M364873 五、新型說明： 【新型所屬之技術領域】 本創作係有關勝體塗佈機台設備’特別是關於一種提供多加工路徑之 塗佈機結構。 【先前技術】 按，塗佈裝置係一種將特定作用及功能的膠體層被覆在基材表面之加 工方式，且因為其製品具有輕薄及多樣化的特性，因此被廣為利用，轉化 • 於各種領域中實施，舉凡生活中常見的膠帶、底片或者大小液晶顯示器(LED) 基板都是其製品實施的一種。 基本上，傳統塗佈機台於基材上形成單膠體層的一次作業程序，係必 須依序經過塗佈上膠、預熱蜞烤、固化表面等一連串步驟(註：隨塗佈產品 種類不同’加工方式也不盡相同），倘若製品需求為單一材料多膠體層，又 或者為複合材料多膠體層時，工作人員即會在每階段作業程序結束後調整 更賴台狀態’亦即，更換不同效果塗佈頭或塗料，並且調整塗佈頭與基 鲁材間之距離，再將基材重複上述流程，完成必須的塗佈作業，而隨著膠體 層的層數要求越多，作業人員調整更動機台的次數也相對增加。 _，更動機台織敝數越多，獨增加:η作人M作業負擔， .顯得耗時費力，同時也降低機台生產效率，提高了人為疏失造成產品不良 瑕疫的比例。 祕於此’本卿針對上述作#上_，提出—種新的多功能塗佈裝 置，以克服習知缺失。 、 【新型内容】 3 M364873 本創作主要目的在於提供__種多魏塗佈機，其_多路徑設置方 式’改變基材行走路徑，即可以使基材上形成功效不同之膠體層，簡化施 作抓程使得工作人作業更為單純簡單，且減少機台更動調整次數，更節 省作業時間。 為達上述之目的，本創作提供_種多功能塗佈機，係用以對一基材進 行 該多功此塗佈機至少包括：-輸送裝置、-塗佈裝置以及一烘箱， 其中輸送裝m定架、複數支撐件以及-回收架喊，係可以安裝基 材並施放沿支撐件行走’再自敏架_，娜在於，域㈣構成複數 移送路徑’塗佈裝置於每__移送雜上設置至少一塗麵，每—塗佈頭都 月匕在基材上形成-賴層，最後由連結此塗佈裝置之烘箱將紐上之勝體 層烘烤成型 由於基材係選擇其中-移送路徑移動，因此改變基材行走路徑，等於 改變基材上所形成之雜層’事先設定好每—塗佈頭制之塗料成份或膠 體層形成厚薄，可以簡單變化施作方式，即驗易在基材上形成單一材料 多膠體層，或者複合材料多膠體層》 底下藉由具體實施例配合所附的圖式詳加說明，便於審查委員更容易 瞭解辨別本創作之目的、技術内容、特點及其所達成之功效。 【實施方式】 本創作提出之s功能塗佈裝置，乃設^重移送路徑運送基材，且每 -移送路徑通過處設置喷塗絲不同之塗麵，藉由改變基材移送路徑之 方式’在基材表面形成不同功能之膠體層。 首先參閱第-圖’為本創作-實施例之多功能塗佈裝置示意簡圖。如 M364873 圖所示’此多功能塗佈機1基本架構包括_箱式機體，以及設置在此機 體12内部之-輸送裝置Μ、-塗佈裝置16、一烘箱18、一紫外線加熱器 20以及一薄膜加工器22 ’此多功能塗佈機！係用以對一基材2施作塗佈作 業’此基材2於本實施例中係舉例半導體常用材料說明，可以是軟性電路 •'板或銅箱LED基板。其中，輸送裝置14是由一固定架142、複數支樓件 144以及—回收架146共構組成’且固定架142可以安裝呈筒狀之基材2， 並朝預定方向旋轉施放基材2釋出；而讀件144係為自轉滾輪，用以支 籲材2移動依序通過塗佈裝置、烘箱、紫外線加熱器Μ以及薄膜 加工器22 ’最後’由回收架146回收。且特別的是，支撐件144在塗佈裝 置16中形成分歧之-第 第二、一第三以及-第四移送路徑Pl、p2、 P3、P4 ’基材2係可選擇經由其中一路徑位移。 於本實施例中，為使塗佈機i成本降低同時亦富有多態樣塗佈變化， 因此塗佈裝置16在第-移送路徑Pl與第三移動路徑p3分歧位置設置一第 -塗佈頭16卜使基材2在it過第一移送路徑Ρι或第三移送路徑&時其 ♦夕卜表面都可以形成-第-膠體層30 ;其次，為使本塗佈機1也^在紐 2内表面形成第二膠體層40 ’因此利用一塗佈輪作為第二塗佈頭162，並以 …抵靠基材2内表面之方式設置在第二移送路徑&上；再者在第三移送路 •控P3以及第四移送路徑P4分歧位置利用一喷嘴設置為—第三塗佈頭163， 於第三塗佈頭163之後更設置-刮刀輪164，使得通過第三移送路徑&或 第四移送路徑P4之基材2外表面都可以形成一第三膠體層5〇，且經由刮刀 輪164整平膠體層50之表面。此一方法最大優點為可以預先設定好每一塗 佈頭⑹、162、163與基材2之間隙大小，以及每一膠體層％、4〇、％組 5 M364873 成成伤的不同依此，基材2會因為通過移送路徑pi、p2、pa、p4的不同， 在基材2表面形成制功效不同之膠體層3Q u。 而在认。十上，為避免辦間成型二不哪體層時，因為塗料混合造成 膠體層被破壞崎況’因此有轉細化先《之膠體層。林實施例之 基材2通過第三飾路徑P#況作為綱H塗佈頭⑹以及第三塗 佈頭63之間有必要加裝_紅外線預熱m當第—塗佈頭16丨在基材2 形成第膠體層30時，係先由紅外線預熱器μ固化第一膠體層％，接著 才可乂由第—塗佈頭163在第一膠體層3〇上形成第三膠體層％，如此一 來，可以避免塗料混合造成膠體層3〇、5G的破壞情形。 又供I目I8係可以對通過之基材2進行烘烤，定型基材2上之膠體層 30 40、50 ’且配合烘箱18的設置，並機體12上裝設有二空氣過渡裝置 ⑻提供機體12⑽空氣對流。而料線加熱^ π則賴對完成烘乾作 業之基材2再進行膠體層3〇、*、％表面固化處理。薄膜加工器η係可 以將-薄膜6G讀輥軋成麵覆在輕層3()、*、5()以及紐2上方， 藉以保護膠體層30、4G、5G完整性，此細⑼選自絕緣體材料。 為更清楚揭示本創作塗佈機u#構作用，係以如下第二圖之流程說明， 及配合第三圖至第六騎示，朗不同施形式說明本創倾術精神。 首先如第二圖以及第三圖所示，係為單一膠體層加工方式之實施例， 於步驟S100開始時，係在步驟S11透過作業人員事先選擇作業路徑，假設 基材2係通過第一移送路徑ρι位移，在經過第-塗佈頭⑹時，如步驟S21 所示，基材2外表面將連續形成第一膠體層30，接續步驟S31，經過烘箱 18微烘定型，並於步驟S4卜利用紫外線加熱器2〇固化膠體層％表面， M364873 且在步驟sm巾判斷是否進行下一循環作業在單一膠體層加工係直接進 行步驟S61 ’經過薄獏加工器η貼覆薄膜6〇保護，最後於步驟奶中由 回收架146 13收加工完成之基材2，並於步驟S2〇〇結束作業。 再以第一圖配合第四圖所示，係為單一材料層疊三膠體層加工方式之 .完成品示意圖’如步驟S11-S41所示，基材2同樣通過第一移送路徑？1位 移’經過第-塗佈頭161碱第一勝體層地，經過烘箱i8以及紫外線加 熱器20固化’不同的是，步驟SM經判斷必須再次循環作業，因此選擇進 籲人步驟S71 ’直接經過回收架146回收基材2，且透過步驟S8卜由作業人 員將回收後之基材2再次安置定架142上，並再次重複上職程直 至最終回’以該例而言’亦既重復作業三次，基材2表面形成三道第一膠 體層30a、3〇b、3〇c ’接續以步驟附貼覆薄膜6〇作保護，進入步驟防回 收加工材料，並在步驟S200結束作業。 接著配合第五圖，係絲材⑽表面形絲體層加卫方式之完成品示 意圖’ -樣重複步驟S11〜S41 ’且第一次作業係選擇將基材2通過第二移送M364873 V. New description: [New technical field] This creation is about the body coating machine equipment', especially regarding a coater structure that provides multiple processing paths. [Prior Art] According to the coating device, a coating method for coating a specific action and function of a colloid layer on a surface of a substrate is widely used and converted into various materials because of its thinness and various characteristics. Implemented in the field, a tape, a film or a liquid crystal display (LED) substrate that is common in everyday life is one of its products. Basically, a single operation procedure for a conventional coating machine to form a mono-colloid layer on a substrate must be followed by a series of steps such as coating, preheating, curing, and curing the surface (Note: depending on the type of coating product) 'The processing method is not the same.) If the product demand is a single material multi-colloid layer, or a composite material multi-colloid layer, the staff will adjust the state after the end of each stage of the operation program', that is, replace Coating the head or coating with different effects, and adjusting the distance between the coating head and the base material, and repeating the above process for the substrate to complete the necessary coating operation, and the more the number of layers of the colloid layer is required, the operator The number of adjustments to the more motivational stations has also increased relatively. _, the more the number of woven woven wovens, the more the increase: η is the burden of human M operation. It seems time-consuming and laborious, but also reduces the production efficiency of the machine, and increases the proportion of plague caused by human error. In this regard, the author proposed a new multi-functional coating device to overcome the conventional deficiency. [New Content] 3 M364873 The main purpose of this creation is to provide __ kinds of multi-Wei coating machine, which has a multi-path setting method to change the walking path of the substrate, that is, to form a colloid layer with different effects on the substrate, simplifying the application The grasping process makes the work of the worker simpler and simpler, and reduces the number of adjustments of the machine and saves the working time. In order to achieve the above purpose, the present invention provides a multi-functional coating machine for performing the multi-functional work on a substrate. The coater comprises at least: a conveying device, a coating device and an oven, wherein the conveying device m fixed frame, multiple support members and - recycling rack shouting, can be installed on the substrate and cast along the support member to walk 're-self-sensitive frame _, Na lies, domain (four) constitutes a complex transfer path 'coating device in each __ transfer miscellaneous At least one coating surface is disposed on each of the coating heads, and the coating layer is formed on the substrate, and finally the body layer is baked by the oven connected to the coating device, and the substrate layer is selected and transferred. The path moves, so changing the walking path of the substrate is equivalent to changing the impurity layer formed on the substrate. 'Pre-setting the coating composition or the thickness of the colloid layer in each coating head can be changed in a simple manner, that is, the inspection is easy. Forming a single-material multi-colloid layer on the substrate, or a composite multi-colloid layer, the detailed description of the specific embodiment is accompanied by the accompanying drawings, so that the reviewing committee can more easily understand the purpose and technical content of the creation. Point, and effects of it. [Embodiment] The functional coating device proposed by the present invention is configured to transport the substrate by the transfer path, and the coating surface is provided with a different coating surface for each transfer path, by changing the substrate transfer path. A colloidal layer of different function is formed on the surface of the substrate. Referring first to the drawings, a schematic diagram of a multi-functional coating apparatus of the present creation-embodiment is shown. As shown in the figure of M364873, 'the basic structure of the multi-functional coater 1 includes a box type body, and a conveying device 设置, a coating device 16, an oven 18, an ultraviolet heater 20, and the like disposed inside the body 12. A film processor 22 'This multi-purpose coater! It is used to apply a coating work to a substrate 2. This substrate 2 is exemplified in the present embodiment as a material commonly used for semiconductors, and may be a flexible circuit or a 'plate or copper box LED substrate. Wherein, the conveying device 14 is composed of a fixing frame 142, a plurality of building members 144 and a recovery frame 146, and the fixing frame 142 can be mounted on the substrate 2 in a cylindrical shape, and the substrate 2 is rotated and rotated in a predetermined direction. The reading member 144 is a self-rotating roller for moving the material 2 through the coating device, the oven, the ultraviolet heater Μ, and the film processor 22 'finally' to be recovered by the recovery frame 146. And in particular, the support member 144 forms a divergence in the coating device 16 - the second, third and fourth transfer paths P1, p2, P3, P4 'the substrate 2 is selectively displaceable via one of the paths . In the present embodiment, in order to reduce the cost of the coater i while also having a multi-modal coating change, the coating device 16 is provided with a first coating head at a position different from the first transfer path P1 and the third moving path p3. 16b, the substrate 2 can form a -colloid layer 30 when it passes through the first transfer path Ρι or the third transfer path amp; and secondly, in order to make the coater 1 also 2, the inner surface forms a second colloid layer 40'. Therefore, a coating wheel is used as the second coating head 162, and is disposed on the second transfer path & in a manner to abut against the inner surface of the substrate 2; The three transfer path P3 and the fourth transfer path P4 are disposed at the same position by a nozzle as a third coating head 163, and after the third coating head 163 is further provided with a scraper wheel 164 so that the third transfer path & Or the outer surface of the substrate 2 of the fourth transfer path P4 may form a third colloid layer 5〇, and the surface of the colloid layer 50 is leveled via the doctor blade 164. The biggest advantage of this method is that the gap size of each coating head (6), 162, 163 and the substrate 2 can be preset, and each colloid layer %, 4 〇, % group 5 M364873 is different from each other. The substrate 2 is formed on the surface of the substrate 2 by a different colloidal layer 3Q u because of the difference in the transfer paths pi, p2, pa, and p4. And recognize it. On the tenth, in order to avoid the formation of the two layers, the colloid layer is destroyed due to the mixing of the coatings. The substrate 2 of the Lin embodiment is passed through the third decorative path P# as the outline H coating head (6) and the third coating head 63. It is necessary to install _ infrared preheating m when the first coating head 16 is on the base. When the first colloid layer 30 is formed, the first colloid layer % is first cured by the infrared preheater μ, and then the third colloid layer % is formed on the first colloid layer 3 by the first coating head 163. In this way, it is possible to avoid the destruction of the colloid layer 3〇 and 5G caused by the mixing of the paint. In addition, the I substrate I8 can be used to bake the passed substrate 2, and the colloid layer 30 40, 50 ′ on the substrate 2 is shaped and matched with the arrangement of the oven 18, and the body 12 is provided with two air transition devices (8). The body 12 (10) convects air. The heating of the feed line ^ π depends on the substrate 2 for the completion of the drying operation and then the surface layer 3, *, % of the colloid layer is cured. The thin film processor η can roll-film 6G to be overlaid on the light layers 3(), *, 5() and New Zealand 2 to protect the integrity of the colloidal layer 30, 4G, 5G. Insulator material. In order to more clearly reveal the function of the present coating machine, the following is a description of the flow chart of the second figure, and with the third to sixth riding instructions, the different forms of the application illustrate the spirit of the invention. First, as shown in the second figure and the third figure, the embodiment is a single colloid layer processing mode. At the beginning of step S100, the operator selects the work path in advance in step S11, assuming that the substrate 2 passes the first transfer. The path ρι displacement, when passing through the first coating head (6), as shown in step S21, the outer surface of the substrate 2 will continuously form the first colloid layer 30, followed by step S31, micro-bake through the oven 18, and in step S4 The surface of the colloid layer is cured by the ultraviolet heater 2, M364873, and it is judged whether or not the next cycle operation is performed in the step sm towel. In the single colloid layer processing system, the step S61 is directly performed through the thin film processor η, and the film is protected. The finished substrate 2 is taken up by the recovery rack 146 13 in the step milk, and the operation is terminated in step S2. Referring to the first figure in combination with the fourth figure, it is a single material lamination of the three colloid layer processing method. The finished product diagram ' As shown in steps S11-S41, the substrate 2 also passes through the first transfer path? The 1 displacement 'passes through the first coating layer 161, the first first winning layer, and passes through the oven i8 and the ultraviolet heater 20 to cure 'differently, the step SM judges that the operation must be cycled again, so the selection of the incoming step S71 'passes directly The recovery rack 146 recovers the substrate 2, and through the step S8, the operator relocates the recovered substrate 2 to the fixed frame 142, and repeats the upper course again until finally returning 'in this case' Three times, the surface of the substrate 2 is formed into three first colloid layers 30a, 3〇b, 3〇c', which are protected by the step of attaching the film 6 to the step, and the process proceeds to the step of recovering the processed material, and the operation is terminated in step S200. Next, in conjunction with the fifth figure, the finished product of the surface of the wire material (10) is shown in the following manner, and the steps S11 to S41 are repeated, and the first operation selects the second transfer of the substrate 2 through the second operation.
路徑1>2位移’以在基材2内表面形成_層4〇，一樣在步驟s5i時，選擇 進入執行步称S71至步驟S81，由工作人員將回收架146回收之基材2再次 安置於固定架142上，第二次作業時，依序進行步驟S11〜S7卜不同的是， 該次作業選擇基材2通過第-移送路徑&於外表面形成第—膠體層,或 者通過第四概路嫌外表面形絲三賴層5Q，如此—來，柯輕鬆在 基材2内外表面形成第…第二聰層3()，或第二第三膠體層.. 再來，更舉-複合材料多層加工方法作說明，此處請回顧第—圖，並 配合第六圏所示，特別之處在於’第—次作業時步驟su係通過第一移送 7 M364873 路徑P,，第二次作業時轉S1H系通過第四移送路徑&，而形成基材2外 表面叠積第-膠體層30以及第三膠體層5〇。又或者，在步驟su時，選擇 基材2通過第三移送路徑P3直接在基材2上成型第一膠體層％，經過一步 驟S12由紅外線預熱器24固化第一膠體層3〇表面，隨後在第一膠體層3〇 上再形成第三膠體層50，也具有相同功效。由相關種種說明可以瞭解本創 作發展以及組合性具有多種延伸可能，再舉一例，如第七(&)圖所示之第三 移送路徑不意圖’以及第七〇5)圖之完成品示意圖，倘若原先刮刀輪164位 置取替以-第四塗佈頭165替代，可以得知基材2在通過第三移送路徑& 時，係先形成第-膠體層30 ’接續，由紅外線預熱器％固化第一膠體層 30表面’過來可以選擇由第三塗佈頭163在第一膠體層3〇上形成第三膠體 層50，或者由第四塗佈頭165在第一膝體層3〇上形成第四膠體層％。 綜上所述’可以發現本創作於機體内設置多道移送路徑，搭配基材通 過不同路徑，在其表面即可以形成功效不同膠體層，預先設定好所有路徑 必須的塗料成份以及成型之膠體層厚薄，藉此，工作人員在每段作業結束 後唯的工作’即疋將由回收架(步驟§71)將基材移咖定架(步驟Ski) 上，以及選擇基材行走路徑(步驟S11)。如此一來，使得工作人員作業更為 單純簡單，減少人為調整可能造成產品瑕疵的機率，再者，機台更動調整 次數越少’相對越節省作業時間，更可以提高機台生產效率，且不論是單 -材料或複合材料多膝體層形成作業，本創作都可以彈性靈活應用而製成 多種製品。 此外’上述說明係舉半導體基板作為其中一實施說明，利用本創作之 重點所在’係舉凡在多層膜膠帶或光碟片保護膜等必須應用塗佈技術之製 M3 64873 品上都可以轉化實施。 唯以上所述者’僅為本_之較佳實施_已，並_総定本創作 實施之範圍。故即凡依本創作申請範圍所述之特徵及精神所為之均等變化 或修飾’均應包括於本創作之申請專利範圍内。 【圖式簡單說明】 第一圖為本創作之裝置示意簡圖。 第二圖為本創作之流程圖。 φ 第三圖為本創作單膠體層一較佳實施例之成品示意圖。 第四圖為本創作另一實施例，係在基材上以單一材料層疊三膠體層之成品 示意圖。 第五圖為本創作又一實施例’係在基材内外表面形成膠體層之成品示意圖。 第六圖為本創作再一實施例’複合材料多層加工之實施例成品示意圖。 第七(a)圖係本創作第三移送路徑之另一實施態樣示意圖。 第七(b)圖係為第七(a)圖之成品示意圖。 • 【主要元件符號說明】 2 塗佈機 2 基材 13 機體 14 輸送裝置 142 固定架 144支撐件 146 回收架 P. ' p2' P3 ' P4 第一、第二、第三及第四移送路徑 16 塗佈裴置 M364873 161 第一塗佈頭 162 第二塗佈頭 163 第三塗佈頭 164 刮刀輪 165 第四塗佈頭 30、40、50、70 第一、第二、第三及第四膠體層 18 烘箱 181空氣過濾裝置 20 紫外線加熱器 22 薄膜加工器 60 薄膜 24 紅外線預熱器Path 1 > 2 displacement 'to form a layer 4 在 on the inner surface of the substrate 2, as in step s5i, the process proceeds to step S71 to step S81, and the substrate 2 recovered by the worker from the recovery rack 146 is placed again. On the fixing frame 142, in the second operation, the steps S11 to S7 are sequentially performed. The difference is that the workpiece selection substrate 2 forms the first colloid layer on the outer surface through the first-transfer path & or through the fourth The road surface is suspected to be the outer surface of the wire three layers 5Q, so - come, Ke easily formed on the inner and outer surfaces of the substrate 2 ... the second layer 3 (), or the second layer of the third layer.. Come again, more - For the description of the multi-layer processing method of composite materials, please refer to the first figure and the sixth figure, especially in the case of 'the first operation step su through the first transfer 7 M364873 path P, the second time During the operation, the S1H is passed through the fourth transfer path &, and the outer surface of the substrate 2 is formed to laminate the first colloid layer 30 and the third colloid layer 5〇. Or, in the step su, the substrate 2 is selected to directly form the first colloid layer % on the substrate 2 through the third transfer path P3, and the surface of the first colloid layer 3 is cured by the infrared preheater 24 through a step S12. The third colloid layer 50 is then formed on the first colloid layer 3, which also has the same effect. According to various descriptions, it can be understood that the development of the creation and the combination have multiple extension possibilities, and another example, such as the third transfer path not shown in the seventh (& If the position of the original scraper wheel 164 is replaced by the fourth coating head 165, it can be known that the substrate 2 is formed by the third transfer path & the first colloid layer 30' is formed, and the infrared preheating is performed. The % of the first colloid layer 30 is cured by the third coating head 163 to form a third colloid layer 50 on the first colloid layer 3, or by the fourth coating head 165 in the first knee layer 3 A fourth colloid layer % is formed thereon. In summary, it can be found that the creation of a multi-channel transfer path in the body, with the substrate through different paths, on the surface can form different colloid layers, pre-set all the necessary coating components and the formed colloid layer Thickness, whereby the worker only works after the end of each job, that is, the substrate will be moved from the recovery rack (step § 71), and the substrate walking path is selected (step S11). . In this way, the work of the staff is simpler and simpler, and the possibility of artificially adjusting the product may be reduced. In addition, the fewer the number of adjustments of the machine is, the more the operation time is saved, and the productivity of the machine can be improved. It is a single-material or composite material forming a multi-knee layer. This creation can be flexibly and flexibly applied to produce a variety of products. Further, the above description is directed to a semiconductor substrate as one of the embodiments, and the focus of the present invention can be converted and implemented on a M3 64873 product which is required to apply a coating technique such as a multilayer film tape or a film protection film. Only those mentioned above are only the preferred implementation of this _, and _ 総 范围 范围 。 。 。 。 。 。 。 。 。 。 。 。 。 。 Therefore, any changes or modifications to the characteristics and spirits described in the scope of this application shall be included in the scope of the patent application for this creation. [Simple description of the diagram] The first diagram is a schematic diagram of the device of the creation. The second picture is the flow chart of the creation. φ The third figure is a schematic view of the finished product of a preferred embodiment of the original single colloid layer. The fourth figure is another embodiment of the creation, which is a schematic view of a finished product in which a tricolloid layer is laminated on a substrate in a single material. The fifth drawing is a schematic view of a finished product in which a colloidal layer is formed on the inner and outer surfaces of the substrate. Fig. 6 is a schematic view showing the finished product of the embodiment of the multilayer processing of the composite material. The seventh (a) diagram is a schematic diagram of another embodiment of the third transfer path of the present creation. The seventh (b) diagram is a schematic diagram of the finished product of the seventh (a) diagram. • [Main component symbol description] 2 Coater 2 Substrate 13 Body 14 Conveying device 142 Fixing frame 144 Support 146 Recycling rack P. ' p2' P3 ' P4 First, second, third and fourth transfer paths 16 Coating device M364873 161 first coating head 162 second coating head 163 third coating head 164 scraper wheel 165 fourth coating head 30, 40, 50, 70 first, second, third and fourth Colloid layer 18 Oven 181 Air filter unit 20 Ultraviolet heater 22 Thin film processor 60 Film 24 Infrared preheater