M410128 五、新型說明： 【新型所屬之技術領域】 本創作係有關一種流體控制閥，尤旨一種用於半導體產 業之設備中，防止大氣壓力因接續的真空泵突然故障而逆流 至其空間中，得以阻斷或開啟管路兩端連通狀態之極氣隔離 閥。 -【先前技術】 * 現代許多半導體高精密度產品有多道的製程，其中加工 步驟需使用程度不一的真空才能完成；而製造真空的方法主 要是藉由真空泵將密閉空間中的空氣抽出，使該空間保持在 負壓狀態，亦即達到某種程度的真空。 歷來，閘閥多設於真空處理，用以將該真空處理排氣成 真空狀態的真空泵，此種閘閥稱為真空閘閥。近年來，真空 閘閥對於用以構成液晶、半導體製造裝置等領域中，其真空 -系統係為重要裝置，亦占有重要地位。 ® 真空閘閥在提高真空處理室之真空度時，係令閥為開閥 狀態，並藉由驅動真空泵以提高真空處理室内的真空度，俾 做成高真空狀態。又，藉由令閥為閉閥狀態而讓真空處理室 内為低真空（低壓）或大氣壓，可取出於真空處理室内進行 處理之工作件，或者是去除真空處理室内的反應生成物。進 而，可保護真空泵不受低壓或大氣壓影響，防止真空泵之劣 化及受損。 3 空“二將供有多數之真空閉閾，雖然可以利用真 當讀真空戈：方式讓該空間保持在負壓狀雜，但是 在大氣或停止運轉時’該負屢空間外部^氣即會 會造成辕空而逆向侵入原有的負壓空間中，如此不但 復，定心品不同程度的危害，並重新使該空間恢 及真、作：:成r靡相當長的運作時間，以 【新型内容】 主要ί::加流體在閥座體及端蓋内流通之流動效率'為其 為達上揭目的，本創作之集氣隔離閱， 閥座體、複數柱撐件、一閥片及一端蓋；其中， 闕座體對應該端蓋並以螺鎖，而該閥座1 孔與主:管:連接，該端蓋具有有第二心^ St： 腔室内複狀位座孔分別銷插複數柱撑 :差:==梯;該=:設有階梯部及 :r™㈣，得，或=== 本創作另一目的在於長期作動損耗 — 低成本達到經濟效益，閥片係框限於、^件更換容易且降 當閥片長時間往復作動導致柱撐件招差部之限位空間内， 時，由於柱撐件係銷 M410128 •插定位座孔，因此只需更換該損耗之柱撐件。 此外，本創作再一目的可達到極氣化，其係藉由第一、 第二氣孔之孔壁朝外漸擴形成一斜度，為一出口及入口以提 供流體流動通過閥座體及端蓋時可達集氣化。 【實施方式】 . 本創作之特點，可參閱本案圖式及實施例之詳細說明而 . 獲得清楚地瞭解。 • 如第一圖所示，本創作之集氣隔離閥其至少包含有： 一閥座體10，其係由第一氣孔11及一腔室12所組成， 而該腔室12内設有複數呈環型排列之定位座孔13 ; 複數柱撐件20，其係設於腔室12内，而該柱撐件20 — 端銷設於該定位座孔13,另端設有階梯部21及具有限位高 度之斷差部22 ; 一閥片30，其係浮設該階梯部21，並由斷差部22框限 其往復作動空間； φ 一端蓋40，其係對應該閥座體10並螺鎖以組設，且該 :端蓋40設有第二氣孔41。 據以，本創作如第二圖至第五圖所示實際實施，其係運 用於半導體產業之設備中，防止大氣壓力因接續的真空泵突 然故障而逆流至其空間中，本創作係由閥座體10對應端蓋 40予以螺鎖，而閥座體10具有一腔室12及第一氣孔11與 一管路密封接合，另端蓋40具有有第二氣孔41係與另一管 路密封接合，主要藉由腔室12内複數定位座孔13分別銷插 複數柱撐件20，並於腔室12内呈環型排列，且閥片30係浮 5 M410128 設部21 ’並由斷差部22設有限位高度以框限間片3〇 往復作動空間，得㈣斷朗啟管路 生逆j力時閥片·30會單向關閉，即不會擴及管路;；隔離閥 止巧染、。、並且’整體㈣結構零件設計簡化， 付[飢體阻力減小，進而增加流體在閥座 40内流通之流動效率。 汉細益 二=片3°長時間往復作動導致柱樓件損耗時，由 於枉按件20係銷插於定位座孔13，因而只需汰換:由 ^撐件20’俾達到快速㈣拆裝零件而節省成本具 此外，如第六圖所不，該閥座體1〇與端蓋4〇間 設有第一墊圈50,而該端蓋4〇與閥片3〇間設有第二〜步 可使其結合緊閉而防止流體逸漏。並且，第一、第二氣圈6〇 41之孔壁朝外漸擴形成一斜度，使該閥座體1〇與端^蓋11、 出口及入口 ’提供流體流動通過閥座體1〇及端 40為 達快速集氣。 Μ時可 兩另外，該斷差部22可設有不同高度，可因應真空 =，而更換不同規格高度斷差部之_件2{)，以^J同 片30往復作動具有不同限位高度空間的選換。 限間 =上所述，本創作提供另—較佳可行之極氣隔 一 ‘太名呈新型專利之申請;惟，以上之實施說明及圖式所 鱼=作較佳實施例者，並非以此揭限本創作，是以所：’ 二1】作之構造、裝置、特徵等近似、雷同者，均應:凡 作之創設目的及申請專利範圍之内。 、屬本創 M410128 【圖式簡單說明】 第一圖係為本創作之讀分解 第二圖係為本創作之組裝。 第三圖係為本創作之組裝結構圖構圖。 第四圖係為本創作之流體作動閥片結構圖。 第五圖係為本創作之另一流體作動閥片結構圖 第六圖係為本創作之另一立體分解結構圖。 籲【主要元件符號說明】 閥座體10 第一氣孔11 腔室12 定位座孔13 柱撐件20 階梯部21 , 斷差部22 ® 閥片30 端蓋40 第二氣孔41 第一墊圈50 第二墊圈60M410128 V. New Description: [New Technology Field] This creation is about a fluid control valve, especially for equipment used in the semiconductor industry to prevent atmospheric pressure from flowing back into its space due to sudden failure of the connected vacuum pump. A gas isolation valve that blocks or opens the connected ends of the pipeline. - [Prior Art] * Many modern semiconductor high-precision products have multiple processes, in which the processing steps need to be completed with varying degrees of vacuum; the vacuum is mainly used to evacuate the air in the confined space by a vacuum pump. The space is maintained in a negative pressure state, i.e., a certain degree of vacuum is achieved. Historically, gate valves have been placed in a vacuum process to evacuate the vacuum process to a vacuum pump. This gate valve is called a vacuum gate valve. In recent years, vacuum gate valves have also played an important role in the vacuum-system system in the fields of liquid crystal, semiconductor manufacturing equipment, and the like. ® Vacuum gate valve is used to open the valve when the vacuum degree of the vacuum processing chamber is increased. By driving the vacuum pump to increase the vacuum in the vacuum processing chamber, the vacuum valve is made into a high vacuum state. Further, by setting the valve to a closed state and allowing the vacuum processing chamber to have a low vacuum (low pressure) or atmospheric pressure, the workpiece processed in the vacuum processing chamber can be taken out, or the reaction product in the vacuum processing chamber can be removed. In addition, the vacuum pump can be protected from low pressure or atmospheric pressure to prevent deterioration and damage of the vacuum pump. 3 empty "two will be provided with a majority of vacuum closed threshold, although you can use the true reading vacuum: the way to keep the space in the negative pressure, but in the atmosphere or stop running, the negative space outside the gas will be It will cause hollowing out and reversely invade the original negative pressure space, so that it will not only reinforce, but also reinforce the harm of the different degrees, and re-enable the space to be true and true: The new content] The main ί:: The flow efficiency of the fluid in the valve seat body and the end cover is the purpose of its purpose. The gas collection of this creation is isolated, the valve seat body, the plurality of column stays, and the valve piece. And an end cover; wherein, the squat body corresponds to the end cover and is screwed, and the valve seat 1 is connected with the main: tube: the end cover has a second core: St: the cavity in the cavity Pin insertion complex column support: difference: == ladder; the =: with a step and: rTM (four), get, or === Another purpose of this creation is long-term operation loss - low cost to achieve economic benefits, valve system The frame is limited, and the replacement of the parts is easy and the valve piece is reciprocated for a long time, resulting in the restriction of the pillar support. Inside, at the time, because the pillar support pin M410128 • inserts the positioning hole, it is only necessary to replace the loss of the pillar support. In addition, this creation can achieve the ultimate gasification by the first, second The hole wall of the air hole is gradually expanded outward to form a slope, which is an outlet and an inlet to provide fluid flow through the valve seat body and the end cover to collect gas. [Embodiment] The characteristics of the creation can be referred to the drawings and The detailed description of the embodiment is clearly understood. • As shown in the first figure, the gas collecting isolation valve of the present invention includes at least: a valve seat body 10 which is composed of a first air hole 11 and a chamber 12 The chamber 12 is provided with a plurality of positioning holes 13 arranged in a ring shape; a plurality of column stays 20 are disposed in the chamber 12, and the column stays 20 are provided at the positioning The seat hole 13 is provided with a step portion 21 and a step portion 22 having a limit height at the other end; a valve piece 30 which floats the step portion 21, and the reciprocating operation space is framed by the step portion 22; An end cap 40 corresponding to the valve seat body 10 and screwed to be assembled, and the end cap 40 is provided with a second air hole 41 According to the above, the creation is actually implemented as shown in the second to fifth figures, which are used in the equipment of the semiconductor industry to prevent the atmospheric pressure from flowing back to the space due to the sudden failure of the connected vacuum pump. The seat body 10 is screwed corresponding to the end cover 40, and the valve seat body 10 has a chamber 12 and the first air hole 11 is sealingly engaged with a pipeline, and the other end cover 40 has a second air hole 41 and is sealed with another pipeline. The joints are mainly inserted into the plurality of column stays 20 by the plurality of positioning holes 13 in the chamber 12, and are arranged in a ring shape in the chamber 12, and the valve piece 30 is floated 5 M410128 and the portion 21' is The portion 22 is provided with a limit height to frame the reciprocating movement space of the inter-slice piece 3, and the valve piece 30 will be closed in one direction when the pipe is reversed, that is, the pipe will not be expanded; Skillfully dyed. And the design of the overall (four) structural parts is simplified, and the [hunting resistance is reduced, thereby increasing the flow efficiency of the fluid flowing in the valve seat 40. Han Xiyi 2 = piece 3 ° long time reciprocating action causes the loss of the column, because the shackle 20 is inserted into the positioning hole 13 and thus only needs to be replaced: by the struts 20' 俾 fast (four) In addition, as shown in the sixth figure, the first gasket 50 is disposed between the valve seat body 1 and the end cover 4, and the second cover 50 is disposed between the end cover 4 and the valve plate 3 The ~ step allows it to be tightly closed to prevent fluid leakage. Moreover, the wall of the first and second air rings 6〇41 gradually expands outward to form a slope, so that the valve seat body 1〇 and the end cover 11, the outlet and the inlet “provide fluid flow through the valve seat body 1 and the end. 40 is a fast gas gathering. In the case of Μ, two different heights can be set, and the slab 2{) of the different height deviation parts can be replaced according to the vacuum=, and the same piece 30 can be reciprocated with different limit heights. Space selection. Limits = As mentioned above, this creation provides another application for the best-practice and extremely versatile 'Tai Ming's new patents; however, the above implementation instructions and drawings for the preferred embodiment are not The limitation of this creation is that the structure, device, characteristics, etc., which are similar to those of the '2', should be: the purpose of creation and the scope of patent application. It belongs to the original M410128 [Simple description of the diagram] The first picture is the decomposition of the creation of the creation. The second picture is the assembly of the creation. The third picture is the composition diagram of the assembly structure of the creation. The fourth picture is the structural diagram of the fluid actuating valve of the creation. The fifth figure is the structural diagram of another fluid actuating valve for the creation. The sixth figure is another three-dimensional exploded structure of the creation. [Main component symbol description] Seat body 10 First air hole 11 Chamber 12 Positioning hole 13 Column stay 20 Step 21, Breaking part 22 ® Valve 30 End cover 40 Second air hole 41 First washer 50 Two washers 60