TWM539423U - Slurry dispersing system and apparatus - Google Patents

Slurry dispersing system and apparatus Download PDF

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Publication number
TWM539423U
TWM539423U TW105219110U TW105219110U TWM539423U TW M539423 U TWM539423 U TW M539423U TW 105219110 U TW105219110 U TW 105219110U TW 105219110 U TW105219110 U TW 105219110U TW M539423 U TWM539423 U TW M539423U
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Taiwan
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slurry
dispersion
porous
particles
container
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TW105219110U
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Chinese (zh)
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蔡慶龍
陳耿陽
徐雅亭
林俊男
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財團法人工業技術研究院
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Priority to TW105219110U priority Critical patent/TWM539423U/en
Priority to CN201720036588.5U priority patent/CN206424802U/en
Publication of TWM539423U publication Critical patent/TWM539423U/en

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Abstract

A slurry dispersing system and apparatus are provided. The system comprises a rotating apparatus and a slurry dispersing apparatus. The slurry dispersing apparatus comprises a container and a porous dispersing structure. The container is disposed at the rotating apparatus and has a first accommodating space. The porous dispersion structure is disposed in the first accommodating space of the container, and has a second accommodating space and a plurality of dispersing holes. The first accommodation space of the container or the second accommodation space of the porous dispersion structure accommodates slurry with a plurality of particles. The rotating apparatus rotates the vessel, the porous dispersion structure and the slurry. The particles of the slurry flow through the dispersing holes to circulate between the first accommodating space of the container and the second accommodating space of the porous dispersing structure to disperse the particles of the slurry.

Description

漿料分散系統及裝置 Slurry dispersion system and device

本揭露關於一種漿料分散系統及裝置,特別是指一種具有多孔分散結構之漿料分散系統及裝置。 The present disclosure relates to a slurry dispersion system and apparatus, and more particularly to a slurry dispersion system and apparatus having a porous dispersion structure.

漿料(如活物或碳黑)因具高表面積和高結構特性,無論是一般製備漿料或是經過奈米研磨之分散液,在溶液中容易聚集成團而難以製備均勻分散之漿料。或者,以奈米研磨製備成奈米粒徑等級之漿料,可能因內部凝聚作用而在儲存、運輸過程中又再度聚集成較大顆粒,使得漿料之物性(如黏度或粒徑分佈)發生變化而偏離初始之均勻分散狀態,以致後續應用產生變異。 Slurry (such as living material or carbon black) has high surface area and high structural characteristics. Whether it is a general preparation slurry or a nano-milled dispersion, it is easy to aggregate in a solution and it is difficult to prepare a uniformly dispersed slurry. . Alternatively, the slurry prepared by nanometer grinding into nanometer particle size may be re-aggregated into larger particles during storage and transportation due to internal cohesion, so that the physical properties of the slurry (such as viscosity or particle size distribution) Changes occur and deviate from the initial uniform dispersion state, so that subsequent applications produce variations.

再者,一般漿料分散裝置之結構較複雜且操作較不易。而在漿料分散裝置之攪拌製程中,漿料之單一顆粒與聚集顆粒容易聚集沈降在容器之底部,並在容器之角落產生死角區而無法分散部分漿料之單一顆粒或聚集顆粒。同時,漿料也易存在具有較大粒徑之聚集顆粒,且漿料之聚集顆粒之粒徑會分布在較廣泛之範圍。另外,漿料經靜置一段時間後,漿料之黏度相較於在初始時間時之漿料之黏度會有較大之變異。 Moreover, the structure of the general slurry dispersing device is complicated and the operation is relatively difficult. In the agitation process of the slurry dispersing device, the single particles and the aggregated particles of the slurry are easily aggregated and settled at the bottom of the container, and a dead zone is formed at the corner of the container to disperse a single particle or aggregated particles of a part of the slurry. At the same time, the slurry is also prone to agglomerated particles having a larger particle size, and the particle size of the aggregated particles of the slurry is distributed over a wider range. In addition, after the slurry is allowed to stand for a period of time, the viscosity of the slurry is greatly changed compared to the viscosity of the slurry at the initial time.

因此,如何克服上述先前技術之問題,實已成為目前亟欲解決之課題。 Therefore, how to overcome the problems of the prior art mentioned above has become a problem that is currently being solved.

本揭露提供一種漿料分散系統及漿料分散裝置,其可較均勻地分散具有多個顆粒之漿料。 The present disclosure provides a slurry dispersion system and a slurry dispersion device that can more uniformly disperse a slurry having a plurality of particles.

本揭露之漿料分散系統包括一旋轉裝置與一漿料分散裝置。漿料分散裝置包括:一容器,其連接旋轉裝置或設置於旋轉裝置上,且容器具有一第一容置空間;以及一多孔分散結構,其容置於容器之第一容置空間內,多孔分散結構具有一第二容置空間與多個分散孔,且容器之第一容置空間或多孔分散結構之第二容置空間容納具有多個顆粒之漿料,其中,藉由旋轉裝置旋轉容器、多孔分散結構及其內之漿料,以使漿料之多個顆粒穿過多孔分散結構之多個分散孔而循環或流動於容器之第一容置空間與多孔分散結構之第二容置空間之間,進而分散漿料之多個顆粒。 The slurry dispersion system of the present disclosure includes a rotating device and a slurry dispersion device. The slurry dispersing device comprises: a container connected to the rotating device or disposed on the rotating device, and the container has a first accommodating space; and a porous dispersing structure, which is received in the first accommodating space of the container, The porous dispersion structure has a second accommodating space and a plurality of dispersion holes, and the first accommodating space of the container or the second accommodating space of the porous dispersion structure accommodates the slurry having a plurality of particles, wherein the rotation is performed by the rotating device a container, a porous dispersion structure and a slurry therein, such that a plurality of particles of the slurry pass through a plurality of dispersion holes of the porous dispersion structure to circulate or flow in the first accommodation space of the container and the second volume of the porous dispersion structure Between the spaces, a plurality of particles of the slurry are dispersed.

本揭露之漿料分散裝置包括:一容器,其具有一第一容置空間;以及一多孔分散結構,其容置於容器之第一容置空間內,多孔分散結構具有一第二容置空間與多個分散孔,且容器之第一容置空間或多孔分散結構之第二容置空間容納具有多個顆粒之漿料,其中,藉由旋轉容器、多孔分散結構及其內之漿料,以使漿料之多個顆粒穿過多孔分散結構之多個分散孔而循環或流動於容器之第一容置空間與多孔分散結構之第二容置空間之間,進而分散漿料之多個顆粒。 The slurry dispersing device of the present disclosure comprises: a container having a first accommodating space; and a porous dispersion structure accommodated in the first accommodating space of the container, the porous dispersing structure having a second accommodating structure a space and a plurality of dispersion holes, and the first accommodation space of the container or the second accommodation space of the porous dispersion structure accommodates a slurry having a plurality of particles, wherein the container is rotated, the porous dispersion structure and the slurry therein So that a plurality of particles of the slurry pass through the plurality of dispersion holes of the porous dispersion structure to circulate or flow between the first accommodating space of the container and the second accommodating space of the porous dispersion structure, thereby dispersing the slurry Particles.

由上述內容可知,本揭露之漿料分散系統及漿料分散裝置中,主要是藉由旋轉容器、多孔分散結構及其內之漿料,以使漿料之多個顆粒穿過多孔分散結構之多個分散孔而循環或流動於容器與多孔分散結構兩者之容置空間之間,進而達到較均勻地分散漿料之多個顆粒之效果。 It can be seen from the above that in the slurry dispersion system and the slurry dispersion device of the present disclosure, the plurality of particles of the slurry pass through the porous dispersion structure mainly by rotating the container, the porous dispersion structure and the slurry therein. The plurality of dispersed pores circulate or flow between the container and the accommodating space of the porous dispersion structure, thereby achieving the effect of more uniformly dispersing the plurality of particles of the slurry.

為讓本揭露之上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明。在以下描述內容中將部分闡述本揭露之額外特徵及優點,且此等特徵及優點將部分自所述描述內容顯而易見,或可藉由對本揭露之實踐習得。本揭露之特徵及優點借助於在申請專利範圍中特別指出的元件及組合來認識到並達到。應理解,前文一般描述與以下詳細描述兩者均僅為例示性及解釋性的,且不欲約束本揭露所主張之範圍。 The above described features and advantages of the present invention will be more apparent from the following description. Additional features and advantages of the present invention will be set forth in part in the description. The features and advantages of the present invention are realized and attained by the elements and combinations particularly pointed out in the appended claims. It is to be understood that both the foregoing general description and

1‧‧‧漿料分散系統 1‧‧‧Slurry Dispersion System

2‧‧‧旋轉裝置 2‧‧‧Rotating device

21‧‧‧第一旋轉模組 21‧‧‧First rotating module

22‧‧‧第二旋轉模組 22‧‧‧Second Rotary Module

3‧‧‧漿料分散裝置 3‧‧‧Slurry dispersing device

31‧‧‧容器 31‧‧‧ Container

311‧‧‧第一容置空間 311‧‧‧First accommodation space

32‧‧‧多孔分散結構 32‧‧‧Porously dispersed structure

321‧‧‧第二容置空間 321‧‧‧Second accommodating space

322‧‧‧分散孔 322‧‧‧Distributed holes

323‧‧‧擾流板 323‧‧‧ spoiler

324‧‧‧內側 324‧‧‧ inside

325‧‧‧外側 325‧‧‧ outside

326‧‧‧本體 326‧‧‧Ontology

327‧‧‧骨架 327‧‧‧ skeleton

4a、4b‧‧‧漿料 4a, 4b‧‧‧ slurry

41a、41b‧‧‧顆粒 41a, 41b‧‧‧ particles

A1、A2‧‧‧位置點 A1, A2‧‧‧ Location

B1、B2、B3‧‧‧位置點 B1, B2, B3‧‧‧ Location

C1、C2、C3‧‧‧位置點 C1, C2, C3‧‧‧ location points

D1‧‧‧自轉方向 D1‧‧‧Rotation direction

D2‧‧‧公轉方向 D2‧‧‧Right direction

D3‧‧‧流動方向 D3‧‧‧ Flow direction

F1‧‧‧迴流 F1‧‧‧Reflow

F2‧‧‧紊流 F2‧‧‧ turbulence

H1、H2‧‧‧長條 H1, H2‧‧‧ strips

L‧‧‧孔徑 L‧‧‧ aperture

L1、L3‧‧‧一次粒徑 L1, L3‧‧‧ primary particle size

L2、L4‧‧‧聚集粒徑 L2, L4‧‧‧ aggregate particle size

M1、M2‧‧‧範圍 M1, M2‧‧‧ range

R‧‧‧死角區 R‧‧‧dead zone

S1、S2‧‧‧曲線 S1, S2‧‧‧ curve

θ‧‧‧傾斜角度 Θ‧‧‧ tilt angle

第1A圖與第1B圖為本揭露中漿料分散系統及漿料分散裝置之立體示意圖,其中,第1B圖比第1A圖具有傾斜角度θ;第2圖為本揭露第1A圖與第1B圖之漿料分散系統及漿料分散裝置中多孔分散結構之展開示意圖;第3A圖與第3B圖為本揭露第1A圖至第2圖之部分多孔分散結構中,藉由多個分散孔與擾流板分散漿料之示意圖,其中,第3A圖為立體圖,第3B圖為第3A圖之部分剖視圖;第4A圖與第4B圖為本揭露第1A圖至第2圖之漿料 分散系統及漿料分散裝置之多孔分散結構中,具有不同開孔率之分散孔之示意圖;第5A圖為本揭露第1A圖至第2圖之漿料分散系統及漿料分散裝置之多孔分散結構中分散孔之孔徑之示意圖;第5B圖為二種不同漿料中單一顆粒與聚集顆粒之粒徑之示意圖;第6A圖為無使用本揭露之多孔分散結構來分散漿料之結果示意圖;第6B圖為有使用本揭露之多孔分散結構來分散漿料之結果示意圖;第7圖為無使用本揭露之多孔分散結構與有使用本揭露之多孔分散結構來分散漿料之結果比較圖;以及第8圖為無使用本揭露之多孔分散結構與有使用本揭露之多孔分散結構來分散漿料之另一結果比較圖。 1A and 1B are perspective views of the slurry dispersing system and the slurry dispersing device of the present disclosure, wherein FIG. 1B has an inclination angle θ compared to FIG. 1A; FIG. 2 is a first embodiment and a first embodiment of FIG. The schematic diagram of the expanded structure of the porous dispersion structure in the slurry dispersion system and the slurry dispersion device; FIG. 3A and FIG. 3B are diagrams showing a part of the porous dispersion structure of FIGS. 1A to 2, by using a plurality of dispersion holes and Schematic diagram of the spoiler dispersing slurry, wherein FIG. 3A is a perspective view, FIG. 3B is a partial cross-sectional view of FIG. 3A, and FIGS. 4A and 4B are the slurry of the first FIG. 1 to FIG. Schematic diagram of dispersed pores having different opening ratios in the porous dispersion structure of the dispersion system and the slurry dispersing device; FIG. 5A is a porous dispersion of the slurry dispersing system and the slurry dispersing device of the first to fourth drawings of the present disclosure Schematic diagram of the pore size of the dispersed pores in the structure; FIG. 5B is a schematic diagram showing the particle sizes of the single particles and the aggregated particles in the two different slurries; and FIG. 6A is a schematic diagram showing the results of dispersing the slurry without using the porous dispersed structure disclosed herein; 6B is a schematic view showing the results of dispersing the slurry using the porous dispersion structure of the present disclosure; and FIG. 7 is a comparison diagram of the results of dispersing the slurry without using the porous dispersion structure of the present disclosure and the porous dispersion structure using the present disclosure; And Figure 8 is a comparison of another result of the use of the porous dispersion structure of the present disclosure and the use of the porous dispersion structure of the present disclosure to disperse the slurry.

以下藉由特定的具體實施形態說明本揭露之實施方式,熟悉此技術之人士可由本說明書所揭示之內容輕易地了解本揭露之其他優點與功效,亦可藉由其他不同的具體實施形態加以施行或應用。 The embodiments of the present disclosure are described in the following specific embodiments, and those skilled in the art can easily understand other advantages and functions of the disclosure by the contents disclosed in the specification, and can also be implemented by other different embodiments. Or application.

第1A圖與第1B圖為本揭露中漿料分散系統1及漿料分散裝置3之立體示意圖,其中,第1B圖比第1A圖具有傾斜角度θ。第2圖為本揭露第1A圖與第1B圖之漿料分散系統1及漿料分散裝置3中多孔分散結構32之展開示意圖。第3A圖與第3B圖為本揭露第1A圖至第2圖之部分 多孔分散結構32中,藉由多個分散孔322與擾流板323分散漿料(見第6B圖之漿料4a或漿料4b)之示意圖,其中,第3A圖為立體圖,第3B圖為第3A圖之部分剖視圖。 1A and 1B are perspective views of the slurry dispersing system 1 and the slurry dispersing device 3 of the present disclosure, wherein the first drawing B has an inclination angle θ than the first embodiment AA. 2 is a developed perspective view of the porous dispersion structure 32 in the slurry dispersion system 1 and the slurry dispersion device 3 of FIGS. 1A and 1B. 3A and 3B are parts of FIG. 1A to FIG. 2 of the disclosure In the porous dispersion structure 32, a schematic diagram of dispersing a slurry (see the slurry 4a or the slurry 4b in FIG. 6B) by a plurality of dispersion holes 322 and a spoiler 323, wherein FIG. 3A is a perspective view, and FIG. 3B is a perspective view. A partial cross-sectional view of Fig. 3A.

如第1A圖至第3B圖所示,漿料分散系統1可包括一旋轉裝置2(如旋轉平台)與至少一(如一或二)漿料分散裝置3。若為一漿料分散裝置3,則可將其設置於旋轉裝置2上(如中心位置)。若為二旋轉裝置2,則可將其分別設置於旋轉裝置2之相對二端。下列謹以一漿料分散裝置3說明之。 As shown in FIGS. 1A to 3B, the slurry dispersion system 1 may include a rotating device 2 (such as a rotating platform) and at least one (eg, one or two) slurry dispersing device 3. If it is a slurry dispersing device 3, it can be placed on the rotating device 2 (such as a central position). In the case of the two rotating devices 2, they can be respectively disposed at opposite ends of the rotating device 2. The following is described in a slurry dispersing device 3.

漿料分散裝置3包括一容器31與一多孔分散結構32。容器31可連接旋轉裝置2或設置於旋轉裝置2上,且容器31具有一第一容置空間311。多孔分散結構32容置於容器31之第一容置空間311內,且多孔分散結構32具有一第二容置空間321與多個分散孔322。容器31之第一容置空間311與多孔分散結構32之第二容置空間321其中至少一者可容納具有多個顆粒之漿料(見第6B圖之漿料4a或漿料4b)。 The slurry dispersion device 3 includes a container 31 and a porous dispersion structure 32. The container 31 can be connected to the rotating device 2 or disposed on the rotating device 2, and the container 31 has a first receiving space 311. The porous dispersion structure 32 is received in the first accommodating space 311 of the container 31, and the porous dispersion structure 32 has a second accommodating space 321 and a plurality of dispersion holes 322. At least one of the first accommodating space 311 of the container 31 and the second accommodating space 321 of the porous dispersion structure 32 can accommodate a slurry having a plurality of particles (see the slurry 4a or the slurry 4b of Fig. 6B).

因此,藉由旋轉裝置2一併旋轉容器31、多孔分散結構32及其內之漿料,並透過離心力作用、重力作用、搖晃振盪力及容器31之拘束,可使漿料之多個顆粒穿過多孔分散結構32之多個分散孔322而不斷地循環或流動於容器31之第一容置空間311與多孔分散結構32之第二容置空間321之間,進而較均勻地分散漿料之多個顆粒。 Therefore, by rotating the container 31, the porous dispersion structure 32, and the slurry therein by the rotating device 2, and by the centrifugal force action, the gravity action, the shaking oscillating force, and the restraint of the container 31, the particles of the slurry can be worn. The plurality of dispersion holes 322 of the porous dispersion structure 32 are continuously circulated or flowed between the first accommodating space 311 of the container 31 and the second accommodating space 321 of the porous dispersion structure 32, thereby uniformly dispersing the slurry. Multiple particles.

上述之旋轉裝置2可為旋轉機構、旋轉平台、自轉機 台、公轉機台、自轉加公轉機台、行星式旋轉機台、攪拌式旋轉機台或轉子式旋轉機台等。多孔分散結構32可為微孔分散結構、多孔(或微孔)分散網、多孔(或微孔)分散層、多孔(或微孔)分散板等。分散孔322可為開孔或孔洞等,且各個分散孔322之形狀可為方形、矩形、圓形、梯形或三角形等。容器31與多孔分散結構32內之漿料可為一種或二種以上,且漿料可為活物、碳黑、溶質、金屬漿料、陶瓷漿料、碳漿料、碳分散液或漿料分散液等,例如第6B圖中具有多個顆粒41a之漿料4a(如活物)、或具有多個顆粒41b之漿料4b(如碳黑)。但是,本揭露並不以此為限。 The above rotating device 2 can be a rotating mechanism, a rotating platform, and a rotating machine Taiwan, revolution machine, self-rotation transfer machine, planetary rotary machine, agitated rotary machine or rotor rotary machine. The porous dispersion structure 32 may be a microporous dispersion structure, a porous (or microporous) dispersion network, a porous (or microporous) dispersion layer, a porous (or microporous) dispersion plate, or the like. The dispersion holes 322 may be openings or holes, and the shape of each of the dispersion holes 322 may be square, rectangular, circular, trapezoidal or triangular. The slurry in the container 31 and the porous dispersion structure 32 may be one or more, and the slurry may be a living material, carbon black, a solute, a metal slurry, a ceramic slurry, a carbon slurry, a carbon dispersion or a slurry. A dispersion or the like, for example, a slurry 4a (such as a living matter) having a plurality of particles 41a in Fig. 6B, or a slurry 4b (e.g., carbon black) having a plurality of particles 41b. However, this disclosure is not limited to this.

如第1A圖與第1B圖所示,旋轉裝置2可具有一第一旋轉模組21。容器31連接第一旋轉模組21或設置於第一旋轉模組21上,第一旋轉模組21可依據自轉方向D1(如逆時鐘方向)一併旋轉容器31、多孔分散結構32及其內之漿料,以使容器31、多孔分散結構32及其內之漿料產生離心力而分散漿料。 As shown in FIGS. 1A and 1B, the rotating device 2 can have a first rotating module 21. The container 31 is connected to the first rotating module 21 or disposed on the first rotating module 21, and the first rotating module 21 can rotate the container 31, the porous dispersion structure 32 and the same according to the rotation direction D1 (such as the counterclockwise direction). The slurry is such that the container 31, the porous dispersion structure 32, and the slurry therein are centrifugally generated to disperse the slurry.

旋轉裝置2也可具有一第二旋轉模組22。第一旋轉模組21連接第二旋轉模組22或設置於第二旋轉模組22上,第二旋轉模組22可依據公轉方向D2(如順時鐘方向)一併旋轉第一旋轉模組21、容器31、多孔分散結構32及其內之漿料,以使第一旋轉模組21、容器31、多孔分散結構32及其內之漿料產生離心力及重力而分散漿料。前述公轉方向D2可相反或相同於自轉方向D1。 The rotating device 2 can also have a second rotating module 22. The first rotating module 21 is connected to the second rotating module 22 or disposed on the second rotating module 22, and the second rotating module 22 can rotate the first rotating module 21 according to the revolution direction D2 (such as a clockwise direction). The container 31, the porous dispersion structure 32, and the slurry therein are such that the first rotating module 21, the container 31, the porous dispersion structure 32, and the slurry therein are subjected to centrifugal force and gravity to disperse the slurry. The aforementioned revolution direction D2 may be opposite or the same as the rotation direction D1.

多孔分散結構32可為一本體326與一骨架327所構 成,骨架327支撐本體326,且本體326與骨架327為互相固定或可彼此分離。 The porous dispersion structure 32 can be a body 326 and a skeleton 327 The skeleton 327 supports the body 326, and the body 326 and the skeleton 327 are fixed to each other or may be separated from each other.

如第1A圖所示,容器31與多孔分散結構32可不具有如第1B圖之傾斜角度θ。或者,如第1B圖所示,容器31與多孔分散結構32均可具有呈30度至60度之傾斜角度θ,藉此提供三維方向之重力作用,以提升漿料分散系統1與漿料分散裝置3分散漿料之效能。傾斜角度θ可為30、40、45、50或60度,但不以此為限。 As shown in Fig. 1A, the container 31 and the porous dispersion structure 32 may not have the inclination angle θ as shown in Fig. 1B. Alternatively, as shown in FIG. 1B, both the container 31 and the porous dispersion structure 32 may have an inclination angle θ of 30 to 60 degrees, thereby providing a three-dimensional force of gravity to enhance the slurry dispersion system 1 and slurry dispersion. The effectiveness of the device 3 to disperse the slurry. The inclination angle θ may be 30, 40, 45, 50 or 60 degrees, but is not limited thereto.

如第1A圖至第3B圖所示,多孔分散結構32可具有多個擾流板323。多個擾流板323分別形成於多個分散孔322處,並位於多孔分散結構32(本體326)之內側324、或內側324加上外側325。擾流板323可為擋板或鰭板等,且擾流板323之維度可為二維(平面)或三維(立體)。 As shown in FIGS. 1A to 3B, the porous dispersion structure 32 may have a plurality of spoilers 323. A plurality of spoilers 323 are formed at the plurality of dispersion holes 322, respectively, and are located inside the inner 324 of the porous dispersion structure 32 (body 326), or the inner side 324 plus the outer side 325. The spoiler 323 may be a baffle or a fin or the like, and the dimension of the spoiler 323 may be two-dimensional (planar) or three-dimensional (stereo).

如第1A圖至第3B圖所示,多孔分散結構32之多個擾流板323可朝向漿料(見第6B圖之漿料4a或漿料4b)之多個顆粒之流動方向D3,且多個擾流板323可對漿料之多個顆粒之流動提供剪切力(shear force),以使漿料之多個顆粒之流動產生迴流F1與紊流F2,讓漿料之多個顆粒不斷地重覆或循環流動於容器31之第一容置空間311、多孔分散結構32之多個分散孔322與第二容置空間321之間,進而分散漿料之多個顆粒及均勻化漿料之多個顆粒之粒徑。 As shown in FIGS. 1A to 3B, the plurality of spoilers 323 of the porous dispersion structure 32 may face the flow direction D3 of the plurality of particles of the slurry (see the slurry 4a or the slurry 4b of FIG. 6B), and The plurality of spoilers 323 can provide a shear force to the flow of the plurality of particles of the slurry, so that the flow of the plurality of particles of the slurry produces the reflux F1 and the turbulent flow F2, and the plurality of particles of the slurry Continuously repetitively circulating or circulating between the first accommodating space 311 of the container 31, the plurality of dispersion holes 322 of the porous dispersion structure 32, and the second accommodating space 321, thereby dispersing a plurality of particles of the slurry and homogenizing the slurry. The particle size of the plurality of particles.

第4A圖與第4B圖為本揭露第1A圖至第2圖之漿料分散系統1及漿料分散裝置3之多孔分散結構32中,具有不同開孔率之分散孔322之示意圖,其中,開孔率等於多 個分散孔322之面積除以本體326之面積。 4A and 4B are schematic views of the dispersion hole 322 having different opening ratios in the porous dispersion structure 32 of the slurry dispersion system 1 and the slurry dispersing device 3 of FIGS. 1A to 2, wherein Opening ratio is equal to The area of the discrete holes 322 is divided by the area of the body 326.

如第4A圖所示,多個分散孔322之開孔率可大於或等於50%,如50%、60%、70%或80%。或者,如第4B圖所示,多個分散孔322之開孔率可小於50%,如40%、30%或20%。據此,本揭露可依實際需求調整多個分散孔322之開孔率,以較佳地分散漿料之多個顆粒或均勻化多個顆粒之粒徑。 As shown in FIG. 4A, the opening ratio of the plurality of dispersion holes 322 may be greater than or equal to 50%, such as 50%, 60%, 70%, or 80%. Alternatively, as shown in FIG. 4B, the opening ratio of the plurality of dispersion holes 322 may be less than 50%, such as 40%, 30%, or 20%. Accordingly, the present disclosure can adjust the opening ratio of the plurality of dispersion holes 322 according to actual needs to preferably disperse a plurality of particles of the slurry or to homogenize the particle diameters of the plurality of particles.

第5A圖為本揭露第1A圖至第2圖之漿料分散系統1及漿料分散裝置3之多孔分散結構32中分散孔322之孔徑L之示意圖。第5B圖為二種不同漿料4a及4b中單一顆粒41a(41b)與聚集顆粒之粒徑之示意圖,其中,聚集顆粒為至少二顆粒41a(41b)所聚集而成。 FIG. 5A is a schematic view showing the pore diameter L of the dispersion hole 322 in the porous dispersion structure 32 of the slurry dispersion system 1 and the slurry dispersing device 3 of FIGS. 1A to 2 . Fig. 5B is a view showing the particle diameters of the single particles 41a (41b) and the aggregated particles in the two different slurries 4a and 4b, wherein the aggregated particles are obtained by agglomerating at least two particles 41a (41b).

如第5A圖所示,多孔分散結構32之單一分散孔322之孔徑L可例如為大約300μm(微米)。如第5B圖所示,漿料4a(如活物)之單一顆粒41a之一次粒徑L1可例如為大約10μm(微米),且漿料4a之聚集顆粒之聚集粒徑L2可例如為大約30μm(微米)。而漿料4b(如碳黑)之單一顆粒41b之一次粒徑L3可例如為大約0.1μm(微米),且漿料4b之聚集顆粒之聚集粒徑L4可例如為大約0.3μm(微米)。 As shown in Fig. 5A, the pore diameter L of the single dispersion hole 322 of the porous dispersion structure 32 may be, for example, about 300 μm (micrometer). As shown in Fig. 5B, the primary particle diameter L1 of the single particle 41a of the slurry 4a (e.g., living matter) may be, for example, about 10 μm (micrometer), and the aggregated particle diameter L2 of the aggregated particle of the slurry 4a may be, for example, about 30 μm. (micron). While the primary particle diameter L3 of the single particle 41b of the slurry 4b (e.g., carbon black) may be, for example, about 0.1 μm (micrometer), and the aggregated particle diameter L4 of the aggregated particle of the slurry 4b may be, for example, about 0.3 μm (micrometer).

因此,本揭露之多孔分散結構32中單一分散孔322之孔徑L可大於漿料4a(4b)之單一顆粒41a(41b)之一次粒徑L1(L3),並大於漿料4a(4b)之聚集顆粒之聚集粒徑L2(L4),以供漿料4a(4b)之單一顆粒41a(41b)與聚集顆粒穿 過多孔分散結構32之分散孔322。 Therefore, the pore diameter L of the single dispersion hole 322 in the porous dispersion structure 32 of the present disclosure may be larger than the primary particle diameter L1 (L3) of the single particle 41a (41b) of the slurry 4a (4b), and larger than the slurry 4a (4b). The aggregated particle size L2 (L4) of the aggregated particles is supplied to the single particles 41a (41b) of the slurry 4a (4b) and the aggregated particles. The pores 322 pass through the porous dispersion structure 32.

第6A圖為無使用本揭露之多孔分散結構32來分散漿料4a(4b)之結果示意圖。第6B圖為有使用本揭露之多孔分散結構32來分散漿料4a(4b)之結果示意圖。 Fig. 6A is a view showing the result of dispersing the slurry 4a (4b) without using the porous dispersion structure 32 of the present disclosure. Fig. 6B is a view showing the result of dispersing the slurry 4a (4b) using the porous dispersion structure 32 of the present disclosure.

如第6A圖所示,當無使用本揭露之多孔分散結構32來分散漿料4a(4b)時,漿料4a(4b)之單一顆粒41a(41b)與聚集顆粒容易聚集沈降在容器31之底部,並在容器31之角落產生死角區R而無法分散部分漿料4a(4b)之單一顆粒41a(41b)與聚集顆粒。反之,如第6B圖所示,當有使用本揭露之多孔分散結構32來分散漿料4a(4b)時,多孔分散結構32可消除如第6A圖之死角區R,並較均勻地分散漿料4a(4b)之單一顆粒41a(41b)與聚集顆粒於整個容器31中。 As shown in FIG. 6A, when the slurry 4a (4b) is dispersed without using the porous dispersion structure 32 of the present disclosure, the single particles 41a (41b) of the slurry 4a (4b) and the aggregated particles are easily aggregated and settled in the container 31. At the bottom, a dead zone R is generated at the corner of the container 31 to disperse the single particles 41a (41b) of the partial slurry 4a (4b) and the aggregated particles. On the other hand, as shown in Fig. 6B, when the porous dispersion structure 32 of the present disclosure is used to disperse the slurry 4a (4b), the porous dispersion structure 32 can eliminate the dead zone R as in Fig. 6A and disperse the slurry more uniformly. The single particles 41a (41b) of the material 4a (4b) are aggregated with the particles throughout the container 31.

第7圖為無使用本揭露之多孔分散結構32與有使用本揭露之多孔分散結構32來分散漿料之結果比較圖。如第7圖之長條H1與長條H2所示,本實施例為對第5B圖之漿料4b(如碳黑)之實驗結果,並以漿料4b之強度(單位為a.u,即不限單位)與粒徑(單位為nm)之關係為例。 Figure 7 is a graph comparing the results of the use of the porous dispersion structure 32 of the present disclosure and the use of the porous dispersion structure 32 of the present disclosure to disperse the slurry. As shown by the strip H1 and the strip H2 in Fig. 7, this example is the experimental result of the slurry 4b (such as carbon black) of Fig. 5B, and the strength of the slurry 4b (unit is au, that is, no The relationship between the limited unit and the particle size (in nm) is taken as an example.

當無使用本揭露之多孔分散結構32來分散漿料4b時,漿料4b之聚集顆粒之粒徑分布較廣泛且較不均勻地分布在約80至1000nm(奈米)之範圍,並有漿料4b之較大聚集顆粒之粒徑(見長條H1)分佈在300至1000nm(奈米)之範圍M1。反之,當有使用本揭露之多孔分散結構32來分散漿料4b(如碳黑)時,漿料4b之聚集顆粒之粒徑分布較狹窄且較均勻地分布在約80至300nm(奈米)之範圍,並有漿料 4b之較小聚集顆粒之粒徑(見長條H2)分佈在70至90nm(奈米)之範圍M2。所以,當有使用本揭露之多孔分散結構32時,多孔分散結構32可消除具有較大粒徑之聚集顆粒,並縮減漿料4b之聚集顆粒之粒徑,也能較均勻地分散漿料4b之聚集顆粒。 When the porous dispersion structure 32 of the present disclosure is used to disperse the slurry 4b, the aggregated particles of the slurry 4b have a broader particle size distribution and are more unevenly distributed in the range of about 80 to 1000 nm (nano), and have a slurry. The particle size of the larger aggregated particles of the material 4b (see strip H1) is distributed in the range M1 of 300 to 1000 nm (nano). On the contrary, when the porous dispersion structure 32 of the present disclosure is used to disperse the slurry 4b (such as carbon black), the aggregated particles of the slurry 4b have a narrow particle size distribution and are more evenly distributed at about 80 to 300 nm (nano). Range and slurry The particle size of the smaller aggregated particles of 4b (see strip H2) is distributed over the range M2 of 70 to 90 nm (nano). Therefore, when the porous dispersion structure 32 of the present disclosure is used, the porous dispersion structure 32 can eliminate the aggregated particles having a larger particle diameter, and reduce the particle diameter of the aggregated particles of the slurry 4b, and can also uniformly disperse the slurry 4b. Aggregated particles.

又,如第7圖之曲線S1與曲線S2所示,本實施例為對第5B圖之漿料4b(如碳黑)之實驗結果,並以漿料4b之顆粒41b之累加百分比(單位為%)與粒徑(單位為nm)之關係為例。 Further, as shown by the curve S1 and the curve S2 in Fig. 7, the present embodiment is an experimental result of the slurry 4b (e.g., carbon black) of Fig. 5B, and the cumulative percentage of the particles 41b of the slurry 4b (in units %) is related to the relationship of the particle diameter (in nm).

當無使用本揭露之多孔分散結構32來分散漿料4b時,在曲線S1上,漿料4b之聚集顆粒之粒徑由80nm(奈米)處開始分布,而從曲線S1之位置點A1可以看出,具有粒徑100nm(奈米)以下之聚集顆粒之累加百分比僅為大約28%。反之,當有使用本揭露之多孔分散結構32來分散漿料4b(如碳黑)時,在曲線S2上,漿料4b之聚集顆粒之粒徑由60nm(奈米)處開始分布,而從曲線S2之位置點A2可以看出,具有粒徑100nm(奈米)以下之聚集顆粒之累加百分比為大約68%。所以,當有使用本揭露之多孔分散結構32時,漿料4b之聚集顆粒之粒徑大多分佈在100nm(奈米)以下,故多孔分散結構32可分散及均勻化漿料4b之聚集顆粒之粒徑。 When the slurry 4b is dispersed without using the porous dispersion structure 32 disclosed herein, on the curve S1, the particle diameter of the aggregated particles of the slurry 4b is distributed from 80 nm (nano), and the point A1 from the position of the curve S1 can be It is seen that the cumulative percentage of aggregated particles having a particle size of less than 100 nm (nano) is only about 28%. On the other hand, when the porous dispersion structure 32 of the present disclosure is used to disperse the slurry 4b (such as carbon black), on the curve S2, the particle diameter of the aggregated particles of the slurry 4b is distributed from 60 nm (nano), and As can be seen from the position A2 of the curve S2, the cumulative percentage of aggregated particles having a particle diameter of 100 nm (nano) or less is about 68%. Therefore, when the porous dispersion structure 32 of the present disclosure is used, the particle size of the aggregated particles of the slurry 4b is mostly distributed below 100 nm (nano), so that the porous dispersion structure 32 can disperse and homogenize the aggregated particles of the slurry 4b. Particle size.

第8圖為無使用本揭露之多孔分散結構32與有使用本揭露之多孔分散結構32來分散漿料之另一結果比較圖。如圖所示,本實施例為在多孔分散結構32之多個分散孔322 與多個擾流板323具有剪切力為100(1/秒)之條件下,對第5B圖之漿料4b(如碳黑)之實驗結果。 Figure 8 is a graph comparing another result of the use of the porous dispersion structure 32 of the present disclosure and the use of the porous dispersion structure 32 of the present disclosure to disperse the slurry. As shown, this embodiment is a plurality of discrete pores 322 in the porous dispersion structure 32. The experimental results of the slurry 4b (e.g., carbon black) of Fig. 5B under the condition that the plurality of spoilers 323 have a shear force of 100 (1/sec).

當無使用本揭露之多孔分散結構32來分散漿料4b時,在曲線S3上,漿料4b之黏度均高於48cPs(釐泊),例如在初始時間之位置點B1、1個月靜置時間之位置點B2與2個月靜置時間之位置點B3三者之黏度分別為48、64及86cPs(釐泊),且經2個月靜置時間之漿料4b之黏度(86cPs)相較於初始時間之漿料4b之黏度(48cPs)有大約2倍之變異。反之,當有使用本揭露之多孔分散結構32來分散漿料4b時,在曲線S4上,漿料4b之黏度均低於27cPs(釐泊),例如在初始時間之位置點C1、1個月靜置時間之位置點C2與2個月靜置時間之位置點C3三者之黏度分別為25、22及27cPs(釐泊),且經2個月靜置時間之漿料4b之黏度(25cPs)相較於初始時間之漿料4b之黏度(27cPs)幾乎沒有變異。所以,當有使用本揭露之多孔分散結構32時,多孔分散結構32可降低漿料4b之黏度,且漿料4b經靜置一段時間後幾乎沒有變異。 When the slurry 4b is dispersed without using the porous dispersion structure 32 of the present disclosure, the viscosity of the slurry 4b is higher than 48 cPs (centipoise) on the curve S3, for example, at the point of initial time B1, 1 month. The position of the time point B2 and the position of the 2 month rest time point B3 are 48, 64 and 86 cPs (centipoise), respectively, and the viscosity (86cPs) phase of the slurry 4b after 2 months of standing time. The viscosity of the slurry 4b (48 cPs) was approximately 2 times higher than the initial time. On the other hand, when the porous dispersion structure 32 of the present disclosure is used to disperse the slurry 4b, the viscosity of the slurry 4b is lower than 27 cPs (centipoise) on the curve S4, for example, at the initial time point C1, 1 month. The viscosity at the position C2 of the rest time and the position C3 of the 2 month rest time are 25, 22 and 27 cPs (centipoise), respectively, and the viscosity of the slurry 4b after 2 months of standing time (25 cPs) There is almost no variation in the viscosity (27 cPs) of the slurry 4b compared to the initial time. Therefore, when the porous dispersion structure 32 of the present disclosure is used, the porous dispersion structure 32 can lower the viscosity of the slurry 4b, and the slurry 4b hardly mutates after standing for a while.

由上述內容可知,本揭露之漿料分散系統及漿料分散裝置中,主要是藉由旋轉容器、多孔分散結構及其內之漿料,以使漿料之多個顆粒穿過多孔分散結構之多個分散孔而循環或流動於容器與多孔分散結構兩者之容置空間之間,進而達到較均勻地分散漿料之多個顆粒之效果。 It can be seen from the above that in the slurry dispersion system and the slurry dispersion device of the present disclosure, the plurality of particles of the slurry pass through the porous dispersion structure mainly by rotating the container, the porous dispersion structure and the slurry therein. The plurality of dispersed pores circulate or flow between the container and the accommodating space of the porous dispersion structure, thereby achieving the effect of more uniformly dispersing the plurality of particles of the slurry.

同時,本揭露之漿料分散系統及漿料分散裝置之結構簡單且操作簡便。本揭露之容器與多孔分散結構均可具有 傾斜角度,藉此提供三維方向之重力作用,進而提升漿料分散系統與漿料分散裝置分散漿料之效能。而且,本揭露之多孔分散結構之多個擾流板可提供高剪切力,以分散漿料之多個顆粒及均勻化漿料之多個顆粒之粒徑。 At the same time, the slurry dispersion system and the slurry dispersion device of the present disclosure are simple in structure and simple in operation. The container and the porous dispersion structure of the present disclosure may have The angle of inclination, thereby providing a three-dimensional force of gravity, thereby enhancing the effectiveness of the slurry dispersion system and the slurry dispersion device to disperse the slurry. Moreover, the plurality of spoilers of the porous dispersion structure of the present disclosure can provide high shear forces to disperse a plurality of particles of the slurry and to homogenize the particle size of the plurality of particles of the slurry.

另外,本揭露之漿料分散系統及漿料分散裝置可消除死角區以較均勻地分散漿料之單一顆粒與聚集顆粒於整個容器中,並可消除具有較大粒徑之聚集顆粒,也可縮減漿料之聚集顆粒之粒徑。而且,本揭露之漿料分散系統及漿料分散裝置可降低漿料之黏度,也能使漿料經靜置一段時間後幾乎沒有變異,從而提高漿料之穩定性及長期儲存之安定性。 In addition, the slurry dispersing system and the slurry dispersing device of the present disclosure can eliminate the dead zone to uniformly disperse the single particles and the aggregated particles of the slurry in the entire container, and can eliminate the aggregated particles having a larger particle size. The particle size of the aggregated particles of the slurry is reduced. Moreover, the slurry dispersing system and the slurry dispersing device of the present disclosure can reduce the viscosity of the slurry, and can also make the slurry hardly mutate after standing for a period of time, thereby improving the stability of the slurry and the stability of long-term storage.

上述實施形態僅例示性說明本揭露之原理、特點及其功效,並非用以限制本揭露之可實施範疇,任何熟習此項技藝之人士均可在不違背本揭露之精神及範疇下,對上述實施形態進行修飾與改變。任何運用本揭露所揭示內容而完成之等效改變及修飾,均仍應為申請專利範圍所涵蓋。因此,本揭露之權利保護範圍,應如申請專利範圍所列。 The above-described embodiments are merely illustrative of the principles, features, and functions of the present disclosure, and are not intended to limit the scope of the present disclosure. Any person skilled in the art can practice the above without departing from the spirit and scope of the disclosure. The embodiment is modified and changed. Any equivalent changes and modifications made by the disclosure of this disclosure should still be covered by the scope of the patent application. Therefore, the scope of protection of this disclosure should be as set forth in the scope of the patent application.

1‧‧‧漿料分散系統 1‧‧‧Slurry Dispersion System

2‧‧‧旋轉裝置 2‧‧‧Rotating device

21‧‧‧第一旋轉模組 21‧‧‧First rotating module

22‧‧‧第二旋轉模組 22‧‧‧Second Rotary Module

3‧‧‧漿料分散裝置 3‧‧‧Slurry dispersing device

31‧‧‧容器 31‧‧‧ Container

311‧‧‧第一容置空間 311‧‧‧First accommodation space

32‧‧‧多孔分散結構 32‧‧‧Porously dispersed structure

321‧‧‧第二容置空間 321‧‧‧Second accommodating space

322‧‧‧分散孔 322‧‧‧Distributed holes

323‧‧‧擾流板 323‧‧‧ spoiler

324‧‧‧內側 324‧‧‧ inside

325‧‧‧外側 325‧‧‧ outside

326‧‧‧本體 326‧‧‧Ontology

327‧‧‧骨架 327‧‧‧ skeleton

D1‧‧‧自轉方向 D1‧‧‧Rotation direction

D2‧‧‧公轉方向 D2‧‧‧Right direction

F1‧‧‧迴流 F1‧‧‧Reflow

F2‧‧‧紊流 F2‧‧‧ turbulence

θ‧‧‧傾斜角度 Θ‧‧‧ tilt angle

Claims (21)

一種漿料分散系統,包括:一旋轉裝置;以及一漿料分散裝置,包括:一容器,其連接該旋轉裝置或設置於該旋轉裝置上,且該容器具有一第一容置空間;以及一多孔分散結構,其容置於該容器之第一容置空間內,該多孔分散結構具有一第二容置空間與多個分散孔,且該容器之第一容置空間或該多孔分散結構之第二容置空間容納具有多個顆粒之漿料,其中,藉由該旋轉裝置旋轉該容器、多孔分散結構及其內之漿料,以使該漿料之多個顆粒穿過該多孔分散結構之多個分散孔而循環或流動於該容器之第一容置空間與該多孔分散結構之第二容置空間之間,進而分散該漿料之多個顆粒。 A slurry dispersion system comprising: a rotating device; and a slurry dispersing device comprising: a container connected to the rotating device or disposed on the rotating device, the container having a first receiving space; and a a porous dispersion structure, which is disposed in a first accommodating space of the container, the porous dispersion structure has a second accommodating space and a plurality of dispersion holes, and the first accommodating space or the porous dispersion structure of the container The second accommodating space accommodates a slurry having a plurality of particles, wherein the container, the porous dispersion structure and the slurry therein are rotated by the rotating device to pass a plurality of particles of the slurry through the porous dispersion A plurality of dispersed pores of the structure circulate or flow between the first accommodating space of the container and the second accommodating space of the porous dispersion structure, thereby dispersing a plurality of particles of the slurry. 如申請專利範圍第1項所述之漿料分散系統,其中,該旋轉裝置為旋轉機構、旋轉平台、自轉機台、公轉機台、自轉加公轉機台、行星式旋轉機台、攪拌式旋轉機台或轉子式旋轉機台。 The slurry dispersion system according to claim 1, wherein the rotating device is a rotating mechanism, a rotating platform, a rotating machine, a revolution machine, a rotation and a revolution machine, a planetary rotary machine, and a stirring rotation. Machine or rotor type rotating machine. 如申請專利範圍第1項所述之漿料分散系統,其中,該旋轉裝置具有一第一旋轉模組,該容器連接該第一旋轉模組或設置於該第一旋轉模組上,且該第一旋轉模組依據自轉方向一併旋轉該容器、多孔分散結構及 其內之漿料。 The slurry dispersing system of claim 1, wherein the rotating device has a first rotating module, the container is connected to the first rotating module or disposed on the first rotating module, and the The first rotating module rotates the container, the porous dispersion structure and the rotating body according to the rotation direction The slurry inside. 如申請專利範圍第3項所述之漿料分散系統,其中,該旋轉裝置更具有一第二旋轉模組,該第一旋轉模組連接該第二旋轉模組或設置於該第二旋轉模組上,且該第二旋轉模組依據公轉方向一併旋轉該第一旋轉模組、容器、多孔分散結構及其內之漿料。 The slurry dispersing system of claim 3, wherein the rotating device further has a second rotating module, the first rotating module is connected to the second rotating module or disposed on the second rotating die And the second rotating module rotates the first rotating module, the container, the porous dispersion structure and the slurry therein according to the revolution direction. 如申請專利範圍第1項所述之漿料分散系統,其中,該容器與該多孔分散結構均具有呈30度至60度之傾斜角度。 The slurry dispersion system of claim 1, wherein the container and the porous dispersion structure each have an inclination angle of 30 to 60 degrees. 如申請專利範圍第1項所述之漿料分散系統,其中,該多孔分散結構為多孔分散網、多孔分散層或多孔分散板。 The slurry dispersion system according to claim 1, wherein the porous dispersion structure is a porous dispersion network, a porous dispersion layer or a porous dispersion plate. 如申請專利範圍第1項所述之漿料分散系統,其中,該多孔分散結構為一本體與一骨架所構成,該骨架支撐該本體,且該本體與骨架為互相固定或可彼此分離。 The slurry dispersion system of claim 1, wherein the porous dispersion structure is a body and a skeleton, the skeleton supports the body, and the body and the skeleton are fixed to each other or can be separated from each other. 如申請專利範圍第1項所述之漿料分散系統,其中,該多孔分散結構更具有多個擾流板,其分別形成於該多個分散孔處並至少位於該多孔分散結構之內側,且各該擾流板之維度為二維或三維。 The slurry dispersion system of claim 1, wherein the porous dispersion structure further has a plurality of spoiler plates respectively formed at the plurality of dispersion holes and located at least inside the porous dispersion structure, and The dimensions of each of the spoilers are two-dimensional or three-dimensional. 如申請專利範圍第8項所述之漿料分散系統,其中,該多孔分散結構之多個擾流板朝向該漿料之多個顆粒之流動方向,且該多個擾流板提供剪切力以使該漿料之多個顆粒之流動產生迴流及紊流而均勻化該漿料之多個顆粒之粒徑。 The slurry dispersion system of claim 8, wherein the plurality of spoilers of the porous dispersion structure face a flow direction of the plurality of particles of the slurry, and the plurality of spoilers provide shearing force The particle size of the plurality of particles of the slurry is homogenized by causing the flow of the plurality of particles of the slurry to cause reflux and turbulence. 如申請專利範圍第1項所述之漿料分散系統,其中,該多孔分散結構之各個分散孔之形狀為方形、矩形、圓形、梯形或三角形。 The slurry dispersion system according to claim 1, wherein each of the dispersion holes of the porous dispersion structure has a square shape, a rectangular shape, a circular shape, a trapezoidal shape or a triangular shape. 如申請專利範圍第1項所述之漿料分散系統,其中,其中,該多孔分散結構之多個分散孔之開孔率為大於50%或小於50%。 The slurry dispersion system according to claim 1, wherein the plurality of dispersion holes of the porous dispersion structure have an opening ratio of more than 50% or less than 50%. 如申請專利範圍第1項所述之漿料分散系統,其中,該多孔分散結構之單一分散孔之孔徑大於該漿料之單一顆粒之一次粒徑,並大於該漿料之至少二顆粒所形成之聚集顆粒之聚集粒徑,以供該漿料之單一顆粒與聚集顆粒穿過該多孔分散結構之分散孔。 The slurry dispersion system of claim 1, wherein the pore size of the single dispersion pore of the porous dispersion structure is larger than the primary particle diameter of the single particle of the slurry, and is larger than the formation of at least two particles of the slurry. The aggregated particle size of the aggregated particles is such that the single particles and aggregated particles of the slurry pass through the dispersed pores of the porous dispersed structure. 一種漿料分散裝置,包括:一容器,其具有一第一容置空間;以及一多孔分散結構,其容置於該容器之第一容置空間內,該多孔分散結構具有一第二容置空間與多個分散孔,且該容器之第一容置空間或該多孔分散結構之第二容置空間容納具有多個顆粒之漿料,其中,藉由旋轉該容器、該多孔分散結構及其內之該漿料,以使該漿料之多個顆粒穿過該多孔分散結構之多個分散孔而循環或流動於該容器之第一容置空間與該多孔分散結構之第二容置空間之間,進而分散該漿料之多個顆粒。 A slurry dispersing device comprising: a container having a first accommodating space; and a porous dispersing structure housed in the first accommodating space of the container, the porous dispersing structure having a second volume a space and a plurality of dispersion holes, and the first accommodation space of the container or the second accommodation space of the porous dispersion structure accommodates a slurry having a plurality of particles, wherein by rotating the container, the porous dispersion structure and The slurry therein, wherein a plurality of particles of the slurry pass through a plurality of dispersion holes of the porous dispersion structure to circulate or flow in a first accommodation space of the container and a second accommodation of the porous dispersion structure Between the spaces, a plurality of particles of the slurry are further dispersed. 如申請專利範圍第13項所述之漿料分散裝置,其中,該容器與該多孔分散結構均具有呈30度至60度之傾斜 角度。 The slurry dispersing device of claim 13, wherein the container and the porous dispersion structure each have a slope of 30 to 60 degrees. angle. 如申請專利範圍第13項所述之漿料分散裝置,其中,該多孔分散結構為多孔分散網、多孔分散層或多孔分散板。 The slurry dispersing device according to claim 13, wherein the porous dispersion structure is a porous dispersion network, a porous dispersion layer or a porous dispersion plate. 如申請專利範圍第13項所述之漿料分散裝置,其中,該多孔分散結構為一本體與一骨架所構成,該骨架支撐該本體,且該本體與骨架為互相固定或可彼此分離。 The slurry dispersion device of claim 13, wherein the porous dispersion structure is a body and a skeleton, the skeleton supports the body, and the body and the skeleton are fixed to each other or can be separated from each other. 如申請專利範圍第13項所述之漿料分散裝置,其中,該多孔分散結構更具有多個擾流板,其分別形成於該多個分散孔處並至少位於該多孔分散結構之內側,且各該擾流板之維度為二維或三維。 The slurry dispersion device of claim 13, wherein the porous dispersion structure further has a plurality of spoiler plates respectively formed at the plurality of dispersion holes and located at least inside the porous dispersion structure, and The dimensions of each of the spoilers are two-dimensional or three-dimensional. 如申請專利範圍第17項所述之漿料分散裝置,其中,該多孔分散結構之多個擾流板朝向該漿料之多個顆粒之流動方向,且該多個擾流板提供剪切力以使該漿料之多個顆粒之流動產生迴流及紊流而均勻化該漿料之多個顆粒之粒徑。 The slurry dispersing device of claim 17, wherein the plurality of spoilers of the porous dispersion structure face a flow direction of the plurality of particles of the slurry, and the plurality of spoilers provide shearing force The particle size of the plurality of particles of the slurry is homogenized by causing the flow of the plurality of particles of the slurry to cause reflux and turbulence. 如申請專利範圍第13項所述之漿料分散裝置,其中,該多孔分散結構之各個分散孔之形狀為方形、矩形、圓形、梯形或三角形。 The slurry dispersing device according to claim 13, wherein each of the dispersed pores of the porous dispersion structure has a square shape, a rectangular shape, a circular shape, a trapezoidal shape or a triangular shape. 如申請專利範圍第13項所述之漿料分散裝置,其中,其中,該多孔分散結構之多個分散孔之開孔率為大於50%或小於50%。 The slurry dispersing device according to claim 13, wherein the plurality of dispersion holes of the porous dispersion structure have an opening ratio of more than 50% or less than 50%. 如申請專利範圍第13項所述之漿料分散裝置,其中,該多孔分散結構之單一分散孔之孔徑大於該漿料之單 一顆粒之一次粒徑,並大於該漿料之至少二顆粒所形成之聚集顆粒之聚集粒徑,以供該漿料之單一顆粒與聚集顆粒穿過該多孔分散結構之分散孔。 The slurry dispersing device according to claim 13, wherein a pore diameter of the single dispersed pore of the porous dispersed structure is larger than a single of the slurry The primary particle size of a particle is greater than the aggregate particle size of the aggregated particles formed by at least two particles of the slurry, such that the single particle and the aggregated particle of the slurry pass through the dispersed pore of the porous dispersion structure.
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TWI747123B (en) * 2019-12-31 2021-11-21 財團法人工業技術研究院 Dispersion device and slurry dispersion system
US11534729B2 (en) 2019-12-31 2022-12-27 Industrial Technology Research Institute Dispersion device and slurry dispersion system

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CN113117571B (en) * 2019-12-31 2023-09-05 财团法人工业技术研究院 Dispersing device and slurry dispersing system

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI747123B (en) * 2019-12-31 2021-11-21 財團法人工業技術研究院 Dispersion device and slurry dispersion system
US11534729B2 (en) 2019-12-31 2022-12-27 Industrial Technology Research Institute Dispersion device and slurry dispersion system

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