M359750 五、新型說明： 【新型所屬之技術領域】 本創作係有關-種透明基板之圖案化透— 膜’旨在提供-種可應用於觸控面板中之圖案 = 溥膜。 4彳€ 【先前技術】 按’近年來，感觸式之人機介面，如：觸控面板 Panel)，已被廣泛地應用至各式各樣之電子產品中，如. 全球定位系統（GPS)、個人數位助理（PDA)、行動電0話 (cellular phone)及掌上型電腦（Handheid 等以取 代傳統之輸入裝置（如：鍵盤及滑鼠等），此一設計上之 幅=變’不僅提昇了該等電子裝置之人機介面親和性，更 因’略了傳統輸人裝置，而騰出更多空間，供安裝大型顯 不面板’方便使用者瀏覽資料。 ‘、 傳統上，觸控面板所使用之觸控技術，依其作動原理 之不同雖可分為光學$、超音波式、紅外線式、電容式 及電阻式等數種，惟，目前仍以電阻式（FUm⑽ 之觸控技術，最被廣泛應用於各式終端產品上，參閱第一 S所示乃傳統電阻式觸控面板，該種觸控面板係採用電壓 偵測方式感應，包括一彼覆有氧化銦錫（IT〇)導電層1〇1之 透明導電玻璃（ITO Glass)10及一由氧化銦錫（ΙΤ0)材料 2〇1製成之透明導電薄膜（IT〇 Film)2〇，其中該透明導電 玻螭10及透明導電薄膜2〇上，係利用網版印刷技術，將 M359750 銀膠(Sllver paste)分別印刷至各該 =物2〇上鄰近其邊緣之位置，以形二= 二，：’再於各該線路11及21上依序形成-絕 „ " .t 接者層13、23，並在該透明導電玻璃10 及透明導電薄膜？ n p弓罢λ V击，， _ '間置人讀侧隔制之間隔點（d〇t 211後艮/各該線路11及21上置入軟性排，線111及 另、# P可稭各該接著層13、23,將該透明導電玻璃10 、：=i臈20，合成—體’製作出所需之觸控面板。 薄膜2 0上之某其他介質直接碰觸該透明導電 該透明導電破璃10开^之透明導電薄膜2〇將與 兩 7成電軋上之導通，並在對應位置產生 2^ 板之控制電路即根據由該等軟性排線111及 計算出:===測到之不同電位差，進-步 標位置上顯值，並在該觸控面板之對應座 配 σ冑統之電阻式觸控面板根據其線路之不同 配線型i I ΐ可分為四線（4 、五線或六線等不同之 苴觸批'炫以五線式觸控面板為例，參閱第二圖所示， 基方向之四條線路，均係佈設在玻璃 ^ ν電層上鄰近其周邊，而其透明導電薄膜上則 來檢測(一軸之電壓值， 點位置_、、，"使用者以手指或筆觸碰該觸控面板上p 條線路璃基板之透明導電層上之兩 處於接地狀^心#之电源’亚令另二條線路4及5 、狀4(仰_’即電壓等於零），此時，觸碰位置 M359750 因阻抗發生變化，將產生壓降，令該透明導電薄膜上之線 " 路可取樣到Vpy之電壓值，反之，當控制電路對該玻璃基 '板之透明導電層上之兩條線路2及4供應5伏特之電源， ; 並令另二條線路1及5處於接地狀態（ground，即電壓等於 零）時，該透明導電薄膜上之線路將取樣到Vpx之電壓值， 該等Vpx及Vpy之電壓值經由控制電路之計算比對後，即 可迅速得知該P點所在之座標位置。 . 目前製作透明導電玻璃的方法仍以傳統的黃光微影 • 蝕刻技術為主流，如第三圖所示，其製作流程是於一透明 玻璃14上濺鍍一層透明導電層15,再舖設一光阻層91於 該透明導電層15上，其次將一繪製有圖案921之光罩92 設置於該光阻層91上方，經由紫外線照射，未被圖案921 遮蔽之光阻層91發生化學變化，利用顯影液將產生化學變 化的光阻層91清洗去除，而使部分不設置圖案921之透明 導電層15裸露在外，也使得光罩92上的圖案921轉移到 該光阻層91上，再蝕刻裸露之透明導電層15，最後將該 • 光阻層91完全清除，即形成具有圖案化之透明導電玻璃 10 ° 上述黃光微影製法不僅所需的設備昂貴，所用之光阻 •層71的成分及顯影液均為對人體有害之化學溶液，不但對 •現場之操作人員的健康造成嚴重的影響，也對環境生態造 成嚴重的污染。以顯影液清除產生化學變化之光阻層71 時，如浸泡清洗時間過長，會使轉印於該光阻層71上之圖 案721脫離或分解，降低生產良率。 M359750 【新型内容】 有鑑於此，本創作之φ i a a& -^ 要目的楗供一種透明基板尤其 •制於觸控面板中之圖案化透明導電薄膜。 達上爲目的’本創作之透明基板設置有油案化透明 該透明導電薄膜係藉由-可重複使用之遮罩上 鏤空之圖㈣’並將該鮮設置於透明基板上並進 ^賤錢或蒸錢，將導電材均勻附著堆積在—透明基板上， /作之圖案化透明導電薄膜，不僅製程簡便且本創 心中完全不需要利用液體處理，而為乾式製程，可改 又白有利用黃光製程會產生廢液嚴重污染環境之缺失。 【實施方式】 ^創作之特點’可參閱本案圖式及實施例之詳細說明 而獲得清楚地瞭解。 本創作「透明基板之圖案化透明導電薄膜及觸控面板」 1四圖所示’該透明基板4〇上設置有圖案化透明導電薄 獏42 ’ 5亥透明基板4〇可以為玻璃基板、ρΕτ、％、pa或 左克力材質’而該透明導電薄膜42係利用一可重複使用之 <罩50缝或蒸鑛構成，請同時參閱第五圖所示其係以滅 —為例忒遮罩50可以為金屬材質係設有一不銹鋼片，並 错:機械加工方式（例如雷射成型），於該遮罩50上形成有 鎮空圖案區5卜將該遮罩50設置於透明基板40上方，藉 由濺鍍可將導電材【可以為銦錫氧化物⑽）或透明導電^ 化物（TCO)】均勻附著堆積於該透明基板4〇表面而形 案化透明導電薄膜42。 M359750 而本創作之透明基板係應用於觸控面板中，如第六圖 ^ 所示，該觸控面板結構至少包括有：一第一透明導電板60、 ' 一第二透明導電板70，以及若干間隔球80 ;其中： : 該第一透明導’電板60，其設有一第一透明基板6i，該 第一透明基板61可以為玻璃基板、PET、PC或壓克力等材 質，該第一透明基板61上並設置有圖案化第一透明導電薄 - 膜62，而該第一透明導電薄膜62係利用一可重複使用之遮 - 罩濺鍍或蒸鍍構成，而該第一透明基板61及第一透明導電 • 薄膜62表面並設有（亦可藉由一遮罩濺鍍或蒸鍍構成）第一 線路63，該第一線路63上依序形成一第一絕緣層64及一第 一接著層65 ;且該第一透明導電板60的外層板面進一步建 構一硬化塗層6 6，以增加觸控面板之防刮能力； 該第二透明導電板70，其設有一第二透明基板71，該 第二透明基板70可以為玻璃基板、PET、PC、PIC或壓克力 材質，該第二透明基板71上設置有圖案化第二透明導電薄 膜72，而該第二透明導電薄膜72係利用一可重複使用之遮 • 罩濺鍍或蒸鍍構成，而該第二透明基板71及第二透明導電 薄膜72表面並設有（亦可藉由一可重複使用之遮罩濺鍍或 蒸鍍構成）第二線路7 3，該第二線路7 3上依序形成一第二絕 -緣層74及一第二接著層75; 至於，該若干隔球80係設於該第一、第二透明導電板 60、70之間，用以將第一、第二透明導電板60、70區隔。 其中，各第一、第二透明導電薄膜62、72係藉由一可 重複使用之遮罩濺鍍或蒸鍍一次成型於該第一、第二透明 基板61、71上，不僅簡化習有黃光製程中繁複之步驟，且 M359750 ^率較高’而光學顯影技術可能因曝光時間或浸泡顯影液 •日寸間過長而產生圖案不清或脫離之瑕疵品，且本創作中完 '全不需要利用液體處理，可改良習有利用黃光製程會產生 : 廢液嚴重污染環境之缺失。 曰 •、综上所述，本創作提供透明基板一較佳可行之圖案化 透明導電薄膜’爰依法提呈新型專利之申請；本創作之技 術内容及技術特點已揭示如上，然而熟悉本項技術之人士 •仍可能基於本創作之揭示而作各種不㈣本案創作精神之 馨替換及修飾。因此，本創作之保護範圍應不限於實施例所 揭示者’而應包括各種不背離本創作之替換及修娜，並為 以下之申請專利範圍所涵蓋。 【圖式簡單說明】 第一圖係為習用觸控面板之結構分解圖。 第二圖係為f用觸控面板結構中導電玻璃及透明導電 溥膜之平面示意圖。 第二圖係為習有黃光製程之流程示意圖。 第四圖係為本創作中透明導電板之結構立體圖。 第五圖係為本創作中透明基板與遮罩之結構示意圖。 第六圖係為本創作中觸控面板之結構分解圖。 M359750M359750 V. New Description: [New Technology Field] This creation is about the pattern-transparent film of transparent substrate. It is intended to provide a pattern that can be applied to touch panels = enamel film. 4彳€ [Prior Art] According to 'in recent years, the touch-sensitive human interface, such as: touch panel Panel, has been widely used in a variety of electronic products, such as. Global Positioning System (GPS) Personal digital assistant (PDA), cellular phone and palmtop computer (Handheid to replace traditional input devices (such as keyboard and mouse), this design is not only improved The human-machine interface affinity of these electronic devices is more due to the fact that the traditional input device is used to free up more space for installing large display panels to facilitate users to browse data. 'Traditionally, touch panels The touch technology used can be divided into optical $, ultrasonic, infrared, capacitive and resistive, depending on the principle of its operation. However, it is still resistive (FUm (10) touch technology. The most widely used in various terminal products, as shown in the first S, is a conventional resistive touch panel. The touch panel is sensed by voltage detection, including one covered with indium tin oxide (IT〇). Transparent of conductive layer 1〇1 Conductive glass (ITO Glass) 10 and a transparent conductive film (IT〇Film) made of indium tin oxide (ITO) material 2〇1, wherein the transparent conductive glass 10 and the transparent conductive film 2 are Using screen printing technology, M359750 silver glue (Sllver paste) is separately printed onto each of the objects 2 邻近 adjacent to the edge thereof, to form two = two,: 'and then sequentially formed on each of the lines 11 and 21 - „ & & . 接 层 13 13 13 13 13 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明 透明211 艮 / each of the lines 11 and 21 is placed in a soft row, the line 111 and the other, # P can be straw each of the layers 13, 23, the transparent conductive glass 10,: = i 臈 20, synthetic body ' Making the required touch panel. Some other medium on the film 20 directly touches the transparent conductive conductive transparent conductive glass 10, and the transparent conductive film 2〇 will be electrically connected with the two 70%, and The control circuit for generating the 2^ board corresponding to the position is based on the different potential differences measured by the soft line 111 and calculated: ===, the step-by-step position The upper display value and the resistive touch panel of the corresponding touch panel of the touch panel can be divided into four lines according to the different wiring type i I of the line (4, five or six lines, etc.) For example, referring to the second figure, the four lines in the base direction are arranged on the glass layer adjacent to the periphery of the glass layer, and the transparent conductive film is used for detection. (The voltage value of one axis, the position of the point _, ,, " the user touches the two transparent conductive layers of the p-line glass substrate on the touch panel with a finger or a pen. Two lines 4 and 5, shape 4 (upward _' is the voltage equal to zero), at this time, the touch position M359750 will change the impedance, a pressure drop will occur, so that the line on the transparent conductive film can be sampled to Vpy Voltage value, conversely, when the control circuit supplies 5 volts of power to the two lines 2 and 4 on the transparent conductive layer of the glass-based board; and the other two lines 1 and 5 are grounded (ground, ie, the voltage is equal to zero When the line on the transparent conductive film is sampled to Vpx The voltage value, after the voltage values of the Vpx and Vpy are compared by the calculation of the control circuit, the coordinate position of the P point can be quickly known. At present, the method of making transparent conductive glass is still dominated by the traditional yellow lithography and etching technology. As shown in the third figure, the manufacturing process is to deposit a transparent conductive layer 15 on a transparent glass 14, and then lay a photoresist. The layer 91 is disposed on the transparent conductive layer 15, and a photomask 92 on which the pattern 921 is drawn is disposed on the photoresist layer 91. The photoresist layer 91 not shielded by the pattern 921 is chemically changed by ultraviolet irradiation, and is developed. The liquid removes the chemically changed photoresist layer 91, and partially exposes the transparent conductive layer 15 not provided with the pattern 921, and also transfers the pattern 921 on the mask 92 to the photoresist layer 91, and then etches the exposed The transparent conductive layer 15 is finally completely removed from the photoresist layer 91 to form a patterned transparent conductive glass 10 °. The above-mentioned yellow light micro-shaping method requires not only expensive equipment, but also the composition and developer of the photoresist layer 71 used. They are all chemical solutions harmful to the human body, which not only have a serious impact on the health of the operators on the site, but also cause serious pollution to the environment and ecology. When the photoresist layer 71 which chemically changes is removed by the developer, if the immersion cleaning time is too long, the pattern 721 transferred onto the photoresist layer 71 is detached or decomposed, and the production yield is lowered. M359750 [New Content] In view of this, the φ i a a & -^ of this creation is intended for a transparent substrate, especially a patterned transparent conductive film made in a touch panel. For the purpose of the purpose of the 'transparent substrate of the creation is provided with oil-transparent transparent transparent conductive film by means of - reusable mask on the hollow map (4) 'and set the fresh on the transparent substrate and into the money or Steaming the money, the conductive material is evenly deposited on the transparent substrate, and the patterned transparent conductive film is not only simple in process, but also does not require liquid treatment in the original heart, but is a dry process, which can be changed and used in yellow. The light process will produce a lack of serious environmental pollution. [Embodiment] The characteristics of the creation can be clearly understood by referring to the detailed description of the drawings and the examples. The present invention "patterned transparent conductive film and touch panel of transparent substrate" is shown in Fig. 1 'The transparent substrate 4 is provided with a patterned transparent conductive thin layer 42'. The transparent substrate 4 can be a glass substrate, ρΕτ , %, pa or 克克力材料' and the transparent conductive film 42 is formed by a reusable <cover 50 seam or steamed ore, please also refer to the fifth figure to show that it is off - for example The cover 50 may be provided with a stainless steel piece in a metal material, and wrongly: a mechanical processing method (for example, laser forming), an air-emptive pattern area 5 is formed on the mask 50, and the mask 50 is disposed above the transparent substrate 40. The transparent conductive film 42 can be formed by uniformly depositing a conductive material (which may be indium tin oxide (10)) or a transparent conductive compound (TCO) on the surface of the transparent substrate 4 by sputtering. M359750 and the transparent substrate of the present invention is applied to a touch panel. As shown in FIG. 6 , the touch panel structure includes at least: a first transparent conductive plate 60, a second transparent conductive plate 70, and a plurality of spacer balls 80; wherein: the first transparent conductive plate 60 is provided with a first transparent substrate 6i, and the first transparent substrate 61 may be a glass substrate, PET, PC or acrylic material, etc. A transparent substrate 61 is provided with a patterned first transparent conductive thin film 62, and the first transparent conductive film 62 is formed by a reusable mask-sputtering or evaporation, and the first transparent substrate And a surface of the first transparent conductive film 62 (which may also be formed by sputtering or vapor deposition), the first line 63 is sequentially formed with a first insulating layer 64 and a first line 63. a first adhesive layer 65 is further formed on the outer surface of the first transparent conductive plate 60 to increase the scratch resistance of the touch panel; the second transparent conductive plate 70 is provided with a second a transparent substrate 71, which may be a glass substrate, PET, PC, PIC or acrylic material, the second transparent substrate 71 is provided with a patterned second transparent conductive film 72, and the second transparent conductive film 72 is sputtered by a reusable mask or The second transparent substrate 71 and the second transparent conductive film 72 are provided on the surface of the second transparent substrate 71 and the second transparent conductive film 72 (which may also be formed by a reusable mask sputtering or evaporation), the second line 73, the second A second insulating layer 74 and a second bonding layer 75 are sequentially formed on the line 7.3; and the plurality of spacers 80 are disposed between the first and second transparent conductive plates 60 and 70 for The first and second transparent conductive plates 60, 70 are separated. The first and second transparent conductive films 62 and 72 are formed on the first and second transparent substrates 61 and 71 by sputtering or vapor deposition of a reusable mask, which not only simplifies the habit of yellowing. The complicated steps in the light process, and the M359750 ^ rate is higher', and the optical development technology may result in unclear or detached products due to the exposure time or the immersion developer/day interval, and the whole process is finished. There is no need to use liquid treatment, which can improve the use of yellow light process to produce: The waste liquid seriously pollutes the environment.曰•, In summary, the creation provides a transparent substrate, a preferably feasible patterned transparent conductive film, 申请 application for new patents according to law; the technical content and technical features of the creation have been disclosed above, but familiar with the technology People • It is still possible to make various substitutions and modifications based on the disclosure of this creation. Therefore, the scope of protection of this creation should not be limited to those disclosed in the examples, and should include various alternatives and modifications that do not depart from the present invention and are covered by the following patent application. [Simple description of the drawing] The first figure is an exploded view of the structure of the conventional touch panel. The second figure is a schematic plan view of the conductive glass and the transparent conductive ruthenium film in the touch panel structure of f. The second picture is a schematic diagram of the process of Xiyou Huangguang process. The fourth figure is a perspective view of the structure of the transparent conductive plate in the creation. The fifth figure is a schematic diagram of the structure of the transparent substrate and the mask in the present creation. The sixth figure is an exploded view of the structure of the touch panel in the present creation. M359750
【主要元件符號說明】 透明導電玻璃1〇 氧化銦錫導電層101 線路11 軟性排線111 絕緣層12 接著層13 透明玻璃14 透明導電層15 透明導電薄膜20 氧化銦錫材料201 線路21 軟性排線211 絕緣層22 接著層23 間隔點30 透明基板4 0 透明導電薄膜42 遮罩50 圖案區51 第一透明導電板60 第一透明基板61 第一透明導電薄膜62 第一線路63 第一絕緣層6 4 第一接著層65 硬化塗層66 第二透明導電板70 第二透明導電薄膜72 第二線路73 第二絕緣層74 第二接著層75 隔球80 光阻層91 光罩92 圖案921 9[Main component symbol description] Transparent conductive glass 1〇 Indium tin oxide conductive layer 101 Line 11 Flexible cable 111 Insulation layer 12 Next layer 13 Transparent glass 14 Transparent conductive layer 15 Transparent conductive film 20 Indium tin oxide material 201 Line 21 Flexible cable 211 Insulation layer 22 Next layer 23 Spacer 30 Transparent substrate 40 Transparent conductive film 42 Mask 50 Pattern area 51 First transparent conductive plate 60 First transparent substrate 61 First transparent conductive film 62 First line 63 First insulating layer 6 4 First adhesive layer 65 hardened coating 66 second transparent conductive plate 70 second transparent conductive film 72 second line 73 second insulating layer 74 second adhesive layer 75 spacer 80 photoresist layer 91 photomask 92 pattern 921 9