TWM576250U - Gas monitoring and purification device - Google Patents

Gas monitoring and purification device Download PDF

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Publication number
TWM576250U
TWM576250U TW107210550U TW107210550U TWM576250U TW M576250 U TWM576250 U TW M576250U TW 107210550 U TW107210550 U TW 107210550U TW 107210550 U TW107210550 U TW 107210550U TW M576250 U TWM576250 U TW M576250U
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gas
purification
monitoring
channel
item
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TW107210550U
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Chinese (zh)
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莫皓然
莫立邦
黃啟峰
韓永隆
陳宣愷
郭俊毅
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研能科技股份有限公司
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Publication of TWM576250U publication Critical patent/TWM576250U/en

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/0004Gaseous mixtures, e.g. polluted air
    • G01N33/0009General constructional details of gas analysers, e.g. portable test equipment
    • G01N33/0011Sample conditioning
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D50/00Combinations of methods or devices for separating particles from gases or vapours
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/007Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by irradiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/74General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/86Catalytic processes
    • B01D53/8668Removing organic compounds not provided for in B01D53/8603 - B01D53/8665
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/02Investigating particle size or size distribution
    • G01N15/0205Investigating particle size or size distribution by optical means
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/06Investigating concentration of particle suspensions
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/06Investigating concentration of particle suspensions
    • G01N15/075Investigating concentration of particle suspensions by optical means
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N2015/0042Investigating dispersion of solids
    • G01N2015/0046Investigating dispersion of solids in gas, e.g. smoke
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02ATECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
    • Y02A50/00TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
    • Y02A50/20Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Pathology (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Dispersion Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Biomedical Technology (AREA)
  • Combustion & Propulsion (AREA)
  • Food Science & Technology (AREA)
  • Medicinal Chemistry (AREA)
  • Disinfection, Sterilisation Or Deodorisation Of Air (AREA)
  • Sampling And Sample Adjustment (AREA)

Abstract

一種氣體監測及淨化裝置,包含:一支撐框體及一氣體監測機,嵌置於該支撐框體中定位,氣體監測機包含:一本體、至少一氣體監測模組、至少一微粒監測模組及至少一淨化氣體模組;藉此該支撐框體上所嵌設氣體監測機來淨化使用者周遭環境之氣體,以降低環境中的空汙氣體暴露所造成人體健康影響及傷害,以及透過該氣體監測機提供氣體監測資訊,進而提供空氣品質通報機制給使用者實施防護措施。 A gas monitoring and purifying device includes: a supporting frame and a gas monitoring machine embedded in the supporting frame for positioning. The gas monitoring machine includes: a body, at least one gas monitoring module, and at least one particle monitoring module And at least one gas purification module; thereby a gas monitoring machine embedded on the support frame is used to purify the gas surrounding the user's environment, so as to reduce the human health impact and injury caused by the exposure of the air pollution gas in the environment, and through the The gas monitoring machine provides gas monitoring information, and then provides an air quality notification mechanism for users to implement protective measures.

Description

氣體監測及淨化裝置 Gas monitoring and purification device

本案關於一種氣體監測及淨化裝置,尤指一種應用於使用者呼吸部位附近周圍環境淨化氣體使用之氣體監測及淨化裝置。 This case relates to a gas monitoring and purification device, in particular a gas monitoring and purification device used for purifying gas in the surrounding environment near the user's breathing site.

現代人對於生活周遭的氣體品質的要求愈來愈重視,例如一氧化碳、二氧化碳、揮發性有機物(Volatile Organic Compound,VOC)、PM2.5、一氧化氮、一氧化硫等等氣體,甚至於氣體中含有的微粒,都會在環境中暴露影響人體健康,嚴重的甚至危害到生命。因此環境氣體品質好壞紛紛引起各國重視,目前急需要如何監測去避免遠離,是當前重視的課題。 Modern people pay more and more attention to the gas quality requirements around life, such as carbon monoxide, carbon dioxide, volatile organic compounds (Volatile Organic Compound, VOC), PM2.5, nitric oxide, sulfur monoxide and other gases, even in the gas The particles contained in it will be exposed to the environment and affect human health, seriously or even endanger life. Therefore, the quality of the environmental gas has attracted attention from various countries. At present, how to monitor to avoid being away is an urgent topic.

如何確認氣體品質的好壞,利用一種氣體感測器來監測周圍環境氣體是可行的,若又能即時提供監測資訊,警示處在環境中的人,能夠即時預防或逃離,避免遭受環境中的氣體暴露造成人體健康影響及傷害,利用氣體感測器來監測周圍環境可說是非常好的應用。不過,即使馬上可以得知空氣品質狀態,但如果無法即刻改善使用者呼吸部位附近周圍環境之氣體,也會立即對人體健康發生影響,為了使用者呼吸部位附近周圍環境能淨化氣體,並降低人體健康的影響,利用氣體監測及淨化裝置提供一種空氣汙染之解決方案,是本案所研發的重要課題。 How to confirm the quality of the gas, it is feasible to use a gas sensor to monitor the surrounding gas, if it can provide real-time monitoring information, warn people in the environment, can immediately prevent or escape, avoid being affected by the environment Gas exposure causes human health impacts and injuries. Using gas sensors to monitor the surrounding environment is a very good application. However, even if the air quality status can be known immediately, if the gas in the surrounding environment near the user's breathing part cannot be improved immediately, it will immediately affect human health. In order to purify the gas and reduce the human body in the surrounding environment near the user's breathing part The impact of health, using gas monitoring and purification equipment to provide a solution to air pollution, is an important subject of research and development in this case.

本案之主要目的係提供一種氣體監測及淨化裝置,利用支撐框體之可攜帶移動及可調整定位之便利性,讓使用者得以環繞依靠固定使用,而該支撐框體上所嵌設氣體監測機來淨化使用者周遭環境之氣體,以降低環境中的空汙氣體暴露所造成人體健康影響及傷害,以及透過該氣體監測機提供氣體監測資訊,進而提供空氣品質通報機制給使用者實施防護措施。 The main purpose of this case is to provide a gas monitoring and purification device that utilizes the convenience of the portable frame and the adjustable positioning of the support frame to allow users to surround and use it fixedly, and the gas monitoring machine is embedded on the support frame To purify the air surrounding the user, to reduce the human health impact and injury caused by the exposure of air pollution in the environment, and to provide gas monitoring information through the gas monitoring machine, and then provide an air quality notification mechanism for the user to implement protective measures.

為達上述目的,本案之一較廣義實施態樣為一種氣體監測及淨化裝置,包含:一支撐框體,為一可撓支撐體,其一端處設有一第一嵌入槽及複數個第一通氣孔,該複數個第一通氣孔與該第一嵌入槽連通;以及一氣體監測機,嵌置於該第一嵌入槽中定位,包含:一本體,設有一進氣口、一排氣口;至少一氣體監測模組,設置於該進氣口、該排氣口之間,該氣體監測模組包含有一氣體致動器及一氣體傳感器,該氣體致動器控制氣體由該進氣口導入該氣體監測模組內,透過該氣體傳感器進行監測;至少一微粒監測模組,設置連通於該進氣口、該排氣口之間,該微粒監測模組包含有一微粒致動器及一微粒傳感器,該微粒致動器控制氣體由該進氣口導入該微粒監測模組內部,以該微粒傳感器監測氣體中所含懸浮微粒的粒徑及濃度;至少一淨化氣體模組,設置連通於該進氣口、該排氣口之間,該淨化氣體模組包含一第一淨化致動器及一第一淨化單元,該第一淨化致動器控制氣體由該進氣口導入該淨化氣體模組內部,透過該第一淨化單元淨化氣體,淨化後氣體由該排氣口排出該本體外,而該排氣口對應該複數個第一通氣孔,使淨化後氣體由該複數個第一通氣孔排出供使用者吸取。 To achieve the above purpose, one of the broader implementation aspects of this case is a gas monitoring and purification device, which includes: a support frame, which is a flexible support body, and a first insertion groove and a plurality of first channels are provided at one end thereof Air holes, the plurality of first air holes communicate with the first insertion groove; and a gas monitoring machine, embedded in the first insertion groove for positioning, including: a body with an air inlet and an air outlet; At least one gas monitoring module is disposed between the gas inlet and the gas outlet, the gas monitoring module includes a gas actuator and a gas sensor, and the gas actuator controls gas to be introduced from the gas inlet In the gas monitoring module, monitoring is performed through the gas sensor; at least one particle monitoring module is arranged to communicate between the air inlet and the exhaust port, the particle monitoring module includes a particle actuator and a particle Sensor, the particle actuator control gas is introduced into the particle monitoring module from the air inlet, and the particle sensor monitors the particle size and concentration of suspended particles contained in the gas; at least one purge gas module is provided to communicate with the Between the intake port and the exhaust port, the purge gas module includes a first purge actuator and a first purge unit. The first purge actuator controls the gas from the intake port to the purge gas module Inside the group, the gas is purified through the first purification unit, and the purified gas is discharged from the body through the exhaust port, and the exhaust port corresponds to a plurality of first vent holes, so that the purified gas is passed through the plurality of first vents The air holes are discharged for users to suck.

1‧‧‧支撐框體 1‧‧‧support frame

11a‧‧‧第一嵌入槽 11a‧‧‧First insertion slot

11b‧‧‧第二嵌入槽 11b‧‧‧Second insertion groove

12a‧‧‧複數個第一通氣孔 12a‧‧‧ plural first vents

12b‧‧‧複數個第二通氣孔 12b‧‧‧multiple second vents

2‧‧‧氣體監測機 2‧‧‧Gas monitoring machine

21‧‧‧本體 21‧‧‧Body

211‧‧‧進氣口 211‧‧‧Air inlet

212‧‧‧排氣口 212‧‧‧Exhaust

22‧‧‧氣體監測模組 22‧‧‧Gas monitoring module

221‧‧‧氣體致動器 221‧‧‧ gas actuator

222‧‧‧氣體傳感器 222‧‧‧ gas sensor

223‧‧‧第一隔腔本體 223‧‧‧The first compartment body

224‧‧‧氣道隔板 224‧‧‧Airway partition

225‧‧‧氣體進氣通道 225‧‧‧Gas intake channel

226‧‧‧氣體排氣通道 226‧‧‧Gas exhaust channel

227‧‧‧氣道連通口 227‧‧‧Airway connection

23‧‧‧微粒監測模組 23‧‧‧Particle monitoring module

231‧‧‧微粒致動器 231‧‧‧Particulate actuator

232‧‧‧微粒傳感器 232‧‧‧Particle sensor

233‧‧‧第二隔腔本體 233‧‧‧Second compartment body

234‧‧‧承載隔板 234‧‧‧Bearing partition

235‧‧‧微粒監測基座 235‧‧‧Particle monitoring base

235a‧‧‧承置槽 235a‧‧‧Bearing slot

235b‧‧‧監測通道 235b‧‧‧Monitoring channel

235c‧‧‧光束通道 235c‧‧‧beam channel

235d‧‧‧容置室 235d‧‧‧accommodation room

236‧‧‧雷射發射器 236‧‧‧Laser launcher

237‧‧‧監測進氣通道 237‧‧‧Monitor the intake channel

238‧‧‧監測排氣通道 238‧‧‧Monitor exhaust channel

24‧‧‧淨化氣體模組 24‧‧‧ Purified gas module

241‧‧‧第一淨化致動器 241‧‧‧The first purification actuator

242‧‧‧第一淨化單元 242‧‧‧The first purification unit

242a‧‧‧濾網 242a‧‧‧filter

242b‧‧‧光觸媒 242b‧‧‧Photocatalyst

242c‧‧‧紫外線燈 242c‧‧‧UV lamp

242d‧‧‧奈米光管 242d‧‧‧Nano light tube

242e‧‧‧電極線 242e‧‧‧electrode wire

242f‧‧‧集塵板 242f‧‧‧dust collecting board

242g‧‧‧升壓電源器 242g‧‧‧Boost power supply

242h‧‧‧電場上護網 242h‧‧‧Electric field protection net

242i‧‧‧吸附濾網 242i‧‧‧Adsorption filter

242j‧‧‧高壓放電極 242j‧‧‧High voltage discharge electrode

242k‧‧‧電場下護網 242k‧‧‧protective net under electric field

243‧‧‧第三膈腔本體 243‧‧‧The third diaphragm body

244‧‧‧第一淨化通道 244‧‧‧The first purification channel

3‧‧‧氣體泵浦 3‧‧‧gas pump

31‧‧‧進氣板 31‧‧‧ Intake Board

31a‧‧‧進氣孔 31a‧‧‧Air inlet

31b‧‧‧匯流排孔 31b‧‧‧Bus hole

31c‧‧‧匯流腔室 31c‧‧‧Combination chamber

32‧‧‧共振片 32‧‧‧Resonance

32a‧‧‧中空孔 32a‧‧‧Hollow hole

32b‧‧‧可動部 32b‧‧‧Moving part

32c‧‧‧固定部 32c‧‧‧Fixed Department

33‧‧‧壓電致動器 33‧‧‧ Piezo Actuator

33a‧‧‧懸浮板 33a‧‧‧Suspended board

331a‧‧‧第一表面 331a‧‧‧First surface

332a‧‧‧第二表面 332a‧‧‧Second surface

33b‧‧‧外框 33b‧‧‧frame

331b‧‧‧組配表面 331b‧‧‧Combination surface

332b‧‧‧下表面 332b‧‧‧Lower surface

33c‧‧‧連接部 33c‧‧‧Connect

33d‧‧‧壓電元件 33d‧‧‧ Piezoelectric element

33e‧‧‧間隙 33e‧‧‧Gap

33f‧‧‧凸部 33f‧‧‧Convex

331f‧‧‧凸部表面 331f‧‧‧Convex surface

34‧‧‧絕緣片 34‧‧‧Insulation sheet

35‧‧‧導電片 35‧‧‧Conductive sheet

36‧‧‧腔室空間 36‧‧‧ chamber space

4‧‧‧鼓風箱氣體泵浦 4‧‧‧Blower box gas pump

41‧‧‧噴氣孔片 41‧‧‧Future Orifice

41a‧‧‧連接件 41a‧‧‧Connector

41b‧‧‧懸浮片 41b‧‧‧Suspended tablets

41c‧‧‧中空孔洞 41c‧‧‧Hollow hole

42‧‧‧腔體框架 42‧‧‧Cavity frame

43‧‧‧致動體 43‧‧‧actuator

43a‧‧‧壓電載板 43a‧‧‧ Piezo carrier

43b‧‧‧調整共振板 43b‧‧‧Adjust resonance plate

43c‧‧‧壓電板 43c‧‧‧ Piezoelectric plate

44‧‧‧絕緣框架 44‧‧‧Insulation frame

45‧‧‧導電框架 45‧‧‧ conductive frame

46‧‧‧共振腔室 46‧‧‧Resonance chamber

47‧‧‧氣流腔室 47‧‧‧Airflow chamber

g‧‧‧腔室間距 g‧‧‧Chamber spacing

5‧‧‧淨化氣體機 5‧‧‧ Purified gas machine

51‧‧‧第二淨化致動器 51‧‧‧Second purification actuator

52‧‧‧第二淨化單元 52‧‧‧Second purification unit

52a‧‧‧濾網 52a‧‧‧Filter

52b‧‧‧光觸媒 52b‧‧‧Photocatalyst

52c‧‧‧紫外線燈 52c‧‧‧UV lamp

52d‧‧‧奈米光管 52d‧‧‧Nano light tube

52e‧‧‧電極線 52e‧‧‧electrode wire

52f‧‧‧集塵板 52f‧‧‧dust collecting board

52g‧‧‧升壓電源器 52g‧‧‧Boost power supply

52h‧‧‧電場上護網 52h‧‧‧Electric field protection net

52i‧‧‧吸附濾網 52i‧‧‧Adsorption filter

52j‧‧‧高壓放電極 52j‧‧‧High voltage discharge electrode

52k‧‧‧電場下護網 52k‧‧‧protection net under electric field

53‧‧‧外框本體 53‧‧‧frame body

54‧‧‧淨化進氣口 54‧‧‧ Purified air inlet

55‧‧‧淨化出氣口 55‧‧‧ Purified air outlet

56‧‧‧第二淨化通道 56‧‧‧Second purification channel

6‧‧‧驅動控制模組 6‧‧‧Drive control module

6a‧‧‧微處理器 6a‧‧‧Microprocessor

6b‧‧‧物聯網通訊器 6b‧‧‧Internet of things communicator

6c‧‧‧全球定位系統元件 6c‧‧‧Global Positioning System components

6d‧‧‧資料通訊器 6d‧‧‧Data Communicator

7‧‧‧連網中繼站 7‧‧‧Connected relay station

8‧‧‧雲端資料處理裝置 8‧‧‧Cloud data processing device

9‧‧‧連結裝置 9‧‧‧Connecting device

第1圖為本案氣體監測及淨化裝置之外觀示意圖。 Figure 1 is a schematic diagram of the appearance of the gas monitoring and purification device in this case.

第2圖為本案氣體監測及淨化裝置之支撐框體外觀示意圖。 Figure 2 is a schematic view of the appearance of the support frame of the gas monitoring and purification device in this case.

第3圖為本案氣體監測及淨化裝置之氣體監測機嵌置於支撐框體之剖面示意圖。 Figure 3 is a schematic cross-sectional view of the gas monitoring machine of the gas monitoring and purifying device of this case embedded in a supporting frame.

第4圖為本案氣體監測機之氣體監測模組剖面示意圖。 Figure 4 is a schematic cross-sectional view of the gas monitoring module of the gas monitoring machine in this case.

第5圖為本案氣體監測機之微粒監測模組剖面示意圖。 Figure 5 is a schematic cross-sectional view of the particulate monitoring module of the gas monitoring machine in this case.

第6A圖為本案氣體監測機之淨化氣體模組之第一淨化單元第一實施例剖面示意圖。 FIG. 6A is a schematic cross-sectional view of the first embodiment of the first purification unit of the purification gas module of the gas monitoring machine of this case.

第6B圖為本案氣體監測機之淨化氣體模組之第一淨化單元第二實施例剖面示意圖。 FIG. 6B is a schematic cross-sectional view of the second embodiment of the first purification unit of the purification gas module of the gas monitoring machine of this case.

第6C圖為本案氣體監測機之淨化氣體模組之第一淨化單元第三實施例剖面示意圖。 FIG. 6C is a schematic cross-sectional view of the third embodiment of the first purification unit of the purification gas module of the gas monitoring machine of this case.

第6D圖為本案氣體監測機之淨化氣體模組之第一淨化單元第四實施例剖面示意圖。 FIG. 6D is a schematic cross-sectional view of the fourth embodiment of the first purification unit of the purification gas module of the gas monitoring machine of this case.

第6E圖為本案氣體監測機之淨化氣體模組之第一淨化單元第五實施例剖面示意圖。 FIG. 6E is a schematic cross-sectional view of the fifth embodiment of the first purification unit of the purification gas module of the gas monitoring machine of this case.

第7A及7B圖所示分別為本案氣體泵浦於不同視角之分解結構示意圖。 Figures 7A and 7B are schematic diagrams showing the exploded structure of the gas pump at different viewing angles in this case.

第7C圖所示為第7A及7B圖所示之氣體泵浦之剖面示意圖。 Figure 7C is a schematic cross-sectional view of the gas pump shown in Figures 7A and 7B.

第7D至7F圖所示為第7C圖所示之氣體泵浦之作動示意圖。 Figures 7D to 7F are schematic diagrams of the operation of the gas pump shown in Figure 7C.

第8A圖所示為本案鼓風箱氣體泵浦相關構件分解示意圖。 Figure 8A shows an exploded schematic view of the relevant components of the blower box gas pump in this case.

第8B至8D圖所示為第8A圖所示之鼓風箱氣體泵浦之作動示意圖。 Figures 8B to 8D are schematic diagrams showing the operation of the gas pump for the blower box shown in Figure 8A.

第9A圖為本案氣體監測及淨化裝置之淨化氣體機嵌置於支撐框體之第二淨化單元第一實施例剖面示意圖。 FIG. 9A is a schematic cross-sectional view of a first embodiment of a second purification unit in which a purified gas machine of the gas monitoring and purification device of this case is embedded in a support frame.

第9B圖為本案氣體監測及淨化裝置之淨化氣體機嵌置於支撐框體之第二淨化單元第二實施例剖面示意圖。 FIG. 9B is a schematic cross-sectional view of a second embodiment of a second purification unit in which a purified gas machine of the gas monitoring and purification device of this case is embedded in a support frame.

第9C圖為本案氣體監測及淨化裝置之淨化氣體機嵌置於支撐框體之第二淨化單元第三實施例剖面示意圖。 FIG. 9C is a schematic cross-sectional view of a third embodiment of a second purification unit in which a purified gas machine of the gas monitoring and purification device of the present case is embedded in a support frame.

第9D圖為本案氣體監測及淨化裝置之淨化氣體機嵌置於支撐框體之第二淨化單元第四實施例剖面示意圖。 FIG. 9D is a schematic cross-sectional view of a fourth embodiment of a second purification unit in which a purified gas machine of the gas monitoring and purification device of this case is embedded in a support frame.

第9E圖為本案氣體監測及淨化裝置之淨化氣體機嵌置於支撐框體之第二淨化單元第五實施例剖面示意圖。 FIG. 9E is a schematic cross-sectional view of a fifth embodiment of a second purification unit in which a purified gas machine of the gas monitoring and purification device of this case is embedded in a support frame.

第10圖為本案氣體監測及淨化裝置之淨化氣體機實施資訊傳輸架構示意圖。 Figure 10 is a schematic diagram of the information transmission structure of the purifying gas machine of the gas monitoring and purifying device in this case.

體現本案特徵與優點的一些典型實施例將在後段的說明中詳細敘述。應理解的是本案能夠在不同的態樣上具有各種的變化,其皆不脫離本案的範圍,且其中的說明及圖示在本質上當作說明之用,而非用以限制本案。 Some typical embodiments embodying the characteristics and advantages of this case will be described in detail in the description in the following paragraphs. It should be understood that this case can have various changes in different forms, which all do not deviate from the scope of this case, and the descriptions and illustrations therein are essentially used for explanation rather than to limit this case.

請參閱第1圖、第2圖及第3圖所示,本案之氣體監測及淨化裝置包含一支撐框體1及至少一氣體監測機2。支撐框體1為一可撓支撐體,可供使用者置位於頭部或頸部附近定位使用,其一端設有一第一嵌入槽11a及複數個第一通氣孔12a,複數個第一通氣孔12a與第一嵌入槽11a相連通;而氣體監測機2嵌置於第一嵌入槽11a中定位,氣體監測機2包含:至少一本體21、至少一氣體監測模組22、至少一微粒監測模組23及至少一淨化氣體模組24。 Please refer to FIG. 1, FIG. 2 and FIG. 3, the gas monitoring and purifying device in this case includes a supporting frame 1 and at least one gas monitoring machine 2. The support frame 1 is a flexible support body, which can be used by the user for positioning near the head or neck. One end is provided with a first insertion groove 11a and a plurality of first ventilation holes 12a, and the plurality of first ventilation holes 12a communicates with the first insertion groove 11a; and the gas monitoring machine 2 is embedded in the first insertion groove 11a for positioning. The gas monitoring machine 2 includes: at least one body 21, at least one gas monitoring module 22, and at least one particle monitoring module Group 23 and at least one purified gas module 24.

上述氣體監測機2之本體21設有一進氣口211及一排氣口212,內部可以組設多個氣體監測模組22、多個微粒監測模組23及多個淨化氣體模組24來監測氣體及淨化氣體使用。以下說明為避免贅述僅以一個氣體監 測模組22、一個微粒監測模組23及一個淨化氣體模組24使用作舉例說明,但不以此為限。 The body 21 of the gas monitoring machine 2 is provided with an air inlet 211 and an air outlet 212, and a plurality of gas monitoring modules 22, a plurality of particulate monitoring modules 23 and a plurality of purified gas modules 24 can be set up for monitoring Use of gas and purified gas. The following description uses only one gas The measuring module 22, a particle monitoring module 23, and a purge gas module 24 are used as examples, but not limited thereto.

如第3圖及第4圖所示,上述之氣體監測模組22設置於進氣口211、排氣口212之間,且氣體監測模組22包括一氣體致動器221、一氣體傳感器222及一第一隔腔本體223,其中第一隔腔本體223內部由一氣道隔板224區隔出相互連通之一氣體進氣通道225及一氣體排氣通道226,氣體進氣通道225對應連通進氣口211,且氣體傳感器222設置在氣體進氣通道225中,而氣體排氣通道226連通排氣口212,且氣體致動器221設置在氣體排氣通道226中,且定位於氣道隔板224上,又氣道隔板224設有一氣道連通口227,以連通氣體進氣通道225及氣體排氣通道226,如此氣體傳感器222設置於氣體進氣通道225中,並且透過氣道隔板224而與氣體致動器221保持相互隔離,因此氣體致動器221致動運作時,因其振動會產生熱源,氣道隔板224就能抑制這些熱源避免影響氣體傳感器222之偵測靈敏度,藉此氣體致動器221控制氣體由進氣口211導入氣體監測模組22內,透過氣體傳感器222進行監測以產生監測資料,且監測後氣體由排氣口212排出。 As shown in FIGS. 3 and 4, the above gas monitoring module 22 is disposed between the air inlet 211 and the exhaust port 212, and the gas monitoring module 22 includes a gas actuator 221 and a gas sensor 222 And a first compartment body 223, wherein a gas inlet channel 225 and a gas exhaust channel 226 that communicate with each other are separated by an air channel partition 224 inside the first compartment body 223, and the gas inlet channel 225 communicates correspondingly The gas inlet 211, and the gas sensor 222 are disposed in the gas inlet channel 225, and the gas exhaust channel 226 communicates with the exhaust port 212, and the gas actuator 221 is disposed in the gas exhaust channel 226, and is positioned at the air channel partition On the plate 224, the airway partition 224 is provided with an airway communication port 227 to connect the gas inlet channel 225 and the gas exhaust channel 226, so that the gas sensor 222 is disposed in the gas inlet channel 225 and passes through the airway partition 224 The gas actuator 221 is kept isolated from each other. Therefore, when the gas actuator 221 is actuated, heat sources are generated due to its vibration. The airway baffle 224 can suppress these heat sources and avoid affecting the detection sensitivity of the gas sensor 222. The actuator 221 controls the gas to be introduced into the gas monitoring module 22 from the air inlet 211, monitors through the gas sensor 222 to generate monitoring data, and the gas is discharged from the air outlet 212 after monitoring.

本案之氣體傳感器222可為一氧氣傳感器、一一氧化碳傳感器、一二氧化碳傳感器、一溫度傳感器、一臭氧傳感器及一揮發性有機物傳感器之至少其中之一或其組合;或,上述之氣體傳感器222可為細菌傳感器、一病毒傳感器或一微生物傳感器之至少其中之一或其組合,均不以此為限。 The gas sensor 222 in this case may be at least one of an oxygen sensor, a carbon monoxide sensor, a carbon dioxide sensor, a temperature sensor, an ozone sensor and a volatile organic compound sensor or a combination thereof; or, the gas sensor 222 may be At least one of the bacterial sensor, a virus sensor or a microbial sensor or a combination thereof is not limited thereto.

再請參閱第7A圖至第7F圖所示,本案氣體致動器221為一流體輸送組件,流體輸送組件可為一氣體泵浦3,氣體泵浦3包含有依序堆疊的一進氣板31、一共振片32、一壓電致動器33、一絕緣片34、一導電片35。 進氣板31具有至少一進氣孔31a、至少一匯流排孔31b及一匯流腔室31c,上述之進氣孔31a與匯流排孔31b其數量相同,於本實施例中,進氣孔31a與匯流排孔31b以數量4個作舉例說明,並不以此為限;4個進氣孔31a分別貫通4個匯流排孔31b,且4個匯流排孔31b匯流到匯流腔室31c。 Please refer to FIGS. 7A to 7F again. In this case, the gas actuator 221 is a fluid conveying component. The fluid conveying component may be a gas pump 3, and the gas pump 3 includes an intake plate stacked in sequence. 31. A resonance sheet 32, a piezoelectric actuator 33, an insulating sheet 34, and a conductive sheet 35. The air intake plate 31 has at least one air intake hole 31a, at least one busbar hole 31b and a busbar chamber 31c. The number of the above air intake holes 31a and the busbar holes 31b are the same. In this embodiment, the air intake holes 31a The number of the bus bar holes 31b is exemplified by four, which is not limited to this; the four intake holes 31a respectively pass through the four bus bar holes 31b, and the four bus bar holes 31b converge to the bus chamber 31c.

上述之共振片32,可透過貼合方式組接於進氣板31上,且共振片32上具有一中空孔32a、一可動部32b及一固定部32c,中空孔32a位於共振片32的中心處,並與進氣板31的匯流腔室31c對應,而設置於中空孔32a的周圍且與匯流腔室31c相對的區域為可動部32b,而設置於共振片32的外周緣部分貼固於進氣板31上則為固定部32c。 The above-mentioned resonance plate 32 can be assembled on the air intake plate 31 by a bonding method, and the resonance plate 32 has a hollow hole 32a, a movable portion 32b, and a fixed portion 32c, and the hollow hole 32a is located in the center of the resonance plate 32 And corresponds to the confluence chamber 31c of the air intake plate 31, and the area provided around the hollow hole 32a and opposed to the confluence chamber 31c is the movable portion 32b, and the outer peripheral portion of the resonance plate 32 is fixed to On the air intake plate 31 is a fixed portion 32c.

上述之壓電致動器33,包含有一懸浮板33a、一外框33b、至少一連接部33c、一壓電元件33d、至少一間隙33e及一凸部33f;其中,懸浮板33a為一正方型懸浮板,具有第一表面331a及相對第一表面331a的一第二表面332a,外框33b環繞設置於懸浮板33a的周緣,且外框33b具有一組配表面331b及一下表面332b,並透過至少一連接部33c連接於懸浮板33a與外框33b之間,以提供彈性支撐懸浮板33a的支撐力,其中,至少一間隙33e為懸浮板33a、外框33b與連接部33c之間的空隙,用以供氣體通過。此外,懸浮板33a的第一表面331a具有凸部33f,凸部33f於本實施例中係將凸部33f的周緣且鄰接於連接部33c的連接處透過蝕刻製程,使其下凹,來使懸浮板33a的凸部33f高於第一表面331a來形成階梯狀結構。 The above piezoelectric actuator 33 includes a floating plate 33a, an outer frame 33b, at least one connecting portion 33c, a piezoelectric element 33d, at least one gap 33e and a convex portion 33f; wherein, the floating plate 33a is a square The suspension board has a first surface 331a and a second surface 332a opposite to the first surface 331a. The outer frame 33b surrounds the periphery of the suspension board 33a, and the outer frame 33b has a set of matching surfaces 331b and a lower surface 332b, and Connected between the suspension plate 33a and the outer frame 33b through at least one connecting portion 33c to provide a supporting force for elastically supporting the suspension plate 33a, wherein at least one gap 33e is between the suspension plate 33a, the outer frame 33b and the connecting portion 33c The gap is for gas to pass through. In addition, the first surface 331a of the floating plate 33a has a convex portion 33f. In this embodiment, the convex portion 33f passes the peripheral edge of the convex portion 33f and is adjacent to the connection portion 33c through an etching process to make it concave, so that The convex portion 33f of the floating plate 33a is higher than the first surface 331a to form a stepped structure.

又如第7C圖所示,本實施例之懸浮板33a採以沖壓成形使其向下凹陷,其下陷距離可由至少一連接部33c成形於懸浮板33a與外框33b之間所調整,使在懸浮板33a上的凸部33f的凸部表面331f與外框33b的組配表 面331b兩者形成非共平面,亦即凸部33f的凸部表面331f將低於外框33b的組配表面331b,且懸浮板33a的第二表面332a低於外框33b的下表面332b,又壓電元件33d貼附於懸浮板33a的第二表面332a,與凸部33f相對設置,壓電元件33d被施加驅動電壓後由於壓電效應而產生形變,進而帶動懸浮板33a彎曲振動;利用於外框33b的組配表面331b上塗佈少量黏合劑,以熱壓方式使壓電致動器33貼合於共振片32的固定部32c,進而使得壓電致動器33得以與共振片32組配結合。此外,絕緣片34及導電片35皆為框型的薄型片體,依序堆疊於壓電致動器33下。於本實施例中,絕緣片34貼附於壓電致動器33之外框33b的下表面332b。 As also shown in FIG. 7C, the suspension board 33a of this embodiment is stamped to make it sink downward, and the sag distance can be adjusted by forming at least one connecting portion 33c between the suspension board 33a and the outer frame 33b, so that The combination table of the convex portion surface 331f of the convex portion 33f on the floating plate 33a and the outer frame 33b Both surfaces 331b form a non-coplanar surface, that is, the convex surface 331f of the convex portion 33f will be lower than the mating surface 331b of the outer frame 33b, and the second surface 332a of the floating plate 33a is lower than the lower surface 332b of the outer frame 33b, The piezoelectric element 33d is attached to the second surface 332a of the suspension plate 33a, and is arranged opposite to the convex portion 33f. After the driving voltage is applied to the piezoelectric element 33d, the piezoelectric element deforms due to the piezoelectric effect, which in turn drives the suspension plate 33a to flex vibration; A small amount of adhesive is coated on the assembly surface 331b of the outer frame 33b, and the piezoelectric actuator 33 is bonded to the fixing portion 32c of the resonance plate 32 by hot pressing, thereby allowing the piezoelectric actuator 33 to be connected to the resonance plate 32 combinations. In addition, the insulating sheet 34 and the conductive sheet 35 are both frame-shaped thin sheets, which are sequentially stacked under the piezoelectric actuator 33. In this embodiment, the insulating sheet 34 is attached to the lower surface 332b of the outer frame 33b of the piezoelectric actuator 33.

請繼續參閱第7C圖所示,氣體泵浦3的進氣板31、共振片32、壓電致動器33、絕緣片34、導電片35依序堆疊結合後,其中懸浮板33a與共振片32之間形成一腔室間距g,腔室間距g將會影響氣體泵浦3的傳輸效果,故維持一固定的腔室間距g對於氣體泵浦3提供穩定的傳輸效率是十分重要。本案之氣體泵浦3對懸浮板33a使用沖壓方式,使其向下凹陷,讓懸浮板33a的第一表面331a與外框33b的組配表面331b兩者為非共平面,亦即懸浮板33a的第一表面331a將低於外框33b的組配表面331b,且懸浮板33a的第二表面332a低於外框33b的下表面332b,使得壓電致動器33之懸浮板33a凹陷形成一空間得與共振片32構成一可調整之腔室間距g,直接透過將上述壓電致動器33之懸浮板33a採以成形凹陷構成一腔室空間36的結構改良,如此一來,所需的腔室間距g得以透過調整壓電致動器33之懸浮板33a成形凹陷距離來完成,有效地簡化了調整腔室間距g的結構設計,同時也達成簡化製程,縮短製程時間等優點。 Please continue to refer to FIG. 7C. After the air intake plate 31, the resonance plate 32, the piezoelectric actuator 33, the insulating plate 34, and the conductive plate 35 of the gas pump 3 are sequentially stacked and combined, the suspension plate 33a and the resonance plate A chamber distance g is formed between 32, and the chamber distance g will affect the transmission effect of the gas pump 3. Therefore, maintaining a fixed chamber distance g is very important for the gas pump 3 to provide stable transmission efficiency. In this case, the gas pump 3 uses a stamping method on the suspension plate 33a to make it concave downward, so that both the first surface 331a of the suspension plate 33a and the mating surface 331b of the outer frame 33b are non-coplanar, that is, the suspension plate 33a The first surface 331a will be lower than the assembly surface 331b of the outer frame 33b, and the second surface 332a of the suspension plate 33a is lower than the lower surface 332b of the outer frame 33b, so that the suspension plate 33a of the piezoelectric actuator 33 is recessed to form a The space and the resonant sheet 32 constitute an adjustable chamber spacing g, and the structure of the chamber space 36 is directly improved by forming the hollow plate 33a of the piezoelectric actuator 33 into a recess, so that the required The cavity spacing g can be achieved by adjusting the forming recess distance of the suspension plate 33a of the piezoelectric actuator 33, which effectively simplifies the structural design of adjusting the cavity spacing g, and at the same time achieves the advantages of simplifying the process and shortening the process time.

第7D圖至第7F圖為第7C圖所示之氣體泵浦3的作動示意圖。請先參閱第7D圖,壓電致動器33的壓電元件33d被施加驅動電壓後產生形變帶動 懸浮板33a向下位移,此時腔室空間36的容積提升,於腔室空間36內形成了負壓,便汲取匯流腔室31c內的空氣進入腔室空間36內,同時共振片32受到共振原理的影響被同步向下位移,連帶增加了匯流腔室31c的容積,且因匯流腔室31c內的空氣進入腔室空間36的關係,造成匯流腔室31c內同樣為負壓狀態,進而通過匯流排孔31b、進氣孔31a來吸取空氣進入匯流腔室31c內;請再參閱第7E圖,壓電元件33d帶動懸浮板33a向上位移,壓縮腔室空間36,迫使腔室空間36內的空氣通過間隙33e向下傳輸,來達到傳輸空氣的效果,同時間,共振片32同樣被懸浮板33a因共振而向上位移,同步推擠匯流腔室31c內的氣體往腔室空間36移動;最後請參閱第7F圖,當懸浮板33a被向下帶動時,共振片32也同時被帶動而向下位移,此時的共振片32將使壓縮腔室空間36內的氣體向至少一間隙33e移動,並且提升匯流腔室31c內的容積,讓氣體能夠持續地通過進氣孔31a、匯流排孔31b來匯聚於匯流腔室31c內,透過不斷地重複上述步驟,使氣體泵浦3能夠連續將氣體自進氣孔31a進入,再由至少一間隙33e向下傳輸,以不斷地汲取氣體監測機2外的氣體進入,提供氣體給氣體傳感器222感測,提升感測效率。 Figures 7D to 7F are schematic diagrams of the operation of the gas pump 3 shown in Figure 7C. Please refer to FIG. 7D first, the piezoelectric element 33d of the piezoelectric actuator 33 is deformed and driven by the application of a driving voltage The suspension plate 33a is displaced downward, and at this time, the volume of the chamber space 36 is raised, a negative pressure is formed in the chamber space 36, and the air in the confluence chamber 31c is drawn into the chamber space 36, and the resonance plate 32 is resonated The influence of the principle is shifted downward synchronously, which increases the volume of the confluence chamber 31c, and because the air in the confluence chamber 31c enters the chamber space 36, the confluence chamber 31c is also in a negative pressure state, and then passes The bus bar hole 31b and the air inlet hole 31a draw air into the bus chamber 31c; please refer to FIG. 7E again, the piezoelectric element 33d drives the suspension plate 33a to move upward, compressing the chamber space 36, forcing the chamber space 36 The air is transmitted downward through the gap 33e to achieve the effect of transmitting air. At the same time, the resonance plate 32 is also displaced upward by the suspension plate 33a due to resonance, and synchronously pushes the gas in the confluence chamber 31c toward the chamber space 36; finally Please refer to FIG. 7F. When the suspension plate 33a is driven downward, the resonance plate 32 is also driven and displaced downward. At this time, the resonance plate 32 will move the gas in the compression chamber space 36 to at least one gap 33e And increase the volume in the confluence chamber 31c, so that the gas can continue to converge in the confluence chamber 31c through the air inlet hole 31a and the confluence row hole 31b. By continuously repeating the above steps, the gas pump 3 can continuously The gas enters from the air inlet 31a, and then is transmitted downward through at least one gap 33e to continuously draw the gas outside the gas monitoring machine 2 to enter, providing gas to be sensed by the gas sensor 222 to improve the sensing efficiency.

請繼續參閱第7C圖,上述氣體致動器221為一氣體泵浦3,而氣體致動器221為一種流體輸送組件,流體輸送組件也可為透過微機電製程的方式所製出的微機電系統氣體泵浦,其中,進氣板31、共振片32、壓電致動器33、絕緣片34、導電片35皆可透過面型微加工技術製成,以縮小整個泵浦的體積。 Please continue to refer to FIG. 7C. The gas actuator 221 is a gas pump 3, and the gas actuator 221 is a fluid delivery component. The fluid delivery component may also be a microelectromechanical device manufactured by a microelectromechanical process The system gas pump, in which the air intake plate 31, the resonance plate 32, the piezoelectric actuator 33, the insulating plate 34, and the conductive plate 35 can be made by surface micromachining technology to reduce the volume of the entire pump.

當然,請參閱第8A圖、第8B圖至第8D圖所示,本案氣體致動器221為一種流體輸送組件,流體輸送組件也可為一種鼓風箱氣體泵浦4(BLOWER PUMP),鼓風箱氣體泵浦4包含有依序堆疊之噴氣孔片41、 腔體框架42、致動體43、絕緣框架44及導電框架45;噴氣孔片41包含了複數個連接件41a、一懸浮片41b及一中空孔洞41c,懸浮片41b可彎曲振動,複數個連接件41a鄰接於懸浮片41b的周緣,本實施例中,連接件41a其數量為4個,分別鄰接於懸浮片41b的4個角落,但不此以為限,而中空孔洞41c形成於懸浮片41b的中心位置;腔體框架42承載疊置於懸浮片41b上,致動體43承載疊置於腔體框架42上,並包含了一壓電載板43a、一調整共振板43b、一壓電板43c,其中,壓電載板43a承載疊置於腔體框架42上,調整共振板43b承載疊置於壓電載板43a上,壓電板43c承載疊置於調整共振板43b上,供施加電壓後發生形變以帶動壓電載板43a及調整共振板43b進行往復式彎曲振動;絕緣框架44則是承載疊置於致動體43之壓電載板43a上,導電框架45承載疊置於絕緣框架44上,其中,致動體43、腔體框架42及懸浮片41b之間形成一共振腔室46。 Of course, please refer to FIGS. 8A, 8B to 8D, the gas actuator 221 in this case is a fluid delivery assembly, and the fluid delivery assembly can also be a blower box gas pump 4 (BLOWER PUMP), drum The bellows gas pump 4 includes air jet holes 41 stacked in sequence, The cavity frame 42, the actuating body 43, the insulating frame 44 and the conductive frame 45; the air jet hole piece 41 includes a plurality of connecting pieces 41a, a suspension piece 41b and a hollow hole 41c, the suspension piece 41b can bend and vibrate, a plurality of connections The piece 41a is adjacent to the peripheral edge of the suspension piece 41b. In this embodiment, the number of the connecting pieces 41a is four, respectively adjacent to the four corners of the suspension piece 41b, but not limited to this, and the hollow hole 41c is formed in the suspension piece 41b The center position of the cavity frame 42 is stacked on the suspension piece 41b, the actuator 43 is stacked on the cavity frame 42, and includes a piezoelectric carrier plate 43a, a tuning resonance plate 43b, a piezoelectric Plate 43c, wherein the piezoelectric carrier plate 43a bears and stacks on the cavity frame 42, the adjustment resonance plate 43b supports and stacks on the piezoelectric carrier plate 43a, and the piezoelectric plate 43c supports and stacks on the adjustment resonance plate 43b for After the voltage is applied, it deforms to drive the piezoelectric carrier plate 43a and the tuning resonance plate 43b for reciprocating bending vibration; the insulating frame 44 carries the piezoelectric carrier plate 43a stacked on the actuator 43, and the conductive frame 45 carries the stack On the insulating frame 44, a resonance chamber 46 is formed between the actuating body 43, the cavity frame 42 and the suspension piece 41b.

再請參閱第8B圖至第8D圖為本案之鼓風箱氣體泵浦4之作動示意圖。請先參閱第8B圖所示,鼓風箱氣體泵浦4透過連接件41a定位,噴氣孔片41底面間形成氣流腔室47;請再參閱第8C圖,當施加電壓於致動體43之壓電板43c時,壓電板43c因壓電效應開始產生形變並同步帶動調整共振板43b與壓電載板43a,此時,噴氣孔片41會因亥姆霍茲共振(Helmholtz resonance)原理一起被帶動,使得致動體43向上移動,由於致動體43向上位移,使得氣流腔室47的容積增加,其內部氣壓形成負壓,於鼓風箱氣體泵浦4外的空氣將因為壓力梯度由噴氣孔片41的連接件41a與側壁之間的空隙進入氣流腔室47並進行集壓;最後請參閱第8C圖,氣體不斷地進入氣流腔室47內,使氣流腔室47內的氣壓形成正 壓,此時,致動體43受電壓驅動向下移動,將壓縮氣流腔室47的容積,並且推擠氣流腔室47內氣體,致使傳導氣體流通。 Please refer to FIGS. 8B to 8D for the action diagram of the blower box gas pump 4 in this case. Please first refer to FIG. 8B, the blower box gas pump 4 is positioned through the connecting piece 41a, and the air flow chamber 47 is formed between the bottom surfaces of the air injection orifice 41; please refer to FIG. 8C again, when a voltage is applied to the actuating body 43 When the piezoelectric plate 43c is deformed, the piezoelectric plate 43c begins to deform due to the piezoelectric effect and simultaneously drives the resonance plate 43b and the piezoelectric carrier plate 43a to be adjusted. At this time, the orifice 41 will be affected by the Helmholtz resonance principle. Being driven together, the actuating body 43 moves upwards. Due to the upward displacement of the actuating body 43, the volume of the airflow chamber 47 increases, and the internal air pressure forms a negative pressure. The air outside the blower box gas pump 4 will be affected by the pressure The gradient enters the airflow chamber 47 from the gap between the connecting piece 41a of the jet orifice 41 and the side wall and collects pressure; finally, referring to FIG. 8C, the gas continuously enters the airflow chamber 47, so that the airflow chamber 47 Positive air pressure At this time, the actuating body 43 is driven to move downward by the voltage, will compress the volume of the airflow chamber 47, and push the gas in the airflow chamber 47, causing the conductive gas to circulate.

當然,上述氣體致動器221為一鼓風箱氣體泵浦4,而氣體致動器221為一種鼓風箱氣體泵浦4之流體輸送組件,此鼓風箱氣體泵浦4之流體輸送組件也可為透過微機電製程的方式所製出的微機電系統氣體泵浦,其中,噴氣孔片41、腔體框架42、致動體43、絕緣框架44及導電框架45皆可透過面型微加工技術製成,以縮小泵浦整個的體積。 Of course, the gas actuator 221 is a blower box gas pump 4, and the gas actuator 221 is a blower box gas pump 4 fluid delivery assembly. The blower box gas pump 4 fluid delivery assembly It can also be a MEMS gas pump manufactured through a micro-electro-mechanical process, in which the air jet orifice 41, the cavity frame 42, the actuating body 43, the insulating frame 44 and the conductive frame 45 can pass through the surface micro Processing technology is made to reduce the entire volume of the pump.

再請參閱第3圖及第5圖所示,上述之微粒監測模組23設置於進氣口211、排氣口212之間,微粒監測模組23包含一微粒致動器231、一微粒傳感器232及一第二隔腔本體233、一承載隔板234、一微粒監測基座235及一雷射發射器236,第二隔腔本體233內部空間藉由該承載隔板234定義出一監測進氣通道237與一監測排氣通道238,監測進氣通道237連通進氣口211,而監測排氣通道238連通排氣口212,又承載隔板234具有一監測連通口234a,以連通監測進氣通道237與監測排氣通道238,以及微粒監測基座235鄰設於承載隔板234,並容置於監測進氣通道237中,具有一承置槽235a、一監測通道235b、一光束通道235c及一容置室235d,微粒致動器231設置於承置槽235a上,而監測通道235b設置於承置槽235a下方,以及容置室235d設置於監測通道235b一側容置定位雷射發射器236,而光束通道235c為連通於容置室235d及監測通道235b之間,且直接垂直橫跨監測通道235b,導引雷射發射器236所發射雷射光束照射至監測通道235b中,以及微粒傳感器232設置於監測通道235b下方,促使微粒致動器231控制氣體由進氣口211進入至承置槽235a而導入監測通道235b中,並受雷射發射器236所發射雷射光束照射,以投 射氣體中光點至微粒傳感器232表面監測氣體中所含懸浮微粒的粒徑及濃度,監測後氣體通過該監測排氣通道238再由該排氣口212排出。 Please refer to FIG. 3 and FIG. 5 again, the above particle monitoring module 23 is disposed between the air inlet 211 and the exhaust port 212, and the particle monitoring module 23 includes a particle actuator 231 and a particle sensor 232 and a second compartment body 233, a carrying partition 234, a particle monitoring base 235 and a laser emitter 236, the inner space of the second compartment body 233 defines a monitoring inlet by the carrying partition 234 The air channel 237 and a monitoring exhaust channel 238, the monitoring intake channel 237 communicates with the intake port 211, and the monitoring exhaust channel 238 communicates with the exhaust port 212, and the carrying partition 234 has a monitoring communication port 234a to communicate with the monitoring inlet The air channel 237, the monitoring exhaust channel 238, and the particle monitoring base 235 are adjacent to the carrier baffle 234, and are accommodated in the monitoring intake channel 237, and have a receiving groove 235a, a monitoring channel 235b, and a beam channel 235c and a receiving chamber 235d, the particle actuator 231 is disposed on the receiving groove 235a, and the monitoring channel 235b is disposed below the receiving groove 235a, and the receiving chamber 235d is disposed on the side of the monitoring channel 235b to receive the positioning laser The transmitter 236, and the beam channel 235c is connected between the accommodating chamber 235d and the monitoring channel 235b, and directly crosses the monitoring channel 235b vertically, guiding the laser beam emitted by the laser transmitter 236 to irradiate the monitoring channel 235b, And the particle sensor 232 is arranged below the monitoring channel 235b, which causes the particle actuator 231 to control the gas from the intake port 211 to the receiving groove 235a and lead into the monitoring channel 235b, and is irradiated by the laser beam emitted by the laser emitter 236 To vote The light spot in the jet gas reaches the surface of the particle sensor 232 to monitor the particle size and concentration of the suspended particles contained in the gas. After monitoring, the gas passes through the monitoring exhaust passage 238 and is then discharged from the exhaust port 212.

上述之微粒監測模組23之微粒致動器231為一流體輸送組件,流體輸送組件可為一氣體泵浦3或者一鼓風箱氣體泵浦4之型態結構來實施氣體傳輸,氣體泵浦3定位於微粒監測基座235的承置槽235a上方來實施設置,鼓風箱氣體泵浦4透過連接件41a定位於微粒監測基座235的承置槽235a上方來實施設置,其結構及動作如上述氣體泵浦3、鼓風箱氣體泵浦4說明,在此就不贅述。而氣體泵浦3也可為透過微機電製程的方式所製出的微機電系統氣體泵浦,其中,進氣板31、共振片32、壓電致動器33、絕緣片34、導電片35皆可透過面型微加工技術製成,以縮小整個泵浦的體積,而鼓風箱氣體泵浦4也可為透過微機電製程的方式所製出的微機電系統氣體泵浦,其中,噴氣孔片41、腔體框架42、致動體43、絕緣框架44及導電框架45皆可透過面型微加工技術製成,以縮小泵浦的體積。 The particle actuator 231 of the particle monitoring module 23 described above is a fluid conveying component. The fluid conveying component may be a gas pump 3 or a blower box gas pump 4 to implement gas transmission. The gas pump 3 Positioned above the receiving groove 235a of the particle monitoring base 235 to implement the setting, the blower box gas pump 4 is positioned above the receiving groove 235a of the particle monitoring base 235 through the connection piece 41a to implement the setting, its structure and action As described above for the gas pump 3 and the blower box gas pump 4, it will not be repeated here. The gas pump 3 can also be a MEMS gas pump manufactured by a micro-electro-mechanical process, in which the air intake plate 31, the resonance plate 32, the piezoelectric actuator 33, the insulating plate 34, and the conductive plate 35 All can be made by surface micro-machining technology to reduce the volume of the entire pump, and the blower box gas pump 4 can also be a micro-electromechanical system gas pump manufactured by a micro-electro-mechanical process, in which The orifice 41, the cavity frame 42, the actuating body 43, the insulating frame 44 and the conductive frame 45 can all be made by surface micromachining technology to reduce the volume of the pump.

請參閱第3圖及第6A圖至第6E圖所示,上述之淨化氣體模組24設置連通於進氣口211、排氣口212之間,淨化氣體模組24包含一第一淨化致動器241、一第一淨化單元242及一第三隔腔本體243,第三隔腔本體243設有一第一淨化通道244,第一淨化通道244連通進氣口211及排氣口212,且第一淨化致動器241設置於第一淨化通道244中,以及第一淨化單元242置設於第一淨化通道244中,透過第一淨化致動器241以控制氣體由進氣口211導入至第一淨化通道244中,再透過第一淨化單元242來淨化氣體,淨化氣體由排氣口212排出,供使用者可使用本裝置達到淨化周遭環境氣體之效益。 Please refer to FIG. 3 and FIGS. 6A to 6E, the above-mentioned purge gas module 24 is provided to communicate between the intake port 211 and the exhaust port 212, and the purge gas module 24 includes a first purge actuation 241, a first purification unit 242 and a third compartment body 243, the third compartment body 243 is provided with a first purification channel 244, the first purification channel 244 communicates with the intake port 211 and the exhaust port 212, and A purification actuator 241 is disposed in the first purification channel 244, and the first purification unit 242 is disposed in the first purification channel 244. The first purification actuator 241 is used to control the introduction of gas from the air inlet 211 to the first purification channel 244. In a purification channel 244, the first purification unit 242 is used to purify the gas, and the purified gas is discharged from the exhaust port 212, so that the user can use the device to achieve the benefit of purifying the surrounding environmental gas.

如第6A圖所示為淨化氣體模組24之第一淨化單元242第一實施例剖面 示意圖,上述之第一淨化單元242可為一種濾網單元,包含多個濾網242a,本實施例為兩個濾網242a分別置設第一淨化通道244中保持一間距,使氣體透過第一淨化致動器241控制導入第一淨化通道244中受兩濾網242a吸附氣體中所含化學煙霧、細菌、塵埃微粒及花粉,以達淨化氣體之效果,其中濾網242a可為靜電濾網、活性碳濾網或高效濾網(HEPA)。 As shown in FIG. 6A, it is a cross section of the first embodiment of the first purification unit 242 of the purification gas module 24. Schematic diagram, the above-mentioned first purification unit 242 may be a filter screen unit, including a plurality of filter screens 242a. In this embodiment, two filter screens 242a are respectively disposed in the first purification channel 244 to maintain a distance to allow gas to pass through The purification actuator 241 controls the introduction into the first purification channel 244 and the two filter screens 242a adsorb the chemical smoke, bacteria, dust particles and pollen contained in the gas to achieve the effect of purifying the gas. The filter screen 242a may be an electrostatic filter, Activated carbon filter or high efficiency filter (HEPA).

如第6B圖所示為淨化氣體模組24之第一淨化單元242第二實施例剖面示意圖,上述第一淨化單元242可為一光觸媒單元,包含一光觸媒242b及一紫外線燈242c,分別置設第一淨化通道244中且兩者之間保持一間距,使氣體透過第一淨化致動器241控制導入第一淨化通道244中,且光觸媒242b透過紫外線燈242c照射得以將光能轉換化學能對氣體分解有害氣體及消毒殺菌,以達淨化氣體之效果。當然於本實施例中也可配合濾網242a在第一淨化通道244中,以加強淨化氣體之效果,其中濾網242a可為靜電濾網、活性碳濾網或高效濾網(HEPA)。 As shown in FIG. 6B, it is a schematic cross-sectional view of the second embodiment of the first purification unit 242 of the purification gas module 24. The first purification unit 242 may be a photocatalyst unit, including a photocatalyst 242b and an ultraviolet lamp 242c, respectively disposed The first purification channel 244 maintains a space between the two, so that the gas is controlled to be introduced into the first purification channel 244 through the first purification actuator 241, and the photocatalyst 242b is irradiated through the ultraviolet lamp 242c to convert the light energy into chemical energy The gas decomposes harmful gas and sterilizes to purify the gas. Of course, in this embodiment, a filter 242a can also be used in the first purification channel 244 to enhance the effect of purifying gas. The filter 242a can be an electrostatic filter, an activated carbon filter, or a high-efficiency filter (HEPA).

如第6C圖所示為淨化氣體模組24之第一淨化單元242第三實施例剖面示意圖,上述之第一淨化單元242可為一光等離子單元,包含一奈米光管242d,置設第一淨化通道244中,使氣體透過第一淨化致動器241控制導入第一淨化通道244中,透過奈米光管242d照射,得以將氣體中的氧分子及水分子分解成具高氧化性光等離子具有破壞有機分子的離子氣流,將氣體中含有揮發性甲醛、甲苯、揮發性有機氣體(VOC)等氣體分子分解成水和二氧化碳,以達淨化氣體之效果。當然於本實施例也可配合濾網242a在第一淨化通道244中,以加強淨化氣體之效果,其中濾網242a可為靜電濾網、活性碳濾網或高效濾網(HEPA)。 As shown in FIG. 6C, it is a schematic cross-sectional view of a third embodiment of the first purification unit 242 of the purification gas module 24. The above-mentioned first purification unit 242 may be a photo-plasma unit, including a nano-optical tube 242d, provided with a first In the purification channel 244, the gas is controlled to be introduced into the first purification channel 244 through the first purification actuator 241, and irradiated through the nano light tube 242d, so that the oxygen molecules and water molecules in the gas can be decomposed into a highly oxidizing light plasma. The ionic gas flow that destroys organic molecules will decompose gas molecules containing volatile formaldehyde, toluene, volatile organic gas (VOC), etc. into water and carbon dioxide, so as to purify the gas. Of course, in this embodiment, a filter 242a can also be used in the first purification channel 244 to enhance the effect of purifying gas. The filter 242a can be an electrostatic filter, an activated carbon filter, or a high-efficiency filter (HEPA).

如第6D圖所示為淨化氣體模組24之第一淨化單元242第四實施例剖面 示意圖,上述之第一淨化單元242可一種負離子單元,包含至少一電極線242e、至少一集塵板242f及一升壓電源器242g,每個電極線242e、每個集塵板242f置設第一淨化通道244中,而升壓電源器242g設置於淨化氣體模組24內提供每個電極線242e高壓放電,每個集塵板242f帶有負電荷,使氣體透過第一淨化致動器241控制導入第一淨化通道244中,透過每個電極線242e高壓放電,得以將氣體中所含微粒帶正電荷,將帶正電荷微粒附著在帶負電荷的每個集塵板242f上,以達淨化氣體之效果。上述之電極線242e採用富勒烯材料纖維束製成,富勒烯材料纖維束是一種應用了納米技術所製造的電觸媒材料,是一種接近超導的材料、電阻幾乎等於零,電離子通過該材料時會產生強大的共振效應,對於電離子的游離析出極為有益,而並非像傳統的離子釋放材料(普通碳纖維金屬等)需要很強的電流,所以電極線242e採用富勒烯材料纖維束製成只需比較微弱的電流即可釋放大劑量、高純度的負氧離子,並且在空間形成純淨的生態負離子浴環境,同時避免了臭氧、氮氧化物、正離子等衍生污染物產生。當然本實施例同樣也可配合濾網242a在第一淨化通道244中,以加強淨化氣體之效果,其中濾網242a可為靜電濾網、活性碳濾網或高效濾網(HEPA)。 As shown in FIG. 6D, it is a section of the fourth embodiment of the first purification unit 242 of the purification gas module 24. Schematic diagram, the above-mentioned first purification unit 242 may be a negative ion unit, including at least one electrode line 242e, at least one dust collecting plate 242f, and a booster power supply 242g. Each electrode line 242e and each dust collecting plate 242f are provided with In a purification channel 244, a booster power supply 242g is provided in the purification gas module 24 to provide high-voltage discharge for each electrode line 242e, and each dust collecting plate 242f is negatively charged to allow gas to pass through the first purification actuator 241 Controlled into the first purification channel 244, through the high-voltage discharge of each electrode line 242e, the particles contained in the gas can be positively charged, and the positively charged particles can be attached to each negatively charged dust collecting plate 242f to achieve The effect of purifying gas. The above electrode wire 242e is made of fiber bundle of fullerene material. The fiber bundle of fullerene material is an electric catalyst material manufactured by applying nanotechnology. It is a material close to superconductivity. The resistance is almost equal to zero. This material will produce a strong resonance effect, which is extremely beneficial for the free precipitation of electrical ions, and unlike traditional ion-releasing materials (common carbon fiber metals, etc.) that require a strong current, the electrode wire 242e uses a fullerene material fiber bundle It can release large dose and high-purity negative oxygen ions with relatively weak current, and form a pure ecological negative ion bath environment in the space, while avoiding the generation of ozone, nitrogen oxides, positive ions and other derivative pollutants. Of course, this embodiment can also be combined with a filter 242a in the first purification channel 244 to enhance the effect of purifying the gas, wherein the filter 242a can be an electrostatic filter, an activated carbon filter or a high-efficiency filter (HEPA).

如第6E圖所示為淨化氣體模組24之第一淨化單元242第五實施例剖面示意圖,上述之第一淨化單元242可為一種電漿離子單元,包含一電場上護網242h、一吸附濾網242i、一高壓放電極32j、一電場下護網242k及一升壓電源器242g,其中電場上護網242h、吸附濾網242i、高壓放電極32j及電場下護網242k置設第一淨化通道244中,且吸附濾網242i、高壓放電極32j夾置設於電場上護網242h、電場下護網242k之間,而升壓電源器242g設置於淨化氣體模組24內提供高壓放電極32j高壓放電,以 產生高壓電漿柱帶有電漿離子,使氣體透過第一淨化致動器241控制導入第一淨化通道244中,透過電漿離子使得氣體中所含氧分子與水分子電離生成陽離子(H+)和陰離子(O2-),且離子周圍附著有水分子的物質附著在病毒和細菌的表面之後,在化學反應的作用下,會轉化成強氧化性的活性氧(羥基,OH基),從而奪走病毒和細菌表面蛋白質的氫,將其分解(氧化分解),以達淨化氣體之效果,當然於本實施例中亦可同步配合濾網242a在第一淨化通道244中,以加強淨化氣體之效果,其中濾網242a可為靜電濾網、活性碳濾網或高效濾網(HEPA)。 As shown in FIG. 6E, it is a schematic cross-sectional view of the fifth embodiment of the first purification unit 242 of the purification gas module 24. The above-mentioned first purification unit 242 may be a plasma ion unit, including a protective mesh 242h on the electric field, and an adsorption The filter 242i, a high voltage discharge electrode 32j, a lower electric field protection mesh 242k and a booster power supply 242g, wherein the electric field upper protection mesh 242h, the adsorption filter 242i, the high voltage discharge electrode 32j and the lower electric field protection mesh 242k are placed first In the purification channel 244, the adsorption filter 242i and the high-voltage discharge electrode 32j are interposed between the upper protective field 242h of the electric field and the lower protective field 242k of the electric field, and the booster power supply 242g is provided in the purified gas module 24 to provide a high-pressure discharge The electrode 32j is discharged at a high voltage to generate a high-pressure plasma column with plasma ions, so that the gas is guided into the first purification channel 244 through the first purification actuator 241, and the plasma ions pass through so that the oxygen molecules and water contained in the gas Molecule ionization generates cations (H + ) and anions (O 2- ), and substances with water molecules attached to the ions are attached to the surface of viruses and bacteria. Under the action of chemical reactions, they will be converted into strong oxidizing active oxygen (Hydroxyl, OH group), so as to take away the hydrogen of the protein on the surface of the virus and bacteria, and decompose it (oxidative decomposition) to achieve the effect of purifying the gas. Of course, in this embodiment, it can also be synchronized with the filter 242a in the first purification In the channel 244, in order to enhance the effect of purifying gas, the filter 242a may be an electrostatic filter, an activated carbon filter or a high efficiency filter (HEPA).

上述淨化氣體模組24之第一淨化致動器241為一流體輸送組件,流體輸送組件可為一氣體泵浦3或者一鼓風箱氣體泵浦4之型態結構來實施氣體傳輸,氣體泵浦3定位於第一淨化通道244中來實施設置,鼓風箱氣體泵浦4透過連接件41a定位於第一淨化通道244中來實施設置,其結構及動作如上述氣體泵浦3、鼓風箱氣體泵浦4說明,在此就不贅述。而氣體泵浦3之流體輸送組件也可為透過微機電製程的方式所製出的微機電系統氣體泵浦,其中,進氣板31、共振片32、壓電致動器33、絕緣片34、導電片35皆可透過面型微加工技術製成,以縮小整個泵浦的體積,而鼓風箱氣體泵浦4之流體輸送組件也可為透過微機電製程的方式所製出的微機電系統氣體泵浦,其中,噴氣孔片41、腔體框架42、致動體43、絕緣框架44及導電框架45皆可透過面型微加工技術製成,以縮小第一淨化致動器241的體積。 The first purge actuator 241 of the purge gas module 24 is a fluid delivery assembly. The fluid delivery assembly can be a gas pump 3 or a blower box gas pump 4 to implement gas transmission. The gas pump The pump 3 is positioned in the first purification channel 244 to implement the installation, and the blower box gas pump 4 is positioned in the first purification channel 244 through the connection 41a to implement the installation. Its structure and operation are as described above for the gas pump 3 and the blast The description of the tank gas pump 4 will not be repeated here. The fluid delivery assembly of the gas pump 3 can also be a micro-electromechanical system gas pump manufactured through a micro-electro-mechanical process, in which the air intake plate 31, the resonance plate 32, the piezoelectric actuator 33, and the insulating plate 34 The conductive sheet 35 can be made by surface micro-machining technology to reduce the volume of the entire pump, and the fluid delivery component of the blower box gas pump 4 can also be a micro-electro-mechanical device manufactured by a micro-electro-mechanical process System gas pump, in which the air jet orifice 41, the cavity frame 42, the actuating body 43, the insulating frame 44 and the conductive frame 45 can be made by surface micromachining technology to reduce the size of the first purge actuator 241 volume.

當然,本案氣體監測及淨化裝置為了加強淨化氣體效果,如第2圖及第9A圖至第9F圖所示,在支撐框體1另一端處設有一第二嵌入槽11b及複數個第二通氣孔12b,複數個第二通氣孔12b與第二嵌入槽11b相連通,而第二嵌入槽11b可供一淨化氣體機5嵌置定位,淨化氣體機5包含一第 二淨化致動器51、一第二淨化單元52及一外框本體53,外框本體53具有一淨化進氣口54及一淨化出氣口55,且淨化出氣口55連通複數個第二通氣孔12b,以及內部設有一第二淨化通道56,連通淨化進氣口54及淨化出氣口55,且第二淨化致動器51設置於第二淨化通道56中,以及第二淨化單元52置設於第二淨化通道56中,透過第二淨化致動器51以控制氣體導入第二淨化通道56中,通過第二淨化單元52淨化氣體,淨化氣體由經淨化出氣口55排出,並經過複數個第二通氣孔12b排出於外。供使用者可使用本裝置達到加強淨化周遭環境氣體之效益。 Of course, in order to enhance the effect of purifying gas, the gas monitoring and purifying device in this case, as shown in FIGS. 2 and 9A to 9F, a second insertion groove 11b and a plurality of second channels are provided at the other end of the support frame 1 The air holes 12b, a plurality of second vent holes 12b communicate with the second insertion groove 11b, and the second insertion groove 11b can be inserted and positioned by a purge gas machine 5, the purge gas machine 5 includes a first Two purification actuators 51, a second purification unit 52, and an outer frame body 53, the outer frame body 53 has a purified air inlet 54 and a purified air outlet 55, and the purified air outlet 55 communicates with a plurality of second vent holes 12b, and a second purification channel 56 is provided inside, which connects the purification inlet 54 and the purification outlet 55, and the second purification actuator 51 is disposed in the second purification channel 56 and the second purification unit 52 is disposed in In the second purification channel 56, the control gas is introduced into the second purification channel 56 through the second purification actuator 51, and the gas is purified by the second purification unit 52. The purified gas is discharged from the purified gas outlet 55 and passes through a plurality of The second vent hole 12b is discharged outside. For users to use this device to achieve the effect of strengthening the purification of the surrounding environmental gas.

如第9A圖為淨化氣體機5嵌置於支撐框體1之第二淨化單元52第一實施例剖面示意圖,上述之第二淨化單元52可為一種濾網單元,包含多個濾網52a,本實施例為兩個濾網52a分別置設第二淨化通道56中保持一間距,使氣體透過第二淨化致動器51控制導入第二淨化通道56中受兩濾網52a吸附氣體中所含化學煙霧、細菌、塵埃微粒及花粉,以達淨化氣體之效果,其中濾網52a可為靜電濾網、活性碳濾網或高效濾網(HEPA)。 As shown in FIG. 9A, it is a schematic cross-sectional view of the first embodiment of the second purification unit 52 in which the purified gas machine 5 is embedded in the support frame 1. The above-mentioned second purification unit 52 may be a filter unit including a plurality of filters 52a. In this embodiment, the two filter screens 52a are respectively disposed in the second purification channel 56 to maintain a gap, so that the gas is controlled to be introduced into the second purification channel 56 through the second purification actuator 51 and is contained in the gas adsorbed by the two filter 52a Chemical smog, bacteria, dust particles and pollen can purify the gas. The filter 52a can be an electrostatic filter, an activated carbon filter or a high-efficiency filter (HEPA).

如第9B圖所示,為淨化氣體機5嵌置於支撐框體1之第二淨化單元52第二實施例剖面示意圖,上述第二淨化單元52可為一光觸媒單元,包含一光觸媒52b及一紫外線燈52c,分別置設第二淨化通道56中保持一間距,使氣體透過淨化致動器51控制導入第二淨化通道56中,且光觸媒52b透過紫外線燈52c照射得以將光能轉換化學能對氣體分解有害氣體及消毒殺菌,以達淨化氣體之效果。當然本實施例也可配合濾網52a在第二淨化通道56中,以加強淨化氣體之效果,其中濾網52a可為靜電濾網、活性碳濾網或高效濾網(HEPA)。 As shown in FIG. 9B, it is a schematic cross-sectional view of a second embodiment of a second purification unit 52 in which the purified gas machine 5 is embedded in the support frame 1. The second purification unit 52 may be a photocatalyst unit, including a photocatalyst 52b and a The ultraviolet lamps 52c are respectively arranged in the second purification channel 56 to maintain a gap, so that the gas is guided into the second purification channel 56 through the purification actuator 51, and the photocatalyst 52b is irradiated through the ultraviolet lamp 52c to convert the light energy into chemical energy The gas decomposes harmful gas and sterilizes to purify the gas. Of course, this embodiment can also cooperate with the filter 52a in the second purification channel 56 to enhance the effect of purifying the gas, wherein the filter 52a can be an electrostatic filter, an activated carbon filter or a high-efficiency filter (HEPA).

如第9C圖所示為淨化氣體機5嵌置於支撐框體1之第二淨化單元52第三 實施例剖面示意圖,上述第二淨化單元52可為一氣體淨化組件,於本實施例中氣體淨化組件為一光等離子單元,包含一奈米光管52d,置設第二淨化通道56中,使氣體透過第二淨化致動器51控制導入第二淨化通道56中,透過奈米光管52d照射,得以將氣體中的氧分子及水分子分解成具高氧化性光等離子具有破壞有機分子的離子氣流,將氣體中含有揮發性甲醛、甲苯、揮發性有機氣體(VOC)等氣體分子分解成水和二氧化碳,以達淨化氣體之效果。當然本實施例也可配合濾網52a在第二淨化通道56中,以加強淨化氣體之效果,其中濾網52a可為靜電濾網、活性碳濾網或高效濾網(HEPA)。 As shown in FIG. 9C, the purified gas machine 5 is embedded in the second purification unit 52 of the support frame 1 and the third A schematic cross-sectional view of an embodiment. The above-mentioned second purification unit 52 may be a gas purification component. In this embodiment, the gas purification component is a light plasma unit, which includes a nano-light tube 52d, and a second purification channel 56 is provided to make the gas Controlled into the second purification channel 56 through the second purification actuator 51, and irradiated through the nano light pipe 52d, the oxygen molecules and water molecules in the gas can be decomposed into a highly oxidizing light plasma with an ion flow that destroys organic molecules. The gas contains volatile formaldehyde, toluene, volatile organic gas (VOC) and other gas molecules into water and carbon dioxide to achieve the effect of purifying the gas. Of course, this embodiment can also cooperate with the filter 52a in the second purification channel 56 to enhance the effect of purifying the gas, wherein the filter 52a can be an electrostatic filter, an activated carbon filter or a high-efficiency filter (HEPA).

如第9D圖所示為淨化氣體機5嵌置於支撐框體1之第二淨化單元52第一實施例剖面示意圖。上述第二淨化單元52可為一氣體淨化組件,於本實施例中氣體淨化組件為一負離子單元,包含至少一電極線52e、至少一集塵板52f及一升壓電源器52g,每個電極線52e、每個集塵板52f置設第二淨化通道56中,而升壓電源器52g設置於淨化氣體機5內提供每個電極線52e高壓放電,每個集塵板52f帶有負電荷,使氣體透過第二淨化致動器51控制導入第二淨化通道56中,透過每個電極線52e高壓放電,得以將氣體中所含微粒帶正電荷,將帶正電荷微粒附著在帶負電荷的每個集塵板52f上,以達淨化氣體之效果。上述之電極線52e採用富勒烯材料纖維束製成。當然本實施例同樣可配合濾網52a在第二淨化通道56中,以加強淨化氣體之效果,其中濾網52a可為靜電濾網、活性碳濾網或高效濾網(HEPA)。 As shown in FIG. 9D, it is a schematic cross-sectional view of the first embodiment of the second purification unit 52 in which the purified gas machine 5 is embedded in the support frame 1. The second purification unit 52 may be a gas purification component. In this embodiment, the gas purification component is a negative ion unit, including at least one electrode wire 52e, at least one dust collector 52f, and a booster power supply 52g, each electrode The line 52e, each dust collecting plate 52f is set in the second purification channel 56, and the booster power supply 52g is set in the purge gas machine 5 to provide high voltage discharge for each electrode line 52e, and each dust collecting plate 52f has a negative charge , The gas is guided into the second purification channel 56 through the second purification actuator 51, and the high-pressure discharge through each electrode line 52e can positively charge the particles contained in the gas, and attach the positively charged particles to the negatively charged Each dust collecting plate 52f has the effect of purifying gas. The above-mentioned electrode wire 52e is made of fiber bundle of fullerene material. Of course, this embodiment can also be combined with a filter 52a in the second purification channel 56 to enhance the effect of purifying gas. The filter 52a can be an electrostatic filter, an activated carbon filter, or a high-efficiency filter (HEPA).

如第9E圖所示為淨化氣體機5嵌置於支撐框體1之第二淨化單元52第四實施例剖面示意圖。上述第二淨化單元52可為一電漿離子單元,包含一電場上護網52h、一吸附濾網52i、一高壓放電極52j、一電場下護網 52k及一升壓電源器52g,其中電場上護網52h、吸附濾網52i、高壓放電極52j及電場下護網52k置設第二淨化通道56中,且吸附濾網52i、高壓放電極52j夾置設於電場上護網52h、電場下護網52k之間,而升壓電源器52g設置於淨化氣體機5內提供高壓放電極52j高壓放電,以產生高壓電漿柱帶有電漿離子,使氣體透過第二淨化致動器51控制導入第二淨化通道56中,透過電漿離子使得氣體中所含氧分子與水分子電離生成陽離子(H+)和陰離子(O2-),且離子周圍附著有水分子的物質附著在病毒和細菌的表面之後,在化學反應的作用下,會轉化成強氧化性的活性氧(羥基,OH基),從而奪走病毒和細菌表面蛋白質的氫,將其分解(氧化分解),以達淨化氣體之效果。當然本實施例亦也可配合濾網52a在第二淨化通道56中,以加強淨化氣體之效果,其中濾網52a可為靜電濾網、活性碳濾網或高效濾網(HEPA)。 As shown in FIG. 9E, it is a schematic cross-sectional view of the fourth embodiment of the second purification unit 52 in which the purified gas machine 5 is embedded in the support frame 1. The above-mentioned second purification unit 52 may be a plasma ion unit, which includes an upper electric field protective screen 52h, an adsorption filter 52i, a high voltage discharge electrode 52j, an electric field lower protective screen 52k, and a booster power supply 52g, wherein the electric field The upper protective screen 52h, the adsorption filter 52i, the high-voltage discharge electrode 52j and the lower electric field protective screen 52k are placed in the second purification channel 56, and the adsorption filter 52i and the high-voltage discharge electrode 52j are interposed on the electric field upper protective screen 52h and the electric field Between the lower protective net 52k, and the booster power supply 52g is provided in the purge gas machine 5 to provide a high-pressure discharge electrode 52j for high-pressure discharge to generate a high-pressure plasma column with plasma ions to pass gas through the second purification actuator 51 Controlling the introduction into the second purification channel 56, through the plasma ions to ionize the oxygen molecules and water molecules contained in the gas to generate cations (H + ) and anions (O 2- ), and the substances with water molecules around the ions adhere to After the surface of viruses and bacteria, under the action of a chemical reaction, it will be converted into strong oxidizing active oxygen (hydroxyl group, OH group), thereby taking away the hydrogen of the protein on the surface of virus and bacteria, and decomposing it (oxidative decomposition), To achieve the effect of purifying gas. Of course, this embodiment can also be combined with a filter 52a in the second purification channel 56 to enhance the effect of purifying gas. The filter 52a can be an electrostatic filter, an activated carbon filter or a high-efficiency filter (HEPA).

再請參閱第9A圖至第9F圖所示,上述第二淨化致動器51可為一流體輸送組件,流體輸送組件可為一氣體泵浦3或者一鼓風箱氣體泵浦4之型態結構來實施氣體傳輸,氣體泵浦3定位於第二淨化通道56中來實施設置,鼓風箱氣體泵浦4透過連接件41a定位於第二淨化通道56中來實施設置,其結構及動作如上述氣體泵浦3、鼓風箱氣體泵浦4說明,在此就不贅述。而氣體泵浦3之流體輸送組件也可為透過微機電製程的方式所製出的微機電系統氣體泵浦,其中,進氣板31、共振片32、壓電致動器33、絕緣片34、導電片35皆可透過面型微加工技術製成,以縮小整個泵浦的體積,而鼓風箱氣體泵浦4之流體輸送組件也可為透過微機電製程的方式所製出的微機電系統氣體泵浦,其中,噴氣孔片41、腔體框架42、致動體43、絕緣框架44及導電框架45皆可透過面型微加工技術製成,以縮小整個泵浦的體積。 Please refer to FIGS. 9A to 9F again, the second purifying actuator 51 may be a fluid conveying component, and the fluid conveying component may be a gas pump 3 or a blower box gas pump 4 Structure to implement gas transmission, the gas pump 3 is positioned in the second purification channel 56 to implement the installation, and the blower box gas pump 4 is positioned in the second purification channel 56 through the connection member 41a to implement the installation, and its structure and actions are as follows The above description of the gas pump 3 and the blower box gas pump 4 will not be repeated here. The fluid delivery assembly of the gas pump 3 can also be a micro-electromechanical system gas pump manufactured through a micro-electro-mechanical process, in which the air intake plate 31, the resonance plate 32, the piezoelectric actuator 33, and the insulating plate 34 The conductive sheet 35 can be made by surface micro-machining technology to reduce the volume of the entire pump, and the fluid delivery component of the blower box gas pump 4 can also be a micro-electro-mechanical device manufactured through a micro-electro-mechanical process System gas pump, in which the air jet orifice 41, the cavity frame 42, the actuating body 43, the insulating frame 44 and the conductive frame 45 can all be made by surface micromachining technology to reduce the volume of the entire pump.

由上述說明可知,本案氣體監測及淨化裝置將支撐框體1兩端處,透過氣體監測機2及淨化氣體機5提供淨化氣體,形成對流加強淨化氣體效果;又,本案氣體監測及淨化裝置之氣體監測機2具有氣體傳感器222、微粒傳感器232來監測周圍環境氣體,若又能即時提供監測資訊來警示處在環境中的人,提供空氣品質通報機制給使用者實施即時預防或逃離防護措施。 It can be seen from the above description that the gas monitoring and purifying device in this case will provide purified gas at both ends of the support frame 1 through the gas monitoring machine 2 and the purifying gas machine 5, forming a convection to enhance the purification gas effect; The gas monitoring machine 2 has a gas sensor 222 and a particle sensor 232 to monitor the surrounding gas. If it can provide monitoring information in real time to warn people in the environment, an air quality notification mechanism is provided for the user to implement immediate prevention or escape protection measures.

因此如第3圖及第10圖所示,本案之氣體監測機2進一步包含一驅動控制模組6,驅動控制模組6包含一微處理器6a、物聯網通訊器6b、一全球定位系統元件6c及一資料通訊器6d,微處理器6a控制啟動氣體監測模組22、微粒監測模組23及淨化氣體模組24之運作,並將氣體傳感器222、微粒傳感器232之監測資料做演算處理而轉換成一輸出數據資訊,透過物聯網通訊器6b接收輸出數據資訊,並傳輸發送至一連網中繼站7,透過連網中繼站7再傳輸輸出數據資訊至一雲端資料處理裝置8予以儲存,且雲端資料處理裝置8將運算處理後之輸出數據資訊發布通知。上述之資料通訊器6d也可以接收輸出數據資訊,並傳輸發送至一連結裝置9,透過連結裝置9顯示輸出數據資訊、儲存輸出數據資訊,或者傳送輸出數據資訊啟動空氣品質通報機制直接通報操作者,或者連結裝置9傳輸輸出數據資訊至連網中繼站7,並由連網中繼站7進一步傳輸,即可將輸出數據資訊傳輸至一雲端資料處理裝置8予以儲存,且該雲端資料處理裝置8將運算處理後之該輸出數據資訊發布通知,通知發送給連網中繼站7,再傳輸至連結裝置9,連結裝置9啟動空氣品質通報機制;上述之連結裝置9亦可發送操控指令來操作氣體監測機2之運作,透過有線通訊傳輸作業或者無線通訊傳輸作業將操控指令傳送至 資料通訊器6b,再傳輸給微處理器6a以控制啟動氣體監測模組22、微粒監測模組23及淨化氣體模組24之監測氣體及淨化氣體操作。 Therefore, as shown in FIG. 3 and FIG. 10, the gas monitoring machine 2 in this case further includes a drive control module 6, the drive control module 6 includes a microprocessor 6a, an Internet of Things communicator 6b, and a global positioning system component 6c and a data communicator 6d, the microprocessor 6a controls the operation of the gas monitoring module 22, the particulate monitoring module 23 and the purge gas module 24, and performs the calculation processing on the monitoring data of the gas sensor 222 and the particulate sensor 232. Converted to an output data information, received the output data information through the Internet of things communicator 6b, and transmitted to a network relay station 7, and then through the network relay station 7 to transmit the output data information to a cloud data processing device 8 for storage, and cloud data processing The device 8 issues a notification of the output data information after the arithmetic processing. The above-mentioned data communicator 6d can also receive output data information and transmit it to a linking device 9, display the output data information through the linking device 9, store the output data information, or send the output data information to activate the air quality notification mechanism to directly notify the operator Or, the linking device 9 transmits the output data information to the networked relay station 7, and the networked relay station 7 further transmits the output data information to a cloud data processing device 8 for storage, and the cloud data processing device 8 will operate After the processing, the output data is issued a notification, and the notification is sent to the networked relay station 7 and then transmitted to the linking device 9. The linking device 9 activates the air quality notification mechanism; the above-mentioned linking device 9 can also send control commands to operate the gas monitoring machine 2 Operation, the control command is sent to the wired communication transmission operation or the wireless communication transmission operation to The data communicator 6b is then transmitted to the microprocessor 6a to control the start of the monitoring gas and purified gas operations of the gas monitoring module 22, the particulate monitoring module 23 and the purified gas module 24.

上述之物聯網通訊器6b為以窄頻無線電通訊技術所傳輸發送訊號之裝置,例如,是以一種窄帶物聯網(Narrow Band Internet of Things,NB-IoT)模組來傳輸輸出數據資訊,而連網中繼站7為通訊電信商所設之資訊傳輸交換通訊設備,透過連網中繼站7即可將輸出數據資訊傳輸至雲端資料處理裝置8予以儲存;而全球定位系統元件6c具備全球定位系統(GPS)之功能,方便裝置使用者定位尋找及定位監控之使用。於一些實施例中,連結裝置9為具有一有線通訊傳輸模組之顯示裝置,例如,桌上型電腦;或者連結裝置9為具有一無線通訊傳輸模組之顯示裝置,例如,筆記型電腦;又或者連結裝置9為具有一無線通訊傳輸模組之可攜式行動裝置,例如,手機。有線通訊傳輸模組主要可採用RS485、RS232、Modbus、KNX等通訊接口來進行有線通訊傳輸作業。無線通訊傳輸模組主要可採用zigbee,z-wave,RF,藍牙,wifi,EnOcean等技術以進行無線通訊傳輸作業。上述之資料通訊器6d為一般有線或無線通訊之傳輸裝置,例如,資料通訊器6d為一種有線通訊傳輸模組,主要可採用RS485、RS232、Modbus、KNX等通訊接口來進行有線通訊傳輸作業,資料通訊器6d亦可為一種無線通訊傳輸模組,主要可採用zigbee,z-wave,RF,藍牙,wifi,EnOcean等技術以進行無線通訊傳輸作業。上述之驅動控制模組6也包括有一供電元件6e,提供輸送一電能以驅動微處理器6a進行控制及運算。 The above-mentioned IoT communicator 6b is a device that transmits and transmits signals using narrow-band radio communication technology. For example, it uses a narrow-band Internet of Things (NB-IoT) module to transmit and output data information. The network relay station 7 is an information transmission and exchange communication device set by a telecommunications carrier. Through the network relay station 7, the output data information can be transmitted to the cloud data processing device 8 for storage; and the global positioning system component 6c is provided with a global positioning system (GPS) The function of the device is convenient for device users to locate and monitor. In some embodiments, the connection device 9 is a display device with a wired communication transmission module, for example, a desktop computer; or the connection device 9 is a display device with a wireless communication transmission module, for example, a notebook computer; Or the connection device 9 is a portable mobile device with a wireless communication transmission module, for example, a mobile phone. The wired communication transmission module can mainly adopt RS485, RS232, Modbus, KNX and other communication interfaces to perform wired communication transmission operations. The wireless communication transmission module can mainly use zigbee, z-wave, RF, Bluetooth, wifi, EnOcean and other technologies for wireless communication transmission operations. The above data communicator 6d is a general wired or wireless communication transmission device. For example, the data communicator 6d is a wired communication transmission module, which can mainly use RS485, RS232, Modbus, KNX and other communication interfaces for wired communication transmission operations. The data communicator 6d can also be a wireless communication transmission module, which can mainly use zigbee, z-wave, RF, Bluetooth, wifi, EnOcean and other technologies for wireless communication transmission. The above-mentioned drive control module 6 also includes a power supply element 6e, which supplies and transmits an electric energy to drive the microprocessor 6a for control and calculation.

當然,本案之氣體監測及淨化裝置在一具體實施例中,支撐框體1置設於嬰兒床上使用,將嬰兒頭部靠置支撐框體1中,透過氣體監測機2產生淨化氣體,提供給嬰兒呼吸部位周圍獲得淨化氣體使用,以及透過 氣體監測機2提供氣體監測資訊,進而提供空氣品質通報機制給監護者實施防護措施,例如放下嬰兒床布簾,或者關閉門窗。而在另一具體實施例中,也可以將支撐框體1置設於嬰兒推車上使用,將嬰兒頭部靠置該支撐框體1中,透過淨化氣體機5產生淨化氣體,提供給嬰兒呼吸部位周圍獲得淨化氣體使用,以及透過氣體監測機2提供氣體監測資訊,進而提供空氣品質通報機制給監護者實施防護措施,例如放下嬰兒車布簾,遠離至安全處迴避。如此本案氣體監測及淨化裝置利用支撐框體1之可攜帶移動之便利性,讓使用者可應用在室內、室外使用,隨時隨地呼吸到淨化氣體,降低空汙對人體健康影響及傷害,極具利用性。 Of course, in a specific embodiment of the gas monitoring and purification device in this case, the support frame 1 is placed on the baby bed for use, and the baby's head is placed against the support frame 1 to generate purified gas through the gas monitoring machine 2 and provide it to Use purified gas around the baby’s breathing area The gas monitoring machine 2 provides gas monitoring information, and then provides an air quality notification mechanism for the guardian to implement protective measures, such as putting down crib curtains, or closing doors and windows. In another specific embodiment, the support frame 1 can also be placed on the stroller and the baby's head is placed against the support frame 1 to generate purified gas through the purified gas machine 5 and provide it to the baby. Use purified gas around the breathing area, and provide gas monitoring information through the gas monitoring machine 2, and then provide an air quality notification mechanism for the guardian to implement protective measures, such as putting down the stroller curtain and staying away from the safe place. In this way, the gas monitoring and purification device in this case utilizes the convenience of the portable support frame 1 to allow users to use it indoors and outdoors, breathing the purified gas anytime and anywhere, reducing the impact and damage of air pollution on human health Utilization.

綜上所述,本案所提供一種氣體監測及淨化裝置,利用支撐框體之可攜帶移動及可調整定位之便利性,讓使用者得以環繞依靠固定使用,而該支撐框體上所嵌設氣體淨化機來淨化使用者周遭環境之氣體,以降低環境中的空汙氣體暴露所造成人體健康影響及傷害,以及透過該氣體監測機提供氣體監測資訊,進而提供空氣品質通報機制給使用者實施防護措施。 In summary, the gas monitoring and purification device provided in this case utilizes the convenience of the portable frame and the adjustable positioning of the support frame, so that the user can surround and rely on the fixed use, and the gas is embedded on the support frame Purification machine to purify the gas surrounding the user's environment to reduce the human health impact and injury caused by the exposure of air pollution in the environment, and provide gas monitoring information through the gas monitoring machine, and then provide an air quality notification mechanism for the user to implement protection Measures.

本案得由熟知此技術之人士任施匠思而為諸般修飾,然皆不脫如附申請專利範圍所欲保護者。 This case must be modified by anyone familiar with this technology, such as Shi Jiangsi, but none of them are as protected as the scope of the patent application.

Claims (37)

一種氣體監測及淨化裝置,包含:一支撐框體,為一可撓支撐體,其一端處設有一第一嵌入槽及複數個第一通氣孔,該複數個第一通氣孔與該第一嵌入槽連通;以及一氣體監測機,嵌置於該第一嵌入槽中定位,包含:一本體,設有一進氣口及一排氣口;至少一氣體監測模組,設置於該進氣口及該排氣口之間,該氣體監測模組包含有一氣體致動器及一氣體傳感器,該氣體致動器控制氣體由該進氣口導入該氣體監測模組內,透過該氣體傳感器進行監測;至少一微粒監測模組,設置連通於該進氣口及該排氣口之間,該微粒監測模組包含有一微粒致動器及一微粒傳感器,該微粒致動器控制氣體由該進氣口導入該微粒監測模組內部,以該微粒傳感器監測氣體中所含懸浮微粒的粒徑及濃度;至少一淨化氣體模組,設置連通於該進氣口及該排氣口之間,該淨化氣體模組包含一第一淨化致動器及一第一淨化單元,該第一淨化致動器控制氣體由該進氣口導入該淨化氣體模組內部,透過該第一淨化單元淨化氣體,淨化後氣體由該排氣口排出該本體外,而該排氣口對應該複數個第一通氣孔,使淨化後氣體由該複數個第一通氣孔排出供使用者吸取。A gas monitoring and purifying device includes: a support frame, which is a flexible support body, and a first insertion groove and a plurality of first ventilation holes are provided at one end thereof, the plurality of first ventilation holes and the first insertion The tank is connected; and a gas monitoring machine, embedded in the first embedded tank for positioning, includes: a body provided with an air inlet and an air outlet; at least one gas monitoring module is provided on the air inlet and Between the exhaust ports, the gas monitoring module includes a gas actuator and a gas sensor. The gas actuator controls the gas to be introduced into the gas monitoring module from the gas inlet, and is monitored by the gas sensor; At least one particle monitoring module is disposed between the air inlet and the exhaust port, the particle monitoring module includes a particle actuator and a particle sensor, the particle actuator controls the gas from the inlet Introduced into the particle monitoring module, the particle sensor is used to monitor the particle size and concentration of suspended particles contained in the gas; at least one purge gas module is provided to communicate between the air inlet and the air outlet, the purge gas The module includes a first purification actuator and a first purification unit. The first purification actuator controls the gas to be introduced into the purification gas module from the air inlet and purifies the gas through the first purification unit. The gas is discharged from the body through the exhaust port, and the exhaust port corresponds to the plurality of first vent holes, so that the purified gas is discharged through the plurality of first vent holes for the user to absorb. 如申請專利範圍第1項所述之氣體監測及淨化裝置,其中該氣體監測模組包含一第一隔腔本體,該第一膈腔本體的內部由一氣道隔板區隔出一氣體進氣通道及一氣體排氣通道,該氣體進氣通道連通該進氣口,且該氣體傳感器設置在該氣體進氣通道中,而該氣體排氣通道連通該排氣口,且該氣體致動器設置在該氣體排氣通道中,且定位於該氣道隔板上,又該氣道隔板設有一氣道連通口,以連通該氣體進氣通道及該氣體排氣通道。The gas monitoring and purifying device as described in item 1 of the patent application scope, wherein the gas monitoring module includes a first compartment body, and a gas inlet is separated by an airway partition region inside the first diaphragm body A gas exhaust channel, the gas intake channel communicates with the intake port, and the gas sensor is disposed in the gas intake channel, and the gas exhaust channel communicates with the exhaust port, and the gas actuator It is arranged in the gas exhaust channel and is positioned on the air channel partition, and the air channel partition is provided with an air channel communication port to connect the gas inlet channel and the gas exhaust channel. 如申請專利範圍第1項所述之氣體監測及淨化裝置,其中該氣體傳感器包含一氧氣感測器、一一氧化碳感測器及一二氧化碳感測器之至少其中之一或其組合。The gas monitoring and purification device as described in item 1 of the patent application scope, wherein the gas sensor includes at least one of an oxygen sensor, a carbon monoxide sensor, and a carbon dioxide sensor, or a combination thereof. 如申請專利範圍第1項所述之氣體監測及淨化裝置,其中該氣體傳感器包含一揮發性有機物傳感器。The gas monitoring and purifying device as described in item 1 of the patent application scope, wherein the gas sensor includes a volatile organic compound sensor. 如申請專利範圍第1項所述之氣體監測及淨化裝置,其中該氣體傳感器包含一細菌傳感器、一病毒傳感器及一微生物傳感器之至少其中之一。The gas monitoring and purification device as described in item 1 of the patent application scope, wherein the gas sensor includes at least one of a bacteria sensor, a virus sensor, and a microbial sensor. 如申請專利範圍第1項所述之氣體監測及淨化裝置,其中該微粒監測模組包含一第二隔腔本體、一承載隔板、一微粒監測基座及一雷射發射器,該第二隔腔本體的內部藉由該承載隔板定義出一監測進氣通道及一監測排氣通道,該監測進氣通道連通該進氣口,而該監測排氣通道連通該排氣口,又該承載隔板具有一監測連通口,以連通該監測進氣通道與該監測排氣通道,以及該微粒監測基座鄰設於該承載隔板,並容置於該監測進氣通道中,具有一承置槽、一監測通道、一光束通道及一容置室,該微粒致動器設置於該承置槽上,而該監測通道設置於該承置槽下方,以及該容置室設置於該監測通道一側用以容置該雷射發射器,而該光束通道為連通於該容置室及該監測通道之間,且直接垂直橫跨該監測通道,導引該雷射發射器所發射雷射光束照射至該監測通道中,以及該微粒傳感器設置於該監測通道下方,促使該微粒致動器控制氣體由該進氣口進入至該承置槽中而導入該監測通道中,並受該雷射發射器所發射雷射光束照射,以投射氣體所產生光點至該微粒傳感器表面監測氣體中所含懸浮微粒的粒徑及濃度,監測後氣體通過該監測排氣通道再由該排氣口排出。The gas monitoring and purifying device as described in item 1 of the patent application scope, wherein the particle monitoring module includes a second compartment body, a carrying partition, a particle monitoring base and a laser emitter, the second The interior of the compartment body defines a monitoring intake channel and a monitoring exhaust channel by the carrying partition, the monitoring intake channel communicates with the intake port, and the monitoring exhaust channel communicates with the exhaust port, and the The carrying partition has a monitoring communication port to connect the monitoring intake passage and the monitoring exhaust passage, and the particulate monitoring base is adjacent to the carrying partition and is accommodated in the monitoring intake passage, and has a The receiving groove, a monitoring channel, a light beam channel and a containing chamber, the particle actuator is disposed on the receiving groove, and the monitoring channel is disposed below the receiving groove, and the containing chamber is disposed on the One side of the monitoring channel is used for accommodating the laser transmitter, and the beam channel is connected between the accommodating chamber and the monitoring channel, and directly crosses the monitoring channel vertically to guide the laser transmitter to emit The laser beam is irradiated into the monitoring channel, and the particle sensor is disposed below the monitoring channel, causing the particle actuator control gas to enter the receiving slot from the air inlet and be introduced into the monitoring channel The laser beam emitted by the laser emitter is irradiated to project the light spot generated by the gas to the surface of the particle sensor to monitor the particle size and concentration of suspended particles contained in the gas. After monitoring, the gas passes through the monitoring exhaust channel and then exits from the exhaust Air outlet. 如申請專利範圍第1項所述之氣體監測及淨化裝置,其中該微粒傳感器為PM2.5傳感器。The gas monitoring and purification device as described in item 1 of the patent application scope, wherein the particle sensor is a PM2.5 sensor. 如申請專利範圍第1項所述之氣體監測及淨化裝置,其中該淨化氣體模組包含一第三隔腔本體,該第三隔腔本體設有一第一淨化通道,該第一淨化通道連通該進氣口及該排氣口,且該第一淨化致動器設置於該第一淨化通道中,以及該第一淨化單元置設於該第一淨化通道中,透過該第一淨化致動器以控制氣體導入該第一淨化通道中,通過該第一淨化單元淨化氣體,淨化氣體由該排氣口排出。The gas monitoring and purification device as described in item 1 of the patent application scope, wherein the purification gas module includes a third compartment body, the third compartment body is provided with a first purification channel, and the first purification channel communicates with the An air intake port and the exhaust port, and the first purification actuator is disposed in the first purification channel, and the first purification unit is disposed in the first purification channel, through the first purification actuator The control gas is introduced into the first purification channel, the gas is purified by the first purification unit, and the purified gas is discharged from the exhaust port. 如申請專利範圍第8項所述之氣體監測及淨化裝置,其中該第一淨化單元為一濾網單元,包含多個濾網,分別置設該第一淨化通道中保持一間距,透過該淨化致動器控制氣體導入該第一淨化通道中受該濾網單元之該多個濾網過濾淨化。The gas monitoring and purification device as described in item 8 of the patent application scope, wherein the first purification unit is a filter unit, which includes a plurality of filters, each of which is placed in the first purification channel to maintain a gap through the purification The actuator controls the gas to be introduced into the first purification channel and is filtered and purified by the plurality of filters of the filter unit. 如申請專利範圍第9項所述之氣體監測及淨化裝置,其中該濾網為一靜電濾網、一活性碳濾網及一高效濾網等至少其中之一。The gas monitoring and purification device as described in item 9 of the patent application scope, wherein the filter is at least one of an electrostatic filter, an activated carbon filter, and a high-efficiency filter. 如申請專利範圍第8項所述之氣體監測及淨化裝置,其中該第一淨化單元為一光觸媒單元,包含一光觸媒及一紫外線燈,分別置設該第一淨化通道中保持一間距,透過該第一淨化致動器控制氣體導入該第一淨化通道中,且該光觸媒透過該紫外線燈照射得以分解淨化氣體。The gas monitoring and purification device as described in item 8 of the patent application scope, wherein the first purification unit is a photocatalyst unit, including a photocatalyst and an ultraviolet lamp, and the first purification channel is respectively arranged to maintain a gap through the The first purification actuator controls the gas to be introduced into the first purification channel, and the photocatalyst is irradiated by the ultraviolet lamp to decompose the purification gas. 如申請專利範圍第8項所述之氣體監測及淨化裝置,其中該第一淨化單元為一光等離子單元,包含一奈米光管,置設於該第一淨化通道中,透過該第一淨化致動器控制氣體導入該第一淨化通道中,透過該奈米光管照射將氣體中含有揮發性甲醛、甲苯及揮發性有機氣體來分解淨化。The gas monitoring and purifying device as described in item 8 of the patent application scope, wherein the first purifying unit is a light plasma unit, including a nanometer light tube, which is disposed in the first purifying channel and passes through the first purifying Actuator control gas is introduced into the first purification channel, and the gas contains volatile formaldehyde, toluene and volatile organic gas to decompose and purify the nanotube light. 如申請專利範圍第8項所述之氣體監測及淨化裝置,其中該第一淨化單元為一負離子單元,包含至少一電極線、至少一集塵板及一升壓電源器,該電極線及該集塵板置設該第一淨化通道中,而該升壓電源器設置於該淨化氣體模組內,提供該電極線高壓放電,該集塵板帶有負電荷,透過該第一淨化致動器控制氣體導入該第一淨化通道中,透過該電極線高壓放電,得以將氣體中所含微粒帶正電荷,將帶正電荷微粒附著在帶負電荷的該集塵板上淨化。The gas monitoring and purification device as described in item 8 of the patent application scope, wherein the first purification unit is a negative ion unit, including at least one electrode wire, at least one dust collector and a booster power supply, the electrode wire and the The dust collecting plate is disposed in the first purification channel, and the booster power supply is provided in the purification gas module to provide high-voltage discharge of the electrode line. The dust collection plate is negatively charged and actuated through the first purification The control gas is introduced into the first purification channel, and the high-voltage discharge through the electrode wire can positively charge the particles contained in the gas, and attach the positively charged particles to the negatively charged dust collection plate for purification. 如申請專利範圍第13項所述之氣體監測及淨化裝置,其中該電極線採用富勒烯材料纖維束製成。The gas monitoring and purification device as described in item 13 of the patent application scope, wherein the electrode wire is made of fiber bundles of fullerene materials. 如申請專利範圍第8項所述之氣體監測及淨化裝置,其中該第一淨化單元為一電漿離子單元,包含一電場上護網、一吸附濾網、一高壓放電極、一電場下護網及一升壓電源器,其中該電場上護網、該吸附濾網、該高壓放電極及該電場下護網置設於該第一淨化通道中,且該吸附濾網及該高壓放電極夾置設於該電場上護網及該電場下護網之間,而該升壓電源器設置於該淨化氣體模組內提供該高壓放電極高壓放電,以產生高壓電漿柱帶有電漿離子,使氣體透過該第一淨化致動器控制導入該第一淨化通道中,透過電漿離子分解淨化氣體。The gas monitoring and purifying device as described in item 8 of the patent application scope, wherein the first purifying unit is a plasma ion unit, including an electric field upper protective mesh, an adsorption filter, a high voltage discharge electrode, and an electric field lower protective Net and a booster power supply, wherein the electric field upper protective net, the adsorption filter, the high voltage discharge electrode and the electric field lower protective net are disposed in the first purification channel, and the adsorption filter and the high voltage discharge electrode It is interposed between the upper protective net of the electric field and the lower protective net of the electric field, and the booster power supply is provided in the purified gas module to provide high-voltage discharge of the high-voltage discharge electrode to generate a high-pressure plasma column charged Plasma ions allow gas to pass through the first purification actuator to be controlled and introduced into the first purification channel, and decomposes and purifies the gas through plasma ions. 如申請專利範圍第1項所述之氣體監測及淨化裝置,其中該支撐框體另一端處設有一第二嵌入槽及複數個第二通氣孔,該複數個第二通氣孔與該第二嵌入槽連通,而該第二嵌入槽供一淨化氣體機嵌置其中,該淨化氣體機包含一第二淨化致動器、一第二淨化單元及一外框本體,該外框本體具有一淨化進氣口及一淨化出氣口,且該淨化出氣口連通該複數個第二通氣孔,以及內部設有一第二淨化通道,連通該淨化進氣口及該淨化出氣口,且該第二淨化致動器設置於該第二淨化通道中,以及該第二淨化單元置設於該第二淨化通道中,透過該第二淨化致動器以控制氣體導入該第二淨化通道中,通過該第二淨化單元淨化氣體,淨化氣體由經該淨化出氣口排出,並經過該複數個第二通氣孔排出於外。The gas monitoring and purifying device as described in item 1 of the patent application scope, wherein a second insertion groove and a plurality of second ventilation holes are provided at the other end of the support frame, the plurality of second ventilation holes and the second insertion The tank is connected, and the second inserting tank is provided with a purge gas machine embedded therein. The purge gas machine includes a second purge actuator, a second purge unit, and an outer frame body. The outer frame body has a purge inlet An air port and a purified air outlet, and the purified air outlet communicates with the plurality of second vent holes, and a second purification channel is provided inside to communicate with the purified air inlet and the purified air outlet, and the second purification is actuated Is installed in the second purification channel, and the second purification unit is disposed in the second purification channel, and the gas is introduced into the second purification channel through the second purification actuator to control the gas to pass through the second purification The unit purifies the gas, and the purified gas is discharged through the purified gas outlet, and is discharged to the outside through the plurality of second vent holes. 如申請專利範圍第16項所述之氣體監測及淨化裝置,其中該第二淨化單元為一濾網單元,包含多個濾網,分別置設該第二淨化通道中保持一間距,透過該第二淨化致動器控制氣體導入該第二淨化通道中受該濾網單元之該多個濾網過濾淨化。The gas monitoring and purification device as described in item 16 of the patent application scope, wherein the second purification unit is a screen unit, including a plurality of screens, respectively disposed in the second purification channel to maintain a gap, through the first The second purification actuator controls the gas to be introduced into the second purification channel and is filtered and purified by the plurality of filters of the filter unit. 如申請專利範圍第17項所述之氣體監測及淨化裝置,其中該濾網為一靜電濾網、一活性碳濾網及一高效濾網等至少其中之一。The gas monitoring and purification device as described in Item 17 of the patent application scope, wherein the filter is at least one of an electrostatic filter, an activated carbon filter, and a high-efficiency filter. 如申請專利範圍第16項所述之氣體監測及淨化裝置,其中該第二淨化單元為一光觸媒單元,包含一光觸媒及一紫外線燈,分別置設該第二淨化通道中保持一間距,透過該第二淨化致動器控制氣體導入該第二淨化通道中,且該光觸媒透過該紫外線燈照射得以分解淨化氣體。The gas monitoring and purification device as described in item 16 of the patent application scope, wherein the second purification unit is a photocatalyst unit, including a photocatalyst and an ultraviolet lamp, and the second purification channel is respectively arranged to maintain a gap through the The second purification actuator controls gas to be introduced into the second purification channel, and the photocatalyst is irradiated through the ultraviolet lamp to decompose the purification gas. 如申請專利範圍第16項所述之氣體監測及淨化裝置,其中該第二淨化單元為一光等離子單元,包含一奈米光管,置設該第二淨化通道中,透過該第二淨化致動器控制氣體導入該第二淨化通道中,透過該奈米光管照射將氣體中含有揮發性甲醛、甲苯及揮發性有機氣體來分解淨化。The gas monitoring and purification device as described in item 16 of the patent application scope, wherein the second purification unit is a light plasma unit, including a nano-light tube, placed in the second purification channel, and activated through the second purification The control gas of the device is introduced into the second purification channel, and the gas containing volatile formaldehyde, toluene and volatile organic gas is decomposed and purified by irradiation through the nanotube. 如申請專利範圍第16項所述之氣體監測及淨化裝置,其中該第二淨化單元為一負離子單元,包含至少一電極線、至少一集塵板及一升壓電源器,該電極線及該集塵板置設該第二淨化通道中,而該升壓電源器設置於該淨化氣體機內,提供該電極線高壓放電,該集塵板帶有負電荷,透過該第二淨化致動器控制氣體導入該第二淨化通道中,透過該電極線高壓放電,得以將氣體中所含微粒帶正電荷,將帶正電荷微粒附著在帶負電荷的該集塵板上淨化。The gas monitoring and purification device as described in item 16 of the patent application scope, wherein the second purification unit is a negative ion unit, including at least one electrode wire, at least one dust collector and a booster power supply, the electrode wire and the The dust collecting plate is disposed in the second purification channel, and the booster power supply is provided in the purifying gas machine to provide high-voltage discharge of the electrode wire. The dust collecting plate is negatively charged and passes through the second purification actuator The control gas is introduced into the second purification channel, and the high-pressure discharge through the electrode wire can positively charge the particles contained in the gas, and attach the positively charged particles to the negatively charged dust collection plate for purification. 如申請專利範圍第21項所述之氣體監測及淨化裝置,其中該電極線採用富勒烯材料纖維束製成。The gas monitoring and purification device as described in item 21 of the patent application scope, wherein the electrode wire is made of fiber bundles of fullerene materials. 如申請專利範圍第16項所述之氣體監測及淨化裝置,其中該第二淨化單元為一電漿離子單元,包含一電場上護網、一吸附濾網、一高壓放電極、一電場下護網及一升壓電源器,其中該電場上護網、該吸附濾網、該高壓放電極及該電場下護網置設於該第二淨化通道中,且該吸附濾網及該高壓放電極夾置設於該電場上護網及該電場下護網之間,而該升壓電源器設置於該淨化氣體機內提供該高壓放電極高壓放電,以產生高壓電漿柱帶有電漿離子,使氣體透過該第二淨化致動器控制導入該第二淨化通道中,透過電漿離子分解淨化氣體。The gas monitoring and purification device as described in item 16 of the patent application scope, wherein the second purification unit is a plasma ion unit, which includes an electric field upper protective mesh, an adsorption filter, a high voltage discharge electrode, and an electric field lower protective And a booster power supply, wherein the electric field upper protective net, the adsorption filter, the high voltage discharge electrode and the electric field lower protective net are disposed in the second purification channel, and the adsorption filter and the high voltage discharge electrode It is interposed between the upper protective net of the electric field and the lower protective net of the electric field, and the booster power supply is provided in the purified gas machine to provide high-voltage discharge of the high-voltage discharge electrode to generate a high-pressure plasma column with plasma The ions, through which the gas passes through the second purification actuator, are controlled to be introduced into the second purification channel, and the plasma ions are decomposed to purify the gas. 如申請專利範圍第1項所述之氣體監測及淨化裝置,其中該氣體致動器、該微粒致動器及該第一淨化致動器為一流體輸送組件。The gas monitoring and purifying device as described in item 1 of the patent application scope, wherein the gas actuator, the particulate actuator and the first purifying actuator are a fluid delivery assembly. 如申請專利範圍第16項所述之氣體監測及淨化裝置,其中該第二淨化致動器為一流體輸送組件。The gas monitoring and purification device as described in item 16 of the patent application scope, wherein the second purification actuator is a fluid delivery assembly. 如申請專利範圍第24或25項所述之氣體監測及淨化裝置,其中該流體輸送組件為一微機電系統氣體泵浦。The gas monitoring and purifying device as described in item 24 or 25 of the patent application scope, wherein the fluid delivery component is a microelectromechanical system gas pump. 如申請專利範圍第24或25項所述之氣體監測及淨化裝置,其中該流體輸送組件為一氣體泵浦,該氣體泵浦包含:一進氣板,具有至少一進氣孔、至少一匯流排孔及一匯流腔室,其中該進氣孔供導入氣流,該匯流排孔對應該進氣孔,且引導該進氣孔之氣流匯流至該匯流腔室;一共振片,具有一中空孔對應該匯流腔室,且該中空孔之周圍為一可動部;以及一壓電致動器,與該共振片相對應設置;其中,該共振片與該壓電致動器之間具有一腔室空間,以使該壓電致動器受驅動時,使氣流由該進氣板之該進氣孔導入,經該匯流排孔匯集至該匯流腔室,再流經該共振片之該中空孔,由該壓電致動器與該共振片之該可動部產生共振傳輸氣流。The gas monitoring and purification device as described in item 24 or 25 of the patent application scope, wherein the fluid delivery assembly is a gas pump, the gas pump includes: an air inlet plate with at least one air inlet hole and at least one confluence A row of holes and a confluence chamber, wherein the air inlet hole is used to introduce airflow, the confluence row hole corresponds to the air inlet hole, and guides the airflow of the air inlet hole to converge to the confluence chamber; a resonant sheet with a hollow hole Corresponding to the confluence chamber, and around the hollow hole is a movable part; and a piezoelectric actuator, corresponding to the resonance plate; wherein, there is a cavity between the resonance plate and the piezoelectric actuator Chamber space, so that when the piezoelectric actuator is driven, the air flow is introduced from the air inlet hole of the air inlet plate, is collected to the confluence chamber through the bus bar hole, and then flows through the hollow of the resonance plate The hole generates a resonance transmission air flow by the piezoelectric actuator and the movable part of the resonance piece. 如申請專利範圍第24或25項所述之氣體監測及淨化裝置,其中該流體輸送組件為一鼓風箱氣體泵浦,該鼓風箱氣體泵浦包含:一噴氣孔片,包含複數個連接件、一懸浮片及一中空孔洞,該懸浮片可彎曲振動,該複數個連接件鄰接於該懸浮片周緣,而該中空孔洞形成於該懸浮片的中心位置,透過該複數個連接件設置定位,並提供彈性支撐該懸浮片,並使該噴氣孔片底面間形成一氣流腔室,且該複數個支架及該懸浮片之間形成至少一空隙;一腔體框架,承載疊置於該懸浮片上;一致動體,承載疊置於該腔體框架上,以接受電壓而產生往復式地彎曲振動;一絕緣框架,承載疊置於該致動體上;以及一導電框架,承載疊設置於該絕緣框架上;其中,該致動體、該腔體框架及該懸浮片之間形成一共振腔室,透過驅動該致動體以帶動該噴氣孔片產生共振,使該噴氣孔片之該懸浮片產生往復式地振動位移,以造成該氣體通過該空隙進入該氣流腔室再排出,實現該氣體之傳輸流動。The gas monitoring and purifying device as described in item 24 or 25 of the patent application scope, wherein the fluid delivery assembly is a blower box gas pump, the blower box gas pump includes: a jet orifice, including a plurality of connections A suspension piece and a hollow hole, the suspension piece can be bent and vibrated, the plurality of connecting pieces are adjacent to the periphery of the suspension piece, and the hollow hole is formed at the center of the suspension piece, and the positioning is set through the plurality of connection pieces And provide elastic support for the suspension sheet, and form an air flow chamber between the bottom surfaces of the air jet orifice sheet, and at least one gap is formed between the plurality of brackets and the suspension sheet; a cavity frame, bearing and stacked on the suspension On-chip; actuating body, bearing stacked on the cavity frame, to receive voltage to generate reciprocating bending vibration; an insulating frame, bearing stacked on the actuating body; and a conductive frame, bearing stacked On the insulating frame; wherein, a resonance chamber is formed between the actuating body, the cavity frame and the suspension piece, and the actuating body is driven to drive the air jet orifice to resonate, so that the air jet orifice The suspension sheet generates a reciprocating vibration displacement to cause the gas to enter the airflow chamber through the gap and then be discharged, so as to realize the transmission flow of the gas. 如申請專利範圍第1項所述之氣體監測及淨化裝置,其中該氣體監測機進一步包含一驅動控制模組,該驅動控制模組包含一微處理器、一物聯網通訊器、一全球定位系統元件及一資料通訊器,該微處理器控制啟動該氣體監測模組、該微粒監測模組及該淨化氣體模組之運作,並將該氣體傳感器及該微粒傳感器之監測資料做演算處理而轉換成一輸出數據資訊,透過該物聯網通訊器接收該輸出數據資訊,並傳輸發送至一連網中繼站,透過該連網中繼站再傳輸該輸出數據資訊至一雲端資料處理裝置予以儲存。The gas monitoring and purifying device as described in item 1 of the patent application scope, wherein the gas monitoring machine further includes a drive control module including a microprocessor, an Internet of Things communicator, and a global positioning system Components and a data communicator, the microprocessor controls the operation of the gas monitoring module, the particle monitoring module, and the purge gas module, and converts the monitoring data of the gas sensor and the particle sensor into arithmetic processing to convert The output data information is received through the IoT communicator, and transmitted to a networked relay station, and then the output data information is transmitted to a cloud data processing device for storage via the networked relay station. 如申請專利範圍第29項所述之氣體監測及淨化裝置,其中該物聯網通訊器為以窄頻無線電通訊技術所傳輸發送訊號之一窄帶物聯網裝置。The gas monitoring and purification device as described in item 29 of the patent application scope, wherein the IoT communicator is a narrow-band IoT device that transmits signals transmitted by narrow-band radio communication technology. 如申請專利範圍第29項所述之氣體監測及淨化裝置,其中該連網中繼站為通訊電信商所設之一資訊傳輸交換通訊設備。The gas monitoring and purification device as described in item 29 of the patent application scope, wherein the networked relay station is an information transmission switching communication device set up by a telecommunications carrier. 如申請專利範圍第29項所述之氣體監測及淨化裝置,其中該資料通訊器接收該輸出數據資訊,並傳輸發送至一連結裝置,透過該連結裝置傳輸該輸出數據資訊。The gas monitoring and purifying device as described in item 29 of the patent application scope, wherein the data communicator receives the output data information and transmits it to a connecting device, and the output data information is transmitted through the connecting device. 如申請專利範圍第32項所述之氣體監測及淨化裝置,其中該連結裝置用以顯示該輸出數據資訊、儲存該輸出數據資訊及傳送該輸出數據資訊,該連結裝置啟動空氣品質通報機制。The gas monitoring and purification device as described in item 32 of the patent application scope, wherein the connecting device is used to display the output data information, store the output data information, and transmit the output data information, and the connecting device activates the air quality notification mechanism. 如申請專利範圍第33項所述之氣體監測及淨化裝置,其中該物聯網通訊器接收該輸出數據資訊並傳輸發送至該連網中繼站,透過該連網中繼站再傳輸至一雲端資料處理裝置,且該雲端資料處理裝置將運算處理後之該輸出數據資訊發布通知,該通知發送給該連網中繼站,再傳輸至該連結裝置啟動空氣品質通報機制。The gas monitoring and purification device as described in item 33 of the patent application scope, wherein the IoT communicator receives the output data information and transmits it to the networked relay station, and then transmits to a cloud data processing device through the networked relay station, Moreover, the cloud data processing device issues a notification of the output data information after the arithmetic processing, and the notification is sent to the networked relay station, and then transmitted to the connected device to activate the air quality notification mechanism. 如申請專利範圍第29項所述之氣體監測及淨化裝置,其中該驅動控制模組包含有一供電元件,提供輸送一電能以驅動該微處理器進行控制及運算。The gas monitoring and purifying device as described in item 29 of the patent application scope, wherein the drive control module includes a power supply element, which supplies and transmits an electric energy to drive the microprocessor for control and calculation. 如申請專利範圍第33項所述之氣體監測及淨化裝置,其中該支撐框體置設於一嬰兒床上使用,將嬰兒頭部靠置該支撐框體中,透過該氣體監測機產生淨化氣體,提供給嬰兒呼吸部位周圍獲得淨化氣體使用,以及透過該氣體監測機提供氣體監測資訊,進而提供空氣品質通報機制給監護者實施防護措施。A gas monitoring and purifying device as described in item 33 of the patent application scope, wherein the support frame is placed on a baby bed for use, the baby's head is placed against the support frame, and purified gas is generated through the gas monitoring machine, Provide the use of purified gas around the baby's breathing area, and provide gas monitoring information through the gas monitoring machine, and then provide an air quality notification mechanism for the guardian to implement protective measures. 如申請專利範圍第33項所述之氣體監測及淨化裝置,其中該支撐框體置設於一嬰兒推車上使用,將嬰兒頭部靠置該支撐框體中,透過該氣體監測機產生淨化氣體,提供給嬰兒呼吸部位周圍獲得淨化氣體使用,以及透過該氣體監測機提供氣體監測資訊,進而提供空氣品質通報機制給監護者實施防護措施。The gas monitoring and purification device as described in item 33 of the patent application scope, wherein the support frame is placed on a stroller for use, the baby's head is placed against the support frame, and purification is generated through the gas monitoring machine The gas is provided for the use of purified gas around the baby's breathing area, and the gas monitoring information is provided through the gas monitoring machine, and then the air quality notification mechanism is provided to the guardian to implement protective measures.
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