TWI826624B - Chemical-mechanical polishing slurry and its using method - Google Patents
Chemical-mechanical polishing slurry and its using method Download PDFInfo
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- 238000005498 polishing Methods 0.000 title claims abstract description 75
- 239000002002 slurry Substances 0.000 title abstract description 10
- 238000000034 method Methods 0.000 title abstract description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 67
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 32
- 239000002245 particle Substances 0.000 claims abstract description 28
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 23
- 125000005233 alkylalcohol group Chemical group 0.000 claims abstract description 11
- 239000007788 liquid Substances 0.000 claims description 33
- 239000000126 substance Substances 0.000 claims description 32
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 claims description 14
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 claims description 5
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 claims description 5
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 3
- 229920000642 polymer Polymers 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 230000003746 surface roughness Effects 0.000 abstract description 8
- 239000002736 nonionic surfactant Substances 0.000 abstract description 7
- 239000000356 contaminant Substances 0.000 abstract description 5
- 239000003989 dielectric material Substances 0.000 abstract description 5
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 13
- 239000010410 layer Substances 0.000 description 12
- 229910004298 SiO 2 Inorganic materials 0.000 description 10
- 239000012530 fluid Substances 0.000 description 8
- 238000007517 polishing process Methods 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- LQZZUXJYWNFBMV-UHFFFAOYSA-N dodecan-1-ol Chemical compound CCCCCCCCCCCCO LQZZUXJYWNFBMV-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000003082 abrasive agent Substances 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000003344 environmental pollutant Substances 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- 231100000719 pollutant Toxicity 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- 229920001213 Polysorbate 20 Polymers 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- 239000003002 pH adjusting agent Substances 0.000 description 2
- 235000010486 polyoxyethylene sorbitan monolaurate Nutrition 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- HLZKNKRTKFSKGZ-UHFFFAOYSA-N tetradecan-1-ol Chemical compound CCCCCCCCCCCCCCO HLZKNKRTKFSKGZ-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- LXOFYPKXCSULTL-UHFFFAOYSA-N 2,4,7,9-tetramethyldec-5-yne-4,7-diol Chemical compound CC(C)CC(C)(O)C#CC(C)(O)CC(C)C LXOFYPKXCSULTL-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 239000003899 bactericide agent Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000005380 borophosphosilicate glass Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229940075614 colloidal silicon dioxide Drugs 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000000256 polyoxyethylene sorbitan monolaurate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- KJIOQYGWTQBHNH-UHFFFAOYSA-N undecanol Chemical compound CCCCCCCCCCCO KJIOQYGWTQBHNH-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/31051—Planarisation of the insulating layers
- H01L21/31053—Planarisation of the insulating layers involving a dielectric removal step
- H01L21/31055—Planarisation of the insulating layers involving a dielectric removal step the removal being a chemical etching step, e.g. dry etching
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
本發明是關於拋光液技術領域，尤其是關於一種用於集成電路製造領域二氧化矽基材平坦化的化學機械拋光液及其應用。The present invention relates to the technical field of polishing liquids, and in particular to a chemical mechanical polishing liquid used for planarizing silicon dioxide substrates in the field of integrated circuit manufacturing and its application.
在集成電路的製造過程中，矽晶圓基片上往往構建了成千上萬的結構單元，這些結構單元通過多層金屬互連進一步形成功能性電路和元器件。在多層金屬互連結構中，金屬導線之間填充二氧化矽或摻雜其他元素的二氧化矽作為層間介電質（Inter-Layer Dielectric, ILD）。隨著集成電路金屬互連技術的發展和佈線層數的增加，化學機械拋光（Chemical Mechanical Polishing, CMP）已經廣泛應用於芯片製造過程中的表面平坦化。這些平坦化的芯片表面有助於多層集成電路的生產，且防止將電介層塗覆在不平表面上引起的畸變。In the manufacturing process of integrated circuits, thousands of structural units are often built on silicon wafer substrates, and these structural units are further formed into functional circuits and components through multi-layer metal interconnections. In a multi-layer metal interconnection structure, silicon dioxide or silicon dioxide doped with other elements is filled between metal wires as the inter-layer dielectric (Inter-Layer Dielectric, ILD). With the development of integrated circuit metal interconnection technology and the increase in the number of wiring layers, chemical mechanical polishing (CMP) has been widely used for surface planarization in the chip manufacturing process. These planarized chip surfaces facilitate the production of multilayer integrated circuits and prevent distortion caused by coating dielectric layers on uneven surfaces.
CMP工藝就是使用一種含磨料的混合物和拋光墊拋光集成電路表面。在典型的化學機械拋光方法中，將襯底直接與旋轉拋光墊接觸，用一載重物在襯底背面施加壓力。在拋光期間，墊片和操作臺旋轉，同時在襯底背面保持向下的力，將磨料和化學活性溶液（通常稱為拋光液或拋光漿料）塗於墊片上，該拋光液與正在拋光的薄膜發生化學反應開始進行拋光過程。The CMP process uses an abrasive mixture and polishing pads to polish the integrated circuit surface. In a typical chemical mechanical polishing method, the substrate is placed in direct contact with a rotating polishing pad and a weight is used to apply pressure on the backside of the substrate. During polishing, the pad and table rotate while maintaining a downward force on the back of the substrate, applying an abrasive and chemically active solution (often called polishing fluid or polishing slurry) to the pad that is in contact with the polishing fluid being polished. A chemical reaction occurs in the polished film to begin the polishing process.
二氧化矽作為集成電路中常用的介電材料，在很多拋光工藝中都會涉及二氧化矽介質層的去除。如在氧化物層間介質拋光過程中，拋光漿料主要用於去除氧化物介質層並平坦化；在淺溝槽隔離層拋光時，拋光液主要用於去除以及平坦化氧化物介質層並停在氮化矽上；在阻擋層拋光中，拋光液需要去除二氧化矽、銅和銅阻擋層；在矽通孔（Through Silicon Via, TSV）工藝，通孔的形成也需要用拋光液去除多餘的二氧化矽。在這些拋光工藝中，都要求較高的氧化物介質層的去除速率，以保證產能。Silicon dioxide is a commonly used dielectric material in integrated circuits, and many polishing processes involve the removal of the silicon dioxide dielectric layer. For example, in the polishing process of the oxide interlayer dielectric, the polishing slurry is mainly used to remove and planarize the oxide dielectric layer; in the polishing of the shallow trench isolation layer, the polishing slurry is mainly used to remove and planarize the oxide dielectric layer and stop it. On silicon nitride; in barrier layer polishing, the polishing slurry needs to remove silicon dioxide, copper and copper barrier layers; in the through silicon via (TSV) process, the formation of through holes also requires the use of polishing slurry to remove excess nitride. Silicon oxide. In these polishing processes, a high removal rate of the oxide dielectric layer is required to ensure throughput.
氧化物介電材料包括薄膜熱氧化二氧化矽（thin thermal oxide）、高密度等離子二氧化矽（high density plasma oxide）、硼磷化矽玻璃（borophosphosilicate glass）、四乙氧基二氧化矽（PETEOS）和摻碳二氧化矽（carbon doped oxide）等。用於二氧化矽介電材料拋光漿料的拋光磨料主要為二氧化鈰和二氧化矽，但氧化鈰磨料在拋光過程中容易劃傷表面。二氧化矽在拋光過程中產生的表面缺陷較少，故大量使用二氧化矽作為研磨顆粒。但為了達到較高的氧化物材料去除速率，通常通過提高研磨顆粒的用量來達到，但研磨顆粒用量的增大會導致晶圓表面粗糙度增加。Oxide dielectric materials include thin thermal oxide, high density plasma oxide, borophosphosilicate glass, PETEOS ) and carbon doped oxide, etc. The polishing abrasives used for silicon dioxide dielectric material polishing slurry are mainly ceria and silicon dioxide, but ceria abrasives can easily scratch the surface during the polishing process. Silica produces fewer surface defects during the polishing process, so silica is used extensively as abrasive particles. However, in order to achieve a higher oxide material removal rate, it is usually achieved by increasing the amount of abrasive particles. However, an increase in the amount of abrasive particles will lead to an increase in wafer surface roughness.
中國專利CN104449396A公開的一種化學機械拋光液採用了磺酸類化合物來改善拋光後二氧化矽的表面缺陷度，該拋光液包括水、膠體二氧化矽磨料、磺酸類添加劑、包合物和氧化劑，pH值大於等於10。該化學機械拋光液具有的氧化矽去除速率為≥1000Å/分鐘，以及促進了拋光後尺寸＞0.16微米的SP1缺陷計數≤70、SP1劃痕數≤25。許多專利也公開了非離子表面活性劑在拋光液中的應用。中國專利CN1688665A公開了一種兩親性非離子表面活性劑在銅的化學機械拋光工藝中的應用，通過加入該表面活性劑減少了碟形下陷以及介電層侵蝕，但未談及該表面活性劑對二氧化矽表面的影響。中國專利CN101280158A公開了一種多晶矽的化學機械拋光液，通過選用多元醇型非離子表面活性劑來抑制多晶矽的去除速率，獲得工藝要求的多晶矽/二氧化矽去除速率選擇比。但未提及該非離子表面活性劑對二氧化矽表面的影響。Chinese patent CN104449396A discloses a chemical mechanical polishing liquid that uses sulfonic acid compounds to improve the surface defects of polished silicon dioxide. The polishing liquid includes water, colloidal silicon dioxide abrasives, sulfonic acid additives, inclusion compounds and oxidants, pH Value is greater than or equal to 10. The chemical mechanical polishing fluid has a silicon oxide removal rate of ≥1000Å/min, and promotes SP1 defect count ≤70 and SP1 scratch count ≤25 with a size >0.16 micron after polishing. Many patents also disclose the use of nonionic surfactants in polishing fluids. Chinese patent CN1688665A discloses the application of an amphiphilic nonionic surfactant in the chemical mechanical polishing process of copper. By adding the surfactant, dishing subsidence and dielectric layer erosion are reduced, but the surfactant is not mentioned. Effect on silica surface. Chinese patent CN101280158A discloses a chemical mechanical polishing liquid for polycrystalline silicon. By selecting a polyol-type nonionic surfactant to suppress the removal rate of polycrystalline silicon, the polycrystalline silicon/silicon dioxide removal rate selectivity ratio required by the process is obtained. However, the effect of this nonionic surfactant on the silica surface was not mentioned.
為了克服現有化學拋光液在拋光過程中二氧化矽（TEOS）的表面粗糙度值大和污染物殘留多的問題，亟待尋求新的化學機械拋光液。In order to overcome the problems of large surface roughness and excessive pollutant residues of silicon dioxide (TEOS) during the polishing process of existing chemical polishing liquids, it is urgent to find new chemical mechanical polishing liquids.
為解決上述問題，本發明提出一種化學機械拋光液，該化學機械拋光液藉由特定分子結構的非離子表面活性劑改善了拋光後晶圓表面平整度和污染物殘留多的問題。In order to solve the above problems, the present invention proposes a chemical mechanical polishing liquid. The chemical mechanical polishing liquid uses a non-ionic surfactant with a specific molecular structure to improve the flatness of the polished wafer surface and the problems of excessive contaminant residues.
為實現以上目的，本發明藉由以下技術方案實現：提供一種化學機械拋光液，其包含研磨顆粒和乙氧基化丁氧基化烷基醇。In order to achieve the above objects, the present invention is achieved through the following technical solution: providing a chemical mechanical polishing liquid, which contains abrasive particles and ethoxylated butoxylated alkyl alcohol.
較佳地，所述乙氧基丁氧基化烷基醇中乙氧基數x為5-20，丁氧基數y為5-20，烷基為碳原子數11-15的直鏈或支鏈。Preferably, the number of ethoxy groups x in the ethoxybutoxylated alkyl alcohol is 5-20, the number y of butoxy groups is 5-20, and the alkyl group is a linear or branched chain with 11-15 carbon atoms. .
較佳地，所述乙氧基丁氧基化烷基醇的質量百分比濃度為0.0005%-1%Preferably, the mass percentage concentration of the ethoxybutoxylated alkyl alcohol is 0.0005%-1%
較佳地，所述乙氧基丁氧基化烷基醇的質量百分比濃度為0.001%-0.5%。Preferably, the mass percentage concentration of the ethoxybutoxylated alkyl alcohol is 0.001%-0.5%.
較佳地，所述的研磨顆粒選自二氧化矽、三氧化二鋁、二氧化鈰、摻雜鋁的二氧化矽和聚合物顆粒中的一種或多種。Preferably, the abrasive particles are selected from one or more of silica, aluminum oxide, ceria, aluminum-doped silica and polymer particles.
較佳地，所述研磨顆粒的質量百分比含量為5-30%。。Preferably, the mass percentage content of the grinding particles is 5-30%. .
較佳地，所述研磨顆粒的質量百分比含量為10-25%。Preferably, the mass percentage content of the grinding particles is 10-25%.
較佳地，所述研磨顆粒的粒徑為30~200nm。Preferably, the particle size of the grinding particles is 30 to 200 nm.
較佳地，所述研磨顆粒的粒徑為50~180nm。Preferably, the particle size of the abrasive particles is 50 to 180 nm.
較佳地，所述化學機械拋光液的pH值為8-12。Preferably, the pH value of the chemical mechanical polishing liquid is 8-12.
較佳地，所述化學機械拋光液的pH值為9-12。Preferably, the pH value of the chemical mechanical polishing liquid is 9-12.
本發明的化學機械拋光液還可以包括金屬緩蝕劑、絡合劑、氧化劑等用來同時對二氧化矽和金屬進行拋光。The chemical mechanical polishing liquid of the present invention may also include metal corrosion inhibitors, complexing agents, oxidants, etc. to simultaneously polish silicon dioxide and metal.
本發明的化學機械拋光液還可以包括pH調節劑、殺菌劑等其他本領域常用的添加劑。The chemical mechanical polishing liquid of the present invention may also include pH adjusters, bactericides and other additives commonly used in this field.
本發明另一方面，在於提供一種如上所述的化學機械拋光液在二氧化矽拋光中的應用。Another aspect of the present invention is to provide an application of the above-mentioned chemical mechanical polishing liquid in silicon dioxide polishing.
本發明的化學機械拋光液可按下述方法製備：將所述組分按比例混合均勻，用pH調節劑（如KOH或HNO3 ）調節到所需要的pH值即可。The chemical mechanical polishing liquid of the present invention can be prepared as follows: the components are mixed uniformly in proportion, and a pH adjuster (such as KOH or HNO 3 ) is used to adjust the pH value to the required value.
與現有技術相比較，本發明的化學機械拋光液具有如下有益效果：本發明的化學機械拋光液，通過特定分子結構的非離子表面活性劑，極大地改善了拋光後二氧化矽（TEOS）的表面粗糙度，並有效地減少了表面污染物的殘留，在獲得高的二氧化矽（TEOS）去除速率的同時還保證拋光後獲得較好的晶圓表面光潔度和平坦度，能夠滿足各種工藝條件下對介質材料表面的要求。Compared with the existing technology, the chemical mechanical polishing liquid of the present invention has the following beneficial effects: the chemical mechanical polishing liquid of the present invention greatly improves the properties of polished silicon dioxide (TEOS) through non-ionic surfactants with specific molecular structures. surface roughness, and effectively reduces the residue of surface contaminants. While obtaining a high silicon dioxide (TEOS) removal rate, it also ensures better wafer surface finish and flatness after polishing, which can meet various process conditions. The following are the requirements for the surface of the media material.
以下結合具體實施例，對本發明做進一步說明。應理解，以下實施例僅用於說明本發明而非用於限制本發明的範圍。The present invention will be further described below with reference to specific examples. It should be understood that the following examples are only used to illustrate the present invention and are not intended to limit the scope of the present invention.
本發明所用試劑及原料均市售可得。The reagents and raw materials used in the present invention are all commercially available.
本發明所述wt%均指的是質量百分含量。製備實施例： The wt% mentioned in the present invention refers to the mass percentage. Preparation Example:
表1為本發明實施例1-11以及對比例1-3的拋光液的成分及含量。按照該表配製實施例和對比例拋光液，將各組分混合均勻，用水補足質量百分比至100%，用pH調節劑調節pH至相應值，得到本發明各實施例及對比例的拋光液。
表1 本發明實施例1-11和對比例1-3的拋光液成分
採用對比1~3拋光液和實施例1~11拋光液按照下述拋光條件對二氧化矽（TEOS）進行拋光，拋光條件：拋光機台為12”Reflexion LK機台，拋光墊為IC1010 pad，下壓力為4.0psi，轉速為拋光盤/拋光頭=93/87rpm，拋光液流速為300ml/min，拋光時間為1min。去除速率，用原子力顯微鏡AFM測試的拋光後的二氧化矽晶圓表面粗糙度，以及用缺陷掃描儀SP2測試的拋光後的二氧化矽晶圓表面污染物顆粒數的結果見表2。
表2 對比1~3拋光液和實施例1~11拋光液對TEOS的去除速率、表面粗糙度、表面污染物顆粒數
結果如表2所示：乙氧基丁氧基化烷基醇的加入，極大的改善了拋光後TEOS的表面粗糙度，並有效的減少了表面污染物的殘留，因而採用本發明的拋光液在獲得高的二氧化矽去除速率的同時保證拋光後獲得較好的晶圓表面光潔度和平坦度，能夠滿足各種工藝條件下對介質材料表面的要求。The results are shown in Table 2: the addition of ethoxybutoxylated alkyl alcohol greatly improved the surface roughness of TEOS after polishing and effectively reduced the residue of surface pollutants. Therefore, the polishing slurry of the present invention was used While obtaining a high silicon dioxide removal rate, it ensures better wafer surface finish and flatness after polishing, which can meet the requirements for the surface of dielectric materials under various process conditions.
應當注意的是，本發明的實施例有較佳的實施性，且並非對本發明作任何形式的限制，任何熟悉該領域的技術人員可能利用上述揭示的技術內容變更或修飾為等同的有效實施例，但凡未脫離本發明技術方案的內容，依據本發明的技術實質對以上實施例所作的任何修改或等同變化及修飾，均仍屬於本發明技術方案的範圍內。It should be noted that the embodiments of the present invention have better implementability and are not intended to limit the present invention in any way. Any person familiar with the art may change or modify the above-disclosed technical contents into equivalent and effective embodiments. , as long as they do not deviate from the content of the technical solution of the present invention, any modifications or equivalent changes and modifications made to the above embodiments based on the technical essence of the present invention still fall within the scope of the technical solution of the present invention.
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