TWM593651U - Air curtain nozzle structure - Google Patents

Abstract

The present invention relates to an air curtain nozzle structure, which provides scouring and cleaning of a semiconductor manufacturing equipment transportation production line. It includes: a steady flow cavity with a communication hole; a fin assembly, which is set to a blade shape It is provided with a linear nozzle outlet; a pressure-increasing chamber, which is provided with several pressure-relief holes and is installed inside the steady flow chamber, and the pressure-increasing chamber is connected to at least one external air pressure source pipeline; After the air pressure flows to the pressurized cavity according to the storage pressure, and then flows through the pressure relief hole to the steady flow cavity for mixing, and then flows through the nozzle outlet of the fin assembly to evenly eject the air curtain to provide a barrier to the outside world surroundings.

Description

Air curtain nozzle structure

The invention relates to the technical field of semiconductor process equipment, in particular to an air curtain nozzle structure.

In general, wafer cassettes play an important role in protecting wafers from contamination in the semiconductor manufacturing process and transferring wafers to each workstation. Therefore, wafer cassettes must be maintained in a positive pressure environment filled with protective gas.

Generally, an air curtain device 9 is installed in the wafer operation equipment, as shown in FIG. 5, and an air inlet 91 and an air outlet 92 are provided to generate an airflow wall blowing downwards. When the wafer is taken out, the airflow wall can prevent contaminants from the external environment from entering the wafer box.

The conventional air curtain device 9 has only a single-chamber space inside, and the output power is not easy to control, which is easy to cause disturbing sounds. At the same time, there is also the problem of more troublesome installation, so the traditional air curtain device 9 It is not suitable for installation in equipment.

Therefore, in view of the above-mentioned problems with the air curtain device 9, the creator of this new model is desperate to create a structure of the air curtain nozzle; therefore, the main purpose of this new model is to provide high cleanliness products such as panels and wafers on the side of semiconductor devices. The conveying production line is used for scouring and cleaning; another purpose of the new model is to provide the inert gas in the open space to be blocked from the external environment.

In order to solve the above problems, the technical solutions adopted by the new model are as follows:

With regard to the novel air curtain nozzle structure of the present invention, it includes: a steady flow cavity with a communication hole; a fin assembly, which is blade-shaped and has a linear nozzle outlet; and a pressurized cavity It is equipped with a number of pressure relief holes and is installed inside the steady flow cavity, and the pressurization cavity is connected to at least one external air pressure source line; after the air pressure flows to the pressurization cavity according to the storage pressure, After flowing into the steady flow cavity through the pressure relief hole for mixing, it then flows through the nozzle outlet of the fin assembly and is evenly sprayed.

In the air curtain nozzle structure, the air pressure source pipeline is additionally provided with a flow regulating valve.

In the air curtain nozzle structure, there are two air pressure source pipelines.

In the structure of the air curtain nozzle, the pressurizing cavity is a circular tube, and the diameter of the pressure relief holes is 1.5 mm, and the distance between the pressure relief holes is 1 cm. .

In the air curtain nozzle structure, the steady flow cavity is provided with a side cover.

In the air curtain nozzle structure, the air pressure source is set to an inert gas.

In the air curtain nozzle structure, the blade-shaped nozzle outlet is set at an angle of 40 degrees.

In the air curtain nozzle structure, the nozzle outlet is designed to have a uniform flow output of a 1 mm-width air outlet.

The new technology can achieve the following effects through the above technical means: 1. The new air curtain nozzle structure is provided with the pressurizing cavity and provides the pressure in the storage cavity, and the steady flow cavity system provides the mixing of the flow output from the pressurizing cavity and increases the air pressure in the steady flow cavity moderately , And finally released from the fin assembly evenly. 2. The new model has the following functions: the scattering angle of the air pressure output can be adjusted freely; the bidirectional air intake adjustment fins provide a uniform output force; the double cavity design provides a significant reduction of high decibel noise.

The content of the present invention will be described below in conjunction with the specific embodiments shown in FIGS. 1 to 3.

As shown in FIGS. 1 and 3, the present invention relates to an air curtain nozzle structure A which provides the flushing and cleaning of a semiconductor manufacturing equipment transport line, which includes: a steady flow cavity 1, a fin assembly 2 and一Pressure chamber 3.

The flow stabilizing chamber 1 is generally rectangular, and is provided to mix with the flow rate output by the pressurizing chamber 3, which is provided with a communication hole 11, and the flow stabilizing chamber 1 is provided with a side cover 12.

The fin assembly 2 is set to be blade-shaped and is provided with a linear nozzle outlet 21 connected to the communication hole 11 of the steady flow chamber 1, and the blade-shaped nozzle outlet 21 is set to 40 degrees Angle, and the width of the nozzle outlet 21 is set to 1 mm, so that the airflow ejected from the nozzle outlet 21 is uniformly output in a blade shape.

The pressure-increasing chamber 3 mainly provides the pressure in the storage chamber, and the pressure-increasing chamber 3 is formed in a circular tube shape and is provided with a plurality of pressure relief holes 31 and is installed inside the steady flow chamber 1; further, the The diameter of the pressure relief hole 31 is set to 1.5 mm, and the distance between the plurality of pressure relief holes 31 is set to 1 cm, so as to provide a uniform pressure relief for the pressurizing chamber 3.

The pressurizing chamber 3 is connected to at least one external air pressure source line 4. In the present embodiment, the air pressure source line 4 is set to two; in addition, the air pressure source line 4 is additionally provided with a flow regulating valve 41 to provide air pressure The flow rate adjustment of the source, that is, the size of the air curtain 5 output by the air curtain nozzle structure A of the new type is adjusted together. In the embodiment of the present invention, two pressure source lines 4 and two flow regulating valves 41 are set.

The new air curtain nozzle structure A is constituted by the above components. As shown in FIGS. 3 and 4, the high-pressure gas is mainly delivered by the air pressure source pipeline 4, and the high-pressure gas is inert gas. When the inert gas pressure flows to After the pressurized cavity 3 is based on the storage pressure, it then flows into the steady flow cavity through the pressure relief hole 31 of the pressurized cavity 3 for uniform mixing, and then flows through the fin The nozzle outlet 21 of the nozzle 2 is evenly ejected to provide an air curtain 5 that blocks the outside, and can flush and clean the semiconductor production line 6; in other words, the total flow of the fin can be adjusted by operating the two flow regulating valves 41 The scattering angle of the air pressure output of the 2 nozzle outlet 21, and provides a uniform output force to achieve the following effects: the scattering angle of the air pressure output can be adjusted freely; the bi-directional intake air adjustment fin provides a uniform output force; the dual cavity design provides Significantly reduce high-decibel noise.

In summary, this new model relates to an air curtain nozzle structure A, and its constituent structure has not been used in books or public use, since it conforms to the requirements of the new patent application, and we urge the Jun Bureau to appraise and grant the patent as soon as possible.

To be clear, the above are the specific embodiments of the case and the technical principles used. If the changes made in accordance with the concept of the case, the resulting functional effects cannot exceed the spirit covered by the description and drawings, All should be within the scope of this case, and Chen Ming.

[This new model] Ａ: Air curtain nozzle structure 1: steady flow cavity 11: connecting hole 12: Side cover 2: Fin assembly 21: nozzle outlet 3: Pressurized chamber 31: Pressure relief hole 4: Air pressure source pipeline 41: Flow regulating valve 5: Air curtain 6: Conveying production line. [Habit] 9: Air curtain device 91: air inlet 92: air outlet.

Figure 1: This is a perspective external view of the structure of the new air curtain nozzle. Figure 2: This is a perspective exploded view of the structure of the new air curtain nozzle. Figure 3: This is a cross-sectional view of the structure of the new air curtain nozzle. Figure 4: This is a perspective exploded view of the structure of the new air curtain nozzle. Figure 5: This is the implementation of the new air curtain nozzle structure.

A: Air curtain nozzle structure

1: steady flow cavity

12: Side cover

2: Fin assembly

21: nozzle outlet

4: Air pressure source pipeline

41: Flow regulating valve

Claims (9)

An air curtain nozzle structure includes: A steady flow cavity with a communication hole; A fin assembly, which is set to be blade-shaped and has a linear nozzle outlet; A pressure-increasing cavity, which is provided with several pressure-relief holes and is installed inside the steady flow cavity, and the pressure-increasing cavity is connected to at least one external air pressure source pipeline; After the air pressure flows to the pressurizing cavity to store the pressure, and then flows into the steady flow cavity through the pressure relief hole for mixing, it then flows through the nozzle outlet of the fin assembly and is evenly ejected. The air curtain nozzle structure according to claim 1, wherein the air pressure source pipeline is additionally provided with a flow regulating valve. The air curtain nozzle structure according to claim 2, wherein the air pressure source pipeline is set to two, and the flow regulating valve is also set to two. The air curtain nozzle structure according to claim 1, wherein the pressurizing cavity is set in a circular tube shape, and the diameter of the provided pressure relief hole is set at 1.5 mm. The air curtain nozzle structure according to claim 4, wherein the distance between the pressure relief holes is set to 1 cm. The air curtain nozzle structure according to claim 1, wherein the steady flow cavity is provided with a side cover. The air curtain nozzle structure as described in claim 1, wherein the air pressure source is set to an inert gas. The air curtain nozzle structure according to claim 1, wherein the blade-shaped nozzle outlet is set at an angle of 40 degrees. The structure of the air curtain nozzle according to claim 1, wherein the nozzle outlet is set to a 1mm-width air outlet uniform flow output design.

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