TWI838673B - Method of manufacturing meta lenses, meta lens structure and multi-lens optical module having meta lens structure - Google Patents

Method of manufacturing meta lenses, meta lens structure and multi-lens optical module having meta lens structure Download PDF

Info

Publication number
TWI838673B
TWI838673B TW110148311A TW110148311A TWI838673B TW I838673 B TWI838673 B TW I838673B TW 110148311 A TW110148311 A TW 110148311A TW 110148311 A TW110148311 A TW 110148311A TW I838673 B TWI838673 B TW I838673B
Authority
TW
Taiwan
Prior art keywords
cylindrical
super
lens
nano
lenses
Prior art date
Application number
TW110148311A
Other languages
Chinese (zh)
Other versions
TW202317357A (en
Inventor
章金 程
昊澎 蔡
Original Assignee
新加坡商超穎光學科技私人有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 新加坡商超穎光學科技私人有限公司 filed Critical 新加坡商超穎光學科技私人有限公司
Publication of TW202317357A publication Critical patent/TW202317357A/en
Application granted granted Critical
Publication of TWI838673B publication Critical patent/TWI838673B/en

Links

Images

Abstract

A method of manufacturing meta lenses includes: depositing an optical material over a substrate; spin coating a nano-imprint resist over the optical material; contacting a mold with the nano-imprint resist, in which the mold has a plurality of circular cylindrical recesses and a protruding portion, and the circular cylindrical recesses are spaced apart from each other; after the mold is in contact with the nano-imprint resist, curing the nano-imprint resist to form a nano-imprint resist pattern, in which the nano-imprint resist pattern has a plurality of circular cylindrical thick portions and a thin portion, and the circular cylindrical thick portions respectively correspond to the circular cylindrical recesses of the mold, and the thin portion corresponds to the protruding portion of the mold; removing the thin portion and remaining the circular cylindrical thick portions; and patterning the optical material according to the remaining circular cylindrical thick portions to form a plurality of circular cylindrical meta lenses. A meta lens structure and a multi-lens optical module having the meta lens structure are also provided.

Description

製造超穎透鏡的方法, 超穎透鏡結構及具有超穎透鏡結構之多鏡頭光學模組Method for manufacturing super-slim lens, super-slim lens structure and multi-lens optical module having super-slim lens structure

本案係涉及一種製造超穎透鏡的方法、以該方法所製造形成之超穎透鏡結構,與應用該超穎透鏡結構所組成之多鏡頭光學模組。 This case involves a method for manufacturing a super-slim lens, a super-slim lens structure manufactured by the method, and a multi-lens optical module composed of the super-slim lens structure.

隨著光學鏡頭的薄型化與小型化趨勢,目前已使光學鏡頭大量被應用於各式生活應用領域之中,但另一方面,前述傳統的薄型化與小型化技術也已面臨技術發展的瓶頸與限制,且此缺點造成無法使各式鏡頭被進一步應用於需極度微型化的應用領域,舉例而言,就以已商品化的谷歌眼鏡(Google Glass)做說明,此項知名商品雖已問世許久,但因受限於裝配其中的光學鏡頭體積過於龐大,故迄今為止,谷歌眼鏡(Google Glass)仍無法為大部分的消費者所接受。 With the trend of thinning and miniaturization of optical lenses, optical lenses have been widely used in various life applications. However, the traditional thinning and miniaturization technology mentioned above has also faced the bottleneck and limitation of technology development, and this shortcoming makes it impossible for various lenses to be further applied in application fields that require extreme miniaturization. For example, let's take the commercialized Google Glass as an example. Although this well-known product has been on the market for a long time, it is limited by the large size of the optical lens installed in it. Therefore, Google Glass has not been accepted by most consumers so far.

為解決此一技術難題,一種超穎透鏡(Meta Lens)結構即被因應提出;亦即,超穎透鏡為能夠操縱電磁波(光)的微小光學元件,其 類似於傳統的聚光透鏡,但超穎透鏡比紙張還薄。由於超穎透鏡的體積很小,又具有徹底改變多種光學應用的潛力,因此諸多研發人員正在開發超穎透鏡的量產方法。 In order to solve this technical problem, a meta-lens structure was proposed; that is, a meta-lens is a tiny optical element that can manipulate electromagnetic waves (light). It is similar to a traditional focusing lens, but the meta-lens is thinner than paper. Because the meta-lens is very small and has the potential to completely change a variety of optical applications, many researchers are developing methods for mass production of meta-lenses.

但以習知量產方式而言,目前常使用電子束微影(electron beam lithography)技術製造超穎透鏡,其缺點為製程成本極高(例如,高昂的光罩開發與製造成本),因而並不利於大量生產,且如此高昂的製造成本,仍將會使得超穎透鏡的技術應用範圍受到極度的限制。 However, in terms of mass production, electron beam lithography is currently commonly used to manufacture superlenses. The disadvantage is that the process cost is extremely high (for example, the high cost of mask development and manufacturing), which is not conducive to mass production. Moreover, such high manufacturing costs will still greatly limit the technical application scope of superlenses.

基此,超穎透鏡結構的問世,雖然是針對前述目前各式光學鏡頭在微型化應用領域面臨瓶頸的一種有效解決方案,但如何能取得具有低製造成本且高良率優勢的超穎透鏡結構,以便使其能進行更廣泛的技術發展與應用,即是本案主要關心的技術重點所在。 Therefore, the emergence of the super-smooth lens structure is an effective solution to the bottleneck faced by various types of optical lenses in the field of miniaturization applications. However, how to obtain a super-smooth lens structure with low manufacturing cost and high yield advantage so that it can be more widely developed and applied is the main technical focus of this case.

本案之主要目的,是提供一種製造超穎透鏡的方法,其製程成本較低並且良率很高,而可有效地應用於大量生產超穎透鏡。 The main purpose of this case is to provide a method for manufacturing super-slim lenses, which has a low process cost and a high yield, and can be effectively applied to mass production of super-slim lenses.

本案之另一目的,是提供一種以製造超穎透鏡的方法所形成之超穎透鏡結構。 Another purpose of this case is to provide a super-slim lens structure formed by a method for manufacturing a super-slim lens.

本案之又一目的,是提供一種以超穎透鏡結構為基礎所組成之多鏡頭光學模組。 Another purpose of this case is to provide a multi-lens optical module based on a super-slim lens structure.

本案提供一種製造超穎透鏡的方法,包括:沉積光學材料於基板上方;旋塗奈米壓印阻劑於光學材料上方;使印模接觸奈米壓印阻劑,其中印模具有多個圓柱狀凹部及一凸部,該些圓柱狀凹部彼此間隔;於使 印模接觸奈米壓印阻劑之後,固化奈米壓印阻劑,以形成奈米壓印阻劑圖案,其中奈米壓印阻劑圖案具有多個圓柱狀厚部及一薄部,該些圓柱狀厚部分別對應印模的該些圓柱狀凹部,薄部對應印模的凸部;移除薄部,並留下該些圓柱狀厚部;以及根據留下的該些圓柱狀厚部圖案化光學材料,以形成多個圓柱狀超穎透鏡。 The present invention provides a method for manufacturing a super-slim lens, comprising: depositing an optical material on a substrate; spin-coating a nano-imprint resist on the optical material; contacting a stamp with the nano-imprint resist, wherein the stamp has a plurality of cylindrical concave portions and a convex portion, and the cylindrical concave portions are spaced apart from each other; after contacting the stamp with the nano-imprint resist, curing the nano-imprint resist to form a nano-imprint resist pattern, wherein the nano-imprint resist pattern has a plurality of cylindrical thick portions and a thin portion, the cylindrical thick portions respectively corresponding to the cylindrical concave portions of the stamp, and the thin portion corresponding to the convex portion of the stamp; removing the thin portion and leaving the cylindrical thick portions; and patterning the optical material according to the remaining cylindrical thick portions to form a plurality of cylindrical super-slim lenses.

在本案的一些實施例中,方法更包括:於形成該些圓柱狀超穎透鏡之後,移除該些圓柱狀厚部。 In some embodiments of the present invention, the method further includes: after forming the cylindrical superlenses, removing the cylindrical thick portions.

在本案的一些實施例中,使印模接觸奈米壓印阻劑步驟包括使奈米壓印阻劑填充印模的該些圓柱狀凹部,使奈米壓印阻劑填充印模的該些圓柱狀凹部步驟包括使印模向下移動、加熱奈米壓印阻劑或其組合。 In some embodiments of the present invention, the step of contacting the stamp with the nano-imprint resist includes filling the cylindrical recesses of the stamp with the nano-imprint resist, and the step of filling the cylindrical recesses of the stamp with the nano-imprint resist includes moving the stamp downward, heating the nano-imprint resist, or a combination thereof.

在本案的一些實施例中,固化奈米壓印阻劑步驟包括進行紫外光照射步驟。 In some embodiments of the present invention, the step of curing the nanoimprint resist includes a step of ultraviolet light irradiation.

在本案的一些實施例中,固化奈米壓印阻劑步驟包括進行冷卻步驟,奈米壓印阻劑為熱塑性材料。 In some embodiments of the present case, the step of curing the nanoimprint resist includes a cooling step, and the nanoimprint resist is a thermoplastic material.

在本案的一些實施例中,印模具有抗黏層位於印模的該些圓柱狀凹部及凸部上方,於使印模接觸奈米壓印阻劑步驟中,抗黏層接觸奈米壓印阻劑。 In some embodiments of the present invention, the stamp has an anti-adhesive layer located above the cylindrical concave and convex portions of the stamp, and in the step of contacting the stamp with the nano-imprint resist, the anti-adhesive layer contacts the nano-imprint resist.

在本案的一些實施例中,方法更包括:於沉積光學材料於基板上方之後以及旋塗奈米壓印阻劑於光學材料上方之前,形成含鉻層於光學材料上方。 In some embodiments of the present invention, the method further includes: forming a chromium-containing layer on the optical material after depositing the optical material on the substrate and before spin-coating the nanoimprint resist on the optical material.

在本案的一些實施例中,光學材料包括非晶矽、二氧化鈦或其組合。 In some embodiments of the present invention, the optical material includes amorphous silicon, titanium dioxide or a combination thereof.

在本案的一些實施例中,方法更包括:於沉積光學材料於基板上方之後以及旋塗奈米壓印阻劑於光學材料上方之前,形成背保護層於基板下方,基板介於光學材料與背保護層之間。 In some embodiments of the present invention, the method further includes: after depositing the optical material on the substrate and before spin-coating the nano-imprint resist on the optical material, forming a back protection layer under the substrate, the substrate being between the optical material and the back protection layer.

在本案的一些實施例中,模具由母模具製成。 In some embodiments of the present invention, the mold is made from a master mold.

在本案的一些實施例中,模具為可一次性使用高分子模具。 In some embodiments of the present case, the mold is a disposable polymer mold.

本案另提供一種超穎透鏡結構,包括:一基板;以及彼此間隔的多個圓柱狀超穎透鏡,位於該基板之上方表面;其中,該些圓柱狀超穎透鏡的其中一者的側壁與該些圓柱狀超穎透鏡的該者的底面之間的夾角為85度至88度或92度至95度。 The present invention also provides a super-slim lens structure, comprising: a substrate; and a plurality of cylindrical super-slim lenses spaced apart from each other and located on the upper surface of the substrate; wherein the angle between the side wall of one of the cylindrical super-slim lenses and the bottom surface of the one of the cylindrical super-slim lenses is 85 degrees to 88 degrees or 92 degrees to 95 degrees.

在本案的一些實施例中,該些圓柱狀超穎透鏡的該者的高度與該些圓柱狀超穎透鏡的該者的最大直徑的比值介於1.25與3.5之間。 In some embodiments of the present invention, the ratio of the height of one of the cylindrical superlenses to the maximum diameter of one of the cylindrical superlenses is between 1.25 and 3.5.

在本案的一些實施例中,該些圓柱狀超穎透鏡的該者的高度介於250奈米與350奈米之間,該些圓柱狀超穎透鏡的該者的最大直徑介於100奈米與200奈米之間。 In some embodiments of the present invention, the height of one of the cylindrical superlenses is between 250 nm and 350 nm, and the maximum diameter of one of the cylindrical superlenses is between 100 nm and 200 nm.

在本案的一些實施例中,該些圓柱狀超穎透鏡的相鄰兩者之間的最小間距介於75奈米與125奈米之間。 In some embodiments of the present invention, the minimum distance between two adjacent cylindrical superlenses is between 75 nanometers and 125 nanometers.

在本案的一些實施例中,該基板為一玻璃基板、一石英基板或一藍寶石基板中之任一者。 In some embodiments of the present invention, the substrate is any one of a glass substrate, a quartz substrate or a sapphire substrate.

本案另提供一種具有超穎透鏡結構之多鏡頭光學模組,包括:多個圓柱狀超穎透鏡,形成於一基板之上方表面且彼此呈間隔排列;一光學濾光元件,其上方表面接觸於該基板之下方表面;以及一光學感測元件,鄰近於該光學濾光元件之下方表面;一光學感測元件,鄰近於該光學濾光元件之下方表面;其中,該些圓柱狀超穎透鏡中之部分圓柱狀超穎透鏡位 於一正常工作區域,該些圓柱狀超穎透鏡中之其餘圓柱狀超穎透鏡位於一備份工作區域。 The present invention also provides a multi-lens optical module with a super-slim lens structure, including: a plurality of cylindrical super-slim lenses formed on the upper surface of a substrate and arranged at intervals; an optical filter element, whose upper surface contacts the lower surface of the substrate; and an optical sensing element adjacent to the lower surface of the optical filter element; an optical sensing element adjacent to the lower surface of the optical filter element; wherein some of the cylindrical super-slim lenses are located in a normal working area, and the remaining cylindrical super-slim lenses are located in a backup working area.

在本案的一些實施例中,位於該正常工作區域之該些部分圓柱狀超穎透鏡,搭配該光學濾光元件與光學感測元件,係可至少提供一紅色透鏡光學模組、一藍色透鏡光學模組與兩綠色透鏡光學模組。 In some embodiments of the present case, the partially cylindrical super-lenses located in the normal working area, in combination with the optical filter element and the optical sensing element, can provide at least one red lens optical module, one blue lens optical module and two green lens optical modules.

在本案的一些實施例中,位於該備份工作區域之該些其餘圓柱狀超穎透鏡,搭配該光學濾光元件與光學感測元件,係可至少提供該紅色透鏡光學模組、該藍色透鏡光學模組與該些綠色透鏡光學模組中之任一者於處於一故障狀態時之一替換備份透鏡光學模組。 In some embodiments of the present invention, the remaining cylindrical super-smooth lenses located in the backup working area, in combination with the optical filter element and the optical sensing element, can provide at least one replacement backup lens optical module for the red lens optical module, the blue lens optical module, and the green lens optical modules when any one of the modules is in a fault state.

在本案的一些實施例中,位於該備份工作區域之該些其餘圓柱狀超穎透鏡,搭配該光學濾光元件與光學感測元件,係可至少提供一具有額外功能之透鏡光學模組;其中,該具有額外功能至少包括一人工智能(AI)功能、一擴增實境(AR)功能、一虛擬實境(VR)及/或一混合實境(MR)功能。 In some embodiments of the present invention, the remaining cylindrical super-slim lenses located in the backup working area, in combination with the optical filter element and the optical sensing element, can provide at least one lens optical module with additional functions; wherein the additional functions include at least an artificial intelligence (AI) function, an augmented reality (AR) function, a virtual reality (VR) and/or a mixed reality (MR) function.

110:基板 110: Substrate

115:背保護層 115: Back protective layer

120:光學材料 120:Optical materials

122、1221:圓柱狀超穎透鏡 122, 1221: Cylindrical ultra-slim lens

122s:圓柱狀超穎透鏡之側壁 122s: Side wall of cylindrical superfine lens

122b:圓柱狀超穎透鏡之底面130:奈米壓印阻劑 122b: Bottom of cylindrical super lens 130: Nano-imprinting resist

132:奈米壓印阻劑圖案 132:Nano-imprint resist pattern

132t:圓柱狀厚部 132t: cylindrical thick part

132w:薄部 132w: thin part

140:印模 140: Impression

140c:凸部 140c: convex part

140r:圓柱狀凹部 140r: cylindrical recess

141:抗黏層 141: Anti-stick layer

a:圓柱狀超穎透鏡之側壁與底面之間的夾角 a: Angle between the side wall and bottom surface of the cylindrical ultra-fine lens

D1、D2:最小間距 D1, D2: minimum spacing

H1、H2:高度 H1, H2: height

W1、W2:最大直徑 W1, W2: Maximum diameter

20、30:多鏡頭光學模組 20, 30: Multi-lens optical module

21、31:光學濾光元件 21, 31: Optical filter element

22、32:光學感測元件 22, 32: Optical sensing element

R:紅色透鏡光學模組 R: Red lens optical module

B:藍色透鏡光學模組 B: Blue lens optical module

G:綠色透鏡光學模組 G: Green lens optical module

BK:替換備份透鏡光學模組BK BK: Replacement backup lens optical module BK

圖1A、1B、1C、1D、1E及1F為依據本案一些實施例的一種使用奈米壓印製程製造超穎透鏡的方法的各個步驟的立體示意圖。 Figures 1A, 1B, 1C, 1D, 1E and 1F are three-dimensional schematic diagrams of the various steps of a method for manufacturing a super-lens using a nano-imprinting process according to some embodiments of the present invention.

圖2A、2B、2C及2D為依據本案一些實施例的一種奈米壓印微影製程的各個步驟的剖面示意圖。 Figures 2A, 2B, 2C and 2D are cross-sectional schematic diagrams of various steps of a nanoimprint lithography process according to some embodiments of the present invention.

圖3A、3B、3C及3D為依據本案一些實施例的一種奈米壓印微影製程的各個步驟的剖面示意圖。 Figures 3A, 3B, 3C and 3D are cross-sectional schematic diagrams of various steps of a nanoimprint lithography process according to some embodiments of the present invention.

圖4為依據本案一些實施例的一種超穎透鏡結構的局部剖面示意圖。 Figure 4 is a partial cross-sectional schematic diagram of a super-lens structure according to some embodiments of the present invention.

圖5為依據本案一些實施例的一種超穎透鏡結構的局部剖面示意圖。 Figure 5 is a partial cross-sectional schematic diagram of a super-lens structure according to some embodiments of the present invention.

圖6為自前述圖1F所示之超穎透鏡結構中標示由一組圓柱狀超穎透鏡所形成之超穎透鏡結構之概念示意圖。 FIG6 is a conceptual diagram showing a super-lens structure formed by a set of cylindrical super-lenses from the super-lens structure shown in FIG1F above.

圖7為本案之一多鏡頭光學模組的剖面示意圖。 Figure 7 is a cross-sectional schematic diagram of a multi-lens optical module in this case.

圖8為本案之另一多鏡頭光學模組的剖面示意圖。 Figure 8 is a cross-sectional schematic diagram of another multi-lens optical module in this case.

為了使本揭示內容的敘述更加詳盡與完備,下文針對本揭示內容的實施態樣與具體實施例提出了說明性的描述;但這並非實施或運用本揭示內容具體實施例的唯一形式。以下所揭露的各實施例,在有益的情形下可相互組合或取代,也可在一實施例中附加其他的實施例,而無須進一步的記載或說明。 In order to make the description of the disclosed content more detailed and complete, the following provides an illustrative description of the implementation and specific embodiments of the disclosed content; however, this is not the only form of implementing or using the specific embodiments of the disclosed content. The embodiments disclosed below can be combined or replaced with each other under beneficial circumstances, and other embodiments can be added to one embodiment without further recording or description.

本文中的空間相對用語,例如「下」、「上」,這是為了便於敘述圖式中一元件或特徵與另一元件或特徵之間的相對關係。這些空間相對用語的真實意義包含其他方位。例如,當圖式上下翻轉180度時,一元件與另一元件之間的關係,可能從「下」變成「上」。本文中所使用的空間相對敘述也應作同樣的解釋。 The spatially relative terms in this article, such as "lower" and "upper", are used to facilitate the description of the relative relationship between one element or feature and another element or feature in the diagram. The true meaning of these spatially relative terms includes other orientations. For example, when the diagram is flipped 180 degrees up and down, the relationship between one element and another element may change from "lower" to "upper". The spatially relative descriptions used in this article should also be interpreted in the same way.

請參閱圖1A、1B、1C、1D、1E及1F,其為依據本案一些實施例的一種使用奈米壓印製程製造超穎透鏡的方法的各個步驟的立體示意圖。如圖1A所示,配置(例如沉積)光學材料120於基板110上方。在一些實施例中,光學材料120包括非晶矽、二氧化鈦或其組合,其反射指數(reflective index)大於3.4,吸收(absorption)小於10-3。在一些實施例中,基板110為玻璃基板、石英(quartz)基板或藍寶石(sapphire)基板。在一些實施例中,使用感應耦合式電漿化學氣相沉積(inductively coupled plasma chemical vapor deposition,ICP-CVD)製程沉積光學材料120於基板110上方。 Please refer to Figures 1A, 1B, 1C, 1D, 1E and 1F, which are three-dimensional schematic diagrams of various steps of a method for manufacturing a super lens using a nanoimprint process according to some embodiments of the present invention. As shown in Figure 1A, an optical material 120 is configured (for example, deposited) above a substrate 110. In some embodiments, the optical material 120 includes amorphous silicon, titanium dioxide or a combination thereof, and its reflective index is greater than 3.4 and its absorption is less than 10-3 . In some embodiments, the substrate 110 is a glass substrate, a quartz substrate or a sapphire substrate. In some embodiments, the optical material 120 is deposited on the substrate 110 using an inductively coupled plasma chemical vapor deposition (ICP-CVD) process.

如圖1A及圖1B所示,配置(例如旋塗)奈米壓印阻劑130於光學材料120上方。在一些實施例中,使用旋轉塗佈製程塗佈奈米壓印阻劑130於光學材料120上方。在一些實施例中,於沉積光學材料120於基板110上方之後以及旋塗奈米壓印阻劑130於光學材料120上方之前,形成背保護層115於基板110下方,基板110介於光學材料120與背保護層115之間。 As shown in FIG. 1A and FIG. 1B , a nanoimprint resist 130 is disposed (e.g., spin-coated) on top of the optical material 120. In some embodiments, the nanoimprint resist 130 is coated on top of the optical material 120 using a spin coating process. In some embodiments, after depositing the optical material 120 on the substrate 110 and before spin-coating the nanoimprint resist 130 on the optical material 120, a back protection layer 115 is formed below the substrate 110, and the substrate 110 is between the optical material 120 and the back protection layer 115.

在一些實施例中,於沉積光學材料120於基板上方之後以及旋塗奈米壓印阻劑130於光學材料上方之前,形成含鉻層(圖未示)於光學材料120上方。含鉻層可用以保護後續形成的圓柱狀超穎透鏡(例如第1E圖的圓柱狀超穎透鏡122)。 In some embodiments, after depositing the optical material 120 on the substrate and before spin-coating the nanoimprint resist 130 on the optical material, a chromium-containing layer (not shown) is formed on the optical material 120. The chromium-containing layer can be used to protect the cylindrical superlens (e.g., the cylindrical superlens 122 in FIG. 1E ) formed subsequently.

如圖1B及圖1C所示,使用一種屬於模具之印模140接觸奈米壓印阻劑130,其中印模140具有多個圓柱狀凹部及一凸部,該些圓柱狀凹部彼此間隔(圖未示)。在一些實施例中,印模140由母模具(未示出)製成。例如,母模具由矽製成,因此也稱為矽模具。在一些實施例中,印模 140為一次性使用高分子模具。在一些實施例中,高分子材料(未示出)沉積在母模具上,然後進行冷卻和脫模以獲得印模140。 As shown in FIG. 1B and FIG. 1C , a stamp 140 belonging to a mold is used to contact the nanoimprint resist 130, wherein the stamp 140 has a plurality of cylindrical recesses and a convex portion, and the cylindrical recesses are spaced apart from each other (not shown). In some embodiments, the stamp 140 is made of a mother mold (not shown). For example, the mother mold is made of silicon, so it is also called a silicon mold. In some embodiments, the stamp 140 is a disposable polymer mold. In some embodiments, a polymer material (not shown) is deposited on the mother mold, and then cooled and demolded to obtain the stamp 140.

如圖1C及圖1D所示,對奈米壓印阻劑130進行一系列的奈米壓印微影(nano-imprint lithography)製程步驟,以形成多個圓柱狀厚部132t,該些圓柱狀厚部132t作為後續圖案化(例如蝕刻)光學材料120的遮罩。以下將詳述奈米壓印微影製程步驟的各種實施例。 As shown in FIG. 1C and FIG. 1D , a series of nano-imprint lithography process steps are performed on the nano-imprint resist 130 to form a plurality of cylindrical thick portions 132t, which serve as masks for subsequent patterning (e.g., etching) of the optical material 120. Various embodiments of the nano-imprint lithography process steps will be described in detail below.

圖2A、2B、2C及2D為依據本案一些實施例的一種奈米壓印微影製程的各個步驟的剖面示意圖。圖2A為圖1C的局部剖面示意圖。圖2D為圖1D的局部剖面示意圖。 Figures 2A, 2B, 2C and 2D are cross-sectional schematic diagrams of various steps of a nanoimprint lithography process according to some embodiments of the present invention. Figure 2A is a partial cross-sectional schematic diagram of Figure 1C. Figure 2D is a partial cross-sectional schematic diagram of Figure 1D.

參考圖1C及圖2A,印模140具有多個圓柱狀凹部140r及一凸部140c,該些圓柱狀凹部140r彼此間隔。在一些實施例中,使印模140接觸奈米壓印阻劑130步驟包括使奈米壓印阻劑130填充印模140的該些圓柱狀凹部140r,使奈米壓印阻劑130填充印模140的該些圓柱狀凹部140r步驟包括使印模140向下移動、加熱奈米壓印阻劑130或其組合。在一些實施例中,如圖2A所示,加熱奈米壓印阻劑130以使其變為流動態,並且使印模140向下移動,以讓流動態的奈米壓印阻劑130填充印模140的該些圓柱狀凹部140r。在一些實施例中,印模140具有抗黏層141,其位於印模140的該些圓柱狀凹部140r及凸部140c上方,因此於使印模140接觸奈米壓印阻劑130步驟中,抗黏層141直接接觸奈米壓印阻劑130。 1C and 2A , the stamp 140 has a plurality of cylindrical recesses 140r and a convex portion 140c, and the cylindrical recesses 140r are spaced apart from each other. In some embodiments, the step of contacting the stamp 140 with the nanoimprint resist 130 includes filling the cylindrical recesses 140r of the stamp 140 with the nanoimprint resist 130, and the step of filling the cylindrical recesses 140r of the stamp 140 with the nanoimprint resist 130 includes moving the stamp 140 downward, heating the nanoimprint resist 130, or a combination thereof. In some embodiments, as shown in FIG. 2A , the nanoimprint resist 130 is heated to become fluid, and the stamp 140 is moved downward to allow the fluid nanoimprint resist 130 to fill the cylindrical recesses 140r of the stamp 140. In some embodiments, the stamp 140 has an anti-adhesive layer 141 located above the cylindrical recesses 140r and the protrusions 140c of the stamp 140, so that in the step of contacting the stamp 140 with the nanoimprint resist 130, the anti-adhesive layer 141 directly contacts the nanoimprint resist 130.

如圖2A及圖2B所示,使印模140接觸奈米壓印阻劑130,並且奈米壓印阻劑130填充印模140的該些圓柱狀凹部140r之後,固化奈米壓印阻劑130,以形成奈米壓印阻劑圖案132。如圖2B所示,奈米壓印阻劑圖案132具有多個圓柱狀厚部132t及一薄部132w,該些圓柱狀厚部132t分別 對應印模140的該些圓柱狀凹部140r,薄部132w對應印模140的凸部140c。在一些實施例中,固化奈米壓印阻劑130步驟包括進行冷卻步驟,奈米壓印阻劑130為熱塑性材料。 As shown in FIG. 2A and FIG. 2B , the stamp 140 is brought into contact with the nano-imprint resist 130, and after the nano-imprint resist 130 fills the cylindrical recesses 140r of the stamp 140, the nano-imprint resist 130 is cured to form a nano-imprint resist pattern 132. As shown in FIG. 2B , the nano-imprint resist pattern 132 has a plurality of cylindrical thick portions 132t and a thin portion 132w, wherein the cylindrical thick portions 132t correspond to the cylindrical recesses 140r of the stamp 140, and the thin portion 132w corresponds to the convex portion 140c of the stamp 140. In some embodiments, the step of curing the nanoimprint resist 130 includes a cooling step, and the nanoimprint resist 130 is a thermoplastic material.

如圖2B及圖2C所示,使印模140向上移動,以與奈米壓印阻劑圖案132分離。在一些實施例中,由於印模140具有抗黏層141,因此在印模140向上移動的過程中,印模140可輕易地與奈米壓印阻劑圖案132分離,因此奈米壓印阻劑圖案132的結構不會被破壞。 As shown in FIG. 2B and FIG. 2C , the stamp 140 is moved upward to be separated from the nano-imprint resist pattern 132. In some embodiments, since the stamp 140 has an anti-adhesive layer 141, the stamp 140 can be easily separated from the nano-imprint resist pattern 132 during the upward movement of the stamp 140, so that the structure of the nano-imprint resist pattern 132 will not be destroyed.

如圖2C及圖2D所示,移除奈米壓印阻劑圖案132的薄部132w,並留下該些圓柱狀厚部132t,該些圓柱狀厚部132t作為後續圖案化光學材料120的遮罩。在一些實施例中,使用電漿清除製程移除奈米壓印阻劑圖案132的薄部132w。 As shown in FIG. 2C and FIG. 2D , the thin portion 132w of the nanoimprint resist pattern 132 is removed, and the cylindrical thick portions 132t are left, and the cylindrical thick portions 132t serve as masks for the subsequent patterning of the optical material 120. In some embodiments, a plasma cleaning process is used to remove the thin portion 132w of the nanoimprint resist pattern 132.

圖3A、3B、3C及3D為依據本案一些實施例的一種奈米壓印微影製程的各個步驟的剖面示意圖。圖3A為圖1C的局部剖面示意圖。圖3D為圖1D的局部剖面示意圖。 Figures 3A, 3B, 3C and 3D are cross-sectional schematic diagrams of various steps of a nanoimprint lithography process according to some embodiments of the present invention. Figure 3A is a partial cross-sectional schematic diagram of Figure 1C. Figure 3D is a partial cross-sectional schematic diagram of Figure 1D.

參考圖1C及圖3A,印模140具有多個圓柱狀凹部140r及一凸部140c,該些圓柱狀凹部140r彼此間隔。在一些實施例中,如圖3A所示,使印模140向下移動,以讓液態的奈米壓印阻劑130填充印模140的該些圓柱狀凹部140r。在一些實施例中,印模140具有抗黏層141,其位於印模140的該些圓柱狀凹部140r及凸部140c上方,因此於使印模140接觸奈米壓印阻劑130步驟中,抗黏層141接觸奈米壓印阻劑130。 Referring to FIG. 1C and FIG. 3A , the stamp 140 has a plurality of cylindrical recesses 140r and a convex portion 140c, and the cylindrical recesses 140r are spaced apart from each other. In some embodiments, as shown in FIG. 3A , the stamp 140 is moved downward to allow the liquid nanoimprint resist 130 to fill the cylindrical recesses 140r of the stamp 140. In some embodiments, the stamp 140 has an anti-adhesive layer 141 located above the cylindrical recesses 140r and the convex portion 140c of the stamp 140, so that in the step of contacting the stamp 140 with the nanoimprint resist 130, the anti-adhesive layer 141 contacts the nanoimprint resist 130.

如圖3A及圖3B所示,使印模140接觸奈米壓印阻劑130,並且奈米壓印阻劑130填充印模140的該些圓柱狀凹部140r之後,固化奈米壓印阻劑130,以形成奈米壓印阻劑圖案132。如圖3B所示,奈米壓印阻劑圖 案132具有多個圓柱狀厚部132t及一薄部132w,該些圓柱狀厚部132t分別對應印模140的該些圓柱狀凹部140r,薄部132w對應印模140的凸部140c。在一些實施例中,固化奈米壓印阻劑步驟包括進行紫外光照射步驟,奈米壓印阻劑(或可稱為光阻)130為紫外光固化樹脂材料,印模140為透明印模。 As shown in FIG. 3A and FIG. 3B , the stamp 140 is brought into contact with the nano-imprint resist 130, and after the nano-imprint resist 130 fills the cylindrical recesses 140r of the stamp 140, the nano-imprint resist 130 is cured to form a nano-imprint resist pattern 132. As shown in FIG. 3B , the nano-imprint resist pattern 132 has a plurality of cylindrical thick portions 132t and a thin portion 132w, wherein the cylindrical thick portions 132t correspond to the cylindrical recesses 140r of the stamp 140, and the thin portion 132w corresponds to the convex portion 140c of the stamp 140. In some embodiments, the step of curing the nano-imprint resist includes a step of ultraviolet light irradiation, the nano-imprint resist (or photoresist) 130 is an ultraviolet light curing resin material, and the stamp 140 is a transparent stamp.

如圖3B及圖3C所示,使印模140向上移動,以與奈米壓印阻劑圖案132分離。在一些實施例中,由於印模140具有抗黏層141,因此在印模140向上移動的過程中,印模140可輕易地與奈米壓印阻劑圖案132分離,因此奈米壓印阻劑圖案132的結構不會被破壞。 As shown in FIG. 3B and FIG. 3C , the stamp 140 is moved upward to be separated from the nano-imprint resist pattern 132. In some embodiments, since the stamp 140 has an anti-adhesive layer 141, the stamp 140 can be easily separated from the nano-imprint resist pattern 132 during the upward movement of the stamp 140, so that the structure of the nano-imprint resist pattern 132 will not be destroyed.

如圖3C及圖3D所示,移除奈米壓印阻劑圖案132的薄部132w,並留下該些圓柱狀厚部132t,該些圓柱狀厚部132t作為後續圖案化光學材料120的遮罩。在一些實施例中,使用電漿清除製程移除奈米壓印阻劑圖案132的薄部132w。 As shown in FIG. 3C and FIG. 3D , the thin portion 132w of the nanoimprint resist pattern 132 is removed, and the cylindrical thick portions 132t are left, and the cylindrical thick portions 132t serve as masks for the subsequent patterning of the optical material 120. In some embodiments, a plasma cleaning process is used to remove the thin portion 132w of the nanoimprint resist pattern 132.

如圖1D及圖1E所示,根據留下的該些圓柱狀厚部132t圖案化光學材料120,以形成多個圓柱狀超穎透鏡122。在一些實施例中,使用蝕刻製程圖案化光學材料120,蝕刻製程例如為感應耦合式電漿反應離子蝕刻(inductively coupled plasma reactive ion etching,ICP-RIE)製程。 As shown in FIG. 1D and FIG. 1E , the optical material 120 is patterned according to the remaining cylindrical thick portions 132t to form a plurality of cylindrical superlenses 122. In some embodiments, the optical material 120 is patterned using an etching process, and the etching process is, for example, an inductively coupled plasma reactive ion etching (ICP-RIE) process.

如圖1E及圖1F所示,於形成該些圓柱狀超穎透鏡122之後,移除該些圓柱狀厚部132t,以使該些圓柱狀超穎透鏡122的頂表面露出。在一些實施例中,於移除該些圓柱狀厚部132t之後,移除背保護層115。在一些實施例中,移除背保護層115之後,貼附膠帶(圖未示)於基板110下方,然後進行切割,最後再移除膠帶。在切割之後,可對圓柱狀超穎透鏡122進 行功能檢測(testing for function)及缺陷光學檢查(optical inspection for defects)。 As shown in FIG. 1E and FIG. 1F, after the cylindrical super-smooth lenses 122 are formed, the cylindrical thick portions 132t are removed to expose the top surfaces of the cylindrical super-smooth lenses 122. In some embodiments, after the cylindrical thick portions 132t are removed, the back protection layer 115 is removed. In some embodiments, after the back protection layer 115 is removed, a tape (not shown) is attached under the substrate 110, and then cut, and finally the tape is removed. After cutting, the cylindrical super-smooth lenses 122 can be tested for function and optical inspection for defects.

值得注意的是,本案之製造多個圓柱狀超穎透鏡122的方法容易實施,並且製程良率很高。假使製造多個長條狀光柵,在實際上難以製造出一致且均勻的長條狀光柵。 It is worth noting that the method of manufacturing multiple cylindrical super lenses 122 in this case is easy to implement and has a high process yield. If multiple long strip gratings are manufactured, it is actually difficult to manufacture consistent and uniform long strip gratings.

本案又提供一種超穎透鏡結構,包括一基板110,與彼此間隔且位於基板110之上方表面的多個圓柱狀超穎透鏡122,並如圖1F所示。圖4為依據本案一些實施例的一種超穎透鏡結構的局部剖面示意圖。如圖4所示,該些圓柱狀超穎透鏡122的其中一者的側壁122s與該些圓柱狀超穎透鏡122的該者的底面122b之間的夾角a為85度至88度,例如為86度、87度或者為任兩數值之間的任何數值。在一些實施例中,夾角a大於或等於85度並且小於88度。 The present invention further provides a super-flexible lens structure, including a substrate 110, and a plurality of cylindrical super-flexible lenses 122 spaced apart from each other and located on the upper surface of the substrate 110, as shown in FIG1F. FIG4 is a partial cross-sectional schematic diagram of a super-flexible lens structure according to some embodiments of the present invention. As shown in FIG4, the angle a between the side wall 122s of one of the cylindrical super-flexible lenses 122 and the bottom surface 122b of the one of the cylindrical super-flexible lenses 122 is 85 degrees to 88 degrees, for example, 86 degrees, 87 degrees, or any value between any two values. In some embodiments, the angle a is greater than or equal to 85 degrees and less than 88 degrees.

在一些實施例中,圓柱狀超穎透鏡122的高度H1與最大直徑W1的比值介於1.25與3.5之間,例如為1.5、2.0、2.5、3.0或者為任兩數值之間的任何數值。 In some embodiments, the ratio of the height H1 to the maximum diameter W1 of the cylindrical superlens 122 is between 1.25 and 3.5, such as 1.5, 2.0, 2.5, 3.0, or any value between any two values.

在一些實施例中,圓柱狀超穎透鏡122的高度H1介於250奈米與350奈米之間,例如為260奈米、270奈米、280奈米、290奈米、300奈米、310奈米、320奈米、330奈米、340奈米或者為任兩數值之間的任何數值。 In some embodiments, the height H1 of the cylindrical superlens 122 is between 250 nm and 350 nm, such as 260 nm, 270 nm, 280 nm, 290 nm, 300 nm, 310 nm, 320 nm, 330 nm, 340 nm, or any value between any two values.

在一些實施例中,圓柱狀超穎透鏡122的最大直徑W1介於100奈米與200奈米之間,例如為110奈米、120奈米、130奈米、140奈米、150奈米、160奈米、170奈米、180奈米、190奈米或者為任兩數值之間的任何數值。 In some embodiments, the maximum diameter W1 of the cylindrical superlens 122 is between 100 nm and 200 nm, such as 110 nm, 120 nm, 130 nm, 140 nm, 150 nm, 160 nm, 170 nm, 180 nm, 190 nm, or any value between any two values.

在一些實施例中,該些圓柱狀超穎透鏡122的相鄰兩者之間的最小間距D1介於75奈米與125奈米之間,例如為80奈米、85奈米、90奈米、95奈米、100奈米、105奈米、110奈米、115奈米、120奈米或者為任兩數值之間的任何數值。 In some embodiments, the minimum distance D1 between two adjacent cylindrical superlenses 122 is between 75 nm and 125 nm, such as 80 nm, 85 nm, 90 nm, 95 nm, 100 nm, 105 nm, 110 nm, 115 nm, 120 nm, or any value between any two values.

圖5為依據本案一些實施例的一種超穎透鏡結構的局部剖面示意圖。如圖5所示,該些圓柱狀超穎透鏡122的其中一者的側壁122s與該些圓柱狀超穎透鏡122的該者的底面122b之間的夾角a為92度至95度,例如為93度、94度或者為任兩數值之間的任何數值。在一些實施例中,夾角a大於92度並且小於或等於95度。 FIG5 is a partial cross-sectional schematic diagram of a super-smooth lens structure according to some embodiments of the present invention. As shown in FIG5, the angle a between the side wall 122s of one of the cylindrical super-smooth lenses 122 and the bottom surface 122b of the one of the cylindrical super-smooth lenses 122 is 92 degrees to 95 degrees, for example, 93 degrees, 94 degrees, or any value between any two values. In some embodiments, the angle a is greater than 92 degrees and less than or equal to 95 degrees.

在一些實施例中,圓柱狀超穎透鏡122的高度H2與最大直徑W2的比值介於1.25與3.5之間,例如為1.5、2.0、2.5、3.0或者為任兩數值之間的任何數值。 In some embodiments, the ratio of the height H2 of the cylindrical super-lens 122 to the maximum diameter W2 is between 1.25 and 3.5, such as 1.5, 2.0, 2.5, 3.0, or any value between any two values.

在一些實施例中,圓柱狀超穎透鏡122的高度H2介於250奈米與350奈米之間,例如為260奈米、270奈米、280奈米、290奈米、300奈米、310奈米、320奈米、330奈米、340奈米或者為任兩數值之間的任何數值。 In some embodiments, the height H2 of the cylindrical superlens 122 is between 250 nm and 350 nm, such as 260 nm, 270 nm, 280 nm, 290 nm, 300 nm, 310 nm, 320 nm, 330 nm, 340 nm, or any value between any two values.

在一些實施例中,圓柱狀超穎透鏡122的最大直徑W2介於100奈米與200奈米之間,例如為110奈米、120奈米、130奈米、140奈米、150奈米、160奈米、170奈米、180奈米、190奈米或者為任兩數值之間的任何數值。 In some embodiments, the maximum diameter W2 of the cylindrical superlens 122 is between 100 nm and 200 nm, such as 110 nm, 120 nm, 130 nm, 140 nm, 150 nm, 160 nm, 170 nm, 180 nm, 190 nm, or any value between any two values.

在一些實施例中,該些圓柱狀超穎透鏡122的相鄰兩者之間的最小間距D2介於75奈米與125奈米之間,例如為80奈米、85奈米、90奈 米、95奈米、100奈米、105奈米、110奈米、115奈米、120奈米或者為任兩數值之間的任何數值。 In some embodiments, the minimum distance D2 between two adjacent cylindrical superlenses 122 is between 75 nm and 125 nm, such as 80 nm, 85 nm, 90 nm, 95 nm, 100 nm, 105 nm, 110 nm, 115 nm, 120 nm, or any value between any two values.

接下來,進一步說明本案運用前述超穎透鏡結構為基礎,組成一種多鏡頭光學模組的具體實施作法;首先,請參閱圖6,其為前述圖1F所示之超穎透鏡結構,包括一基板110,與彼此間隔且位於基板110之上方表面的多個圓柱狀超穎透鏡122;於其中,本案可視後續多鏡頭光學模組所需尺寸大小等等不同的應用需求,以決定需要採用圖1F所示之超穎透鏡結構中之超穎透鏡122的數量,藉以形成體積較小之超穎透鏡結構。 Next, the specific implementation method of using the aforementioned super-lens structure as the basis to form a multi-lens optical module is further described. First, please refer to FIG. 6, which is the super-lens structure shown in FIG. 1F, including a substrate 110 and a plurality of cylindrical super-lenses 122 spaced from each other and located on the upper surface of the substrate 110. In this case, the number of super-lenses 122 in the super-lens structure shown in FIG. 1F can be determined according to different application requirements such as the size required for the subsequent multi-lens optical module, so as to form a smaller super-lens structure.

以下,將以圖6中標示1221此一組共8個圓柱狀超穎透鏡122所形成之超穎透鏡結構為例進行後續的應用說明,且本案不以此為限。 Below, the subsequent application description will be carried out using the super-lens structure formed by a group of 8 cylindrical super-lenses 122 marked 1221 in Figure 6 as an example, and this case is not limited to this.

申言之,請再參閱圖7,其為一多鏡頭光學模組20的剖面示意圖;於其中,包括前述該組共8個圓柱狀超穎透鏡1221以及位於該些圓柱狀超穎透鏡1221下方之基板110,且一光學濾光元件21,其上方表面接觸於於基板110之下方表面;以及一光學感測元件22,鄰近於光學濾光元件21之下方表面。 In other words, please refer to Figure 7 again, which is a cross-sectional schematic diagram of a multi-lens optical module 20; it includes the aforementioned set of 8 cylindrical super-smooth lenses 1221 and a substrate 110 located below the cylindrical super-smooth lenses 1221, an optical filter element 21, whose upper surface contacts the lower surface of the substrate 110; and an optical sensing element 22, adjacent to the lower surface of the optical filter element 21.

其中,由於該些圓柱狀超穎透鏡1221彼此間的間隔距離相當小(奈米等級),故與此些圓柱狀超穎透鏡1221相對應的光學濾光元件21及光學感測元件22的面積即可維持正常尺寸(甚或再縮小),便足以涵蓋此些多個圓柱狀超穎透鏡1221;另一方面,搭配低解析度的低成本光學感測元件22,也可輕易地實現組合成一高解析度的感測影像資料。 Among them, since the spacing distance between the cylindrical super-flexible lenses 1221 is very small (nanometer level), the area of the optical filter element 21 and the optical sensing element 22 corresponding to these cylindrical super-flexible lenses 1221 can maintain a normal size (or even be reduced), which is enough to cover these multiple cylindrical super-flexible lenses 1221; on the other hand, with the low-resolution low-cost optical sensing element 22, it can also be easily combined into a high-resolution sensing image data.

舉例來說,光學感測元件22可採用1百萬位元組(1MB)像素解析度的低成本實施元件,透過前述該組共8個圓柱狀超穎透鏡1221,即可 得到8個1MB像素解析度的感測影像資料,之後,再透過軟體予以合併,即可輕易得到高品質的8百萬位元組(8MB)像素解析度之感測影像資料。 For example, the optical sensing element 22 can use a low-cost implementation element with a pixel resolution of 1 megabyte (1MB). Through the aforementioned set of 8 cylindrical super-slim lenses 1221, 8 sensing image data with a pixel resolution of 1MB can be obtained. After that, by merging them through software, high-quality sensing image data with a pixel resolution of 8 megabytes (8MB) can be easily obtained.

本案上述多鏡頭的實施概念如要改以目前體積相當大的傳統習知光學鏡頭來據以實施的話,除需使光學濾光元件與感測元件的體積也要相對應地大幅度擴大以涵蓋多個鏡頭之外,此等習知多鏡頭光學模組的龐大體積也不利於整合於各式產品中,因此可知,運用以本案方法所製造之超穎透鏡結構而組裝形成的前述多鏡頭光學模組20,將可輕易地實現習知技術所不容易做到之技術運用。 If the implementation concept of the multi-lens in this case is to be implemented by conventional optical lenses of considerable size, the size of the optical filter element and the sensing element must be greatly enlarged accordingly to cover multiple lenses. In addition, the large size of such conventional multi-lens optical modules is not conducive to integration into various products. Therefore, it can be seen that the aforementioned multi-lens optical module 20 assembled by using the super lens structure manufactured by the method of this case can easily realize the technical application that is not easy to achieve with conventional technology.

再則,本案的另一嶄新技術應用,即是可以將該些圓柱狀超穎透鏡1221中之部分圓柱狀超穎透鏡設定位於一正常工作區域,且將該些圓柱狀超穎透鏡1221中之其餘圓柱狀超穎透鏡設定位於一備份工作區域,如此一來,當位於正常工作區域中之任一超穎透鏡(並包含位於其下方之光學濾光元件與光學感測元件)處於一故障狀態時,位於備份工作區域中任一超穎透鏡(並包含位於其下方之光學濾光元件與光學感測元件)即可作為一替換備份透鏡光學模組之用。 Furthermore, another novel technical application of the present invention is that part of the cylindrical super-smooth lenses 1221 can be positioned in a normal working area, and the rest of the cylindrical super-smooth lenses 1221 can be positioned in a backup working area. In this way, when any super-smooth lens in the normal working area (including the optical filter element and the optical sensor element located below it) is in a fault state, any super-smooth lens in the backup working area (including the optical filter element and the optical sensor element located below it) can be used as a replacement backup lens optical module.

舉例而言,請參閱圖8,其為一多鏡頭光學模組30的剖面示意圖;於其中,包括前述該組共8個圓柱狀超穎透鏡1221以及位於該些圓柱狀超穎透鏡1221下方之基板110,且一光學濾光元件31,其上方表面接觸於於基板110之下方表面;以及一光學感測元件32,鄰近於光學濾光元件31之下方表面。 For example, please refer to FIG. 8 , which is a cross-sectional schematic diagram of a multi-lens optical module 30 , which includes the aforementioned set of 8 cylindrical super-smooth lenses 1221 and a substrate 110 located below the cylindrical super-smooth lenses 1221 , an optical filter element 31 , whose upper surface contacts the lower surface of the substrate 110 ; and an optical sensing element 32 , which is adjacent to the lower surface of the optical filter element 31 .

於圖7所示之技術運用不同處在於,於圖8中,位於正常工作區域之該些部分圓柱狀超穎透鏡,搭配光學濾光元件31與光學感測元件32,係可至少提供一紅色透鏡光學模組R、一藍色透鏡光學模組B與兩綠色 透鏡光學模組G;另一方面,位於備份工作區域之該些其餘圓柱狀超穎透鏡,搭配光學濾光元件31與光學感測元件32,係可至少提供紅色透鏡光學模組R、藍色透鏡光學模組B與該些綠色透鏡光學模組G中之任一者,於處於一故障狀態時之一替換備份透鏡光學模組BK;基此,相較於受制習知光學鏡頭之大體積的限制,導致目前市面上並無法找到具有配置當作備用或替換使用之多鏡頭光學模組之產品的重大缺失,透過本案所揭露之多鏡頭光學模組30,則將可輕易地實現自動替換光學模組的技術概念,且可增加技術運用的彈性,與提升結合有多鏡頭光學模組30之各式產品的使用可靠度。 The difference between the technical application shown in FIG. 7 is that in FIG. 8, the partial cylindrical super-smooth lenses located in the normal working area, in combination with the optical filter element 31 and the optical sensor element 32, can provide at least one red lens optical module R, one blue lens optical module B and two green lens optical modules G; on the other hand, the remaining cylindrical super-smooth lenses located in the backup working area, in combination with the optical filter element 31 and the optical sensor element 32, can provide at least one red lens optical module R, one blue lens optical module B and two green lens optical modules G. Any one of the lens optical modules G can be replaced with a backup lens optical module BK when it is in a fault state; based on this, compared with the limitation of the large size of conventional optical lenses, which leads to the major defect that there is no product with a multi-lens optical module configured as a backup or replacement on the market, the multi-lens optical module 30 disclosed in this case can easily realize the technical concept of automatic replacement of optical modules, increase the flexibility of technical application, and improve the reliability of various products combined with the multi-lens optical module 30.

當然,有關圖8之另一技術運用實例,則是可將位於備份工作區域之該些替換備份透鏡光學模組BK,當作可至少提供一具有額外功能之透鏡光學模組來使用,其中,前述具有額外功能至少包括一人工智能(AI)功能、一擴增實境(AR)功能、一虛擬實境(VR)及/或一混合實境(MR)功能,如此一來,顯更可進一步擴大本案所揭露之具有超穎透鏡結構之多鏡頭光學模組30的技術應用範圍。 Of course, another technical application example of FIG. 8 is that the replacement backup lens optical modules BK located in the backup working area can be used as a lens optical module that can provide at least one additional function, wherein the aforementioned additional function at least includes an artificial intelligence (AI) function, an augmented reality (AR) function, a virtual reality (VR) and/or a mixed reality (MR) function. In this way, the technical application scope of the multi-lens optical module 30 with a super-slim lens structure disclosed in this case can be further expanded.

上述實施例僅為例示性說明本案之原理及其功效,以及闡釋本案之技術特徵,而非用於限制本案之保護範疇。任何熟悉本技術者之人士均可在不違背本案之技術原理及精神的情況下,可輕易完成之改變或均等性之安排均屬於本案所主張之範圍。 The above implementation examples are only for illustrative purposes to illustrate the principle and efficacy of this case, as well as to explain the technical features of this case, and are not used to limit the scope of protection of this case. Any person familiar with this technology can easily complete changes or equal arrangements without violating the technical principles and spirit of this case, which are all within the scope advocated by this case.

110:基板 110: Substrate

122:圓柱狀超穎透鏡 122: Cylindrical ultra-slim lens

Claims (19)

一種製造超穎透鏡的方法,包括:沉積一光學材料於一基板上方;旋塗一奈米壓印阻劑於該光學材料上方;使一印模接觸該奈米壓印阻劑,其中該印模具有多個圓柱狀凹部及一凸部,該些圓柱狀凹部彼此間隔;於使該印模接觸該奈米壓印阻劑之後,固化該奈米壓印阻劑,以形成一奈米壓印阻劑圖案,其中該奈米壓印阻劑圖案具有多個圓柱狀厚部及一薄部,該些圓柱狀厚部分別對應該印模的該些圓柱狀凹部,該薄部對應該印模的該凸部;其中,該印模具有一抗黏層位於該印模的該些圓柱狀凹部及該凸部上方,於使該印模接觸該奈米壓印阻劑時,該抗黏層直接接觸該奈米壓印阻劑;移除該薄部,並留下該些圓柱狀厚部;以及根據留下的該些圓柱狀厚部圖案化該光學材料,以形成多個圓柱狀超穎透鏡;其中,該些圓柱狀超穎透鏡的相鄰兩者之間的一最小間距介於75奈米與125奈米之間。 A method for manufacturing a super lens includes: depositing an optical material on a substrate; spin coating a nano-imprint resist on the optical material; contacting a stamp with the nano-imprint resist, wherein the stamp has a plurality of cylindrical concave portions and a convex portion, and the cylindrical concave portions are spaced apart from each other; after contacting the stamp with the nano-imprint resist, curing the nano-imprint resist to form a nano-imprint resist pattern, wherein the nano-imprint resist pattern has a plurality of cylindrical thick portions and a thin portion, and the cylindrical thick portions correspond to the cylindrical portions of the stamp respectively. The cylindrical concave portion, the thin portion corresponds to the convex portion of the stamp; wherein the stamp has an anti-adhesive layer located above the cylindrical concave portions and the convex portion of the stamp, and when the stamp is brought into contact with the nano-imprint resist, the anti-adhesive layer directly contacts the nano-imprint resist; removing the thin portion and leaving the cylindrical thick portions; and patterning the optical material according to the remaining cylindrical thick portions to form a plurality of cylindrical super-slim lenses; wherein a minimum spacing between two adjacent cylindrical super-slim lenses is between 75 nanometers and 125 nanometers. 如請求項1所述之製造超穎透鏡的方法,更包括:於形成該些圓柱狀超穎透鏡之後,移除該些圓柱狀厚部。 The method for manufacturing a super-slim lens as described in claim 1 further includes: after forming the cylindrical super-slim lenses, removing the cylindrical thick portions. 如請求項1所述之製造超穎透鏡的方法,其中使該印模接觸該奈米壓印阻劑步驟包括使該奈米壓印阻劑填充該印模的該些圓柱狀凹 部,使該奈米壓印阻劑填充該印模的該些圓柱狀凹部步驟包括使該印模向下移動、加熱該奈米壓印阻劑或其組合。 The method for manufacturing a super lens as described in claim 1, wherein the step of making the stamp contact the nano-imprint resist includes filling the cylindrical recesses of the stamp with the nano-imprint resist, and the step of filling the cylindrical recesses of the stamp with the nano-imprint resist includes moving the stamp downward, heating the nano-imprint resist, or a combination thereof. 如請求項1所述之製造超穎透鏡的方法,其中固化該奈米壓印阻劑步驟包括進行一紫外光照射步驟。 A method for manufacturing a super lens as described in claim 1, wherein the step of curing the nanoimprint resist includes performing an ultraviolet light irradiation step. 如請求項1所述之製造超穎透鏡的方法,其中固化該奈米壓印阻劑步驟包括進行一冷卻步驟,該奈米壓印阻劑為一熱塑性材料。 A method for manufacturing a super-slim lens as described in claim 1, wherein the step of curing the nano-imprint resist includes a cooling step, and the nano-imprint resist is a thermoplastic material. 如請求項1所述之製造超穎透鏡的方法,更包括:於沉積該光學材料於該基板上方之後以及旋塗該奈米壓印阻劑於該光學材料上方之前,形成一含鉻層於該光學材料上方。 The method for manufacturing a super lens as described in claim 1 further includes: forming a chromium-containing layer on the optical material after depositing the optical material on the substrate and before spin-coating the nano-imprint resist on the optical material. 如請求項1所述之製造超穎透鏡的方法,其中該光學材料包括非晶矽、氧化鈦或其組合。 A method for manufacturing a super lens as described in claim 1, wherein the optical material includes amorphous silicon, titanium oxide or a combination thereof. 如請求項1所述之製造超穎透鏡的方法,更包括:於沉積該光學材料於該基板上方之後以及旋塗該奈米壓印阻劑於該光學材料上方之前,形成一背保護層於該基板下方,該基板介於該光學材料與該背保護層之間。 The method for manufacturing a super lens as described in claim 1 further includes: after depositing the optical material on the substrate and before spin-coating the nano-imprint resist on the optical material, forming a back protection layer under the substrate, the substrate being between the optical material and the back protection layer. 如請求項1所述之製造超穎透鏡的方法,其中該印模由一母模具製成。 A method for manufacturing a super-slim lens as described in claim 1, wherein the stamp is made from a master mold. 如請求項1所述之製造超穎透鏡的方法,其中該印模為可一次性使用高分子模具。 A method for manufacturing a super-slim lens as described in claim 1, wherein the stamp is a disposable polymer mold. 一種超穎透鏡結構,包括:一基板;以及彼此間隔的多個圓柱狀超穎透鏡,位於該基板之上方表面;其中,該些圓柱狀超穎透鏡的其中一者的一側壁與該些圓柱狀超穎透鏡的該者的一底面之間的一夾角為85度至88度或92度至95度;其中,該些圓柱狀超穎透鏡係以請求項1所述之方式所形成。 A super-flexible lens structure, comprising: a substrate; and a plurality of cylindrical super-flexible lenses spaced apart from each other, located on the upper surface of the substrate; wherein an angle between a side wall of one of the cylindrical super-flexible lenses and a bottom surface of the one of the cylindrical super-flexible lenses is 85 degrees to 88 degrees or 92 degrees to 95 degrees; wherein the cylindrical super-flexible lenses are formed in the manner described in claim 1. 如請求項11所述之超穎透鏡結構,其中該些圓柱狀超穎透鏡的該者的一高度與該些圓柱狀超穎透鏡的該者的一最大直徑的一比值介於1.25與3.5之間。 The super-flexible lens structure as described in claim 11, wherein the ratio of a height of one of the cylindrical super-flexible lenses to a maximum diameter of one of the cylindrical super-flexible lenses is between 1.25 and 3.5. 如請求項11所述之超穎透鏡結構,其中該些圓柱狀超穎透鏡的該者的一高度介於250奈米與350奈米之間,該些圓柱狀超穎透鏡的該者的一最大直徑介於100奈米與200奈米之間。 The superlens structure as described in claim 11, wherein a height of one of the cylindrical superlenses is between 250 nanometers and 350 nanometers, and a maximum diameter of one of the cylindrical superlenses is between 100 nanometers and 200 nanometers. 如請求項11所述之超穎透鏡結構,其中該些圓柱狀超穎透鏡的相鄰兩者之間的一最小間距介於75奈米與125奈米之間。 The superlens structure as described in claim 11, wherein a minimum distance between two adjacent cylindrical superlenses is between 75 nanometers and 125 nanometers. 如請求項11所述之超穎透鏡結構,其中該基板為一玻璃基板、一石英基板或一藍寶石基板中之任一者。 The super lens structure as described in claim 11, wherein the substrate is any one of a glass substrate, a quartz substrate or a sapphire substrate. 一種具有超穎透鏡結構之多鏡頭光學模組,包括:多個圓柱狀超穎透鏡,形成於一基板之上方表面且彼此呈間隔排列;一光學濾光元件,其上方表面接觸於該基板之下方表面;以及一光學感測元件,鄰近於該光學濾光元件之下方表面;其中,該些圓柱狀超穎透鏡中之部分圓柱狀超穎透鏡位於一正常工作區域,該些圓柱狀超穎透鏡中之其餘圓柱狀超穎透鏡位於一備份工作區域;其中,該些圓柱狀超穎透鏡係以請求項1所述之方式所形成。 A multi-lens optical module with a super-slim lens structure includes: a plurality of cylindrical super-slim lenses formed on the upper surface of a substrate and arranged at intervals; an optical filter element, whose upper surface contacts the lower surface of the substrate; and an optical sensing element adjacent to the lower surface of the optical filter element; wherein some of the cylindrical super-slim lenses are located in a normal working area, and the remaining cylindrical super-slim lenses are located in a backup working area; wherein the cylindrical super-slim lenses are formed in the manner described in claim 1. 如請求項16所述之多鏡頭光學模組,其中位於該正常工作區域之該些部分圓柱狀超穎透鏡,搭配該光學濾光元件與光學感測元件,係可至少提供一紅色透鏡光學模組、一藍色透鏡光學模組與兩綠色透鏡光學模組。 The multi-lens optical module as described in claim 16, wherein the partially cylindrical super-slim lenses located in the normal working area, in combination with the optical filter element and the optical sensing element, can provide at least one red lens optical module, one blue lens optical module and two green lens optical modules. 如請求項17所述之多鏡頭光學模組,其中位於該備份工作區域之該些其餘圓柱狀超穎透鏡,搭配該光學濾光元件與光學感測元件,係可至少提供該紅色透鏡光學模組、該藍色透鏡光學模組與該些綠色透鏡光學模組中之任一者於處於一故障狀態時之一替換備份透鏡光學模組。 The multi-lens optical module as described in claim 17, wherein the remaining cylindrical super-smooth lenses located in the backup working area, in combination with the optical filter element and the optical sensing element, can provide at least one replacement backup lens optical module for the red lens optical module, the blue lens optical module and the green lens optical modules when any one of them is in a fault state. 如請求項16所述之多鏡頭光學模組,其中位於該備份工作區域之該些其餘圓柱狀超穎透鏡,搭配該光學濾光元件與光學感測元件,係可至少提供一具有額外功能之透鏡光學模組;其中,該具有額外功能至少包括一人工智能(AI)功能、一擴增實境(AR)功能、一虛擬實境(VR)及/或一混合實境(MR)功能。 The multi-lens optical module as described in claim 16, wherein the remaining cylindrical super-slim lenses located in the backup working area, in combination with the optical filter element and the optical sensing element, can provide at least one lens optical module with additional functions; wherein the additional functions at least include an artificial intelligence (AI) function, an augmented reality (AR) function, a virtual reality (VR) and/or a mixed reality (MR) function.
TW110148311A 2021-10-26 2021-12-23 Method of manufacturing meta lenses, meta lens structure and multi-lens optical module having meta lens structure TWI838673B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SG10202111902W 2021-10-26
SG10202111902W 2021-10-26

Publications (2)

Publication Number Publication Date
TW202317357A TW202317357A (en) 2023-05-01
TWI838673B true TWI838673B (en) 2024-04-11

Family

ID=

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20180166616A1 (en) 2016-12-09 2018-06-14 Applied Materials, Inc. Collimated oled light field display

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20180166616A1 (en) 2016-12-09 2018-06-14 Applied Materials, Inc. Collimated oled light field display

Similar Documents

Publication Publication Date Title
US7815430B2 (en) Mold, production process of mold, imprint apparatus, and imprint method
US8027089B2 (en) Minute structure and its manufacturing method
JP5023324B2 (en) Color filter device and manufacturing method thereof
KR100623026B1 (en) Wire-grid Polarizer and Fabrication Method thereof
US20070243655A1 (en) Self-Aligned Process for Fabricating Imprint Templates Containing Variously Etched Features
WO2021129341A1 (en) Ar diffractive waveguide mass-production method and device
CN104698515A (en) Method of making microarrays
KR20070041585A (en) Moat system for an imprint lithography template
KR20110036875A (en) Optical element
KR100951915B1 (en) Fabricating method of micro-nano pattern using plasma etching
JP2004012856A (en) Optical element, mold for optical element, and method for manufacturing optical element
WO2018214202A1 (en) Method for fabricating nanometre line grid structure
JP6012692B2 (en) Method for forming microlens array and method for manufacturing solid-state imaging device
KR100741343B1 (en) Manufacturing method of film for polarizer and protecting information
TWI838673B (en) Method of manufacturing meta lenses, meta lens structure and multi-lens optical module having meta lens structure
JP2008209448A (en) Antireflection structure
CA3014989C (en) Methods for micro and nano fabrication by selective template removal
CN213876300U (en) Photoetching mask plate with nano-scale patterning size
JP3611613B2 (en) Three-dimensional shape forming method, three-dimensional structure formed by the method, and press mold
JPH01252902A (en) Low reflection diffraction grating and its production
CN217932406U (en) Metamaterial lens structure and multi-lens optical module with same
JP2007328128A (en) Optical element and its manufacturing method
CN115236779A (en) First mold and preparation method thereof, blazed grating and preparation method thereof
JP2002116315A (en) Manufacturing method for micro optical element
CN108550527B (en) Graphical method