TWM301356U - Aligning and positioning device of an exposing device - Google Patents

Aligning and positioning device of an exposing device Download PDF

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Publication number
TWM301356U
TWM301356U TW95207565U TW95207565U TWM301356U TW M301356 U TWM301356 U TW M301356U TW 95207565 U TW95207565 U TW 95207565U TW 95207565 U TW95207565 U TW 95207565U TW M301356 U TWM301356 U TW M301356U
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TW
Taiwan
Prior art keywords
movable seat
seat
workpiece
reticle
telescopic device
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Application number
TW95207565U
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Chinese (zh)
Inventor
Shian-Wei Lin
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M & R Nano Technology Co Ltd
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Application filed by M & R Nano Technology Co Ltd filed Critical M & R Nano Technology Co Ltd
Priority to TW95207565U priority Critical patent/TWM301356U/en
Publication of TWM301356U publication Critical patent/TWM301356U/en

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Description

M301356 八、新型說明: 【新型所屬之技術領域】 本創作係有關一種曝光機之對準定位裝置,其兼具調整快 速、可多方向自動調整與調整後之光罩與工件間具有一預定間隙 等功效。 【先前技術】 習用曝光機(簡稱第一種習用曝光機)如第六圖所示,其包括 > 在一機台91上設一第一伸縮裝置92(可能包括馬達921、連結器 922,以及滾珠螺桿923); —固定座93係可受該第一伸縮裝置92 連動,一活動座94係設於該固定座93上,該活動座94在四個位 置(弟六圖僅顯示其中兩個位置)分別各設一調整螺件941可在該 固定座93上作調整(兩個調X轴方向之水平程度,另兩個調γ軸 方向之水平私度),一工件95係設於該活動座94上;一光罩承座 96係用關定-光罩’ 曝光頭97伽以發出預定光線並穿 | 透該光罩961而使該工件95曝光。 習用第-種曝光機之活動座94在四個位置分別設一調整螺件 94i喊量調整其在固定座93上的位置;假設活動座94正常應位 於-第一位置P1 ’但由於某因素使活動座94微量傾斜至一第二位 置P2 ;因為是以人工調整四支調整螺件94卜使該活動座94回復 該第-崎P卜故,調整作業繁鎖,十分耗時,整體效果不佳。 其次,習用第一實施例需以人工調整四支調整螺件糾,X袖 方向及Υ轴方向均要調整,無法自動調整。 M301356 此外,如第七圖所示,其係另一種習用曝光機(簡稱第二種習 用曝光機),係包括在一機台91上設一第一伸縮裝置92 ;該第一 伸縮裝置92係供一活動座94支撐於該機台91上;一工件95係 設於該活動座94上;一光罩承座96係用以固定一光罩961 ; 一曝 光頭97係用以發出預定光線並穿透該光罩961而使該工件95曝 光,一活動座固定裝置98係設於該活動座94與該機台91之間, 其用以將調整角度後的活動座94固定於該機台91上。M301356 VIII. New description: [New technical field] This is a kind of alignment device for exposure machine, which has a fast adjustment, can be automatically adjusted and adjusted in multiple directions, and has a predetermined gap between the mask and the workpiece. And other effects. [Prior Art] A conventional exposure machine (referred to as a first conventional exposure machine) as shown in the sixth figure, which includes > a first telescopic device 92 is provided on a machine table 91 (possibly including a motor 921, a connector 922, And the ball screw 923); the fixing seat 93 is interlocked by the first telescopic device 92, and a movable seat 94 is disposed on the fixing seat 93. The movable seat 94 is in four positions (the two of the six figures only show two of them) Each of the positions is provided with an adjusting screw 941 which can be adjusted on the fixing seat 93 (the horizontal degree of the two X-axis directions and the other two horizontal degrees of the γ-axis direction), and a workpiece 95 is attached to The movable seat 94; a reticle holder 96 is used to illuminate the workpiece 95 by a predetermined-photomask' exposure head 97 to emit predetermined light and to pass through the reticle 961. The movable seat 94 of the first type of exposure machine is provided with a adjusting screw 94i at four positions to adjust the position of the movable seat 94i on the fixed seat 93; it is assumed that the movable seat 94 should normally be located at the -first position P1 'but due to a certain factor The movable seat 94 is slightly tilted to a second position P2; since the four adjusting screws 94 are manually adjusted to return the movable seat 94 to the first-seat P, the adjustment operation is complicated, which is time-consuming and overall. Not good. Secondly, in the first embodiment, the four adjustment screws are manually adjusted, and the X sleeve direction and the x-axis direction are adjusted, and the automatic adjustment cannot be performed. M301356 In addition, as shown in the seventh figure, it is another conventional exposure machine (referred to as a second conventional exposure machine), which comprises a first telescopic device 92 on a machine table 91; the first telescopic device 92 is A movable seat 94 is supported on the machine table 91; a workpiece 95 is attached to the movable seat 94; a mask holder 96 is used to fix a light cover 961; and an exposure head 97 is used to emit predetermined light. And the workpiece 95 is exposed through the reticle 961, and a movable seat fixing device 98 is disposed between the movable seat 94 and the machine table 91, and is used for fixing the adjustable movable seat 94 to the machine. On the stage 91.

習用第二實施例僅設單個第一伸縮裝置92調整該活動座⑽ 的位置,因為該第-伸縮裝置92係為彈簧,雖然可以自動調整, 但只能適用於該光罩961與該工件95彼此貼合接觸之狀態,無法 保持-微量_。對猶些曝絲序要求鮮961與卫件95間要 保有一預定間隙之情形,即無法適用。 因此,有必要研發新技術以解決上述缺點。 【新型内容】 嫩,撤料定位裝置 本創作之次一目的 其調整快速。 在於提供一種曝光機之對準定位裝置 枣創作之又一目的 〖奴供一種曝光機之對準定位罗w 其可多方向自動調整。 t 本創作之再—目的,紐提供—祕錢之對較位 其調整後之鮮與功贴有1定_。 、 M301356 本創作係提供一種曝光機之對準定位裝置,其包括·· 一機台; -工件承座’係設於該機台上,其係用以固定一工件,該工 件承座至少具有-第-伸縮裝置、一固定座、一活動座及—活動 2固定裝置;該第-伸縮裝置係介於該機台與該固定座間,該固 疋座係„又丨球凹部’ §彡活動座係設—與該半球凹部相對應之半 球凸部’使該半球凹部與該半球凸部相配合而可任意方向微量傾 斜,該活動座固定裝置係可固定活動座; 一光罩承座,係用以固定一光罩; 一曝光頭,_赠_定紐穿賴光料韻X件曝光。 ”本創作之上述目的與優點’雜從下述所翻實施例之詳細 說明與附圖中,獲得深入瞭解。 茲以下列實補麵合圖式詳細綱本創作於後: 【實施方式】 本創作係為-種曝光機之對準定位裝置,參閲第一及第二 圖,其包括-機台1〇、-工作 20、一光罩承座3〇及一曝光 頭40 〇 關於該機台1〇 ’係用以設置該工作承座2〇、該光罩承座3〇 及該曝光頭40。 關於該工件承座20,係用以固定-工件25,該工件承座20 ^少具有-第一伸縮裝置2卜一固定座Μ、一活動座Μ及一活 座固定裝置24,·該第-伸縮裝置21係介於該機台1〇與該固定 7 M301356 座22間,該固定座22係設有一半球凹部221 ;該活動座23設有 -與該半球凹部221相對應之半球凸部23卜使得該半球凹部221 與該半球凸部231相配合而可任意方向微量相對滑動,該活動座 固定裝置24係可固定該活動座23 ; 至於該光罩承座30,係用以固定一光罩31。 該曝光頭40,係用以發出預定光線並穿透該光罩31而使該工 件25曝光。 參閱第二圖,在預先歸零校正的情況下,啟動該工作承座2〇 上之第一伸縮裝置21,該第一伸縮裝置21頂推該固定座22,該 固定座22 ϋ過該半球凹部221,頂推該活動座23之半球凸部231, 使该活動座23將該工件25(例如為晶圓)移動至平行該光罩31之預 定曝光位置。 啟動該曝光頭4G,該曝辆4G發出—光線,該光線透過該光 罩31照射該工件25,對該工件25進行曝光加工作業。 參閱第三圖,當實際進行曝光加工作業時,承載該工件25之 活動座23 _光罩31間可能未能簡平行,錢轉25 一端與 该光罩31間產生-第-高度Η1 ’而該工件25另端因與該光罩31 間具-預定傾斜角Θ而產生-第二高度Η2,該第一高度m小於 該第二高度H2 ’在第三圖中所示之傾斜程度係誇大化,以方便瞭 解。 參閱第四圖’此時直接啟動該工作承座2〇上之第一伸縮裝置 21,該第一伸縮裝置21頂推該固定座22,該固定座22頂推該活 8 d M301356 動座23 ’該活動座23頂推該工件25朝該光罩31靠合的過程中, 透過其半球凸部231在該固定座22之半球凹部221上進行“球面 滑動”之滑動微調,自動將該工件25調整至與該光罩31可以平 行貼靠的位置(如第四圖所示)。 该活動座固定裝置24可以例如磁性定位或是直接卡止等方式 來固定該活動座23,此時該活動座23雖略為傾斜,但該工件25 係與該光罩31已完全平行密貼。 請參閱第五®,控繼第一伸縮裝置^ _一預定之微量距 離(例如30微米、60微米或其他距離),該第一伸縮裝置21拉回該 固定座22,該固定座22帶動該活動座23,使該工件%與該光罩 平行的保持預疋間隙(即该第一高度出),再啟動該曝光頭 對該工件25進行曝光加工作業。 參閱第-圖,實務上,該第—伸縮裝置21可以是由一馬達 21!、一連結器212及一滾珠螺桿231組成之實施例。 更詳細的講,本創作之用以承載該玉件25之活動座23,係設 树凸部加承載於該固定座22之半球凹部221上;當該第一伸 縮裝置21推頂該固定座22,該固定座22再透過該活動座μ推動 〜件25罪口於5亥光罩31的過程中,不論該活動座也可以說 是工件25)與該光罩31間如何的傾斜,都可以藉由該半球凸部231 與該半球凹部221間產生“球面滑動,,的滑動微調,使該活動座 可乂推頂》亥工件25罪合於該光軍31,在微調完成後,固定傾 ^、動座23再啟動該第一伸縮裝置μ將該工件%移動至適 9 M301356 當曝光位置’即可進行曝光加工作業。 本創作之優點及功致如下所述: []凋正快速。本創作係以活動座之半球凸 凹部相對作“心叫” U纽之牛琢 /動,以調整卫件與光罩間保持平行,因是 她60度之“球面滑動”,故,不論工件如何歪斜,都可以 在接觸之短時間快速調整。 ,二^方向自動°驗。只要卫件(也可以說是活動座)與光罩 a平行狀態’騎動座自動會以半球凸部在岐座之半球凹部 ^自打調整歧_分X轴方向及γ軸方向),完全不需人工作 業’相當方便。 []調正後之光罩與工制具有—預定間隙。只要啟動第一伸 縮^置,第—伸縮裝置驅動棚定座、該活動座與該工件朝該光 罩靠合後再_1定距離,使得該光罩與該工制具有一平行 度極佳之預定間隙。 以上僅是藉由較佳實施例詳細說明本創作,對於該實施例所 做的任何簡單修改與變化,皆不脫離本創作之精神與範圍。 由以上抽明,可使熟知本項技藝者畴本創作的確可達 成七述目的實已付合專利法之規定,爰提出新型專利申請。 M301356 【圖式簡單說明】 第一圖係本創作之實施例外觀圖 第二圖係本創作之部分結構之示意圖 第三圖係第二圖之動作過程一之示意圖 第四圖係第二圖之動作過程二之示意圖 第五圖係第二圖之動作過程三之示意圖 第六圖係習用裝置之示意圖 第七圖係另一習用裝置之示意圖 【主要元件符號說明】 10、91機台 20工作承座 21、92第一伸縮裝置 211、921 馬達 212、922連結器 213、923滾珠螺桿 22、93固定座 221半球凹部 23、94活動座 231半球凸部 24、98活動座固定裝置 25、95工件 30、96光罩承座 31、961光罩 40、97曝光頭 941調整螺件 H1第一高度 H2第二高度 P1第一位置 P2第二位置 11The second embodiment uses only a single first telescopic device 92 to adjust the position of the movable seat (10), because the first telescopic device 92 is a spring, although it can be automatically adjusted, it can only be applied to the reticle 961 and the workpiece 95. The state of being in contact with each other cannot be maintained - trace _. It is not applicable if there is a predetermined gap between the fresh 961 and the guard 95. Therefore, it is necessary to develop new technologies to solve the above disadvantages. [New content] Tender, unloading positioning device The second purpose of this creation is to adjust quickly. It is to provide an alignment positioning device for the exposure machine. Another purpose of the creation of the jujube 〖Nu for the alignment positioning of an exposure machine, which can be automatically adjusted in multiple directions. t The re-creation of the creation - the purpose, the new offer - the secret of the pair of money, the adjustment of the fresh and the paste has a fixed _. M301356 The present invention provides an alignment positioning device for an exposure machine, comprising: a machine table; - a workpiece holder is attached to the machine table for fixing a workpiece, the workpiece holder having at least a first telescopic device, a fixed seat, a movable seat and a movable 2 fixing device; the first telescopic device is interposed between the machine and the fixed seat, the solid seat is a 丨 丨 ball recess § 彡 activity The pedestal--the hemispherical convex portion corresponding to the concave portion of the hemisphere enables the hemispherical concave portion to be tilted in an arbitrary direction in cooperation with the convex portion of the hemisphere, and the movable seat fixing device can fix the movable seat; a reticle holder, It is used to fix a reticle; an exposure head, _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ Get a deeper understanding. The following is a detailed outline of the following drawings: [Embodiment] This creation is an alignment positioning device for an exposure machine. Refer to the first and second figures, which includes a machine 1 - Work 20, a reticle holder 3 〇 and an exposure head 40 〇 about the machine 1 〇 ' is used to set the work socket 2 该, the reticle holder 3 〇 and the exposure head 40. The workpiece holder 20 is used for fixing the workpiece 25, and the workpiece holder 20 has less - a first telescopic device 2, a fixed seat, a movable seat and a living fixture 24, - a telescopic device 21 is interposed between the machine 1 〇 and the fixed 7 M301 356 seat 22, the fixed seat 22 is provided with a hemispherical recess 221; the movable seat 23 is provided with a hemispherical convex portion corresponding to the hemispherical recess 221 23, the hemispherical concave portion 221 is matched with the hemispherical convex portion 231 and can slide relative to each other in an arbitrary direction. The movable seat fixing device 24 can fix the movable seat 23; and the reticle holder 30 is used for fixing one Photomask 31. The exposure head 40 is for emitting predetermined light and penetrating the mask 31 to expose the workpiece 25. Referring to the second figure, in the case of pre-zeroing correction, the first telescopic device 21 on the working socket 2 is activated, and the first telescopic device 21 pushes the fixing seat 22, and the fixing seat 22 passes through the hemisphere. The concave portion 221 pushes the hemispherical convex portion 231 of the movable seat 23 to move the workpiece 25 (for example, a wafer) to a predetermined exposure position parallel to the photomask 31. The exposure head 4G is activated, and the exposure unit 4G emits light which is irradiated to the workpiece 25 through the mask 31 to perform an exposure processing operation on the workpiece 25. Referring to the third figure, when the exposure processing operation is actually performed, the movable seat 23_the reticle 31 carrying the workpiece 25 may not be parallel, and the end of the money turn 25 and the reticle 31 generate a -th-height Η1'. The other end of the workpiece 25 is generated by a predetermined inclination angle 与 with the reticle 31 - a second height Η 2, and the first height m is smaller than the second height H2 ′. The degree of inclination shown in the third figure is exaggerated. To facilitate understanding. Referring to the fourth figure, the first telescopic device 21 on the working socket 2 is directly activated. The first telescopic device 21 pushes the fixing base 22, and the fixing base 22 pushes the living 8 d. M301356 movable seat 23 'The movable seat 23 pushes the workpiece 25 toward the reticle 31, and performs a "spherical sliding" sliding fine adjustment on the hemispherical concave portion 221 of the fixed seat 22 through the hemispherical convex portion 231, and automatically performs the workpiece 25 is adjusted to a position that can be placed in parallel with the reticle 31 (as shown in the fourth figure). The movable seat fixing device 24 can fix the movable seat 23 by, for example, magnetic positioning or direct locking. At this time, the movable seat 23 is slightly inclined, but the workpiece 25 is completely parallel to the reticle 31. Referring to the fifth meter, the first telescopic device is controlled to a predetermined small distance (for example, 30 micrometers, 60 micrometers or other distances), and the first telescopic device 21 is pulled back to the fixing base 22, and the fixing seat 22 drives the The movable seat 23 maintains the pre-twisting gap (ie, the first height) in parallel with the mask, and then activates the exposure head to perform an exposure processing operation on the workpiece 25. Referring to Fig. 1, in practice, the first telescopic device 21 may be an embodiment consisting of a motor 21!, a connector 212, and a ball screw 231. In more detail, the movable seat 23 for carrying the jade 25 of the present invention is provided with a tree protrusion and is carried on the hemispherical recess 221 of the fixing seat 22; when the first telescopic device 21 pushes the fixed seat 22, the fixing seat 22 is further pushed through the movable seat μ to smear the sin in the process of the 5 ray mask 31, regardless of the movable seat, how can the workpiece 25) and the reticle 31 be tilted, By the "spherical sliding, the sliding fine adjustment of the hemispherical convex portion 231 and the hemispherical concave portion 221, the movable seat can be pushed to the top" is sinned by the light army 31, and is fixed after the fine adjustment is completed. The tilting and moving seat 23 restarts the first telescopic device μ to move the workpiece % to the appropriate 9 M301356. The exposure position can be performed for the exposure processing operation. The advantages and merits of the creation are as follows: This creation is based on the hemispherical convex and concave part of the movable seat as the "heart call" U Newton's calf/moving, to keep the guard between the guard and the reticle parallel, because she is 60 degrees of "spherical sliding", so regardless of How the workpiece is skewed can be quickly adjusted in a short time of contact. As far as the automatic inspection is concerned, as long as the guard (also can be said to be the movable seat) and the reticle a parallel state, the rider will automatically adjust the difference with the hemispherical convex portion in the hemispherical recess of the squat _ the X-axis direction and the γ-axis Direction), no need for manual work at all. 'It is quite convenient. []The reticle and the manufacturing system have a predetermined gap. As long as the first telescopic device is activated, the first telescopic device drives the shed, the movable seat and the movable seat. The workpiece is placed at a distance of the reticle, and the reticle has a predetermined gap with an excellent degree of parallelism. The above description is only for the detailed description of the present embodiment. Any simple modifications and changes made will not deviate from the spirit and scope of this creation. From the above, it is possible to make it possible for the person skilled in the art to achieve the seven-objective effect of the patent law. Propose a new type of patent application. M301356 [Simple description of the diagram] The first diagram is the appearance of the embodiment of the creation. The second diagram is a schematic diagram of part of the structure of the creation. The third diagram is the schematic diagram of the operation of the second diagram. The movement of the second picture The second diagram is the schematic diagram of the operation process of the second diagram. The sixth diagram is the schematic diagram of the conventional device. The seventh diagram is a schematic diagram of another conventional device. [Main component symbol description] 10, 91 machine 20 working socket 21, 92 first telescopic device 211, 921 motor 212, 922 connector 213, 923 ball screw 22, 93 fixing seat 221 hemispherical concave portion 23, 94 movable seat 231 hemispherical convex portion 24, 98 movable seat fixing device 25, 95 workpiece 30 , 96 reticle holder 31, 961 reticle 40, 97 exposure head 941 adjustment screw H1 first height H2 second height P1 first position P2 second position 11

Claims (1)

M301356 九、申請專利範園: 1 .-種曝光機之對準定位裝置,係包括: 一機台; 工件承座’係設於該機台上,其侧關定—场,該工 件承座至少具有一第一伸縮裝置、一固定座、一活動座及一活 動座口疋虞置,該第一伸縮裝置係介於該機台與該固定座間, 口^座係A半球凹部’該活動座係與該半球凹部相對 應之半球凸部’使該半球凹部與該半球凸部相配合而可任意方 向微量傾斜,該活動座固定裝置係可固定活動座; 一光罩承座,係用以固定一光罩; 曝光碩,係用以發出預定光線穿透該光罩使該工件曝光。 如申明專利域第1項所述之曝光機之對準定位裝置,其中, Ί舌動座固定裝置係以磁性定位固定該活動座。 3如中明專利範15第i項所述之曝光機之對準定位裝置,其中, I舌動座固定I置係以直接卡止固定該活動座。 (? 12M301356 IX. Application for Patent Park: 1. The alignment device for the exposure machine includes: a machine table; the workpiece holder is mounted on the machine, the side is fixed-field, the workpiece holder At least a first telescopic device, a fixed seat, a movable seat and a movable seat device, the first telescopic device is interposed between the machine and the fixed seat, and the mouth is a hemispherical recess The hemispherical convex portion corresponding to the concave portion of the hemisphere enables the hemispherical concave portion to be tilted in an arbitrary direction in cooperation with the convex portion of the hemisphere, and the movable seat fixing device can fix the movable seat; To fix a reticle; to expose a predetermined light to penetrate the reticle to expose the workpiece. The alignment positioning device of the exposure machine according to the first aspect of the invention, wherein the tongue movement fixing device fixes the movable seat by magnetic positioning. [3] The alignment positioning device of the exposure machine according to the invention of the invention, wherein the tongue movement seat is fixed to directly fix the movable seat. (? 12
TW95207565U 2006-05-03 2006-05-03 Aligning and positioning device of an exposing device TWM301356U (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI401548B (en) * 2009-07-01 2013-07-11
TWI461856B (en) * 2008-09-24 2014-11-21 Univ Ming Chi Technology With a precise alignment of the tilt exposure mechanism

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI461856B (en) * 2008-09-24 2014-11-21 Univ Ming Chi Technology With a precise alignment of the tilt exposure mechanism
TWI401548B (en) * 2009-07-01 2013-07-11

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