TWM613588U - Gene amplification apparatus - Google Patents

Gene amplification apparatus Download PDF

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Publication number
TWM613588U
TWM613588U TW110201600U TW110201600U TWM613588U TW M613588 U TWM613588 U TW M613588U TW 110201600 U TW110201600 U TW 110201600U TW 110201600 U TW110201600 U TW 110201600U TW M613588 U TWM613588 U TW M613588U
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Taiwan
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gene amplification
amplification device
air flow
airflow
rotating
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TW110201600U
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Chinese (zh)
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宋振安
陳烱煒
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緯創資通股份有限公司
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Priority to TW110201600U priority Critical patent/TWM613588U/en
Priority to CN202120491985.8U priority patent/CN214830257U/en
Publication of TWM613588U publication Critical patent/TWM613588U/en

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Abstract

一種基因擴增設備適於對至少一樣本進行基因擴增,基因擴增設備包括一支架、一旋轉承座、一馬達及一第一氣流產生器,旋轉承座可轉動地設置於支架,旋轉承座具有一容置槽及一氣流流道,至少一樣本放置於容置槽,且容置槽位於氣流流道或其延伸路徑上,馬達設於支架,用以驅動旋轉承座相對支架轉動,第一氣流產生器用以產生一第一氣流,且第一氣流沿氣流流道流動而流過容置槽。A gene amplification device is suitable for gene amplification of at least one sample. The gene amplification device includes a bracket, a rotating bearing, a motor, and a first airflow generator. The rotating bearing is rotatably arranged on the bracket and rotates. The socket has a accommodating groove and an air flow channel. At least one part is placed in the accommodating groove, and the accommodating groove is located on the air flow channel or its extension path. , The first airflow generator is used for generating a first airflow, and the first airflow flows along the airflow channel and flows through the accommodating groove.

Description

基因擴增設備Gene amplification equipment

本創作係關於一種基因擴增設備,特別是一種旋轉承座具有氣流流道設計的基因擴增設備。This creation is about a gene amplification device, especially a gene amplification device with a rotating seat with an air flow channel design.

聚合酶連鎖反應(Polymerase chain reaction, PCR)是利用基因聚合酶對基因進行連鎖複製,其中,即時定量聚合酶連鎖反應(Real-Time PCR,qPCR)可即時監測整個聚合酶連鎖反應。聚合酶連鎖反應主要包括溫控部分及檢測部份。溫控部分提供聚合酶連鎖反應所需要的熱循環溫度。而檢測部分是利用特定激發光波長使螢光試劑釋放出螢光反應,再藉由光學感測器及濾鏡來擷取和檢測特定波段。執行一次聚合酶連鎖反應約可得到2倍的聚合酶連鎖反應產物,執行N次後約可得到2 N的聚合酶連鎖反應產物,而在聚合酶連鎖反應產物倍增時,螢光反應逐步增強累積,因此,即時定量聚合酶連鎖反應即時地監測整個聚合酶連鎖反應的溫度變化與螢光變化,紀錄循環數與螢光強度的變化值,即可對基因作量化分析。 Polymerase chain reaction (Polymerase chain reaction, PCR) is the use of gene polymerase to carry out chain replication of genes. Among them, real-time quantitative polymerase chain reaction (Real-Time PCR, qPCR) can monitor the entire polymerase chain reaction in real time. The polymerase chain reaction mainly includes the temperature control part and the detection part. The temperature control part provides the thermal cycle temperature required for the polymerase chain reaction. The detection part uses a specific excitation light wavelength to cause the fluorescent reagent to release a fluorescent reaction, and then uses an optical sensor and a filter to capture and detect a specific wavelength. Performing polymerase chain reaction once can get about 2 times the polymerase chain reaction product, after performing N times, about 2 N polymerase chain reaction product can be obtained, and when the polymerase chain reaction product doubles, the fluorescence reaction gradually increases and accumulates Therefore, real-time quantitative polymerase chain reaction can monitor the temperature change and fluorescence change of the entire polymerase chain reaction in real time, record the cycle number and fluorescence intensity change value, and then quantitatively analyze the gene.

在習知技術中,存放有待測基因的試管係放置於基因擴增設備之試管載座。試管載座具導熱效果。加熱器與熱電致冷晶片(Thermoelectric Cooling Module,TEC)熱接觸試管載座,以透過試管載座對試管進行加熱或冷卻。散熱鰭片熱接觸於加熱器與熱電致冷晶片,以將加熱器與熱電致冷晶片所產生之廢熱排出。然而,目前散熱鰭片的尺寸恐不足以支持即時溫控的需求,且受限於基因擴增設備之體積限制,也難以大幅度地增加散熱鰭片的尺寸。In the conventional technology, the test tube system storing the gene to be tested is placed on the test tube holder of the gene amplification device. The test tube holder has the heat conduction effect. The heater and the thermoelectric cooling chip (Thermoelectric Cooling Module, TEC) thermally contact the test tube holder to heat or cool the test tube through the test tube holder. The heat dissipation fins are in thermal contact with the heater and the thermoelectric cooling chip to discharge waste heat generated by the heater and the thermoelectric cooling chip. However, the size of the current heat dissipation fins may not be sufficient to support the demand for real-time temperature control, and is limited by the volume limitation of the gene amplification equipment, and it is difficult to greatly increase the size of the heat dissipation fins.

本創作之一實施例所揭露之基因擴增設備適於對至少一樣本進行基因擴增。基因擴增設備包括一支架、一旋轉承座、一馬達及一第一氣流產生器。旋轉承座可轉動地設置於支架。旋轉承座具有一容置槽及一氣流流道。至少一樣本放置於容置槽,且容置槽位於氣流流道或其延伸路徑上。馬達設於支架,用以驅動旋轉承座相對支架轉動。第一氣流產生器用以產生一第一氣流,且第一氣流沿氣流流道流動而流過容置槽。The gene amplification device disclosed in an embodiment of the invention is suitable for gene amplification of at least one sample. The gene amplification device includes a bracket, a rotating seat, a motor, and a first airflow generator. The rotating bearing seat is rotatably arranged on the bracket. The rotating bearing seat has an accommodating groove and an air flow channel. At least one sample is placed in the accommodating groove, and the accommodating groove is located on the air flow channel or its extension path. The motor is arranged on the bracket to drive the rotating bearing seat to rotate relative to the bracket. The first airflow generator is used for generating a first airflow, and the first airflow flows along the airflow channel and flows through the accommodating groove.

根據上述實施例之基因擴增設備,透過在旋轉承座之導熱盤體上直接設置經過放置試管(樣本)處的氣流流道,使得氣流能直接對試管(樣本)進行升降溫,以讓基因擴增設備符合即時升降溫的需求。According to the gene amplification device of the above-mentioned embodiment, by directly setting the airflow channel through the place where the test tube (sample) is placed on the heat conducting plate of the rotating holder, the airflow can directly raise and lower the temperature of the test tube (sample), so that the gene The amplification equipment meets the needs of instant heating and cooling.

以上關於本創作內容的說明及以下實施方式的說明係用以示範與解釋本創作的原理,並且提供本創作的專利申請範圍更進一步的解釋。The above description of the content of this creation and the description of the following implementation manners are used to demonstrate and explain the principle of this creation, and to provide a further explanation of the scope of the patent application for this creation.

請參閱圖1與圖2。圖1係顯示本創作第一實施例之基因擴增設備的立體示意圖。圖2係顯示本創作第一實施例之基因擴增設備進行聚合酶連鎖反應所需要的三階段熱循環溫度示意圖。Please refer to Figure 1 and Figure 2. Fig. 1 is a three-dimensional schematic diagram showing the gene amplification device of the first embodiment of the invention. Fig. 2 is a schematic diagram showing the three-stage thermal cycle temperature required for the polymerase chain reaction of the gene amplification device of the first embodiment of the invention.

如圖1所示,本創作實施例之基因擴增設備1為一種即時定量聚合酶連鎖反應(qPCR)設備,其主要包括溫控系統、光學系統及轉動系統。溫控系統例如利用熱電致冷晶片(Thermoelectric Cooling Module,TEC)、加熱器、風扇或散熱鰭片進行加熱和冷卻以達到快速升降溫。如圖2所示,溫控系統對含有螢光試劑的試管提供聚合酶連鎖反應所需要的三階段熱循環溫度。每一次聚合酶連鎖反應須包括升溫至95°C之變性作用(Denaturation)、降溫至50°C~60°C之煉合作用(Annealing)、及再升溫至72°C之延伸作用(Extension)。光學系統對試管中的螢光試劑在每一次熱循環後所激發出的螢光反應進行擷取數值及定量分析。轉動系統利用馬達轉動溫控系統之轉盤(在一實施例中,轉盤例如乘載有16個試管),使16個含有螢光試劑的試管可分別對應不同之光學系統位置,利用光學系統之特定激發光波長使螢光試劑釋放出螢光反應,接著光學系統中的光電感測器(Photodiode)擷取螢光亮度及分析最後的基因濃度。上述各溫度值可視不同基因及不同試劑而變化調整。As shown in FIG. 1, the gene amplification device 1 of this creative embodiment is a real-time quantitative polymerase chain reaction (qPCR) device, which mainly includes a temperature control system, an optical system, and a rotating system. The temperature control system uses, for example, a Thermoelectric Cooling Module (TEC), heater, fan, or radiating fins for heating and cooling to achieve rapid temperature rise and fall. As shown in Figure 2, the temperature control system provides the three-stage thermal cycle temperature required for the polymerase chain reaction to the test tube containing the fluorescent reagent. Each polymerase chain reaction must include denaturation to 95°C, Annealing to 50°C to 60°C, and extension to 72°C. . The optical system captures values and quantitatively analyzes the fluorescent reaction excited by the fluorescent reagent in the test tube after each thermal cycle. The rotating system uses a motor to rotate the turntable of the temperature control system (in one embodiment, the turntable carries, for example, 16 test tubes), so that 16 test tubes containing fluorescent reagents can correspond to different positions of the optical system, using the specific optical system The wavelength of the excitation light causes the fluorescent reagent to release a fluorescent reaction, and then the photodiode in the optical system captures the fluorescence brightness and analyzes the final gene concentration. The above-mentioned temperature values can be adjusted according to different genes and different reagents.

光學系統具有四個光學裝置,每一光學裝置包括一激發濾鏡(Excitation filter)、一發射濾鏡(Emission filter)及一光電感測器(Photodiode)。在一實施例中,上述光學裝置可用以偵測四種特定螢光:綠(激發波長494nm、發射波長520nm)、黃(激發波長550nm、發射波長570nm)、橘(激發波長575nm、發射波長602nm)、紅(激發波長646nm、發射波長662nm)。The optical system has four optical devices, and each optical device includes an excitation filter, an emission filter, and a photodiode. In one embodiment, the above-mentioned optical device can be used to detect four specific fluorescent lights: green (excitation wavelength 494nm, emission wavelength 520nm), yellow (excitation wavelength 550nm, emission wavelength 570nm), orange (excitation wavelength 575nm, emission wavelength 602nm) ), red (excitation wavelength 646nm, emission wavelength 662nm).

就光學裝置的細部而言,在光學裝置中,由單色發光二極體(LED)發出之光線,穿過激發濾鏡(Excitation filter),再被分光濾鏡(Dichroic filter)反射(分光濾鏡(Dichroic filter)能反射短波而使長波穿透),向上照射在裝有螢光試劑的試管底部,螢光試劑受到激發後,所發射之螢光穿過分光濾鏡再穿過發射濾鏡(Emission filter),篩選掉所有不需要的雜訊光源後被光電感測器(Photodiode)接收,在一連串的光路後觀測最終的螢光特性變化以進行分析。As far as the details of the optical device are concerned, in the optical device, the light emitted by the monochromatic light-emitting diode (LED) passes through the excitation filter, and then is reflected by the dichroic filter. Mirror (Dichroic filter) can reflect short waves and make long waves penetrate), and illuminate upward on the bottom of the test tube containing fluorescent reagent. After the fluorescent reagent is excited, the emitted fluorescence passes through the spectroscopic filter and then through the emission filter. (Emission filter), after filtering out all the unwanted noise light sources, it is received by the photodiode, and after a series of light paths, the final changes in fluorescence characteristics are observed for analysis.

轉動系統之馬達直接轉動溫控系統,使溫控系統上含有螢光試劑的試管可分別對應四個光學裝置位置以進行偵測。在一實施例中,轉動系統可以包括極限感測器(limit sensor),其利用光遮斷方式偵測馬達轉動位置中的初始點(Home)和停止點(End),並通過韌體和軟體區別目前正在偵測之試管。The motor of the rotating system directly rotates the temperature control system, so that the test tubes containing fluorescent reagents on the temperature control system can respectively correspond to the positions of the four optical devices for detection. In one embodiment, the rotation system may include a limit sensor, which uses a light blocking method to detect the initial point (Home) and the stopping point (End) of the motor rotation position, and through firmware and software Distinguish the test tube currently being tested.

請參閱圖1與圖3至圖7。圖3係顯示本創作第一實施例之基因擴增設之剖面示意圖。圖4係顯示本創作第一實施例之導風罩的立體示意圖。圖5係顯示本創作第一實施例之基因擴增設之另一割面的剖面示意圖。圖6係顯示本創作第一實施例之基因擴增設之局部分解示意圖。圖7係顯示本創作第一實施例之導熱盤體另一視角的立體示意圖。Please refer to Figure 1 and Figures 3 to 7. Fig. 3 is a schematic cross-sectional view showing the gene amplification device of the first embodiment of the present creation. Fig. 4 is a three-dimensional schematic diagram showing the wind deflector of the first embodiment of the invention. Fig. 5 is a schematic cross-sectional view showing another cut plane of the gene amplification device of the first embodiment of the present creation. Fig. 6 is a partial exploded schematic diagram showing the gene amplification device of the first embodiment of the present creation. FIG. 7 is a three-dimensional schematic diagram showing the heat conducting plate body of the first embodiment of the present invention from another perspective.

如圖1與圖3所示,本創作實施例之基因擴增設備1適於對至少一樣本進行基因擴增。基因擴增設備1包括一支架100、一承座如一旋轉承座200、一馬達300及一第一氣流產生器400。As shown in FIG. 1 and FIG. 3, the gene amplification device 1 of this creative embodiment is suitable for gene amplification of at least one sample. The gene amplification device 1 includes a support 100, a support such as a rotating support 200, a motor 300, and a first airflow generator 400.

在一實施例中,支架100包括一底部110及一支撐部120。支撐部120立於底部110。In an embodiment, the bracket 100 includes a bottom 110 and a supporting portion 120. The supporting portion 120 stands on the bottom 110.

如圖3至圖6所示,旋轉承座200包括一旋轉盤210、一加熱盤220及一旋轉盤蓋230。旋轉盤210例如由塑膠等絕緣材質製成,並可繞旋轉承座200之一旋轉軸心A相對支架100轉動,如沿方向a轉動。旋轉盤210具有多個穿槽211。這些穿槽211繞旋轉承座200之旋轉軸心A呈環狀排列。As shown in FIGS. 3 to 6, the rotating socket 200 includes a rotating disk 210, a heating disk 220 and a rotating disk cover 230. The rotating disk 210 is made of, for example, an insulating material such as plastic, and can rotate about a rotation axis A of the rotating bearing 200 relative to the support 100, such as in the direction a. The rotating disk 210 has a plurality of through grooves 211. The through slots 211 are arranged in a ring around the rotation axis A of the rotating bearing 200.

加熱盤220例如固定於旋轉盤210,並包括一導熱盤體221及一加熱器222。導熱盤體221用來承載樣本,如待基因擴增之液體。加熱器222熱接觸於導熱盤體221。當加熱器222啟動時,加熱器222會透過導熱盤體221對樣本進行加熱。在一實施例中,加熱器222亦可改為致冷晶片,並非用以限制本創作。The heating plate 220 is, for example, fixed to the rotating plate 210 and includes a heat conducting plate body 221 and a heater 222. The heat conducting plate 221 is used to carry a sample, such as a liquid to be amplified. The heater 222 is in thermal contact with the heat conducting plate body 221. When the heater 222 is activated, the heater 222 will heat the sample through the heat conducting plate 221. In an embodiment, the heater 222 can also be changed to a cooling chip, which is not used to limit the present invention.

加熱盤220之導熱盤體221的外形例如為圓形,並具有多個穿槽2211,這些穿槽2211繞旋轉承座200之旋轉軸心A呈環狀排列。而穿槽2211與穿槽211共同構成容置槽C。也就是說,這些容置槽C繞旋轉承座200之旋轉軸心A呈環狀排列。容置槽C用以放置存放有樣本(未繪示)的試管2。旋轉盤210用以防止試管2傾斜,以及加熱盤220用以對試管2加熱。The heat conducting plate body 221 of the heating plate 220 has a circular shape, for example, and has a plurality of through grooves 2211, and the through grooves 2211 are arranged in a ring around the rotation axis A of the rotating bearing 200. The piercing groove 2211 and the piercing groove 211 together form the accommodating groove C. In other words, the accommodating grooves C are arranged in a ring shape around the rotation axis A of the rotating socket 200. The accommodating tank C is used to place a test tube 2 containing a sample (not shown). The rotating disk 210 is used to prevent the test tube 2 from tilting, and the heating disk 220 is used to heat the test tube 2.

加熱盤220之導熱盤體221於遠離旋轉盤210之一側具有多個散熱鰭片2212。這些散熱鰭片2212的形狀例如呈平板狀,並呈放射狀排列,以分隔出多個氣流流道2213。容置槽C分別位於氣流流道2213或其延伸路徑上。或是說,於導熱盤體221之徑向方向上,容置槽C位於氣流流道2213內或外側。如此一來,當氣流流道2213有氣流流過時,流經氣流流道2213之氣流會順勢流經容置槽C旁,並將容置槽C周圍的廢熱帶走,以對容置槽C內之試管2進行降溫。The heat conducting plate body 221 of the heating plate 220 has a plurality of heat dissipation fins 2212 on a side away from the rotating plate 210. The shape of the heat dissipation fins 2212 is, for example, a flat plate, and is arranged radially to separate a plurality of airflow channels 2213. The accommodating grooves C are respectively located on the air flow channel 2213 or its extension path. In other words, in the radial direction of the heat conducting plate body 221, the accommodating groove C is located inside or outside the air flow channel 2213. In this way, when there is air flow through the air flow channel 2213, the air flow through the air flow channel 2213 will flow along the side of the accommodating tank C, and will remove the waste heat around the accommodating tank C to face the accommodating tank C. The inner test tube 2 is cooled down.

在一實施例中,加熱盤220之導熱盤體221還可以具有一鏤空結構2214,如開口。鏤空結構2214位於導熱盤體221無設置穿槽2211的位置,如導熱盤體221之中央處,以讓導熱盤體221所接收到熱能集中傳導至穿槽2211(容置槽C)處。不過,本實施例之鏤空結構2214的設計並非用以限制本創作,在其他實施例中,導熱盤體亦可不設置鏤空結構2214。In one embodiment, the heat conducting plate body 221 of the heating plate 220 may also have a hollow structure 2214, such as an opening. The hollow structure 2214 is located at a position where the heat-conducting plate body 221 does not have the through groove 2211, such as the center of the heat-conducting plate body 221, so that the heat energy received by the heat-conducting plate body 221 is concentratedly conducted to the through groove 2211 (accommodating groove C). However, the design of the hollow structure 2214 in this embodiment is not intended to limit the present creation. In other embodiments, the hollow structure 2214 may not be provided in the thermally conductive plate body.

旋轉盤蓋230可拆卸地裝設於旋轉盤210,並覆蓋這些容置槽C。當旋轉盤蓋230自旋轉盤210拆下時,使用者能夠將試管2放進容置槽C或自容置槽C取出。當旋轉盤蓋230安裝於旋轉盤210時,旋轉盤蓋230會抵壓試管2,以將試管2固定於容置槽C內並用以施加壓力使試管接觸加熱盤220。The rotating disk cover 230 is detachably installed on the rotating disk 210 and covers the accommodating grooves C. When the rotating disk cover 230 is detached from the rotating disk 210, the user can put the test tube 2 into the accommodating slot C or take it out from the accommodating slot C. When the rotating disk cover 230 is installed on the rotating disk 210, the rotating disk cover 230 will press the test tube 2 to fix the test tube 2 in the accommodating groove C and apply pressure to make the test tube contact the heating disk 220.

在一實施例中,容置槽C的數量為多個,但並不以此為限。在其他實施例中,容置槽C的數量也可以僅為單個。In one embodiment, the number of accommodating grooves C is multiple, but it is not limited thereto. In other embodiments, the number of the accommodating groove C can also be only a single one.

在一實施例中,旋轉承座200還可以包括一擋風盤240。擋風盤240位於加熱盤220遠離旋轉盤210之一側,並遮蓋於這些氣流流道2213之一側,以避免氣流流道2213內之氣流朝遠離旋轉盤210的方向外洩。也就是說,擋風盤240位於加熱盤220軸向上之一側,以將氣流流道2213內之氣流集中朝徑向方向上容置槽C處吹。擋風盤240具有一中央開口241及多個穿孔242。這些穿孔242繞旋轉承座200之旋轉軸心A呈環狀排列。這些穿孔242分別對準這些容置槽C,且這些穿孔242供光學系統600(參閱圖1與圖8)之檢測光線穿過而讓光學系統600能夠對放置於容置槽C之試管2中的樣本進行檢測。In an embodiment, the rotating bearing 200 may further include a wind deflector 240. The wind shield 240 is located on a side of the heating disk 220 away from the rotating disk 210 and covers one side of the air flow channels 2213 to prevent the air flow in the air flow channels 2213 from leaking away from the rotating disk 210. In other words, the wind deflector 240 is located on one side of the heating plate 220 in the axial direction, so as to concentrate the air flow in the air flow channel 2213 toward the accommodating groove C in the radial direction. The windshield 240 has a central opening 241 and a plurality of through holes 242. The through holes 242 are arranged in a ring around the rotation axis A of the rotating bearing 200. These perforations 242 are respectively aligned with the accommodating grooves C, and these perforations 242 allow the detection light of the optical system 600 (refer to FIGS. 1 and 8) to pass through so that the optical system 600 can be placed in the test tube 2 of the accommodating groove C. Samples for testing.

在一實施例中,擋風盤240具有這些穿孔242,以供光學系統600之檢測光線照射到試管2,但並不以此為限。在其他實施例中,若擋風盤240的材質具透光能力,則擋風盤240亦可無需開設這些穿孔242。In an embodiment, the windshield 240 has these perforations 242 for the detection light of the optical system 600 to irradiate the test tube 2, but it is not limited to this. In other embodiments, if the material of the windshield 240 has light-transmitting ability, the windshield 240 may not need to be provided with these perforations 242.

在一實施例中,旋轉承座200還可以包括一隔熱件250,隔熱件250例如為塑膠,並介於旋轉盤210與加熱盤220(加熱器222)之間,以避免加熱盤220所產生的熱量分散到旋轉盤210。如此一來,提升加熱盤220對容置槽C內試管2的加熱速度。In one embodiment, the rotating socket 200 may further include a heat insulating member 250. The heat insulating member 250 is, for example, plastic and is interposed between the rotating disk 210 and the heating disk 220 (heater 222) to avoid heating the disk 220. The generated heat is dispersed to the rotating disk 210. In this way, the heating speed of the test tube 2 in the containing tank C by the heating plate 220 is increased.

在一實施例中,導熱盤體221的形狀以圓板狀為例而便於透過軸向與徑向來說明容置槽C、擋風盤240與氣流流道2213間的位置關係,但並不以此為限。在其他實施例中,導熱盤體221的形狀也可以改為其他幾何形狀,如方形板狀。In one embodiment, the shape of the heat conducting plate 221 is a circular plate as an example to facilitate the description of the positional relationship between the accommodating groove C, the wind deflector 240 and the air flow channel 2213 through the axial and radial directions, but not This is limited. In other embodiments, the shape of the heat conducting plate body 221 can also be changed to other geometric shapes, such as a square plate shape.

如圖3所示,馬達300具有一輸出軸310,且旋轉承座200之旋轉盤210固定於馬達300之輸出軸310。當馬達300啟動時,馬達300會帶動旋轉承座200相對支架100轉動。As shown in FIG. 3, the motor 300 has an output shaft 310, and the rotating disk 210 of the rotating bearing 200 is fixed to the output shaft 310 of the motor 300. When the motor 300 is started, the motor 300 will drive the rotating socket 200 to rotate relative to the bracket 100.

如圖3至圖5所示,加熱器222與第一氣流產生器400例如構成上述之溫控系統。第一氣流產生器400例如為風扇,且第一氣流產生器400所產生之第一氣流F1用以流向這些氣流流道2213,以透過第一氣流F1來對容置槽C內之試管2進行降溫。詳細來說,本實施例之基因擴增設備1還可以包括一導風罩500。導風罩500介於旋轉承座200與第一氣流產生器400之間,且第一氣流產生器400較導風罩500靠近底部110。導風罩500具有一導引流道510、一入風口520及一出風口530。入風口520與出風口530分別連通於導引流道510的相異兩側。第一氣流產生器400位於導風罩500之入風口520,導風罩500之出風口530透過擋風盤240之中央開口241連通氣流流道2213。如此一來,第一氣流產生器400所產生之第一氣流F1會先經導引流道510之導引垂直向上流向加熱盤220,再經氣流流道2213之導引水平流向容置槽C處,以對容置槽C內之試管2進行降溫。As shown in FIGS. 3 to 5, the heater 222 and the first airflow generator 400 constitute, for example, the aforementioned temperature control system. The first airflow generator 400 is, for example, a fan, and the first airflow F1 generated by the first airflow generator 400 is used to flow to these airflow channels 2213, so as to pass the first airflow F1 to the test tube 2 in the containing tank C. Cool down. In detail, the gene amplification device 1 of this embodiment may further include a wind deflector 500. The wind deflector 500 is between the rotating bearing 200 and the first airflow generator 400, and the first airflow generator 400 is closer to the bottom 110 than the wind deflector 500. The air guiding hood 500 has a guiding channel 510, an air inlet 520 and an air outlet 530. The air inlet 520 and the air outlet 530 are respectively connected to two different sides of the guiding channel 510. The first airflow generator 400 is located at the air inlet 520 of the wind deflector 500, and the air outlet 530 of the wind deflector 500 communicates with the air flow channel 2213 through the central opening 241 of the wind deflector 240. In this way, the first air flow F1 generated by the first air flow generator 400 will first flow vertically upward to the heating plate 220 through the guide flow channel 510, and then flow horizontally to the accommodating tank C through the air flow channel 2213. , To cool down the test tube 2 in the containing tank C.

由於第一氣流產生器400所產生之第一氣流F1係直接吹向容置槽C內之試管2,故試管2的降溫效果較佳。Since the first air flow F1 generated by the first air flow generator 400 is directly blown to the test tube 2 in the accommodating tank C, the cooling effect of the test tube 2 is better.

如圖3所示,在本實施例中,馬達300之輸出軸310穿過導風罩500之導引流道510,並連接於旋轉承座200。如此一來,即可讓旋轉承座200、馬達300與導風罩500在有限的空間中較密集地排列,以進一步縮小基因擴增設備1的體積。不過,馬達300之輸出軸310穿過導風罩500之導引流道510並非用以限制本創作。在其他實施例中,馬達之輸出軸亦可無需穿過導風罩之導引流道。As shown in FIG. 3, in this embodiment, the output shaft 310 of the motor 300 passes through the guide channel 510 of the wind deflector 500 and is connected to the rotating bearing 200. In this way, the rotating bearing 200, the motor 300 and the wind deflector 500 can be arranged densely in a limited space, so as to further reduce the volume of the gene amplification device 1. However, the output shaft 310 of the motor 300 passing through the guide channel 510 of the air guide 500 is not intended to limit the present invention. In other embodiments, the output shaft of the motor does not need to pass through the guide flow passage of the wind deflector.

在一實施例中,上述之轉動系統係以馬達300為例,但並不以此為限。在其他實施例中,轉動系統亦可以改為其他可讓旋轉承座200旋轉的元件。In one embodiment, the above-mentioned rotating system uses the motor 300 as an example, but it is not limited to this. In other embodiments, the rotating system can also be changed to other components that can allow the rotating bearing 200 to rotate.

如圖3與圖4所示,在本實施例中,入風口520與第一氣流產生器400的數量例如但不限於各有四個。這些第一氣流產生器400分別對應設置於入風口520,使得這些第一氣流產生器400所產生的第一氣流F1一起流向容置槽C處的試管2。採用多個第一氣流產生器400的用意為在相同流量輸出的情況下,可選擇較小尺寸的第一氣流產生器400,而一般來說較小尺寸之第一氣流產生器400的噪音較小。As shown in FIGS. 3 and 4, in this embodiment, the number of the air inlet 520 and the first airflow generator 400 is, for example, but not limited to four each. The first airflow generators 400 are respectively disposed at the air inlet 520 so that the first airflow F1 generated by the first airflow generators 400 flows to the test tube 2 at the containing tank C together. The purpose of using multiple first airflow generators 400 is that under the same flow output, a smaller size first airflow generator 400 can be selected, and generally speaking, the smaller size of the first airflow generator 400 is less noisy. small.

請參閱圖1與圖8,圖8係顯示本創作第一實施例之基因擴增設備的局部分解示意圖。在一實施例中,基因擴增設備1還可以包括一光學系統600,光學系統600固定於支架100,並位於導風罩500周圍。Please refer to FIG. 1 and FIG. 8. FIG. 8 is a partial exploded schematic diagram of the gene amplification device according to the first embodiment of the invention. In an embodiment, the gene amplification device 1 may further include an optical system 600, which is fixed to the support 100 and is located around the wind deflector 500.

在一實施例中,基因擴增設備1還可以包括一第二流體產生器700,第二流體產生器700裝設於支架100並用以產生吹向光學系統600的一第二氣流F2。第二氣流F2可對基因擴增設備1整體內部進行降溫。In an embodiment, the gene amplification device 1 may further include a second fluid generator 700 installed on the support 100 and used to generate a second air flow F2 blowing toward the optical system 600. The second air flow F2 can cool down the entire interior of the gene amplification device 1.

請復參閱圖1與圖3,在一實施例中,基因擴增設備1還可以包括一中央控制模組800。中央控制模組800固定於支架100之底部110,並例如透過有線或無線的方式通訊(電)連接加熱器222、馬達300、第一氣流產生器400、光學系統600及第二氣流產生器700,以控制加熱器222、馬達300、第一氣流產生器400、光學系統600及第二氣流產生器700之開啟與關閉。Please refer to FIG. 1 and FIG. 3 again. In one embodiment, the gene amplification device 1 may further include a central control module 800. The central control module 800 is fixed on the bottom 110 of the bracket 100, and is connected to the heater 222, the motor 300, the first airflow generator 400, the optical system 600, and the second airflow generator 700 through wired or wireless communication (electrical), for example , To control the opening and closing of the heater 222, the motor 300, the first airflow generator 400, the optical system 600, and the second airflow generator 700.

請參閱圖9,圖9係顯示本創作第一實施例之基因擴增方法的流程示意圖,適於對至少一樣本進行基因擴增,包括下列步驟。首先,如步驟S11所示,提供前述之基因擴增設備1。接著,如步驟S12所示,在一第一升溫步驟中,以溫控系統將導熱盤體221提升至一第一溫度。接著,如步驟S13所示,在一第一定溫步驟中,以溫控系統將導熱盤體221維持於第一溫度。接著,如步驟S14所示,在一第一降溫步驟中,以溫控系統將導熱盤體221冷卻至一第二溫度。接著,如步驟S15所示,在一檢測步驟中,以溫控系統將導熱盤體221維持於第二溫度。接著,如步驟S16所示,在一第二升溫步驟中,以溫控系統將導熱盤體221提升至一第三溫度。接著,如步驟S17所示,在一第二定溫步驟中,以溫控系統將導熱盤體221維持於第三溫度。接著,如步驟S18所示,在一第三升溫步驟中,以溫控系統將導熱盤體221提升至第一溫度。經由上述步驟S11至步驟S18能透過溫控系統進行導熱盤體221之溫度控制,更精確的說,能透過溫控系統進行試管2與試管2內之樣本的溫度控制。Please refer to FIG. 9. FIG. 9 is a schematic flow chart of the gene amplification method of the first embodiment of the present creation, which is suitable for gene amplification of at least one sample, and includes the following steps. First, as shown in step S11, the aforementioned gene amplification device 1 is provided. Then, as shown in step S12, in a first heating step, the heat conducting plate 221 is raised to a first temperature by the temperature control system. Next, as shown in step S13, in a first constant temperature step, the thermally conductive plate 221 is maintained at the first temperature by the temperature control system. Then, as shown in step S14, in a first cooling step, the heat conducting plate 221 is cooled to a second temperature by the temperature control system. Then, as shown in step S15, in a detection step, the heat conducting plate 221 is maintained at the second temperature by the temperature control system. Then, as shown in step S16, in a second heating step, the heat conducting plate 221 is raised to a third temperature by the temperature control system. Then, as shown in step S17, in a second constant temperature step, the heat conducting plate 221 is maintained at the third temperature by the temperature control system. Then, as shown in step S18, in a third heating step, the heat conducting plate 221 is raised to the first temperature by the temperature control system. Through the above steps S11 to S18, the temperature control of the heat conducting plate 221 can be performed through the temperature control system. More precisely, the temperature control of the test tube 2 and the sample in the test tube 2 can be performed through the temperature control system.

請參閱圖10與圖11,圖10係顯示本創作第一實施例之基因擴增設備進行基因擴增程序的時間溫度曲線示意圖。圖11係顯示本創作第一實施例之基因擴增方法的具體實施例。如步驟S12所示,在一第一升溫步驟中,以溫控系統將導熱盤體221提升至一第一溫度(95°C),如透過加熱器222來讓導熱盤體221增溫。接著,如步驟S13所示,在一第一定溫步驟中,以溫控系統將導熱盤體221維持於第一溫度(95°C)。接著,如步驟S14所示,在一第一降溫步驟中,以溫控系統將導熱盤體221冷卻至一第二溫度(50°C),如透過第一氣流產生器400所產生的氣流將導熱盤體221冷卻至第二溫度(50°C),藉此降低試管的溫度。接著,如步驟S15所示,在一檢測步驟中,以溫控系統將導熱盤體221維持於第二溫度(50°C、檢測)。接著,如步驟S16所示,在一第二升溫步驟中,以溫控系統將導熱盤體221提升至一第三溫度(72°C),如透過加熱器222來讓導熱盤體221增溫。接著,如步驟S17所示,在一第二定溫步驟中,以溫控系統將導熱盤體221維持於第三溫度(72°C)。接著,如步驟S18所示,在一第三升溫步驟中,以溫控系統將導熱盤體221提升至第一溫度(95°C),如透過加熱器222來讓導熱盤體221增溫。在達到循環數之前,透過重複上述步驟S13~步驟S18,可以獲得基因擴增之效果。而在達到循環數之後,則結束程序。Please refer to FIG. 10 and FIG. 11. FIG. 10 is a schematic diagram showing the time-temperature curve of the gene amplification device of the first embodiment of the present creation during the gene amplification procedure. Fig. 11 shows a specific embodiment of the gene amplification method of the first embodiment of the present creation. As shown in step S12, in a first heating step, the heat-conducting plate 221 is raised to a first temperature (95° C.) by the temperature control system, such as heating the heat-conducting plate 221 through the heater 222. Then, as shown in step S13, in a first constant temperature step, the thermally conductive plate 221 is maintained at a first temperature (95° C.) by a temperature control system. Next, as shown in step S14, in a first cooling step, the heat conducting plate 221 is cooled to a second temperature (50°C) by the temperature control system, as the air flow generated by the first air flow generator 400 will be The heat conducting plate 221 is cooled to the second temperature (50°C), thereby reducing the temperature of the test tube. Next, as shown in step S15, in a detection step, the heat conducting plate 221 is maintained at a second temperature (50°C, detection) by a temperature control system. Then, as shown in step S16, in a second heating step, the heat-conducting plate 221 is raised to a third temperature (72°C) by the temperature control system, such as heating the heat-conducting plate 221 through the heater 222 . Then, as shown in step S17, in a second constant temperature step, the thermally conductive plate 221 is maintained at a third temperature (72°C) by a temperature control system. Then, as shown in step S18, in a third heating step, the heat conducting plate 221 is raised to the first temperature (95° C.) by the temperature control system, such as heating the heat conducting plate 221 through the heater 222. Before reaching the number of cycles, by repeating the above steps S13 to S18, the effect of gene amplification can be obtained. After reaching the number of cycles, the program ends.

請參閱圖12,圖12係顯示本創作第二實施例之導熱盤體的立體示意圖。在本實施例中,導熱盤體221a的散熱鰭片2212a的形狀呈柱狀,這些散熱鰭片2212a分成多組,如3個散熱鰭片2212a為一組。每一組中之各散熱鰭片2212a沿導熱盤體221a之徑向方向排列,且這些組散熱鰭片2212a呈環狀排列。此外,各組散熱鰭片2212a之任二相鄰間隔設置而形成一氣流流道2213a。Please refer to FIG. 12. FIG. 12 is a three-dimensional schematic diagram of the thermally conductive plate body of the second embodiment of the present creation. In this embodiment, the shape of the heat dissipation fins 2212a of the heat conducting plate 221a is columnar, and the heat dissipation fins 2212a are divided into multiple groups, such as three heat dissipation fins 2212a as a group. The heat dissipation fins 2212a in each group are arranged along the radial direction of the heat conducting plate body 221a, and the heat dissipation fins 2212a of these groups are arranged in a ring shape. In addition, any two of the heat dissipation fins 2212a of each group are arranged adjacent to each other to form an air flow channel 2213a.

請參閱圖13,圖13係顯示本創作第三實施例之導熱盤體的立體示意圖。在本實施例中,導熱盤體221b之每一散熱鰭片2212b的形狀呈曲形板狀,並呈放射狀排列。任二相鄰之散熱鰭片2212b間隔設置而形成一氣流流道2213b。Please refer to FIG. 13, which is a three-dimensional schematic diagram of the thermally conductive plate body of the third embodiment of the present creation. In this embodiment, the shape of each heat dissipation fin 2212b of the thermally conductive plate body 221b is a curved plate and is arranged in a radial pattern. Any two adjacent heat dissipation fins 2212b are spaced apart to form an air flow channel 2213b.

請參閱圖14,圖14係顯示根據本創作第四實施例之導熱盤體的立體示意圖。在本實施例中,導熱盤體221c無設有散熱鰭片,也就是說,氣流流道2213c呈現完整的環形。Please refer to FIG. 14. FIG. 14 is a three-dimensional schematic diagram of a thermally conductive plate body according to the fourth embodiment of the present invention. In this embodiment, the heat conducting plate 221c is not provided with heat dissipation fins, that is to say, the air flow channel 2213c presents a complete ring shape.

上述第一氣流產生器400的數量為多個,但並不以此為限。請參閱圖15,圖15係顯示本創作第五實施例之第一氣流產生器與導風罩的平面示意圖。在本實施例中,第一氣流產生器400d的數量為單個,且導風罩500d的外形依據第一氣流產生器400d的數量微調。The number of the above-mentioned first airflow generator 400 is multiple, but it is not limited thereto. Please refer to FIG. 15. FIG. 15 is a schematic plan view of the first airflow generator and the wind deflector according to the fifth embodiment of the invention. In this embodiment, the number of the first airflow generator 400d is single, and the shape of the wind deflector 500d is fine-tuned according to the number of the first airflow generator 400d.

上述基因擴增設備1之承座係採用旋轉承座200,但並不以此為限。請參閱圖3與圖16,圖16係顯示本創作第六實施例之第一氣流產生器、導風罩與平移承座的平面示意圖。在本實施例中,平移承座200e與第一氣流產生器400e分別位於導風罩500e之相對兩側。平移承座200e與上述旋轉承座200之功能類似,皆能夠用來承載試管與對試管進行加熱,其差異僅在於旋轉承座200係相對支架100轉動,而平移承座200e係相對支架100平移。第一氣流產生器400e所產生的氣流經導風罩500e之導引而流向平移承座200e所承載之試管。The above-mentioned gene amplification device 1 adopts a rotating bearing 200 as the bearing system, but it is not limited to this. Please refer to FIGS. 3 and 16. FIG. 16 is a schematic plan view showing the first airflow generator, the wind deflector, and the translational bearing of the sixth embodiment of the present invention. In this embodiment, the translation bearing 200e and the first airflow generator 400e are respectively located on opposite sides of the wind deflector 500e. The translational bearing 200e is similar in function to the above-mentioned rotating bearing 200, both of which can be used to carry and heat test tubes. The only difference is that the rotating bearing 200 rotates relative to the support 100, while the translational bearing 200e translates relative to the support 100. . The airflow generated by the first airflow generator 400e is guided by the wind deflector 500e to flow to the test tube carried by the translational bearing 200e.

上述加熱器222的數量為單個,並圍繞導熱盤體221之鏤空結構,但並不以此為限。請參閱圖17,圖17係顯示本創作第七實施例之加熱盤的分解示意圖。在本實施例中,加熱盤220f包括一導熱盤體221f及多個加熱器222f。加熱器222f熱接觸於導熱盤體221f,並圍繞導熱盤體221f之穿槽2211f,以重點式地對試管放置處進行加熱,或是可個別控制各穿槽2211f處的溫度,以更精準地對試管及試管內的樣本個別/局部調控溫度。The number of the heater 222 is single and surrounds the hollow structure of the heat conducting plate body 221, but it is not limited to this. Please refer to FIG. 17, which is an exploded schematic diagram of the heating plate of the seventh embodiment of the invention. In this embodiment, the heating plate 220f includes a heat conducting plate body 221f and a plurality of heaters 222f. The heater 222f is in thermal contact with the heat-conducting plate 221f and surrounds the groove 2211f of the heat-conducting plate 221f to heat the place where the test tube is placed in a focused manner, or the temperature at each groove 2211f can be individually controlled to more accurately Individually/locally regulate the temperature of the test tube and the sample in the test tube.

在一實施例中,加熱器222f例如為氮化鋁陶瓷加熱片,氮化鋁陶瓷加熱片具有高熱傳導系數、高硬度、低熱膨脹係數、抗腐蝕、低介電損失、無毒性、電氣絕緣之效果。In one embodiment, the heater 222f is, for example, an aluminum nitride ceramic heating piece, which has high thermal conductivity, high hardness, low thermal expansion coefficient, corrosion resistance, low dielectric loss, non-toxicity, and electrical insulation. effect.

上述加熱器222係熱接觸於導熱盤體221,但並不以此為限。請參閱圖18,圖18係顯示本創作第八實施例之導風罩、加熱器與第一氣流產生器的立體示意圖。在本實施例中,加熱器900g例如為陶瓷加熱器並位於第一氣流產生器400g之氣流流動路徑上。在本實施例中,第一氣流產生器400g的數量以四個為例,加熱器900g的數量以二個為例,且其中兩個第一氣流產生器400g直接裝設於導風罩500g,以及另外兩個第一氣流產生器400g透過二加熱器900g裝設於導風罩500g。如此一來,當搭配加熱器900g之第一氣流產生器400g運轉時,第一氣流產生器400g所產生之氣流會經過加熱器900g之加熱再吹向容置槽處,藉以對容置槽處之試管加熱。更進一步來說,欲將導熱盤體升溫時,則將加熱器900g及配有加熱器900g之二第一氣流產生器400g開啟,另外二第一氣流產生器400g關閉。反之,欲將導熱盤體降溫時,則將加熱器900g及配有加熱器900g之二第一氣流產生器400g關閉,另外二第一氣流產生器400g開啟。在一實施例中,欲將導熱盤體降溫時,亦可將加熱器900g關閉,四個第一氣流產生器400g均開啟,使得降溫效果較佳。The heater 222 is in thermal contact with the heat conducting plate 221, but it is not limited to this. Please refer to FIG. 18, which is a three-dimensional schematic diagram of the air deflector, the heater, and the first airflow generator of the eighth embodiment of the invention. In this embodiment, the heater 900g is, for example, a ceramic heater and is located on the airflow path of the first airflow generator 400g. In this embodiment, the number of first airflow generators 400g is four as an example, and the number of heaters 900g is two as an example, and two of the first airflow generators 400g are directly installed on the wind deflector 500g. And the other two first airflow generators 400g are installed in the wind deflector 500g through the second heater 900g. In this way, when the first airflow generator 400g with the heater 900g is operated, the airflow generated by the first airflow generator 400g will be heated by the heater 900g and then blown to the accommodating tank, so as to oppose the accommodating tank. The test tube is heated. Furthermore, when the heat-conducting plate body is to be heated up, the heater 900g and the two first airflow generators 400g equipped with the heater 900g are turned on, and the other two first airflow generators 400g are turned off. Conversely, when the heat conducting plate body is to be cooled down, the heater 900g and the two first airflow generator 400g equipped with the heater 900g are turned off, and the other two first airflow generators 400g are turned on. In one embodiment, when the temperature of the heat conducting plate body is to be lowered, the heater 900g can also be turned off, and the four first airflow generators 400g are all turned on, so that the cooling effect is better.

在一實施例中,加熱器900g與第一氣流產生器400g的位置可以對調,也就是說改成加熱器透過第一氣流產生器裝設於導風罩。In one embodiment, the positions of the heater 900g and the first airflow generator 400g can be reversed, that is to say, the heater is installed in the air deflector through the first airflow generator.

根據上述實施例之基因擴增設備,透過在旋轉承座之導熱盤體直接設置經過放置試管(樣本)處的氣流流道,使得氣流能直接對試管(樣本)進行升降溫,以讓基因擴增設備符合即時升降溫的需求。According to the gene amplification device of the above-mentioned embodiment, by directly setting the airflow channel through the place where the test tube (sample) is placed on the heat-conducting plate of the rotating holder, the airflow can directly raise and lower the temperature of the test tube (sample) to allow the gene to expand. The increased equipment meets the needs of instant temperature rise and fall.

再者,透過在加熱盤之導熱盤體上設置散熱鰭片,以進一步提升散熱氣流對試管的降溫速度。Furthermore, by arranging heat dissipation fins on the heat conducting plate body of the heating plate, the cooling speed of the test tube by the heat dissipation airflow is further improved.

此外,透過將加熱盤之加熱器直接熱接觸於導熱盤體,且導熱盤體於試管放置處有鏤空結構,使得加熱器所提供之熱能可更集中地傳導至試管放置處,以讓基因擴增設備符合即時升溫的需求。In addition, by directly contacting the heater of the heating plate with the heat-conducting plate body, and the heat-conducting plate body has a hollow structure where the test tube is placed, the heat energy provided by the heater can be more concentratedly conducted to the place where the test tube is placed, so that the gene can be expanded. Adding equipment meets the demand for immediate temperature rise.

雖然本創作以前述之諸項實施例揭露如上,然其並非用以限定本創作,任何熟習相像技藝者,在不脫離本創作之精神和範圍內,當可作些許之更動與潤飾,因此本創作之專利保護範圍須視本說明書所附之申請專利範圍所界定者為準。Although this creation is disclosed above in the foregoing embodiments, it is not intended to limit this creation. Anyone familiar with similar skills should be able to make some changes and modifications without departing from the spirit and scope of this creation. Therefore, this creation The scope of patent protection for creation shall be subject to the definition of the scope of patent application attached to this manual.

1:基因擴增設備 2:試管 100:支架 110:底部 120:支撐部 200:旋轉承座(承座) 200e:平移承座(承座) 210:旋轉盤 211:穿槽 220、220f:加熱盤 221、221a、221b、221c、221f:導熱盤體 2211、2211f:穿槽 2212、2212a、2212b:散熱鰭片 2213、2213a、2213b、2213c:氣流流道 2214:鏤空結構 222、222f:加熱器 230:旋轉盤蓋 240:擋風盤 241:中央開口 242:穿孔 250:隔熱件 300:馬達 310:輸出軸 400、400d、400e、400g:第一氣流產生器 500、500d、500e、500g:導風罩 510:導引流道 520:入風口 530:出風口 600:光學系統 700:第二氣流產生器 800:中央控制模組 900g:加熱器 a:方向 A:旋轉軸心 C:容置槽 F1:第一氣流 F2:第二氣流1: Gene amplification equipment 2: test tube 100: bracket 110: bottom 120: Support 200: Rotating bearing (bearing seat) 200e: translation bearing (bearing seat) 210: Rotating Disk 211: piercing 220, 220f: heating plate 221, 221a, 221b, 221c, 221f: thermally conductive plate 2211, 2211f: through slot 2212, 2212a, 2212b: heat sink fins 2213, 2213a, 2213b, 2213c: air flow channel 2214: hollow structure 222, 222f: heater 230: Rotating Disk Cover 240: windshield 241: central opening 242: Perforation 250: heat insulation 300: Motor 310: output shaft 400, 400d, 400e, 400g: the first airflow generator 500, 500d, 500e, 500g: wind hood 510: Guide runner 520: air inlet 530: air outlet 600: Optical system 700: second airflow generator 800: Central control module 900g: heater a: direction A: Rotation axis C: holding tank F1: First airflow F2: second airflow

圖1係顯示本創作第一實施例之基因擴增設備的立體示意圖。 圖2係顯示本創作第一實施例之基因擴增設備進行聚合酶連鎖反應所需要的三階段熱循環溫度示意圖。 圖3係顯示本創作第一實施例之基因擴增設之剖面示意圖。 圖4係顯示本創作第一實施例之導風罩的立體示意圖。 圖5係顯示本創作第一實施例之基因擴增設之另一割面的剖面示意圖。 圖6係顯示本創作第一實施例之基因擴增設之局部分解示意圖。 圖7係顯示本創作第一實施例之導熱盤體另一視角的立體示意圖。 圖8係顯示本創作第一實施例之基因擴增設備的局部分解示意圖。 圖9係顯示本創作第一實施例之基因擴增方法的流程示意圖 圖10係顯示本創作第一實施例之基因擴增設備進行基因擴增程序的時間溫度曲線示意圖。 圖11係顯示本創作第一實施例之基因擴增方法的具體實施例。 圖12係顯示本創作第二實施例之導熱盤體的立體示意圖。 圖13係顯示本創作第三實施例之導熱盤體的立體示意圖。 圖14係顯示本創作第四實施例之導熱盤體的立體示意圖。 圖15係顯示本創作第五實施例之第一氣流產生器與導風罩的平面示意圖。 圖16係顯示本創作第六實施例之第一氣流產生器、導風罩與平移承座的平面示意圖。 圖17係顯示本創作第七實施例之加熱盤的分解示意圖。 圖18係顯示本創作第八實施例之導風罩、加熱器與第一氣流產生器的立體示意圖。 Fig. 1 is a three-dimensional schematic diagram showing the gene amplification device of the first embodiment of the invention. Fig. 2 is a schematic diagram showing the three-stage thermal cycle temperature required for the polymerase chain reaction of the gene amplification device of the first embodiment of the invention. Fig. 3 is a schematic cross-sectional view showing the gene amplification device of the first embodiment of the present creation. Fig. 4 is a three-dimensional schematic diagram showing the wind deflector of the first embodiment of the invention. Fig. 5 is a schematic cross-sectional view showing another cut plane of the gene amplification device of the first embodiment of the present creation. Fig. 6 is a partial exploded schematic diagram showing the gene amplification device of the first embodiment of the present creation. FIG. 7 is a three-dimensional schematic diagram showing the heat conducting plate body of the first embodiment of the present invention from another perspective. Fig. 8 is a partial exploded schematic diagram showing the gene amplification device of the first embodiment of the invention. Figure 9 is a schematic diagram showing the flow of the gene amplification method of the first embodiment of the present creation Fig. 10 is a schematic diagram showing the time-temperature curve of the gene amplification procedure performed by the gene amplification device of the first embodiment of the invention. Fig. 11 shows a specific embodiment of the gene amplification method of the first embodiment of the present creation. FIG. 12 is a three-dimensional schematic diagram showing the heat conducting plate body of the second embodiment of the invention. FIG. 13 is a three-dimensional schematic diagram showing the thermally conductive plate body of the third embodiment of the present invention. FIG. 14 is a three-dimensional schematic diagram showing the heat conducting plate body of the fourth embodiment of the invention. Fig. 15 is a schematic plan view showing the first airflow generator and the wind deflector of the fifth embodiment of the invention. Fig. 16 is a schematic plan view showing the first airflow generator, the wind deflector and the translational bearing of the sixth embodiment of the invention. Fig. 17 is an exploded schematic diagram showing the heating plate of the seventh embodiment of the invention. FIG. 18 is a three-dimensional schematic diagram showing the air guide hood, the heater and the first airflow generator of the eighth embodiment of the invention.

1:基因擴增設備 1: Gene amplification equipment

2:試管 2: test tube

100:支架 100: bracket

110:底部 110: bottom

120:支撐部 120: Support

200:旋轉承座 200: Rotating bearing

210:旋轉盤 210: Rotating Disk

220:加熱盤 220: heating plate

221:導熱盤體 221: heat conduction plate

230:旋轉盤蓋 230: Rotating Disk Cover

300:馬達 300: Motor

310:輸出軸 310: output shaft

400:第一氣流產生器 400: The first airflow generator

500:導風罩 500: Wind hood

510:導引流道 510: Guide runner

520:入風口 520: air inlet

530:出風口 530: air outlet

600:光學系統 600: Optical system

800:中央控制模組 800: Central control module

a:方向 a: direction

A:旋轉軸心 A: Rotation axis

C:容置槽 C: holding tank

F1:第一氣流 F1: First airflow

Claims (22)

一種基因擴增設備,適於對至少一樣本進行基因擴增,該基因擴增設備包括: 一支架;一旋轉承座,可轉動地設置於該支架,該旋轉承座具有一容置槽及一氣流流道,該至少一樣本放置於該容置槽且該容置槽位於該氣流流道或其延伸路徑上;一馬達,設於該支架,用以驅動該旋轉承座相對該支架轉動;以及一第一氣流產生器,該第一氣流產生器用以產生一第一氣流,該第一氣流沿該氣流流道流動而流過該容置槽。 A gene amplification device is suitable for gene amplification of at least one sample, and the gene amplification device includes: A bracket; a rotating bearing seat, rotatably arranged on the bracket, the rotating bearing seat has an accommodating groove and an air flow channel, the at least one copy is placed in the accommodating groove and the accommodating groove is located in the air flow On the channel or its extension path; a motor arranged on the bracket for driving the rotating bearing to rotate relative to the bracket; and a first airflow generator for generating a first airflow, the first airflow generator An air flow flows along the air flow channel and flows through the accommodating groove. 如請求項1所述之基因擴增設備,其中,該旋轉承座具有複數個氣流流道及包括複數個散熱鰭片,該等散熱鰭片分隔出該等氣流流道,該容置槽位於其中一該氣流流道或其延伸路徑上,該第一氣流產生器所產生之該第一氣流用以流向該等氣流流道。The gene amplification device according to claim 1, wherein the rotating bearing has a plurality of air flow channels and includes a plurality of heat dissipation fins, the heat dissipation fins separate the air flow channels, and the accommodating slot is located On one of the air flow channels or its extension path, the first air flow generated by the first air flow generator is used to flow to the air flow channels. 如請求項2所述之基因擴增設備,其中,每一該散熱鰭片的形狀呈平板狀,並呈放射狀排列。The gene amplification device according to claim 2, wherein each of the heat dissipation fins has a flat plate shape and is arranged radially. 如請求項2所述之基因擴增設備,其中,每一該散熱鰭片的形狀呈曲形板狀,並呈放射狀排列。The gene amplification device according to claim 2, wherein each of the heat dissipation fins has a curved plate shape and is arranged radially. 如請求項2所述之基因擴增設備,其中,每一該散熱鰭片的形狀呈柱狀,並呈環狀排列。The gene amplification device according to claim 2, wherein each of the heat dissipation fins has a columnar shape and is arranged in a ring shape. 如請求項1所述之基因擴增設備,其更包括一導風罩,該導風罩具有一導引流道、一入風口及一出風口,該入風口與該出風口分別連通於該導引流道之相異兩側,該第一氣流產生器位於該導風罩之該入風口,該導風罩之該出風口連通該氣流流道,以令該第一氣流產生器所產生之該第一氣流經該導引流道流向該氣流流道。The gene amplification device according to claim 1, further comprising a wind deflector, the wind deflector having a guiding channel, an air inlet and an air outlet, the air inlet and the air outlet are respectively connected to the The first airflow generator is located at the air inlet of the air guiding hood, and the air outlet of the air guiding hood is connected to the airflow channel, so that the first airflow generator generates The first airflow flows to the airflow channel through the guide channel. 如請求項6所述之基因擴增設備,其中,該馬達包括一輸出軸,該輸出軸穿過該導風罩之該導引流道,並連接於該旋轉承座。The gene amplification device according to claim 6, wherein the motor includes an output shaft, and the output shaft passes through the guide flow passage of the air deflector and is connected to the rotating bearing. 如請求項6所述之基因擴增設備,其更包括複數個第一氣流產生器,該導風罩具有複數個入風口,該等第一氣流產生器分別設置於該等入風口。The gene amplification device according to claim 6, further comprising a plurality of first airflow generators, the air guide hood has a plurality of air inlets, and the first airflow generators are respectively arranged at the air inlets. 如請求項6所述之基因擴增設備,其中,該支架包括一底部及一支撐部,該支撐部立於該底部,該導風罩介於該旋轉承座與該第一氣流產生器之間,且該第一氣流產生器較該導風罩靠近該底部。The gene amplification device according to claim 6, wherein the support includes a bottom and a supporting portion, the supporting portion stands on the bottom, and the wind deflector is interposed between the rotary bearing and the first airflow generator And the first airflow generator is closer to the bottom than the wind deflector. 如請求項6所述之基因擴增設備,其更包括一光學系統,該光學系統固定於該支架,並位於該導風罩周圍。The gene amplification device according to claim 6, further comprising an optical system, the optical system is fixed to the bracket and located around the wind deflector. 如請求項10所述之基因擴增設備,其更包括一第二流體產生器,該第二流體產生器裝設於該支架並用以產生吹向該光學系統的一第二氣流。The gene amplification device according to claim 10, further comprising a second fluid generator installed on the support and used for generating a second air flow to the optical system. 如請求項1所述之基因擴增設備,其中,該旋轉承座包括一旋轉盤、一加熱盤及一旋轉盤蓋,該馬達包括一輸出軸,該旋轉盤固定於該馬達之該輸出軸,該加熱盤固定於該旋轉盤,該容置槽位於該旋轉盤與該加熱盤,該旋轉盤蓋可拆卸地裝設於該旋轉盤,並覆蓋該容置槽。The gene amplification device according to claim 1, wherein the rotating socket includes a rotating disk, a heating disk, and a rotating disk cover, the motor includes an output shaft, and the rotating disk is fixed to the output shaft of the motor The heating plate is fixed on the rotating plate, the containing groove is located on the rotating plate and the heating plate, and the rotating plate cover is detachably mounted on the rotating plate and covers the containing groove. 如請求項12所述之基因擴增設備,其中,該加熱盤包括一導熱盤體及一加熱器,該加熱器對該導熱盤體加熱。The gene amplification device according to claim 12, wherein the heating plate includes a heat-conducting plate body and a heater, and the heater heats the heat-conducting plate body. 如請求項13所述之基因擴增設備,其中,該導熱盤體具有複數個穿槽,該加熱盤包括複數個加熱器,該等加熱器圍繞該導熱盤體之該等穿槽。The gene amplification device according to claim 13, wherein the thermally conductive plate body has a plurality of through grooves, the heating plate includes a plurality of heaters, and the heaters surround the through grooves of the thermally conductive plate body. 如請求項13所述之基因擴增設備,其中,該旋轉承座具有複數個容置槽及複數個氣流流道,該加熱盤之該導熱盤體包括複數個散熱鰭片,該等散熱鰭片位於該導熱盤體遠離該旋轉盤之一側,該等散熱鰭片分隔出該等氣流流道,該等容置槽分別位於該等氣流流道或其延伸路徑上。The gene amplification device according to claim 13, wherein the rotary bearing has a plurality of accommodating grooves and a plurality of air flow channels, the heat conducting plate of the heating plate includes a plurality of heat dissipation fins, and the heat dissipation fins The fins are located on the side of the heat-conducting disk body away from the rotating disk, the heat dissipation fins separate the air flow channels, and the accommodating grooves are respectively located on the air flow channels or their extension paths. 如請求項12所述之基因擴增設備,其中,該旋轉承座更包括一擋風盤,該擋風盤位於該加熱盤遠離該旋轉盤之一側,並遮蓋於該等氣流流道之一側。The gene amplification device according to claim 12, wherein the rotating bearing further comprises a wind shield, the wind shield is located on a side of the heating disk away from the rotating disk, and is covered by the air flow channels One side. 如請求項12所述之基因擴增設備,其中,該旋轉承座更包括一隔熱件,該隔熱件介於該旋轉盤與該加熱盤之間。The gene amplification device according to claim 12, wherein the rotating bearing further includes a heat insulating member, the heat insulating member being interposed between the rotating disk and the heating disk. 如請求項1所述之基因擴增設備,其中,該旋轉承座具有複數個容置槽,該等容置槽繞該旋轉承座之一旋轉軸心呈環狀排列,該至少一樣本適於被置於任一該容置槽之中。The gene amplification device according to claim 1, wherein the rotating socket has a plurality of accommodating grooves, and the accommodating grooves are arranged in a ring around a rotation axis of the rotating socket, and the at least one element is suitable It is placed in any of the accommodating grooves. 如請求項1所述之基因擴增設備,其更包括一加熱器,該加熱器位於該第一氣流產生器之該第一氣流的流動路徑上。The gene amplification device according to claim 1, further comprising a heater located on the flow path of the first airflow of the first airflow generator. 一種基因擴增設備,包括: 一支架;一承座,設置於該支架,該承座具有一容置槽及一氣流流道,該容置槽位於該氣流流道或其延伸路徑上;一導風罩,該導風罩具有一入風口及一出風口,該導風罩之該出風口連通該氣流流道;以及一第一氣流產生器,位於該導風罩之該入風口,該第一氣流產生器用以產生一第一氣流,該第一氣流自該入風口往該出風口而流向該氣流流道並流過該容置槽。 A gene amplification device, including: A bracket; a bearing seat, arranged on the bracket, the bearing seat having an accommodating groove and an air flow channel, the accommodating groove is located on the air flow channel or its extension path; a wind deflector, the wind deflector It has an air inlet and an air outlet, the air outlet of the wind deflector is connected to the airflow channel; and a first airflow generator located at the air inlet of the wind deflector, and the first airflow generator is used to generate a The first air flow, the first air flow flows from the air inlet to the air outlet, flows to the air flow channel and flows through the accommodating groove. 如請求項20所述之基因擴增設備,其更包括一加熱器,設置於該第一氣流產生器及該導風罩之間,該第一氣流經過該加熱器加熱後再流過該容置槽。The gene amplification device according to claim 20, further comprising a heater disposed between the first airflow generator and the air guide hood, and the first airflow is heated by the heater and then flows through the container.置槽. 如請求項20所述之基因擴增設備,其更包括一加熱器,該加熱器熱接觸於該容置槽,該加熱器包括一氮化鋁陶瓷加熱片。The gene amplification device according to claim 20, further comprising a heater which is in thermal contact with the accommodating tank, and the heater comprises an aluminum nitride ceramic heating piece.
TW110201600U 2021-02-08 2021-02-08 Gene amplification apparatus TWM613588U (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI818398B (en) * 2021-12-29 2023-10-11 財團法人工業技術研究院 Convective polymerase chain reaction apparatus and optical detecting method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI818398B (en) * 2021-12-29 2023-10-11 財團法人工業技術研究院 Convective polymerase chain reaction apparatus and optical detecting method thereof

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