TWM526751U - Chemical deposition sealing device - Google Patents
Chemical deposition sealing device Download PDFInfo
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- TWM526751U TWM526751U TW105206746U TW105206746U TWM526751U TW M526751 U TWM526751 U TW M526751U TW 105206746 U TW105206746 U TW 105206746U TW 105206746 U TW105206746 U TW 105206746U TW M526751 U TWM526751 U TW M526751U
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- fastening component
- hook
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- 238000007789 sealing Methods 0.000 title claims description 43
- 238000005234 chemical deposition Methods 0.000 title claims description 22
- 239000000758 substrate Substances 0.000 claims description 28
- 230000000694 effects Effects 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000007667 floating Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 238000001311 chemical methods and process Methods 0.000 description 1
- 238000012864 cross contamination Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Clamps And Clips (AREA)
Description
本揭露為一種化學沉積密封裝置,尤指一種雙片同步密封的雙片掛具,結構簡單、製造容易且機構可靠度高之化學沉積密封裝置。 The present disclosure relates to a chemical deposition sealing device, in particular to a two-piece synchronously sealed two-piece hanger, which has a simple structure, is easy to manufacture, and has high mechanism reliability.
化學沉積為3C產業微細化的重要製程設備,以往皆為單槽單片(如,晶圓)的化學沉積方式,近年來隨著產業需求,單槽雙片的化學沉積應用漸趨重要,因具有產能加倍以及化學液使用量小的優勢,已逐漸成為化學沉積主流技術。 Chemical deposition is an important process equipment for the miniaturization of the 3C industry. In the past, it was a chemical deposition method for single-slot single-chip (eg, wafer). In recent years, with the industrial demand, the chemical deposition of single-slot and double-chip has become more and more important. With the advantages of doubled production capacity and small chemical liquid usage, it has gradually become the mainstream technology of chemical deposition.
習知之雙片(如,晶圓)的沉積密封技術仍需二次密封,每次密封必須測漏才能確保密封品質,避免化學液體洩漏至基板(如,晶圓)背面,產生不同化學製程間的化學液交叉汙染以及影響化學沉積的品質與生產穩定性。其中一習知結構的產品需運用氣囊元件充放氣以及旋轉伺服馬達,使具彈性化結構勾板變形,最終產生扣緊力達到晶圓密封功效,但其製造成本顯然過高;另有習知結構必須控制密封所需的扭緊力矩,達到晶圓密封效果,但其基板厚度改變,即會造成起始旋轉位置偏差,增加自動化製程的複雜度。 The conventional two-piece (eg, wafer) deposition sealing technology still requires a secondary seal. Each seal must be leak tested to ensure the quality of the seal, avoiding chemical liquid leakage to the back of the substrate (eg, wafer), resulting in different chemical processes. Chemical liquid cross-contamination and affect the quality and stability of chemical deposition. One of the well-known structures requires the use of airbag components to charge and deflate and rotate the servo motor to deform the elastic structural hook plate, and finally produce the fastening force to achieve the wafer sealing effect, but the manufacturing cost is obviously too high; It is known that the structure must control the tightening torque required for sealing to achieve the wafer sealing effect, but the thickness of the substrate changes, which will cause the initial rotational position deviation and increase the complexity of the automated process.
綜上所述,如何克服習知雙片(如,晶圓)的沉積密封技術之缺點乃為熟知此技術者所竭力苦思之重要課題。 In summary, how to overcome the shortcomings of the conventional deposition and sealing technology of two-piece (eg, wafer) is an important issue that is well-understood by those skilled in the art.
在一實施例中,本揭露提出一種化學沉積密封裝置,其包含:一第一扣緊組件;一第二扣緊組件,與該第一扣緊組件相扣合;一定位裝置,其設置於該第一扣緊組件與該第二扣緊組件之間,該定位裝置包括:一第一承座,用以承載一基板;一第二承座,用以承載另一基板;其中,該第一扣緊組件具有一第一凸緣,該第二扣緊組件具有一第二凸緣,該第一凸緣設有一第一內密封環,該第二凸緣設有一第二內密封環,且於該第二扣緊組件設有一第二外密封環。 In an embodiment, the present disclosure provides a chemical deposition sealing device comprising: a first fastening component; a second fastening component engaged with the first fastening component; and a positioning device disposed on the Between the first fastening component and the second fastening component, the positioning device comprises: a first socket for carrying a substrate; and a second socket for carrying another substrate; wherein the first a fastening component has a first flange, the second fastening component has a second flange, the first flange is provided with a first inner sealing ring, and the second flange is provided with a second inner sealing ring. And the second fastening component is provided with a second outer sealing ring.
10‧‧‧第一扣緊組件 10‧‧‧First fastening component
11‧‧‧第一扣緊板 11‧‧‧First fastening plate
111‧‧‧第一孔洞 111‧‧‧First hole
112‧‧‧第一凸緣 112‧‧‧First flange
113‧‧‧第一內密封環 113‧‧‧First inner seal ring
12‧‧‧第一勾孔板 12‧‧‧ first hook plate
121‧‧‧第一勾孔 121‧‧‧ first hook hole
13‧‧‧活動勾板 13‧‧‧ activity board
131‧‧‧活動勾柱 131‧‧‧ activity hook
132‧‧‧桿體 132‧‧‧ rod body
20‧‧‧第二扣緊組件 20‧‧‧Second fastening component
21‧‧‧第二扣緊板 21‧‧‧Second fastening plate
214‧‧‧第二外密封環 214‧‧‧Second outer seal ring
211‧‧‧第二孔洞 211‧‧‧Second hole
221a‧‧‧寬部 221a‧‧ Wide section
221b‧‧‧窄部 221b‧‧‧narrow
212‧‧‧第二凸緣 212‧‧‧second flange
213‧‧‧第二內密封環 213‧‧‧Second inner seal ring
22‧‧‧第二勾孔板 22‧‧‧Second hook plate
221‧‧‧第二勾孔 221‧‧‧Second hook hole
30‧‧‧定位裝置 30‧‧‧ Positioning device
31‧‧‧第一承座 31‧‧‧First seat
311‧‧‧限位板 311‧‧‧Limited board
32‧‧‧第二承座 32‧‧‧Second seat
33‧‧‧銷體 33‧‧‧ Pin body
331‧‧‧一端 331‧‧‧ one end
332‧‧‧凸緣 332‧‧‧Flange
333‧‧‧另一端 333‧‧‧The other end
34‧‧‧彈性元件 34‧‧‧Flexible components
P1、P2‧‧‧基板 P1, P2‧‧‧ substrate
T‧‧‧槽體 T‧‧‧ trough
S‧‧‧液體 S‧‧‧Liquid
圖1為本揭露之一實施例之組合結構示意圖。 FIG. 1 is a schematic diagram of a combined structure according to an embodiment of the present disclosure.
圖2為圖1實施例之部分分解結構示意圖。 Figure 2 is a partially exploded perspective view of the embodiment of Figure 1.
圖3為圖1之縱向斷面結構示意圖。 Figure 3 is a schematic longitudinal sectional view of Figure 1.
圖4為圖2之縱向斷面結構示意圖。 Figure 4 is a schematic longitudinal sectional view of Figure 2.
圖5為本揭露之定位裝置之前視結構示意圖。 FIG. 5 is a schematic front view of the positioning device of the present disclosure.
圖6為圖5之右側結構示意圖。 Figure 6 is a schematic view of the right side of Figure 5.
圖7為圖5之A-A剖面結構示意圖。 Figure 7 is a schematic cross-sectional view of the A-A of Figure 5;
圖8為圖7之結構受壓時之示意圖。 Figure 8 is a schematic view of the structure of Figure 7 when pressurized.
圖9為本揭露之活動勾板與勾孔相配合之結構示意圖。 FIG. 9 is a schematic structural view of a movable hook plate and a hook hole according to the present disclosure.
圖10為本揭露之扣緊裝置之分解結構示意圖。 FIG. 10 is a schematic exploded view of the fastening device of the present disclosure.
圖11為圖10之第一勾孔板與活動勾板相配合且未勾合之前視結構示意圖。 FIG. 11 is a schematic view showing the structure of the first hook hole plate of FIG. 10 in cooperation with the movable hook plate and not hooked.
圖12為圖11之B-B剖面結構示意圖。 Figure 12 is a schematic cross-sectional view of the line B-B of Figure 11;
圖13為圖12之C部放大結構示意圖。 Figure 13 is a schematic enlarged view of the portion C of Figure 12;
圖14為圖10之第一勾孔板與活動勾板相配合且勾合之前視結構示意圖。 FIG. 14 is a schematic view showing the structure of the first hook hole plate and the movable hook plate of FIG.
圖15為圖14之D-D剖面結構示意圖。 Figure 15 is a schematic cross-sectional view of the D-D of Figure 14.
圖16為圖15之E部放大結構示意圖。 Figure 16 is a schematic enlarged view of the portion E of Figure 15.
圖17為本揭露未勾合時之放大結構示意圖。 FIG. 17 is a schematic enlarged view of the structure when the hook is not hooked.
圖18為本揭露勾合時之放大結構示意圖。 FIG. 18 is a schematic enlarged view of the structure when the hook is closed.
圖19為對應圖17之立體結構示意圖。 19 is a schematic perspective view corresponding to FIG. 17.
圖20為對應圖18之立體結構示意圖。 FIG. 20 is a schematic perspective view corresponding to FIG. 18. FIG.
請參閱圖1至圖4所示,本揭露之一種化學沉積密封裝置,包含一第一扣緊組件10、一第二扣緊組件20以及一定位裝置30。其中該第一扣緊組件10與該第二扣緊組件20相扣合,該定位裝置設置於該第一扣緊組件10與該第二扣緊組件20之間。如圖1所示之密封裝置例如承載有基板(如,晶圓),浸入一槽體T中進行一化學沉積製程,其中,基板(如,晶圓)係全部浸入液體S中以進行化學沉積製程。 Referring to FIG. 1 to FIG. 4 , a chemical deposition sealing device of the present disclosure includes a first fastening component 10 , a second fastening component 20 , and a positioning device 30 . The first fastening component 10 is engaged with the second fastening component 20 , and the positioning device is disposed between the first fastening component 10 and the second fastening component 20 . The sealing device shown in FIG. 1 carries, for example, a substrate (eg, a wafer), and is immersed in a tank T for performing a chemical deposition process, wherein the substrate (eg, a wafer) is entirely immersed in the liquid S for chemical deposition. Process.
請參閱圖4至圖7,該定位裝置30包含一第一承座31、一第二承座32、複數銷體33以及複數彈性元件34。其中,該第一承座31用以承載一基板P1,該第二承座32用以承載另一基板P2,該複數銷體33以及該複數彈性元件34係設置於該第一承座31與該第二承座32之間;在一實施例中,該基板為晶圓。如圖7所示,各該銷體33之軸向的其中一端331之外圍具有凸緣332,於該第 一承座31設有一限位板311,該限位板311與該第一承座31之間具有一距離D,該銷體33設有該凸緣332之該一端331設置於該限位板311與該第一承座31之間,該銷體33相對之另一端333伸出限位板311並固設於該第二承座32。如圖7所示,當該複數彈性元件34呈釋放狀態時,該凸緣332貼靠於該限位板311,如圖8所示,當該複數彈性元件34呈壓縮狀態時,該凸緣332則遠離限位板。在一實施例中,該第一承座31與該第二承座32皆呈圓形。 Referring to FIGS. 4-7 , the positioning device 30 includes a first socket 31 , a second socket 32 , a plurality of pin bodies 33 , and a plurality of elastic members 34 . The first socket 31 is used to carry a substrate P1, and the second socket 32 is used to carry another substrate P2. The plurality of pins 33 and the plurality of elastic members 34 are disposed on the first socket 31. Between the second sockets 32; in one embodiment, the substrate is a wafer. As shown in FIG. 7, the outer end of one end 331 of each axial direction of the pin body 33 has a flange 332. A retaining plate 31 is provided with a limiting plate 311. The limiting plate 311 has a distance D from the first bearing block 31. The pin body 33 is provided with the one end 331 of the flange 332. Between the 311 and the first socket 31 , the opposite end 333 of the pin body 33 protrudes from the limiting plate 311 and is fixed to the second socket 32 . As shown in FIG. 7, when the plurality of elastic members 34 are in a released state, the flange 332 abuts against the limiting plate 311, as shown in FIG. 8, when the plurality of elastic members 34 are in a compressed state, the flange 332 is away from the limit plate. In an embodiment, the first socket 31 and the second socket 32 are both circular.
請續參閱圖2~圖4、圖9~18;如圖4所示,該第一扣緊組件10包含一第一扣緊板11、一第一勾孔板12以及一活動勾板13。其中,該第一扣緊板11具有一第一孔洞111,該第一孔洞111之內緣具有一第一凸緣112;如圖10所示,該第一勾孔板12設置於該第一扣緊板11之一面,該第一勾孔板12具有複數第一勾孔121;該活動勾板13設置於該第一勾孔板12相對於設有該第一勾孔板12之一面,該活動勾板13具有複數活動勾柱131,該活動勾板13一側設有一桿體132。 Please refer to FIG. 2 to FIG. 4 and FIG. 9 to FIG. 18 . As shown in FIG. 4 , the first fastening component 10 includes a first fastening plate 11 , a first hook plate 12 and a movable hook plate 13 . The first fastening plate 11 has a first hole 111. The inner edge of the first hole 111 has a first flange 112. As shown in FIG. 10, the first hook plate 12 is disposed on the first hole. One side of the fastening plate 11 has a plurality of first hook holes 121; the movable hook plate 13 is disposed on the first hook plate 12 opposite to the one surface of the first hook plate 12 The movable hooking plate 13 has a plurality of movable hooks 131, and a side of the movable hooking plate 13 is provided with a rod 132.
如圖4所示,該第二扣緊組件20包含一第二扣緊板21以及一第二勾孔板22。其中,該第二扣緊板21對應於該第一孔洞111設有一第二孔洞211,該第二孔洞211之內緣具有一第二凸緣212;如圖10所示,該第二勾孔板22設置於該第二扣緊板21之一面,該第二勾孔板22具有複數第二勾孔221。又如圖9所示,第二勾孔221具有寬部221a與窄部221b。 As shown in FIG. 4 , the second fastening component 20 includes a second fastening plate 21 and a second hook plate 22 . The second fastening hole 21 is provided with a second hole 211 corresponding to the first hole 111, and the second edge 212 of the second hole 211 has a second flange 212; as shown in FIG. The plate 22 is disposed on one surface of the second fastening plate 21 , and the second hook plate 22 has a plurality of second hook holes 221 . As shown in FIG. 9, the second hook hole 221 has a wide portion 221a and a narrow portion 221b.
如圖1與圖4所示,該定位裝置30被夾設於該第一扣緊組件10的第一凸緣112與該第二扣緊組件20的第二凸緣212之間,該 第一承座31與該第二承座32承載之基板P1與P2(如圖17與圖18)係分別外露於該第一孔洞111與該第二孔洞211。其中,於該第一凸緣112設有一第一內密封環113,於該第二凸緣212設有一第二內密封環213,於該第二扣緊板21設有一第二外密封環214。 As shown in FIG. 1 and FIG. 4 , the positioning device 30 is sandwiched between the first flange 112 of the first fastening component 10 and the second flange 212 of the second fastening component 20 . The first socket 31 and the substrates P1 and P2 (such as FIG. 17 and FIG. 18) carried by the second socket 32 are exposed to the first hole 111 and the second hole 211, respectively. The first flange 112 is provided with a first inner seal ring 113, the second flange 212 is provided with a second inner seal ring 213, and the second fastening plate 21 is provided with a second outer seal ring 214. .
請參見圖9,在一實施例中,本揭露之一種化學沉積密封裝置,第一扣緊組件10設置有第一內密封環113以及複數活動勾柱131;第二扣緊組件20設置有第二內密封環213、第二外密封環214,以及複數第二勾孔221;在此實施例中,透過複數活動勾柱131以及複數第二勾孔221的組裝扣緊來達成雙片基板的密封功能。 Referring to FIG. 9 , in an embodiment, in the chemical deposition sealing device of the present disclosure, the first fastening component 10 is provided with a first inner sealing ring 113 and a plurality of movable hooks 131 ; the second fastening component 20 is provided with a first a second inner sealing ring 213, a second outer sealing ring 214, and a plurality of second hook holes 221; in this embodiment, the assembly of the plurality of movable hooks 131 and the plurality of second hook holes 221 is fastened to achieve a two-piece substrate. Sealing function.
請參見圖7與圖8,在一實施例中,本揭露之一種化學沉積密封裝置,當該複數彈性元件34呈釋放狀態時,該凸緣332貼靠於該限位板311,此時稱為定位狀態、用於將基板(如,晶圓)載入或載出;又如圖8所示,當該複數彈性元件34呈壓縮狀態時,該凸緣332則遠離限位板311,此時雙基板呈現浮動狀態,透過此多方向自由度設計,可達成基板方位與姿態的調整,進而確保兩基板均勻貼合於第一內密封環113及第二內密封環213。 Referring to FIG. 7 and FIG. 8 , in an embodiment, a chemical deposition sealing device of the present disclosure, when the plurality of elastic members 34 are in a released state, the flange 332 abuts against the limiting plate 311. For positioning, for loading or unloading a substrate (eg, a wafer); as shown in FIG. 8, when the plurality of elastic members 34 are in a compressed state, the flange 332 is away from the limiting plate 311. When the dual substrate is in a floating state, the multi-directional degree of freedom design can adjust the orientation and posture of the substrate, thereby ensuring that the two substrates are evenly bonded to the first inner seal ring 113 and the second inner seal ring 213.
請參見圖17與圖18,在一實施例中,本揭露之一種化學沉積密封裝置,將定位裝置30置於第一扣緊組件10以及第二扣緊組件20之間,透過施以外壓力,例如在第一扣緊組件10之一測施以外壓力(如,氣壓等),可使定位裝置30處於浮動狀態(如圖8所示),此時兩基板P1與P2分別可均勻密合於第一內密封環113與第二內密封環213;且透過此外壓力,可使第二扣緊組件20之第二外密封環214與第一扣緊組件10密合,令活動勾柱131進入第 二勾孔211的寬部211a(如圖19所示)。接續,以外力推動桿體132(如圖15所示),使活動勾柱131進入第二勾孔211的窄部211b(如圖20所示)。由於活動勾柱131一端係接觸於第一扣緊組件10因此產生旋轉,可使活動勾柱131與第二勾孔211貼合(如圖18所示)。接續則除去外壓力,則第二外密封環214產生向外之扣緊力,確保第一扣緊組件10與第二扣緊組件20的密合。在此實施例中,當第一扣緊組件10、第二扣緊組件10以及定位裝置30完成密合時,兩基板P1與P2係透過第一內密封環133與第二內密封環213達成密封效果,第一扣緊組件10與第二扣緊組件10則透過第二外密封環214達成密合/密封效果。由此可知,本揭露僅透過一次壓合與扣緊動作則完成雙基板之密封。 Referring to FIG. 17 and FIG. 18, in an embodiment, a chemical deposition sealing device of the present disclosure places the positioning device 30 between the first fastening component 10 and the second fastening component 20, and transmits pressure. For example, in the pressure (for example, air pressure, etc.) of one of the first fastening components 10, the positioning device 30 can be in a floating state (as shown in FIG. 8), and the two substrates P1 and P2 can be uniformly adhered to the two substrates. The first inner seal ring 113 and the second inner seal ring 213; and through the additional pressure, the second outer seal ring 214 of the second fastening component 20 can be brought into close contact with the first fastening component 10, so that the movable hook column 131 enters First The wide portion 211a of the second hook hole 211 (shown in FIG. 19). Subsequently, the external force pushes the rod 132 (as shown in FIG. 15), so that the movable hook 131 enters the narrow portion 211b of the second hook hole 211 (as shown in FIG. 20). Since one end of the movable hook 131 is in contact with the first fastening component 10 and thus rotates, the movable hook 131 can be attached to the second hook hole 211 (as shown in FIG. 18). In addition, the external pressure is removed, and the second outer seal ring 214 generates an outward fastening force to ensure the tightness of the first fastening component 10 and the second fastening component 20. In this embodiment, when the first fastening component 10, the second fastening component 10 and the positioning device 30 complete the sealing, the two substrates P1 and P2 are passed through the first inner sealing ring 133 and the second inner sealing ring 213. The sealing effect, the first fastening component 10 and the second fastening component 10 achieve a sealing/sealing effect through the second outer sealing ring 214. It can be seen from the above that the present disclosure completes the sealing of the double substrate only by one pressing and fastening action.
綜上所述,本揭露所提供之化學沉積密封裝置,首創雙基板同步密封的雙基板掛具,僅須一次壓合與扣緊動作則可完成雙基板之密封,僅須一次測漏即可確認密封品質,同時,透過定位裝置的承座、銷體與彈性元件設計,因此可避免基板密封過程發生破片。綜上所述,本揭露所提供之化學沉積密封裝置,具有同步雙基板密封功效,相較國內外廠商,具有結構簡單、製造容易以及機構可靠度高等優點。 In summary, the chemical deposition sealing device provided by the present disclosure, the first dual-substrate hanger with synchronous sealing of two substrates, can complete the sealing of the double substrate only by one pressing and fastening action, and only needs one leak test. The sealing quality is confirmed, and at the same time, the bearing, the pin body and the elastic member of the positioning device are designed, so that the chipping in the substrate sealing process can be avoided. In summary, the chemical deposition sealing device provided by the disclosure has the advantages of synchronous double-substrate sealing, and has the advantages of simple structure, easy manufacture and high mechanism reliability compared with domestic and foreign manufacturers.
惟以上所述之具體實施例,僅係用於解釋本揭露之特點及功效,而非用於限定本揭露之可實施範疇,於未脫離本揭露上揭之精神與技術範疇下,任何運用本揭露所揭示內容而完成之等效改變及修飾,均仍應為下述之申請專利範圍所涵蓋。 However, the specific embodiments described above are merely used to explain the features and functions of the present disclosure, and are not intended to limit the scope of the disclosure, and may be used without departing from the spirit and scope of the disclosure. Equivalent changes and modifications made to the disclosure are still covered by the scope of the following claims.
10‧‧‧第一扣緊組件 10‧‧‧First fastening component
20‧‧‧第二扣緊組件 20‧‧‧Second fastening component
30‧‧‧定位裝置 30‧‧‧ Positioning device
T‧‧‧槽體 T‧‧‧ trough
S‧‧‧液體 S‧‧‧Liquid
Claims (6)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW105206746U TWM526751U (en) | 2016-05-10 | 2016-05-10 | Chemical deposition sealing device |
| CN201620444951.2U CN205954107U (en) | 2016-05-10 | 2016-05-16 | Chemical deposition sealing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW105206746U TWM526751U (en) | 2016-05-10 | 2016-05-10 | Chemical deposition sealing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWM526751U true TWM526751U (en) | 2016-08-01 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW105206746U TWM526751U (en) | 2016-05-10 | 2016-05-10 | Chemical deposition sealing device |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN205954107U (en) |
| TW (1) | TWM526751U (en) |
-
2016
- 2016-05-10 TW TW105206746U patent/TWM526751U/en unknown
- 2016-05-16 CN CN201620444951.2U patent/CN205954107U/en active Active
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| CN205954107U (en) | 2017-02-15 |
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