TWM606467U - Chip co-planarity testing equipment - Google Patents

Chip co-planarity testing equipment Download PDF

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Publication number
TWM606467U
TWM606467U TW109211772U TW109211772U TWM606467U TW M606467 U TWM606467 U TW M606467U TW 109211772 U TW109211772 U TW 109211772U TW 109211772 U TW109211772 U TW 109211772U TW M606467 U TWM606467 U TW M606467U
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wafer
optical glass
carrying
coplanarity
plane
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TW109211772U
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Chinese (zh)
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王偉杰
郭溫良
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海華科技股份有限公司
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Publication of TWM606467U publication Critical patent/TWM606467U/en

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Abstract

本創作公開一種晶片共面度檢測設備,其包含至少一個承載模組與一偵測器。所述承載模組包含一承載台及安裝於所述承載台上的一光學玻璃。所述光學玻璃具有位於相反側的一承載平面與一入光面、及形成於所述承載平面的一對位圖案。所述承載平面能用來供至少一個晶片的多個焊墊設置,以使至少一個所述晶片的部分所述焊墊能通過重力而抵接於所述承載平面。所述偵測器對應於所述光學玻璃設置並能通過偵測所述對位圖案而得知所述承載平面的位置,用以偵測每個所述焊墊以得知其與所述承載平面之間的間距。The present invention discloses a chip coplanarity detection device, which includes at least one carrying module and a detector. The carrying module includes a carrying table and an optical glass installed on the carrying table. The optical glass has a bearing plane and a light incident surface on opposite sides, and a pair of patterns formed on the bearing plane. The carrying plane can be used to provide a plurality of bonding pads of at least one chip, so that part of the bonding pads of at least one chip can abut against the carrying plane by gravity. The detector is arranged corresponding to the optical glass and can know the position of the load-bearing plane by detecting the alignment pattern, and is used to detect each of the solder pads to know its relation to the load-bearing The spacing between the planes.

Description

晶片共面度檢測設備Wafer coplanarity testing equipment

本創作涉及一種共面度檢測設備,尤其涉及一種晶片共面度檢測設備。This creation relates to a coplanarity detection equipment, in particular to a wafer coplanarity detection equipment.

現有的共面度檢測設備雖然能用來檢測多個待測物(如:錫球)的共面度,但現有共面度檢測設備是依據多個待測物所提供的資訊,來計算或選擇出所述共面度的判斷基準面(base plane),所以通過現有共面度檢測設備而檢測得知的共面度結果會有較大的誤差。Although the existing coplanarity detection equipment can be used to detect the coplanarity of multiple test objects (such as solder balls), the existing coplanarity detection equipment calculates or The base plane for judging the coplanarity is selected, so the coplanarity result detected by the existing coplanarity detection device will have a larger error.

於是,本創作人認為上述缺陷可改善,乃特潛心研究並配合科學原理的運用,終於提出一種設計合理且有效改善上述缺陷的本創作。Therefore, the author believes that the above-mentioned shortcomings can be improved, and with great concentration of research and the application of scientific principles, finally proposed a reasonable design and effective improvement of the above-mentioned shortcomings.

本創作實施例在於提供一種晶片共面度檢測設備,其能有效地改善現有共面度檢測設備所可能產生的缺陷。The inventive embodiment is to provide a wafer coplanarity inspection device, which can effectively improve the defects that may occur in the existing coplanarity inspection device.

本創作實施例公開一種晶片共面度檢測設備,其包括:至少一個承載模組,包含:一承載台;及一光學玻璃,安裝於所述承載台上,並且所述光學玻璃具有位於相反側的一承載平面與一入光面,所述光學玻璃包含有形成於所述承載平面的一對位圖案;其中,所述承載平面能用來供至少一個晶片的多個焊墊設置,以使至少一個所述晶片的部分所述焊墊能通過重力而抵接於所述承載平面;以及一偵測器,對應於所述光學玻璃設置,所述偵測器能通過偵測所述對位圖案而得知所述承載平面的位置,並且所述偵測器能用來偵測每個所述焊墊以得知其與所述承載平面之間的間距。This creative embodiment discloses a wafer coplanarity detection device, which includes: at least one carrying module, including: a carrying table; and an optical glass installed on the carrying table, and the optical glass has an opposite side A carrying plane and a light-incident surface of the optical glass, the optical glass includes a pair of patterns formed on the carrying plane; wherein the carrying plane can be used to set a plurality of bonding pads of at least one chip, so that At least a part of the bonding pad of the chip can abut against the carrying plane by gravity; and a detector corresponding to the optical glass arrangement, and the detector can detect the alignment The pattern is used to know the position of the carrying plane, and the detector can be used to detect each of the solder pads to know the distance between it and the carrying plane.

優選地,所述承載台包含有位於相反兩側的一第一表面與一第二表面,並且所述承載台形成有自所述第一表面貫穿至所述第二表面的一穿孔,所述光學玻璃設置於所述第一表面,並且所述承載平面與所述對位圖案的位置對應於所述穿孔,以使所述偵測器能通過所述穿孔而偵測所述對位圖案及設置於所述承載平面上的多個所述焊墊。Preferably, the carrying table includes a first surface and a second surface on opposite sides, and the carrying table is formed with a through hole penetrating from the first surface to the second surface, the The optical glass is disposed on the first surface, and the position of the bearing plane and the alignment pattern corresponds to the perforation, so that the detector can detect the alignment pattern and the alignment pattern through the perforation A plurality of the solder pads arranged on the carrying plane.

優選地,至少一個所述承載模組包含有可分離地設置於所述承載台的一定位治具,並且所述定位治具形成有至少一個固持槽,用以收容至少一個所述晶片;所述光學玻璃夾持在所述定位治具與所述承載台之間;所述定位治具形成有連通至少一個所述固持槽的一容置槽,並且所述光學玻璃設置於所述容置槽內。Preferably, at least one of the load-bearing modules includes a positioning jig detachably disposed on the load-bearing platform, and the positioning jig is formed with at least one holding groove for accommodating at least one of the chips; The optical glass is clamped between the positioning jig and the carrying platform; the positioning jig is formed with an accommodation groove communicating with at least one of the holding grooves, and the optical glass is disposed in the accommodation In the slot.

綜上所述,本創作實施例所公開的晶片共面度檢測設備,其通過所述光學玻璃的所述承載平面搭配重力,以穩定地提供其共面度測試中所需的判斷基準面,進而有效地降低因基準面而產生的誤差。In summary, the wafer coplanarity detection device disclosed in this creative embodiment uses the load-bearing plane of the optical glass with gravity to stably provide the judgment reference plane required in the coplanarity test. This effectively reduces the errors caused by the reference plane.

進一步地說,所述偵測器能通過偵測所述對位圖案而得知所述承載平面的位置,並且所述偵測器能用來偵測每個所述焊墊以得知其與所述承載平面之間的間距,進而精準地測得任一個所述晶片的多個所述焊墊的共面度。Furthermore, the detector can know the position of the carrying plane by detecting the alignment pattern, and the detector can be used to detect each of the solder pads to know its The distance between the supporting planes can then accurately measure the coplanarity of the multiple bonding pads of any one of the chips.

為能更進一步瞭解本創作的特徵及技術內容,請參閱以下有關本創作的詳細說明與附圖,但是此等說明與附圖僅用來說明本創作,而非對本創作的保護範圍作任何的限制。In order to have a better understanding of the features and technical content of this creation, please refer to the following detailed descriptions and drawings about this creation, but these descriptions and drawings are only used to illustrate this creation, and not for any protection scope of this creation. limit.

以下是通過特定的具體實施例來說明本創作所公開有關“晶片共面度檢測設備”的實施方式,本領域技術人員可由本說明書所公開的內容瞭解本創作的優點與效果。本創作可通過其他不同的具體實施例加以施行或應用,本說明書中的各項細節也可基於不同觀點與應用,在不悖離本創作的構思下進行各種修改與變更。另外,本創作的附圖僅為簡單示意說明,並非依實際尺寸的描繪,事先聲明。以下的實施方式將進一步詳細說明本創作的相關技術內容,但所公開的內容並非用以限制本創作的保護範圍。The following is a specific embodiment to illustrate the implementation of the "wafer coplanarity detection device" disclosed in this creation, and those skilled in the art can understand the advantages and effects of this creation from the content disclosed in this specification. This creation can be implemented or applied through other different specific embodiments, and various details in this specification can also be modified and changed based on different viewpoints and applications without departing from the concept of this creation. In addition, the drawings in this creation are merely schematic illustrations, and are not depicted in actual size, and are stated in advance. The following embodiments will further describe the related technical content of this creation in detail, but the disclosed content is not intended to limit the protection scope of this creation.

應當可以理解的是,雖然本文中可能會使用到“第一”、“第二”、“第三”等術語來描述各種元件或者信號,但這些元件或者信號不應受這些術語的限制。這些術語主要是用以區分一元件與另一元件,或者一信號與另一信號。另外,本文中所使用的術語“或”,應視實際情況可能包括相關聯的列出項目中的任一個或者多個的組合。It should be understood that although terms such as “first”, “second”, and “third” may be used herein to describe various elements or signals, these elements or signals should not be limited by these terms. These terms are mainly used to distinguish one element from another, or one signal from another signal. In addition, the term "or" used in this document may include any one or a combination of more of the associated listed items depending on the actual situation.

請參閱圖1至圖11所示,其為本創作的一實施例。如圖1至圖4所示,本實施例公開一種晶片共面度檢測設備100,其利用重力來檢測至少一個晶片200的多個焊墊201的共面度。其中,所述晶片共面度檢測設備100包含一U形支架1、分別安裝於所述U形支架1兩個末端部11的兩個承載模組2、位於所述U形支架1內側的一橫向移載機構3、安裝於所述橫向移載機構3且位於所述U形支架1內側的一偵測器4。Please refer to Figures 1 to 11, which are an embodiment of the creation. As shown in FIGS. 1 to 4, this embodiment discloses a wafer coplanarity detection device 100 that uses gravity to detect the coplanarity of a plurality of bonding pads 201 of at least one wafer 200. Wherein, the wafer coplanarity detection device 100 includes a U-shaped bracket 1, two load-bearing modules respectively mounted on the two end portions 11 of the U-shaped bracket 1, and an inner side of the U-shaped bracket 1. The lateral transfer mechanism 3, a detector 4 installed on the lateral transfer mechanism 3 and located inside the U-shaped bracket 1.

需說明的是,所述晶片共面度檢測設備100於本實施例中雖是以包含上述構件來說明,但本創作不以此為限。舉例來說,如圖5所示,所述晶片共面度檢測設備100所包含的所述承載模組2數量可以是一個,並且所述U形支架1則對應調整為L形支架1a。另外,在本創作未繪示的其他實施例中,所述晶片共面度檢測設備100可以省略所述橫向移載機構3,以使所述偵測器4不會移動;又或者,所述晶片共面度檢測設備100也可以省略所述U形支架1與所述橫向移載機構3,而至少一個所述承載模組2與所述偵測器4則是安裝於其他構件上。It should be noted that although the chip coplanarity detection device 100 is described in this embodiment by including the above-mentioned components, the present creation is not limited to this. For example, as shown in FIG. 5, the number of the carrying module 2 included in the wafer coplanarity detection apparatus 100 may be one, and the U-shaped bracket 1 is adjusted to an L-shaped bracket 1a. In addition, in other embodiments not shown in this creation, the wafer coplanarity detection device 100 can omit the lateral transfer mechanism 3 so that the detector 4 does not move; or, the The wafer coplanarity detection device 100 can also omit the U-shaped bracket 1 and the lateral transfer mechanism 3, and at least one of the carrier module 2 and the detector 4 are mounted on other components.

由於圖1至圖4所示的兩個所述承載模組2為大致相同的結構,並且兩個所述承載模組2大致呈對稱狀安裝,所以為便於說明本實施例,以下將先說明單個所述承載模組2的結構,但本創作不以此為限。舉例來說,在本創作未繪示的其他實施例中,所述晶片共面度檢測設備100也可以包含結構略有差異的多個所述承載模組2。Since the two load-bearing modules 2 shown in FIGS. 1 to 4 have substantially the same structure, and the two load-bearing modules 2 are installed substantially symmetrically, in order to facilitate the description of this embodiment, the following will be described first The structure of the single carrier module 2 is not limited to this creation. For example, in other embodiments not shown in the present creation, the wafer coplanarity detection device 100 may also include a plurality of the carrier modules 2 with slightly different structures.

請參閱圖4及圖6至圖11所示,所述承載模組2於本實施例中包含有呈板狀一承載台21(也可視為承載板)、連接於所述承載台21的一縱向移載機構22、安裝於所述承載台21上的一光學玻璃23、及可分離地設置於所述承載台21的一定位治具24,但本創作不受限於此。舉例來說,在本創作未繪示的其他實施例中,所述承載模組2可以省略或以其他構件取代所述縱向移載機構22及/或所述定位治具24;或者,所述承載模組2也可以採用非為板狀的承載台21。Please refer to FIGS. 4 and 6 to 11, the carrying module 2 in this embodiment includes a carrying platform 21 (also regarded as carrying plate) in a plate shape, and a carrying platform 21 connected to the carrying platform 21 The longitudinal transfer mechanism 22, an optical glass 23 installed on the carrying platform 21, and a positioning jig 24 detachably installed on the carrying platform 21, but the invention is not limited to this. For example, in other embodiments not shown in this creation, the carrying module 2 may omit or replace the longitudinal transfer mechanism 22 and/or the positioning fixture 24 with other components; or, the The carrying module 2 can also adopt a carrying platform 21 that is not plate-shaped.

於本實施例中,所述承載台21包含有位於相反兩側的一第一表面211與一第二表面212,並且所述承載台21形成有自所述第一表面211貫穿至所述第二表面212的一穿孔213。其中,所述承載台21的所述穿孔213於本實施例中呈長形且定義有一長度方向L,並且所述穿孔213較佳是自遠離所述縱向移載機構22的所述承載台21一端(如:圖7中的所述承載台21右端)凹設所形成。In this embodiment, the carrying platform 21 includes a first surface 211 and a second surface 212 on opposite sides, and the carrying platform 21 is formed to penetrate from the first surface 211 to the second surface 212 A perforation 213 on the two surfaces 212. Wherein, the perforation 213 of the carrying platform 21 is elongated in this embodiment and defines a length direction L, and the perforation 213 is preferably from the carrying platform 21 away from the longitudinal transfer mechanism 22 One end (for example, the right end of the carrying platform 21 in FIG. 7) is formed by a recess.

需額外說明的是,由於本實施例的承載台21為非透光狀,所以所述承載台21是以形成有所述穿孔213,以利於搭配其他構件來共同實現晶片共面度檢測,但本創作不受限於此。舉例來說,在本創作未繪示的其他實施例中,所述承載台21也可以是呈透光狀且未形成有所述穿孔213。It should be additionally noted that since the carrying table 21 of this embodiment is non-transparent, the carrying table 21 is formed with the perforation 213 to facilitate the co-planarity detection of the wafer with other components, but This creation is not limited to this. For example, in other embodiments not shown in the present creation, the carrying platform 21 may also be light-transmissive and the perforation 213 is not formed.

再者,所述承載台21安裝於所述縱向移載機構22,以使所述縱向移載機構22能使所述承載台21沿著沿垂直所述長度方向L的一方向移動。其中,所述承載台21是以未形成有所述穿孔213的部位安裝於所述縱向移載機構22,以使形成有所述穿孔213的所述承載台21部位呈懸空狀。Furthermore, the carrying platform 21 is installed on the longitudinal transfer mechanism 22 so that the longitudinal transfer mechanism 22 can move the carrying platform 21 along a direction perpendicular to the length direction L. Wherein, the carrying platform 21 is installed in the longitudinal transfer mechanism 22 at a portion where the perforation 213 is not formed, so that the portion of the carrying platform 21 where the perforation 213 is formed is suspended.

所述光學玻璃23於本實施例中為一透明平板狀結構,並且所述光學玻璃23對於波長介於400奈米~700奈米的可見光具有90%以上的穿透率,但本創作不以此為限。也就是說,不具備特定光學條件的玻璃則不同於本實施例所指的光學玻璃23。其中,所述光學玻璃23具有位於相反側的一承載平面231以及一入光面232,所述入光面232於本實施例中也是呈平面狀,並且所述入光面232的外形等同於所述承載平面231的外形,但本創作不以此為限。The optical glass 23 is a transparent plate-shaped structure in this embodiment, and the optical glass 23 has a transmittance of more than 90% for visible light with a wavelength between 400 nm and 700 nm, but this creation does not This is limited. In other words, glass that does not have specific optical conditions is different from the optical glass 23 referred to in this embodiment. The optical glass 23 has a supporting plane 231 and a light incident surface 232 on opposite sides. The light incident surface 232 is also planar in this embodiment, and the shape of the light incident surface 232 is equivalent to The shape of the bearing plane 231 is not limited to this creation.

其中,所述光學玻璃23是以所述入光面232設置於所述承載台21的所述第一表面211,並且所述光學玻璃23較佳是完整地覆蓋於所述穿孔213的一側(如:圖8中的所述穿孔213頂側),但本創作不以此為限。舉例來說,在本創作未繪示的其他實施例中,所述光學玻璃23也可以是僅覆蓋於局部的所述穿孔213;或者,所述光學玻璃23也可以是至少局部設置於所述穿孔213內。Wherein, the optical glass 23 is set on the first surface 211 of the carrying table 21 by the light incident surface 232, and the optical glass 23 preferably completely covers one side of the through hole 213 (For example: the top side of the perforation 213 in Figure 8), but this creation is not limited to this. For example, in other embodiments not shown in the present creation, the optical glass 23 may also cover only a part of the perforation 213; or, the optical glass 23 may also be at least partially disposed on the Inside perforation 213.

再者,所述承載平面231能用來供至少一個晶片200的多個焊墊201設置,以使至少一個所述晶片200的部分所述焊墊201能通過重力而抵接於所述承載平面231。也就是說,所述晶片共面度檢測設備100是通過所述光學玻璃23的所述承載平面231搭配重力,以穩定地提供其共面度測試中所需的判斷基準面(base plane),進而有效地降低因基準面而產生的誤差。Furthermore, the carrying plane 231 can be used to provide a plurality of bonding pads 201 of at least one chip 200, so that a part of the bonding pads 201 of at least one chip 200 can abut against the carrying plane by gravity. 231. That is to say, the wafer coplanarity detection device 100 uses the load-bearing plane 231 of the optical glass 23 with gravity to stably provide the base plane required for the coplanarity test. This effectively reduces the errors caused by the reference plane.

於本實施例中,所述光學玻璃23的所述承載平面231是垂直於一鉛錘方向V,並且所述光學玻璃23為平行所述長度方向L的一長條狀構造,以使所述承載平面231能供多個所述晶片200沿所述長度方向L設置。In this embodiment, the carrying plane 231 of the optical glass 23 is perpendicular to a plumb direction V, and the optical glass 23 is a long strip structure parallel to the length direction L, so that the The supporting plane 231 can provide a plurality of the wafers 200 along the length direction L.

更詳細地說,所述光學玻璃23包含有形成於所述承載平面231的一對位圖案233,並且所述承載平面231與所述對位圖案233的位置(沿所述鉛錘方向V)對應於所述穿孔213。其中,所述對位圖案233於本實施例中是以位於所述承載平面231上的不透光薄膜來說明,據以利於通過所述對位圖案233來精準地提供所述承載平面231的位置,但本創作不受限於此。舉例來說,在本創作未繪示的其他實施例中,所述對位圖案233也可以是透光率不同於(或小於)所述光學玻璃23的薄膜,其同樣能夠有效地提供所述承載平面231的位置。In more detail, the optical glass 23 includes an alignment pattern 233 formed on the carrying plane 231, and the position of the carrying plane 231 and the alignment pattern 233 (along the plumb direction V) Corresponds to the perforation 213. Wherein, the alignment pattern 233 in this embodiment is described as an opaque film located on the bearing plane 231, so as to facilitate the accurate provision of the bearing plane 231 through the alignment pattern 233 Location, but this creation is not limited to this. For example, in other embodiments not shown in this creation, the alignment pattern 233 can also be a film with a light transmittance different from (or less than) the optical glass 23, which can also effectively provide the The position of the bearing plane 231.

需額外說明的是,所述光學玻璃23於本實施例中雖是以平板狀的玻璃來說明,但在本創作未繪示的其他實施例中,所述承載平面231可以僅佔所述光學玻璃23的局部板面,而在所述承載平面231以外的所述光學玻璃23區域可以是非為平面狀,但所述對位圖案233不可以形成在所述承載平面231以外的區域,據以準確地提供所述承載平面231的位置。It should be additionally noted that although the optical glass 23 is illustrated as a flat glass in this embodiment, in other embodiments not shown in the present creation, the carrying plane 231 may only occupy the optical glass Part of the surface of the glass 23, and the area of the optical glass 23 outside the carrying plane 231 may be non-planar, but the alignment pattern 233 may not be formed in an area outside the carrying plane 231, according to The position of the bearing plane 231 is accurately provided.

所述定位治具24設置於所述承載台21的所述第一表面211上,並且所述光學玻璃23夾持在所述定位治具24與所述承載台21之間。於本實施例中,所述定位治具24自頂面沿所述長度方向L形成有貫穿狀的多個固持槽241,用以分別收容至少多個所述晶片200。The positioning jig 24 is disposed on the first surface 211 of the carrying table 21, and the optical glass 23 is clamped between the positioning jig 24 and the carrying table 21. In this embodiment, the positioning jig 24 has a plurality of through-shaped holding grooves 241 formed along the length direction L from the top surface of the positioning jig 24 for accommodating at least a plurality of the wafers 200 respectively.

再者,所述定位治具24自底面則是沿所述長度方向L形成有連通多個所述固持槽241的一容置槽242,並且所述容置槽242形狀對應於所述光學玻璃23,以使所述光學玻璃23可被設置於所述容置槽242內,但本創作不受限於此。舉例來說,在本創作未繪示的其他實施例中,所述定位治具24可以形成有用以收容至少一個所述晶片200的至少一個固持槽241以及連通至少一個所述固持槽241的一容置槽242,並且所述光學玻璃23設置於所述容置槽242內。Furthermore, from the bottom surface of the positioning jig 24, a receiving groove 242 communicating with a plurality of the holding grooves 241 is formed along the length direction L, and the receiving groove 242 has a shape corresponding to the optical glass 23, so that the optical glass 23 can be set in the accommodating groove 242, but the invention is not limited to this. For example, in other embodiments not shown in this creation, the positioning jig 24 may be formed with at least one holding groove 241 for accommodating at least one of the chips 200 and a holding groove 241 communicating with at least one of the holding grooves 241. The accommodating groove 242, and the optical glass 23 is disposed in the accommodating groove 242.

更詳細地說,所述容置槽242於本實施例中沿所述長度方向L貫穿所述定位治具24,並且所述容置槽242的寬度略大於所述穿孔213的寬度,以利於所述光學玻璃23夾持在所述定位治具24與所述承載台21之間。換個角度來說,所述承載台21的所述穿孔213朝向所述定位治具24正投影所形成的一投影區域,其位於所述容置槽242之內且覆蓋多個所述固持槽241。In more detail, the accommodating groove 242 penetrates the positioning jig 24 along the length direction L in this embodiment, and the width of the accommodating groove 242 is slightly larger than the width of the perforation 213 to facilitate The optical glass 23 is clamped between the positioning jig 24 and the carrying platform 21. To put it another way, the perforation 213 of the carrying platform 21 faces a projection area formed by the orthographic projection of the positioning fixture 24, which is located in the accommodating groove 242 and covers a plurality of the holding grooves 241 .

此外,所述定位治具24於本實施例中為非透光狀,並且所述光學玻璃23的所述對位圖案233沿所述鉛錘方向V對應於未形成有所述固持槽241的所述定位治具24區域。再者,所述定位治具24的厚度較佳是略小於任一個所述晶片200的厚度,據以利於所述晶片200自所述定位治具24的所述固持槽241中取出。In addition, the positioning jig 24 is non-translucent in this embodiment, and the alignment pattern 233 of the optical glass 23 along the plumb direction V corresponds to the position where the holding groove 241 is not formed. The positioning fixture has 24 areas. Furthermore, the thickness of the positioning jig 24 is preferably slightly smaller than the thickness of any one of the wafers 200, so that the wafer 200 can be taken out from the holding groove 241 of the positioning jig 24.

所述偵測器4對應於所述光學玻璃23設置,以使所述偵測器4能通過偵測所述對位圖案233而得知所述承載平面231的位置,並且所述偵測器4能用來偵測每個所述焊墊201以得知其與所述承載平面231之間的間距,進而精準地測得任一個所述晶片200的多個所述焊墊201的共面度。The detector 4 is arranged corresponding to the optical glass 23, so that the detector 4 can know the position of the bearing plane 231 by detecting the alignment pattern 233, and the detector 4 4 can be used to detect each of the bonding pads 201 to know the distance between it and the carrying plane 231, and then accurately measure the coplanarity of the bonding pads 201 of any one of the chips 200 degree.

更詳細地說,並且所述偵測器4於本實施例中是安裝於所述橫向移載機構3,並且所述橫向移載機構3能使所述偵測器4面向所述穿孔213且沿所述長度方向L移動,但本創作不受限於此。再者,由於所述光學玻璃23的所述承載平面231與所述對位圖案233的位置(皆沿所述鉛錘方向V)對應於所述穿孔213,以使所述偵測器4能通過所述穿孔213而偵測所述對位圖案233及設置於所述承載平面231上的多個所述焊墊201。In more detail, and in this embodiment, the detector 4 is installed on the lateral transfer mechanism 3, and the lateral transfer mechanism 3 can make the detector 4 face the perforation 213 and Move along the length direction L, but this creation is not limited to this. Furthermore, since the positions of the supporting plane 231 and the alignment pattern 233 of the optical glass 23 (both along the plumb direction V) correspond to the perforation 213, the detector 4 can The alignment pattern 233 and the plurality of solder pads 201 disposed on the carrying plane 231 are detected through the through hole 213.

[本創作實施例的技術效果][Technical effects of this creative embodiment]

綜上所述,本創作實施例所公開的晶片共面度檢測設備,其通過所述光學玻璃23的所述承載平面231搭配重力,以穩定地提供其共面度測試中所需的判斷基準面(也就是,以所述承載平面231為基準面),進而有效地降低因基準面而產生的誤差。In summary, the wafer coplanarity detection device disclosed in this creative embodiment uses the load-bearing plane 231 of the optical glass 23 to match gravity to stably provide the judgment criterion required in the coplanarity test. (That is, take the bearing plane 231 as the reference surface), thereby effectively reducing errors caused by the reference surface.

進一步地說,所述偵測器4能通過偵測所述對位圖案233而得知所述承載平面231的位置,並且所述偵測器4能用來偵測每個所述焊墊201以得知其與所述承載平面231之間的間距,進而精準地測得任一個所述晶片200的多個所述焊墊201的共面度。Furthermore, the detector 4 can know the position of the carrying plane 231 by detecting the alignment pattern 233, and the detector 4 can be used to detect each of the solder pads 201 In order to know the distance between it and the carrying plane 231, the coplanarity of the bonding pads 201 of any one of the chips 200 can be accurately measured.

以上所公開的內容僅為本創作的優選可行實施例,並非因此侷限本創作的專利範圍,所以凡是運用本創作說明書及圖式內容所做的等效技術變化,均包含於本創作的專利範圍內。The content disclosed above is only a preferred and feasible embodiment of the creation, and does not limit the patent scope of this creation. Therefore, all equivalent technical changes made using this creation specification and schematic content are included in the patent scope of this creation Inside.

100:晶片共面度檢測設備 1:U形支架 11:末端部 1a:L形支架 2:承載模組 21:承載台 211:第一表面 212:第二表面 213:穿孔 22:縱向移載機構 23:光學玻璃 231:承載平面 232:入光面 233:對位圖案 24:定位治具 241:固持槽 242:容置槽 3:橫向移載機構 4:偵測器 200:晶片 201:焊墊 V:鉛錘方向 L:長度方向100: wafer coplanarity testing equipment 1: U-shaped bracket 11: End 1a: L-shaped bracket 2: Carrier module 21: Bearing platform 211: First Surface 212: second surface 213: Piercing 22: Longitudinal transfer mechanism 23: Optical glass 231: bearing plane 232: light incident surface 233: counterpoint pattern 24: positioning fixture 241: Holding Slot 242: Containment Slot 3: Lateral transfer mechanism 4: detector 200: chip 201: Pad V: plumb direction L: length direction

圖1為本創作實施例的晶片共面度檢測設備的立體示意圖。FIG. 1 is a three-dimensional schematic diagram of the wafer coplanarity detection device according to the creative embodiment.

圖2為圖1沿剖線II-II的剖視示意圖。2 is a schematic cross-sectional view of FIG. 1 along the line II-II.

圖3為圖2的部位III的放大示意圖。FIG. 3 is an enlarged schematic diagram of part III of FIG. 2.

圖4為圖3的部位IV的放大示意圖。FIG. 4 is an enlarged schematic diagram of the part IV in FIG. 3.

圖5為圖1另一形態的立體示意圖。Fig. 5 is a perspective schematic view of another form of Fig. 1.

圖6為本創作實施例的晶片共面度檢測設備的承載模組放大示意圖。FIG. 6 is an enlarged schematic diagram of the carrier module of the wafer coplanarity detection device according to the creative embodiment.

圖7為圖6另一視角的放大示意圖。FIG. 7 is an enlarged schematic diagram of FIG. 6 from another perspective.

圖8為圖6的局部分解示意圖。Fig. 8 is a partial exploded schematic view of Fig. 6.

圖9為圖8另一視角的放大示意圖。FIG. 9 is an enlarged schematic diagram of FIG. 8 from another perspective.

圖10為圖8的分解示意圖。Fig. 10 is an exploded schematic diagram of Fig. 8.

圖11為圖10另一視角的放大示意圖。FIG. 11 is an enlarged schematic diagram of FIG. 10 from another perspective.

21:承載台 21: Bearing platform

211:第一表面 211: First Surface

212:第二表面 212: second surface

213:穿孔 213: Piercing

23:光學玻璃 23: Optical glass

231:承載平面 231: bearing plane

232:入光面 232: light incident surface

233:對位圖案 233: counterpoint pattern

24:定位治具 24: positioning fixture

241:固持槽 241: Holding Slot

242:容置槽 242: Containment Slot

4:偵測器 4: detector

200:晶片 200: chip

V:鉛錘方向 V: plumb direction

L:長度方向 L: length direction

Claims (10)

一種晶片共面度檢測設備,其包括: 至少一個承載模組,包含: 一承載台;及 一光學玻璃,安裝於所述承載台上,並且所述光學玻璃具有位於相反側的一承載平面與一入光面,所述光學玻璃包含有形成於所述承載平面的一對位圖案;其中,所述承載平面能用來供至少一個晶片的多個焊墊設置,以使至少一個所述晶片的部分所述焊墊能通過重力而抵接於所述承載平面;以及 一偵測器,對應於所述光學玻璃設置,所述偵測器能通過偵測所述對位圖案而得知所述承載平面的位置,並且所述偵測器能用來偵測每個所述焊墊以得知其與所述承載平面之間的間距。 A wafer coplanarity detection equipment, which includes: At least one carrier module, including: A bearing platform; and An optical glass installed on the carrying table, and the optical glass has a carrying plane and a light incident surface on opposite sides, the optical glass includes a pair of patterns formed on the carrying plane; wherein The carrying plane can be used to provide a plurality of bonding pads of at least one chip, so that a part of the bonding pads of at least one chip can abut against the carrying plane by gravity; and A detector corresponding to the optical glass arrangement, the detector can know the position of the bearing plane by detecting the alignment pattern, and the detector can be used to detect each The distance between the solder pad and the carrying plane is known. 如請求項1所述的晶片共面度檢測設備,其中,所述承載台包含有位於相反兩側的一第一表面與一第二表面,並且所述承載台形成有自所述第一表面貫穿至所述第二表面的一穿孔,所述光學玻璃以所述入光面設置於所述第一表面,並且所述承載平面與所述對位圖案的位置對應於所述穿孔,以使所述偵測器能通過所述穿孔而偵測所述對位圖案及設置於所述承載平面上的多個所述焊墊。The wafer coplanarity inspection device according to claim 1, wherein the carrier includes a first surface and a second surface on opposite sides, and the carrier is formed from the first surface A perforation penetrating to the second surface, the optical glass is disposed on the first surface with the light incident surface, and the position of the bearing plane and the alignment pattern corresponds to the perforation, so that The detector can detect the alignment pattern and the plurality of solder pads arranged on the carrying plane through the perforation. 如請求項2所述的晶片共面度檢測設備,其中,所述承載台的所述穿孔呈長形且定義有一長度方向,所述承載平面能供多個所述晶片沿所述長度方向設置;所述晶片共面度檢測設備進一步包含有一橫向移載機構,所述偵測器安裝於所述橫向移載機構,並且所述橫向移載機構能使所述偵測器面向所述穿孔且沿所述長度方向移動。The wafer coplanarity detection device according to claim 2, wherein the perforation of the carrying table is elongated and defines a length direction, and the carrying plane can provide for a plurality of the wafers to be arranged along the length direction The wafer coplanarity detection equipment further includes a lateral transfer mechanism, the detector is installed in the lateral transfer mechanism, and the lateral transfer mechanism can make the detector face the through hole and Move along the length direction. 如請求項3所述的晶片共面度檢測設備,其中,至少一個所述承載模組包含有一縱向移載機構,所述承載台安裝於所述縱向移載機構,以使所述縱向移載機構能使所述承載台沿著沿垂直所述長度方向的一方向移動。The wafer coplanarity testing equipment according to claim 3, wherein at least one of the carrier modules includes a longitudinal transfer mechanism, and the carrier is installed on the longitudinal transfer mechanism to enable the longitudinal transfer The mechanism can make the carrying table move along a direction perpendicular to the length direction. 如請求項3所述的晶片共面度檢測設備,其中,所述晶片共面度檢測設備進一步包含有一U形支架,所述橫向移載機構及所述偵測器位於所述U形支架的內側,至少一個所述承載模組的數量進一步限定為兩個,並且兩個所述承載模組分別安裝於所述U形支架的兩個末端部。The wafer coplanarity inspection device according to claim 3, wherein the wafer coplanarity inspection device further includes a U-shaped bracket, and the lateral transfer mechanism and the detector are located on the U-shaped bracket On the inside, the number of at least one bearing module is further limited to two, and the two bearing modules are respectively installed at the two end portions of the U-shaped bracket. 如請求項1所述的晶片共面度檢測設備,其中,至少一個所述承載模組包含有可分離地設置於所述承載台的一定位治具,並且所述定位治具形成有至少一個固持槽,用以收容至少一個所述晶片。The wafer coplanarity inspection device according to claim 1, wherein at least one of the carrier modules includes a positioning jig detachably disposed on the carrier, and the positioning jig is formed with at least one The holding groove is used for accommodating at least one chip. 如請求項6所述的晶片共面度檢測設備,其中,所述光學玻璃夾持在所述定位治具與所述承載台之間。The wafer coplanarity inspection device according to claim 6, wherein the optical glass is clamped between the positioning jig and the carrying table. 如請求項7所述的晶片共面度檢測設備,其中,所述定位治具形成有連通至少一個所述固持槽的一容置槽,並且所述光學玻璃設置於所述容置槽內。The wafer coplanarity detection device according to claim 7, wherein the positioning jig is formed with a containing groove communicating with at least one of the holding grooves, and the optical glass is disposed in the containing groove. 如請求項1所述的晶片共面度檢測設備,其中,所述光學玻璃對於波長介於400奈米~700奈米的可見光具有90%以上的穿透率。The wafer coplanarity detection device according to claim 1, wherein the optical glass has a transmittance of more than 90% for visible light with a wavelength between 400 nanometers and 700 nanometers. 如請求項1所述的晶片共面度檢測設備,其中,所述光學玻璃的所述承載平面垂直於一鉛錘方向。The wafer coplanarity inspection device according to claim 1, wherein the bearing plane of the optical glass is perpendicular to a plumb direction.
TW109211772U 2020-09-09 2020-09-09 Chip co-planarity testing equipment TWM606467U (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI750800B (en) * 2020-09-09 2021-12-21 海華科技股份有限公司 Coplanarity detaction apparatus for chip
TWI761202B (en) * 2020-09-09 2022-04-11 海華科技股份有限公司 Coplanarity detaction apparatus for chip

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI750800B (en) * 2020-09-09 2021-12-21 海華科技股份有限公司 Coplanarity detaction apparatus for chip
TWI761202B (en) * 2020-09-09 2022-04-11 海華科技股份有限公司 Coplanarity detaction apparatus for chip

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