TWM328072U - Reuse apparatus for recycling etching indium waste liquid - Google Patents

Reuse apparatus for recycling etching indium waste liquid Download PDF

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TWM328072U
TWM328072U TW96215597U TW96215597U TWM328072U TW M328072 U TWM328072 U TW M328072U TW 96215597 U TW96215597 U TW 96215597U TW 96215597 U TW96215597 U TW 96215597U TW M328072 U TWM328072 U TW M328072U
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Taiwan
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indium
liquid
waste
acid
extraction
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TW96215597U
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Chinese (zh)
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Ting-Che Hsiao
Jun-Yi Wu
Wei-Sheng Chen
Min-Shing Tsai
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Univ Nat Cheng Kung
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Priority to TW96215597U priority Critical patent/TWM328072U/en
Publication of TWM328072U publication Critical patent/TWM328072U/en

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M328072 八、新型說明: 【新型所屬之技術領域】 本創作係有關於一種回收蝕刻廢銦液再利用裝置,特別係指 光電業中與太陽能產業中蝕刻廢銦液的回收銦與錫^有價金屬 再利用裝置。其主要係將廢棄之侧銦液,藉由本裝置進行驗 濃集、固液分離、酸溶、溶媒萃取與反萃取等步驟處理後,不僅 將錫與銦完全分離及回收高價值之銦與錫金屬,除能回收有價金 屬,更可以避免蝕刻廢錮液對環境所造成的污染問題,達到環 保、資源再生與經濟等多重效益。 【先前技術】 TFT-LCD廠主要製程包含在玻璃基板上製作「薄膜電晶 體」(亦稱A—)製程、液晶灌邮板(CeU)製程以及模組化(M〇duie) 製程等二個製程。其巾「薄膜電晶體」製程^tft_lcd之最主 要技術,其原理係在玻璃基板上利用導電體塗佈、微影照相及曝 光顯像等之齡技術,製作出所需之「電極基板」,做為傳遞訊 號、電壓控制之元件,有關其製程說明如下: (A) 將玻璃基板人料清洗後,其上塗佈「蝴」薄膜,乾材原料 為金屬或半導體薄膜(如氧化銦錫,ITO),做為導電電路基材。 (B) 刖逑細上均勻塗佈「光阻」,糊已微影照相完成之「光罩」 進行曝光,當完成曝光、顯像工程後即獲得所需導電線路。 (C) 利用「蝕刻液」將不需要之金屬或半導體膜去除,僅留下光阻 所保護之導、電線路膜,再利用「剝離液」將表面光阻去除後, M328072 金屬或半導體之導電線路膜即可成型。 ⑼重覆前述之薄膜形成、光阻塗佈、曝光、顯像、烟、光阻 剝膜等程序約5〜8次(分別針對各層金屬或半導體膜)後,即可 完成薄膜電晶體之電極基板(或稱Higy。 完成電極基板的製作後,塗上黏著劑及Photo Spacer,注入 液晶材料’與彩色濾、光片對組’經過裂片與切割後貼附偏光片, 最後加上背光源、裝上驅動1(:等,即完成1^丁_1^1)。 汀〇,中文名稱為氧化銦鍚,是indiumtin〇xide縮寫,或譯 為tm-d〇ped indium oxide,即依不同產品要求,在(in州加入約 10%的(Sn〇2),炼點,密度 7,12〇_7,職咖3。肋 具有可見光透過率95%以上、紫外線吸收輪裏、對微波衰減 率欲%、導電和加卫性能良好、膜層既耐磨又魏學腐辦優 點,作為透明導電膜已獲得廣泛應用。 精礦冶煉和高溫煉鐵過程中,銦金屬依其行為與走向不同, 會在某些生產㈣和中間產品或副產品中得到富集,成為提鋼的 主要原料,如爐渣、浸出渣、溶液、煙塵、合金和陽極泥等,一 叙的銦金屬取得來源都是由提煉鋅礦後的紐巾轉並純化。此 卜由I□的再生資源回收再生銦已逐漸成為銦的主要供應源。用在 半導體等電子產業,則需要純化至4]^(9999%);若是要用在汀〇 革材或CIS/CIGS電池吸收板,純度則需達到6N (99.9999%)。 目所銦材料最大的應用為ITO靶材,主要是用在液晶平面透明導 甩層的塗佈’佔所有銦材料的七成,而太陽能電池的透明導電氧 M328072 化物亦W使用ITO,銦在低炫點合金的應用也很廣泛,尤其曰 HoHS a後’含銦之無鱗錫的市場也逐漸成長。M328072 VIII. New Description: [New Technology Field] This creation department is about recycling and recycling waste indium liquid recycling equipment, especially the recycling of indium and tin in the photovoltaic industry and the solar industry. Reuse the device. It mainly treats the waste side indium solution, and after the device is subjected to the steps of concentration concentration, solid-liquid separation, acid solution, solvent extraction and back extraction, not only the tin and indium are completely separated and the high-value indium and tin are recovered. Metal, in addition to the recovery of valuable metals, can avoid the pollution caused by etching waste sputum to the environment, and achieve multiple benefits such as environmental protection, resource regeneration and economy. [Prior Art] The main process of the TFT-LCD factory consists of making a "thin film transistor" (also known as A-) process, a liquid crystal engraving plate (CeU) process, and a modular (M〇duie) process on a glass substrate. Process. The main technology of the film "film transistor" process ^tft_lcd, the principle is to use the age of the conductor coating, lithography and exposure imaging on the glass substrate to create the required "electrode substrate", As a component for transmitting signals and voltage control, the process descriptions are as follows: (A) After cleaning the glass substrate, the film is coated with a "butterfly" film, and the dry material is a metal or semiconductor film (such as indium tin oxide, ITO) as a conductive circuit substrate. (B) Evenly apply "resistance" on the enamel, and the paste is immersed in the "mask" for photo exposure. When the exposure and development projects are completed, the desired conductive lines are obtained. (C) Use the "etching solution" to remove the unnecessary metal or semiconductor film, leaving only the conductive and electrical circuit film protected by the photoresist, and then removing the surface photoresist with the "peeling liquid", and then conducting the metal or semiconductor of M328072. The circuit film can be formed. (9) After repeating the above-mentioned film formation, photoresist coating, exposure, development, smoke, photoresist stripping, etc., about 5 to 8 times (for each layer of metal or semiconductor film), the electrode of the thin film transistor can be completed. Substrate (or Higy. After the electrode substrate is fabricated, apply adhesive and Photo Spacer, inject liquid crystal material and color filter, light film pair group) after cleavage and cutting, attach polarizer, and finally add backlight, Install the driver 1 (: etc., that is, complete 1 ^ Ding_1^1). Ting Yu, Chinese name is indium oxide 钖, is the abbreviation of indiumtin〇xide, or translated as tm-d〇ped indium oxide, that is, according to different products Requirements, in the state of about 10% (Sn〇2), refining point, density 7,12 〇 _7, professional coffee 3. The rib has a visible light transmittance of 95% or more, ultraviolet absorption wheel, microwave attenuation rate As a transparent conductive film, it has been widely used as a transparent conductive film with good conductivity, good electrical conductivity and good performance, and the film is both wear-resistant and Wei Xue. In the process of concentrate smelting and high-temperature iron making, indium metal has different behaviors and trends. Will be enriched in certain production (four) and intermediate products or by-products, It becomes the main raw material of the steel, such as slag, leaching slag, solution, soot, alloy and anode mud. The source of the indium metal is all converted and purified by the towel after the zinc ore is extracted. Regeneration of recycled indium has gradually become the main source of indium. Used in electronics industries such as semiconductors, it needs to be purified to 4]^(9999%); if it is to be used in Tingzhi leather or CIS/CIGS battery absorption plate, purity It is required to reach 6N (99.9999%). The largest application of indium material in the target is ITO target, which is mainly used in the coating of liquid crystal plane transparent conductive layer, accounting for 70% of all indium materials, and the transparent conductive oxygen of solar cells. M328072 is also made of ITO. Indium is also widely used in low-focus alloys. Especially after HoHS a, the market for indium-free scale-free tin has also grown.

為心屬’但锡錠因表面形成氧化物薄膜而成珍珠 色=的理性貝特點是炫點較低而沸點較高,展性好而延性 差^為’錫在空氣中能在表面形成緻密的氧化物薄膜而阻止 錫_魏’所以可崎軸軸鐵。溫度高於_錫開始緩 乳化生成SnO和Sn〇2。溫度升高雜溶解微量魏,在織熱 喊溫下,錫能迅速氧化揮發,錫在常溫下與水、水蒸氣和4 化碳無作用。但在高溫下(.高於喊)錫能分解水蒸氣,也能 被二氧化碳氧化成Sn〇2。 .目岫國内TFT-LCD廠中製程的關鍵材料—半導體薄膜 (ITO) ’在飯刻方面,大部分以酸性螯合液進行,並未再針對此一 ITO蝕刻液進行回收金屬銦,普遍將之排放至廢水處理廠進行處 理,此舉不但增加廢棄物處理的困擾,對於流放的金屬銦與錫, 也實屬可惜。 本創作人因鑑於習知ITO蝕刻液未進行回收金屬銦及造 成廢棄物處理困擾之缺失,乃潛心研究改革之道,並憑藉本身♦ 之專業及多年來的工作經驗,加上歷經數次的試驗修正與改進 後,終於首創出本創作。 【新型内容】 本創作主要係在提供廢棄之蝕刻銦液經由鹼濃集與固液分離 銦與錫,不但能回收有價金屬,更可以免除蝕刻廢銦液對環境所 7 M328072 造成的π染問題,達到環保、資源與經濟等多重效益。 其係由侧廢銦液儲存槽、固齡離機過濃集反應槽、酸 '☆反應槽、祕林反應塔、反萃取反應塔與D2EHPA萃取劑儲 存槽所構成。其中蝕刻廢銦液儲存槽^ .^液分離機,係過濾舰中的雜質,絲為廢氧化賴液體;驗 濃集反應槽,係於槽内_控_與流量計添加適量之氫氧化納 /今液並進行鹼滚集反應’調整槽中的pH值,形成氫氧化細體沈 •,殿物與含錫液;酸溶反應槽,將氫氧化銦固體沈殿物置於酸溶反 應槽’利驗伽與流量計添加之雜溶雜作並進行加熱 私序與I谷反應’械含峨液;溶鮮取反應塔具有混合區與 分離區二部分,水相與油相兩流體則以逆向流方式經過萃取反應 ’在混合區相遇後’經由高賴拌加以混合,使得溶質在兩相中 分_到平衡後,進入分離區靜置分離,因此係針對溶媒萃取反 應塔進行萃取參數’包括溶出液pH值、溶媒濃度、振細率、接 ^冑㈣與油水體積比之各項參數蚊’將酸溶後的含峨液之水 相溶液,藉由油相D2EHPA萃取舰行高賴拌之最佳萃取反應 ^待反應完後,會產生廢水與含銦之油相(有機相)溶液,將標的物 濃集至油相中之反應;反萃取反應塔,係針對溶媒萃取後之含铜 油相以酸劑(石肖酸、鹽酸、硫酸)進行反萃取,得到精練的石肖酸鋼、 氯化銦與硫酸銦反萃取水相濃縮液,其反萃取效率達鄕以上; D2EHPA萃取·储,供絲mEHpA萃取顺經反萃取反應 後之D2EHPA回收液。 8 M328072 【實施方式】 有關本創作為達上述之使用目的與功效, ,兹舉出較佳可行之實施例,並配合圖式所示^之技術手段 ’請參閱1^涵主涵^【先 固液分離機⑴20、鹼濃集反應槽3〇、固液分離機(2)2卜㉟、六 槽(1)40、酸溶反應槽(2)4卜固液分離機⑶以 〜合反應 ^ c ^ 杲个取反應塔50 、反卒取反應塔60與D2EHPA萃取劑儲存槽7〇所構成。其中蝕 刻廢錮液贿槽1G,係供暫存廢侧峨之用;固液分離^⑴^ ,係與蝕刻廢銦液儲存槽連接,能過濾含銦廢液中雜質,濾、夜為 廢氧化銦舰體;驗濃減賴3Q,倾固齡_(⑽連接、、、’ 並於槽_職糊錢料添加魅讀氧灿雜進行驗濃 集反應,可調整槽中的pH值,形成氫氧化銦固體沈厥物與含^ ;固液分離機(2)21,其係與鹼濃集反應槽3〇連接,能強制進行氡 氧化銦固體沈澱物與含錫液之分離,以利後續處理;酸溶反應槽 (1)40其與固液分離機(2)21連接,係將氫氧化铜固體沈;殿物利用 控制閥與流量計添加適量之硫酸溶液操作並進行加熱程序與酸溶 反應,形成含銦濾液;酸溶反應槽(2)41,係與固液分離機(2)21連 接,可將含錫液利用控制閥與流量計添加適量之硫酸溶液操作並 進行加熱程序與酸溶反應,形成氫氧化錫沈澱物;固液分離機(3)22 ,其與酸溶反應槽(2)41連接,係強制進行氫氧化錫固體沈澱物與 濾液之分離,以形成含錫產物;溶媒萃取反應塔5〇,則與酸溶反 應槽(1)40、反萃取反應塔60和D2EHPA萃取劑儲存槽70連接, 9 M328072 反應塔包含數崎浦、數個控綱、數個微滅量計、數個隔板 及數個高賴拌器,控糊與微動流量計適#赃油相與水 相之流量至萃取反絲’並㈣溶後的含銦水相溶液,藉由油相 D2EHPA萃取舰行高顧拌之最料取參數反應,包括溶出液 pH值、溶媒濃度、振盪頻率、接觸時間肖油水體積比之各項參數 設定,待萃取反應完後,會產生廢水與含細相(有機相)溶液;反 十取反應^ 60 ’係與洛媒卒取反應塔5Q和萃取劑儲存 才曰70連接,其針對喊萃取後之含銦油相赠硝酸、稀鹽酸、稀 夂進行反萃取反應’得到精煉的《肖酸銦、氯化銦、硫酸麵反萃 取水減縮液,其反萃取效率達_以上,反萃取後的含姻反萃 取溶液已符合專麵金屬資騎翁之規格要求,*且反萃取後 的油相D2EHPA萃取劑可回收再利用;D2EHpA萃取劑错存槽 50之油相進料口與反萃取反應塔6〇之油相出料口 _,供存放與时咖聰萃連胁觸萃取反應塔 儲存槽10、驗濃集反應槽30、酸溶反應槽4〇 50、反萃敗斤廄权:An如rXAmh , u 口 ;而蝕刻廢銦液 ^谷媒卒取反應塔 7〇皆使用耐衝擊 、反萃取反應塔6〇與咖脆萃取劑儲存槽For the heart of the 'but tin ingots due to the formation of oxide film on the surface of the pearl color = rational shell characteristics are lower point and higher boiling point, good ductility and poor ductility ^ for tin in the air can form a dense surface The oxide film prevents the tin _Wei' so it can be a shaft axis iron. The temperature is higher than _ tin starts to emulsifie to form SnO and Sn〇2. When the temperature rises, the miscellaneous amount of Wei is dissolved. Under the temperature of the weaving heat, the tin can be rapidly oxidized and volatilized. The tin has no effect on water, water vapor and carbonized carbon at normal temperature. However, at high temperatures (higher than shouting), tin can decompose water vapor and can also be oxidized by carbon dioxide to Sn〇2. The key material for the process in the domestic TFT-LCD factory, the semiconductor film (ITO), is mostly carried out with acid chelating solution in the case of rice cooking. It is not used to recover metal indium for this ITO etching solution. Discharging it into a wastewater treatment plant for treatment, which not only increases the trouble of waste disposal, but also is a pity for the metal indium and tin that are discharged. The creator has devoted himself to researching reforms because of the lack of recycling of metal indium and the waste disposal problems caused by the conventional ITO etching solution, and with its own professional and years of work experience, plus several times. After the trial correction and improvement, I finally created this creation. [New content] This creation mainly provides the separation of indium and tin by the concentrated concentration and in-liquid separation of indium in the waste, which not only can recover valuable metals, but also eliminate the problem of π dyeing caused by etching waste indium liquid to the environment 7 M328072. To achieve multiple benefits such as environmental protection, resources and economy. The utility model comprises a side waste indium liquid storage tank, a solid age off-concentration reaction tank, an acid '☆ reaction tank, a secret forest reaction tower, a stripping reaction tower and a D2EHPA extractant storage tank. The etching waste indium liquid storage tank ^ . ^ liquid separator, is the filter ship impurities, the wire is waste oxidation liquid; the concentration of the reaction tank, in the tank _ control _ and flow meter add an appropriate amount of sodium hydroxide / The current solution and the alkali roll-collecting reaction 'adjust the pH value in the tank to form the oxidized fine body sinking ·, the temple and the tin-containing liquid; the acid-soluble reaction tank, the indium hydroxide solid sediment in the acid-soluble reaction tank'验 伽 与 与 与 与 与 与 与 与 与 与 与 与 与 与 与 与 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计 流量计The flow mode is mixed by the extraction reaction 'after the mixing zone meets', and the solute is mixed in the two phases to be equilibrated, and then enters the separation zone for static separation. Therefore, the extraction parameters for the solvent extraction reaction column are included. The pH value of the eluate, the concentration of the solvent, the ratio of the vibrating layer, the ratio of the volume of the mixture to the volume ratio of the oil to water, and the aqueous solution of the sputum containing the acid solution, the oil phase D2EHPA is used to extract the oil. The best extraction reaction ^ After the reaction is completed, it will be produced. The reaction between the waste water and the oil phase (organic phase) containing indium, and the concentration of the target substance into the oil phase; the back extraction reaction tower is an acid agent (stone xiao acid, hydrochloric acid, for the copper-containing oil phase after solvent extraction) Sulfuric acid) is back-extracted to obtain refined sulphuric acid steel, indium chloride and indium sulfate back extraction aqueous phase concentrate, the back extraction efficiency of which is above 鄕; D2EHPA extraction and storage, supply of silk mEHpA after extraction by back extraction reaction D2EHPA recovery solution. 8 M328072 [Embodiment] In order to achieve the above-mentioned purpose and effect of the above-mentioned works, a better and feasible embodiment is given, and the technical means of the figure shown in the figure is shown. Please refer to 1^ 涵主涵^[First Solid-liquid separator (1) 20, alkali-concentrated reaction tank 3〇, solid-liquid separator (2) 2, 35, six tanks (1) 40, acid-soluble reaction tank (2) 4, solid-liquid separator (3) ^ c ^ 杲 a reaction tower 50, a reaction tower 60 and a D2EHPA extractant storage tank 7 。. The etched waste sputum bribe trough 1G is used for temporary storage of waste side sputum; solid-liquid separation ^(1)^ is connected with the etching waste indium liquid storage tank, which can filter impurities in the indium-containing waste liquid, filter, night waste Indium oxide hull; concentration reduction 3Q, tilting age _ ((10) connection,,, and 'in the tank _ job paste money to add charm reading oxygen to carry out the concentration reaction, can adjust the pH value in the tank, Forming an indium hydroxide solid deposit and a solid-liquid separator (2) 21, which is connected to the alkali-concentrated reaction tank 3,, and can forcibly separate the solid indium antimonide solid precipitate from the tin-containing liquid, The subsequent treatment; the acid-soluble reaction tank (1) 40 is connected with the solid-liquid separator (2) 21 to solidify the copper hydroxide; the temple is operated by a control valve and a flow meter by adding an appropriate amount of sulfuric acid solution and heating is performed. Reacting with acid to form an indium-containing filtrate; the acid-soluble reaction tank (2) 41 is connected to the solid-liquid separator (2) 21, and the tin-containing liquid can be operated by adding an appropriate amount of sulfuric acid solution using a control valve and a flow meter. The heating process reacts with the acid to form a tin hydroxide precipitate; the solid-liquid separator (3) 22 is connected to the acid-soluble reaction tank (2) 41 The separation of the solid precipitate of tin hydroxide and the filtrate is forcibly formed to form a tin-containing product; the solvent extraction reaction column 5 is mixed with the acid-soluble reaction tank (1) 40, the stripping reaction column 60 and the D2EHPA extractant storage tank 70. Connection, 9 M328072 The reaction tower contains several Sakisaki, several controllers, several micro-extinction meters, several separators and several high-mixing mixers. The paste and micro-flow meter are suitable for the oil phase and water phase. Flow to the extraction of the reverse filament 'and (d) dissolved indium-containing aqueous phase solution, the oil phase D2EHPA extraction of the ship's high-speed mixing of the most parameters, including the pH of the solution, solvent concentration, oscillation frequency, contact time The oil-water volume ratio is set by various parameters. After the extraction reaction is completed, the wastewater and the phase containing the fine phase (organic phase) are generated; the anti-decade reaction is taken; the 60' system and the Luojing stroke reaction column 5Q and the extractant storage agent are collected. 70 connection, which is used for the back extraction reaction of the indium-containing oil containing the indium oil, the dilute hydrochloric acid and the dilute solution, and the refined "indium acid, indium chloride, sulfuric acid anti-extraction water reduction liquid, and its back extraction efficiency. Up to _ above, after stripping of the backing extraction solution In accordance with the specification requirements of the special metal Ziqiong, * and the oil phase D2EHPA extractant after back extraction can be recycled and reused; the oil phase feed port of the D2EHpA extractant storage tank 50 and the oil phase of the stripping reaction tower 6 Discharge port _, for storage and time Coke Conglian threatening extraction reaction tower storage tank 10, test concentrated reaction tank 30, acid-soluble reaction tank 4〇50, anti-extraction power: An such as rXAmh, u mouth And etching waste indium liquid ^ Valley medium stroke reaction tower 7 〇 are used in impact resistance, back extraction reaction tower 6 〇 and crispy extractant storage tank

M328072 生產品,而含賊液經酸溶可回收氫氧化錫之產物,則本裝置不 但此回收杨金屬’更可以免除侧廢銦㈣觀所造成的污染 問題,達到環保、資源再生與經濟等多重效益。 (二) 依本裝置回收處理所得銦與錫金屬資源,並能符合售 至國外精煉狀鮮,其產品品質可達商品化規格,極具經濟價 值,可有效降低含銦廢液回收與資源化成本。 、 (三) 本裝置藉由驗濃集、固液分離、酸溶、溶媒萃取與反 萃取等步魏理後,可將銦觸完全分離及銦祕金屬資源回收 ,『但設置與處理成本低,並具節能、高經濟回收效益,且為一 新穎且14的將銦錫氧化物廢液巾回收銦與錫金屬裝置。 '.(四)本裝置之處理設備大何依據不同_氧化物廢液之 光電產業、太陽能產業與資源虹廠處理規模調整使用,因此符 合目前_相_錫氧化物廢液时處理量之找產業、太陽能 產業與資源化行業別處理現況之需求,以供搭配實際處理上之需 要,極具有產業可利用性與推廣性。 综上所述,摘作確實已_所翻之使用目的與功效,且 於申請前並未發現有_之產品核料利在先,更未見於刊物, 紅符合_補之中請要件,纽法提出專利申請,懇請早曰 審結,並賜准專利,實深感德澤。 【圖式簡單說明】 第一圖所示係為本創作之裝置示意圖。 M328072 【主要元件符號說明】 10 :蝕刻廢銦液儲存槽 20 :固液分離機(1) 21 :固液分離機(2) 22 :固液分離機(3) 30 :鹼濃集反應槽 40 :酸溶反應槽(1) • 41 :酸溶反應槽(2) 50 :溶媒萃取反應塔 ' 60 :反萃取反應塔 70 : D2EHPA萃取劑儲存槽 S ·固相 L :液相 | Μ:混合相 L(〇il;):油相 L(aq.):水相 12M328072 raw products, and containing thief liquid acid-soluble can recover the product of tin hydroxide, this device not only recovers the Yang metal', but also eliminates the pollution problem caused by the side waste indium (four) view, to achieve environmental protection, resource regeneration and economics, etc. Multiple benefits. (2) Recycling and processing the indium and tin metal resources obtained by the device, and can meet the refined refining conditions sold abroad. The quality of the products can reach commercial specifications and has great economic value, which can effectively reduce the recovery and resources of indium-containing waste liquid. Cost. (3) After the device is concentrated, solid-liquid separation, acid solution, solvent extraction and back extraction, it can completely separate the indium touch and recover the indium metal resources, but the installation and processing cost is low. The utility model has the advantages of energy saving and high economic recovery, and is a novel and 14-indium and tin metal waste device for recycling indium tin oxide waste liquid towel. '. (4) The processing equipment of this device is different according to the different _ oxide waste liquid photoelectric industry, solar energy industry and resource Hong factory processing scale adjustment, so it is in line with the current _ phase _ tin oxide waste liquid processing Industry, solar energy industry and resource-based industries do not need to deal with the current situation, in order to meet the needs of actual processing, and have great industrial availability and promotion. In summary, the extract has indeed been used for the purpose and efficacy of the use, and before the application, it has not been found that the product of the product is prior to the publication, but not in the publication, the red meets the requirements of the supplement, The law filed a patent application, and asked for a trial and a patent. [Simple description of the diagram] The first figure shows the schematic diagram of the device. M328072 [Description of main components] 10: Etching waste indium solution storage tank 20: Solid-liquid separator (1) 21: Solid-liquid separator (2) 22: Solid-liquid separator (3) 30: Alkali-concentrated reaction tank 40 : Acid-soluble reaction tank (1) • 41: Acid-soluble reaction tank (2) 50: Solvent extraction reaction tower '60: Stripping reaction tower 70: D2EHPA extractant storage tank S · Solid phase L: liquid phase | Μ: mixing Phase L (〇il;): Oil phase L (aq.): Water phase 12

Claims (1)

M328072 九、申請專利範圍: 1.一種回收蝕刻廢銦液再利用裝置,主要包括有. 一蝕刻廢銦液儲存槽,係供存放蝕刻含銦廢液之用; 77 鹼 添加― 適量的氫氧錢溶賴整最叙pH值,使其產线減錮沈殿與 含鍚液; 一酸溶反應槽,係與固液分離機連接,能將含錫液利用控制闕 與流量計添加適量之雜溶賴倾進行加熱辦與酸溶反應; -固液分_,係與細廢峨和驗濃集反應财接,分雜 刻含銦廢液雜質以及將驗濃集反應槽触溶反麟之固體殘渣進 行固液分離; -溶媒萃喊麟,其與酸溶槽和D2EHPA轉劑贿槽連 接,適當調整油相與水相之流量至萃取反應器進行溶出液pH值、 溶媒濃度、振μ率、接觸時間與油水_比之錄奴的萃取 反應,得到含銦油相(有機相)濃縮液; 一反萃取反應塔,係與溶媒萃取反應塔和D2EHpA萃取劑儲 存槽連接,並針對溶媒萃取後之含銦油相(有機相)以硝酸、鹽酸、 硫酸等進行反萃取反應,得到精煉的硝酸銦、氯化銦、硫酸銦反 萃取水相濃縮液,而且反萃取後的油相D2EHPA萃取劑可回收再 利用; 一 D2EHPA萃取劑儲存槽,係連接於溶媒萃取反應塔之油相 進料口與反萃取反應塔之油相出料口。 13 M328072 2.如申請專利範圍第1項所述之回收_廢銦液再糊裝置, 其中,酸溶反應槽的酸添加_可為硫酸或鹽酸等酸性液體。 3·如申請專利範圍第1項所述之回收_廢銦液再利用裝置, 砰,固™空職 式或板框式壓濾機或真空過濾機或離心機。 4.如申請專利範圍帛i項所述之回收_廢錮液再利用裝置, 其中,反萃取反應塔的酸劑可為硝酸、鹽酸與_等酸性液體。 5·如申請專利範圍第1項所述之回收爛廢銦液再利用裝置 ’其中’溶媒萃取反應塔内設有隔板與高速縣器,其設置數量 依溶出液PH值、溶媒濃度、振細率、接觸時間與油水體積比之 參數決定其最佳操作條件。 、 6.如申請專利範圍第〗項所述之回收綱廢銦液再利用裝置 2中’轉萃取反應塔與反萃取反應塔,可採行批次或連續式 反應方式。 、 f 2月專利範圍第1項所述之回收餘刻廢銦液再利用 钱刻廢銦液儲存槽、驗濃集反應槽、酸溶反應槽、、溶 :=萃取反應塔與D2騰萃取 14M328072 IX. Patent application scope: 1. A recycling and recycling waste indium liquid recycling device, mainly including: an etching waste indium liquid storage tank for storing and etching the indium-containing waste liquid; 77 alkali addition - proper amount of hydrogen and oxygen Qianrong relies on the most pH value, so that the production line is reduced by the spleen and the sputum; the acid-soluble reaction tank is connected with the solid-liquid separator, and the tin-containing liquid can be used to control the enthalpy and the flow meter to add appropriate amount of impurities. Dissolving and dissolving the heating and acid-dissolving reaction; - solid-liquid fraction _, the system is combined with the fine waste enthalpy and the concentration concentration reaction, and the impurities containing the indium waste liquid are mixed and the concentrated reaction tank is dissolved. The solid residue is subjected to solid-liquid separation; - the solvent is extracted, and it is connected with the acid solution tank and the D2EHPA transfer agent, and the flow rate of the oil phase and the water phase is appropriately adjusted to the extraction reactor for the pH value of the solution, the solvent concentration, and the vibration μ. Rate, contact time and oil-water _ compared to the extraction reaction of the slave, to obtain a concentrate containing indium oil phase (organic phase); a stripping reaction tower connected to the solvent extraction reaction tower and the D2EHpA extractant storage tank, and for the solvent Indium-containing oil phase after extraction (organic phase The reverse extraction reaction is carried out with nitric acid, hydrochloric acid, sulfuric acid, etc. to obtain refined indium nitrate, indium chloride, indium sulfate back extraction aqueous phase concentrate, and the oil phase D2EHPA extractant after back extraction can be recycled and reused; a D2EHPA extraction The agent storage tank is connected to the oil phase feed port of the solvent extraction reaction tower and the oil phase discharge port of the stripping reaction tower. 13 M328072 2. The recycling_waste indium liquid re-batch device according to claim 1, wherein the acid addition of the acid-soluble reaction tank may be an acidic liquid such as sulfuric acid or hydrochloric acid. 3. Recycling _ waste indium liquid recycling device as described in item 1 of the patent application scope, 砰, solid TM vacant or plate and frame filter press or vacuum filter or centrifuge. 4. The recycling _ waste mash reusing device according to the patent application 帛i item, wherein the acid agent of the stripping reaction column may be an acidic liquid such as nitric acid, hydrochloric acid or _. 5. The recycling waste indium liquid recycling device as described in item 1 of the patent application scope includes a separator and a high-speed county device in the solvent extraction reaction tower, the number of which is set according to the pH value of the solution, the concentration of the solvent, and the vibration. The parameters of fineness, contact time and oil-water volume ratio determine the optimum operating conditions. 6. If the 'return extraction reaction tower and the stripping reaction tower' are used in the recycling waste indium liquid reuse unit 2 described in the patent application scope, the batch or continuous reaction mode may be adopted. , f. The recycling of the waste indium solution described in item 1 of the February patent range, and the use of the waste indium liquid storage tank, the concentration reaction tank, the acid-soluble reaction tank, the solution: the extraction reaction tower and the D2 extraction 14
TW96215597U 2007-09-17 2007-09-17 Reuse apparatus for recycling etching indium waste liquid TWM328072U (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI386371B (en) * 2009-08-31 2013-02-21 Univ Da Yeh A method for the recycling of indium tin oxide sputtering liquid waste
TWI408239B (en) * 2010-09-28 2013-09-11 Au Optronics Corp Method for recycling indium tin oxide thin film and method for recycling a substrate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI386371B (en) * 2009-08-31 2013-02-21 Univ Da Yeh A method for the recycling of indium tin oxide sputtering liquid waste
TWI408239B (en) * 2010-09-28 2013-09-11 Au Optronics Corp Method for recycling indium tin oxide thin film and method for recycling a substrate

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