TWM255377U - The plasma apparatus for disposal of perfluorocompound off-gas - Google Patents

The plasma apparatus for disposal of perfluorocompound off-gas Download PDF

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Publication number
TWM255377U
TWM255377U TW91209744U TW91209744U TWM255377U TW M255377 U TWM255377 U TW M255377U TW 91209744 U TW91209744 U TW 91209744U TW 91209744 U TW91209744 U TW 91209744U TW M255377 U TWM255377 U TW M255377U
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TW
Taiwan
Prior art keywords
plasma
water
treatment
exhaust gas
efficiency
Prior art date
Application number
TW91209744U
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Chinese (zh)
Inventor
Chin-Ching Tzeng
Shih-Yin Liu
Nian-Hung Guo
Shiaw-Huei Chen
Neng-Fang Tseng
Original Assignee
Inst Nuclear Energy Res
Desiccant Technology Corp
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Application filed by Inst Nuclear Energy Res, Desiccant Technology Corp filed Critical Inst Nuclear Energy Res
Priority to TW91209744U priority Critical patent/TWM255377U/en
Publication of TWM255377U publication Critical patent/TWM255377U/en

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M255377 V. Creative Instructions (1) Perfluoride is one of the greenhouse gases; in 1997, in the United Nations Framework Convention on Climate Change and the Metropolitan Protocol, countries passed the control of six major greenhouse gases (carbon dioxide C02, Pinane CH4 'nitrous oxide N20, sulfur hexafluoride SF :, hydrofluorocarbon HFCs and perfluoride PFCs, etc.) specific reduction plan and timetable. Among the six main regulated greenhouse gases, SFe, HFCs & PFCs are mainly artificial greenhouse gas components. Although HFC s and PFC s do not deplete the ozone layer, they are all potent greenhouse gases with high Global Warming Potential (GWP) values. The GWPs for HFCs, PFCs, and SF6 are: 140- Π 70 0, 6500-92, 00, 23900, can stay in the atmosphere for a long time, with a very long life cycle 'the cumulative effect in the atmosphere is irreversible. In recent years, semiconductor processes (such as cavity cleaning procedures in dry etching chemical vapor deposition) have widely used CF4, C2F6, and NF3 perf compounds (pfc; Perf luorocompound) as process gases, and only a small part of these gases have been used. Most of the remaining (such as about 90% of chemical vapor deposition) is regarded as exhaust emissions, which is an important source of greenhouse effect. As the developed countries of the semiconductor industry already have a common understanding and agreement, regulations will be formulated to reduce pFCs gas emissions in the future. The Taiwan semiconductor industry will also be bound by this agreement. But at present, the manufacturing technology of semiconductors and spare parts is becoming more and more sophisticated, and the use of perfluoride is increasing with the progress of semiconductor processes. Therefore, it is necessary to control and deal with environmental pollution, harm and new ones. "Exhaust gas treatment systems, In response to more stringent exhaust gas emission standards in the future, this creation feels the urgent need for the treatment of perfluorinated exhaust gas. Based on the design principle of high-energy density plasma high-temperature cracking and washing and removal of harm, we carefully create a highly efficient perfluorinated exhaust gas. Electricity
M255377 V. Creation instructions (2) Poly treatment device 'It contains a plasma torch, a reaction chamber', a sprinkler group, a water tank, and a wet washing tower. It is characterized by the indoor treatment of the sprinkler group. , This wet creation should wait for harmful exhaust gas treatment. Sheng Nanwen (big plasma) will be some simple carbon and hydrogen fluoride of the whole IL compound. This is an equation such as the warm plasma torch directly made into the mouth into a wet wash ring with conductors and other: The working principles of C2F6 and SiH4 are, for example, pyrolysis of high-energy dense compounds and destruction, or atoms such as hydrogen will be combined into a sprinkler group that cannot be reached by furnaces, and the exhaust gas will be discharged into a water tank after being treated by the polyester tower. Fluoride, NF3, CHF3 and other plasma plasma torches produced by industrial production, CF4 under: straightness (10 atomization and water or, one oxygen or more. Introduce exhaust gas and high, and after the reaction chamber is cooled, then The recycling range of the scrubbing tower includes half of the treatment. For example, the creation of the perfluorinated chemical bond in the exhaust gas is broken down by the treated molecular double, without the traditional thermal combustion of the machine, ~ 80 MJ / kg), ionization, the combination of oxygen to form carbonized carbon, and the more complex components of dioxide
C2F6 + 4 H2〇 --- > 6 HF + 2 C02 + JJ S i H4 + 02 ---> S i 〇2 + 2 H2, and produce a hydrogen fluoride sprinkler group, spraying water but due to electricity The temperature of the exhaust gas after the pulp torch treatment is extremely high, so at the exit of the plasma reaction chamber, two
Page 7 M255377 ~ —----— Mist II cools down the gas quickly and dissolves part of the HF, but because the high temperature affects the gas / combined degree ', the combined degree is not high, so the exhaust gas is cooled by water spray. After that, 1 丨 i: ϊ style? The scrubbing tower is filled with high-surface-area fillers, carvings, and water groups. When the exhaust gas passes through this wet scrubbing tower, the entrained particles and silicon powder in the mouth can be washed and filtered. At the same time, hydrogen fluoride 41 suction, when processing thorium fluoride-containing products, the spray of water mist can be two! :: and hydrogen acid, according to the current situation, there is a waste water department in the science park. The fluorine-containing waste water can be treated by the waste water treatment plant. Therefore, the water stored in this creation tank can be discharged to the wastewater treatment plant in batches or continuously.
IrtV η ·
In order to make your members have a better understanding, the following illustration and the creation of a preferred embodiment are explained below. The picture does not explain: The first picture: a conventional perfluoride electric heating box processing device. The second picture: a conventional perfluoride incinerator incineration treatment device. The second picture. The high efficiency of this creation is exhausting. ≪ Door >; And the description of the drawing number of the Wangwanghuan waste gas plasma treatment device: 10 electric heating box 1 1 electric heating wire 20 windmill * 30 chimney
4〇 Combustion furnace 41 Flame nozzle 50 Windmill ’60 Chimney 110 Plasma reactor 111 Exhaust gas inlet
M255377 V. Creation instructions (4) 112 Plasma torch 113 Reaction chamber 12 0 Water sprayer group 121 Water volume control valve 122 Water sprayer head 130 Water tank 14 0 Pump 141 Filter 15 0 Wet washing tower 151 Water sprayer group 1 6 0 As shown in the first figure, the windmill is a conventional perfluoride electric heating box processing device. The exhaust gas is introduced into the electric heating box 10, and the pyrofluoride is decomposed at high temperature by heating with electric heating wires. Finally, it is discharged through the chimney 30. However, due to the use of electric heating,
On the other hand, it consumes electricity with poor energy efficiency. On the other hand, the maximum heating temperature can only reach 200 ° C, which requires a certain heating reaction time. Therefore, in general, the amount of processing air is small, and some solids are also easy to remain in the electric heating box.丨 〇 中. As shown in the first figure, it is a conventional perfluoride burner incinerator. Typical ^ is to use gas as fuel, introduce gas into the flame nozzle 41 and ignite to form a flame with an energy density of 1 ~ 3 MJ / kg, and then introduce the exhaust gas into the combustion furnace 4 for incineration, and then use the windmill 5 to process the gas Sent to the chimney row 〇 to large ,. The advantage of this device is that the amount of exhaust gas treatment is large and the temperature can also be higher than that of electric heaters. However, recently, for safety considerations in semiconductor factories, there have been self-regulations in the factory.
疋 Do not use a gas burner incinerator as an exhaust gas treatment device to avoid danger. Three pictures, shown below: This is one of the best implementation examples of the high-efficiency full gaseous gas plasma treatment of the creation. The following explains the principle and operation mode so that Committee member understands the feasibility and superiority of this creation. Sex. Originally created "胄 * Density density t high | Design original
Page 9 M255377 V. Creation Instructions (5) A highly efficient plasma treatment device for high-efficiency perfluoride exhaust gas, which is carefully created by Li ', which is characterized in that the exhaust gas directly interacts with the high-temperature plasma torch, and then enters the reaction chamber for processing. A sprinkler group is set at the outlet of the reaction chamber. After the exhaust gas is cooled by the sprinkler group, it is introduced into a wet washing tower to be discharged. The circulating water of this wet washing tower is provided with a water tank to supply it. The operation of this creation is as follows: the plasma reactor 110 includes three parts: an exhaust gas inlet, an electric polymerization torch 112, and a reaction chamber 113. The reaction chamber is constructed of refractory 2 heat material. Under the heating of the plasma torch, Can form a high temperature environment. The exhaust gas of the whole IL compound enters the plasma reactor 11 through the exhaust gas inlet 111, and passes through the extremely high temperature (10, 00 (TC)) plasma beam of the plasma torch 112. The perfluoride exhaust gas is in the electric torch 112 and the reaction chamber. In 113, it was instantly pyrolyzed, atomic $ or ionized, and the chemical bond between the perfluorinated compounds was disintegrated and destroyed ^ 2 $ into some simple and easy-to-handle molecules or atoms such as hydrogen, carbon monoxide, carbon dioxide and hydrogen fluoride, etc., without Opportunities combine into larger or more complex molecules, which cannot be achieved by thermal combustion furnaces. However, because the temperature of the exhaust gas treated by the reactor 110 is high and hydrogen fluoride gas is generated, water is At the exit of the reaction chamber 113 of the slurry reactor 110, a spray nozzle = group 120 is set, and the spray-water device group 120 is provided with a water volume control valve 121 to regulate the water spray. Make the exhaust gas cool down quickly, but it is divided into hydrogen hydride (HF), but because the high temperature affects the gas dissolvers, = after the strict gas is spray-cooled, the exhaust gas is introduced into a wet washing bar. Σ is filled with 鬲 surface area filling Objects, and is equipped with a water spray set 151, spray 7lc = 151 extracted by the water pump of the water supply tank 140 is 13〇, help may be provided a transition 141 and transition solid impurities before 14〇. Exhaust gases by
Page 10 M255377 V. Creative Instructions (6) " "-When passing this wet scrubbing tower 1 500, the solids entrained in it, such as stone powder, can be washed and filtered. At the same time, hydrogen fluoride is also absorbed here. During the treatment of the hydrogen chloride product, the sprayed water mist can be added with lye to neutralize the hydrogen fluoride acid. However, according to the current situation, if a wastewater treatment plant is set up in the science park, usually the wastewater from Hetun can be treated by The wastewater treatment plant treats it. Therefore, the water stored in the creation tank can be discharged to the wastewater treatment plant in batches or continuously. When the static pressure of the airflow provided by the exhaust gas is insufficient, a windmill 160 can be added to the wet wash bar and the rear end of this creation to make up for the static pressure and smoothly discharge the designed air volume value. Because of the high energy density of the plasma reactor compared with the conventional treatment methods such as combustion, the creation of perfluoride has higher cracking efficiency, and the efficiency superiority is greatly improved. The destruction removal rate of the treatment can reach Μ π ◦It is environmentally friendly and has been proven to be able to process a variety of waste products at the same time. The chemical bonds of CF4 hF6 and NFS and other harmful exhaust gases are destroyed, and the efficiency can reach more than 99%. In this creative experiment, the plasma torch is a non-transmission type DC plasma torch that should produce high temperature plasma.评估 ^ 蛉 Evaluation of exhaust gas treatment equipment in the sports industry, 99% in Metal Etch process, but the treatment efficiency of fluorine, ⑽3, and ㈤4 can reach the compound (for example: CF) t the second effect is not good 'especially, similar (CDO) treatment equipment has no treatment effect, and the controlled pyrolysis oxidizer is 99%, which has an excellent treatment efficiency for SiH, N; 3 and SlF4, which is also lower than that of 4 N2O, NF3 and other gases. The efficiency is all in the 30% Ether volume 丨 From said, ;;, a See the superior performance of this creation. Carefully created ^, Plasma two-temperature pyrolysis and washing and detoxification design Originally a high-efficiency perfluoride exhaust gas plasma treatment Device,
M255377 V. Creation Note (7) It has innovation, feasibility and superiority. I would like to ask your member to grant a patent in accordance with the Patent Law.

Claims (1)

  1. M9W7 ——_ VI. Application for patent scope 1. A high-efficiency perfluorinated waste gas electrical destruction treatment device, which includes a plasma torch, a reaction chamber, a sprinkler group, a water tank, and a wet washing tower. It is characterized by the introduction of exhaust gas and the high-temperature plasma torch to directly interact with it, and then enter the chamber for treatment. And a sprinkler group is set at the exit of the reaction chamber. Second and second level, the circulating water of this wet washing tower is provided with a water tank. 2: The high-efficiency all-chemical waste gas as described in the scope of the patent application ^ Denso, * of which the electric torch is a non-transmission type DC plasma torch that generates high temperature with direct current power supply. Lidian water 3 · Efficiently enter a device as described in the scope of patent application 1, / 5 of Temple 1-Ganyang King gaseous waste gas plasma treatment 4 Ru Shen 2i Ϊ to the layer material is fire and heat insulation Material person. 4. One of the patent scopes of Shenyan 1 / Ye Ye, one of the devices ’喰 @ & ± Sheep King fluoride waste gas plasma treatment, replaced by the sprinkler group. I., and or I., and the above number 5. The high-efficiency full device as described in the application scope of patent 1, which is in the plasma treatment of the device, crystal +, φ β king disorder chemical waste lice 6 Such as the heart * ^ type polyester tower after installing a windmill. • Declares that the high-efficiency perfluorinated servant malozone device described in patent scope 1, among which the thunder will be a, the gaseous waste milk plasma treatment of this thunder will use the water torch, and react to the vertical configuration. , And with this-the plasma torch flame direction and pass this: the direction of the dagger is perpendicular to each other. Water exhaust gas flow
TW91209744U 2002-06-25 2002-06-25 The plasma apparatus for disposal of perfluorocompound off-gas TWM255377U (en)

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TW91209744U TWM255377U (en) 2002-06-25 2002-06-25 The plasma apparatus for disposal of perfluorocompound off-gas

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Application Number Priority Date Filing Date Title
TW91209744U TWM255377U (en) 2002-06-25 2002-06-25 The plasma apparatus for disposal of perfluorocompound off-gas

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TWM255377U true TWM255377U (en) 2005-01-11

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103028316A (en) * 2011-09-29 2013-04-10 丰映科技股份有限公司 Plasma apparatus for the abating emissions of per-fluoro compounds and plasma vortex reactor for making the plasma apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103028316A (en) * 2011-09-29 2013-04-10 丰映科技股份有限公司 Plasma apparatus for the abating emissions of per-fluoro compounds and plasma vortex reactor for making the plasma apparatus

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