TWM570745U - Powder purification treatment device - Google Patents

Abstract

The invention provides a powder purification treatment device, comprising: planning, in a casing, a first water washing chamber, a powder capturing chamber and a second water washing chamber, wherein the first water washing chamber has an inlet for introducing exhaust gas a first water sprinkler is disposed in the first water washing chamber, wherein the powder capturing chamber is provided with at least one water jet head and a plurality of trap rings, and the second water washing chamber has an outlet for discharging exhaust gas, and the second water washing chamber Having a second water sprinkler disposed therein, the inlet, the first water washing chamber, the powder capturing chamber, the second water washing chamber, and the outlet sequentially serve as a gas flow path for guiding exhaust gas; thereby improving The problem that the fine mist of the semiconductor exhaust gas generated after the high-temperature sintering treatment is difficult to be sufficiently captured.

Description

Powder purification treatment device

The present invention relates to a technique for capturing a product after a sintering reaction of a semiconductor process exhaust gas, and more particularly to a powder purification treatment device.

It is known that the exhaust gas generated by the semiconductor process includes SiH ₄ , H ₂ SiCl ₂ (DCS), WF ₆ , BF ₃ , NF ₃ , SF ₆ , CF ₄ , C ₂ F ₆ C ₃ F _{8 ,} etc., wherein NF ₃ , SF ₆ , CF ₄ , C ₂ F ₆ and C ₃ F ₈ and other harmful substances (Perfluororated Compounds (PFC)), if discharged into the atmosphere, cause environmental pollution, even the greenhouse effect, causing global warming Severe effects, so the exhaust gases must be treated as harmless gases.

The semiconductor exhaust gas treatment equipment widely used in the workshop is used to treat the above-mentioned exhaust gas into a harmless gas. In general, known semiconductor exhaust gas treatment devices are provided with a reaction chamber for exhaust gas, and the exhaust gas generated by the semiconductor process is introduced into the reaction chamber, and the high temperature provided by the flame or hot air in the reaction chamber is Exhaust gas is sintered (ie, sintering reaction); in particular, a high-temperature sintering reaction can decompose fluoride gases such as NF ₃ , SF ₆ , CF ₄ , C ₂ F ₆ and C ₃ F ₈ into harmless Fluoride ion (F ^- ), in order to achieve the purpose of purifying the exhaust gas.

It is also known that after the high-temperature sintering treatment of the exhaust gas, powder products of SiO ₂ , PO ₂ , AlO ₂ , W ₃ O ₅ , and BO ₃ are generated in the reaction chamber, and the products usually require a water washing process in the latter stage. The scrambler is captured and brushed so that the above product can be deposited in water and filtered.

However, since the powders of SiO ₂ , PO ₂ , AlO ₂ , W ₃ O ₅ , and BO ₃ in the product are extremely fine, the water washing process used in the known semiconductor exhaust gas treating equipment cannot sufficiently capture the powder formation. The material, the purification efficiency of the semiconductor process exhaust gas is not good, and even the cost of the exhaust gas treatment equipment and the purification process is increased, so it is urgent to be improved.

In view of the above, the main object of the present invention is to improve the problem that the powders of SiO ₂ , PO ₂ , AlO ₂ , W ₃ O ₅ , and BO ₃ which are formed after the high-temperature sintering treatment of the semiconductor exhaust gas are extremely fine and difficult to sufficiently capture.

In a preferred embodiment, the technical means of the present invention comprises planning, in a casing, to provide a passage for providing exhaust gas containing the powder: a first water washing chamber having an inlet for introducing the exhaust gas containing the powder, and a first water sprinkler is arranged in the first water washing chamber; a powder capturing chamber is formed with a first filtering tank and a second filtering tank, and a passage between the first filtering tank and the second filtering tank Connected to each other, and at least one water jet head is disposed above the first filter tank and the second filter tank, and a plurality of trap rings are respectively disposed in the first filter tank and the second filter tank; a second water washing chamber having an outlet for discharging the purified exhaust gas, and a second water sprinkler disposed in the second water washing chamber, the second water washing chamber being formed on one side of the first water washing chamber, so that the powder The capturing chamber is located between the first water washing chamber and the second water washing chamber; wherein the first filter tank bottom is formed with a plurality of first venting holes communicating with the first water washing chamber, and the second Multiple connections are formed at the bottom of the filter tank a second venting opening of the second water washing chamber; the inlet, the first water washing chamber, the plurality of first venting holes, the first filtering tank, the powder capturing chamber, the second filtering tank, the The plurality of second venting holes, the second water washing chamber, and the outlet sequentially serve as a gas flow path for guiding the exhaust gas to pass therethrough.

In a further implementation, the inlet and the outlet are formed on the top of the housing, respectively. One end of the first sprinkler protrudes out of the casing through the inlet, and one end of the second sprinkler protrudes out of the casing through the outlet.

In a further implementation, the first filter tank and the second filter tank are respectively formed on a bottom layer of the powder capturing chamber.

In a further implementation, the channel is formed in an upper layer of the powder capture chamber.

In a further implementation, the water sprinkler has a tubular body in the form of a hollow column, and one end of the tubular body forms a water spray hole that sprays upward, and the spray body is provided with a plurality of spray holes facing downward to spray water. The pore size of the pores is larger than the pore size of the spray orifice. The pipe body extends outward from the water spray hole to form a spoiler, and the spoiler has a slope inclined from the top to the bottom, so that the water spray hole is spaced apart from the oblique water supply splash.

In a further implementation, the trap ring has a loop shape, and a plurality of vent holes are formed in the ring wall of the trap ring, and a side of each of the vent holes extends toward an axial center of the trap ring. A tongue. The plurality of trap rings are respectively disposed side by side in the first filter tank and the second filter tank. The plurality of capture rings are of a multi-layer construction.

In a further implementation, the two ends of the water jet head respectively form a connecting portion and a spiral portion spirally extending outward from the connecting portion, and a water outlet hole is formed in the connecting portion, and one end of the water discharging hole is sprayed toward the spiral portion. splash.

In a further implementation, the housing is disposed on a semiconductor exhaust gas treatment device having a reaction chamber and a rear water washing chamber, the first water washing chamber being in communication with the reaction chamber via the inlet The second water washing chamber is in communication with the rear stage water washing chamber via the outlet.

According to the above technology, the technical effect of the present invention is that the exhaust gas can be sufficiently captured by the exhaust gas in a plurality of stages of washing and multi-stage powder recovery, thereby improving the purification efficiency of the exhaust gas.

In addition, the relevant technical details that can be implemented by the present invention will be explained in the following embodiments and drawings.

1‧‧‧Powder purification treatment device

10‧‧‧ shell

11‧‧‧ Entrance

12‧‧‧Export

13‧‧‧ gas flow path

14‧‧‧Drainage

15‧‧‧Overflow

16‧‧‧Connected pipe

21‧‧‧First washing chamber

211‧‧‧The first set of sinks

22‧‧‧ powder capture chamber

221‧‧‧First filter tank

222‧‧‧Second filter tank

223‧‧‧First venting hole

224‧‧‧second venting hole

23‧‧‧Second water washing chamber

231‧‧‧Second sump

24‧‧ ‧ partition

25‧‧‧ channel

30a‧‧‧First sprinkler

30b‧‧‧Second water sprinkler

31‧‧‧Water inlet

32‧‧‧Water jet hole

33‧‧‧ spray hole

34‧‧‧ spoiler

40‧‧‧ capture ring

40a‧‧‧Upper capture ring

40b‧‧‧lower capture ring

41‧‧‧Ventinel

42‧‧‧ tongue

50‧‧‧ sprinkler head

51‧‧‧Connecting Department

52‧‧‧Spiral Department

53‧‧‧Water outlet

54‧‧‧Water supply pipe

60‧‧‧Semiconductor exhaust gas treatment equipment

61‧‧‧Reaction chamber

62‧‧‧Lower stage washing chamber

63‧‧‧Exhaust gas inlet pipe

64‧‧‧heater

1 is a cross-sectional view of the present invention; FIG. 2 is a schematic perspective view of the capture ring; FIG. 3 is a schematic view of the exhaust gas passing through the capture ring; Fig. 5 is a schematic view showing the operation of Fig. 1; and Fig. 6 is a cross-sectional view showing the present invention in which a powder purification treatment apparatus is disposed in an exhaust gas treatment apparatus.

First, referring to FIG. 1 , a preferred embodiment of a powder purification processing apparatus provided by the present invention is disclosed. The powder purification processing apparatus 1 includes a casing 10 which may be made of a metal plate (such as a stainless steel plate). The snail is assembled or welded, and a first water washing chamber 21, a powder capturing chamber 22 and a second water washing chamber 23 for providing passage of the exhaust gas containing the powder are formed in the casing 10, wherein:

The first water washing chamber 21 has an inlet 11 for introducing the exhaust gas containing the powder, and the inlet 11 is formed at the top of the casing 10, that is, the exhaust gas passes through the inlet from the top to the bottom. 11 is introduced into the first water washing chamber 21. A first water sprinkler 30a is disposed in the first water washing chamber 21, and one end of the first water sprinkler 30a protrudes out of the casing 10 through the inlet 11 to facilitate water capture by the first sprinkler 30a. 11 is introduced into the exhaust gas contained in the exhaust gas of the first water washing chamber 21. A first sump 211 is formed at the bottom of the first water washing chamber 21, and the first sump 211 is configured to collect waste water formed by combining the water sprayed by the first water sprayer 30a with the powder contained in the exhaust gas.

A first filter tank 221 and a second filter tank 222 are formed in the interior of the powder capture chamber 22 . More specifically, the first filter tank 221 and the second filter tank 222 are respectively formed on the bottom layer of the powder capturing chamber 22. The upper layer of the powder capturing chamber 22 forms a passage 25 through which the first filter tank 221 and the second filter tank 222 communicate. Above the first filter tank 221 and the second filter tank 222 (that is, the top of the powder capture chamber 22), at least one water spray head 50 is disposed. A plurality of trap rings 40 are also disposed in the first filter tank 221 and the second filter tank 222, respectively.

The second water washing chamber 23 has an outlet 12 for discharging the purified exhaust gas, and the outlet 12 is formed at the top of the casing 10, that is, the exhaust gas is washed by the second water in a bottom-up manner. The outlet 12 of the chamber 23 is discharged. A second water sprinkler 30b is disposed in the second water washing chamber 23, and one end of the second water sprinkler 30b protrudes out of the casing 10 through the outlet 12 to facilitate the water capturing by the second water sprinkler 30b. The exhaust gas contained in the exhaust gas discharged from the outlet 12 of the second water washing chamber 23 contains the powder. A second sump 231 is formed at the bottom of the second water washing chamber 23, and the second sump 231 collects waste water formed by combining the water sprayed by the second water sprayer 30b with the powder contained in the exhaust gas.

The second water washing chamber 23 is formed on one side of the first water washing chamber 21 such that the powder capturing chamber 22 is seated between the first water washing chamber 21 and the second water washing chamber 23. The second water washing chamber 23 and the first water washing chamber 21 are disposed to be spaced apart from each other via a partition plate 24. One end of the partition plate 24 extends to the bottom of the casing 10, and the other end of the partition plate 24 extends. To the bottom of the powder capture chamber 22. The partition 24 is configured to extend into the powder capture chamber 22 to space the first filter tank 221 and the second filter tank 222. The passage 25 is formed between the top of the powder capture chamber 22 and one end of the partition 24 that extends into the powder capture chamber 22.

The bottom of the first filter tank 221 is formed with a plurality of first venting holes 223 communicating with the first water washing chamber 21, and the bottom of the second filter tank 222 is formed with a plurality of communicating with the second water washing chamber 23 The second venting hole 224. The inlet 11, the first water washing chamber 21, the plurality of first venting holes 223, the first filtering tank 221, the powder capturing chamber 22, the second filtering tank 222, and the plurality of A gas flow passage 13 formed between the second venting hole 224, the second water washing chamber 23 and the outlet 12 guides the passage of the exhaust gas, so that the exhaust gas sequentially receives the multi-stage water washing and the multi-stage powder filling along the gas flow path 13. Purification treatment.

Referring to FIG. 1 again, the first water sprinkler 30a and the second water sprinkler 30b have a hollow cylindrical tube body, and the first water sprinkler 30a and the second water sprinkler 30b are respectively connected at the two ends of the tubular body. a water inlet hole 31 and a water spray hole 32 that sprays upward, and a plurality of sprays that communicate with the water hole 31 and spray downward are disposed at intervals around the pipe body of the first water sprayer 30a and the second water sprayer 30b. The pore 33 has a pore diameter larger than the pore diameter of the spray hole 33, so that the particle size of the water droplet sprayed by the water spray hole 32 is larger than the particle size of the water droplet sprayed by the spray hole 33. Wherein, by the water spray hole 32 The sprayed water drops quickly fall into the first sump 211 and the second sump 231 due to their large particle size. On the other hand, the water droplets sprayed by the spray holes 33 are distributed in the first water washing chamber 21 and the second water washing chamber 23 in a diffused manner because of their small particle size.

In a specific implementation, the tubes of the first water sprinkler 30a and the second water sprinkler 30b extend outward from the water spray hole 32 to form a spoiler 34, and the spoiler 34 is located in the water spray direction of the water spray hole 32. The spoiler 34 has a slope (substantially conical slope) inclined from the top to the bottom, so that the water spray holes 32 are spaced apart to correspond to the oblique water supply splashing, so that the water droplets sprayed by the water spray holes 32 pass through the disturbance. The flow plate 34 is guided in a mesh shape in the first water washing chamber 21 and the second water washing chamber 23, and can improve the coverage of the water spray hole 32 when the water droplets are sprayed. In addition, the first water sprinkler 30a and the second water sprinkler 30b are connected to a water inlet pipe (not shown) via the water inlet hole 31, and the water supplied from the water inlet pipe is ejected outward through the water spray hole 32 and the spray hole 33.

Referring to FIG. 1 to FIG. 3 together, the trap ring 40 may be formed by bending a metal sheet to form a loop shape (as shown in FIG. 2). A plurality of vent holes 41 are formed in the ring wall of the trap ring 40, and a tongue extending from the vent hole 41 toward the axial center of the trap ring 40 is formed on the ring wall of the trap ring 40. Sheet 42. The exhaust gas is implemented through the venting ring 40 through the trap ring 40 (shown in FIG. 3), which can increase the contact surface of the trap ring 40 with the exhaust gas. The tab 42 is embodied in the form of a ring wall of the trap ring 40. The tongue piece 42 is a powder of SiO ₂ , PO ₂ , AlO ₂ , W ₃ O ₅ , and BO ₃ bound to water in the exhaust gas by the property that water molecules adhere to the metal surface. Further, the trap ring 42 is disposed in a side by side manner in the first filter tank 221 and the second filter tank 222, that is, the axial direction of the trap ring 40 and the exhaust gas along the gas flow path. The direction of flow 13 is vertical, so that exhaust gas can pass through the trap ring 40 via the vent hole 41. The trap ring 40 can be a multi-layered structure. In this embodiment, the trap ring 40 in the first filter tank 221 and the second filter tank 222 can be divided into an upper trap ring 40a and a lower layer trap according to its position. The ring 40b (shown in FIG. 3) can increase the contact surface of the tongue 42 in the trap ring 40 with the exhaust gas, thereby enhancing the effect of the trap ring 40 in capturing the powder in the exhaust gas.

Referring to FIG. 1 and FIG. 4 , the two ends of the water jet head 50 respectively form a connecting portion 51 and a spiral portion 52 extending outwardly from the connecting portion 51 . A water outlet hole 53 is formed in the connecting portion 51 . One end of the water outlet hole 53 is sprayed with water toward the spiral portion 52. Further, the peripheral edge of the connecting portion 51 is formed with a thread so that the water jet head 50 can be screwed to a water supply pipe 54. The spiral portion 52 has a spirally extending shape, and allows water to be spirally outwardly sprayed by the guide of the spiral portion 52 after passing through the water outlet hole 53, thereby expanding the spray range of the water spray head 50. Further, in addition to capturing the powder in the exhaust gas, the water sprayed by the water jet head 50 can also be used to remove the powder adhering to the trap ring 40, so that the powder falls with the water to the first sump. In 211 and the second sump 231, the effect of the trap ring 40 in capturing the powder in the exhaust gas is further maintained.

Referring to FIG. 1 and FIG. 3, the exhaust gas in the first water washing chamber 21 is introduced into the first filter tank 221 through the first vent hole 223, and sequentially passes through the lower trap ring 40b and the upper trap ring 40a (eg, As shown in FIG. 3, it flows to the second filter tank 222. Then, the exhaust gas passes through the upper trap ring 40a and the lower trap ring 40b in the second filter tank 222, and then enters the second water washing chamber 23 via the second vent hole 224. Further, the water sprayed by the first filter tank 221 and the water spray head 50 above the second filter tank 222 forms a water droplet that falls down and contacts the exhaust gas, thereby capturing SiO ₂ , PO ₂ , and AlO ₂ in the exhaust gas. , W ₃ O ₅ , BO ₃ powder. Then, the water droplets pass through the vent holes 41 above the upper trap ring 40a and enter the upper trap ring 40a along the tongue piece 42. When the water drops move along the tongue piece 42, they are combined with other water drops, and then A water droplet with a larger particle size is formed. The water droplets having a larger particle size will fall downward and exit the upper trap ring 40a through the vent holes 41 below the upper trap ring 40a. Then, the larger-sized water droplets will then pass through the vent holes 41 above the lower trap ring 40b and enter the lower trap ring 40b along the tongue 42. When the water drops move along the tongue 42, they will interact with other water. The beads combine due to contact to form a larger particle size of water. Finally, the larger particle size drops down and exits the lower trap ring 40b through the vent 41 below the lower trap ring 40b. When the water droplets of the different particle size are passed through the upper trap ring 40a and the lower trap ring 40b, they contact the exhaust gas to capture SiO ₂ , PO ₂ , AlO ₂ , W ₃ O ₅ , and BO ₃ in the exhaust gas. powder.

Referring to FIG. 1 , the housing 10 further has a drain port 14 and an overflow port 15 . The drain port 14 is formed on the casing 10 below the second sump 231 to facilitate the discharge of the second set. Waste water accumulated in the water tank 231. A partition pipe 16 is disposed between the second sump 231 and the first sump 211, so that the waste water accumulated in the first sump 211 can flow into the second sump 231 through the communication pipe 16. It is discharged by the drain port 14.

The overflow port 15 is formed on the casing 10 on the side of the second sump 231. The height of the overflow port 15 is lower than the height of the first venting hole 223 and the second venting hole 224 of the powder capturing chamber 22. The height of the wastewater accumulated in the first sump 211 is lower than the height of the first venting hole 223 and the height of the wastewater accumulated in the second sump 231 is lower than the height of the second venting hole 224, thereby avoiding the The waste water accumulated in the first water tank 211 and the second water collection tank 231 blocks the first vent hole 223 and the second vent hole 224 so that the exhaust gas cannot flow into the powder capturing chamber 22.

Referring to FIG. 5, when the exhaust gas enters the first water washing chamber 21 through the inlet 11, the exhaust gas first contacts the water droplets sprayed by the first water sprayer 30a, wherein the spray holes 33 are sprayed in a diffused manner. The water droplets having a small particle size easily collide with the SiO ₂ , PO ₂ , AlO ₂ , W ₃ O ₅ , and BO ₃ powders in the exhaust gas, and combine with the powder to increase the particle size of the powder, thereby further moving the powder. The speed is slowed down and is easily washed into the first sump 211 by the water droplets which are sprayed by the water spray holes 32 and which are distributed in a mesh shape. Subsequently, the exhaust gas via the plurality of holes 223 in the first groove 221 into the first filter, the exhaust gas _{SiO 2, PO 2, AlO 2} , W 3 O 5, BO 3 powder by washing with water in a first chamber 21 and the The water is combined to easily adhere to the trap ring 40, and the exhaust gas flows from the first filter tank 221 to the second filter tank 222 to be washed by the water sprayed by the spray head 50, and the exhaust gas then contacts the second filter tank 222. Multiple capture rings 40 within to capture the powder again. Then, the exhaust gas is introduced into the second water washing chamber 23 via the plurality of second vent holes 224, and contacts the water flow sprayed by the second water sprayer 30b, again capturing the powder of the enthalpy in the exhaust gas, and passing through the second sump 231 collects the waste water sprayed by the second water sprayer 30b and carries the powder, and then the exhaust gas is discharged through the outlet 12.

Referring to FIG. 6, the gas shell 10 of the powder purification processing apparatus 1 of the present invention is disposed on a semiconductor exhaust gas treatment device 60 having a reaction chamber 61 and a rear water washing chamber 62 therein. The first water washing chamber 21 is in communication with the reaction chamber 61 via an inlet 11, and the second water washing chamber 23 is in communication with the rear water washing chamber 62 via the outlet 12. Further, the top of the semiconductor exhaust gas treatment tank 60 is provided with at least one exhaust gas introduction pipe 63 and a heater 64, wherein the exhaust gas introduction pipe 63 guides the exhaust gas into the reaction chamber 61, and the heater 64 provides high temperature to the exhaust gas. The sintering process is performed, and the heater 64 may be a flame heater or a hot rod.

The exhaust gas is first introduced into the reaction chamber 61, and then sintered at a high temperature provided by the heater 63. After the high temperature sintering reaction, the exhaust gas generates SiO ₂ , PO ₂ , AlO ₂ , W ₃ O. ₅ , BO ₃ powder product. Then, the exhaust gas enters the powder purification processing device 1 via the inlet 11, sequentially passes through the first water washing chamber 21, the powder capturing chamber 22, and the second water washing chamber 23, by the first water washing chamber 21, powder The capture chamber 22 and the second water washing chamber 23 are subjected to multi-stage water washing and multi-stage powder enrichment purification treatment, and the powder in the exhaust gas can be sufficiently captured to purify the exhaust gas.

The above embodiments are merely illustrative of the preferred embodiments of the present invention, but are not to be construed as limiting the scope of the present invention. Therefore, the present invention is subject to the content of the claims defined in the scope of the patent application.

Claims (12)

A powder purification treatment device comprising: planning, in a casing, to provide passage of exhaust gas containing a powder containing: a first water washing chamber having an inlet for introducing exhaust gas containing the powder, and the first water washing chamber a first water sprayer is disposed; a powder capture chamber is formed with a first filter tank and a second filter tank, wherein the first filter tank and the second filter tank are connected via a passage, and the first a water jet head is disposed above a filter tank and the second filter tank, and a plurality of trap rings are respectively disposed in the first filter tank and the second filter tank; and a second water washing chamber has a discharge a second water sprinkler is disposed in the second water washing chamber, and the second water washing chamber is formed on one side of the first water washing chamber, so that the powder capturing chamber is located at the first Between the water washing chamber and the second water washing chamber; wherein the first filter tank bottom is formed with a plurality of first venting holes communicating with the first water washing chamber, and the bottom of the second filter tank is formed with a plurality of communicating The second water washing chamber a second venting hole; the inlet, the first water washing chamber, the plurality of first venting holes, the first filtering tank, the powder capturing chamber, the second filtering tank, and the plurality of second venting holes The second water washing chamber and the outlet are sequentially a gas flow passage for guiding the exhaust gas to pass through. The powder purification processing apparatus of claim 1, wherein the inlet and the outlet are respectively formed at a top of the housing. The powder purification processing apparatus according to claim 1 or 2, wherein one end of the first water spout protrudes out of the housing through the inlet, and one end of the second water jet protrudes out of the housing through the outlet. The powder purification processing apparatus of claim 1, wherein the first filter tank and the second filter tank are respectively formed on a bottom layer of the powder capturing chamber. The powder purification processing apparatus of claim 1, wherein the channel is formed in an upper layer of the powder capturing chamber. The powder purification treatment device according to claim 1 or 2, wherein the water sprayer has a hollow cylindrical tubular body, and one end of the tubular body forms a water spray hole that is sprayed upward, and the circumference of the tubular body is spaced apart from each other. a spray hole that sprays water downward, the spray hole having a larger diameter than the spray hole. The powder purification processing device of claim 6, wherein the tube body extends outward from the water spray hole to form a spoiler, the spoiler having a slope inclined from the top to the bottom, so that the water spray holes are spaced apart Slope water supply should be sprayed. The powder purification processing apparatus according to claim 1, wherein the trap ring has a loop shape, a plurality of vent holes are formed in a ring wall of the trap ring, and a side of each of the vent holes faces the trap A tongue extending in the axial direction of the ring. The powder purification processing apparatus according to claim 1 or 8, wherein the plurality of trap rings are respectively disposed side by side in the first filter tank and the second filter tank. The powder purification processing apparatus of claim 9, wherein the plurality of trap rings are of a multi-layered configuration. The powder purification processing device according to claim 1, wherein the two ends of the water jet head respectively form a connecting portion and a spiral portion spirally extending outward from the connecting portion, wherein the connecting portion forms a water outlet hole, and the water outlet hole One end is sprayed toward the spiral portion. The powder purification processing apparatus of claim 1, wherein the housing is disposed on a semiconductor exhaust gas treatment device having a reaction chamber and a rear water washing chamber, the first water washing chamber passing through the inlet In communication with the reaction chamber, the second water wash chamber is in communication with the rear stage water wash chamber via the outlet.