M325210 八、新型說明: 【新型所屬之技術領域】 本新型是關於一種多層隔熱膜貼片，特別是指一種適 合貼合在例如：玻璃、鏡片等等基材的表面，並用來阻隔 陽光熱源之多層隔熱膜貼片。 【先前技術】 在以往的技藝中，具有適當厚度之聚酯（polyester，簡 稱PET)薄膜經常被當作隔熱膜貼片來使用，此種單層ρΕτ 薄膜雖然具有適當的強度，但其抵抗光線的效果不佳，為 了使PET薄膜具有較佳的抗紅外線及抗紫外線能力，有時 業者會在PET薄膜的表面覆蓋一層含有例如：鎳、銀、鋁 、鉻等金屬層，或者增加一層含有機染料的染色層。前述 ^屬層或染色層的設計，雖然可以增力口貼片抗紅外線及抗 紫外線的功效，但是金屬薄層有時會阻礙通訊器材之訊號 接收’造成周遭環境收訊品質的不佳，而染色薄層的設計 ，則會因為染料受到陽光照射逐漸褪色的影響，而產生隔 熱效果降低的缺失，顯然以往以單層聚酯薄膜作祕 隔熱膜貼片在使用時存在有諸多不盡理想之處。 【新型内容】 本新型之目的係在提供一種在兼顧透光率的同時，具 有較熱、抗紅外線或抗紫外線功效之多層隔熱膜貼片 本新型多層隔熱膜貼 等等基材的表面，包含： 片係可貼附在例如：玻璃、鏡片 一基層單元，以及一第一抗光線 5 M325210 面，以及一間隔之第二表面 結合在該等表面的其中之一」 本新型的有益效果在於 ，以及第一抗光線層的設置 層。其中該基層單元包括合計20〜200層之數第一基 膜之厚度在可見光波長範圍，且談基層單元具有一第一表 而該第一抗光線層是選擇地 利用該基層單元之多層結構 可以使貼片在具有隔熱的功 月b外’更可選擇地增進貼片之抗紫紅線或抗紫外線的功效M325210 VIII. New description: [New technical field] The present invention relates to a multi-layer thermal insulation film patch, in particular to a surface suitable for bonding to substrates such as glass, lenses, etc., and used to block sunlight heat sources. Multi-layer insulation film patch. [Prior Art] In the prior art, a polyester (PET) film having a suitable thickness is often used as a heat-insulating film patch, and the single-layer ρ Ε τ film has an appropriate strength, but it resists The effect of light is not good. In order to make the PET film have better resistance to infrared rays and ultraviolet rays, sometimes the surface of the PET film is covered with a metal layer containing, for example, nickel, silver, aluminum, chromium, or the like. Dyeing layer of machine dye. The design of the above-mentioned layer or dye layer can enhance the anti-infrared and anti-ultraviolet effect of the patch, but the thin layer of metal sometimes hinders the signal reception of the communication device, causing poor reception quality of the surrounding environment. The design of the dyed thin layer will be caused by the gradual fading of the dye by the sunlight, and the loss of the heat insulation effect will be reduced. Obviously, there are many endless use of the single-layer polyester film as the secret heat-insulating film patch. Ideal. [New content] The purpose of the present invention is to provide a multilayer heat-insulating film patch having a relatively hot, anti-infrared or anti-ultraviolet effect while taking into consideration the light transmittance. , comprising: a sheet attached to, for example, a glass, a lens-base unit, and a first light-resistant 5 M325210 surface, and a second surface of the gap bonded to one of the surfaces. In, and a layer of the first anti-light layer. Wherein the base layer unit comprises a total of 20 to 200 layers, the thickness of the first base film is in the visible wavelength range, and the base layer unit has a first surface and the first light-resistant layer is selectively used to utilize the multilayer structure of the base layer unit. The patch can be used to enhance the anti-purple line or anti-ultraviolet effect of the patch in addition to the heat-insulating function.
【實施方式】 有關本新型之前述及其他技術内容、特點與功效，在 乂下配a參考圖式及較佳實施例的詳細說明中，將可清楚 的呈現。 參閱圖1，本新型多層隔熱膜貼片丨之一較隹實施例係 可貼覆在一例如破璃、鏡片尊之基材1〇上，包含:一基層 單元11、一第一抗光娘層12、一抗刮耐磨層13，以及一第 —抗光線層14。 本新型之基層單元11係使用申請人所申請之日本特開 平9-300540號發明案所揭示之彩虹反射膜為基底，為了使 該彩虹反射膜適合作為隔熱膜貼片，該基層單元n包括多 數間隔之第一基膜111，以及多數介於相鄰第一基膜U1間 的第二基膜112交互堆疊而成。上述基層單元丨丨具有一個 第一表面113，以及一個與第一表面113間隔之第二表面 114，且前述基膜in、112中形成該第一或第二表面ιΐ3、 6 M325210 114的最外層厚度大於位在中間者。為了兼具較佳的透光率 及隔熱效果，該第一基膜m及第二基膜112的層數總和為 2〇〜2〇0層’較佳為7〇〜2〇〇層，且每一基膜mm之厚 度皆在可見光波長範圍内，亦即，該等基膜lu、112之厚 度為 3800〜8000A。 又本新型第一基膜111佔基層單元丨丨總重量的％〜％ 重量％，其係為丙烯酸系（acryl)樹脂製成，具體例如··甲基 _ 丙烯酸酯（methyl acrylate)、乙基丙烯酸酯（ethyl acrylate)、 丁基丙烯酸酯（butyl acrylate)、甲基丙烯酸甲靡加她… methacrylate)、乙基丙烯酸曱醋（ethyi methacrylate)、丁基 丙烯酸甲酯(butyl methacrylate)等等較低分子量之丙烯酸系 單體的聚合物，或者以該等單體為主成份，並與其他可共 聚合單體混合而成的聚合物。 本新型之第二基膜112佔基層單元u總重量的5〇〜7〇 重量％，係由聚對苯二甲酸丁醇酉旨（p〇lybutylene . tereplithalate，以下簡稱八成份）、聚對苯二曱酸丁二醇酯彈 性體（以下間稱B成份）’以及線狀低密度聚乙浠 (polyethylene，以下簡稱C成份）等聚合物混合而成。在本 新型中’ A成伤可由1，4 丁 <一醉（1，4-butanediol)與對苯二甲 酸（terephthalic acid)，或者與對苯二曱酸二甲醋（dimethyl terephthalate)之觸媒性縮聚反應所得之聚合物，即B成份只 要是聚對苯二曱酸丁二醇酯，且具有彈性之聚合物，即可 達到本新型的目的。此外’本新型之B成份亦可採用聚對 本一甲酸丁二醇酿與聚乙二醇之聚合物，較佳是嵌段丘聚 7 M325210 物，本新型之c成份 古认 取j為市售的線狀低密度聚合物，上述 聚乙烯之比重為〇.δ5〜α〇^ ^ ^ ^ ^ 工述 為卜％。 · 3 ’熔融指數（melt index，簡稱ΜΙ) 本新型第二基膜Μ:丄_ 曰〇/ 、112中该Α成份的使用量為80〜95重 « /〇 ’較佳為85〜93曹旦。/ 里/〇’而B成份之使用量為3〜15重 量°/〇，較佳為5〜1〇重吾。 八 、夏里〆〇，C成份之使用量為〇·5〜5重量％ ’車父佳為1.0〜4重蕃〇/ 里/〇則述成分依特定比例熔融混合後，[Embodiment] The foregoing and other technical contents, features, and advantages of the present invention will be apparent from the accompanying drawings and the detailed description of the preferred embodiments. Referring to FIG. 1 , one of the novel multilayer heat-insulating film patch sheets can be attached to a substrate such as a glass and a lens, and includes: a base unit 11 and a first anti-light mother. The layer 12, a scratch-resistant wear layer 13, and a first anti-light layer 14. The base layer unit 11 of the present invention is based on a rainbow reflective film disclosed in the Japanese Patent Application Laid-Open No. Hei 9-300540, which is hereby incorporated by reference. A plurality of spaced first base films 111, and a plurality of second base films 112 interposed between adjacent first base films U1 are alternately stacked. The base unit unit has a first surface 113 and a second surface 114 spaced apart from the first surface 113, and the outermost layer of the first or second surface layers 3, 6 M325210 114 is formed in the base film in, 112. The thickness is greater than the middle. In order to achieve better light transmittance and heat insulation effect, the total number of layers of the first base film m and the second base film 112 is 2 〇 2 〇 0 layer ', preferably 7 〇 2 layer , layer, And the thickness of each base film mm is in the visible light wavelength range, that is, the thickness of the base films lu, 112 is 3800~8000A. Further, the first base film 111 of the present invention accounts for % to % by weight of the total weight of the base unit, and is made of an acryl resin, specifically, for example, methyl acrylate or ethyl. Ethyl acrylate, butyl acrylate, methyl methacrylate plus methacrylate, ethyi methacrylate, butyl methacrylate, etc. A polymer of an acrylic monomer having a molecular weight, or a polymer obtained by mixing these monomers as a main component and other copolymerizable monomers. The second base film 112 of the present invention accounts for 5〇~7〇% by weight of the total weight of the base unit u, and is composed of polybutylene terephthalate (p〇lybutylene. tereplithalate, hereinafter referred to as eight components), polyparaphenylene A polymer such as a butylene phthalate elastomer (hereinafter referred to as "B component") and a linear low-density polyethylene (hereinafter referred to as C component) are mixed. In the present invention, 'A injury can be 1,4 Ding < 1,4-butanediol and terephthalic acid, or with dimethyl terephthalate The polymer obtained by the polycondensation reaction, that is, the component B, is a polymer having a polybutylene terephthalate and having elasticity, and the object of the present invention can be attained. In addition, the component B of the present invention may also be a polymer of polybutylene-formic acid butanediol and polyethylene glycol, preferably block methane 7 M325210, and the c component of the novel c is commercially available. The linear low-density polymer, the specific gravity of the above polyethylene is 〇.δ5~α〇^^^^^. · 3 'melt index (referred to as ΜΙ) This new type of second base film Μ: 丄 _ 曰〇 / , 112 the use of this bismuth component is 80 ~ 95 weight « / 〇 ' is preferably 85 ~ 93 Cao Dan. / 里 / 〇 ' and the amount of the B component is 3 to 15 weight ° / 〇, preferably 5 ~ 1 〇 heavy. 8. Xia Lizhen, the amount of C component used is 〇·5~5 wt% ’Che’s Jia is 1.0~4 heavy 〇/ 里/〇 The ingredients are melted and mixed according to a certain ratio.
即可製成本新型所需之第二基膜112。 j新5L為了彳于到具有較佳阻隔紅外線及紫外線能力 勺土 ^單元11該第一基膜U1之折射率與合成之第二基 膜112的折射率相差〇 〇3〜〇·17, 本新型之第一抗光線層12具有抗紅外線的功能，其係 Π3 ^ , ^ V ^ $光線層12疋採用例如聚碳酸酯等聚合物黏結劑為 基質’並加入〇·5〜1〇重量％可吸收紅外線之奈米級塗料， L a於本新型之奈米級塗料乃例如··粉體粒徑介於 50nm之氧化銦錫、氧化錫銻等化合物，其塗佈的厚 度以1 ΙΟμιη為較佳。由於不同粒徑之奈米級塗料會影響貼 片1對於％光中紅外線的阻隔效果，並造成外觀顏色上的 差異’因此，採用何種粒徑之粉體係依實際需要而定。 本新型抗刮耐磨層13是以塗佈的方式覆蓋在第一抗光 線層12之一表面121上，以避免該第一抗光線層12受到 損傷、刮傷，在本實施例令，該抗刮耐磨層13是採用聚酯 化合物為基質，並加入〇.2重量％例如六硼化鑭之抗刮耐磨 8The second base film 112 required for the present invention can be formed. j new 5L in order to get better resistance to infrared and ultraviolet light, the refractive index of the first base film U1 is different from the refractive index of the second base film 112 which is synthesized, 〇〇3~〇·17, The novel first light-resistant layer 12 has an anti-infrared function, and the system is Π3 ^ , ^ V ^ $ light layer 12 疋 using a polymer binder such as polycarbonate as a substrate 'and adding 〇·5~1〇% by weight Nano-grade coatings that can absorb infrared rays, and nano-grade coatings of the present invention are, for example, compounds such as indium tin oxide and antimony tin oxide having a powder particle size of 50 nm, and the coating thickness is 1 ΙΟμιη. Preferably. Since the nano-scale coatings of different particle sizes affect the barrier effect of the patch 1 on the infrared rays in the % light, and cause a difference in the appearance color, the powder system of which particle size is used depends on actual needs. The scratch-resistant wear layer 13 of the present invention is coated on one surface 121 of the first light-resistant layer 12 to prevent the first light-resistant layer 12 from being damaged or scratched. In this embodiment, The scratch-resistant wear-resistant layer 13 is made of a polyester compound and is added with 〇.2% by weight of, for example, lanthanum hexaboride.
M325210 磨層13之厚度介於。 本新型之第二抗光線層14具有阻隔紫外線的功能，同 時亦兼具有接著性高、高耐加熱性、耐濕性等特性，以便 使製成之隔熱膜貼# 1能夠直接黏貼在玻璃或者鏡片等基 材10上，但本新型在設計上，並不以第二抗光線層14: 身具有黏料必要。±述第二抗光線層14亦以塗佈的方式 ，將含有紫外線吸收劑之丙烯酸系黏著劑覆蓋於基層單元 11的第二表面114上，其中該紫外線吸收劑乃例如苯并三 唑’其使用量以0.3〜0.7重量％為較佳，塗佈的厚度為 1 〜5μιη 〇 為了製造如圖1所示之隔熱膜貼片1，本實施例的製法 包含·製備基層單元11、成型第一抗光線層12、成型抗刮 耐磨層13 ’以及成型苐二抗光線層14等四個步驟，其中： 製備基層單元11 :採用聚甲基丙烯酸曱酯（簡稱ΡΜΜΑ 掛脂）、黏度為lPa.a的聚對苯二甲酸丁二醇酯，以及密度 0.92、熔融流動指數2之聚乙二醇為原料，即在本新型中採 用PMMA樹脂來製作第一基膜，而以pBT樹脂、 coPBT樹脂（聚對苯二曱酸丁二醇醋與聚乙二醇共聚物），以 及聚乙烯來調配形成第二基膜112，此調配後的樹脂中含有 90重量％之PBT樹脂、7重量％之c〇PBT樹脂，以及3重 量％之密度為0.92、熔融指數為2之線狀低密度聚乙烯（簡 稱LLDPE) ’且第一及第二基膜1丨丨、丨丨2之折射率差為 0.06。將該等原料分別儲存在兩台溫度分別為13〇。〇及75。〇 9 M325210 的乾燥機中，當原料渥度達到_4〇m，再分別送到兩台 不同押出量及工作溫度的押出機，其中用來押出第二基膜 112(即由PBT、⑶而及LLDpE混合而成之樹脂）之押“ 的工作温度為240°C，押出量為6〇 kg/hr，而用來押送第一 基膜111(即PMMA樹脂)的押出機，其工作溫度為235它， 押出量為47 kg/hr。經前述押出機押出的熔融樹脂將傳送到 一個層進給塊系統，經此系統之控制將樹脂分成1〇〇層， 齡 之後經由單集流管平膜片模具押到一温度為3〇〜4〇它的高溫 - 定型滾輪，再經由常温定型滾輪組來精確控制膜片厚度及 覓度’之後將具有均勻厚度之膜片傳送到一工作溫度12〇它 的又軸延伸機，籍該雙軸延伸機的拉引，將膜片的縱向 (TDO)拉伸至2.5〜4_5倍’而橫向（MDO)拉伸至2.5〜4倍， 即可製得總膜厚25μιη之基層單元11。 成型第一抗光線層12 :將〇·5重量％且粒徑1〇〇〜15〇nm 之氧化錫銻加入聚碳酸酯中混合。之後以塗佈機將該混合 物以50米/分鐘的速度塗佈在基層單元u之第一表面ιΐ3 上，經由烘烤溫度65°C之機台的烘烤固化後，即可在基層 單元11上形成膜厚5μπι的第一抗光線層。 成型抗刮耐磨層13 :將0.2重量。/。之六硼化鑭加入聚醋 化合物中混合，之後同樣以塗佈機將該混合物以5〇米/分鐘 的速度k佈在苐一抗光線層12之表面上，經由烘烤溫度 60〜70°C之機台的烘烤固化後，即可在第一抗光線層12表 面形成膜厚1〜2Um的抗刮耐磨層13。 成型第二抗光線層14:利用滾輪式塗佈機將含有〇·5 10 M325210 重里。/。之苯并：嗤之聚丙晞酸樹脂塗佈在基層單元η之第 二表面1H上，塗佈速度亦為5〇米/分鐘，供烤溫度約為 60C ’即可形成第二抗光線層14，同時完成本新型隔敎膜 貼片1的製造，為了便於❹，製造後可於第二抗光線層 1小底面貝占附一層離型紙（圖未示）。 由以上說明可知，本新型隔熱膜貼片1中使用由 20〜200層基膜lu、112所組成的基層單元U，並在基層單 元^的兩個表面113、114上結合該第 一抗光線層14、抗刮耐磨層13等設計，不僅未見於習知隔 熱膜，該項設計更可在兼顧可見光透光率的前提下，達到 隔熱效果佳，以及依需要選擇地提高貼片丨之抗紅外線、 抗紫外線或抗刮耐磨功效。 惟以上所述者，僅為本新型之較佳實施例而已，當不 能以此限定本新型實施之範圍，即大凡依本新型申請專利 範圍及說明内容所作之簡單的等效變化與修飾，皆仍屬本 新型專利涵蓋之範圍内。 【圖式簡單說明】 圖1是本新型多層隔熱膜貼片之一較佳實施例的側視 放大圖。 M325210 【主要元件符號說明】 1 隔熱膜貼片 113 10 透光基材 114 11 基層單元 12 111 第一基膜 13 112 第二基膜 14 第一表面 第二表面 第一抗光線層 抗刮耐磨層 第二抗光線層M325210 The thickness of the abrasive layer 13 is between. The second light-resistant layer 14 of the present invention has the function of blocking ultraviolet rays, and also has the characteristics of high adhesion, high heat resistance, moisture resistance, etc., so that the formed heat-insulating film sticker #1 can be directly adhered thereto. On the substrate 10 such as glass or lens, the present invention is not designed to have the second light-resistant layer 14: it is necessary to have a binder. The second anti-light layer 14 is also coated on the second surface 114 of the base unit 11 by a coating method, wherein the ultraviolet absorber is, for example, benzotriazole The amount of use is preferably 0.3 to 0.7% by weight, and the thickness of the coating is 1 to 5 μm. In order to manufacture the heat-insulating film patch 1 as shown in FIG. 1, the method of the present embodiment comprises the preparation of the base unit 11, and molding. a light-resistant layer 12, a shaped scratch-resistant layer 13', and a second layer of the anti-scratch layer 14 are formed, wherein: the base unit 11 is prepared by using poly(meth) methacrylate (abbreviated as 挂 挂), and the viscosity is lPa.a polybutylene terephthalate, and a density of 0.92, a melt flow index of 2 polyethylene glycol as raw materials, that is, in the present invention, PMMA resin is used to make the first base film, and pBT resin, CoPBT resin (polybutylene terephthalate butyl vinegar and polyethylene glycol copolymer), and polyethylene to form a second base film 112, the formulated resin contains 90% by weight of PBT resin, 7 weight % of c〇PBT resin, and 3 weights The density of 0.92, a melt index of 2 of the linear low density polyethylene (abbreviation LLDPE) 'and the first and the second base film 1 Shushu, Shushu 2 of the refractive index difference is 0.06. The raw materials were separately stored at two temperatures of 13 Torr. 〇 and 75. 〇9 M325210 dryer, when the raw material temperature reaches _4〇m, and then sent to two different extrusion and working temperature extruders, which are used to push out the second base film 112 (that is, by PBT, (3) The resin which is mixed with LLDpE has an operating temperature of 240 ° C and an extrusion amount of 6 〇 kg / hr, and the extruder for ejecting the first base film 111 (ie, PMMA resin) has an operating temperature of 235, the amount of extrusion is 47 kg / hr. The molten resin extruded by the aforementioned extruder will be transferred to a layer feed block system, and the resin is divided into 1 layer by the control of the system, and then passed through a single header. The diaphragm mold is transferred to a temperature of 3 〇 4 〇 的 的 的 的 高温 高温 定 定 定 定 定 定 定 定 精确 精确 精确 精确 精确 精确 精确 精确 精确 精确 精确 精确 精确 精确 精确 精确 精确 精确 精确 精确 精确 精确 精确 精确 精确 精确 精确 精确 精确 精确 精确 精确又The other axis extension machine, by the drawing of the biaxial stretching machine, stretches the longitudinal direction (TDO) of the diaphragm to 2.5~4_5 times' and the transverse direction (MDO) to 2.5~4 times. A base unit 11 having a total film thickness of 25 μm is obtained. The first light-resistant layer 12 is formed: 〇·5% by weight and The tin oxide ruthenium having a diameter of 1 〇〇 15 〇 nm is added to the polycarbonate and mixed, and then the mixture is applied to the first surface ι 3 of the base unit u at a speed of 50 m/min by a coater, and baked. After baking and solidification of the machine at a temperature of 65 ° C, a first anti-light layer having a film thickness of 5 μm can be formed on the base unit 11. Forming scratch-resistant wear layer 13: 0.2 wt% of lanthanum hexaboride The mixture was mixed with a polyacetal compound, and then the mixture was also applied to the surface of the anti-light-ray layer 12 at a speed of 5 〇m/min by a coater, and passed through a baking table at a temperature of 60 to 70 ° C. After baking and curing, a scratch-resistant wear layer 13 having a film thickness of 1 to 2 Um can be formed on the surface of the first light-resistant layer 12. Forming the second light-resistant layer 14: using a roller coater to contain 〇·5 10 M325210 Benzene: bismuth polyacrylic acid resin is coated on the second surface 1H of the base unit η, the coating speed is also 5 〇m / min, and the baking temperature is about 60 C ' The anti-light layer 14 simultaneously completes the manufacture of the novel barrier film patch 1 for the purpose of facilitating flaws, and can be applied to the second antibody after manufacture. The outer layer of the wire layer 1 is covered with a release paper (not shown). As can be seen from the above description, the base film unit U composed of 20 to 200 base films lu and 112 is used in the thermal insulation film patch 1 of the present invention. The design of the first anti-light layer 14, the anti-scratch wear layer 13 and the like on the two surfaces 113, 114 of the base unit ^ is not only found in the conventional heat-insulating film, and the design can also achieve the visible light transmittance. Under the premise, the thermal insulation effect is good, and the anti-infrared, anti-ultraviolet or anti-scratch and wear-resisting effects of the patch are selectively increased as needed. However, the above is only the preferred embodiment of the present invention. The scope of the present invention is not limited by this, that is, the simple equivalent changes and modifications made by the present invention in accordance with the scope and description of the novel application are still within the scope of the present patent. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a side elevational view of a preferred embodiment of the novel multilayer thermal barrier film. M325210 [Main component symbol description] 1 Thermal insulation film patch 113 10 Light-transmitting substrate 114 11 Base unit 12 111 First base film 13 112 Second base film 14 First surface Second surface First light-resistant layer scratch-resistant Second layer of anti-light layer
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