TWM255377U - The plasma apparatus for disposal of perfluorocompound off-gas - Google Patents

The plasma apparatus for disposal of perfluorocompound off-gas Download PDF

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TWM255377U
TWM255377U TW91209744U TW91209744U TWM255377U TW M255377 U TWM255377 U TW M255377U TW 91209744 U TW91209744 U TW 91209744U TW 91209744 U TW91209744 U TW 91209744U TW M255377 U TWM255377 U TW M255377U
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Taiwan
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water
plasma
treatment
exhaust gas
efficiency
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TW91209744U
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Chinese (zh)
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Chin-Ching Tzeng
Shih-Yin Liu
Nian-Hung Guo
Shiaw-Huei Chen
Neng-Fang Tseng
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Inst Nuclear Energy Res
Desiccant Technology Corp
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Publication of TWM255377U publication Critical patent/TWM255377U/en

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M255377 五、創作說明(1) 全氟化物是溫室管制氣體之一;1 9 9 7年,,聯合國氣候變化 綱要公約厅、都議定書'’中,各國通過管制六種主要溫室氣 體(二氧化碳C02、曱烷CH4 '氧化亞氮N20、六氟化硫SF:、 氫氟碳化物HFCs及全氟化物PFCs等)的具體減量方案及時 刻表。在六種主要管制溫室氣體中,SFe、HFCs &PFCs等 主要為人造的溫室氣體成分。雖然H F C s及P F C s不會耗損臭 氧層,但皆為強效溫室氣體,具有高全球溫暖化潛勢指數 值(Global Warming Potential, GWP ), HFCs 、 PFCs、SF6 的 GWP 分別為:l4〇 — Π 70 0、65〇〇 _92〇〇、 23900,能停留在大氣層中相當長時間,具極長之生命 期’在大氣中的累積效應為不可逆的。近年來半導體製程 (如在乾蝕刻化學氣相沉積之清腔程序等)廣泛地使用 CF4 C2F6、NF3 專全氟化合物(pfc ; Perf luorocompound ) 做為製程氣體,而這些氣體僅少部分被使用掉,剩餘的大 部分(如化學氣相沉積約剩餘9 〇 % )則當作廢氣排放,是 造成溫室效應的重要來源。由於半導體產業發達之各國 已有共同認知及協議未來將制定法規減少pFCs氣體之排 放’臺灣半導體產業亦將受到此協議之約束。但目前半導 體,備元件的製造技術日趨精密,促使全氟化物的使用量 隨著半導體製程的進步與日俱增,因此需要管制與處理避 免環境公,害之產生,以及採用新的”。廢氣處理系統,以 因應未來更加嚴苛之廢氣排放標準。本創作有感於全氟化 物廢氣處理之迫切需要,以高能量密度電漿高溫裂解及洗 滌除害的設計原理,精心創作一種高效率全氟化物廢氣電M255377 V. Creative Instructions (1) Perfluoride is one of the greenhouse gases; in 1997, in the United Nations Framework Convention on Climate Change and the Metropolitan Protocol, countries passed the control of six major greenhouse gases (carbon dioxide C02, Pinane CH4 'nitrous oxide N20, sulfur hexafluoride SF :, hydrofluorocarbon HFCs and perfluoride PFCs, etc.) specific reduction plan and timetable. Among the six main regulated greenhouse gases, SFe, HFCs & PFCs are mainly artificial greenhouse gas components. Although HFC s and PFC s do not deplete the ozone layer, they are all potent greenhouse gases with high Global Warming Potential (GWP) values. The GWPs for HFCs, PFCs, and SF6 are: 140- Π 70 0, 6500-92, 00, 23900, can stay in the atmosphere for a long time, with a very long life cycle 'the cumulative effect in the atmosphere is irreversible. In recent years, semiconductor processes (such as cavity cleaning procedures in dry etching chemical vapor deposition) have widely used CF4, C2F6, and NF3 perf compounds (pfc; Perf luorocompound) as process gases, and only a small part of these gases have been used. Most of the remaining (such as about 90% of chemical vapor deposition) is regarded as exhaust emissions, which is an important source of greenhouse effect. As the developed countries of the semiconductor industry already have a common understanding and agreement, regulations will be formulated to reduce pFCs gas emissions in the future. The Taiwan semiconductor industry will also be bound by this agreement. But at present, the manufacturing technology of semiconductors and spare parts is becoming more and more sophisticated, and the use of perfluoride is increasing with the progress of semiconductor processes. Therefore, it is necessary to control and deal with environmental pollution, harm and new ones. "Exhaust gas treatment systems, In response to more stringent exhaust gas emission standards in the future, this creation feels the urgent need for the treatment of perfluorinated exhaust gas. Based on the design principle of high-energy density plasma high-temperature cracking and washing and removal of harm, we carefully create a highly efficient perfluorinated exhaust gas. Electricity

M255377 五、創作說明(2) 聚處理裝置’其包含 一電漿火炬, 一反應室’ 一喷水器組, 一水槽, 一濕式洗滌塔, 其特徵在於 應室内處理 過喷水器組 放,此一濕 本創作的應 等有害廢氣 廢氣處理。 生南溫(大 的電漿,將 全IL化物的 一些簡單易 碳和氟化氫 子,這是一 應方程式如 溫電漿火炬直接作 出口處設置 入一濕式洗 環用水設有 導體及其他 :C2F6、SiH4 工作原理如 、高能量密 化物熱解、 而摧毀,並 或原子如氫 會組合成較 爐所無法達 一喷水器組,廢氣經 滌塔處理後予以排 一水槽供應之。 程之全氟化物 、NF3、CHF3 等 流電漿火炬產 工業製 、CF4 下:直 度(10 原子化 與水或 、一氧 大的或 到的。 引入廢氣與高 ,並於反應室 降溫後,再引 式洗滌塔之循 用範圍包含半 之處理,例如 本創作之基本 於 1 0, 0 00 〇C ) 廢氣中的全氟 化學鍵被瓦解 於處理的分子 雙,而沒有機 般傳統熱燃燒 下, ~80 MJ/kg) 、離子化,使 氧氣結合形成 化碳、二氧化 較複雜的分 舉例說明其反M255377 V. Creation instructions (2) Poly treatment device 'It contains a plasma torch, a reaction chamber', a sprinkler group, a water tank, and a wet washing tower. It is characterized by the indoor treatment of the sprinkler group. , This wet creation should wait for harmful exhaust gas treatment. Sheng Nanwen (big plasma) will be some simple carbon and hydrogen fluoride of the whole IL compound. This is an equation such as the warm plasma torch directly made into the mouth into a wet wash ring with conductors and other: The working principles of C2F6 and SiH4 are, for example, pyrolysis of high-energy dense compounds and destruction, or atoms such as hydrogen will be combined into a sprinkler group that cannot be reached by furnaces, and the exhaust gas will be discharged into a water tank after being treated by the polyester tower. Fluoride, NF3, CHF3 and other plasma plasma torches produced by industrial production, CF4 under: straightness (10 atomization and water or, one oxygen or more. Introduce exhaust gas and high, and after the reaction chamber is cooled, then The recycling range of the scrubbing tower includes half of the treatment. For example, the creation of the perfluorinated chemical bond in the exhaust gas is broken down by the treated molecular double, without the traditional thermal combustion of the machine, ~ 80 MJ / kg), ionization, the combination of oxygen to form carbonized carbon, and the more complex components of dioxide

C2F6 + 4 H2〇---> 6 HF + 2 C02 + JJ S i H4 + 02 ---> S i 〇2 + 2 H2 ,並產生氟化氫氣 喷水器組,喷出水 但由於電漿火炬處理後的廢氣溫度極高 體’因此在電漿反應室出口處,設置二C2F6 + 4 H2〇 --- > 6 HF + 2 C02 + JJ S i H4 + 02 ---> S i 〇2 + 2 H2, and produce a hydrogen fluoride sprinkler group, spraying water but due to electricity The temperature of the exhaust gas after the pulp torch treatment is extremely high, so at the exit of the plasma reaction chamber, two

第7頁 M255377 ~—----— 霧二使氣體迅逮降溫,並溶解部分HF,但由於高溫影響氣 體/合解度’、,合解度不高,所以在廢氣經喷水霧冷卻後,再 1丨i: ϊ式?滌塔,該洗滌塔内部填有高表面積填充物, 雕、水态組,廢氣在經過此一濕式洗滌塔時,其夾帶 粒,々口含矽粉末等可以被洗淨濾除,同時氟化氫 41吸,,在處理含氟化氳產物之時,喷出之水霧可 二!::和氫酸性,依現況而言在科學園區設有廢水 处琢者吊含氟廢水可由廢水處理場處理之,因此本 創作水槽之儲水可做批次排放或連續排放至廢水處理場Page 7 M255377 ~ —----— Mist II cools down the gas quickly and dissolves part of the HF, but because the high temperature affects the gas / combined degree ', the combined degree is not high, so the exhaust gas is cooled by water spray. After that, 1 丨 i: ϊ style? The scrubbing tower is filled with high-surface-area fillers, carvings, and water groups. When the exhaust gas passes through this wet scrubbing tower, the entrained particles and silicon powder in the mouth can be washed and filtered. At the same time, hydrogen fluoride 41 suction, when processing thorium fluoride-containing products, the spray of water mist can be two! :: and hydrogen acid, according to the current situation, there is a waste water department in the science park. The fluorine-containing waste water can be treated by the waste water treatment plant. Therefore, the water stored in this creation tank can be discharged to the wastewater treatment plant in batches or continuously.

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為使貴委員有較佳之了解,特就下列圖示與舉本創作 一較佳實施例說明如下。 圖不說明: 第一圖:習用之全氟化物電熱加熱箱處理裝置 第二圖:習用之全氟化物燃燒爐焚化處理裝置 第二圖··本創作之高效率令惫Υ卜 <门>又午王齓化物廢氣電漿處理裝置 圖號說明: 10電熱加熱箱 1 1電熱絲 20 風車 * 30 煙囪In order to make your members have a better understanding, the following illustration and the creation of a preferred embodiment are explained below. The picture does not explain: The first picture: a conventional perfluoride electric heating box processing device. The second picture: a conventional perfluoride incinerator incineration treatment device. The second picture. The high efficiency of this creation is exhausting. ≪ Door >; And the description of the drawing number of the Wangwanghuan waste gas plasma treatment device: 10 electric heating box 1 1 electric heating wire 20 windmill * 30 chimney

4〇 燃燒爐 41火焰噴嘴 50 風車’ 、 60 煙囪 110電漿反應器 111廢氣進口4〇 Combustion furnace 41 Flame nozzle 50 Windmill ’60 Chimney 110 Plasma reactor 111 Exhaust gas inlet

M255377 五、創作說明(4) 112電漿火炬 113反應室 12 0喷水器組 121水量控制閥122 喷水頭 130水槽 14 0幫浦 141 過濾器 15 0濕式洗滌塔 151 噴水器組 1 6 0 風車 如第一圖所示,為習用之全氟化物電熱加熱箱處理裝置。 將廢氣引入電熱加熱箱1 〇,藉電熱絲丨丨加熱來高溫分解全 氟化物,最後經煙囪3 0排出,但其由於採用電熱加熱,一M255377 V. Creation instructions (4) 112 Plasma torch 113 Reaction chamber 12 0 Water sprayer group 121 Water volume control valve 122 Water sprayer head 130 Water tank 14 0 Pump 141 Filter 15 0 Wet washing tower 151 Water sprayer group 1 6 0 As shown in the first figure, the windmill is a conventional perfluoride electric heating box processing device. The exhaust gas is introduced into the electric heating box 10, and the pyrofluoride is decomposed at high temperature by heating with electric heating wires. Finally, it is discharged through the chimney 30. However, due to the use of electric heating,

方面甚耗電能能源效率差,另一方面加熱最高溫度僅能達 20 0 °C,需一定的加熱反應時間,所以一般言之處理風 量較小,另外一些固體物也容易殘留於電熱加熱箱丨〇中。 如第一圖所示,為習用之全氟化物燃燒爐焚化處理裝置。 典型^為使用瓦斯為燃料,將瓦斯引入火焰喷嘴41點燃形 成能量密度1〜3 MJ/kg的火焰,再將廢氣導入燃燒爐4〇内 進行4解焚化,再由風車5 〇將處理後氣體送往煙囪6 〇排至 大,。此裝置好處是廢氣處理量較大且溫度也可較電熱者 ,回但是近來半導體廠為了安全考量,已有廠内自行規On the other hand, it consumes electricity with poor energy efficiency. On the other hand, the maximum heating temperature can only reach 200 ° C, which requires a certain heating reaction time. Therefore, in general, the amount of processing air is small, and some solids are also easy to remain in the electric heating box.丨 〇 中. As shown in the first figure, it is a conventional perfluoride burner incinerator. Typical ^ is to use gas as fuel, introduce gas into the flame nozzle 41 and ignite to form a flame with an energy density of 1 ~ 3 MJ / kg, and then introduce the exhaust gas into the combustion furnace 4 for incineration, and then use the windmill 5 to process the gas Sent to the chimney row 〇 to large ,. The advantage of this device is that the amount of exhaust gas treatment is large and the temperature can also be higher than that of electric heaters. However, recently, for safety considerations in semiconductor factories, there have been self-regulations in the factory.

疋不採用瓦斯燃燒爐焚化處理裝置做為廢氣處理裝置,以 避免危險。 三圖,所示丄為本創作之高效率全氣化物廢氣電漿處理 ^主之一較佳貫施例,以下並說明其原理及運作方式,以 使貝委員了解本創作之可行性及優越性。 本創作得』冑*量密度t聚高|裂解A洗務除害的設計原疋 Do not use a gas burner incinerator as an exhaust gas treatment device to avoid danger. Three pictures, shown below: This is one of the best implementation examples of the high-efficiency full gaseous gas plasma treatment of the creation. The following explains the principle and operation mode so that Committee member understands the feasibility and superiority of this creation. Sex. Originally created "胄 * Density density t high | Design original

第9頁 M255377 五、創作說明(5) 理’精心創作之一種高效率全氟化物廢氣電漿處理裝置, 其特徵在於弓丨入廢氣與高溫電漿火炬直接作用,再進入反 應室内處理,並於反應室出口處設置一喷水器組,廢氣經 過噴水裔組降溫後,再引入一濕式洗滌塔處理後予以排 放,此一濕式洗滌塔之循環用水設有一水槽供應之。本創 作之運作如下:電漿反應器110包括廢氣進口 、電聚火 炬112、反應室113三個部分,其中該反應室内部係以耐火 2熱材,構築而成,在電漿火炬加熱下,可形成高溫環境 。全IL化物廢氣由廢氣進口 111進入電漿反應器11〇,通 過電漿火炬11 2之極高溫(10, 〇〇 (TC )電漿束流,全氟化 物廢氣在電毀火炬112及反應室113中,瞬間被熱解、原子 $或離子化,全氟化物組成之間的化學鍵因而被瓦解摧 ^2 $成一些簡單易於處理的分子或原子如氫、一氧化 碳她二氧化碳和氟化氫等,而沒有機會組合成較大的或較 禝雜的分子,這是熱燃燒爐所無法達到的。但由於經電將 ^應器110處理後的廢氣溫度很高,並產生氟化氫氣體,水 因此,在電漿反應器110的反應室113出口處,設置一喷欠 =組120,喷-水器組120設有水量控制閥121調控噴水、7 、=員1 2 2噴出水霧’由此水吸收熱量使廢氣迅速降溫, ”分I化氫(HF),但由於高溫影響氣體的溶解户, =在严氣經噴霧冷卻後,再將廢氣引入一濕式洗條$ σ内邛填有鬲表面積填充物,並設有噴水器組151 ,噴7lc =且151之水源由幫浦140抽取水槽13〇的水供應之,幫、 14〇之前可設置一過渡器141過渡雜質及固體物。廢氣在經Page 9 M255377 V. Creation Instructions (5) A highly efficient plasma treatment device for high-efficiency perfluoride exhaust gas, which is carefully created by Li ', which is characterized in that the exhaust gas directly interacts with the high-temperature plasma torch, and then enters the reaction chamber for processing. A sprinkler group is set at the outlet of the reaction chamber. After the exhaust gas is cooled by the sprinkler group, it is introduced into a wet washing tower to be discharged. The circulating water of this wet washing tower is provided with a water tank to supply it. The operation of this creation is as follows: the plasma reactor 110 includes three parts: an exhaust gas inlet, an electric polymerization torch 112, and a reaction chamber 113. The reaction chamber is constructed of refractory 2 heat material. Under the heating of the plasma torch, Can form a high temperature environment. The exhaust gas of the whole IL compound enters the plasma reactor 11 through the exhaust gas inlet 111, and passes through the extremely high temperature (10, 00 (TC)) plasma beam of the plasma torch 112. The perfluoride exhaust gas is in the electric torch 112 and the reaction chamber. In 113, it was instantly pyrolyzed, atomic $ or ionized, and the chemical bond between the perfluorinated compounds was disintegrated and destroyed ^ 2 $ into some simple and easy-to-handle molecules or atoms such as hydrogen, carbon monoxide, carbon dioxide and hydrogen fluoride, etc., without Opportunities combine into larger or more complex molecules, which cannot be achieved by thermal combustion furnaces. However, because the temperature of the exhaust gas treated by the reactor 110 is high and hydrogen fluoride gas is generated, water is At the exit of the reaction chamber 113 of the slurry reactor 110, a spray nozzle = group 120 is set, and the spray-water device group 120 is provided with a water volume control valve 121 to regulate the water spray. Make the exhaust gas cool down quickly, but it is divided into hydrogen hydride (HF), but because the high temperature affects the gas dissolvers, = after the strict gas is spray-cooled, the exhaust gas is introduced into a wet washing bar. Σ is filled with 鬲 surface area filling Objects, and is equipped with a water spray set 151, spray 7lc = 151 extracted by the water pump of the water supply tank 140 is 13〇, help may be provided a transition 141 and transition solid impurities before 14〇. Exhaust gases by

第10頁 M255377 五、創作說明(6) ""-- 過此一濕式洗滌塔1 5 〇時,其夾帶之固體物,例如,含石夕 粉末,’可以被洗淨濾除,同時氟化氫在此也被吸收,於 處理IL化氫產物時,噴出之水霧可加鹼液中和氟化氫酸 性三但依現況而言,在科學園區設有廢水處理場者,通常 合敦廢水可由廢水處理場處理之,因此,本創作水槽之儲 水可做批次排放或連續排放至廢水處理場即可。當廢氣來 ,所提供之氣流靜壓不足時,本創作之濕式洗條、後 端可加置一風車16〇以補足靜壓,順利排出設計的風量 值。本創作由於採用電漿反應器丨丨〇較之習用處理方式如 燃燒法之能量密度高,因此,全氟化物之裂解效率較高, 效率優越性大幅提昇,處理之破壞去除率可達Μ π◦甚 ,環保價值,同時已證實可以同時處理多種全狀化物廢 ' 了將CF4 hF6與NFS等有害廢氣的化學鍵加以破壞、分 田ϋ ΐ ί效率可達9 9%以上。本創作實驗時電漿火炬係採 π Γί ^應產生高溫電漿之非傳輸型直流電漿火炬。 饴 々^蛉體業廢氣處理設備評估,在Metal Etch製程 99%,但對含氟、⑽3、及㈤4之處理效率可達 合物(例如:CF ) t二理效果不佳’尤其對,類化 (CDO)處理設備無處理效果’而控制式熱解氧化器 99%,對於SiH、Ν; 3、SlF4之有極佳之處理效率大於 下,由此亦4 N2〇、NF3等氣體之處理效率則均在30%以 太卷丨从说·、;、a見本創作之優越性能0 理,精心創作^,電漿兩溫裂解及洗滌除害的設計原 一種高效率全氟化物廢氣電漿處理裝置,Page 10 M255377 V. Creative Instructions (6) " "-When passing this wet scrubbing tower 1 500, the solids entrained in it, such as stone powder, can be washed and filtered. At the same time, hydrogen fluoride is also absorbed here. During the treatment of the hydrogen chloride product, the sprayed water mist can be added with lye to neutralize the hydrogen fluoride acid. However, according to the current situation, if a wastewater treatment plant is set up in the science park, usually the wastewater from Hetun can be treated by The wastewater treatment plant treats it. Therefore, the water stored in the creation tank can be discharged to the wastewater treatment plant in batches or continuously. When the static pressure of the airflow provided by the exhaust gas is insufficient, a windmill 160 can be added to the wet wash bar and the rear end of this creation to make up for the static pressure and smoothly discharge the designed air volume value. Because of the high energy density of the plasma reactor compared with the conventional treatment methods such as combustion, the creation of perfluoride has higher cracking efficiency, and the efficiency superiority is greatly improved. The destruction removal rate of the treatment can reach Μ π ◦It is environmentally friendly and has been proven to be able to process a variety of waste products at the same time. The chemical bonds of CF4 hF6 and NFS and other harmful exhaust gases are destroyed, and the efficiency can reach more than 99%. In this creative experiment, the plasma torch is a non-transmission type DC plasma torch that should produce high temperature plasma.评估 ^ 蛉 Evaluation of exhaust gas treatment equipment in the sports industry, 99% in Metal Etch process, but the treatment efficiency of fluorine, ⑽3, and ㈤4 can reach the compound (for example: CF) t the second effect is not good 'especially, similar (CDO) treatment equipment has no treatment effect, and the controlled pyrolysis oxidizer is 99%, which has an excellent treatment efficiency for SiH, N; 3 and SlF4, which is also lower than that of 4 N2O, NF3 and other gases. The efficiency is all in the 30% Ether volume 丨 From said, ;;, a See the superior performance of this creation. Carefully created ^, Plasma two-temperature pyrolysis and washing and detoxification design Originally a high-efficiency perfluoride exhaust gas plasma treatment Device,

M255377 五、創作說明(7) 其具有創新與可行性及優越性,爰請貴委員依專利法予 以專利。M255377 V. Creation Note (7) It has innovation, feasibility and superiority. I would like to ask your member to grant a patent in accordance with the Patent Law.

Claims (1)

M9W7 ——_ 六、申請專利範圍 1· 一種高效率全氟化物廢氣電毁處理裝置,其包含, 一電漿火炬, 一反應室, 一喷水器組, 一水槽, 一濕式洗滌塔, 其特徵在於引入廢氣與高溫電漿火炬直接作用,再進入 應室内處理’並於反應室出口處設置一噴水器組, 你 過噴水器組降溫後,再引入—濕式洗滌塔處理後予以=、二 放,此一濕式洗滌塔之循環用水設有一水槽供應之。 2:如申請專利範圍1所述之高效率全說化物廢氣^電 裝,*其中之電黎火炬,係以直流電力供應產生高溫 之非傳輸型直流電漿火炬者。 里電水 3 ·如申請專利範圍1所述之高效入 a 裝置,1中之/5庙—甘羊王氣化物廢氣電漿處理 4如申二i Ϊ ί至其層材料係為耐火斷熱材料者。 4.如申睛專利範圍1 / 了叶者 裝置’其中之一喰走@ & ±羊王氟化物廢氣電漿處理 喷水器組取代之者。 一、、且或一、、且以上數量的 5 ·如申請專·利範圍1所述之高效率全 裝置,其在本裝置之、、晶+、φ β王亂化物廢虱電漿處理 6如由心* ^ 式滌塔後加裝一風車者。 •申明專利範圍1所述之高效率全氟仆物麻洛啻髂 裝置,其,中之雷將 a ,氣化物廢乳電漿處理 之此雷將卜水火炬,、反應至採直立方式配置,且配w 之此-電漿火炬火焰方向與通過此 :匕己置 方向為互相垂直者。 水 廢氣氣流M9W7 ——_ VI. Application for patent scope 1. A high-efficiency perfluorinated waste gas electrical destruction treatment device, which includes a plasma torch, a reaction chamber, a sprinkler group, a water tank, and a wet washing tower. It is characterized by the introduction of exhaust gas and the high-temperature plasma torch to directly interact with it, and then enter the chamber for treatment. And a sprinkler group is set at the exit of the reaction chamber. Second and second level, the circulating water of this wet washing tower is provided with a water tank. 2: The high-efficiency all-chemical waste gas as described in the scope of the patent application ^ Denso, * of which the electric torch is a non-transmission type DC plasma torch that generates high temperature with direct current power supply. Lidian water 3 · Efficiently enter a device as described in the scope of patent application 1, / 5 of Temple 1-Ganyang King gaseous waste gas plasma treatment 4 Ru Shen 2i Ϊ to the layer material is fire and heat insulation Material person. 4. One of the patent scopes of Shenyan 1 / Ye Ye, one of the devices ’喰 @ & ± Sheep King fluoride waste gas plasma treatment, replaced by the sprinkler group. I., and or I., and the above number 5. The high-efficiency full device as described in the application scope of patent 1, which is in the plasma treatment of the device, crystal +, φ β king disorder chemical waste lice 6 Such as the heart * ^ type polyester tower after installing a windmill. • Declares that the high-efficiency perfluorinated servant malozone device described in patent scope 1, among which the thunder will be a, the gaseous waste milk plasma treatment of this thunder will use the water torch, and react to the vertical configuration. , And with this-the plasma torch flame direction and pass this: the direction of the dagger is perpendicular to each other. Water exhaust gas flow
TW91209744U 2002-06-25 2002-06-25 The plasma apparatus for disposal of perfluorocompound off-gas TWM255377U (en)

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TW91209744U TWM255377U (en) 2002-06-25 2002-06-25 The plasma apparatus for disposal of perfluorocompound off-gas

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103028316A (en) * 2011-09-29 2013-04-10 丰映科技股份有限公司 Plasma processing apparatus and eddy current plasma reactor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103028316A (en) * 2011-09-29 2013-04-10 丰映科技股份有限公司 Plasma processing apparatus and eddy current plasma reactor

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