TWM588822U - Conductive plate for touch device - Google Patents

Abstract

The present invention provides a conductive plate for a touch device, which includes a support unit, an optical adjustment film layer structure, and a conductive film layer structure. The supporting unit includes a flexible transparent substrate. The optical adjustment film layer structure is formed on a first surface of the flexible light-transmissive substrate, and includes a first optical adjustment layer with a refractive index greater than 2, and a second optical adjustment with a refractive index less than the first optical adjustment layer Layer, and an adhesion layer interposed between the first optical adjustment layer and the second optical adjustment layer. The conductive film layer structure includes a pair of indium tin oxide layers stacked on the optical adjustment film layer spaced apart from each other, a copper conductor layer stacked between the pair of indium tin oxide layers, and a stack of the copper conductor layer and the The nickel-copper alloy layer between the indium tin oxide layer and the indium tin oxide layer.

Description

Conductive board for touch device

The present invention relates to a conductive board, especially a conductive board for touch device.

Referring to FIG. 1, a conductive plate 1 for a conventional touch device includes a support substrate 11 made of polyethylene terephthalate (PET), and a pair of support substrates 11 formed on the support substrate 11 A hard coating layer 12 on the upper and lower surfaces, an optical adjustment layer 13 formed on the upper hard coating layer 12 of the pair of hard coating layers 12, and a conductive film layer structure 14 formed on the optical adjustment layer 13 . The conductive film layer structure 14 has an indium tin oxide (ITO) layer 141 formed on the optical adjustment layer 13, a copper conductor layer 142 formed on the indium tin oxide layer 141, and a nickel-copper alloy layer 143.

The conductive plate 1 for the existing touch device is generally supplied to downstream manufacturers to etch the conductive film layer structure 14 through the etching technology to the circuit for the touch device. However, downstream manufacturers often have problems with incomplete circuits after implementing etching technology. Furthermore, the supporting substrate 11 made of PET is difficult to meet the requirements of portable flexible touch electronic devices.

It can be seen from the above description that the conductive plates for touch devices are improved so that downstream manufacturers can etch complete circuits and meet the needs of portable flexible touch electronic devices, which are yet to be solved by relevant technical personnel in the technical field. Subject.

Therefore, the purpose of the present invention is to provide a conductive plate for touch devices that can be supplied to downstream manufacturers of touch devices to etch complete circuits and meet the requirements of portable flexible touch electronic devices.

Therefore, the conductive plate for the new touch device includes a supporting unit, an optical adjustment film layer structure, and a conductive film layer structure. The supporting unit includes a flexible transparent substrate. The optical adjustment film layer structure is formed on a first surface of the flexible light-transmissive substrate, and includes a first optical adjustment layer with a refractive index greater than 2, and a second optical adjustment with a refractive index less than the first optical adjustment layer Layer, and an adhesion layer interposed between the first optical adjustment layer and the second optical adjustment layer. The conductive film layer structure includes a pair of indium tin oxide layers stacked on the optical adjustment film layer spaced apart from each other, a copper conductor layer stacked between the pair of indium tin oxide layers, and a stack of the copper conductor layer and the The nickel-copper alloy layer between the indium tin oxide layer and the indium tin oxide layer.

The effect of the present invention is that the flexible transparent substrate of the supporting unit can meet the needs of portable flexible electronic devices, and the indium tin oxide layer on the upper layer in the conductive film layer structure can also prevent the nickel The oxidation of the copper alloy layer prevents the downstream manufacturers of the touch device from destroying the integrity of the final circuit when etching their conductive film structure through the etchant.

Referring to FIG. 2, an embodiment of the conductive plate for the new touch device includes a supporting unit 2, an optical adjustment film layer structure 3, and a conductive film layer structure 4.

The supporting unit 2 includes a flexible transparent substrate 21. The flexible light-transmitting substrate 21 is made of cyclic olefin copolymer (COC for short), colorless polyimide (CPI for short), and optical polyimide (OPI for short) Or cyclic olefin polymer (cyclic olefin polymer, referred to as COP).

The optical adjustment film layer structure 3 is formed on a first surface 211 of the flexible transparent substrate 21 and includes a first optical adjustment layer 31 with a refractive index greater than 2, and a refractive index less than the first optical adjustment layer 31 The second optical adjustment layer 32, and an adhesion layer 33 interposed between the first optical adjustment layer 31 and the second optical adjustment layer 32. In this embodiment of the present invention, the difference in refractive index between the first optical adjustment layer 31 and the second optical adjustment layer 32 is used to improve light transmittance; however, based on the first optical adjustment layer 31 and the second The adhesion between the two optical adjustment layers 32 is not good. Therefore, the adhesion between the first optical adjustment layer 31 and the second optical adjustment layer 32 is improved through the adhesion layer 33. Preferably, the adhesion layer 33 of the optical adjustment film layer structure 3 is made of amorphous silicon (amorphous Si), silicon monoxide (SiO) or chromium (Cr), and has a thickness less than 5 nm; The first optical adjustment layer 31 of the adjustment film structure 3 is selected from TiO ₂ , Ti ₃ O ₅ , Ta ₂ O ₅ , Nb ₂ O ₅ or ZrO ₂ ; the second optical adjustment layer 32 of the optical adjustment film structure 3 It is crystalline SiO ₂ .

The conductive film layer structure 4 includes a pair of indium tin oxide layers 41 stacked on the optical adjustment film layer structure 3 at intervals, a copper conductor layer 42 stacked between the pair of indium tin oxide layers 41, and a stack of A nickel-copper alloy layer 43 between the copper conductor layer 42 and the indium tin oxide layer 41 above the pair of indium tin oxide layers 41 and used to prevent oxidation of the copper conductor layer 42.

In this embodiment of the present invention, the indium tin oxide layer 41 on the upper layer is used as a protective layer for downstream manufacturers of touch devices when etching circuits to prevent oxidation of the nickel-copper alloy layer 43 And to avoid the downstream manufacturers using etching technology to etch the circuit is damaged by the etchant (etchant) resulting in incomplete circuit problems.

The supporting unit 2 also selectively includes a first hard coating layer 22, and further includes a second hard coating layer 23 and a protective layer 24. The first hard coat layer 22 is formed on the first surface 211 of the flexible light-transmissive substrate 21 to be interposed between the first optical adjustment layer 31 and the flexible light-transmissive substrate 21, and the second hard coating layer The layer 23 is formed on a second surface 212 of the flexible light-transmissive substrate 21 opposite to the first surface 211. The protective layer 24 is formed on the second hard coat layer 23. In this embodiment of the present invention, the first and second hard coat layers 22 and 23 are made of ZrO ₂ ; the protective layer 24 is formed by a coating method and is made of polyethylene terephthalate (PET), polypropylene (PP), polyethylene (PE) or cycloolefin copolymer (COC). It should be added here that the refractive index based on ZrO ₂ is about 2.16; therefore, the first hard coat layer 22 of this embodiment of the present invention can also replace the first optical adjustment layer 31, and when the embodiment of the present invention When the first optical adjustment layer 31 is ZrO ₂ , the first hard coat layer 22 can be omitted. That is to say, when the material of one of the first optical adjustment layer 31 and the first hard coat layer 22 is ZrO ₂ , the other can be omitted, and a single film layer can simultaneously achieve protection and optical The purpose of adjustment. In this embodiment of the present invention, the flexible light-transmitting substrate 21 is used to replace the supporting substrate 11 of the existing conductive plate for touch devices, which can meet the needs of portable flexible touch electronic devices.

It can be known from the foregoing detailed description of this embodiment of the present invention that the present invention uses a flexible light-transmissive substrate 21 made of COP, CPI, COC, or OPI to replace the support substrate 11 made of PET previously loaded in the prior art, and The indium tin oxide layer 41 on the upper layer of the nickel-copper alloy layer 43 of the conductive film layer structure 4 is additionally formed, so that the present invention can meet the needs of portable flexible touch electronic devices, and secondly, through the The indium tin oxide layer 41 prevents the oxidation of the nickel-copper alloy layer 43, and when the downstream manufacturers of the touch device etch their conductive film layer structure 4 by etching technology, the indium tin oxide layer 41 located above can maintain the final circuit Integrity to avoid this embodiment from being adversely affected by etchant.

Also, it is worth mentioning that the main purpose of the protective layer 24 of the support unit 2 in this embodiment of the present invention is to protect the second hard coating layer 23 from scratches during the etching of the circuit, and the protective layer 24 is Can be torn off. In other words, once the downstream manufacturer of the touch device scratches the protective layer 24 during the etching process and thus affects the light transmittance or appearance, the protective layer 24 can be removed from the second hard coat layer 23.

In summary, the flexible light-transmissive substrate 21 of the conductive plate for the new touch device can meet the needs of portable flexible electronic devices, and the indium tin oxide on the upper layer of the conductive film layer structure 4 The layer 41 can also prevent the oxidation of the nickel-copper alloy layer 43 and prevent the downstream manufacturers of the touch device from destroying the integrity of the final circuit when the conductive film layer structure 4 is etched through the etchant, so it can indeed achieve the new purpose of cost.

However, the above are only examples of the new model. When the scope of the new model cannot be limited by this, all simple equivalent changes and modifications made according to the patent application scope and patent specification content of the new model are still classified as Within the scope of this new patent.

2‧‧‧Support unit 31‧‧‧First optical adjustment layer 21‧‧‧Flexible transparent substrate 32‧‧‧Second optical adjustment layer 211‧‧‧First surface 33‧‧‧ adhesion layer 212‧‧‧Second surface 4‧‧‧Conducting film structure 22‧‧‧The first hard coating 41‧‧‧Indium tin oxide layer 23‧‧‧second hard coating 42‧‧‧Copper conductor layer 24‧‧‧Protective layer 43‧‧‧Ni-Cu alloy layer 3‧‧‧Optical adjustment film structure

Other features and functions of the present invention will be clearly presented in the embodiments with reference to the drawings, in which: FIG. 1 is a schematic front view illustrating a conventional conductive plate for an existing touch device; and FIG. 2 is a schematic front view illustrating an embodiment of a conductive plate for the new touch device.

2‧‧‧Support unit

21‧‧‧Flexible transparent substrate

211‧‧‧First surface

212‧‧‧Second surface

22‧‧‧The first hard coating

23‧‧‧second hard coating

24‧‧‧Protective layer

3‧‧‧Optical adjustment film structure

31‧‧‧First optical adjustment layer

32‧‧‧Second optical adjustment layer

33‧‧‧ adhesion layer

4‧‧‧Conducting film structure

41‧‧‧Indium tin oxide layer

42‧‧‧Copper conductor layer

43‧‧‧Ni-Cu alloy layer

Claims (10)

A conductive board for touch device, including: A supporting unit, including a flexible light-transmitting substrate; An optical adjustment film layer structure is formed on a first surface of the flexible transparent substrate and includes a first optical adjustment layer with a refractive index greater than 2, and a second optical adjustment with a refractive index less than the first optical adjustment layer Layer, and an adhesion layer interposed between the first optical adjustment layer and the second optical adjustment layer; and A conductive film layer structure includes a pair of indium tin oxide layers stacked on the optical adjustment film layer spaced apart from each other, a copper conductor layer stacked between the pair of indium tin oxide layers, and a stack of copper conductor layers and A nickel-copper alloy layer between the indium tin oxide layer and the indium tin oxide layer on the pair. The conductive plate for a touch device according to claim 1, wherein the flexible light-transmitting substrate is made of cyclic olefin copolymer, colorless polyimide, optical grade polyimide or cyclic olefin polymer Made by. The conductive plate for a touch device according to claim 1, wherein the adhesion layer of the optical adjustment film layer structure is made of amorphous silicon, silicon monoxide, or chromium. The conductive plate for a touch device according to claim 1, wherein the adhesion layer of the optical adjustment film structure has a thickness of less than 5 nm. The conductive plate for a touch device according to claim 1, wherein the first optical adjustment layer of the optical adjustment film layer structure is selected from TiO ₂ , Ti ₃ O ₅ , Ta ₂ O ₅ , Nb ₂ O ₅ or ZrO ₂ ; the second optical adjustment layer of the optical adjustment film structure is SiO ₂ . The conductive plate for a touch device according to claim 1, wherein the supporting unit further selectively includes a first hard coating layer formed on the first of the flexible transparent substrate The surface is interposed between the first optical adjustment layer and the flexible transparent substrate. The conductive plate for a touch device according to claim 6, wherein the support unit further includes a second hard coating layer formed on one of the flexible light-transmissive substrates opposite to the first One surface on the second surface. The conductive plate for a touch device according to claim 6, wherein the first hard coating layer is made of ZrO ₂ . The conductive plate for a touch device according to claim 7, wherein the support unit further includes a protective layer formed on the second hard coat layer. The conductive plate for a touch device according to claim 9, wherein the protective layer is made of polyethylene terephthalate, polypropylene, polyethylene or cycloolefin copolymer.

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