TWM376890U - The electron emission device and electromagnetic wave generator of carbon nanotube - Google Patents

The electron emission device and electromagnetic wave generator of carbon nanotube Download PDF

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TWM376890U
TWM376890U TW098215259U TW98215259U TWM376890U TW M376890 U TWM376890 U TW M376890U TW 098215259 U TW098215259 U TW 098215259U TW 98215259 U TW98215259 U TW 98215259U TW M376890 U TWM376890 U TW M376890U
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Taiwan
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carbon nanotube
layer
electron emission
metal oxide
carbon
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TW098215259U
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Chinese (zh)
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Chen-Yuan Liu
Huang-Chang Lin
Jing-Chung Huang
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Univ Tungnan
Chen-Yuan Liu
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Publication of TWM376890U publication Critical patent/TWM376890U/en

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Abstract

This creature is providing an electron emission device and Electromagnetic Wave Generator that can achieve a high electron emission efficiency even in case of a small exciting energy. The electron emission device is provided with a carbon nanotube layer 12 formed on a SiC base plate 11 and composed of a plurality of carbon nanotubes oriented in a perpendicular direction to a surface of the SiC base plate 11, a MgO layer 13 formed on the carbon nanotube layer 12 and contacting with the carbon nanotube layer 12, an Ohmic electrode 17 connected with the carbon nanotube layer 12, an electrode 15 arranged to face the MgO layer 13 with a space 14 in-between, and a voltage source 16 to impress a voltage between the Ohmic electrode 17 and the electrode 15.

Description

五、新型說明: 【新型所屬之技術領域】 本發月係有關於電子放崎置及電磁波產生裝置,特別是有 關於使u奴g之電子放射裝置及電磁波產生裝置之相關技 術。 【先前技術】 、近年來,由於對顯示器、電子顯微鏡、照明裝置、以及電每 皮產生裝置等之性雜升的要求偏高,故以賴於鱗裝置之屬 子放難置的高效率、高輸出化為目的,而盛行著使用奈米碳« 之電子放射裝置的開發。奈米碳管係能極力提高沿著管的方向之 ^氣傳導率。耕,她㈣知的電侧騎朗之金屬材料 由於其管㈣離為线,故前端部㈣場強度係高於平坦關 倍以上。因此’藉由使用奈米碳管於電子放射裝置之方式,^ 期待能取得高的電子放射效率。此外,由於太平 古Μ丄 卜由於不未石厌管之機械強度 I化故如使时轉砂電子放紐置,村轉能取得長壽 〒化、以及低成本化等之優點。 但’為了取得該麟之高電子婦效率 定向於電子放_方向,並確實地自太 屮丰。太4 衫的前端將電子放射 'Τ…碳㈣定向成長技術既知有將具有觸媒的作用之金屬 祕板,絲顧齡顧板在轉高溫的狀態下, 中nr體作氣相化學反應喊生奈米碳㈣方法或在真空 、旧進行高溫退火時使&脫離,藉細產生定向的奈米碳管 專散獻1之特開2·15。77號公報所示之使用如此 疋向的不㈣官而構成之電子放射裝置係如圖8所示。 該電子放射裝置係由下列所構成: η-型SiC基板11 ; 且 〜奈米碳管層12 ’其係由上述真空中的高溫退火法所形成, 由定向化之奈米碳管所構成; 電極15 ; 電阻電極17 ;以及 電壓源16,其係施加電壓於電極15和SiC基板U上的電阻 電極17之間。 如此之電子放射裝置其自奈米碳管層U的表面所放射出去的 電子係移動於空隙14。 [本創作欲解決之課題】 但,即使在使用如圖8所示之定向化的奈米碳管之電子放射 裝置W中’其支配電子的放射鱗之參數的讀函數為4〜而 為極高,欲魏S的電子放概率,然必須高的激發能量。 因此,該電子放難Ϊ並無法實現高的電子放射效率。 此時提電子放射效率之技術,報告有分配電子線於定向 雖不完全而被Mg〇所包覆之奈米碳管,使電子賴2 :欠之技術則 揭露於 Applied Physics Letters.加,81,服1〇9811〇6(2〇〇2)但,在 該技術s 17 ’ §電?線的激發能量較低時則無法實現期待電子 的同放射效率。因此,該技術亦無法實現高的電子放射效率。 【新型内容】 本創作之目的係提供—電子放崎置,其係即使在激發能量 較小時,亦能實現高的電子放射效率。 為了達成此目的,本發明之電子放射裝置之具備: 奈米碳管層,其係形成於基板上,且由對前述基板表面而定 向於垂直方向之複數的奈米碳管所構成; 金屬氧化物層’其係形成於前述奈米碳管層上,且和前述奈 米碳管層相接觸; 第1 ’其係和前述奈米碳管層相連接;以及 第2電極,其係隔開和前述金屬氧化物層之間,且相對向而 配置。 根據如此之構成,㈣奈米碳管層表面伽彡成有金屬氧化物 層,且奈米碳管_電子脫出表面時的障壁高度變低,而不必如 各知的電子放射裝置之需要高的激發能量’故即彳吏在激發能量較 小時’亦能實現高的電子放射效率。 此處,前述金屬氧化物層之最大膜厚係以較前述奈米碳管之 最大直徑更小為佳❺此外,前述複數的奈米碳管係對前述基板表 面而定向於垂直方向,且對前述基板表面而位於垂直方向的前述 奈米碳管之前端部上之金屬氧化物層之長度係以較前述奈米碳管 之最大直徑更小為佳。 根據如此之構成,由於僅選擇性地形成金屬氧化物層於奈米 石反管的前端部,故能保障奈米碳管的表面電場強度最強的尖銳之 月'J端部在表面形成障壁高度最低的部份。此外,由於各奈米碳管 係定向於電子放射方向,故能確實地自各奈米碳管的前端部進行 特性一致之電子放射。其結果,即能更加提高電子放射效率。 此外,前述金屬氧化物層係以形成於前述複數的奈米碳管之 間為佳。 根據如此之構成,在奈米碳管的侧壁被激發之電子亦能藉由 金屬氧化物的功效而於真空中脫出。其結果,由於即使電子未到 達奈米碳管的前端部亦能被放射出去,且可縮短激發至放射為止 的時間,故能更加提高電子放射效率。 此外,前述金屬氧化物層係以形成於前述奈米碳管的内部為 佳。 根據如此之構成,在遠離奈米碳管的表面之奈米碳管的内部 被激發之電子亦能藉由金屬氧化物的功效而於真空中脫出。其鈇 果由於即使電子未到達奈米碳管的前端部亦能被放射出去,且 "T縮短激發至放射為止的時間,故能更加提高電子放射效率。 此外,前述金屬氧化物層係以含有Mg〇、Ba〇、Ca〇、Be〇、 以及SrO之中任意一項為佳。 根據如此之構成,由於金屬氧化物能使用電子傳導帶的能量 準位兩的材料,故可降低用以使由奈米碳管所激發,且到達傳導 帶準位的電子自表面而脫出於真空中的障壁高度。其結果,即能 更加提兩電子放射效率。 此外,本發明亦能作成電磁波產生裝置,其特徵在於具 90 備 奈米碳管層,其係形成於基板上,且由複數的奈米碳管所構 成; 金屬氧化物層,其係形成於前述奈米碳管層上,且和前述奈 米碳管層相接觸; 光源,其係照射脈衝光於前述奈米碳管層; 第1 1:極’其係和前述奈米碳管層相連接;以及 第2電極’其係隔開和前述金屬氧化物層之間,且;^目對向而 配置。 根據如此之構成,被奈米碳管_狀脈衝光所激發之電 子’其係即使直接超過奈米碳f本身之高功函數而不被充分的 能量所激斜,雜藉由金魏化物㈣咖於由電子放射面往 真二中脫ώ此外,藉由照射於奈米碳管層的脈衝光使用丨啦以 下的時間寬幅之超短_雷射光,即能產生驗(tewHertz)的 電磁波其結果,即能實現高輸出之兆級電磁波產生裝置。 【實施方式】 【實施形態1】 參閱圖式而說明有關於本創作之實施形態的電子放 裁面r係模式性地表示本實施形態之電子放射裝置的構造: 如圖1 (a)所示,在η刑L ^ 在η_型SlC基板11上形成奈米碳管層12, M376890 ,、係由對Slc基板u表面定向於垂直方向,亦即前端為對沉基 板U表面而朝定向垂直方向之高度·細之複數的奈米碳管所構 成。該奈米碳管層12係於lxl0_ 5Toit的真空中,對Sic基板u 在溫度K)000C中施以60分鐘的退火處理,並藉由使si麟且殘 留碳而形成。 此外’在奈米碳管層12上形成氧化鎮(吻0)層13,其係和奈 米碳管層12相接觸之100nm以下的厚度,例如i〇nm的厚度。該 φ MgO層I3係藉由電子光束蒸著法將Mg〇堆積於奈米碳管層u 上而形成。電子放射面係由_層13和奈米碳管層12所構成。 此外,在MgO層13上方配置有電極15,其係於和Mg〇層 13之間隔開間隔1_的空隙14而相對向於吨〇層13。該電極 15係能對SiC基板11相對地施加正的偏壓電壓之電極,且具有集 束放射電子的陽極電極之功能。此外,在Sic基板n的背面係形 成和奈米碳官層12作電氣性連接之電阻電極17。電源壓16係連 •接於電極15和電阻電極Π,且施加電壓於電極15和電阻電極17 .之間。又,電阻電極17雖形成於別匚基板n的背面,但,亦可 去除MgO層13和奈米碳管層12的一部份而形成於Sic基板u 的表面。 圖1(b)和圖1(c)係分別表示電子放射面的最表面之詳細構造 之截面圖和上視圖。 形成於SiC基板11表面之奈米碳管層12係如圖i(b)所示, 由平均5層的碳面所構成之平均直徑(圖1 (b)之X方向的奈米碳管 M376890 之長度的平均)11〇nm之多牆型的複數的奈米碳管i2a所構 成各不米奴营12a係作成各碳面為保持特定的面間距離而最表 面為閉塞之構造,各奈米碳管12a的前端部(圖_之A)係形成尖 =之形狀。在如此構造之奈米碳管以上係形成藉由電子光束蒸 著法而堆積之Mg〇層13。吨〇層13係由下列所構成··V. New type of description: [Technical field to which the new type belongs] This month's newsletter relates to an electronic display device and an electromagnetic wave generating device, and more particularly to an electronic radiation device and an electromagnetic wave generating device for making a slave. [Prior Art] In recent years, since the requirements for the display, the electron microscope, the illumination device, and the electric per-skin production device are relatively high, the high efficiency of the genus of the scale device is difficult. For the purpose of high output, the development of an electron emission device using nanocarbon « is prevalent. The carbon nanotube system is able to increase the gas conductivity in the direction along the tube. Ploughing, she (4) knows that the electric side of the electric side rides the metal material of the Lang. Because the tube (4) is off the line, the front end (4) field strength is higher than the flat double. Therefore, by using a carbon nanotube in an electron emission device, it is expected that high electron emission efficiency can be obtained. In addition, since the Taiping ancient 卜 不 不 不 由于 由于 由于 石 石 石 石 石 石 石 石 石 石 石 石 石 石 石 石 石 石 石 石 石 石 石 石 石 石 石 石 石 石 石 村 村 村 村 村 村However, in order to achieve the high efficiency of the electronic women, it is oriented to the electronic _ direction, and indeed from the Taifeng. The front end of the Tai 4 shirt will be electronically radiated 'Τ...carbon (4) directional growth technology. It is known that there is a metal secret board that will have the function of a catalyst. When the silk is in the state of high temperature, the nr body is called a gas phase chemical reaction. The raw carbon carbon (4) method or the vacuum and the old high-temperature annealing to remove & fine to produce oriented carbon nanotubes dedicated to the special opening 2 · 15. The use of the 77 The electronic radiation device composed of the four (4) official is shown in FIG. The electron emission device is composed of: an n-type SiC substrate 11; and a carbon nanotube layer 12' which is formed by a high temperature annealing method in the above vacuum, and is composed of a oriented carbon nanotube; The electrode 15; the resistive electrode 17; and the voltage source 16 is applied between the electrode 15 and the resistive electrode 17 on the SiC substrate U. In such an electron emission device, electrons emitted from the surface of the carbon nanotube layer U move to the gap 14. [The subject to be solved by this creation] However, even in the electron emission device W using the oriented carbon nanotube shown in Fig. 8, the read function of the parameter of the radiation scale governing the electron is 4~ High, the probability of electron release of Wei S, must have high excitation energy. Therefore, the electron emission is difficult to achieve high electron emission efficiency. At this time, the technology of electron emission efficiency was reported, and the carbon nanotubes coated with Mg〇 were distributed in the case where the distribution electrons were not completely oriented, so that the technology of the electrons was revealed in Applied Physics Letters. , served 1〇9811〇6 (2〇〇2) However, in the technology s 17 ' § electricity? When the excitation energy of the line is low, the same radiation efficiency of the expected electrons cannot be achieved. Therefore, this technology cannot achieve high electron emission efficiency. [New content] The purpose of this creation is to provide an electronic arsenal, which can achieve high electron emission efficiency even when the excitation energy is small. In order to achieve the object, the electron emission device of the present invention comprises: a carbon nanotube layer formed on a substrate and composed of a plurality of carbon nanotubes oriented in a vertical direction to the surface of the substrate; metal oxide The layer 'is formed on the carbon nanotube layer and is in contact with the aforementioned carbon nanotube layer; the first 'series is connected to the aforementioned carbon nanotube layer; and the second electrode is separated It is disposed between the metal oxide layer and the metal oxide layer. According to such a configuration, (4) the surface of the carbon nanotube layer is gamma-deposited to have a metal oxide layer, and the barrier height at the time when the carbon nanotubes are electrically removed from the surface becomes low, and it is not necessary to have a high demand as a known electron emission device. The excitation energy 'so that when the excitation energy is small' can also achieve high electron emission efficiency. Here, the maximum film thickness of the metal oxide layer is preferably smaller than the maximum diameter of the carbon nanotubes. Further, the plurality of carbon nanotubes are oriented perpendicular to the surface of the substrate, and The length of the metal oxide layer on the front end portion of the aforementioned carbon nanotube in the vertical direction on the surface of the substrate is preferably smaller than the maximum diameter of the aforementioned carbon nanotube. According to such a configuration, since only the metal oxide layer is selectively formed at the front end portion of the nanosoil back tube, it is possible to ensure that the sharpest moon 'J end portion of the surface of the carbon nanotube having the strongest electric field strength forms a barrier height on the surface. The lowest part. Further, since each of the carbon nanotubes is oriented in the direction of electron emission, electron emission having uniform characteristics can be surely obtained from the tip end portions of the respective carbon nanotubes. As a result, the electron emission efficiency can be further improved. Further, the metal oxide layer is preferably formed between the plurality of carbon nanotubes. According to such a configuration, electrons excited on the side wall of the carbon nanotube can also be removed in a vacuum by the effect of the metal oxide. As a result, even if the electrons are not emitted to the tip end portion of the carbon nanotubes, the time until the excitation is irradiated can be shortened, so that the electron emission efficiency can be further improved. Further, the metal oxide layer is preferably formed inside the carbon nanotube. According to such a configuration, electrons excited inside the carbon nanotubes away from the surface of the carbon nanotube can also be removed in a vacuum by the effect of the metal oxide. As a result, even if the electrons do not reach the tip end portion of the carbon nanotube, the time is elapsed, and the time until the radiation is excited is shortened, so that the electron emission efficiency can be further improved. Further, the metal oxide layer preferably contains any one of Mg〇, Ba〇, Ca〇, Be〇, and SrO. According to such a configuration, since the metal oxide can use the energy level of the electron conduction band, the electrons that are excited by the carbon nanotubes and reach the conduction band can be removed from the surface and removed from the vacuum. The height of the barrier. As a result, the two electron emission efficiencies can be further improved. Furthermore, the present invention can also be used as an electromagnetic wave generating device, characterized in that it has a 90-millimeter carbon nanotube layer formed on a substrate and composed of a plurality of carbon nanotubes; a metal oxide layer formed in The carbon nanotube layer is in contact with the carbon nanotube layer; the light source is irradiated with pulsed light on the carbon nanotube layer; the first 1: pole is connected to the carbon nanotube layer And the second electrode 'is spaced between the metal oxide layer and the metal oxide layer, and is disposed opposite to each other. According to such a configuration, the electrons excited by the SEM-like pulsed light are not directly excited by sufficient energy even if they directly exceed the high work function of the nanocarbon f itself, and the hybrids are treated with gold (W) The coffee is dislocated from the electron emission surface to the true two. In addition, by using the pulse light that is irradiated on the carbon nanotube layer, the ultra-short_laser light of the time width below the 丨 is used, and the electromagnetic wave of the test (tewHertz) can be generated. As a result, a high-order mega-level electromagnetic wave generating device can be realized. [Embodiment] [Embodiment 1] An electronic placement surface r according to an embodiment of the present invention is schematically illustrated with reference to the drawings. The structure of the electron emission device of the present embodiment is schematically shown in Fig. 1 (a). Forming a carbon nanotube layer 12, M376890 on the η_-type SlC substrate 11, on the η_-type S1 substrate 11, is oriented in a vertical direction to the surface of the Slc substrate u, that is, the front end is opposite to the surface of the counter substrate U. The height of the direction and the number of fine carbon nanotubes. The carbon nanotube layer 12 was placed in a vacuum of lx10_5 Toit, and the Sic substrate u was subjected to an annealing treatment at a temperature of K)000C for 60 minutes, and was formed by subjecting si lin and retaining carbon. Further, an oxidized town (knight 0) layer 13 is formed on the carbon nanotube layer 12, which is in contact with the carbon nanotube layer 12 at a thickness of 100 nm or less, for example, a thickness of i 〇 nm. The φ MgO layer I3 is formed by depositing Mg 〇 on the carbon nanotube layer u by electron beam evaporation. The electron emission surface is composed of a layer 13 and a carbon nanotube layer 12. Further, an electrode 15 is disposed above the MgO layer 13, which is spaced apart from the Mg layer 13 by a gap 14 spaced apart from the Mg layer 13, and is opposed to the tantalum layer 13. The electrode 15 is an electrode capable of applying a positive bias voltage to the SiC substrate 11 and has an anode electrode that concentrates the emitted electrons. Further, a resistive electrode 17 electrically connected to the carbon nanotube layer 12 is formed on the back surface of the Sic substrate n. The power supply voltage 16 is connected to the electrode 15 and the resistance electrode Π, and a voltage is applied between the electrode 15 and the resistance electrode 17 . Further, the resistive electrode 17 is formed on the back surface of the other substrate n, but may be formed on the surface of the Sic substrate u by removing a part of the MgO layer 13 and the carbon nanotube layer 12. Fig. 1 (b) and Fig. 1 (c) are a cross-sectional view and a top view, respectively, showing a detailed structure of the outermost surface of the electron emitting surface. The carbon nanotube layer 12 formed on the surface of the SiC substrate 11 is an average diameter composed of an average of five carbon faces as shown in Fig. i(b) (the carbon nanotube M376890 in the X direction of Fig. 1(b)) Each of the lengths of the 11 〇 nm multi-walled carbon nanotubes i2a is composed of a variety of carbon nanotubes, and each of the carbon faces is formed to have a specific surface distance and the outermost surface is closed. The front end portion (Fig. A) of the carbon nanotube 12a is formed into a shape of a pointed shape. Above the carbon nanotube thus constructed, a Mg layer 13 deposited by electron beam evaporation is formed. The tonnage layer 13 is composed of the following:

Mg013a ’其係選擇性遷移於奈米碳管以的前端部,且垂直 .方向之長度較奈米碳管12a的最大直徑為更小,且位於前端部上 φ 方;以及Mg013a' selectively migrates to the front end portion of the carbon nanotube, and the length in the vertical direction is smaller than the maximum diameter of the carbon nanotube 12a, and is located at the front end portion of φ square;

Mg013b,其係形成於前端部以外的部份。 如此之形成遷移於奈米碳管12a的前端部的,其係_ 米碳管^的前端部為理想的碳面之石墨型的碳之原子排列崩 毁’並形成再排列原子的缺_造’且對異種原子、分子表示極 高的反應性之故。此時,該最大_厚β(圖咖γ方向之卿 層η的長度之最錄齡靖12a的最大錄c(轉)的χ 方向之奈米破管以的長度之最大值)為更薄。理想上為控制於形 成奈米碳管以的最大直徑之10分之丨以下,邮基板丨丨之 保持於3000C以下而形成Mg〇層13。據 的前端部選擇性地形成增加包覆量之%〇層13此二未碳管以 Mg〇層η的奈米碳管12a的前端部上之部份的膜厚、 層。13的綱管仏的前端部上之部份以外的部份的膜厚為更 厚。 ·、 16而對 在具有如此的構造之電子放射裝置當中,藉由電麼源Mg013b is formed in a portion other than the front end portion. The formation of the rear end portion of the carbon nanotube 12a is such that the front end portion of the carbon nanotubes is an ideal carbon surface, and the graphite-type carbon atoms are arranged to collapse and form a rearrangement of atoms. 'And it shows extremely high reactivity to heterogeneous atoms and molecules. At this time, the maximum _thickness β (the maximum length of the nanometer tube in the χ direction of the maximum recording c (turn) of the length of the γ layer in the gamma direction γ direction is thinner) . It is desirable to control the formation of the carbon nanotube layer 13 by 10 or less of the maximum diameter of the carbon nanotubes. According to the front end portion, a film thickness and a layer of a portion on the front end portion of the carbon nanotube layer 12a of the carbon nanotube layer η are formed by selectively increasing the amount of coating. The film thickness of the portion other than the portion on the front end portion of the class 13 is thicker. ·, 16 and in the electron emission device having such a structure, by the source of electricity

SiC基板u相對地施加正的偏壓電壓,據此而奈米碳管層12内的 電子即由表面放射出去,放射出的電子係移動至空隙14。 圖2係電子放射面之能量圖表。又,圖2(&)係自表面真空側 31施加正的電壓於表面未被Mg〇層13所包覆之奈米碳管丨2時 之月b里圖表。圖2(b)係自表面真空側31施加正的電壓於表面被 MgO層13所包覆之奈米碳管層丨2時之能量圖表。 根據圖2(a),在表面未被叫〇層π所包覆之奈米碳管層U 當中’在奈米碳管層12峨崎的電子鋪由直接越過相當於奈 米碳管本身的功函數ψΜ中的障壁之雜32、由通道通過 障壁之路經33而於表面真空側3〗放射出去。另—方面,根義 2=’在表面被_層13所包覆之奈米碳管層12當中在奈米 反s層12内被激發的電?賴財介的料伽近的能量 ^位EC所傳導之經路%,或經㈣,而於表面真空㈣放射出 、因此在表面被Mg〇層π所包覆之奈米碳管層12當中電 脫=表面時之障壁面度係高高地減低至之電子親和力X程 度(通常為2eV以下),且來自类品+ _ , I自表面之電子的放射所必需之激發能量 氣特::用圖3說明有關於具有上述構造之電子放射裝置的電 又,在》! 知電錢魏置的錢—電㈣性鱗之圖示。 在圖3 t ’實線(轉!)麵 流〜電壓紐祕,㈣⑽ 獨ΜΙ子麟裝置的電 之電子放射、,、線Ιί}係表示未使用MgO之上述構造 放射裝置的電流-_性曲線,點虛線(曲線ίπ)係表示 M376890 未使用MgO ’且在奈米碳管層當中各奈米碳管未定向之上述構造 之電子放射裝置的電流一電壓特性曲線。 由於圖3之曲線II和線曲m並不相同,故藉由將各奈米碳管 予以疋向,將電場放射電流超過〇 〇1μΑ時的施加電壓定義為臨界 值電壓時,則臨界值電壓係自大約35〇ν(曲線ΗΙ)減少大約5〇ν而 成為大約300V(曲線II),電流值相較於施加電壓325V亦大約增大 10倍。此係藉由將各奈米碳管相定向,而使各奈米碳管之前端 •抽電场強度增強。另-方面,由於曲線Π和線曲m並不相同, 故藉由以MgO包覆各奈米碳管,使臨界值電壓進*減低大約 5〇V,電流值亦進而大約增大丨G倍。此係由於將堆積於奈米 碳官上,使電子脫出表面時之障鶴錢低,且增大電子放射效 率之故。 如上述’罐本實施職之電子放射錢,則奈米碳管係由 MgO所包覆。因此,即使電子批表㈣之障壁高度變低,且電 鲁壓源之施加電壓較小時,電子亦放射至外部。亦即,由於不必如 習知之電子放射裝置需要高的激發能量,故即使在激發能量較小 時亦犯實現南的電子放射效率。 此外’根據本實施形態之電子放射裝置,則奈米碳管係定向 於電子放射方向’且定向之奈米碳管的前端部躺㈣所包覆。 因此’由於自奈米碳管所放射的電子係輕易地自該前端部放射至 真空中’故能提高電子放射效率。此時,在各奈米碳管間的空隙 亦於MgO的形成時軸蒸著的_财部份輯目〇。因此亦 12 M376890 自奈米碳管侧壁中介堆積於側壁的Mg〇而進行電子放射。 此外,根據本實施形態之電子放射裝置,則由於奈米碳管係 疋向’故電子的放射方向為H此,由於能確實地自奈米碳 管的前端部進行雜-致之電子放射,故能提高電子放射效率。 又,在本實施形態之電子放射褒置當中,如圖4所示,MgO 層13係具有··The SiC substrate u is relatively biased with a positive bias voltage, whereby electrons in the carbon nanotube layer 12 are emitted from the surface, and the emitted electrons move to the gap 14. Figure 2 is an energy diagram of the electron emission surface. Further, Fig. 2 (&) is a graph in which the positive voltage is applied from the surface vacuum side 31 to the month b when the surface is not covered by the carbon nanotube layer 2 of the Mg layer 13. Fig. 2(b) is a graph showing the energy when a positive voltage is applied from the surface vacuum side 31 to the surface of the carbon nanotube layer 包覆2 covered by the MgO layer 13. According to Fig. 2(a), in the surface of the carbon nanotube layer U which is not covered by the layer π, the electrons in the carbon nanotube layer 12 are directly passed over the equivalent of the carbon nanotube itself. The obstacles 32 in the work function ψΜ are radiated by the channel through the barrier 33 and on the surface vacuum side 3 . On the other hand, the root meaning 2 = 'in the surface of the carbon nanotube layer 12 covered by the layer 13 is excited in the nano-anti-s layer 12? Lai Caisong's energy is close to the energy path E, which is transmitted by the EC, or is emitted by the surface vacuum (4), so it is in the surface of the carbon nanotube layer 12 covered by the Mg layer π. The electrical barrier = surface barrier is highly reduced to the degree of electron affinity X (usually below 2 eV), and the excitation energy necessary for the emission of electrons from the surface + _ , I from the surface: The figure of the electric-electrical device having the above-described structure will be described with reference to Fig. 3, which shows the money-electricity (four) scale of the electric power. In Fig. 3 t 'solid line (turn!) surface flow ~ voltage secret, (four) (10) The electric electron emission, the line Ιί} of the ΜΙ子子麟装置 indicates the current of the above-mentioned structure of the radiation device without using MgO-_ The curve, the dotted line (curve ίπ) is a current-voltage characteristic curve of the above-structured electron emission device in which M376890 does not use MgO' and each of the carbon nanotubes is not oriented in the carbon nanotube layer. Since the curve II and the line curve m of FIG. 3 are not the same, when the respective carbon nanotubes are twisted and the applied voltage when the electric field emission current exceeds 〇〇1 μΑ is defined as the threshold voltage, the threshold voltage is It is reduced by about 5 〇ν from about 35 〇ν (curve ΗΙ) to about 300 V (curve II), and the current value is also increased by about 10 times compared with the applied voltage of 325 V. This is to increase the strength of the pumping electric field at the front end of each carbon nanotube by orienting each carbon nanotube phase. On the other hand, since the curve 线 and the line curvature m are not the same, the threshold voltage is reduced by about 5 〇V by covering each of the carbon nanotubes with MgO, and the current value is further increased by about 丨G times. . This is due to the fact that it will accumulate on the carbon carbon, which makes the electrons get out of the surface with low barriers and increases the electron emission efficiency. The above carbon nanotubes are coated with MgO as described above. Therefore, even if the barrier height of the electronic batch meter (4) becomes low and the applied voltage of the voltage source is small, the electrons are radiated to the outside. That is, since it is not necessary to require a high excitation energy as in the conventional electron emission device, the electron emission efficiency of the south is achieved even when the excitation energy is small. Further, according to the electron emission device of the present embodiment, the carbon nanotube system is oriented in the electron emission direction and the front end portion of the oriented carbon nanotube is covered (four). Therefore, the electron emission efficiency can be improved because the electrons emitted from the carbon nanotubes are easily radiated from the front end portion into the vacuum. At this time, the gap between the carbon nanotubes is also reflected in the vaporization of the MgO. Therefore, 12 M376890 also emits electrons from the sidewalls of the carbon nanotubes deposited on the sidewalls of the carbon nanotubes. Further, according to the electron emission device of the present embodiment, since the emission direction of the electrons is "H", the electron emission from the tip end portion of the carbon nanotube can be surely performed. Therefore, it can improve the electron emission efficiency. Further, in the electron emission device of the present embodiment, as shown in Fig. 4, the MgO layer 13 has ...

MgU J3C 八即〜风於谷佘米碳管12a之間的空隙 MgO 13d ’其係形成於各奈米碳管⑵内部。 藉由作成如此之構成,即能自遠離奈米碳管的前端之部份的 側土和内壁中;| MgO進行電子放射至真空,且能提高電子放射 效率。本創作構成之絲作難圖如圖5所示,亦即,最初在溫 度:17_C ’時間:2〇分鐘,壓力·· 1〇_ 2pa,氧分壓⑽條件 下’將基板施以退火處理而使奈米碳管成長(步驟su)。此後,將 奈米碳管的前端部在溫度:7〇〇〇c ’時間:2〇分鐘,壓力:大氣 麼’氧分壓20%的條件下施以熱氧化,將熱氧化的部份予以去除, 並開放奈米碳管的前端部之—部份(步驟S12)。繼而在該開放之前 端部上,使用電子光束蒸著法而在基板溫度:細c塵力:川 _奶的條件下’將Mg〇予以蒸著而堆積膜厚iOnm之Mg0,藉 此而實現本構.驟阳)。在_堆積時,细選擇性地使_ 擴散骑米碳管的空隙和缺陷’在Mg〇的真空蒸著時,將形成奈 .事Λτ |,,|'里 l^/Γ 。此係因為在該溫度 圍s中,Mg0於堆_,能齡概於_碳管的空隙和缺 Γ <— 13 M376890 陷的同時,奈米碳管本身亦能保持機械性的形狀之故。據此,即 能使形成於奈米碳管的内部之Mg0數量增加。又,奈米碳管的前 端部之開放亦簡由照射電子絲於奈米碳管的前端部且去除該 前端部而進行。 【實施形態2】 圖6雜式性地表示本實祕態之電磁波產生裝置的構造之 截面圖。 • 如圖6所示’在n-型SiC基板11形成奈来碳管層12,其係由 對Sic基板11表面定向於垂直方向之高度200譲之複數的奈米碳 管所構成。該奈米碳管層12係於lxi〇_ 5T〇rr的真空中,對Sic 基板11在/瓜度10000C中施以60分鐘的退火處理,並藉由使义 脫離且殘留碳而形成。 此外’在奈米碳管層12上形成MgO層13,其係和奈米碳管 層12相接觸之l〇0nm以下的厚度,例如1〇nm的厚度。該Mg〇 籲·層13係藉由電子光束蒸著法將MgO堆積於奈米碳管層12上而形 成。電子放射面係由MgO層13和奈米碳管層12所構成。 此處’由MgO層13和奈米碳管層12所構成之電子放射面係 照射透過電極25和基板26的超短脈衝光列28。該超短脈衝光列 28係較電子自電子放射面脫出時的障壁高度的Mg〇之電子親和 力X更小之能量的光,例如波長780nm、脈衝寬幅1〇〇fs、重覆頻 率50MHz的脈衝光,且在雷射光源27產生。 此外,在MgO層13上方係配置有電極25,其係於和Mg〇 14 M376890 層13之間隔開間隔1〇帅的空隙μ而相對向於_層13 極25係能對sic基板11相對地施加正的偏壓電壓之膜厚20(1 之1T〇所形成之電極,且具有集束蘭電子的陽極電極之功能。 電極25係形成於由環婦煙系氣體所構成之基板%上。此外,在The MgU J3C is a gap between the wind and the glutinous rice carbon tube 12a. MgO 13d ' is formed inside each of the carbon nanotubes (2). By such a configuration, it is possible to move away from the side soil and the inner wall of the front end portion of the carbon nanotube; | MgO emits electrons to a vacuum, and the electron emission efficiency can be improved. The difficulty of the creation of this creation is shown in Figure 5, that is, initially at the temperature: 17_C 'time: 2 〇 minutes, pressure · 1 〇 _ 2pa, oxygen partial pressure (10) conditions, the substrate is annealed The carbon nanotubes are grown (step su). Thereafter, the front end portion of the carbon nanotube is subjected to thermal oxidation at a temperature of 7 〇〇〇c 'time: 2 〇 minutes, pressure: atmospheric ' 'oxygen partial pressure of 20%, and the thermally oxidized portion is given The portion of the front end portion of the carbon nanotube is removed and opened (step S12). Then, at the end before the opening, using the electron beam evaporation method, under the condition of substrate temperature: fine c dust force: Chuan_milk, 'Mg〇 is evaporated to deposit Mg0 of the film thickness iOnm, thereby realizing Constituency. At the time of _ accumulation, finely selectively venting the voids and defects of the carbon nanotubes in the vacuum of Mg 将 will form 奈 Λ | | , , 。 。 。 。 。 。 。 。 。 。 。. This is because in the temperature range s, Mg0 is in the stack _, the energy age is more than the gap between the carbon tube and the defect — 13 M376890, while the carbon nanotube itself can maintain the mechanical shape. . Accordingly, the number of MgO formed inside the carbon nanotubes can be increased. Further, the opening of the front end portion of the carbon nanotube is also performed by irradiating the electron fiber to the front end portion of the carbon nanotube and removing the front end portion. [Embodiment 2] Fig. 6 is a cross-sectional view schematically showing the structure of an electromagnetic wave generating apparatus of the present state. • As shown in Fig. 6, the carbon nanotube layer 12 is formed on the n-type SiC substrate 11, and is composed of a plurality of carbon nanotubes having a height of 200 Å which is oriented in the vertical direction on the surface of the Sic substrate 11. The carbon nanotube layer 12 was placed in a vacuum of lxi〇_5T〇rr, and the Sic substrate 11 was annealed at a temperature of 10000 C for 60 minutes, and was formed by removing the meaning and leaving carbon. Further, the MgO layer 13 is formed on the carbon nanotube layer 12, and is in contact with the carbon nanotube layer 12 at a thickness of 10 nm or less, for example, a thickness of 1 〇 nm. The Mg · layer 13 is formed by depositing MgO on the carbon nanotube layer 12 by electron beam evaporation. The electron emission surface is composed of the MgO layer 13 and the carbon nanotube layer 12. Here, the electron emission surface composed of the MgO layer 13 and the carbon nanotube layer 12 illuminates the ultrashort pulse light train 28 of the transmission electrode 25 and the substrate 26. The ultrashort pulse train 28 is light having a smaller energy than the electron affinity X of the barrier height when the electrons are ejected from the electron emission surface, for example, a wavelength of 780 nm, a pulse width of 1 〇〇 fs, and a repetition frequency of 50 MHz. The pulsed light is generated at the laser source 27. Further, an electrode 25 is disposed above the MgO layer 13 so as to be spaced apart from the layer 13 of the Mg〇14 M376890 by a gap μ, and the layer 25 of the layer 13 can be opposite to the sic substrate 11 A film having a positive bias voltage of 20 (1 to 1 Torr) and having an anode electrode that bundles blue electrons is applied. The electrode 25 is formed on the substrate % composed of the ring gas. ,in

SiC基板11的月面係形成和奈米碳管層η作電氣性連接之電阻電 極17 °電賴16係連接於電極25和魏電極17,且施加電壓於 電極25和電阻電極17之間。電阻電極17_成於说基板I! 的背面’但,亦可去除Mg0㈣和奈米碳管層12的一部份而形 成於SiC基板11的表面。 乂 此外’電子放射面係形成和圖1(b)、⑹所示之電子放射面相 同的構成。亦即’形成於Sic基板u表面之奈米碳管層η係由 平層的&面所構成之平均紐11()腦之多牆型的複數的奈米 石厌吕12a所構成。各奈米碳管12&係作成各碳面為保持特定的面 間距離而最表面為閉塞之構造’各奈米碳管以的前端部係形成 尖銳之形狀。在奈米碳管Ua上係形成藉由電子光束蒸著法而堆 積之MgO層13。%〇層13係由下列所構成:The lunar surface of the SiC substrate 11 is formed such that a resistor electrode electrically connected to the carbon nanotube layer η is electrically connected to the electrode 25 and the Wei electrode 17, and a voltage is applied between the electrode 25 and the resistance electrode 17. The resistive electrode 17_ is formed on the back surface of the substrate I!, but a portion of the Mg0 (four) and the carbon nanotube layer 12 may be removed to form a surface of the SiC substrate 11.乂 In addition, the electron emission surface is formed in the same manner as the electron emission surface shown in Figs. 1(b) and (6). That is, the carbon nanotube layer η formed on the surface of the Sic substrate u is composed of a plurality of nano-walls of the average layer 11 () of the flat layer & Each of the carbon nanotubes 12 & is formed such that each carbon surface has a structure in which a specific surface distance is maintained and the outermost surface is closed. The tip end portion of each of the carbon nanotubes has a sharp shape. An MgO layer 13 which is deposited by electron beam evaporation is formed on the carbon nanotube Ua. The % layer 13 is composed of the following:

MgOlh,其係選擇性遷移於奈米碳管仏的前端部垂直方 向之長度較奈米碳管12a的最大直徑為更小,且位於前端部上方. 以及 ’MgOlh, which selectively migrates in the vertical direction of the front end portion of the carbon nanotube, is smaller than the maximum diameter of the carbon nanotube 12a and is located above the front end portion.

Mg013b ’其係形成於前端部以外的部份。 1此之升/成遷移於奈米碳管12a的前端部# Mg〇13a,其係去 米碳管12a的前端部為理想的碳面之石墨型的碳之原子排列崩 M376890 毁,並形成再排列原子的缺陷構造,且對異種原子、分子表示極 高的反應性之故。此時,最大的膜厚較奈米碳管12a的最大直徑 為更薄。理想上為控制於形成奈米碳管12a的最大直徑之1〇分之 1以下’ SiC基板11之溫度保持於3〇〇〇c以下而形成Mg〇層。 據此,即能在奈米碳管12a的前端部選擇性地形成更多包覆量之 MgO 層 13。 在具有如此的構造之電磁波產生裝置當中,藉由電壓源16而 對SiC基板11相對地施加正的偏壓電壓,進而將雷射光源巧所 產生之超她衝光系列28照射於電子放射面,據此而奈米碳管層 12内的電子即由電子放射面放射出去。由呢〇層13進行電場放 射而集束於電極25之電子群29係形成照射雷射脈衝的時間寬幅 程度之脈朗’職至lps程度的脈衝電流係流過電極Μ和電 子放射面之間。ϋ此’產生具有比例於該瞬時電流的時間變化率 之電場強度的電磁波3〇。此時,由於所產生之電磁波的頻率係大 致和上述瞬時電_脈衝寬_反數鱗,軸w贿ζ的區域 亦即兆級,輯極25和電子放射面之__歧電磁波的波長 和等級整合而作成ΙΟμηι。 繼而參_ 7而說明有關於具有上述構造之電磁波產生裝置 的特性。圖7係表示電磁波產生裝置所產生的電磁波之功率頻摄 ,實線(錄⑽表示上觸造之轉 、所產生的電魏之徘賴雜(鱗Q,麟( 係表示未使用Mg0於光電面之上述構造之電磁波產生裝置所產 M376890 生的電磁波之功率頻譜特I生。 根據圖7,本實細彡態之電磁波產生裝置她於未使用Mg〇 之電磁波產生裝置,則電磁波的尖峰功率係改善近1〇〇倍。此係 因為使用MgO於光電面的結果,如圖3所示,放射電流改善唯至 10倍之故。 如上述,根據本實施形態之電磁波產生裝置,藉由和第i實 施形態相同的理由,即使激發能量較小時亦能實現高的電子放射 • 效率。此外,藉由電子的放射而產生兆級波。因此,能實現高輸 出之兆級波產生裝置。 此外,本實施形態之電子放射裝置中,堆積於奈米碳管層上 之金屬氧化物雖例示為MgO,但,若為第2族氧化物,則不自限 於此,取而代之而使用SrO、BaO、BeO、CaO或此等之合金亦可 取付同等之功效。 本實施形態之電磁波產生裝置中,形成金屬氧化物之基板雖 #例示為SiC基板,但,若為含碳之基板,則不自限於此,取而代 •之而使用另外的基板亦可取得同等之功效。 【圖式簡單說明】 〔圖1〕(a)模式性地表示本創作之實施形態之電子放射裝置的構 造之戴面圖。 (b) 表示電子放射面的最表面之詳細構造之截面圖。 (c) 表示電子放射面的最表面之詳細構造之上面圖。 〔圖2〕⑻自表面真空側施加正的電壓於表面未被Mg〇層所包 覆之奈米碳管層時之電子放射面的能量圖表。 17 iVJJ/Ο卿 (b)自表面真空側施加正電塵於表面被MgO層所包覆之 奈米碳管層時之電子放射面的能量圖表。 y圖3〕表示電子放射裝置的電流一電壓特性曲線之圖示。 圖4〕表示電子放射面的最表面之詳細構造之截面圖。 ^圖5〕表示電子放射裝置的製造方法之流程圖。 〔圖6〕模式性地表示第2實施形態之電磁波產生裝置的構 截面圖。 ^ 〔圖7〕表示電磁波產生裝置所產生之電磁波的功率頻譜特性之 圖示- 圖 〔圖8〕模式性地表示習知之電子放射裝置的構成之戴面 【主要元件符號說明】 11 SiC基板 12 奈米碳管層 12a 奈米碳管 13 氧化鎂(MgO)層Mg013b' is formed in a portion other than the front end portion. 1 liter/migration migrates to the front end portion of the carbon nanotube 12a # Mg〇13a, which is a graphite-type carbon atomic array collapsed at the tip end portion of the carbon nanotube 12a, and is destroyed and formed. The defect structure of the atom is arranged, and the reactivity of the hetero atom and the molecule is extremely high. At this time, the maximum film thickness is thinner than the maximum diameter of the carbon nanotube 12a. It is preferable to control the temperature of the SiC substrate 11 to be equal to or less than 1 ’c of the maximum diameter of the carbon nanotube 12a to be formed to form an Mg ruthenium layer. According to this, it is possible to selectively form a more coating amount of the MgO layer 13 at the front end portion of the carbon nanotube 12a. In the electromagnetic wave generating apparatus having such a configuration, a positive bias voltage is relatively applied to the SiC substrate 11 by the voltage source 16, and the ultra-bright light series 28 generated by the laser light source is irradiated onto the electron emitting surface. Accordingly, electrons in the carbon nanotube layer 12 are emitted from the electron emitting surface. The electron group 29 which is irradiated by the electric layer 13 and is concentrated on the electrode 25 forms a pulse current which is irradiated with a laser pulse for a wide range of time, and flows between the electrode 电子 and the electron emitting surface. . Here, an electromagnetic wave 3 具有 having an electric field intensity proportional to the temporal change rate of the instantaneous current is generated. At this time, since the frequency of the generated electromagnetic wave is substantially the same as the above-mentioned instantaneous electric_pulse width_reverse scale, the region where the axis w is bribed is also the mega-level, the wavelength of the electromagnetic wave and the wavelength of the electromagnetic radiation surface. The level is integrated and made into ΙΟμηι. Next, the characteristics of the electromagnetic wave generating apparatus having the above configuration will be described with reference to -7. Fig. 7 is a diagram showing the power frequency of the electromagnetic wave generated by the electromagnetic wave generating device, and the solid line (recorded (10) indicates the turn of the upper touch, and the generated electric power is ambiguous (scale Q, lin (representing that Mg0 is not used) The power spectrum of the electromagnetic wave generated by the M376890 produced by the electromagnetic wave generating device of the above-described structure is special. According to Fig. 7, the electromagnetic wave generating device of the actual fine state is the electromagnetic wave generating device of the electromagnetic wave generating device without using Mg, The improvement is nearly 1 time. This is because the result of using MgO on the photoelectric surface, as shown in Fig. 3, the radiation current is improved by only 10 times. As described above, the electromagnetic wave generating apparatus according to the present embodiment, by For the same reason as in the first embodiment, even when the excitation energy is small, high electron emission efficiency can be achieved. Further, a mega-wave is generated by electron emission. Therefore, a high-output mega-wave generation device can be realized. Further, in the electron emission device of the present embodiment, the metal oxide deposited on the carbon nanotube layer is exemplified by MgO, but if it is a group 2 oxide, it is not limited thereto, and instead In the electromagnetic wave generating apparatus of the present embodiment, the substrate on which the metal oxide is formed is exemplified as a SiC substrate, but a substrate containing carbon is used. It is not limited to this, and the same effect can be obtained by using another substrate. [Illustration of the drawing] [Fig. 1] (a) schematically shows the electron emission device of the embodiment of the present creation (b) A cross-sectional view showing the detailed structure of the outermost surface of the electron-emitting surface. (c) The top view showing the detailed structure of the outermost surface of the electron-emitting surface. [Fig. 2] (8) Self-surface vacuum side Energy diagram of the electron emission surface when a positive voltage is applied to the surface of the carbon nanotube layer not covered by the Mg layer. 17 iVJJ/Ο卿(b) Applying positive electric dust from the surface vacuum side to the surface by the MgO layer Energy diagram of the electron emission surface when the carbon nanotube layer is coated. y Figure 3] shows a current-voltage characteristic curve of the electron emission device. Fig. 4] shows the detailed structure of the outermost surface of the electron emission surface. Sectional view. ^ Figure 5] Table (Fig. 6) schematically shows a cross-sectional view of the electromagnetic wave generating device of the second embodiment. [Fig. 7] shows the power spectrum characteristics of electromagnetic waves generated by the electromagnetic wave generating device. Fig. 8 is a view schematically showing a configuration of a conventional electronic radiation device. [Main component symbol description] 11 SiC substrate 12 carbon nanotube layer 12a carbon nanotube 13 magnesium oxide (MgO) layer

13a、13b、13c、13d MgO13a, 13b, 13c, 13d MgO

14 空隙 15、25 電極 16 電壓源 17 電阻電極 26 基板 27 雷射光源 28 超短脈衝光系列 29 電子群 30 電磁波14 Void 15、25 Electrode 16 Voltage source 17 Resistive electrode 26 Substrate 27 Laser source 28 Ultrashort pulse light series 29 Electron group 30 Electromagnetic wave

Claims (1)

六、申請專利範圍: 卜-種電子崎裝置,频徵在於具備: 奈来奴管層’其絲成於基板上,且由對前述基板表面而定 向於垂直柯之複數的奈米碳管所構成; 金屬氧化物層,其係形成於前述奈米碳管層上,且和前述奈 米碳管層相接觸; T 第1電極,其係和前述奈米碳管層相連接;以及 第2電極’其係隔開和前述金屬氧化物層之間,且相對向而 配置。 2、 如申請專利範圍第1項之電子放射裝置其中, 前述金屬氧化物層之最大膜厚較前述奈米碳管之最大直徑為 更小。 3、 如申s青專利範圍第1項之電子放射裝置,其中, 對前述基板表©而位於垂直方向的前述奈来碳管之_部上之金 屬氧化物層之長度較前述奈米碳管之最大直徑為更小。 4、 如申請專利範圍第1項之電子放射裳置,其中, 前述金屬氧化物層係形成於前述複數的奈米碳管之間。 5、 如申請專利範圍第1項之電子放射裳置,其中, 前述金屬氧化物層係形成於前述奈米碳管的内部。 6、 如申請專利範圍第1項之電子放射震置,其中, 前述金屬氧化物層係含有MgO、Ba〇、Ca〇、Be〇、以及sK) 之中任意一項。 U376890 7、如申請專利範圍第1項之電子故射擎置盆 位於前述金屬氧化物層的前述杏 部份以外的部份之膜厚為更厚 、灭官之前端部上的部份之 祕,係較位於前述金屬氧化物層的前述奈米碳管之前端部上的 8、一種電磁波產生裝置,其特徵在於具備: 奈米碳管層’其係形成於基板上,且由複數的奈米碳管所構成. 鲁層,其_成猶絲純管紅,姊麵奈米碳 光源,其係照射脈衝光於前述奈米碳管層;Sixth, the scope of application for patents: Bu-type electronic device, the frequency is characterized by: the Neridu tube layer's filaments are formed on the substrate, and the carbon nanotubes are oriented to the surface of the substrate and are perpendicular to the vertical number of the carbon nanotubes. a metal oxide layer formed on the carbon nanotube layer and in contact with the carbon nanotube layer; T first electrode connected to the carbon nanotube layer; and second The electrodes are spaced apart from the metal oxide layer and disposed opposite each other. 2. The electron emission device of claim 1, wherein the maximum thickness of the metal oxide layer is smaller than the maximum diameter of the carbon nanotube. 3. The electron emission device of claim 1, wherein the length of the metal oxide layer on the portion of the carbon nanotubes in the vertical direction of the substrate table is longer than the carbon nanotubes. The largest diameter is smaller. 4. The electron emission device according to claim 1, wherein the metal oxide layer is formed between the plurality of carbon nanotubes. 5. The electron emission device according to claim 1, wherein the metal oxide layer is formed inside the carbon nanotube. 6. The electron emission device according to the first aspect of the patent application, wherein the metal oxide layer contains any one of MgO, Ba〇, Ca〇, Be〇, and sK). U376890 7. The electronic filming pot of the first part of the metal oxide layer is thicker and the part of the front part of the metal oxide layer is thicker. And an electromagnetic wave generating device which is disposed on the front end portion of the carbon nanotube layer of the metal oxide layer, and is characterized in that: the carbon nanotube layer is formed on the substrate, and is composed of a plurality of The carbon nanotubes are composed of a layer of ruthenium, which is a pure red tube of the sacred silk, and a carbon source of the surface of the nano-carbon, which is irradiated with pulsed light on the aforementioned carbon nanotube layer; 第1電極,其係和前述奈米碳管層相連接;以及 弟2電極’其係隔開和前述金屬氧化物層之間,且相對向而配a first electrode which is connected to the aforementioned carbon nanotube layer; and a second electrode which is separated from the metal oxide layer and which is opposite to each other
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