TWM574073U - Gas processing device - Google Patents

Gas processing device Download PDF

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TWM574073U
TWM574073U TW107215265U TW107215265U TWM574073U TW M574073 U TWM574073 U TW M574073U TW 107215265 U TW107215265 U TW 107215265U TW 107215265 U TW107215265 U TW 107215265U TW M574073 U TWM574073 U TW M574073U
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processing
chamber
gas
unit
processing unit
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TW107215265U
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Chinese (zh)
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吳宗學
吳康碩
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臺禹科機股份有限公司
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Publication of TWM574073U publication Critical patent/TWM574073U/en

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Abstract

一種氣體處理裝置,包含至少一第一處理單元、一第一進氣管、至少一第二處理單元、一第二進氣管、至少一設置於該第二處理單元的第二加熱器,及一第一熱交換單元。該第一處理單元包括一連通該第一進氣管的第一處理腔,及一連通該第一處理腔的第一出氣管。該第二處理單元環繞該第一處理單元並包括一連通該第二進氣管且不連通該第一處理腔的第二處理腔,及一連通該第二處理腔的第二出氣管。該第一熱交換單元環繞該第一進氣管並包括一連通該第一出氣管及該第二出氣管其中一者的第一交換室,及一第一排氣管。藉由該第一熱交換單元,經處理後所排出之氣體,可與尚未進行處理的氣體進行熱交換,以節省加熱氣體所需的能源。A gas processing device comprising at least a first processing unit, a first intake pipe, at least a second processing unit, a second intake pipe, at least one second heater disposed in the second processing unit, and A first heat exchange unit. The first processing unit includes a first processing chamber that communicates with the first intake pipe, and a first air outlet that communicates with the first processing chamber. The second processing unit surrounds the first processing unit and includes a second processing chamber that communicates with the second intake tube and does not communicate with the first processing chamber, and a second air outlet that communicates with the second processing chamber. The first heat exchange unit surrounds the first intake pipe and includes a first exchange chamber that communicates with one of the first outlet pipe and the second outlet pipe, and a first exhaust pipe. By the first heat exchange unit, the gas discharged after the treatment can exchange heat with the gas that has not been processed, thereby saving energy required for heating the gas.

Description

氣體處理裝置Gas treatment device

本新型是有關於一種氣體處理裝置,特別是指一種具有雙反應單元,而能自主提供反應所需熱量以節省能源消耗的氣體處理裝置。The present invention relates to a gas treatment device, and more particularly to a gas treatment device having a double reaction unit and capable of independently providing heat required for the reaction to save energy consumption.

氨氣(ammonia, NH3)能作為肥料、燃料、清潔劑及製冷劑的原料,具有多種工業化學上的用途,是世界上產量最多的無機化合物之一,但其不僅具有刺激性氣味,溶於水後還有腐蝕性,若未經處理即洩漏或排放入大氣中,將會造成嚴重的環保隱憂,因此在排放前需要經過妥善的處理,將其轉化為無害的氮氣後方能排放。Ammonia (NH3) can be used as a raw material for fertilizers, fuels, detergents and refrigerants. It has many industrial chemical applications and is one of the most abundant inorganic compounds in the world, but it has not only a pungent odor but also soluble. Corrosive after water, if it is leaked or discharged into the atmosphere without treatment, it will cause serious environmental concerns. Therefore, it needs to be properly treated before being discharged, and it can be discharged into harmless nitrogen.

配合適當的觸媒,能將氨氣分解為氮氣及氫氣,氮氣與氫氣均有廣泛的工業用途,產物中的氫氣更能作為氫氧電池等綠色能源的原料,是當前廣受注目的能源之一。Combined with appropriate catalyst, it can decompose ammonia into nitrogen and hydrogen. Nitrogen and hydrogen have wide industrial use. The hydrogen in the product can be used as a raw material for green energy such as hydrogen and oxygen batteries. One.

然而,將氨氣分解為氮氣與氫氣的反應是為一吸熱反應,且需在極高的環境溫度下進行,目前的作法是在反應槽中設置電力加熱器提供反應所需熱能,但過程中必須消耗大量電力,造成成本的負擔及大量的能源耗損,故仍有改良的空間。However, the reaction of decomposing ammonia into nitrogen and hydrogen is an endothermic reaction and needs to be carried out at an extremely high ambient temperature. The current practice is to provide an electric heater in the reaction tank to provide the heat energy required for the reaction, but in the process. There is still room for improvement in the need to consume a large amount of electricity, resulting in a cost burden and a large amount of energy consumption.

因此,本新型之目的,即在提供一種可節省能源消耗的氣體處理裝置。Therefore, the object of the present invention is to provide a gas treatment device that can save energy consumption.

於是,本新型氣體處理裝置,包含至少一第一處理單元、一第一進氣管、至少一第二處理單元、一第二進氣管、至少一第二加熱器,及一第一熱交換單元。該第一處理單元包括一第一處理腔、一設置於該第一處理腔的第一觸媒,及一與該第一處理腔相連通的第一出氣管。該第一進氣管相反於該第一出氣管設置且連通該第一處理腔。該第二處理單元環繞該第一處理單元並包括一第二處理腔、一設置於該第二處理腔的第二觸媒,及一與該第二處理腔相連通的第二出氣管,該第二處理腔與該第一處理腔不相連通。該第二進氣管相反於該第二出氣管設置且連通該第二處理腔。該第二加熱器設置於該第二處理單元。該第一熱交換單元環繞該第一進氣管並包括一連通該第一出氣管及該第二出氣管其中一者的第一交換室,及一與該第一交換室連通的第一排氣管。Therefore, the novel gas processing apparatus includes at least a first processing unit, a first intake pipe, at least a second processing unit, a second intake pipe, at least a second heater, and a first heat exchange. unit. The first processing unit includes a first processing chamber, a first catalyst disposed in the first processing chamber, and a first air outlet tube in communication with the first processing chamber. The first intake pipe is disposed opposite to the first air outlet and communicates with the first processing chamber. The second processing unit surrounds the first processing unit and includes a second processing chamber, a second catalyst disposed in the second processing chamber, and a second air outlet tube communicating with the second processing chamber, The second processing chamber is out of communication with the first processing chamber. The second intake pipe is disposed opposite to the second air outlet and communicates with the second processing chamber. The second heater is disposed in the second processing unit. The first heat exchange unit surrounds the first intake pipe and includes a first exchange chamber that communicates with one of the first outlet pipe and the second outlet pipe, and a first row that communicates with the first exchange chamber trachea.

本新型之功效在於:藉由該第一熱交換單元,經處理後所排出之溫度較高的氣體,可與尚未進行反應而溫度較低的氣體進行熱交換,藉以節省加熱該第一處理裝置以使氣體反應所需的能源,同時可降低反應後所排出之氣體的溫度,以利後續再應用。The utility model has the advantages that: by the first heat exchange unit, the higher temperature gas discharged after the treatment can exchange heat with the gas which has not been reacted and has a lower temperature, thereby saving heating of the first treatment device. In order to make the gas react with the energy required, the temperature of the gas discharged after the reaction can be lowered to facilitate subsequent application.

在本新型被詳細描述之前,應當注意在以下的說明內容中,類似的元件是以相同的編號來表示。Before the present invention is described in detail, it should be noted that in the following description, similar elements are denoted by the same reference numerals.

參閱圖1,本新型氣體處理裝置之一第一實施例,包含至一第一處理單元1、一第一進氣管2、一第二處理單元3、一第二進氣管4、一第一加熱器51、一第二加熱器52、一第一熱交換單元6,及一第二熱交換單元7。Referring to FIG. 1, a first embodiment of the present novel gas processing apparatus includes a first processing unit 1, a first intake pipe 2, a second processing unit 3, a second intake pipe 4, and a first A heater 51, a second heater 52, a first heat exchange unit 6, and a second heat exchange unit 7.

在本實施例中,以將該氣體處理裝置應用於氨氣的處理為例作說明,該第一進氣管2及該第二進氣管4用以分別供工業製程中所產生的氨氣廢氣進入該第一處理單元1及該第二處理單元3,氨氣分別與該第一處理單元1及該第二處理單元3內的觸媒反應後,轉化為無害的氣體再排出,為此,於本實施例中該第一處理單元1及該第二處理單元3分別呈長管形狀,以便提供較長的反應時間,使氨氣充分地被轉化。In the present embodiment, the treatment of applying the gas treatment device to ammonia gas is taken as an example. The first intake pipe 2 and the second intake pipe 4 are respectively used for ammonia gas generated in an industrial process. The exhaust gas enters the first processing unit 1 and the second processing unit 3, and the ammonia gas reacts with the catalyst in the first processing unit 1 and the second processing unit 3, respectively, and is converted into harmless gas and discharged. In the present embodiment, the first processing unit 1 and the second processing unit 3 are respectively in the shape of a long tube to provide a longer reaction time for the ammonia gas to be sufficiently converted.

該第一處理單元1包括一第一處理腔11、一設置於該第一處理腔11的第一觸媒12,及一與該第一處理腔11相連通的第一出氣管13。該第一觸媒11是一還原觸媒。The first processing unit 1 includes a first processing chamber 11 , a first catalyst 12 disposed in the first processing chamber 11 , and a first air outlet 13 in communication with the first processing chamber 11 . The first catalyst 11 is a reduction catalyst.

該第一進氣管2相反於該第一出氣管13設置且連通該第一處理腔11。The first intake pipe 2 is disposed opposite to the first air outlet pipe 13 and communicates with the first processing chamber 11 .

該第二處理單元3環繞包覆於該第一處理單元1外,並包括一第二處理腔31、一設置於該第二處理腔31的第二觸媒32,及一與該第二處理腔31相連通的第二出氣管33,該第二處理腔31與該第一處理腔11不相連通。該第二觸媒32是一氧化觸媒。The second processing unit 3 is wrapped around the first processing unit 1 and includes a second processing chamber 31, a second catalyst 32 disposed in the second processing chamber 31, and a second processing unit. The second outlet chamber 33 is connected to the chamber 31, and the second processing chamber 31 is not in communication with the first processing chamber 11. The second catalyst 32 is an oxidation catalyst.

該第二進氣管4相反於該第二出氣管33設置且連通該第二處理腔31。The second intake pipe 4 is disposed opposite to the second air outlet pipe 33 and communicates with the second process chamber 31.

該第一加熱器51設置於該第一處理腔11,該第二加熱器52設置於該第二處理腔31,該第一加熱器51及該第二加熱器52能分別提供該第一處理單元1及該第二處理單元3內氣體處理反應所需的熱量。在本實施例中,該第一加熱器51及該第二加熱器52分別為一延伸入該第一處理腔11及該第二處理腔31的長柱狀加熱器,以均勻加熱整個第一處理腔11及整個第二處理腔31並達到良好的加熱效果,但不以此為限。可以想像的是,本新型氣體處理裝置也能視反應規模或是該第一處理單元1及該第二處理單元3的大小,設置多數均勻排列於該第一處理腔11的第一加熱器51,及多數均勻排列於該第二處理腔31的第二加熱器52來提高加熱效果,但不以此為限,該等第二加熱器52也能設置於該第二處理腔31之外,例如環繞該第二處理單元3設置,藉由加熱該第二處理單元3之外殼,同樣可以達到提高該第二處理單元3的溫度的功效。The first heater 51 is disposed in the first processing chamber 11, and the second heater 52 is disposed in the second processing chamber 31. The first heater 51 and the second heater 52 can respectively provide the first processing The heat required for the gas treatment reaction in unit 1 and the second processing unit 3. In the embodiment, the first heater 51 and the second heater 52 are respectively long column heaters extending into the first processing chamber 11 and the second processing chamber 31 to uniformly heat the entire first The processing chamber 11 and the entire second processing chamber 31 are processed to achieve a good heating effect, but not limited thereto. It is conceivable that the gas processing apparatus of the present invention can also provide a plurality of first heaters 51 uniformly arranged in the first processing chamber 11 depending on the scale of the reaction or the size of the first processing unit 1 and the second processing unit 3. And a plurality of second heaters 52 uniformly arranged in the second processing chamber 31 to improve the heating effect, but not limited thereto, the second heaters 52 can also be disposed outside the second processing chamber 31. For example, it is arranged around the second processing unit 3, and by heating the outer casing of the second processing unit 3, the effect of increasing the temperature of the second processing unit 3 can also be achieved.

該第一熱交換單元6環繞該第一進氣管2並包括一連通該第一出氣管13的第一交換室61,及一與該第一交換室61連通的第一排氣管62。於本實施例中,該第一熱交換單元6經由一外部管路(圖未示)連接該第一出氣管13,以連通該第一交換室61及該第一出氣管13。The first heat exchange unit 6 surrounds the first intake pipe 2 and includes a first exchange chamber 61 that communicates with the first air outlet pipe 13 and a first exhaust pipe 62 that communicates with the first exchange chamber 61. In the embodiment, the first heat exchange unit 6 is connected to the first air outlet pipe 13 via an external pipe (not shown) to communicate the first exchange chamber 61 and the first air outlet pipe 13.

該第二熱交換單元7環繞該第一進氣管2且包括一連通該第二出氣管33的第二交換室71,及一與該第二交換室71連通的第二排氣管72,該第二交換室71及該第一交換室61不相連通。於本實施例中,該第二熱交換單元7經由另一外部管路(圖未示)連接該第二出氣管33,以連通該第二交換室71及該第二出氣管33。The second heat exchange unit 7 surrounds the first intake pipe 2 and includes a second exchange chamber 71 that communicates with the second air outlet pipe 33, and a second exhaust pipe 72 that communicates with the second exchange chamber 71. The second exchange chamber 71 and the first exchange chamber 61 are not in communication. In the present embodiment, the second heat exchange unit 7 is connected to the second air outlet pipe 33 via another external pipe (not shown) to communicate the second exchange chamber 71 and the second air outlet pipe 33.

於本實施例中,該第一進氣管適用於將待處理的氨氣沿一進氣方向D1輸送至該第一處理腔,該第一熱交換單元及該第二熱交換單元則沿該進氣方向D1依序設置於該第一進氣管外圍。此外,在其他實施態樣中,也可以僅包含該第一熱交換單元6,而不包含該第二熱交換單元7,且該第一熱交換單元6可以連通該第一出氣管13及該第二出氣管33其中一者。In this embodiment, the first intake pipe is adapted to transport the ammonia gas to be treated to the first processing chamber along an intake direction D1, and the first heat exchange unit and the second heat exchange unit are along the The intake direction D1 is sequentially disposed at the periphery of the first intake pipe. In addition, in other implementations, the first heat exchange unit 6 may be included only, and the second heat exchange unit 7 may not be included, and the first heat exchange unit 6 may communicate with the first air outlet tube 13 and the One of the second outlet pipes 33.

在運作時,待處理的氨氣廢氣經由該第一進氣管2與該第二進氣管4分別進入該第一處理單元1與該第二處理單元3。見圖1中之箭頭A,經由該第一進氣管2輸送的氨氣,藉由該第一加熱器51所提供的熱量,在該第一處理單元1中經過該第一觸媒12的催化分解為氮氣以及氫氣,反應式如下所示:In operation, the ammonia exhaust gas to be treated enters the first processing unit 1 and the second processing unit 3 via the first intake pipe 2 and the second intake pipe 4, respectively. Referring to the arrow A in FIG. 1 , the ammonia gas sent through the first intake pipe 2 passes through the first catalyst 12 in the first processing unit 1 by the heat supplied by the first heater 51. Catalytic decomposition into nitrogen and hydrogen, the reaction formula is as follows:

2NH 3→N 2+3H 2 2NH 3 →N 2 +3H 2

所得到的產物氮氣與氫氣均為無害的氣體,且在工業上均有廣泛的用途,並經由該第一出氣管13排入該第一熱交換單元6的第一交換室61,之後再經由該第一排氣管62排出,並可供後續收集以進一步的純化及應用。The obtained product nitrogen and hydrogen are both harmless gases, and are widely used in industry, and are discharged into the first exchange chamber 61 of the first heat exchange unit 6 via the first outlet pipe 13, and then via The first exhaust pipe 62 is discharged and available for subsequent collection for further purification and application.

見圖1中之箭頭B,氨氣由該第二進氣管4進入該第二處理單元3後,藉由該第二加熱器52所提供的熱量及該第二觸媒32的催化,氨氣會與氧反應為氮氣及水,反應式如下所示:Referring to the arrow B in FIG. 1 , after the ammonia gas enters the second processing unit 3 from the second intake pipe 4, the heat provided by the second heater 52 and the catalysis of the second catalyst 32, ammonia The gas reacts with oxygen as nitrogen and water, and the reaction formula is as follows:

4NH 3+3O 2→2N 2+6H 2O 4NH 3 +3O 2 →2N 2 +6H 2 O

產物的氮氣與水可直接經由該第二出氣管33排入該第二熱交換單元7的第二交換室71,之後再經由該第二排氣管72排出或是收集後純化利用。為避免反應相互干擾,該第一處理腔11與該第二處理腔31不相連通,氨氣的供應也各自獨立,分別由該第一進氣管2及該第二進氣管3提供。The nitrogen and water of the product can be directly discharged into the second exchange chamber 71 of the second heat exchange unit 7 via the second outlet pipe 33, and then discharged or collected through the second exhaust pipe 72 for purification. In order to avoid mutual interference of the reaction, the first processing chamber 11 is not in communication with the second processing chamber 31, and the supply of ammonia gas is also independent, and is provided by the first intake pipe 2 and the second intake pipe 3, respectively.

詳細說明的是,在該第二處理單元3中進行的“氨氧化”反應是一放熱反應,在該第一處理單元1中進行的“氨分解”反應則為一吸熱反應,氣體處理時,藉由該第二加熱器52加熱該第二處理腔31使反應發生,隨後反應所放出的熱能能夠加熱該第一處理單元1,而提供作為該第一處理單元1中“氨分解”反應所需的熱量。當該第一處理單元1溫度不足時,可開啟該第一加熱器51來為該第一處理腔11升溫,但若溫度已足夠使“氨分解”反應穩定發生,能夠停止該第一加熱器51的運作,而僅由該第二處理單元3中“氨氧化”反應的放熱供給該第一處理單元1反應即可。In detail, the "ammoxidation" reaction performed in the second treatment unit 3 is an exothermic reaction, and the "ammonia decomposition" reaction performed in the first treatment unit 1 is an endothermic reaction. Heating the second processing chamber 31 by the second heater 52 to cause a reaction to occur, and then the thermal energy released by the reaction can heat the first processing unit 1 to provide an "ammonia decomposition" reaction in the first processing unit 1. The amount of heat needed. When the temperature of the first processing unit 1 is insufficient, the first heater 51 can be turned on to raise the temperature of the first processing chamber 11, but if the temperature is sufficient to stabilize the "ammonia decomposition" reaction, the first heater can be stopped. The operation of 51, and only the exothermic reaction of the "ammoxidation" reaction in the second treatment unit 3 is supplied to the first treatment unit 1 for reaction.

此外,經過該第一處理單元1及該第二處理單元3反應後所產生的氣體(氫氣及氮氣),相較於尚未反應前的氨氣,其溫度較高,因此藉由將氫氣及氮氣排入該第一熱交換單元6及該第二熱交換單元7,可加熱該第一進氣管2的管壁,以提供熱量給將進入該第一處理單元1的氨氣,而能節省加熱該第一處理單元1所需的能源。此外,由該第一排氣管62及該第二排氣管72所排出的氣體需經過降溫,才能進行後續處理及應用,因此,排出的氣體在經過該第一熱交換單元6及該第二熱交換單元7時,除了可提供熱量給第一進氣管2,同時可降低自身溫度,以利於後續的純化及應用,並能減少降溫所需的時間及能源。In addition, the gas (hydrogen and nitrogen) generated after the reaction between the first processing unit 1 and the second processing unit 3 is higher than the ammonia gas before the reaction, so that hydrogen and nitrogen are used. Discharging into the first heat exchange unit 6 and the second heat exchange unit 7, the wall of the first intake pipe 2 can be heated to provide heat to the ammonia gas that will enter the first processing unit 1, thereby saving The energy required for the first processing unit 1 is heated. In addition, the gas discharged from the first exhaust pipe 62 and the second exhaust pipe 72 needs to be cooled to be subjected to subsequent processing and application, and therefore, the exhausted gas passes through the first heat exchange unit 6 and the first When the heat exchange unit 7 is used, in addition to providing heat to the first intake pipe 2, the temperature of the first intake pipe 2 can be lowered to facilitate subsequent purification and application, and the time and energy required for cooling can be reduced.

再說明的是,由於由該第一處理單元1排出的氣體溫度高於由該第二處理單元3排出的氣體溫度,藉由該第一熱交換單元6及該第二熱交換單元7沿該進氣方向D1依序設置於該第一進氣管2外圍,可使由該第一處理單元1排出的氣體先接觸該第一進氣管2,如此,可更有效的降低由該第一處理單元1排出的氣體之溫度。It is noted that, since the temperature of the gas discharged by the first processing unit 1 is higher than the temperature of the gas discharged by the second processing unit 3, the first heat exchange unit 6 and the second heat exchange unit 7 are along the The intake direction D1 is sequentially disposed on the periphery of the first intake pipe 2, so that the gas discharged by the first processing unit 1 can first contact the first intake pipe 2, so that the first one can be more effectively reduced. The temperature of the gas discharged from the processing unit 1.

值得一提的是,在本實施例中,該第一處理單元1設有二篩網14,以區隔該第一處理腔11與該第一進氣管2,以及區隔該第一處理腔11與該第一出氣管13。而該第二處理單元3設有一篩網34,以區隔該第二處理腔31與該第二出氣管33,該等篩網14、34可供氣體通過並防止該第一觸媒12與該第二觸媒32分別自該第一處理腔11及該第二處理腔31洩漏。而該第二處理單元3還設有一區隔該第二處理腔31與該第二進氣管4的隔板35、一由該隔板35朝該第二處理腔31延伸的氣體流通管36,該隔板35為不透氣材質,而氨氣則是經由該第二進氣管2以及該氣體流通管36進入該第二處理腔31,如此,藉由伸設入該第二處理腔31深處的該氣體流通管36,能確保氨氣能在該第二處理腔31中央被釋出,均勻地在該第二處理腔31中反應並釋出熱量,以便均勻地加熱該第一處理單元1。It is to be noted that, in this embodiment, the first processing unit 1 is provided with two screens 14 to separate the first processing chamber 11 and the first intake tube 2, and to separate the first processing. The chamber 11 and the first air outlet tube 13. The second processing unit 3 is provided with a screen 34 for partitioning the second processing chamber 31 and the second air outlet tube 33. The screens 14, 34 are for allowing gas to pass through and preventing the first catalyst 12 from The second catalyst 32 leaks from the first processing chamber 11 and the second processing chamber 31, respectively. The second processing unit 3 is further provided with a partition 35 separating the second processing chamber 31 and the second intake pipe 4, and a gas flow pipe 36 extending from the partition 35 toward the second processing chamber 31. The partition plate 35 is made of a gas-tight material, and the ammonia gas enters the second processing chamber 31 via the second intake pipe 2 and the gas flow pipe 36, and thus is extended into the second processing chamber 31 by the extension. The gas flow pipe 36 at the position ensures that ammonia gas can be released in the center of the second processing chamber 31, uniformly reacts in the second processing chamber 31 and releases heat to uniformly heat the first processing unit. 1.

參閱圖3,本新型氣體處理裝置之一第二實施例的原理大致於該第一實施例相同,主要不同之處在於,該第二實施例包含多數與該第一進氣管2相連通的第一處理單元1,及多數與該第二進氣管4相連通且分別環繞包覆該等第一處理單元1的第二處理單元3。而該第一熱交換單元6的第一交換室61則連通該等第一處理單元1的該等第一出氣管13,該第二熱交換單元7的第二交換室71則連通該等第二處理單元3的該等第二出氣管33。Referring to FIG. 3, the principle of the second embodiment of the present novel gas processing apparatus is substantially the same as that of the first embodiment. The main difference is that the second embodiment includes a plurality of communicating with the first intake pipe 2. The first processing unit 1 and a plurality of second processing units 3 that communicate with the second intake pipe 4 and surround the first processing unit 1 respectively. The first exchange chamber 61 of the first heat exchange unit 6 communicates with the first air outlet tubes 13 of the first processing units 1, and the second exchange chamber 71 of the second heat exchange unit 7 communicates with the first The second outlet tubes 33 of the two processing units 3.

如此,藉由相互“並聯”的該等第一處理單元1及該等第二處理單元3,該第二實施例除能達到與該第一實施例相同功效以外,還能夠倍增氨氣處理的效率,以符合產業實際應用的需求。在本實施例中於圖示僅繪製二第一處理單元1及二第二處理單元3,但實施時並不以此為限。Thus, by the first processing unit 1 and the second processing unit 3 that are "parallel" with each other, the second embodiment can double the ammonia treatment in addition to the same efficiency as the first embodiment. Efficiency to meet the needs of the actual application of the industry. In the present embodiment, only the first processing unit 1 and the second processing unit 3 are shown in the figure, but the implementation is not limited thereto.

值得一提的是,本新型氣體處理裝置同樣可以被應用於其他氣體處理的化學反應中,而不限於上述實施例所述之氨氣處理,藉由適當的觸媒,該第一處理單元1能被應用於一吸熱反應,例如一還原反應,此時該第一觸媒12對應使用一還原觸媒;該第二處理單元3能被應用於一放熱反應,例如一氧化反應,此時該第二觸媒32則對應使用一氧化觸媒,藉此該第二處理單元3能於反應過程中加熱該第一處理單元1,來達到節省處理過程之能源成本的功效,把握上述的原則並使用適當的觸媒,該第一處理單元2與該第二處理單元4也可通入不同的氣體進行處理。可以想像的是,本新型也可應用於處理其他可液化含氫氣體,例如甲烷(CH 4)、丙烷(C 3H 8)等,但不限於此。 It is worth mentioning that the novel gas treatment device can also be applied to other chemical reactions of gas treatment, and is not limited to the ammonia treatment described in the above embodiments. The first treatment unit 1 is provided by a suitable catalyst. Can be applied to an endothermic reaction, such as a reduction reaction, in which case the first catalyst 12 corresponds to a reduction catalyst; the second treatment unit 3 can be applied to an exothermic reaction, such as an oxidation reaction, at this time The second catalyst 32 corresponds to the use of an oxidation catalyst, whereby the second processing unit 3 can heat the first processing unit 1 during the reaction process to achieve the energy cost saving process, and grasp the above principles. The first processing unit 2 and the second processing unit 4 can also be treated with different gases using a suitable catalyst. It is conceivable that the present invention can also be applied to the treatment of other liquefiable hydrogen-containing gases such as methane (CH 4 ), propane (C 3 H 8 ) and the like, but is not limited thereto.

此外,該第一熱交換單元6及該第二熱交換單元7亦不限於圖式中筒狀之形式,該第一熱交換單元6及該第二熱交換單元7也可以呈管狀而依序圍繞於該第一進氣管2,以使反應後所生成的氣體與尚未進行吸熱反應的氣體之間進行熱交換,但不以此為限。In addition, the first heat exchange unit 6 and the second heat exchange unit 7 are also not limited to the cylindrical form, and the first heat exchange unit 6 and the second heat exchange unit 7 may also be tubular and sequentially The first intake pipe 2 is surrounded to exchange heat between the gas generated after the reaction and the gas that has not undergone the endothermic reaction, but is not limited thereto.

綜上所述,本新型氣體處理裝置之功效在於,藉由該第一熱交換單元1環繞該第一進氣管2,且第一交換室61連通該第一出氣管13,該第一處理單元1反應生成的高溫氣體可與將要進入該第一處理單元1進行反應的氣體進行熱交換,藉以節省加熱第一處理裝置1以使氣體反應所需的能源,同時可降低反應後所排出之氣體的溫度,以利後續再應用,故確實能達到本新型之目的。In summary, the effect of the novel gas treatment device is that the first heat exchange unit 1 surrounds the first intake pipe 2, and the first exchange chamber 61 communicates with the first air outlet pipe 13, the first process The high temperature gas generated by the reaction of the unit 1 can exchange heat with the gas to be reacted into the first processing unit 1, thereby saving the energy required for heating the first treatment device 1 to react the gas, and at the same time reducing the discharge after the reaction. The temperature of the gas, in order to facilitate subsequent application, can indeed achieve the purpose of the present invention.

惟以上所述者,僅為本新型之實施例而已,當不能以此限定本新型實施之範圍,凡是依本新型申請專利範圍及專利說明書內容所作之簡單的等效變化與修飾,皆仍屬本新型專利涵蓋之範圍內。However, the above is only the embodiment of the present invention, and when it is not possible to limit the scope of the present invention, all the simple equivalent changes and modifications according to the scope of the patent application and the contents of the patent specification are still This new patent covers the scope.

1‧‧‧第一處理單元1‧‧‧First Processing Unit

11‧‧‧第一處理腔 11‧‧‧First treatment chamber

12‧‧‧第一觸媒 12‧‧‧First Catalyst

13‧‧‧第一出氣管 13‧‧‧First outlet tube

14‧‧‧篩網 14‧‧‧ screen

2‧‧‧第一進氣管 2‧‧‧First intake pipe

3‧‧‧第二處理單元 3‧‧‧Second processing unit

31‧‧‧第二處理腔 31‧‧‧Second processing chamber

32‧‧‧第二觸媒 32‧‧‧Secondary catalyst

33‧‧‧第二出氣管 33‧‧‧Second outlet tube

34‧‧‧篩網 34‧‧‧ screen

35‧‧‧隔板 35‧‧‧Baffle

36‧‧‧氣體流通管 36‧‧‧ gas flow tube

4‧‧‧第二進氣管 4‧‧‧Second intake manifold

51‧‧‧第一加熱器 51‧‧‧First heater

52‧‧‧第二加熱器 52‧‧‧second heater

6‧‧‧第一熱交換單元 6‧‧‧First heat exchange unit

61‧‧‧第一交換室 61‧‧‧First exchange room

62‧‧‧第一排氣管 62‧‧‧First exhaust pipe

7‧‧‧第二熱交換單元 7‧‧‧Second heat exchange unit

71‧‧‧第二交換室 71‧‧‧Second exchange room

72‧‧‧第二排氣管 72‧‧‧Second exhaust pipe

D1‧‧‧進氣方向 D1‧‧‧Intake direction

A‧‧‧氣體流動方向 A‧‧‧ gas flow direction

B‧‧‧氣體流動方向 B‧‧‧ Gas flow direction

本新型之其他的特徵及功效,將於參照圖式的實施方式中清楚地呈現,其中: 圖1是本新型氣體處理裝置的一第一實施例的一剖面示意圖;及 圖2是本新型氣體處理裝置之一第二實施例的一剖面示意圖。Other features and effects of the present invention will be apparent from the following description of the drawings, wherein: Figure 1 is a cross-sectional view of a first embodiment of the gas processing apparatus of the present invention; and Figure 2 is a gas of the present invention. A schematic cross-sectional view of a second embodiment of a processing device.

Claims (7)

一種氣體處理裝置,包含: 至少一第一處理單元,包括一第一處理腔、一設置於該第一處理腔的第一觸媒,及一與該第一處理腔相連通的第一出氣管; 一第一進氣管,相反於該第一出氣管設置且連通該第一處理腔; 至少一第二處理單元,環繞該第一處理單元並包括一第二處理腔、一設置於該第二處理腔的第二觸媒,及一與該第二處理腔相連通的第二出氣管,該第二處理腔與該第一處理腔不相連通; 一第二進氣管,相反於該第二出氣管設置且連通該第二處理腔; 至少一第二加熱器,設置於該第二處理單元;及 一第一熱交換單元,環繞該第一進氣管並包括一連通該第一出氣管及該第二出氣管其中一者的第一交換室,及一與該第一交換室連通的第一排氣管。A gas processing apparatus comprising: at least one first processing unit, comprising a first processing chamber, a first catalyst disposed in the first processing chamber, and a first air outlet tube in communication with the first processing chamber a first air inlet tube opposite to the first air outlet tube and connected to the first processing chamber; at least one second processing unit surrounding the first processing unit and including a second processing chamber, one disposed on the first a second catalyst of the two processing chambers, and a second air outlet tube communicating with the second processing chamber, the second processing chamber is not in communication with the first processing chamber; a second intake tube, opposite to the a second air outlet tube is disposed and communicates with the second processing chamber; at least one second heater is disposed at the second processing unit; and a first heat exchange unit surrounds the first air inlet tube and includes a first communication unit a first exchange chamber of one of the outlet pipe and the second outlet pipe, and a first exhaust pipe in communication with the first exchange chamber. 如請求項1所述的氣體處理裝置,其中,該第一熱交換單元的第一交換室連通該第一出氣管。The gas processing apparatus of claim 1, wherein the first exchange chamber of the first heat exchange unit communicates with the first outlet pipe. 如請求項2所述的氣體處理裝置,還包含一環繞該第一進氣管的第二熱交換單元,該第二熱交換單元包括一連通該第二出氣管的第二交換室,及一與該第二交換室連通的第二排氣管,該第二交換室及該第一交換室不相連通。The gas processing apparatus of claim 2, further comprising a second heat exchange unit surrounding the first intake pipe, the second heat exchange unit including a second exchange chamber communicating with the second outlet pipe, and a a second exhaust pipe communicating with the second exchange chamber, the second exchange chamber and the first exchange chamber are not in communication. 如請求項3所述的氣體處理裝置,其中,該第一進氣管適用於將氣體沿一進氣方向輸送至該第一處理腔,該第一熱交換單元及該第二熱交換單元沿該進氣方向依序設置於該第一進氣管外圍。The gas processing apparatus of claim 3, wherein the first intake pipe is adapted to transport gas to the first processing chamber in an intake direction, the first heat exchange unit and the second heat exchange unit along The intake direction is sequentially disposed at the periphery of the first intake pipe. 如請求項1所述的氣體處理裝置,其中,該第一觸媒是一還原觸媒。The gas treatment device of claim 1, wherein the first catalyst is a reduction catalyst. 如請求項1所述的氣體處理裝置,其中,該第二觸媒是一氧化觸媒。The gas treatment device of claim 1, wherein the second catalyst is an oxidation catalyst. 如請求項1所述的氣體處理裝置,還包含至少一設置於該第一處理腔的第一加熱器。The gas processing apparatus of claim 1, further comprising at least one first heater disposed in the first processing chamber.
TW107215265U 2018-11-09 2018-11-09 Gas processing device TWM574073U (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112449544A (en) * 2019-08-29 2021-03-05 谷歌有限责任公司 Liquid-soluble gas seal cooling system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112449544A (en) * 2019-08-29 2021-03-05 谷歌有限责任公司 Liquid-soluble gas seal cooling system
CN112449544B (en) * 2019-08-29 2022-07-05 谷歌有限责任公司 Liquid-soluble gas seal cooling system

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