TWM261315U - Improved polishing machine - Google Patents

Improved polishing machine Download PDF

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Publication number
TWM261315U
TWM261315U TW93213795U TW93213795U TWM261315U TW M261315 U TWM261315 U TW M261315U TW 93213795 U TW93213795 U TW 93213795U TW 93213795 U TW93213795 U TW 93213795U TW M261315 U TWM261315 U TW M261315U
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TW
Taiwan
Prior art keywords
base
polishing machine
grinding wheel
movable frame
item
Prior art date
Application number
TW93213795U
Other languages
Chinese (zh)
Inventor
Su-Jeng Wu
Original Assignee
Luen Tz Da Fa Machinery Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Luen Tz Da Fa Machinery Co Ltd filed Critical Luen Tz Da Fa Machinery Co Ltd
Priority to TW93213795U priority Critical patent/TWM261315U/en
Publication of TWM261315U publication Critical patent/TWM261315U/en

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Description

M261315 創作說明(1) 【新型所屬之技術 本創作係與拋 效果之改良之拋光 【先前技術】 按,習知之拋 於該機台上之一馬 傳動軸之一傳動皮 傳動皮帶旋轉,進 輪姐之砂輪轉動, 削,以達到拋光工 由於拋光機運 恕,必然使得剛性 光機所組成之連續 大,不僅會影響機 果。 【新型内容】M261315 Creation instructions (1) [New technology belongs to the creation and polishing of the improved polishing effect [previous technology] Press, as is known, a horse driving shaft and a driving leather driving belt on the machine rotates and enters the wheel The grinding wheel of the sister rotates and cuts to achieve that the polishing machine will inevitably make the continuous composition of the rigid light machine large due to the polishing machine's operation, which will not only affect the machine. [New content]

領域】 先機有關,更詳而言之是指一種呈 機者。 一,、4辰 光機其 達及一 帶。拋 而利用 如此一 件表面 作時馬 之機台 式抛光 台結構 結構大 砂輪組 光機使 傳動皮 來,即 之目的 達與砂 產生震 設備, 之穩固 體上係包含一機台、設置 ,以及連結馬達與砂輪龟 用時,係可藉由馬達帶動 帶促使砂輪纽運轉,使砂 可將工件貼靠於砂輪上磨 〇 輪組皆處於持續澤轉之狀 動之情形’若是由;部抱 則震動之幅度將 更曰心%工件拋光之致 ^ 本創作之主要目的即在提供一種可解決前揭缺 ,機,其藉由避震機構之設置,不僅可提升機台择失之拋 又度,更可提高工件之拋光效果者。 、、=構之穩 、,豕疋,馬運成前述之目的,本創作係提供—Field] Opportunities are concerned, and more specifically refer to a presenter. One, four, Chen Guangji reach the area. The use of such a surface as a horse machine desktop polishing table structure structure large grinding wheel set light machine to drive the leather, that is to achieve the purpose of sand vibration equipment, the stable solid system includes a machine, settings, and When the motor is connected with the grinding wheel turtle, the belt can be driven by the motor to drive the grinding wheel to make the sand move the workpiece against the grinding wheel. The wheels are moving continuously. The amplitude of the vibration will be even more so that the work piece is polished. The main purpose of this creation is to provide a mechanism that can solve the problem before it is solved. The setting of the shock-absorbing mechanism can not only improve the selection of the machine, but also Degree, can improve the polishing effect of the workpiece. ,, = structure of stability, 豕 疋, Ma Yuncheng for the aforementioned purpose, this creative department provides-

拋光機,包含有一機台、一驅動馬達、及一可受誃改〖 達傳動之砂輪組;其特徵在於該機台係具有一基以1 動架,樞設於該基座上,該驅動馬達與砂輪組係=班’ 動架頂側;及一避震機構,連接於該基座盥活=^置2 、 巧木之fThe polishing machine includes a machine, a driving motor, and a grinding wheel set capable of being modified. The machine is characterized in that the machine has a base and a moving frame, which is pivoted on the base and the drive. The motor and grinding wheel system = the top side of the moving frame; and a shock-absorbing mechanism connected to the base;

M261315 _ 四、創作說明(2) 利M261315 _ IV. Creative Instructions (2)

用以當該驅動馬達與砂輪組運轉而造成活動架震動斤 用避震機構產生避震效果者。 ^ J 【實施方式】 以下,茲舉本創作一較佳實施例,並配合圖 步之詳細說明如後: 4連一 首先,請參閱第一圖至第三圖所示,本創作一一— 施例之拋光機1,係包含有一機台10,一驅動馬達2〇^^一貫 砂輪組30設置於該機台10上;該驅動馬達2〇與砂於組3 結構、作動方式概與習知拋光機之馬達、砂輪級^同^ 非本創作之重點此處不再贅述’本創作該拋光機丨 ” 係在於: 知色 該機台1 0,係由一基座11與一活動架1 2所構成。該活 動架12係具有一立板121,該立板121底端係利用二姊 樞設於基座11上,一頂板122,固設於該立板121頂端,該 驅動馬達20與砂輪組30係設置於頂板122頂側。基此,該Χ 活動架1 2係可相對基座1 1樞轉。 一避震機構40,係由一避震器41與一氣壓缸42所組成 。該避震器4 1,係連接於該頂板1 2 2與基座11之間,具有 一螺桿411,二螺帽412,螺設於該螺桿411上,一彈簧41 3 ,套置於該螺桿41 1上而介於頂板1 22底側與螺帽412之間 。該氣壓缸4 2,係樞設於該基座1 1上,其活塞桿4 2 1並樞 接該立板1 2 2。 藉由上述各該構件之配合,如第四圖所示’當該拋光 機1運作時,由於該活動架1 2係可相對基座1 1樞轉之設計When the driving motor and the grinding wheel set are running and the movable frame is vibrated, a shock-absorbing mechanism is used to generate a shock-absorbing effect. ^ J [Implementation] The following is a preferred embodiment of this creation, and the detailed description of the steps is as follows: 4 consecutive one First, please refer to the first to third pictures, this creation one by one- The polishing machine 1 of the embodiment includes a machine 10, and a driving motor 20 is provided on the machine 10; the driving motor 20 and the sand are in group 3. Knowing the motor and grinding wheel of the polishing machine ^ Same as ^ This is not the focus of this creation. I will not repeat the 'this polishing machine in this creation 丨'. It is because: The machine 10 is known, which is composed of a base 11 and a movable rack. The movable frame 12 has a vertical plate 121. The bottom end of the vertical plate 121 is arranged on the base 11 by two sister pivots, and a top plate 122 is fixed on the top of the vertical plate 121. The driving motor 20 and the grinding wheel set 30 are arranged on the top side of the top plate 122. Based on this, the X movable frame 12 can be pivoted relative to the base 11 1. A shock-absorbing mechanism 40 is composed of a shock absorber 41 and a pneumatic cylinder 42 The shock absorber 41 is connected between the top plate 1 2 2 and the base 11 and has a screw 411, two nuts 412, and a screw disposed on the screw. On 411, a spring 41 3 is sleeved on the screw 41 1 and interposed between the bottom side of the top plate 1 22 and the nut 412. The pneumatic cylinder 4 2 is pivoted on the base 11 and the piston The rod 4 2 1 is pivotally connected to the vertical plate 1 2 2. With the cooperation of the above components, as shown in the fourth figure, 'When the polishing machine 1 is operating, since the movable frame 1 2 can be opposite to the base 1 1 pivot design

第6頁 M261315 3、創作說明(3) ,且,該避震器41與 輪組3 0運轉所產生之 使該砂輪組3 0不會產 作者。因此,相較於 構設計不僅可有效提 工件之拋光效果者。 綜上所陳,本創 動架可樞轉之設計以 機台結構之穩定度, 本創作確實符合新型 氣壓缸4 2均可吸收該驅動馬達2 0與砂 震動能量並維持機台1 0結構之穩定, 生晃動現象,便於進行工件之搬光動 習知拋光機,本創作該拋光機1之結 升機台結構之穩定度,更進而可提高 作所提供之拋光機,其藉由機台之活 及避震機構之設置,不僅可有效提升 更可提高工件之拋光效果者;緣是, 專利之規定,爰依法提出申請。Page 6 M261315 3. Creation description (3), and the shock absorber 41 and the wheel set 30 run so that the wheel set 30 will not produce the author. Therefore, compared with the structural design, it can not only effectively improve the polishing effect of the workpiece. To sum up, the design of the movable frame of this invention is pivotable to the stability of the machine structure. This creation is indeed consistent with the new pneumatic cylinder 4 2 can absorb the driving motor 20 and sand vibration energy and maintain the machine 10 structure. It is stable and has the phenomenon of shaking, which is convenient for moving the workpiece. It is convenient to use the conventional polishing machine. The stability of the structure of the lifting machine of this polishing machine 1 is created, and the polishing machine provided by the machine can be further improved. The installation of the platform and the suspension mechanism can not only effectively enhance the polishing effect of the workpiece, but also because of the provisions of the patent, apply according to law.

第7頁 M261315__ 圖式簡單說明 【圖式簡單說明】 第一圖係本創作一較佳實施例之立體組合圖。 第二圖係本創作一較佳實施例中機台與避震機構之立體組 合圖。 τ 第三圖係本創作一較佳實施例之惻視圖。 第四圖係本創作一較佳實施例之動作示意圖,顯示避震機 構之運作狀態。 【主要元件符號說明】 拋光機1 機台10 驅動馬達2 0 砂輪組3 0 避震機構4 0 基座11 活動架1 2 立板1 2 1 軸承1 3 頂板1 2 2 避震器4 1 氣壓缸42 螺桿41 1 螺帽4 1 2 彈簧4 13 棚 Η 1 第8頁Page 7 M261315__ Simple illustration of the drawing [Simplified illustration of the drawing] The first drawing is a three-dimensional combination drawing of a preferred embodiment of this creation. The second picture is a three-dimensional combination diagram of the machine and the shock-absorbing mechanism in a preferred embodiment of the present invention. The third figure is a perspective view of a preferred embodiment of the present invention. The fourth diagram is a schematic diagram of the operation of a preferred embodiment of the present invention, showing the operation status of the shock-absorbing mechanism. [Description of symbols of main components] Polishing machine 1 Machine 10 Drive motor 2 0 Grinding wheel set 3 0 Suspension mechanism 4 0 Base 11 Movable frame 1 2 Upright plate 1 2 1 Bearing 1 3 Top plate 1 2 2 Shock absorber 4 1 Air pressure Cylinder 42 Screw 41 1 Nut 4 1 2 Spring 4 13 Shed 1 Page 8

Claims (1)

M261315 五、申請导利範圍 1. 一種 及一可受該 其特徵 該機台 該驅動馬達 一避震 驅動馬達與 構產生避震 2. 如申 架係具有一 固設於該立 3 ·如申 板底端係利 4.如申 震機構係包 5 ·如申 器係連接於 6 ·如申 機構更包含 連接該立板 改良之拋光機,包含有一機台、一驅動馬達、 驅動馬達傳動之砂輪組; 在於: 係具有一基座,一活動架,樞設於該基座上, 與砂輪組係設置於活動架頂側;及„ 機構,連接於該基座與活動架之間,用以當該 砂輪組運轉而造成活動架震動時可利用避震機 效果者。 請專利範圍第1項所述之拋光機,其中該活動 立板,該立板底,端係樞設於基座上,一頂板, 板頂端,該驅動馬達與砂輪組係設置於頂板頂 請專利範圍第1或2項所述之拋光機,其中該立 用軸承樞設於基座上。 請專利範圍第1或2項所述之拋光機,其中該避 含一避震器,係連接於該活動架與基座之間。 請專利範圍第4項所述之拋光機」其中該避震 該頂板與基座之間。 請專利範圍第4項所述之拋光機,其中該避震 有一氣壓缸,係設置於該基座上,其活塞桿並M261315 V. Application for guidance 1. A type and a feature that can be affected by the machine The drive motor a shock-absorbing drive motor and a structure to generate shock 2. If the application frame has a fixed installation on the stand 3 · Rushen The bottom of the plate is profitable 4. Rushen mechanism is included in package 5. Rushen device is connected to 6. Rushen mechanism further includes a polishing machine connected to the vertical plate, which includes a machine, a drive motor, and a drive motor. The grinding wheel set comprises: a base, a movable frame, pivoted on the base, and a grinding wheel set on the top side of the movable frame; and a mechanism connected between the base and the movable frame, Those who can use the shock absorber effect when the grinding wheel is moved and the movable frame vibrates. Please polish the machine according to item 1 of the patent scope, wherein the movable stand, the bottom of the stand, and the end are pivoted on the base The top plate, the top of the plate, the drive motor and the grinding wheel set are set on the top plate of the polishing machine described in item 1 or 2 of the patent scope, wherein the standing bearing is pivotally mounted on the base. Or the polishing machine according to item 2, wherein the avoidance contains a The shock absorber is connected between the movable frame and the base. Please refer to the polishing machine described in item 4 of the patent scope, wherein the shock is between the top plate and the base. The polishing machine according to item 4 of the patent, wherein the shock absorber has a pneumatic cylinder, which is arranged on the base, and the piston rod 第9頁Page 9
TW93213795U 2004-08-31 2004-08-31 Improved polishing machine TWM261315U (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI792029B (en) * 2019-08-06 2023-02-11 日商日清紡微電子股份有限公司 piezoelectric element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI792029B (en) * 2019-08-06 2023-02-11 日商日清紡微電子股份有限公司 piezoelectric element

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