TWM610519U - Chip package and both electronic device and circuit board assembly including the chip packages - Google Patents
Chip package and both electronic device and circuit board assembly including the chip packages Download PDFInfo
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本創作是有關於一種晶片封裝體,且特別是有關於一種具有散熱接墊的晶片封裝體以及包括此晶片封裝體的電子裝置與電路板總成(circuit board assembly)。This creation relates to a chip package, and more particularly to a chip package with heat dissipation pads, and an electronic device and circuit board assembly including the chip package.
隨著半導體製程的進步,現在的晶片具有強大的功能,而這種功能強大的晶片通常在運作時會產生大量的熱能。然而,一般晶片封裝體所採用的模封材料(molding compound)大多具有偏低的熱導率(thermal conductivity),因此晶片所產生的熱能不容易從模封材料散逸而容易堆積,造成晶片的溫度上升而降低效能,甚至發生過熱(overheat)而導致晶片損壞。With the advancement of semiconductor manufacturing processes, today's chips have powerful functions, and such powerful chips usually generate a lot of heat energy during operation. However, most of the molding compounds used in chip packages have low thermal conductivity. Therefore, the heat generated by the chips is not easily dissipated from the molding materials and is easy to accumulate, resulting in the temperature of the chips. Rise and reduce performance, and even overheat (overheat) may cause chip damage.
本創作至少一實施例提供一種晶片封裝體,其包括散熱接墊來幫助熱能散逸。At least one embodiment of the present invention provides a chip package that includes heat dissipation pads to help heat dissipation.
本創作另一實施例提供一種電路板總成,其包括上述晶片封裝體。Another embodiment of the present invention provides a circuit board assembly, which includes the above-mentioned chip package.
本創作另一實施例提供一種電子裝置,其包括上述晶片封裝體。Another embodiment of the present invention provides an electronic device, which includes the above-mentioned chip package.
本創作至少一實施例所提供的晶片封裝體包括載板與第一晶片。載板包括絕緣部、線路結構、散熱接墊、導熱部與第一晶片。絕緣部具有第一表面、相對第一表面的第二表面、以及位於第一表面與第二表面之間的側壁面。線路結構位於絕緣部中,其中線路結構的一部分裸露於第一表面。散熱接墊固設於側壁面。導熱部位於絕緣部中,並熱耦接散熱接墊。第一晶片裝設於第一表面,並電性連接線路結構,其中第一晶片熱耦接導熱部。The chip package provided by at least one embodiment of the present invention includes a carrier board and a first chip. The carrier board includes an insulating part, a circuit structure, a heat dissipation pad, a heat conduction part and a first chip. The insulating portion has a first surface, a second surface opposite to the first surface, and a sidewall surface located between the first surface and the second surface. The circuit structure is located in the insulating part, and a part of the circuit structure is exposed on the first surface. The heat dissipation pad is fixed on the side wall surface. The heat-conducting part is located in the insulating part and is thermally coupled to the heat-dissipating pad. The first chip is mounted on the first surface and is electrically connected to the circuit structure, wherein the first chip is thermally coupled to the heat conducting part.
在本創作至少一實施例中,上述導熱部與散熱接墊兩者皆與線路結構彼此分離及電性絕緣,而第一晶片電性絕緣於導熱部與散熱接墊。In at least one embodiment of the present invention, both the heat-conducting portion and the heat-dissipating pad are separated from the circuit structure and electrically insulated from each other, and the first chip is electrically insulated from the heat-conducting part and the heat-dissipating pad.
在本創作至少一實施例中,上述導熱部包括導熱墊與連接件。導熱墊位於第一表面,並熱耦接第一晶片,其中第一晶片配置於導熱墊。連接件位於絕緣部中,並熱耦接導熱墊與散熱接墊。In at least one embodiment of the present invention, the above-mentioned heat-conducting part includes a heat-conducting pad and a connecting member. The thermal pad is located on the first surface and is thermally coupled to the first chip, wherein the first chip is disposed on the thermal pad. The connector is located in the insulating part, and thermally couples the heat-conducting pad and the heat-dissipating pad.
在本創作至少一實施例中,上述導熱墊連接散熱接墊,且導熱墊與散熱接墊為一體成型。In at least one embodiment of the present invention, the aforementioned thermal pad is connected to the thermal pad, and the thermal pad and the thermal pad are integrally formed.
在本創作至少一實施例中,上述第一晶片具有連接墊,而連接墊熱耦接導熱墊,並與線路結構電性絕緣。In at least one embodiment of the present invention, the above-mentioned first chip has a connection pad, and the connection pad is thermally coupled to the thermal pad and is electrically insulated from the circuit structure.
在本創作至少一實施例中,上述連接件包括金屬層與至少一金屬件。金屬層直接接觸散熱接墊。金屬件位於金屬層與導熱墊之間,並連接金屬層與導熱墊。In at least one embodiment of the present invention, the above-mentioned connecting member includes a metal layer and at least one metal member. The metal layer directly contacts the heat dissipation pad. The metal piece is located between the metal layer and the heat-conducting pad, and connects the metal layer and the heat-conducting pad.
在本創作至少一實施例中,上述連接件包括多個金屬件,且這些金屬件為多根金屬柱。In at least one embodiment of the present invention, the above-mentioned connecting member includes a plurality of metal members, and these metal members are a plurality of metal pillars.
在本創作至少一實施例中,上述絕緣部包括多層彼此堆疊的絕緣層,而這些絕緣層其中兩層分別具有第一表面與第二表面。線路結構包括至少一內層線路層與兩層外層線路層。這些外層線路層分別位於第一表面與第二表面,其中位於第一表面的外層線路層電性連接第一晶片,而內層線路層與金屬層位於其中兩層絕緣層之間。In at least one embodiment of the present invention, the above-mentioned insulating portion includes a plurality of insulating layers stacked on each other, and two of the insulating layers have a first surface and a second surface, respectively. The circuit structure includes at least one inner circuit layer and two outer circuit layers. The outer circuit layers are located on the first surface and the second surface, respectively. The outer circuit layer on the first surface is electrically connected to the first chip, and the inner circuit layer and the metal layer are located between the two insulating layers.
在本創作至少一實施例中,上述晶片封裝體更包括第二晶片,其配置於第二表面,並電性連接線路結構。第二晶片熱耦接導熱部,並電性絕緣於導熱部與散熱接墊。In at least one embodiment of the present invention, the aforementioned chip package further includes a second chip disposed on the second surface and electrically connected to the circuit structure. The second chip is thermally coupled to the heat-conducting part, and is electrically insulated from the heat-conducting part and the heat-dissipating pad.
在本創作至少一實施例中,上述導熱部包括多個導熱墊與多個連接件。這些導熱墊分別位於第一表面與第二表面,並分別熱耦接第一晶片與第二晶片,其中第一晶片與第二晶片分別配置於這些導熱墊。這些連接件連接這些導熱墊與散熱接墊。In at least one embodiment of the present invention, the above-mentioned heat conducting part includes a plurality of heat conducting pads and a plurality of connecting members. The thermally conductive pads are respectively located on the first surface and the second surface, and are thermally coupled to the first chip and the second chip, respectively, wherein the first chip and the second chip are respectively disposed on the thermally conductive pads. These connectors connect the thermal pads and the thermal pads.
在本創作至少一實施例中,上述第二晶片的晶背熱耦接位於第二表面的導熱墊。In at least one embodiment of the present invention, the backside of the second chip is thermally coupled to the thermal pad on the second surface.
在本創作至少一實施例中,各個連接件包括金屬層與至少一金屬件。金屬層直接接觸散熱接墊,而金屬件位於相鄰的金屬層與導熱墊之間,並連接相鄰的金屬層與導熱墊。In at least one embodiment of the present invention, each connecting member includes a metal layer and at least one metal member. The metal layer directly contacts the heat dissipation pad, and the metal piece is located between the adjacent metal layer and the thermal pad, and connects the adjacent metal layer and the thermal pad.
在本創作至少一實施例中,上述絕緣部包括多層彼此堆疊的絕緣層,而這些絕緣層其中兩層分別具有第一表面與第二表面。線路結構包括至少一內層線路層與兩層外層線路層。這些外層線路層分別位於第一表面與第二表面,其中位於第一表面的外層線路層電性連接第一晶片,而內層線路層與這些金屬層位於其中兩層絕緣層之間。In at least one embodiment of the present invention, the above-mentioned insulating portion includes a plurality of insulating layers stacked on each other, and two of the insulating layers have a first surface and a second surface, respectively. The circuit structure includes at least one inner circuit layer and two outer circuit layers. The outer circuit layers are located on the first surface and the second surface, respectively. The outer circuit layer on the first surface is electrically connected to the first chip, and the inner circuit layer and the metal layers are located between two insulating layers.
在本創作至少一實施例中,上述晶片封裝體更包括線路組件,其中第二晶片位於載板與線路組件之間,而線路組件電性連接第二晶片與載板。In at least one embodiment of the present invention, the aforementioned chip package further includes a circuit assembly, wherein the second chip is located between the carrier board and the circuit assembly, and the circuit assembly is electrically connected to the second chip and the carrier board.
本創作至少一實施例所提供的電路板總成包括線路基板與上述晶片封裝體。線路基板包括主體、導熱件與線路層,其中導熱件與線路層皆位於主體上。晶片封裝體裝設於線路基板的主體上,並電性連接線路層,其中散熱接墊熱耦接導熱件。The circuit board assembly provided by at least one embodiment of the present invention includes a circuit substrate and the aforementioned chip package. The circuit substrate includes a main body, a heat-conducting element and a circuit layer, wherein the heat-conducting element and the circuit layer are both located on the main body. The chip package is mounted on the main body of the circuit substrate and is electrically connected to the circuit layer, wherein the heat dissipation pad is thermally coupled to the heat conduction element.
在本創作至少一實施例中,上述導熱件包括固定部與導熱片。固定部固定於主體上,而導熱片連接固定部,並從固定部延伸,其中導熱片熱耦接散熱接墊。In at least one embodiment of the present invention, the above-mentioned heat-conducting member includes a fixing part and a heat-conducting sheet. The fixing part is fixed on the main body, and the heat conducting sheet is connected to the fixing part and extends from the fixing part, wherein the heat conducting sheet is thermally coupled to the heat dissipation pad.
在本創作至少一實施例中,上述第一晶片位於線路基板與載板之間。In at least one embodiment of the present invention, the above-mentioned first chip is located between the circuit substrate and the carrier board.
本創作至少一實施例所提供的電子裝置包括殼體、線路圖案、上述晶片封裝體與散熱部。殼體具有表面,而線路圖案位於此表面上。晶片封裝體裝設於上述殼體的表面上,並電性連接線路圖案。散熱部熱耦接散熱接墊。The electronic device provided by at least one embodiment of the present invention includes a casing, a circuit pattern, the aforementioned chip package, and a heat sink. The shell has a surface, and the circuit pattern is located on this surface. The chip package is mounted on the surface of the casing and is electrically connected to the circuit pattern. The heat dissipating part is thermally coupled to the heat dissipating pad.
在本創作至少一實施例中,上述第一晶片位於殼體的表面與載板之間。In at least one embodiment of the present invention, the above-mentioned first chip is located between the surface of the housing and the carrier.
在本創作至少一實施例中,上述殼體包括基底與壁體。基底具有上述表面,而壁體連接基底,並位於散熱接墊的對面,其中散熱部位於壁體與散熱接墊之間。In at least one embodiment of the present invention, the above-mentioned housing includes a base and a wall. The base has the above-mentioned surface, and the wall is connected to the base and is located opposite to the heat dissipation pad, wherein the heat dissipation portion is located between the wall and the heat dissipation pad.
基於上述,利用上述導熱部與散熱接墊,晶片封裝體內的晶片(例如第一晶片)所產生的熱能可以迅速地從散熱接墊散逸,以減少或避免熱能堆積,從而避免晶片因過熱而降低效能或損壞。Based on the above, by using the heat conduction part and the heat dissipation pad, the heat generated by the chip (such as the first chip) in the chip package can be quickly dissipated from the heat dissipation pad to reduce or avoid the accumulation of heat, thereby preventing the chip from being degraded due to overheating. Effectiveness or damage.
在以下的內文中,為了清楚呈現本案的技術特徵,圖式中的元件(例如層、膜、基板以及區域等)的尺寸(例如長度、寬度、厚度與深度)會以不等比例的方式放大。因此,下文實施例的說明與解釋不受限於圖式中的元件所呈現的尺寸與形狀,而應涵蓋如實際製程及/或公差所導致的尺寸、形狀以及兩者的偏差。例如,圖式所示的平坦表面可以具有粗糙及/或非線性的特徵,而圖式所示的銳角可以是圓的。所以,本案圖式所呈示的元件主要是用於示意,並非旨在精準地描繪出元件的實際形狀,也非用於限制本案的申請專利範圍。In the following text, in order to clearly present the technical features of the case, the dimensions (such as length, width, thickness, and depth) of the elements (such as layers, films, substrates, and regions) in the drawings will be enlarged in unequal proportions. . Therefore, the description and explanation of the following embodiments are not limited to the size and shape presented by the elements in the drawings, but should cover the size, shape, and deviation of the two caused by actual manufacturing processes and/or tolerances. For example, the flat surface shown in the drawing may have rough and/or non-linear characteristics, and the acute angle shown in the drawing may be round. Therefore, the elements shown in the drawings of this case are mainly used for illustration, and are not intended to accurately depict the actual shape of the elements, nor are they used to limit the scope of patent applications in this case.
其次,本案內容中所出現的「約」、「近似」或「實質上」等這類用字不僅涵蓋明確記載的數值與數值範圍,而且也涵蓋所屬技術領域中具有通常知識者所能理解的可允許偏差範圍,其中此偏差範圍可由測量時所產生的誤差來決定,而此誤差例如是起因於測量系統或製程條件兩者的限制。此外,「約」可表示在上述數值的一個或多個標準偏差內,例如±30%、±20%、±10%或±5%內。本案文中所出現的「約」、「近似」或「實質上」等這類用字可依光學性質、蝕刻性質、機械性質或其他性質來選擇可以接受的偏差範圍或標準偏差,並非單以一個標準偏差來套用以上光學性質、蝕刻性質、機械性質以及其他性質等所有性質。Secondly, the words "about", "approximately" or "substantially" appearing in the content of this case not only cover the clearly recorded value and range of values, but also cover those who have ordinary knowledge in the technical field can understand The allowable deviation range, where the deviation range can be determined by the error generated during the measurement, and the error is, for example, caused by the limitation of the measurement system or the process conditions. In addition, "about" may mean within one or more standard deviations of the aforementioned value, for example within ±30%, ±20%, ±10%, or ±5%. The terms "about", "approximately" or "substantially" appearing in this text can be used to select acceptable deviation ranges or standard deviations based on optical properties, etching properties, mechanical properties, or other properties. The standard deviation applies to all the above optical properties, etching properties, mechanical properties, and other properties.
圖1A至圖1G是本創作至少一實施例的電路板總成的製造流程的示意圖,其中圖1G繪示實質上已完成的電路板總成200的剖面示意圖。請先參閱圖1G,電路板總成200包括晶片封裝體100與線路基板210,其中晶片封裝體100裝設於線路基板210上。線路基板210包括主體211、線路層212與導熱件213,其中導熱件213與線路層212皆位於主體211上。以圖1G為例,導熱件213與線路層212皆位在主體211的同一平面上。1A to 1G are schematic diagrams of the manufacturing process of the circuit board assembly according to at least one embodiment of the present invention, wherein FIG. 1G is a schematic cross-sectional view of the
晶片封裝體100裝設於線路基板210的主體211上,並且電性連接線路層212,其中晶片封裝體100可透過多個焊球B1而裝設於主體211上,並且電性連接線路層212,如圖1G所示。不過,在其他實施例中,晶片封裝體100也可以採用其他方式裝設於主體211上。例如,晶片封裝體100可利用超音波焊接而裝設於主體211上。或者,晶片封裝體100也可採用打線(wire-bonding)方式裝設於主體211及電性連接線路層212。因此,圖1G不限制晶片封裝體100裝設於線路基板210的方式。The
線路基板210可以是單層線路板(single-sided wiring board)、雙面線路板(double-sided wiring board)或多層線路板(multilayer wiring board)。因此,線路基板210可以包括一層或多層線路層(包括線路層212),而圖1G不限制線路基板210所包括的線路層的數量。換句話說,線路基板210可以只包括一層線路層212,或是包括線路層212以及其他至少一線路層。The
例如,當線路基板210為雙面線路板或多層線路板時,主體211可以包括至少一層絕緣層(未標示)以及至少一層線路層(未繪示)。當線路基板210為單層線路板時,主體211可包括一層絕緣層(未標示),但不包括線路層。另外,線路基板210可以是軟式線路板(flexible wiring board)、硬式線路板(rigid wiring board)或軟硬複合線路板(flexible-rigid wiring board)。For example, when the
導熱件213包括固定部A13與導熱片S13,其中導熱片S13連接固定部A13,並從固定部A13延伸,且導熱片S13可沿著遠離線路基板210的方向延伸。固定部A13固定於主體211上。例如,固定部A13可利用膠材貼附於主體211上。導熱件213可以是金屬彈片、金屬箔片、金屬條或散熱鰭片(heat sink),例如銅箔、鋁箔、銅條或鋼片,而固定部A13與導熱片S13可以是一體成型。換句話說,固定部A13與導熱片S13之間不會存有明顯的接縫(seam)或接合點(joint)。The
導熱件213也可以是包括非金屬材料的複合材料。例如,在其他未繪示的實施例中,導熱件213可以包括可撓性基板與導熱層,其中導熱層例如是金屬層或碳材料層,並且形成於可撓性基板上,而可撓性基板可由高分子材料所製成,例如聚醯亞胺(Polyimide,PI))或聚對苯二甲酸乙二酯(Polyethylene Terephthalate, PET)。可撓性基板的一部分可固定在主體211上,另一部分則不固定在主體211上,以使導熱片S13能相對於固定部A13彎曲。此外,前述碳材料層可以是由碳纖維或石墨烯(Graphene)所製成。The
晶片封裝體100包括第一晶片110以及載板150,其中第一晶片110裝設於載板150上。第一晶片110可以是晶粒(die),其為未封裝的晶片,所以第一晶片110的主要材料可以是半導體材料,例如矽或砷化鎵。不過,在其他實施例中,第一晶片110也可以是已封裝的晶片,其可包括封裝載板或導線架(皆未繪示)。因此,第一晶片110不限制是未封裝的晶粒或已封裝的晶片。The
載板150包括絕緣部151與線路結構152,其中線路結構152位於絕緣部151中。絕緣部151具有第一表面151a、相對第一表面151a的第二表面151b以及位於第一表面151a與第二表面151b之間的側壁面151c。以圖1G為例,絕緣部151的上表面與下表面分別為第二表面151b與第一表面151a,而側壁面151c為環形,並沿著第一表面151a與第二表面151b兩者邊緣延伸。The
第一晶片110裝設於第一表面151a,並且電性連接線路結構152。詳細而言,線路結構152的一部分裸露於第一表面151a,而第一晶片110可以採用覆晶(flip chip)方式裝設於第一表面151a,並從第一表面151a電性連接線路結構152。以圖1G為例,第一晶片110可利用多個焊球B1連接裸露於第一表面151a的部分線路結構152。此外,第一晶片110可以位於線路基板210與載板150之間,如圖1G所示。The
載板150實質上可以是線路板,而線路結構152包括至少一層內層線路層152a以及兩層外層線路層152b,其中內層線路層152a位於這兩層外層線路層152b之間。以圖1G為例,線路結構152包括兩層內層線路層152a與兩層外層線路層152b,所以載板150具有四層線路,其中這些外層線路層152b分別位於第一表面151a與第二表面151b,而位於第一表面151a的外層線路層152b電性連接第一晶片110。The
絕緣部151包括多層彼此堆疊的絕緣層L51、L52與L53,其中這些絕緣層L51、L52與L53的主要材料可以包括樹脂。絕緣層L52夾置在絕緣層L51與L53之間,而其中的兩層絕緣層L51與L53分別具有第一表面151a與第二表面151b,所以第一晶片110會鄰接絕緣層L51。The insulating
這些絕緣層L51、L52與L53、這些內層線路層152a以及這些外層線路層152b彼此堆疊,其中這些絕緣層L51、L52與L53每一個會夾置在這些內層線路層152a與這些外層線路層152b其中兩層之間。以圖1G為例,絕緣層L52夾置在兩層內層線路層152a之間,而絕緣層L51或L53夾置在相鄰的內層線路層152a與外層線路層152b之間。The insulating layers L51, L52, and L53, the
線路結構152可以還包括多個導電柱V52,其中這些導電柱V52位於絕緣部151內。例如,這些導電柱V52分布在絕緣層L51、L52與L53中,如圖1G所示。這些導電柱V52連接這些內層線路層152a與這些外層線路層152b,以使電流能在這些內層線路層152a與這些外層線路層152b內傳遞。此外,圖1G所示的導電柱V52為導電盲孔結構(conductive blind via structure),但在其他實施例中,導電柱V52也可以是導電通孔結構(conductive through hole structure)或導電埋孔結構(conductive embedded hole structure)。The
在本實施例中,晶片封裝體100可以還包括模封材料191、多根金屬柱192與多個線路接墊193。模封材料191覆蓋第一晶片110與第一表面151a,並包覆第一晶片110,其中模封材料191可位於載板150與線路基板210之間。這些金屬柱192貫穿模封材料191,並且連接這些線路接墊193與其中一層外層線路層152b,而這些線路接墊193分別連接這些焊球B1,以使這些金屬柱192能透過這些線路接墊193與這些焊球B1而電性連接線路基板210的線路層212。如此,第一晶片110能透過載板150、金屬柱192、線路接墊193與焊球B1而電性連接線路基板210。In this embodiment, the
須說明的是,在其他實施例中,第一晶片110可僅透過載板150與焊球B1而電性連接線路基板210,而載板150可位於第一晶片110與線路基板210之間。換句話說,模封材料191與第一晶片110可配置於第二表面151b,其中這些焊球B1可連接於下方的外層線路層152b與線路基板210。因此,圖1G所示的金屬柱192與線路接墊193可以省略,以使第一晶片110能在沒有金屬柱192與線路接墊193的條件下電性連接線路基板210。It should be noted that in other embodiments, the
載板150還包括散熱接墊153與導熱部154,其中散熱接墊153固設於側壁面151c,而導熱部154位於絕緣部151中。散熱接墊153熱耦接導熱件213的導熱片S13,其中本案所述的「熱耦接」是指兩物體直接接觸,或是兩物體之間設置散熱膠、散熱膏或散熱墊等高熱導率材料,以使熱能可以迅速地在這兩物體之間傳遞。The
以圖1G為例,導熱片S13與散熱接墊153之間可以配置具有高熱導率的導熱材料HD1,其例如是散熱膠、散熱膏或散熱墊,其中導熱材料HD1可以是銀膠、錫膏、錫膠或銅膏,或是由碳材料所製成的膠材或墊片,其中此碳材料例如是碳纖維或石墨烯。或者,導熱材料HD1也可以是具有電性絕緣特性的導熱高分子材料。如此,熱能可以在導熱片S13與散熱接墊153之間迅速傳遞。Taking FIG. 1G as an example, a thermal conductive material HD1 with high thermal conductivity can be arranged between the thermal conductive sheet S13 and the
此外,在其他實施例中,導熱片S13也可以直接接觸於散熱接墊153,並且可以透過超音波焊接而直接連接散熱接墊153。或者,導熱件213可以是金屬彈片,而導熱片S13可以利用彈力壓觸散熱接墊153,以使導熱片S13抵觸散熱接墊153,但導熱片S13不連接散熱接墊153。所以,導熱片S13與散熱接墊153之間不限制要配置導熱材料HD1。In addition, in other embodiments, the thermal conductive sheet S13 may also directly contact the
導熱部154熱耦接散熱接墊153。在本實施例中,導熱部154可直接接觸與連接散熱接墊153。具體而言,導熱部154可包括多個導熱墊154p與多個連接件154c,其中以圖1G為例的導熱部154c包括兩個導熱墊154p與兩個連接件154c。不過,在其他實施例中,導熱部154可以僅包括一個導熱墊154p與一個連接件154c。或者,導熱部154可以包括三個以上的導熱墊154p與三個以上的連接件154c。The
這些導熱墊154p分別位於第一表面151a與第二表面151b,而位於第一表面151a的導熱墊154p熱耦接第一晶片110。以圖1G為例,第一晶片110與其相鄰的導熱墊154p之間可配置導熱材料HD1,以使熱能可在第一晶片110與其相鄰的導熱墊154p之間迅速傳遞。The thermally
這些連接件154c連接並熱耦接這些導熱墊154p與散熱接墊153,而導熱墊154p可以連接散熱接墊153,其中導熱墊154p與散熱接墊153可以是一體成型。換句話說,導熱墊154p與散熱接墊153之間不會存有明顯的接縫或接合點。此外,這些導熱墊154p皆與線路結構152彼此分離,以使各個導熱墊154p與線路結構152彼此電性絕緣。也就是說,在線路結構152內傳遞的電流不會流到導熱墊154p與散熱接墊153。The
各個連接件154c可以包括金屬層M41與多個金屬件M42。金屬層M41直接接觸並連接散熱接墊153,所以金屬層M41熱耦接散熱接墊153。這些內層線路層152a與這些金屬層M41皆位於這些絕緣層L51與L53之間,並且位於絕緣層L52的相對兩側。Each connecting
以圖1G為例,位於上方的內層線路層152a與金屬層M41皆位於絕緣層L53與L52之間,而位於下方的內層線路層152a與金屬層M41皆位於絕緣層L52與L51之間。此外,位於絕緣層L52同一側的內層線路層152a與金屬層M41可以是由同一層金屬層經光刻後而形成。不過,金屬層M41與內層線路層152a彼此分離,以使這些金屬層M41與線路結構152彼此電性絕緣。Taking FIG. 1G as an example, the upper
這些金屬件M42位於金屬層M41與導熱墊154p之間,並連接金屬層M41與導熱墊154p。在圖1G所示的實施例中,這些金屬件M42可直接接觸並連接金屬層M41與導熱墊154p,以使各個金屬件M42熱耦接金屬層M41與導熱墊154p。These metal pieces M42 are located between the metal layer M41 and the
各個金屬件M42可為金屬柱,而金屬件M42與導電柱V52兩者的形狀與形成方法皆可相同。例如,金屬件M42與導電柱V52可以是在同一道電鍍製程中形成,而且兩者形狀可相同於導電盲孔結構。此外,各個金屬件M42與線路結構152彼此分離,以使這些金屬件M42與線路結構152彼此電性絕緣。Each metal member M42 may be a metal pillar, and the shape and forming method of both the metal member M42 and the conductive pillar V52 may be the same. For example, the metal part M42 and the conductive pillar V52 can be formed in the same electroplating process, and the shapes of the two can be the same as the conductive blind hole structure. In addition, the metal parts M42 and the
因此,這些金屬層M41與這些金屬件M42皆與線路結構152彼此電性絕緣,以使各個連接件154c與線路結構152彼此電性絕緣。由於各個導熱墊154p與線路結構152也彼此電性絕緣,因此導熱部154與散熱接墊153兩者皆與線路結構152彼此分離及電性絕緣。換句話說,在電路板總成200正常運作下,線路結構152內傳遞的電流不會傳遞至導熱部154與散熱接墊153。Therefore, the metal layers M41 and the metal members M42 are electrically insulated from the
第一晶片110熱耦接導熱部154,因此第一晶片110能透過導熱部154而熱耦接散熱接墊153。在圖1G所示的實施例中,第一晶片110可以具有連接墊111,其中在第一晶片110正常運作下,不會有任何電流在連接墊111內傳遞。換句話說,第一晶片110不會從連接墊111輸出任何電訊號,也不會從連接墊111接收任何電訊號,所以連接墊111與線路結構152電性絕緣。The
連接墊111熱耦接導熱墊154p。例如,連接墊111與導熱墊154p之間可以配置導熱材料HD1,以使連接墊111透過導熱材料HD1而熱耦接導熱墊154p,如圖1G所示。或者,連接墊111也可以直接接觸導熱墊154p,甚至連接墊111可以直接連接導熱墊154p。例如,連接墊111可利用超音波焊接而直接連接導熱墊154p。The
在第一晶片110正常運作下,連接墊111內不會有任何電流傳遞,因此縱使連接墊111直接接觸導熱墊154p,第一晶片110依然與導熱墊154p電性絕緣,以至於第一晶片110會與導熱部154電性絕緣。此外,第一晶片110與散熱接墊153彼此分離,以使第一晶片110也會與散熱接墊153電性絕緣。也就是說,第一晶片110會電性絕緣於散熱接墊153與導熱部154。因此,在正常情況下,散熱接墊153與導熱部154兩者與第一晶片110之間不會有電流傳遞。Under the normal operation of the
由於第一晶片110能透過導熱部154而熱耦接散熱接墊153,因此運作中的第一晶片110所產生的熱能可以經由導熱部154迅速地傳遞至散熱接墊153,以減少或避免熱能堆積於第一晶片110,進而避免第一晶片110的溫度過高。其次,散熱接墊153熱耦接導熱件213,因此第一晶片110的熱能可從散熱接墊153迅速地傳遞至線路基板210的導熱件213,以幫助熱能散逸,從而避免第一晶片110因過熱而降低效能或損壞。Since the
晶片封裝體100可包括多個晶片。以圖1G為例,晶片封裝體100可更包括第二晶片120,其可相同於第一晶片110。第二晶片120可配置於第二表面151b,並熱耦接導熱部154。所以,載板150可位於第一晶片110與第二晶片120之間。導熱部154的這些導熱墊154p分別位於第一表面151a與第二表面151b,並分別熱耦接第一晶片110與第二晶片120,其中第一晶片110與第二晶片120分別配置於這些導熱墊154p。The
第二晶片120的晶背(未標示)可熱耦接位於第二表面151b的導熱墊154p。例如,第二晶片120的晶背可直接接觸於導熱墊154p。因此,第二晶片120能透過導熱部154而熱耦接散熱接墊153與導熱件213,以使第二晶片120所產生的熱能也能從散熱接墊153迅速地傳遞至線路基板210的導熱件213,幫助熱能散逸,從而避免第二晶片120因過熱而降低效能或損壞。The crystal back (not labeled) of the
此外,第二晶片120電性連接線路結構152,所以第二晶片120可以透過載板150而電性連接線路基板210。由於導熱部154與散熱接墊153兩者皆與線路結構152電性絕緣,而且第二晶片120是以晶背熱耦接導熱墊154p,因此第二晶片120未電性連接導熱墊154p,並且電性絕緣於導熱部154與散熱接墊153。In addition, the
在本實施例中,晶片封裝體100可以更包括線路組件160,其中第二晶片120位於載板150與線路組件160之間,而線路組件160電性連接第二晶片120與載板150,以使第二晶片120能透過線路組件160而電性連接載板150。此外,線路組件160實質上可以是線路板。In this embodiment, the
以圖1G為例,線路組件160可以包括絕緣層161、多層線路層162與多個導電柱V62。這些線路層162分別形成於絕緣層161的相對兩側,即絕緣層161夾置在這些線路層162之間。這些導電柱V62位於絕緣層161中,並連接這些線路層162,以使這些線路層162能透過導電柱V62而彼此電性連接。Taking FIG. 1G as an example, the
第二晶片120電性連接鄰近載板150的線路層162,其中第二晶片120可用覆晶方式電性連接線路層162。也就是說,第二晶片120可透過多個焊球B1而電性連接線路層162。此外,第二晶片120可被模封材料191覆蓋與包覆,而模封材料191與其所包覆的第二晶片120可位在載板150與線路組件160之間,如圖1G所示。The
覆蓋及包覆第二晶片120的模封材料191也可以被多根金屬柱192貫穿,而這些金屬柱192連接相鄰的線路層162與外層線路層152b,以電性連接線路組件160與載板150。例如,金屬柱192可利用超音波焊接或焊球B1而電性連接相鄰的線路層162與外層線路層152b。如此,第二晶片120能透過線路組件160與載板150而電性連接線路基板210。The
載板150可還包括兩層絕緣保護層159a與159b。這些絕緣保護層159a與159b分別位於絕緣部151的相對第一表面151a與第二表面151b,其中絕緣保護層159a與159b皆具有多個開口(未標示),以暴露導熱墊154p與部分外層線路層152b,以使外層線路層152b能電性連接第一晶片110與線路組件160,而這些導熱墊154p能分別熱耦接第一晶片110與第二晶片120。此外,絕緣保護層159a與159b可以是防焊層。The
線路組件160可以還包括兩層絕緣保護層169,其中絕緣保護層169也可以是防焊層。這些絕緣保護層169分別位於絕緣層161的相對兩側,其中這些絕緣保護層169皆具有多個開口,以局部暴露這些線路層162。如此,下方的線路層162能電性連接這些金屬柱192與第二晶片120,而上方的線路層162可供其他電子元件(未繪示)裝設。此外,在其他實施例中,上方的絕緣保護層169可以不具有任何開口,以全面性地覆蓋絕緣層161。The
特別一提的是,在其他實施例中,晶片封裝體100可以只包括一塊晶片。例如,晶片封裝體100可以包括第一晶片110與第二晶片120僅其中一者。因此,導熱部154可以僅包括一個導熱墊154p與一個連接件154c來熱耦接單一個晶片(例如第一晶片110或第二晶片120)。換句話說,圖1G中的第一晶片110與第二晶片120其中一者不僅可以被省略,而被省略的晶片所熱耦接的一組連接件154c與導熱墊154p也可以被省略。因此,圖1G不限制晶片封裝體100中的晶片的數量、連接件154c的數量以及導熱墊154p的數量。In particular, in other embodiments, the
在圖1G所示的實施例中,載板150包括多層內層線路層152a(圖1G繪示兩層內層線路層152a),但在其他實施例中,載板150也可以只包括一層內層線路層152a,或是不包括任何內層線路層152a。因此,圖1G不限制載板150所包括的內層線路層152a的數量。In the embodiment shown in FIG. 1G, the
其次,圖1G所示的晶片封裝體100包括線路組件160,但在其他實施例中,晶片封裝體100可不包括線路組件160,而第一晶片110與第二晶片120兩者可裝設於第一表面151a與第二表面151b其中至少一面。例如,第一晶片110與第二晶片120分別裝設於第一表面151a與第二表面151b。或者,第一晶片110與第二晶片120裝設於線路基板210的同一表面(即第一表面151a或第二表面151b)。如此,第一晶片110與第二晶片120可透過載板150而電性連接線路基板210。此外,第一晶片110與第二晶片120也可利用覆晶或打線方式裝設於載板150上。因此,圖1G不限制第一晶片110與第二晶片120兩者與線路基板210之間的電性連接方式。Secondly, the
此外,在其他實施例中,第一晶片110的晶背(未標示)也可以熱耦接位於第一表面151a的導熱墊154p,而第二晶片120可具有連接墊,其如同第一晶片110的連接墊111,其中第二晶片120的連接墊可以熱耦接位於第二表面151b的導熱墊154p。因此,圖1G不限制第一晶片110與第二晶片120兩者與導熱墊154p之間的熱耦接方式。In addition, in other embodiments, the backside (not labeled) of the
以下將配合圖1A至圖1G說明電路板總成200的製造流程。須說明的是,由於載板150可以只包括一層內層線路層152a,或是不包括任何內層線路層152a,而且晶片封裝體100可以只包括一塊晶片(例如第一晶片110與第二晶片120僅其中一者),或是包括三塊以上的晶片,因此電路板總成200的製造流程有多種,而圖1A至圖1G僅揭露其中至少一種電路板總成200的製造流程。The manufacturing process of the
請參閱圖1A,在電路板總成200的製造流程中,首先,提供核心基板15,其中核心基板15可以包括絕緣層L52、多個內層線路層152a、多個金屬層M41與多個導電柱V52。接著,在核心基板15的相對兩側上分別形成絕緣層L51與L53。此時,絕緣層L51與L53全面性覆蓋這些金屬層M41與這些內層線路層152a。1A, in the manufacturing process of the
請參閱圖1B與圖1C,其中圖1C是俯視示意圖,而圖1B是圖1C中沿線1B-1B剖面而繪製的剖面示意圖。接著,在絕緣層L51與L53上形成多個盲孔H51與H52,並且在這些絕緣層L51、L52與L53中形成多個溝槽T51。這些盲孔H51與H52可用雷射鑽孔或機械鑽孔來形成,而這些溝槽T51可用外形切割(routing)來形成。須說明的是,圖1C是在省略這些盲孔H51、H52與這些內層線路層152a的條件下而繪製,所以這些盲孔H51與H52繪示於圖1B中,未繪示於圖1C。Please refer to FIGS. 1B and 1C, wherein FIG. 1C is a schematic top view, and FIG. 1B is a schematic cross-sectional view drawn along the
各個溝槽T51是從絕緣層L51的第一表面151a延伸至絕緣層L53的第二表面151b,所以這些溝槽T51是貫穿絕緣層L51、L52與L53而形成。另外,核心基板15具有多個單顆(Unit)15u以及切割道(scribe-line cut)15c,其中這些單顆15u可呈陣列排列。切割道15c的形狀可為網狀,並分布於這些單顆15u的周圍。這些溝槽T51位於切割道15c中,並分別鄰接這些單顆15u。這些溝槽T51彼此分離而未相通,所以這些單顆15u仍彼此相連。因此,在剛形成這些溝槽T51之後,核心基板15仍維持單一塊基板,未被切割成多塊分離的單顆15u。Each trench T51 extends from the
請參閱圖1D,接著,在這些盲孔H51與H52內分別形成多個金屬件M42與多個導電柱V52,其中金屬件M42形成於盲孔H51內,而導電柱V52形成於盲孔H52內。在第一表面151a與第二表面151b上分別形成兩外層線路層152b與多個導熱墊154p,以及在這些溝槽T51內分別形成多個散熱接墊153。1D, then, a plurality of metal parts M42 and a plurality of conductive pillars V52 are respectively formed in the blind holes H51 and H52, wherein the metal parts M42 are formed in the blind holes H51, and the conductive pillars V52 are formed in the blind holes H52 . Two outer circuit layers 152b and a plurality of
形成金屬件M42、導電柱V52、外層線路層152b、多個導熱墊154p以及散熱接墊153的方法可包括微影與電鍍,其中金屬件M42、導熱墊154p與散熱接墊153可在同一道電鍍製程中製造。彼此相連的金屬件M42、導熱墊154p與散熱接墊153可以是一體成型。換句話說,金屬件M42、導熱墊154p與散熱接墊153三者相連之處不會存有明顯的接縫或接合點。之後,沿著切割道15c(請參閱圖1C)切割這些絕緣層L51、L53以及核心基板15,以形成多個彼此分離的載板150。The method of forming the metal part M42, the conductive pillar V52, the
請參閱圖1E與圖1F,其中圖1E是俯視示意圖,而圖1F是圖1E中沿線1F-1F剖面而繪製的剖面示意圖。接著,可以在第一表面151a與第二表面151b上分別形成絕緣保護層159a與159b,其中絕緣保護層159a與159b會暴露導熱墊154p以及局部暴露這些外層線路層152b。接著,將第一晶片110裝設於第一表面151a上。之後,可在第一表面151a上形成覆蓋及包覆第一晶片110的模封材料191。接著,可形成貫穿模封材料191的多個金屬柱192與多個線路接墊193,其中這些線路接墊193分別電性連接這些金屬柱192。Please refer to FIGS. 1E and 1F, in which FIG. 1E is a schematic top view, and FIG. 1F is a schematic cross-sectional view drawn along the
請參閱圖1G,接著,可裝設第二晶片120於第二表面151b上,並形成線路組件160,其中線路組件160可利用疊層法或增層法來形成。至此,晶片封裝體100大致上已製造完成。接著,將晶片封裝體100裝設於線路基板210上,以形成電路板總成200,其中晶片封裝體100的散熱接墊153熱耦接於線路基板210的導熱件213。Please refer to FIG. 1G. Next, the
圖2A是本創作另一實施例的電子裝置的剖面示意圖。請參閱圖2A,本實施例的電子裝置400可以是智慧手機、筆記型電腦、平板電腦、桌上型電腦或顯示器,並包括晶片封裝體300、殼體410與線路圖案420。殼體410具有表面411a,其中線路圖案420位於表面411a上,而晶片封裝體300裝設於表面411a上,並電性連接線路圖案420。以圖2A為例,晶片封裝體300可利用超音波焊接而電性連接線路圖案420。或者,晶片封裝體300也可利用打線或多個焊球B1(請參閱圖1G)而電性連接線路圖案420。FIG. 2A is a schematic cross-sectional view of an electronic device according to another embodiment of the invention. 2A, the
線路圖案420可以利用化學電鍍而形成在表面411a。具體而言,殼體410可以具有多個觸媒顆粒(未繪示),其中這些觸媒顆粒在被活化後能與電鍍液內的離子發生化學反應,以使離子被還原成金屬沉積物,從而形成線路圖案420。活化觸媒顆粒的方法可以是雷射照射。也就是說,觸媒顆粒被雷射照射之後會活化,進而能還原離子。有關上述觸媒顆粒以及線路圖案420的形成,可以參考台灣公告號I362906與I361643專利案。The
晶片封裝體300與前述實施例中的晶片封裝體100相似。舉例來說,晶片封裝體300與100兩者包括相同與相似的元件,例如第一晶片110、第二晶片120、線路組件160、散熱接墊153以及載板350,其中第一晶片110可以位於表面411a與載板350之間。晶片封裝體300與100兩者之間的差異僅在於:載板350所包括的多個連接件354c。The
圖2B是圖2A中的電子裝置400在移除線路組件160與第二晶片120之後的俯視示意圖,其中圖2A是沿著圖2B中的線2A-2A剖面而繪製,而圖2B可呈現導熱墊154p的俯視外貌。請參閱圖2A與圖2B,各個連接件354c可包括金屬層M41與一個金屬件M82,其中金屬件M82為金屬塊,並具有寬度W82與厚度T82,而厚度T82與寬度W82之間的比值可以小於0.2(即1:5)。因此,金屬件M82的寬度W82明顯大過於金屬件M82的厚度T82,如圖2A所示。2B is a schematic top view of the
從圖2B來看,金屬件M82的形狀可以是矩形,而圖2B所示的金屬件M82明顯具有一對短邊與一對長邊(皆未標示),其中寬度W82實質上可以等於金屬件M82的短邊長度,如圖2B所示。這些金屬件M82能將第一晶片110與第二晶片120兩者所產生的熱能迅速地傳遞至散熱接墊153,以幫助熱能散逸,避免或減少熱能堆積於第一晶片110與第二晶片120。From FIG. 2B, the shape of the metal piece M82 can be rectangular, and the metal piece M82 shown in FIG. 2B obviously has a pair of short sides and a pair of long sides (none of them), and the width W82 can be substantially equal to the metal piece. The length of the short side of M82 is shown in Figure 2B. These metal parts M82 can quickly transfer the heat generated by both the
電子裝置400還包括散熱部430,其熱耦接散熱接墊153,其中散熱部430可以是金屬層,而散熱部430的形成方法可以相同於線路圖案420的形成方法。例如,散熱部430可利用上述觸媒顆粒來形成。散熱部430可以利用超音波焊接而直接連接散熱接墊153。或者,散熱部430也可利用導熱材料HD1(請參閱圖1G)而熱耦接散熱接墊153。此外,在其他實施例中,散熱部430可以單純地直接接觸散熱接墊153,但散熱部430與散熱接墊153彼此不連接。The
殼體410可以包括基底411與壁體412,其中壁體412連接基底411。例如,壁體412與基底411為一體成型,且壁體412與基底411兩者材料可為具電絕緣性的塑膠,並可利用射出成型而製成。基底411具有表面411a,而壁體412位於散熱接墊153的對面,其中散熱部430可位於壁體412與散熱接墊153之間。The
須說明的是,在圖2A與圖2B所示的實施例中,散熱部430可為金屬層。然而,在其他實施中,散熱部430可以是電子裝置400的金屬殼體或散熱鰭片,而殼體410可以是一塊沒有壁體412的支撐件,即殼體410可等於基底411。因此,散熱部430不限制是金屬層。此外,圖2A中的第一晶片110與第二晶片120其中一者不僅可以被省略,而被省略的晶片所熱耦接的一組連接件354c與導熱墊154p也可以被省略。因此,圖2A不限制晶片封裝體300中的晶片(例如第一晶片110與第二晶片120)的數量、連接件354c的數量以及導熱墊154p的數量。It should be noted that, in the embodiment shown in FIGS. 2A and 2B, the
值得一提的是,在圖1G所示的晶片封裝體100中,至少一個連接件154c可以替換成如圖2A所示的連接件354c,而圖2A所示的晶片封裝體300也可裝設於線路基板210上。換句話說,晶片封裝體300也能應用於電路板總成200。同樣地,在圖2A所示的晶片封裝體300中,至少一個連接件354c可以替換成圖1G所示的連接件154c,而圖1G所示的晶片封裝體100也可裝設於殼體410,並電性連接線路圖案420,即晶片封裝體100也能應用於電子裝置400。It is worth mentioning that in the
綜上所述,利用上述導熱部與散熱接墊,晶片封裝體內的晶片(例如第一晶片110)所產生的熱能可以迅速地傳遞至散熱接墊,以使熱能散逸於外界環境,進而減少或避免熱能堆積。如此,本創作至少一實施例所揭露的晶片封裝體能避免晶片因過熱而降低效能或損壞,從而有利於封裝現今功能強大的晶片。In summary, by using the heat conducting portion and the heat dissipating pad, the heat generated by the chip (such as the first chip 110) in the chip package can be quickly transferred to the heat dissipating pad, so that the heat is dissipated to the external environment, thereby reducing or Avoid accumulation of heat energy. In this way, the chip package disclosed in at least one embodiment of the present invention can prevent the chip from being degraded or damaged due to overheating, thereby facilitating the packaging of today's powerful chips.
雖然本創作已以實施例揭露如上,然其並非用以限制本創作,本創作所屬技術領域中具有通常知識者,在不脫離本創作精神和範圍內,當可作些許更動與潤飾,因此本創作保護範圍當視後附的申請專利範圍所界定者為準。Although this creation has been disclosed in the above embodiments, it is not intended to limit this creation. Those with ordinary knowledge in the technical field to which this creation belongs can make some changes and modifications without departing from the spirit and scope of this creation. Therefore, this creation The scope of creation protection shall be subject to the scope of the attached patent application.
15:核心基板
15c:切割道
15u:單顆
100、300:晶片封裝體
110:第一晶片
111:連接墊
120:第二晶片
150、350:載板
151:絕緣部
151a:第一表面
151b:第二表面
151c:側壁面
152:線路結構
152a:內層線路層
152b:外層線路層
153:散熱接墊
154:導熱部
154c、354c:連接件
154p:導熱墊
159a、159b、169:絕緣保護層
160:線路組件
161、L51、L52、L53:絕緣層
162、212:線路層
191:模封材料
192:金屬柱
193:線路接墊
200:電路板總成
210:線路基板
211:主體
213:導熱件
410:殼體
411:基底
411a:表面
412:壁體
420:線路圖案
430:散熱部
A13:固定部
B1:焊球
H51、H52:盲孔
HD1:導熱材料
M41:金屬層
M42、M82:金屬件
S13:導熱片
T51:溝槽
T82:厚度
V52、V62:導電柱
W82:寬度
15:
圖1A至圖1G是本創作至少一實施例的電路板總成的製造流程的示意圖。 圖2A是本創作另一實施例的電子裝置的剖面示意圖。 圖2B是圖2A中的電子裝置在移除線路組件與第二晶片之後的俯視示意圖。 1A to 1G are schematic diagrams of the manufacturing process of the circuit board assembly according to at least one embodiment of the present invention. FIG. 2A is a schematic cross-sectional view of an electronic device according to another embodiment of the invention. 2B is a schematic top view of the electronic device in FIG. 2A after the circuit assembly and the second chip are removed.
100:晶片封裝體 100: chip package
110:第一晶片 110: The first chip
111:連接墊 111: connection pad
120:第二晶片 120: second chip
150:載板 150: carrier board
151:絕緣部 151: Insulation part
151a:第一表面 151a: first surface
151b:第二表面 151b: second surface
151c:側壁面 151c: side wall surface
152:線路結構 152: Line structure
152a:內層線路層 152a: inner circuit layer
152b:外層線路層 152b: Outer circuit layer
153:散熱接墊 153: Thermal pad
154:導熱部 154: Heat conduction part
154c:連接件 154c: connector
154p:導熱墊 154p: thermal pad
159a、159b、169:絕緣保護層 159a, 159b, 169: insulating protective layer
160:線路組件 160: line components
161、L51、L52、L53:絕緣層 161, L51, L52, L53: insulating layer
162、212:線路層 162, 212: circuit layer
191:模封材料 191: molding material
192:金屬柱 192: Metal column
193:線路接墊 193: line pad
200:電路板總成 200: Circuit board assembly
210:線路基板 210: circuit board
211:主體 211: Subject
213:導熱件 213: Thermal conductive parts
A13:固定部 A13: Fixed part
B1:焊球 B1: Solder ball
HD1:導熱材料 HD1: Thermally conductive material
M41:金屬層 M41: Metal layer
M42:金屬件 M42: Metal parts
S13:導熱片 S13: Thermal conductive sheet
V52、V62:導電柱 V52, V62: conductive pillar
Claims (20)
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI772170B (en) * | 2021-09-06 | 2022-07-21 | 先豐通訊股份有限公司 | Circuit board with embedded chips and manufacturing method |
TWI772116B (en) * | 2021-07-05 | 2022-07-21 | 大陸商宏恆勝電子科技(淮安)有限公司 | Circuit board with heat dissipation function and manufacturing method |
TWI827178B (en) * | 2022-07-26 | 2023-12-21 | 大陸商鵬鼎控股(深圳)股份有限公司 | Circuit board with embedded elements and method for fabricating the same |
US11924961B2 (en) | 2022-03-11 | 2024-03-05 | Unimicron Technology Corp. | Circuit board and method of manufacturing the same |
-
2020
- 2020-12-23 TW TW109217023U patent/TWM610519U/en unknown
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI772116B (en) * | 2021-07-05 | 2022-07-21 | 大陸商宏恆勝電子科技(淮安)有限公司 | Circuit board with heat dissipation function and manufacturing method |
TWI772170B (en) * | 2021-09-06 | 2022-07-21 | 先豐通訊股份有限公司 | Circuit board with embedded chips and manufacturing method |
US11924961B2 (en) | 2022-03-11 | 2024-03-05 | Unimicron Technology Corp. | Circuit board and method of manufacturing the same |
TWI827178B (en) * | 2022-07-26 | 2023-12-21 | 大陸商鵬鼎控股(深圳)股份有限公司 | Circuit board with embedded elements and method for fabricating the same |
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