TWM611895U - Exposure apparatus - Google Patents

Abstract

An exposure apparatus comprising a working room, a first photographic film frame and a second photographic film frame is provided. The first photographic film frame is suitable to move between a first position outside the working room and a second position in the working room. The second photographic film frame is suitable to move between a third position outside the working room and a forth position in the working room. When the first photographic film frame is at the second position, the second photographic film frame is at the third position. When the second photographic film frame is at the forth position, the first photographic film frame is at the first position. The exposure assembly is disposed in the working room.

Description

Exposure machine

This creation is about an exposure machine, and especially an exposure machine with a film frame.

The conventional exposure machine has only one film frame. During the exposure operation, the film frame carries the film and is located in the work chamber of the exposure machine. The exposure device located in the work chamber exposes the film to transfer the pattern on the film to the work chamber and below the film frame. On the substrate. When the staff needs to expose another kind of negative film, they must first stop the exposure operation of the exposure machine, and then pull the negative film frame out of the working chamber for subsequent negative film replacement. Therefore, the work of replacing the negative film of the conventional exposure machine will cause the exposure machine to stop the exposure operation and reduce the use efficiency of the exposure machine.

One purpose of this creation is to provide an exposure machine with two film frames, which is convenient for users to change the film while the exposure machine can still perform exposure operations, so as to improve the use efficiency of the exposure machine.

This creation provides an exposure machine, including a working chamber, a first film frame and a second film frame. The first film frame is adapted to move between a first position outside the working chamber and a second position inside the working chamber. The second film frame is adapted to move between a third position outside the working chamber and a fourth position inside the working chamber. When the first film frame is in the second position, the second film frame is in the third position, and when the second film frame is in the fourth position, the first film frame is in the first position.

In an embodiment of the present creation, when the first film frame is in the first position, the first film frame is adapted to rotate less than 90 degrees with an axis as the axis, so that a bearing surface of the first film frame is inclined upward , And a back surface of the first film frame is inclined downward and facing the working chamber. The bearing surface and the back surface of the first film frame are opposite to each other.

In an embodiment of the present creation, when the second film frame is in the third position, the second film frame is adapted to make a rotation of less than 90 degrees with another axis as the axis, so that a bearing surface of the second film frame is inclined to face And a back surface of the second film frame is inclined downward and facing the working chamber. The supporting surface and the back surface of the second film frame are opposite to each other.

In an embodiment of the present creation, when the first film frame is in the first position, the first film frame is suitable to be detached from the exposure machine.

In an embodiment of the present creation, when the second film frame is in the third position, the second film frame is suitable for being detached from the exposure machine.

In an embodiment of the invention, the first film frame and the second film frame are adapted to move along a horizontal direction.

In an embodiment of the present invention, the above-mentioned exposure machine further includes a substrate carrying platform, which is adapted to move along a second position between a fifth position outside the working chamber and a sixth position inside the working chamber. Move in a horizontal direction. This other horizontal direction is substantially perpendicular to the aforementioned horizontal direction.

In an embodiment of the present invention, the above-mentioned exposure machine further includes a substrate carrying platform and an exposure device. The substrate carrying platform is adapted to move between a fifth position outside the working chamber and a sixth position inside the working chamber. The exposure device is located in the working chamber. When the substrate carrying platform is at the sixth position and the first film frame is at the second position, the first film frame is located between the substrate carrying platform and the exposure device. When the substrate carrying platform is at the sixth position and the second film frame is at the fourth position, the second film frame is located between the substrate carrying platform and the exposure device.

Fig. 1 shows a three-dimensional view of an exposure machine according to an embodiment of the present creation. Please refer to FIG. 1, an exposure machine 200 according to an embodiment of the present creation includes a working chamber 210, a substrate carrying platform 220, a first film frame 230, a second film frame 240 and an exposure device 250. The exposure device 250 is located in the working chamber 210. The substrate carrying platform 220 is suitable for carrying a substrate 300, and the substrate carrying platform 220 shown in FIG. 1 is at a position P21 outside the working chamber 210. The first film frame 230 shown in FIG. 1 is located at a position P31 in the working chamber 210. A bearing surface 232 of the first film frame 230 is suitable for bearing a film (not shown) to be exposed. The film has Multiple patterns. The second film frame 240 shown in FIG. 1 is at a position P41 outside the working chamber 210. A bearing surface 242 of the second film frame 240 is suitable for bearing another film (not shown) to be exposed.

2A to 2B are schematic side views showing the action of the second film frame of FIG. 1 when changing the film. Please refer to FIG. 1, FIG. 2A and FIG. 2B at the same time. When the exposure machine 200 uses the first film frame 230 to perform the exposure operation, the substrate carrying platform 220 shown in FIG. Moving in a first horizontal direction D1 to move to another position P22 within the working chamber 210 (see FIGS. 2A and 2B), so that the substrate 300 carried by the substrate carrying platform 220 is positioned on the first film frame 230 (It is located below the position P31 in the working chamber 210). At this time, the exposure device 250 located in the working chamber 210 and above the first film frame 230 exposes the film (not shown) carried on the bearing surface 232 of the first film frame 230 to transfer the pattern on the film It is printed on the substrate 300 located in the working chamber 210 and under the first film frame 230.

After exposure, the substrate 300 can be carried by the substrate carrying platform 220 and exit the working chamber 210 along the first horizontal direction D1, that is, the substrate carrying platform 220 can be moved from the position P22 in the working chamber 210 to the position of the working chamber 210. Outside the position P21. At this time, the exposed substrate 300 can be conveyed by a conveying device (not shown) to leave the substrate carrying platform 220, and another substrate to be exposed (not shown) can be configured by conveying the conveying device The substrate carrying platform 220 is ready for subsequent exposure operations.

2A and 2B, when the exposure machine 200 uses the first film frame 230 to perform the above exposure operation, the second film frame 240 located on the position P41 outside the working chamber 210 can be horizontal with an axis A41 as the axis The state makes a rotation of less than 90 degrees, so that the bearing surface 242 of the second film frame 240 is inclined upward, and a back surface 244 of the second film frame 240 is inclined downward and faces the working chamber 210. The axis A41 is substantially parallel to the first horizontal direction D1, and the supporting surface 242 and the back surface 244 of the second film frame 240 are opposite to each other. The slanted upward carrying surface 242 of the second film frame 240 can facilitate the user to remove the film (not shown) carried by the carrier surface 242, and facilitate the user to vacuum another film (not shown). It is attached to the supporting surface 242 of the second film frame 240. Then, the user can turn the inclined second film frame 240 back to the horizontal state shown in FIG. 2A to wait for the subsequent operation of replacing the film frame. In another embodiment, when the second film frame 240 is located at the position P41 outside the working chamber 210, the second film frame 240 may be adapted to be detached from the exposure machine 200 to allow the user to perform the operation of changing the film. However, this other embodiment is not shown in the drawings.

3A to 3B are schematic side views showing the action of the first film frame of FIG. 1 when the film is replaced. 3A and 3B, when the exposure machine 200 is to perform the exposure operation of another batch of the substrate 400, the user can manually or electrically drive the first film frame 230 and the second film frame 240 along Moving in a second horizontal direction D2 (which is substantially perpendicular to the first horizontal direction D1), the second film frame 240 is at a position P42 within the working chamber 210, and the first film frame 230 is in the working chamber 210 A position outside of P32. At this time, the exposure device 250 located in the working chamber 210 and above the second film frame 240 exposes the film (not shown) carried on the bearing surface 242 of the second film frame 240 to transfer the pattern on the film It is printed on the substrate 400 located in the working chamber 210 and under the second film frame 240.

When the exposure machine 200 uses the second film frame 240 to perform the above exposure operation, the first film frame 230 located at the position P32 outside the working chamber 210 can rotate with an axis A31 as the axis from the horizontal state to a rotation of less than 90 degrees , So that the bearing surface 232 of the first film frame 230 is inclined upward, and a back surface 234 of the first film frame 230 is inclined downward and faces the working chamber 210. The axis A31 is substantially parallel to the first horizontal direction D1, and the bearing surface 232 and the back surface 234 of the first film frame 230 are opposite to each other. The inclined upward carrying surface 232 of the first film frame 230 can facilitate the user to remove the film (not shown) carried by the carrier surface 232, and facilitate the user to vacuum another film (not shown). It is attached to the supporting surface 232 of the first film frame 230. Then, the user can turn the inclined first film frame 230 back to the horizontal state shown in FIG. 3A to wait for the subsequent work of replacing the film frame. In another embodiment, when the first film frame 230 is located at the position P32 outside the working chamber 210, the first film frame 230 may be adapted to be detached from the exposure machine 200 to allow the user to perform the operation of changing the film. However, this other embodiment is not shown in the drawings.

Please refer to FIGS. 2A, 2B, 3A and 3B. In summary, in the exposure machine 200 of this embodiment, the first film frame 230 is adapted to be positioned at a position P32 outside the working chamber 210 and in the working chamber. Move between positions P31 within. The second film frame 240 is adapted to move between a position P41 outside the working chamber 210 and a position P42 inside the working chamber 210. In addition, when the first film frame 230 is located at the position P31 inside the working chamber, the second film frame 240 is at the position P41 outside the working chamber 210, and when the second film frame 240 is located inside the working chamber 210 At the position P42, the first film frame 230 is located at a position P32 outside the working chamber 210. In addition, in this embodiment, the first film frame 230 and the second film frame 240 may be adapted to move along the second horizontal direction D2.

Based on the above, the exposure machine of this creative embodiment has at least one of the following advantages. The exposure machine with two film frames in this creative embodiment is convenient for the user to change the film, the exposure machine can still perform exposure operations, so as to improve the use efficiency of the exposure machine.

200: Exposure machine 210: working chamber 220: substrate carrier platform 230: The first film frame 232, 242: bearing surface 234, 244: Back 240: second film frame 250: Exposure device 300, 400: substrate A31, A41: axis D1: The first horizontal direction D2: second horizontal direction P21, P22, P31, P32, P41, P42: position

Fig. 1 shows a three-dimensional view of an exposure machine according to an embodiment of the present creation.

2A to 2B are schematic side views showing the action of the second film frame of FIG. 1 when changing the film.

3A to 3B are schematic side views showing the action of the first film frame of FIG. 1 when the film is replaced.

200: Exposure machine

210: working chamber

220: substrate carrier platform

230: The first film frame

232, 242: bearing surface

240: second film frame

250: Exposure device

300: substrate

A41: Axis

D1: The first horizontal direction

D2: second horizontal direction

P21, P31, P41: position

Claims (8)

An exposure machine, including: A working chamber; A first film frame adapted to move between a first position outside the working chamber and a second position inside the working chamber; and A second film frame adapted to move between a third position outside the working chamber and the fourth position inside the working chamber, wherein when the first film frame is located at the second position When the second film frame is located at the third position, and when the second film frame is located at the fourth position, the first film frame is located at the first position. For the exposure machine set forth in item 1 of the scope of patent application, when the first film frame is in the first position, the first film frame is adapted to rotate less than 90 degrees with an axis as an axis, so that the A bearing surface of the first film frame is inclined upward, and a back surface of the first film frame is inclined downward and facing the working chamber, wherein the bearing surface and the back surface of the first film frame are opposite to each other. For the exposure machine described in item 1 of the scope of patent application, when the second film frame is in the third position, the second film frame is adapted to rotate less than 90 degrees with an axis as the axis, so that the A bearing surface of the second film frame is inclined upward, and a back surface of the second film frame is inclined downward and facing the working chamber, wherein the bearing surface and the back surface of the second film frame are opposite to each other. According to the exposure machine described in item 1 of the scope of patent application, when the first negative film frame is in the first position, the first negative film frame is suitable to be detached from the exposure machine. According to the exposure machine described in item 1 of the scope of patent application, when the second film frame is in the third position, the second film frame is suitable to be detached from the exposure machine. According to the exposure machine described in item 1 of the scope of patent application, the first film frame and the second film frame are adapted to move along a horizontal direction. As described in item 6 of the scope of patent application, the exposure machine further includes a substrate carrying platform, which is suitable for between a fifth position outside the working chamber and a sixth position inside the working chamber Move along another horizontal direction, wherein the other horizontal direction is substantially perpendicular to the horizontal direction. For example, the exposure machine mentioned in item 1 of the scope of patent application includes: A substrate carrying platform adapted to move between a fifth position outside the working chamber and a sixth position inside the working chamber; and An exposure device located in the working chamber; Wherein when the substrate carrying platform is at the sixth position and the first film frame is at the second position, the first film frame is located between the substrate carrying platform and the exposure device; and When the substrate carrying platform is at the sixth position and the second film frame is at the fourth position, the second film frame is located between the substrate carrying platform and the exposure device.

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