M397589 五、新型說明： 【新型所屬之技術領域】 本新型是有關於一種光罩盒，特別是指一種能利用吹 淨技術進行内部環境淨化的光罩盒。 【先前技術】 在半導體製程中，運用自動化物料搬運系統（Automated Material Handling System，AMHS)，與隔離進出料標準機械 介面（Standard Mechanical Interface，SMIF)設備，來進行 晶圓與光罩於不使用期間的維護與運送，不但能取代傳統 人工搬運、降低無塵室設備之建置與維護成本，還能提升 晶圓與光罩的潔淨度，達到超高生產良率，故近年來， AMHS與SMIF已被列為是國際間半導體廠的標準設備規 々At 章巳σ 根據上述技術概念，除了在曝光使用時，光罩在運送 過程或保存期間，都必須放置在一個高潔淨度、氣密性 佳、低氣體逸出（outgassing )與抗靜電防護的光罩載具 内，如光罩儲存盒（Mask Package)、光罩傳送盒（Reticle SMIF Pod，RSP )，同時於該光罩載具中填充超純惰性氣體 (如氮氣或氬氣）或極度乾淨乾燥空氣（XCDA )，藉以隔 絕光罩與外界空氣之接觸，有效防止光罩受到污染，確保 高光罩潔淨度與高生產良率。 不過，除了存在於外界空氣中的污染物之外，光罩盒 與光罩之防護元件（pellicle )的材料本身也可能會逸出氣 體污染物，為了維持光罩盒内部環境的高潔淨度等級，吹 3 M397589 淨技術（purge technolQgy)是已被廣泛用來 環境進行污染控制。相對地，此類光罩盒的底部通;且^ 進::構造’透™充氣設備將氮氣或 Γ二光先罩罩盒:::迫使光 错以讓先罩盒内部環境產生整體換氣與 淨化效果，確保光罩保存在高潔淨度環境中。可木物的 所以’對於半導體製造業者來 罩盒内邱環m 者來說才木用吹淨技術對光 二：。〜控制時，在不會引發其它負面效庫 的則知下’如破壞光罩之 充氣量，‘”亡 “件，、，。構，如何以最經濟的 ' 速、有效地使光罩盒内部均勻換氣盥去除，，亏九 物，是相當重要的課題。 、，可木 【新型内容】 因此，本新型之目#，即 環流場，以㈣、右心〜 種再内4此形成循 …决速、有效地均勾換氣與去除污染 率佳的光罩盒。 人夺政 於是’本新型之光罩盒， 蓋結合且相配合界定出_ 頂’以及一與該底 該隔離空間的一内表面具有一導流弧面部。 罩圍 -夠ΐ!型之功效在於，利用該頂蓋之導流弧面部結構， 1使充進入該隔離空間令的一吹淨 死角地循環流動，藉以㈣貝饧無 ㈣先罩盒達到快速、有效地均勻 換乳與去除污染物之優異吹淨效率。 【實施方式】 有關本新型之别述及其他技術内容、特點與功效，在 M397589 以下配合參考圖式之五個較佳實施例的詳細說明中，將可 清楚的呈現。 在本新型被詳細描述之前，要注意的是，在以下的說 明内容中，類似的元件是以相同的編號來表示。 如圖1至圖3所示，本新型光罩盒2的一第一較佳實 細*例，可以疋一光罩儲存盒（Mask Package)或一光罩傳送 盒（Reticle SMIF P〇d ’ RSP)，能供一光罩1存放其中，以 予進行儲存或運送。而且，該光罩盒2能與一 乂/CDA充氣 系統（圖中未示）結合，適時適量地進行氮氣或乾淨乾燥 空氣（以下稱吹淨氣體）的填充，以維持其内部環境的高 潔淨度與正壓狀態。 δ亥光罩盒2整體外觀大致是呈四方體形狀，並包含一 方形的底蓋21，以及一與該底蓋21結合在一起之四方體形 狀的頂蓋22,該底蓋21與該頂蓋2相配合界定出—呈四方 體形狀的隔離空間23。 該底蓋21之左側（對應圖中方向，以下同）具有一貫 穿其頂、底面且連通該隔離空間23的排氣口 211。 δ亥頂蓋22具有一外表面221 ’以及一罩圍該隔離空間 23的内表面222，該内表面222具有一呈多邊形的頂面部 223，以及一其一頂緣連接該頂面部223之一周緣的導流弧 面部224。 在本實施例’該頂面部223是具有四個圓弧轉角Ri的 圓角四方形’相對地’該導流弧面部224為具有四個圓弧 轉角R2的圓角方框者’而且，該頂面部223與該導流弧面 5 M397589 4 224的相交接轉角處也構成四個圓弧轉角R3，所以，該 貝蓋22的内表面222整體並未呈現出任何尖角結構，特別 疋所述圓弧轉角R1〜R3的弧長（arc length)不小於1.5 A刀’且其曲率（curve rati〇 )不大於1公分-1 〇 再者該頂蓋22還具有一自該外表面221之右側頂部 延伸至該導流弧面部224之其中一圓弧轉角R2處且連通該 隔離空間23的進氣口 225。 於進行吹淨作業時，該乂/CDA充氣系統所提供的吹淨 氣體，會經由該進氣口 225並沿著該導流弧面部224表面 進入該隔離空間23中，由於該導流弧面部224沒有任何會 造成紊流或迴流的尖角結構，同時能對該吹淨氣體產生良 好的循環導流作用，使得該吹淨氣體會在該隔離空間23中 穂定、順暢地循環流動，從而無死角地將該光罩盒2内部 環境的原有氣體通通經由該排氣口 211 (或其他縫隙）排擠 出，如此便能讓該隔離空間23與該光罩丨之防護元件 (pelhcle) 11内部快速、有效地均勻換氣並去除污染物， 達到優異的吹淨效率，確保該光罩盒2内部環境與該光罩】 皆能維持高潔淨度狀態。 事貫上，除了本實施例所揭露之該頂面部223為圓角 四方形的方式外，該頂面部223也可以是如圓角三角形、 圓角五邊形、圓角六邊形…等多邊形狀，該導流弧面部 的形狀也會相應改變；再者，該頂面部223與該導流弧面 部224的相交接轉角處也可以是直角形態。另外’以四方 形之該頂面部223來說，其四個轉角的形態也可以是直 6 M397589 角、圓弧角並存’也就是說，其圓轉角ri的數量可以只 有個、一個或三個，這時候，該導流弧面部224之頂緣 則疋連接該頂面部223之周緣之通過所述一個、二個或三 個圓弧轉肖R1的局部長度範圍者，所以，該導流弧面部 224之圓弧轉角R2的數量會等同於該頂面部⑵之圓弧轉 角R1的數量，且具體就該導流弧面部224的俯視形狀來 看’該導流弧面部224可以略呈L形（一個圓弧轉角R2M397589 V. New description: [New technical field] The present invention relates to a photomask box, and more particularly to a photomask box capable of purifying the internal environment by using a blowing technique. [Prior Art] In the semiconductor manufacturing process, the Automated Material Handling System (AMHS) and the Standard Mechanical Interface (SMIF) device are used for wafer and mask during non-use. Maintenance and transportation can not only replace traditional manual handling, reduce the cost of construction and maintenance of clean room equipment, but also improve the cleanliness of wafers and reticle to achieve high production yield. Therefore, in recent years, AMHS and SMIF It has been listed as a standard equipment specification for international semiconductor factories. According to the above technical concept, in addition to exposure, the reticle must be placed in a high cleanliness and airtightness during transportation or storage. Good, low gas outgassing and antistatic protection in reticle carriers, such as Mask Package, Reticle SMIF Pod (RSP), and in the reticle carrier Fill with ultra-pure inert gas (such as nitrogen or argon) or extremely clean dry air (XCDA) to isolate the hood from the outside air and effectively prevent it. Cover contamination, ensure high cleanliness photomask and the high production yield. However, in addition to the contaminants present in the outside air, the material of the pellicle and the pellicle of the reticle may itself escape gaseous contaminants in order to maintain a high degree of cleanliness in the interior environment of the reticle. , Blowing 3 M397589 net technology (purge technolQgy) is a pollution control that has been widely used in the environment. In contrast, the bottom of such a reticle box is open; and the following:: The construction of the 'Turethane' inflatable device will be nitrogen or Γ two light first cover box::: forced optical error to make the overall environment of the hood box to ventilate And the purification effect ensures that the reticle is stored in a high cleanliness environment. It can be used for the semiconductor manufacturers to bring the technology to the light in the cover box. ~ Control, if it does not cause other negative effects, such as destroying the amount of inflation of the mask, ‘“death',,,,. Structure, how to use the most economical speed and effective to evenly ventilate the inside of the mask box, and it is a very important issue. ,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, Cover box. The person is in a state of the art, and the present invention has a light-shielding box, the cover is combined and defined to define a top surface, and an inner surface of the isolated space with the bottom portion has a guiding arc surface. The function of the hood-enhanced type is that, by using the guiding arc-face structure of the top cover, 1 the circulatory flow is made to fill the isolation space, so that (4) the 饧 饧 (4) hood is fast. Excellent drying efficiency for uniform uniform milk removal and removal of contaminants. [Embodiment] The description of the novel and other technical contents, features and functions of the present invention will be apparent from the following detailed description of the preferred embodiments of the accompanying drawings. Before the present invention is described in detail, it is noted that in the following description, similar elements are denoted by the same reference numerals. As shown in FIG. 1 to FIG. 3, a first preferred embodiment of the present photomask case 2 can be a Mask Package or a Mask Transfer Box (Reticle SMIF P〇d ' RSP) can be stored in a reticle 1 for storage or transportation. Moreover, the photomask case 2 can be combined with a 乂/CDA inflation system (not shown) to properly fill nitrogen or clean dry air (hereinafter referred to as purge gas) in a timely manner to maintain high cleanliness of its internal environment. Degree and positive pressure state. The overall appearance of the δ ray cover box 2 is substantially in the shape of a square, and comprises a square bottom cover 21, and a quadrangular shaped top cover 22 combined with the bottom cover 21, the bottom cover 21 and the top The cover 2 cooperates to define an isolated space 23 in the shape of a square. The left side of the bottom cover 21 (corresponding to the direction in the drawing, hereinafter the same) has an exhaust port 211 which is consistently passed through the top and bottom surfaces thereof and communicates with the partition space 23. The δH top cover 22 has an outer surface 221 'and an inner surface 222 surrounding the isolation space 23. The inner surface 222 has a polygonal top surface portion 223, and a top edge connects the top surface portion 223 The leading edge of the arc is 224. In the present embodiment, the top surface portion 223 is a rounded square having four arc angles Ri 'relatively'. The flow guiding arc surface portion 224 is a rounded square frame having four arc corners R2. The intersection of the top surface portion 223 and the guide arc surface 5 M397589 4 224 also constitutes four arc corners R3. Therefore, the inner surface 222 of the bezel 22 does not exhibit any sharp corner structure as a whole. The arc length of the arc angles R1 R R3 is not less than 1.5 A knife 'and its curvature is not more than 1 cm -1 . Further, the top cover 22 has a surface from the outer surface 221 The right top portion extends to one of the arcuate corners R2 of the flow guiding arc surface 224 and communicates with the air inlet 225 of the isolation space 23. During the purging operation, the purge gas provided by the helium/CDA inflation system enters the isolation space 23 via the air inlet 225 and along the surface of the flow guiding arc surface 224, due to the guiding arc surface 224 does not have any sharp-angle structure which causes turbulence or recirculation, and at the same time, can generate a good circulation guiding effect on the purge gas, so that the purge gas will circulate and smoothly circulate in the isolation space 23, thereby The original gas of the inner environment of the photomask casing 2 is discharged through the exhaust port 211 (or other slit) without any dead angle, so that the isolation space 23 and the pelhcle of the photomask can be arranged. The interior quickly and efficiently uniformly ventilates and removes contaminants, achieving excellent blowing efficiency, ensuring that the interior of the reticle 2 and the reticle maintain a high cleanliness state. In addition, in addition to the manner in which the top surface portion 223 is rounded square, the top surface portion 223 may also be a polygon such as a rounded triangle, a rounded pentagon, a rounded hexagon, etc. In a shape, the shape of the curved portion of the flow guiding body is also changed correspondingly; in addition, the intersection angle between the top surface portion 223 and the guiding arc surface portion 224 may also be a right angle shape. In addition, in the case of the square top surface 223, the shape of the four corners can also be straight 6 M397589 angles and arc angles coexisting. That is to say, the number of round corners ri can be only one, one or three. At this time, the top edge of the guiding arc surface portion 224 is connected to the peripheral edge of the top surface portion 223 through the partial length range of the one, two or three arcs, and therefore, the guiding arc The number of arc angles R2 of the face 224 may be equal to the number of arc angles R1 of the top face (2), and specifically, the guide arc face 224 may be slightly L-shaped in view of the plan view shape of the guide arc face 224. (An arc angle R2
者）、U形（二個圓弧轉角^者），或具—缺角的方形（三 個圓弧轉角R2者），而當該導流弧面部224為上述開放式 开八喊時’必須從該導流弧面# 224之—開放端側處進氣， 使吹淨氣體能沿該導流弧㈣224表面的延伸方向循環流 動0 如圖4所示，為本新型之光罩盒 ^ 乐一較佳實施 歹1，”上述該第一較佳實施例不同之處在於該頂蓋U為 半球罩形狀’該隔離空間23為半圓球形狀，該導流弧面部, U-shaped (two arc corners ^), or square-shaped corners (three arc corners R2), and when the guiding arc surface 224 is called the above-mentioned open-style opening, it must be The air is blown from the open end side of the guide arc surface #224, so that the purge gas can circulate along the extending direction of the surface of the guide arc (four) 224. As shown in Fig. 4, the present type of photomask box is A preferred embodiment ,1, wherein the first preferred embodiment is different in that the top cover U is in the shape of a dome cover. The isolation space 23 is in the shape of a semi-spherical ball.
224的範圍是涵蓋該内表面222的全區域，即為半球面形 狀’該頂蓋22不具有進排氣功能，而該底蓋21還具有一 位在其右側部且連通該隔離空間23的進氣口 2丨2。 同樣地’經由該進氣口 212進入該隔離空間23中的吹 淨氣體，在該半球面狀之導流弧面部224的循環導二The range of 224 is the entire area covering the inner surface 222, that is, the hemispherical shape 'the top cover 22 does not have an intake and exhaust function, and the bottom cover 21 also has a one on the right side thereof and communicates with the isolation space 23 The air inlet is 2丨2. Similarly, the purge gas entering the isolation space 23 via the air inlet 212 is circulated in the hemispherical guide arc surface portion 224.
下，能在該隔離空間23中科定 ；，L τ稳疋；丨負物無死角地循環流 動’並將該隔離空間23巾的舊有氣體快速、有效地從兮 乳口 2U (或其他縫隙）擠出，故本實施例於進行 同樣能夠達到優異的淨化效率。 崎’ 如圖5與圖6所示，為本新型之光革盒：的 佳實把例’與上述該第二較佳實施例不同處在於，該頂蓋 22與該隔離空間23為圓柱體狀，該内表面222之頂面部 如為圓形，該導流狐面部224是自該頂面部切的周緣: 下延伸成圓環形狀’在本實施例，該頂面冑223與該導流 弧面部224的相交接轉角處是呈直角形態，當然，、：可： 是圓弧角形態。 ^再者，該頂蓋22還具有—自該外表面221之底部延伸 至忒導流弧面冑224且連通該隔離空間23的排氣口咖， 在本實施例’該進氣σ 225與該排氣口 226是分別位在該 導流弧面部224的-切線方向上，使得該隔離空間23能進 行切線式進氣與排氣。 因此，該吹淨氣體在該導流弧面部224的導引下，得 以穩定'_、無死角地循環流動，促使該光罩盒2内部 %境快速、有效地均勻換氣並去除污染物，達到優異的吹 淨效率。 如圖7所示，為本新型之光罩盒2的一第四較佳實施 例，與上述該第二較佳實施例不同處在於，該頂蓋22整體 外觀略呈半圓柱狀，該内表面222具有二間隔平行面對之 半圓形的側面部227，以及一其相反二弧緣分別連接所述二 侧面部227之一弧緣且呈圓拱形的導流弧面部224。在本實 施例，所述二側面部227與該導流弧面部224的相交接轉 角處是直角形態，當然也可以是圓弧角形態。 如同該第二較佳實施例，本實施例同樣也能達到淨化 M397589 效率佳的功效。 如圖8所示，為本新型之光罩盒2的一第五較佳實施 例，與上述該第一較佳實施例不同處在於，該頂蓋22之進 氣口 225是自該外表面221之頂面左側延伸至該頂面部a] 的左側’而且，該頂蓋22還具有—自該外表面221之頂面 右側延伸至該頂面部223之右側且連通該隔離空間23的排 氣口 226。Underneath, it can be fixed in the isolation space 23; L τ is stable; the raft is circulated without dead ends, and the old gas of the isolation space 23 is quickly and effectively removed from the 兮 2 2 (or other The slits are extruded, so that the present embodiment can achieve excellent purification efficiency as well. As shown in FIG. 5 and FIG. 6, the present invention is different from the second preferred embodiment in that the top cover 22 and the isolation space 23 are cylindrical. The top surface of the inner surface 222 is circular, and the guiding fox face 224 is a peripheral edge cut from the top surface: a lower extending annular shape. In the embodiment, the top surface 223 and the diversion The intersecting corners of the curved surface portion 224 are in a right angle form. Of course, the: can be: an arc angle shape. Further, the top cover 22 further has an exhaust port extending from the bottom of the outer surface 221 to the crucible guide surface 224 and communicating with the isolation space 23, in the present embodiment 'the intake σ 225 and The exhaust ports 226 are respectively located in the tangential direction of the flow guiding arc surface 224 such that the isolated space 23 can perform tangential intake and exhaust. Therefore, the blowing gas is stably circulated under the guidance of the guiding arc surface portion 224, and the inside of the hood 2 is quickly and effectively uniformly ventilated and the pollutants are removed. Achieve excellent blowing efficiency. As shown in FIG. 7, a fourth preferred embodiment of the present photomask case 2 is different from the second preferred embodiment in that the top cover 22 has a semi-cylindrical overall appearance. The surface 222 has two semi-circular side portions 227 which are spaced apart in parallel, and a curved arc-shaped arcuate portion 224 which is connected to one of the arcuate edges of the two side portions 227, respectively. In this embodiment, the intersection of the two side surface portions 227 and the flow guiding arc surface portion 224 is a right angle shape, and of course, it may be an arc angle shape. As with the second preferred embodiment, this embodiment can also achieve the efficiency of purifying M397589. As shown in FIG. 8, a fifth preferred embodiment of the present photomask case 2 is different from the first preferred embodiment in that the air inlet 225 of the top cover 22 is from the outer surface. The top surface of the top surface of 221 extends to the left side of the top surface portion a]. Moreover, the top cover 22 further has an exhaust gas extending from the right side of the top surface of the outer surface 221 to the right side of the top surface portion 223 and communicating with the isolation space 23. Port 226.
再者該底蓋21無法用以進排氣，並具有一與該頂蓋 22結合之方形的蓋本體213，以及一設置在該蓋本體 之一内表面且鄰近地環繞該光罩1之周側的導流框體214， 該導流框體214的斷面是概呈角形 ，並具有一接觸該隔離 ]23的弧凹内面215。在本實施例，該導流框體214是 裒 <堯在用以支持該光罩丨的結構體外圍，當然’該導流框 體214也可以就是用以支持定位該光罩丨的結構體者。Furthermore, the bottom cover 21 cannot be used for air intake and exhaust, and has a square cover body 213 combined with the top cover 22, and a circumference disposed on an inner surface of the cover body and adjacently surrounding the reticle 1 The lateral flow guiding frame 214 has a substantially angular cross section and has an arc concave inner surface 215 contacting the isolation 23 . In this embodiment, the flow guiding frame 214 is 裒<尧 on the periphery of the structure for supporting the reticle. Of course, the guiding frame 214 may also be a structure for supporting positioning of the reticle. Body.
相較於該第一較佳實施例，本實施例透過該導流弧面 部224結合該弧凹内面215的結構，能強化對該吹淨氣體 的循環導流作用’使該光罩± 2内部環境能更加快速、有 效地均勻換氣並去除污染物’於吹淨效率上更加提升。 准以上所述者’僅為本新型之較佳實施例而已，當不 月匕以此限疋本新型實施之範圍，即大凡依本新型申請專利 範圍及新型說明内容所作之簡單的等效變化與修飾，皆仍 屬本新型專利涵蓋之範圍内。 【圖式簡單說明】 圖1是一立體透視圖，說明本新型光罩盒之一第一較 9 M397589 佳實施例的結構； 圖2是該第一較佳實施例的一縱剖圖·， 圖3疋該第一較佳實施例的一橫剖圖. 一第二較佳實 圖4是一縱剖圖，說明本新型光罩盒之 施例的結構； 囿 疋 且體通視圖，說明本新型光罩盒之一第三 佳實施例； —父 圖6是該第三較佳實施例的一橫剖圖； 圖7疋一立體透視圖，說明本新型光罩盒之—楚 & 皿〜 弟四輕 佳貫施例的結構；以及 圖8是-縱剖圖，說明本新型光罩盒之一第五較佳者 施例的結構。 只 M397589 【主要元件符號說明】 1 光罩 221 外表面 11 防護元件 222 内表面 2 光罩盒 223 頂面告P 21 底蓋 224 導流弧面部 211 排氣口 225 進氣口 212 進氣口 226 排氣口 213 蓋本體 227 側面部 214 導流框體 Rl〜 R3圓弧轉角 215 弧凹内面 23 隔離空間 22 頂蓋Compared with the first preferred embodiment, the embodiment combines the structure of the curved concave inner surface 215 through the guiding arc surface portion 224, and can enhance the circulation guiding action of the purge gas. The environment can more evenly and efficiently ventilate and remove pollutants', which improves the blowing efficiency. The above-mentioned ones are only the preferred embodiments of the present invention, and are not limited to the scope of this new type of implementation, that is, the simple equivalent changes made by the general patent application scope and the new description contents. And modifications are still within the scope of this new patent. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a perspective perspective view showing the structure of a preferred embodiment of the first photomask case of the present invention; FIG. 2 is a longitudinal sectional view of the first preferred embodiment. Figure 3 is a cross-sectional view of the first preferred embodiment. A second preferred embodiment is a longitudinal sectional view showing the structure of the embodiment of the novel photomask case; A third preferred embodiment of the present photomask case; a parent FIG. 6 is a cross-sectional view of the third preferred embodiment; and FIG. 7 is a perspective perspective view of the present photomask case - Chu & The structure of the dish is the structure of the fifth preferred embodiment of the present invention; and FIG. 8 is a longitudinal sectional view showing the structure of a fifth preferred embodiment of the novel photomask case. M397589 only [Main component symbol description] 1 Photomask 221 External surface 11 Protective element 222 Inner surface 2 Photomask box 223 Top surface P 21 Bottom cover 224 Guide arc surface 211 Exhaust port 225 Air inlet 212 Air inlet 226 Exhaust port 213 Cover body 227 Side portion 214 Guide frame Rl R R3 Arc angle 215 Arc concave inner surface 23 Isolation space 22 Top cover
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