TWM530178U - Purification device for residual liquid containing metal - Google Patents

Purification device for residual liquid containing metal Download PDF

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Publication number
TWM530178U
TWM530178U TW105203235U TW105203235U TWM530178U TW M530178 U TWM530178 U TW M530178U TW 105203235 U TW105203235 U TW 105203235U TW 105203235 U TW105203235 U TW 105203235U TW M530178 U TWM530178 U TW M530178U
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Taiwan
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partition
chamber
metal
residual liquid
wall
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TW105203235U
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Chinese (zh)
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Dong-Shan Guo
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Dong-Shan Guo
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Priority to TW105203235U priority Critical patent/TWM530178U/en
Publication of TWM530178U publication Critical patent/TWM530178U/en

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Description

含金屬殘液之淨化裝置 Purification device containing metal residual liquid

本創作係關於一種淨化設備,尤指一種含金屬殘液之淨化裝置。 This creation relates to a purification device, especially a purification device containing a metal residual liquid.

工業間往往因為各種製程因素,會產生含金屬之殘液,此類殘液,該含金屬之殘液由於重金屬離子往往具有毒性,或者導致癌症、畸形等物質,對人類健康與環境影響至鉅。 Industrial plants often produce metal-containing residual liquids due to various process factors. Such residual liquids are often toxic due to heavy metal ions, or cause cancer, deformity and other substances, which have a great impact on human health and the environment. .

因此對此類含金屬殘液,例如防護裝飾性之鎳鉻鍍層所需使用之鍍鎳鉻溶液等,工業間或是資源、環保業者,大多已經因應時代潮流或是法令規範而進行排放之改善,更甚而對於該金屬進行回收而有利於資源再生與應用。例如電鍍廢水處理設備各種流程進行調節、靜置蒸發、加藥、還原、中和反應、pH調節、沉澱、過濾等,有單獨流程也有複合之流程,視金屬殘液之濃度、種類、危害等而調整或設計。 Therefore, for such metal-containing residual liquids, such as nickel-chromium plating solutions for protective decorative nickel-chromium plating, etc., industrial or resource and environmental protection companies have mostly improved emissions according to the trend of the times or laws and regulations. Moreover, recycling of the metal is more beneficial to resource regeneration and application. For example, various processes of electroplating wastewater treatment equipment are adjusted, static evaporation, dosing, reduction, neutralization reaction, pH adjustment, precipitation, filtration, etc. There are separate processes and compound processes, depending on the concentration, type, and hazard of the metal residual liquid. And adjustment or design.

在各種處理階段中,就物理性之靜置蒸發階段而言,目前多是藉由自然之風量與溫度對於金屬殘液進行分離,以自然之風量與溫度而將金屬殘液中之水分與金屬,利用自然蒸發而分離。然而此種自然蒸發並不能發揮較大之物理分離之效果。 In the various treatment stages, in terms of the physical static evaporation stage, the metal residual liquid is separated by natural air volume and temperature, and the water and metal in the metal residual liquid are naturally used by the air volume and temperature. , separated by natural evaporation. However, such natural evaporation does not exert the effect of large physical separation.

有鑑於先前技術之問題,本創作人認為應有一種含金屬殘液 之淨化裝置,包括一箱體,該箱體包括一頂壁、一底壁、一前壁、一後壁、一第一側壁與一第二側壁相互框圍;該箱體內部於該頂壁與該底壁之間設直立之一第一隔板,該第一隔板與該底壁之間保持一第一通道;且該第一隔板與該第一側壁之間界定一第一容室;與該第一隔板相隔之位置,該箱體內部於該頂壁與該底壁之間設直立之一第二隔板,該第二隔板與該頂壁之間保持一第二通道;且該第二隔板與該第一隔板界定一第二容室;與該第二隔板相隔之位置,該箱體內部於該頂壁與該底壁之間設直立之一第三隔板,該第三隔板與該底壁之間保持一第三通道;且該第三隔板與該第二隔板之間界定一第三容室,且該第三隔板與該第二側壁界定一第四容室;且該箱體設一送風單元與該第一容室相通;該箱體設一金屬殘液輸入單元與該第一容室相通,該箱體設一金屬殘液排出單元與該第二容室相通,該箱體設一冷卻液輸入單元與該第三容室相通,該箱體設一排氣口與該第四容室相通,且該箱體設一冷卻液排出單元與該第四容室相通。 In view of the problems of the prior art, the author believes that there should be a metal-containing residual liquid. The cleaning device comprises a box body, wherein the box body comprises a top wall, a bottom wall, a front wall, a rear wall, a first side wall and a second side wall framed together; the box body is inside the top wall Providing a first partition between the first partition and the bottom wall; and defining a first space between the first partition and the first side wall; a second partition between the top wall and the bottom wall, and a second partition between the second partition and the top wall a second partition and the first partition define a second chamber; at a position spaced apart from the second partition, the interior of the box is erected between the top wall and the bottom wall a third partition, a third passage is maintained between the third partition and the bottom wall; and a third chamber is defined between the third partition and the second partition, and the third partition is The second side wall defines a fourth chamber; and the box body is provided with a air supply unit communicating with the first chamber; the box body is provided with a metal residual liquid input unit communicating with the first chamber, the box body a metal residual liquid discharge unit is in communication with the second chamber, the tank is provided with a coolant input unit communicating with the third chamber, the tank is provided with an exhaust port communicating with the fourth chamber, and the box is A coolant discharge unit is disposed in communication with the fourth chamber.

藉由自然之風量與溫度進行蒸發而初步分離水分與金屬外,更進一步將水分中之殘餘金屬再透過冷卻之進行,形成二度之水洗效果,對於排放之金屬更進一步減量。 The water and the metal are initially separated by evaporation of the natural air volume and temperature, and the residual metal in the water is further passed through the cooling to form a second degree of water washing effect, and the metal to be discharged is further reduced.

(1)‧‧‧箱體 (1) ‧‧‧ cabinet

(11)‧‧‧頂壁 (11) ‧‧‧ top wall

(12)‧‧‧底壁 (12) ‧‧‧ bottom wall

(13)‧‧‧前壁 (13) ‧ ‧ front wall

(14)‧‧‧後壁 (14) ‧‧‧Back wall

(15)‧‧‧第一側壁 (15) ‧‧‧First side wall

(16)‧‧‧第二側壁 (16) ‧‧‧second side wall

(21)‧‧‧第一隔板 (21)‧‧‧First partition

(21A)‧‧‧斜導板 (21A)‧‧‧ oblique guide

(22)‧‧‧第二隔板 (22)‧‧‧Second partition

(23)‧‧‧第三隔板 (23)‧‧‧ Third partition

(23A)‧‧‧斜導板 (23A)‧‧‧ oblique guide

(3A)‧‧‧第一通道 (3A)‧‧‧First Passage

(3B)‧‧‧第二通道 (3B)‧‧‧second channel

(3C)‧‧‧第三通道 (3C) ‧ ‧ third channel

(31)‧‧‧第一容室 (31) ‧ ‧ first room

(32)‧‧‧第二容室 (32)‧‧‧Second room

(33)‧‧‧第三容室 (33) ‧ ‧ third room

(34)‧‧‧第四容室 (34) ‧ ‧ fourth room

(41)‧‧‧送風單元 (41)‧‧‧Air supply unit

(42)‧‧‧金屬殘液輸入單元 (42)‧‧‧Metal residual liquid input unit

(43)‧‧‧金屬殘液排出單元 (43)‧‧‧Metal residual liquid discharge unit

(44)‧‧‧冷卻液輸入單元 (44) ‧‧‧Coolant input unit

(45)‧‧‧排氣口 (45) ‧ ‧ vents

(46)‧‧‧冷卻液排出單元 (46)‧‧‧Cool drain unit

(51)‧‧‧過濾板 (51)‧‧‧ Filter plates

(52A)‧‧‧過濾板 (52A)‧‧‧ Filter Plate

(52B)‧‧‧過濾板 (52B)‧‧‧Filter plate

(53)‧‧‧過濾板 (53)‧‧‧ Filter plates

(61)‧‧‧金屬殘液槽 (61)‧‧‧Metal raffinate

(62)‧‧‧第一水洗槽 (62) ‧‧‧First washing tank

(63)‧‧‧第二水洗槽 (63)‧‧‧Second water washing tank

第一圖係本新型創作之立體外觀圖 The first picture is a three-dimensional appearance of the new creation

第二圖係本新型創作之立體分解圖 The second picture is a three-dimensional exploded view of the new creation

第三圖係本新型創作之內部示意圖 The third picture is an internal schematic diagram of the new creation.

第四圖係本新型創作之相關系統示意圖 The fourth picture is a schematic diagram of the related system of the new creation.

以下藉由圖式說明本新型創作之內容、特點以及實施例,俾使 貴審查人員對於本新型創作有更進一步之了解。 The following description of the contents, features and examples of the novel creation will enable the reviewer to have a better understanding of the novel creation.

請參閱第一圖、第二圖與第三圖綜合觀示,本新型創作係關於一種含金屬殘液之淨化裝置,包括一箱體(1),該箱體(1)包括一頂壁(11)、一底壁(12)、一前壁(13)、一後壁(14)、一第一側壁(15)與一第二側壁(16)相互框圍;該箱體(1)內部於該頂壁(11)與該底壁(12)之間設直立之一第一隔板(21),該第一隔板(21)與該底壁(12)之間保持一第一通道(3A);且該第一隔板(21)與該第一側壁(15)之間界定一第一容室(31);與該第一隔板(21)相隔之位置,該箱體(1)內部於該頂壁(11)與該底壁(12)之間設直立之一第二隔板(22),該第二隔板(22)與該頂壁(11)之間保持一第二通道(3B);且該第二隔板(22)與該第一隔板(21)板界定一第二容室(32);與該第二隔板(22)相隔之位置,該箱體(1)內部於該頂壁(11)與該底壁(12)之間設直立之一第三隔板(23),該第三隔板(23)與該底壁(12)之間保持一第三通道(3C);且該第三隔板(23)與該第二隔板(22)之間界定一第三容室(33),且該第三隔板(23)與該第二側壁(16)界定一第四容室(34);且該箱體(1)設一送風單元(41)與該第一容室(31)相通;該箱體(1)設一金屬殘液輸入單元(42)與該第一容室(31)相通,該箱體(1)設一金屬殘液排出單元(43)與該第二容室(32)相通,該箱體(1)設一冷卻液輸入單元(44)與該第三容室(33)相通,該箱體(1)設一排氣口(45)與該第四容室(34)相 通,且該箱體(1)設一冷卻液排出單元(46)與該第四容室(34)相通。 Referring to the first, second and third figures, the novel creation relates to a purification device containing a metal residual liquid, comprising a box (1), the box (1) comprising a top wall ( 11), a bottom wall (12), a front wall (13), a rear wall (14), a first side wall (15) and a second side wall (16) are framed together; the inside of the box (1) Between the top wall (11) and the bottom wall (12), a first partition (21) is erected, and a first passage is maintained between the first partition (21) and the bottom wall (12). (3A); and a first chamber (31) is defined between the first partition (21) and the first side wall (15); and the box is separated from the first partition (21) 1) internally, between the top wall (11) and the bottom wall (12), a second partition (22) is provided, and a gap between the second partition (22) and the top wall (11) is maintained. a second passage (3B); and the second partition (22) and the first partition (21) plate define a second chamber (32); at a position spaced apart from the second partition (22), A third partition (23) is disposed between the top wall (11) and the bottom wall (12), and the third partition (23) and the bottom wall (12) Maintain a third channel (3C); and the first A third chamber (33) is defined between the partition (23) and the second partition (22), and the third partition (23) and the second side wall (16) define a fourth chamber ( 34); and the casing (1) is provided with a blowing unit (41) communicating with the first chamber (31); the tank (1) is provided with a metal residual liquid input unit (42) and the first chamber (31) communicating, the tank (1) is provided with a metal residual liquid discharge unit (43) communicating with the second chamber (32), the tank (1) is provided with a coolant input unit (44) and the first The three chambers (33) are in communication, and the tank (1) is provided with an exhaust port (45) and the fourth chamber (34) And the tank (1) is provided with a coolant discharge unit (46) communicating with the fourth chamber (34).

請參閱第四圖,配合第一至第三圖所示,當工業用之金屬殘液流至一金屬殘液槽(61)中置放,將其汲導至該金屬殘液輸入單元(42)而至該箱體(1)內部,此時由於藉由該送風單元(41)之汲風進入,可以將該金屬殘液流冷卻,少量含金屬之熱氣繼續上揚,經由該第一通道(3A)繼續上揚至該第二容室(32),而金屬殘液中之金屬因為比重較大而下沉,而經由該第一通道(3A)由該金屬殘液排出單元(43)將其導出至該金屬殘液槽(61)內部等待繼續分離。此時在第一容室(31)與第二容室(32)雖可以完成初步之金屬與水分離。但仍然未能盡善。 Referring to the fourth figure, in conjunction with the first to third figures, when the industrial metal residual liquid flows into a metal residual liquid tank (61), it is guided to the metal residual liquid input unit (42). ) to the inside of the casing (1), at this time, due to the hurricane entering by the air blowing unit (41), the metal residual liquid flow can be cooled, and a small amount of metal-containing hot gas continues to rise, via the first passage ( 3A) continuing to rise to the second chamber (32), and the metal in the metal residual liquid sinks due to a large specific gravity, and the metal residual liquid discharge unit (43) is passed through the first passage (3A) Exported to the inside of the metal raffinate tank (61) waiting to continue the separation. At this time, preliminary metal-water separation can be completed in the first chamber (31) and the second chamber (32). But still not doing enough.

少量含金屬之熱氣繼續上揚,藉由該第二通道(3B)逸至該第三容室(33),此時藉由該冷卻液輸入單元(44)之冷液進入,進一步冷卻該少量含金屬之熱氣,使得內部之金屬再因冷卻而隨冷卻液由該第三通道(3C)而由該冷卻液排出單元(46)排出而依序至外部之第一水洗槽(62)、第二水洗槽(63)為後續之淨化處理。該第二水洗槽(63)內之水洗液亦可充作前述之該冷卻液輸入單元(44)之冷液,以循環並節省用水。 A small amount of metal-containing hot gas continues to rise, and the second passage (3B) escapes to the third chamber (33). At this time, the cold liquid of the coolant input unit (44) enters to further cool the small amount. The hot metal of the metal causes the inner metal to be discharged from the third passage (3C) by the coolant discharge unit (46) by cooling, and sequentially to the outer first washing tank (62), the second The washing tank (63) is a subsequent purification treatment. The water washing liquid in the second washing tank (63) can also be used as the cold liquid of the cooling liquid input unit (44) to circulate and save water.

而熱氣藉由該排氣口(45)排出,當然該熱氣可以再經由檢測,符合環保法令要求再排出外界,否則可以再收集處理。然而本新型創作至少可以藉由自然之風量與溫度進行蒸發而初步分離水分與金屬外,更進一步將水分中之殘餘金屬再透過冷卻之進行,形成二度之水洗(冷卻)效果,對於排放之金屬更進一步減量。 The hot air is discharged through the exhaust port (45). Of course, the hot gas can be detected again and discharged to the outside world according to the requirements of the environmental protection law, otherwise it can be collected and processed. However, the novel creation can at least initially separate the moisture and the metal by evaporation of the natural air volume and temperature, and further pass the residual metal in the water through the cooling to form a second degree of water washing (cooling) effect for the discharge. The metal is further reduced.

本新型創作之較佳實施例,該第一容室(31)於該前壁(13)與該後壁(14)間設一過濾板(51),且該金屬殘液輸入單元(42)設置位置之高於該過濾板(51)上方。可以使得該金屬殘液第一度經過過濾,更佳達到分離效果。 In a preferred embodiment of the present invention, the first chamber (31) is provided with a filter plate (51) between the front wall (13) and the rear wall (14), and the metal residual liquid input unit (42) The set position is higher than the filter plate (51). The metal residue can be filtered for the first time to better achieve the separation effect.

該第二容室(32)於該前壁(13)與該後壁(14)間設上下相隔之二過濾板(52A)、(52B),且該金屬殘液排出單元(43)設置位置低於該下方之過濾板(52B)。更可以使得該金屬殘液第二度與第三度經過過濾,更佳達到分離效果。 The second chamber (32) is provided with two filter plates (52A) and (52B) spaced apart from each other between the front wall (13) and the rear wall (14), and the metal residual liquid discharge unit (43) is disposed at a position Lower than the filter plate (52B) below. The metal residue can be filtered for the second degree and the third degree to better achieve the separation effect.

該第四容室(34)於該前壁(13)與該後壁(14)間設一過濾板(53),且該冷卻液排出單元(46)設置位置低於該過濾板(53)。更可以使得該金屬殘液第四度經過過濾,更佳達到分離效果。 The fourth chamber (34) is provided with a filter plate (53) between the front wall (13) and the rear wall (14), and the coolant discharge unit (46) is disposed lower than the filter plate (53). . The metal residue can be filtered for the fourth time to better achieve the separation effect.

其中該第一隔板(21)下方延伸一斜導板(21A),協助該殘餘金屬導至該金屬殘液排出單元(43)。 A diagonal guide plate (21A) extends below the first partition plate (21) to assist the residual metal to be guided to the metal residual liquid discharge unit (43).

其中該第三隔板(23)下方延伸一斜導板(23A),協助分離之金屬導至該冷卻液排出單元(46)。 A diagonal guide plate (23A) extends below the third partition plate (23) to assist the separated metal to be guided to the coolant discharge unit (46).

綜上所述,本新型創作符合可專利之要件,爰依法提出專利申請。舉凡依本新型創作申請專利範圍所作之均等變化,皆屬本案訴求標的之範疇。 In summary, the new creation complies with the patentable requirements, and the patent application is filed according to law. Any change in the scope of patent application for this new type of creation is within the scope of the subject matter of the case.

(1)‧‧‧箱體 (1) ‧‧‧ cabinet

(11)‧‧‧頂壁 (11) ‧‧‧ top wall

(12)‧‧‧底壁 (12) ‧‧‧ bottom wall

(13)‧‧‧前壁 (13) ‧ ‧ front wall

(14)‧‧‧後壁 (14) ‧‧‧Back wall

(15)‧‧‧第一側壁 (15) ‧‧‧First side wall

(16)‧‧‧第二側壁 (16) ‧‧‧second side wall

(21)‧‧‧第一隔板 (21)‧‧‧First partition

(21A)‧‧‧斜導板 (21A)‧‧‧ oblique guide

(22)‧‧‧第二隔板 (22)‧‧‧Second partition

(23)‧‧‧第三隔板 (23)‧‧‧ Third partition

(23A)‧‧‧斜導板 (23A)‧‧‧ oblique guide

(3A)‧‧‧第一通道 (3A)‧‧‧First Passage

(3B)‧‧‧第二通道 (3B)‧‧‧second channel

(3C)‧‧‧第三通道 (3C) ‧ ‧ third channel

(31)‧‧‧第一容室 (31) ‧ ‧ first room

(32)‧‧‧第二容室 (32)‧‧‧Second room

(33)‧‧‧第三容室 (33) ‧ ‧ third room

(34)‧‧‧第四容室 (34) ‧ ‧ fourth room

(41)‧‧‧送風單元 (41)‧‧‧Air supply unit

(42)‧‧‧金屬殘液輸入單元 (42)‧‧‧Metal residual liquid input unit

(43)‧‧‧金屬殘液排出單元 (43)‧‧‧Metal residual liquid discharge unit

(44)‧‧‧冷卻液輸入單元 (44) ‧‧‧Coolant input unit

(45)‧‧‧排氣口 (45) ‧ ‧ vents

(46)‧‧‧冷卻液排出單元 (46)‧‧‧Cool drain unit

(51)‧‧‧過濾板 (51)‧‧‧ Filter plates

(52A)‧‧‧過濾板 (52A)‧‧‧ Filter Plate

(52B)‧‧‧過濾板 (52B)‧‧‧Filter plate

(53)‧‧‧過濾板 (53)‧‧‧ Filter plates

Claims (6)

一種含金屬殘液之淨化裝置,包括一箱體,該箱體包括一頂壁、一底壁、一前壁、一後壁、一第一側壁與一第二側壁相互框圍;該箱體內部於該頂壁與該底壁之間設直立之一第一隔板,該第一隔板與該底壁之間保持一第一通道;且該第一隔板與該第一側壁之間界定一第一容室;與該第一隔板相隔之位置,該箱體內部於該頂壁與該底壁之間設直立之一第二隔板,該第二隔板與該頂壁之間保持一第二通道;且該第二隔板與該第一隔板界定一第二容室;與該第二隔板相隔之位置,該箱體內部於該頂壁與該底壁之間設直立之一第三隔板,該第三隔板與該底壁之間保持一第三通道;且該第三隔板與該第二隔板之間界定一第三容室,且該第三隔板與該第二側壁界定一第四容室;且該箱體設一送風單元與該第一容室相通;該箱體設一金屬殘液輸入單元與該第一容室相通,該箱體設一金屬殘液排出單元與該第二容室相通,該箱體設一冷卻液輸入單元與該第三容室相通,該箱體設一排氣口與該第四容室相通,且該箱體設一冷卻液排出單元與該第四容室相通。 A cleaning device for a metal-containing residual liquid, comprising a box body, the box body comprising a top wall, a bottom wall, a front wall, a rear wall, a first side wall and a second side wall framed together; a first partition is disposed between the top wall and the bottom wall, and a first passage is maintained between the first partition and the bottom wall; and between the first partition and the first side wall Defining a first chamber; at a position spaced apart from the first partition, a second partition is disposed between the top wall and the bottom wall, and the second partition and the top wall Maintaining a second passage therebetween; and the second partition defines a second chamber with the first partition; at a position spaced apart from the second partition, the interior of the box is between the top wall and the bottom wall a third partition is disposed between the third partition and the bottom wall; and a third chamber is defined between the third partition and the second partition, and the third partition The third partition defines a fourth chamber with the second side wall; and the box body is provided with a air supply unit communicating with the first chamber; the box is provided with a metal residual liquid input unit and the first volume In the same manner, the tank is provided with a metal residual liquid discharge unit communicating with the second chamber, the tank is provided with a coolant input unit communicating with the third chamber, the box is provided with an exhaust port and the fourth volume The chamber is in communication, and the tank is provided with a coolant discharge unit communicating with the fourth chamber. 如申請專利範圍第1項所述之含金屬殘液之淨化裝置,其中該第一容室於該前壁與該後壁間設一過濾板,且該金屬殘液輸入單元設置位置之高於該過濾板上方。 The apparatus for purifying a metal-containing residual liquid according to claim 1, wherein the first chamber is provided with a filter plate between the front wall and the rear wall, and the metal residual liquid input unit is disposed at a higher position. Above the filter plate. 如申請專利範圍第1項所述之含金屬殘液之淨化裝置,其中該第二容室於該前壁與該後壁間設上下相隔之二過濾板,且該金屬殘液排出單元設置位置低於該下方之過濾板。 The apparatus for purifying a metal-containing residual liquid according to claim 1, wherein the second chamber is provided with two filter plates spaced apart from each other between the front wall and the rear wall, and the metal residual liquid discharge unit is disposed at a position Lower than the filter plate below. 如申請專利範圍第1項所述之含金屬殘液之淨化裝置,其中該第四容室 於該前壁與該後壁間設一過濾板,且該冷卻液排出單元設置位置低於該過濾板。 The apparatus for purifying a metal-containing residual liquid according to claim 1, wherein the fourth chamber A filter plate is disposed between the front wall and the rear wall, and the coolant discharge unit is disposed lower than the filter plate. 如申請專利範圍第1項所述之含金屬殘液之淨化裝置,其中該第一隔板下方延伸一斜導板。 The apparatus for purifying a metal-containing residual liquid according to claim 1, wherein a skew guide is extended below the first partition. 如申請專利範圍第1項所述之含金屬殘液之淨化裝置,其中該第三隔板下方延伸一斜導板。 The apparatus for purifying a metal-containing residual liquid according to claim 1, wherein a diagonal guide plate extends below the third partition.
TW105203235U 2016-03-09 2016-03-09 Purification device for residual liquid containing metal TWM530178U (en)

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