TWI824509B - adhesive sheet - Google Patents

adhesive sheet Download PDF

Info

Publication number
TWI824509B
TWI824509B TW111117102A TW111117102A TWI824509B TW I824509 B TWI824509 B TW I824509B TW 111117102 A TW111117102 A TW 111117102A TW 111117102 A TW111117102 A TW 111117102A TW I824509 B TWI824509 B TW I824509B
Authority
TW
Taiwan
Prior art keywords
adhesive sheet
layer
adhesive
gas generating
gas
Prior art date
Application number
TW111117102A
Other languages
Chinese (zh)
Other versions
TW202233780A (en
Inventor
上野周作
平山高正
Original Assignee
日商日東電工股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日東電工股份有限公司 filed Critical 日商日東電工股份有限公司
Publication of TW202233780A publication Critical patent/TW202233780A/en
Application granted granted Critical
Publication of TWI824509B publication Critical patent/TWI824509B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • B32B7/023Optical properties
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00Adhesives based on unspecified macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J5/00Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J5/00Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
    • C09J5/04Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers involving separate application of adhesive ingredients to the different surfaces to be joined
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/40Additional features of adhesives in the form of films or foils characterized by the presence of essential components
    • C09J2301/416Additional features of adhesives in the form of films or foils characterized by the presence of essential components use of irradiation
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/50Additional features of adhesives in the form of films or foils characterized by process specific features
    • C09J2301/502Additional features of adhesives in the form of films or foils characterized by process specific features process for debonding adherents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2400/00Presence of inorganic and organic materials
    • C09J2400/20Presence of organic materials
    • C09J2400/24Presence of a foam

Landscapes

  • Organic Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Adhesive Tapes (AREA)
  • Materials For Medical Uses (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Laminated Bodies (AREA)

Abstract

本發明提供一種黏著片材,其同時實現優異之黏著性與剝離性,且被黏著體視認性(隔著黏著片材之視認性)優異。 本發明之黏著片材具備藉由雷射光照射而產生氣體之氣體產生層,霧度值為50%以下。於一實施方式中,上述氣體產生層之厚度為0.1 μm~50 μm。於一實施方式中,上述氣體產生層為可吸收紫外線之層。於一實施方式中,上述氣體產生層含有紫外線吸收劑。 The present invention provides an adhesive sheet that achieves both excellent adhesiveness and peelability and has excellent visibility to an adherend (visibility across the adhesive sheet). The adhesive sheet of the present invention has a gas generating layer that generates gas when irradiated with laser light, and has a haze value of 50% or less. In one embodiment, the thickness of the gas generating layer ranges from 0.1 μm to 50 μm. In one embodiment, the gas generating layer is a layer that can absorb ultraviolet rays. In one embodiment, the gas generating layer contains an ultraviolet absorber.

Description

黏著片材adhesive sheet

本發明係關於一種黏著片材。The present invention relates to an adhesive sheet.

先前,於對電子零件進行處理(加工)時,存在進行如下操作之情形,即,於處理時將被處理體經由黏著片材而暫時固定於固定台,於處理後將被處理體自該黏著片材剝離。作為此種操作中所使用之黏著片材,存在使用如下黏著片材之情形,該黏著片材於處理時具有特定之黏著力,於處理後黏著力可下降。作為此種黏著片材之一,提出有使黏著劑層中含有熱膨脹性微小球而構成之黏著片材(例如專利文獻1)。含有熱膨脹性微小球之黏著片材具有如下特徵:具有特定之黏著力,且藉由利用加熱使熱膨脹性微小球膨脹,而於黏著面形成凹凸,從而使接觸面積減小,因此黏著力會下降或消失。此種黏著片材具有無外應力便可容易地剝離被處理體之優點。Previously, when electronic components were processed (processed), there were cases where the object to be processed was temporarily fixed to a fixing table via an adhesive sheet during processing, and the object to be processed was removed from the adhesive sheet after processing. The sheet peels off. As an adhesive sheet used in such an operation, there are cases where an adhesive sheet is used that has a specific adhesive force during processing and that can be reduced in adhesive force after processing. As one such adhesive sheet, an adhesive sheet containing heat-expandable microspheres in an adhesive layer has been proposed (for example, Patent Document 1). The adhesive sheet containing thermally expandable microspheres has the following characteristics: It has a specific adhesive force, and by using heat to expand the thermally expandable microspheres, unevenness is formed on the adhesive surface, thereby reducing the contact area and thus reducing the adhesive force. or disappear. This kind of adhesive sheet has the advantage that the object to be processed can be easily peeled off without external stress.

然而,含有熱膨脹性微小球之黏著片材之透光性較低,於使用該黏著片材之情形時,產生如下問題:難以隔著黏著片材視認為了顯示電子零件之暫時固定位置而設於固定台之標記。 先前技術文獻 專利文獻 However, the light transmittance of the adhesive sheet containing thermally expandable microspheres is low, and when the adhesive sheet is used, the following problem arises: it is difficult to temporarily fix the position of the display electronic component through the adhesive sheet. Fixed platform mark. Prior technical literature patent documents

專利文獻1:日本專利特開2001-131507號公報Patent Document 1: Japanese Patent Application Publication No. 2001-131507

[發明所欲解決之問題][Problem to be solved by the invention]

本發明係為了解決上述先前之課題而完成者,其目的在於提供一種同時實現優異之黏著性與剝離性,且被黏著體視認性(隔著黏著片材之視認性)優異之黏著片材。 [解決問題之技術手段] The present invention was completed in order to solve the above-mentioned previous problems, and its object is to provide an adhesive sheet that achieves both excellent adhesiveness and peelability and has excellent visibility of the adherend (visibility through the adhesive sheet). [Technical means to solve problems]

本發明之黏著片材具備藉由雷射光照射而產生氣體之氣體產生層,且霧度值為50%以下。 於一實施方式中,上述氣體產生層之厚度為0.1 μm~50 μm。 於一實施方式中,上述氣體產生層為可吸收紫外線之層。 於一實施方式中,上述氣體產生層含有紫外線吸收劑。 於一實施方式中,上述黏著片材之波長360 nm之紫外線透過率為30%以下。 於一實施方式中,上述黏著片材之波長500 nm之紫外線透過率為50%~100%。 於一實施方式中,上述氣體產生層為產生烴系氣體之層。 於一實施方式中,上述氣體產生層之氣化起始溫度為150℃~500℃。 於一實施方式中,上述黏著片材之10%重量減少溫度為200℃~500℃。 於一實施方式中,上述黏著片材於上述氣體產生層之至少單側進而具備黏著劑層,該黏著劑層係其表面藉由對該黏著片材照射雷射光而變形之層。 於一實施方式中,上述黏著劑層之厚度為0.1 μm~50 μm。 於一實施方式中,上述黏著劑層藉由對上述黏著片材照射雷射光而發泡。 根據本發明之其他態樣,提供一種電子零件之處理方法。該電子零件之處理方法包括:將電子零件貼附於上述黏著片材上;及對該黏著片材照射雷射光而自該黏著片材剝離該電子零件。 於一實施方式中,上述電子零件之剝離係選擇位置地進行。 於一實施方式中,上述處理方法包括:於將上述電子零件貼附於上述黏著片材後且自該黏著片材剝離該電子零件前,對該電子零件進行特定處理。 於一實施方式中,上述處理為研磨加工、切割加工、黏晶、打線接合、蝕刻、蒸鍍、成型、電路形成、檢查、產品檢驗、洗淨、轉印、排列、修復或裝置表面保護。 根據本發明之其他態樣,提供一種電子零件之處理方法。該電子零件之處理方法包括:自上述黏著片材剝離上述電子零件之後,將電子零件配置於其他片材。 [發明之效果] The adhesive sheet of the present invention has a gas generating layer that generates gas when irradiated with laser light, and has a haze value of 50% or less. In one embodiment, the thickness of the gas generating layer ranges from 0.1 μm to 50 μm. In one embodiment, the gas generating layer is a layer that can absorb ultraviolet rays. In one embodiment, the gas generating layer contains an ultraviolet absorber. In one embodiment, the ultraviolet transmittance of the above-mentioned adhesive sheet at a wavelength of 360 nm is 30% or less. In one embodiment, the ultraviolet transmittance of the above-mentioned adhesive sheet at a wavelength of 500 nm is 50% to 100%. In one embodiment, the gas generating layer is a layer that generates hydrocarbon gas. In one embodiment, the gasification starting temperature of the gas generating layer is 150°C to 500°C. In one embodiment, the 10% weight loss temperature of the adhesive sheet is 200°C to 500°C. In one embodiment, the adhesive sheet further includes an adhesive layer on at least one side of the gas generating layer, and the adhesive layer is a layer whose surface is deformed by irradiating the adhesive sheet with laser light. In one embodiment, the thickness of the adhesive layer ranges from 0.1 μm to 50 μm. In one embodiment, the adhesive layer is foamed by irradiating the adhesive sheet with laser light. According to other aspects of the present invention, a method for processing electronic components is provided. The processing method of the electronic components includes: attaching the electronic components to the adhesive sheet; and irradiating the adhesive sheet with laser light to peel off the electronic components from the adhesive sheet. In one embodiment, the electronic components are peeled off at selected locations. In one embodiment, the above processing method includes: performing specific processing on the electronic component after attaching the electronic component to the adhesive sheet and before peeling off the electronic component from the adhesive sheet. In one embodiment, the above-mentioned processing is grinding, cutting, die bonding, wire bonding, etching, evaporation, molding, circuit formation, inspection, product inspection, cleaning, transfer, alignment, repair or device surface protection. According to other aspects of the present invention, a method for processing electronic components is provided. The processing method of the electronic components includes: peeling off the electronic components from the adhesive sheet, and arranging the electronic components on another sheet. [Effects of the invention]

根據本發明,可提供一種同時實現優異之黏著性與剝離性,且被黏著體視認性(隔著黏著片材之視認性)優異之黏著片材。According to the present invention, it is possible to provide an adhesive sheet that achieves both excellent adhesiveness and peelability and has excellent visibility to the adherend (visibility through the adhesive sheet).

A. 黏著片材之概要圖1(a)係本發明之較佳實施方式之黏著片材之概略剖視圖。黏著片材100具備氣體產生層10。氣體產生層10藉由雷射光照射而產生氣體。更詳細而言,氣體產生層10係藉由利用雷射光照射使其成分氣化而產生氣體之層。作為雷射光,代表性而言使用UV(ultraviolet,紫外線)雷射光。氣體產生層10可具有特定之黏著力。 A. Overview of Adhesive Sheet Figure 1(a) is a schematic cross-sectional view of an adhesive sheet according to a preferred embodiment of the present invention. The adhesive sheet 100 includes the gas generating layer 10 . The gas generating layer 10 generates gas by irradiation with laser light. More specifically, the gas generating layer 10 is a layer that generates gas by vaporizing its components using laser light irradiation. As the laser light, UV (ultraviolet, ultraviolet) laser light is typically used. The gas generating layer 10 may have specific adhesion.

圖1(b)係本發明之其他實施方式之黏著片材之概略剖視圖。黏著片材100'具備氣體產生層10與配置於氣體產生層10之單面之至少一層之黏著劑層20。黏著劑層20之表面會藉由對黏著片材(實質上為氣體產生層)照射雷射光而變形。於一實施方式中,該變形會因自氣體產生層10產生之氣體,而產生於黏著劑層20之與氣體產生層10相反之側。FIG. 1(b) is a schematic cross-sectional view of an adhesive sheet according to another embodiment of the present invention. The adhesive sheet 100' includes a gas generating layer 10 and at least one adhesive layer 20 arranged on one side of the gas generating layer 10. The surface of the adhesive layer 20 is deformed by irradiating the adhesive sheet (essentially a gas generating layer) with laser light. In one embodiment, the deformation occurs on the side of the adhesive layer 20 opposite to the gas generating layer 10 due to the gas generated from the gas generating layer 10 .

本發明之黏著片材可於氣體產生層或黏著劑層貼附電子零件等被處理體而使用。本發明之黏著片材具備氣體產生層,藉由雷射光照射而於微小範圍局部地產生氣體。藉由此種氣體之產生,而產生貼附面之變形,其結果,可使被黏著體良好地剝離。於黏著片材具備黏著劑層之情形時,如上所述,因該氣體之產生,而於黏著劑層產生變形,其結果,於照射過雷射光之部分表現剝離性。代表性而言,雷射光自氣體產生層之與黏著劑層相反之側照射。根據本發明,能以如上所述之方式於微小範圍產生變形,故而於對極其微細之小型電子零件進行處理(加工)時,亦可使該小型電子零件良好地剝離。又,即便於需要剝離之小型電子零件與不需要剝離之小型電子零件相鄰地暫時固定之情形時,亦可於剝離對象之部位進行剝離,於剝離對象外之部位不進行剝離,即,可僅使需要剝離之小型電子零件剝離,亦可防止小型電子零件之不需要之脫離。為使黏著劑層之變形良好地產生,較佳為以上述產生之氣體之至少一部分不自黏著片材逸出之方式阻隔,黏著劑層可作為氣體阻隔層發揮作用。The adhesive sheet of the present invention can be used by attaching an object to be processed such as electronic components to a gas generating layer or an adhesive layer. The adhesive sheet of the present invention is provided with a gas generating layer, which generates gas locally in a small range by irradiation with laser light. The generation of this gas causes deformation of the adhering surface, resulting in good peeling of the adherend. When the adhesive sheet has an adhesive layer, as described above, the adhesive layer is deformed due to the generation of the gas, and as a result, the portion irradiated with laser light exhibits peelability. Typically, the laser light is irradiated from the side of the gas generation layer opposite to the adhesive layer. According to the present invention, deformation can be generated in a micro range in the manner described above, so that when extremely fine small electronic components are processed (processed), the small electronic components can be peeled off satisfactorily. Furthermore, even when small electronic components that need to be peeled off are temporarily fixed adjacent to small electronic components that do not need to be peeled off, it is possible to peel off the parts to be peeled off and not to peel off parts other than the parts to be peeled off. It can only peel off small electronic parts that need to be peeled off, and can also prevent unnecessary detachment of small electronic parts. In order to cause the deformation of the adhesive layer to occur satisfactorily, it is preferable to block at least part of the gas generated above in such a manner that it does not escape from the adhesive sheet. The adhesive layer can function as a gas barrier layer.

所謂黏著劑層之變形係指於黏著劑層之法線方向(厚度方向)與水平方向(與厚度方向正交之方向)產生之位移。黏著劑層之變形例如藉由如下方式產生:藉由使用波長355 nm、光束直徑約20 μm 之UV雷射光,於0.80 mW功率、40 kHz頻率下進行脈衝掃描,而自氣體產生層產生氣體。關於變形後之形狀,例如對於脈衝掃描過之任意1點,於雷射光照射結束24小時後,根據共聚聚焦雷射顯微鏡或非接觸型干涉顯微鏡(WYKO)等之測定進行觀測。其形狀可為發泡(凸)、貫通孔(凹凸)、凹陷(凹),藉由該等變形而可產生剝離性。於要沿法線方向將電子零件效率良好地剝離時,較佳為雷射光照射前後之法線方向之位移變化較大,尤其適合形成發泡形狀者。發泡(凸)係以未照射部之黏著片材表面為基準,將最高點定義為垂直位移Y,將半峰全幅值定義為水平位移X(直徑)。關於雷射光照射後形成孔之貫通孔(凹凸)與凹陷(凹),將最高點與最低點之差定義為垂直位移Y,將孔之直徑定義為水平位移X。以下,亦將藉由雷射光照射而變形之部分稱為「變形部」。 The so-called deformation of the adhesive layer refers to the displacement in the normal direction (thickness direction) and horizontal direction (the direction orthogonal to the thickness direction) of the adhesive layer. The deformation of the adhesive layer is produced, for example, in the following way: by using a wavelength of 355 nm and a beam diameter of approximately 20 μm. The UV laser light is pulse scanned at a power of 0.80 mW and a frequency of 40 kHz to generate gas from the gas generation layer. Regarding the deformed shape, for example, any point that has been pulse scanned is observed by measurement using a confocal laser microscope or a non-contact interference microscope (WYKO) 24 hours after the laser irradiation is completed. The shape may be foamed (convex), through-holes (concave-convex), or recessed (concave), and these deformations can produce peelability. When it is necessary to efficiently peel off electronic components along the normal direction, it is preferable that the displacement in the normal direction before and after laser light irradiation changes greatly, especially for forming a foamed shape. Foaming (convexity) is based on the surface of the adhesive sheet in the unirradiated part. The highest point is defined as the vertical displacement Y, and the full amplitude at half maximum is defined as the horizontal displacement X (diameter). Regarding the through-holes (concave-convex) and depressions (concave) formed after laser light irradiation, the difference between the highest point and the lowest point is defined as the vertical displacement Y, and the diameter of the hole is defined as the horizontal displacement X. Hereinafter, the part deformed by laser light irradiation will also be referred to as the "deformation part".

圖2係本發明之其他實施方式之黏著片材之概略剖視圖。黏著片材200於氣體產生層10與黏著劑層20之間進而具備中間層30。藉由設置中間層,可容易地控制黏著劑層之變形(詳情於後文敍述)。又,中間層可與黏著劑層協作而作為氣體阻隔層發揮作用。因此,藉由設置中間層,氣體阻隔性會提高,可獲得黏著劑層更佳地變形之黏著片材。中間層可為單層,亦可為複數層。FIG. 2 is a schematic cross-sectional view of an adhesive sheet according to another embodiment of the present invention. The adhesive sheet 200 further includes an intermediate layer 30 between the gas generating layer 10 and the adhesive layer 20 . By providing an intermediate layer, the deformation of the adhesive layer can be easily controlled (details will be described later). In addition, the intermediate layer can cooperate with the adhesive layer to function as a gas barrier layer. Therefore, by providing the intermediate layer, the gas barrier properties will be improved, and an adhesive sheet with better deformation of the adhesive layer can be obtained. The middle layer can be a single layer or multiple layers.

雖未圖示,但上述黏著片材可進而具備其他層。例如,亦可於氣體產生層之與黏著劑層為相反側之面設有基材、其他黏著劑層等。作為基材,例如使用包含任意適當之樹脂之膜。Although not shown in the figure, the above-mentioned adhesive sheet may further include other layers. For example, a base material, other adhesive layers, etc. may be provided on the side of the gas generating layer opposite to the adhesive layer. As the base material, for example, a film containing any appropriate resin is used.

本發明之黏著片材之特徵在於,霧度值為50%以下。本發明中,可不含有不溶性之填料等而形成氣體產生層、黏著劑層及中間層,因此可獲得霧度值較小,透光性較高,白濁得到抑制之黏著片材。上述黏著片材於雷射照射前(暫時固定時),透明性較高。若使用此種黏著片材,則例如可隔著黏著片材視認被黏著體(例如,用於暫時固定電子零件之台),從而例如可隔著該黏著片材較佳地視認為了顯示電子零件之暫時固定位置而設於固定台之標記。此種效果為利用含有不溶性之填料之黏著片材(例如,作為剝離性表現層之黏著劑層中含有熱膨脹性微小球之黏著片材)無法獲得之優異效果。The adhesive sheet of the present invention is characterized by having a haze value of 50% or less. In the present invention, the gas generating layer, the adhesive layer and the intermediate layer can be formed without containing insoluble fillers. Therefore, an adhesive sheet with smaller haze value, higher light transmittance and suppressed white turbidity can be obtained. The above-mentioned adhesive sheet has high transparency before laser irradiation (when temporarily fixed). If such an adhesive sheet is used, for example, the adherend (for example, a stand for temporarily fixing electronic components) can be seen through the adhesive sheet, and the electronic component can be better seen through the adhesive sheet. A mark placed on the fixed platform to temporarily fix the position. This effect is an excellent effect that cannot be obtained by using an adhesive sheet containing an insoluble filler (for example, an adhesive sheet containing heat-expandable microspheres in the adhesive layer serving as a peelable expression layer).

本發明之黏著片材之霧度值較佳為0%~50%,更佳為0.01%~40%,進而較佳為0.05%~30%,尤佳為0.1%~20%。若為此種範圍,則本發明之上述效果變得更顯著。The haze value of the adhesive sheet of the present invention is preferably 0% to 50%, more preferably 0.01% to 40%, further preferably 0.05% to 30%, particularly preferably 0.1% to 20%. If it is such a range, the above-mentioned effect of this invention becomes more remarkable.

本發明之黏著片材之黏著劑層相對於SUS430之黏著力較佳為0.1 N/20 mm以上,更佳為0.2 N/20 mm~50 N/20 mm,進而較佳為0.5 N/20 mm~40 N/20 mm,尤佳為0.7 N/20 mm~20 N/20 mm,最佳為1 N/20 mm~10 N/20 mm。若為此種範圍,則可獲得例如作為電子零件之製造中所使用之暫時固定用片材而表現出良好之黏著性之黏著片材。本說明書中,所謂黏著力係指於23℃之環境下藉由依照JIS(Japanese Industrial Standards,日本工業標準) Z 0237:2000之方法(貼合條件:2 kg輥1個往返,拉伸速度:300 mm/min,剝離角度180°)而測定出之黏著力。The adhesive force of the adhesive layer of the adhesive sheet of the present invention relative to SUS430 is preferably 0.1 N/20 mm or more, more preferably 0.2 N/20 mm to 50 N/20 mm, and further preferably 0.5 N/20 mm. ~40 N/20 mm, especially 0.7 N/20 mm ~ 20 N/20 mm, the best is 1 N/20 mm ~ 10 N/20 mm. If it is within this range, it is possible to obtain an adhesive sheet that exhibits good adhesiveness as a temporary fixing sheet used in the manufacture of electronic components, for example. In this manual, the so-called adhesion refers to the method in accordance with JIS (Japanese Industrial Standards, Japanese Industrial Standards) Z 0237: 2000 in an environment of 23°C (laminating conditions: 2 kg roller 1 round trip, stretching speed: 300 mm/min, peeling angle 180°) and measured the adhesive force.

於一實施方式中,上述氣體產生層具有特定之黏著力。本發明之黏著片材之氣體產生層相對於SUS430之黏著力較佳為0.1 N/20 mm以上,更佳為0.5 N/20 mm~50 N/20 mm,進而較佳為1 N/20 mm~40 N/20 mm,尤佳為1.5 N/20 mm~30 N/20 mm,最佳為2 N/20 mm~20 N/20 mm。若為此種範圍,則可獲得例如作為電子零件之製造中所使用之暫時固定用片材而表現出良好之黏著性之黏著片材。In one embodiment, the gas generating layer has specific adhesion. The adhesive force of the gas generating layer of the adhesive sheet of the present invention relative to SUS430 is preferably 0.1 N/20 mm or more, more preferably 0.5 N/20 mm to 50 N/20 mm, and further preferably 1 N/20 mm. ~40 N/20 mm, preferably 1.5 N/20 mm ~ 30 N/20 mm, and optimally 2 N/20 mm ~ 20 N/20 mm. If it is within this range, it is possible to obtain an adhesive sheet that exhibits good adhesiveness as a temporary fixing sheet used in the manufacture of electronic components, for example.

本發明之黏著片材之厚度較佳為2 μm~200 μm,更佳為3 μm~150 μm,進而較佳為5 μm~120 μm。The thickness of the adhesive sheet of the present invention is preferably 2 μm to 200 μm, more preferably 3 μm to 150 μm, and further preferably 5 μm to 120 μm.

本發明之黏著片材之水蒸氣透過率較佳為5000 g/(m 2・day)以下,更佳為4800 g/(m 2・day)以下,進而較佳為4500 g/(m 2・day)以下,進而較佳為4200 g/(m 2・day)以下。具備具有此種範圍之水蒸氣透過率之黏著劑層(視需要進而具備中間層)之黏著片材中,防止藉由雷射光照射而產生之氣體之逸出,於黏著劑層形成優異形狀之變形部。若使用此種黏著片材,則可精度良好地使小型被黏著體(例如,電子零件)剝離。本發明之黏著片材之水蒸氣透過率越小越佳,其下限值例如為0.1 g/(m 2・day)。水蒸氣透過率可於30℃、90% RH之環境下藉由依照JIS K7129B之測定法而測定。 The water vapor transmittance of the adhesive sheet of the present invention is preferably 5000 g/(m 2 ·day) or less, more preferably 4800 g/(m 2 ·day) or less, and still more preferably 4500 g/(m 2 ·day). day) or less, and more preferably 4200 g/(m 2 ·day) or less. In an adhesive sheet having an adhesive layer (and an intermediate layer if necessary) with a water vapor transmittance in this range, the gas generated by laser irradiation is prevented from escaping, and an excellent shape is formed in the adhesive layer. Deformation Department. If such an adhesive sheet is used, small adherends (for example, electronic components) can be peeled off with high precision. The lower the water vapor transmission rate of the adhesive sheet of the present invention, the better, and its lower limit is, for example, 0.1 g/(m 2 ·day). The water vapor transmission rate can be measured in an environment of 30°C and 90% RH by the measurement method according to JIS K7129B.

包含上述黏著劑層與中間層之積層體之水蒸氣透過率較佳為10000 g/(m 2・day)以下,更佳為7000 g/(m 2・day)以下,進而較佳為5000 g/(m 2・day)以下,進而較佳為4800 g/(m 2・day)以下,尤佳為4500 g/(m 2・day)以下,最佳為4200 g/(m 2・day)以下。若為此種範圍,則包含黏著劑層與中間層之積層體作為氣體阻隔層良好地發揮作用,於黏著劑層形成優異形狀之變形部。若使用此種黏著片材,則可精度良好地使小型被黏著體(例如,電子零件)剝離。包含黏著劑層與中間層之積層體之水蒸氣透過率越小越佳,其下限值例如為1 g/(m 2・day)。 The water vapor transmission rate of the laminate including the adhesive layer and the intermediate layer is preferably 10,000 g/(m 2 · day) or less, more preferably 7,000 g/(m 2 · day) or less, and still more preferably 5,000 g /(m 2・day) or less, more preferably 4800 g/(m 2・day) or less, particularly preferably 4500 g/(m 2・day) or less, most preferably 4200 g/(m 2・day) the following. If it is within this range, the laminate including the adhesive layer and the intermediate layer will function well as a gas barrier layer, and a deformation portion with an excellent shape will be formed in the adhesive layer. If such an adhesive sheet is used, small adherends (for example, electronic components) can be peeled off with high precision. The lower the water vapor transmission rate of the laminate including the adhesive layer and the intermediate layer, the better. The lower limit is, for example, 1 g/(m 2 ·day).

包含上述黏著劑層與中間層之積層體之穿刺強度度較佳為10 mN~5000 mN,更佳為30 mN~4000 mN,進而較佳為50 mN~3000 mN,尤佳為100 mN~2000 mN。若為此種範圍,則包含黏著劑層與中間層之積層體作為氣體阻隔層良好地發揮作用,且較佳地產生藉由氣體之產生所引起之形狀變化,其結果,於黏著劑層形成優異形狀之變形部。若使用此種黏著片材,則可精度良好地使小型被黏著體(例如,電子零件)剝離。穿刺強度係如圖3所示,使用壓縮試驗機6(Kato Tech公司製造,商品名「KES-G5」),將樣品4(例如,積層體)夾於具有直徑11.28 mm之圓形開口部之試樣保持器5A、5B而測定。更詳細而言,可於23℃之測定溫度下,於該圓形開口部之圓形開口部中心,將穿刺針(曲率半徑:1 mm)對樣品穿刺(穿刺速度:0.1 mm/s),將於破裂點之最大負荷作為穿刺強度。The puncture strength of the laminate including the adhesive layer and the intermediate layer is preferably 10 mN to 5000 mN, more preferably 30 mN to 4000 mN, further preferably 50 mN to 3000 mN, particularly preferably 100 mN to 2000 mN. If it is within this range, the laminate including the adhesive layer and the intermediate layer functions well as a gas barrier layer and preferably produces a shape change caused by the generation of gas. As a result, the adhesive layer is formed Excellent shape deformation part. If such an adhesive sheet is used, small adherends (for example, electronic components) can be peeled off with high precision. As shown in Figure 3, the puncture strength is measured by using a compression tester 6 (manufactured by Kato Tech, trade name "KES-G5"), and clamping the sample 4 (for example, a laminated body) with a circular opening having a diameter of 11.28 mm. Sample holders 5A and 5B are used for measurement. More specifically, at a measurement temperature of 23°C, a puncture needle (radius of curvature: 1 mm) can be pierced into the sample (piercing speed: 0.1 mm/s) at the center of the circular opening. The maximum load at the rupture point is taken as the puncture strength.

包含上述黏著劑層與中間層之積層體之波長360 nm之紫外線透過率較佳為50%~100%,更佳為60%~95%。The ultraviolet transmittance at a wavelength of 360 nm of the laminate including the adhesive layer and the intermediate layer is preferably 50% to 100%, more preferably 60% to 95%.

上述黏著片材之波長360 nm之紫外線透過率較佳為30%以下,更佳為20%以下,進而較佳為15%以下,尤佳為10%以下,最佳為5%以下。黏著片材之波長360 nm之紫外線透過率之下限例如為0%(較佳為0.05%,更佳為0.1%)。The ultraviolet transmittance of the above-mentioned adhesive sheet at a wavelength of 360 nm is preferably 30% or less, more preferably 20% or less, further preferably 15% or less, particularly preferably 10% or less, and most preferably 5% or less. The lower limit of the ultraviolet transmittance of the adhesive sheet at a wavelength of 360 nm is, for example, 0% (preferably 0.05%, more preferably 0.1%).

上述黏著片材之波長500 nm之紫外線透過率較佳為50%~100%,更佳為60%~99%,進而較佳為70%~98%,尤佳為80%~97%。The ultraviolet transmittance of the above-mentioned adhesive sheet at a wavelength of 500 nm is preferably 50% to 100%, more preferably 60% to 99%, further preferably 70% to 98%, and even more preferably 80% to 97%.

上述黏著片材之10%重量減少溫度較佳為200℃~500℃,更佳為220℃~450℃,進而較佳為250℃~400℃,尤佳為270℃~370℃。若為此種範圍,則可獲得藉由雷射光照射而可形成更良好之變形部之黏著片材。所謂黏著片材之10%重量減少溫度係指使黏著片材升溫時之TGA分析中,相對於升溫前之重量而減少10重量%(即,黏著片材之重量相對於照射前之重量而成為90%)之時間點之溫度。The 10% weight reduction temperature of the adhesive sheet is preferably 200°C to 500°C, more preferably 220°C to 450°C, further preferably 250°C to 400°C, and particularly preferably 270°C to 370°C. If it is within this range, an adhesive sheet that can form a more favorable deformation portion by laser light irradiation can be obtained. The so-called 10% weight reduction temperature of the adhesive sheet refers to a 10% weight loss relative to the weight before heating (that is, the weight of the adhesive sheet becomes 90% relative to the weight before irradiation) in TGA analysis when the adhesive sheet is heated. %) temperature at the time point.

B. 氣體產生層氣體產生層可為能吸收紫外線之層。於一實施方式中,氣體產生層含有紫外線吸收劑。藉由含有紫外線吸收劑,可形成可吸收雷射光而進行氣化之氣體產生層。代表性而言,氣體產生層含有紫外線吸收劑與黏著劑A。較佳為紫外線吸收劑溶解於黏著劑A而存在。若紫外線吸收劑溶解於黏著劑A而存在,則可獲得如下黏著片材,其可於貼附面(氣體產生層表面及/或黏著劑層表面)之任意部位產生變形部(例如,凹凸部),且變形部(例如,凹凸部)之形狀之偏差較少。若使用此種黏著片材,則可於所需部位精度良好地產生變形部(例如,凹凸部),本發明之效果變得顯著。再者,本說明書中,所謂「溶解於黏著劑而存在」之狀態係指紫外線吸收劑未以粒子之形式存在於氣體產生層中。更具體而言,上述氣體產生層中,較佳為不含利用X射線CT(computer tomography,電腦斷層掃描)之氣體產生層截面內之粒子分佈測定中粒徑為10 μm以上之紫外線吸收劑。再者,氣體產生層可於黏著劑中含有不溶之成分,亦可不含有。於一實施方式中,氣體產生層中之不溶成分之有無及含量藉由氣體產生層之霧度值而評價,霧度值越小,評價為氣體產生層中之不溶成分之含量越少。較佳為氣體產生層於黏著劑中實質上不含不溶之成分。 B. Gas Generating Layer The gas generating layer may be a layer that can absorb ultraviolet rays. In one embodiment, the gas generating layer contains an ultraviolet absorber. By containing an ultraviolet absorber, a gas generating layer that absorbs laser light and vaporizes can be formed. Typically, the gas generating layer contains an ultraviolet absorber and an adhesive A. Preferably, the ultraviolet absorber is dissolved in the adhesive A and exists. If the ultraviolet absorber is dissolved in the adhesive A, an adhesive sheet can be obtained that can produce deformed portions (for example, uneven portions) at any part of the attachment surface (the surface of the gas generation layer and/or the surface of the adhesive layer). ), and there is less deviation in the shape of the deformation portion (for example, the concave and convex portion). If such an adhesive sheet is used, a deformed portion (for example, a concave and convex portion) can be accurately produced at a desired location, and the effect of the present invention becomes remarkable. In addition, in this specification, the state of "being dissolved in the adhesive" means that the ultraviolet absorber does not exist in the form of particles in the gas generating layer. More specifically, the gas generating layer preferably does not contain an ultraviolet absorber having a particle size of 10 μm or more as measured by particle distribution in a cross section of the gas generating layer using X-ray CT (computer tomography). Furthermore, the gas generating layer may or may not contain insoluble components in the adhesive. In one embodiment, the presence and content of insoluble components in the gas generating layer are evaluated by the haze value of the gas generating layer. The smaller the haze value is, the smaller the content of insoluble components in the gas generating layer is evaluated. Preferably, the gas generating layer contains substantially no insoluble components in the adhesive.

上述氣體產生層截面之利用奈米壓痕法所得之彈性模數較佳為0.01 MPa~1000 MPa,更佳為0.05 MPa~800 MPa。若為此種範圍,則較佳地產生藉由氣體之產生所引起之氣體產生層之形狀變化,其結果,於貼附面(氣體產生層表面及/或黏著劑層表面)形成優異形狀之變形部。所謂利用奈米壓痕法所得之彈性模數係指跨及負載時、卸載時連續地測定將壓頭壓入至試樣(例如,黏著面)時對壓頭之負載負荷與壓入深度,並根據所得之負載負荷-壓入深度曲線而求出之彈性模數。利用奈米壓痕法所得之彈性模數係以如下方式獲得:對於藉由將金剛石製之Berkovich型(三角錐型)探針垂直地壓抵於測定對象層切出之截面而獲得之位移-負荷遲滯曲線,利用測定裝置附帶之軟體(triboscan)進行數值處理。本說明書中,所謂截面之利用奈米壓痕法所得之彈性模數係使用奈米壓痕儀(Hysitron Inc公司製造之Triboindenter TI-950),藉由在特定溫度(25℃)之單一壓入法,於壓入速度約500 nm/sec、拔出速度約500 nm/sec、壓入深度約1500 nm之測定條件下測定出之彈性模數。再者,氣體產生層之彈性模數可藉由該層中所含之材料之種類、構成材料之基礎聚合物之結構、添加至該層中之添加劑之種類、量等而進行調整。再者,本說明書中,於未言及截面或表面而僅記作利用奈米壓痕法所得之彈性模數時,該彈性模數係指截面之利用奈米壓痕法所得之彈性模數。The elastic modulus of the cross section of the gas generation layer obtained by the nanoindentation method is preferably 0.01 MPa to 1000 MPa, more preferably 0.05 MPa to 800 MPa. If it is within this range, it is preferable to produce a shape change of the gas generating layer due to the generation of gas, and as a result, an excellent shape is formed on the attachment surface (the surface of the gas generating layer and/or the surface of the adhesive layer). Deformation Department. The so-called elastic modulus obtained by the nanoindentation method refers to the continuous measurement of the load and penetration depth of the indenter when the indenter is pressed into the sample (for example, the adhesive surface) when loading and unloading. And the elastic modulus is calculated based on the obtained load-pressure depth curve. The elastic modulus obtained by the nanoindentation method is obtained as follows: For the displacement obtained by pressing a diamond Berkovich type (triangular pyramid type) probe vertically against a section cut out of the measurement target layer - The load hysteresis curve is numerically processed using the software (triboscan) provided with the measuring device. In this specification, the so-called elastic modulus of the cross-section obtained by the nanoindentation method is measured by using a nanoindentation instrument (Triboindenter TI-950 manufactured by Hysitron Inc) by a single indentation at a specific temperature (25°C). Method, the elastic modulus is measured under the measurement conditions of an intrusion speed of about 500 nm/sec, a withdrawal speed of about 500 nm/sec, and an indentation depth of about 1500 nm. Furthermore, the elastic modulus of the gas generating layer can be adjusted by the type of material contained in the layer, the structure of the base polymer constituting the material, the type and amount of additives added to the layer, and the like. Furthermore, in this specification, when the cross section or the surface is not mentioned and only the elastic modulus obtained by the nanoindentation method is mentioned, the elastic modulus refers to the elastic modulus of the cross section obtained by the nanoindentation method.

上述氣體產生層表面之利用奈米壓痕法所得之彈性模數較佳為0.01 MPa~1000 MPa,更佳為0.05 MPa~800 MPa。若為此種範圍,則較佳地產生藉由氣體之產生所引起之氣體產生層之形狀變化,其結果,於黏著劑層形成優異形狀之變形部。所謂利用奈米壓痕法所得之彈性模數係指跨及負載時、卸載時連續地測定將壓頭壓入至試樣(例如,黏著面)時對壓頭之負載負荷與壓入深度,並根據所得之負載負荷-壓入深度曲線而求出之彈性模數。利用奈米壓痕法所得之彈性模數係以如下方式獲得:對於藉由將金剛石製之Berkovich型(三角錐型)探針垂直地壓抵於測定對象層切出之截面而獲得之位移-負荷遲滯曲線,利用測定裝置附帶之軟體(triboscan)進行數值處理。本說明書中,所謂表面之利用奈米壓痕法所得之彈性模數係使用奈米壓痕儀(Hysitron Inc公司製造之Triboindenter TI-950),藉由在特定溫度(25℃)之單一壓入法,於壓入速度約500 nm/sec、拔出速度約500 nm/sec、壓入深度約3000 nm之測定條件下測定出之彈性模數。再者,氣體產生層之彈性模數可藉由該層中所含之材料之種類、構成材料之基礎聚合物之結構、添加至該層中之添加劑之種類、量等而進行調整。本發明中,將截面作為測定面藉由上述方法而測定之利用奈米壓痕法所得之彈性模數、與將表面作為測定面藉由上述方法而測定之利用奈米壓痕法所得之彈性模數並無顯著差異,於難以進行自截面之測定之情形時可採用自表面測定之值作為自截面之測定值。The elastic modulus of the surface of the gas generation layer obtained by the nanoindentation method is preferably 0.01 MPa to 1000 MPa, more preferably 0.05 MPa to 800 MPa. If it is within this range, it is preferable to produce a shape change of the gas generation layer due to the generation of gas, and as a result, a deformation portion with an excellent shape is formed in the adhesive layer. The so-called elastic modulus obtained by the nanoindentation method refers to the continuous measurement of the load and penetration depth of the indenter when the indenter is pressed into the sample (for example, the adhesive surface) when loading and unloading. And the elastic modulus is calculated based on the obtained load-pressure depth curve. The elastic modulus obtained by the nanoindentation method is obtained as follows: For the displacement obtained by pressing a diamond Berkovich type (triangular pyramid type) probe vertically against a section cut out of the measurement target layer - The load hysteresis curve is numerically processed using the software (triboscan) provided with the measuring device. In this specification, the so-called elastic modulus of the surface obtained by the nanoindentation method is measured by using a nanoindentation instrument (Triboindenter TI-950 manufactured by Hysitron Inc.) by a single indentation at a specific temperature (25°C). Method, the elastic modulus is measured under the measurement conditions of an intrusion speed of about 500 nm/sec, a withdrawal speed of about 500 nm/sec, and an indentation depth of about 3000 nm. Furthermore, the elastic modulus of the gas generating layer can be adjusted by the type of material contained in the layer, the structure of the base polymer constituting the material, the type and amount of additives added to the layer, and the like. In the present invention, the elastic modulus obtained by the nanoindentation method is measured by the above method using the cross section as the measurement surface, and the elastic modulus obtained by the nanoindentation method is measured by the above method using the surface as the measurement surface. There is no significant difference in modulus. When it is difficult to measure from the cross section, the value measured from the surface can be used as the measured value from the cross section.

上述氣體產生層之氣化起始溫度較佳為150℃~500℃,更佳為170℃~450℃,進而較佳為190℃~420℃,尤佳為200℃~400℃。若為此種範圍,則可獲得藉由雷射光照射而可形成更良好之變形部之黏著片材。再者,本說明書中,所謂氣體產生層之氣化起始溫度係指根據使黏著片材升溫時之EGA分析(evolved gas analysis,釋出氣體分析)算出之氣體產生上升溫度。所謂氣體產生上升溫度係以達到根據EGA分析所得之EGA/MS圖譜之最大氣體產生峰值之半值的溫度而定義。氣化起始溫度越低,雷射光照射時開始產生氣體之溫度越低,於利用更小功率進行雷射光照射之情形時亦會產生充分之氣體量。於一實施方式中,氣體產生層之氣化起始溫度相當於紫外線吸收劑之氣化起始溫度。The gasification starting temperature of the gas generating layer is preferably 150°C to 500°C, more preferably 170°C to 450°C, further preferably 190°C to 420°C, and particularly preferably 200°C to 400°C. If it is within this range, an adhesive sheet that can form a more favorable deformation portion by laser light irradiation can be obtained. In addition, in this specification, the gasification start temperature of the gas generation layer refers to the gas generation rising temperature calculated based on EGA analysis (evolved gas analysis) when the adhesive sheet is heated. The so-called rising gas generation temperature is defined as the temperature that reaches half the maximum gas generation peak value of the EGA/MS spectrum obtained by EGA analysis. The lower the gasification starting temperature is, the lower the temperature at which gas begins to be generated when laser light is irradiated. A sufficient amount of gas will also be generated when lower power is used for laser light irradiation. In one embodiment, the gasification starting temperature of the gas generating layer is equivalent to the gasification starting temperature of the ultraviolet absorber.

上述氣體產生層之10%重量減少溫度較佳為150℃~500℃,更佳為170℃~450℃,進而較佳為200℃~400℃。若為此種範圍,則可獲得藉由雷射光照射而可形成更良好之變形部之黏著片材。所謂氣體產生層之10%重量減少溫度係指使黏著片材升溫時(例如,藉由雷射光照射而升溫時)之TGA分析(thermogravimetric analysis,熱重量分析)中,氣體產生層之重量相對於升溫前之重量而減少10重量%(即,氣體產生層之重量相對於升溫前之重量而成為90%)之時間點的溫度。The 10% weight loss temperature of the gas generating layer is preferably 150°C to 500°C, more preferably 170°C to 450°C, and further preferably 200°C to 400°C. If it is within this range, an adhesive sheet that can form a more favorable deformation portion by laser light irradiation can be obtained. The so-called 10% weight loss temperature of the gas generating layer refers to the weight of the gas generating layer relative to the temperature rise in TGA analysis (thermogravimetric analysis, thermogravimetric analysis) when the adhesive sheet is heated (for example, when the temperature is raised by irradiation with laser light). The temperature at the time point when the weight of the gas generation layer is reduced by 10% by weight (that is, the weight of the gas generation layer becomes 90% of the weight before temperature rise).

上述氣體產生層之厚度較佳為0.1 μm~50 μm,更佳為1 μm~40 μm,進而較佳為2 μm~30 μm,尤佳為5 μm~20 μm。若為此種範圍,則可獲得藉由雷射光照射而可形成更良好之變形部之黏著片材。The thickness of the gas generating layer is preferably 0.1 μm to 50 μm, more preferably 1 μm to 40 μm, further preferably 2 μm to 30 μm, particularly preferably 5 μm to 20 μm. If it is within this range, an adhesive sheet that can form a more favorable deformation portion by laser light irradiation can be obtained.

上述氣體產生層之利用奈米壓痕法所得之彈性模數Er(gas)[單位:MPa]與厚度h(gas)[單位:μm]滿足下述式(1)。 Log(Er(gas)×10 6)≧8.01×h(gas) -0.116・・・(1) 本發明中,藉由以滿足上述式(1)之方式構成氣體產生層,而防止因自氣體產生層產生之氣體所引起之過度變形,從而黏著片材藉由雷射光照射而良好地變形。藉由形成此種氣體產生層,而無需配置較厚之阻隔層(黏著劑層)作為防止過度變形之層便可產生微小範圍內之表面變形。更具體而言,可利用氣體產生層單獨體使表面變形,或柔軟地構成黏著劑層(氣體阻隔層)。 The elastic modulus Er(gas) [unit: MPa] and thickness h(gas) [unit: μm] of the gas generation layer obtained by the nanoindentation method satisfy the following formula (1). Log(Er(gas)×10 6 )≧8.01×h(gas) -0.116・・・(1) In the present invention, by configuring the gas generating layer to satisfy the above formula (1), it is possible to prevent gas generation Excessive deformation caused by the gas generated in the generating layer allows the adhesive sheet to be deformed well by laser light irradiation. By forming such a gas generating layer, surface deformation within a small range can be generated without configuring a thicker barrier layer (adhesive layer) as a layer to prevent excessive deformation. More specifically, the surface of the gas generating layer alone can be deformed or the adhesive layer (gas barrier layer) can be formed softly.

於一實施方式中,利用奈米壓痕法所得之彈性模數Er(gas)[單位:MPa]與厚度h(gas)[單位:μm]滿足下述式(2)。於一實施方式中,利用奈米壓痕法所得之彈性模數Er(gas)[單位:MPa]與厚度h(gas)[單位:μm]滿足下述式(3)。 Log(Er(gas)×10 6)≧7.66×h(gas) -0.092・・・(2) Log(Er(gas)×10 6)≧7.52×h(gas) -0.081・・・(3) 若為此種範圍,則上述效果變得更顯著。 In one embodiment, the elastic modulus Er(gas) [unit: MPa] and the thickness h(gas) [unit: μm] obtained by the nanoindentation method satisfy the following formula (2). In one embodiment, the elastic modulus Er(gas) [unit: MPa] and the thickness h(gas) [unit: μm] obtained by the nanoindentation method satisfy the following formula (3). Log(Er(gas)×10 6 )≧7.66×h(gas) -0.092・・・(2) Log(Er(gas)×10 6 )≧7.52×h(gas) -0.081・・・(3) If it is in this range, the above-mentioned effect becomes more remarkable.

於一實施方式中,利用奈米壓痕法所得之彈性模數Er(gas)[單位:MPa]與厚度h(gas)[單位:μm]進而滿足下述式(4)。 Log(Er(gas)×10 6)≦47.675×h(gas) -0.519・・・(4) In one embodiment, the elastic modulus Er(gas) [unit: MPa] and the thickness h(gas) [unit: μm] obtained by the nanoindentation method further satisfy the following formula (4). Log(Er(gas)×10 6 )≦47.675×h(gas) -0.519・・・(4)

上述氣體產生層之波長360 nm之紫外線透過率較佳為30%以下,更佳為20%以下,進而較佳為15%以下,尤佳為10%以下,最佳為5%以下。氣體產生層之波長360 nm之紫外線透過率之下限例如為0%(較佳為0.05%,更佳為0.1%)。The ultraviolet transmittance of the gas generating layer at a wavelength of 360 nm is preferably 30% or less, more preferably 20% or less, further preferably 15% or less, particularly preferably 10% or less, and most preferably 5% or less. The lower limit of the ultraviolet transmittance of the gas generating layer at a wavelength of 360 nm is, for example, 0% (preferably 0.05%, more preferably 0.1%).

上述氣體產生層之霧度值較佳為55%以下,更佳為0.1%~50%,進而較佳為0.5%~40%。該霧度值成為氣體產生層中之黏著劑(實質上為基礎聚合物)與紫外線吸收劑之相容性之指標。霧度值係根據入射可見光區域(波長:380 nm~780 nm)之光時擴散透過光相對於全光線透過光之比率而求出。於將光之波長尺寸視為最小單位,在波長尺寸以上,濃度與組成均勻之情形時,透明性較高,即,相容性較高。另一方面,於濃度與組成不均勻之情形時,產生光之散射,產生白濁,即,相容性變低。若氣體產生層之霧度為上述範圍,則可成為紫外線吸收劑無偏倚地存在而構成之黏著片材。此種黏著片材藉由雷射光照射而精度良好地表現剝離性。The haze value of the gas generating layer is preferably 55% or less, more preferably 0.1% to 50%, and further preferably 0.5% to 40%. This haze value becomes an indicator of the compatibility of the adhesive (essentially the base polymer) in the gas generating layer with the UV absorber. The haze value is calculated based on the ratio of diffuse transmitted light to total light transmitted light when light in the visible light region (wavelength: 380 nm to 780 nm) is incident. When the wavelength size of light is regarded as the smallest unit, when the concentration and composition are uniform above the wavelength size, the transparency is higher, that is, the compatibility is higher. On the other hand, when the concentration and composition are non-uniform, light scattering occurs and cloudiness occurs, that is, the compatibility becomes low. If the haze of the gas generating layer is within the above range, an adhesive sheet can be formed in which the ultraviolet absorber is uniformly present. This kind of adhesive sheet exhibits releasability with high precision by being irradiated with laser light.

B-1.紫外線吸收劑 作為紫外線吸收劑,只要獲得本發明之效果,則可使用任意適當之紫外線吸收劑。作為紫外線吸收劑,例如可例舉:二苯甲酮系紫外線吸收劑、三𠯤系紫外線吸收劑、苯并三唑系紫外線吸收劑、水楊酸酯系紫外線吸收劑、氰基丙烯酸酯系紫外線吸收劑等。其中較佳為三𠯤系紫外線吸收劑。尤其於使用丙烯酸系黏著劑作為黏著劑A之情形時,三𠯤系紫外線吸收劑由於與該丙烯酸系黏著劑之基礎聚合物之相容性較高,故而可較佳地使用。藉由使用三𠯤系紫外線吸收劑,可形成霧度值較小之氣體產生層。三𠯤系紫外線吸收劑更佳為包含具有羥基之化合物,尤佳為包含羥基苯基三𠯤系化合物之紫外線吸收劑(羥基苯基三𠯤系紫外線吸收劑)。 B-1.UV absorber As the ultraviolet absorber, any appropriate ultraviolet absorber can be used as long as the effects of the present invention are obtained. Examples of the ultraviolet absorber include benzophenone-based ultraviolet absorbers, trisulfonate-based ultraviolet absorbers, benzotriazole-based ultraviolet absorbers, salicylate-based ultraviolet absorbers, and cyanoacrylate-based ultraviolet absorbers. Absorbents, etc. Among them, the three-series ultraviolet absorbers are preferred. Especially when an acrylic adhesive is used as the adhesive A, a trifluoroethylene UV absorber can be preferably used due to its high compatibility with the base polymer of the acrylic adhesive. By using trifluoroethylene ultraviolet absorbers, a gas generating layer with a smaller haze value can be formed. The trifluoroethylene-based ultraviolet absorber preferably contains a compound having a hydroxyl group, and particularly preferably is an ultraviolet absorber containing a hydroxyphenyl trifluoroethylene-based compound (hydroxyphenyl trifluoroethylene-based ultraviolet absorber).

作為羥基苯基三𠯤系紫外線吸收劑,例如可例舉:2-(4,6-雙(2,4-二甲基苯基)-1,3,5-三𠯤-2-基)-5-羥基苯與[(C10-C16(主要是C12-C13)烷氧基)甲基]環氧乙烷之反應產物(商品名「TINUVIN 400」,BASF公司製造)、2-[4,6-雙(2,4-二甲基苯基)-1,3,5-三𠯤-2-基]-5-[3-(十二烷氧基)-2-羥基丙氧基]苯酚、2-(2,4-二羥基苯基)-4,6-雙-(2,4-二甲基苯基)-1,3,5-三𠯤與縮水甘油酸(2-乙基己基)酯之反應產物(商品名「TINUVIN 405」,BASF公司製造)、2,4-雙(2-羥基-4-丁氧基苯基)-6-(2,4-二丁氧基苯基)-1,3,5-三𠯤(商品名「TINUVIN 460」,BASF公司製造)、2-(4,6-二苯基-1,3,5-三𠯤-2-基)-5-[(己基)氧基]苯酚(商品名「TINUVIN 1577」,BASF公司製造)、2-(4,6-二苯基-1,3,5-三𠯤-2-基)-5-[2-(2-乙基己醯氧基)乙氧基]苯酚(商品名「Adekastab LA-46」,ADEKA股份有限公司製造)、2-(2-羥基-4-[1-辛氧基羰基乙氧基]苯基)-4,6-雙(4-苯基苯基)-1,3,5-三𠯤(商品名「TINUVIN 479」,BASF公司製造)、BASF公司製造之商品名「TINUVIN 477」等。Examples of the hydroxyphenyltrixamethonium-based ultraviolet absorbers include: 2-(4,6-bis(2,4-dimethylphenyl)-1,3,5-trixamethonium-2-yl)- Reaction product of 5-hydroxybenzene and [(C10-C16 (mainly C12-C13) alkoxy) methyl] ethylene oxide (trade name "TINUVIN 400", manufactured by BASF), 2-[4,6 -Bis(2,4-dimethylphenyl)-1,3,5-tris-2-yl]-5-[3-(dodecyloxy)-2-hydroxypropoxy]phenol, 2-(2,4-dihydroxyphenyl)-4,6-bis-(2,4-dimethylphenyl)-1,3,5-trihydroxyphenyl and glycidic acid (2-ethylhexyl) Reaction product of ester (trade name "TINUVIN 405", manufactured by BASF), 2,4-bis(2-hydroxy-4-butoxyphenyl)-6-(2,4-dibutoxyphenyl) -1,3,5-Trisulfin (trade name "TINUVIN 460", manufactured by BASF), 2-(4,6-diphenyl-1,3,5-trissac-2-yl)-5-[ (Hexyl)oxy]phenol (trade name "TINUVIN 1577", manufactured by BASF), 2-(4,6-diphenyl-1,3,5-tris-2-yl)-5-[2- (2-ethylhexyloxy)ethoxy]phenol (trade name "Adekastab LA-46", manufactured by ADEKA Co., Ltd.), 2-(2-hydroxy-4-[1-octyloxycarbonylethoxy] [base]phenyl)-4,6-bis(4-phenylphenyl)-1,3,5-tribenzoyl (trade name "TINUVIN 479", manufactured by BASF), trade name "TINUVIN 477" manufactured by BASF "wait.

作為苯并三唑系紫外線吸收劑(苯并三唑系化合物),例如可例舉:2-(2-羥基-5-第三丁基苯基)-2H-苯并三唑(商品名「TINUVIN PS」,BASF公司製造)、苯丙酸及3-(2H-苯并三唑-2-基)-5-(1,1-二甲基乙基)-4-羥基(C7-9側鏈及直鏈烷基)之酯化合物(商品名「TINUVIN 384-2」,BASF公司製造)、3-[3-第三丁基-4-羥基-5-(5-氯-2H-苯并三唑-2-基)苯基]丙酸辛酯及3-[3-第三丁基-4-羥基-5-(5-氯-2H-苯并三唑-2-基)苯基]丙酸2-乙基己酯之混合物(商品名「TINUVIN 109」,BASF公司製造)、2-(2H-苯并三唑-2-基)-4,6-雙(1-甲基-1-苯基乙基)苯酚(商品名「TINUVIN 900」,BASF公司製造)、2-(2H-苯并三唑-2-基)-6-(1-甲基-1-苯基乙基)-4-(1,1,3,3-四甲基丁基)苯酚(商品名「TINUVIN 928」,BASF製造)、3-(3-(2H-苯并三唑-2-基)-5-第三丁基-4-羥基苯基)丙酸甲酯/聚乙二醇300之反應產物(商品名「TINUVIN 1130」,BASF公司製造)、2-(2H-苯并三唑-2-基)對甲酚(商品名「TINUVIN P」,BASF公司製造)、2-(2H-苯并三唑-2-基)-4,6-雙(1-甲基-1-苯基乙基)苯酚(商品名「TINUVIN 234」,BASF公司製造)、2-[5-氯-2H-苯并三唑-2-基]-4-甲基-6-(第三丁基)苯酚(商品名「TINUVIN 326」,BASF公司製造)、2-(2H-苯并三唑-2-基)-4,6-二-第三戊基苯酚(商品名「TINUVIN 328」,BASF公司製造)、2-(2H-苯并三唑-2-基)-4-(1,1,3,3-四甲基丁基)苯酚(商品名「TINUVIN 329」,BASF公司製造)、2,2'-亞甲基雙[6-(2H-苯并三唑-2-基)-4-(1,1,3,3-四甲基丁基)苯酚](商品名「TINUVIN 360」,BASF公司製造)、3-(3-(2H-苯并三唑-2-基)-5-第三丁基-4-羥基苯基)丙酸甲酯與聚乙二醇300之反應產物(商品名「TINUVIN 213」,BASF公司製造)、2-(2H-苯并三唑-2-基)-6-十二烷基-4-甲基苯酚(商品名「TINUVIN 571」,BASF公司製造)、2-[2-羥基-3-(3,4,5,6-四氫鄰苯二甲醯亞胺基甲基)-5-甲基苯基]苯并三唑(商品名「Sumisorb 250」,住友化學股份有限公司製造)、2-(3-第三丁基-2-羥基-5-甲基苯基)-5-氯-2H-苯并三唑(商品名「SEESORB 703」,Shipro Kasei公司製造)、2-(2H-苯并三唑-2-基)-4-甲基-6-(3,4,5,6-四氫鄰苯二甲醯亞胺基甲基)苯酚(商品名「SEESORB 706」,Shipro Kasei公司製造)、2-(4-苯甲醯氧基-2-羥基苯基)-5-氯-2H-苯并三唑(Shipro Kasei公司製造之商品名「SEESORB 7012BA」)、2-第三丁基-6-(5-氯-2H-苯并三唑-2-基)-4-甲基苯酚(商品名「KEMISORB 73」,Chemipro Kasei公司製造)、2,2'-亞甲基雙[6-(2H-苯并三唑-2-基)-4-第三辛基苯酚](商品名「Adekastab LA-31」,ADEKA股份有限公司製造)、2-(2H-苯并三唑-2-基)對甲酚(商品名「Adekastab LA-32」,ADEKA股份有限公司製造)、2-(5-氯-2H-苯并三唑-2-基)-6-第三丁基-4-甲基苯酚(商品名「Adekastab LA-36」,ADEKA股份有限公司製造)等。Examples of benzotriazole-based ultraviolet absorbers (benzotriazole-based compounds) include: 2-(2-hydroxy-5-tert-butylphenyl)-2H-benzotriazole (trade name " TINUVIN PS", manufactured by BASF), phenylpropionic acid and 3-(2H-benzotriazol-2-yl)-5-(1,1-dimethylethyl)-4-hydroxy (C7-9 side chain and linear alkyl) ester compound (trade name "TINUVIN 384-2", manufactured by BASF), 3-[3-tert-butyl-4-hydroxy-5-(5-chloro-2H-benzo Triazol-2-yl)phenyl]octyl propionate and 3-[3-tert-butyl-4-hydroxy-5-(5-chloro-2H-benzotriazol-2-yl)phenyl]propanate A mixture of 2-ethylhexyl acid (trade name "TINUVIN 109", manufactured by BASF), 2-(2H-benzotriazol-2-yl)-4,6-bis(1-methyl-1- Phenylethyl)phenol (trade name "TINUVIN 900", manufactured by BASF), 2-(2H-benzotriazol-2-yl)-6-(1-methyl-1-phenylethyl)- 4-(1,1,3,3-Tetramethylbutyl)phenol (trade name "TINUVIN 928", manufactured by BASF), 3-(3-(2H-benzotriazol-2-yl)-5- Reaction product of tert-butyl-4-hydroxyphenyl)methyl propionate/polyethylene glycol 300 (trade name "TINUVIN 1130", manufactured by BASF), 2-(2H-benzotriazol-2-yl) ) p-cresol (trade name "TINUVIN P", manufactured by BASF), 2-(2H-benzotriazol-2-yl)-4,6-bis(1-methyl-1-phenylethyl) Phenol (trade name "TINUVIN 234", manufactured by BASF), 2-[5-chloro-2H-benzotriazol-2-yl]-4-methyl-6-(tert-butyl)phenol (trade name "TINUVIN 326", manufactured by BASF Corporation), 2-(2H-benzotriazol-2-yl)-4,6-di-tertiary amylphenol (trade name "TINUVIN 328", manufactured by BASF Corporation), 2 -(2H-benzotriazol-2-yl)-4-(1,1,3,3-tetramethylbutyl)phenol (trade name "TINUVIN 329", manufactured by BASF), 2,2'- Methylenebis[6-(2H-benzotriazol-2-yl)-4-(1,1,3,3-tetramethylbutyl)phenol] (trade name "TINUVIN 360", manufactured by BASF ), the reaction product of methyl 3-(3-(2H-benzotriazol-2-yl)-5-tert-butyl-4-hydroxyphenyl)propionate and polyethylene glycol 300 (trade name " TINUVIN 213", manufactured by BASF Corporation), 2-(2H-benzotriazol-2-yl)-6-dodecyl-4-methylphenol (trade name "TINUVIN 571", manufactured by BASF Corporation), 2 -[2-Hydroxy-3-(3,4,5,6-tetrahydrophthalimidomethyl)-5-methylphenyl]benzotriazole (trade name "Sumisorb 250", Manufactured by Sumitomo Chemical Co., Ltd.), 2-(3-tert-butyl-2-hydroxy-5-methylphenyl)-5-chloro-2H-benzotriazole (trade name "SEESORB 703", Shipro Kasei company), 2-(2H-benzotriazol-2-yl)-4-methyl-6-(3,4,5,6-tetrahydrophthalyliminomethyl)phenol ( Trade name "SEESORB 706", manufactured by Shipro Kasei Co., Ltd.), 2-(4-benzyloxy-2-hydroxyphenyl)-5-chloro-2H-benzotriazole (trade name, manufactured by Shipro Kasei Co., Ltd. SEESORB 7012BA"), 2-tert-butyl-6-(5-chloro-2H-benzotriazol-2-yl)-4-methylphenol (trade name "KEMISORB 73", manufactured by Chemipro Kasei Co., Ltd.), 2,2'-methylenebis[6-(2H-benzotriazol-2-yl)-4-tertiary octylphenol] (trade name "Adekastab LA-31", manufactured by ADEKA Co., Ltd.), 2-(2H-benzotriazole-2-yl)-p-cresol (trade name "Adekastab LA-32", manufactured by ADEKA Co., Ltd.), 2-(5-chloro-2H-benzotriazole-2- methyl)-6-tert-butyl-4-methylphenol (trade name "Adekastab LA-36", manufactured by ADEKA Co., Ltd.), etc.

於一實施方式中,使用不含鹵素原子之紫外線吸收劑。若使用此種紫外線吸收劑,則可獲得難以污染電極等被黏著體之黏著片材。In one embodiment, a UV absorber that does not contain halogen atoms is used. If such a UV absorber is used, an adhesive sheet that is less likely to contaminate adherends such as electrodes can be obtained.

構成上述紫外線吸收劑之化合物之分子量較佳為200~1500,更佳為250~1200,進而較佳為300~1000。若為此種範圍,則可獲得藉由雷射光照射而可形成更良好之變形部之黏著片材。The molecular weight of the compound constituting the ultraviolet absorber is preferably 200 to 1,500, more preferably 250 to 1,200, further preferably 300 to 1,000. If it is within this range, an adhesive sheet that can form a more favorable deformation portion by laser light irradiation can be obtained.

上述紫外線吸收劑之最大吸收波長較佳為300 nm~450 nm,更佳為320 nm~400 nm,進而較佳為330 nm~380 nm。The maximum absorption wavelength of the above-mentioned ultraviolet absorber is preferably 300 nm to 450 nm, more preferably 320 nm to 400 nm, and further preferably 330 nm to 380 nm.

相對於氣體產生層100重量份,上述紫外線吸收劑之含有比率較佳為1重量份~100重量份,更佳為1重量份~50重量份,進而較佳為5重量份~30重量份。若為此種範圍,則可獲得藉由雷射光照射而可形成更良好之變形部之黏著片材。The content ratio of the ultraviolet absorber is preferably 1 to 100 parts by weight, more preferably 1 to 50 parts by weight, and still more preferably 5 to 30 parts by weight relative to 100 parts by weight of the gas generating layer. If it is within this range, an adhesive sheet that can form a more favorable deformation portion by laser light irradiation can be obtained.

B-2.黏著劑A 作為上述氣體產生層中所含之黏著劑A,較佳地使用感壓黏著劑A。作為黏著劑A,例如可例舉:丙烯酸系黏著劑、橡膠系黏著劑、乙烯基烷基醚系黏著劑、矽酮系黏著劑、聚酯系黏著劑、聚醯胺系黏著劑、胺基甲酸酯系黏著劑、苯乙烯-二烯嵌段共聚物系黏著劑等。其中較佳為丙烯酸系黏著劑或橡膠系黏著劑,更佳為丙烯酸系黏著劑。再者,上述黏著劑可單獨使用或組合2種以上而使用。 B-2. Adhesive A As the adhesive A contained in the gas generating layer, a pressure-sensitive adhesive A is preferably used. Examples of the adhesive A include: acrylic adhesives, rubber adhesives, vinyl alkyl ether adhesives, silicone adhesives, polyester adhesives, polyamide adhesives, amine adhesives, etc. Formate-based adhesives, styrene-diene block copolymer-based adhesives, etc. Among them, an acrylic adhesive or a rubber adhesive is preferred, and an acrylic adhesive is more preferred. In addition, the above-mentioned adhesive agent can be used individually or in combination of 2 or more types.

作為上述丙烯酸系黏著劑,例如可例舉將使用(甲基)丙烯酸烷基酯之1種或2種以上作為單體成分之丙烯酸系聚合物(均聚物或共聚物)作為基礎聚合物之丙烯酸系黏著劑等。作為(甲基)丙烯酸烷基酯之具體例,可例舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸十一烷基酯、(甲基)丙烯酸十二烷基酯、(甲基)丙烯酸十三烷基酯、(甲基)丙烯酸十四烷基酯、(甲基)丙烯酸十五烷基酯、(甲基)丙烯酸十六烷基酯、(甲基)丙烯酸十七烷基酯、(甲基)丙烯酸十八烷基酯、(甲基)丙烯酸十九烷基酯、(甲基)丙烯酸二十烷基酯等(甲基)丙烯酸C1-20烷基酯。其中,可較佳地使用具有碳數為1~20之直鏈狀或分枝狀之烷基之(甲基)丙烯酸烷基酯,可更佳地使用具有碳數為2~20之直鏈狀或分枝狀之烷基之(甲基)丙烯酸烷基酯。Examples of the acrylic adhesive include an acrylic polymer (homopolymer or copolymer) using one or more alkyl (meth)acrylates as monomer components as a base polymer. Acrylic adhesive, etc. Specific examples of (meth)acrylic acid alkyl esters include: (meth)acrylic acid methyl ester, (meth)acrylic acid ethyl ester, (meth)acrylic acid propyl ester, (meth)acrylic acid isopropyl ester, Butyl (meth)acrylate, isobutyl (meth)acrylate, second butyl (meth)acrylate, third butyl (meth)acrylate, amyl (meth)acrylate, (meth)acrylic acid Hexyl ester, heptyl (meth)acrylate, octyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, isooctyl (meth)acrylate, nonyl (meth)acrylate, (meth)acrylate Isononyl acrylate, decyl (meth)acrylate, isodecyl (meth)acrylate, undecyl (meth)acrylate, dodecyl (meth)acrylate, (meth)acrylate Tridecyl acrylate, myristyl (meth)acrylate, pentadecyl (meth)acrylate, cetyl (meth)acrylate, heptadecyl (meth)acrylate , C1-20 alkyl (meth)acrylate such as octadecyl (meth)acrylate, nonadecyl (meth)acrylate, eicosanyl (meth)acrylate. Among them, alkyl (meth)acrylate having a linear or branched alkyl group with a carbon number of 1 to 20 can be preferably used, and a linear alkyl group having a carbon number of 2 to 20 can be used more preferably. Alkyl (meth)acrylate with a branched or branched alkyl group.

於一實施方式中,使用具有碳數為4以上(較佳為4~20,更佳為4~18)之直鏈狀或分枝狀之烷基之(甲基)丙烯酸烷基酯A。使用此種單體而形成之具有較長側鏈之丙烯酸系聚合物於與紫外線吸收劑之親和性(相容性)較高之方面有利。相對於構成丙烯酸系聚合物之全部結構單元,上述(甲基)丙烯酸烷基酯A之含有比率較佳為30重量%以上,更佳為50重量%以上,進而較佳為70重量%~100重量%,尤佳為80重量%~100重量%。若為此種範圍,則可提高丙烯酸系聚合物與紫外線吸收劑之相容性。相對於丙烯酸系聚合物之總量100重量份,包含源自上述(甲基)丙烯酸烷基酯A之結構單元之丙烯酸系聚合物之含有比率較佳為30重量份~100重量份,更佳為70重量份~100重量份。In one embodiment, (meth)acrylic acid alkyl ester A having a linear or branched alkyl group having a carbon number of 4 or more (preferably 4 to 20, more preferably 4 to 18) is used. The acrylic polymer having a long side chain formed by using such a monomer is advantageous in that it has high affinity (compatibility) with the ultraviolet absorber. The content ratio of the alkyl (meth)acrylate A is preferably 30% by weight or more, more preferably 50% by weight or more, and even more preferably 70% by weight to 100% by weight, based on all the structural units constituting the acrylic polymer. % by weight, preferably 80% by weight to 100% by weight. If it is within this range, the compatibility between the acrylic polymer and the ultraviolet absorber can be improved. The content ratio of the acrylic polymer containing the structural unit derived from the alkyl (meth)acrylate A is preferably 30 to 100 parts by weight, more preferably, relative to 100 parts by weight of the total amount of the acrylic polymer. It is 70 parts by weight to 100 parts by weight.

於一實施方式中,組合使用具有碳數為4以上(較佳為4~20,更佳為4~18)之直鏈狀或分枝狀之烷基之(甲基)丙烯酸烷基酯A、與三𠯤系紫外線吸收劑。(甲基)丙烯酸烷基酯A與三𠯤系紫外線吸收劑之相容性尤其優異,具備使用該等化合物而形成之氣體產生層之黏著片材之視認性顯著優異。In one embodiment, alkyl (meth)acrylate A having a linear or branched alkyl group with a carbon number of 4 or more (preferably 4 to 20, more preferably 4 to 18) is used in combination. , and three series of ultraviolet absorbers. Alkyl (meth)acrylate A has particularly excellent compatibility with trifluoroethylene ultraviolet absorbers, and an adhesive sheet having a gas generating layer formed using these compounds has significantly excellent visibility.

上述丙烯酸系聚合物亦能以凝聚力、耐熱性、交聯性等之改質為目的,視需要含有對應於可與上述(甲基)丙烯酸烷基酯共聚之其他單體成分之單元。作為此種單體成分,例如可例舉:丙烯酸、甲基丙烯酸、丙烯酸羧乙酯、丙烯酸羧戊酯、伊康酸、順丁烯二酸、反丁烯二酸、丁烯酸等含羧基之單體;順丁烯二酸酐、伊康酸酐等酸酐單體;(甲基)丙烯酸羥乙酯、(甲基)丙烯酸羥丙酯、(甲基)丙烯酸羥丁酯、(甲基)丙烯酸羥己酯、(甲基)丙烯酸羥辛酯、(甲基)丙烯酸羥癸酯、(甲基)丙烯酸羥基月桂酯、甲基丙烯酸(4-羥甲基環己基)甲酯等含羥基之單體;苯乙烯磺酸、烯丙基磺酸、2-(甲基)丙烯醯胺-2-甲基丙磺酸、(甲基)丙烯醯胺丙磺酸、(甲基)丙烯酸磺丙酯、(甲基)丙烯醯氧基萘磺酸等含磺酸基之單體;(甲基)丙烯醯胺、N,N-二甲基(甲基)丙烯醯胺、N-丁基(甲基)丙烯醯胺、N-羥甲基(甲基)丙烯醯胺、N-羥甲基丙烷(甲基)丙烯醯胺等(N-取代)醯胺系單體;(甲基)丙烯酸胺基乙酯、(甲基)丙烯酸N,N-二甲基胺基乙酯、(甲基)丙烯酸第三丁基胺基乙酯等(甲基)丙烯酸胺基烷基酯系單體;(甲基)丙烯酸甲氧基乙酯、(甲基)丙烯酸乙氧基乙酯等(甲基)丙烯酸烷氧基烷基酯系單體;N-環己基順丁烯二醯亞胺、N-異丙基順丁烯二醯亞胺、N-月桂基順丁烯二醯亞胺、N-苯基順丁烯二醯亞胺等順丁烯二醯亞胺系單體;N-甲基伊康醯亞胺、N-乙基伊康醯亞胺、N-丁基伊康醯亞胺、N-辛基伊康醯亞胺、N-2-乙基己基伊康醯亞胺、N-環己基伊康醯亞胺、N-月桂基伊康醯亞胺等伊康醯亞胺系單體;N-(甲基)丙烯醯氧基亞甲基丁二醯亞胺、N-(甲基)丙烯醯基-6-氧基六亞甲基丁二醯亞胺、N-(甲基)丙烯醯基-8-氧基八亞甲基丁二醯亞胺等丁二醯亞胺系單體;乙酸乙烯酯、丙酸乙烯酯、N-乙烯基吡咯啶酮、甲基乙烯基吡咯啶酮、乙烯基吡啶、乙烯基哌啶酮、乙烯基嘧啶、乙烯基哌𠯤、乙烯基吡𠯤、乙烯基吡咯、乙烯基咪唑、乙烯基㗁唑、乙烯基𠰌啉、N-乙烯基羧醯胺類、苯乙烯、α-甲基苯乙烯、N-乙烯基己內醯胺等乙烯基系單體;丙烯腈、甲基丙烯腈等氰基丙烯酸酯單體;(甲基)丙烯酸縮水甘油酯等含環氧基之丙烯酸系單體;(甲基)丙烯酸聚乙二醇、(甲基)丙烯酸聚丙二醇、(甲基)丙烯酸甲氧基乙二醇、(甲基)丙烯酸甲氧基聚丙二醇等二醇系丙烯酸酯單體;(甲基)丙烯酸四氫呋喃甲酯、氟(甲基)丙烯酸酯、矽酮(甲基)丙烯酸酯等具有雜環、鹵素原子、矽原子等之丙烯酸酯系單體;己二醇二(甲基)丙烯酸酯、(聚)乙二醇二(甲基)丙烯酸酯、(聚)丙二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、季戊四醇二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、環氧丙烯酸酯、丙烯酸聚酯、丙烯酸胺基甲酸酯等多官能單體;異戊二烯、丁二烯、異丁烯等烯烴系單體;乙烯醚等乙烯醚系單體等。該等單體成分可單獨使用或組合2種以上而使用。其中,尤其就與紫外線吸收劑之親和性(相容性)較高之觀點而言,較佳地使用丙烯酸、甲基丙烯酸、丙烯酸羧乙酯、丙烯酸羧戊酯、伊康酸、順丁烯二酸、反丁烯二酸、丁烯酸等含羧基之單體;順丁烯二酸酐、伊康酸酐等酸酐單體;(甲基)丙烯酸羥乙酯、(甲基)丙烯酸羥丙酯、(甲基)丙烯酸羥丁酯、(甲基)丙烯酸羥己酯、(甲基)丙烯酸羥辛酯、(甲基)丙烯酸羥癸酯、(甲基)丙烯酸羥基月桂酯、甲基丙烯酸(4-羥甲基環己基)甲酯等含羥基之單體。相對於丙烯酸系聚合物之總量100重量份,上述含羧基之單體之含有比率較佳為0.5重量份~15重量份,更佳為1重量份~10重量份,進而較佳為3重量份~9.5重量份。相對於丙烯酸系聚合物之總量100重量份,上述酸酐單體之含有比率較佳為0.5重量份~15重量份,更佳為1重量份~10重量份,進而較佳為3重量份~9.5重量份。相對於丙烯酸系聚合物之總量100重量份,上述含羥基之單體之含有比率較佳為0.5重量份~15重量份,更佳為1重量份~10重量份,進而較佳為3重量份~9.5重量份。The above-mentioned acrylic polymer may also contain units corresponding to other monomer components copolymerizable with the above-mentioned alkyl (meth)acrylate for the purpose of modifying cohesive force, heat resistance, cross-linkability, etc., if necessary. Examples of such monomer components include acrylic acid, methacrylic acid, carboxyethyl acrylate, carboxypentyl acrylate, itaconic acid, maleic acid, fumaric acid, crotonic acid, and the like containing carboxyl groups. Monomers; anhydride monomers such as maleic anhydride and Iconic anhydride; (meth)hydroxyethyl acrylate, (meth)hydroxypropyl acrylate, (meth)hydroxybutyl acrylate, (meth)acrylic acid Hydroxyl hexyl ester, hydroxyoctyl (meth)acrylate, hydroxydecyl (meth)acrylate, hydroxylauryl (meth)acrylate, (4-hydroxymethylcyclohexyl)methyl methacrylate and other hydroxyl-containing monomers Body; Styrenesulfonic acid, allylsulfonic acid, 2-(meth)acrylamide-2-methylpropanesulfonic acid, (meth)acrylamidepropanesulfonic acid, (meth)acrylic acid sulfopropyl ester , (meth)acryloxynaphthalene sulfonic acid and other sulfonic acid group-containing monomers; (meth)acrylamide, N,N-dimethyl(meth)acrylamide, N-butyl(meth)acrylamide (N-substituted) amide monomers such as N-hydroxymethyl (meth)acrylamide, N-hydroxymethylpropane (meth)acrylamide, etc.; (meth)acrylic acid amine (meth)acrylic acid aminoalkyl ester monomers such as ethyl ester, N,N-dimethylaminoethyl (meth)acrylate, tert-butylaminoethyl (meth)acrylate, etc.; (meth)acrylic acid alkoxyalkyl ester monomers such as methoxyethyl methacrylate and ethoxyethyl (meth)acrylate; N-cyclohexylmaleimide, N- Isopropylmaleimide, N-laurylmaleimide, N-phenylmaleimide and other maleimide monomers; N-methyl Ikonimide, N-Ethyl Iconimide, N-Butyl Iconimide, N-Octyl Iconimide, N-2-Ethylhexyl Iconimide, N -Iconidimine-based monomers such as cyclohexyl itonimide and N-lauryl itonimide; N-(meth)acryloxymethylenesuccinimide, N-( Meth)acryl-6-oxyhexamethylene succinimide, N-(meth)acryl-8-oxyoctamethylene succinimide and other succinimines Monomers; vinyl acetate, vinyl propionate, N-vinylpyrrolidone, methylvinylpyrrolidone, vinylpyridine, vinylpiperidone, vinylpyrimidine, vinylpiperdine, vinyl Ethylene such as pyridine, vinylpyrrole, vinylimidazole, vinylethazole, vinylpyridine, N-vinylcarboxamides, styrene, α-methylstyrene, N-vinylcaprolactamide, etc. Base monomers; cyanoacrylate monomers such as acrylonitrile and methacrylonitrile; epoxy-containing acrylic monomers such as glycidyl (meth)acrylate; (meth)acrylic polyethylene glycol, (meth)acrylic acid polyethylene glycol, Diol acrylate monomers such as meth)acrylic acid polypropylene glycol, (meth)acrylic acid methoxyethylene glycol, (meth)acrylic acid methoxypolypropylene glycol, etc.; (meth)acrylic acid tetrahydrofuran methyl ester, fluorine (meth)acrylate Acrylate monomers with heterocyclic rings, halogen atoms, silicon atoms, etc.; hexanediol di(meth)acrylate, (poly)ethylene glycol di(meth)acrylate, etc. Meth)acrylate, (poly)propylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate, pentaerythritol di(meth)acrylate, trimethylolpropane tri(meth)acrylate Ester, pentaerythritol tri(meth)acrylate, dipentaerythritol hexa(meth)acrylate, epoxy acrylate, acrylic polyester, acrylic urethane and other multi-functional monomers; isoprene, butadiene , isobutylene and other olefin monomers; vinyl ether and other vinyl ether monomers, etc. These monomer components can be used individually or in combination of 2 or more types. Among them, acrylic acid, methacrylic acid, carboxyethyl acrylate, carboxypentyl acrylate, itaconic acid, and maleic acid are preferably used, especially from the viewpoint of high affinity (compatibility) with ultraviolet absorbers. Monomers containing carboxyl groups such as diacids, fumaric acid, and crotonic acid; anhydride monomers such as maleic anhydride and itaconic anhydride; hydroxyethyl (meth)acrylate and hydroxypropyl (meth)acrylate , hydroxybutyl (meth)acrylate, hydroxyhexyl (meth)acrylate, hydroxyoctyl (meth)acrylate, hydroxydecyl (meth)acrylate, hydroxylauryl (meth)acrylate, methacrylic acid ( 4-Hydroxymethylcyclohexyl) methyl ester and other hydroxyl-containing monomers. The content ratio of the above-mentioned carboxyl group-containing monomer is preferably 0.5 to 15 parts by weight, more preferably 1 to 10 parts by weight, and still more preferably 3 parts by weight relative to 100 parts by weight of the total amount of the acrylic polymer. parts to 9.5 parts by weight. The content ratio of the acid anhydride monomer is preferably 0.5 to 15 parts by weight, more preferably 1 to 10 parts by weight, and still more preferably 3 to 10 parts by weight relative to 100 parts by weight of the total amount of the acrylic polymer. 9.5 parts by weight. The content ratio of the above-mentioned hydroxyl-containing monomer is preferably 0.5 to 15 parts by weight, more preferably 1 to 10 parts by weight, and still more preferably 3 parts by weight relative to 100 parts by weight of the total amount of the acrylic polymer. parts to 9.5 parts by weight.

作為上述橡膠系黏著劑,例如可例舉將如下者作為基礎聚合物之橡膠系黏著劑:天然橡膠;聚異戊二烯橡膠、苯乙烯-丁二烯(SB)橡膠、苯乙烯-異戊二烯(SI)橡膠、苯乙烯-異戊二烯-苯乙烯嵌段共聚物(SIS)橡膠、苯乙烯-丁二烯-苯乙烯嵌段共聚物(SBS)橡膠、苯乙烯-乙烯-丁烯-苯乙烯嵌段共聚物(SEBS)橡膠、苯乙烯-乙烯-丙烯-苯乙烯嵌段共聚物(SEPS)橡膠、苯乙烯-乙烯-丙烯嵌段共聚物(SEP)橡膠、再生橡膠、丁基橡膠、聚異丁烯、該等之改性體等合成橡膠等。Examples of the rubber-based adhesive include rubber-based adhesives using the following as a base polymer: natural rubber; polyisoprene rubber, styrene-butadiene (SB) rubber, styrene-isoprene Diene (SI) rubber, styrene-isoprene-styrene block copolymer (SIS) rubber, styrene-butadiene-styrene block copolymer (SBS) rubber, styrene-ethylene-butylene Ethylene-styrene block copolymer (SEBS) rubber, styrene-ethylene-propylene-styrene block copolymer (SEPS) rubber, styrene-ethylene-propylene block copolymer (SEP) rubber, recycled rubber, butadiene base rubber, polyisobutylene, their modified bodies and other synthetic rubbers.

自上述氣體產生層產生之氣體較佳為烴(較佳為脂肪族烴)系氣體。可產生烴系氣體之氣體產生層例如以烴系化合物為主成分而構成。氣體產生層較佳為不含有含鹵素元素之化合物。若產生之氣體為烴系氣體,則可防止作為被加工物之電子零件之腐蝕。此種效果藉由形成不含有含鹵素元素之化合物之氣體產生層而變得更顯著。自氣體產生層之產生離子式量較佳為10 m/z~800 m/z,更佳為11 m/z~700 m/z,進而較佳為12 m/z~500 m/z,尤佳為13 m/z~400 m/z。The gas generated from the gas generating layer is preferably a hydrocarbon (preferably aliphatic hydrocarbon) gas. The gas generating layer capable of generating hydrocarbon-based gas is composed of a hydrocarbon-based compound as its main component, for example. The gas generating layer preferably does not contain compounds containing halogen elements. If the generated gas is a hydrocarbon-based gas, corrosion of electronic parts as the workpiece can be prevented. This effect becomes more remarkable by forming a gas generating layer that does not contain a compound containing a halogen element. The amount of ions generated from the gas generating layer is preferably 10 m/z to 800 m/z, more preferably 11 m/z to 700 m/z, further preferably 12 m/z to 500 m/z, especially The optimal range is 13 m/z~400 m/z.

上述黏著劑A可視需要含有任意適當之添加劑。作為該添加劑,例如可例舉:交聯劑、黏著賦予劑(例如,松香系黏著賦予劑、萜烯系黏著賦予劑、烴系黏著賦予劑等)、塑化劑(例如,偏苯三甲酸酯系塑化劑、均苯四甲酸酯系塑化劑)、顏料、染料、抗老化劑、導電材、抗靜電劑、光穩定劑、剝離調整劑、軟化劑、界面活性劑、阻燃劑、抗氧化劑等。The above-mentioned adhesive A may contain any appropriate additives if necessary. Examples of the additive include cross-linking agents, tackifiers (eg, rosin-based tackifiers, terpene-based tackifiers, hydrocarbon-based tackifiers, etc.), plasticizers (eg, trimellitic acid). Ester plasticizer, pyromellitate plasticizer), pigments, dyes, anti-aging agents, conductive materials, antistatic agents, light stabilizers, peeling adjusters, softeners, surfactants, flame retardants agents, antioxidants, etc.

作為上述交聯劑,例如可例舉:異氰酸酯系交聯劑、環氧系交聯劑、三聚氰胺系交聯劑、過氧化物系交聯劑、以及脲系交聯劑、金屬烷氧化物系交聯劑、金屬螯合物系交聯劑、金屬鹽系交聯劑、碳二醯亞胺系交聯劑、㗁唑啉系交聯劑、氮丙啶系交聯劑、胺系交聯劑等。其中,較佳為異氰酸酯系交聯劑或環氧系交聯劑。Examples of the cross-linking agent include isocyanate-based cross-linking agents, epoxy-based cross-linking agents, melamine-based cross-linking agents, peroxide-based cross-linking agents, urea-based cross-linking agents, and metal alkoxide-based cross-linking agents. Cross-linking agent, metal chelate-based cross-linking agent, metal salt-based cross-linking agent, carbodiimide-based cross-linking agent, oxazoline-based cross-linking agent, aziridine-based cross-linking agent, amine-based cross-linking agent Agents, etc. Among them, an isocyanate cross-linking agent or an epoxy cross-linking agent is preferred.

作為上述異氰酸酯系交聯劑之具體例,可例舉:伸丁基二異氰酸酯、六亞甲基二異氰酸酯等低級脂肪族聚異氰酸酯類;伸環戊基二異氰酸酯、伸環己基二異氰酸酯、異佛爾酮二異氰酸酯等脂環族異氰酸酯類;2,4-甲苯二異氰酸酯、4,4'-二苯甲烷二異氰酸酯、苯二甲基二異氰酸酯等芳香族異氰酸酯類;三羥甲基丙烷/甲苯二異氰酸酯三聚物加成物(Nippon Polyurethane Industry公司製造,商品名「Coronate L」)、三羥甲基丙烷/六亞甲基二異氰酸酯三聚物加成物(Nippon Polyurethane Industry公司製造,商品名「Coronate HL」)、六亞甲基二異氰酸酯之異氰尿酸酯體(Nippon Polyurethane Industry公司製造,商品名「Coronate HX」)等異氰酸酯加成物等。異氰酸酯系交聯劑之含量可根據所需之黏著力而設定為任意適當之量,相對於基礎聚合物100重量份,代表性而言為0.1重量份~20重量份,更佳為0.5重量份~10重量份。Specific examples of the isocyanate-based crosslinking agent include lower aliphatic polyisocyanates such as butyl diisocyanate and hexamethylene diisocyanate; cyclopentyl diisocyanate, cyclohexyl diisocyanate, isophoride Alicyclic isocyanates such as ketone diisocyanate; aromatic isocyanates such as 2,4-toluene diisocyanate, 4,4'-diphenylmethane diisocyanate, xylylene diisocyanate; trimethylolpropane/toluene diisocyanate Isocyanate trimer adduct (manufactured by Nippon Polyurethane Industry, trade name "Coronate L"), trimethylolpropane/hexamethylene diisocyanate trimer adduct (manufactured by Nippon Polyurethane Industry, trade name "Coronate L") Coronate HL"), isocyanate adducts such as the isocyanurate body of hexamethylene diisocyanate (manufactured by Nippon Polyurethane Industry, trade name "Coronate HX"), etc. The content of the isocyanate cross-linking agent can be set to any appropriate amount according to the required adhesion. It is typically 0.1 to 20 parts by weight relative to 100 parts by weight of the base polymer, and more preferably 0.5 parts by weight. ~10 parts by weight.

作為上述環氧系交聯劑,例如可例舉:N,N,N',N'-四縮水甘油基間苯二甲胺、二縮水甘油基苯胺、1,3-雙(N,N-縮水甘油基胺基甲基)環己烷(三菱瓦斯化學公司製造,商品名「Tetrad C」)、1,6-己二醇二縮水甘油醚(共榮社化學公司製造,商品名「Epolight 1600」)、新戊二醇二縮水甘油醚(共榮社化學公司製造,商品名「Epolight 1500NP」)、乙二醇二縮水甘油醚(共榮社化學公司製造,商品名「Epolight 40E」)、丙二醇二縮水甘油醚(共榮社化學公司製造,商品名「Epolight 70P」)、聚乙二醇二縮水甘油醚(日本油脂公司製造,商品名「EPIOL E-400」)、聚丙二醇二縮水甘油醚(日本油脂公司製造,商品名「EPIOL P-200」)、山梨醇聚縮水甘油醚(Nagase chemteX公司製造,商品名「Denacol EX-611」)、甘油聚縮水甘油醚(Nagase chemteX公司製造,商品名「Denacol EX-314」)、季戊四醇聚縮水甘油醚、聚甘油聚縮水甘油醚(Nagase chemteX公司製造,商品名「Denacol EX-512」)、山梨醇酐聚縮水甘油醚、三羥甲基丙烷聚縮水甘油醚、己二酸二縮水甘油酯、鄰苯二甲酸二縮水甘油酯、三(2-羥乙基)異氰尿酸三縮水甘油酯、間苯二酚二縮水甘油醚、雙苯酚-S-二縮水甘油醚、分子內具有2個以上之環氧基之環氧系樹脂等。環氧系交聯劑之含量可根據所需之黏著力而設定為任意適當之量,相對於基礎聚合物100重量份,代表性而言為0.01重量份~10重量份,更佳為0.03重量份~5重量份。Examples of the epoxy cross-linking agent include: N,N,N',N'-tetraglycidyl metaxylylenediamine, diglycidyl aniline, 1,3-bis(N,N- Glycidyl aminomethyl) cyclohexane (manufactured by Mitsubishi Gas Chemical Co., Ltd., trade name "Tetrad C"), 1,6-hexanediol diglycidyl ether (manufactured by Kyoeisha Chemical Co., Ltd., trade name "Epolight 1600" "), neopentyl glycol diglycidyl ether (manufactured by Kyeisha Chemical Co., Ltd., trade name "Epolight 1500NP"), ethylene glycol diglycidyl ether (manufactured by Kyeisha Chemical Co., Ltd., trade name "Epolight 40E"), Propylene glycol diglycidyl ether (manufactured by Kyeisha Chemical Co., Ltd., trade name "Epolight 70P"), polyethylene glycol diglycidyl ether (manufactured by Nippon Oils and Fats Co., Ltd., trade name "EPIOL E-400"), polypropylene glycol diglycidyl ether Ether (manufactured by Nippon Oils and Fats Corporation, trade name "EPIOL P-200"), sorbitol polyglycidyl ether (manufactured by Nagase chemteX Company, trade name "Denacol EX-611"), glycerol polyglycidyl ether (manufactured by Nagase chemteX Company, Trade name "Denacol EX-314"), pentaerythritol polyglycidyl ether, polyglyceryl polyglycidyl ether (manufactured by Nagase chemteX, trade name "Denacol EX-512"), sorbitan polyglycidyl ether, trimethylol Propane polyglycidyl ether, diglycidyl adipate, diglycidyl phthalate, tris(2-hydroxyethyl)triglycidyl isocyanurate, resorcinol diglycidyl ether, bisphenol -S-diglycidyl ether, epoxy resins with two or more epoxy groups in the molecule, etc. The content of the epoxy cross-linking agent can be set to any appropriate amount according to the required adhesion. It is typically 0.01 to 10 parts by weight relative to 100 parts by weight of the base polymer, and more preferably 0.03 parts by weight. parts to 5 parts by weight.

C. 黏著劑層上述黏著劑層含有任意適當之黏著劑B。作為黏著劑B,可為感壓黏著劑B1,亦可為硬化型黏著劑B2。 C. Adhesive layer The above adhesive layer contains any appropriate adhesive B. The adhesive B may be a pressure-sensitive adhesive B1 or a hardening adhesive B2.

上述黏著劑層之厚度較佳為0.1 μm~50 μm,更佳為0.5 μm~40 μm,進而較佳為1 μm~30 μm,尤佳為2 μm~20 μm。若為此種範圍,則可形成具有較佳黏著力,且作為氣體阻隔層良好地發揮作用之黏著劑層。The thickness of the above-mentioned adhesive layer is preferably 0.1 μm to 50 μm, more preferably 0.5 μm to 40 μm, further preferably 1 μm to 30 μm, and particularly preferably 2 μm to 20 μm. If it is within this range, an adhesive layer can be formed that has good adhesion and functions well as a gas barrier layer.

上述黏著劑層之水蒸氣透過率較佳為20000 g/(m 2・day)以下,更佳為10000 g/(m 2・day)以下,進而較佳為7000 g/(m 2・day)以下,進而較佳為5000 g/(m 2・day)以下,尤佳為4800 g/(m 2・day)以下,最佳為4500 g/(m 2・day)以下。若為此種範圍,則黏著劑層作為氣體阻隔層良好地發揮作用,形成優異形狀之變形部。若使用此種黏著片材,則可精度良好地使小型被黏著體(例如,電子零件)剝離。黏著劑層之水蒸氣透過率越小越佳,其下限值例如為100 g/(m 2・day)。 The water vapor transmission rate of the above-mentioned adhesive layer is preferably 20000 g/(m 2 ·day) or less, more preferably 10000 g/(m 2 ·day) or less, and further preferably 7000 g/(m 2 ·day) or less, more preferably 5000 g/(m 2 ·day) or less, particularly preferably 4800 g/(m 2 ·day) or less, most preferably 4500 g/(m 2 ·day) or less. If it is within this range, the adhesive layer will function well as a gas barrier layer and form a deformation portion with an excellent shape. If such an adhesive sheet is used, small adherends (for example, electronic components) can be peeled off with high precision. The lower the water vapor transmission rate of the adhesive layer, the better. The lower limit is, for example, 100 g/(m 2 ·day).

上述黏著劑層之穿刺強度較佳為10 mN~3000 mN,更佳為30 mN~2500 mN,進而較佳為50 mN~2000 mN,尤佳為100 mN~2000 mN。若為此種範圍,則黏著劑層作為氣體阻隔層良好地發揮作用,且較佳地產生藉由氣體之產生所引起之形狀變化,其結果,形成優異形狀之變形部。若使用此種黏著片材,則可精度良好地使小型被黏著體(例如,電子零件)剝離。The puncture strength of the above-mentioned adhesive layer is preferably 10 mN to 3000 mN, more preferably 30 mN to 2500 mN, further preferably 50 mN to 2000 mN, and particularly preferably 100 mN to 2000 mN. If it is within this range, the adhesive layer will function well as a gas barrier layer and will preferably produce a shape change caused by the generation of gas. As a result, a deformation portion with an excellent shape will be formed. If such an adhesive sheet is used, small adherends (for example, electronic components) can be peeled off with high precision.

上述黏著劑層之波長360 nm之紫外線透過率較佳為50%~100%,更佳為60%~95%。The ultraviolet transmittance of the above-mentioned adhesive layer with a wavelength of 360 nm is preferably 50% to 100%, and more preferably 60% to 95%.

C-1.感壓黏著劑B1 作為上述感壓黏著劑B1,例如可例舉:丙烯酸系黏著劑、橡膠系黏著劑、乙烯基烷基醚系黏著劑、矽酮系黏著劑、聚酯系黏著劑、聚醯胺系黏著劑、胺基甲酸酯系黏著劑、苯乙烯-二烯嵌段共聚物系黏著劑等。其中較佳為丙烯酸系黏著劑或橡膠系黏著劑,更佳為丙烯酸系黏著劑。作為含有感壓黏著劑之黏著劑層所含有之黏著劑B1,可使用B-2項中說明之黏著劑。 C-1. Pressure-sensitive adhesive B1 Examples of the pressure-sensitive adhesive B1 include acrylic adhesives, rubber adhesives, vinyl alkyl ether adhesives, silicone adhesives, polyester adhesives, and polyamide adhesives. , urethane adhesives, styrene-diene block copolymer adhesives, etc. Among them, an acrylic adhesive or a rubber adhesive is preferred, and an acrylic adhesive is more preferred. As the adhesive B1 contained in the adhesive layer containing the pressure-sensitive adhesive, the adhesive described in item B-2 can be used.

C-2.硬化型黏著劑B2 作為硬化型黏著劑B2,例如可例舉:熱固型黏著劑、活性能量線硬化型黏著劑等。較佳為使用活性能量線硬化型黏著劑。藉由該活性能量線硬化型黏著劑而形成之上述黏著劑層為照射活性能量線而形成之黏著劑層,即,為於活性能量線照射後具有特定黏著力之黏著劑層。 C-2. Hardening adhesive B2 Examples of the curing adhesive B2 include thermosetting adhesives, active energy ray curing adhesives, and the like. It is preferable to use an active energy ray-hardening adhesive. The above-mentioned adhesive layer formed by the active energy ray curable adhesive is an adhesive layer formed by irradiation of active energy rays, that is, an adhesive layer with specific adhesive force after irradiation of active energy rays.

作為構成上述活性能量線硬化型黏著劑之樹脂材料,例如可例舉:紫外線硬化系統(加藤清視著,綜合技術中心發行(1989))、光硬化技術(技術資訊協會編(2000))、日本專利特開2003-292916號公報、日本專利4151850號等中記載之樹脂材料。更具體而言,可例舉含有成為母劑之聚合物與活性能量線反應性化合物(單體或低聚物)之樹脂材料(B2-1)、含有活性能量線反應性聚合物之樹脂材料(B2-2)等。Examples of the resin material constituting the above-mentioned active energy ray curable adhesive include ultraviolet curing system (authored by Kiyoshi Kato, published by the Comprehensive Technology Center (1989)), photocuring technology (edited by the Technical Information Association (2000)), Resin materials described in Japanese Patent Application Laid-Open No. 2003-292916, Japanese Patent No. 4151850, etc. More specifically, examples thereof include a resin material (B2-1) containing a polymer serving as a mother agent and an active energy ray-reactive compound (monomer or oligomer), and a resin material containing an active energy ray-reactive polymer. (B2-2) etc.

作為上述成為母劑之聚合物,例如可例舉:天然橡膠、聚異丁烯橡膠、苯乙烯-丁二烯橡膠、苯乙烯-異戊二烯-苯乙烯嵌段共聚物橡膠、再生橡膠、丁基橡膠、聚異丁烯橡膠、腈橡膠(NBR(Nitrile Butadiene Rubber,丁腈橡膠))等橡膠系聚合物;矽酮系聚合物;丙烯酸系聚合物等。該等聚合物可單獨使用或組合2種以上而使用。Examples of the polymer used as the masterbatch include natural rubber, polyisobutylene rubber, styrene-butadiene rubber, styrene-isoprene-styrene block copolymer rubber, recycled rubber, and butyl rubber. Rubber-based polymers such as rubber, polyisobutylene rubber, and nitrile rubber (NBR (Nitrile Butadiene Rubber)); silicone-based polymers; acrylic-based polymers, etc. These polymers can be used individually or in combination of 2 or more types.

作為上述活性能量線反應性化合物,例如可例舉含有複數個丙烯醯基、甲基丙烯醯基、乙烯基、烯丙基、乙炔基等具有碳-碳多重鍵之官能基之光反應性之單體或低聚物。其中,較佳地使用具有乙烯性不飽和官能基之化合物,更佳地使用具有乙烯性不飽和官能基之(甲基)丙烯酸系化合物。具有乙烯性不飽和官能基之化合物藉由紫外線而容易生成自由基,因此若使用該化合物,則可形成可於短時間硬化之黏著劑層。又,若使用具有乙烯性不飽和官能基之(甲基)丙烯酸系化合物,則可形成硬化後具有適度硬度之黏著劑層。作為光反應性之單體或低聚物之具體例,可例舉:三羥甲基丙烷三(甲基)丙烯酸酯、四羥甲基甲烷四(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇單羥基五(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、1,4-丁二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、(甲基)丙烯酸胺基甲酸酯系化合物等含(甲基)丙烯醯基之化合物;該含(甲基)丙烯醯基之化合物之二聚物~五聚物等。該等化合物可單獨使用或組合2種以上而使用。Examples of the active energy ray reactive compounds include photoreactive compounds containing a plurality of functional groups having carbon-carbon multiple bonds such as acrylic groups, methacrylic groups, vinyl groups, allyl groups, and ethynyl groups. Monomer or oligomer. Among them, a compound having an ethylenically unsaturated functional group is preferably used, and a (meth)acrylic compound having an ethylenically unsaturated functional group is more preferably used. A compound having an ethylenically unsaturated functional group easily generates free radicals by ultraviolet rays. Therefore, if this compound is used, an adhesive layer that can be cured in a short time can be formed. Furthermore, if a (meth)acrylic compound having an ethylenically unsaturated functional group is used, an adhesive layer having moderate hardness after curing can be formed. Specific examples of the photoreactive monomer or oligomer include trimethylolpropane tri(meth)acrylate, tetramethylolmethane tetra(meth)acrylate, and pentaerythritol tri(meth)acrylate. ) Acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol monohydroxypenta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, 1,4-butanediol di(meth)acrylate, Compounds containing (meth)acrylyl groups such as 1,6-hexanediol di(meth)acrylate, polyethylene glycol di(meth)acrylate, and (meth)acrylic urethane compounds ; Dimers to pentamers of the (meth)acrylyl group-containing compound, etc. These compounds can be used individually or in combination of 2 or more types.

又,作為上述活性能量線反應性化合物,可使用環氧化丁二烯、甲基丙烯酸縮水甘油酯、丙烯醯胺、乙烯基矽氧烷等單體;或由該單體構成之低聚物。含有該等化合物之樹脂材料(B2-1)可藉由紫外線、電子束等高能量線而硬化。In addition, as the above-mentioned active energy ray reactive compound, monomers such as epoxidized butadiene, glycidyl methacrylate, acrylamide, vinylsiloxane, or the like; or oligomers composed of these monomers can be used. The resin material (B2-1) containing these compounds can be hardened by high-energy rays such as ultraviolet rays and electron beams.

進而,作為上述活性能量線反應性化合物,可使用鎓鹽等有機鹽類與分子內具有複數個雜環之化合物之混合物。該混合物藉由活性能量線(例如,紫外線、電子束)之照射,有機鹽會裂解而生成離子,其成為起始種而引發雜環之開環反應,從而可形成三維網狀結構。作為上述有機鹽類,例如可例舉:錪鹽、鏻鹽、銻鹽、鋶鹽、硼酸鹽等。作為上述分子內具有複數個雜環之化合物中之雜環,可例舉:環氧乙烷、氧雜環丁烷、氧雜環戊烷、環硫乙烷、氮丙啶等。Furthermore, as the active energy ray reactive compound, a mixture of an organic salt such as an onium salt and a compound having a plurality of heterocyclic rings in the molecule can be used. When the mixture is irradiated with active energy rays (eg, ultraviolet rays, electron beams), the organic salt will be decomposed to generate ions, which become starting species and trigger a ring-opening reaction of the heterocycle, thereby forming a three-dimensional network structure. Examples of the organic salts include iodonium salts, phosphonium salts, antimony salts, sulfonium salts, and borate salts. Examples of the heterocyclic ring in the compound having a plurality of heterocyclic rings in the molecule include ethylene oxide, oxetane, oxolane, ethylene sulfide, and aziridine.

含有上述成為母劑之聚合物與活性能量線反應性化合物之樹脂材料(B2-1)中,相對於成為母劑之聚合物100重量份,活性能量線反應性化合物之含有比率較佳為0.1重量份~500重量份,更佳為1重量份~300重量份,進而較佳為10重量份~200重量份。In the resin material (B2-1) containing the above-described polymer as a masterbatch and an active energy ray-reactive compound, the content ratio of the active energy ray-reactive compound is preferably 0.1 relative to 100 parts by weight of the polymer as a masterbatch. Parts by weight to 500 parts by weight, more preferably 1 part by weight to 300 parts by weight, further preferably 10 parts by weight to 200 parts by weight.

作為上述活性能量線反應性聚合物,例如可例舉含有丙烯醯基、甲基丙烯醯基、乙烯基、烯丙基、乙炔基等具有碳-碳多重鍵之活性能量線反應性官能基之聚合物。較佳為使用具有乙烯性不飽和官能基之化合物(聚合物),更佳為使用具有丙烯醯基或甲基丙烯醯基之(甲基)丙烯酸系聚合物。作為具有活性能量線反應性官能基之聚合物之具體例,可例舉包含多官能(甲基)丙烯酸酯之聚合物等。該包含多官能(甲基)丙烯酸酯之聚合物較佳為於側鏈具有碳數為4以上之烷基酯,更佳為具有碳數為6以上之烷基酯,進而較佳為具有碳數為8以上之烷基酯,尤佳為具有碳數為8~20之烷基酯,最佳為具有碳數為8~18之烷基酯。Examples of the active energy ray reactive polymer include those containing active energy ray reactive functional groups having carbon-carbon multiple bonds such as acrylic group, methacrylic group, vinyl group, allyl group, and ethynyl group. polymer. It is preferable to use a compound (polymer) having an ethylenically unsaturated functional group, and more preferably to use a (meth)acrylic polymer having an acrylic group or a methacrylic group. Specific examples of the polymer having an active energy ray-reactive functional group include a polymer containing polyfunctional (meth)acrylate. The polymer containing polyfunctional (meth)acrylate is preferably an alkyl ester having a carbon number of 4 or more in the side chain, more preferably an alkyl ester having a carbon number of 6 or more, and still more preferably a carbon The alkyl ester having a carbon number of 8 or more is particularly preferably an alkyl ester having a carbon number of 8 to 20, and most preferably an alkyl ester having a carbon number of 8 to 18.

含有上述活性能量線反應性聚合物之樹脂材料(B2-2)亦可進而含有上述活性能量線反應性化合物(單體或低聚物)。The resin material (B2-2) containing the above-mentioned active energy ray-reactive polymer may further contain the above-mentioned active energy ray-reactive compound (monomer or oligomer).

上述活性能量線硬化型黏著劑可藉由活性能量線之照射而硬化。本發明之黏著片材中,於使黏著劑硬化前貼附被黏著體之後,照射活性能量線而使黏著劑硬化,藉此可使該被黏著體密接。作為活性能量線,例如可例舉:γ射線、紫外線、可見光線、紅外線(熱線)、射頻波、α射線、β射線、電子束、電漿流、電離輻射、粒子束等。活性能量線之波長、照射量等條件可根據使用之樹脂材料之種類等而設定為任意適當之條件。例如,可照射10~1000 mJ/cm 2照射量之紫外線而使黏著劑硬化。 The above-mentioned active energy ray curable adhesive can be hardened by irradiation of active energy rays. In the adhesive sheet of the present invention, after the adherend is attached before hardening the adhesive, active energy rays are irradiated to harden the adhesive, whereby the adherend can be brought into close contact with the adherend. Examples of the active energy rays include γ rays, ultraviolet rays, visible rays, infrared rays (heat lines), radio frequency waves, α rays, β rays, electron beams, plasma currents, ionizing radiation, particle beams, and the like. Conditions such as the wavelength and irradiation dose of active energy rays can be set to any appropriate conditions depending on the type of resin material used. For example, the adhesive can be hardened by irradiating ultraviolet light with a dose of 10 to 1000 mJ/cm 2 .

D. 中間層作為上述中間層之形態,例如可例舉樹脂層、具有黏著性之層等。 D. Intermediate Layer Examples of the form of the above-mentioned intermediate layer include a resin layer, an adhesive layer, and the like.

於一實施方式中,上述中間層含有熱塑性樹脂。此種中間層可為含有熱塑性樹脂之樹脂膜、含有包含熱塑性樹脂之黏著劑C之層等。於其他實施方式中,上述中間層含有硬化型樹脂(例如,紫外線硬化型樹脂、熱固型樹脂)。此種中間層可為含有硬化型樹脂之樹脂膜、含有硬化型黏著劑D之層等。In one embodiment, the intermediate layer contains thermoplastic resin. Such an intermediate layer may be a resin film containing a thermoplastic resin, a layer containing an adhesive C containing a thermoplastic resin, or the like. In other embodiments, the intermediate layer contains curable resin (eg, ultraviolet curable resin, thermosetting resin). This intermediate layer may be a resin film containing a curable resin, a layer containing a curable adhesive D, or the like.

中間層之厚度較佳為0.1 μm~50 μm,更佳為1 μm~40 μm,進而較佳為1.5 μm~30 μm。若為此種範圍,則可形成作為氣體阻隔層良好地發揮作用之中間層。The thickness of the intermediate layer is preferably 0.1 μm to 50 μm, more preferably 1 μm to 40 μm, and further preferably 1.5 μm to 30 μm. If it is within this range, an intermediate layer that functions well as a gas barrier layer can be formed.

上述中間層之水蒸氣透過率較佳為5000 g/(m 2・day)以下,更佳為4800 g/(m 2・day)以下,進而較佳為4500 g/(m 2・day)以下,進而較佳為4200 g/(m 2・day)以下。若為此種範圍,則中間層作為氣體阻隔層良好地發揮作用,形成優異形狀之變形部。若使用此種黏著片材,則可精度良好地使小型被黏著體(例如,電子零件)剝離。中間層之水蒸氣透過率越小越佳,其下限值例如為0.1 g/(m 2・day)。 The water vapor transmission rate of the above-mentioned intermediate layer is preferably 5000 g/(m 2 ·day) or less, more preferably 4800 g/(m 2 ·day) or less, further preferably 4500 g/(m 2 ·day) or less , and more preferably 4200 g/(m 2 ·day) or less. If it is within this range, the intermediate layer will function well as a gas barrier layer and form a deformation portion with an excellent shape. If such an adhesive sheet is used, small adherends (for example, electronic components) can be peeled off with high precision. The lower the water vapor transmission rate of the intermediate layer, the better. The lower limit is, for example, 0.1 g/(m 2 ·day).

上述中間層之穿刺強度較佳為300 mN~5000 mN,更佳為500 mN~4500 mN,進而較佳為1000 mN~4000 mN。若為此種範圍,則中間層作為氣體阻隔層良好地發揮作用,且較佳地產生藉由氣體之產生所引起之形狀變化,其結果,形成優異形狀之變形部。若使用此種黏著片材,則可精度良好地使小型被黏著體(例如,電子零件)剝離。The puncture strength of the above-mentioned intermediate layer is preferably 300 mN to 5000 mN, more preferably 500 mN to 4500 mN, and further preferably 1000 mN to 4000 mN. If it is within this range, the intermediate layer functions well as a gas barrier layer and preferably causes a shape change caused by the generation of gas. As a result, a deformed portion with an excellent shape is formed. If such an adhesive sheet is used, small adherends (for example, electronic components) can be peeled off with high precision.

上述中間層之波長360 nm之紫外線透過率較佳為50%~100%,更佳為60%~95%。The ultraviolet transmittance of the above-mentioned intermediate layer with a wavelength of 360 nm is preferably 50% to 100%, and more preferably 60% to 95%.

D-1.作為樹脂層之中間層 作為樹脂層之中間層例如由樹脂膜形成。作為形成該樹脂膜之樹脂,例如可例舉:聚對苯二甲酸乙二酯系樹脂、聚烯烴系樹脂、苯乙烯系彈性體樹脂(例如SEBS等)、紫外線硬化型樹脂、熱固性樹脂、胺基甲酸酯系樹脂、環氧系樹脂等。於一實施方式中,上述樹脂膜包含熱塑性樹脂。 D-1. As an intermediate layer between the resin layer The intermediate layer as the resin layer is formed of, for example, a resin film. Examples of the resin forming the resin film include polyethylene terephthalate resin, polyolefin resin, styrene elastomer resin (such as SEBS, etc.), ultraviolet curable resin, thermosetting resin, amine Formate-based resins, epoxy-based resins, etc. In one embodiment, the resin film includes thermoplastic resin.

上述樹脂膜之厚度較佳為0.1 μm~50 μm,更佳為0.5 μm~30 μm,進而較佳為1 μm~20 μm。The thickness of the above-mentioned resin film is preferably 0.1 μm to 50 μm, more preferably 0.5 μm to 30 μm, and further preferably 1 μm to 20 μm.

D-2.作為具有黏著性之層之中間層 關於作為具有黏著性之層之中間層,可例舉:含有感壓黏著劑之中間層、含有硬化型黏著劑之中間層等。較佳為配置含有硬化型黏著劑D之中間層。尤其若作為黏著劑層而將含有感壓黏著劑A之黏著劑層與含有硬化型黏著劑D之中間層組合,則可獲得藉由雷射光照射而可形成更良好之變形部之黏著片材。作為硬化型黏著劑D,可使用C-2項中說明之黏著劑。 D-2. As an intermediate layer among the adhesive layers Examples of the intermediate layer that is an adhesive layer include an intermediate layer containing a pressure-sensitive adhesive, an intermediate layer containing a hardening adhesive, and the like. It is preferable to configure an intermediate layer containing hardening adhesive D. In particular, if an adhesive layer containing a pressure-sensitive adhesive A and an intermediate layer containing a hardening adhesive D are combined as an adhesive layer, an adhesive sheet can be obtained that can form a better deformation portion by laser irradiation. . As the hardening adhesive D, the adhesive described in item C-2 can be used.

作為具有黏著性之層之中間層之厚度較佳為5 μm~50 μm,更佳為5 μm~30 μm。The thickness of the intermediate layer as an adhesive layer is preferably 5 μm to 50 μm, more preferably 5 μm to 30 μm.

E. 黏著片材之製造方法本發明之黏著片材可藉由任意適當之方法而製造。關於本發明之黏著片材,例如可例舉如下方法:於特定基材上直接塗佈含有黏著劑A及紫外線吸收劑之氣體產生層形成用組合物而形成氣體產生層,並於該氣體產生層上塗佈含有黏著劑B之黏著劑層形成用組合物而形成黏著劑層。於一實施方式中,於黏著片材具有中間層之情形時,在形成黏著劑層之前,將中間層形成用組合物塗佈於氣體產生層上而形成中間層,並於該中間層上塗佈黏著劑層形成用組合物而形成黏著劑層。又,亦可將各層分別形成之後進行貼合而形成黏著片材。 E. Manufacturing method of adhesive sheet The adhesive sheet of the present invention can be manufactured by any appropriate method. An example of the adhesive sheet of the present invention is as follows: a gas generating layer forming composition containing an adhesive A and an ultraviolet absorber is directly coated on a specific substrate to form a gas generating layer, and the gas generating layer is formed on a specific substrate. An adhesive layer-forming composition containing adhesive B is applied on the layer to form an adhesive layer. In one embodiment, when the adhesive sheet has an intermediate layer, before forming the adhesive layer, the intermediate layer-forming composition is applied to the gas generating layer to form the intermediate layer, and the intermediate layer is coated with The cloth adhesive layer forming composition is used to form an adhesive layer. Alternatively, each layer may be formed separately and then laminated together to form an adhesive sheet.

作為上述組合物之塗佈方法,可採用任意適當之塗佈方法。例如,可於塗佈後進行乾燥而形成各層。作為塗佈方法,例如可例舉使用多輥塗佈機、模嘴塗佈機、凹版塗佈機、敷料器等之塗佈方法。作為乾燥方法,例如可例舉:自然乾燥、加熱乾燥等。進行加熱乾燥之情形時之加熱溫度可根據成為乾燥對象之物質之特性而設定為任意適當之溫度。又,可根據各層之形態而進行活性能量線照射(例如,紫外線照射)。As the coating method of the above composition, any appropriate coating method can be used. For example, each layer can be formed by drying after coating. Examples of the coating method include a coating method using a multi-roller coater, a die coater, a gravure coater, an applicator, and the like. Examples of drying methods include natural drying, heat drying, and the like. The heating temperature when performing heat drying can be set to any appropriate temperature according to the characteristics of the substance to be dried. Moreover, active energy ray irradiation (for example, ultraviolet irradiation) can be performed according to the form of each layer.

F. 電子零件之處理方法本發明之電子零件之處理方法包括:將電子零件貼附於上述黏著片材;及對該黏著片材照射雷射光,而自該黏著片材剝離電子零件。作為電子零件,例如可例舉:半導體晶片、LED(Light-emitting diode,發光二極體)晶片、MLCC(Multi-layer Ceramic Capacitor,積層陶瓷電容)等。 F. Processing method of electronic components The processing method of electronic components of the present invention includes: attaching electronic components to the above-mentioned adhesive sheet; and irradiating the adhesive sheet with laser light to peel off the electronic components from the adhesive sheet. Examples of electronic components include semiconductor wafers, LED (Light-emitting diode) wafers, MLCC (Multi-layer Ceramic Capacitors), and the like.

上述電子零件之剝離可選擇位置地進行。具體而言,將複數個電子零件貼附、固定於黏著片材,能以使電子零件之一部分剝離,讓其他電子零件仍保持固定之方式進行電子零件之剝離。The above-mentioned peeling off of the electronic components can be performed at selected locations. Specifically, by attaching and fixing multiple electronic components to an adhesive sheet, the electronic components can be peeled off in such a way that part of the electronic components can be peeled off while other electronic components remain fixed.

於一實施方式中,本發明之電子零件之處理方法包括:於將電子零件貼附於黏著片材後且自黏著片材剝離電子零件前,對該電子零件進行特定處理。上述處理並無特別限定,例如可例舉:研磨加工、切割加工、黏晶、打線接合、蝕刻、蒸鍍、成型、電路形成、檢查、產品檢驗、洗淨、轉印、排列、修復、裝置表面保護等處理。In one embodiment, the processing method of electronic components of the present invention includes: performing specific processing on the electronic components after attaching the electronic components to the adhesive sheet and before peeling off the electronic components from the adhesive sheet. The above-mentioned processing is not particularly limited, and examples include: grinding processing, cutting processing, die bonding, wire bonding, etching, evaporation, molding, circuit formation, inspection, product inspection, cleaning, transfer, alignment, repair, and installation. Surface protection and other treatments.

上述電子零件之尺寸(貼附面之面積)例如為1 μm 2~250000 μm 2。於一實施方式中,可將電子零件之尺寸(貼附面之面積)為1 μm 2~6400 μm 2之電子零件供至處理。於其他實施方式中,可將電子零件之尺寸(貼附面之面積)為1 μm 2~2500 μm 2之電子零件供至處理。 The size of the above-mentioned electronic component (the area of the attachment surface) is, for example, 1 μm 2 to 250000 μm 2 . In one embodiment, electronic components whose size (the area of the attachment surface) ranges from 1 μm 2 to 6400 μm 2 can be supplied to the process. In other embodiments, electronic components with a size (area of the attachment surface) ranging from 1 μm 2 to 2500 μm 2 may be provided for processing.

於一實施方式中,如上所述可將複數個電子零件配置於黏著片材上。電子零件之間隔例如為1 μm~500 μm。本發明中,於可縮小間隔地暫時固定被處理體之方面有利。In one embodiment, as described above, a plurality of electronic components can be arranged on the adhesive sheet. The distance between electronic components is, for example, 1 μm to 500 μm. The present invention is advantageous in that the object to be processed can be temporarily fixed with a narrow gap.

作為雷射光,例如可使用UV雷射光。雷射光之照射功率例如為1 μJ~1000 μJ。UV雷射光之波長例如為240 nm~380 nm。As the laser light, for example, UV laser light can be used. The irradiation power of laser light is, for example, 1 μJ to 1000 μJ. The wavelength of UV laser light is, for example, 240 nm to 380 nm.

於一實施方式中,上述電子零件之處理方法包括:於電子零件之剝離後,將該電子零件配置於其他片材(例如,黏著片材、基板等)。 實施例 In one embodiment, the above-mentioned processing method of electronic components includes: after peeling off the electronic components, arranging the electronic components on other sheets (eg, adhesive sheets, substrates, etc.). Example

以下,利用實施例對本發明進行具體說明,但本發明並不受該等實施例限定。實施例中之評價方法如下所述。再者,下述評價中,使用剝離隔離膜後之黏著片材。又,實施例中,只要無特別明確記載,則「份」及「%」為重量基準。Hereinafter, the present invention will be specifically described using examples, but the present invention is not limited to these examples. The evaluation methods in the examples are as follows. In addition, in the following evaluation, the adhesive sheet after peeling off the separator was used. In addition, in the examples, unless otherwise clearly stated, "parts" and "%" are based on weight.

(1)透過率 於具有中間層之黏著片材之情形時,將黏著片材設置於分光光度計(商品名「UV-VIS紫外可見分光光度計 SolidSpec3700」,島津製作所公司製造),讓入射光向樣品之氣體阻隔層側垂直地入射,測定300 nm~800 nm之波長區域之透光率。抽選所得之透射光譜之360 nm及500 nm之波長下之透過率。於僅由黏著層構成之黏著片材之情形時,於保留單側之剝離襯墊之狀態下設置於分光光度計而進行測定,其後,測定剝離襯墊單獨體之透射光譜,藉由進行減法運算而獲得黏著層單獨體之透射光譜。抽選所得之透射光譜之360 nm與500 nm之波長下之透過率。 (2)最大氣體產生峰值溫度 將黏著片材試樣約0.5 mg設置於加熱爐型熱解器,藉由對加熱而揮發之成分進行質量分析之EGA-MS分析,而獲得質量色譜圖。利用加熱爐型熱解器(Frontier Laboratories公司製造,商品名「PY2020iD」)以10℃/min升溫速度自40℃升溫至500℃,使用GC/MS(Gas chromatography/mass spectrometry,氣相層析質譜)分析裝置(JEOL公司製造,商品名「JMS-T100GCV」),根據質量範圍m/z=10~800之質量色譜圖而算出最大氣體產生峰值溫度。 (3)氣化起始溫度 利用與上述(2)同樣之方法使黏著片材升溫,將根據EGA分析而算出之氣體產生上升溫度作為氣化起始溫度。氣體產生上升溫度係以達到根據EGA分析所得之EGA/MS色譜之最大氣體產生峰值之半值的溫度而定義。 (4)產生氣體種 將黏著片材試樣設置於自動試樣燃燒裝置(三菱化學分析技術公司製造,商品名「AQF-2100H」),捕獲以400℃加熱30分鐘而產生之氣體。藉由利用離子層析法對捕獲液進行分析,而特定出產生氣體種。 (5) 5%重量減少溫度 使用示差熱分析裝置(TA Instruments公司製造,商品名「Discovery TGA」),於10℃/min升溫溫度、N 2氛圍下,將流量設為25 ml/min,針對黏著片材測定重量減少5%之溫度。 (6) 10%重量減少溫度 使用示差熱分析裝置(TA Instruments公司製造,商品名「Discovery TGA」),於10℃/min升溫溫度、N 2氛圍下,將流量設為25 ml/min,針對黏著片材測定重量減少10%之溫度。 針對黏著片材、氣體產生層(UV吸收劑)分別測定10%重量減少溫度。 (7)水蒸氣透過率 以覆蓋具有10 mm×10 mm之開口部之Al治具之開口部的方式貼附試樣而製作測定樣品,並將測定樣品設置於水蒸氣透過度測定裝置(MOCON公司製造,商品名「PERMATRAN-W3/34G」)之第1腔室與第2腔室之間,利用MOCON測定法進行評價。溫濕度條件設為30℃/90% RH,氣體(水蒸氣)流量設為10.0±0.5 cc/min,測定時間設為20小時。 針對黏著片材、黏著劑層、中間層分別測定水蒸氣透過率。 (8)表面形狀變化 於黏著片材之氣體產生層側(與黏著劑層相反之側)貼合玻璃板(松波硝子公司製造,大型載玻片S9112(標準大型白色磨邊No.2))而獲得測定樣品。自測定樣品之玻璃板側,使用波長355 nm、光束直徑約20 μm 之UV雷射光,以0.80 mW功率、40 kHz頻率進行脈衝掃描,而使氣體自氣體產生層產生。對於與脈衝掃描過之任意1點對應之黏著劑層表面(實施例1及比較例1中為氣體產生層表面),於雷射光照射結束24小時後,利用共聚聚焦雷射顯微鏡進行觀察,而測定垂直位移Y與水平位移X(直徑;半峰全幅值)。 於位移Y為8 μm以上之情形時,剝離性顯著優異(表中,◎);於位移Y為0.6 μm以上且未達8 μm之情形時,剝離性良好(表中,〇);於位移Y未達0.6 μm之情形時,剝離性不充分(表中,×)。 (9)霧度值 於具有中間層之黏著片材之情形時,將剝離襯墊剝離後設置於霧度計,使入射光向樣品垂直地入射而測定霧度值。於僅由黏著層構成之黏著片材之情形時,於保留單側之剝離襯墊之狀態下設置於霧度計而進行測定,其後測定剝離襯墊單獨體之霧度值,藉由進行減法運算而獲得黏著層單獨體之霧度值。 於霧度值為20%以下之情形時,評價為被黏著體視認性:良(表中,〇),於霧度值為20%以上50%以下之情形時,評價為被黏著體視認性:可(表中,△),於霧度值為50%以上之情形時,評價為被黏著視認性:差(表中,×)。 (10)黏著力(氣體產生層側) 於黏著片材之黏著劑層側貼合PET#25而獲得測定樣品。對於測定樣品之氣體產生層側相對於SUS430之黏著力,藉由依照JIS Z 0237:2000之方法(貼合條件:2 kg輥1個往返,拉伸速度:300 mm/min,剝離角度180°)進行測定。 (11)黏著力(黏著劑層) 於黏著片材之氣體產生層側貼合PET#25而獲得測定樣品。對於測定樣品之黏著劑層側相對於SUS430之黏著力,藉由依照JIS Z 0237:2000之方法(貼合條件:2 kg輥1個往返,拉伸速度:300 mm/min,剝離角度180°)進行測定。 (12)變形之面內均一性 以上述(8)之方式對氣體產生層照射UV雷射光。 利用顯微鏡對隨機選擇之2 mm×2 mm範圍之變形部進行觀察,於凸部之90個%以上為相同尺寸之情形時設為良(表中,〇),於凸部之80個%以上且未達90個%為相同尺寸之情形時設為可(表中,△),於凸部之未達80個%為相同尺寸之情形時設為差(表中,×)。所謂相同尺寸係指位移X之差在±20%以內。 (13)變形之位置選擇性 以上述(8)之方式對氣體產生層照射UV雷射光。 將僅雷射光照射部單獨變形之情形設為合格(〇),將於雷射照射部周邊亦有複數處變形之情形設為不合格(×)。 (14)彈性模數 使用奈米壓痕儀(Hysitron Inc公司製造之Triboindenter TI-950),藉由在特定溫度(25℃)之單一壓入法,於壓入速度約500 nm/sec、拔出速度約500 nm/sec、壓入深度約1500 nm之測定條件下測定彈性模數。 (1) Transmittance In the case of an adhesive sheet with an intermediate layer, set the adhesive sheet on a spectrophotometer (trade name: "UV-VIS Ultraviolet-Visible Spectrophotometer SolidSpec 3700", manufactured by Shimadzu Corporation) to let the incident light Vertically incident on the gas barrier layer side of the sample, and measure the transmittance in the wavelength range of 300 nm to 800 nm. The transmittance at the wavelength of 360 nm and 500 nm of the selected transmission spectrum. In the case of an adhesive sheet consisting only of an adhesive layer, the measurement is performed by placing the release liner on one side in a spectrophotometer, and then measuring the transmission spectrum of the release liner alone. Subtraction operation is performed to obtain the transmission spectrum of the adhesive layer alone. The transmittance at the wavelength of 360 nm and 500 nm of the selected transmission spectrum. (2) Maximum peak gas generation temperature. Approximately 0.5 mg of the adhesive sheet sample was placed in a furnace-type pyrolyzer, and a mass chromatogram was obtained by performing mass analysis of the components volatilized by heating using EGA-MS. A heating furnace type pyrolyzer (manufactured by Frontier Laboratories, trade name "PY2020iD") was used to increase the temperature from 40°C to 500°C at a temperature rise rate of 10°C/min, and GC/MS (Gas chromatography/mass spectrometry, gas chromatography mass spectrometry) was used. ) analysis device (manufactured by JEOL Corporation, trade name "JMS-T100GCV"), calculates the maximum gas generation peak temperature based on the mass chromatogram in the mass range m/z=10 to 800. (3) Vaporization start temperature: The adhesive sheet is heated in the same manner as in (2) above, and the rising temperature of gas generation calculated based on EGA analysis is used as the vaporization start temperature. The gas production rising temperature is defined as the temperature that reaches half the maximum gas production peak value of the EGA/MS chromatogram obtained by EGA analysis. (4) Generated gas species: The adhesive sheet sample was placed in an automatic sample combustion device (manufactured by Mitsubishi Chemical Analytical Technology Co., Ltd., trade name "AQF-2100H"), and the gas generated by heating at 400°C for 30 minutes was captured. By analyzing the capture liquid using ion chromatography, the gas species produced are identified. (5) Use a differential thermal analysis device (manufactured by TA Instruments, trade name "Discovery TGA") at the 5% weight loss temperature, set the flow rate to 25 ml/min under a heating temperature of 10°C/min and an N2 atmosphere. Determine the temperature at which the weight of the adhesive sheet decreases by 5%. (6) At the 10% weight loss temperature, use a differential thermal analysis device (manufactured by TA Instruments, trade name "Discovery TGA"), set the flow rate to 25 ml/min under a heating temperature of 10°C/min and an N2 atmosphere. Determine the temperature at which the weight of the adhesive sheet decreases by 10%. The 10% weight loss temperature was measured for each of the adhesive sheet and gas generating layer (UV absorber). (7) Water Vapor Transmission Rate A measurement sample was prepared by attaching a sample so as to cover the opening of an Al jig having an opening of 10 mm × 10 mm, and set the measurement sample in a water vapor transmission measuring device (MOCON (manufactured by the company, trade name "PERMATRAN-W3/34G") between the first chamber and the second chamber, the MOCON measurement method was used to evaluate. The temperature and humidity conditions are set to 30°C/90% RH, the gas (water vapor) flow rate is set to 10.0±0.5 cc/min, and the measurement time is set to 20 hours. The water vapor transmission rate was measured separately for the adhesive sheet, adhesive layer, and intermediate layer. (8) The surface shape changes when the gas generating layer side of the adhesive sheet (the side opposite to the adhesive layer) is bonded to a glass plate (manufactured by Matsunami Glass Co., Ltd., large glass slide S9112 (standard large white edge No. 2)) and obtain the measurement sample. From the glass plate side of the sample, use a wavelength of 355 nm and a beam diameter of about 20 μm. The UV laser light is used for pulse scanning with a power of 0.80 mW and a frequency of 40 kHz to generate gas from the gas generation layer. The surface of the adhesive layer corresponding to any point scanned by the pulse (the surface of the gas generation layer in Example 1 and Comparative Example 1) was observed using a condensation focusing laser microscope 24 hours after the end of laser irradiation. Measure the vertical displacement Y and horizontal displacement X (diameter; full amplitude at half maximum). When the displacement Y is 8 μm or more, the peelability is significantly excellent (in the table, ◎); when the displacement Y is 0.6 μm or more and less than 8 μm, the peelability is good (in the table, ○); when the displacement When Y is less than 0.6 μm, the releasability is insufficient (× in the table). (9) Haze value In the case of an adhesive sheet with an intermediate layer, peel off the release liner and set it in a haze meter, and measure the haze value by making incident light vertically incident on the sample. In the case of an adhesive sheet consisting only of an adhesive layer, the measurement is performed by placing the release liner on one side in a haze meter, and then measuring the haze value of the release liner alone. The haze value of the adhesive layer alone is obtained by subtraction. When the haze value is 20% or less, the visibility of the adherend is evaluated as: Good (in the table, 0). When the haze value is 20% or more and less than 50%, the visibility of the adherend is evaluated as: Good (in the table, 0). : Yes (in the table, △). When the haze value is above 50%, the adhered visibility is evaluated as: poor (in the table, ×). (10) Adhesion (gas generating layer side) PET#25 was bonded to the adhesive layer side of the adhesive sheet to obtain a measurement sample. The adhesion of the gas generating layer side of the sample to SUS430 was measured according to the method of JIS Z 0237:2000 (Laminating conditions: 2 kg roller 1 round trip, stretching speed: 300 mm/min, peeling angle 180° ) is measured. (11) Adhesion (adhesive layer) PET#25 was bonded to the gas generating layer side of the adhesive sheet to obtain a measurement sample. The adhesion of the adhesive layer side of the sample to SUS430 was measured according to the method of JIS Z 0237:2000 (laminated conditions: 2 kg roller 1 round trip, stretching speed: 300 mm/min, peeling angle 180° ) is measured. (12) In-plane uniformity of deformation The gas generation layer is irradiated with UV laser light in the manner of (8) above. Use a microscope to observe the deformed parts in a randomly selected 2 mm × 2 mm range. When more than 90% of the convex parts are of the same size, it is regarded as good (in the table, 0). When more than 80% of the convex parts are of the same size, it is regarded as good (0). If less than 90% of the convex parts are of the same size, it is set as acceptable (in the table, △), and when less than 80% of the convex parts are of the same size, it is set as poor (in the table, ×). The so-called same size means that the difference in displacement X is within ±20%. (13) Position selectivity of deformation The gas generation layer is irradiated with UV laser light in the manner described in (8) above. The case where only the laser irradiated part is deformed alone is rated as pass (0), and the case where there are also multiple deformations around the laser irradiated part is rated as failed (×). (14) Elastic modulus using a nanoindentation instrument (Triboindenter TI-950 manufactured by Hysitron Inc), through a single indentation method at a specific temperature (25°C), at an indentation speed of about 500 nm/sec, and pulling out The elastic modulus is measured under the conditions of an exit speed of approximately 500 nm/sec and an intrusion depth of approximately 1500 nm.

[製造例1]氣體產生層形成用組合物a之製備 向甲苯中添加丙烯酸2-乙基己酯30重量份、丙烯酸乙酯70重量份、丙烯酸2-羥乙酯4重量份、甲基丙烯酸甲酯5重量份、及作為聚合起始劑之過氧化苯甲醯0.2重量份後,加熱至70℃而獲得丙烯酸系共聚物(聚合物A)之甲苯溶液。 將聚合物A之甲苯溶液(聚合物A:100重量份)、異氰酸酯系交聯劑(Nippon Polyurethane公司製造,商品名「Coronate L」)1.5重量份、紫外線吸收劑(BASF公司製造,商品名「Tinuvin 477」,結構:[化1])20重量份混合而製備氣體產生層形成用組合物a。將氣體產生層形成用組合物a之組成示於表1。 [Production Example 1] Preparation of composition a for gas generation layer formation Add 30 parts by weight of 2-ethylhexyl acrylate, 70 parts by weight of ethyl acrylate, 4 parts by weight of 2-hydroxyethyl acrylate, 5 parts by weight of methyl methacrylate, and peroxide as a polymerization initiator to toluene. After adding 0.2 parts by weight of benzyl, the mixture was heated to 70° C. to obtain a toluene solution of an acrylic copolymer (polymer A). A toluene solution of polymer A (Polymer A: 100 parts by weight), 1.5 parts by weight of isocyanate cross-linking agent (manufactured by Nippon Polyurethane Co., Ltd., trade name "Coronate L"), and ultraviolet absorber (manufactured by BASF Co., Ltd., trade name "Coronate L") Tinuvin 477", structure: [Chemical 1]) 20 parts by weight were mixed to prepare a gas generating layer forming composition a. Table 1 shows the composition of the gas generating layer forming composition a.

[化1] [Chemical 1]

[製造例2]氣體產生層形成用組合物b之製備 將UV吸收劑之調配量設為10重量份,除此以外,以與製造例1同樣之方式製備氣體產生層形成用組合物b。將氣體產生層形成用組合物b之組成示於表1。 [Production Example 2] Preparation of gas generation layer forming composition b The composition b for gas generation layer formation was prepared in the same manner as in Production Example 1 except that the compounding amount of the UV absorber was 10 parts by weight. Table 1 shows the composition of the gas generating layer forming composition b.

[製造例3]氣體產生層形成用組合物c之製備 作為UV吸收劑,使用2,4-雙(2-羥基-4-丁氧基苯基)-6-(2,4-二丁氧基苯基)-1,3,5-三𠯤(商品名「TINUVIN 460」,BASF公司製造,結構:[化2])10重量份,除此以外,以與製造例1同樣之方式製備氣體產生層形成用組合物c。將氣體產生層形成用組合物c之組成示於表1。 [Production Example 3] Preparation of composition c for gas generation layer formation As a UV absorber, 2,4-bis(2-hydroxy-4-butoxyphenyl)-6-(2,4-dibutoxyphenyl)-1,3,5-trifluoroethylene (commercial product Name "TINUVIN 460", manufactured by BASF Co., Ltd., structure: [Chemical 2]) 10 parts by weight, except that the gas generating layer forming composition c was prepared in the same manner as in Production Example 1. Table 1 shows the composition of the gas generating layer forming composition c.

[化2] [Chemicalization 2]

[製造例4]氣體產生層形成用組合物d之製備 作為UV吸收劑,使用2-(4,6-雙(2,4-二甲基苯基)-1,3,5-三𠯤-2-基)-5-羥基苯與[(C10-C16(主要為C12-C13)烷氧基)甲基]環氧乙烷之反應產物(商品名「TINUVIN 400」,BASF公司製造,結構:[化3])20重量份,除此以外,以與製造例1同樣之方式製備氣體產生層形成用組合物d。將氣體產生層形成用組合物d之組成示於表1。 [Production Example 4] Preparation of gas generation layer forming composition d As a UV absorber, 2-(4,6-bis(2,4-dimethylphenyl)-1,3,5-tri𠯤-2-yl)-5-hydroxybenzene and [(C10-C16 (Mainly C12-C13) alkoxy) methyl] ethylene oxide reaction product (trade name "TINUVIN 400", manufactured by BASF, structure: [Chemical 3]) 20 parts by weight, in addition to The composition d for forming a gas generating layer was prepared in the same manner as in Production Example 1. Table 1 shows the composition of the gas generating layer forming composition d.

[化3] [Chemical 3]

[製造例5]氣體產生層形成用組合物e之製備 向乙酸乙酯中添加丙烯酸2-乙基己酯30重量份、丙烯酸甲酯70重量份、丙烯酸10重量份、及作為聚合起始劑之過氧化苯甲醯0.2重量份後,加熱至70℃而獲得丙烯酸系共聚物(聚合物B)之乙酸乙酯溶液。 將聚合物B之乙酸乙酯溶液(聚合物B:100重量份)、異氰酸酯系交聯劑(Nippon Polyurethane公司製造,商品名「Coronate L」)1重量份、及紫外線吸收劑(BASF公司製造,商品名「Tinuvin477」)20重量份混合而製備氣體產生層形成用組合物e。將氣體產生層形成用組合物e之組成示於表1。 [Production Example 5] Preparation of gas generation layer forming composition e After adding 30 parts by weight of 2-ethylhexyl acrylate, 70 parts by weight of methyl acrylate, 10 parts by weight of acrylic acid, and 0.2 parts by weight of benzoyl peroxide as a polymerization initiator to ethyl acetate, heat to 70°C. An ethyl acetate solution of an acrylic copolymer (polymer B) was obtained. An ethyl acetate solution of polymer B (polymer B: 100 parts by weight), 1 part by weight of an isocyanate cross-linking agent (manufactured by Nippon Polyurethane, trade name "Coronate L"), and a UV absorber (manufactured by BASF, Trade name "Tinuvin 477") 20 parts by weight were mixed to prepare a gas generating layer forming composition e. Table 1 shows the composition of the gas generating layer forming composition e.

[製造例6]氣體產生層形成用組合物f之製備 向乙酸乙酯中添加丙烯酸2-乙基己酯95重量份、丙烯酸5重量份、及作為聚合起始劑之過氧化苯甲醯0.15重量份後,加熱至70℃而獲得丙烯酸系共聚物(聚合物C)之乙酸乙酯溶液。 將聚合物C之乙酸乙酯溶液(聚合物C:100重量份)、異氰酸酯系交聯劑(Nippon Polyurethane公司製造,商品名「Coronate L」)1重量份、及紫外線吸收劑(BASF公司製造,商品名「Tinuvin477」)20重量份混合而製備氣體產生層形成用組合物f。將氣體產生層形成用組合物f之組成示於表1。 [Manufacturing Example 6] Preparation of gas generating layer forming composition f After adding 95 parts by weight of 2-ethylhexyl acrylate, 5 parts by weight of acrylic acid, and 0.15 parts by weight of benzoyl peroxide as a polymerization initiator to ethyl acetate, the acrylic copolymer ( Solution of polymer C) in ethyl acetate. An ethyl acetate solution of polymer C (polymer C: 100 parts by weight), 1 part by weight of an isocyanate cross-linking agent (manufactured by Nippon Polyurethane, trade name "Coronate L"), and an ultraviolet absorber (manufactured by BASF, Trade name "Tinuvin 477") 20 parts by weight were mixed to prepare a gas generating layer forming composition f. Table 1 shows the composition of the gas generating layer forming composition f.

[製造例7]氣體產生層形成用組合物g之製備 向乙酸乙酯中添加丙烯酸2-乙基己酯95重量份、丙烯酸5重量份、及作為聚合起始劑之過氧化苯甲醯0.15重量份後,加熱至70℃而獲得丙烯酸系共聚物(聚合物C)之乙酸乙酯溶液。 將聚合物C之乙酸乙酯溶液(聚合物C:100重量份)、環氧系交聯劑(三菱瓦斯化學公司製造,商品名「TETRAD-C」)0.1重量份、及紫外線吸收劑(BASF公司製造,商品名「Tinuvin 477」)20重量份混合而製備氣體產生層形成用組合物g。將氣體產生層形成用組合物g之組成示於表1。 [Production Example 7] Preparation of composition g for forming gas generating layer After adding 95 parts by weight of 2-ethylhexyl acrylate, 5 parts by weight of acrylic acid, and 0.15 parts by weight of benzoyl peroxide as a polymerization initiator to ethyl acetate, the acrylic copolymer ( Solution of polymer C) in ethyl acetate. An ethyl acetate solution of polymer C (polymer C: 100 parts by weight), 0.1 part by weight of epoxy cross-linking agent (manufactured by Mitsubishi Gas Chemical Co., Ltd., trade name "TETRAD-C"), and ultraviolet absorber (BASF Co., Ltd., trade name "Tinuvin 477") 20 parts by weight were mixed to prepare a gas generating layer forming composition g. Table 1 shows the composition of the gas generating layer forming composition g.

[製造例8]氣體產生層形成用組合物h之製備 將順丁烯二酸改性苯乙烯-乙烯-丁烯-苯乙烯嵌段共聚物(SEBS:苯乙烯部位/乙烯-丁烯部位(重量比)=30/70,酸值:10(mg-CH 3ONa/g),旭化成化學公司製造,商品名「Tuftec M1913」)100重量份、環氧系交聯劑(三菱瓦斯化學公司製造,商品名「TETRAD-C」)3重量份、紫外線吸收劑(BASF公司製造,商品名「Tinuvin 477」)20重量份、及作為溶劑之甲苯混合而製備氣體產生層形成用組合物h。將氣體產生層形成用組合物h之組成示於表1。 [Manufacturing Example 8] Preparation of gas generating layer forming composition h. Maleic acid-modified styrene-ethylene-butylene-styrene block copolymer (SEBS: styrene part/ethylene-butylene part ( Weight ratio) = 30/70, acid value: 10 (mg-CH 3 ONa/g), manufactured by Asahi Kasei Chemical Co., Ltd., trade name "Tuftec M1913") 100 parts by weight, epoxy cross-linking agent (manufactured by Mitsubishi Gas Chemical Co., Ltd. , trade name "TETRAD-C") 3 parts by weight, ultraviolet absorber (manufactured by BASF, trade name "Tinuvin 477") 20 parts by weight, and toluene as a solvent were mixed to prepare a gas generating layer forming composition h. Table 1 shows the composition of the gas generating layer forming composition h.

[製造例8']氣體產生層形成用組合物i之製備 向甲苯中添加丙烯酸丁酯100重量份、丙烯酸5重量份、及作為聚合起始劑之過氧化苯甲醯0.2重量份後,加熱至70℃而獲得丙烯酸系共聚物(聚合物D)之甲苯溶液。 將聚合物D之甲苯溶液(聚合物D:100重量份)、環氧系交聯劑(三菱瓦斯化學公司製造,商品名「TETRAD-C」)0.1重量份、及紫外線吸收劑(BASF公司製造,商品名「Tinuvin 400」)20重量份混合而製備氣體產生層形成用組合物i。將氣體產生層形成用組合物i之組成示於表1。 [Production Example 8'] Preparation of composition i for gas generation layer formation After adding 100 parts by weight of butyl acrylate, 5 parts by weight of acrylic acid, and 0.2 parts by weight of benzoyl peroxide as a polymerization initiator to toluene, the toluene of an acrylic copolymer (polymer D) was obtained by heating to 70°C. solution. A toluene solution of polymer D (polymer D: 100 parts by weight), 0.1 part by weight of epoxy cross-linking agent (manufactured by Mitsubishi Gas Chemical Co., Ltd., trade name "TETRAD-C"), and ultraviolet absorber (manufactured by BASF Corporation) , trade name "Tinuvin 400") 20 parts by weight were mixed to prepare a gas generating layer forming composition i. Table 1 shows the composition of the gas generating layer forming composition i.

[製造例8'']氣體產生層形成用組合物j之製備 以與製造例5同樣之方式獲得丙烯酸系共聚物(聚合物B)之乙酸乙酯溶液。 將聚合物B之乙酸乙酯溶液(聚合物B:100重量份)、環氧系交聯劑(三菱瓦斯化學公司製造,商品名「TETRAD-C」)0.1重量份、及紫外線吸收劑(BASF公司製造,商品名「Tinuvin400」)20重量份混合而製備氣體產生層形成用組合物j。將氣體產生層形成用組合物j之組成示於表1。 [Production Example 8''] Preparation of composition j for gas generation layer formation In the same manner as in Production Example 5, an ethyl acetate solution of an acrylic copolymer (polymer B) was obtained. An ethyl acetate solution of polymer B (polymer B: 100 parts by weight), 0.1 part by weight of epoxy cross-linking agent (manufactured by Mitsubishi Gas Chemical Co., Ltd., trade name "TETRAD-C"), and ultraviolet absorber (BASF Company's product, trade name "Tinuvin 400") 20 parts by weight were mixed to prepare a gas generating layer forming composition j. Table 1 shows the composition of the gas generating layer forming composition j.

[製造例8''']氣體產生層形成用組合物k之製備 向甲苯中添加丙烯酸丁酯50重量份、丙烯酸乙酯50重量份、丙烯酸5重量份、丙烯酸2-羥乙酯0.1重量份、三羥甲基丙烷三丙烯酸酯0.3重量份、及作為聚合起始劑之過氧化苯甲醯0.1重量份後,加熱至70℃而獲得丙烯酸系共聚物(聚合物E)甲苯溶液。 將聚合物E之甲苯溶液(聚合物E:100重量份)、環氧系交聯劑(三菱瓦斯化學公司製造,商品名「TETRAD-C」)0.1重量份、及紫外線吸收劑(BASF公司製造,商品名「Tinuvin 400」)20重量份混合而製備氣體產生層形成用組合物k。將氣體產生層形成用組合物k之組成示於表1。 [Manufacturing Example 8'''] Preparation of gas generating layer forming composition k Add 50 parts by weight of butyl acrylate, 50 parts by weight of ethyl acrylate, 5 parts by weight of acrylic acid, 0.1 parts by weight of 2-hydroxyethyl acrylate, and 0.3 parts by weight of trimethylolpropane triacrylate as a polymerization starter to toluene. After adding 0.1 part by weight of benzoyl peroxide as an agent, the mixture was heated to 70° C. to obtain a toluene solution of an acrylic copolymer (Polymer E). A toluene solution of polymer E (polymer E: 100 parts by weight), 0.1 part by weight of epoxy cross-linking agent (manufactured by Mitsubishi Gas Chemical Co., Ltd., trade name "TETRAD-C"), and ultraviolet absorber (manufactured by BASF Corporation) , trade name "Tinuvin 400") 20 parts by weight were mixed to prepare a gas generating layer forming composition k. Table 1 shows the composition of the gas generating layer forming composition k.

[製造例9]氣體產生層形成用組合物I之製備 作為UV吸收劑,使用2-[5-氯-2H-苯并三唑-2-基]-4-甲基-6-(第三丁基)苯酚(商品名「TINUVIN 326」,BASF公司製造)20重量份,除此以外,以與製造例1同樣之方式製備氣體產生層形成用組合物I。將氣體產生層形成用組合物I之組成示於表1。 [Production Example 9] Preparation of gas generation layer forming composition I As a UV absorber, 2-[5-chloro-2H-benzotriazol-2-yl]-4-methyl-6-(tert-butyl)phenol (trade name "TINUVIN 326", manufactured by BASF Corporation) was used ) 20 parts by weight, the gas generating layer forming composition I was prepared in the same manner as in Production Example 1. Table 1 shows the composition of the gas generating layer forming composition I.

[製造例10]含熱膨脹性微小球之組合物II之製備 不調配紫外線吸收劑,將交聯劑之調配量設為1.4重量份,且調配熱膨脹性微小球(松本油脂製藥公司製造,商品名「Matsumoto Microsphere F-50D」)30重量份、及萜酚系黏著賦予樹脂(住友電木公司製造,商品名「SUMILITERESIN PR51732」)10重量份,除此以外,以與製造例5同樣之方式製備含熱膨脹性微小球之組合物II。 [Production Example 10] Preparation of composition II containing thermally expandable microspheres The ultraviolet absorber was not blended, and the blending amount of the cross-linking agent was set to 1.4 parts by weight, and 30 parts by weight of heat-expandable microspheres (manufactured by Matsumoto Oils & Fats Pharmaceutical Co., Ltd., trade name "Matsumoto Microsphere F-50D") and terpene phenol series were blended. A composition II containing thermally expandable microspheres was prepared in the same manner as in Production Example 5, except that 10 parts by weight of an adhesive imparting resin (manufactured by Sumitomo Bakelite Co., Ltd., trade name "SUMILITERESIN PR51732") was used.

[製造例11]含熱膨脹性微小球之組合物III之製備 代替萜酚系黏著賦予樹脂(住友電木公司製造,商品名「SUMILITERESIN PR51732」)10重量份,使用萜酚系黏著賦予樹脂(Yasuhara Chemical公司製造,商品名「YS POLYSTER T160」)20重量份,除此以外,以與製造例5同樣之方式製備含熱膨脹性微小球之組合物III。 [Production Example 11] Preparation of composition III containing thermally expandable microspheres Instead of 10 parts by weight of terpenol-based tackifier resin (manufactured by Sumitomo Bakelite Co., Ltd., trade name "SUMILITERESIN PR51732"), 20 parts by weight of terpenol-based tackifier resin (manufactured by Yasuhara Chemical Co., Ltd., trade name "YS POLYSTER T160") was used. Except for this, a thermally expandable microsphere-containing composition III was prepared in the same manner as in Production Example 5.

[表1] 氣體產生層形成用組合物 製造例1 氣體產生層形成用組合物a 製造例2 氣體產生層形成用組合物b 製造例3 氣體產生層形成用組合物c 製造例4 氣體產生層形成用組合物d 製造例5 氣體產生層形成用組合物e    基礎聚合物 材質 丙烯酸系 丙烯酸系 丙烯酸系 丙烯酸系 丙烯酸系 聚合物種 聚合物A 聚合物A 聚合物A 聚合物A 聚合物B 交聯劑 交聯劑種 異氰酸酯系 異氰酸酯系 異氰酸酯系 異氰酸酯系 異氰酸酯系 交聯劑份數 Coronate/L(1.5) Coronate/L(1.5) Coronate/L(1.5) Coronate/L(1.5) Coronate/L(1.0) UV吸收劑 UV吸收劑種 (骨架) 羥基苯基三𠯤系 羥基苯基三𠯤系 羥基苯基三𠯤系 羥基苯基三𠯤系 羥基苯基三𠯤系 品名、份數 Tinuvin477(20) Tinuvin477(10) Tinuvin460(10) Tinuvin400(20) Tinuvin477(20) UV吸收劑之分子量 958.2 958.2 629.8 647.8 958.2 TGA10%重量減少溫度[℃] 352.8 352.8 401.5 391.7 352.8 UV吸收劑之最大吸收波長 356 nm 356 nm 349 nm 336 nm 356 nm 備註                   實施例1~5 實施例6 實施例7 實施例8 實施例9       氣體產生層形成用組合物 製造例6 氣體產生層形成用組合物f 製造例7 氣體產生層形成用組合物g 製造例8 氣體產生層形成用組合物h 製造例8' 氣體產生層形成用組合物i 製造例8" 氣體產生層形成用組合物j 製造例8''' 氣體產生層形成用組合物k 基礎聚合物 材質 丙烯酸系 丙烯酸系 SEBS系 丙烯酸系 丙烯酸系 丙烯酸系 聚合物種 聚合物C 聚合物C 聚合物D 聚合物B 聚合物E 交聯劑 交聯劑種 異氰酸酯系 環氧系 環氧系 環氧系 環氧系 環氧系 交聯劑份數 Coronate/L(1.0) Tetrad C(0.1) Tetrad C(3) Tetrad C(0.1) Tetrad C(0.1) Tetrad C(0.1) UV吸收劑 UV吸收劑種 (骨架) 羥基苯基三𠯤系 羥基苯基三𠯤系 羥基苯基三𠯤系 羥基苯基三𠯤系 羥基苯基三𠯤系 羥基苯基三𠯤系 品名、份數 Tinuvin477(20) Tinuvin477(20) Tinuvin477(20) Tinuvin400(20) Tinuvin400(20) Tinuvin400(20) UV吸收劑之分子量 958.2 958.2 958.2 647.8 647.8 647.8 TGA10%重量減少溫度[℃] 352.8 352.8 352.8 391.7 391.7 391.7 UV吸收劑之最大吸收波長 356 nm 356 nm 356 nm 336 nm 336 nm 336 nm 備註                      實施例10 實施例11 實施例12 實施例13 實施例14 實施例15       氣體產生層形成用組合物 製造例9 氣體產生層形成用組合物I 製造例10 含熱膨脹性微小球之組合物II 製造例11 含熱膨脹性微小球之組合物III    基礎聚合物 材質 丙烯酸系 丙烯酸系 丙烯酸系 聚合物種 聚合物A 聚合物A 聚合物A 交聯劑 交聯劑種 異氰酸酯系 異氰酸酯系 異氰酸酯系 交聯劑份數 Coronate/L(1.5) Coronate/L(1.4) Coronate/L(1.4) UV吸收劑 UV吸收劑種 (骨架) 苯并三唑系 - - 品名、份數 Tinuvin326(20) - - UV吸收劑之分子量 315.8 - - TGA10%重量減少溫度[℃] 234.5 - - UV吸收劑之最大吸收波長 355 nm - - 備註    含熱膨脹性微小球 含熱膨脹性微小球    比較例1、2 比較例3 比較例4 [Table 1] Composition for forming gas generating layer Production Example 1 Composition a for gas generation layer formation Production Example 2 Gas Generating Layer Forming Composition b Production Example 3 Composition c for gas generation layer formation Production Example 4 Composition d for gas generation layer formation Production Example 5 Gas Generating Layer Forming Composition e base polymer Material Acrylic Acrylic Acrylic Acrylic Acrylic Polymer species Polymer A Polymer A Polymer A Polymer A Polymer B Cross-linking agent Cross-linking agent type Isocyanate series Isocyanate series Isocyanate series Isocyanate series Isocyanate series Number of cross-linking agents Coronate/L(1.5) Coronate/L(1.5) Coronate/L(1.5) Coronate/L(1.5) Coronate/L(1.0) UV absorber UV absorber type (skeleton) Hydroxyphenyl triseries Hydroxyphenyl triseries Hydroxyphenyl triseries Hydroxyphenyl triseries Hydroxyphenyl triseries Product name, number of copies Tinuvin477(20) Tinuvin477(10) Tinuvin460(10) Tinuvin400(20) Tinuvin477(20) Molecular weight of UV absorber 958.2 958.2 629.8 647.8 958.2 TGA10% weight reduction temperature [℃] 352.8 352.8 401.5 391.7 352.8 Maximum absorption wavelength of UV absorber 356nm 356nm 349 nm 336nm 356nm Remarks Examples 1 to 5 Example 6 Example 7 Example 8 Example 9 Composition for forming gas generating layer Production Example 6 Composition f for gas generation layer formation Production Example 7 Composition g for forming a gas generating layer Production Example 8 Composition h for gas generation layer formation Production Example 8' Gas Generating Layer Forming Composition i Production Example 8" Composition j for gas generation layer formation Production Example 8''' Composition k for forming a gas generating layer base polymer Material Acrylic Acrylic SEBS Department Acrylic Acrylic Acrylic Polymer species Polymer C Polymer C Polymer D Polymer B Polymer E Cross-linking agent Cross-linking agent type Isocyanate series Epoxy system Epoxy system Epoxy system Epoxy system Epoxy system Number of cross-linking agents Coronate/L(1.0) Tetrad C(0.1) Tetrad C(3) Tetrad C(0.1) Tetrad C(0.1) Tetrad C(0.1) UV absorber UV absorber type (skeleton) Hydroxyphenyl triseries Hydroxyphenyl triseries Hydroxyphenyl triseries Hydroxyphenyl triseries Hydroxyphenyl triseries Hydroxyphenyl triseries Product name, number of copies Tinuvin477(20) Tinuvin477(20) Tinuvin477(20) Tinuvin400(20) Tinuvin400(20) Tinuvin400(20) Molecular weight of UV absorber 958.2 958.2 958.2 647.8 647.8 647.8 TGA10% weight reduction temperature [℃] 352.8 352.8 352.8 391.7 391.7 391.7 Maximum absorption wavelength of UV absorber 356nm 356nm 356nm 336nm 336nm 336nm Remarks Example 10 Example 11 Example 12 Example 13 Example 14 Example 15 Composition for forming gas generating layer Production Example 9 Composition I for gas generation layer formation Production Example 10 Composition II containing thermally expandable microspheres Production Example 11 Composition III containing thermally expandable microspheres base polymer Material Acrylic Acrylic Acrylic Polymer species Polymer A Polymer A Polymer A Cross-linking agent Cross-linking agent type Isocyanate series Isocyanate series Isocyanate series Number of cross-linking agents Coronate/L(1.5) Coronate/L(1.4) Coronate/L(1.4) UV absorber UV absorber type (skeleton) Benzotriazole series - - Product name, number of copies Tinuvin326(20) - - Molecular weight of UV absorber 315.8 - - TGA10% weight reduction temperature [℃] 234.5 - - Maximum absorption wavelength of UV absorber 355nm - - Remarks Contains thermally expandable microspheres Contains thermally expandable microspheres Comparative Examples 1 and 2 Comparative example 3 Comparative example 4

[製造例12]黏著劑a之製備 以與製造例1同樣之方式獲得丙烯酸系共聚物(聚合物A)之甲苯溶液。 將聚合物A之甲苯溶液(聚合物A:100重量份)、異氰酸酯系交聯劑(Nippon Polyurethane公司製造,商品名「Coronate L」)3重量份、及界面活性劑(花王公司製造,商品名「EXCEPARL IPP」)5重量份混合而製備黏著劑a。將黏著劑a之組成示於表2。 [Production Example 12] Preparation of adhesive a In the same manner as in Production Example 1, a toluene solution of an acrylic copolymer (polymer A) was obtained. A toluene solution of polymer A (polymer A: 100 parts by weight), 3 parts by weight of isocyanate cross-linking agent (manufactured by Nippon Polyurethane Co., Ltd., trade name "Coronate L"), and surfactant (manufactured by Kao Co., Ltd., trade name "EXCEPARL IPP") 5 parts by weight were mixed to prepare adhesive a. The composition of adhesive a is shown in Table 2.

[製造例12']黏著劑b之製備 以與製造例6同樣之方式獲得丙烯酸系共聚物(聚合物C)之甲苯溶液。 將聚合物C之甲苯溶液(聚合物C:100重量份)、異氰酸酯系交聯劑(Nippon Polyurethane公司製造,商品名「Coronate L」)3重量份、及環氧系交聯劑(三菱瓦斯化學公司製造,商品名「TETRAD-C」)1重量份混合而製備黏著劑b。將黏著劑b之組成示於表2。 [Production Example 12'] Preparation of adhesive b In the same manner as in Production Example 6, a toluene solution of an acrylic copolymer (polymer C) was obtained. A toluene solution of polymer C (polymer C: 100 parts by weight), 3 parts by weight of an isocyanate cross-linking agent (manufactured by Nippon Polyurethane Co., Ltd., trade name "Coronate L"), and an epoxy cross-linking agent (Mitsubishi Gas Chemical (manufactured by the company, trade name "TETRAD-C")) 1 part by weight was mixed to prepare adhesive b. The composition of adhesive b is shown in Table 2.

[製造例13]黏著劑I之製備 將交聯劑之調配量設為1重量份,且不含有界面活性劑,除此以外,以與製造例12同樣之方式製備黏著劑I。將黏著劑I之組成示於表2。 [Production Example 13] Preparation of Adhesive I Adhesive I was prepared in the same manner as in Production Example 12 except that the compounding amount of the cross-linking agent was 1 part by weight and no surfactant was contained. The composition of adhesive I is shown in Table 2.

[表2] 黏著劑組合物 製造例12 黏著劑a 製造例12' 黏著劑b 製造例13 黏著劑I 基礎聚合物 材質 丙烯酸系 丙烯酸系 丙烯酸系 聚合物種 聚合物A 聚合物C 聚合物A 交聯劑 交聯劑種 異氰酸酯系 異氰酸酯系 異氰酸酯系 品名、份數 Coronate/L(3) Coronate/L(3) Coronate/L(1) 交聯劑種 - 環氧系 - 品名、份數 - Tetrad C(1) - 界面活性劑 界面活性劑種 脂肪酸酯系 - - 品名、份數 EXCEPARL IPP(5) - -    實施例2~10 比較例2 實施例13、14、15 比較例3~4 [Table 2] Adhesive composition Production Example 12 Adhesive a Production Example 12' Adhesive b Production Example 13 Adhesive I base polymer Material Acrylic Acrylic Acrylic Polymer species Polymer A Polymer C Polymer A Cross-linking agent Cross-linking agent type Isocyanate series Isocyanate series Isocyanate series Product name, number of copies Coronate/L(3) Coronate/L(3) Coronate/L(1) Cross-linking agent type - Epoxy system - Product name, number of copies - Tetrad C(1) - surfactant Surfactant species Fatty acid ester series - - Product name, number of copies EXCEPARL IPP(5) - - Examples 2 to 10 Comparative Example 2 Examples 13, 14, 15 Comparative examples 3 to 4

[製造例14]中間層形成用組合物a之製備 以與製造例5同樣之方式獲得丙烯酸系共聚物(聚合物B)之乙酸乙酯溶液。 將聚合物B之乙酸乙酯溶液(聚合物B:100重量份)、環氧系交聯劑(三菱瓦斯化學公司製造,商品名「Tetrad C」)1重量份、UV低聚物(三菱化學公司製造,商品名「紫光UV-1700B」)50重量份、及光聚合起始劑(BASF公司製造,商品名「Omnirad 127」)3重量份混合而製備中間層形成用組合物a。將中間層形成用組合物a之組成示於表3。 [Production Example 14] Preparation of intermediate layer forming composition a In the same manner as in Production Example 5, an ethyl acetate solution of an acrylic copolymer (polymer B) was obtained. An ethyl acetate solution of polymer B (polymer B: 100 parts by weight), 1 part by weight of epoxy cross-linking agent (manufactured by Mitsubishi Gas Chemical Co., Ltd., trade name "Tetrad C"), UV oligomer (Mitsubishi Chemical Co., Ltd. The intermediate layer forming composition a was prepared by mixing 50 parts by weight of a photopolymerization initiator (manufactured by BASF, trade name "Omnirad 127") and 3 parts by weight of a photopolymerization initiator (manufactured by BASF, trade name "Omnirad 127"). Table 3 shows the composition of the intermediate layer forming composition a.

[製造例15]中間層形成用組合物b之製備 將順丁烯二酸改性苯乙烯-乙烯-丁烯-苯乙烯嵌段共聚物(SEBS:苯乙烯部位/乙烯-丁烯部位(重量比)=30/70,酸值:10(mg-CH 3ONa/g),旭化成化學公司製造,商品名「Tuftec M1913」)100重量份、環氧系交聯劑(三菱瓦斯化學公司製造,商品名「TETRAD-C」)3重量份、脂肪酸酯系界面活性劑(花王公司製造,商品名「EXCEPARL IPP」,分子量:298.5,烷基之碳數:16)3重量份、及作為溶劑之甲苯混合而獲得中間層形成用組合物b。將中間層形成用組合物b之組成示於表3。 [Production Example 15] Preparation of intermediate layer forming composition b. Maleic acid-modified styrene-ethylene-butylene-styrene block copolymer (SEBS: styrene part/ethylene-butylene part (weight Ratio) = 30/70, acid value: 10 (mg-CH 3 ONa/g), manufactured by Asahi Kasei Chemical Company, trade name "Tuftec M1913") 100 parts by weight, epoxy cross-linking agent (manufactured by Mitsubishi Gas Chemical Company, Trade name "TETRAD-C") 3 parts by weight, fatty acid ester surfactant (manufactured by Kao Corporation, trade name "EXCEPARL IPP", molecular weight: 298.5, carbon number of alkyl group: 16) 3 parts by weight, and as a solvent and toluene were mixed to obtain an intermediate layer forming composition b. Table 3 shows the composition of the intermediate layer forming composition b.

[表3] 中間層形成用組合物 製造例14 中間層形成用組合物a 製造例15 中間層形成用組合物b 基礎聚合物 材質 丙烯酸系 SEBS系 聚合物種 聚合物B UV低聚物 UV低聚物 UV硬化型丙烯酸胺基甲酸酯 - 品名、份數 UV-1700B(50) - 交聯劑 交聯劑種 環氧系 環氧系 品名、份數 Tetrad C(1) Tetrad C(3) 光聚合起始劑 光聚合起始劑 苯烷酮系 - 品名、份數 Irg127(3) -    實施例3 實施例4 [table 3] Intermediate layer forming composition Production Example 14 Intermediate Layer Forming Composition a Production Example 15 Intermediate Layer Forming Composition b base polymer Material Acrylic SEBS Department Polymer species Polymer B UV oligomer UV oligomer UV hardening acrylic urethane - Product name, number of copies UV-1700B(50) - Cross-linking agent Cross-linking agent type Epoxy system Epoxy system Product name, number of copies Tetrad C(1) Tetrad C(3) Photopolymerization initiator Photopolymerization initiator Benzoanone series - Product name, number of copies Irg127(3) - Example 3 Example 4

[實施例1] 將製造例1中獲得之氣體產生層形成用組合物a以溶劑揮發(乾燥)後之厚度成為7 μm之方式塗佈於帶有矽酮脫模劑處理面之聚對苯二甲酸乙二酯膜(東麗公司製造,商品名「Cerapeel」厚度:38 μm),其後進行乾燥,而獲得於該聚對苯二甲酸乙二酯膜上僅包含氣體產生層之黏著片材。 將所得之黏著片材供於上述評價(1)~(13)。將結果示於表4。 [Example 1] The gas generating layer forming composition a obtained in Production Example 1 was applied to polyethylene terephthalate with a silicone release agent-treated surface so that the thickness after evaporation (drying) of the solvent became 7 μm. film (manufactured by Toray Corporation, trade name "Cerapeel", thickness: 38 μm), and then dried to obtain an adhesive sheet including only a gas generating layer on the polyethylene terephthalate film. The obtained adhesive sheet was used for the above-mentioned evaluations (1) to (13). The results are shown in Table 4.

[實施例2] 將製造例12中獲得之黏著劑a以溶劑揮發(乾燥)後之厚度成為15 μm之方式塗佈於帶有矽酮脫模劑處理面之聚對苯二甲酸乙二酯膜(厚度:75 μm),其後進行乾燥,而於該聚對苯二甲酸乙二酯膜上形成黏著劑層前驅層a。 將製造例1中獲得之氣體產生層形成用組合物a以溶劑揮發(乾燥)後之厚度成為7 μm之方式塗佈於帶有矽酮脫模劑處理面之聚對苯二甲酸乙二酯膜(東麗公司製造,商品名「Cerapeel」厚度:38 μm),其後進行乾燥,而於該聚對苯二甲酸乙二酯膜上形成氣體產生層前驅層a。 將上述黏著劑層前驅層a與上述氣體產生層前驅層a於輥間層壓而貼合,獲得夾於帶有矽酮脫模劑處理面之聚對苯二甲酸乙二酯膜之間的黏著片材(黏著劑層/氣體產生層)。 將所得之黏著片材供於上述評價(1)~(13)。將結果示於表4。 [Example 2] The adhesive a obtained in Production Example 12 was applied to a polyethylene terephthalate film with a silicone release agent-treated surface (thickness: 75 μm), and then dried to form an adhesive layer precursor layer a on the polyethylene terephthalate film. The gas generating layer forming composition a obtained in Production Example 1 was applied to polyethylene terephthalate with a silicone release agent-treated surface so that the thickness after evaporation (drying) of the solvent became 7 μm. film (manufactured by Toray Industries, trade name "Cerapeel", thickness: 38 μm), and then dried to form a gas generating layer precursor layer a on the polyethylene terephthalate film. The above-mentioned adhesive layer precursor layer a and the above-mentioned gas generation layer precursor layer a are laminated between rollers to obtain a film sandwiched between polyethylene terephthalate films with silicone release agent-treated surfaces. Adhesive sheet (adhesive layer/gas generating layer). The obtained adhesive sheet was used for the above-mentioned evaluations (1) to (13). The results are shown in Table 4.

[實施例3] 將製造例12中獲得之黏著劑a以溶劑揮發(乾燥)後之厚度成為15 μm之方式塗佈於帶有矽酮脫模劑處理面之聚對苯二甲酸乙二酯膜(厚度:75 μm),其後進行乾燥,而於該聚對苯二甲酸乙二酯膜上形成黏著劑層前驅層a。 將製造例14中獲得之中間層形成用組合物a以溶劑揮發(乾燥)後之厚度成為15 μm之方式塗佈於帶有矽酮脫模劑處理面之聚對苯二甲酸乙二酯膜(東麗公司製造,商品名「Cerapeel」厚度:38 μm),其後進行乾燥,而於該聚對苯二甲酸乙二酯膜上形成中間層前驅層a。 繼而,將上述黏著劑層前驅層a與上述中間層前驅層a於輥間層壓而貼合,自中間層前驅層側於500 mJ/cm 2之條件下進行UV照射,而獲得夾於帶有矽酮脫模劑處理面之聚對苯二甲酸乙二酯膜之間的積層體前驅層a。 將製造例1中獲得之氣體產生層形成用組合物a以溶劑揮發(乾燥)後之厚度成為7 μm之方式塗佈於帶有矽酮脫模劑處理面之聚對苯二甲酸乙二酯膜(東麗公司製造,商品名「Cerapeel」厚度:38 μm),其後進行乾燥,而於該聚對苯二甲酸乙二酯膜上形成氣體產生層前驅層a。 將上述積層體前驅層a之中間層前驅層a側之帶有矽酮脫模劑處理面之聚對苯二甲酸乙二酯膜剝離後,將積層體前驅層a之中間層前驅層a與上述氣體產生層前驅層a於輥間層壓而貼合,獲得夾於帶有矽酮脫模劑處理面之聚對苯二甲酸乙二酯膜之間的黏著片材(黏著劑層/中間層/氣體產生層)。 將所得之黏著片材供於上述評價(1)~(13)。將結果示於表4。 [Example 3] The adhesive a obtained in Production Example 12 was applied to polyethylene terephthalate with a silicone release agent-treated surface so that the thickness after evaporation (drying) of the solvent became 15 μm. film (thickness: 75 μm), and then dried to form an adhesive layer precursor layer a on the polyethylene terephthalate film. The intermediate layer forming composition a obtained in Production Example 14 was applied to a polyethylene terephthalate film with a silicone release agent-treated surface so that the thickness after evaporation (drying) of the solvent became 15 μm. (manufactured by Toray, trade name "Cerapeel", thickness: 38 μm), and then dried to form an intermediate layer precursor layer a on the polyethylene terephthalate film. Then, the above-mentioned adhesive layer precursor layer a and the above-mentioned intermediate layer precursor layer a are laminated and bonded between rollers, and UV irradiation is performed from the intermediate layer precursor layer side under the condition of 500 mJ/cm 2 to obtain the sandwiched tape Laminated body precursor layer a between polyethylene terephthalate films with silicone release agent-treated surfaces. The gas generating layer forming composition a obtained in Production Example 1 was applied to polyethylene terephthalate with a silicone release agent-treated surface so that the thickness after evaporation (drying) of the solvent became 7 μm. film (manufactured by Toray Corporation, trade name "Cerapeel", thickness: 38 μm), and then dried to form a gas generating layer precursor layer a on the polyethylene terephthalate film. After peeling off the polyethylene terephthalate film with the silicone release agent-treated surface on the side of the intermediate layer precursor layer a of the above-mentioned laminated body precursor layer a, separate the intermediate layer precursor layer a of the laminated body precursor layer a and The above-mentioned gas generation layer precursor layer a is laminated between rollers to obtain an adhesive sheet (adhesive layer/middle) sandwiched between polyethylene terephthalate films with silicone release agent-treated surfaces. layer/gas generating layer). The obtained adhesive sheet was used for the above-mentioned evaluations (1) to (13). The results are shown in Table 4.

[實施例4] 將製造例12中獲得之黏著劑a以溶劑揮發(乾燥)後之厚度成為15 μm之方式塗佈於帶有矽酮脫模劑處理面之聚對苯二甲酸乙二酯膜(厚度:75 μm),其後進行乾燥,而於該聚對苯二甲酸乙二酯膜上形成黏著劑層前驅層a。 將製造例15中獲得之中間層形成用組合物b以溶劑揮發(乾燥)後之厚度成為15 μm之方式塗佈於帶有矽酮脫模劑處理面之聚對苯二甲酸乙二酯膜(東麗公司製造,商品名「Cerapeel」厚度:38 μm),其後進行乾燥,而於該聚對苯二甲酸乙二酯膜上形成中間層前驅層a。 繼而,將上述黏著劑層前驅層a與上述中間層前驅層b於輥間層壓而貼合,獲得夾於帶有矽酮脫模劑處理面之聚對苯二甲酸乙二酯膜之間的積層體前驅層b。 將製造例1中獲得之氣體產生層形成用組合物a以溶劑揮發(乾燥)後之厚度成為7 μm之方式塗佈於帶有矽酮脫模劑處理面之聚對苯二甲酸乙二酯膜(東麗公司製造,商品名「Cerapeel」厚度:38 μm),其後進行乾燥,而於該聚對苯二甲酸乙二酯膜上形成氣體產生層前驅層a。 將上述積層體前驅層b之中間層前驅層b側之帶有矽酮脫模劑處理面之聚對苯二甲酸乙二酯膜剝離後,將積層體前驅層b之中間層前驅層b與上述氣體產生層前驅層a於輥間層壓而貼合,獲得夾於帶有矽酮脫模劑處理面之聚對苯二甲酸乙二酯膜之間的黏著片材(黏著劑層/中間層/氣體產生層)。 將所得之黏著片材供於上述評價(1)~(13)。將結果示於表4。 [Example 4] The adhesive a obtained in Production Example 12 was applied to a polyethylene terephthalate film with a silicone release agent-treated surface (thickness: 75 μm), and then dried to form an adhesive layer precursor layer a on the polyethylene terephthalate film. The intermediate layer forming composition b obtained in Production Example 15 was applied to a polyethylene terephthalate film with a silicone release agent-treated surface so that the thickness after evaporation (drying) of the solvent became 15 μm. (manufactured by Toray, trade name "Cerapeel", thickness: 38 μm), and then dried to form an intermediate layer precursor layer a on the polyethylene terephthalate film. Then, the above-mentioned adhesive layer precursor layer a and the above-mentioned intermediate layer precursor layer b are laminated between rollers to obtain a film sandwiched between polyethylene terephthalate films with a silicone release agent-treated surface. The precursor layer b of the laminated body. The gas generating layer forming composition a obtained in Production Example 1 was applied to polyethylene terephthalate with a silicone release agent-treated surface so that the thickness after evaporation (drying) of the solvent became 7 μm. film (manufactured by Toray Corporation, trade name "Cerapeel", thickness: 38 μm), and then dried to form a gas generating layer precursor layer a on the polyethylene terephthalate film. After peeling off the polyethylene terephthalate film with the silicone release agent-treated surface on the side of the intermediate layer precursor layer b of the above-mentioned laminated body precursor layer b, separate the intermediate layer precursor layer b of the laminated body precursor layer b and The above-mentioned gas generation layer precursor layer a is laminated between rollers to obtain an adhesive sheet (adhesive layer/middle) sandwiched between polyethylene terephthalate films with silicone release agent-treated surfaces. layer/gas generating layer). The obtained adhesive sheet was used for the above-mentioned evaluations (1) to (13). The results are shown in Table 4.

[實施例5] 將製造例12中獲得之黏著劑a以溶劑揮發(乾燥)後之厚度成為15 μm之方式塗佈於帶有矽酮脫模劑處理面之聚對苯二甲酸乙二酯膜(厚度:75 μm),其後進行乾燥,而於該聚對苯二甲酸乙二酯膜上形成黏著劑層前驅層a。 將製造例1中獲得之氣體產生層形成用組合物a以溶劑揮發(乾燥)後之厚度成為7 μm之方式塗佈於帶有矽酮脫模劑處理面之聚對苯二甲酸乙二酯膜(東麗公司製造,商品名「Cerapeel」厚度:38 μm),其後進行乾燥,而於該聚對苯二甲酸乙二酯膜上形成氣體產生層前驅層a。 將上述黏著劑層前驅層a於輥間層壓而貼合於聚對苯二甲酸乙二酯膜(東麗公司製造,商品名「Lumirror#2F51N」厚度:2 μm)之單側。 繼而,將氣體產生層前驅層a於輥間層壓而貼合於上述聚對苯二甲酸乙二酯膜之與黏著劑層前驅層a相反之側。 以此方式獲得夾於帶有矽酮脫模劑處理面之聚對苯二甲酸乙二酯膜之間的黏著片材(黏著劑層/中間層/氣體產生層)。 將所得之黏著片材供於上述評價(1)~(13)。將結果示於表4。 [Example 5] The adhesive a obtained in Production Example 12 was applied to a polyethylene terephthalate film with a silicone release agent-treated surface (thickness: 75 μm), and then dried to form an adhesive layer precursor layer a on the polyethylene terephthalate film. The gas generating layer forming composition a obtained in Production Example 1 was applied to polyethylene terephthalate with a silicone release agent-treated surface so that the thickness after evaporation (drying) of the solvent became 7 μm. film (manufactured by Toray Corporation, trade name "Cerapeel", thickness: 38 μm), and then dried to form a gas generating layer precursor layer a on the polyethylene terephthalate film. The above-mentioned adhesive layer precursor layer a was laminated between rollers and bonded to one side of a polyethylene terephthalate film (manufactured by Toray, trade name "Lumirror #2F51N", thickness: 2 μm). Then, the gas generation layer precursor layer a is laminated between rollers and bonded to the side of the polyethylene terephthalate film opposite to the adhesive layer precursor layer a. In this way, an adhesive sheet (adhesive layer/intermediate layer/gas generating layer) sandwiched between polyethylene terephthalate films with silicone release agent-treated surfaces is obtained. The obtained adhesive sheet was used for the above-mentioned evaluations (1) to (13). The results are shown in Table 4.

[實施例6] 代替氣體產生層形成用組合物a而使用氣體產生層形成用組合物b,除此以外,以與實施例5同樣之方式獲得黏著片材。將所得之黏著片材供於上述評價(1)~(13)。將結果示於表5。 [Example 6] An adhesive sheet was obtained in the same manner as in Example 5, except that the gas generating layer forming composition b was used instead of the gas generating layer forming composition a. The obtained adhesive sheet was used for the above-mentioned evaluations (1) to (13). The results are shown in Table 5.

[實施例7] 代替氣體產生層形成用組合物a而使用氣體產生層形成用組合物c,除此以外,以與實施例5同樣之方式獲得黏著片材。將所得之黏著片材供於上述評價(1)~(13)。將結果示於表5。 [Example 7] An adhesive sheet was obtained in the same manner as in Example 5, except that the gas generating layer forming composition c was used instead of the gas generating layer forming composition a. The obtained adhesive sheet was used for the above-mentioned evaluations (1) to (13). The results are shown in Table 5.

[實施例8] 代替氣體產生層形成用組合物a而使用氣體產生層形成用組合物d,除此以外,以與實施例5同樣之方式獲得黏著片材。將所得之黏著片材供於上述評價(1)~(13)。將結果示於表5。 [Example 8] An adhesive sheet was obtained in the same manner as in Example 5, except that the gas generating layer forming composition d was used instead of the gas generating layer forming composition a. The obtained adhesive sheet was used for the above-mentioned evaluations (1) to (13). The results are shown in Table 5.

[實施例9] 代替氣體產生層形成用組合物a而使用氣體產生層形成用組合物e,除此以外,以與實施例5同樣之方式獲得黏著片材。將所得之黏著片材供於上述評價(1)~(13)。將結果示於表5。 [Example 9] An adhesive sheet was obtained in the same manner as in Example 5, except that the gas generating layer forming composition e was used instead of the gas generating layer forming composition a. The obtained adhesive sheet was used for the above-mentioned evaluations (1) to (13). The results are shown in Table 5.

[實施例10] 代替氣體產生層形成用組合物a而使用氣體產生層形成用組合物f,除此以外,以與實施例5同樣之方式獲得黏著片材。將所得之黏著片材供於上述評價(1)~(13)。將結果示於表5。 [Example 10] An adhesive sheet was obtained in the same manner as in Example 5, except that the gas generating layer forming composition f was used instead of the gas generating layer forming composition a. The obtained adhesive sheet was used for the above-mentioned evaluations (1) to (13). The results are shown in Table 5.

[實施例11] 代替氣體產生層形成用組合物a而使用氣體產生層形成用組合物g,除此以外,以與實施例1同樣之方式獲得黏著片材。將所得之黏著片材供於上述評價。將結果示於表6。 [Example 11] An adhesive sheet was obtained in the same manner as in Example 1, except that the gas generating layer forming composition g was used instead of the gas generating layer forming composition a. The obtained adhesive sheet was used for the above evaluation. The results are shown in Table 6.

[實施例12] 代替氣體產生層形成用組合物a而使用氣體產生層形成用組合物h,除此以外,以與實施例1同樣之方式獲得黏著片材。將所得之黏著片材供於上述評價。將結果示於表6。 [Example 12] An adhesive sheet was obtained in the same manner as in Example 1, except that the gas generating layer forming composition h was used instead of the gas generating layer forming composition a. The obtained adhesive sheet was used for the above evaluation. The results are shown in Table 6.

[表4]    實施例1 實施例2 實施例3 實施例4 實施例5 黏著劑層 黏著劑 - 黏著劑a 黏著劑a 黏著劑a 黏著劑a 厚度[μm] - 15 7 7 7 黏著層之水蒸氣透過率[g/(m 2・day)] - 3435.3 4059.3 4059.3 4059.3 中間層 中間層材料 - - 中間層形成用組合物a 中間層形成用組合物b PET 厚度[μm] - - 15 15 2 中間層之水蒸氣透過率[g/(m 2・day)] - - 1778 78 1114.34 氣體產生層 氣體產生層材料 氣體產生層形成用組合物a 氣體產生層形成用組合物a 氣體產生層形成用組合物a 氣體產生層形成用組合物a 氣體產生層形成用組合物a 厚度[μm] 7 7 7 7 7 UV吸收劑之分子量 958.2 958.2 958.2 958.2 958.2 TGA10%重量減少溫度[℃] 352.8 352.8 352.8 352.8 352.8 UV吸收劑之最大吸收波長 356 nm 356 nm 356 nm 356 nm 356 nm 黏著片材 厚度[μm] 7 22 29 29 16 氣體產生特性 透過率@360 nm[%] 0.05 0.01 0.02 0.00 0.01 透過率@500 nm[%] 91.78 91.98 92.62 92.76 91.98 最大氣體產生峰值溫度[℃] 380 380 370 370 380 氣化起始溫度[℃] 335 335 330 330 335 產生氣體種 TGA5%重量減少溫度[℃] 310.6 312.6 306.2 304.5 312.6 TGA10%重量減少溫度[℃] 33.5 349.5 340.1 339.5 349.5 氣體阻隔特性 水蒸氣透過率[g/(m 2・day)] 4062.6 3158.9 1238.1 198.1 334.2 表面形狀變化 高度(Y:垂直位移)[μm] -6.7 3.4 1.4 1.2 10.6 直徑(X:水平位移)[μm] 19.1 23.1 13.2 10.1 51.2 狀態 破裂凹 發泡凸 發泡凸 發泡凸 發泡凸 霧度值 0.2 1.5 0.4 1.2 1.5 相對於SUS430之黏著力[N/20 mm] (黏著劑層側) 4.20 3.46 2.32 0.33 相對於SUS430之黏著力[N/20 mm] (氣體產生層側) 6.02 5.22 3.86 2.95 4.74 剝離性 變形之面內均一性 被黏著體視認性 位置選擇性 [Table 4] Example 1 Example 2 Example 3 Example 4 Example 5 adhesive layer Adhesive - Adhesive a Adhesive a Adhesive a Adhesive a Thickness[μm] - 15 7 7 7 Water vapor transmission rate of adhesive layer [g/(m 2 ·day)] - 3435.3 4059.3 4059.3 4059.3 middle layer Middle layer material - - Intermediate layer forming composition a Intermediate layer forming composition b PET Thickness[μm] - - 15 15 2 Water vapor transmission rate of the middle layer [g/(m 2 ·day)] - - 1778 78 1114.34 gas generating layer Gas generating layer material Composition a for gas generation layer formation Composition a for gas generation layer formation Composition a for gas generation layer formation Composition a for gas generation layer formation Composition a for gas generation layer formation Thickness[μm] 7 7 7 7 7 Molecular weight of UV absorber 958.2 958.2 958.2 958.2 958.2 TGA10% weight reduction temperature [℃] 352.8 352.8 352.8 352.8 352.8 Maximum absorption wavelength of UV absorber 356nm 356nm 356nm 356nm 356nm adhesive sheet Thickness[μm] 7 twenty two 29 29 16 Gas generation characteristics Transmittance@360 nm[%] 0.05 0.01 0.02 0.00 0.01 Transmittance@500 nm[%] 91.78 91.98 92.62 92.76 91.98 Maximum gas generation peak temperature [℃] 380 380 370 370 380 Gasification starting temperature [℃] 335 335 330 330 335 gas species hydrocarbon Hydrocarbon hydrocarbon Hydrocarbon hydrocarbon TGA5% weight reduction temperature [℃] 310.6 312.6 306.2 304.5 312.6 TGA10% weight reduction temperature [℃] 33.5 349.5 340.1 339.5 349.5 Gas barrier properties Water vapor transmission rate [g/(m 2・day)] 4062.6 3158.9 1238.1 198.1 334.2 Surface shape changes Height (Y: vertical displacement) [μm] -6.7 3.4 1.4 1.2 10.6 Diameter (X: horizontal displacement) [μm] 19.1 23.1 13.2 10.1 51.2 condition rupture pit Foaming convex Foaming convex Foaming convex Foaming convex Haze value 0.2 1.5 0.4 1.2 1.5 Adhesion force to SUS430 [N/20 mm] (adhesive layer side) 4.20 3.46 2.32 0.33 Adhesion force to SUS430 [N/20 mm] (gas generation layer side) 6.02 5.22 3.86 2.95 4.74 Peelability In-plane uniformity of deformation Visual recognition of the adherent body location selectivity

[表5]    實施例6 實施例7 實施例8 實施例9 實施例10 黏著劑層 黏著劑 黏著劑a 黏著劑a 黏著劑a 黏著劑a 黏著劑a 厚度[μm] 7 7 7 7 7 黏著層之水蒸氣透過率[g/(m 2・day)] 4059.3 4059.3 4059.3 4059.3 4059.3 中間層 中間層材料 PET PET PET PET PET 厚度[μm] 2 2 2 2 2 中間層之水蒸氣透過率[g/(m 2・day)] 1114.34 1114.34 1114.34 1114.34 1114.34 氣體產生層 氣體產生層材料 氣體產生層形成用組合物b 氣體產生層形成用組合物c 氣體產生層形成用組合物d 氣體產生層形成用組合物e 氣體產生層形成用組合物f 厚度[μm] 7 7 7 7 7 UV吸收劑之分子量 958.2 629.8 647.8 958.2 958.2 TGA10%重量減少溫度[℃] 352.8 401.5 391.7 352.8 352.8 UV吸收劑之最大吸收波長 356 nm 349 nm 336 nm 356 nm 356 nm 黏著片材 厚度[μm] 16 16 16 16 16 氣體產生特性 透過率@360 nm[%] 0.05 0.00 0.20 0.02 0.01 透過率@500 nm[%] 92.2 92.10 91.93 90.24 92.17 最大氣體產生峰值溫度[℃] 380 390 395 380 380 氣化起始溫度[℃] 335 360 370 335 335 產生氣體種 TGA5%重量減少溫度[℃] 310.3 319.2 326.2 313.2 309.7 TGA10%重量減少溫度[℃] 347.2 359.6 369.9 351.4 349.7 氣體阻隔特性 水蒸氣透過率[g/(m 2・day)] 330.2 328.4 339.4 336.2 284.1 表面形狀變化 高度(Y:垂直位移)[μm] 5.3 10.5 4.5 6.5 15.7 直徑(X:水平位移)[μm] 42.1 40.6 41.3 39.3 41.5 狀態 發泡凸 發泡凸 發泡凸 發泡凸 發泡凸 霧度值 1.6 10.4 1.4 26 9 相對於SUS430之黏著力[N/20 mm] (黏著劑層側) 0.31 0.35 0.39 0.46 0.42 相對於SUS430之黏著力[N/20 mm] (氣體產生層側) 4.59 4.30 4.68 2.52 6.37 剝離性 變形之面內均一性 被黏著體視認性 位置選擇性 [table 5] Example 6 Example 7 Example 8 Example 9 Example 10 adhesive layer Adhesive Adhesive a Adhesive a Adhesive a Adhesive a Adhesive a Thickness[μm] 7 7 7 7 7 Water vapor transmission rate of adhesive layer [g/(m 2 ·day)] 4059.3 4059.3 4059.3 4059.3 4059.3 middle layer Middle layer material PET PET PET PET PET Thickness[μm] 2 2 2 2 2 Water vapor transmission rate of the middle layer [g/(m 2 ·day)] 1114.34 1114.34 1114.34 1114.34 1114.34 gas generating layer Gas generating layer material Composition b for forming gas generating layer Gas generating layer forming composition c Composition d for forming gas generating layer Composition e for forming gas generating layer Composition f for forming gas generating layer Thickness[μm] 7 7 7 7 7 Molecular weight of UV absorber 958.2 629.8 647.8 958.2 958.2 TGA10% weight reduction temperature [℃] 352.8 401.5 391.7 352.8 352.8 Maximum absorption wavelength of UV absorber 356nm 349 nm 336nm 356nm 356nm adhesive sheet Thickness[μm] 16 16 16 16 16 Gas generation characteristics Transmittance@360 nm[%] 0.05 0.00 0.20 0.02 0.01 Transmittance@500 nm[%] 92.2 92.10 91.93 90.24 92.17 Maximum gas generation peak temperature [℃] 380 390 395 380 380 Gasification starting temperature [℃] 335 360 370 335 335 gas species hydrocarbon hydrocarbon hydrocarbon Hydrocarbon hydrocarbon TGA5% weight reduction temperature [℃] 310.3 319.2 326.2 313.2 309.7 TGA10% weight reduction temperature [℃] 347.2 359.6 369.9 351.4 349.7 Gas barrier properties Water vapor transmission rate [g/(m 2・day)] 330.2 328.4 339.4 336.2 284.1 Surface shape changes Height (Y: vertical displacement) [μm] 5.3 10.5 4.5 6.5 15.7 Diameter (X: horizontal displacement) [μm] 42.1 40.6 41.3 39.3 41.5 condition Foaming convex Foaming convex Foaming convex Foaming convex Foaming convex Haze value 1.6 10.4 1.4 26 9 Adhesion force to SUS430 [N/20 mm] (adhesive layer side) 0.31 0.35 0.39 0.46 0.42 Adhesion force to SUS430 [N/20 mm] (gas generation layer side) 4.59 4.30 4.68 2.52 6.37 Peelability In-plane uniformity of deformation Visual recognition of the adherent body location selectivity

[表6]    實施例11 實施例12 實施例13 實施例14 實施例15 黏著劑層 黏著劑 - - 黏著劑b 黏著劑b 黏著劑b 厚度[μm] - - 10 10 10 黏著層之水蒸氣透過率[g/(m 2・day)] - - 3754.3 3754.3 3754.3 中間層 中間層材料 - - - - - 厚度[μm] - - - - - 中間層之水蒸氣透過率[g/(m 2・day)] - - - - - 氣體產生層 氣體產生層材料 氣體產生層形成用組合物g 氣體產生層形成用組合物h 氣體產生層形成用組合物i 氣體產生層形成用組合物j 氣體產生層形成用組合物k 厚度[μm] 20 20 20 20 20 UV吸收劑之分子量 958.2 958.2 647.8 647.8 647.8 TGA10%重量減少溫度[℃] 352.8 352.8 391.7 391.7 391.7 UV吸收劑之最大吸收波長 356 nm 356 nm 336 nm 336 nm 336 nm 厚度h(gas)[μm] 20 20 20 20 20 彈性模數Er(gas)[MPa] 0.95 77.62 3.05 2.88 2.12 LogEr(gas) 5.98 7.89 6.48 6.46 6.33 8.01×h(gas) -0.116 5.66 5.66 5.66 5.66 5.66 根據Log(Er(gas)×10 6)≧8.01×h(gas) - 0 .116算出之氣體產生層之彈性模數之下限值[MPa] 0.46 0.46 0.46 0.46 0.46 7.66×h(gas) -0.092 5.81 5.81 5.81 5.81 5.81 根據Log(Er(gas)×10 6)≧7.66×h(gas) -0.092算出之氣體產生層之彈性模數之下限值[MPa] 0.65 0.65 0.65 0.65 0.65 7.52×h(gas) -0.081 5.90 5.90 5.90 5.90 5.90 根據Log(Er(gas)×10 6)≧7.52×h(gas) -0.081算出之氣體產生層之彈性模數之下限值[MPa] 0.79 0.79 0.79 0.79 0.79 47.675×h(gas) -0.519 10.07 10.07 10.07 10.07 10.07 根據Log(Er(gas)×10 6)≦47.675×h(gas) -0.519算出之氣體產生層之彈性模數之上限值[MPa] 11765.71 11765.71 11,765.7 11,765.7 11,765.7 黏著片材 厚度[μm] 20 20 30 30 30 氣體產生特性 透過率@360 nm[%] 0.18 0.19 0.37 0.48 0.36 透過率@500 nm[%] 89.11 90.20 88.43 83.44 88.30 最大氣體產生峰值溫度[℃] 380 380 390 395 395 氣化起始溫度[℃] 335 335 360 375 370 產生氣體種 TGA5%重量減少溫度[℃] 304.90 308.40 328.9 331.1 332.3 TGA10%重量減少溫度[℃] 327.80 329.80 358.0 360.4 359.6 氣體阻隔特性 水蒸氣透過率[g/(m 2・day)] 3113.20 3356.80 2888.1 3001.2 2791.3 表面形狀變化 高度(Y:垂直位移)[μm] 0.9 0.7 2.4 1.3 1.9 直徑(X:水平位移)[μm] 12.3 14.6 26.3 25.7 22.4 狀態 發泡凸 發泡凸 發泡凸 發泡凸 發泡凸 霧度值 7.3 8.2 5.8 47.1 5.8 相對於SUS430之黏著力[N/20 mm] (黏著劑層側) - - 0.38 0.28 0.43 相對於SUS430之黏著力[N/20 mm] (氣體產生層側) 0.40 0.21 7.50 8.72 16.20 剝離性 變形之面內均一性 被黏著體視認性 位置選擇性 [Table 6] Example 11 Example 12 Example 13 Example 14 Example 15 adhesive layer Adhesive - - Adhesive b Adhesive b Adhesive b Thickness[μm] - - 10 10 10 Water vapor transmission rate of adhesive layer [g/(m 2・day)] - - 3754.3 3754.3 3754.3 middle layer Middle layer material - - - - - Thickness[μm] - - - - - Water vapor transmission rate of the middle layer [g/(m 2・day)] - - - - - gas generating layer Gas generating layer material Composition g for forming gas generating layer Gas generating layer forming composition h Composition for forming gas generating layer i Gas generating layer forming compositionj Gas generating layer forming composition k Thickness[μm] 20 20 20 20 20 Molecular weight of UV absorber 958.2 958.2 647.8 647.8 647.8 TGA10% weight reduction temperature [℃] 352.8 352.8 391.7 391.7 391.7 Maximum absorption wavelength of UV absorber 356nm 356nm 336nm 336nm 336nm Thickness h(gas)[μm] 20 20 20 20 20 Elastic modulus Er(gas)[MPa] 0.95 77.62 3.05 2.88 2.12 LogEr(gas) 5.98 7.89 6.48 6.46 6.33 8.01×h(gas) -0.116 5.66 5.66 5.66 5.66 5.66 The lower limit value of the elastic modulus of the gas generating layer [MPa] calculated based on Log(Er ( gas)×10 6 )≧8.01×h(gas) - 0.116 0.46 0.46 0.46 0.46 0.46 7.66×h(gas) -0.092 5.81 5.81 5.81 5.81 5.81 The lower limit value of the elastic modulus of the gas generating layer [MPa] calculated based on Log(Er(gas)×10 6 )≧7.66×h(gas) -0.092 0.65 0.65 0.65 0.65 0.65 7.52×h(gas) -0.081 5.90 5.90 5.90 5.90 5.90 The lower limit value of the elastic modulus of the gas generating layer calculated from Log(Er(gas)×10 6 )≧7.52×h(gas) -0.081 [MPa] 0.79 0.79 0.79 0.79 0.79 47.675×h(gas) -0.519 10.07 10.07 10.07 10.07 10.07 The upper limit value of the elastic modulus of the gas generating layer calculated from Log(Er(gas)×10 6 )≦47.675×h(gas) -0.519 [MPa] 11765.71 11765.71 11,765.7 11,765.7 11,765.7 adhesive sheet Thickness[μm] 20 20 30 30 30 Gas generation characteristics Transmittance@360 nm[%] 0.18 0.19 0.37 0.48 0.36 Transmittance@500 nm[%] 89.11 90.20 88.43 83.44 88.30 Maximum gas generation peak temperature [℃] 380 380 390 395 395 Gasification starting temperature [℃] 335 335 360 375 370 gas species hydrocarbon hydrocarbon hydrocarbon hydrocarbon hydrocarbon TGA5% weight reduction temperature [℃] 304.90 308.40 328.9 331.1 332.3 TGA10% weight reduction temperature [℃] 327.80 329.80 358.0 360.4 359.6 Gas barrier properties Water vapor transmission rate [g/(m 2・day)] 3113.20 3356.80 2888.1 3001.2 2791.3 Surface shape changes Height (Y: vertical displacement) [μm] 0.9 0.7 2.4 1.3 1.9 Diameter (X: horizontal displacement) [μm] 12.3 14.6 26.3 25.7 22.4 condition Foaming convex Foaming convex Foaming convex Foaming convex Foaming convex Haze value 7.3 8.2 5.8 47.1 5.8 Adhesion force to SUS430 [N/20 mm] (adhesive layer side) - - 0.38 0.28 0.43 Adhesion force to SUS430 [N/20 mm] (gas generation layer side) 0.40 0.21 7.50 8.72 16.20 Peelability In-plane uniformity of deformation Visual recognition of the adherent body location selectivity

[比較例1] 代替氣體產生層形成用組合物a而使用氣體產生層形成用組合物I,除此以外,以與實施例1同樣之方式獲得黏著片材。將所得之黏著片材供於上述評價(1)~(13)。將結果示於表7。 [Comparative example 1] An adhesive sheet was obtained in the same manner as in Example 1, except that the gas generating layer forming composition I was used instead of the gas generating layer forming composition a. The obtained adhesive sheet was used for the above-mentioned evaluations (1) to (13). The results are shown in Table 7.

[比較例2] 代替氣體產生層形成用組合物a而使用氣體產生層形成用組合物I,除此以外,以與實施例5同樣之方式獲得黏著片材。將所得之黏著片材供於上述評價(1)~(13)。將結果示於表7。 [Comparative example 2] An adhesive sheet was obtained in the same manner as in Example 5, except that the gas generating layer forming composition I was used instead of the gas generating layer forming composition a. The obtained adhesive sheet was used for the above-mentioned evaluations (1) to (13). The results are shown in Table 7.

[比較例3] 代替黏著劑a而使用黏著劑I,將黏著劑層之厚度設為10 μm,使用厚度188 μm之PET膜作為中間層,代替氣體產生層形成用組合物a而使用含熱膨脹性微小球之組合物II形成48 μm之氣體產生層,除此以外,以與實施例5同樣之方式獲得黏著片材。將所得之黏著片材供於上述評價(1)~(13)。將結果示於表7。 [Comparative example 3] Adhesive I was used instead of Adhesive A, the thickness of the adhesive layer was set to 10 μm, a PET film with a thickness of 188 μm was used as the intermediate layer, and a combination containing thermally expandable microspheres was used instead of Gas Generating Layer Forming Composition A. Material II formed a gas generating layer of 48 μm, and an adhesive sheet was obtained in the same manner as in Example 5, except that a gas generating layer of 48 μm was formed. The obtained adhesive sheet was used for the above-mentioned evaluations (1) to (13). The results are shown in Table 7.

[比較例4] 代替黏著劑a而使用黏著劑I,將黏著劑層之厚度設為10 μm,使用厚度100 μm之PET膜作為中間層,代替氣體產生層形成用組合物a而使用含熱膨脹性微小球之組合物III形成48 μm之氣體產生層,除此以外,以與實施例5同樣之方式獲得黏著片材。將所得之黏著片材供於上述評價(1)~(13)。將結果示於表7。 [Comparative example 4] Adhesive I was used instead of Adhesive A, the thickness of the adhesive layer was set to 10 μm, a PET film with a thickness of 100 μm was used as the intermediate layer, and a combination containing thermally expandable microspheres was used instead of Gas Generating Layer Forming Composition A. The adhesive sheet was obtained in the same manner as in Example 5, except that a gas generating layer of 48 μm was formed from Product III. The obtained adhesive sheet was used for the above-mentioned evaluations (1) to (13). The results are shown in Table 7.

[表7]    比較例1 比較例2 比較例3 比較例4 黏著劑層 黏著劑 - 黏著劑a 黏著劑I 黏著劑I 厚度[μm] - 7 10 10 黏著層之水蒸氣透過率[g/(m 2・day)] - 4059.3 - - 中間層 中間層材料 - PET PET PET 厚度[μm] - 2 188 100 中間層之水蒸氣透過率[g/(m 2・day)] - 3450 - - 氣體產生層 氣體產生層材料 氣體產生層形成用組合物I 氣體產生層形成用組合物I 含熱膨脹性微小球之組合物II 含熱膨脹性微小球之組合物III 厚度[μm] 7 7 48 48 UV吸收劑之分子量 315.8 315.8 - - TGA10%重量減少溫度[℃] 234.5 232.5 - - UV吸收劑之最大吸收波長 355 nm 355 nm - - 黏著片材 厚度[μm] 7 16 246 158 氣體產生特性 透過率@360 nm[%] 7.56 7.45 58.32 71.78 透過率@500 nm[%] 88.74 86.44 84.01 84.15 最大氣體產生峰值溫度[℃] 250 250 - - 氣化起始溫度[℃] 215 215 - - 產生氣體種 烴 鹵素化合物 烴 鹵素化合物 TGA5%重量減少溫度[℃] 240.6 245.6 - - TGA10%重量減少溫度[℃] 280.3 284.3 - - 氣體阻隔特性 水蒸氣透過率[g/(m 2・day)] 4062.6 298.6 - - 表面形狀變化 高度(Y:垂直位移)[μm] -6.2 8.2 ≧100 μm ≧100 μm 直徑(X:水平位移)[μm] 16.1 36.4 ≧200 μm ≧200 μm 狀態 破裂凹 發泡凸 複數發泡凸 複數發泡凸 霧度值 51.2 58.5 66.4 56.4 相對於SUS430之黏著力[N/20 mm] (黏著劑層側)    1.05 - - 相對於SUS430之黏著力[N/20 mm] (氣體產生層側) 0.58 0.58 - - 剝離性 變形之面內均一性 × × 被黏著體視認性 × × × × 位置選擇性 × × [Table 7] Comparative example 1 Comparative example 2 Comparative example 3 Comparative example 4 adhesive layer Adhesive - Adhesive a Adhesive I Adhesive I Thickness[μm] - 7 10 10 Water vapor transmission rate of adhesive layer [g/(m 2・day)] - 4059.3 - - middle layer Middle layer material - PET PET PET Thickness[μm] - 2 188 100 Water vapor transmission rate of the middle layer [g/(m 2・day)] - 3450 - - gas generating layer Gas generating layer material Gas generating layer forming composition I Gas generating layer forming composition I Composition II containing thermally expandable microspheres Composition III containing thermally expandable microspheres Thickness[μm] 7 7 48 48 Molecular weight of UV absorber 315.8 315.8 - - TGA10% weight reduction temperature [℃] 234.5 232.5 - - Maximum absorption wavelength of UV absorber 355nm 355nm - - adhesive sheet Thickness[μm] 7 16 246 158 Gas generation characteristics Transmittance@360 nm[%] 7.56 7.45 58.32 71.78 Transmittance@500 nm[%] 88.74 86.44 84.01 84.15 Maximum gas generation peak temperature [℃] 250 250 - - Gasification starting temperature [℃] 215 215 - - gas species Hydrocarbon halogen compounds Hydrocarbon halogen compounds hydrocarbon hydrocarbon TGA5% weight reduction temperature [℃] 240.6 245.6 - - TGA10% weight reduction temperature [℃] 280.3 284.3 - - Gas barrier properties Water vapor transmission rate [g/(m 2・day)] 4062.6 298.6 - - Surface shape changes Height (Y: vertical displacement) [μm] -6.2 8.2 ≧100 μm ≧100 μm Diameter (X: horizontal displacement) [μm] 16.1 36.4 ≧200 μm ≧200 μm condition rupture pit Foaming convex plural foaming convex plural foaming convex Haze value 51.2 58.5 66.4 56.4 Adhesion force to SUS430 [N/20 mm] (adhesive layer side) 1.05 - - Adhesion force to SUS430 [N/20 mm] (gas generation layer side) 0.58 0.58 - - Peelability In-plane uniformity of deformation × × Visual recognition of the adherent body × × × × location selectivity × ×

4:樣品 5A,5B:試樣保持器 6:壓縮試驗機 10:氣體產生層 20:黏著劑層 30:中間層 100,100',200:黏著片材 4:Sample 5A, 5B: Sample holder 6: Compression testing machine 10: Gas generation layer 20: Adhesive layer 30:Middle layer 100,100',200: Adhesive sheet

圖1(a)、(b)係本發明之一實施方式之黏著片材之概略剖視圖。 圖2係本發明之其他實施方式之黏著片材之概略剖視圖。 圖3係對穿刺強度之測定方法進行說明之概略圖。 1(a) and (b) are schematic cross-sectional views of an adhesive sheet according to one embodiment of the present invention. FIG. 2 is a schematic cross-sectional view of an adhesive sheet according to another embodiment of the present invention. FIG. 3 is a schematic diagram illustrating a method of measuring puncture strength.

10:氣體產生層 10: Gas generation layer

20:黏著劑層 20: Adhesive layer

100,100':黏著片材 100,100': Adhesive sheet

Claims (15)

一種黏著片材,其具備藉由雷射光照射而產生氣體之氣體產生層,且霧度值為50%以下,波長360nm之紫外線透過率為30%以下,上述氣體產生層為產生烴系氣體之層。 An adhesive sheet, which has a gas generating layer that generates gas when irradiated with laser light, has a haze value of 50% or less, and an ultraviolet transmittance of 360 nm wavelength of 30% or less, and the gas generating layer generates hydrocarbon gases. layer. 如請求項1之黏著片材,其中上述氣體產生層之厚度為0.1μm~50μm。 The adhesive sheet of claim 1, wherein the thickness of the gas generating layer is 0.1 μm ~ 50 μm. 如請求項1或2之黏著片材,其中上述氣體產生層為可吸收紫外線之層。 The adhesive sheet of claim 1 or 2, wherein the gas generating layer is a layer that can absorb ultraviolet rays. 如請求項3之黏著片材,其中上述氣體產生層含有紫外線吸收劑。 The adhesive sheet of claim 3, wherein the gas generating layer contains an ultraviolet absorber. 如請求項1或2之黏著片材,其波長500nm之紫外線透過率為50%~100%。 For example, the adhesive sheet required in item 1 or 2 has an ultraviolet transmittance of 50% to 100% at a wavelength of 500nm. 如請求項1或2之黏著片材,其中上述氣體產生層之氣化起始溫度為150℃~500℃,所謂氣體產生層之氣化起始溫度係指根據使黏著片材升溫時之釋出氣體分析(EGA分析)算出之氣體產生上升溫度,所謂氣體產生上升溫度係定義為達到根據EGA分析所得之釋出氣體分析/質譜(EGA/MS) 圖譜之最大氣體產生峰值之半值的溫度。 For example, the adhesive sheet of claim 1 or 2, wherein the gasification starting temperature of the gas generating layer is 150°C to 500°C. The so-called gasification starting temperature of the gas generating layer refers to the release temperature of the adhesive sheet when the adhesive sheet is heated. The rising temperature of gas production calculated by EGA analysis. The so-called rising temperature of gas production is defined as the emission gas analysis/mass spectrometry (EGA/MS) obtained by EGA analysis. The temperature at which the maximum gas production peak in the spectrum is half the value. 如請求項1或2之黏著片材,其10%重量減少溫度為200℃~500℃,所謂10%重量減少溫度係指使黏著片材升溫時之熱重量分析(TGA分析)中,氣體產生層之重量相對於升溫前之重量而減少10重量%之時間點的溫度。 For example, the 10% weight loss temperature of the adhesive sheet in claim 1 or 2 is 200°C~500°C. The so-called 10% weight loss temperature refers to the gas generation layer in the thermogravimetric analysis (TGA analysis) when the adhesive sheet is heated. The temperature at which the weight decreases by 10% by weight relative to the weight before heating. 如請求項1或2之黏著片材,其於上述氣體產生層之至少單側進而具備黏著劑層,且該黏著劑層係其表面藉由對上述黏著片材照射雷射光而變形之層。 The adhesive sheet according to claim 1 or 2 further includes an adhesive layer on at least one side of the gas generating layer, and the adhesive layer is a layer whose surface is deformed by irradiating the adhesive sheet with laser light. 如請求項8之黏著片材,其中上述黏著劑層之厚度為0.1μm~50μm。 Such as the adhesive sheet of claim 8, wherein the thickness of the above-mentioned adhesive layer is 0.1 μm~50 μm. 如請求項8之黏著片材,其中上述黏著劑層藉由對上述黏著片材照射雷射光而發泡。 The adhesive sheet of claim 8, wherein the adhesive layer is foamed by irradiating the adhesive sheet with laser light. 一種電子零件之處理方法,其包括:將電子零件貼附於如請求項1至10中任一項之黏著片材上;及對該黏著片材照射雷射光而自該黏著片材剝離該電子零件。 A method for processing electronic parts, which includes: attaching electronic parts to an adhesive sheet according to any one of claims 1 to 10; and irradiating the adhesive sheet with laser light to peel off the electronic components from the adhesive sheet. Component. 如請求項11之電子零件之處理方法,其中上述電子零件之剝離係選擇位置地進行。 A method for processing electronic parts as claimed in claim 11, wherein the stripping of the electronic parts is carried out at a selected location. 如請求項11或12之電子零件之處理方法,其包括:於將上述電子零件貼附於上述黏著片材後且自該黏著片材剝離該電子零件前,對該電子零件進行特定處理。 For example, claim 11 or 12 for the processing method of electronic components, which includes: performing specific processing on the electronic components after attaching the electronic components to the adhesive sheet and before peeling off the electronic components from the adhesive sheet. 如請求項13之電子零件之處理方法,其中上述處理為研磨加工、切割加工、黏晶、打線接合、蝕刻、蒸鍍、成型、電路形成、檢查、產品檢驗、洗淨、轉印、排列、修復或裝置表面保護。 Such as the processing method of electronic parts in claim 13, wherein the above-mentioned processing is grinding processing, cutting processing, die bonding, wire bonding, etching, evaporation, molding, circuit formation, inspection, product inspection, cleaning, transfer printing, arrangement, Repair or install surface protection. 如請求項11或12之電子零件之處理方法,其包括:自上述黏著片材剝離上述電子零件之後,將電子零件配置於其他片材。 The method of processing electronic parts according to claim 11 or 12 includes: peeling off the electronic parts from the adhesive sheet and arranging the electronic parts on another sheet.
TW111117102A 2019-12-20 2020-12-16 adhesive sheet TWI824509B (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2019230601 2019-12-20
JP2019-230601 2019-12-20
JP2020-114046 2020-07-01
JP2020114046 2020-07-01

Publications (2)

Publication Number Publication Date
TW202233780A TW202233780A (en) 2022-09-01
TWI824509B true TWI824509B (en) 2023-12-01

Family

ID=76478669

Family Applications (2)

Application Number Title Priority Date Filing Date
TW111117102A TWI824509B (en) 2019-12-20 2020-12-16 adhesive sheet
TW109144492A TWI767453B (en) 2019-12-20 2020-12-16 adhesive sheet

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW109144492A TWI767453B (en) 2019-12-20 2020-12-16 adhesive sheet

Country Status (5)

Country Link
JP (1) JPWO2021124855A1 (en)
KR (1) KR20220117232A (en)
CN (1) CN114846098A (en)
TW (2) TWI824509B (en)
WO (1) WO2021124855A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024015735A (en) * 2022-07-25 2024-02-06 株式会社レゾナック Film for temporary fixing, laminate for temporary fixing, manufacturing method of semiconductor device, and composition for temporary fixing

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010202833A (en) * 2009-03-05 2010-09-16 Sekisui Chem Co Ltd Adhesive tape for processing electronic element

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6151140A (en) * 1984-08-21 1986-03-13 Fuji Photo Film Co Ltd Heat developable photosensitive material
JP3594853B2 (en) 1999-11-08 2004-12-02 日東電工株式会社 Heat release adhesive sheet
JP2004186200A (en) * 2002-11-29 2004-07-02 Sekisui Chem Co Ltd Method of manufacturing semiconductor chip
JPWO2011118488A1 (en) * 2010-03-24 2013-07-04 積水化学工業株式会社 Adhesive composition and adhesive tape
JP2013159743A (en) * 2012-02-07 2013-08-19 Nitto Denko Corp Method for peeling pressure-sensitive adhesive agent laminate and pressure-sensitive adhesive agent layer used therein
JP6054208B2 (en) * 2013-03-04 2016-12-27 日東電工株式会社 Thermally peelable adhesive sheet
JP7088736B2 (en) * 2017-10-06 2022-06-21 積水化学工業株式会社 Surface protection film
KR20210021063A (en) * 2018-09-10 2021-02-24 쇼와 덴코 가부시키가이샤 Adhesive sheet

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010202833A (en) * 2009-03-05 2010-09-16 Sekisui Chem Co Ltd Adhesive tape for processing electronic element

Also Published As

Publication number Publication date
TW202126767A (en) 2021-07-16
KR20220117232A (en) 2022-08-23
CN114846098A (en) 2022-08-02
TW202233780A (en) 2022-09-01
JPWO2021124855A1 (en) 2021-06-24
TWI767453B (en) 2022-06-11
WO2021124855A1 (en) 2021-06-24

Similar Documents

Publication Publication Date Title
TWI652324B (en) Adhesive sheet
TWI530545B (en) Thermally peelable type pressure-sensitive adhesive sheet
US20130260120A1 (en) Heat-peelable pressure-sensitive adhesive sheet
JP6091954B2 (en) Adhesive sheet, protective film-forming film, protective film-forming composite sheet, and marking method
JP2007070432A (en) Pressure-sensitive adhesive sheet and method of processing product using the pressure-sensitive adhesive sheet
TW201726868A (en) Adhesive agent composition and adhesive sheet
TWI745194B (en) Adhesive sheet
TW202024263A (en) Adhesive sheet
TW201905135A (en) Tangent ribbon integrated adhesive sheet
TW201638260A (en) Resin film-forming sheet, resin film-forming composite sheet, and silicon wafer regeneration method
TWI824509B (en) adhesive sheet
CN114901765A (en) Adhesive sheet
TW202126769A (en) Pressure-sensitive adhesive sheet
TWI824455B (en) adhesive sheet
TW202144171A (en) Adhesive sheet
TWI758015B (en) Adhesive sheet and processing method of electronic parts
US20230026069A1 (en) Adhesive sheet
JP2022038213A (en) Member processing method
TW202134372A (en) Adhesive sheet
TW202313917A (en) Protective film-forming film and composite sheet for forming protective film wherein the protective film-forming film is a curable or non-curable protective film-forming film
JP2023047740A (en) Protective film-forming film, protective film-forming sheet, protective film-forming composite sheet, rework method, and device manufacturing method