M302049 八、新型說明： 【新型所屬之技術領域】 本創作係有關-種X光產生裂置，尤指—種係以四極 結構之場發射器作為陰極電子源之χ光產生裝置。 【先前技術】 自十九世紀X光意外被發現，並可以清楚透 體後，在之後眾多科學家競相研究下，開啟了科學 性的-頁，特別是在醫學臨床上的應用，更是造福許多: ，而如今：X光的應用除了被利用於醫學領域外 應用在工業用途及保全作業上。 而目前一般習知的x光曝光裝置，其他光產生社 構係包括-陰極電子源及一陽極革巴材，且同時設置於一直口 空腔體中，其中該陰極電子源# A /、 ,^ ^ ?, 為種由鎢或碳材質所構 成之熱琶子㈣源，而該陽極革巴材係為一金屬乾材，如鎢 、銀或銅所製成，而該直空月*俨 、、、 ^., 更包括一透明窗，因此當 ;子束自陰極電子源射出後，利用陰陽極之間的高壓電差 2速其電子運動，以撞擊該陽極的金_ 加以曝光於光阻上透明由導出經過被照物後，最後再 作為中的X光曝光裝置’係利用熱電子發射源 才^获源’傳統的熱電子源必須消耗較大的能量 能；擊；的產生，而同時為了讓電子束具有足夠的 她極㈣，該陽極及陰極之間則必須保持一定 之㈣，以提供足夠之電壓差以利於該電子束加速，然而 M302049 此舉雖有利於高壓電差的產生，但對於產生的電子束而+ .丄因為過長的距離而使電子束產生擴冑的情況，造成電子 =度下降，使得電子束撞上陽極靶材後所產生的χ光品質 ’欠差γ直接影響後續χ光之應用，而習知的陰陽極結構中 亦無裳設用以收敛電子束的結構，成為該習知χ 置之缺失。 衣 ^為了解決上述的電子束產生擴散的情況，之後的習 •知技蟄便揭露一種非熱電子發射源之奈米碳管之陰極電子 《射源材爿，並利用收敏結構之場發射器作為陰極電子束 ’X射源的X光曝光裝置’其上設有一用以收斂電子束的收 放網罩10a，如第一圖所示之結構，該網罩丨此上具有一 閘極層100a及一收傲層101a，該網罩服上更設有複數平 行排列的透孔1〇2a，該透孔102a的位置係對準於陰極電子 源12a及陽極革巴材14a上，以作為陰極奈米碳管電子源 _〗2a所產生的電子束射向陽極靶材14a時穿越網罩i〇a的 通道，由於係採用奈米碳管為電子發射源因此無須額外提 供熱源以激發電子發射源，以陰陽極間之高壓即可汲引陰 極電子發射源產生電子束，更進一步利用收敛層同時排: 以=的電子，使電子束以收斂的形式撞擊革巴材⑷並產 ^能量的轉換，使X光自陽極靶材14a之另一側經由透明 窗16a透出經過被照物後於光阻上曝光成像。 雖然上述的收敛結構之電子發射源，可有效將陰陽極 結構間之陰極電子源12a所產生的電子束加以收*，並直 接撞擊該陽極革巴材14a，產生品質較好的X光，並由革巴材 M302049 14a之另一側所設置之透明窗丨 X光係自透明窗16a透出後，係=，但由於所產生的 當發散的X光照射於被照物上^^種發散狀態，因此 ，使得X弁穿、# >职& 4 Λ· Μ λ光無法產生聚焦效果 使仔U牙透被照物後無法精確 該裝置中未盡理想之處。 成像方、先阻上，成為 【新型内容】 針對上述之缺失，本創作 有複數收斂透鏡之陣列式1光：：在：提供-種具 鏡之設置，使由透明窗所透射出’错由該收傲透 U果，以精確成像於欲成像之光阻上。 為了達成上述之目的，本創 源曝光裝置，該裝置俜主要勺紅捉仏卿列式X先 # 包括—x光背光源及複數收傲 錢，其中該X光背光源更包括—陰極電子發射裝置、一支 %極把材及-透窗’該陰極電子發射裝置係為一種呈四極 結構之複數奈㈣管電子發射源，其上設有—閘極層及一 收傲電極層，而該陽極革巴材設於對應陰極電子發射裝置之 位置，同時陽極革巴材外側設有一透窗，最後透窗外設有對 應於電子發射源之複數收斂透鏡，藉由該背光源使產生之 X光’經由透窗透射而ψ ^ ，一 後’再、、堂由收敛透鏡聚焦，照射 被照物後可精確成像於欲曝光之光阻上。 【貫施方式】 。月ί閱第圖，係為本創作之χ光曝光機結構之剖視 不思圖’呑亥X光曝光機1夕么士士这义么^ ν .. 工^戍i之結構係包括一 X光背光源η及 複數聚焦透鏡12 ’而該X朵咎伞 Λ八九月九源11更包括一陰極電子發 M302049 射裝置110、、—陽極靶材112及一透窗114 ，其中該陽極 萆巴材112係為金屬材質，設於該陰極電子發射裝置11〇之 上方，而該透窗114則設於該陽極靶材112之外側，與複 數聚焦透鏡12連接；另外，該陰極電子發射裝置110係為 種八有四極、、’α構之奈米碳管電子發射源結構，更包括— 基板601，係為玻璃材質，於該基板β〇ι um 緣層602二該第—絕緣層602上形成一閘極導電層603广 於^閘極$電層603上再形成一第二絕緣層_，之 於：：ϊ緣層604設有一收斂層6〇5，該收斂層605係為 :::通之金屬層，以提供一電壓對通過之電子束產生 ^ 才、上述之弟一絶緣層602、閘極導電層 二：:：緣層604及收斂層6〇5上形成複數穿孔_ 二二_之排列方式係呈陣列式，該穿孔 :二曝：在一於穿孔嶋内部所形成凹陷區物中，並 内設置一陰極電则，最後於該陰極 迅極608上叹有一奈米碳管 奈米石炭管發射裝置110 =源609 ’以形成整個 ^ ，卜，在上述之複數聚焦透鏡12 ===各個奈米碳管電子發射請，亦呈 見陣列式排列，其外觀如第三圖所示。 數Ji;=，係為本創作之操作剖視圖，其係以複 、、、之不未厌g黾子發射源6〇9結構來展 子藉由閘極導電層603由太、 °出，黾 後形成-電子束1。(如= 射源609汲引出 該電子束Η)經過收敛層6〇5 ‘：材，，而 于果10截面之發散程度 • M3 02049 即被收斂層605所限制，使電子束1〇集中 112之預定區域中。 讀％極乾材 …續請參閱第四圖，如上所述，本創作之χ 係為-種具有奈米碳管作為陰極電子發射二 當奈米碳管電子發射源_所產生之電子幻。二 :種低能量之X光2〇,之後再經由透窗m透= ：：：：^^^ 二所5又之4焦透鏡12將發散之χ 形射於放置於基座3。二= 田光2〇準確照射於被昭物40德 ，同時被照物40被X光20所昭 …、物40後 光阻6。上，如第五圖（B);射之::像5〇，成像於背後之 J所不’藉此，透過兮 數奈米碳管電子發射源6〇9 i過及早一或稷 112所產生小區域X光2。，再==撞擊陽極㈣ 形成收斂之X光束，除了 二、透鏡12再加以聚焦 後清楚成像於光阻60上，更於被照物品40上，最 小規模區域之曝光作用。 σ ^擇之照射區域進行 惟以上所述之實施方式，Η 能以此限定本創作實施範圍二二土之貫施實例，當不 說明書内容所作之等效變化2 1彳作申§t專利範圍及 專利涵蓋範圍。 Μ修飾1應屬本創作下述之 【圖式簡單說明】 第一圖、係為習知之結構剖視圖。 M302049 :二圖、係為本創作之結構剖視示意圖 Γ三圖、料本創作之曝μ置透鏡示意圖。 f四圖、係為本創作之操作示意圖。 f五圖（A )、係為本創作之X光操作示意圖 第五圖（β )、係為本創作之X光操作示意圖 【主要元件符號說明】 收斂網罩l〇a 收斂層l〇la 陰極電子源12a 透明窗16a (本創作） X光曝光機1 奈米碳管發射裝置11〇 透窗114 電子束10 基座30 影像50 基板601 閘極導電層603 &斂層605 凹陷區域607 電子發射源609 閘極層l〇〇a 透孔102a 陽極把材14a X光背光源11 陽極乾材112 聚焦透鏡12 X光20 被照物4〇 光阻60 第一絕緣層602 第二絕緣層604 穿孔606 陰極電極608M302049 VIII. New Description: [New Technology Field] This creation is related to the X-ray generation cracking, especially the seed light generator with a quadrupole field emitter as the cathode electron source. [Prior Art] Since the X-ray accident was discovered in the 19th century, and it was clear that it was transparent, after many scientists began to study it, it opened up a scientific-page, especially in medical clinical applications, which is beneficial to many. : And nowadays: X-ray applications are used in industrial applications and security operations in addition to being used in the medical field. In the conventional x-ray exposure apparatus, other light-generating structures include a cathode electron source and an anode leather material, and are simultaneously disposed in the straight mouth cavity, wherein the cathode electron source # A /, ^ ^ ?, is a kind of hot tweezers (four) source made of tungsten or carbon material, and the anode leather bar is made of a metal dry material, such as tungsten, silver or copper, and the straight sky *俨, , , ^., further includes a transparent window, so when the beam is ejected from the cathode electron source, the electrons are moved by the high voltage difference between the cathode and the cathode at a speed of 2, and the gold _ which is impinging on the anode is exposed. The transparency on the photoresist is derived from the object after being passed through, and finally the X-ray exposure device is used as the source of the hot electron emission source. The conventional hot electron source must consume a large amount of energy energy; At the same time, in order to make the electron beam have enough her pole (four), the anode and cathode must be kept constant (four) to provide sufficient voltage difference to facilitate the electron beam acceleration, but M302049 is beneficial to high voltage electricity. The difference is generated, but for the generated electron beam +. If the distance is too long, the electron beam is dilated, causing the electron=degree to decrease, so that the defect quality γ produced by the electron beam hitting the anode target directly affects the application of the subsequent ray, and the conventional There is also no structure in the anodized structure for converging the electron beam, which is a lack of the conventional device. In order to solve the above-mentioned problem of electron beam diffusion, the latter method discloses a cathode electron of a carbon nanotube of a non-thermal electron emission source, and uses a field emission of a sensitization structure. The X-ray exposure device as the cathode electron beam 'X-ray source' is provided with a retractable mesh cover 10a for converging the electron beam, as shown in the first figure, the mesh cover has a gate thereon The layer 100a and the arrogant layer 101a are further provided with a plurality of parallel-arranged through holes 1〇2a, the positions of which are aligned with the cathode electron source 12a and the anode leather material 14a. As the electron beam generated by the cathode carbon nanotube electron source _ 2a is directed to the anode target 14a, the passage through the mesh cover i〇a, since the carbon nanotube is used as the electron emission source, there is no need to provide an additional heat source to excite The electron emission source can use the high voltage between the anode and the cathode to induce the cathode electron emission source to generate an electron beam, and further utilize the convergence layer to simultaneously discharge: the electrons of the electron beam cause the electron beam to collide with the leather material in a convergent form (4) and generate energy. Conversion of X-ray from anode target 14 The other side of a is exposed to the photoresist through the transparent window 16a and exposed to the photoresist. Although the above-mentioned electron emission source of the convergent structure can effectively collect the electron beam generated by the cathode electron source 12a between the anode and cathode structures, and directly hit the anode leather material 14a, the X-ray of good quality is produced, and The transparent window X light system provided on the other side of the leather material M302049 14a is exposed from the transparent window 16a, but is generated due to the divergence of the X-rays emitted from the illuminated object. The state, therefore, makes X 弁, # >职& 4 Λ· Μ λ light can not produce a focusing effect so that the U tooth can not be accurate in the device after the subject is not accurate. Imaging side, first blocking, become [new content] In response to the above-mentioned lack, this creation has a complex convergence lens array type 1 light:: in: provide - the setting of the mirror, so that the transparent window transmits the wrong The arrogant U fruit is accurately imaged on the photoresist to be imaged. In order to achieve the above purpose, the present invention has the main exposure device, the main device of the device, including the x-ray backlight and the plurality of digital backlights, wherein the X-ray backlight further comprises a cathode electron emission device. A cathode electrode and a through-the-chamber 'the cathode electron-emitting device is a four-pole structure of a plurality of n-tube electron-emitting sources, and has a gate layer and an anode electrode layer, and the anode leather The material is disposed at a position corresponding to the cathode electron-emitting device, and a transparent window is disposed outside the anode leather material. Finally, a plurality of convergent lenses corresponding to the electron emission source are disposed outside the window, and the generated X-ray is passed through the backlight. Through the window transmission and ψ ^, after a 're-, the church is focused by the convergent lens, after the illumination of the object can be accurately imaged on the photoresist to be exposed. [The way of implementation]. The monthly picture is based on the cross-sectional view of the structure of the Twilight Exposure Machine. The 'Xi Hai X-ray Exposure Machine 1 么 士 士 士 ^ ^ ^ ^ ν .. The structure of the work ^ 戍 i includes a The X-ray backlight η and the plurality of focusing lenses 12 ′ and the X-ray umbrella Λ 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九 九The bakelite 112 is made of a metal material and is disposed above the cathode electron-emitting device 11 , and the transmissive window 114 is disposed on the outer side of the anode target 112 and connected to the plurality of focusing lenses 12 . In addition, the cathode electron-emitting device The 110 series is an eight-pole, four-pole, nano-carbon nanotube electron-emitting source structure, and further includes a substrate 601, which is made of glass, and the first insulating layer 602 is disposed on the substrate β 〇 um edge layer 602. Forming a gate conductive layer 603 over the gate electrode layer 603 and forming a second insulating layer _, the:: the edge layer 604 is provided with a convergence layer 6〇5, the convergence layer 605 is: :: pass through the metal layer to provide a voltage pair to pass through the electron beam generation, the above-mentioned brother-insulation layer 602, gate The conductive layer 2::: the edge layer 604 and the convergence layer 6〇5 form a plurality of perforations _ 22 _ arranged in an array, the perforation: two exposure: in a recessed area formed inside the perforated crucible, And a cathode electric current is arranged therein, and finally a nano carbon nanotube nano carboniferous tube emitting device 110 = source 609 ' is slanted on the cathode fast pole 608 to form the whole ^, 卜, in the above plurality of focusing lenses 12 === The electron emission of each carbon nanotube is also arranged in an array, and its appearance is as shown in the third figure. The number Ji;=, is a cross-sectional view of the operation of the creation, which is a complex, and the 黾 黾 发射 发射 发射 发射 发射 藉 藉 藉 藉 藉 藉 藉 藉 藉 藉 藉 藉 藉 藉 藉 藉 藉 藉 藉 藉 藉 藉 藉 藉 藉 藉 藉 藉 藉 藉After formation - electron beam 1. (eg = source 609汲 leads the electron beam Η) through the convergence layer 6〇5 ': material, and the degree of divergence in the section of fruit 10 • M3 02049 is limited by the convergence layer 605, so that the electron beam 1 〇 concentrated 112 In the predetermined area. Read % Extremely Dry Materials ... Continued to see the fourth picture. As mentioned above, the enthalpy of this creation is an electronic illusion with a carbon nanotube as the electron emission source of the cathode electron emission diode. Second: a low-energy X-ray 2 〇, and then placed on the pedestal 3 via a transmissive window m through :: :::: ^ ^ ^ two 5 and 4 focal lenses 12 . Two = Tianguang 2〇 accurately irradiated to the 40th of the Zhaozhao, while the object 40 was illuminated by X-ray 20, and after 40, the photoresist was 6. On, as shown in the fifth picture (B); shot:: like 5 〇, imaged in the back of the J does not 'by this, through the number of carbon nanotubes electron emission source 6 〇 9 i too early or 稷 112 A small area of X-ray 2 is produced. And then == impacting the anode (4) to form a convergent X-beam, except that the lens 12 is then focused and then imaged on the photoresist 60, and on the illuminated object 40, the exposure of the smallest area. σ ^Selected irradiation area to carry out the above-mentioned implementation method, Η can limit the implementation of the scope of the creation of this two-two-dimensional example, when the content of the description does not change the equivalent of 2 1 彳 申 § patent scope And the scope of patent coverage. ΜModification 1 should be the following in this creation. [Simplified description of the drawings] The first figure is a cross-sectional view of a conventional structure. M302049: The second figure is a schematic cross-sectional view of the structure of the creation. f Four diagrams are diagrams of the operation of the creation. f Figure 5 (A), the fifth diagram of the X-ray operation diagram of the creation (β), is the schematic diagram of the X-ray operation of the creation [main component symbol description] Convergence mesh cover l〇a Convergence layer l〇la cathode Electron source 12a transparent window 16a (this creation) X-ray exposure machine 1 carbon nanotube emitting device 11 through window 114 electron beam 10 pedestal 30 image 50 substrate 601 gate conductive layer 603 & condensed layer 605 recessed area 607 Transmitting source 609 gate layer l〇〇a through hole 102a anode material 14a X-ray backlight 11 anode dry material 112 focusing lens 12 X-ray 20 object 4 〇 photoresist 60 first insulating layer 602 second insulating layer 604 perforation 606 cathode electrode 608