TWM312762U - Electronic device manufacturing apparatus - Google Patents

Electronic device manufacturing apparatus Download PDF

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Publication number
TWM312762U
TWM312762U TW95203932U TW95203932U TWM312762U TW M312762 U TWM312762 U TW M312762U TW 95203932 U TW95203932 U TW 95203932U TW 95203932 U TW95203932 U TW 95203932U TW M312762 U TWM312762 U TW M312762U
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Taiwan
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processing chamber
chamber component
chamber
component
components
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TW95203932U
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Chinese (zh)
Inventor
John M White
Donald Verplancken
Shinichi Kurita
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Applied Materials Inc
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Priority claimed from US11/145,003 external-priority patent/US20060051507A1/en
Priority claimed from US11/214,475 external-priority patent/US7784164B2/en
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of TWM312762U publication Critical patent/TWM312762U/en

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Description

M312762 點且包括至少一開口。該方法亦包括將分離的處理室部件 組裝成該非多邊形的傳送室。 本創作的其它特徵及態樣從下面的詳細說明,申請專 利範圍及附圖中將會變得更加完整。 【實施方式】 第1圖為依據本創作的某些實施例的第一示範性多件 式電子元件製造處理室1 00的俯視圖。參照第1圖,該多 件式電子元件製造處理室100是用來在電子元件製造期間 輸送基材的一傳送室。該傳送室100在電子元件製造期間 被耦接至一或多個製程室及/或負载鎖定室103。該傳送室 100可包括一末端效應器(end effector)(未示出)用來在電 子元件製造期間傳送一基材於製程室及/或負載鎖定室之 間。示範性基材包括,例如,一玻璃板、一聚合物基材、 一半導體晶圓、一光罩、一標線板或類此者。 依據本創作的一些實施例,該傳送室1 0 0可包括複數 個被耦接在一起的處理室部件。詳言之,該傳送室1 0 0可 包括一第一處理室部件 1〇9(如,一第一側處理室部件)及 一第二處理室部件1 1 1 (如,一第二側處理室部件)其耦接至 一第三處理室部件113(如,一中央處理室部件)。該第一處 理室部件1 0 9及第二處理室部件11 1分別經由一 〇型環(未 個別顯示)而耦接至該第三處理室部件1 1 3。該第一處理室 部件1 09及第二處理室部件1 1 1分別藉由使用一固定機 構’譬如像是螺釘,螺栓或類此者’而耦接至該第三處理 7M312762 points and includes at least one opening. The method also includes assembling the separate process chamber components into the non-polygonal transfer chamber. Other features and aspects of the present invention will become more fully apparent from the following detailed description. [Embodiment] Fig. 1 is a plan view showing a first exemplary multi-piece electronic component manufacturing process chamber 100 in accordance with some embodiments of the present invention. Referring to Fig. 1, the multi-piece electronic component manufacturing process chamber 100 is a transfer chamber for transporting a substrate during the manufacture of electronic components. The transfer chamber 100 is coupled to one or more process chambers and/or load lock chambers 103 during manufacture of the electronic components. The transfer chamber 100 can include an end effector (not shown) for transferring a substrate between the process chamber and/or the load lock chamber during manufacture of the electronic component. Exemplary substrates include, for example, a glass sheet, a polymeric substrate, a semiconductor wafer, a reticle, a reticle, or the like. According to some embodiments of the present author, the transfer chamber 100 may include a plurality of process chamber components that are coupled together. In detail, the transfer chamber 100 may include a first process chamber component 1〇9 (eg, a first side process chamber component) and a second process chamber component 1 1 1 (eg, a second side process) The chamber component) is coupled to a third process chamber component 113 (eg, a central processing chamber component). The first process chamber component 109 and the second process chamber component 11 1 are coupled to the third process chamber component 141 via a 〇-ring (not individually shown). The first process chamber component 109 and the second process chamber component 1 1 1 are coupled to the third process 7 by using a fixed mechanism such as a screw, a bolt or the like, respectively.

M312762 室部件1 13。雖然,第1圖的多件式電子元件製造處理室 100包括了三個處理室部件,但該多件式電子元件製造處 理室可包含數目更多或更少的處理室部件(如,2,4,5,6 等等)。 傳統傳送室(如,單件式傳送示)的寬度大致上都被限 制在約3公尺或更小,用以符合陸地及/或航空運輸規定, 運輸容量及/或設計建築設計。例如,一大於3公尺的傳送 室會被當地的法規禁止用最大正常容量的航空貨運飛機 (如波音 747)運送且亦無法通過一般電子元件製造場所的 出入口。相反地,在本創作的一或多個態樣中,該多件式 傳送室在被組裝起來之後的寬度W1為4 · 2公尺。因此, 本創作的電子元件製造處理室1 00可容納比傳統的單件式 傳送室更大的基材。該電子元件製造室1〇〇的寬度可以比 4.2公尺更大或更小。 依據本創作的一些實施例,從俯視圖或從側剖面圖來 看,該多件式電子元件製造處理室的每一個處理室部件 I 09-11 3的形狀都像是被一或多條線繩所切的圓。例如, 從俯視圖或從側剖面圖來看,側處理室部件1 〇 9,1 1 1類似 一被一線繩所切過圓(或,更一般性地,一橢圓)切過的一 部分。相同地,從俯視圖或從側剖面圖來看,該中央處理 室部件1 1 3類似於一個圓被兩條線繩所切過的部分。此形 狀包括兩個彎曲部段及兩個直線段。側處理室部件 1 0 9, II 1的形狀包括一彎曲段及一直線段。應注意的是,處理 室部件1 09-1 1 3中的每一者都沒有一多邊形的形狀。換言 8 M312762 之,處理室部件109-113中的每一者都包括 巴栝至少一彎曲段。 攸俯視圖或從側剖面圖來看,該示範 掉费批# 夕件式電子元 …室1〇〇在組裝好之後(如’組合好的形狀)為_ 之後的Γ範性多件式電子元件製造處理$ 1〇°在組裝好 後的整體形狀(如’三維度的形狀)為一 該示範性夕从44 # …'而’ 祀性多件式電子兀件製造處理室1〇〇 db ^ j具有包括各式 非夕還逆形狀在内的其它整體形狀(如, 些 u橢囫形的柱體)。M312762 Room components 1 13. Although the multi-piece electronic component manufacturing process chamber 100 of FIG. 1 includes three processing chamber components, the multi-piece electronic component manufacturing processing chamber may include a greater or lesser number of processing chamber components (eg, 2, 4, 5, 6, etc.). The width of a conventional transfer chamber (e.g., a one-piece transfer) is generally limited to about 3 meters or less to comply with land and/or air transportation regulations, shipping capacity, and/or design architectural design. For example, a transmission room larger than 3 meters would be prohibited by local regulations from being transported by air cargo aircraft of the largest normal capacity (such as Boeing 747) and could not pass through the entrances and exits of general electronic components manufacturing sites. Conversely, in one or more aspects of the present creation, the multi-piece transfer chamber has a width W1 of 4 · 2 meters after being assembled. Therefore, the electronic component manufacturing process chamber 100 of the present invention can accommodate a larger substrate than a conventional one-piece transfer chamber. The width of the electronic component manufacturing chamber 1 可以 can be larger or smaller than 4.2 meters. According to some embodiments of the present invention, each of the processing chamber components I 09-11 3 of the multi-piece electronic component manufacturing process chamber is shaped like one or more wires from a top view or a side cross-sectional view. The circle that was cut. For example, from a top view or from a side cross-sectional view, the side processing chamber components 1 〇 9, 1 1 1 are similar to a portion cut by a wire (or, more generally, an ellipse). Similarly, the central processing chamber component 1 1 3 is similar to a portion where a circle is cut by two strands, as seen from a top view or from a side cross-sectional view. This shape includes two curved sections and two straight sections. Side treatment chamber components 1 0 9, II 1 shape includes a curved section and a straight section. It should be noted that each of the process chamber components 1 09-1 1 3 does not have a polygonal shape. In other words 8 M312762, each of the process chamber components 109-113 includes at least one curved section of the bay.攸 Top view or from the side cross-sectional view, the demonstration of the batch of electronic components ... room 1 〇〇 after assembly (such as 'combined shape) is _ after the versatile multi-piece electronic components Manufacturing process $1〇° after assembly of the overall shape (such as 'three-dimensional shape') for an exemplary eve from 44 #...' and '祀' multi-piece electronic components manufacturing processing room 1〇〇db ^ j has other integral shapes including various types of non-rectangle shapes (e.g., cylinders of u ellipsoid shape).

一 F夕邊形的室,特別是對稱的非多邊 形的室、 A 至(如,一圓柱 至),可提供农適用的内部基材傳送區域〜曰 理室叔·剌 , 叫丁一疋罝的處 材枓。例如,與一多邊形室比較起來, 又合非多邊形室 2帛不到的角落區域。因此,對於_定量可用内部 基材傳送面積數量而言,一非多邊形的室的重量比一個具 有相同的可用内部基材傳送面積數量的多邊形室輕。 、第2A圖為依據本創作的某些實施例的第一示範性多 T式電子元件製造處理室100(其相對於第丄圖被旋轉)= 刀解立體圖。第一至第三處理室部件1〇9_113中的每一者 被水平地耦合用以形成該多件式電子元件製造處理室 100。該第一處理室部件109的長度以LS1來代表及該第 一處理室部件109的最大寬度(如,在最寬點的寬度)是以 wsi來代表。該第二處理室部件ηι的長度以ls2來代表 及該第二處理室部件lu的最大寬度是以WS2來代表。該 第三處理室部件113的最大長度(如,在最長點的長度)以 LC 1來代表及該第二處理室部件丨丨3的寬度是以wc丨來代 表。在一或多個實施例中,該第三處理室部件丨丨3的最大 9A F-shaped chamber, especially a symmetrical non-polygonal chamber, A to (for example, a cylinder to), can provide a suitable internal substrate transfer area ~ 曰理室叔·剌, called Ding Yizhen The material is flawed. For example, compared with a polygonal chamber, it is combined with a corner area that is not accessible to the polygonal chamber. Thus, for a quantitative amount of internal substrate transfer area, a non-polygonal chamber weighs less than a polygonal chamber having the same number of available internal substrate transfer areas. 2A is a first exemplary multi-T electronic component manufacturing process chamber 100 (which is rotated relative to the first diagram) in accordance with certain embodiments of the present invention = a knife-cut perspective view. Each of the first to third process chamber components 1〇9_113 is horizontally coupled to form the multi-piece electronic component manufacturing process chamber 100. The length of the first process chamber component 109 is represented by LS1 and the maximum width of the first process chamber component 109 (e.g., the width at the widest point) is represented by wsi. The length of the second process chamber component ηι is represented by ls2 and the maximum width of the second process chamber component lu is represented by WS2. The maximum length of the third process chamber component 113 (e.g., the length at the longest point) is represented by LC 1 and the width of the second process chamber component 3 is represented by wc. In one or more embodiments, the maximum of the third process chamber component 丨丨3

M312762 寬度約為2.4公尺及該第三處理室部件113的最大長度 為4.2公尺。該第三處理室部件113的長度及/或寬度可 比上述的數值大一些或小一些。在所示的實施例中,該 三處理室部件1 1 3的最大長度LC1亦為該室1 00的總 徑。如圖所示,第一處理室部件109的長度LSI及第二 理室部件1 1 1的長度LS2等於第三處理室部件1 1 3的側 的長度。然而,第一處理室部件109的長度LSI與第二 理室部件 1 1 1的長度 LS2可以是不相同的。在一實施 中,第一處理室部件 109的寬度WS1及第二處理室部 111的寬度WS2都約為0.9公尺。然而,第一處理室部 109的寬度WS1及/或第二處理室部件111的寬度WS2 以不同於(如,大一些或小一些)上述數值及/或兩個寬度 以彼此不同。(在一特定的實施例中,第三處理室部件1 可具有一寬度,其約等於或小於第一處理室部件1 09的 度加上第二處理室部件111的寬度,惟,第一處理室部 109,第二處理室部件111及第三處理室部件113的寬度 間亦可以有其它的關係。) 該多件式電子元件製造處理室1 〇〇的每一處理室部 1 0 9 -1 1 3都是用,例如,鋁、不銹鋼或任何可用、相對 態且可作為傳送室之材質製成。 雖然該多件式電子元件製造處理室1 〇 〇的總尺寸不 合陸地及/或航空運輸規定,但該多件式電子元件製造處 室100的每一處理室部件109-113都符合陸地及/或航空 輸規定。詳言之,在所描述的例子中,該多件式電子元 約 以 第 直 處 邊 處 例 件 件 可 可 13 寬 件 之 件 鈍 符 理 運 件 10 M312762 t ^處"理至1 0 0的總寬度為4.2公尺,它並不符合陸地及/ 或航二運輪規定。然而,第一處理室部件的寬度W S 1及第 一處理室部件Π1的寬度WS2為〇·9公尺及第三處理室部 件11 3的寬度W C 1為2 · 4公尺,它們都符合陸地及/或航 空運輸規定。(在另一實施例中,第三處理室部件丨丨3的寬 度WC1為3至3.2公尺,第一及第二處理室部件1〇9,111 的寬度WS1,WS2為0.5至〇·6公尺。) 又,該多件式電子元件製造處理室100的每一處理室 部件1 09-11 3都可以在傳統的加工機具或機台上來製造。 因此,該多件式電子元件製造處理室1 〇〇的製造商可從眾 多的傳統加工機具或機台中選擇一或多個機具或機台來製 造該多件式電子元件製造處理室100的處理室部件 109-113。該多件式電子元件製造處理室1〇〇的製造者可從 眾多的傳統的加工機具或機台的競爭中取得到一個好價 錢。相反地,可用來製造具有可容納大型基材尺寸的單件 式電子元件製造處理室1〇〇的加工機具或機台的數量是相 當有限的。此有限數量的加工機具或機台所造成的結果為 競爭減少。由於競爭減少,製造商製造該單件式室所需要 付的錢將會比製造該多件式電子元件製造處理室1〇〇的錢 多。又,因為此一單件式室並不符合陸地及/或航空運輸規 定’所以此種單件式室的製造商在運送此室時將需要獲得 特殊的協助,譬如警察的護衛,,,超大尺寸貨物,,的簽核等 等。本創作的多件式電子元件製造處理室丨00就不需要此 類的協助。 11The M312762 has a width of about 2.4 meters and the third process chamber member 113 has a maximum length of 4.2 meters. The length and/or width of the third processing chamber component 113 can be somewhat larger or smaller than the above values. In the illustrated embodiment, the maximum length LC1 of the three process chamber components 113 is also the total diameter of the chamber 100. As shown, the length LSI of the first process chamber member 109 and the length LS2 of the second chamber member 11 1 are equal to the length of the side of the third process chamber member 141. However, the length LSI of the first process chamber component 109 and the length LS2 of the second chamber component 1 1 1 may be different. In one implementation, both the width WS1 of the first process chamber component 109 and the width WS2 of the second process chamber section 111 are both about 0.9 meters. However, the width WS1 of the first processing chamber portion 109 and/or the width WS2 of the second processing chamber member 111 are different from (e.g., larger or smaller) the above numerical values and/or two widths to be different from each other. (In a particular embodiment, the third process chamber component 1 can have a width that is approximately equal to or less than the degree of the first process chamber component 109 plus the width of the second process chamber component 111, however, the first process There may be other relationships between the width of the chamber portion 109, the second processing chamber member 111 and the third processing chamber member 113.) Each processing chamber portion of the multi-piece electronic component manufacturing processing chamber 1 is 1 0 9 - 1 1 3 is used, for example, aluminum, stainless steel or any material that is available, relatively reflective and can be used as a transfer chamber. Although the overall size of the multi-piece electronic component manufacturing process chamber 1 is not in accordance with terrestrial and/or air transportation regulations, each of the processing chamber components 109-113 of the multi-piece electronic component manufacturing chamber 100 conforms to land and/or Or air transport regulations. In detail, in the example described, the multi-piece electronic component is approximately the first straight edge of the sample piece, the cocoa 13 wide piece of the piece is singularly transported by the member 10 M312762 t ^ at a total of 1 to 0 The width is 4.2 meters and it does not comply with the requirements of the land and / or the second wheel. However, the width WS1 of the first process chamber component and the width WS2 of the first process chamber component 〇1 are 〇·9 meters and the width WC 1 of the third process chamber component 311 is 2·4 meters, which are all in accordance with the land. And / or air transport regulations. (In another embodiment, the width WC1 of the third process chamber member 丨丨3 is 3 to 3.2 meters, and the widths WS1, WS2 of the first and second process chamber members 1 〇 9, 111 are 0.5 to 〇·6 Further, each of the processing chamber components 1 09-11 3 of the multi-piece electronic component manufacturing processing chamber 100 can be fabricated on a conventional processing tool or machine. Therefore, the manufacturer of the multi-piece electronic component manufacturing processing chamber 1 can select one or more implements or machines from a plurality of conventional processing tools or machines to manufacture the processing of the multi-piece electronic component manufacturing processing chamber 100. Room components 109-113. The manufacturer of the multi-piece electronic component manufacturing process chamber 1 can obtain a good price from the competition of many conventional processing tools or machines. Conversely, the number of processing implements or machines that can be used to fabricate a single-piece electronic component manufacturing process chamber 1 that can accommodate large substrate sizes is relatively limited. The result of this limited number of processing tools or machines is a reduction in competition. As competition is reduced, the manufacturer will have to pay more for the one-piece room than for the multi-piece electronics manufacturing process. Also, because this one-piece room does not comply with terrestrial and/or air transport regulations', manufacturers of such one-piece rooms will need special assistance when transporting this room, such as police guards, oversized Size goods,, signing, etc. The multi-piece electronic component manufacturing processing chamber 丨00 of the present invention does not require such assistance. 11

M312762 該第一多件式電子元件製造處理室 將參照第2A圖以及第2B-2D圖來加以 為第1室100組裝好之後的立體圖;第 的俯視圖;及第2D圖為第一室100的 一室100的一切面,其適於耦接至三基 室,這將於下文中詳細說明)。 參照第2A-2D圖,第一室100包括 201 A-F(20 1D 此室的外部是看不到的) 中,有六個下凹的切面被提供,但數量 亦可被使用。 每一下凹的切面 201A-F都提供一 室,一負載鎖定室或其它室可如圖所示 處(例如透過一 Ο型環或其它密封件), 室103。雖然有該等下凹的切面201Α-Ϊ 1 00的整體結構為一圓柱形。例如,如 該第一(側)處理室部件109包括一圓柱 的切面 201B,201C形成於其内,及負 111包括一圓柱形壁205可讓下凹的切 於其内。該第三(中央)處理室部件113 側壁207,2 09(如第2A圖所示),其分 201A , 201D 。 因為處理室部件109,111,113的〇 2 07,209的關係,第一室100的内部區 (力如參見第2A及2C圖)。當容許一位 100的其它特徵現 說明,其中第2B圖 2C圖為第一室100 側視圖(其顯示出第 材疊置式負載鎖定 複數個下凹的切面 。在所示的實施例 更多或更少的切面 平的區域讓一製程 地密封地耦接至該 例如,第1圖中的 的存在,但第一室 第2A-2C圖所示, 形壁203可讓下凹 5二(側)處理室部件 面201E,201F形成 具有圓柱形的對立 別包括下凹的切面 0柱形壁203, 205, 域亦大致為圓柱形 在該第一室100内 12 口 211A-D亦在基材傳送通過形成在第一及第二處理室部 件109,111的各切面上之開口(狹缝開口)時,提供額外的 間隙。亦即,槽口 211A_D可在基材分別傳送通過對應於M312762 The first multi-piece electronic component manufacturing processing chamber will be assembled after the first chamber 100 is assembled with reference to FIGS. 2A and 2B-2D; a top view; and a 2D view of the first chamber 100 All sides of a chamber 100, which are adapted to be coupled to a three-base chamber, as will be described in more detail below). Referring to Figures 2A-2D, the first chamber 100 includes 201 A-F (20 1D is not visible outside of the chamber), and six concave cuts are provided, but the number can also be used. Each of the concave cut surfaces 201A-F provides a chamber, a load lock chamber or other chamber as shown (e.g., through a loop or other seal), chamber 103. Although the overall structure of the concave facets 201Α-Ϊ 1 00 is a cylindrical shape. For example, if the first (side) processing chamber component 109 includes a cylindrical cut surface 201B, 201C formed therein, and the negative 111 includes a cylindrical wall 205 that allows the recess to be cut therein. The third (central) processing chamber component 113 has side walls 207, 2 09 (shown in Figure 2A), which are divided into 201A, 201D. Because of the relationship of the chamber components 109, 111, 113, the inner region of the first chamber 100 (see, for example, Figures 2A and 2C). Other features that allow one bit 100 are now illustrated, wherein FIG. 2B FIG. 2C is a side view of the first chamber 100 (which shows the first stacked load locks a plurality of concave cut faces. More embodiments in the illustrated embodiment or Fewer cross-sectional areas allow a process to be sealingly coupled to the presence of, for example, Figure 1, but as shown in Figure 2A-2C of the first chamber, the wall 203 can be recessed 5 (side) The process chamber component faces 201E, 201F are formed with cylindrically opposed faces including recessed facet 0 cylindrical walls 203, 205, which are also generally cylindrical in the first chamber 100. 12 ports 211A-D are also in the substrate. An additional gap is provided through the openings (slit openings) formed in the respective cut faces of the first and second process chamber members 109, 111. That is, the notches 211A_D can be transported through the substrate respectively corresponding to

M312762 的真二機為人自由地轉動時,圓柱形結構可減少第—室 100的内部空間。此一轉動是在,例%,該機器人轉動來 將基材傳达於與該第一室100相耦接的各室103(第i圖) 之間時發生的。 為了要容納一真空機器人過該第三(中央)處理室部件 113的旋轉,該第三處理室部件ιΐ3包括有槽口的區域 211AD(參見第2A圖,圖中只有槽口 2UA_C被示出)。槽 下凹的切面201F,201E,201C,201B(如第2A及a圖所 示)的開口 213 ’ 215 ’ 217,219時,提供額外的間隙。 雖然所示的第一及第二處理室部件309, 3 1 1的下凹切 面201B,201C,201E,20 1F只具有一開口 ,但每一下凹 的切面都可包括額外的開口(如,2,3,4或更多開口)。 相同地,所示的第三(中央)處理室部件113的切面2〇1A具 有一單一的開口 22 1(第2A圖),但它亦可包括額外的開口 (如,2,3,4等等)。第三處理室部件113的切面21〇D(第 2D圖)包括三個垂直地疊設的開口 223A-C(第2A及2D 圖),但亦可包括其它數目的開口(如,1,2,4,5等等)。 在本創作的至少一實施例中,該第三處理室部件丨丨3的下 凹切面2 1 0D的中間開口 223B與第二側處理室部件i丨丨的 下凹切面2 0 1 E的開口 2 1 5及第一側處理室部件i 〇 9的下 凹切面201C的開口 217垂直地對齊(如第2D圖所示)。應 13When the real two-machine of the M312762 is freely rotated, the cylindrical structure can reduce the internal space of the first chamber 100. This rotation occurs when, for example, the robot rotates to convey the substrate between the chambers 103 (i-th) coupled to the first chamber 100. In order to accommodate the rotation of the vacuum robot through the third (central) processing chamber component 113, the third processing chamber component ι3 includes a notched region 211AD (see Figure 2A, only the notch 2UA_C is shown) . Additional gaps are provided when the slots 213', 215', 217, 219 of the recessed facets 201F, 201E, 201C, 201B (as shown in Figures 2A and a). Although the concave cut faces 201B, 201C, 201E, 20 1F of the first and second process chamber components 309, 31 are shown as having only one opening, each of the concave cut faces may include additional openings (eg, 2 , 3, 4 or more openings). Similarly, the cut surface 2〇1A of the illustrated third (central) process chamber component 113 has a single opening 22 1 (Fig. 2A), but it may also include additional openings (e.g., 2, 3, 4, etc.) Wait). The cut surface 21〇D (Fig. 2D) of the third process chamber component 113 includes three vertically stacked openings 223A-C (2A and 2D views), but may also include other numbers of openings (e.g., 1, 2). , 4, 5, etc.). In at least one embodiment of the present invention, the intermediate opening 223B of the concave cut surface 2 1 0D of the third processing chamber component 3 and the opening of the concave cut surface 2 0 1 E of the second side processing chamber component i丨丨2 1 5 and the opening 217 of the concave cut surface 201C of the first side processing chamber component i 〇 9 are vertically aligned (as shown in Fig. 2D). Should 13

M312762 注意的是,每一開口 2 1 3-223C都被作成可讓一基材通過的 大小。其它的結構及對齊亦可被使用。 參照第2A-2B圖,該第一及第二側處理室部件109, 111包括複數個鰭片結構22 5,每一個鰭片結構都可提供第 一室1 00結構上的完整性。例如,鰭片結構225可減小因 介於第一室100的内部區域與耦接至該第一室的製程室之 間’及/或與該第一室1 00外的環境之間的壓差所造成的第 一及第二側處理室部件 1 0 9,1 11的圓柱形側/等壁的偏 斜。又,該鰭片結構225的使用可減小第一及第二側處理 室部件1 0 9,1 1 1的壁厚,並降低第一室1 〇 〇的總重量。在 一實施例中,該等鰭片結構225在靠近第一及第二側處理 室部件109,1 1 1的靠近側壁/頂壁處具有約0.55英吋的厚 度,及在第一及第二側處理室部件1 09,1 1 1的接觸該中央 處理室部件113的密封表面處具有約1.3英吋的厚度(對不 銹鋼而言),但其它的材質及/或厚度亦可被使用。 如第2A圖所示,該第一室1〇〇的第三(中央)處理室部 件 1 13的底部 227包括一平的部分 229及一圓頂部分 21 3(亦參見第2D圖)。該圓頂部分231因為其圓頂的關係 所以可提供增進的強度給該底部227,且可降低該底部227 的材料厚度要求。在一示範性的實施例中,當使用不銹鋼 時’該圓頂部分231可具有一約3/8”或更小的厚度,而平 的部分227則具有一約3/4”至1”或更小的厚度。其它的材 料及/或厚度值及/或介於平的部分229與圓頂部分231之 間的厚度差亦可被使用。為了要進一步提高該圓頂部分 14M312762 Note that each opening 2 1 3-223C is made to a size that allows a substrate to pass. Other structures and alignments can also be used. Referring to Figures 2A-2B, the first and second side processing chamber components 109, 111 include a plurality of fin structures 22 5, each of which provides structural integrity of the first chamber 100. For example, the fin structure 225 can reduce the pressure between the interior region of the first chamber 100 and the process chamber coupled to the first chamber and/or the environment outside the first chamber 100 The cylindrical side/equal wall deflection of the first and second side processing chamber components 1 0 9, 1 11 caused by the difference. Moreover, the use of the fin structure 225 reduces the wall thickness of the first and second side processing chamber components 10, 1 1 1 and reduces the total weight of the first chamber 1 〇 。. In one embodiment, the fin structures 225 have a thickness of about 0.55 inches near the side walls/top walls of the first and second side processing chamber components 109, 11 1 , and in the first and second The side treatment chamber components 1 09, 1 1 1 have a thickness of about 1.3 inches (for stainless steel) at the sealing surface of the central processing chamber component 113, although other materials and/or thicknesses may be used. As shown in Fig. 2A, the bottom portion 227 of the third (central) processing chamber member 1 13 of the first chamber 1 includes a flat portion 229 and a dome portion 21 3 (see also Fig. 2D). The dome portion 231 provides increased strength to the bottom portion 227 due to its dome relationship and can reduce the material thickness requirements of the bottom portion 227. In an exemplary embodiment, when stainless steel is used, the dome portion 231 can have a thickness of about 3/8" or less, while the flat portion 227 has a thickness of about 3/4" to 1" or A smaller thickness. Other material and/or thickness values and/or thickness differences between the flat portion 229 and the dome portion 231 may also be used. To further enhance the dome portion 14

M312762 2 3 1,可在該圓頂部分2 3 1的底下形成鰭片或類似的支撐結 構233,如第2D圖所示。使用鰭片233可減小,例如,圓 頂部分2 3 1的垂直偏斜。 第2B-2C圖顯示一頂蓋23 5,它可與第一室1 〇〇 —其 被使用。例如,頂蓋23 5可適於密封該第一室ι〇〇的第三(中 央)處理室部件1 1 3 (藉由使用一 〇型環或類似的密封件於 等蓋235與第三處理室部件113之間 參照第2B-2C圖,頂蓋23 5包括一用複數個支撐結構 (如圖所示的樑2 3 9)加以強化之平的密封部分2 3 7。該密封 部分237可具有一厚度’其近似於該室1〇〇的底部227的 平的部分229(第2A圖)的厚度,且樑239提供額外的結構 f生支撐(讓頂蓋235的厚度及重量得以減輕)。頂蓋235可 包括一連結位置241,它可被用來將該頂蓋23 5相對於第 一室1〇〇升高及/或降低(譬如,透過一起重機或類此者)。 因為頂蓋235的重量的關係,提供一或多個進出艙口 (hatch)(未示出)或其它開口於該頂蓋23 5上是較佳的,使 得整個頂i 23 5不必從第一室1〇〇上被取下才能進出該第 一室1〇〇的内部(如,為了維修或保養)。任何數樣的進出 驗口都可被包括(如,1,3,4個等等)。 第3圖為依據本創作的某些實施例的第二示範性多件 式電子元件製造處理室300的俯視圖。參照第3圖,該多 件式電子元件製造處理t 300“來在電子元件製造期間 輸送基材的-料t。該# “ 3〇〇在電子元件製造期間 被耦接至一或多個製程室及/或&^ 1 _ ..... 15M312762 2 3 1, fins or similar support structures 233 may be formed underneath the dome portion 213 as shown in Fig. 2D. The fins 233 can be used to reduce, for example, the vertical deflection of the dome portion 2 31. Figure 2B-2C shows a top cover 23 5 which can be used with the first chamber 1 - it is used. For example, the top cover 23 5 can be adapted to seal the third (central) process chamber component 1 1 3 of the first chamber (by using a 〇-shaped ring or similar seal on the equal cover 235 and the third treatment Referring to Figure 2B-2C between the chamber members 113, the top cover 23 5 includes a flat sealing portion 237 that is reinforced with a plurality of support structures (beams 239 as shown). The sealing portion 237 can Having a thickness 'which approximates the thickness of the flat portion 229 (Fig. 2A) of the bottom 227 of the chamber 1 ,, and the beam 239 provides additional structural support (to reduce the thickness and weight of the top cover 235) The top cover 235 can include a joint location 241 that can be used to raise and/or lower the top cover 23 5 relative to the first chamber 1 (eg, through a crane or the like). The relationship of the weight of the cover 235, it is preferred to provide one or more inlet hatches (not shown) or other openings on the top cover 23 5 such that the entire top i 23 5 does not have to be from the first chamber 1 The raft is removed to gain access to the interior of the first chamber (eg, for repair or maintenance). Any number of access checks Can be included (eg, 1, 3, 4, etc.). Figure 3 is a top plan view of a second exemplary multi-piece electronic component fabrication processing chamber 300 in accordance with certain embodiments of the present disclosure. Referring to Figure 3, The multi-piece electronic component manufacturing process t 300 "to feed the substrate during the manufacture of the electronic component - the material "t" is coupled to one or more process chambers and/or &;^ 1 _ ..... 15

M312762 100可包括一末端效應器(end effector)(未示出)用來在電 子元件製造期間傳送一基材於製程室及/或負載鎖定室之 間。 依據本創作的一些實施例,該傳送室3 0 0可包括複數 個可被耦接在一起的處理室部件。詳言之,該傳送室 300 可包括一第一處理室部件 3 0 9 (如,一第一側處理室部件) 及一第二處理室部件3 1 1 (如,一第二側處理室部件)其耦接 至一第三處理室部件 3 1 3 (如,一中央處理室部件)。該第 一處理室部件3 0 9及第二處理室部件3 1 1各別經由一 Ο型 環(未被分開來顯示)而耦接至該第三處理室部件 3 1 3。該 第一處理室部件3 09及第二處理室部件3 1 1各別藉由使用 一固定機構,譬如像是螺釘,螺栓或類此者,而耦接至該 第三處理室部件3 13。雖然,第3圖的多件式電子元件製 造處理室3 00包括了三個處理室部件,但該多件式電子元 件製造處理室可包含數目更多或更少的處理室部件(如, 2,4,5,6個等等)。 在本創作的一或多個態樣中,該多件式傳送室在被組 裝起來之後的寬度(如,總度)W2為4.2公尺。因此,本創 作的電子元件製造處理室3 00可容納比傳統的單件式傳送 室更大的基材。該電子元件製造室300的寬度可以比4.2 公尺更大或更小。 依據本創作的一些實施例,從俯視圖或從側剖面圖來 看,該多件式電子元件製造處理室的每一個處理室部件 3 09-3 1 3 的形狀都像是被一或多條線繩所切的圓。例如, 16The M312762 100 can include an end effector (not shown) for transferring a substrate between the process chamber and/or the load lock chamber during manufacture of the electronic component. According to some embodiments of the present author, the transfer chamber 300 may include a plurality of process chamber components that may be coupled together. In detail, the transfer chamber 300 can include a first processing chamber component 309 (eg, a first side processing chamber component) and a second processing chamber component 31 (eg, a second side processing chamber component) It is coupled to a third process chamber component 3 1 3 (eg, a central processing chamber component). The first process chamber component 309 and the second process chamber component 311 are each coupled to the third process chamber component 313 via a Ο-type ring (not shown separately). The first process chamber component 3 09 and the second process chamber component 3 1 1 are each coupled to the third process chamber component 3 13 by use of a securing mechanism, such as a screw, bolt or the like. Although the multi-piece electronic component manufacturing process chamber 300 of FIG. 3 includes three processing chamber components, the multi-piece electronic component manufacturing processing chamber may include a greater or lesser number of processing chamber components (eg, 2 , 4, 5, 6, etc.). In one or more aspects of the present creation, the width (e.g., total) W2 of the multi-piece transfer chamber after being assembled is 4.2 meters. Therefore, the electronic component manufacturing process chamber 300 of the present invention can accommodate a larger substrate than a conventional one-piece transfer chamber. The width of the electronic component manufacturing chamber 300 may be larger or smaller than 4.2 meters. According to some embodiments of the present invention, each of the processing chamber components 3 09-3 1 3 of the multi-piece electronic component manufacturing process chamber is shaped like one or more lines, from a top view or a side cross-sectional view. The circle cut by the rope. For example, 16

M312762 從俯視圖或從側剖面圖來看,側處理室部件3 09,3 1 1類似 一被一線繩所切過(或,更一般性地,一橢圓)切過的一部 分。相同地,從俯視圖或從側剖面圖來看,該中央處理室 部件3 1 3類似於一個圓被兩條平行的線繩所切過的部分。 此形狀包括兩個彎曲部段及兩個直線段。側處理室部件 3 09,3 1 1的形狀包括一彎曲段及一直線段。應注意的是, 處理室部件3 09-3 1 3中的每一者都沒有一多邊形的形狀。 換言之,處理室部件3 0 9 - 3 1 3中的每一者都包括至少一彎 曲段。 從俯視圖或從側剖面圖來看,該示範性多件式電子元 件製造處理室3 0 0在組裝好之後(如,組合好的形狀)為一 圓形。該示範性多件式電子元件製造處理室3 0 0在組裝好 之後的整體形狀(如,三維度的形狀)為一圓柱形。然而, 該示範性多件式電子元件製造處理室300可具有包括各式 非多邊迎形狀在内的其它整體形狀(如,橢圓形的柱體)。 如上文中提及的,這些非多邊形的室,特別是對稱的非多 邊形室(如,一圓柱形的室),其可提供最適用的内部基材 傳送區域予一定量的處理室材料。例如,與一多邊形室比 較起來,一非多邊形室不會包括用不到的角落區域。 第4A圖為依據本創作的某些實施例的第一示範性多 件式電子元件製造處理室3 00(其相對於第3圖被旋轉)的 分解立體圖。第一至第三處理室部件309-313中的每一者 被水平地耦接用以形成該多件式電子元件製造處理室 3 00。該第一處理室部件109的長度以LSI來代表及該第 17M312762 From a top view or from a side cross-sectional view, the side processing chamber components 3 09, 31 1 are similar to a portion cut by a string (or, more generally, an ellipse). Similarly, from a top view or from a side cross-sectional view, the central processing chamber component 313 is similar to a portion of a circle that was cut by two parallel strands. This shape includes two curved sections and two straight sections. The shape of the side processing chamber component 3 09, 3 1 1 includes a curved section and a straight section. It should be noted that each of the process chamber components 3 09-3 1 3 does not have the shape of a polygon. In other words, each of the process chamber components 3 0 9 - 3 1 3 includes at least one curved segment. The exemplary multi-piece electronic component manufacturing process chamber 300 is rounded after assembly (e.g., combined shape) from a top view or from a side cross-sectional view. The overall shape (e.g., three-dimensional shape) of the exemplary multi-piece electronic component manufacturing process chamber 300 after assembly is a cylindrical shape. However, the exemplary multi-piece electronic component manufacturing process chamber 300 can have other integral shapes (e.g., elliptical cylinders) including various non-multilateral shape shapes. As mentioned above, these non-polygonal chambers, particularly symmetrical non-polygonal chambers (e.g., a cylindrical chamber), provide the most suitable internal substrate transfer area to a certain amount of processing chamber material. For example, a non-polygon chamber will not include corner areas that are not used, as compared to a polygonal chamber. Figure 4A is an exploded perspective view of a first exemplary multi-piece electronic component manufacturing process chamber 300 (which is rotated relative to Figure 3) in accordance with certain embodiments of the present teachings. Each of the first to third process chamber components 309-313 is horizontally coupled to form the multi-piece electronic component manufacturing process chamber 300. The length of the first processing chamber component 109 is represented by LSI and the 17th

M312762 一處理室部件3 09的最大寬度(如,在最寬點的寬度)是以 WS1’來代表。該第二處理室部件311的長度以LS2’來代表 及該第二處理室部件3 1 1的最大寬度是以W S 2 ’來代表。該 第三處理室部件3 1 3的最大長度(如,在最長點的長度)以 LC’l來代表及該第三處理室部件313的寬度是以WC1’來 代表。 在一或多個實施例中,該第三處理室部件3 1 3的最大 寬度WC1’約為2.4公尺及該第三處理室部件313的最大長 度LC1’約為4.2公尺。該第三處理室部件313的長度及/ 或寬度可以比上述的數值大一些或小一些。在所示的實施 例中,該第三處理室部件 3 1 3的最大長度 LC 1 ’亦為該室 3 00的總直徑。如圖所示,第一處理室部件309的長度LSI ’ 及第二處理室部件 3 1 1的長度 LS2 ’等於第三處理室部件 3 1 3的側邊的長度。然而,第一處理室部件3 09的長度LS 1 ’ 與第二處理室部件311的長度LS2’可以是不相同的。在一 實施例中,第一處理室部件3 09的寬度WS 1 ’及/或第二處 理室部件3 1 1的寬度WS2’都約為0.9公尺。然而,第一處 理室部件309的寬度WS1’及/或第二處理室部件311的寬 度 WS2’可以不同於上述數值(如,大一些或小一些)及/或 兩個寬度可以彼此不同。(在一特定的實施例中,第三處理 室部件1 1 3可具有一寬度,其約等於或小於第一處理室部 件3 09的寬度加上第二處理室部件3 1 1的寬度,惟,第一 處理室部件3 0 9,第二處理室部件3 1 1及第三處理室部件 3 1 3的寬度之間亦可以有其它的關係。) 18 的每一處理室部件 或任何可用、相對M312762 The maximum width of a process chamber component 3 09 (e.g., the width at the widest point) is represented by WS1'. The length of the second processing chamber component 311 is represented by LS2' and the maximum width of the second processing chamber component 31 1 is represented by W S 2 '. The maximum length of the third process chamber component 3 1 3 (e.g., the length at the longest point) is represented by LC'1 and the width of the third process chamber component 313 is represented by WC1'. In one or more embodiments, the third process chamber component 313 has a maximum width WC1' of about 2.4 meters and the third process chamber component 313 has a maximum length LC1' of about 4.2 meters. The length and/or width of the third processing chamber component 313 can be somewhat larger or smaller than the above values. In the illustrated embodiment, the maximum length LC 1 ' of the third process chamber component 3 1 3 is also the total diameter of the chamber 300. As shown, the length LS' of the first processing chamber member 309 and the length LS2' of the second processing chamber member 31 1 are equal to the length of the side of the third processing chamber member 313. However, the length LS 1 ' of the first process chamber component 309 and the length LS2' of the second process chamber component 311 may be different. In one embodiment, the width WS 1 ' of the first processing chamber component 309 and/or the width WS2' of the second processing chamber component 31 1 are both about 0.9 meters. However, the width WS1' of the first process chamber component 309 and/or the width WS2' of the second process chamber component 311 may differ from the above values (e.g., larger or smaller) and/or the two widths may be different from each other. (In a particular embodiment, the third process chamber component 113 may have a width that is approximately equal to or less than the width of the first process chamber component 309 plus the width of the second process chamber component 31. There may be other relationships between the width of the first process chamber component 3 0 9 , the second process chamber component 3 1 1 and the third process chamber component 3 1 3 .) Each of the process chamber components of 18 or any available, relatively

M312762 該多件式電子元件製造處理室3〇〇 3 09-3 1 3都是用,例如,鋁,不銹鋼, 鈍態且可作為傳送室之材質製成。 雖然該多件式電子元件製造處 :陸地及/:戈航空運輸規定’但該多件式電子元件製造處理 至3 0 0的母一處理室部件3 〇 9 _ 3 } 3都爲 _ F付δ陸地及/或航空運 輸規定。詳言《’在所描述的例子中’該多件式電子元件 製造處理室300的總寬度為42公尺’它並不符合陸地及/ 或航空運輸規定。然而,第一處理室部件的寬纟WU,及第 二處理室部件3U的寬度WS2,為"公尺及第三處理室部 件313的寬f,為2.4公尺1們都符合陸地及/或航 空運輸規定。(在另一實施例中,第三處理室部件3丨3的寬 度WC1,為3至3.2公尺,第〆及第二處理室部件3〇9, S11 的寬度WS1’,WS2’為〇 5至〇·6公尺。) 又’該多件式電子元件製造處理室300的每—處理室 部件3 09-3 1 3都可以在傳統的加工機具或機台上來製造。 因此,該多件式電子元件製造處理室100的製造商可從恭 多的傳統加工機具或機台中選擇一或多個機具或機台來製 造該多件式電子元件製造處理室300的處理室部件 309-313。該多件式電子元件製造處理室300的製造者町從 眾多的傳統的加工機具或機台的競爭中取得到一個好償 錢。而且’本創作的多件式電子元件製造處理室3〇〇不需 要特殊的運輸協助。 該第一多件式電子元件製造處理室300的其它特徵現 19M312762 The multi-piece electronic component manufacturing processing chamber 3〇〇 3 09-3 1 3 is used, for example, aluminum, stainless steel, passive and can be made as a material for the transfer chamber. Although the multi-piece electronic component manufacturing site: land and /: Ge air transport regulations 'but the multi-piece electronic component manufacturing process to 300 mother-processing room components 3 〇9 _ 3 } 3 are _ F δ Land and/or air transport regulations. DETAILED DESCRIPTION OF THE INVENTION In the described example, the multi-piece electronic component manufacturing process chamber 300 has a total width of 42 meters. It does not comply with terrestrial and/or air transportation regulations. However, the width WU of the first process chamber component and the width WS2 of the second process chamber component 3U are the width f of the "metric ruler and the third process chamber component 313, which are 2.4 meters and are in accordance with the land and/or Or air transport regulations. (In another embodiment, the width WC1 of the third processing chamber component 3丨3 is 3 to 3.2 meters, and the widths WS1', WS2' of the second and second processing chamber components 3〇9, S11 are 〇5 Up to 6 meters.) Further, each of the processing chamber components 3 09-3 1 3 of the multi-piece electronic component manufacturing process chamber 300 can be manufactured on a conventional processing tool or machine. Therefore, the manufacturer of the multi-piece electronic component manufacturing processing chamber 100 can select one or more implements or machines from a variety of conventional processing tools or machines to manufacture the processing chamber of the multi-piece electronic component manufacturing processing chamber 300. Parts 309-313. The maker of the multi-piece electronic component manufacturing processing chamber 300 obtains a good payout from the competition of many conventional processing tools or machines. Moreover, the multi-piece electronic component manufacturing process chamber 3 of the present invention does not require special transportation assistance. Other features of the first multi-piece electronic component manufacturing process chamber 300 are now

M312762 將參照第4A圖以及第4B-4D圖來加以說明,其中第4B圖 為第二室300組裝好之後的立體圖;第4C圖為第二室300 的俯視圖;及第4D圖為第二室3 00的側視圖(其顯示出第 二室300的一切面,其適於耦接至一三基材疊置式負載鎖 定室,這將於下文中詳細說明)。 參照第4A-4D圖,第一室300包括複數個突伸出的切 面401A-F它們從室300的彎曲側壁突伸出。在所示的實 施例中,有六個突伸出的切面被提供,但數量更多或更少 的切面亦可被使用。 每一突伸出的切面 401 A-F都提供一平的區域讓一製 程室,一負載鎖定室或其它室可如圖所示地密封地耦接至 該處(例如透過一 0型環或其它密封件),例如,第3圖中 的室103。雖然有該等突伸出的切面401A-F的存在,但第 二室300的整體結構為一大致圓柱形。例如,如第4A-4C 圖所示,該第一(側)處理室部件309包括一圓柱形壁403 可讓突伸出的切面 4 0 1 B,4 0 1 C形成於其内,及第二(側) 處理室部件 311包括一圓柱形壁 405可讓突伸出的切面 401E,401F從該處延伸出。該第三(中央)處理室部件313 具有圓柱形的對立側壁407,409 (如第4A圖所示),其分 別包括突伸出的切面401A,401D。 因為處理室部件309, 311,313的圓柱形壁403, 405, 407,409的關係,第二室3 00的内部區域亦大致為圓柱形 (例如參見第4A及4C圖)。當容許一位在該第二室3 00内 的真空機器人自由地轉動時,圓柱形結構可減少第二室 20M312762 will be described with reference to FIG. 4A and FIG. 4B-4D, wherein FIG. 4B is a perspective view of the second chamber 300 after assembly; FIG. 4C is a plan view of the second chamber 300; and FIG. 4D is a second chamber. A side view of 300 (which shows all of the faces of the second chamber 300, which are adapted to be coupled to a three-substrate stacked load lock chamber, as will be explained in more detail below). Referring to Figures 4A-4D, the first chamber 300 includes a plurality of protruding cut faces 401A-F which project from the curved side walls of the chamber 300. In the illustrated embodiment, six protruding cuts are provided, but a greater or lesser number of cuts can be used. Each raised face 401 AF provides a flat area for a process chamber, a load lock chamber or other chamber to be sealingly coupled thereto as shown (eg, through a 0-ring or other seal) ), for example, the chamber 103 in FIG. Despite the presence of the raised facets 401A-F, the overall configuration of the second chamber 300 is generally cylindrical. For example, as shown in Figures 4A-4C, the first (side) processing chamber component 309 includes a cylindrical wall 403 in which the projecting facets 4 0 1 B, 4 0 1 C are formed, and The two (side) processing chamber component 311 includes a cylindrical wall 405 from which the projecting cut faces 401E, 401F extend. The third (central) process chamber component 313 has cylindrical opposing side walls 407, 409 (shown in Figure 4A) that include projecting cut faces 401A, 401D, respectively. Because of the relationship of the cylindrical walls 403, 405, 407, 409 of the process chamber components 309, 311, 313, the interior region of the second chamber 300 is also generally cylindrical (see, for example, Figures 4A and 4C). The cylindrical structure can reduce the second chamber 20 when a vacuum robot in the second chamber 300 is allowed to freely rotate.

M312762 1 00的内部空間。此一轉動是在,例如,該機器人轉動來 將基材傳达於與該第二室300相耦接的各室1〇3(第3圖 之間時發生的。 Θ > 為了要容納一真空機器人過該第三(中央)處理室部件 3 1 3的旋轉,該第三處理室部件3丨3包括有槽口的區域 411A-D(參見第4Α圖,圖中只有槽口 411A-C被示出)。槽 口 411 A-D亦在基材傳送通過形成在第一及第二處理室部 件1 09,111的各切面上之開口(狹缝開口)時,提供額外的 間隙。亦即,槽口 4 1 1 A-D可在基材分別傳送通過對應於 突伸出的切面401F,401E,401C,401B(如第4A及4B圖 所示)的開口 4 1 3,4 1 5,4 1 7,4 1 9時,提供額外的間隙。 雖然所示的第一及第二處理室部件3 09,3 1 1的伸出切 面401B,401C,401E,401F只具有一開口 ,但每一突伸 出的切面都可包括額外的開口(如,2,3,4或更多開口)。 相同地,所示的第三(中央)處理室部件3 1 3的切面40 1 A具 有一單一的開口 42 1 (第4 A圖),但它亦可包括額外的開口 (如,2,3,4個等等)。第三處理室部件313的切面410D (第 4D圖)包括三個垂直地疊設的開口 423A-C(第 4A及4D 圖),但亦可包括其它數目的開口(如,1,2,4,5個等等)。 在本創作的至少一實施例中,該第三處理室部件3丨3之突 伸出的切面410D的中間開口 423B與第二側處理室部件 3 11之突伸出的切面2 0 1 E的開口 2 1 5及第一側處理室部件 309之突伸出的切面401C的開口 417垂直地對齊(如第4D 圖所示)。應注意的是,每一開口 4 1 3 - 4 2 3 C都被作成可讓 21M312762 1 00 internal space. This rotation occurs, for example, when the robot rotates to convey the substrate to each of the chambers 1〇3 (Fig. 3) coupled to the second chamber 300. Θ > The vacuum robot passes the rotation of the third (central) processing chamber component 3 1 3, and the third processing chamber component 3丨3 includes the notched regions 411A-D (see Figure 4, only the notches 411A-C in the figure) The notch 411 AD also provides an additional gap when the substrate is conveyed through openings (slit openings) formed in the respective cut faces of the first and second process chamber members 109, 111. The notch 4 1 1 AD can be conveyed through the substrate through openings corresponding to the protruding faces 401F, 401E, 401C, 401B (as shown in Figures 4A and 4B), respectively, 4 1 3, 4 1 5, 4 1 7 Additional clearance is provided at 4 1 pm. Although the extended sections 401B, 401C, 401E, 401F of the first and second process chamber components 3 09, 31 1 are shown to have only one opening, each projection The cut faces may include additional openings (eg, 2, 3, 4 or more openings). Similarly, the third (central) process chamber component 3 1 3 is shown. The face 40 1 A has a single opening 42 1 (Fig. 4A), but it may also include additional openings (e.g., 2, 3, 4, etc.). The cut surface 410D of the third process chamber component 313 ( Figure 4D) includes three vertically stacked openings 423A-C (Figs. 4A and 4D), but may also include other numbers of openings (e.g., 1, 2, 4, 5, etc.). In at least one embodiment, the intermediate opening 423B of the protruding section 410D of the third processing chamber component 3丨3 and the opening 2 1 of the second processing chamber component 311 projecting the slit 2 0 1 E 5 and the opening 417 of the protruding face 401C of the first side processing chamber component 309 is vertically aligned (as shown in Fig. 4D). It should be noted that each opening 4 1 3 - 4 2 3 C is made Let 21

M312762 一基材通過的大小。其它的結構及對齊亦可被使用。 參照第4A-4B圖,該第一及第二側處理室部件3 09, 3 1 1包括複數個鰭片結構42 5,每一個鰭片結構都可提供第 二室300結構上的完整性。例如,鰭片結構225可減小因 介於第二室300的内部區域與耦接至該第二室的製程室之 間,及/或與該第二室3 0 0外的環境之間的壓差所造成的第 一及第二側處理室部件 3 0 9,3 1 1的圓柱形側/等壁的偏 斜。又,該鰭片結構4 2 5的使用可減小第一及第二側處理 室部件3 09,3 1 1的壁厚,並降低第二室3 00的總重量。在 一實施例中,該等鰭片結構42 5在靠近第一及第二側處理 室部件3 09,3 1 1的靠近側壁/頂壁處具有約0.5 5英吋的厚 度,及在第一及第二側處理室部件3 09,3 1 1的接觸該中央 處理室部件3 1 3的密封表面處具有約1 .3英吋的厚度(對不 銹鋼而言),但其它的材質及/或厚度亦可被使用。 如進一步於第4A圖所示,該第二室3 00的第三(中央) 處理室部件3 1 3的底部427包括一平的部分429及一圓頂 部分4 1 3 (亦參見第4D圖)。..該圓頂部分43 1因為其圓頂的 關係所以可提供增進的強度給該底部 42 7,且可降低該底 部427的材料厚度要求。在一示範性的實施例中,當使用 不銹鋼時,該圓頂部分 431可具有一約 3/8”或更小的厚 度,而平的部分427則具有一約3/4”至1”或更小的厚度。 其它的材料及/或厚度值及/或介於平的部分429與圓頂部 分43 1之間的厚度差亦可被使用。為了要進一步提高該圓 頂部分43 1,可在該圓頂部分431的底下形成鰭片或類似 22M312762 The size of a substrate through. Other structures and alignments can also be used. Referring to Figures 4A-4B, the first and second side processing chamber components 3 09, 31 1 include a plurality of fin structures 42 5 , each of which provides structural integrity of the second chamber 300. For example, the fin structure 225 can be reduced between the interior region of the second chamber 300 and the process chamber coupled to the second chamber, and/or between the environment outside the second chamber 300. The deflection of the cylindrical side/equal wall of the first and second side processing chamber components 3 0 9, 3 1 1 caused by the pressure difference. Moreover, the use of the fin structure 425 reduces the wall thickness of the first and second side processing chamber components 3 09, 31 1 and reduces the total weight of the second chamber 300. In one embodiment, the fin structures 42 5 have a thickness of about 0.5 5 inches near the side walls/top walls of the first and second side processing chamber components 3 09, 31 1 , and at the first And the second side processing chamber component 3 09, 31 1 has a thickness of about 1.3 inches (for stainless steel) at the sealing surface of the central processing chamber component 3 1 3 , but other materials and/or Thickness can also be used. As further shown in Fig. 4A, the bottom portion 427 of the third (central) processing chamber component 313 of the second chamber 300 includes a flat portion 429 and a dome portion 4 1 3 (see also Figure 4D). The dome portion 43 1 can provide increased strength to the bottom portion 42 7 due to its dome relationship and can reduce the material thickness requirements of the bottom portion 427. In an exemplary embodiment, when stainless steel is used, the dome portion 431 can have a thickness of about 3/8" or less, while the flat portion 427 has a thickness of about 3/4" to 1" or Smaller thicknesses. Other material and/or thickness values and/or thickness differences between the flat portion 429 and the dome portion 43 1 may also be used. To further enhance the dome portion 43 1, Forming fins or the like under the dome portion 431

M312762 的支撐結構433,如第4D圖所示。使用鰭片433可減小, 例如,圓頂部分4 3 1的垂直偏斜。 第4B-4C圖顯示一頂蓋43 5,它可與第二室3 00 —其 被使用。例如,頂蓋43 5可適於密封該第二室3 00的第三(中 央)處理室部件3 1 3 (藉由使用一 Ο型環或類似的密封件於 等蓋43 5與第三處理室部件3 1 3之間)。 參照第4B-4C圖,頂蓋43 5包括一用複數個支撐結構 (如圖所示的樑43 9)加以強化之平的密封部分437。該密封 部分43 7可具有一厚度,其近似於該室300的底部427的 平的部分42 9(第4A圖)的厚度,且樑439提供額外的結構 性支撐(讓頂蓋43 5的厚度及重量得以減輕)。頂蓋43 5可 包括一連結位置44 1,它可被用來將該頂蓋4 3 5相對於第 二室300升高及/或降低(譬如,透過一起重機或類此者)。 為了要製造一多件式電子元件製造處理室1〇〇,300, 一使用者,譬如一製造商,可使用本創作的方法 500,其 將於下文中參照第 5圖加以說明。方法 5 0 0開始於步驟 5 02。依據本創作的方法500,在步驟504,該電子元件製 造處理室的一或多個總尺寸被決定。詳言之,一製造商要 製造一所需尺寸的基材。根據該所需要的尺寸,該製造商 可決定(如,設計)一可製造此一基材之電子元件製造處理 室的一或多個總尺寸。如果該所需要的基材尺寸夠大的 話,則該室的總尺寸將無法符合陸地及航空運輸規定中的 至少一者。 之後,在一些實施例中,該製造商,例如,可決定如 23The support structure 433 of the M312762 is as shown in Fig. 4D. The fins 433 can be used to reduce, for example, the vertical deflection of the dome portion 433. Figure 4B-4C shows a top cover 43 5 which can be used with the second chamber 300. For example, the top cover 43 5 can be adapted to seal the third (central) process chamber component 3 1 3 of the second chamber 300 (by using a Ο-shaped ring or similar seal on the equal cover 435 and the third treatment Between the chamber components 3 1 3). Referring to Figures 4B-4C, the top cover 43 5 includes a flat sealing portion 437 that is reinforced with a plurality of support structures (beams 43 9 as shown). The sealing portion 43 7 can have a thickness that approximates the thickness of the flat portion 42 9 (Fig. 4A) of the bottom portion 427 of the chamber 300, and the beam 439 provides additional structural support (allowing the thickness of the top cover 43 5 And the weight is reduced). The top cover 43 5 can include a joint location 44 1 that can be used to raise and/or lower the top cover 435 relative to the second chamber 300 (e.g., through a crane or the like). In order to manufacture a multi-piece electronic component manufacturing process chamber 1, 300, a user, such as a manufacturer, the method 500 of the present invention can be used, which will be described hereinafter with reference to FIG. Method 500 starts at step 5 02. In accordance with the method 500 of the present authorisation, at step 504, one or more overall dimensions of the electronic component fabrication processing chamber are determined. In particular, a manufacturer is required to make a substrate of the desired size. Depending on the desired size, the manufacturer can determine (e. g., design) one or more overall dimensions of an electronic component fabrication process chamber from which the substrate can be fabricated. If the required substrate size is large enough, the overall size of the chamber will not meet at least one of the land and air transportation regulations. Thereafter, in some embodiments, the manufacturer, for example, may decide to

M312762 何將該電子元件製造處理室分切為複數個處理室部件,使 得該等處理室部件中的每一處理室部件的尺寸都符合陸地 及航空運輸規定中的至少一者且在此同時,該室的完整性 在組裝好時將足以實施製造操作。例如,製造商可將經過 設計的多件式電子元件製造處理室分切為使用垂直分段的 處理室部件,譬如第1-4圖所示的電子元件製造處理室 100,3 00。亦可使用水平分段的方式。製造商可決定用其 它方向或方向的組合的分段方式來將電子元件製造處理室 分切成處理室部件。 之後,在步驟 5 0 6,製造該等複數個處理室部件。例 如,製造商可使用一加工機具或機台來製造該等處理室部 件。該多件式電子元件製造處理室100,300即以此方式製 成。 當該電子元件製造處理室100,3 00被製造之後,該電 子元件製造處理室1 00, 300即可在步驟5 08被運送至客戶 所在地。為了要運送一多件式電子元件製造處理室100, 3 00,該製造商可使用運送依據本創作的一或多個實施例之 此一室的方法。例如,複數個電子元件製造處理處理室部 件中的第一處理室部件可透過陸地及航空運輸中的一者來 運送。該第一處理室部件可被放在一符合運輸規定的貨櫃 中,使得該第一處理室部件與該貨櫃的一側(譬如,底側) 形成一角度。因此,如果該第一處理室部件不是以該角度 被放在該貨櫃内的話,則該第一處理室部件可具有比被允 許的尺寸還大的高度或寬度尺寸,且仍能夠放進到一符合 24M312762 How to divide the electronic component manufacturing processing chamber into a plurality of processing chamber components such that each of the processing chamber components is sized to conform to at least one of terrestrial and air transportation regulations and at the same time, The integrity of the chamber will be sufficient to perform manufacturing operations when assembled. For example, a manufacturer can cut a designed multi-piece electronic component fabrication process chamber into vertically segmented process chamber components, such as the electronic component fabrication processing chamber 100, 300 shown in Figures 1-4. Horizontal segmentation can also be used. The manufacturer may decide to divide the electronic component manufacturing process chamber into process chamber components in a segmented manner in a combination of other directions or directions. Thereafter, at step 506, the plurality of processing chamber components are fabricated. For example, a manufacturer can use a processing tool or machine to make the process chamber components. The multi-piece electronic component manufacturing process chamber 100, 300 is produced in this manner. After the electronic component manufacturing process chamber 100, 300 is manufactured, the electronic component manufacturing process chamber 100, 300 can be shipped to the customer's location at step 508. In order to transport a multi-piece electronic component manufacturing process chamber 100, 300, the manufacturer may use a method of transporting such a chamber in accordance with one or more embodiments of the present teachings. For example, the first process chamber component of the plurality of electronic component manufacturing process chamber components can be transported by one of land and air transportation. The first process chamber component can be placed in a container that conforms to shipping regulations such that the first process chamber component forms an angle with one side (e.g., the bottom side) of the container. Thus, if the first process chamber component is not placed in the container at the angle, the first process chamber component can have a height or width dimension that is greater than the allowed size and can still be placed into a Meets 24

M312762 運輸規定的貨櫃内。運送更大的處理室部件的能力讓本創 作之多件式室可由更少的處理室部件來構成。因此,將處 理室部件以一角度放置在貨櫃内是較佳的,但並非是必要 的。在一些實施例中,最好是將一多件式室製造成一儘可 能地大且仍能夠放入到一標準尺寸貨櫃内之主要的或中央 處理室部件,且將其餘的處理室部件做得小一點或儘可能 地小,讓組裝更方便。 在步驟5 1 0,當處理室部件抵達,例如,客戶所在地, 處理室部件可被組裝用以形成該電子元件製造處理室 1 00,3 00。在一些實施例中,突伸出的切面可在步驟 512 被安裝到電子元件製造處理室1〇〇的下凹切面201 A-F中 或取代下凹切面20 1 A-F。在這些實施例中,突伸出的切面 可幫助將負載鎖定室及/或製程室搞接至該電子元件製造 處理室100。在某些實施例中,被增加到下凹的切面201 A-F 上之突伸出的切面完全地延伸到該電子元件製造處理室 1 00的外圓周之外,使得所得到的室看起來與第4A圖所示 的實施例類似。在其它的實施例中,被增加到下凹的切面 20 1 A-F上之突伸出的切面只部分地延伸超過該電子元件 製造處理室100的外圓周。突伸出的切面可包括一帶有一 開口(其被作成可讓一基材通過的大小)之平的區域(用來 耦接一負載鎖定室或一製程室)及一接合部分,其密封地套 入到一下凹的切面2 0 1 A - F的凹部内。 在步驟514,負載鎖定室及/或製程室被耦接至該電子 元件製造處理室100,300的切面。在步驟516,一用來將 25M312762 Transport within the specified container. The ability to transport larger chamber components allows the multi-part chamber of the creation to be constructed from fewer chamber components. Therefore, it is preferred, but not necessary, to place the processing chamber components at an angle within the container. In some embodiments, it is preferred to manufacture a multi-part chamber as a primary or central processing chamber component that is as large as possible and still fits into a standard size container, and to make the remaining processing chamber components Smaller or as small as possible to make assembly easier. At step 510, when the process chamber components arrive, for example, at the customer's location, the process chamber components can be assembled to form the electronic component manufacturing process chamber 100, 300. In some embodiments, the projecting cut faces may be mounted in step 512 to or in place of the undercut faces 201 A-F of the electronic component fabrication processing chamber 1〇〇. In these embodiments, the projecting cut surface can assist in engaging the load lock chamber and/or the process chamber to the electronic component manufacturing process chamber 100. In some embodiments, the protruding cut surface that is added to the concave cut surface 201 AF extends completely beyond the outer circumference of the electronic component manufacturing process chamber 100, so that the resulting chamber looks like The embodiment shown in Figure 4A is similar. In other embodiments, the raised cut surface that is added to the concave cut surface 20 1 A-F extends only partially beyond the outer circumference of the electronic component manufacturing process chamber 100. The protruding cut surface may include a flat area (for coupling a load lock chamber or a process chamber) with an opening (which is made to allow a substrate to pass) and a joint portion, which is sealed Enter into the recess of the concave section 2 0 1 A - F. At step 514, the load lock chamber and/or the process chamber are coupled to the cut surface of the electronic component fabrication processing chamber 100,300. At step 516, one is used to

M312762 基材經由該非多邊形的傳送室移動於製程室之間的機器人 被安裝到該電子元件製造處理室1〇〇,300中。該方法500 在步驟5 1 8結束。 因此,雖然本創作已參照本創作的示範性實施例加以 說明,但應被暸解的是,其它的實施例亦會落在由下面的 申請專利範圍所界定之本創作的精神與範圍内。 【圖式簡單說明】 第1圖為依據本創作的某些實施例的第一示範性多件 式電子元件製造處理室的俯視圖。 第2A圖為第1圖中依據本創作的某些實施例的第一 示範性多件式電子元件製造處理室的分解立體圖。 第2B圖為第2A圖的第一室組裝後的立體圖。 第2C圖為第2A圖的第一室的俯視圖。 第2D圖為第2A圖的第一室的側視圖。 第3圖為依據本創作的某些實施例的第二示範性多件 式電子元件製造處理室的俯視圖。 第4A圖為第3圖中依據本創作的某些實施例的第二 示範性多件式電子元件製造處理室的分解立體圖。 第4B圖為第3A圖的第一室組裝後的立體圖。 第4C圖為第3A圖的第一室的俯視圖。 第4D圖為第3A圖的第一室的側視圖。 第5圖為一流程圖,其顯示本創作的一些方法實施例。 26The robot in which the M312762 substrate is moved between the process chambers via the non-polygonal transfer chamber is mounted in the electronic component manufacturing process chambers 1, 300. The method 500 ends at step 518. Therefore, the present invention has been described with reference to the exemplary embodiments of the present invention, and it is to be understood that other embodiments may fall within the spirit and scope of the present invention as defined by the following claims. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a plan view showing a first exemplary multi-piece electronic component manufacturing process chamber in accordance with some embodiments of the present invention. Fig. 2A is an exploded perspective view of the first exemplary multi-piece electronic component manufacturing process chamber in accordance with some embodiments of the present invention in Fig. 1. Fig. 2B is a perspective view of the first chamber after assembly of Fig. 2A. Fig. 2C is a plan view of the first chamber of Fig. 2A. Fig. 2D is a side view of the first chamber of Fig. 2A. Figure 3 is a top plan view of a second exemplary multi-piece electronic component fabrication process chamber in accordance with certain embodiments of the present teachings. Fig. 4A is an exploded perspective view of the second exemplary multi-piece electronic component manufacturing process chamber in accordance with some embodiments of the present invention in Fig. 3. Fig. 4B is a perspective view of the first chamber after assembly of Fig. 3A. Figure 4C is a plan view of the first chamber of Figure 3A. Figure 4D is a side view of the first chamber of Figure 3A. Figure 5 is a flow chart showing some method embodiments of the present author. 26

M312762 【主要元件符號說明】 100 多件式電子元件製造處理室 103製程室及/或負載 鎖定室 109 第一處理室 部 件 111 第二處理室部半 113 第三處理室 部 件 201A-F 下凹的切面 203 圓柱形壁 205 圓柱形壁 207 對立側壁 209 對立側壁 21 1 A -D 槽口 213- 219 開口 223A-C 開口 225 縛片結構 227 底部 229 平的部分 23 1 圓頂部分 233 支撐結構 235 頂蓋 237 平的密封部分 239 樑 241 連結位置 300 多件式電子元件製造處理室 309 第 一處理室部件 311 第二處理室部f 3 13 第 三處理室部件 401 A-F 突伸出的切 403 圓柱形壁 405 圓柱形壁 407 對 立側壁 409 對立側壁 411 A -D 槽口 413- 419 開口 423A - C 開口 425 籍片結構 427 底 部 429 平的部分 43 1 圓 頂部分 433 支撐結構 435 頂 蓋 437 平的密封部分 439 樑 441 連結位置 27 M312762 500 方法M312762 [Description of main component symbols] 100 multi-piece electronic component manufacturing processing chamber 103 process chamber and/or load lock chamber 109 first processing chamber component 111 second processing chamber section half 113 third processing chamber component 201A-F recessed Section 203 cylindrical wall 205 cylindrical wall 207 opposite side wall 209 opposite side wall 21 1 A - D notch 213- 219 opening 223A-C opening 225 tab structure 227 bottom 229 flat portion 23 1 dome portion 233 support structure 235 top Cover 237 Flat sealing portion 239 Beam 241 Connection position 300 Multi-piece electronic component manufacturing processing chamber 309 First processing chamber component 311 Second processing chamber portion f 3 13 Third processing chamber component 401 AF protruding 403 Cylindrical Wall 405 cylindrical wall 407 opposite side wall 409 opposite side wall 411 A - D notch 413 - 419 opening 423A - C opening 425 piece structure 427 bottom 429 flat part 43 1 dome part 433 support structure 435 top cover 437 flat seal Section 439 Beam 441 Connection Location 27 M312762 500 Method

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Claims (1)

M312762M312762 九、申請專利範圍: 1. 一種用於製造電子元件之裝置,其至少包含: 複數個處理室部件,適於組裝一起以形成一非多邊形 的電子元件製造處理室, 其中該等處理室部件各別地具有符合陸地及航空運輸 規定中的至少一種規定的尺寸;及IX. Patent application scope: 1. A device for manufacturing electronic components, comprising at least: a plurality of processing chamber components adapted to be assembled together to form a non-polygonal electronic component manufacturing processing chamber, wherein each of the processing chamber components Having a size that meets at least one of the requirements of land and air transportation regulations; and 其中該非多邊形的電子元件製造處理室的整體尺寸並 不符合陸地及航空運輸規定中的至少一種規定。 2.如申請專利範圍第1項所述之裝置,其中該等處理室部 件中的每一者都包括至少一彎曲側。 3 .如申請專利範圍第2項所述之裝置,其中該等處理室部 件中的至少一者包括至少兩個彎曲側及兩個直線側。The overall size of the non-polygonal electronic component manufacturing process chamber does not comply with at least one of the terrestrial and air transportation regulations. 2. The device of claim 1, wherein each of the processing chamber components comprises at least one curved side. 3. The device of claim 2, wherein at least one of the processing chamber components comprises at least two curved sides and two straight sides. 4.如申請專利範圍第2項所述之裝置,其中該等處理室部 件中的至少兩者,每一個處理室部件都包括至少一脊曲側 及一直線側。 5 .如申請專利範圍第4項所述之裝置,其中該等處理室部 件適於沿著該等直線側組合在一起。 6.如申請專利範圍第2項所述之裝置,其中每一彎曲側都 294. The device of claim 2, wherein at least two of the processing chamber components, each of the processing chamber components comprises at least one of a curved side and a straight side. 5. The device of claim 4, wherein the processing chamber components are adapted to be joined together along the linear sides. 6. The device of claim 2, wherein each curved side is 29 M312762 包括至少一開口 ,每一開口都被作成可讓一基材從中通過 的大小且適於耦接至一第二室。 7.如申請專利範圍第2項所述之裝置,其中該等複數個處 理室部件包括至少一處理室部件,該處理室部件在其彎曲 側的至少一者處具有至少一切面,及 其中該至少一切面適於耦接至一第二室及包括至少一 開口0 8. 如申請專利範圍第7項所述之裝置,其中該至少一切面 係凹陷於該彎曲側上。 9. 如申請專利範圍第8項所述之裝置,其中該至少一切面 包括複數個開孔。 1 0.如申請專利範圍第7項所述之裝置,其中該至少一切 面適於從該彎曲側突伸出。 1 1 .如申請專利範圍第1 0項所述之裝置,其中該至少一切 面包括複數個開孔。 12. —種用於製造電子元件之裝置,其至少包含: 一第一處理室部件,其具有被兩條線繩(cords)切過之 30M312762 includes at least one opening, each opening being sized to pass a substrate therethrough and adapted to be coupled to a second chamber. 7. The device of claim 2, wherein the plurality of processing chamber components comprise at least one processing chamber component having at least one face at least one of its curved sides, and wherein At least all of the faces are adapted to be coupled to a second chamber and include at least one opening. 8. The device of claim 7, wherein the at least all of the faces are recessed on the curved side. 9. The device of claim 8, wherein the at least one of the faces comprises a plurality of openings. The device of claim 7, wherein the at least one surface is adapted to protrude from the curved side. 1 1. The device of claim 10, wherein the at least one of the plurality of faces comprises a plurality of openings. 12. A device for manufacturing electronic components, comprising: at least: a first processing chamber component having a cut by two cords M312762M312762 橢圓形部分的側向剖面形狀,使得該形狀包括兩個彎曲 段,一第一直線段,及一第二直線段; 一第二處理室部件,其具有被一條線繩切過之一橢圓 形部分的側向剖面形狀,使得該形狀包括一彎曲段及一第 三直線段;及 一第三處理室部件,其具有被一條線繩切過之橢圓形 部分的側向剖面形狀,使得該形狀包括一彎曲段及一第四 直線段, 其中該等處理室部件適於組裝在一起,形成一橢圓形 的柱體形狀。 1 3 .如申請專利範圍第1 2項所述之裝置,其中形成該第一 處理室部件的側向剖面形狀的兩條線繩是平行的。 14.如申請專利範圍第12項所述之裝置,其中該第一處理 室部件適於沿著該第一直線段耦接至該第二處理室部件, 及 其中該第一處理室部件適於沿著該第二直線段耦接至 該第三處理室部件。 1 5 .如申請專利範圍第1 2項所述之裝置,其中該等處理室 部件適於組裝在一起形成一具有圓柱體形狀的室。 31a lateral cross-sectional shape of the elliptical portion such that the shape comprises two curved segments, a first straight segment, and a second straight segment; a second processing chamber component having an elliptical portion cut by a wire a lateral cross-sectional shape such that the shape includes a curved section and a third straight section; and a third processing chamber component having a lateral cross-sectional shape of the elliptical portion cut by a string such that the shape includes A curved section and a fourth straight section, wherein the processing chamber components are adapted to be assembled together to form an elliptical cylindrical shape. The device of claim 12, wherein the two strands forming the lateral cross-sectional shape of the first processing chamber component are parallel. 14. The device of claim 12, wherein the first processing chamber component is adapted to be coupled to the second processing chamber component along the first straight section, and wherein the first processing chamber component is adapted to The second straight line segment is coupled to the third processing chamber component. The device of claim 12, wherein the processing chamber components are adapted to be assembled together to form a chamber having a cylindrical shape. 31 M312762 16. —種用於製造電子元件之裝置,其至少包含: 一第一處理室部件; 一第二處理室部件,其適於耦接至該第一處理室部 件;及 一第三處理室部件,其適於耦接至該第一處理室部件, 其中該第一處理室部件包括一頂部其具有一由二彎曲 段、一第一直線段及一第二直線段所形成的形狀, 其中該第二處理室部件包括一頂部其具有一由一彎曲 段及一直線段所形成的形狀, 其中該第三處理室部件包括一頂部,其具有一由一彎 曲段及一直線段形成的形狀, 其中該第一處理室部件的第一直線段的長度約等於該 第二處理室部件的直線段,及該第一處理室部件的第二直 線段的長度約等於該第三處理室部件的直線段,及 其中該第一處理室部件的二彎曲段、該第二處理室部 件的彎曲段及第三處理室部件的彎曲段在第二處理室部件 及第三處理室部件耦接至該第一處理室部件的時候共同形 成一橢圓。 1 7.如申請專利範圍第1 6項所述之裝置,其中由該等處理 室部件的彎曲段形成的橢圓為一圓。 1 8 .如申請專利範圍第1 6項所述之裝置,其中該第二處理 32 M312762 室部件適於沿著該第二處理室部件的直線段及該第一處理 室部件的第一直線段耦接至該第一處理室部件。 1 9.如申請專利範圍第1 6項所述之裝置,其中該第一處理 室部件的第一直線段及該第一處理室部件的第二直線段的 長度大致相等。M312762 16. Apparatus for manufacturing electronic components, comprising: at least: a first processing chamber component; a second processing chamber component adapted to be coupled to the first processing chamber component; and a third processing chamber a member adapted to be coupled to the first processing chamber component, wherein the first processing chamber component includes a top having a shape formed by two curved segments, a first straight segment, and a second straight segment, wherein the shape The second processing chamber component includes a top having a shape formed by a curved section and a straight section, wherein the third processing chamber component includes a top having a shape formed by a curved section and a straight section, wherein the a length of the first straight section of the first processing chamber component is approximately equal to a straight section of the second processing chamber component, and a length of the second straight section of the first processing chamber component is approximately equal to a straight section of the third processing chamber component, and Wherein the two curved sections of the first processing chamber component, the curved section of the second processing chamber component, and the curved section of the third processing chamber component are in the second processing chamber component and the third processing chamber component Connected to the first member when the processing chamber together form an ellipse. The device of claim 16, wherein the ellipse formed by the curved segments of the processing chamber components is a circle. The device of claim 16, wherein the second process 32 M312762 chamber component is adapted to be coupled along a straight line segment of the second process chamber component and a first straight segment of the first process chamber component Connected to the first processing chamber component. The device of claim 16 wherein the first straight line segment of the first processing chamber component and the second straight segment of the first processing chamber component are substantially equal in length. 2 0.如申請專利範圍第1 6項所述之裝置,其中該第一處理 室部件的第一直線段及該第一處理室部件的第二直線段的 長度不同。 2 1 .如申請專利範圍第1 6項所述之裝置,其中該等處理室 部件的每一者都包括至少一彎曲的側壁及至少一在該彎曲 的側壁上的切面, 其中至少一切面適於耦接至一負載鎖定室,及The device of claim 16, wherein the first straight line segment of the first processing chamber component and the second straight straight segment of the first processing chamber component have different lengths. The device of claim 16, wherein each of the processing chamber components includes at least one curved side wall and at least one cut surface on the curved side wall, wherein at least one of Coupling to a load lock chamber, and 其中至少一切面包括一或多個可讓一基材通過的開 〇 , 2 2 .如申請專利範圍第2 1項所述之裝置,其中至少一切面 係凹陷於一彎曲的側壁上。 2 3 .如申請專利範圍第2 1項所述之裝置,其中至少一切面 係從一彎曲的側壁突伸出。 33At least one of the faces includes one or more openings for passing a substrate, and the device of claim 21, wherein at least all of the faces are recessed on a curved side wall. The device of claim 2, wherein at least all of the features protrude from a curved side wall. 33
TW95203932U 2005-06-02 2006-03-09 Electronic device manufacturing apparatus TWM312762U (en)

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US11/214,475 US7784164B2 (en) 2004-06-02 2005-08-29 Electronic device manufacturing chamber method

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TW95203932U TWM312762U (en) 2005-06-02 2006-03-09 Electronic device manufacturing apparatus

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