TWI847105B - Substrate processing method - Google Patents

Substrate processing method

Info

Publication number
TWI847105B
TWI847105B TW111109251A TW111109251A TWI847105B TW I847105 B TWI847105 B TW I847105B TW 111109251 A TW111109251 A TW 111109251A TW 111109251 A TW111109251 A TW 111109251A TW I847105 B TWI847105 B TW I847105B
Authority
TW
Taiwan
Prior art keywords
processing method
substrate processing
substrate
processing
Prior art date
Application number
TW111109251A
Other languages
Chinese (zh)
Other versions
TW202303673A (en
Inventor
堀越章
竹市弥生
上野美佳
Original Assignee
日商斯庫林集團股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2022010194A external-priority patent/JP2022151603A/en
Priority claimed from JP2022010259A external-priority patent/JP2022151604A/en
Application filed by 日商斯庫林集團股份有限公司 filed Critical 日商斯庫林集團股份有限公司
Publication of TW202303673A publication Critical patent/TW202303673A/en
Application granted granted Critical
Publication of TWI847105B publication Critical patent/TWI847105B/en

Links

TW111109251A 2021-03-24 2022-03-14 Substrate processing method TWI847105B (en)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP2021050036 2021-03-24
JP2021-049777 2021-03-24
JP2021049777 2021-03-24
JP2021-050036 2021-03-24
JP2022010194A JP2022151603A (en) 2021-03-24 2022-01-26 Substrate processing method
JP2022-010194 2022-01-26
JP2022-010259 2022-01-26
JP2022010259A JP2022151604A (en) 2021-03-24 2022-01-26 Plasma generation device and design method thereof

Publications (2)

Publication Number Publication Date
TW202303673A TW202303673A (en) 2023-01-16
TWI847105B true TWI847105B (en) 2024-07-01

Family

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Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006118161A1 (en) 2005-04-28 2006-11-09 Hitachi Kokusai Electric Inc. Substrate treating apparatus and electrode

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006118161A1 (en) 2005-04-28 2006-11-09 Hitachi Kokusai Electric Inc. Substrate treating apparatus and electrode

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