TWM628882U - Improved structure of lcd panel - Google Patents

Abstract

An improved structure of LCD panel including a first substrate and a second substrate is provided. The second substrate is disposed opposite the first substrate. The first substrate includes a display area, a non-display area, and an anti-etching metal layer. The display area has a reflective area. The non-display area has an outer ring portion, a first non-display area, and a second non-display area. The anti-etching metal layer is disposed on the non-display area.

Description

Improved structure of liquid crystal display panel

The present invention relates to a liquid crystal display panel, and in detail, relates to an improved structure of a liquid crystal display panel.

In the etching process of the reflective metal layer of the liquid crystal display panel, because the panel at the edge of the carrier is in contact with the etching solution for a long time, the reflective metal layer around the display area will be over-etched, and the transparent conductive layer below will be over-etched. Layers are prone to side etching.

The above situation will lead to the phenomenon that the panel at the edge of the carrier has bad corners, so that the yield rate of the panel there is low.

In view of this, how to provide an improved structure of a liquid crystal display panel, which can avoid over-etching of the reflective metal layer and side etching of the transparent conductive layer during the etching process of the reflective metal layer, so as to improve the panel yield at the edge of the carrier board , which is an urgent problem to be solved in this industry.

In order to solve the above technical problems, the present invention is realized as follows: an improved structure of a liquid crystal display panel is provided, which includes a first substrate and a second substrate. The second substrate is disposed on the opposite side of the first substrate. Wherein, the first substrate has a display area, a non-display area and an anti-etching metal layer. The display area has a reflective area, the reflective area has a plurality of reflective metal layers, and the plurality of reflective metal layers are arranged in an array. The non-display area has an outer ring portion, a first non-display area and a second non-display area. The outer ring part surrounds and is arranged on the periphery of the display area. The first non-display area surrounds and is disposed on the periphery of the outer ring portion, and the side of the first non-display area facing the second substrate has a first transparent conductive layer. The second non-display area surrounds and is disposed on the periphery of the first non-display area, and a side of the second non-display area facing the second substrate has a second transparent conductive layer. The anti-etching metal layer is disposed in the non-display area.

In the improved structure of the novel liquid crystal display panel, the anti-etching metal layer is disposed at least on the outer ring portion of the non-display area, the first transparent conductive layer in the first non-display area, or the second transparent conductive layer in the second non-display area. one of the layers.

In the improved structure of the novel liquid crystal display panel, the plurality of reflective metal layers have a first gap in a first direction, and the plurality of reflective metal layers have a second gap in a second direction.

In the improved structure of the novel liquid crystal display panel, the first gap and the second gap are between 1 micrometer and 200 micrometers.

In the improved structure of the new liquid crystal display panel, when the anti-etching metal layer is disposed on the outer ring portion, the anti-etching metal layer has a third gap between the first direction and the display area, and the anti-etching metal layer is in the second direction. There is a fourth gap between the display area and the third gap, and the third gap is equal to the first gap, and the fourth gap is equal to the second gap.

In the improved structure of the novel liquid crystal display panel, the anti-etching metal layer is a ring-shaped metal layer.

In the improved structure of the liquid crystal display panel of the present invention, in the outer ring portion, the side of the first substrate facing the second substrate has a first metal layer, an insulating layer, a second metal layer and a protective layer. The layer and the second metal layer are arranged on the first substrate spaced apart from each other, the insulating layer is arranged on the first metal layer, the protective layer is arranged on the insulating layer, the second metal layer and the partially exposed first substrate, and the anti-etching metal layer is set on the protective layer.

In the improved structure of the new liquid crystal display panel, in the first non-display area, the side of the first substrate facing the second substrate has a first metal layer, an insulating layer, a second metal layer, a protective layer and a The first transparent conductive layer, the first metal layer is arranged on the first substrate and partially covers the first substrate, the insulating layer is arranged on the first substrate and the first metal layer and partially exposes the first metal layer, and the second metal layer is arranged on the On the insulating layer, the protective layer is arranged on the insulating layer and is not in contact with the first metal layer and the second metal layer, and the first transparent conductive layer is arranged on the second metal layer, the insulating layer and the partially exposed first metal layer.

In the improved structure of the novel liquid crystal display panel, the anti-etching metal layer and the first transparent conductive layer are arranged correspondingly.

In the improved structure of the novel liquid crystal display panel, in the second non-display area, the side of the first substrate facing the second substrate has a first metal layer, an insulating layer, a second metal layer, a protective layer and a The second transparent conductive layer, the first metal layer is disposed on the first substrate and partially exposed to the first substrate, the insulating layer is disposed on the first metal layer, the second metal layer is disposed on the insulating layer, and the protective layer is disposed on the second metal On the layer and the partially exposed first substrate, the second transparent conductive layer is arranged on the protective layer and the protective layer is partially exposed.

In the improved structure of the new liquid crystal display panel, in the second non-display area, the side of the first substrate facing the second substrate further has a non-display area column spacer, and the non-display area column spacer is arranged on the exposed protective layer and not in contact with the second transparent conductive layer.

In the improved structure of the novel liquid crystal display panel, the anti-etching metal layer is disposed on the protective layer and the second transparent conductive layer.

In the improved structure of the novel liquid crystal display panel, the etching-resistant metal layer and a reflective metal layer in the display area have patterns with corresponding sizes.

In the improved structure of the novel liquid crystal display panel, the metal material of the anti-etching metal layer is the same as the metal material of the reflective metal layer in the display area.

In this novel embodiment, the etching-resistant metal layer is disposed at least on the outer ring portion of the non-display area, the first transparent conductive layer in the first non-display area, or the second transparent conductive layer in the second non-display area. One of the methods in the area of the reflective metal layer, so that the excessive etching solution in the etching process of the reflective metal layer can be blocked by the anti-etching metal layer outside the display area, so that the excessive etching solution will not contact and etch into the display area. A transparent conductive layer, which in turn improves the panel yield at the edge of the carrier.

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are a part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments in the present invention, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the protection scope of the present invention.

The present invention provides an improved structure of a liquid crystal display panel, which can be applied to a reflective panel or a transflective panel. The following description will take the application to a reflective panel as an example, but it is not limited thereto. As shown in FIG. 1 to FIG. 6 , the improved structure 100 of the liquid crystal display panel of the present invention includes a first substrate 110 and a second substrate 120 , and the second substrate 120 is disposed on the opposite side of the first substrate 110 .

The first substrate 110 has a display area 200A, a non-display area 200B and an etch-resistant metal layer 600 . The display area 200A has a reflective area 210, the reflective area 210 has a plurality of reflective metal layers 220, and the plurality of reflective metal layers 220 are arranged in an array. The non-display area 200B has an outer ring portion 300 , a first non-display area 400 and a second non-display area 500 . The outer ring portion 300 surrounds and is disposed on the periphery of the display area 200A. The first non-display area 400 surrounds and is disposed on the periphery of the outer ring portion 300 , and the side of the first non-display area 400 facing the second substrate 120 has a first transparent conductive layer 411 (as shown in FIG. 5 ). The second non-display area 500 surrounds and is disposed on the periphery of the first non-display area 400 , and the side of the second non-display area 500 facing the second substrate 120 has a second transparent conductive layer 511 (as shown in FIG. 6 ). The etch-resistant metal layer 600 is disposed in the non-display area 200B.

As shown in FIG. 2 to FIG. 6 , the aforementioned anti-etching metal layer 600 is formed through at least the outer ring portion 300 of the non-display area 200B, the first transparent conductive layer 411 of the first non-display area 400 , or the second transparent conductive layer 411 . The disposition of one of the second transparent conductive layers 511 in the non-display area 500 enables excess etchant in the etching process of the reflective metal layer to be blocked by the etch-resistant metal layer 600 at the periphery of the display area 200A, so that excessive The etchant will not contact and etch the reflective metal layer 220 in the display area 200A, thereby effectively avoiding over-etching of the reflective metal layer 220 and improving the panel yield at the edge of the carrier.

In the following, the arrangement of the etching resistant metal layer 600 in the outer ring portion 300 , the first transparent conductive layer 411 of the first non-display area 400 , and the second transparent conductive layer 511 of the second non-display area 500 will be discussed. illustrate.

First, FIG. 2 is an enlarged view of the area A in FIG. 1 . As shown in the first embodiment of FIG. 2 , the display area 200A has a plurality of reflective metal layers 220 , the plurality of reflective metal layers 220 are arranged in an array, and the plurality of reflective metal layers 220 have a first gap D1 in a first direction X, and have a second gap D2 in a second direction Y with each other. When the anti-etching metal layer 600 is disposed on the outer ring portion 300, the anti-etching metal layer 600 has a third gap D3 between the first direction X and the display area 200A, and the anti-etching metal layer 600 is in the second direction Y and the display area There is a fourth gap D4 between 200A.

In a preferred embodiment, the first gap D1 and the second gap D2 are between 1 micrometer and 200 micrometers. Therefore, the third gap D3 can be made equal to the first gap D1, and the fourth gap D4 can be made equal to the second gap, so that the etch-resistant metal layer 600 can effectively block the excessive etching solution.

In another preferred embodiment, the third gap D3 can be made equal to the first gap D1±10 μm, the fourth gap D4 can be made equal to the second gap D2±10 μm, and the etching resistant metal layer 600 can be effectively The effect of blocking too much etching solution.

By disposing the anti-etching metal layer 600 on the outer ring portion 300, and making the anti-etching metal layer 600 and the display area 200A have a third gap D3 and a fourth gap D4 between the first direction X and the second direction Y, respectively, When the reflective metal layer is etched for the improved structure 100 of the new liquid crystal display panel, too much etchant will be blocked after contacting the etch-resistant metal layer 600 , so that it cannot continue to flow into the inner display area 200A. In this way, even if the improved structure 100 of the liquid crystal display panel of the present invention encounters a relatively high concentration and too much etchant during the etching process, the over-etching phenomenon caused by it will only occur at the periphery of the etching-resistant metal layer 600 , not The side etching phenomenon will be caused to the transparent conductive layer in the display area 200A.

In addition, the etch-resistant metal layer 600 is a ring-shaped metal layer, which is only disposed on the outer ring portion 300 of the periphery of the display area 200A, and does not cover the display area 200A. In addition, the etch-resistant metal layer 600 in the first embodiment needs to be electrically connected to the reference voltage (Vcom) in the panel structure, so as to avoid the problem of electrical floating and affect the charging and discharging of the liquid crystal.

FIG. 3 is a cross-sectional view of the line segment BB' in FIG. 2 . As shown in FIG. 3 , in the first embodiment, in the outer ring portion 300 , the side of the first substrate 110 facing the second substrate 120 has a first A metal layer 710 , an insulating layer 720 , a second metal layer 730 and a protection layer 740 . The first metal layer 710 and the second metal layer 730 are disposed on the first substrate 110 spaced apart from each other along the first direction X, the insulating layer 720 is disposed on the first metal layer 710, and the protective layer 740 is disposed on the insulating layers 720, On the second metal layer 730 and the partially exposed first substrate 110 .

Since there is no transparent conductive layer in the outer ring portion 300 , the anti-etching metal layer 600 only needs to be disposed on the protective layer 740 to effectively block the excess etching solution, so that the excess etching solution cannot be positioned on the outer ring portion 300 . The transparent conductive layer under the reflective metal layer 220 of the inner display area 200A causes side etching.

It should be noted that, in the first embodiment, in the outer ring portion 300 , a color filter layer 750 and a flat layer 760 are sequentially disposed on the side of the second substrate 120 facing the first substrate 110 to form a Complete outer ring portion 300.

A cross-sectional view of the display area 200A is shown in FIG. 4 , which is a cross-section of the line segment C-C' in FIG. 2 . The display area 200A has a first substrate 110 , a second substrate 120 opposite to the first substrate 110 , and a liquid crystal layer LC located between the first substrate 110 and the second substrate 120 . The active element 130 and the protective layer 140 (the same layer as the protective layer 740 of the outer ring portion 300 , the first non-display area 400 , and the second non-display area 500 are disposed in sequence on the side of the first substrate 110 facing the second substrate 120 ) ), the flat layer 150, the pixel electrode 160 (the same film layer as the first transparent conductive layer 411 in the first non-display area 400 and the second transparent conductive layer 511 in the second non-display area 500), the reflective metal layer 220 (with The anti-etching metal layer 600 is the same layer), and the active element 130 is sequentially provided with a first metal layer 131 (gate), an insulating layer 132, a semiconductor layer 133, and a second metal layer 134 (source, drain) from bottom to top ) and other components.

Please refer to FIG. 5 , which is a cross-sectional view of the line segment D-D' in FIG. 1 . In the second embodiment of the improved structure 100 of the novel liquid crystal display panel, since the first non-display area 400 is a non-display area with layer-hopping electrical properties, it has a relatively complex laminated structure.

In detail, in the first non-display area 400 , the side of the first substrate 110 facing the second substrate 120 has a first metal layer 710 , an insulating layer 720 , a second metal layer 730 , a protective layer 740 and The first transparent conductive layer 411 . The first metal layer 710 is disposed on the first substrate 110 and partially covers the first substrate 110 . The insulating layer 720 is disposed on the first substrate 110 and the first metal layer 710 and partially exposes the first metal layer 710 . The second metal layer 730 is disposed on the insulating layer 720 , and preferably, the second metal layer 730 can be selectively disposed in a recess 721 of the insulating layer 720 . The protective layer 740 is disposed on the insulating layer 720 and is not in contact with the first metal layer 710 and the second metal layer 730 . The first transparent conductive layer 411 is disposed on the second metal layer 730 , the insulating layer 720 and the partially exposed first metal layer 710 . That is, in the second embodiment, the electrical connection between the first metal layer 710 and the second metal layer 730 is formed through the first transparent conductive layer 411 , which constitutes the electrical jumper of the first non-display area 400 .

As a result, when the anti-etching metal layer 600 is disposed on the first transparent conductive layer 411 of the first non-display area 400, it is ensured that during the etching process of the reflective metal layer, excessive etching solution will be removed by the anti-etching metal layer. When the 600 is blocked without causing side etching to the transparent conductive layer under the reflective metal layer 220 in the display area 200A, since the first non-display area 400 has a layer jumping property, once the etching solution causes over-etching of the anti-etching metal layer 600 , and at the same time, the first transparent conductive layer 411 located under the etch-resistant metal layer 600 is side-etched, and the side-etch phenomenon will affect the space between the first metal layer 710 and the second metal layer 730 located under the first transparent conductive layer 411 The electrical connection relationship of the second embodiment leads to the occurrence of electrical floating and affects the normal inversion of the liquid crystal in the display area 200A, which makes the design of the second embodiment to consider that the etching-resistant metal layer 600 is disposed on the first transparent conductive layer. When on the layer 411, the anti-etching metal layer 600 needs to further cover the first transparent conductive layer 411. This arrangement ensures that even if the etching solution causes over-etching of the etching-resistant metal layer 600, the etching solution cannot The upward direction affects the first transparent conductive layer 411 located under the etch-resistant metal layer 600 .

It should be noted that, in the second embodiment, in the first non-display area 400 , a color filter layer 750 , a flat layer 760 and a color filter layer 750 are sequentially disposed on the side of the second substrate 120 facing the first substrate 110 . A third transparent conductive layer 770 is formed to form a complete first non-display area 400 .

Please refer to FIG. 6 , which is a cross-sectional view of the line segment E-E' in FIG. 1 . In the third embodiment of the improved structure 100 of the novel liquid crystal display panel, since the second non-display area 500 is a non-display area without layer jumping properties, it has a relatively simple laminated structure.

In detail, in the second non-display area 500 , the side of the first substrate 110 facing the second substrate 120 has a first metal layer 710 , an insulating layer 720 , a second metal layer 730 , a protective layer 740 and The second transparent conductive layer 511 . The first metal layer 710 is disposed on the first substrate 110 and partially exposed to the first substrate 110 , the insulating layer 720 is disposed on the first metal layer 710 , the second metal layer 730 is disposed on the insulating layer 720 , and the protective layer 740 is disposed On the second metal layer 730 and the partially exposed first substrate 110 , the second transparent conductive layer 511 is disposed on the protective layer 740 and the protective layer 740 is partially exposed.

As shown in FIG. 6 , a side of the protective layer 740 facing the second substrate 120 further has a non-display area column spacer 790 , and the non-display area column spacer 790 is disposed on the exposed protective layer 740 and Not in contact with the second transparent conductive layer 511 .

In this way, when the anti-etching metal layer 600 is disposed on the second transparent conductive layer 511 of the second non-display area 500, it is ensured that during the etching process of the reflective metal layer, excessive etching solution will be removed by the anti-etching metal layer. When the reflective metal layer 220 in the display area 200A is blocked by 600 and does not cause side etching, since the second non-display area 500 does not have layer jumping properties, even if the etching solution will cause over-etching of the anti-etching metal layer 600, In addition, when the etching solution will also side-etch the second transparent conductive layer 511 located under the etch-resistant metal layer 600, the side-etching phenomenon will not affect the first metal layer 710 and the second metal layer 730 located under the protective layer 740. The electrical relationship between them makes it only necessary to consider that the etching-resistant metal layer 600 is disposed above the protective layer 740 and the second transparent conductive layer 511 in the design of the third embodiment, so as to improve the etching resistance of the second non-display area 500 Regarding the area of the metal layer 600 , the anti-etching metal layer 600 does not need to cover the side of the second transparent conductive layer 511 , and the anti-etching metal layer 600 does not need to be disposed on the periphery of the column spacer 790 in the non-display area. That is to say, when the anti-etching metal layer 600 is disposed in the second non-display area 500 without layer jumping properties, the anti-etching metal layer 600 and the reflective metal layer 220 in the display area 200A have patterns corresponding in size, and also That is, the anti-etching metal layer 600 and the reflective metal layer 220 in the display area 200A have the same area and pattern.

In other aspects of the third embodiment, the etching resistant metal layer 600 may also have an area larger than that of the second transparent conductive layer 511 to further prevent the second transparent conductive layer 511 from being etched.

It should be noted that, in the third embodiment, in the second non-display area 500 , a color filter layer 750 and a flat layer 760 are sequentially disposed on the side of the second substrate 120 facing the first substrate 110 . to form a complete second non-display area 500 .

The aforementioned first metal layer 710 is preferably a gate metal layer, the insulating layer 720 is preferably a gate insulating layer, and the second metal layer 730 is preferably a source-drain metal layer, but this does not be restricted.

To sum up, in the new embodiment, the etching-resistant metal layer 600 can be selectively disposed on the outer ring of the non-display area 200B by arranging the etching-resistant metal layer 600 from the inside to the outside. part 300, the first transparent conductive layer 411 of the first non-display area 400, or the second transparent conductive layer 511 of the second non-display area 500, etc., so that the etching resistant metal layer 600 can be used to block the etching of excessive etching solution, It is avoided that the etchant in the etching process of the reflective metal layer will cause overetching of the reflective metal layer 220 in the panel display area 200A at the edge of the carrier, or cause side etching to the transparent conductive layer in the non-display area 200B, thereby increasing the load Panel yield at the edge of the panel. It should be noted that the etching resistant metal layer 600 is alternatively disposed on the outer ring portion 300 , the first transparent conductive layer 411 of the first non-display area 400 , or the second transparent conductive layer of the second non-display area 500 in addition to the above In addition to the three areas such as the layer 511 , the etching resistant metal layer 600 can also be disposed on the outer ring portion 300 , the first transparent conductive layer 411 of the first non-display area 400 , or the second transparent conductive layer of the second non-display area 500 at the same time. 511 and other three areas, or the etching resistant metal layer 600 is simultaneously disposed on the outer ring portion 300 , the first transparent conductive layer 411 of the first non-display area 400 , or the second non-display area 500 Transparent conductive layer 511 and other three regions. On the other hand, when the etch-resistant metal layer 600 is disposed on the first transparent conductive layer 411 of the first non-display area 400 or the second transparent conductive layer 511 of the second non-display area 500, it is necessary to further determine whether there is In the case of electrically jumping layers, the method of covering the transparent conductive layers with the anti-etching metal layer 600 is considered, so as to avoid the liquid crystal rotation problem that may be caused when the over-etching phenomenon occurs in the first non-display area 400 or the second non-display area 500 . In addition, the metal material of the anti-etching metal layer 600 is the same as the metal material of the reflective metal layer 220 in the display area 200A, and the metal material is preferably silver or aluminum neodymium alloy, but not limited thereto.

The above-mentioned embodiments are only intended to illustrate the technical ideas and features of the present invention, and their purpose is to enable those skilled in the art to understand the content of the present invention and implement them accordingly. It should not limit the patent scope of the present invention. That is, all equivalent changes or modifications made in accordance with the spirit disclosed in this new model shall still be covered within the scope of the patent of this new model.

100: Improved structure of liquid crystal display panel 110: The first substrate 120: Second substrate 130: Active Components 131: first metal layer 132: Insulation layer 133: Semiconductor layer 134: second metal layer 140: protective layer 150: flat layer 160: pixel electrode 200A: Display area 200B: Non-display area 210: Reflection Zone 220: Reflective metal layer 300: Outer ring 400: The first non-display area 411: the first transparent conductive layer 500: Second non-display area 511: the second transparent conductive layer 600: Anti-etch metal layer 710: first metal layer 720: Insulation layer 721: Depression 730: Second metal layer 740: Protective layer 750: Color filter layer 760: Flat Layer 770: the third transparent conductive layer 790: Non-display area column spacer X: first direction Y: the second direction D1: first gap D2: Second gap D3: The third gap D4: Fourth gap LC: liquid crystal layer

The accompanying drawings described herein are used to provide further understanding of the present invention and constitute a part of the present invention. The schematic embodiments and descriptions of the present invention are used to explain the present invention and do not constitute an improper limitation of the present invention. In the attached image: FIG. 1 is a top view of the improved structure of the new liquid crystal display panel. FIG. 2 is a first embodiment of the improved structure of the new liquid crystal display panel, which is an enlarged view of the area A in FIG. 1 . Fig. 3 is a sectional view of the line segment B-B' in Fig. 2 . FIG. 4 is a schematic view of the display area of the improved structure of the new liquid crystal display panel, which is a cross section of the line segment C-C' in FIG. 2 . FIG. 5 is a second embodiment of the improved structure of the new liquid crystal display panel, which is a cross-sectional view of the line segment D-D' in FIG. 1 . FIG. 6 is a third embodiment of the improved structure of the new liquid crystal display panel, which is a cross-sectional view of the line segment E-E' in FIG. 1 .

200A: Display area

210: Reflection Zone

220: Reflective metal layer

300: Outer ring

600: Anti-etch metal layer

X: first direction

Y: the second direction

D1: first gap

D2: Second gap

D3: The third gap

D4: Fourth gap

Claims (14)

An improved structure of a liquid crystal display panel, comprising: a first substrate; and a second substrate disposed on the opposite side of the first substrate; Wherein, the first substrate has: a display area with a reflection area, the reflection area has a plurality of reflection metal layers, and the reflection metal layers are arranged in an array; A non-display area, having: an outer ring portion, surrounding and disposed on the periphery of the display area; a first non-display area surrounding and disposed on the periphery of the outer ring portion, the side of the first non-display area facing the second substrate has a first transparent conductive layer; and a second non-display area surrounding and disposed on the periphery of the first non-display area, the second non-display area having a second transparent conductive layer on the side facing the second substrate; and An anti-etching metal layer is disposed in the non-display area. The improved structure of the liquid crystal display panel as claimed in claim 1, wherein the anti-etching metal layer is disposed at least on the outer ring portion of the non-display area, the first transparent conductive layer in the first non-display area, or the second one of the second transparent conductive layers in the non-display area. The improved structure of the liquid crystal display panel according to claim 1, wherein the reflective metal layers have a first gap with each other in a first direction, and the reflective metal layers have a second gap with each other in a second direction . The improved structure of the liquid crystal display panel as claimed in claim 3, wherein the first gap and the second gap are between 1 micrometer and 200 micrometers. The improved structure of the liquid crystal display panel according to claim 3, wherein when the anti-etching metal layer is disposed on the outer ring portion, the anti-etching metal layer has a third gap between the first direction and the display area , the anti-etching metal layer has a fourth gap between the second direction and the display area, and the third gap is equal to the first gap, and the fourth gap is equal to the second gap. The improved structure of the liquid crystal display panel according to claim 1 or 5, wherein the anti-etching metal layer is a ring-shaped metal layer. The improved structure of the liquid crystal display panel according to claim 1 or 5, wherein in the outer ring portion, the side of the first substrate facing the second substrate has a first metal layer, an insulating layer, and a second metal layer layer and a protective layer, the first metal layer and the second metal layer are arranged on the first substrate at intervals from each other, the insulating layer is arranged on the first metal layer, the protective layer is arranged on the insulating layer, the first metal layer Two metal layers and the partially exposed first substrate, and the anti-etching metal layer is disposed on the protective layer. The improved structure of the liquid crystal display panel according to claim 1, wherein in the first non-display area, the side of the first substrate facing the second substrate has a first metal layer, an insulating layer, a second substrate metal layer, a protective layer and the first transparent conductive layer, the first metal layer is arranged on the first substrate and partially covers the first substrate, the insulating layer is arranged on the first substrate and the first metal layer and partially expose the first metal layer, the second metal layer is arranged on the insulating layer, the protective layer is arranged on the insulating layer and not in contact with the first metal layer and the second metal layer, the first transparent The conductive layer is disposed on the second metal layer, the insulating layer and the partially exposed first metal layer. The improved structure of the liquid crystal display panel according to claim 1 or 8, wherein the etching-resistant metal layer is disposed correspondingly to the first transparent conductive layer. The improved structure of the liquid crystal display panel according to claim 1, wherein in the second non-display area, the side of the first substrate facing the second substrate has a first metal layer, an insulating layer, a second metal layer, a protective layer and the second transparent conductive layer, the first metal layer is arranged on the first substrate and partially exposed to the first substrate, the insulating layer is arranged on the first metal layer, the second metal layer The layer is disposed on the insulating layer, the protective layer is disposed on the second metal layer and the partially exposed first substrate, and the second transparent conductive layer is disposed on the protective layer and partially exposes the protective layer. The improved structure of the liquid crystal display panel according to claim 10, wherein in the second non-display area, a side of the first substrate facing the second substrate further has a non-display area column spacer, the non-display area A columnar spacer is disposed on the exposed protective layer and is not in contact with the second transparent conductive layer. The improved structure of the liquid crystal display panel as claimed in claim 10, wherein the anti-etching metal layer is disposed on the protective layer and the second transparent conductive layer. The improved structure of the liquid crystal display panel as claimed in claim 12, wherein the etching-resistant metal layer and the reflective metal layers in the display area have patterns with corresponding sizes. The improved structure of the liquid crystal display panel as claimed in claim 1, wherein the metal material of the anti-etching metal layer is the same as the metal material of the reflective metal layers in the display area.

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