TWM252135U - The improvement of a coating mechanism with rosin flux on a wafer ball grid array - Google Patents

The improvement of a coating mechanism with rosin flux on a wafer ball grid array Download PDF

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Publication number
TWM252135U
TWM252135U TW93200010U TW93200010U TWM252135U TW M252135 U TWM252135 U TW M252135U TW 93200010 U TW93200010 U TW 93200010U TW 93200010 U TW93200010 U TW 93200010U TW M252135 U TWM252135 U TW M252135U
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Taiwan
Prior art keywords
seat
flux
coating
solder
application
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TW93200010U
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Chinese (zh)
Inventor
Cheng-Chang Tseng
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All Ring Tech Co Ltd
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Priority to TW93200010U priority Critical patent/TWM252135U/en
Publication of TWM252135U publication Critical patent/TWM252135U/en

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Description

M252135 M252135 四、創作說明(2) --- 動作,當由一側塗抹至另一側後,該塗抹之 二/則可上昇至原處,再令另一刮刀組 (22 :動,使其刮刀片(231)下降位移至可力源 爾後,再藉由輪送帶(24)反向將其帶位j之位 銲 Ί刀片(2 3 1 )往回塗抹銲劑,如此 2 >令 劑。但由上述方式係具有m點:p了達均句塗抹 本浪費 該習知結構中,其二壓缸之設置係為產製者的成M252135 M252135 IV. Creation Instructions (2) --- Action, when smeared from one side to the other, the second of the smear can be raised to the original position, and then another scraper group (22: move to make it After the scraper blade (231) is lowered and moved to Keliyuan, the welding blade (2 3 1) at the position j is reversely applied by the conveyor belt (24), so as to apply 2 > However, the above method has m points: the patter of the dajun sentence is wasted. In the conventional structure, the setting of the second pressure cylinder is a product of the producer.

KU :下位移的運用時間過長,係 3·該二壓缸之設置,係須先考量整體管路的配置, 才可有作動順暢機械程序。 ^ 4 ·因無法偵測銲劑存量,故習用皆設定以作動次數 來作為提供補充銲劑的準則,但此程序係無法有效地控制 辉劑量,致使於在機台中銲劑量過少,仍繼續動作而不補 充(未達補充銲劑之作動次數)或鮮劑量充足仍繼續補充 銲劑’使其過量造成作業耗時及增加產品的不良率。KU: The use time of the lower displacement is too long, because of the setting of the three-cylinder, it is necessary to consider the configuration of the overall pipeline before there can be a smooth mechanical program. ^ 4 · Because it is impossible to detect the flux quantity, it is customary to set the number of operations as the guideline for providing supplementary flux. However, this procedure cannot effectively control the amount of glow, so that the amount of flux in the machine is too small, and it continues to operate without Replenishment (below the number of operations to replenish the flux) or continue to replenish the flux when the fresh dose is sufficient, which will cause excessive operation time and increase the defective rate of the product.

綜上所述可知,一般眾所皆知晶片植球機結構,在因 應使用者及產製者之需求,皆有些許不盡理想之處。因此 ’如何改善晶片植球機在製作及使用時之缺失,及針對上 述缺失來設計達到可由簡單的構造,相對達成所需之實質 效益,即為本創作者所欲解決之課題所在,且針對產品的 技術結構再作具體及有效進步性的新型改良設置。To sum up, it is known that the structure of the wafer ball planter, which is generally known, is somewhat unsatisfactory in response to the needs of users and manufacturers. Therefore, 'how to improve the defects in the production and use of wafer ball planters, and to design the above-mentioned defects to achieve a simple structure and relatively achieve the required substantial benefits, which is the problem that the creator wants to solve, and The technical structure of the product is further improved with specific and effective progress.

第7頁 M252135 1、創作說明(3)Page 7 M252135 1. Creation Instructions (3)

【新型内容J 麦是,本創作係有關一種晶片楂球機之銲劑塗佈機構 f改良,主要係於銲劑膠台底部之輸送帶上連結設有一雨旁 側具有凸設塊之結合座,且可各自對應嵌設具嵌槽之活動 座’而於凸設塊連設有彈性件搭接於活動座上卡合作彈性 壓持’且兩活動座對應鎖設於底端呈兩斜向塗佈面之盡抹 座上’同,使該塗抹座位於銲劑膠台頂面之塗佈區;據此 匕=使輸达帶連結帶動結合座,而令結合座凸設塊抵掣活 b =二=略為傾斜狀態拉動塗抹座,使其塗佈面可對塗佈 £進仃塗抹助銲劑及同時達平整者。 【實施方法】 丨段及ί :本::J達上揭目的、功效’其所採用之技術手 明如下,俾舉數較佳可行實施例並配合圖式說 1同。 史審查委員對本創作能有更進一步之瞭解與認 丨之媒請參閱第一〜三圖所示,係本創作晶片植球機 佈機構’(= 立體及各面剖視示意圖,該銲劑塗 I劑膠台(ι ί Γ =劑機(101)輸送助銲劑,經銲 ί面之以(=道(102)至銲劑膠台⑴) 有輸送帶(]Ί ί 03),再於銲劑膠台(10)底部設 1 2 1 )之沾人),且連結組設有一兩旁側具有凸設塊( 1 ^ )之、、、。合座(12),而由該結合座 凸設塊(…)係各自對應欲入一具嵌槽= 第8頁 M252135 ,且該活動座q彳 且套設彈性件(1 3 3C申有固 又該兩活動座(1 3)心;於凸設 .1 , -, X 、 J ;係對應鎖設於底 右/5、,之塗抹纟(1 4)上,且該 係g又有感測視窗口 ( 1 4 位於銲劑膠台(i 〇 ) 2),同時該 、丄U )頂面之塗佈區( 作動時, 位移,而 )嵌槽( 則會抵掣 左位移則 座(1 3 1 3 )往 側傾斜狀 1 4 )則 4 1), 劑;而當 塗抹,令 (13) 3 )往左 傾斜狀態 佈區(1 區(1 0 四、創作說明(4) 丨活動座(1 3 )内 I定塊(1 3 2 ), |塊(1 2 1 )上, |端呈兩斜向塗佈面 塗抹座(1 4 )上 塗抹座(1 4 )係 1 0 3 )上。 請繼續參閱第 1 1 )運轉連結帶 1 2 )位移時,該 |之結合座(1 2 ) 3 )嵌槽(1 3 1 1 2 )凸設塊(1 3 1 )之左側壁面 丨斜,而帶動塗抹座 而此時該略為傾 j對應塗佈區(1 Q 過之塗佈區(1 0 I抹後’則往右向位 12)凸設塊(1 1 )之右側壁面, ,而帶動塗抹座( |使該塗抹座(1 4 佈面(1 4 1 ), 四〜七圖所示,於 座(1 2 ) 動座(1 3 (12 1) 面,而當往 係抵掣活動 其活動座( )同樣以右 之塗抹座( 塗佈面(1 行塗抹助銲 樣方式往回 抵掣活動座 活動座(1 同樣以左側 傾斜對應塗 方向之塗佈 係由輸送( 當結合座( 1 3 1 )内 活動座(1 該結合座( )嵌槽(1 右側方向傾 態往左位移 利用所傾斜 對所位移經 左向位移塗 該結合座( 嵌槽(1 3 側方向傾斜 往右位移, ◦ 3 )之塗 3 )進行塗 第9頁 M252135[New content J Mai is, this creation is an improvement on the flux coating mechanism f of a wafer haw ball machine, which is mainly connected with a joint seat with a convex block on the side of the rain belt. It can be respectively corresponding to the movable seat with an embedded groove, and an elastic member is attached to the convex block to overlap with the movable seat to cooperate with the elastic pressing, and the two movable seats are correspondingly locked at the bottom and coated diagonally. The same as above, the application seat is located at the coating area on the top surface of the solder glue table; according to this, the conveying belt is connected to drive the combination seat, and the combination seat convex block resists b = two = Pull the applicator slightly inclined so that its coating surface can be applied to the application. Apply flux and level it at the same time. [Implementation method] The paragraph and ί: Ben :: J reached the purpose of the disclosure, the effect of the technical manual used is as follows, the number of preferred and feasible embodiments and the description of the drawings are the same. The history reviewers can further understand and recognize this creation. For the media, please refer to the first to third pictures, which are the wafer ball planter cloth mechanism of this creation '(= three-dimensional and cross-sectional schematic diagrams of the surface, the solder coating I Glue station (ι Γ = flux machine (101) to transport the flux, which passes through the welding surface (= lane (102) to the solder station ⑴) with a conveyor belt (] Ί ί 03), and then to the solder station (10) 1 2 1) is attached to the bottom), and the linking group is provided with one, two, and two having convex blocks (1 ^) on both sides. The combined seat (12), and the protruding blocks (...) formed by the combined seat are respectively corresponding to a recessed groove = page 8 M252135, and the movable seat q 彳 is provided with an elastic member (1 3 3C Shen Yougu The center of the two movable seats (1 3); the convex setting .1,-, X, J; the corresponding lock is set on the bottom right / 5, the daub (1 4), and the system g has a feeling The viewing window (1 4 is located on the solder rubber table (i 〇) 2), and at the same time, the coating area on the top surface of the 丄 U) (displacement when operating, and) the slot (will counteract the left displacement of the seat (1 3 1 3) Tilt to the side 1 4) Then 4 1), agent; and when applied, make (13) 3) tilt to the left. The cloth area (1 area (1 0 IV. Creative instructions (4) 丨 movable seat) (1 3) the inner I fixed block (1 3 2), | on the block (1 2 1), the end is provided with two oblique coating surfaces (1 4) and the upper application base (1 4) is 1 0 3) Please continue to refer to Section 1 1) When the connection belt 1 2) is displaced, the combined seat (1 2) 3) recess (1 3 1 1 2) left wall surface of the protruding block (1 3 1) 丨Oblique, and drive the applicator seat, which should be slightly tilted at this time corresponding to the coating area (1 Q after the coating area (1 0 I after wiping ' Then the right wall surface of the block (1 1) is protruded to the right 12), and the application base (| makes the application base (1 4 cloth surface (1 4 1), as shown in Figures 4-7), 1 2) the moving seat (1 3 (12 1) surface, and when moving the moving seat (), the moving seat () is also the right side of the smearing seat (the coating surface (1 line of smearing soldering sample way back to the moving seat) The movable base (1 is also tilted to the left to correspond to the coating direction. The coating is conveyed by the movable base (1 the combined base (1 3 1)). Coat the joint with the left side of the displacement (inlay groove (1 3 side direction obliquely and shift to the right, ◦ 3)) 3) Paint on page 9 M252135

抹mi:整以供下一程序構件沾附助銲劑。 窗口 mj:器(a)對塗抹……感測視 助銲劑之高低輸人量,而於低於所需之塗抹 銲劑y101)輸送助銲劑經銲 、:= 道(102)㈣劑膠台(10)頂面之 、供塗抹平整。 心玉仰 由,上所述,該元件之組成與使用實施說明可知, 們二:知道本創作晶片植球機之銲劑塗佈機構改良,具有 下列幾項優點,如下: 1 ·本創作晶片植球機之銲劑塗佈機構改良,藉由活 動座嵌設於結合座之凸設塊,而令結合座位移時,可帶動 活動座及塗抹座略為傾斜滑動,而以塗抹座傾斜對應塗佈 區之塗佈面進行塗抹助銲劑;以此左右位移方式帶動,其 作動速度快’無須如習知結構需等待壓缸作動的時間,係 符合產業經濟效益。 2 ·由上述結構之設置可知,無需如習知結構設置壓 缸’故本創作之組裝構件簡單,相對也降低製作成本。 3 ·本創作無習知結構需設置管路的問題存在。 4 本創作晶片植球機之銲劑塗佈機構改良,藉由感 測器來镇測助銲劑量,係達到適時供應銲劑的優點。 綜上所述,本創作實施例確能達到所預期之使用功效 ’又其所揭露之具體構造,不僅未曾見於同類產品中,亦 未曾公開於申請前,誠已完全符合專利法之規定與要求,Wiping mi: for the next program component to adhere to the flux. Window mj: device (a) for smearing ... sensing the level of input of flux, and the flux is lower than the required flux y101) to transport the flux through the soldering: 10) The top surface is smooth for painting. Xin Yuyang, as mentioned above, we can know the composition and use of this component. We know that the flux coating mechanism of the wafer ball planter is improved, which has the following advantages, as follows: 1 The flux coating mechanism of the ball machine is improved. The movable seat is embedded in the convex block of the joint seat, so that when the joint seat is displaced, the movable seat and the application seat can be slightly slid, and the application seat is inclined to correspond to the coating area. The coating surface is coated with flux; driven by the left-right displacement method, its operation speed is fast, and it does not need to wait for the cylinder to act as a conventional structure, which is in line with industrial economic benefits. 2 · It can be seen from the setting of the above structure that there is no need to set the cylinder as in the conventional structure, so the assembly components of this creation are simple and the production cost is relatively reduced. 3 · There is a problem that the pipelines need to be set up in the construction without any knowledge. 4 The flux coating mechanism of this creative wafer ball implanter is improved. The sensor is used to measure the flux amount, which achieves the advantage of timely supply of flux. In summary, this creative embodiment can indeed achieve the expected use effect, and the specific structure disclosed is not only not seen in similar products, nor disclosed before the application, and it has fully complied with the requirements and requirements of the Patent Law. ,

M252135 四、創作說明(6) 爰依法提出新型專利之申請,懇請惠予審查,並賜准專利 ,則實感德便。 M252135 ( ( ( 圖式簡單說明 圖 式 簡 單說明】 第 圖 :本創作之立體示意 圖 0 第 二 圖 本創作橫向剖視示意圖 第 二 圖 本創作縱向剖視示意圖 第 四 圖 本創作之動作示意 圖 ( __ 一 ) 第 五 圖 本創作之局部剖視示意 圖 第 六 圖 本創作之動作示意 圖 ( 二 ) 第 七 圖 本創作之局部剖視示意 圖 第 八 圖 習知之立體示意 圖 第 九 圖 習知之動作示意 圖 參照圖號〕 <本創作> 1 ) 銲劑塗佈機構 ( 1 0 ) 銲劑膠台 1 0 1 ) 供銲劑機 ( 1 0 2 ) 料道 1 0 3 ) 塗佈區 ( 1 1 ) 輸送帶 1 2 ) 結合座 ( 1 2 1 ) 凸設塊 1 3 ) 活動座 ( 1 3 1 ) 欲槽 1 3 2 ) 固定塊 ( 1 3 3 ) 彈性件 1 4 ) 塗抹座 ( 1 4 1 ) 塗佈面 1 4 2 ) 感測視窗口 ( A ) 感測器 < 習 知> 2 0 ) 銲劑膠台 ( 2 1 ) 塗佈區 2 2 ) 刮刀組 ( 2 2 1 ) 刮刀片 2 3 ) 刮刀組 ( 2 3 1 ) 刮刀片M252135 IV. Creation Instructions (6) When applying for a new patent in accordance with the law, I would like to ask for your review and grant the patent. M252135 (((Simplified illustration of the diagram, simple illustration of the diagram) Figure: The three-dimensional schematic diagram of this creation 0 The second diagram This diagram of the horizontal section of the creation The second diagram The diagram of the vertical section of the creation The fourth diagram of the action of this creation (__ 1) Figure 5: Partial cross-section diagram of the creation Figure 6: Partial cross-section diagram of the creation (2) Figure 7: Partial cross-section diagram of the creation ] ≪ This creation > 1) Flux coating mechanism (1 0) Flux rubber table 1 0 1) Flux supply machine (1 0 2) Material path 1 0 3) Coating area (1 1) Conveyor belt 1 2) Combining base (1 2 1) Convex block 1 3) Moving base (1 3 1) Groove 1 3 2) Fixing block (1 3 3) Elastic piece 1 4) Application base (1 4 1) Coating surface 1 4 2) Sensing view window (A) Sensor < conventional > 2 0) Solder glue table (2 1) Coating area 2 2) Squeegee group (2 2 1) Squeegee blade 2 3) Squeegee group (2 3 1) Scraper

第12頁 M252135 圖式簡單說明 (24) 輸送帶Page 12 M252135 Simple illustration (24) Conveyor belt

1ϋ·Ι 第13頁1ϋ · 第 13

Claims (1)

M252135 五、申請專利範圍 1 · 一種晶片 有一銲劑膠台,於 合座,而銲劑膠台 該塗抹座底端 之塗佈區上,而由 座一端設有嵌槽, 據此,於結合 抹座以略為傾斜狀 佈區來回進行塗抹 2 ·如申請專 劑塗佈機構改良」 ,且該固定塊係可 ,如此係可於活動 壓持的功效者。 3 ·如申請專 劑塗佈機構改良」 輸送助銲劑,且於 視窗口外對應設有 測,而予以控制供 至銲劑膠台頂面之 植球機之銲劑塗佈 銲劑膠台底部設有 頂端面上設有一塗 呈兩斜向塗佈面, 塗抹座兩側各對應 以對應喪入套合於 座凸設塊推動該活 態被拉動,使其塗 助銲劑及同時達平 利範圍第1項所述 ,其中,該活動座 套設彈性件,而搭 座與塗抹座來回作 利範圍第1項所述 ,其中,該銲劑膠 塗抹座兩侧設有感 感測1§ ’係經由感 鲜劑機輸送助辉劑 塗佈區供塗抹平整 機構改良,主要係設 可藉輸送帶連動之結 抹座,其特徵在於: 且位於銲劑膠台頂面 樞接一活動座,活動 結合座凸設塊上; 動座作動時,可使塗 抹座之塗佈面可對塗 整者。 之「晶片植球機之銲 上係可凸伸一固定塊 接於結合座凸設塊上 動時,可藉彈性件作 之「晶片植球機之銲 台一側設有供銲劑機 測視窗口 ,而由感測 測器由感測視窗口 4貞 經銲劑膠台内之料道 者。M252135 V. Application for patent scope 1 · A wafer has a solder glue station on the base, and the solder glue station is on the coating area at the bottom end of the application base, and one end of the base is provided with a recess. Smear back and forth with a slightly inclined cloth area. 2 · If applying for the improvement of a special agent coating mechanism, and the fixing block is OK, so it can be used for active compression. 3 · If applying for the improvement of the special flux coating mechanism ", send the flux, and set a corresponding measurement outside the viewing window, and control the solder coating flux supplied to the ball planter on the top surface of the flux rubber table. There is a coating on the surface with two oblique coating surfaces, and the two sides of the painting base correspond to each other to fit into the convex block on the seat to push the living state to be pulled, so that it can be coated with flux and reach the level of profitability at the same time. Item 1, wherein the movable seat is provided with an elastic member, and the covering seat and the application seat are used to make a profit. As described in Item 1, wherein the two sides of the solder paste application seat are provided with sensing 1§ The freshener conveying agent coating area is used for the improvement of the smoothing mechanism. It is mainly provided with a wiper seat that can be linked by a conveyor belt. It is characterized in that: a movable seat is pivotally located on the top surface of the solder glue table, and the movable combination seat is convex Set the block; when the moving seat is operated, the coating surface of the application seat can be facing the finisher. "The soldering system of the wafer ball planter can be extended by a fixed block connected to the projection block of the joint seat, which can be made by using an elastic member. , And the sensor through the sensor viewing window 4 through the material channel in the solder station. 第14頁Page 14
TW93200010U 2004-01-02 2004-01-02 The improvement of a coating mechanism with rosin flux on a wafer ball grid array TWM252135U (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112259478A (en) * 2020-10-23 2021-01-22 技感半导体设备(南通)有限公司 Ball scraping and spreading device and method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112259478A (en) * 2020-10-23 2021-01-22 技感半导体设备(南通)有限公司 Ball scraping and spreading device and method

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