M409519 [0002]M409519 [0002]
五、新型說明： 【新型所屬之技術領域】 [0001] 本創作係關於一種光罩盒之定位結構，特別是指一 種光罩盒之上盍的晶圓片定位元件’以點接觸_晶圓 片表面，藉以減少接觸之磨耗，避免產生粉塵之結構。 【先前技術】 按，一般習用之光罩盒之定位結構，請參閱第1 ' 2圖 所示’其係包括有：一底座11及一上蓋12 ;其中，該底 座π上設有一供安裝晶圓月13之安裝座m ;該上蓋12V. New Description: [New Technology Field] [0001] This creation is about a positioning structure of a photomask box, especially a wafer positioning element on a mask box. The surface of the sheet is used to reduce the wear of the contact and avoid the structure of dust. [Prior Art] According to the positioning structure of the conventional reticle box, please refer to the figure 1 '2' which includes: a base 11 and an upper cover 12; wherein the base π is provided with a mounting crystal The seat of the moon 13; the upper cover 12
内壁選定位置上設有至少一個定位元件14，該等定 件u設有-彈性本则，設有一扁 平之译性接觸端〗42,用座1UU 一晶圓片13表面。 使用時，將該晶圓片13置放於該底座〗丨之安裴座m 上’再將該上蓋12蓋住該元件14之 彈性接觸端Ml接觸及壓住巧安^座料上之晶圓片丨3上 表面，藉以垂直限位該晶B 運送時產生上、 下跳動。 然而，該習用之光罩盒之定位結構雖可垂直限位該晶 圓片13避免運送時產生上、下跳動，但是其係以扁平之 彈性接觸端141接觸及壓住該晶圓片13表面，由於扁平接 觸端141之接觸為線接觸，與該晶圓片a之接觸面積大， 運送時容易增加磨耗，產生粉塵（微粒塵屑），而影響 該晶圓片13之光照敍刻電路的精準度。 由此可見，上述習用物品仍有諸多缺失，實非一良善之At least one positioning element 14 is provided at a selected position on the inner wall, and the element u is provided with an elastic state, and a flat translational contact end 42 is provided, which is used to seat the surface of the wafer 13 with a 1UU. In use, the wafer 13 is placed on the ampere m of the pedestal, and the upper cover 12 is covered by the elastic contact end M1 of the component 14 to contact and press the crystal on the slab. The upper surface of the wafer 丨3, by which the crystal B is transported with vertical and vertical bounces. However, the positioning structure of the conventional photomask box can vertically limit the wafer 13 to avoid upper and lower jumps during transportation, but it contacts and presses the surface of the wafer 13 with a flat elastic contact end 141. Since the contact of the flat contact end 141 is a line contact, the contact area with the wafer a is large, and the abrasion is easily increased during transportation, and dust (particle dust) is generated, which affects the illumination characterization circuit of the wafer 13. Precision. It can be seen that there are still many shortcomings in the above-mentioned items, which is not a good one.
表單編號A010I 第3頁 M409519 設計者，而亟待加以改良。 【新型内容】 [0003] 鑑於上述習用光罩盒之定位結構所衍生的各項缺點 ，本案創作人乃亟思加以改良創新，並經多年苦心孤詣 潛心研究後，終於成功研發完成本件一種「光罩盒之定 位結構」。 本創作之一目的，在於提供一種光罩盒之定位結構 ，係一光罩盒之上蓋的晶圓片定位元件，以點接觸一晶 圓片表面，而能減少與該晶圓片接觸之磨耗。 本創作之另一目的，在於提供一種光罩盒之定位結 構，係一光罩盒之上蓋的晶圓片定位今件，可減少與一 ,* '.t . ^ ' , 晶圓片接觸之磨耗，避免產k磨耗之粉塵.，.而不影響該 "二 :¾ 二 +;. ' 晶圓片之光照蝕刻電路的精準度。 可達成上述新型目的之光罩盒之定位結構，包括有 :一底座及一上蓋；其中，該底座上設有一供安裝晶圓 ? / ； < > \< - ° ' V · 片之安裝座；而該上蓋内壁選延'位置上設有至少一個定 .... ' 位元件，該等定位元件設有一彈性本體，該彈性本體末 端設有一彈性之接觸尖端，用以接觸及壓住該安裝座上 之一晶圓片表面；使用時，藉由該等定位元件之接觸尖 端與該晶圓片表面之點接觸，使能減少與該晶圓片接觸 之磨耗，避免產生磨耗之粉塵，而不影響該晶圓片之光 照蝕刻電路的精準度。 請參閱以下有關本創作一較佳實施例之詳細說明及 其附圖，將可進一步瞭解本創作之技術内容及其目的功 效： 第4頁 表單編號A0101 M409519 【實施方式】 [0004] 本創作所提供之一種「光罩盒之定位結構」，請參 閱第3'4圖所示，主要包括有：一底座5及一上蓋6。 其中，該底座5上設有一供安裝晶圓片之安裝座51 該上蓋6内壁選定位置上設有至少一個定位元件61 ，該等定位元件61設有一彈性本體62，該彈性本體62末 端設有一具彈性之接觸尖端621，用以接觸及壓住該安裝 座51上之一晶圓片7表面。Form No. A010I Page 3 M409519 Designer, and needs to be improved. [New content] [0003] In view of the shortcomings derived from the positioning structure of the conventional photomask box, the creator of this case was improved and innovated, and after years of painstaking research, he finally successfully developed a "mask". The positioning structure of the box." One of the purposes of the present invention is to provide a reticle housing positioning structure, which is a wafer locating element on a cover of a reticle to contact a wafer surface to reduce the wear of the wafer. . Another object of the present invention is to provide a locating structure of a reticle, which is a wafer positioned on a cover of a reticle, which can be reduced to contact with a wafer, *'.t. ^ ' Wear, avoid the dust that produces k wear. Without affecting the accuracy of the light etching circuit of the wafer. The positioning structure of the photomask box capable of achieving the above novel object comprises: a base and an upper cover; wherein the base is provided with a mounting wafer? /; <>\< - ° 'V · piece a mounting seat; and the upper wall of the upper cover is provided with at least one fixed position. The positioning elements are provided with an elastic body, and the elastic body end is provided with an elastic contact tip for contact and pressing. The surface of the wafer on the mounting seat is used. When the contact tip of the positioning component is in contact with the surface of the wafer, the wear of the contact with the wafer can be reduced to avoid wear. Dust without affecting the accuracy of the light etch circuit of the wafer. Please refer to the following detailed description of a preferred embodiment of the present invention and its accompanying drawings, which will further understand the technical contents of the present invention and its functions and effects: Page 4 Form No. A0101 M409519 [Embodiment] [0004] The present invention A "positioning structure of the mask case" is provided, as shown in FIG. 3'4, which mainly includes a base 5 and an upper cover 6. The base 5 is provided with a mounting base 51 for mounting the wafer. The inner cover of the upper cover 6 is provided with at least one positioning component 61. The positioning component 61 is provided with an elastic body 62. A resilient contact tip 621 for contacting and pressing the surface of one of the wafers 7 on the mount 51.
藉上述構件之組成，請參閱第4圖所示，藉由該等 定位元件61之接觸尖端62之點接觸， 使能減少與該晶圓片7接觸# 產p磨耗之粉塵 (微粒塵屑），而不影響後照蝕刻電路 的精準度。By the composition of the above-mentioned members, as shown in FIG. 4, by the point contact of the contact tips 62 of the positioning elements 61, it is possible to reduce the dust (particle dust) which is in contact with the wafer 7. Without affecting the accuracy of the back-illuminated circuit.
再者，使用時，係將該晶圓片7置放於該底座5之安 裝座51上，再將該上蓋6蓋丨住該：灰痤:5丨\〗權k等定位元件 61之接觸尖端621接觸及#被上之晶圓片7表 面，藉以垂直限位該晶圓片運送時產生上、下跳 動。 請參閱第3、4圖所示，該等定位元件61係以一螺 絲8鎖固於該上蓋6之内壁選定位置上。 該等定位元件61係以一體成型固設於該上蓋6之内壁選定 位置上。 請參閱第3、4圖所示，該上蓋6可由一内蓋601及 一外蓋602所構成，其中，該等定位元件61設於該内蓋 601之内壁選定位置上，該内蓋601可連接於該外蓋602 表單編號A0101 内壁上，組成該上蓋6。 該等定位元件61係以一螺絲8鎖固於該内蓋601之 内壁選定位置上。 該等定位元件61係以一體成型固設於該内蓋601之 内壁選定位置上。 另，該上蓋6可由一内蓋601及一外蓋602 —體成型 所構成，該等定位元件61設於該内蓋601之内壁選定位置 上。 該等定位元件61係以一螺絲8鎖固於該内蓋601之 内壁選定位置上。 該等定位元件61係以一;體成型課於該内蓋6 01之 内壁選定位置上。 請參閱第3、4圖所示，'該等定'位元1T61之彈性本體 62可為一圓柱狀彈性本體62。 該等定位元件61之彈性本體62可為一矩形彈性本體 62。 ; 請參閱第5圖所示，該等走位元件61之彈性本體62 可為一菱形彈性本體62。 該等定位元件61之彈性本體62可為一橡膠材質或一 塑膠材質。 本創作所提供之光罩盒之定位結構，與前述習用技 術相互比較時，更具有下列之優點： 1. 為該光罩盒之上蓋6的晶圓片定位元件61，以點 接觸一晶圓片7表面，而能減少與該晶圓片7接觸之磨耗 〇 2. 為該光罩盒之上蓋6的晶圓片定位元件61，可減 表單编號A0101 第6頁, M409519 ’與-晶iU 7接觸之磨耗’避免產生磨耗之粉塵，而不 衫響该晶圓片7之光照钱刻電路的精準度。 上列詳細說明係針對本創作之一可行實施例之具體說 明，惟該實施例並非用以限制本創作之專利範圍，凡未 脫離本創作技藝精神所為之等效實施或變更，例如：等 變化之等效性實施例，均應包含於本案之專利範圍中。 【圖式簡單說明】Moreover, in use, the wafer 7 is placed on the mount 51 of the base 5, and the upper cover 6 is covered by the contact of the positioning member 61 such as: 丨: The tip 621 contacts and the surface of the wafer 7 that is placed thereon, thereby causing up and down bounce when the wafer is transported by the vertical limit. Referring to Figures 3 and 4, the positioning members 61 are locked to a selected position on the inner wall of the upper cover 6 by a screw 8. The positioning members 61 are integrally formed and fixed to the inner wall of the upper cover 6 at selected positions. The upper cover 6 can be formed by an inner cover 601 and an outer cover 602. The positioning member 61 is disposed at a selected position on the inner wall of the inner cover 601. The inner cover 601 can be It is connected to the inner wall of the outer cover 602 form number A0101 to constitute the upper cover 6. The positioning members 61 are locked to a selected position on the inner wall of the inner cover 601 by a screw 8. The positioning members 61 are integrally formed and fixed to selected positions on the inner wall of the inner cover 601. In addition, the upper cover 6 can be formed by an inner cover 601 and an outer cover 602. The positioning members 61 are disposed at selected positions on the inner wall of the inner cover 601. The positioning members 61 are locked to a selected position on the inner wall of the inner cover 601 by a screw 8. The positioning members 61 are formed in a body forming position at a selected position on the inner wall of the inner cover 610. Referring to Figures 3 and 4, the elastic body 62 of the '1' position 1T61 may be a cylindrical elastic body 62. The resilient body 62 of the positioning elements 61 can be a rectangular resilient body 62. Referring to FIG. 5, the elastic body 62 of the traverse member 61 may be a diamond-shaped elastic body 62. The elastic body 62 of the positioning member 61 can be made of a rubber material or a plastic material. The positioning structure of the photomask box provided by the present invention has the following advantages when compared with the prior art: 1. The wafer positioning member 61 of the cover 6 of the photomask box is in point contact with a wafer. The surface of the sheet 7 can reduce the wear of the contact with the wafer 7. 2. The wafer positioning member 61 for the cover 6 of the photomask box can be reduced by the form number A0101, page 6, M409519 'and-crystal The wear of the iU 7 contact 'avoids the abrasion of the dust, without the accuracy of the circuit of the wafer 7 . The detailed description above is a detailed description of one of the possible embodiments of the present invention, but the embodiment is not intended to limit the scope of the patents, and the equivalent implementations or modifications, such as variations, etc., without departing from the spirit of the art. Equivalent embodiments are to be included in the scope of the patent. [Simple description of the map]
[0005]第1圖為習用之立體分解圖。 第2圖為習用之部分刮面圖。 第3圖為本創作之立體分解圖 第4圖為本創作之部分剖面 第5圖為本創作另一實施例 【主要元件符號說明】 [0006] [0007] 6602 底座 上蓋 外蓋 627 彈性本體Fig. 1 is a perspective exploded view of a conventional one. Figure 2 is a partial scraping view of the conventional use. Figure 3 is an exploded perspective view of the creation. Figure 4 is a partial cross-section of the creation. Figure 5 is another embodiment of the creation. [Main component symbol description] [0006] [0007] 6602 Base Upper cover Cover 627 Elastic body
QB 圓片 62i8 ίυαί T---- 安裝座 IV / 内蓋 定位元件 接觸尖端 螺絲 第7頁> 表單編號A0101QB disc 62i8 ίυαί T---- Mounting seat IV / Inner cover Positioning element Contact tip Screw Page 7> Form No. A0101