TWI832505B - Discharge pressure evaluation method, discharge pressure evaluation program, recording medium and substrate processing apparatus - Google Patents

Discharge pressure evaluation method, discharge pressure evaluation program, recording medium and substrate processing apparatus Download PDF

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TWI832505B
TWI832505B TW111139945A TW111139945A TWI832505B TW I832505 B TWI832505 B TW I832505B TW 111139945 A TW111139945 A TW 111139945A TW 111139945 A TW111139945 A TW 111139945A TW I832505 B TWI832505 B TW I832505B
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discharge pressure
pressure
period
discharge
time
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TW202325413A (en
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木村崇也
安陪裕滋
岡本悟史
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日商斯庫林集團股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B12/00Arrangements for controlling delivery; Arrangements for controlling the spray area
    • B05B12/08Arrangements for controlling delivery; Arrangements for controlling the spray area responsive to condition of liquid or other fluent material to be discharged, of ambient medium or of target ; responsive to condition of spray devices or of supply means, e.g. pipes, pumps or their drive means
    • B05B12/085Arrangements for controlling delivery; Arrangements for controlling the spray area responsive to condition of liquid or other fluent material to be discharged, of ambient medium or of target ; responsive to condition of spray devices or of supply means, e.g. pipes, pumps or their drive means responsive to flow or pressure of liquid or other fluent material to be discharged
    • B05B12/087Flow or presssure regulators, i.e. non-electric unitary devices comprising a sensing element, e.g. a piston or a membrane, and a controlling element, e.g. a valve
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B21/00Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
    • G01B21/02Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness
    • G01B21/08Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness for measuring thickness
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L11/00Measuring steady or quasi-steady pressure of a fluid or a fluent solid material by means not provided for in group G01L7/00 or G01L9/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/6715Apparatus for applying a liquid, a resin, an ink or the like
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67253Process monitoring, e.g. flow or thickness monitoring

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

本發明可將自噴嘴吐出處理液從開始至結束為止之期間全體中其吐出壓力的適當性反映在吐出壓力之評價上。 本發明於開始自噴嘴71吐出塗布液(處理液)起至結束自噴嘴71吐出塗布液為止之吐出期間Tt(第一期間)中,測定吐出壓力。接著,抽選出吐出期間Tt全體中吐出壓力之時間變化所具有的理想梯形絕對誤差,作為特徵量Fv1(第一特徵量),根據該特徵量Fv1對吐出壓力之時間變化進行評價。 According to the present invention, the adequacy of the discharge pressure during the entire period from the start to the end of discharge of the treatment liquid from the nozzle can be reflected in the evaluation of the discharge pressure. In the present invention, the discharge pressure is measured during the discharge period Tt (first period) from the start of discharge of the coating liquid (processing liquid) from the nozzle 71 to the end of the discharge of the coating liquid from the nozzle 71 . Next, the ideal trapezoidal absolute error of the time change of the discharge pressure in the entire discharge period Tt is extracted as a feature value Fv1 (first feature value), and the time change of the discharge pressure is evaluated based on this feature value Fv1.

Description

吐出壓力評價方法、吐出壓力評價程式、記錄媒體及基板處理裝置Discharge pressure evaluation method, discharge pressure evaluation program, recording medium and substrate processing device

本發明係關於藉由對處理液賦予吐出壓力而自噴嘴吐出處理液的技術。再者,作為自噴嘴吐出處理液之對象物,包含例如半導體基板、光罩用基板、液晶顯示用基板、有機EL顯示用基板、電漿顯示用基板、FED(Field Emission Display,場發射顯示器)用基板、光碟用基板、磁碟用基板、光磁碟用基板等。The present invention relates to a technology for discharging a processing liquid from a nozzle by applying a discharge pressure to the processing liquid. In addition, the object to which the processing liquid is discharged from the nozzle includes, for example, a semiconductor substrate, a photomask substrate, a liquid crystal display substrate, an organic EL display substrate, a plasma display substrate, and a FED (Field Emission Display). Used substrates, optical disk substrates, magnetic disk substrates, optical disk substrates, etc.

如日本專利特開2011-005465號公報及日本專利特開2020-040046號公報所示般,在將自噴嘴吐出之處理液塗布於基板時,賦予處理液之吐出壓力對於塗布於基板之處理液的厚度產生較大影響。在此,在日本專利特開2011-005465號公報中,將吐出壓力之波形分割為複數個區間,根據各區間之波形的斜率,而對吐出壓力是否在容許範圍內進行評價。此外,在日本專利特開2020-040046號公報中,對於上升區域或穩定吐出區域等各區域,謀求與吐出壓力關聯之參數的最佳化。As shown in Japanese Patent Laid-Open No. 2011-005465 and Japanese Patent Laid-Open No. 2020-040046, when the processing liquid discharged from the nozzle is applied to the substrate, the discharge pressure given to the processing liquid has a greater impact on the processing liquid applied to the substrate. The thickness has a greater impact. Here, in Japanese Patent Application Laid-Open No. 2011-005465, the waveform of the discharge pressure is divided into a plurality of sections, and whether the discharge pressure is within the allowable range is evaluated based on the slope of the waveform in each section. Furthermore, in Japanese Patent Application Laid-Open No. 2020-040046, parameters related to the discharge pressure are optimized for each region such as a rising region or a stable discharge region.

然而,上述技術係將開始自噴嘴吐出處理液起至結束為止之期間加以分割,而進行評價。因此,對塗布於基板之處理液的厚度產生影響之期間全體中,吐出壓力的適當性並未能反映在吐出壓力之評價上,亦有未必稱得上對吐出壓力進行適當評價之情形。尤其,從開始自噴嘴吐出處理液起,經過吐出壓力上升至既定壓力,直至吐出壓力開始自既定壓力減少為止之主要期間被認為非常重要。因此,對於求取反映出至少包含該主要期間之期間全體中吐出壓力的評價,上述技術在此點上並不充分。However, the above-mentioned technique divides and evaluates the period from the start to the end of discharge of the treatment liquid from the nozzle. Therefore, the appropriateness of the discharge pressure is not reflected in the evaluation of the discharge pressure during the entire period during which the thickness of the treatment liquid applied to the substrate is affected, and it may not necessarily be called an appropriate evaluation of the discharge pressure. In particular, the main period from when the treatment liquid starts to be discharged from the nozzle, when the discharge pressure rises to a predetermined pressure, to when the discharge pressure starts to decrease from the predetermined pressure is considered to be very important. Therefore, the above-described technology is not sufficient in terms of obtaining an evaluation that reflects the discharge pressure in the entire period including at least the main period.

本發明係鑑於上述課題所完成者,其目的在於,可使對塗布於基板之處理液的厚度產生影響之期間全體中吐出壓力的適當性反映在吐出壓力之評價上。The present invention was accomplished in view of the above-mentioned problems, and an object thereof is to reflect the adequacy of the discharge pressure in the evaluation of the discharge pressure in the entire period during which the thickness of the processing liquid applied to the substrate is affected.

本發明之吐出壓力評價方法係具備有如下步驟:在至少包含主要期間之評價對象期間中,測定吐出壓力的步驟,其中,上述主要期間係藉由對處理液賦予吐出壓力而自噴嘴吐出處理液之吐出裝置,從開始自噴嘴吐出處理液起,經過吐出壓力上升至既定壓力,直至吐出壓力開始自既定壓力減少為止的期間;抽選出評價對象期間全體中吐出壓力之時間變化所具有的特徵量,作為全體特徵量的步驟;以及根據全體特徵量而對吐出壓力之時間變化進行評價的步驟。The discharge pressure evaluation method of the present invention includes the step of measuring the discharge pressure during an evaluation target period including at least a main period in which the processing liquid is discharged from the nozzle by applying a discharge pressure to the processing liquid. The discharge device starts to discharge the treatment liquid from the nozzle, passes through the period when the discharge pressure rises to a predetermined pressure, and ends when the discharge pressure starts to decrease from the predetermined pressure; extract the characteristic amount of the temporal change of the discharge pressure in the entire evaluation target period , as a step of the overall feature quantity; and a step of evaluating the time change of the discharge pressure based on the overall feature quantity.

本發明之吐出壓力評價程式係使電腦執行如下步驟:於至少包含主要期間之評價對象期間中,測定吐出壓力的步驟,其中,上述主要期間係藉由對處理液賦予吐出壓力而自噴嘴吐出處理液之吐出裝置,從開始自噴嘴吐出處理液起,經過吐出壓力上升至既定壓力,直至吐出壓力開始自既定壓力減少為止的期間;抽選出評價對象期間全體中吐出壓力之時間變化所具有的特徵量,作為全體特徵量的步驟;以及根據全體特徵量而對吐出壓力之時間變化進行評價的步驟。 The discharge pressure evaluation program of the present invention causes a computer to execute a step of measuring the discharge pressure in an evaluation target period including at least a main period in which the processing liquid is discharged from the nozzle by applying a discharge pressure to the process liquid. The liquid discharge device starts to discharge the treatment liquid from the nozzle, passes through the period when the discharge pressure rises to a predetermined pressure, and ends when the discharge pressure starts to decrease from the predetermined pressure; the characteristic of the temporal change of the discharge pressure in the entire evaluation target period is extracted The step is to use the quantity as the overall characteristic quantity; and the step is to evaluate the time change of the discharge pressure based on the overall characteristic quantity.

本發明之記錄媒體包括所述之吐出壓力評價程式,該吐出壓力評價程式藉由電腦可讀出地記錄。 The recording medium of the present invention includes the above-mentioned discharge pressure evaluation program, and the discharge pressure evaluation program is recorded in a computer-readable manner.

本發明之基板處理裝置係具備有:噴嘴;壓力賦予部,其對處理液賦予吐出壓力而使噴嘴吐出處理液;測定部,其測定吐出壓力;以及控制部,其係於至少包含主要期間之評價對象期間中,取得測定部所測定之吐出壓力,其中,上述主要期間係從開始自噴嘴吐出處理液起,經過吐出壓力上升至既定壓力,直至吐出壓力開始自既定壓力減少為止的期間;控制部抽選出評價對象期間全體中吐出壓力之時間變化所具有的特徵量,作為全體特徵量,並根據全體特徵量而對吐出壓力之時間變化進行評價。 The substrate processing apparatus of the present invention is provided with: a nozzle; a pressure applying part that applies a discharge pressure to the processing liquid to cause the nozzle to discharge the processing liquid; a measuring part that measures the discharge pressure; and a control part that includes at least a main period. During the evaluation target period, the discharge pressure measured by the measuring unit is obtained, where the above-mentioned main period is the period from when the treatment liquid is discharged from the nozzle, through the discharge pressure rising to a predetermined pressure, until the discharge pressure starts to decrease from the predetermined pressure; control The characteristic quantity of the temporal change of the discharge pressure in the entire evaluation target period is extracted as the overall characteristic quantity, and the temporal variation of the discharge pressure is evaluated based on the overall characteristic quantity.

在如此構成之本發明(吐出壓力評價方法、吐出壓力評價程式、記錄媒體及基板處理裝置)中,於至少包含主要期間之評價對象期間中,測定吐出壓力,其中,上述主要期間係從開始自噴嘴吐出處理液起,經過吐出壓力上升至既定壓力,直至吐出壓力開始自既定壓力減少為止的期間。而且,抽選出評價對象期間全體中吐出壓力之時間變化所具有的特徵量,作為全體特徵量,並根據全體特徵量而對吐出壓力之時間變化進行評價。藉此,可使對塗布於基板之處理液的厚度產生影響之期間(換言之,評價對象期間)全體中吐出壓力的適當性反映在吐出壓力之評價上。In the invention thus constituted (discharge pressure evaluation method, discharge pressure evaluation program, recording medium, and substrate processing apparatus), the discharge pressure is measured during an evaluation target period including at least a main period starting from the beginning. The period from when the nozzle discharges the treatment liquid to when the discharge pressure rises to a predetermined pressure until the discharge pressure starts to decrease from the predetermined pressure. Furthermore, the characteristic quantity of the temporal change of the discharge pressure in the entire evaluation target period is extracted as the overall characteristic quantity, and the temporal variation of the discharge pressure is evaluated based on the overall characteristic quantity. This allows the adequacy of the discharge pressure in the entire period that affects the thickness of the processing liquid applied to the substrate (in other words, the evaluation target period) to be reflected in the evaluation of the discharge pressure.

此外,亦可將吐出壓力評價方法構成為,評價對象期間係主要期間,抽選出主要期間全體中吐出壓力之時間變化所具有的特徵量即主要特徵量,作為全體特徵量。在該構成中,可於主要期間對塗布於基板之處理液的厚度造成的影響特別大時(換言之,經過主要期間後之期間的影響僅些微時),使該主要期間全體中吐出壓力的適當性反映在吐出壓力之評價上。In addition, the discharge pressure evaluation method may be configured such that the evaluation target period is a main period, and the main characteristic quantity that is a characteristic quantity of the temporal change of the discharge pressure in the entire main period is extracted as the overall characteristic quantity. In this structure, when the main period has a particularly large influence on the thickness of the processing liquid applied to the substrate (in other words, when the period after the main period has only a slight influence), the discharge pressure can be appropriately adjusted throughout the main period. Sexuality is reflected in the evaluation of the vomiting pressure.

此外,亦可將吐出壓力評價方法構成為,主要特徵量係表示,近似於主要期間全體中吐出壓力之時間變化的主要近似波形、與主要期間全體中吐出壓力的時間變化之差。在該構成中,可根據與主要期間全體中吐出壓力的時間變化相對之近似波形,而對該主要期間全體中之吐出壓力進行適當之評價。In addition, the discharge pressure evaluation method may be configured such that the main characteristic quantity represents the difference between a main approximate waveform that approximates the time change of the discharge pressure in the entire main period and the time change of the discharge pressure in the entire main period. In this configuration, the discharge pressure in the entire main period can be appropriately evaluated based on the approximate waveform corresponding to the time change of the discharge pressure in the entire main period.

此外,亦可將吐出壓力評價方法構成為,主要近似波形係具有:上升近似直線,其係自吐出開始壓力至較吐出開始壓力為大之穩定壓力為止,隨著時間經過而線性地增大,其係直線近似於在開始自噴嘴吐出處理液後隨著時間經過而增大之吐出壓力的時間變化;開始時近似直線,其係設置於開始自噴嘴吐出處理液的時間點與上升近似直線之間,表示吐出開始壓力;以及穩定直線,其係設置於上升近似直線到達穩定壓力起至主要期間的最後為止之間,表示穩定壓力。在該構成中,可近似於主要期間全體中吐出壓力的時間變化,而對該期間全體中之吐出壓力進行適當之評價。In addition, the discharge pressure evaluation method can also be configured such that the main approximate waveform has a rising approximate straight line that increases linearly with the passage of time from the discharge start pressure to a stable pressure that is greater than the discharge start pressure. It is a straight line that approximates the time change of the discharge pressure that increases with the passage of time after the treatment liquid is started to be discharged from the nozzle. It is an approximate straight line at the beginning and is set between the time point when the treatment liquid is started to be discharged from the nozzle and the rising approximate straight line. The period represents the discharge start pressure; and the stable straight line is set between the time when the approximate straight line rises to the stable pressure and the end of the main period, which represents the stable pressure. In this configuration, the discharge pressure in the entire main period can be appropriately evaluated by approximating the time change of the discharge pressure in the entire main period.

此外,亦可將吐出壓力評價方法構成為,評價對象期間係開始自噴嘴吐出處理液起,至結束自噴嘴吐出處理液為止的第一期間,抽選出第一期間全體中吐出壓力之時間變化所具有的特徵量即第一特徵量,作為全體特徵量。在該構成中,可於開始自噴嘴吐出處理液起至結束自噴嘴吐出處理液為止的第一期間,當吐出壓力對塗布於基板之處理液的厚度造成影響時,使該第一期間全體中吐出壓力的適當性反映在吐出壓力之評價上。In addition, the discharge pressure evaluation method may be configured such that the evaluation target period is the first period from the time when the nozzle discharges the processing liquid to the end of the nozzle discharge of the processing liquid, and the time changes of the discharge pressure in the entire first period may be extracted. The first characteristic quantity is the characteristic quantity, which is used as the overall characteristic quantity. In this structure, when the discharge pressure affects the thickness of the processing liquid applied to the substrate during the first period from the start of the discharge of the processing liquid from the nozzle to the end of the discharge of the processing liquid from the nozzle, the entire first period can be centered. The appropriateness of the discharge pressure is reflected in the evaluation of the discharge pressure.

此外,亦可將吐出壓力評價方法構成為,第一特徵量係表示,近似於第一期間全體中吐出壓力之時間變化的第一近似波形、與第一期間全體中吐出壓力的時間變化之差。在該構成中,可根據與開始自噴嘴吐出處理液起至結束為止的期間全體中吐出壓力的時間變化相對之近似波形,而對該期間全體中之吐出壓力進行適當之評價。In addition, the discharge pressure evaluation method may be configured such that the first characteristic amount represents a difference between a first approximate waveform that approximates the time change of the discharge pressure in the entire first period and the time change of the discharge pressure in the entire first period. . In this configuration, it is possible to appropriately evaluate the discharge pressure during the entire period from the start to the end of the discharge of the treatment liquid from the nozzle based on the approximate waveform relative to the time change of the discharge pressure.

此外,亦可將吐出壓力評價方法構成為,第一近似波形係具有:上升近似直線,其係直線近似於在開始自噴嘴吐出處理液後隨著時間經過而增大之吐出壓力的時間變化,藉此,自吐出開始壓力至較吐出開始壓力為大之穩定壓力為止,隨著時間經過而線性地增大;開始時近似直線,其係設置於自噴嘴吐出處理液的開始時間點與上升近似直線之間,表示吐出開始壓力;落下近似直線,其係直線近似於在結束自噴嘴吐出處理液前隨著時間經過而減少之吐出壓力的時間變化,藉此,自穩定壓力至較穩定壓力為小之吐出結束壓力為止,隨著時間經過而線性地減少;結束時近似直線,其係設置於落下近似直線與自噴嘴吐出處理液的結束時間點之間,表示吐出結束壓力;以及穩定直線,其將上升近似直線及落下近似直線各者之間加以連接,表示穩定壓力。在該構成中,可使開始自噴嘴吐出處理液起至結束為止的期間全體中吐出壓力的時間變化更加近似於梯形波形,而對該期間全體中之吐出壓力進行適當性評價。In addition, the discharge pressure evaluation method may be configured such that the first approximate waveform has a rising approximate straight line, which is a straight line that approximates the time change of the discharge pressure that increases with the passage of time after starting to discharge the treatment liquid from the nozzle, Thereby, the pressure from the discharge start pressure to the stable pressure which is greater than the discharge start pressure increases linearly with the passage of time; the beginning is approximately a straight line, which is set at the start time point of discharge of the treatment liquid from the nozzle and rises approximately The straight line represents the discharge start pressure; the falling approximate straight line is a straight line that approximates the time change of the discharge pressure that decreases with the passage of time before finishing discharging the treatment liquid from the nozzle. Accordingly, from the stable pressure to the more stable pressure is The discharge end pressure decreases linearly with the passage of time until the discharge end pressure is small; the end approximate straight line is set between the drop approximate straight line and the end time point of discharging the treatment liquid from the nozzle, indicating the discharge end pressure; and the stable straight line, It connects the rising approximate straight line and the falling approximate straight line to represent stable pressure. In this configuration, the time change of the discharge pressure in the entire period from the start of the nozzle to the end of discharge of the treatment liquid can be made closer to a trapezoidal waveform, and the adequacy of the discharge pressure in the entire period can be evaluated.

此外,亦可將吐出壓力評價方法構成為,進而具備有如下步驟:抽選出評價對象期間中較評價對象期間為短之第二期間中吐出壓力之時間變化所具有的特徵量,作為第二特徵量的步驟;根據全體特徵量及第二特徵量而對吐出壓力之時間變化進行評價。在該構成中,可根據開始自噴嘴吐出處理液起至結束為止的期間全體、及較該期間為短之期間兩者中吐出壓力的時間變化,而高精度地對吐出壓力進行評價。In addition, the discharge pressure evaluation method may also be configured to further include the step of extracting, as the second feature, a characteristic amount of the temporal change in the discharge pressure in a second period that is shorter than the evaluation target period. The step of measuring: evaluating the time change of the discharge pressure based on the overall characteristic quantity and the second characteristic quantity. In this configuration, the discharge pressure can be evaluated with high accuracy based on the time change of the discharge pressure in both the entire period from the start to the end of discharge of the treatment liquid from the nozzle and the period shorter than this period.

此外,亦可將吐出壓力評價方法構成為,將開始自噴嘴吐出處理液起既定之上升初期期間,設定為第二期間,於整個上升初期期間,吐出壓力係隨著時間經過而增大,對於上升初期期間中吐出壓力之時間變化的回歸曲線、與上升初期期間中吐出壓力的時間變化之差,抽選出表示該差之特徵量,作為第二特徵量。在該構成中,可加進自噴嘴吐出處理液剛開始後之吐出壓力的時間變化,而對吐出壓力進行評價。In addition, the discharge pressure evaluation method may also be configured such that a predetermined initial period of rise from when the nozzle starts to discharge the treatment liquid is set as the second period, and the discharge pressure increases with the passage of time during the entire initial period of rise. The difference between the regression curve of the time change of the discharge pressure during the initial rise period and the time change of the discharge pressure during the initial rise period is extracted as a second feature value. In this configuration, the discharge pressure can be evaluated by adding the temporal change in the discharge pressure immediately after the nozzle discharges the treatment liquid.

此外,亦可將吐出壓力評價方法構成為,將開始自噴嘴吐出處理液起至吐出壓力增大為既定壓力為止之上升期間,設定為第二期間。在該構成中,可加進上升期間中吐出壓力的時間變化,而對吐出壓力進行評價。In addition, the discharge pressure evaluation method may be configured such that the rising period from when the nozzle starts discharging the processing liquid until the discharge pressure increases to a predetermined pressure is set as the second period. In this configuration, the discharge pressure can be evaluated by adding the time change of the discharge pressure during the rising period.

具體而言,亦可將吐出壓力評價方法構成為,抽選出上升期間之長度,作為第二特徵量。在該構成中,可加進吐出壓力之上升速度,而對吐出壓力進行評價。Specifically, the discharge pressure evaluation method may be configured to extract the length of the rising period as the second feature quantity. In this configuration, the discharge pressure can be evaluated by adding the rise rate of the discharge pressure.

此外,亦可將吐出壓力評價方法構成為,抽選出上升期間中吐出壓力之時間變化的一次微分與既定之臨限值交叉的次數,作為第二特徵量。在該構成中,可加進上升期間中吐出壓力之時間變化的平滑度,而對吐出壓力進行評價。In addition, the discharge pressure evaluation method may be configured to extract the number of times that the first derivative of the time change of the discharge pressure crosses a predetermined threshold value during the rising period as the second characteristic quantity. In this configuration, the discharge pressure can be evaluated taking into account the smoothness of the temporal change of the discharge pressure during the rising period.

此外,亦可將吐出壓力評價方法構成為,抽選出上升期間中吐出壓力之時間變化的二次微分之絕對值與既定之臨限值交叉的次數,作為第二特徵量。在該構成中,可加進上升期間中吐出壓力之時間變化的平滑度,而對吐出壓力進行評價。In addition, the discharge pressure evaluation method may be configured to extract the number of times the absolute value of the second derivative of the time change of the discharge pressure crosses a predetermined threshold value during the rising period as the second characteristic quantity. In this configuration, the discharge pressure can be evaluated taking into account the smoothness of the temporal change of the discharge pressure during the rising period.

此外,亦可將吐出壓力評價方法構成為,對於上升期間中,吐出壓力之時間變化的二次微分變得較既定之正臨限值為大之時間、與吐出壓力之時間變化的二次微分變得較具有與正臨限值相同之絕對值的既定之負臨限值為小之時間的比,抽選出該比,作為第二特徵量。在該構成中,可加進在上升期間之初期與終期吐出壓力之時間變化的差異,而對吐出壓力進行評價。In addition, the discharge pressure evaluation method may also be configured as follows: during the rising period, the second derivative of the time change of the discharge pressure becomes larger than the predetermined positive threshold value, and the second derivative of the time change of the discharge pressure The ratio of the time at which the negative threshold value becomes smaller than the predetermined negative threshold value having the same absolute value as the positive threshold value is extracted as the second feature quantity. In this configuration, the discharge pressure can be evaluated by taking into account the difference in temporal changes in the discharge pressure at the initial and final stages of the rise period.

此外,亦可將吐出壓力評價方法構成為,將吐出壓力增大至既定壓力為止之既定的上升終期期間,設定為第二期間,對於近似於上升終期期間中吐出壓力之時間變化的上升終期近似波形、與上升終期期間中吐出壓力的時間變化之差,抽選出表示該差之特徵量,作為第二特徵量,上升終期近似波形係具有:上升終期近似直線,其係藉由直線近似於較既定壓力更小之壓力範圍中隨著時間經過而增大之吐出壓力的時間變化,而與求出之近似曲線重疊,至上升終期期間後之穩定期間的吐出壓力之時間變化的平均值即穩定壓力為止,隨著時間經過而線性地增大;以及延伸直線,其係自上升終期近似直線延伸至上升終期期間之結束時間點,而表示穩定壓力。在該構成中,可加進上升期間之終期的吐出壓力之失速程度,而對吐出壓力進行評價。In addition, the discharge pressure evaluation method may be configured such that a predetermined rise end period until the discharge pressure increases to a predetermined pressure is set as the second period, and the rise end period is approximated to a time change of the discharge pressure during the rise end period. The difference between the waveform and the time change of the discharge pressure during the final period of rise is extracted. As the second characteristic quantity, the approximate waveform at the end of rise has: the approximate straight line at the end of rise, which is approximated by a straight line. The time change of the discharge pressure that increases with the passage of time in a pressure range with a smaller predetermined pressure overlaps with the obtained approximate curve, and the average value of the time change of the discharge pressure in the stable period after the rising terminal period is stable. The pressure increases linearly as time passes; and an extended straight line extends from an approximate straight line at the end of the rise to the end time point of the final rise period, indicating stable pressure. In this configuration, the discharge pressure can be evaluated by adding the stall degree of the discharge pressure at the end of the rising period.

此外,亦可將吐出壓力評價方法構成為,將自吐出壓力達到最大值之時間點起,至吐出壓力之時間變化的二次微分與零交叉兩次之時間點為止的初期振動期間,設定為第二期間,對於初期振動期間中吐出壓力的最小值及初期振動期間後之既定的穩定期間中吐出壓力的平均值中較小的壓力、與吐出壓力的最大值之差,抽選出該差,作為第二特徵量。在該構成中,可加進吐出壓力之過衝,而對吐出壓力進行評價。In addition, the discharge pressure evaluation method may be configured such that the initial vibration period from the time when the discharge pressure reaches the maximum value to the time when the second derivative of the time change of the discharge pressure crosses zero twice is set to In the second period, the difference between the minimum value of the discharge pressure in the initial vibration period, the average value of the discharge pressure in the predetermined stable period after the initial vibration period, whichever is smaller, and the maximum value of the discharge pressure is extracted. as the second feature quantity. In this configuration, the discharge pressure can be evaluated by adding the overshoot of the discharge pressure.

此外,亦可將吐出壓力評價方法構成為,將吐出壓力超過既定壓力之時間點起既定之遷移期間,設定為第二期間,針對遷移期間中吐出壓力相對於遷移期間後既定的穩定期間中吐出壓力的平均值之差,抽選出表示該差之特徵量,作為第二特徵量。在該構成中,可加進吐出壓力到達既定壓力後吐出壓力的穩定度,而對吐出壓力進行評價。In addition, the discharge pressure evaluation method may also be configured such that a predetermined transition period from the time point when the discharge pressure exceeds the predetermined pressure is set as the second period, and the discharge pressure during the transition period is compared with the discharge during the predetermined stable period after the transition period. From the difference between the average values of the pressures, a feature quantity representing the difference is extracted as the second feature quantity. In this configuration, the discharge pressure can be evaluated by taking into account the stability of the discharge pressure after the discharge pressure reaches a predetermined pressure.

此外,亦可將吐出壓力評價方法構成為,將自吐出壓力超過既定壓力之時間點起,至朝向自噴嘴吐出處理液之結束而開始減少吐出壓力之時間點為止的定壓期間,設定為第二期間,抽選出表示定壓期間中吐出壓力的最大值與最小值之差的特徵量,作為第二特徵量。在該構成中,可加進吐出壓力之定壓期間中吐出壓力的穩定性,而對吐出壓力進行評價。In addition, the discharge pressure evaluation method may be configured such that the constant pressure period from the time when the discharge pressure exceeds the predetermined pressure to the time when the discharge pressure starts to decrease toward the end of discharging the treatment liquid from the nozzle is set as the third During the second period, a feature quantity representing the difference between the maximum value and the minimum value of the discharge pressure in the constant pressure period is extracted as the second feature quantity. In this configuration, the discharge pressure can be evaluated by taking into account the stability of the discharge pressure during the constant pressure period.

如上述般,根據本發明,可使從開始自噴嘴吐出處理液起至結束為止之期間全體中對吐出壓力的適當性反映在吐出壓力之評價上。As described above, according to the present invention, the adequacy of the discharge pressure in the entire period from the start to the end of discharge of the treatment liquid from the nozzle can be reflected in the evaluation of the discharge pressure.

圖1係示意性地表示本發明的基板處理裝置之一實施形態,即塗布裝置的全體構成的圖。該塗布裝置1係將塗布液對自圖1左手側朝向右手側以水平姿勢被搬送之基板S的上表面Sf進行塗布之狹縫塗布機。再者,於以下之各圖中,為了使裝置各部分之配置關係明確化,將基板S之搬送方向設為「X方向」,將圖1之左手側朝向右手側的水平方向稱為「+X方向」,將反方向稱為「-X方向」。此外,在與X方向正交之水平方向Y中,將裝置之正面側稱為「-Y方向」,並且將裝置之背面側稱為「+Y方向」。進而,將鉛直方向Z中上方向及下方向分別稱為「+Z方向」及「-Z方向」。FIG. 1 is a diagram schematically showing the overall structure of a coating device, which is one embodiment of the substrate processing apparatus of the present invention. This coating device 1 is a slit coater that applies a coating liquid to the upper surface Sf of a substrate S that is conveyed in a horizontal posture from the left-hand side to the right-hand side in FIG. 1 . In addition, in the following figures, in order to clarify the arrangement relationship of each part of the device, the conveying direction of the substrate S is referred to as the "X direction", and the horizontal direction from the left-hand side to the right-hand side in Figure 1 is referred to as "+ X direction", and the opposite direction is called "-X direction". In addition, in the horizontal direction Y orthogonal to the X direction, the front side of the device is called the "-Y direction" and the back side of the device is called the "+Y direction". Furthermore, the upper direction and the lower direction in the vertical direction Z are called "+Z direction" and "-Z direction" respectively.

在塗布裝置1中,沿著基板S之搬送方向Dt(+X方向),依序接近配置有輸入輸送機100、輸入移載部2、浮起平台部3、輸出移載部4、輸出輸送機110,如以下所詳述般,藉由該等而形成朝大致水平方向延伸之基板S的搬送路徑。再者,於以下之說明中,在與基板S之搬送方向Dt建立關聯而表示位置關係時,有時將「基板S之搬送方向Dt之上游側」簡稱為「上游側」,又將「基板S之搬送方向Dt之下游側」簡稱為「下游側」。在本例中,自某基準位置觀察時,相對之(-X)側係相當於「上游側」,相對之(+X)側係相當於「下游側」。In the coating device 1 , an input conveyor 100 , an input transfer unit 2 , a floating platform unit 3 , an output transfer unit 4 , and an output conveyor are disposed in close proximity in this order along the transfer direction Dt (+X direction) of the substrate S. As will be described in detail below, the machine 110 forms a conveyance path of the substrate S extending in a substantially horizontal direction. In addition, in the following description, when the positional relationship is expressed in association with the conveyance direction Dt of the substrate S, the "upstream side in the conveyance direction Dt of the substrate S" may be simply referred to as "the upstream side", and the "substrate S" may also be referred to as "the upstream side". The "downstream side of the conveyance direction Dt of S" is simply called the "downstream side". In this example, when viewed from a certain reference position, the opposite (-X) side is equivalent to the "upstream side" and the opposite (+X) side is equivalent to the "downstream side".

處理對象即基板S係自圖1之左手側被搬入至輸入輸送機100。輸入輸送機100係具備有滾輪輸送機101、及使其進行旋轉驅動的旋轉驅動機構102,藉由滾輪輸送機101之旋轉,基板S係以水平姿勢朝下游側即(+X)方向被搬送。輸入移載部2係具備有滾輪輸送機21、及具有使其進行旋轉驅動之功能及使其升降之功能的旋轉・升降驅動機構22。藉由滾輪輸送機21旋轉,基板S進而朝(+X)方向被搬送。此外,藉由滾輪輸送機21之升降,其變更基板S之鉛直方向Z的位置。藉由如此構成之輸入移載部2,基板S自輸入輸送機100被移載至浮起平台部3。The substrate S that is the processing object is carried into the input conveyor 100 from the left hand side in FIG. 1 . The input conveyor 100 is provided with a roller conveyor 101 and a rotation drive mechanism 102 for rotationally driving. By the rotation of the roller conveyor 101, the substrate S is conveyed in a horizontal posture toward the downstream side, that is, in the (+X) direction. . The input transfer unit 2 is provided with a roller conveyor 21 and a rotation/lifting drive mechanism 22 that has a function of rotating the roller conveyor 21 and a function of raising and lowering the roller conveyor 21 . As the roller conveyor 21 rotates, the substrate S is further conveyed in the (+X) direction. In addition, the position of the substrate S in the vertical direction Z is changed by the lifting and lowering of the roller conveyor 21 . The substrate S is transferred from the input conveyor 100 to the floating platform unit 3 by the input transfer unit 2 configured in this way.

浮起平台部3係具備有沿著基板之搬送方向Dt而被分割為三部分之平板狀的平台。即,浮起平台部3係具備有入口浮起平台31、塗布平台32及出口浮起平台33,該等各平台之上表面係相互地成為同一平面之一部分。進而,浮起平台部3係具有升降銷驅動機構34、浮起控制機構35及升降驅動機構36。升降銷驅動機構34可使被設置在入口浮起平台31之升降銷升降。浮起控制機構35可將用於使基板S浮起之壓縮空氣供給至浮起平台部3之各平台。升降驅動機構36可使出口浮起平台33升降。The floating platform part 3 is provided with a flat platform divided into three parts along the conveyance direction Dt of the substrate. That is, the floating platform part 3 is equipped with the inlet floating platform 31, the coating platform 32, and the outlet floating platform 33, and the upper surfaces of these platforms become part of the same plane mutually. Furthermore, the floating platform part 3 has a lifting pin driving mechanism 34, a floating control mechanism 35, and a lifting driving mechanism 36. The lifting pin driving mechanism 34 can raise and lower the lifting pin provided on the entrance floating platform 31 . The floating control mechanism 35 can supply compressed air for floating the substrate S to each platform of the floating platform part 3 . The lifting drive mechanism 36 can raise and lower the outlet floating platform 33 .

於入口浮起平台31及出口浮起平台33各者之上表面,呈矩陣狀地設置有多個噴出孔,該等噴出孔噴出自浮起控制機構35供給之壓縮空氣,藉由自噴出之氣流賦予的浮力,使基板S浮起。如此,基板S之下表面Sb係在離開平台上表面的狀態下,呈水平姿勢地被支撐。基板S之下表面Sb與平台上表面的距離,即浮起量,例如可設為10微米至500微米。A plurality of ejection holes are provided in a matrix on the upper surface of each of the inlet floating platform 31 and the outlet floating platform 33. These ejection holes eject the compressed air supplied from the floating control mechanism 35. The buoyancy given by the air flow causes the substrate S to float. In this way, the lower surface Sb of the substrate S is supported in a horizontal posture while being separated from the upper surface of the platform. The distance between the lower surface Sb of the substrate S and the upper surface of the platform, that is, the floating amount, can be set to 10 microns to 500 microns, for example.

另一方面,在塗布平台32之上表面,交互地配置有噴出壓縮空氣的噴出孔、及對於基板S的下表面Sb與平台上表面之間的空氣加以抽吸的抽吸孔。浮起控制機構35控制來自噴出孔之壓縮空氣的噴出量與來自抽吸孔之抽吸量,藉此而精密地控制基板S之下表面Sb與塗布平台32之上表面的距離。藉此,將通過塗布平台32之上方的基板S之上表面Sf在鉛直方向Z的位置控制在規定值。浮起平台部3之具體構成例如可應用日本專利第5346643號所記載之發明。再者,關於塗布平台32上之浮起量,其係根據如後詳述之感測器61、62所檢測之檢測結果而由控制單元9所計算出,再藉由氣流控制而可高精度地進行調整。On the other hand, on the upper surface of the coating platform 32, ejection holes for ejecting compressed air and suction holes for sucking air between the lower surface Sb of the substrate S and the upper surface of the platform are alternately arranged. The floating control mechanism 35 controls the ejection amount of the compressed air from the ejection hole and the suction amount from the suction hole, thereby precisely controlling the distance between the lower surface Sb of the substrate S and the upper surface of the coating platform 32 . Thereby, the position of the upper surface Sf of the substrate S passing above the coating platform 32 in the vertical direction Z is controlled to a predetermined value. The specific structure of the floating platform portion 3 can be applied to the invention described in Japanese Patent No. 5346643, for example. Furthermore, the floating amount on the coating platform 32 is calculated by the control unit 9 based on the detection results detected by the sensors 61 and 62, which will be described in detail later, and can be achieved with high accuracy through air flow control. to make adjustments.

經由輸入移載部2被搬入至浮起平台部3之基板S係藉由滾輪輸送機21之旋轉而被賦予朝(+X)方向之推進力,而被搬送至入口浮起平台31上。入口浮起平台31、塗布平台32及出口浮起平台33係將基板S支撐成浮起狀態,但不具有使基板S朝水平方向移動之功能。浮起平台部3中基板S的搬送係由配置在入口浮起平台31、塗布平台32及出口浮起平台33下方之基板搬送部5所進行。The substrate S carried into the floating platform part 3 via the input transfer part 2 is given a propulsive force in the (+X) direction by the rotation of the roller conveyor 21, and is transported to the entrance floating platform 31. The inlet floating platform 31, the coating platform 32 and the outlet floating platform 33 support the substrate S in a floating state, but do not have the function of moving the substrate S in the horizontal direction. The substrate S is transported in the floating platform part 3 by the substrate transporting part 5 arranged below the inlet floating platform 31 , the coating platform 32 and the outlet floating platform 33 .

基板搬送部5係具備有:卡盤機構51,其係部分地抵接於基板S之下表面周緣部,藉此而自下方支撐基板S;及吸附・移行控制機構52,其係具有對被設置在卡盤機構51上端之吸附構件的吸附墊(省略圖示)賦予負壓而吸附保持基板S的功能、及使卡盤機構51朝X方向往返移行的功能。在卡盤機構51保持基板S之狀態下,基板S之下表面Sb係位在較浮起平台部3之各平台上表面更高的位置。因此,基板S係被卡盤機構51吸附保持著其周緣部,且藉由自浮起平台部3賦予之浮力而全體維持水平姿勢。再者,在藉由卡盤機構51而部分保持基板S之下表面Sb的階段,為了檢測基板S之上表面在鉛直方向Z的位置,將板厚測定用之感測器61配置在滾輪輸送機21之附近。於該感測器61之正下方位置,存在有未保持基板S之狀態的卡盤(省略圖示),藉此,感測器61可對吸附構件之上表面進行檢測,亦即,可對吸附面在鉛直方向Z的位置進行檢測。The substrate transfer unit 5 is equipped with: a chuck mechanism 51 that partially abuts the lower surface peripheral portion of the substrate S to support the substrate S from below; and an adsorption/transfer control mechanism 52 that has a function to control the substrate S. The suction pad (not shown) of the suction member provided at the upper end of the chuck mechanism 51 has the function of applying negative pressure to suction and hold the substrate S, and the function of reciprocating the chuck mechanism 51 in the X direction. When the chuck mechanism 51 holds the substrate S, the lower surface Sb of the substrate S is located at a higher position than the upper surface of each platform of the floating platform portion 3 . Therefore, the peripheral edge portion of the substrate S is adsorbed and held by the chuck mechanism 51 , and the overall horizontal posture is maintained by the buoyancy force imparted from the floating platform portion 3 . Furthermore, in the stage where the lower surface Sb of the substrate S is partially held by the chuck mechanism 51, in order to detect the position of the upper surface of the substrate S in the vertical direction Z, the sensor 61 for plate thickness measurement is arranged on the roller conveyor. Near machine 21. Directly below the sensor 61, there is a chuck (not shown) that does not hold the substrate S. With this, the sensor 61 can detect the upper surface of the adsorption member, that is, it can detect The position of the adsorption surface in the vertical direction Z is detected.

卡盤機構51保持著自輸入移載部2被搬入至浮起平台部3之基板S,在該狀態下使卡盤機構51朝(+X)方向移動,藉此,基板S係自入口浮起平台31之上方經由塗布平台32之上方朝出口浮起平台33之上方被搬送。被搬送之基板S係被交接給配置在出口浮起平台33之(+X)側的輸出移載部4。The chuck mechanism 51 holds the substrate S carried from the input transfer part 2 to the floating platform part 3. In this state, the chuck mechanism 51 is moved in the (+X) direction, whereby the substrate S is floated from the inlet. The upper part of the lifting platform 31 is conveyed toward the upper part of the exit floating platform 33 via the upper part of the coating platform 32 . The transported substrate S is delivered to the output transfer unit 4 arranged on the (+X) side of the outlet floating platform 33 .

輸出移載部4係具備有滾輪輸送機41、及具有使其進行旋轉驅動之功能及使其升降之功能的旋轉・升降驅動機構42。藉由滾輪輸送機41的旋轉,其對基板S賦予有朝(+X)方向之推進力,進而將基板S沿著搬送方向Dt搬送。此外,藉由滾輪輸送機41的升降,其變更基板S在鉛直方向Z的位置。藉由輸出移載部4,基板S係自出口浮起平台33之上方被移載至輸出輸送機110。The output transfer unit 4 is provided with a roller conveyor 41 and a rotation/lifting drive mechanism 42 that has a function of rotating and driving the roller conveyor 41 and a function of raising and lowering the roller conveyor 41 . The rotation of the roller conveyor 41 imparts a propulsive force in the (+X) direction to the substrate S, thereby conveying the substrate S along the conveyance direction Dt. In addition, the position of the substrate S in the vertical direction Z is changed by the lifting and lowering of the roller conveyor 41 . The substrate S is transferred to the output conveyor 110 from above the outlet floating platform 33 by the output transfer unit 4 .

輸出輸送機110係具備有滾輪輸送機111、及使其進行旋轉驅動的旋轉驅動機構112,藉由滾輪輸送機111之旋轉,其進而將基板S朝(+X)方向搬送,最終將其朝塗布裝置1外送出。再者,輸入輸送機100及輸出輸送機110可設置為塗布裝置1之構成的一部分,但亦可與塗布裝置1分開。此外,例如可將設置在塗布裝置1之上游側的另一單元之基板送出機構當作輸入輸送機100來使用。此外,亦可將設置在塗布裝置1之下游側的另一單元之基板接收機構當作輸出輸送機110來使用。The output conveyor 110 is equipped with a roller conveyor 111 and a rotation drive mechanism 112 that drives the rotation. By the rotation of the roller conveyor 111, the substrate S is further conveyed in the (+X) direction, and finally the substrate S is transported in the (+X) direction. The coating device 1 is sent out. Furthermore, the input conveyor 100 and the output conveyor 110 may be provided as a part of the coating device 1 , or may be separated from the coating device 1 . In addition, for example, a substrate feeding mechanism of another unit provided on the upstream side of the coating device 1 may be used as the input conveyor 100 . In addition, the substrate receiving mechanism of another unit provided on the downstream side of the coating device 1 may also be used as the output conveyor 110 .

在被如此搬送之基板S的搬送路徑上,其配置有用以將塗布液對基板S之上表面Sf塗布的塗布機構7。塗布機構7係具有狹縫噴嘴(以下簡稱為「噴嘴」)71,該狹縫噴嘴係具有狹縫狀的吐出口。此外,雖省略圖示,但於噴嘴71連接有定位機構,噴嘴71係藉由定位機構而被定位在塗布平台32上方之塗布位置(圖1中以實線表示之位置)或於後述說明之維護位置。進而,於噴嘴71,連接有塗布液供給機構8,並自塗布液供給機構8供給塗布液,於噴嘴下部自向下開口之吐出口吐出塗布液。A coating mechanism 7 for applying a coating liquid to the upper surface Sf of the substrate S is disposed on the conveyance path of the substrate S conveyed in this way. The coating mechanism 7 has a slit nozzle (hereinafter referred to as "nozzle") 71 having a slit-shaped discharge port. In addition, although illustration is omitted, a positioning mechanism is connected to the nozzle 71, and the nozzle 71 is positioned at the coating position above the coating platform 32 (the position indicated by a solid line in FIG. 1) by the positioning mechanism, or as explained later. Maintain location. Furthermore, the coating liquid supply mechanism 8 is connected to the nozzle 71 , the coating liquid is supplied from the coating liquid supply mechanism 8 , and the coating liquid is discharged from the discharge port opening downward at the lower part of the nozzle.

圖2係表示塗布液供給機構之構成的圖。如圖2所示,塗布液供給機構8係使用藉由體積變化而輸送塗布液之泵81,作為用以對噴嘴71輸送塗布液之輸送源。泵81例如可使用日本專利特開平10-61558號公報所記載之波紋管(bellows)型的泵。該泵81係具有於徑向上彈性膨脹伸縮自如之可撓性管811。該可撓性管811之一端係藉由配管82而與塗布液補充單元83相連接,另一端係藉由配管84而與噴嘴71連接。FIG. 2 is a diagram showing the structure of the coating liquid supply mechanism. As shown in FIG. 2 , the coating liquid supply mechanism 8 uses a pump 81 that delivers the coating liquid through volume change as a delivery source for delivering the coating liquid to the nozzle 71 . As the pump 81, for example, a bellows type pump described in Japanese Patent Application Laid-Open No. 10-61558 can be used. The pump 81 has a flexible tube 811 that is elastically expandable and contractible in the radial direction. One end of the flexible tube 811 is connected to the coating liquid replenishing unit 83 through a pipe 82 , and the other end is connected to the nozzle 71 through a pipe 84 .

於可撓性管811之外側,配置有於軸向上彈性變形自如之波紋管812。該波紋管812係具有小型波紋管部813與大型波紋管部814,於可撓性管811與波紋管812之間的泵室815,封入有非壓縮性媒體。此外,於小型波紋管部813與大型波紋管部814之間設置有作動盤部816。於作動盤部816連接有驅動部817。當驅動部817因應來自控制單元9之指令而作動時,作動盤部816係以既定之移動模式(表示相對於時間經過而作動盤部816之速度變化的模式)於軸向上位移,而使波紋管812之內側的容積變化。藉此,可撓性管811係於徑向上膨脹收縮而執行泵動作,其將自塗布液補充單元83適當地補給之塗布液朝向噴嘴71輸送。因此,作動盤部816之移動模式係與自噴嘴71吐出之塗布液的吐出特性(吐出壓力之時間變化)緊密地關聯,而可獲得與移動模式相應之既定吐出特性。Outside the flexible tube 811, a bellows 812 is arranged that is elastically deformable in the axial direction. This bellows 812 has a small bellows part 813 and a large bellows part 814, and a non-compressible medium is sealed in the pump chamber 815 between the flexible tube 811 and the bellows 812. In addition, an actuating disk portion 816 is provided between the small bellows portion 813 and the large bellows portion 814 . A driving part 817 is connected to the actuating plate part 816 . When the driving part 817 operates in response to the command from the control unit 9, the actuating disk part 816 is displaced in the axial direction in a predetermined movement pattern (a pattern indicating the speed change of the actuating disk part 816 with respect to the passage of time), causing ripples The volume inside tube 812 changes. Thereby, the flexible tube 811 expands and contracts in the radial direction to perform a pump operation, which transports the coating liquid appropriately supplied from the coating liquid replenishing unit 83 toward the nozzle 71 . Therefore, the movement pattern of the actuating disk portion 816 is closely related to the discharge characteristics (time change of the discharge pressure) of the coating liquid discharged from the nozzle 71, and predetermined discharge characteristics corresponding to the movement pattern can be obtained.

塗布液補充單元83係具有貯存塗布液之貯存箱831。該貯存箱831係藉由配管82而與泵81連接。此外,於配管82,插設有開閉閥833。該開閉閥833係因應來自控制單元9之補充指令而開啟,其可將貯存箱831內之塗布液補充至泵81之可撓性管811。相反地,其因應來自控制單元9之補充停止指令而關閉,而限制塗布液自貯存箱831朝泵81的可撓性管811作補充。The coating liquid replenishing unit 83 has a storage tank 831 for storing coating liquid. This storage tank 831 is connected to the pump 81 through a pipe 82 . In addition, an opening and closing valve 833 is inserted in the pipe 82 . The on-off valve 833 is opened in response to the replenishment command from the control unit 9, and can replenish the coating liquid in the storage tank 831 to the flexible tube 811 of the pump 81. On the contrary, it is closed in response to the replenishment stop command from the control unit 9 to limit replenishment of the coating liquid from the storage tank 831 to the flexible tube 811 of the pump 81 .

於連接在泵81之輸出側(同圖的左手側)的配管84,插設有開閉閥85,其因應來自控制單元9之開閉指令而進行開閉。藉此,可對塗布液朝噴嘴71之輸送與輸送停止進行切換。此外,於配管84,安裝有壓力計86,其對被輸送至噴嘴71之塗布液的壓力(吐出壓力)進行檢測,將該檢測結果(壓力值)輸出至控制單元9。An opening and closing valve 85 is inserted in the pipe 84 connected to the output side of the pump 81 (the left hand side in the figure), and opens and closes in response to an opening and closing command from the control unit 9 . Thereby, it is possible to switch between feeding and stopping the coating liquid to the nozzle 71 . In addition, a pressure gauge 86 is attached to the pipe 84 and detects the pressure (discharge pressure) of the coating liquid sent to the nozzle 71 and outputs the detection result (pressure value) to the control unit 9 .

如圖2所示,於如此自塗布液供給機構8被供給塗布液之噴嘴71,設置有用於以非接觸方式偵測基板S的浮起高度之浮起高度檢測用的感測器62。藉由該感測器62,可對浮起的基板S、與塗布平台32之平台面的上表面之離開距離進行測定,控制單元9對應於該檢測值而控制定位機構(省略圖示),藉此對噴嘴71下降之位置進行調整。再者,感測器62可使用光學式感測器、或超音波式感測器等。As shown in FIG. 2 , the nozzle 71 to which the coating liquid is supplied from the coating liquid supply mechanism 8 is provided with a floating height detection sensor 62 for detecting the floating height of the substrate S in a non-contact manner. The sensor 62 can measure the distance between the floating substrate S and the upper surface of the coating platform 32, and the control unit 9 controls the positioning mechanism (not shown) in response to the detected value. Thereby, the descending position of the nozzle 71 is adjusted. Furthermore, the sensor 62 may use an optical sensor, an ultrasonic sensor, or the like.

為了對噴嘴71進行既定之維護,如圖1所示,於塗布機構7設置有噴嘴洗淨待機單元72。噴嘴洗淨待機單元72主要係具有滾筒721、洗淨部722、滾筒槽723等。而且,藉由該等進行噴嘴洗淨及液滴形成,將噴嘴71之吐出口調整為適合於下一塗布處理之狀態。此外,使噴嘴71位在噴嘴洗淨待機單元72所設置之位置,亦即使其位在維護位置,為了對施加於塗布液之吐出壓力進行評價,而執行自噴嘴71吐出塗布液之模擬吐出。In order to perform predetermined maintenance on the nozzle 71, as shown in FIG. 1, the coating mechanism 7 is provided with a nozzle cleaning standby unit 72. The nozzle cleaning standby unit 72 mainly includes a drum 721, a cleaning part 722, a drum tank 723, and the like. Furthermore, by performing nozzle cleaning and droplet formation, the discharge port of the nozzle 71 is adjusted to a state suitable for the next coating process. In addition, the nozzle 71 is positioned at the position where the nozzle cleaning standby unit 72 is installed, that is, the maintenance position. In order to evaluate the discharge pressure applied to the coating liquid, a simulated discharge of the coating liquid from the nozzle 71 is performed.

進而,於塗布裝置1,具備有用以控制裝置各部分之動作的控制單元9(圖3)。圖3係表示控制單元的構成之一例的方塊圖。如圖3所示,控制單元9為電腦,其具備有運算部91、記憶部93及UI(User Interface,使用者介面)95。運算部91係由CPU(Central Processing Unit,中央處理單元)等構成之處理器,其係藉由執行吐出壓力評價程式97,而建構出執行吐出壓力之測定的測定執行部911、及對所測定之吐出壓力進行評價的壓力評價部913。記憶部93係HDD(Hard Disk Drive,硬式磁碟機)或SSD(Solid State Drive,固態硬碟)等記憶裝置,其係記憶上述之吐出壓力評價程式97、及隨著執行吐出壓力評價程式97而被測定之吐出壓力測定資料99。該吐出壓力評價程式97係例如由與控制單元9分開設置之記錄媒體M所提供。該記錄媒體M係記錄著可藉由電腦(控制單元9)讀出之吐出壓力評價程式97。該記錄媒體M例如可列舉有USB(Universal Serial Bus,通用序列匯流排)記憶體、記憶卡或外部之伺服器電腦的記憶裝置等。此外,UI 95係具有對使用者顯示資訊的顯示器、及受理使用者之輸入操作的輸入機器。具備有如此構成的控制單元9例如可使用桌上型、膝上型或平板型之各種電腦。Furthermore, the coating device 1 is provided with a control unit 9 (Fig. 3) for controlling the operation of each part of the device. FIG. 3 is a block diagram showing an example of the structure of the control unit. As shown in FIG. 3 , the control unit 9 is a computer and includes a computing unit 91 , a memory unit 93 and a UI (User Interface) 95 . The arithmetic unit 91 is a processor composed of a CPU (Central Processing Unit) and the like, and executes the discharge pressure evaluation program 97 to construct a measurement execution unit 911 that performs the measurement of the discharge pressure, and performs the measurement of the discharge pressure. The pressure evaluation unit 913 evaluates the discharge pressure. The memory unit 93 is a memory device such as HDD (Hard Disk Drive) or SSD (Solid State Drive), which stores the above-mentioned discharge pressure evaluation program 97 and executes the discharge pressure evaluation program 97 The measured discharge pressure measurement data is 99. This discharge pressure evaluation program 97 is provided by, for example, a recording medium M provided separately from the control unit 9 . This recording medium M records a discharge pressure evaluation program 97 that can be read by a computer (control unit 9). Examples of the recording medium M include a USB (Universal Serial Bus) memory, a memory card, or a memory device of an external server computer. In addition, the UI 95 has a display that displays information to the user and an input device that accepts the user's input operation. The control unit 9 having such a structure can be used in various computers such as desktop, laptop or tablet computers.

圖4係表示根據吐出壓力評價程式而執行之吐出壓力評價方法之一例的流程圖。在步驟S101中,測定執行部911係根據吐出壓力評價程式97所規定之移動模式而使作動盤部816移動,藉此,使塗布液自噴嘴71吐出(模擬吐出)。如此,整體上,作動盤部816若自速度零加速至既定之目標速度,則以目標速度進行等速移動,其後,自該目標速度減速至速度零。然而,如日本專利特開2020-040046號公報所示,在作動盤部816之速度達到最高速度後,至穩定於目標速度為止之局部的期間中,對作動盤部816之速度(參數)進行調整,而設定移動模式。FIG. 4 is a flowchart showing an example of a discharge pressure evaluation method executed based on a discharge pressure evaluation program. In step S101 , the measurement execution unit 911 moves the actuating plate 816 according to the movement pattern specified by the discharge pressure evaluation program 97 , thereby causing the coating liquid to be discharged from the nozzle 71 (simulated discharge). In this way, in general, when the actuating disk portion 816 accelerates from speed zero to a predetermined target speed, it moves at a constant speed at the target speed, and then decelerates from the target speed to speed zero. However, as shown in Japanese Patent Application Laid-Open No. 2020-040046, the speed (parameter) of the actuating plate portion 816 is adjusted during a partial period after the speed of the actuating plate portion 816 reaches the maximum speed and stabilizes at the target speed. Adjust while setting the movement mode.

具體而言,作動盤部816之移動模式在吐出壓力評價程式97中被規定為,吐出壓力以如下順序變化: ・吐出壓力自初期壓力Pi增加至較該初期壓力Pi為大之目標壓力Pt ・吐出壓力在目標壓力Pt穩定 ・吐出壓力自目標壓力Pt減少至初期壓力Pi Specifically, the movement pattern of the actuating disk portion 816 is defined in the discharge pressure evaluation program 97 so that the discharge pressure changes in the following sequence: ・The discharge pressure increases from the initial pressure Pi to the target pressure Pt which is greater than the initial pressure Pi. ・The discharge pressure is stable at the target pressure Pt ・The discharge pressure decreases from the target pressure Pt to the initial pressure Pi

進而,在步驟S101中,隨著作動盤部816之移動而自噴嘴71吐出塗布液,與此並行地,測定執行部911係以既定之取樣周期而周期性地取得壓力計86所測定之吐出壓力的測定值。如此,於自噴嘴71吐出塗布液之吐出期間Tt(圖5)中,取得對被賦予給塗布液之吐出壓力進行測定的結果,將其作為吐出壓力測定資料99而記憶在記憶部93。該吐出壓力測定資料99係將時刻與在該時刻測定之吐出壓力的值建立對應而加以表示。Furthermore, in step S101, the coating liquid is discharged from the nozzle 71 as the actuating plate part 816 moves. In parallel with this, the measurement execution part 911 periodically obtains the discharge measured by the pressure gauge 86 at a predetermined sampling cycle. Measured value of pressure. In this manner, during the discharge period Tt ( FIG. 5 ) when the coating liquid is discharged from the nozzle 71 , the measurement result of the discharge pressure given to the coating liquid is obtained and stored in the memory unit 93 as the discharge pressure measurement data 99 . The discharge pressure measurement data 99 represents time and the value of the discharge pressure measured at that time in association with each other.

在步驟S102中,壓力評價部913係依照既定之評價項目而對吐出壓力測定資料99所示之吐出壓力的時間變化進行評價。如後述般,該評價項目為,自吐出壓力測定資料99所示之吐出壓力的時間變化抽選出既定之特徵量,根據該特徵量而對吐出壓力之時間變化進行評價。接著,對於用以對吐出壓力測定資料99所示之吐出壓力的時間變化進行評價的各評價項目加以詳述。In step S102, the pressure evaluation unit 913 evaluates the temporal change of the discharge pressure shown in the discharge pressure measurement data 99 based on predetermined evaluation items. As will be described later, this evaluation item is to extract a predetermined feature value from the time change of the discharge pressure shown in the discharge pressure measurement data 99 and evaluate the time change of the discharge pressure based on the feature value. Next, each evaluation item for evaluating the time change of the discharge pressure shown in the discharge pressure measurement data 99 will be described in detail.

圖5係用以說明在吐出壓力之評價上使用的各期間的圖。在圖5中,以橫軸表示時刻且以縱軸表示吐出壓力,於該圖式中,示意地表示吐出壓力之時間變化。再者,相關圖式之標記在後述所揭示之各圖中皆相同。在圖5之例中,從開始自噴嘴71吐出塗布液前直至結束自噴嘴71吐出塗布液後(即,經歷吐出期間Tt之前後),取得吐出壓力測定資料99。再者,在本例中,自噴嘴71開始吐出塗布液之時刻ta之吐出壓力、及自噴嘴71結束吐出塗布液之時刻te之吐出壓力係為初期壓力Pi。但,吐出開始時及結束時其各個壓力並不限一直與初期壓力Pi一致。FIG. 5 is a diagram illustrating each period used for evaluation of discharge pressure. In FIG. 5 , the horizontal axis represents time and the vertical axis represents discharge pressure. In this figure, the time change of the discharge pressure is schematically shown. Furthermore, the labels of the relevant figures are the same in each figure disclosed later. In the example of FIG. 5 , the discharge pressure measurement data 99 is obtained from before starting to discharge the coating liquid from the nozzle 71 to after finishing the discharge of the coating liquid from the nozzle 71 (that is, before and after the discharge period Tt). In this example, the discharge pressure at the time ta when the nozzle 71 starts discharging the coating liquid and the discharge pressure at the time te when the nozzle 71 ends discharging the coating liquid are the initial pressure Pi. However, the respective pressures at the beginning and end of discharging are not necessarily always consistent with the initial pressure Pi.

如圖5所示,吐出期間Tt可分割為四個期間Ta、Tb、Tc、Td。上升期間Ta、遷移期間Tb、穩定期間Tc及落下期間Td之詳細內容係如下所述。As shown in FIG. 5 , the discharge period Tt can be divided into four periods Ta, Tb, Tc, and Td. The details of the rising period Ta, the transition period Tb, the stable period Tc, and the falling period Td are as follows.

上升期間Ta係從塗布液供給機構8開始自噴嘴71吐出塗布液之時刻ta(即,塗布液供給機構8開始移動作動盤部816之時刻ta)起,至吐出壓力到達目標壓力Pt之時刻tb為止的期間。亦即,於時刻ta,開始自噴嘴71吐出塗布液,而吐出壓力係於時刻ta至時刻tb之期間,自初期壓力Pi增加至目標壓力Pt。The rising period Ta is from the time ta when the coating liquid supply mechanism 8 starts to discharge the coating liquid from the nozzle 71 (that is, the time ta when the coating liquid supply mechanism 8 starts to move the actuating plate part 816) to the time tb when the discharge pressure reaches the target pressure Pt. period until. That is, at time ta, the coating liquid starts to be discharged from the nozzle 71, and the discharge pressure increases from the initial pressure Pi to the target pressure Pt during the period from time ta to time tb.

遷移期間Tb係自時刻tb起,經過既定的振動衰減期間至時刻tc為止的期間。該振動衰減期間係吐出壓力之時間變化穩定所需的期間,例如為由使用者對UI 95之輸入操作所設定,而被記憶於記憶部93。The transition period Tb is a period from time tb to time tc after passing through a predetermined vibration attenuation period. This vibration attenuation period is a period required for the time change of the discharge pressure to be stable, and is set by the user's input operation on the UI 95, for example, and is stored in the memory unit 93.

穩定期間Tc係自時刻tc起,至塗布液供給機構8開始減少吐出壓力之時刻td(即,塗布液供給機構8開始使作動盤部816自目標速度減速之時刻td)為止的期間。亦即,塗布液供給機構8係於時刻tc至時刻td之期間,使作動盤部816等速地移動,而於時刻td開始作動盤部816之減速。再者,於穩定期間Tc中,吐出壓力基本上穩定在目標壓力Pt。然而,於穩定期間Tc中,吐出壓力之時間變化仍含有微小之振動,吐出壓力係變得較目標壓力Pt為大或小。The stable period Tc is a period from time tc to time td when the coating liquid supply mechanism 8 starts reducing the discharge pressure (ie, time td when the coating liquid supply mechanism 8 starts decelerating the actuating disk portion 816 from the target speed). That is, the coating liquid supply mechanism 8 moves the actuating plate portion 816 at a constant speed from time tc to time td, and starts decelerating the actuating plate portion 816 at time td. Furthermore, during the stable period Tc, the discharge pressure is basically stabilized at the target pressure Pt. However, during the stable period Tc, the time change of the discharge pressure still contains slight vibrations, and the discharge pressure becomes larger or smaller than the target pressure Pt.

又,遷移期間Tb與穩定期間Tc構成定壓期間Tbc。亦即,定壓期間Tbc為時刻tb至時刻td之間的期間。In addition, the transition period Tb and the stable period Tc constitute a constant voltage period Tbc. That is, the constant pressure period Tbc is a period from time tb to time td.

落下期間Td係自時刻td起,至塗布液供給機構8結束自噴嘴71吐出塗布液之時刻te(即,塗布液供給機構8使作動盤部816停止之時刻te)為止的期間。亦即,吐出壓力係於時刻td至時刻te之間減少至初期壓力Pi,而於時刻te停止自噴嘴71吐出塗布液。The falling period Td is a period from time td to time te when the coating liquid supply mechanism 8 ends discharging the coating liquid from the nozzle 71 (that is, time te when the coating liquid supply mechanism 8 stops the actuating plate part 816). That is, the discharge pressure decreases to the initial pressure Pi between time td and time te, and the discharge of the coating liquid from the nozzle 71 stops at time te.

圖6係示意地表示對於吐出壓力之時間變化而壓力評價部執行運算之一例的圖。如圖6所示,壓力評價部913係以時間對吐出壓力之時間變化進行微分,藉此而計算出吐出壓力之時間變化的一次微分D1。進而,壓力評價部913係以時間對吐出壓力之時間變化的一次微分D1進行微分,藉此而計算出吐出壓力之時間變化的二次微分D2。此外,壓力評價部913係根據下列各數式而計算出平均絕對誤差MAE(Mean Absolute Error)及均方根誤差RMSE(Root Mean Square Error): MAE(α,β)=(1/n)・(Σ |α-β| ) RMSE(α,β)=((1/n)・(Σ (α-β) 2)) 1/2n=資料數 FIG. 6 is a diagram schematically showing an example of calculation performed by the pressure evaluation unit with respect to temporal changes in discharge pressure. As shown in FIG. 6 , the pressure evaluation unit 913 differentiates the time change of the discharge pressure with time, thereby calculating the first differential D1 of the time change of the discharge pressure. Furthermore, the pressure evaluation unit 913 differentiates the first differential D1 of the time change of the discharge pressure with time, thereby calculating the second differential D2 of the time change of the discharge pressure. In addition, the pressure evaluation unit 913 calculates the mean absolute error MAE (Mean Absolute Error) and the root mean square error RMSE (Root Mean Square Error) based on the following equations: MAE (α, β) = (1/n)・(Σ |α-β| ) RMSE(α,β)=((1/n)・(Σ (α-β) 2 )) 1/2 n=Number of data

圖7係用以說明根據特徵量Fv1對吐出壓力之時間變化進行評價的評價項目的圖。圖7之評價項目係,根據梯形波形與吐出壓力測定資料99之誤差(理想梯形絕對誤差),對吐出壓力測定資料99所示之吐出壓力的時間變化進行評價,其中,該梯形波形所具有之振幅係相當於,穩定期間Tc中吐出壓力的平均值(即穩定壓力Pm)與初期壓力Pi之差。FIG. 7 is a diagram for explaining evaluation items for evaluating the time change of the discharge pressure based on the characteristic amount Fv1. The evaluation item in Figure 7 is to evaluate the time change of the discharge pressure shown in the discharge pressure measurement data 99 based on the error (ideal trapezoidal absolute error) between the trapezoidal waveform and the discharge pressure measurement data 99. Among them, the trapezoidal waveform has The amplitude corresponds to the difference between the average discharge pressure during the stable period Tc (that is, the stable pressure Pm) and the initial pressure Pi.

具體而言,在上升期間Ta中,對既定的下側基準壓力、及較該下側基準壓力為大之既定的上側基準壓力之間的吐出壓力之時間變化被執行線性回歸分析,計算出上升回歸直線Lr_R。該上升回歸直線Lr_R係在時刻t11至時刻t12之間,自初期壓力Pi線性地增加至穩定壓力Pm。Specifically, during the rise period Ta, a linear regression analysis is performed on the time change of the discharge pressure between a predetermined lower reference pressure and a predetermined upper reference pressure that is greater than the lower reference pressure, and the rise is calculated. Regression straight line Lr_R. This rising regression line Lr_R increases linearly from the initial pressure Pi to the stable pressure Pm between time t11 and time t12.

同樣地,在落下期間Td中,對上側基準壓力與下側基準壓力之間的吐出壓力之時間變化被執行線性回歸分析,計算出落下回歸直線Lr_F。該落下回歸直線Lr_F係在時刻t13至時刻t14之間,自穩定壓力Pm線性地減少至初期壓力Pi。Similarly, during the drop period Td, linear regression analysis is performed on the time change of the discharge pressure between the upper reference pressure and the lower reference pressure, and the drop regression straight line Lr_F is calculated. This drop regression line Lr_F linearly decreases from the stable pressure Pm to the initial pressure Pi between time t13 and time t14.

再者,下側基準壓力及上側基準壓力係較初期壓力Pi為大而較目標壓力Pt為小之壓力,其例如為由使用者對UI 95之輸入操作所設定,而被記憶在記憶部93。在本例中,下側基準壓力係將初期壓力Pi與目標壓力Pt之差的絕對值之20%之壓力加進至初期壓力Pi而成的壓力,上側基準壓力係將初期壓力Pi與目標壓力Pt之差的絕對值之80%之壓力加進至初期壓力Pi而成的壓力。Furthermore, the lower reference pressure and the upper reference pressure are pressures that are larger than the initial pressure Pi and smaller than the target pressure Pt. They are set by the user's input operation on the UI 95, for example, and are memorized in the memory unit 93. . In this example, the lower reference pressure is a pressure obtained by adding 20% of the absolute value of the difference between the initial pressure Pi and the target pressure Pt to the initial pressure Pi. The upper reference pressure is a pressure obtained by adding the initial pressure Pi and the target pressure Pt. The pressure obtained by adding 80% of the absolute value of the difference between Pt to the initial pressure Pi.

此外,對於時刻ta至時刻t11之區間,設定開始時近似直線Lr_s。該開始時近似直線Lr_s係表示初期壓力Pi之斜率為零的直線。亦即,開始時近似直線Lr_s係從開始自噴嘴71吐出塗布液之時間點(時刻ta)起,連接至上升回歸直線Lr_R之開始時間點的直線。再者,依照回歸直線之狀態(斜率),而有時刻t11較時刻ta更前面之情形,亦有時刻t12較時刻tb更後面之情形。其結果,當成為t11<ta時,被省略開始時近似直線Lr_s。In addition, for the interval from time ta to time t11, an approximate straight line Lr_s is set at the beginning. The initial approximate straight line Lr_s is a straight line indicating that the slope of the initial pressure Pi is zero. That is, the initial approximate straight line Lr_s is a straight line connected from the time point (time ta) when the coating liquid is discharged from the nozzle 71 to the start time point of the rising regression line Lr_R. Furthermore, depending on the state (slope) of the regression line, time t11 may be earlier than time ta, and time t12 may be later than time tb. As a result, when t11<ta is satisfied, the initial approximation straight line Lr_s is omitted.

此外,對時刻t14至時刻te之區間,設定結束時近似直線Lr_e。該結束時近似直線Lr_e係表示初期壓力Pi之斜率為零的直線。亦即,結束時近似直線Lr_e係從落下回歸直線Lr_F之結束時間點起,連接至結束自噴嘴71吐出塗布液之時間點(時刻te)的直線。再者,當成為te<t14時,被省略結束時近似直線Lr_e。In addition, for the interval from time t14 to time te, the end approximation straight line Lr_e is set. The end-time approximate straight line Lr_e is a straight line indicating that the slope of the initial pressure Pi is zero. That is, the end-time approximate straight line Lr_e is a straight line connecting from the end time point of falling into the regression straight line Lr_F to the time point (time te) when the discharge of the coating liquid from the nozzle 71 is completed. Furthermore, when te<t14 is satisfied, the end-time approximation straight line Lr_e is omitted.

進而,對於時刻t12至時刻t13之區間,設定穩定直線Lr_m。該穩定直線Lr_m係表示穩定壓力Pm之斜率為零的直線。亦即,穩定直線Lr_m係將上升回歸直線Lr_R之結束時間點(時刻t12)與落下回歸直線Lr_F之開始時間點(時刻t13)加以連接而表示穩定壓力Pm的直線。Furthermore, a stable straight line Lr_m is set for the interval from time t12 to time t13. The stable straight line Lr_m is a straight line indicating the stable pressure Pm with a slope of zero. That is, the stable straight line Lr_m is a straight line that connects the end time point (time t12) of the rising regression straight line Lr_R and the starting time point (time t13) of the falling regression straight line Lr_F and represents the stable pressure Pm.

如此,計算出在時序上排列之由開始時近似直線Lr_s、上升回歸直線Lr_R、穩定直線Lr_m、落下回歸直線Lr_F及結束時近似直線Lr_e所構成的近似波形WF1。接著,壓力評價部913則計算出,自時刻ta至時刻te為止之吐出期間Tt全體中,吐出壓力測定資料99與近似波形WF1之間的平均絕對誤差MAE(理想梯形絕對誤差),作為特徵量Fv1。此外,壓力評價部913係根據既定之臨限值Th1(例如0.05),將特徵量Fv1正規化為0以上且2以下之範圍。具體而言,根據下列數式,將特徵量Fv1轉換為經標準化後之特徵量Fv1(即評價值V1): 若Fv1<Th1,則Fv1=0 若Fv1≧Th1,則Fv1=(Fv1+1-Th1)×c1 在此,係數c1為標準化係數,其係預先設定為使特徵量Fv1收斂在2以下之範圍的值(例如15)。 In this way, the approximate waveform WF1 composed of the starting approximate straight line Lr_s, the rising regression straight line Lr_R, the stable straight line Lr_m, the falling regression straight line Lr_F and the ending approximate straight line Lr_e arranged in time series is calculated. Next, the pressure evaluation unit 913 calculates the mean absolute error MAE (ideal trapezoidal absolute error) between the discharge pressure measurement data 99 and the approximate waveform WF1 in the entire discharge period Tt from time ta to time te as a feature quantity. Fv1. In addition, the pressure evaluation unit 913 normalizes the feature value Fv1 to a range of 0 or more and 2 or less based on a predetermined threshold value Th1 (for example, 0.05). Specifically, the feature quantity Fv1 is converted into the standardized feature quantity Fv1 (ie, the evaluation value V1) according to the following mathematical formula: If Fv1<Th1, then Fv1=0 If Fv1≧Th1, then Fv1=(Fv1+1-Th1)×c1 Here, the coefficient c1 is a standardized coefficient, which is set in advance to a value (for example, 15) in a range in which the feature value Fv1 converges to 2 or less.

如根據圖7之特徵量Fv1的評價,當吐出期間Tt全體中吐出壓力的時間變化大大地自理想形狀(即梯形形狀)偏離時,則可對該吐出壓力賦予較大之分數(即,較差之評價)。According to the evaluation of the characteristic value Fv1 in FIG. 7 , when the time change of the discharge pressure in the entire discharge period Tt greatly deviates from the ideal shape (i.e., trapezoidal shape), a larger score (i.e., poorer) can be assigned to the discharge pressure. evaluation).

圖8係用以說明根據特徵量Fv2對吐出壓力之時間變化進行評價的評價項目的圖。圖8之評價項目係對吐出壓力之上升的平滑度進行評價。具體而言,對於上升期間Ta中,下側基準壓力P2_l、及較該下側基準壓力P2_l為大之上側基準壓力P2_u之間的吐出壓力之時間變化被執行曲線回歸分析,而計算出上升回歸曲線Nr。該曲線回歸分析係藉由二次曲線來執行。FIG. 8 is a diagram for explaining evaluation items for evaluating the time change of the discharge pressure based on the characteristic amount Fv2. The evaluation items in Figure 8 evaluate the smoothness of the increase in discharge pressure. Specifically, during the rise period Ta, a curve regression analysis is performed on the time change in the discharge pressure between the lower reference pressure P2_l and the upper reference pressure P2_u which is greater than the lower reference pressure P2_l, and the rise regression is calculated Curve Nr. The curve regression analysis is performed using a quadratic curve.

下側基準壓力P2_l係被設定為初期壓力Pi。另一方面,上側基準壓力P2_u係較下側基準壓力P2_l為大且較目標壓力Pt為小之壓力,其例如由使用者對UI 95之輸入操作所設定,而被記憶在記憶部93。在本例中,上側基準壓力P2_u係將初期壓力Pi與目標壓力Pt之差的絕對值之20%的壓力加進至初期壓力Pi所成的壓力。該上升回歸曲線Nr係在時刻t21至時刻t22之間,自下側基準壓力P2_l(初期壓力Pi)增加至上側基準壓力P2_u。再者,時刻t21與時刻ta一致,時刻t22為在時刻ta之後且在時刻tb之前的時刻。The lower reference pressure P2_1 is set as the initial pressure Pi. On the other hand, the upper reference pressure P2_u is a pressure that is greater than the lower reference pressure P2_l and smaller than the target pressure Pt. It is set by the user's input operation on the UI 95 and is stored in the memory unit 93, for example. In this example, the upper reference pressure P2_u is a pressure obtained by adding 20% of the absolute value of the difference between the initial pressure Pi and the target pressure Pt to the initial pressure Pi. This rising regression curve Nr increases from the lower reference pressure P2_l (initial pressure Pi) to the upper reference pressure P2_u between time t21 and time t22. Furthermore, time t21 coincides with time ta, and time t22 is a time after time ta and before time tb.

如此,計算出由上升回歸曲線Nr所構成的波形WF2。接著,壓力評價部913計算出,自時刻t21至時刻t22為止之上升初期期間Ta_s中,吐出壓力測定資料99與波形WF2之間的均方根誤差RMSE,作為特徵量Fv2。此外,壓力評價部913係根據既定之臨限值Th2(例如0.05),將特徵量Fv2正規化為0以上且2以下之範圍。具體而言,根據下列數式,將特徵量Fv2轉換為經標準化後之特徵量Fv2(即評價值V2): 若Fv2<Th2,則Fv2=0 若Fv2≧Th2,則Fv2=2 In this way, the waveform WF2 composed of the rising regression curve Nr is calculated. Next, the pressure evaluation unit 913 calculates the root mean square error RMSE between the output pressure measurement data 99 and the waveform WF2 in the initial rise period Ta_s from time t21 to time t22 as the feature amount Fv2. In addition, the pressure evaluation unit 913 normalizes the feature value Fv2 to a range of 0 or more and 2 or less based on a predetermined threshold value Th2 (for example, 0.05). Specifically, the feature quantity Fv2 is converted into the standardized feature quantity Fv2 (ie, the evaluation value V2) according to the following mathematical formula: If Fv2<Th2, then Fv2=0 If Fv2≧Th2, then Fv2=2

如根據圖8之特徵量Fv2的評價,當開始自噴嘴71吐出塗布液前之狀態受到影響,而在吐出剛開始後之吐出壓力產生異常時,其可對該吐出壓力賦予較大之分數(即,較差之評價)。再者,可使用於曲線回歸分析之曲線並不受限於二次曲線,亦可為指數函數等其他曲線。For example, based on the evaluation of the characteristic value Fv2 in FIG. 8 , when the state before starting to discharge the coating liquid from the nozzle 71 is affected and the discharge pressure immediately after the start of discharge is abnormal, a large score can be given to the discharge pressure ( that is, a poor evaluation). Furthermore, the curves that can be used for curve regression analysis are not limited to quadratic curves, and can also be other curves such as exponential functions.

圖9係用以說明根據特徵量Fv3對吐出壓力之時間變化進行評價的評價項目的圖。圖9之評價項目係對上升期間Ta是否收斂於一定期間內進行評價。具體而言,壓力評價部913係計算出,吐出壓力自初期壓力Pi朝目標壓力Pt增大所需要之自時刻ta至時刻tb為止的上升期間Ta之長度(=tb-ta),作為特徵量Fv3。此外,壓力評價部913係根據既定之臨限值Th3(例如350ms),將特徵量Fv3正規化為0以上且1以下之範圍。具體而言,根據下列數式,將特徵量Fv3轉換為經標準化後之特徵量Fv3(即評價值V3): 若Fv3<Th3,則Fv3=0 若Fv3≧Th3,則Fv3=1 FIG. 9 is a diagram for explaining evaluation items for evaluating the time change of the discharge pressure based on the characteristic amount Fv3. The evaluation items in Figure 9 evaluate whether the rising period Ta converges within a certain period. Specifically, the pressure evaluation unit 913 calculates the length of the rising period Ta from time ta to time tb (=tb-ta) required for the discharge pressure to increase from the initial pressure Pi toward the target pressure Pt as a characteristic amount. Fv3. In addition, the pressure evaluation unit 913 normalizes the feature value Fv3 to a range of 0 or more and 1 or less based on a predetermined threshold value Th3 (for example, 350 ms). Specifically, the feature quantity Fv3 is converted into the standardized feature quantity Fv3 (ie, the evaluation value V3) according to the following mathematical formula: If Fv3<Th3, then Fv3=0 If Fv3≧Th3, then Fv3=1

如根據圖9之特徵量Fv3的評價,可對上升至目標壓力Pt為止需要時間的吐出壓力賦予較大之分數(即,較差之評價)。For example, based on the evaluation of the feature value Fv3 in FIG. 9 , a larger score (that is, a poor evaluation) can be given to the discharge pressure that takes time to rise to the target pressure Pt.

圖10A係用以說明根據特徵量Fv4對吐出壓力之時間變化進行評價的評價項目的圖,圖10B係表示藉由根據特徵量Fv4之評價而判斷為不適當的吐出壓力之時間變化例的圖。圖10A之評價項目係對吐出壓力之上升中有無異常進行評價。具體而言,壓力評價部913對於自時刻ta至時刻tb為止之上升期間Ta,計算出吐出壓力之時間變化的一次微分D1,而求出一次微分波形WF4。FIG. 10A is a diagram illustrating evaluation items for evaluating the temporal change of the discharge pressure based on the characteristic amount Fv4. FIG. 10B is a diagram showing an example of the temporal variation of the discharge pressure determined to be inappropriate based on the evaluation based on the characteristic amount Fv4. . The evaluation item in Fig. 10A evaluates whether there is any abnormality in the increase in discharge pressure. Specifically, the pressure evaluation unit 913 calculates the first differential D1 of the time change of the discharge pressure for the rising period Ta from time ta to time tb, and obtains the first differential waveform WF4.

接著,壓力評價部913係於上升期間Ta中,求出一次微分波形WF4與既定的臨限值Th4交叉之次數,作為特徵量Fv4。在圖10A之例中,一次微分波形WF4與臨限值Th4(例如0.002)係在時刻t41及時刻t42各者交叉,交叉次數(特徵量Fv4)為兩次。此外,壓力評價部913係將特徵量Fv4正規化為0以上且1以下之範圍。具體而言,根據下列數式,將特徵量Fv4轉換為經標準化後之特徵量Fv4(即評價值V4): 若Fv4≦2,則Fv4=0 若Fv4>2,則Fv4=1 Next, the pressure evaluation unit 913 determines the number of times the primary differential waveform WF4 crosses the predetermined threshold value Th4 during the rising period Ta as the characteristic amount Fv4. In the example of FIG. 10A , the primary differential waveform WF4 and the threshold value Th4 (for example, 0.002) cross each other at time t41 and time t42, and the number of crossings (feature amount Fv4) is two. In addition, the stress evaluation unit 913 normalizes the feature value Fv4 to a range of 0 or more and 1 or less. Specifically, the feature quantity Fv4 is converted into the standardized feature quantity Fv4 (ie, the evaluation value V4) according to the following mathematical formula: If Fv4≦2, then Fv4=0 If Fv4>2, then Fv4=1

根據圖10A之特徵量Fv4的評價,於上升期間Ta中吐出壓力的時間變化產生台階時(例如,如圖10B所示),可對該吐出壓力賦予較大之分數(即,較差之評價)。Based on the evaluation of the characteristic amount Fv4 in FIG. 10A , when a step occurs in the time change of the discharge pressure during the rising period Ta (for example, as shown in FIG. 10B ), a larger score (that is, a poor evaluation) can be given to the discharge pressure. .

圖11A係用以說明根據特徵量Fv5對吐出壓力之時間變化進行評價的評價項目的圖,圖11B係表示藉由根據特徵量Fv5之評價而判斷為不適當的吐出壓力之時間變化例的圖。圖11A之評價項目係對吐出壓力之上升中有無異常進行評價。具體而言,壓力評價部913對於自時刻ta至時刻tb為止之上升期間Ta,計算出吐出壓力之時間變化的二次微分D2,而求出二次微分波形WF5。FIG. 11A is a diagram illustrating evaluation items for evaluating the temporal change of the discharge pressure based on the characteristic amount Fv5. FIG. 11B is a diagram showing an example of the temporal variation of the discharge pressure determined to be inappropriate based on the evaluation based on the characteristic amount Fv5. . The evaluation item in Figure 11A evaluates whether there is any abnormality in the increase in discharge pressure. Specifically, the pressure evaluation unit 913 calculates the second-order differential D2 of the time change of the discharge pressure for the rising period Ta from time ta to time tb, and obtains the second-order differential waveform WF5.

接著,壓力評價部913求出,於上升期間Ta中,二次微分波形WF5之絕對值與既定的臨限值Th5交叉之次數,作為特徵量Fv5。在圖11A之例中,二次微分波形WF5之絕對值與臨限值Th5(例如0.0002)係在時刻t51、t52、t53及t54各者交叉,交叉次數(特徵量Fv5)為四次。此外,壓力評價部913係將特徵量Fv5正規化為0以上且1以下之範圍。具體而言,根據下列數式,將特徵量Fv5轉換為經標準化後之特徵量Fv5(即評價值V5): 若Fv5=4,則Fv5=0 若Fv5≠4,則Fv5=1 Next, the pressure evaluation unit 913 determines the number of times the absolute value of the second-order differential waveform WF5 crosses the predetermined threshold value Th5 during the rising period Ta as the characteristic amount Fv5. In the example of FIG. 11A , the absolute value of the second-order differential waveform WF5 intersects with the threshold value Th5 (for example, 0.0002) at each of times t51, t52, t53, and t54, and the number of intersections (feature amount Fv5) is four. In addition, the stress evaluation unit 913 normalizes the feature value Fv5 to a range of 0 or more and 1 or less. Specifically, the feature quantity Fv5 is converted into the standardized feature quantity Fv5 (ie, the evaluation value V5) according to the following mathematical formula: If Fv5=4, then Fv5=0 If Fv5≠4, then Fv5=1

根據圖11A之特徵量Fv5的評價,於上升期間Ta中吐出壓力的時間變化產生台階時(例如,如圖11B所示),可對該吐出壓力賦予較大之分數(即,較差之評價)。Based on the evaluation of the characteristic amount Fv5 in FIG. 11A , when a step occurs in the time change of the discharge pressure during the rising period Ta (for example, as shown in FIG. 11B ), a larger score (that is, a poor evaluation) can be given to the discharge pressure. .

圖12係用以說明根據特徵量Fv6而對吐出壓力之時間變化進行評價的評價項目的圖。圖12之評價項目係對於吐出壓力之上升是否在後半未有失速進行評價。具體而言,壓力評價部913對於自時刻ta至時刻tb為止之上升期間Ta,計算出吐出壓力之時間變化的二次微分D2,而求出二次微分波形WF6。FIG. 12 is a diagram for explaining evaluation items for evaluating the time change of the discharge pressure based on the characteristic amount Fv6. The evaluation items in Figure 12 evaluate whether the increase in discharge pressure does not stall in the second half. Specifically, the pressure evaluation unit 913 calculates the second-order differential D2 of the time change of the discharge pressure for the rising period Ta from time ta to time tb, and obtains the second-order differential waveform WF6.

接著,壓力評價部913係於上升期間Ta中分別求出:二次微分波形WF6變得較既定之正臨限值(Th5)更大的時間T_1st、及二次微分波形WF6變得較既定之負臨限值(-Th5)更小的時間T_2nd。在此,正臨限值與負臨限值係具有相同之絕對值(Th5),並具有互不相同之符號。該正臨限值及負臨限值之絕對值(Th5)係與在上述特徵量Fv5所進行之評價中使用的臨限值Th5的絕對值相等。接著,壓力評價部913求出該等時間之比(=T_1st/T_2nd),以作為特徵量Fv6。進而,壓力評價部913係根據下列數式,將特徵量Fv6加以轉換: Fv6=|1-Fv6| Next, the pressure evaluation unit 913 calculates the time T_1st when the second-order differential waveform WF6 becomes larger than the predetermined positive threshold value (Th5) and the second-order differential waveform WF6 when it becomes larger than the predetermined positive threshold value (Th5) during the rising period Ta. The negative threshold value (-Th5) is the smaller time T_2nd. Here, the positive threshold value and the negative threshold value have the same absolute value (Th5) and have different signs. The absolute values (Th5) of the positive threshold value and the negative threshold value are equal to the absolute value of the threshold value Th5 used in the evaluation of the feature quantity Fv5. Next, the pressure evaluation unit 913 obtains the ratio of these times (=T_1st/T_2nd) as the feature amount Fv6. Furthermore, the pressure evaluation unit 913 converts the feature amount Fv6 according to the following equation: Fv6=|1-Fv6|

此外,壓力評價部913使用既定之臨限值Th6(例如0.2),將如此轉換後之特徵量Fv6正規化為0以上且2以下之範圍。具體而言,根據下列數式,將特徵量Fv6轉換為經標準化後之特徵量Fv6(即評價值V6): 若Fv6<Th6,則Fv6=0 若Fv6≧Th6,則Fv6=f(Fv6) f(γ)=4×γ-0.8 再者,將γ作為變數之函數f(γ),並不限於本例,其可任意地變更。 In addition, the pressure evaluation unit 913 normalizes the thus converted feature amount Fv6 to a range of 0 or more and 2 or less using a predetermined threshold value Th6 (for example, 0.2). Specifically, the feature quantity Fv6 is converted into the standardized feature quantity Fv6 (ie, the evaluation value V6) according to the following mathematical formula: If Fv6<Th6, then Fv6=0 If Fv6≧Th6, then Fv6=f(Fv6) f(γ)=4×γ-0.8 In addition, the function f(γ) using γ as a variable is not limited to this example, and it can be changed arbitrarily.

作為塗布液之塗布對象的基板S之搬送速度係,即使於加速期間之後半仍未失速而到達之目標速度。因此,被賦予給塗布液之吐出壓力也在上升期間Ta中未有失速而到達目標壓力Pt較佳。相對於此,根據圖12之特徵量Fv6的評價,於上升期間Ta中吐出壓力失速時,可對該吐出壓力賦予較大之分數(即,較差之評價)。The conveyance speed of the substrate S to be coated with the coating liquid is a target speed that is reached without stalling even in the second half of the acceleration period. Therefore, it is preferable that the discharge pressure given to the coating liquid reaches the target pressure Pt without stalling during the rising period Ta. On the other hand, according to the evaluation of the characteristic amount Fv6 in FIG. 12 , when the discharge pressure stalls during the rising period Ta, a large score (that is, a poor evaluation) can be given to the discharge pressure.

圖13係用以說明根據特徵量Fv7而對吐出壓力之時間變化進行評價的評價項目的圖。圖13之評價項目係對上升結束時吐出壓力之時間變化的銳利度進行評價。具體而言,對於上升期間Ta中,下側基準壓力P7_l、及較該下側基準壓力P7_l為大之上側基準壓力P7_u之間的吐出壓力之時間變化,執行直線回歸分析,而計算出上升終期回歸直線Lr。在此,下側基準壓力P7_l係將初期壓力Pi與目標壓力Pt之差的絕對值之80%之壓力加入至初期壓力Pi所成的壓力,上側基準壓力P7_u係將初期壓力Pi與目標壓力Pt之差的絕對值之90%之壓力加入至初期壓力Pi所成的壓力,吐出壓力係於時刻t71至時刻t72之間,自下側基準壓力P7_l朝上側基準壓力P7_u增大。FIG. 13 is a diagram for explaining evaluation items for evaluating the time change of the discharge pressure based on the characteristic amount Fv7. The evaluation items in Figure 13 evaluate the sharpness of the time change of the discharge pressure at the end of the rise. Specifically, linear regression analysis is performed on the time change of the discharge pressure between the lower reference pressure P7_l and the upper reference pressure P7_u which is greater than the lower reference pressure P7_l during the rising period Ta, and the rising end period is calculated Regression straight line Lr. Here, the lower reference pressure P7_l is a pressure obtained by adding 80% of the absolute value of the difference between the initial pressure Pi and the target pressure Pt to the initial pressure Pi, and the upper reference pressure P7_u is a pressure obtained by adding the initial pressure Pi and the target pressure Pt The discharge pressure is the pressure obtained by adding 90% of the absolute value of the difference to the initial pressure Pi. The discharge pressure increases from the lower reference pressure P7_l toward the upper reference pressure P7_u between time t71 and time t72.

該上升終期回歸直線Lr係隨著時間經過而增大,而於時刻t73到達穩定壓力Pm(穩定期間Tc中吐出壓力的平均值)。如此,對於時刻t71至時刻t73之區間,設定上升終期回歸直線Lr。進而,壓力評價部913設定有,於時刻t73至時刻tb之間表示穩定壓力Pm之斜率為零的延伸直線Lm。如上述般,時刻tb係吐出壓力到達目標壓力Pt之時刻,其相當於上升期間Ta之結束時刻。亦即,該延伸直線Lm係設置成,自上升終期回歸直線Lr(之結束時間點)延伸至上升期間Ta之結束時間點。再者,於tb<t73時,被省略延伸直線Lm。This rise-end regression line Lr increases as time passes, and reaches the stable pressure Pm (the average value of the discharge pressure during the stable period Tc) at time t73. In this way, the rising terminal regression straight line Lr is set for the interval from time t71 to time t73. Furthermore, the pressure evaluation unit 913 sets an extended straight line Lm with a slope of zero indicating the stable pressure Pm between time t73 and time tb. As mentioned above, time tb is the time when the discharge pressure reaches the target pressure Pt, which corresponds to the end time of the rising period Ta. That is, the extended straight line Lm is set to extend from (the end time point of) the rise final regression straight line Lr to the end time point of the rise period Ta. In addition, when tb<t73, the extended straight line Lm is omitted.

如此,計算出在時序上排列由上升終期回歸直線Lr及延伸直線Lm所構成的近似波形WF7。接著,壓力評價部913係計算出,自吐出壓力成為目標壓力Pt之90%的時刻t72起至成為100%的時刻tb為止之上升終期期間Ta_e中,表示吐出壓力測定資料99與近似波形WF7間之差的值,以作為特徵量Fv7。具體而言,設定有權重基準時間寬度Tw=t73-t72。接著,根據下列數式,計算出附加權重均方根誤差和: Fv7=(Σ(P_measure-WF7) 2×W) 1/2P_measure=吐出壓力測定資料99 在時刻tb≦t73+2×Tw之範圍,W=1 在時刻tb>t73+2×Tw之範圍,W=w w係較1為大之權重係數,例如10 In this way, the approximate waveform WF7 composed of the rising terminal regression straight line Lr and the extension straight line Lm is arranged in time series is calculated. Next, the pressure evaluation unit 913 calculates, in the rising end period Ta_e from the time t72 when the discharge pressure reaches 90% of the target pressure Pt to the time tb when it reaches 100%, the distance between the discharge pressure measurement data 99 and the approximate waveform WF7 The difference value is taken as the feature quantity Fv7. Specifically, the weighted reference time width Tw=t73-t72 is set. Then, calculate the sum of additional weighted root mean square errors according to the following equation: Fv7=(Σ(P_measure-WF7) 2 ×W) 1/2 P_measure=Discharge pressure measurement data 99 At time tb≦t73+2×Tw Range, W=1 In the range of time tb>t73+2×Tw, W=w w is a weight coefficient larger than 1, such as 10

此外,壓力評價部913係根據既定之臨限值Th7(例如0.6),將特徵量Fv7正規化為0以上且2以下之範圍。具體而言,根據下列數式,將特徵量Fv7轉換為經標準化後之特徵量Fv7(即評價值V7): 若Fv7<Th7,則Fv7=0 若Fv7≧Th7,則Fv7=Fv7/c7 c7係任意之正的常數,例如1.1 In addition, the pressure evaluation unit 913 normalizes the feature value Fv7 to a range of 0 or more and 2 or less based on a predetermined threshold value Th7 (for example, 0.6). Specifically, the feature quantity Fv7 is converted into the standardized feature quantity Fv7 (ie, the evaluation value V7) according to the following mathematical formula: If Fv7<Th7, then Fv7=0 If Fv7≧Th7, then Fv7=Fv7/c7 c7 is any positive constant, such as 1.1

如根據圖13之特徵量Fv7的評價,當上升之氣勢微弱,而吐出壓力之時間變化顯示帶有圓角的波形時,則可對該吐出壓力賦予較大之分數(即,較差之評價)。For example, according to the evaluation of the characteristic quantity Fv7 in Figure 13, when the rising momentum is weak and the time change of the discharge pressure shows a waveform with rounded corners, a larger score (ie, a poor evaluation) can be assigned to the discharge pressure. .

圖14係用以說明根據特徵量Fv8而對吐出壓力之時間變化進行評價的評價項目的圖。圖14之評價項目係對在吐出壓力之上升中產生之過衝的程度進行評價。具體而言,壓力評價部913求出,於吐出壓力達到最大值Pmax之時刻t81中,吐出壓力之二次微分D2的符號(正/負)。接著,壓力評價部913計算出,吐出壓力之二次微分D2的符號自時刻t81之符號切換兩次的時刻t82。接著,對於自時刻t81至時刻t82為止之初期振動期間Tb_s中吐出壓力的時間變化進行評價。FIG. 14 is a diagram for explaining evaluation items for evaluating the time change of the discharge pressure based on the characteristic amount Fv8. The evaluation items in Figure 14 evaluate the degree of overshoot that occurs when the discharge pressure increases. Specifically, the pressure evaluation unit 913 obtains the sign (positive/negative) of the second derivative D2 of the discharge pressure at time t81 when the discharge pressure reaches the maximum value Pmax. Next, the pressure evaluation unit 913 calculates time t82 when the sign of the second derivative D2 of the discharge pressure switches twice from the sign at time t81. Next, the time change of the discharge pressure in the initial vibration period Tb_s from time t81 to time t82 is evaluated.

具體而言,求出該初期振動期間Tb_s中吐出壓力之時間變化的最小值P8min,將穩定壓力Pm及壓力P8min中較小之壓力選擇為對象壓力Pg。接著,根據最大壓力Pmax與對象壓力Pg之差,即下列數式而計算出特徵量Fv8: Fv8=Pmax-Pg Specifically, the minimum value P8min of the time change of the discharge pressure in the initial vibration period Tb_s is found, and the smaller of the stable pressure Pm and the pressure P8min is selected as the target pressure Pg. Next, the characteristic amount Fv8 is calculated based on the difference between the maximum pressure Pmax and the target pressure Pg, that is, the following equation: Fv8=Pmax-Pg

進而,壓力評價部913使用既定之臨限值Th8(例如0.035),將特徵量Fv8正規化為0以上且2以下之範圍。具體而言,根據下列數式,將特徵量Fv8轉換為經標準化後之特徵量Fv8(即評價值V8): 若Fv8<Th8,則Fv8=0 若Fv8≧Th8,則Fv8=Fv8/c8 c8係任意之正的常數,例如0.12 Furthermore, the pressure evaluation unit 913 normalizes the feature value Fv8 to a range of 0 or more and 2 or less using a predetermined threshold value Th8 (for example, 0.035). Specifically, the feature quantity Fv8 is converted into the standardized feature quantity Fv8 (ie, the evaluation value V8) according to the following formula: If Fv8<Th8, then Fv8=0 If Fv8≧Th8, then Fv8=Fv8/c8 c8 is any positive constant, such as 0.12

根據圖14之特徵量Fv8的評價,當上升之氣勢強烈,而吐出壓力之時間變化顯示較大的過衝(overshoot)時,可對該吐出壓力賦予較大之分數(score)(即,較差之評價)。According to the evaluation of the characteristic quantity Fv8 in Figure 14, when the rising momentum is strong and the time change of the discharge pressure shows a large overshoot, a large score (ie, poor score) can be assigned to the discharge pressure. evaluation).

圖15係用以說明根據特徵量Fv9而對吐出壓力之時間變化進行評價的評價項目的圖。圖15之評價項目係對遷移期間Tb中吐出壓力之時間變化的穩定度進行評價。具體而言,壓力評價部913係對遷移期間Tb中之吐出壓力、及穩定期間Tc中之吐出壓力的平均值即穩定壓力Pm,根據下列數式,計算出均方根誤差RMSE(P_measure,Pm),而作為特徵量Fv9: Fv9=RMSE(P_measure,Pm) P_measure=吐出壓力測定資料99 FIG. 15 is a diagram for explaining evaluation items for evaluating the time change of the discharge pressure based on the characteristic amount Fv9. The evaluation items in Fig. 15 evaluate the stability of the time change of the discharge pressure in Tb during the migration period. Specifically, the pressure evaluation unit 913 calculates the root mean square error RMSE (P_measure, Pm) based on the following equation based on the stable pressure Pm, which is the average value of the discharge pressure in the transition period Tb and the discharge pressure in the stable period Tc. ), and as the feature quantity Fv9: Fv9=RMSE(P_measure,Pm) P_measure=Spit out pressure measurement data 99

進而,壓力評價部913係將特徵量Fv9正規化為0以上且2以下之範圍。具體而言,根據下列數式,將特徵量Fv9轉換為經標準化後之特徵量Fv9(即評價值V9): Fv9=Fv9/c9 c9係任意之正的常數,例如0.04 Furthermore, the stress evaluation unit 913 normalizes the feature value Fv9 to a range of 0 or more and 2 or less. Specifically, the feature quantity Fv9 is converted into the standardized feature quantity Fv9 (ie, the evaluation value V9) according to the following mathematical formula: Fv9=Fv9/c9 c9 is any positive constant, such as 0.04

根據圖15之特徵量Fv9的評價,當吐出壓力之時間變化顯示遷移期間Tb中振盪(ringing)時,可對該吐出壓力賦予較大之分數(即,較差之評價)。According to the evaluation of the characteristic amount Fv9 in FIG. 15 , when the time change of the discharge pressure shows ringing in the transition period Tb, a large score (ie, a poor evaluation) can be given to the discharge pressure.

圖16係用以說明根據特徵量Fv10而對吐出壓力之時間變化進行評價的評價項目的圖。圖16之評價項目係對定壓期間Tbc中吐出壓力之時間變化的穩定度進行評價。具體而言,壓力評價部913求出,於定壓期間Tbc中吐出壓力之最大值Pmax與最小值P10min。接著,壓力評價部913根據定壓期間Tbc中最大壓力Pmax與最小壓力P10min之差,即根據下列數式,而計算出特徵量Fv10: Fv10=Pmax-P10min FIG. 16 is a diagram for explaining evaluation items for evaluating the time change of the discharge pressure based on the characteristic amount Fv10. The evaluation items in Figure 16 evaluate the stability of the time change of the discharge pressure in Tbc during the constant pressure period. Specifically, the pressure evaluation unit 913 obtains the maximum value Pmax and the minimum value P10min of the discharge pressure during the constant pressure period Tbc. Next, the pressure evaluation unit 913 calculates the characteristic amount Fv10 based on the difference between the maximum pressure Pmax and the minimum pressure P10min in the constant pressure period Tbc, that is, based on the following equation: Fv10=Pmax-P10min

進而,壓力評價部913使用臨限值Th10(例如0.12),將特徵量Fv10正規化為0以上且2以下之範圍。具體而言,根據下列數式,將特徵量Fv10轉換為經標準化後之特徵量Fv10(即評價值V10): 若Fv10<Th10,則Fv10=0 若Fv10≧Th10,則Fv10=Fv10/Th10 Furthermore, the pressure evaluation unit 913 normalizes the feature value Fv10 to a range of 0 or more and 2 or less using the threshold value Th10 (for example, 0.12). Specifically, the feature quantity Fv10 is converted into the standardized feature quantity Fv10 (ie, the evaluation value V10) according to the following mathematical formula: If Fv10<Th10, then Fv10=0 If Fv10≧Th10, then Fv10=Fv10/Th10

根據圖16之特徵量Fv10的評價,當對塗布液之膜厚影響較大之穩定期間Tc中,吐出壓力之時間變化顯示較大差異時,可對該吐出壓力賦予較大之分數(即,較差之評價)。According to the evaluation of the characteristic quantity Fv10 in Figure 16, when the time change of the discharge pressure shows a large difference in the stable period Tc which has a large influence on the film thickness of the coating liquid, a large score can be assigned to the discharge pressure (i.e., poor rating).

如此,壓力評價部913係根據自吐出壓力測定資料99將特徵量Fv1~Fv10各者抽選出後之結果,而計算出評價值V1~V10。接著,壓力評價部913求出該等評價值V1~V10之合計,以作為對於吐出壓力測定資料99所示之吐出壓力的時間變化之最終評價值(步驟S102)。In this way, the pressure evaluation unit 913 calculates the evaluation values V1 to V10 based on the result of extracting each of the feature values Fv1 to Fv10 from the discharge pressure measurement data 99 . Next, the pressure evaluation unit 913 calculates the total of the evaluation values V1 to V10 as the final evaluation value for the time change of the discharge pressure shown in the discharge pressure measurement data 99 (step S102).

在以上所說明之實施形態中,自噴嘴71開始吐出塗布液(處理液)至自噴嘴71吐出塗布液結束為止的吐出期間Tt(第一期間、評價對象期間)中,測定吐出壓力(步驟S101)。接著,抽選出吐出期間Tt全體中吐出壓力之時間變化所具有的理想梯形絕對誤差,以作為特徵量Fv1(第一特徵量、全體特徵量),根據該特徵量Fv1而對吐出壓力之時間變化進行評價(步驟S102)。藉此,可使自噴嘴71開始吐出塗布液至結束的吐出期間Tt全體中吐出壓力的適當性反映在吐出壓力之評價上。In the above-described embodiment, the discharge pressure is measured during the discharge period Tt (first period, evaluation target period) from when the nozzle 71 starts discharging the coating liquid (processing liquid) to when the nozzle 71 ends discharging the coating liquid (the first period, the evaluation target period) (step S101 ). Next, the ideal trapezoidal absolute error of the time change of the discharge pressure in the entire discharge period Tt is extracted as a feature value Fv1 (first feature value, overall feature value), and the time change of the discharge pressure is calculated based on this feature value Fv1 Evaluation is performed (step S102). Thereby, the adequacy of the discharge pressure in the entire discharge period Tt from the start of discharge of the coating liquid to the end of discharge from the nozzle 71 can be reflected in the evaluation of the discharge pressure.

此外,如圖7所示,特徵量Fv1係表示,近似於吐出期間Tt全體中吐出壓力之時間變化的近似波形WF1(第一近似波形)、與吐出期間Tt全體中吐出壓力的時間變化之差。在該構成中,可根據自噴嘴71開始吐出塗布液之至結束之吐出期間Tt全體中與吐出壓力的時間變化相對之近似波形WF1,而對該吐出期間Tt全體中之吐出壓力進行適當之評價。In addition, as shown in FIG. 7 , the characteristic amount Fv1 represents the difference between an approximate waveform WF1 (first approximate waveform) that approximates the time change of the discharge pressure in the entire discharge period Tt, and the time change of the discharge pressure in the entire discharge period Tt. . In this configuration, the discharge pressure in the entire discharge period Tt can be appropriately evaluated based on the approximate waveform WF1 corresponding to the time change of the discharge pressure in the entire discharge period Tt from when the nozzle 71 starts to discharge the coating liquid to the end. .

尤其是,近似波形WF1係具有: ・上升回歸直線Lr_R(上升近似直線),其係直線近似於自噴嘴71開始吐出塗布液後隨著時間經過而增大之吐出壓力的時間變化,藉此,自初期壓力Pi(吐出開始壓力)起至較初期壓力Pi為大之穩定壓力Pm為止,隨著時間經過而線性地增大; ・開始時近似直線Lr_s,其係設置於自噴嘴71吐出塗布液的開始時間點(時刻ta)與上升回歸直線Lr_R之間,以表示初期壓力Pi; ・落下回歸直線Lr_F(落下近似直線),其係直線近似於在自噴嘴71吐出塗布液結束前隨著時間經過而減少之吐出壓力的時間變化,藉此,自穩定壓力Pm至較穩定壓力Pm為小之初期壓力Pi(吐出結束壓力)為止,隨著時間經過而線性地減少; ・結束時近似直線Lr_e,其係設置於落下回歸直線Lr_F與自噴嘴71吐出塗布液的結束時間點(時刻te)之間,而表示初期壓力Pi(吐出結束壓力);以及 ・穩定直線Lr_m,其將上升回歸直線Lr_R及落下回歸直線Lr_F各者之間加以連接,以表示穩定壓力Pm。 在該構成中,可使自噴嘴71吐出塗布液之開始至結束為止的吐出期間Tt全體中吐出壓力的時間變化更加近似於梯形波形,而對該吐出期間Tt全體中之吐出壓力進行適當之評價。 In particular, the approximate waveform WF1 system has: ・The rising regression straight line Lr_R (rising approximate straight line) is a straight line that approximates the time change of the discharge pressure that increases with the passage of time after the nozzle 71 starts to discharge the coating liquid. Thereby, from the initial pressure Pi (the discharge start pressure) It increases linearly with the passage of time from the stable pressure Pm which is greater than the initial pressure Pi; ・The initial approximate straight line Lr_s is set between the starting time point (time ta) when the coating liquid is discharged from the nozzle 71 and the rising regression line Lr_R to represent the initial pressure Pi; ・The drop regression line Lr_F (drop approximation straight line) is a straight line that approximates the time change of the discharge pressure that decreases with the passage of time until the coating liquid is discharged from the nozzle 71, thereby changing from the stable pressure Pm to the more stable pressure Pm It decreases linearly with the passage of time until it reaches a small initial pressure Pi (discharge end pressure); ・The end approximate straight line Lr_e is set between the drop regression line Lr_F and the end time point (time te) of discharging the coating liquid from the nozzle 71, and represents the initial pressure Pi (discharge end pressure); and ・The stable straight line Lr_m connects the rising regression straight line Lr_R and the falling regression straight line Lr_F to represent the stable pressure Pm. In this configuration, the time change of the discharge pressure in the entire discharge period Tt from the beginning to the end of the discharge of the coating liquid from the nozzle 71 is made more similar to a trapezoidal waveform, and the discharge pressure in the entire discharge period Tt can be appropriately evaluated. .

此外,抽選出吐出期間Tt中較吐出期間Tt為短之期間(第二期間)中吐出壓力之時間變化所具有的特徵量Fv2~Fv10(第二特徵量),根據特徵量Fv2~Fv10而對吐出壓力之時間變化進行評價(步驟S102)。在該構成中,可根據自噴嘴71吐出塗布液之開始至結束為止的吐出期間Tt全體、及較該吐出期間Tt為短之期間兩者中吐出壓力的時間變化,以高精度地對吐出壓力進行評價。In addition, the characteristic amounts Fv2 to Fv10 (second characteristic amounts) of the time change of the discharge pressure in the period (second period) that is shorter than the discharge period Tt in the discharge period Tt are extracted, and based on the characteristic amounts Fv2 to Fv10, The time change of the discharge pressure is evaluated (step S102). In this configuration, the discharge pressure can be adjusted with high accuracy based on the temporal changes in the discharge pressure during both the entire discharge period Tt from the start to the end of discharge of the coating liquid from the nozzle 71 and the period shorter than the discharge period Tt. Make an evaluation.

此外,在圖8所示之評價項目中,對於自噴嘴71吐出塗布液之開始起,於既定的上升初期期間Ta_s(第二期間)中之吐出壓力進行評價。於整個該上升初期期間Ta_s,吐出壓力係隨著時間經過而增大,對於上升初期期間Ta_s中吐出壓力之時間變化的上升回歸曲線Nr、與上升初期期間Ta_s中吐出壓力的時間變化之差,抽選出表示該差之特徵量Fv2(第二特徵量)。在該構成中,可加進自噴嘴71吐出塗布液剛開始後之吐出壓力的時間變化,以對吐出壓力進行評價。In addition, among the evaluation items shown in FIG. 8 , the discharge pressure in the predetermined rising initial period Ta_s (second period) from the start of discharge of the coating liquid from the nozzle 71 is evaluated. Throughout the initial rise period Ta_s, the discharge pressure increases with the passage of time. The difference between the rise regression curve Nr of the time change of the discharge pressure in the rise initial period Ta_s and the time change of the discharge pressure in the rise initial period Ta_s is, The feature quantity Fv2 (second feature quantity) representing this difference is extracted. In this configuration, the discharge pressure can be evaluated by adding the temporal change in the discharge pressure immediately after the nozzle 71 starts discharging the coating liquid.

此外,對於自噴嘴71吐出塗布液從開始至吐出壓力增大為目標壓力Pt(既定壓力)為止之上升期間Ta(第二期間)中之吐出壓力進行評價。在該構成中,可加進上升期間Ta之吐出壓力的時間變化,以對吐出壓力進行評價。In addition, the discharge pressure in the rising period Ta (second period) from the start of discharge of the coating liquid from the nozzle 71 until the discharge pressure increases to the target pressure Pt (predetermined pressure) is evaluated. In this configuration, the discharge pressure can be evaluated by adding the time change of the discharge pressure during the rising period Ta.

具體而言,在圖9所示之評價項目中,抽選出上升期間Ta之長度,以作為特徵量Fv2(第二特徵量)。在該構成中,可加進吐出壓力之上升速度,以對吐出壓力進行評價。Specifically, among the evaluation items shown in FIG. 9 , the length of the rising period Ta is extracted as the feature amount Fv2 (second feature amount). In this configuration, the discharge pressure can be evaluated by adding the rise rate of the discharge pressure.

此外,在圖10A及圖10B所示之評價項目中,將上升期間Ta中吐出壓力之時間變化的一次微分D1與既定之臨限值Th4交叉的次數抽選出,以作為特徵量Fv4(第二特徵量)。在該構成中,可加進上升期間中吐出壓力之時間變化的平滑度,以對吐出壓力進行評價。In addition, among the evaluation items shown in FIGS. 10A and 10B , the number of times that the first differential D1 of the time change of the discharge pressure during the rising period Ta crosses the predetermined threshold value Th4 is extracted as the feature value Fv4 (second characteristic quantity). In this configuration, the smoothness of the temporal change of the discharge pressure during the rising period can be added to evaluate the discharge pressure.

此外,在圖11所示之評價項目中,將上升期間Ta中,吐出壓力之時間變化的二次微分D2之絕對值與既定之臨限值Th5交叉的次數抽選出,以作為特徵量Fv5(第二特徵量)。在該構成中,可加進上升期間Ta中吐出壓力之時間變化的平滑度,以對吐出壓力進行評價。In addition, among the evaluation items shown in Fig. 11, the number of times the absolute value of the second derivative D2 of the time change of the discharge pressure crosses the predetermined threshold value Th5 during the rising period Ta is extracted as the characteristic amount Fv5 ( second characteristic quantity). In this configuration, the smoothness of the temporal change of the discharge pressure in the rising period Ta can be added to evaluate the discharge pressure.

此外,在圖12所示之評價項目中,對於上升期間Ta中,吐出壓力之時間變化的二次微分D2變得較既定之正臨限值(Th5)為大之時間T_1st、與吐出壓力之時間變化的二次微分D2變得較具有與正臨限值相同之絕對值的負臨限值(-Th5)為小之時間T_2nd的比,抽選出該比,以作為特徵量Fv6(第二特徵量)。在該構成中,可加進上升期間Ta之初期與終期的吐出壓力之時間變化的差異,以對吐出壓力進行評價。In addition, in the evaluation items shown in Figure 12, for the time T_1st when the second derivative D2 of the time change of the discharge pressure becomes larger than the predetermined positive threshold value (Th5) during the rising period Ta, and the time T_1st of the discharge pressure The ratio of the time T_2nd at which the quadratic differential D2 of the time change becomes smaller than the negative threshold value (-Th5) having the same absolute value as the positive threshold value is extracted as the feature amount Fv6 (second characteristic quantity). In this configuration, the discharge pressure can be evaluated by adding the difference in the time change of the discharge pressure at the initial and final stages of the rise period Ta.

此外,在圖13所示之評價項目中,對吐出壓力增大至目標壓力Pt(既定壓力)為止之上升終期期間Ta_e(第二期間)中之吐出壓力進行評價。亦即,對於近似於上升終期期間Ta_e中吐出壓力之時間變化的近似波形WF7(上升終期近似波形)、與上升終期期間Ta_e中吐出壓力的時間變化之差,抽選出表示該差之特徵量Fv7(第二特徵量)。該近似波形WF7係由上升終期回歸直線Lr(上升終期近似直線)與延伸直線Lm所構成。上升終期回歸直線Lr係藉由直線近似於較目標壓力Pt更小之壓力範圍(P7_l~P7_u)中隨著時間經過而增大之吐出壓力的時間變化,而與求出之近似曲線重疊,隨著時間經過而線性地增大至穩定壓力Pm為止。延伸直線Lm係自上升終期回歸直線Lr(之結束時間點)延伸至上升終期期間Ta_e之結束時間點,而表示穩定壓力Pm。在該構成中,可加進上升期間Ta之終期的吐出壓力之失速程度,以對吐出壓力進行評價。In addition, among the evaluation items shown in FIG. 13 , the discharge pressure in the rising final period Ta_e (second period) until the discharge pressure increases to the target pressure Pt (predetermined pressure) is evaluated. That is, for the difference between the approximate waveform WF7 (approximate waveform at the end of rise) that approximates the time change of the discharge pressure in the end of rise period Ta_e, and the time change of the discharge pressure in the end of rise period Ta_e, the characteristic amount Fv7 representing the difference is extracted (the second characteristic quantity). This approximate waveform WF7 is composed of a rise-end regression straight line Lr (rise-end approximation straight line) and an extension straight line Lm. The regression line Lr at the end of the rise is a straight line approximation to the time change of the discharge pressure that increases with the passage of time in a pressure range (P7_l~P7_u) smaller than the target pressure Pt, and overlaps with the obtained approximate curve. As time passes, it increases linearly until it reaches the stable pressure Pm. The extended straight line Lm extends from (the end time point of) the rising terminal regression line Lr to the ending time point of the rising terminal period Ta_e, and represents the stable pressure Pm. In this configuration, the discharge pressure can be evaluated by adding the stall degree of the discharge pressure at the end of the rising period Ta.

此外,在圖14所示之評價項目中,對自吐出壓力達到最大值Pmax之時間點(時刻t81)起,至吐出壓力之時間變化的二次微分D2與零交叉兩次之時間點(時刻t82)為止之初期振動期間Tb_s(第二期間)中之吐出壓力進行評價。具體而言,求出初期振動期間Tb_s中吐出壓力的最小值P8min,對於該最小值P8min及穩定壓力Pm中較小的壓力、與吐出壓力的最大值Pmax之差,抽選出該差,以作為特徵量Fv8(第二特徵量)。在該構成中,可加進吐出壓力之過衝,以對吐出壓力進行評價。In addition, in the evaluation items shown in Figure 14, from the time point when the discharge pressure reaches the maximum value Pmax (time t81) to the time point when the second derivative D2 of the time change of the discharge pressure crosses zero twice (time t81) The discharge pressure in the initial vibration period Tb_s (second period) up to t82) is evaluated. Specifically, the minimum value P8min of the discharge pressure in the initial vibration period Tb_s is obtained, and the difference between the smaller of the minimum value P8min and the stable pressure Pm and the maximum value Pmax of the discharge pressure is extracted as Feature amount Fv8 (second feature amount). In this configuration, the discharge pressure can be evaluated by adding an overshoot of the discharge pressure.

此外,在圖15所示之評價項目中,對吐出壓力超過目標壓力Pt(既定壓力)之時間點(時刻tb)起既定之遷移期間Tb(第二期間)中之吐出壓力進行評價。具體而言,針對上升期間Ta中吐出壓力相對於穩定壓力Pm之差,抽選出表示該差之特徵量Fv9(第二特徵量)。在該構成中,可加進吐出壓力到達目標壓力Pt後之吐出壓力的穩定度,以對吐出壓力進行評價。In addition, in the evaluation items shown in FIG. 15 , the discharge pressure in the predetermined transition period Tb (second period) from the time point (time tb) when the discharge pressure exceeds the target pressure Pt (predetermined pressure) is evaluated. Specifically, a feature value Fv9 (second feature value) representing the difference between the discharge pressure and the stable pressure Pm during the rising period Ta is extracted. In this configuration, the discharge pressure can be evaluated by adding the stability of the discharge pressure after the discharge pressure reaches the target pressure Pt.

此外,在圖16所示之評價項目中,對自吐出壓力超過目標壓力Pt(既定壓力)之時間點(時刻tb)起,至朝向自噴嘴71吐出塗布液之結束而開始減少吐出壓力之時間點(時刻td)為止的定壓期間Tbc中之吐出壓力進行評價。具體而言,抽選出表示定壓期間Tbc中吐出壓力的最大值Pmax與最小值P10min之差的特徵量Fv10。在該構成中,可加進吐出壓力之定壓期間Tbc中吐出壓力的穩定性,以對吐出壓力進行評價。In addition, in the evaluation items shown in FIG. 16 , the time from the time point (time tb) when the discharge pressure exceeds the target pressure Pt (predetermined pressure) to the end of discharge of the coating liquid from the nozzle 71 and the time when the discharge pressure starts to decrease is The discharge pressure in the constant pressure period Tbc up to the point (time td) is evaluated. Specifically, the feature quantity Fv10 representing the difference between the maximum value Pmax and the minimum value P10min of the discharge pressure in the constant pressure period Tbc is extracted. In this configuration, the discharge pressure can be evaluated by adding the stability of the discharge pressure during the constant pressure period Tbc.

如以上所述,在上述實施形態中,塗布裝置1係相當於本發明之「基板處理裝置」之一例,噴嘴71係相當於本發明之「噴嘴」之一例,塗布液供給機構8係相當於本發明之「壓力賦予部」之一例,噴嘴71及塗布液供給機構8協同運作而構成本發明之「吐出裝置」之一例,壓力計86係相當於本發明之「測定部」之一例,控制單元9係相當於本發明之「電腦」及「控制部」之一例,吐出壓力評價程式97係相當於本發明之吐出壓力評價程式之一例,記錄媒體M係相當於本發明之「記錄媒體」之一例,塗布液係相當於本發明之「處理液」之一例,由壓力計86所測定之壓力係相當於本發明之「吐出壓力」之一例。As described above, in the above embodiment, the coating device 1 corresponds to an example of the "substrate processing apparatus" of the present invention, the nozzle 71 corresponds to an example of the "nozzle" of the present invention, and the coating liquid supply mechanism 8 corresponds to As an example of the "pressure imparting part" of the present invention, the nozzle 71 and the coating liquid supply mechanism 8 cooperate to form an example of the "discharge device" of the present invention. The pressure gauge 86 is equivalent to an example of the "measuring part" of the present invention. Control The unit 9 corresponds to an example of the "computer" and the "control unit" of the present invention, the discharge pressure evaluation program 97 corresponds to an example of the discharge pressure evaluation program of the present invention, and the recording medium M corresponds to the "recording medium" of the present invention. As an example, the coating liquid corresponds to an example of the "processing liquid" of the present invention, and the pressure measured by the pressure gauge 86 corresponds to an example of the "discharge pressure" of the present invention.

此外,吐出期間Tt係相當於本發明之「第一期間」之一例,特徵量Fv1係相當於本發明之「第一特徵量」之一例,近似波形WF1係相當於本發明之「第一近似波形」之一例,初期壓力Pi係相當於本發明之「吐出開始壓力」及「吐出結束壓力」之一例,上升回歸直線Lr_R係相當於本發明之「上升近似直線」之一例,開始時近似直線Lr_s係相當於本發明之「開始時近似直線」之一例,落下回歸直線Lr_F係相當於本發明之「落下近似直線」之一例,結束時近似直線Lr_e係相當於本發明之「結束時近似直線」之一例,穩定直線Lr_m係相當於本發明之「穩定直線」之一例。In addition, the discharge period Tt is equivalent to an example of the "first period" of the present invention, the characteristic quantity Fv1 is equivalent to an example of the "first characteristic quantity" of the present invention, and the approximate waveform WF1 is equivalent to the "first approximation" of the present invention. The initial pressure Pi is an example of the "discharge start pressure" and the "discharge end pressure" of the present invention, and the rising regression line Lr_R is an example of the "rising approximate straight line" of the present invention, which is an approximate straight line at the beginning. Lr_s is equivalent to an example of the "starting approximate straight line" of the present invention, the falling regression straight line Lr_F is equivalent to an example of the "falling approximate straight line" of the present invention, and the ending approximate straight line Lr_e is equivalent to the "ending approximate straight line" of the present invention. ”, the stable straight line Lr_m is equivalent to an example of the “stable straight line” in the present invention.

進而,上升初期期間Ta_s、上升期間Ta、上升終期期間Ta_e、初期振動期間Tb_s、遷移期間Tb及定壓期間Tbc係相當於本發明之「第二期間」之一例,特徵量Fv2~Fv10係相當於本發明之「第二特徵量」之一例,初期期間Ta_s係相當於本發明之「上升初期期間」之一例,回歸曲線Nr係相當於本發明之「回歸曲線」之一例,上升期間Ta係相當於本發明之「上升期間」之一例,上升終期期間Ta_e係相當於本發明之「上升終期期間」之一例,近似波形WF7係相當於本發明之「上升終期近似波形」之一例,上升終期回歸直線Lr係相當於本發明之「上升終期近似直線」之一例,延伸直線Lm係相當於本發明之「延伸直線」之一例,初期振動期間Tb_s係相當於本發明之「初期振動期間」之一例,穩定期間Tc係相當於本發明之「穩定期間」之一例,遷移期間Tb係相當於本發明之「遷移期間」之一例,定壓期間Tbc係相當於本發明之「定壓期間」之一例。Furthermore, the initial rise period Ta_s, the rise period Ta, the final rise period Ta_e, the initial vibration period Tb_s, the transition period Tb, and the constant pressure period Tbc are equivalent to an example of the "second period" of the present invention, and the characteristic amounts Fv2 to Fv10 are equivalent to each other. As an example of the "second characteristic quantity" of the present invention, the initial period Ta_s is equivalent to an example of the "initial rising period" of the present invention, the regression curve Nr is equivalent to an example of the "regression curve" of the present invention, and the rising period Ta is The rising terminal period Ta_e is equivalent to an example of the "rising period" of the present invention. The rising terminal period Ta_e is equivalent to an example of the "rising terminal period" of the present invention. The approximate waveform WF7 is equivalent to an example of the "rising terminal approximate waveform" of the present invention. The rising terminal period The regression straight line Lr is equivalent to an example of the "rising end approximation straight line" of the present invention, the extension straight line Lm is equivalent to an example of the "extended straight line" of the present invention, and the initial vibration period Tb_s is equivalent to the "initial vibration period" of the present invention. For example, the stable period Tc is equivalent to an example of the "stable period" of the present invention, the transition period Tb is equivalent to an example of the "transition period" of the present invention, and the constant pressure period Tbc is equivalent to one of the "constant pressure periods" of the present invention. An example.

再者,本發明並不受限於上述之實施形態,只要不脫離其主旨,可在上述之實施形態以外進行各種變更。例如,在上述實施形態中,根據被安裝在配管82之壓力計86所檢測出之壓力值,而對吐出特性進行計測,但壓力計86之安裝位置並不受限於此,只要為可對輸送給噴嘴71之塗布液的壓力進行檢測之位置,則該安裝位置可為任意位置。In addition, this invention is not limited to the above-mentioned embodiment, As long as it does not deviate from the summary, various changes other than the above-mentioned embodiment can be made. For example, in the above embodiment, the discharge characteristics are measured based on the pressure value detected by the pressure gauge 86 installed in the pipe 82. However, the installation position of the pressure gauge 86 is not limited to this, as long as it can be measured. The installation position can be any position where the pressure of the coating liquid supplied to the nozzle 71 is detected.

此外,在上述實施形態中,使用波紋管型之泵81,但泵之種類並不受限於此,例如亦可使用注射器型之泵(例如,日本專利特開2008-101510號公報),其係使用活塞。In addition, in the above embodiment, the bellows type pump 81 is used, but the type of the pump is not limited thereto. For example, a syringe type pump may also be used (for example, Japanese Patent Laid-Open No. 2008-101510). System uses piston.

此外,在上述實施形態中,對於在使基板S浮起之狀態下對基板S之表面Sf供給塗布液的塗布裝置1,雖適用於本發明,但本發明之適用對象並不受限於此,其可將本發明適用於藉由對噴嘴輸送處理液而自該噴嘴對基板上表面供給處理液,以施行既定處理之全部基板處理技術。In addition, in the above-mentioned embodiment, although the present invention is applied to the coating device 1 that supplies the coating liquid to the surface Sf of the substrate S in a state where the substrate S is floated, the applicable objects of the present invention are not limited thereto. , the present invention can be applied to all substrate processing technologies that perform a predetermined process by transporting a processing liquid to a nozzle and supplying the processing liquid from the nozzle to the upper surface of the substrate.

此外,本發明無須根據上述之全部特徵量Fv2~Fv10而對吐出壓力進行評價,其亦可構成為僅根據該等特徵量之一部分而對吐出壓力進行評價。或是,亦可僅根據特徵量Fv1而對吐出壓力進行評價。In addition, the present invention does not need to evaluate the discharge pressure based on all the above-mentioned characteristic values Fv2 to Fv10. It may also be configured to evaluate the discharge pressure based on only a part of these characteristic values. Alternatively, the discharge pressure may be evaluated based only on the characteristic value Fv1.

此外,當計算圖7之近似波形WF1時,亦可使用表示目標壓力Pt之斜率為零的直線,以取代穩定直線Lr_m。In addition, when calculating the approximate waveform WF1 in FIG. 7 , a straight line with a slope of zero representing the target pressure Pt can also be used instead of the stable straight line Lr_m.

進而,亦可為,計算下述變形例中所說明之特徵量Fv1_1,以取代圖7所示之特徵量Fv1,而根據該特徵量Fv1_1而對吐出壓力之時間變化進行評價。圖17係用以說明在吐出壓力之評價項目的變形例中使用之各期間的圖,圖18係用以說明根據特徵量Fv1_1而對吐出壓力之時間變化進行評價的評價項目的變形例的圖。在此,以圖17與上述圖5的差異點為主而進行說明,該等圖式之共通點被附上相等符號而適當地省略其說明。同樣地,以圖18與上述圖7的差異點為主而進行說明,且該等圖式之共通點被附上相等符號而適當地省略說明。Furthermore, the characteristic value Fv1_1 described in the following modifications may be calculated instead of the characteristic value Fv1 shown in FIG. 7 , and the time change of the discharge pressure may be evaluated based on the characteristic value Fv1_1. FIG. 17 is a diagram illustrating each period used in a modified example of the evaluation item of discharge pressure, and FIG. 18 is a diagram illustrating a modified example of the evaluation item that evaluates the time change of the discharge pressure based on the characteristic amount Fv1_1. . Here, the description will be mainly focused on the differences between FIG. 17 and the above-mentioned FIG. 5 , and the common points between these drawings will be given equal symbols and their description will be appropriately omitted. Similarly, the description will be mainly focused on the differences between FIG. 18 and FIG. 7 , and the common points between these drawings will be given equal symbols and the description will be omitted appropriately.

如圖17所示,在評價項目之變形例中,使用注目期間Troi。該注目期間Troi係時刻ta至時刻td為止之期間。即,注目期間Troi係由上升期間Ta、遷移期間Tb及穩定期間Tc所構成,換言之,其係由上升期間Ta及定壓期間Tbc所構成。如此,注目期間Troi係相當於本發明中「主要期間係從開始自噴嘴吐出處理液後,經過吐出壓力上升至既定壓力,直至吐出壓力開始自既定壓力減少為止的期間」之一例,目標壓力Pt係相當於本發明之「既定壓力」之一例。As shown in FIG. 17 , in a modification of the evaluation item, the attention period Troi is used. The attention period Troi is the period from time ta to time td. That is, the attention period Troi is composed of the rising period Ta, the transition period Tb, and the stable period Tc. In other words, it is composed of the rising period Ta and the constant pressure period Tbc. In this way, the period of interest Troi is equivalent to an example of "the main period is the period from when the processing liquid starts to be discharged from the nozzle, after the discharge pressure rises to the predetermined pressure, to when the discharge pressure starts to decrease from the predetermined pressure" in the present invention, the target pressure Pt This is an example of "predetermined pressure" equivalent to the present invention.

如圖18所示,在該變形例中,與上述之特徵量Fv1之情況相同,與計算上升回歸直線Lr_R一起地,設定有開始時近似直線Lr_s。進而,於時刻t12至時刻td之期間,設定有表示穩定壓力Pm(即,穩定期間Tc中吐出壓力之測定值的平均)之斜率為零的直線,即穩定直線Lr_m_1。As shown in FIG. 18 , in this modified example, similarly to the case of the above-mentioned feature value Fv1, a starting approximate straight line Lr_s is set together with the calculation of the ascending regression straight line Lr_R. Furthermore, between time t12 and time td, a straight line representing the stable pressure Pm (that is, the average of the measured values of the discharge pressure during the stable period Tc) with a slope of zero, that is, a stable straight line Lr_m_1, is set.

如此,計算出在時序上排列之由開始時近似直線Lr_s、上升回歸直線Lr_R及穩定直線Lr_m_1所構成的近似波形WF1_1。接著,壓力評價部913係計算出,時刻ta至時刻td為止之注目期間Troi全體中,吐出壓力測定資料99與近似波形WF1_1之間的平均絕對誤差MAE,以作為特徵量Fv1_1。此外,壓力評價部913係根據既定之臨限值Th1_1(例如0.05),將特徵量Fv1_1正規化為既定之範圍。具體而言,根據下列數式,將特徵量Fv1_1轉換為經標準化後之特徵量Fv1_1(即評價值V1_1): 若Fv1_1<Th1_1,則Fv1_1=0 若Fv1_1≧Th1_1,則Fv1_1=(Fv1_1+1-Th1_1)×c1_1 在此,Fv1_1之上限係設為2×c1_1,係數c1_1為標準化係數即任意之正的常數。再者,特徵量Fv1_1之正規化的具體方法不限於本例,亦可適當地變更。 In this way, the approximate waveform WF1_1 composed of the initial approximate straight line Lr_s, the rising regression straight line Lr_R and the stable straight line Lr_m_1 arranged in time series is calculated. Next, the pressure evaluation unit 913 calculates the mean absolute error MAE between the output pressure measurement data 99 and the approximate waveform WF1_1 in the entire attention period Troi from time ta to time td as the feature amount Fv1_1. In addition, the pressure evaluation unit 913 normalizes the feature value Fv1_1 into a predetermined range based on a predetermined threshold value Th1_1 (for example, 0.05). Specifically, the feature quantity Fv1_1 is converted into the standardized feature quantity Fv1_1 (ie, the evaluation value V1_1) according to the following mathematical formula: If Fv1_1<Th1_1, then Fv1_1=0 If Fv1_1≧Th1_1, then Fv1_1=(Fv1_1+1-Th1_1)×c1_1 Here, the upper limit of Fv1_1 is set to 2×c1_1, and the coefficient c1_1 is a standardized coefficient, that is, an arbitrary positive constant. In addition, the specific method of normalizing the feature quantity Fv1_1 is not limited to this example, and can be changed appropriately.

如根據圖18之特徵量Fv1_1作評價,於注目期間Troi全體中吐出壓力的時間變化較大地自理想形狀偏離時,則可對該吐出壓力賦予較大之分數(即,較差之評價)。As evaluated based on the feature quantity Fv1_1 in FIG. 18 , if the time variation of the discharge pressure in the entire Troi during the attention period greatly deviates from the ideal shape, a large score (that is, a poor evaluation) can be given to the discharge pressure.

在該變形例中,於圖4所示之吐出壓力評價的測定結果評價(步驟S102)中,壓力評價部913並非根據自吐出壓力抽選出特徵量Fv1,而是根據自吐出壓力抽選出特徵量Fv1_1之結果,以計算評價值V1_1。進而,與上述同樣地,壓力評價部913係根據自吐出壓力對特徵量Fv2~Fv10進行抽選出之結果而計算出評價值V2~V10。接著,壓力評價部913求出該等評價值V1_1、V2~V10之合計,以作為對於吐出壓力測定資料99所示之吐出壓力的時間變化之最終評價值(步驟S102)。In this modification, in the measurement result evaluation (step S102) of the discharge pressure evaluation shown in FIG. 4, the pressure evaluation unit 913 does not extract the feature value Fv1 based on the self-discharge pressure, but extracts the feature value based on the self-discharge pressure. The result of Fv1_1 is used to calculate the evaluation value V1_1. Furthermore, similarly to the above, the pressure evaluation unit 913 calculates the evaluation values V2 to V10 based on the result of extracting the feature values Fv2 to Fv10 from the discharge pressure. Next, the pressure evaluation unit 913 obtains the total of the evaluation values V1_1, V2 to V10 as the final evaluation value for the time change of the discharge pressure shown in the discharge pressure measurement data 99 (step S102).

在以上所說明之變形例中,從開始自噴嘴71吐出處理液起,經過吐出壓力上升至目標壓力Pt(既定壓力),直至吐出壓力開始自目標壓力Pt減少為止之注目期間Troi(主要期間、評價對象期間)中,對吐出壓力進行測定。接著,抽選出注目期間Troi全體中吐出壓力之時間變化所具有的特徵量Fv1_1(全體特徵量) ,根據特徵量Fv1_1而對吐出壓力之時間變化進行評價。藉此,可使對塗布於基板S之處理液的厚度產生影響之注目期間Troi全體中吐出壓力的適當性反映在吐出壓力之評價上。In the modified example described above, the attention period Troi (main period, after the discharge pressure starts to rise to the target pressure Pt (predetermined pressure) from the time when the discharge pressure starts to be discharged from the nozzle 71 until the discharge pressure starts to decrease from the target pressure Pt) During the evaluation target period), the discharge pressure is measured. Next, the characteristic amount Fv1_1 (overall characteristic amount) of the temporal change in the discharge pressure in the entire attention period Troi is extracted, and the temporal change in the discharge pressure is evaluated based on the characteristic amount Fv1_1. Thereby, the appropriateness of the discharge pressure in the entire attention period Troi, which affects the thickness of the processing liquid applied to the substrate S, can be reflected in the evaluation of the discharge pressure.

進而言之,在該變形例中,可於注目期間Troi對塗布於基板S之處理液的厚度造成的影響特別大時(換言之,經過注目期間Troi後之期間的影響僅些微時),使該注目期間Troi全體中吐出壓力的適當性反映在吐出壓力之評價上。Furthermore, in this modification, when the influence of the attention period Troi on the thickness of the processing liquid applied to the substrate S is particularly large (in other words, when the influence of the period after the attention period Troi is only slight), the effect of the attention period Troi can be made The adequacy of the discharge pressure in the entire Troi during the attention period is reflected in the evaluation of the discharge pressure.

此外,特徵量Fv1_1(主要特徵量)係表示,近似於注目期間Troi(主要期間)全體中吐出壓力之時間變化的近似波形WF1_1(主要近似波形)、與注目期間Troi全體中吐出壓力的時間變化之差。在該構成中,可根據對注目期間Troi全體中吐出壓力的時間變化之近似波形WF1_1,而對該注目期間Troi全體中之吐出壓力進行適當之評價。In addition, the feature amount Fv1_1 (main feature amount) represents an approximate waveform WF1_1 (main approximation waveform) that approximates the time change of the discharge pressure in the entire attention period Troi (the main period), and the time change of the discharge pressure in the entire attention period Troi. Difference. In this configuration, the discharge pressure in the entire attention period Troi can be appropriately evaluated based on the approximate waveform WF1_1 of the time change of the discharge pressure in the entire attention period Troi.

尤其是,近似波形WF1_1係具有: ・上升回歸直線Lr_R(上升近似直線),其係自初期壓力Pi(吐出開始壓力)至較初期壓力Pi為大之穩定壓力Pm為止,隨著時間經過而線性地增大,其係直線近似於在開始自噴嘴71吐出塗布液後隨著時間經過而增大之吐出壓力的時間變化; ・開始時近似直線Lr_s,其係設置於自噴嘴71吐出塗布液的開始時間點(時刻ta)與上升回歸直線Lr_R之間,而表示初期壓力Pi;以及 ・穩定直線Lr_m_1,其係設置於上升回歸直線Lr_R到達穩定壓力Pm起至注目期間Troi之最後為止之間(時刻t12至時刻td之間),而表示穩定壓力Pm。 在該構成中,可於注目期間Troi全體中近似於吐出壓力的時間變化,而對該注目期間Troi全體中之吐出壓力進行適當之評價。 In particular, the approximate waveform WF1_1 has: ・The rising regression line Lr_R (rising approximate straight line) increases linearly with the passage of time from the initial pressure Pi (discharge start pressure) to the stable pressure Pm which is greater than the initial pressure Pi. It is a straight line approximation to The time change of the discharge pressure that increases with the passage of time after starting to discharge the coating liquid from the nozzle 71; ・The initial approximate straight line Lr_s is set between the start time point (time ta) of discharging the coating liquid from the nozzle 71 and the rising regression line Lr_R, and represents the initial pressure Pi; and ・The stable straight line Lr_m_1 is set between the time when the rising regression line Lr_R reaches the stable pressure Pm and the end of the attention period Troi (between time t12 and time td), and represents the stable pressure Pm. In this configuration, the discharge pressure in the entire attention period Troi can be appropriately evaluated by approximating the time change of the discharge pressure in the entire attention period Troi.

順帶一提,當使用圖18所示之特徵量Fv1_1對吐出壓力進行評價時,在步驟S101中,無須對經過注目期間Troi後之期間(亦即,落下期間Td)的吐出壓力進行計測。Incidentally, when the discharge pressure is evaluated using the characteristic amount Fv1_1 shown in FIG. 18, in step S101, it is not necessary to measure the discharge pressure during the period after the attention period Troi (that is, the drop period Td).

此外,亦可被構成為,上述之兩個特徵量Fv1及特徵量Fv1_1中,可由UI 95選擇使用哪一特徵量來對吐出壓力進行評價。此時,在步驟S102中,由使用者對UI 95之輸入操作來選擇特徵量Fv1及特徵量Fv1_1中之一特徵量,並以該特徵量對吐出壓力進行評價。Furthermore, it may be configured so that the UI 95 can select which feature value is used to evaluate the discharge pressure among the two feature values Fv1 and Fv1_1 described above. At this time, in step S102, one of the feature value Fv1 and the feature value Fv1_1 is selected by the user's input operation on the UI 95, and the discharge pressure is evaluated using the feature value.

本發明可適用於藉由將處理液輸送至噴嘴,而自噴嘴將處理液以目標特性對基板吐出而進行供給之整個的基板處理技術。The present invention can be applied to the entire substrate processing technology in which the processing liquid is delivered to a nozzle and the processing liquid is ejected from the nozzle to the substrate with target characteristics and supplied.

1:塗布裝置(基板處理裝置) 2:輸入移載部 3:浮起平台部 4:輸出移載部1: Coating device (substrate processing device) 2: Input transfer part 3: Floating platform part 4:Output transfer part

5:基板搬送部 5:Substrate transport department

7:塗布機構 7: Coating mechanism

8:塗布液供給機構(壓力賦予部) 8: Coating liquid supply mechanism (pressure imparting part)

9:控制單元(電腦、控制部) 9: Control unit (computer, control department)

21:滾輪輸送機 21:Roller conveyor

22:旋轉‧升降驅動機構 22: Rotation and lifting drive mechanism

31:入口浮起平台 31: Entrance floating platform

32:塗布平台 32: Coating platform

33:出口浮起平台 33: Exit floating platform

34:升降銷驅動機構 34: Lift pin driving mechanism

35:浮起控制機構 35: Floating control mechanism

36:升降驅動機構 36:Lifting drive mechanism

41:滾輪輸送機 41:Roller conveyor

42:旋轉‧升降驅動機構 42: Rotation and lifting drive mechanism

51:卡盤機構 51:Chuck mechanism

52:吸附‧移行控制機構 52: Adsorption and migration control mechanism

61、62:感測器 61, 62: Sensor

71:噴嘴 71:Nozzle

72:噴嘴洗淨待機單元 72: Nozzle cleaning standby unit

81:泵 81:Pump

82:配管 82:Piping

83:塗布液補充單元 83: Coating fluid replenishment unit

84:配管 85:開閉閥 86:壓力計(測定部) 91:運算部 93:記憶部 95:UI 97:吐出壓力評價程式 99:吐出壓力測定資料 100:輸入輸送機 101:滾輪輸送機 102:旋轉驅動機構 110:輸出輸送機 111:滾輪輸送機 112:旋轉驅動機構 721:滾筒 722:洗淨部 723:滾筒槽 811:可撓性管 812:波紋管 813:小型波紋管部 814:大型波紋管部 815:泵室 816:作動盤部 817:驅動部 831:貯存箱 833:開閉閥 911:測定執行部 913:壓力評價部 D1:一次微分 D2:二次微分 Fv1:特徵量(第一特徵量) Fv2~Fv10:特徵量(第二特徵量) Lm:延伸直線 Lr:上升終期回歸直線(上升終期近似直線) Lr_F:落下回歸直線 Lr_R:上升回歸直線(上升近似直線) Lr_e:結束時近似直線 Lr_m、Lr_m_1:穩定直線 Lr_s:開始時近似直線 M:記錄媒體 Nr:上升回歸曲線(回歸曲線) Pi:初期壓力(吐出開始壓力、吐出結束壓力) Pm:穩定壓力 Pmax:最大壓力(最大值) Pt:目標壓力 P2_l、P7_l:下側基準壓力(下側基準值) P2_u、P7_u:上側基準壓力(上側基準值) P8min:壓力(最小值) P10min:最小壓力(最小值) S:基板 Sb:下表面 Sf:上表面(表面) Ta:上升期間(第二期間) Ta_e:上升終期期間(第二期間) Ta_s:上升初期期間(第二期間) Tb:遷移期間(第二期間) Tbc:定壓期間(第二期間) Tb_s:初期振動期間(第二期間) Tc:穩定期間 Td:落下期間 Th4、Th5:臨限值 Troi:注目期間 Tt:吐出期間(第一期間) Tw:權重基準時間寬度 T_1st、T_2nd:時間 ta、tb、tc、td、te:時刻 t11、t12、t13、t14、t21、t22、t41、t42、t51、t52、t53、t54、t71、t72、t73、t81、t82:時刻 WF1:近似波形(第一近似波形) WF2:波形 WF4:一次微分波形 WF5、WF6:二次微分波形 WF7:近似波形(上升終期近似波形) WF1_1:近似波形(主要近似波形) X、Dt:搬送方向 Y:水平方向 Z:鉛直方向 84:Piping 85:Open and close valve 86: Pressure gauge (measurement department) 91:Operation Department 93:Memory department 95:UI 97: Spit out the stress evaluation program 99:Spit out pressure measurement data 100:Input conveyor 101:Roller conveyor 102: Rotary drive mechanism 110:Output conveyor 111:Roller conveyor 112: Rotary drive mechanism 721:Roller 722:Cleaning Department 723:Roller groove 811:Flexible tube 812: Bellows 813:Small bellows department 814:Large corrugated pipe department 815:Pump room 816: Actuator plate 817:Drive Department 831:Storage box 833:Open and close valve 911:Measurement Execution Department 913: Stress Assessment Department D1: first differential D2: Second differential Fv1: Feature quantity (first feature quantity) Fv2~Fv10: Feature quantity (second feature quantity) Lm: extended straight line Lr: Regression straight line at the end of the rise (approximate straight line at the end of the rise) Lr_F: falling regression line Lr_R: Rising regression straight line (rising approximate straight line) Lr_e: Approximate straight line at the end Lr_m, Lr_m_1: stable straight line Lr_s: approximate straight line at the beginning M: recording medium Nr: rising regression curve (regression curve) Pi: initial pressure (discharge start pressure, discharge end pressure) Pm: stable pressure Pmax: maximum pressure (maximum value) Pt: target pressure P2_l, P7_l: Lower side reference pressure (lower side reference value) P2_u, P7_u: Upper reference pressure (upper reference value) P8min: pressure (minimum value) P10min: minimum pressure (minimum value) S:Substrate Sb: lower surface Sf: upper surface (surface) Ta: rising period (second period) Ta_e: rising final period (second period) Ta_s: Early rising period (second period) Tb: migration period (second period) Tbc: Constant pressure period (second period) Tb_s: Initial vibration period (second period) Tc: stable period Td: falling period Th4, Th5: threshold value Troi: period of attention Tt: Discharge period (first period) Tw: weight base time width T_1st, T_2nd: time ta, tb, tc, td, te: time t11, t12, t13, t14, t21, t22, t41, t42, t51, t52, t53, t54, t71, t72, t73, t81, t82: time WF1: Approximate waveform (first approximate waveform) WF2: Waveform WF4: First differential waveform WF5, WF6: Secondary differential waveform WF7: Approximate waveform (approximate waveform at the end of rising period) WF1_1: Approximate waveform (main approximate waveform) X, Dt: conveying direction Y: horizontal direction Z: vertical direction

圖1係示意地表示本發明的基板處理裝置之一實施形態即塗布裝置的全體構成圖。 圖2係表示塗布液供給機構之構成圖。 圖3係表示控制單元的構成之一例的方塊圖。 圖4係表示根據吐出壓力評價程式而執行之吐出壓力評價方法之一例的流程圖。 圖5係用以說明在吐出壓力之評價上使用的各期間的圖。 圖6係示意地表示對於吐出壓力之時間變化而壓力評價部執行運算之一例的圖。 圖7係用以說明根據特徵量Fv1而對吐出壓力之時間變化進行評價的評價項目的圖。 圖8係用以說明根據特徵量Fv2而對吐出壓力之時間變化進行評價的評價項目的圖。 圖9係用以說明根據特徵量Fv3而對吐出壓力之時間變化進行評價的評價項目的圖。 圖10A係用以說明根據特徵量Fv4而對吐出壓力之時間變化進行評價的評價項目的圖。 圖10B係表示藉由根據特徵量Fv4之評價而判斷為不適當的吐出壓力之時間變化例的圖。 圖11A係用以說明根據特徵量Fv5對吐出壓力之時間變化進行評價的評價項目的圖。 圖11B係表示藉由根據特徵量Fv5之評價而判斷為不適當的吐出壓力之時間變化例的圖。 圖12係用以說明根據特徵量Fv6對吐出壓力之時間變化進行評價的評價項目的圖。 圖13係用以說明根據特徵量Fv7對吐出壓力之時間變化進行評價的評價項目的圖。 圖14係用以說明根據特徵量Fv8對吐出壓力之時間變化進行評價的評價項目的圖。 圖15係用以說明根據特徵量Fv9對吐出壓力之時間變化進行評價的評價項目的圖。 圖16係用以說明根據特徵量Fv10對吐出壓力之時間變化進行評價的評價項目的圖。 圖17係用以說明在吐出壓力之評價項目的變形例中使用之各期間的圖。 圖18係用以說明根據特徵量Fv1_1對吐出壓力之時間變化進行評價的評價項目的變形例的圖。 FIG. 1 is a schematic diagram showing the overall structure of a coating device, which is one embodiment of the substrate processing device of the present invention. Fig. 2 is a structural diagram showing a coating liquid supply mechanism. FIG. 3 is a block diagram showing an example of the structure of a control unit. FIG. 4 is a flowchart showing an example of a discharge pressure evaluation method executed based on a discharge pressure evaluation program. FIG. 5 is a diagram illustrating each period used for evaluation of discharge pressure. FIG. 6 is a diagram schematically showing an example of calculation performed by the pressure evaluation unit with respect to temporal changes in discharge pressure. FIG. 7 is a diagram for explaining evaluation items for evaluating the time change of the discharge pressure based on the characteristic amount Fv1. FIG. 8 is a diagram for explaining evaluation items for evaluating the time change of the discharge pressure based on the characteristic amount Fv2. FIG. 9 is a diagram for explaining evaluation items for evaluating the time change of the discharge pressure based on the characteristic amount Fv3. FIG. 10A is a diagram for explaining evaluation items for evaluating the time change of the discharge pressure based on the characteristic amount Fv4. FIG. 10B is a diagram showing an example of time change of the discharge pressure determined to be inappropriate based on the evaluation based on the characteristic value Fv4. FIG. 11A is a diagram for explaining evaluation items for evaluating the time change of the discharge pressure based on the characteristic amount Fv5. FIG. 11B is a diagram showing an example of time change of the discharge pressure determined to be inappropriate based on the evaluation of the characteristic value Fv5. FIG. 12 is a diagram for explaining evaluation items for evaluating the time change of the discharge pressure based on the characteristic amount Fv6. FIG. 13 is a diagram for explaining evaluation items for evaluating the time change of the discharge pressure based on the characteristic amount Fv7. FIG. 14 is a diagram for explaining evaluation items for evaluating the time change of the discharge pressure based on the characteristic amount Fv8. FIG. 15 is a diagram for explaining evaluation items for evaluating the time change of the discharge pressure based on the characteristic amount Fv9. FIG. 16 is a diagram for explaining evaluation items for evaluating the time change of the discharge pressure based on the characteristic amount Fv10. FIG. 17 is a diagram for explaining each period used in a modification of the evaluation item of discharge pressure. FIG. 18 is a diagram for explaining a modification of the evaluation item for evaluating the time change of the discharge pressure based on the feature amount Fv1_1.

Lr_F:落下回歸直線 Lr_F: falling regression line

Lr_R:上升回歸直線 Lr_R: rising regression line

Lr_e:結束時近似直線 Lr_e: Approximate straight line at the end

Lr_m:穩定直線 Lr_m: stable straight line

Lr_s:開始時近似直線 Lr_s: approximate straight line at the beginning

Pi:初期壓力 Pi: initial pressure

Pm:穩定壓力 Pm: stable pressure

ta、te:時刻 ta, te: time

t11、t12、t13、t14:時刻 t11, t12, t13, t14: time

WF1:近似波形(第一近似波形) WF1: Approximate waveform (first approximate waveform)

Claims (21)

一種吐出壓力評價方法,其係具備有如下步驟:於至少包含主要期間之評價對象期間中,測定吐出壓力的步驟,其中,上述主要期間係藉由對處理液賦予上述吐出壓力而自噴嘴吐出處理液之吐出裝置,從開始自上述噴嘴吐出處理液起,經過上述吐出壓力上升至既定壓力,直至上述吐出壓力開始自上述既定壓力減少為止的期間;抽選出上述評價對象期間全體中上述吐出壓力之時間變化所具有的特徵量,作為全體特徵量的步驟;以及根據上述全體特徵量而對上述吐出壓力之時間變化進行評價的步驟。 A discharge pressure evaluation method comprising the step of measuring the discharge pressure during an evaluation target period including at least a main period in which processing is discharged from a nozzle by applying the discharge pressure to a processing liquid. The liquid discharge device starts to discharge the treatment liquid from the nozzle, passes through the period when the discharge pressure rises to a predetermined pressure, and ends when the discharge pressure starts to decrease from the predetermined pressure; the discharge pressure of the entire evaluation target period is selected. The step of using the characteristic quantity of the temporal change as an overall characteristic quantity; and the step of evaluating the temporal variation of the discharge pressure based on the overall characteristic quantity. 如請求項1之吐出壓力評價方法,其中,上述評價對象期間係上述主要期間,抽選出上述主要期間全體中上述吐出壓力之時間變化所具有的特徵量即主要特徵量,作為上述全體特徵量。 The discharge pressure evaluation method according to claim 1, wherein the evaluation target period is the main period, and the characteristic quantity of the temporal change of the discharge pressure in the entire main period is extracted as the main characteristic quantity as the overall characteristic quantity. 如請求項2之吐出壓力評價方法,其中,上述主要特徵量係表示,近似於上述主要期間全體中上述吐出壓力之時間變化的主要近似波形、與上述主要期間全體中上述吐出壓力的時間變化之差。 The discharge pressure evaluation method of claim 2, wherein the main characteristic quantity represents a main approximate waveform that approximates the time change of the discharge pressure in the entire main period, and the time change of the discharge pressure in the entire main period. Difference. 如請求項3之吐出壓力評價方法,其中,上述主要近似波形係具有:上升近似直線,其係自吐出開始壓力至較上述吐出開始壓力為大之穩定壓力為止,隨著時間經過而線性地增大,其係直線近似於在開始自 上述噴嘴吐出處理液後隨著時間經過而增大之上述吐出壓力的時間變化;開始時近似直線,其係設置於開始自上述噴嘴吐出處理液的時間點與上述上升近似直線之間,表示上述吐出開始壓力;以及穩定直線,其係設置於上述上升近似直線到達上述穩定壓力起至上述主要期間的最後為止之間,表示上述穩定壓力。 The discharge pressure evaluation method of claim 3, wherein the main approximate waveform has an ascending approximate straight line, which increases linearly with time from the discharge start pressure to a stable pressure greater than the discharge start pressure. is large, its straight line approximates the starting point since The time change of the above-mentioned discharge pressure that increases with the passage of time after the above-mentioned nozzle discharges the treatment liquid; the initial approximate straight line is set between the time point when the above-mentioned nozzle starts to discharge the treatment liquid and the above-mentioned rising approximate straight line, indicating the above-mentioned The discharge start pressure; and a stable straight line, which is provided between the time when the above-mentioned rising approximate straight line reaches the above-mentioned stable pressure and the end of the above-mentioned main period, indicating the above-mentioned stable pressure. 如請求項1之吐出壓力評價方法,其中,上述評價對象期間係開始自上述噴嘴吐出處理液起,至結束自上述噴嘴吐出處理液為止的第一期間,抽選出上述第一期間全體中上述吐出壓力之時間變化所具有的特徵量即第一特徵量,作為上述全體特徵量。 The discharge pressure evaluation method of Claim 1, wherein the evaluation target period is a first period from when the nozzle discharges the processing liquid to when the processing liquid discharge from the nozzle ends, and the discharge pressure is selected from the entire first period. The first characteristic quantity, which is a characteristic quantity of the time change of the pressure, serves as the above-mentioned overall characteristic quantity. 如請求項5之吐出壓力評價方法,其中,上述第一特徵量係表示,近似於上述第一期間全體中上述吐出壓力之時間變化的第一近似波形、與上述第一期間全體中上述吐出壓力的時間變化之差。 The discharge pressure evaluation method of claim 5, wherein the first characteristic quantity represents a first approximate waveform that approximates the temporal change of the discharge pressure in the entire first period, and the discharge pressure in the entire first period. The difference in time changes. 如請求項6之吐出壓力評價方法,其中,上述第一近似波形係具有:上升近似直線,其係直線近似於在開始自上述噴嘴吐出處理液後隨著時間經過而增大之上述吐出壓力的時間變化,藉此,自吐出開始壓力至較上述吐出開始壓力為大之穩定壓力為止,隨著時間經過而線性地增大; 開始時近似直線,其係設置於自上述噴嘴吐出處理液的開始時間點與上述上升近似直線之間,表示上述吐出開始壓力;落下近似直線,其係直線近似於在結束自上述噴嘴吐出處理液前隨著時間經過而減少之上述吐出壓力的時間變化,藉此,自上述穩定壓力至較上述穩定壓力為小之吐出結束壓力為止,隨著時間經過而線性地減少;結束時近似直線,其係設置於上述落下近似直線與自上述噴嘴吐出處理液的結束時間點之間,表示上述吐出結束壓力;以及穩定直線,其將上述上升近似直線及上述落下近似直線各者之間加以連接,表示上述穩定壓力。 The discharge pressure evaluation method of claim 6, wherein the first approximate waveform has a rising approximate straight line that is a straight line approximation to the discharge pressure that increases with the passage of time after the process liquid starts to be discharged from the nozzle. Time changes, whereby the discharge start pressure increases linearly with the passage of time until the stable pressure is greater than the discharge start pressure; The starting approximate straight line is set between the start time point of discharging the treatment liquid from the nozzle and the rising approximate straight line, indicating the discharge starting pressure; the falling approximate straight line is a straight line approximating the end of discharging the treatment liquid from the nozzle. The time change of the above-mentioned discharge pressure that decreases with the passage of time, thereby linearly decreasing with the passage of time from the above-mentioned stable pressure to the discharge end pressure that is smaller than the above-mentioned stable pressure; at the end, it is approximately a straight line, which is disposed between the above-mentioned falling approximate straight line and the end time point of discharging the treatment liquid from the above-mentioned nozzle, and represents the above-mentioned discharge end pressure; and a stable straight line, which connects the above-mentioned rising approximate straight line and the above-mentioned falling approximate straight line, represents The above stable pressure. 如請求項1之吐出壓力評價方法,其中,進而具備有如下步驟:抽選出上述評價對象期間中較上述評價對象期間為短之第二期間中上述吐出壓力之時間變化所具有的特徵量,作為第二特徵量的步驟;根據上述全體特徵量及上述第二特徵量而對上述吐出壓力之時間變化進行評價。 The discharge pressure evaluation method of claim 1 further includes the step of extracting a characteristic amount of the temporal change of the discharge pressure in a second period shorter than the evaluation target period among the evaluation target periods, as The step of the second characteristic quantity: evaluating the time change of the discharge pressure based on the above-mentioned overall characteristic quantity and the above-mentioned second characteristic quantity. 如請求項8之吐出壓力評價方法,其中,將開始自上述噴嘴吐出處理液起既定之上升初期期間,設定為上述第二期間,於整個上述上升初期期間,上述吐出壓力係隨著時間經過而增大, 對於上述上升初期期間中上述吐出壓力之時間變化的回歸曲線、與上述上升初期期間中上述吐出壓力的時間變化之差,抽選出表示該差之特徵量,作為上述第二特徵量。 The discharge pressure evaluation method of claim 8, wherein a predetermined initial rising period after the process liquid is discharged from the nozzle is set as the second period, and the discharge pressure increases with the passage of time during the entire initial rising period. increase, From the difference between the regression curve of the time change of the discharge pressure in the initial rise period and the time change of the discharge pressure in the initial rise period, a feature quantity representing the difference is extracted as the second feature quantity. 如請求項8之吐出壓力評價方法,其中,將開始自上述噴嘴吐出處理液起至上述吐出壓力增大為上述既定壓力為止之上升期間,設定為上述第二期間。 The discharge pressure evaluation method according to claim 8, wherein the rising period from when the nozzle starts discharging the treatment liquid until the discharge pressure increases to the predetermined pressure is set as the second period. 如請求項10之吐出壓力評價方法,其中,抽選出上述上升期間之長度,而作為上述第二特徵量。 In the discharge pressure evaluation method of claim 10, the length of the rising period is extracted as the second characteristic quantity. 如請求項10之吐出壓力評價方法,其中,抽選出上述上升期間中上述吐出壓力之時間變化的一次微分與既定之臨限值交叉的次數,作為上述第二特徵量。 The discharge pressure evaluation method of claim 10, wherein the number of times a first derivative of the time change of the discharge pressure crosses a predetermined threshold value during the rising period is selected as the second characteristic quantity. 如請求項10之吐出壓力評價方法,其中,抽選出上述上升期間中上述吐出壓力之時間變化的二次微分之絕對值與既定之臨限值交叉的次數,作為上述第二特徵量。 The discharge pressure evaluation method of Claim 10, wherein the number of times an absolute value of the second derivative of the time change of the discharge pressure crosses a predetermined threshold value during the rising period is selected as the second characteristic quantity. 如請求項10之吐出壓力評價方法,其中,對於上述上升期間中,上述吐出壓力之時間變化的二次微分變得較既定之正臨限值為大之時間、與上述吐出壓力之時間變化的二次微分變得較具有與上述正臨限值相同之絕對值的既定之負臨限值為小之時間的比,抽選出該比,作為上述第二特徵量。 The discharge pressure evaluation method of Claim 10, wherein during the rising period, the time when the second derivative of the time change of the discharge pressure becomes larger than a predetermined positive threshold value, and the time when the time change of the discharge pressure The ratio of the time at which the quadratic differential becomes smaller than a predetermined negative threshold value having the same absolute value as the positive threshold value is extracted as the second feature quantity. 如請求項8至14中任一項之吐出壓力評價方法,其中,將上述吐出壓力增大至上述既定壓力為止之既定的上升終期期間,設定為上述第二期間, 對於近似於上述上升終期期間中上述吐出壓力之時間變化的上升終期近似波形、與上述上升終期期間中上述吐出壓力的時間變化之差,抽選出表示該差之特徵量,而作為上述第二特徵量,上述上升終期近似波形係具有:上升終期近似直線,其係藉由直線近似於較上述既定壓力更小之壓力範圍中隨著時間經過而增大之上述吐出壓力的時間變化,與求出之近似曲線相重疊,至上述上升終期期間後之穩定期間的上述吐出壓力之時間變化的平均值即穩定壓力為止,隨著時間經過而線性地增大;以及延伸直線,其係自上述上升終期近似直線延伸至上述上升終期期間之結束時間點,表示上述穩定壓力。 The discharge pressure evaluation method according to any one of claims 8 to 14, wherein a predetermined rising end period until the discharge pressure increases to the predetermined pressure is set as the second period, The difference between the rise end approximate waveform that approximates the time change of the discharge pressure during the rise end period and the time change of the discharge pressure during the rise end period is extracted as the second feature. quantity, the above-mentioned approximate waveform at the end of rise has: an approximate straight line at the end of rise, which is a linear approximation to the time change of the above-mentioned discharge pressure that increases with the passage of time in a pressure range smaller than the above-mentioned predetermined pressure, and is obtained The approximate curve increases linearly with the passage of time until the average value of the time change of the discharge pressure in the stable period after the above-mentioned end-of-rise period is the stable pressure; and a straight line is extended from the above-mentioned end-of-rise period. The approximate straight line extending to the end time point of the above-mentioned rising terminal period represents the above-mentioned stable pressure. 如請求項8至14中任一項之吐出壓力評價方法,其中,將自上述吐出壓力達到最大值之時間點起,至上述吐出壓力之時間變化的二次微分與零交叉兩次之時間點為止的初期振動期間,設定為上述第二期間,對於上述初期振動期間中上述吐出壓力的最小值及上述初期振動期間後之既定的穩定期間中上述吐出壓力的平均值中較小的壓力、與上述吐出壓力的上述最大值之差,抽選出該差,作為上述第二特徵量。 The method for evaluating discharge pressure according to any one of claims 8 to 14, wherein: from the time point when the above-mentioned discharge pressure reaches the maximum value to the time point when the second derivative of the time change of the above-mentioned discharge pressure crosses zero twice The initial vibration period until The difference between the maximum value of the discharge pressure is extracted and used as the second feature quantity. 如請求項8至14中任一項之吐出壓力評價方法,其中,將上述吐出壓力超過上述既定壓力之時間點起既定之遷移期間,設定為上述第二期間, 對上述遷移期間中上述吐出壓力相對於上述遷移期間後既定的穩定期間中上述吐出壓力的平均值之差,抽選出表示該差之特徵量,作為上述第二特徵量。 The discharge pressure evaluation method according to any one of claims 8 to 14, wherein a predetermined transition period from the time point when the discharge pressure exceeds the predetermined pressure is set as the second period, From the difference between the discharge pressure during the transition period and the average value of the discharge pressure during a predetermined stable period after the transition period, a characteristic quantity representing the difference is extracted as the second characteristic quantity. 如請求項8至14中任一項之吐出壓力評價方法,其中,將自上述吐出壓力超過上述既定壓力之時間點起,至朝向自上述噴嘴吐出處理液之結束而開始減少上述吐出壓力之時間點為止的定壓期間,設定為上述第二期間,抽選出表示上述定壓期間中上述吐出壓力的最大值與最小值之差的特徵量,作為上述第二特徵量。 The discharge pressure evaluation method according to any one of claims 8 to 14, wherein the time from when the discharge pressure exceeds the predetermined pressure to the time when the discharge pressure starts to decrease toward the end of discharge of the treatment liquid from the nozzle The constant pressure period up to the point is set as the second period, and a characteristic quantity representing the difference between the maximum value and the minimum value of the discharge pressure in the constant pressure period is extracted as the second characteristic quantity. 一種吐出壓力評價程式,其係使電腦執行如下步驟:於至少包含主要期間之評價對象期間中,測定吐出壓力的步驟,其中,上述主要期間係藉由對處理液賦予上述吐出壓力而自噴嘴吐出處理液之吐出裝置,從開始自上述噴嘴吐出處理液起,經過上述吐出壓力上升至既定壓力,直至上述吐出壓力開始自上述既定壓力減少為止的期間;抽選出上述評價對象期間全體中上述吐出壓力之時間變化所具有的特徵量,作為全體特徵量的步驟;以及根據上述全體特徵量對上述吐出壓力之時間變化進行評價的步驟。 A discharge pressure evaluation program that causes a computer to execute the step of measuring the discharge pressure in an evaluation target period including at least a main period in which the process liquid is discharged from a nozzle by applying the discharge pressure to the process liquid. The discharge device of the processing liquid starts to discharge the processing liquid from the nozzle, passes through the period when the discharge pressure rises to a predetermined pressure, and ends when the discharge pressure starts to decrease from the predetermined pressure; the discharge pressure is selected from the entire evaluation target period. The step of using the characteristic quantity of the temporal change as an overall characteristic quantity; and the step of evaluating the temporal variation of the discharge pressure based on the overall characteristic quantity. 一種記錄媒體,其包括申請專利範圍第19項所述之吐出壓力評價程式,該吐出壓力評價程式藉由電腦可讀出地記錄。 A recording medium including the discharge pressure evaluation program described in claim 19, the discharge pressure evaluation program being recorded in a computer-readable manner. 一種基板處理裝置,其係具備有:噴嘴;壓力賦予部,其對處理液賦予吐出壓力而使上述噴嘴吐出處理液; 測定部,其測定上述吐出壓力;以及控制部,其係於至少包含主要期間之評價對象期間中,取得上述測定部所測定之上述吐出壓力,其中,上述主要期間係從開始自上述噴嘴吐出處理液起,經過上述吐出壓力上升至既定壓力,直至上述吐出壓力開始自上述既定壓力減少為止的期間;上述控制部抽選出上述評價對象期間全體中上述吐出壓力之時間變化所具有的特徵量,作為全體特徵量,並根據上述全體特徵量對上述吐出壓力之時間變化進行評價。 A substrate processing apparatus is provided with: a nozzle; and a pressure applying part that applies a discharge pressure to a processing liquid to cause the nozzle to discharge the processing liquid; a measurement unit that measures the discharge pressure; and a control unit that obtains the discharge pressure measured by the measurement unit during an evaluation target period including at least a main period from the start of the nozzle discharge process The period during which the discharge pressure rises to a predetermined pressure after the liquid rises until the discharge pressure starts to decrease from the predetermined pressure; the control unit extracts the characteristic amount of the temporal change of the discharge pressure in the entire evaluation target period as The overall characteristic quantity is used to evaluate the time change of the discharge pressure based on the overall characteristic quantity.
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