TWM288479U - Image-protective apparatus - Google Patents

Image-protective apparatus Download PDF

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Publication number
TWM288479U
TWM288479U TW94215684U TW94215684U TWM288479U TW M288479 U TWM288479 U TW M288479U TW 94215684 U TW94215684 U TW 94215684U TW 94215684 U TW94215684 U TW 94215684U TW M288479 U TWM288479 U TW M288479U
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Taiwan
Prior art keywords
light
protection device
diffraction
elements
eye protection
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TW94215684U
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Chinese (zh)
Inventor
Seng-Hsiung Chang
Hon Kuan
Heng-Yau Pan
Meei-Ling Hung
Yung-Chiang Wei
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Far East College
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Publication of TWM288479U publication Critical patent/TWM288479U/en

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M288479 八、新型說明: 【新型所屬之技術領域】M288479 Eight, new description: [New technology field]

本新型係有關於一種護目裝置,其特別有關於一 種表面使用光繞射元件(diffracti〇 C doe)之護目裝置。 ement’ 【先前技術】 粗。Γ統護目裝置係為醇鹽及溶凝膠⑽gel)之複合材 LΛ功月匕上’多用來阻播顯示器之輻射、線。雖具有消 除靜電荷、吸收低頻輻射之優點,然而傳統 於阻f外來不同波長之光線與吸收強光、反射光與眩先 2月匕較不顯著。在種類上,護目裝置多為偏光鏡片, 二除來自大地的反射光線,並清除部分來自水平方向 々刺眼偏光。然而’傳統護目裝置具有不均勻、劃紋、 Z、凹凸不平、氣泡與模糊等缺點,特別是對於不同 的強光無法兼具偏折之效果。 株张ΐ了解決這個問題,有需要提供—種使用光繞射元 所構成之新型護目裝置以克服先前技術的缺點。 k新型内容】 本新型之目的在提供一種護目裝置,其係使用光 繞射元件於其表面。 含一為達上述目的,本創作提出一種護目裝置,其包 • :、、、蔓目展置本體之透明基板,以及複數個光繞The present invention relates to a eye protection device, and more particularly to a eye protection device using a light diffracting element (diffracti〇 C doe). Ement' [previous technique] thick. The SiS eye protection device is a composite of alkoxide and lyogel (10) gel). Although it has the advantages of eliminating static charge and absorbing low-frequency radiation, it is less obvious that the light of different wavelengths is different from that of absorbing strong light, reflected light and glare. In terms of types, the eye protection devices are mostly polarized lenses, the second is to remove the reflected light from the earth, and the part is removed from the horizontal direction. However, the conventional eye protection device has disadvantages such as unevenness, crease, Z, unevenness, bubble and blur, and the like, especially for different glare, cannot have a partial deflection effect. In order to solve this problem, it is necessary to provide a novel eye protection device using a light diffracting element to overcome the disadvantages of the prior art. k Novel content] The purpose of the novel is to provide a eye protection device that uses a light diffractive element on its surface. In order to achieve the above purpose, the present invention proposes a eye protection device comprising: a transparent substrate on which the body is mounted, and a plurality of light windings.

5 FE003-P428-TW M288479 射元件。該複數個光繞射 分曰# 仟係包含複數階光繞射單 疋日日格,且該複數個光繞射元件 ^ ^ 兀件係配置於該透明基板 衣 laj ° 根據本創作之護目裝置之一 你田、-特欲,該護目裝置係 使用禝數個光繞射元件。 根據本創作之護目裝置之另一 _ ..... Λ , - 7, 特徵,该稷數個光 、兀射兀件之光繞射單元晶格係 軺係/、有2的整數倍階數。 =創作所揭示之護目裝置係以微機電製程 n:有將不同波長的強光皆可完整偏折之效果。 口此可以應用於一般眼鏡之護目裝置。 2補作之上述和其他目的\特徵、和優點能 更月顯易t董’下文特舉數個較佳實施例,並配合所附 圖式,作詳細說明如下。 【實施方式】 -雖然本創作可表現為不同形式之實施例,但附圖所 不者及於下文巾說明者係為本創作可之較佳實施例,並 請了解本文所料者料量為賴作之—範例,且並非 意圖用以將本創作限制於圖示及/或所描述之特定實施 例中。 、 傳統護目裝置具有不均勻、劃紋、斑點、凹凸不 平、氣泡與模糊等缺點,㈣是對於不同波長的強光 無法兼具偏折之效果。有鑑於此,有需要提供-種使5 FE003-P428-TW M288479 Shooting components. The plurality of light diffraction branches 仟 包含 包含 包含 包含 包含 包含 包含 包含 包含 包含 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , One of the devices is your field, and the eye protection device uses a plurality of light diffractive elements. According to another _ ..... Λ , - 7, characteristic of the eye protection device of the present invention, the light diffracting unit lattice system of the plurality of light and the transmitting element has an integer multiple of 2 Order. = The eye protection device disclosed by the author is based on the micro-electromechanical process. n: It has the effect of completely deflecting the strong light of different wavelengths. This can be applied to the eye protection device of general glasses. 2 The above and other objects, features, and advantages of the supplement can be made more convenient. The following is a detailed description of several preferred embodiments, and is described in detail below with reference to the accompanying drawings. [Embodiment] - Although the present invention may be embodied in different forms, the drawings and the following description are preferred embodiments of the present invention, and please understand that the amount of material in this document is The examples are not intended to limit the present invention to the particular embodiments illustrated and/or described. Traditional eye protection devices have the disadvantages of unevenness, creases, spots, unevenness, bubbles and blurring. (4) It is impossible for both glare of different wavelengths to have a partial deflection effect. In view of this, there is a need to provide

FE003-P428-TW 6 M288479 用光、vo射元件所構成之護目裝置以克服先前技術的 缺點。 "月參考第1a圖’其顯示為本創作所述之護目裝置 1〇0。本創作提出一種護目裝置100,其主要包含一作 為羞目1置本體之透明基板200,複數個光繞射元件 3〇〇位於該透明基板2⑼之表面;其中該複數個光繞 射兀件300係包含複數階光繞射單元晶格320 ;以及 遠複數個光繞射元件3〇〇之平坦面配置於該透明基板 200之表面。更注意的是,該複數個光繞射元件係配 置於該透明基板200之第一表面與第二表面,且互相 為互補式之結構。請參考第lb圖,其顯示為本創作 所述之濩目裝置100之一種應用。該護目裝置可應用 於任何可顯示影像之裝置,如電視鏡面,或一般顯示 器110之鏡面。 請參考第2圖,其顯示為護目裝置之侧面結構與 光繞射元件之細部結構圖。光繞射元件(D〇E) 3〇〇的 基本原理是以相位調制的方式,利用純量繞射理論或 向畺繞射理論,經過計算後得到表面輪廓之變化。全 像術(holography)發明後,更進一步的將繞射光學的概 念與原理應用在微光學元件上;如分光器與微小透鏡 組(lens lets)。光繞射元件的基本設計流程係首先計算 出特定波前的干涉圖形,即為電腦全像片 (computer-generated h〇l〇gram,CGH )。再由數位繪圖 機輸出計算模擬後的干涉圖形,最後微縮影到底片。FE003-P428-TW 6 M288479 A protective device consisting of optical and vo-emitting elements to overcome the disadvantages of the prior art. "Monthly reference to Fig. 1a' which shows the eye protection device 1〇0 described in the creation. The present invention proposes a protection device 100, which mainly comprises a transparent substrate 200 as a shame, and a plurality of light diffraction elements 3 are located on the surface of the transparent substrate 2 (9); wherein the plurality of optical diffraction elements The 300 series includes a plurality of light diffraction unit cells 320; and a flat surface of the plurality of light diffraction elements 3 is disposed on a surface of the transparent substrate 200. More specifically, the plurality of light diffractive elements are disposed on the first surface and the second surface of the transparent substrate 200 and are complementary to each other. Please refer to Figure lb, which shows an application of the eyepiece device 100 described herein. The eye protection device can be applied to any device capable of displaying an image, such as a television mirror or a mirror of a general display 110. Please refer to Fig. 2, which shows a detailed view of the side structure of the eye protection device and the light diffraction element. The basic principle of the light diffractive element (D〇E) 3〇〇 is the phase modulation method, which uses the scalar diffraction theory or the 畺 diffraction theory to calculate the surface profile. After the invention of holography, the concepts and principles of diffractive optics were further applied to micro-optical components; such as beamsplitters and lens sets. The basic design flow of the light diffraction element is to first calculate the interference pattern of a specific wavefront, which is a computer-generated h〇l〇gram (CGH). Then, the digital plotter output calculates the simulated interference pattern, and finally the miniature image is the final film.

FE003-P428-TW 7 M288479 精由表面輪廊之變化調制入射面光場的相位,控制出 射面光場的相位,得到預定出射光空間能量的分布。 配合第2圖以說明其使用方法。其中λ1、λ2係表 示一般不同方向的入射光線,經光繞射元件後將光線 散射;λ3係表示為光線從顯示器射出之光線,經由互 補式光繞射元件之結構,其光程間距相等,使得從顯 示器射出之光線不會被光繞射元件所散射。該光繞射 元件之設計法則大致分為四種架構··第一種是光程差 法(optical path method);第二種是純量波繞射理論 (scalar diffraction theory);第三種是嚴格耦合波傳理 論(rigorous coupled wave theory);第四種是箅效介質 理論(effective medium theory)。目前的光繞射元件多 採用純量波繞射法設計。純量波繞射法係以光的波動 現象為基礎來描述光的繞射現象,又稱為傅氏光學 (fourier optics)。光的波動說認為波前上的 每一點都可以視為一個次級的(sec〇ndary)球面波源, 即所有新波源的波包會組成新的波前。該光繞射元件 之工作原理係為介質的折射率n與光繞射元件膜厚之 關係方程式。根據入射光之波長與基板之折射率來設 计經光繞射元件後光線之前進方向。 繞射效率與該複數個光繞射元件300上之光繞射 單凡晶格310之數目有關,-般而言,越多階的光繞 射早兀晶格310可得到更高之效率。需注意的是,為 了设計上的方便,其中該複數個光繞射元件300上之FE003-P428-TW 7 M288479 The phase of the incident surface light field is modulated by the change of the surface porch, and the phase of the outgoing surface light field is controlled to obtain the distribution of the spatial energy of the predetermined outgoing light. Use Figure 2 to illustrate how to use it. Wherein λ1 and λ2 are incident light rays generally in different directions, and the light is scattered by the light diffraction element; λ3 is expressed as light emitted from the display by the light, and the optical path spacing is equal via the structure of the complementary light diffraction element. The light emitted from the display is not scattered by the light diffractive element. The design rule of the light diffractive element is roughly divided into four kinds of structures: the first is an optical path method; the second is a scalar diffraction theory; the third is Rigorous coupled wave theory; the fourth is effective medium theory. The current light diffraction elements are mostly designed using a scalar wave diffraction method. The scalar wave diffraction method is based on the phenomenon of light fluctuations and describes the diffraction phenomenon of light, also known as fourier optics. The fluctuation of light says that every point on the wavefront can be regarded as a secondary (sec〇ndary) spherical wave source, that is, the wave packets of all new wave sources will form a new wavefront. The optical diffraction element operates on the relationship between the refractive index n of the medium and the film thickness of the light diffraction element. The forward direction of the light passing through the light diffraction element is designed according to the wavelength of the incident light and the refractive index of the substrate. The diffraction efficiency is related to the number of light diffraction single crystal lattices 310 on the plurality of light diffractive elements 300. In general, the more orders of light are scattered around the early lattice 310 to achieve higher efficiency. It should be noted that for the convenience of design, the plurality of light diffractive elements 300 are

FE003-P428-TW 8 M288479 光繞射單το晶格32〇之數目係具有2的整數倍階數,且 该複數個光繞射元件300係為週期性結構。該複數個 光繞射兀件3〇〇之厚度不大於1〇um,且其繞射角度不 大於90度。在創作中,言亥複數個光繞射元件之繞射效 率不大於98%。 再次配合第2圖以說明光繞射元件300製程上, D:E的製造方法大至上有三種:全像紀錄、光罩微影 (黃光微影)製程和直接紀錄。本創作較佳實施例係採 用但不限於為光罩微影(黃光微影)製程。在透明之基 板3 10如石英,玻璃基板、銦錫氧化物厚膜(IT。)或 透明光阻,以傳統光罩微影(黃光微影)製程製作。為 了製作不同深度之光繞射單元晶格32〇,可採用多次 κ光微影與蝕刻製程。或者使用灰階光罩,由於光阻 在灰階光罩不同顏色深度下有不同曝光深度,因此可 達到不同深度之光繞射單元晶格32〇。該光阻係採用 但不限於AZ正光阻系列與Su_8負光阻系列,其他厚膜 光阻亦可實施。 ' 另一方面,在光繞射元件300的製程上,微機電 製程技術、半導體製程技術或準分子雷射製程等方式 可製作出奈米尺度之光繞射元件元件。由於微機電^ 程(MEMS )技術的快速發展與元件微小化的需求, 光繞射元件300的光繞射單元晶格32〇製程亦可使用 類微微機電之LIGA製程,亦即是先於矽基板利用上半 導體製程做出類似光繞射單元晶格32〇之母模。再披FE003-P428-TW 8 M288479 The number of light diffraction single το lattices 32 系 has an integer multiple of 2, and the plurality of light diffraction elements 300 are of a periodic structure. The plurality of light diffractive elements 3 厚度 have a thickness of no more than 1 〇 um and a diffraction angle of not more than 90 degrees. In the creation, the diffraction efficiency of a plurality of light diffractive elements is not more than 98%. Again with the second diagram to illustrate the process of the optical diffractive component 300, there are three major manufacturing methods for D:E: holographic recording, lithographic lithography (yellow lithography) process and direct recording. The preferred embodiment of the present invention is, but not limited to, a reticle lithography (yellow lithography) process. The transparent substrate 3 10 such as quartz, glass substrate, indium tin oxide thick film (IT.) or transparent photoresist is fabricated by a conventional mask lithography (yellow lithography) process. In order to fabricate 32 〇 of the light diffraction unit lattices of different depths, multiple κ photolithography and etching processes can be employed. Or use a gray scale reticle. Since the photoresist has different exposure depths at different color depths of the gray scale reticle, the diffraction grating unit lattice of different depths can be achieved. The photoresist is used but not limited to the AZ positive photoresist series and the Su_8 negative photoresist series. Other thick film photoresists can also be implemented. On the other hand, on the manufacturing process of the light diffraction element 300, a micro-electromechanical process technology, a semiconductor process technology or a quasi-molecular laser process can produce a nano-scale light diffraction element component. Due to the rapid development of micro-electromechanical (MEMS) technology and the need for miniaturization of components, the optical diffraction unit of the optical diffraction element 300 can also use the LIGA process of micro-electromechanical, that is, prior to 矽The substrate utilizes an upper semiconductor process to make a master mold similar to the light diffraction unit lattice 32〇. Put on

FE003-P428-TW 9 M288479 覆一層透明的聚矽氣焓 似物,待烘烤過後脫心 子聚合物PDMS或其相 光繞射元们〇。:=得到厚度約為⑽左右之 驟,即可製作互補式4::面重複上述之製程步 射元件300之光鱗射單。構的光繞射元件3〇〇。該光繞 數,其較佳實施二二;晶=係具有2的整數 之平扫面田$ …、、、白口亥複數個光繞射元件300 千—面取後係配置料明基板2G0之表面。 f上所述’相較於傳統的護目裝置,本創作所揭 裝置_具有光繞射元件,== 鏡:具有均勾、無劃紋、無斑點,更可以; Ξ到H強Ϊ光線且不影響顯示器之畫質與對比率’ 達f有效保護使用者眼睛之功效。因此本創作之該镬 ^置旦⑽之功效係可用來偏折外來不同波長之強 光且不影響鏡面之畫質與對比率。 用以作已以前述較佳實施例揭示,然其並非 5之創作’任何熟習此技藝者’在不脫離本創 圍内,當可作各種之更動與修改。如上 述=釋,都可以作各型式的修正與變化,而不會破 ΐϋ作ί精神。因此本創作之保護範圍當視後附之 申靖專利範圍所界定者為準。FE003-P428-TW 9 M288479 A layer of transparent polyfluorene gas is used. After the baking, the de-polymerized polymer PDMS or its phase diffraction elements are 〇. := A step of obtaining a thickness of about (10) is obtained, and a complementary type 4:: face is repeated to repeat the above-described process shooting element 300. The light diffractive element 3 is configured. The number of the optical windings is preferably two or two; the crystal= is a plain scanning surface having an integer of 2, and is a plurality of light diffractive elements of the white mouth. The surface. Compared with the traditional eye protection device, the device disclosed in the present invention has a light diffractive element, == mirror: has a hook, no scratch, no spots, and more; And does not affect the quality of the display and the contrast ratio 'f to effectively protect the user's eyes. Therefore, the effect of this creation (10) can be used to deflect the strong light of different wavelengths without affecting the image quality and contrast ratio of the mirror. It is to be understood that the above-described preferred embodiments are disclosed, and that it is not intended to be a substitute for the invention. As explained above, you can make corrections and changes for each type without breaking the spirit of ί. Therefore, the scope of protection of this creation is subject to the definition of Shenjing's patent scope attached to it.

FE003-P428-TW 10 M288479 【圖式簡單說明】 第la圖顯示為本創作所述之護目裝置; 第lb圖顯示為本創作所述之護目裝置之應用;以及 第2圖顯示為護目裝置之側面結構與光繞射元件之 細部結構圖。 【主要元件符號說明】 100護目裝置 110顯示器鏡面 200透明基板 300光繞射元件 310作為光繞射元件之透明基板 320光繞射單元晶格FE003-P428-TW 10 M288479 [Simplified description of the drawings] Figure la shows the eye protection device described in the present application; Figure lb shows the application of the eye protection device described in the present writing; and Figure 2 shows the protection A detailed structural view of the side structure of the mesh device and the light diffraction element. [Main component symbol description] 100 eye protection device 110 display mirror 200 transparent substrate 300 light diffraction element 310 as a transparent substrate of light diffraction element 320 light diffraction unit lattice

11 FE003-P428-TW11 FE003-P428-TW

Claims (1)

M288479 1 九、申請專利範圍: 1· 一種護目裝置,其包含: 一作為護目裝置本體之透明基板; 複數個光繞射兀件,其中該複數個光繞射元件係包含 複數階光繞射單元晶格;以及 该複數個光繞射元件係配置於該透明基板之表面。 2·如專利申請範圍第1項之護目裝置,其中該複數個光 繞射元件之光繞射單元晶格係具有2的整數倍階數。 3·如專利申請範圍第丨項之護目裝置,其中該複數個光 繞射元件係配置於該透明基板之第一表面與第二表 面’且互相為互補式之結構。 4·如專利申請範圍第1項之護目裝置,其中該複數個光 繞射7^件之厚度不大於1 Oum。 5· ^專利申請範圍第1項之護目裝置,其中該複數個光 、%射元件之繞射效率不大於98%。 • ^專利申請範圍第1項之護目裝置,其中該複數個光 射元件之基板係為玻璃基板、銦錫氧化物厚膜與透 月光阻中之一種材料。 12 FE003-P428-TW M288479 ,其中該複數個光 7·如專利申請範圍第1項之護目裝 繞射元件以微機電製程所製作。 13 FE003-P428-TWM288479 1 IX. Patent application scope: 1. A eye protection device comprising: a transparent substrate as a body of a protection device; a plurality of light diffraction elements, wherein the plurality of light diffraction elements comprise a plurality of light diffraction a unit cell lattice; and the plurality of light diffractive elements are disposed on a surface of the transparent substrate. 2. The eye protection device of claim 1, wherein the light diffracting unit lattice of the plurality of optical diffractive elements has an integer multiple of two orders. 3. The eye protection device of claim 3, wherein the plurality of optical diffractive elements are disposed on the first surface and the second surface of the transparent substrate and are complementary to each other. 4. The device of claim 1, wherein the plurality of light diffraction elements are no more than 1 Oum thick. 5. The protective device of claim 1, wherein the plurality of light and % elements have a diffraction efficiency of not more than 98%. • The eye protection device of claim 1, wherein the substrate of the plurality of light-emitting elements is one of a glass substrate, a thick film of indium tin oxide, and a transparent photoresist. 12 FE003-P428-TW M288479, wherein the plurality of light beams are fabricated in a microelectromechanical process as in the first embodiment of the patent application scope. 13 FE003-P428-TW
TW94215684U 2005-09-12 2005-09-12 Image-protective apparatus TWM288479U (en)

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