TWM632049U - Processing mechanism of light guide plate - Google Patents

Processing mechanism of light guide plate Download PDF

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Publication number
TWM632049U
TWM632049U TW111206909U TW111206909U TWM632049U TW M632049 U TWM632049 U TW M632049U TW 111206909 U TW111206909 U TW 111206909U TW 111206909 U TW111206909 U TW 111206909U TW M632049 U TWM632049 U TW M632049U
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Taiwan
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light guide
guide plate
processing mechanism
protective film
wheel
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TW111206909U
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Chinese (zh)
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李宗翰
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茂林光學股份有限公司
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Priority to TW111206909U priority Critical patent/TWM632049U/en
Publication of TWM632049U publication Critical patent/TWM632049U/en

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Abstract

本創作提供一種導光板之加工機構,包含一附膜裝置、一押花輪及一撐抵裝置。附膜裝置用以貼附保護膜至導光板之上及/或下表面,押花輪設於附膜裝置一側且表面具有花紋結構,押花輪於加熱至一設定溫度後滾押保護膜,使保護膜形成對應花紋結構之凹陷結構,撐抵裝置相對押花輪設置,供撐抵導光板以使押花輪於保護膜上施力滾押。據此可供導光板於後續堆疊時藉保護膜上之凹陷結構,避免保護膜相互擠壓過久產生真空吸附現象,以防止抓取堆疊的導光板時,會連帶地將下一片導光板吸起再脫離而使下一片導光板摔落在更下方之導光板,造成導光板損壞。The present invention provides a processing mechanism for a light guide plate, which includes a film attaching device, a pressing flower wheel and a supporting device. The film-attaching device is used to attach the protective film to the upper and/or lower surface of the light guide plate. The embossing wheel is arranged on one side of the film-attaching device and has a pattern structure on the surface. The protective film forms a concave structure corresponding to the pattern structure, and the supporting device is arranged opposite the pressing flower wheel to support the light guide plate so that the pressing flower wheel can be rolled and pressed on the protective film. According to this, the light guide plate can use the concave structure on the protective film during the subsequent stacking to avoid the vacuum adsorption phenomenon caused by the protective film pressing each other for a long time. The next light guide plate falls to the lower light guide plate, causing damage to the light guide plate.

Description

導光板之加工機構Processing mechanism of light guide plate

本創作係與導光板加工領域相關,尤其是一種導光板之加工機構。This creation is related to the field of light guide plate processing, especially a processing mechanism of light guide plate.

目前的導光板製造方案,大致可分為先提供塑料板材,再經過二次加工於塑料板材上形成所需光學微結構之方式,或是直接利用射出成型方式以在板材製成時一併於板材上形成光學微結構。然而無論是上述哪種製造方式,導光板在製造完成後,還須經過許多精修與出貨準備步驟。The current light guide plate manufacturing solutions can be roughly divided into a method of first providing a plastic sheet, and then forming the required optical microstructure on the plastic sheet through secondary processing, or directly using the injection molding method to form the sheet together with the sheet. Optical microstructures are formed on the plate. However, no matter which of the above manufacturing methods is used, after the light guide plate is manufactured, it still needs to go through many finishing and shipping preparation steps.

一般來說導光板製造完成並再經過各種加工處理後,會採用堆疊成落再搬運出貨之方式進行,同時為了保護導光板上的光學微結構,以及避免堆疊的導光板相互摩擦毀損,因此需在導光板上覆蓋平滑的保護材料,爾後再進行堆疊及包裝運送。但是,設置保護材料後,當透過機構拿取最上方也就是第一片導光板時,由於導光板相互堆疊擠壓過久,進而導致相鄰之導光板間產生真空吸附現象,此時因應真空吸附現象,第二片導光板會一併被吸起,再脫離摔落至第三片導光板上,如此會造成導光板碰撞損壞,而在後續之組裝使用上造成極大問題。然,目前仍無特別針對此現象予以解決之方案與技術提出。Generally speaking, after the light guide plate is manufactured and undergoes various processing treatments, it will be stacked and then transported and shipped. At the same time, in order to protect the optical microstructure on the light guide plate and prevent the stacked light guide plates from rubbing and damaging each other, therefore The light guide plate needs to be covered with a smooth protective material before stacking and packaging. However, after setting the protective material, when the topmost light guide plate, which is the first piece of light guide plate, is taken through the mechanism, the light guide plates are stacked and squeezed for too long, resulting in vacuum adsorption between adjacent light guide plates. At this time, due to the vacuum Adsorption phenomenon, the second light guide plate will be sucked up together, and then fall off and fall to the third light guide plate, which will cause collision damage to the light guide plate, and cause great problems in subsequent assembly and use. However, there is still no specific solution and technology proposed for this phenomenon.

有鑑於此,本創作人係集結多年從事相關行業之豐富經驗,遂構思並提出一種導光板之加工機構,透過在保護材料上進行加工而防止導光板堆疊時相互擠壓而形成前述之真空吸附現象,進而有效解決拿取堆疊成落之導光板時的不便與缺失之處。In view of this, the creator has gathered many years of rich experience in related industries, and then conceived and proposed a processing mechanism for light guide plates, which can prevent the light guide plates from squeezing each other when they are stacked to form the aforementioned vacuum adsorption by processing on protective materials. phenomenon, and then effectively solve the inconvenience and deficiency when taking the stacked light guide plates.

本創作之一目的,旨在提供一種導光板之加工機構,其係於自動化貼附保護膜至導光板表面後,利用滾押加工於保護膜上形成紋路,而可有效解決導光板相互堆疊擠壓過久所產生之真空吸附現象。One of the objectives of this creation is to provide a processing mechanism for light guide plates, which can effectively solve the problem of stacking and squeezing light guide plates after automatically attaching a protective film to the surface of the light guide plate, and then using rolling processing to form lines on the protective film. Vacuum adsorption phenomenon caused by pressure for a long time.

為達上述目的,本創作於一實施方式中揭露一種導光板之加工機構,包含:一附膜裝置,用以貼附一保護膜至導光板之上表面及/或下表面;一押花輪,設於該附膜裝置一側,該押花輪表面具有一花紋結構,該押花輪於加熱至一設定溫度後滾押該保護膜,使該保護膜形成對應該花紋結構之凹陷結構;及一撐抵裝置,相對該押花輪設置,供撐抵導光板以使該押花輪於該保護膜上施力滾押。據此,係可藉由保護膜表面與花紋結構對應之凹陷紋路避免真空吸附現象,以有效防止後續針對堆疊狀之導光板執行抓取或拿取動作時的導光板摔落問題。In order to achieve the above-mentioned purpose, the present invention discloses a processing mechanism of a light guide plate in one embodiment, comprising: a film attaching device for attaching a protective film to the upper surface and/or the lower surface of the light guide plate; a pressing flower wheel, Set on one side of the film-attaching device, the surface of the extrusion wheel has a pattern structure, and the extrusion wheel is heated to a set temperature and rolls the protective film, so that the protective film forms a concave structure corresponding to the pattern structure; and a support The pressing device is arranged relative to the pressing flower wheel, and is used to support the light guide plate so that the pressing flower wheel is forced to roll on the protective film. Accordingly, the vacuum adsorption phenomenon can be avoided by the concave lines on the surface of the protective film and the pattern structure, so as to effectively prevent the light guide plate from falling when the stacked light guide plate is grabbed or taken out.

進一步地,於另一實施方式中係揭露該花紋結構分佈於該押花輪表面而形成複數押印區,且該等押印區為長條狀並呈間隔排列設置,如此可使保護膜因應花紋結構所形成之紋路分布更為適切,且押花輪於製造上亦相對更為簡易。Further, in another embodiment, it is disclosed that the pattern structure is distributed on the surface of the embossing wheel to form a plurality of imprinting areas, and the imprinting areas are elongated and arranged at intervals, so that the protective film can be adapted to the pattern structure. The pattern distribution formed is more suitable, and the manufacturing of the embossing wheel is relatively simpler.

基於前述實施方式,於再一實施方式中係揭示任二相鄰之該押印區間距為1±0.2mm,以形成較為適切的紋路分布狀態並利於加工製成押花輪結構。Based on the foregoing embodiment, in another embodiment, it is disclosed that the distance between any two adjacent embossing areas is 1±0.2 mm, so as to form a more suitable grain distribution state and facilitate processing into an embossed wheel structure.

另者,次一實施方式中則揭露該等押印區之長度分別為100±0.5mm,以在押印加工上具有更好的效率且適用於大多數的導光板尺規。In addition, in the next embodiment, the lengths of the imprinting areas are respectively 100±0.5 mm, so as to have better efficiency in imprinting and be suitable for most light guide plate rulers.

再者,一實施方式中係揭示該等押印區之寬度分別為1.8±0.2mm,以據此形成較好的花紋分布狀態。Furthermore, in an embodiment, it is disclosed that the widths of the imprinting areas are respectively 1.8±0.2 mm, so as to form a better pattern distribution state accordingly.

另外,考量常見之導光板尺規,於一實施方式中係揭露該押花輪之直徑為22±0.5mm,以更利於執行滾押加工。In addition, considering the common light guide plate ruler, in one embodiment, the diameter of the embossing wheel is disclosed as 22±0.5mm, which is more convenient for performing the rolling process.

此外,於一實施方式中係揭露該花紋結構係包含複數第一斜紋溝槽及複數第二斜紋溝槽,該等第一斜紋溝槽相互平行間隔排列設置,該等第二斜紋溝槽相互平行間隔排列設置,且該等第一斜紋溝槽及該等第二斜紋溝槽相互交錯,如此除利於製造押花輪結構外,也可相對保護膜形成較適切之紋路結構。In addition, in one embodiment, it is disclosed that the pattern structure includes a plurality of first twill grooves and a plurality of second twill grooves, the first twill grooves are arranged in parallel and spaced apart from each other, and the second twill grooves are parallel to each other The first twill grooves and the second twill grooves are staggered with each other, so that not only is it beneficial to manufacture the embossing wheel structure, but also a more suitable texture structure can be formed relative to the protective film.

基於上述實施方式,另一實施方式中係揭露任二相鄰之該第一斜紋溝槽間距為1.5±0.2mm,以利構成較適切之花紋。Based on the above-mentioned embodiment, another embodiment discloses that the distance between any two adjacent first twill grooves is 1.5±0.2 mm, so as to form a more suitable pattern.

或亦可使如次一實施方式所述,使任二相鄰之該第二斜紋溝槽間距為1.5±0.2mm,也能據此形成較適切之花紋。Alternatively, as described in the next embodiment, the distance between any two adjacent second twill grooves is 1.5±0.2 mm, and a more appropriate pattern can also be formed accordingly.

此外,再一實施方式中則揭露該等第二斜紋溝槽之傾斜角度為45~60度,以與第一斜紋溝槽夾設形成適於押印之花紋。In addition, in another embodiment, the inclination angle of the second twill grooves is 45-60 degrees, so as to be sandwiched with the first twill grooves to form patterns suitable for embossing.

為利於自動化加工且讓導光板之移動更為順暢,於一實施方式中揭露該撐抵裝置包含複數被動輸送輪,該等被動輸送輪係間隔排列設置,且於導光板移動時該等被動輸送輪係以其中心為軸心旋轉。In order to facilitate automatic processing and make the movement of the light guide plate smoother, in an embodiment, it is disclosed that the supporting device includes a plurality of passive conveying wheels, and the passive conveying wheel trains are arranged at intervals, and the passive conveying wheels are arranged when the light guide plate moves. The wheel train rotates with its center as the axis.

此外,具體實施上,一實施方式為導光板之加工機構更包含一雷射切割裝置,設於該押花輪一側,供以切割受該押花輪押印後之導光板,讓導光板上之保護膜於押印形成凹陷結構後始進行切割形成所需尺寸。In addition, in a specific implementation, an embodiment of the processing mechanism for the light guide plate further includes a laser cutting device, which is arranged on one side of the embossing wheel for cutting the light guide plate after being embossed by the embossing wheel, so as to protect the light guide plate on the light guide plate. The film is cut to form the desired size after the concave structure is formed by embossing.

再者,為更全面地保護導光板,於另一實施方式中則揭露該附膜裝置包含二膜材滾輪,分別設置於導光板之頂側與底側,以將該保護膜貼附至導光板之上表面及下表面;該押花輪設於導光板頂側,以對貼附於導光板上表面之該保護膜進行押印。Furthermore, in order to protect the light guide plate more comprehensively, in another embodiment, it is disclosed that the film attaching device includes two film material rollers, which are respectively disposed on the top side and the bottom side of the light guide plate, so as to attach the protective film to the guide plate. The upper surface and the lower surface of the light guide plate; the embossing wheel is arranged on the top side of the light guide plate to emboss the protective film attached to the upper surface of the light guide plate.

進一步地,為使押花輪可順利地將花紋結構押印至保護膜上形成相對應之凹陷結構,於一實施方式中係揭示該設定溫度為50~60℃。Further, in order to enable the embossing wheel to smoothly emboss the pattern structure on the protective film to form the corresponding concave structure, in one embodiment, it is disclosed that the set temperature is 50-60°C.

綜上所述,本創作之導光板之加工機構,係將保護膜之覆設與押花加工結合於同一加工產線中,且利用押花輪於保護膜上形成凹陷結構而可防止後續導光板堆疊成落後,因堆疊相互擠壓造成相鄰導光板間形成真空吸附之狀態,如此即可有效避免拿取導光板時連帶將其他導光板一併吸起再摔落之缺失問題,有效提升導光板之組裝應用效率並保持導光板產品品質。進一步地,關於押花輪之具體結構狀態以及加工機構之細部結構特徵等,本創作亦有提出諸多可附加之技術特徵,而如上各段落所述。To sum up, the processing mechanism of the light guide plate of this creation combines the covering of the protective film and the embossing processing in the same processing line, and the embossing wheel is used to form a concave structure on the protective film to prevent the subsequent stacking of the light guide plate. After the formation, the adjacent light guide plates form a vacuum adsorption state due to the mutual extrusion of the stack, which can effectively avoid the problem of sucking up other light guide plates together and then dropping them when taking the light guide plate, and effectively improve the light guide plate. The assembly application efficiency and maintain the quality of light guide plate products. Further, regarding the specific structural state of the pressing flower wheel and the detailed structural features of the processing mechanism, this creation also proposes many technical features that can be added, as described in the above paragraphs.

誠如前述,於現今導光板生產領域中,對於導光板堆疊後的拿取摔落問題仍無較好的解決方案,為了有效避免該問題以讓廠商於拿取導光板時更為順暢與便利,本創作人係提出一種導光板之加工機構,藉由對於導光板進行押印加工之方式來防止導光板於堆疊後,因相互擠壓過久所造成之真空吸附現象。以下係透過圖式與文字對本創作之導光板之加工機構進行說明,其中,各圖所繪內容係供示意說明本創作技術特徵之用,各圖所示之長、寬、厚、高等尺寸,非表示實際結構與尺規、比例等,合先敘明。As mentioned above, in today's light guide plate production field, there is still no good solution to the problem of picking up and falling light guide plates after stacking. In order to effectively avoid this problem, manufacturers can take the light guide plates more smoothly and conveniently. , The author proposes a processing mechanism for the light guide plate, which can prevent the vacuum adsorption phenomenon caused by pressing each other for a long time after the light guide plates are stacked. The following is a description of the processing mechanism of the light guide plate of this creation through the drawings and text. The content drawn in each figure is for the purpose of illustrating the technical characteristics of this creation. The dimensions of length, width, thickness and height shown in each figure, It does not represent the actual structure, ruler, scale, etc., which will be explained first.

請參閱第1及2圖,其係為本創作一實施方式之加工機構示意圖及押花輪結構示意圖。本創作之導光板之加工機構1,係包含一附膜裝置10、一押花輪11及一撐抵裝置12。附膜裝置10係用以貼附一保護膜2至導光板9的上表面及/或下表面,以保護導光板9表面之光學微結構(圖中未示)。押花輪11設於附膜裝置10一側,且押花輪11表面具有一花紋結構111,押花輪11於加熱至一設定溫度後滾押保護膜2,使保護膜2形成對應花紋結構111之凹陷結構,例如第1圖中押花輪11左側保護膜2上方以較黑線條表示的區域即為保護膜11受押印後形成之凹陷結構部分。其中,押花輪11之花紋結構111係可透過於滾輪上雕刻形成,例如透過刀具於滾輪上割出多個溝槽等,而使押花輪11形成可於保護膜2表面押印形成凹陷結構之花紋結構111。撐抵裝置12則相對押花輪11設置,供以撐抵導光板9以使押花輪11於保護膜2上施力滾押。而前述加工機構1所加工之導光板9對象,係指已於表面形成有光學微結構之板材,且可例如為透過射出成型製成而呈分離狀之片體,逐一地進行附膜與押印加工,或為透過押出成形之接續狀長條板材,一次性地進行附膜與押印。而前述之導光板製程方式已為相關業界中使用已久之成熟技術,且非為本創作之重點特徵,於此即不再多做敘述。Please refer to Figures 1 and 2, which are a schematic diagram of a processing mechanism and a schematic diagram of the structure of an embossing wheel according to an embodiment of the present invention. The light guide plate processing mechanism 1 of the present creation includes a film attachment device 10 , a pressing flower wheel 11 and a supporting device 12 . The film attaching device 10 is used for attaching a protective film 2 to the upper surface and/or the lower surface of the light guide plate 9 to protect the optical microstructure on the surface of the light guide plate 9 (not shown in the figure). The extrusion wheel 11 is arranged on one side of the film attachment device 10, and the surface of the extrusion wheel 11 has a pattern structure 111. After the extrusion wheel 11 is heated to a set temperature, the protective film 2 is rolled to form a depression corresponding to the pattern structure 111. The structure, for example, the area above the protective film 2 on the left side of the embossing wheel 11 in Fig. 1 is indicated by a darker line, which is the concave structure part formed after the protective film 11 is embossed. Among them, the pattern structure 111 of the embossing wheel 11 can be formed by engraving on the roller, for example, a plurality of grooves are cut out on the roller by a cutter, so that the embossing wheel 11 can form a pattern that can be embossed on the surface of the protective film 2 to form a concave structure. Structure 111. The supporting device 12 is disposed opposite to the pressing flower wheel 11 for supporting the light guide plate 9 so that the pressing flower wheel 11 is forced to roll on the protective film 2 . The object of the light guide plate 9 processed by the aforementioned processing mechanism 1 refers to a plate with an optical microstructure formed on the surface, and can be, for example, a separate sheet formed by injection molding, and the film is attached and stamped one by one. Processing, or by extruding a continuous long sheet, filming and stamping at one time. The aforementioned light guide plate manufacturing method has been a mature technology used in the relevant industry for a long time, and is not the key feature of this creation, so it will not be described here.

據此,透過上述之加工機構1針對覆設於導光板9表面之保護膜2進行押印加工後,係可有效防止後續導光板9堆疊成落造成之真空吸附現象。更具體地說,當保護膜2為平整光滑之狀態時,相互擠壓過久即會導致上下相鄰之兩片導光板9形成真空吸附,為了避免該現象,透過本實施方式所述加工機構1之押花輪11,即可讓保護膜2形成非平整光滑之結構態樣,藉由具凹陷結構之保護膜2,就可以有效防止擠壓後造成的真空吸附現象。Accordingly, after the protective film 2 covering the surface of the light guide plate 9 is embossed by the processing mechanism 1, the vacuum adsorption phenomenon caused by the subsequent stacking of the light guide plate 9 can be effectively prevented. More specifically, when the protective film 2 is in a flat and smooth state, if the protective film 2 is pressed against each other for a long time, it will cause the two adjacent light guide plates 9 to form vacuum adsorption. The pressing wheel 11 of 1 can make the protective film 2 form a non-flat and smooth structure, and the protective film 2 with a concave structure can effectively prevent the vacuum adsorption phenomenon caused by extrusion.

為利於移動導光板9,一實施狀態中該撐抵裝置12係包含複數被動輸送輪121,該等被動輸送輪121係間隔排列設置,且於導光板9移動時該等被動輸送輪121係以其中心為軸心旋轉。透過該些被動輸送輪121,除可相對導光板9形成撐抵功能以讓押花輪11可順利地在保護膜2上押印形成凹陷結構外,也能據此讓導光板9可順利移動繼續後續加工或搬移處理等,並在該結構狀態下,即可以導光板9為動件,押花輪11為原地自轉的作動方式,快速且確實地押印貼附於導光板9上的保護膜2。In order to facilitate the movement of the light guide plate 9, in an implementation state, the supporting device 12 includes a plurality of passive conveying wheels 121, the passive conveying wheels 121 are arranged at intervals, and when the light guide plate 9 moves, the passive conveying wheels 121 are Its center is the axis of rotation. Through these passive conveying wheels 121 , in addition to forming a supporting function relative to the light guide plate 9 so that the embossing wheel 11 can smoothly emboss on the protective film 2 to form a concave structure, the light guide plate 9 can also be moved smoothly to continue the follow-up. In this structural state, the light guide plate 9 can be used as a moving part, and the embossing wheel 11 can be rotated in place, and the protective film 2 attached to the light guide plate 9 can be quickly and reliably printed.

誠如前述,本實施方式之加工機構1係可針對已為欲出貨尺規大小之導光板9進行押印,也可以先針對連續之長條片狀結構進行押印後再切割成所需尺規,於本實施方式中即揭露加工機構1可更包含一雷射切割裝置13,設於押花輪11一側,供以切割受押花輪11押印後之導光板9。具體實施上,連續長條狀之導光板9經過附膜裝置10而於導光板表面貼附保護膜2後,再藉由押花輪11對保護膜2進行滾押,使保護膜2形成諸多與花紋結構111相對應之凹陷結構,而後再藉由雷射切割裝置13將長條狀的導光板9切割形成所需尺寸,而製成可供出貨之導光板產品。As mentioned above, the processing mechanism 1 of this embodiment can emboss the light guide plate 9 that is the size of the gauge to be shipped, or can first emboss the continuous long sheet structure and then cut it into the desired gauge. In this embodiment, it is disclosed that the processing mechanism 1 may further include a laser cutting device 13 , which is arranged on one side of the embossing wheel 11 for cutting the light guide plate 9 after being embossed by the embossing wheel 11 . In specific implementation, the continuous long light guide plate 9 passes through the film attaching device 10 to attach the protective film 2 on the surface of the light guide plate, and then rolls the protective film 2 by the embossing wheel 11, so that the protective film 2 forms many The pattern structure 111 corresponds to the concave structure, and then the long strip light guide plate 9 is cut into the required size by the laser cutting device 13 to produce the light guide plate product ready for shipment.

為更確實地保護導光板9,以及考量加工製程之順暢度,加工機構1之附膜裝置10係可包含二膜材滾輪101,分別設置於導光板9之頂側與底側,以將保護膜2貼附至導光板9之上表面及下表面;而押花輪11設於導光板9頂側,以對貼附於導光板9上表面之保護膜2進行押印。如此可進一步地增進導光板9受保護之效能,同時在這樣的附膜裝置10與押花輪11設置狀態下,也能讓導光板9加工進行更為流暢且有效率。In order to more reliably protect the light guide plate 9 and consider the smoothness of the processing process, the film attaching device 10 of the processing mechanism 1 may include two film material rollers 101, which are respectively disposed on the top side and the bottom side of the light guide plate 9 to protect the light guide plate 9. The film 2 is attached to the upper surface and the lower surface of the light guide plate 9 ; and the embossing wheel 11 is arranged on the top side of the light guide plate 9 to emboss the protective film 2 attached to the upper surface of the light guide plate 9 . In this way, the protection effect of the light guide plate 9 can be further improved, and at the same time, the processing of the light guide plate 9 can be smoother and more efficient under the installation state of the film attaching device 10 and the embossing wheel 11 .

此外,為利於押花輪11押印保護膜2以於保護膜2上形成對應花紋結構111之凹陷結構,押花輪11係可於加熱至設定溫度為50~60℃,再對保護膜2進行押印,如此可藉由略高的溫度讓保護膜2軟化,使花紋結構111可順利地押印至保護膜2上。In addition, in order to facilitate the embossing wheel 11 to emboss the protective film 2 to form a concave structure corresponding to the pattern structure 111 on the protective film 2, the embossing wheel 11 can be heated to a set temperature of 50-60°C, and then the protective film 2 is embossed. In this way, the protective film 2 can be softened by a slightly higher temperature, so that the pattern structure 111 can be smoothly printed on the protective film 2 .

請繼續參閱第2圖,於一實施狀態中,押花輪11之花紋結構111係分布於押花輪11表面而形成複數押印區112,且押印區112分別為長條狀並呈間隔排列設置。如此,係可讓保護膜2上受押花輪11押印形成之凹陷結構分布更為均勻,並有效避免過度破壞保護膜2而影響其對於導光板9之保護效能。Please continue to refer to FIG. 2 , in an implementation state, the pattern structures 111 of the embossing wheel 11 are distributed on the surface of the embossing wheel 11 to form a plurality of embossing areas 112 , and the embossing areas 112 are elongated and arranged at intervals. In this way, the concave structures formed by the embossing pattern wheel 11 on the protective film 2 can be more uniformly distributed, and the protective film 2 can be effectively prevented from being damaged excessively and the protection performance of the light guide plate 9 is affected.

請再一併搭配參閱第3圖,其係為本創作一實施方式之押花輪側視圖。關於押花輪11之結構尺規,係可使任二相鄰之押印區112間距D1為1±0.2mm,透過這樣的押印區112結構特徵,除了利於在押花輪11上加工形成花紋結構111外,也能在滾押保護膜2後,使凹陷結構形成更為均勻之結構分布狀態。Please refer to FIG. 3 together, which is a side view of the pressing flower wheel according to an embodiment of the present invention. Regarding the structural ruler of the embossing wheel 11, the distance D1 between any two adjacent embossing areas 112 can be set to 1±0.2mm. Through such structural features of the embossing area 112, in addition to facilitating the processing of the embossing wheel 11 to form the pattern structure 111, After the protective film 2 is rolled, the recessed structure can be formed into a more uniform structure distribution state.

另者,關於押印區112的長度及寬度,本創作亦提出對應尺規限制,例如可使押印區112之長度L分別為100±0.5mm,如此係可讓押花輪11更適用於各種尺寸規格的導光板9產品,有效針對導光板9上的保護膜2進行滾押。In addition, with regard to the length and width of the embossing area 112, the present creation also proposes corresponding rules and regulations. For example, the length L of the embossing area 112 can be set to 100±0.5mm respectively, so that the embossing wheel 11 can be more suitable for various sizes. The light guide plate 9 product is effectively rolled against the protective film 2 on the light guide plate 9 .

押印區112之寬度W部分,則可使押印區112之寬度W分別為1.8±0.2mm,以讓押花輪11於滾動押印時,在保護膜2上形成分布較為適切之凹陷結構狀態。For the width W of the embossing area 112, the width W of the embossing area 112 can be respectively 1.8±0.2mm, so that when the embossing wheel 11 rolls and embosses, the protective film 2 can form a more suitable concave structure state.

此外,考量現今常見的導光板9之尺規大小,一實施狀態中係可使押花輪11之直徑A為22±0.5mm,如此即能較適用於押印大多數的導光板9。其中,上述各段關於押花輪之結構尺規條件,除可分別實施外,當然也可同時實施,而讓押花輪具有更好的加工效能等。In addition, considering the size of the current common light guide plate 9, in an implementation state, the diameter A of the embossing wheel 11 can be set to 22±0.5mm, which is more suitable for embossing most light guide plates 9. Among them, the above paragraphs about the structural ruler and gauge conditions of the pressing flower wheel can be implemented separately, of course, can also be implemented simultaneously, so that the pressing flower wheel has better processing efficiency and so on.

關於花紋結構111之示例,請再一併搭配參閱第3圖中的押花輪花紋結構放大示意部分。於本實施方式中,花紋結構111係包含複數第一斜紋溝槽1111及複數第二斜紋溝槽1112,第一斜紋溝槽1111相互平行間隔排列設置,第二斜紋溝槽1112亦相互平行間隔排列設置,且第一斜紋溝槽1111與第二斜紋溝槽1112係相互交錯設置,而形成如格狀般之紋路。如此,當押花輪11於保護膜2上滾押時,藉由第一斜紋溝槽1111與第二斜紋溝槽1112夾設形成之相對凸出部分,即可於保護膜2上形成多個凹陷結構,藉由該些凹陷結構即可避免上下堆疊的導光板9之間形成真空吸附現象。For an example of the pattern structure 111 , please refer to the enlarged schematic part of the pattern structure of the pressed flower wheel in FIG. 3 together. In this embodiment, the pattern structure 111 includes a plurality of first twill grooves 1111 and a plurality of second twill grooves 1112. The first twill grooves 1111 are arranged in parallel and spaced apart from each other, and the second twill grooves 1112 are also arranged in parallel and spaced apart from each other. The first twill grooves 1111 and the second twill grooves 1112 are arranged in a staggered manner to form a lattice-like pattern. In this way, when the embossing wheel 11 is rolled on the protective film 2 , a plurality of depressions can be formed on the protective film 2 by the relative protruding portions formed by sandwiching the first twill groove 1111 and the second twill groove 1112 With these recessed structures, the vacuum adsorption phenomenon between the stacked light guide plates 9 can be avoided.

進一步地,當花紋結構111為上述狀態時,可使任二相鄰之第一斜紋溝槽1111間距D2為1.5±0.2mm,如此以與第二斜紋溝槽1112交錯夾設形成足夠的凸出區域以進行押印。Further, when the pattern structure 111 is in the above state, the distance D2 between any two adjacent first twill grooves 1111 can be set to 1.5±0.2 mm, so that sufficient protrusions are formed by interlacing with the second twill grooves 1112. area for imprinting.

另者,也可選擇使任二相鄰之第二斜紋溝槽1112間距D3為1.5±0.2mm,如此在製造押花輪之加工步驟上也可更為簡化。當然此特徵條件可與上述之第一斜紋溝槽1111間距D2條件一併存在,而使第二斜紋溝槽1112與第一斜紋溝槽1111呈相對應之分布狀態。In addition, the distance D3 between any two adjacent second twill grooves 1112 can also be selected to be 1.5±0.2 mm, so that the processing steps of manufacturing the embossing wheel can be simplified. Of course, this characteristic condition can exist together with the above-mentioned condition of the distance D2 of the first twill grooves 1111 , so that the second twill grooves 1112 and the first twill grooves 1111 are in a corresponding distribution state.

此外,於一實施狀態中,則可使第二斜紋溝槽1112之傾斜角度θ為45~60度,如第3圖所示。透過該限制條件,也可較為確保花紋結構111具有足夠之凸出區域押印保護膜2形成對應之凹陷結構。同樣地,第二斜紋溝槽1112之傾斜角度θ限制範圍也可與上述之第一斜紋溝槽1111間距D2及/或第二斜紋溝槽1112間距D3一併存在。In addition, in an implementation state, the inclination angle θ of the second twill groove 1112 can be set to be 45-60 degrees, as shown in FIG. 3 . With this restriction, it can also be relatively ensured that the pattern structure 111 has enough protruding areas to imprint the protective film 2 to form a corresponding concave structure. Similarly, the limited range of the inclination angle θ of the second twill grooves 1112 may also exist together with the above-mentioned spacing D2 of the first twill grooves 1111 and/or the spacing D3 of the second twill grooves 1112 .

綜上所述,本創作之導光板之加工機構係可有效解決導光板堆疊後所造成之真空吸附現象,避免後續拿取導光板時,因真空吸附而使下一片導光板同步被吸起再摔落之問題,大幅地優化導光板之應用良率。具體之技術特徵在於透過附膜裝置於導光板貼附保護膜,並利用押花輪在保護膜上押印形成凹陷結構,以藉此消除多片導光板堆疊時相互擠壓所產生之真空吸附現象,進而避免前述於拿取導光板時之問題。而關於加工機構之細部結構特徵,本創作亦有提出諸多可附加之結構狀態,以利在加工製程上以及押印效能上獲得更好的良率與效率等,例如押花輪於應用上之各類實施方案,包括花紋結構分布於押花輪上而形成多個押印區、押印區之尺規、押花輪之直徑等,以及花紋結構可包含第一斜紋溝槽與第二斜紋溝槽等特徵;或是關於附膜裝置、撐抵裝置等具體結構狀態,還有考量整體加工製程而衍生出之雷射切割裝置以及押印輪加熱之設定溫度大小等。To sum up, the processing mechanism of the light guide plate in this creation can effectively solve the vacuum adsorption phenomenon caused by the stacking of the light guide plate, and avoid the next light guide plate being simultaneously sucked up due to vacuum adsorption when the light guide plate is taken out later. The problem of falling, greatly optimizes the application yield of the light guide plate. The specific technical feature is that a protective film is attached to the light guide plate through a film attachment device, and a concave structure is formed on the protective film by means of an embossing wheel, so as to eliminate the vacuum adsorption phenomenon caused by the mutual extrusion of multiple light guide plates when stacking. Thus, the aforementioned problems when taking the light guide plate are avoided. Regarding the detailed structural features of the processing mechanism, this creation also proposes many additional structural states to facilitate better yield and efficiency in the processing process and imprinting performance, such as various types of embossing wheels used in applications The embodiment includes that the pattern structure is distributed on the embossing wheel to form a plurality of embossing areas, the ruler of the embossing area, the diameter of the embossing wheel, etc., and the pattern structure can include features such as the first twill groove and the second twill groove; or It is about the specific structural state of the film attaching device, the supporting device, etc., as well as the laser cutting device derived from the overall processing process and the set temperature of the printing wheel heating.

1:加工機構 10:附膜裝置 101:膜材滾輪 11:押花輪 111:花紋結構 1111:第一斜紋溝槽 1112:第二斜紋溝槽 112:押印區 12:撐抵裝置 121:被動輸送輪 13:雷射切割裝置 2:保護膜 9:導光板 D1:任二相鄰之押印區間距 D2:任二相鄰之第一斜紋溝槽間距 D3:任二相鄰之第二斜紋溝槽間距 L:押印區之長度 W:押印區之寬度 A:押花輪之直徑 θ:第二斜紋溝槽之傾斜角度 1: Processing mechanism 10: Attachment film device 101: Membrane roller 11: Press flower wheel 111: Pattern structure 1111: The first twill groove 1112: Second twill groove 112: Printing area 12: Support device 121: Passive conveying wheel 13: Laser cutting device 2: Protective film 9: Light guide plate D1: The distance between any two adjacent imprinting areas D2: The distance between any two adjacent first twill grooves D3: The distance between any two adjacent second twill grooves L: the length of the stamped area W: the width of the imprint area A: Diameter of pressing wheel θ: The inclination angle of the second twill groove

第1圖,為本創作一實施方式之加工機構示意圖。 第2圖,為本創作一實施方式之押花輪結構示意圖。 第3圖,為本創作一實施方式之押花輪側視圖。 FIG. 1 is a schematic diagram of a processing mechanism according to an embodiment of the present invention. Fig. 2 is a schematic diagram of the structure of the pressing flower wheel according to an embodiment of the present invention. Figure 3 is a side view of the pressing flower wheel according to an embodiment of the present invention.

1:加工機構 1: Processing mechanism

10:附膜裝置 10: Attachment film device

101:膜材滾輪 101: Membrane roller

11:押花輪 11: Press flower wheel

12:撐抵裝置 12: Support device

121:被動輸送輪 121: Passive conveying wheel

13:雷射切割裝置 13: Laser cutting device

2:保護膜 2: Protective film

9:導光板 9: Light guide plate

Claims (14)

一種導光板之加工機構,包含: 一附膜裝置,用以貼附一保護膜至導光板之上表面及/或下表面; 一押花輪,設於該附膜裝置一側,該押花輪表面具有一花紋結構,該押花輪於加熱至一設定溫度後滾押該保護膜,使該保護膜形成對應該花紋結構之凹陷結構;及 一撐抵裝置,相對該押花輪設置,供撐抵導光板以使該押花輪於該保護膜上施力滾押。 A processing mechanism for a light guide plate, comprising: a film attaching device for attaching a protective film to the upper surface and/or the lower surface of the light guide plate; An embossing wheel is installed on one side of the film attaching device. The surface of the embossing wheel has a pattern structure. After being heated to a set temperature, the embossing wheel rolls the protective film so that the protective film forms a concave structure corresponding to the pattern structure. ;and A supporting device is arranged opposite to the pressing flower wheel, and is used to support the light guide plate so that the pressing flower wheel can be rolled and pressed on the protective film. 如請求項1之導光板之加工機構,其中,該花紋結構分佈於該押花輪表面而形成複數押印區,且該等押印區為長條狀並呈間隔排列設置。The light guide plate processing mechanism of claim 1, wherein the pattern structure is distributed on the surface of the embossing wheel to form a plurality of imprinting areas, and the imprinting areas are elongated and arranged at intervals. 如請求項2之導光板之加工機構,其中,任二相鄰之該押印區間距為1±0.2mm。The processing mechanism of the light guide plate according to claim 2, wherein the distance between any two adjacent imprinting areas is 1±0.2mm. 如請求項2之導光板之加工機構,其中,該等押印區之長度分別為100±0.5mm。The processing mechanism of the light guide plate as claimed in claim 2, wherein the lengths of the imprinting areas are respectively 100±0.5mm. 如請求項2之導光板之加工機構,其中,該等押印區之寬度分別為1.8±0.2mm。The processing mechanism of the light guide plate as claimed in claim 2, wherein the widths of the stamping areas are respectively 1.8±0.2mm. 如請求項2之導光板之加工機構,其中,該押花輪之直徑為22±0.5mm。The processing mechanism of the light guide plate according to claim 2, wherein the diameter of the embossing wheel is 22±0.5mm. 如請求項1或2之導光板之加工機構,其中,該花紋結構係包含複數第一斜紋溝槽及複數第二斜紋溝槽,該等第一斜紋溝槽相互平行間隔排列設置,該等第二斜紋溝槽相互平行間隔排列設置,且該等第一斜紋溝槽及該等第二斜紋溝槽相互交錯。The light guide plate processing mechanism of claim 1 or 2, wherein the pattern structure comprises a plurality of first twill grooves and a plurality of second twill grooves, the first twill grooves are arranged in parallel and spaced apart from each other, and the first twill grooves The two twill grooves are arranged in parallel and spaced apart from each other, and the first twill grooves and the second twill grooves are staggered with each other. 如請求項7之導光板之加工機構,其中,任二相鄰之該第一斜紋溝槽間距為1.5±0.2mm。The light guide plate processing mechanism of claim 7, wherein the spacing between any two adjacent first twill grooves is 1.5±0.2 mm. 如請求項7之導光板之加工機構,其中,任二相鄰之該第二斜紋溝槽間距為1.5±0.2mm。The light guide plate processing mechanism of claim 7, wherein the spacing between any two adjacent second twill grooves is 1.5±0.2 mm. 如請求項7之導光板之加工機構,其中,該等第二斜紋溝槽之傾斜角度為45~60度。The light guide plate processing mechanism of claim 7, wherein the inclination angle of the second twill grooves is 45-60 degrees. 如請求項1之導光板之加工機構,其中,該撐抵裝置包含複數被動輸送輪,該等被動輸送輪係間隔排列設置,且於導光板移動時該等被動輸送輪係以其中心為軸心旋轉。The light guide plate processing mechanism of claim 1, wherein the abutting device comprises a plurality of passive conveying wheels, the passive conveying wheel trains are arranged at intervals, and the center of the passive conveying wheel trains is the axis when the light guide plate moves Heart spins. 如請求項1之導光板之加工機構,更包含一雷射切割裝置,設於該押花輪一側,供以切割受該押花輪押印後之導光板。The processing mechanism of the light guide plate as claimed in claim 1 further includes a laser cutting device, which is arranged on one side of the embossing wheel for cutting the light guide plate after being embossed by the embossing wheel. 如請求項1之導光板之加工機構,其中,該附膜裝置包含二膜材滾輪,分別設置於導光板之頂側與底側,以將該保護膜貼附至導光板之上表面及下表面;該押花輪設於導光板頂側,以對貼附於導光板上表面之該保護膜進行押印。The processing mechanism of the light guide plate according to claim 1, wherein the film attaching device comprises two film material rollers, which are respectively arranged on the top side and the bottom side of the light guide plate, so as to attach the protective film to the upper surface and the lower surface of the light guide plate. surface; the embossing wheel is arranged on the top side of the light guide plate to emboss the protective film attached to the surface of the light guide plate. 如請求項1之導光板之加工機構,其中,該設定溫度為50~60℃。The processing mechanism of the light guide plate according to claim 1, wherein the set temperature is 50-60°C.
TW111206909U 2022-06-29 2022-06-29 Processing mechanism of light guide plate TWM632049U (en)

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GD4K Issue of patent certificate for granted utility model filed before june 30, 2004