TWM477041U - Heater assembly - Google Patents

Heater assembly

Info

Publication number
TWM477041U
TWM477041U TW102220470U TW102220470U TWM477041U TW M477041 U TWM477041 U TW M477041U TW 102220470 U TW102220470 U TW 102220470U TW 102220470 U TW102220470 U TW 102220470U TW M477041 U TWM477041 U TW M477041U
Authority
TW
Taiwan
Prior art keywords
heating element
processing apparatus
filaments
heating
filament
Prior art date
Application number
TW102220470U
Other languages
Chinese (zh)
Inventor
Alexander I Gurary
Vadim Boguslavskiy
Original Assignee
Veeco Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Veeco Instruments Inc filed Critical Veeco Instruments Inc
Priority to TW102220470U priority Critical patent/TWM477041U/en
Publication of TWM477041U publication Critical patent/TWM477041U/en

Links

Landscapes

  • Resistance Heating (AREA)

Abstract

A wafer processing apparatus and heating assembly for use in such processing apparatus. In particular, a heating element having a plurality of heating element filaments and mechanical support of the heating element filaments in a wafer processing apparatus where the heating element is mounted within the processing apparatus for heating wafers mounted on a wafer carrier and allows for unrestricted thermal expansion of the radiant heating elements. Heating element is substantially planar. Heating element can be dimensioned to be approximately 675 mm in diameter, ±5%. Filaments are curved and lie substantially in one plane. The structure of each filament is configured so that filaments follow the structure of its adjacent filament but do not make contact with its adjacent filament.
TW102220470U 2013-11-04 2013-11-04 Heater assembly TWM477041U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW102220470U TWM477041U (en) 2013-11-04 2013-11-04 Heater assembly

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW102220470U TWM477041U (en) 2013-11-04 2013-11-04 Heater assembly

Publications (1)

Publication Number Publication Date
TWM477041U true TWM477041U (en) 2014-04-21

Family

ID=60625119

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102220470U TWM477041U (en) 2013-11-04 2013-11-04 Heater assembly

Country Status (1)

Country Link
TW (1) TWM477041U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108728828A (en) * 2017-04-20 2018-11-02 中微半导体设备(上海)有限公司 CVD equipment and its temprature control method and heater
US11804388B2 (en) 2018-09-11 2023-10-31 Asm Ip Holding B.V. Substrate processing apparatus and method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108728828A (en) * 2017-04-20 2018-11-02 中微半导体设备(上海)有限公司 CVD equipment and its temprature control method and heater
US11804388B2 (en) 2018-09-11 2023-10-31 Asm Ip Holding B.V. Substrate processing apparatus and method
TWI821379B (en) * 2018-09-11 2023-11-11 荷蘭商Asm Ip私人控股有限公司 Substrate processing apparatus and method

Similar Documents

Publication Publication Date Title
MX350960B (en) Pedestal construction with low coefficient of thermal expansion top.
GB2533063A (en) Structures and methods with reduced sensitivity to surface charge
EP2973661A4 (en) Wafer carrier having provisions for improving heating uniformity in chemical vapor deposition systems
TW201614758A (en) Top lamp module for carousel deposition chamber
MY178363A (en) An aerosol-generating system having a fluid-permeable heater assembly
TW201613013A (en) Heater power feeding mechanism
TW201614760A (en) Heater apparatus for substrate processing and liquid processing arraratus for substrate comprising the same
EP3338299A4 (en) Process-specific wafer carrier correction to improve thermal uniformity in chemical vapor deposition systems and processes
EP3530618A4 (en) Graphite/graphene complex material, heat-collecting body, heat-transfer body, thermal radiation body and thermal radiation system
BR112017012070B8 (en) SOLAR COLLECTOR
GB201103052D0 (en) Superconducting electromagnets comprising coils bonded to a support structure
IN2014DN09708A (en)
DK3449511T3 (en) Luminous solar concentrator with large surface based on semiconductor nanocrystals with indirect band gap
TWM477041U (en) Heater assembly
PL3874196T3 (en) Led filament arrangement with heat sink structure
MX2018004839A (en) Hair care device.
MX2018005760A (en) Electric resistance radiant furnace with mesh, screen, or honeycomb between panel emitters.
MA40285A (en) Integrated, three-dimensional cell configuration, integrated cooling array and cell-based integrated circuit
MX2020002173A (en) High temperature monofilament articles.
TW201613737A (en) Light irradiation device
MX2015010534A (en) Lighting device with improved thermal properties.
MD4280C1 (en) pInP-nCdS structure growth method
TWD179913S (en) Heater for semiconductor heat treatment
IT201700023496A1 (en) Heat transfer fluids with high thermal conductivity.
JP2014059155A5 (en)

Legal Events

Date Code Title Description
MM4K Annulment or lapse of a utility model due to non-payment of fees