TWI823475B - USE OF ZnO/NSP COMPOSITE IN SKIN PROTECTION - Google Patents

USE OF ZnO/NSP COMPOSITE IN SKIN PROTECTION Download PDF

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TWI823475B
TWI823475B TW111126539A TW111126539A TWI823475B TW I823475 B TWI823475 B TW I823475B TW 111126539 A TW111126539 A TW 111126539A TW 111126539 A TW111126539 A TW 111126539A TW I823475 B TWI823475 B TW I823475B
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zinc oxide
zno
skin
cosmetic composition
silicon wafer
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TW202402262A (en
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林江珍
賴惠敏
侯慕檀
侯廷鉞
陳俊帆
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臺灣多胺股份有限公司
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Abstract

The present invention provides a skin protecting composition, comprising a zinc oxide-on-silicate platelet composite (ZnO/NSP composite). The ZnO/NSP composite is made of silicate platelet and ZnO particles adsorbed thereon, in which the ZnO particles are created by the dehydration of Zn(OH)2 formed on the silicate platelet. The ZnO particles adhering on the silicate platelet can effectively improve the dispersibility of zinc oxide particles, and the average particle size can reach near nanometer size; moreover, exhibit better anti-bacterial and light-absorbing properties than ZnO itself, and are not toxic or irritating to the skin. The ZnO/NSP composite can be used in the preparation of skin-protecting compositions, especially cosmetic compositions.

Description

矽片-氧化鋅複合物用於皮膚保護組合物之用途 Use of Silicon Chip-Zinc Oxide Complex in Skin Protective Compositions

本發明係關於一種矽片-氧化鋅複合物(ZnO/NSP composite)應用於皮膚保護之用途,特別是關於一種矽片-氧化鋅複合物用於製備保護皮膚之化妝品組合物的用途。 The present invention relates to the use of a silicon flake-zinc oxide composite (ZnO/NSP composite) for skin protection, and in particular to the use of a silicon flake-zinc oxide composite for preparing cosmetic compositions for skin protection.

已知氧化鋅是一種物理性的日光阻斷劑,它的吸收光譜覆蓋了從290到380nm的波段,因此可以防護到UVB和UVA所有波段。物理性防曬其原理是利用產品中的礦物質等不透光粒子,當日光照射到這類物質時直接遮蔽阻擋,但因市售氧化鋅分散性差,導致使用量較高,造成擦用時的厚重感及蒼白感等不自然的缺點,不易討消費大眾的歡心。氧化鋅亦已用於治療及預防尿布疹(Diaper rash),和其他輕微的皮膚問題,如燙傷、割傷或刮傷等。其原理是在皮膚上形成一道屏障,以隔絕刺激物質或濕氣。 Zinc oxide is known to be a physical sun blocker. Its absorption spectrum covers the band from 290 to 380nm, so it can protect all bands of UVB and UVA. The principle of physical sunscreen is to use opaque particles such as minerals in the product to directly block sunlight when it is exposed to such substances. However, due to the poor dispersion of commercially available zinc oxide, the usage amount is high, resulting in irritation during application. Unnatural shortcomings such as thickness and paleness are not easy to please the consumer public. Zinc oxide has also been used to treat and prevent diaper rash and other minor skin problems such as burns, cuts or scratches. It works by forming a barrier on the skin to keep out irritants or moisture.

近年來,已有許多使用奈米氧化鋅粒子的防曬產品,雖可解決消費者塗抹不適感的問題,但是防曬劑中使用的奈米粒子安全性一直是備受爭議的問題,因為之前的動物暴露研究發現,從人體研究中將奈米氧化鋅(ZnO)防曬劑應用於皮膚,對皮膚的吸收要高得多。且有部分公共宣導團體擔心,含有氧化鋅(ZnO)奈米粒子的防曬劑對皮膚上層的滲透,可 以進入活表皮中的活細胞並產生毒性,包括DNA損傷。 In recent years, there have been many sunscreen products using zinc oxide nanoparticles. Although they can solve the problem of discomfort for consumers when applying, the safety of nanoparticles used in sunscreens has always been a controversial issue because of previous animal Exposure studies found that when nanoscale zinc oxide (ZnO) sunscreen was applied to the skin, skin absorption was much higher from human studies. And some public advocacy groups are concerned that sunscreens containing zinc oxide (ZnO) nanoparticles can penetrate into the upper layers of the skin and may to enter living cells in the living epidermis and cause toxicity, including DNA damage.

本發明首先發現,藉由令氧化鋅在矽片表面上形成而製成的矽片-氧化鋅複合物,可使所形成的氧化鋅顆粒均勻分散並吸附在矽片表面上,不僅能改進市售氧化鋅不易分散的缺點,並且對於人類皮膚不具毒性及刺激性,同時能提升氧化鋅之特性,有效降低氧化鋅的使用量。 The present invention first discovered that the silicon wafer-zinc oxide composite made by forming zinc oxide on the surface of the silicon wafer can make the formed zinc oxide particles evenly dispersed and adsorbed on the surface of the silicon wafer, which can not only improve the market The disadvantage of zinc oxide is that it is not easily dispersed, and it is not toxic or irritating to human skin. At the same time, it can improve the properties of zinc oxide and effectively reduce the usage of zinc oxide.

於是,本發明之一方面係關於一種矽片-氧化鋅複合物(ZnO-on-silicate platelet composite)用於製備皮膚保護組合物之用途。 Accordingly, one aspect of the present invention relates to the use of a ZnO-on-silicate platelet composite for preparing a skin protection composition.

於本發明之一些具體實施例,所述之組合物為一種化妝品組合物,較佳為皮膚防護乳霜、乳液或護膚清潔產品,包括防曬乳霜、洗髮精/乳、養髮液(hair tonic)等。 In some specific embodiments of the present invention, the composition is a cosmetic composition, preferably a skin protective cream, lotion or skin care cleansing product, including sunscreen cream, shampoo/milk, and hair lotion. tonic) and so on.

另一方面,本發明係關於一種用於保護皮膚之化妝品組合物,包含一矽片-氧化鋅複合物及載劑、賦形劑或稀釋劑。 In another aspect, the present invention relates to a cosmetic composition for skin protection, comprising a silicon flake-zinc oxide complex and a carrier, excipient or diluent.

於本發明之一些具體實施例,所述之組合物為一種防曬乳液、或抗菌洗髮精/乳或養髮液(hair tonic)。 In some embodiments of the present invention, the composition is a sunscreen lotion, or antibacterial shampoo/milk or hair tonic.

圖1為本發明之矽片-氧化鋅複合物的外觀型態SEM觀測照片,標記橫線長度代表2μm。圖中的紅色圈是將ZnO拉出進行能量散射X射線譜(EDS)的區域。 Figure 1 is an SEM observation photo of the appearance of the silicon wafer-zinc oxide composite of the present invention. The length of the marked horizontal line represents 2 μm. The red circle in the figure is the area where ZnO is pulled out for energy dispersion X-ray spectroscopy (EDS).

圖2A為本發明之矽片-氧化鋅複合物粉末分散後以TEM觀察的結果,標記橫線長度代表100nm。圖2B為矽片-氧化鋅複合物以粉末的型態進行X-ray繞射分析的圖譜。紅色線為ZnO的標準圖譜。 Figure 2A shows the results of TEM observation after the silicon wafer-zinc oxide composite powder of the present invention is dispersed. The length of the marked horizontal line represents 100 nm. Figure 2B is a spectrum of X-ray diffraction analysis of the silicon wafer-zinc oxide composite in powder form. The red line is the standard spectrum of ZnO.

圖3為本發明之矽片-氧化鋅複合物對皮膚細胞:人類表皮形成細胞HaCaT(A)、人類皮膚纖維母細胞Hs68(B)及小鼠黑色素細胞B16F10(C)的毒性評估結果。將細胞與不同濃度(0、1、10、100、500、1000、5000ppm)之氧化鋅-矽片複合物溶液共培養24小時後,進行MTT分析,測定細胞經過氧化鋅-矽片複合物處理後的存活率(以相對於無處理對照組之存活率的百分比值表示)。 Figure 3 shows the toxicity evaluation results of the silicon chip-zinc oxide complex of the present invention to skin cells: human epidermal cells HaCaT (A), human skin fibroblasts Hs68 (B) and mouse melanocytes B16F10 (C). After the cells were co-cultured with zinc oxide-silica complex solutions at different concentrations (0, 1, 10, 100, 500, 1000, 5000ppm) for 24 hours, MTT analysis was performed to determine whether the cells were treated with zinc oxide-silica complex. The survival rate after treatment (expressed as a percentage relative to the survival rate of the untreated control group).

圖4為本發明之矽片-氧化鋅複合物的3D經皮吸收試驗,表皮組織經顯微400X放大之觀察結果。將16%(相當於1.6x105ppm)之矽片-氧化鋅複合物懸浮液塗覆於皮膚上,經過6小時(A)及24小時(B)之經皮吸收實驗後,以顯微鏡觀察表皮組織中ZnO/NSP顆粒之分布情形。於圖中圈出者係標示ZnO/NSP顆粒於各皮膚層的位置。 Figure 4 is a 3D transdermal absorption test of the silicon wafer-zinc oxide composite of the present invention, and the observation results of the epidermal tissue under a microscope at 400X magnification. 16% (equivalent to 1.6x10 5 ppm) silicon flake-zinc oxide complex suspension was applied to the skin. After 6 hours (A) and 24 hours (B) of transdermal absorption experiments, the epidermis was observed with a microscope. Distribution of ZnO/NSP particles in tissues. The circles in the figure indicate the positions of ZnO/NSP particles in each skin layer.

圖5為本發明之矽片-氧化鋅複合物與市售氧化鋅之全光譜掃描(200~600nm)圖譜比較結果。矽片-氧化鋅複合物之最大吸收出現在367nm,而市售氧化鋅之最大吸收出現在375nm,且本發明之矽片-氧化鋅複合物表現出有更強的UV吸收。 Figure 5 is a comparison result of the full spectrum scan (200~600nm) of the silicon wafer-zinc oxide composite of the present invention and commercially available zinc oxide. The maximum absorption of the silicon wafer-zinc oxide composite appears at 367 nm, while the maximum absorption of commercially available zinc oxide appears at 375 nm, and the silicon wafer-zinc oxide composite of the present invention exhibits stronger UV absorption.

圖6為球形馬拉色菌(Malassezia globosa)以(A)濃度0.1%之本發明矽片-氧化鋅複合物液體(以粉體形式配製於培養液),及(B)濃度1%之本發明矽片-氧化鋅複合物液體(以液體形式配製於培養液)之抑菌濃度檢測結果。 Figure 6 shows Malassezia globosa using (A) the silicon wafer-zinc oxide complex liquid of the present invention at a concentration of 0.1% (prepared in the culture medium in powder form), and (B) the concentration of 1%. The test results of the antibacterial concentration of the invented silicon wafer-zinc oxide complex liquid (prepared in liquid form in the culture medium).

本發明所述之“矽片”為一種將天然層狀黏土經過完全脫層而獲得的獨立片狀結構(亦稱為天然矽片,NSP),主要成分為水合及水可 分散之矽鋁氧化物(SiO2‧Al2O3‧xH2O),其陽離子交換當量(CEC)約為80-200mequiv/100g。矽片的製備方法已見於許多文獻(例如,US 6,765,050 B2),主要包含將天然黏土例如蒙脫土(montmorillonite)、去離子水(deionized water)、介面活性劑(surfactants)等原料置放入反應槽,經加熱及持續攪拌至脫層和分散的反應完成,即獲得一種改質蒙脫土(modified montmorillonite)的產品(灰色膠狀物),即所稱之“矽片”。 The "silica flakes" described in the present invention are an independent flake structure (also known as natural silicon flakes, NSP) obtained by complete delamination of natural layered clay. The main component is hydrated and water-dispersible silicon aluminum oxide. (SiO 2 ‧Al 2 O 3 ‧xH 2 O), its cation exchange equivalent (CEC) is about 80-200mequiv/100g. The preparation method of silicon wafers has been seen in many documents (for example, US 6,765,050 B2), which mainly includes placing natural clay such as montmorillonite (montmorillonite), deionized water (deionized water), surfactants and other raw materials into a reaction After heating and continuous stirring in the tank until the delamination and dispersion reactions are completed, a modified montmorillonite product (gray jelly) is obtained, which is called "silica flakes".

實施例1. 矽片-氧化鋅複合物之製備及物化特性分析Example 1. Preparation and analysis of physical and chemical properties of silicon wafer-zinc oxide composite

本發明之矽片-氧化鋅複合物的製造方法主要包括:將鋅鹽的水溶液加入矽片懸浮液中,進行金屬離子交換反應;加入NaOH,使矽片表面形成氫氧化鋅;在60℃~99℃下使氫氧化鋅脫水形成氧化鋅粒子,並吸附於矽片表面上,得到液態的矽片-氧化鋅複合物;液態矽片-氧化鋅複合物再經過濾,乾燥及研磨,即得到粉末狀的矽片-氧化鋅複合物。 The manufacturing method of the silicon wafer-zinc oxide composite of the present invention mainly includes: adding an aqueous solution of zinc salt into the silicon wafer suspension to perform a metal ion exchange reaction; adding NaOH to form zinc hydroxide on the surface of the silicon wafer; Zinc hydroxide is dehydrated at 99°C to form zinc oxide particles, which are adsorbed on the surface of silicon wafers to obtain a liquid silicon wafer-zinc oxide composite; the liquid silicon wafer-zinc oxide composite is then filtered, dried and ground to obtain Powdered silicon flake-zinc oxide composite.

以下提供一製造實例。將矽片稱重(0.85g)置於三頸圓底燒瓶(three-neck round-bottom flask)中,加入ddH2O使總重達約26g,並於80℃下攪拌30分鐘使其均質化,形成一矽片懸浮液。將醋酸鋅溶液(41g,1% w/w)加入該三頸圓底燒瓶中,並加入約5mL的ddH2O清洗。置於80℃下,以500rpm之轉速攪拌30分鐘。將氫氧化鈉溶液(22g,1% w/w)加入該三頸圓底燒瓶中,並加入約5mL的ddH2O清洗。將混合物於80℃下,以500rpm之轉速反應1小時,然後置於室溫下冷卻。待冷卻至室溫後,即得到液態的矽片-氧化鋅複合物。將該產物使用抽氣過濾。收集濾餅,並於120℃下進行乾燥直到水分含量低於5%。最後將乾燥的產物進行研磨,得到呈粉末狀的矽片-氧化鋅複合物。 A manufacturing example is provided below. Weigh the silicon wafer (0.85g) and place it in a three-neck round-bottom flask, add ddH 2 O to bring the total weight to about 26g, and stir at 80°C for 30 minutes to homogenize. , forming a silicon chip suspension. Zinc acetate solution (41 g, 1% w/w) was added to the three-neck round bottom flask, and approximately 5 mL of ddH 2 O was added for cleaning. Place at 80°C and stir at 500 rpm for 30 minutes. Sodium hydroxide solution (22g, 1% w/w) was added to the three-neck round-bottom flask, and approximately 5 mL of ddH2O was added for cleaning. The mixture was reacted at 80° C. at a rotation speed of 500 rpm for 1 hour, and then cooled at room temperature. After cooling to room temperature, a liquid silicon wafer-zinc oxide composite is obtained. The product was filtered using suction. The filter cake is collected and dried at 120°C until the moisture content is less than 5%. Finally, the dried product is ground to obtain a powdered silicon flake-zinc oxide composite.

在SEM(HITACHI SU-5000)觀察下,吸附在矽片上的ZnO粒子會互相聚集而呈現3D立體的球狀結構,於SEM下,看到整片滿滿的都是ZnO,而矽片則在下面被覆蓋住。配合laser scattering的數據,亦顯示ZnO顆粒堆疊之後能變成更大的3D聚集(圖1)。 Under SEM (HITACHI SU-5000) observation, the ZnO particles adsorbed on the silicon wafer will aggregate with each other and present a 3D spherical structure. Under SEM, it can be seen that the entire wafer is full of ZnO, while the silicon wafer is Covered underneath. Combined with laser scattering data, it also shows that ZnO particles can become larger 3D aggregates after stacking (Figure 1).

為了進一步檢視ZnO的個別顆粒與堆積型態,遂將所得到的粉末狀矽片-氧化鋅複合物分散後,以穿透式電子顯微鏡(TEM,JEOL JEM-3010)進行觀察。如圖2A所示,矽片呈現2D展開,其表面上附著分散的ZnO顆粒,矽片-氧化鋅複合物之粒徑分佈主要落於1.0μm至20.0μm之範圍內。接著將粉末型態的矽片-氧化鋅複合物進行X光繞射分析(X-ray Diffraction),結果參見圖2B。使用Scherrer equation(

Figure 111126539-A0101-12-0005-18
)計算ZnO顆粒的平均粒徑,算得每個ZnO本身的粒子大小係介於15~20nm,約為17nm左右(以primary structure原始晶格計算,ZnO具有良好晶格)。 In order to further examine the individual particles and stacking patterns of ZnO, the obtained powdered silicon flake-zinc oxide composite was dispersed and observed with a transmission electron microscope (TEM, JEOL JEM-3010). As shown in Figure 2A, the silicon wafer unfolds in 2D, with dispersed ZnO particles attached to its surface. The particle size distribution of the silicon wafer-zinc oxide composite mainly falls in the range of 1.0 μm to 20.0 μm. Then, the powdered silicon wafer-zinc oxide composite was subjected to X-ray diffraction analysis (X-ray Diffraction). The results are shown in Figure 2B. Use the Scherrer equation(
Figure 111126539-A0101-12-0005-18
) Calculate the average particle size of ZnO particles and find that the particle size of each ZnO itself is between 15 and 20nm, about 17nm (calculated based on the original lattice of the primary structure, ZnO has a good lattice).

沈降分析。使用RO水配製不同濃度(100、200、300、500、1000ppm)的ZnO或NSP-ZnO溶液,各吸取5mL的溶液至試管中,經震盪呈均勻白色懸浮液後,靜置觀察底部白色沉澱出現,並記錄其時間。 Settlement analysis. Use RO water to prepare ZnO or NSP-ZnO solutions with different concentrations (100, 200, 300, 500, 1000ppm). Take 5 mL of each solution into a test tube. After shaking to form a uniform white suspension, let it stand and observe the appearance of white precipitate at the bottom. , and record its time.

Figure 111126539-A0101-12-0005-1
Figure 111126539-A0101-12-0005-1

實施例2. 矽片-氧化鋅複合物對皮膚細胞之毒性測試Example 2. Toxicity test of silicon wafer-zinc oxide composite to skin cells

將三種皮膚細胞株(人類表皮形成細胞HaCaT、人類皮膚纖維母細胞Hs68、小鼠黑色素細胞B16F10)各以2×105cells/mL之濃度接種於96well培養盤的各孔內,於37℃培養箱中培養過夜使其黏著。加入不同濃度(0、1、10、100、500、1000、5000ppm)之矽片-氧化鋅複合物溶液,與細胞共培養24小時。之後將培養液去除,並將100μL之MTT(溴化3-(4,5-二甲基噻唑-2-基)-2,5-二苯基四唑)溶液(1mg/mL)加入各孔中,培育2小時,之後將MTT溶液去除。於各孔中加入DMSO,並於波長595nm下測量吸光值。由圖3A-3C之結果顯示,經過與本發明之矽片-氧化鋅複合物溶液作用24小時後,人類表皮形成細胞HaCaT在濃度10ppm下的細胞存活率為51.78%,在濃度100ppm下細胞存活率為9.49%(圖3A);人類皮膚纖維母細胞Hs6在濃度1ppm下細胞存活率為68.57%,在濃度10ppm細胞存活率為14.47%(圖3B);小鼠皮膚黑色素瘤細胞在濃度1ppm下細胞存活率為88.39%,在濃度10ppm下細胞存活率為38.68%(圖3C),據此推算出本發明之矽片-氧化鋅複合物對於表皮形成細胞HaCaT、人類皮膚纖維母細胞及黑色素細胞B16F10的IC50劑量,分別為14.39ppm、3.12ppm及7.16ppm。 Three skin cell lines (human epidermal cell HaCaT, human dermal fibroblast Hs68, mouse melanocyte B16F10) were each inoculated into each well of a 96well culture plate at a concentration of 2×10 5 cells/mL, and cultured at 37°C. Incubate overnight in the box to allow adhesion. Add silicon wafer-zinc oxide complex solutions of different concentrations (0, 1, 10, 100, 500, 1000, 5000 ppm) and co-culture with the cells for 24 hours. Afterwards, the culture medium was removed, and 100 μL of MTT (3-(4,5-dimethylthiazol-2-yl)-2,5-diphenyltetrazole bromide) solution (1 mg/mL) was added to each well. incubate for 2 hours, after which the MTT solution is removed. Add DMSO to each well, and measure the absorbance value at a wavelength of 595 nm. The results shown in Figures 3A-3C show that after 24 hours of interaction with the silicon wafer-zinc oxide complex solution of the present invention, the cell survival rate of human epidermal forming cells HaCaT at a concentration of 10 ppm was 51.78%, and the cell survival rate at a concentration of 100 ppm was 51.78%. The cell survival rate of human skin fibroblast Hs6 was 68.57% at a concentration of 1 ppm, and the cell survival rate was 14.47% at a concentration of 10 ppm (Fig. 3B); the survival rate of mouse skin melanoma cells at a concentration of 1 ppm The cell survival rate was 88.39%, and the cell survival rate at a concentration of 10 ppm was 38.68% (Fig. 3C). Based on this, it was deduced that the silicon wafer-zinc oxide complex of the present invention has an effect on epidermal forming cells HaCaT, human skin fibroblasts and melanocytes. The IC50 doses of B16F10 are 14.39ppm, 3.12ppm and 7.16ppm respectively.

另外,依據OECD的眼睛和皮膚刺激性測試(OECD TG 439 Skin Irritation Test)指引,進行矽片-氧化鋅複合物的皮膚和眼睛刺激性測試,所得結果顯示,矽片-氧化鋅複合物混和於純水的20%水溶液,對於皮膚和眼睛無產生刺激性(NI,Non-irritant)。 In addition, according to the OECD TG 439 Skin Irritation Test guidelines, the skin and eye irritation test of the silicon wafer-zinc oxide complex was conducted. The results showed that the silicon wafer-zinc oxide complex was mixed with A 20% aqueous solution of pure water, non-irritating to skin and eyes (NI, Non-irritant).

ZnO/NSP經皮吸收/顯微鏡檢視 ZnO/NSP percutaneous absorption/microscopic examination

ZnO/NSP(16%)之3D Skin經皮吸收實驗3D Skin transdermal absorption experiment of ZnO/NSP (16%)

本實驗係以人類重組表皮組織MatTek,EPI-200-SIT(表面積:0.6cm2)為3D skin材料來源,進行濃度為16%之NSP-ZnO懸浮液(實驗樣品)的經皮吸收測試,以未含16%實驗樣品的皮下液體(DMEM medium)為對照組。將0.05mL的16%樣品放置於3D skin上,皮下則放置1.0mL的培養液(DMEM medium)。於6及24小時經皮吸收作用後,吸出3D skin上的樣品,並稍微以培養液沖洗表面。收集皮下培養液和3D skin並冷藏。將各實驗組收集到的皮下培養液和3D skin送交SGS檢測矽和鋅的含量,檢測方法為ICP/OES,檢測極限:Si:10ppm,Zn:1.0ppm。 This experiment uses human recombinant epidermal tissue MatTek, EPI-200-SIT (surface area: 0.6cm 2 ) as the source of 3D skin material, and conducts a percutaneous absorption test of NSP-ZnO suspension (experimental sample) with a concentration of 16%. The subcutaneous fluid (DMEM medium) without 16% experimental sample was the control group. Place 0.05mL of 16% sample on the 3D skin, and place 1.0mL of culture medium (DMEM medium) under the skin. After 6 and 24 hours of transdermal absorption, aspirate the sample on the 3D skin and slightly rinse the surface with culture solution. Collect subcutaneous culture fluid and 3D skin and refrigerate. The subcutaneous culture fluid and 3D skin collected from each experimental group were sent to SGS to detect the content of silicon and zinc. The detection method was ICP/OES, and the detection limits were: Si: 10ppm, Zn: 1.0ppm.

已知皮膚組織上的NSP-ZnO Hybrid懸浮液之濃度為16%,亦即160,000ppm;假設NSP:ZnO(重量比)=44.8:55.2,則可計算得下表之數據。由下表2之數據顯示,NSP-ZnO於實驗過程中進到表下組織是很微量的,通過皮膚的比率極低。 It is known that the concentration of NSP-ZnO Hybrid suspension on skin tissue is 16%, which is 160,000ppm; assuming NSP: ZnO (weight ratio) = 44.8: 55.2, the data in the table below can be calculated. The data in Table 2 below shows that a very small amount of NSP-ZnO entered the subsurface tissue during the experiment, and the rate of passing through the skin was extremely low.

Figure 111126539-A0101-12-0007-2
Figure 111126539-A0101-12-0007-2

ZnO/NSP(16%)之3D Skin經皮吸收(顯微鏡檢視)3D Skin percutaneous absorption of ZnO/NSP (16%) (microscopic examination)

進一步以顯微鏡檢視NSP-ZnO顆粒的經皮吸收情形。將如上述經過6及24小時的經皮吸收實驗後,吸出人類表皮組織上的多餘樣品,再以DMEM培養基稍微沖洗。之後,以石蠟包埋表皮組織,並以H&E染色及組織切片。以光學顯微鏡觀察表皮組織的上層。 The percutaneous absorption of NSP-ZnO particles was further examined under a microscope. After 6 and 24 hours of transdermal absorption experiments as described above, the excess samples on the human epidermal tissue were aspirated, and then slightly rinsed with DMEM culture medium. Afterwards, the epidermal tissue was embedded in paraffin, stained with H&E and sectioned. Observe the upper layer of epidermal tissue using a light microscope.

由圖4A-4B之結果顯示,無論6小時實驗之組別或者24小時實驗之組別,均發現在皮膚的角質層外部有NSP-ZnO的殘留顆粒。24小時的組別角質層顯得更為鬆散些,並且最外部的角質層有部分剝離的現象。但並未觀察到,角質層內部或者顆粒層細胞有明顯之NSP-ZnO顆粒。顯示,NSP-ZnO粒子於實驗過程中進到表皮組織內部的量很低,幾乎看不到。 The results shown in Figures 4A-4B show that regardless of the 6-hour experimental group or the 24-hour experimental group, residual particles of NSP-ZnO were found outside the stratum corneum of the skin. The stratum corneum of the 24-hour group appeared looser, and the outermost stratum corneum was partially peeled off. However, no obvious NSP-ZnO particles were observed inside the stratum corneum or in the granular layer cells. It was shown that the amount of NSP-ZnO particles entering the epidermal tissue during the experiment was very low and almost invisible.

實施例3. 矽片-氧化鋅複合物之皮膚保護功效測試Example 3. Skin protection efficacy test of silicon wafer-zinc oxide complex

紫外線吸收能力UV absorbing ability

由圖5之全光譜掃描(200~600nm)比較結果可以明顯看出,本發明之矽片-氧化鋅複合物表現出具有更強的UV吸收能力。NSP-ZnO之最大吸收在367nm,較市售ZnO(最大吸收在375nm)往左位移,這與ZnO粒子的大小有關,當顆粒的體積越小,需要表現表面電漿共振(Surface plasmon resonance,SPR)所需頻率上升,因此吸收波長將會下降。顯示附載於本發明矽片-氧化鋅複合物上的氧化鋅顆粒其粒子明顯較市售ZnO粒子小,對於紫外線的吸收能力相對上也更好。 It can be clearly seen from the comparison results of the full spectrum scan (200~600nm) in Figure 5 that the silicon wafer-zinc oxide composite of the present invention exhibits stronger UV absorption ability. The maximum absorption of NSP-ZnO is at 367nm, which is shifted to the left compared with commercially available ZnO (maximum absorption at 375nm). This is related to the size of ZnO particles. When the size of the particles is smaller, it needs to express surface plasmon resonance (SPR). ) the required frequency increases, so the absorption wavelength will decrease. It is shown that the zinc oxide particles attached to the silicon wafer-zinc oxide composite of the present invention have significantly smaller particles than commercially available ZnO particles, and have relatively better ultraviolet absorption capabilities.

消光係數分析Extinction coefficient analysis

摩爾消光係數,也稱為摩爾吸收率,是衡量化學物質在特定波長下吸收光的強度的量度。它是物種的固有屬性;根據比爾-朗伯定律 (Beer-Lambert law),公式為A=ε cl,其中A=吸光值,c=濃度,l=細胞長度,ε的單位通常為M-1cm-1或L mol-1cm-1。消光係數的另一個度量是E1,1(質量消光係數)。E1,1是1%溶液的吸光度,單位為g-1L cm-1。ε和E1,1可以使用以下等式進行轉換:ε=(E1,1*分子量)/10。 Molar extinction coefficient, also known as molar absorptivity, is a measure of how strongly a chemical absorbs light at a specific wavelength. It is an inherent property of the species; according to Beer-Lambert law, the formula is A=ε cl, where A=absorbance value, c=concentration, l=cell length, and the unit of ε is usually M-1cm -1 or L mol-1cm -1 . Another measure of extinction coefficient is E1,1 (mass extinction coefficient). E 1,1 is the absorbance of 1% solution in g-1L cm-1. ε and E 1,1 can be converted using the following equation: ε = (E 1,1 *molecular weight)/10.

實驗方法:首先,製備1.0mg/mL的ZnO/NSP複合物和市售氧化鋅的懸浮液。以Spectrophotometer進行UV/可見光的全光譜掃描(200~600nm)及消光係數的計算。1.0mg/mL的ZnO/NSP Hybrid的最大吸光度為367nm;1.0mg/mL的市售ZnO的最大吸光度為375nm。 Experimental method: First, prepare a suspension of 1.0 mg/mL ZnO/NSP complex and commercially available zinc oxide. Use Spectrophotometer to perform full spectrum scanning of UV/visible light (200~600nm) and calculation of extinction coefficient. The maximum absorbance of ZnO/NSP Hybrid at 1.0mg/mL is 367nm; the maximum absorbance of commercially available ZnO at 1.0mg/mL is 375nm.

Figure 111126539-A0101-12-0009-3
Figure 111126539-A0101-12-0009-3

消光係數越高,表示其遮光能力越好。由以上結果可以比較出,無論以哪一種公式來計算,本發明之矽片-氧化鋅複合物(ZnO/NSP)比市售ZnO有更高的消光係數。若以E1,1(質量消光係數)來考量將100% ZnO進行改質成ZnO/NSP複合物後,其消光係數約增加了37%,此結果也可能是來自於本發明吸附於矽片上之氧化鋅,具有更小粒徑及更佳分散度的效應所致。綜合上述結果,本發明之矽片-氧化鋅複合物(ZnO/NSP)比市售ZnO,能提供皮膚更佳的紫外光防護效果。 The higher the extinction coefficient, the better its light-shielding ability. From the above results, it can be concluded that no matter which formula is used to calculate, the silicon wafer-zinc oxide composite (ZnO/NSP) of the present invention has a higher extinction coefficient than commercially available ZnO. If E1,1 (mass extinction coefficient) is considered, after 100% ZnO is modified into a ZnO/NSP composite, its extinction coefficient increases by approximately 37%. This result may also come from the adsorption of the present invention on the silicon wafer. Zinc oxide has smaller particle size and better dispersion effect. Based on the above results, the silicon wafer-zinc oxide composite (ZnO/NSP) of the present invention can provide better UV protection effect on the skin than commercially available ZnO.

抑菌功效Antibacterial effect

測試本發明矽片-氧化鋅複合物對五種致病菌(黑麴菌(Aspergillus brasiliensis,ATCC 16404)、金黃葡萄球菌(Staphylococcus aureus,ATCC 6538)、大腸桿菌(Escherichia coli,ATCC 8739)、白色念珠菌(Candida albicans,ATCC 10231)、綠膿桿菌(Pseudomonas aeruginosa,ATCC 9027)之抑菌效果。以不含樣品之菌種懸浮液為陰性對照組(預期不具有抗菌效果);含抗生素之菌種懸浮液為陽性對照組(預期具有抗菌效果);空白對照組為不含菌種懸浮液之培養基,各組的接種菌量為105~106cfu/mL的菌液。接種後,於各菌種最適的生長絛件培養(好氧細菌:35℃±2.0℃;酵母菌:32℃±2.0℃;黴菌:25℃±2.0℃)下,以200rpm震盪培養18~72小時。培養完成後,取出培養液,接種於含有以培養液調配NSP-ZnO Hybrid樣品至實驗需求的濃度的培養基上,於各菌種最適的生長絛件下培養(好氧細菌:35℃±2.0℃;24小時;酵母菌:32℃±2.0℃;48小時;黴菌:25℃±2.0℃;72~96小時),觀察生長狀況並記錄最小抑菌濃度。 The silicon chip-zinc oxide composite of the present invention was tested against five pathogenic bacteria ( Aspergillus brasiliensis , ATCC 16404), Staphylococcus aureus (ATCC 6538), Escherichia coli (ATCC 8739), white Antibacterial effect of Candida albicans (ATCC 10231) and Pseudomonas aeruginosa (ATCC 9027). The bacterial suspension without sample was used as the negative control group (not expected to have antibacterial effect); bacteria containing antibiotics The seed suspension is the positive control group (expected to have antibacterial effect); the blank control group is the culture medium without the strain suspension. The inoculation amount of each group is 10 5 ~ 10 6 cfu/mL of bacterial liquid. After inoculation, Cultivation in the optimal growth environment for each strain (aerobic bacteria: 35°C ± 2.0°C; yeast: 32°C ± 2.0°C; mold: 25°C ± 2.0°C), shaking at 200 rpm for 18 to 72 hours. The culture is completed After that, take out the culture medium, inoculate it on the medium containing the NSP-ZnO Hybrid sample prepared with the culture medium to the concentration required for the experiment, and culture it under the optimal growth conditions of each bacterial species (aerobic bacteria: 35℃±2.0℃; 24 hours; yeast: 32℃±2.0℃; 48 hours; mold: 25℃±2.0℃; 72~96 hours), observe the growth status and record the minimum inhibitory concentration.

Figure 111126539-A0101-12-0010-4
Figure 111126539-A0101-12-0010-4

為確定此等抑菌功效之提昇是來自本發明之矽片-氧化鋅複合物,遂進一步比較矽片(NSP)、氧化鋅(ZnO)及矽片-氧化鋅複合物(ZnO/NSP)對於大腸桿菌E.coli之抑菌活性。將濃度為0、50、70、100、200、500ppm之矽片、氧化鋅及矽片-氧化鋅複合物溶液,與大腸桿菌(1x106CFU/mL)培養8小時(37℃,200rpm),之後測量各培養液的OD600數值。結果列於下表5。 In order to confirm that the improvement in antibacterial efficacy comes from the silicon wafer-zinc oxide complex of the present invention, the effects of silicon wafer (NSP), zinc oxide (ZnO) and silicon wafer-zinc oxide complex (ZnO/NSP) were further compared. Antibacterial activity of E.coli . Incubate silicon flakes, zinc oxide and silicon flake-zinc oxide complex solutions with concentrations of 0, 50, 70, 100, 200 and 500ppm with E. coli (1x10 6 CFU/mL) for 8 hours (37°C, 200rpm). Then measure the OD600 value of each culture solution. The results are listed in Table 5 below.

Figure 111126539-A0101-12-0011-5
Figure 111126539-A0101-12-0011-5

結果顯示,單純的矽片(NSP)在低於500ppm的濃度下,不具有抑菌活性;氧化鋅(ZnO)在200ppm濃度下才顯現具有抑菌活性;而本發明之矽片-氧化鋅複合物(ZnO/NSP)在70ppm濃度下即具有抑菌活性,表示附載於矽片上的氧化鋅確實能提昇其抑菌功效。 The results show that pure silicon flakes (NSP) do not have antibacterial activity at a concentration lower than 500ppm; zinc oxide (ZnO) only shows antibacterial activity at a concentration of 200ppm; and the silicon flake-zinc oxide composite of the present invention The compound (ZnO/NSP) has antibacterial activity at a concentration of 70ppm, indicating that the zinc oxide attached to the silicon wafer can indeed enhance its antibacterial effect.

矽片-氧化鋅複合物對皮屑芽胞菌之抑菌濃度測試Test of the inhibitory concentration of silicon wafer-zinc oxide complex against Bacillus dandruff

檢驗方法係參照Andrews JM.,J Antimicrobio Chemother 48 suppl 1:5-16,2001所述之方法。球形馬拉色菌(Malassezia globosa,BCRC 23114)於30℃±2℃;好氧環境;培養5天。菌量調配至期望菌數為1.5 x108CFU/mL。實驗組及對照組個別添加接種量為1%之菌液,最終添加菌量為104~105CFU/mL。將不含樣品之菌種懸浮培養液(對照組,pH 5.40 at 25℃)進行序列稀釋,經培養後觀察生長狀況並記錄。實驗組為:FS21092401S4(由NSP-ZnO複合物粉體以培養液配製成0.1%液體,pH 5.86 at 25℃);及FS21092402S4(由NSP-ZnO複合物液體以培養液配製成1%液體,pH 6.18 at 25℃)。接種後對照組與實驗組分別於作用條件(30℃±2℃;好氧環境;作用48小時)進行作用。於第24小時及第48小時進行序列稀釋,經培養後觀察生長狀況並記錄。結果如下表6所示。 The testing method is based on the method described in Andrews JM., J Antimicrobio Chemother 48 suppl 1:5-16, 2001. Malassezia globosa (BCRC 23114) was cultured at 30℃±2℃ in an aerobic environment for 5 days. The bacterial quantity is adjusted to the desired bacterial count of 1.5 x10 8 CFU/mL. The experimental group and the control group were individually added with bacterial solution with an inoculation amount of 1%, and the final bacterial amount added was 10 4 ~ 10 5 CFU/mL. Serially dilute the bacterial suspension culture medium without samples (control group, pH 5.40 at 25°C), and observe and record the growth status after cultivation. The experimental groups are: FS21092401S4 (prepared from NSP-ZnO compound powder with culture medium to 0.1% liquid, pH 5.86 at 25°C); and FS21092402S4 (prepared from NSP-ZnO compound liquid with culture medium to 1% liquid , pH 6.18 at 25℃). After vaccination, the control group and the experimental group were treated respectively under the action conditions (30℃±2℃; aerobic environment; 48 hours of action). Serial dilutions were performed at 24 hours and 48 hours, and the growth status was observed and recorded after culture. The results are shown in Table 6 below.

減菌率(%)之計算公式: Calculation formula of bacterial reduction rate (%):

Figure 111126539-A0101-12-0012-6
Figure 111126539-A0101-12-0012-6

Figure 111126539-A0101-12-0012-7
Figure 111126539-A0101-12-0012-7

另由圖6之結果顯示,本發明之矽片-氧化鋅複合物(ZnO/NSP),不論是以粉體或液體製備成的液體,在1000ppm濃度下,可觀察到球形馬拉色菌的生長完全受到抑制。 In addition, the results in Figure 6 show that the silicon wafer-zinc oxide composite (ZnO/NSP) of the present invention, whether it is prepared as powder or liquid, can observe the growth of Malassezia spherica at a concentration of 1000 ppm. Growth is completely inhibited.

實施例4. 矽片-氧化鋅複合物之化妝品組合物製備例Example 4. Preparation Example of Cosmetic Composition of Silicon Chip-Zinc Oxide Complex

防曬乳液 sunscreen lotion

下表所列為防曬乳液組合物(W/O乳液(emulsion))的一組成配方例。依習知的乳液製作流程,將本發明之矽片-氧化鋅複合物(ZnO/NSP)以先入水相的方式製成W/O乳液。 The following table lists a formula example of a sunscreen emulsion composition (W/O emulsion). According to the conventional emulsion production process, the silicon wafer-zinc oxide composite (ZnO/NSP) of the present invention is first introduced into the water phase to prepare a W/O emulsion.

Figure 111126539-A0101-12-0013-8
Figure 111126539-A0101-12-0013-8

下表所列為防曬乳液組合物(W/O乳液(emulsion))的一組成配方例。依習知的乳液製作流程,將本發明之矽片-氧化鋅複合物(ZnO/NSP)以先入油相的方式製成W/O乳液。 The following table lists a formula example of a sunscreen emulsion composition (W/O emulsion). According to the conventional emulsion production process, the silicon wafer-zinc oxide composite (ZnO/NSP) of the present invention is first introduced into the oil phase to prepare a W/O emulsion.

Figure 111126539-A0101-12-0014-9
Figure 111126539-A0101-12-0014-9

另以市售ZnO(為親油性)以先入油相的方式製成W/O乳液。將所得之各乳液進行防曬測試。防曬係數SPF(Sun Protection Factor)、UVAP及Star Rating分別為UVB及UVA防護效能指標,本實例係使用UVA(320-400nm)及UVB(290-320nm)照射塗布有測試乳液的PMMA substrate,經由積分球收集穿透後的光,檢驗各測試乳液在290-400nm區間每隔1nm之穿透率,並以UV-2600之SPF Calculator軟體換算,而求得SPF值、UVAP及Star Rating。下表7為檢測結果。 In addition, commercially available ZnO (which is lipophilic) was used to prepare a W/O emulsion by entering the oil phase first. Each emulsion obtained was tested for sun protection. SPF (Sun Protection Factor), UVAP and Star Rating are UVB and UVA protection effectiveness indicators respectively. In this example, UVA (320-400nm) and UVB (290-320nm) are used to irradiate the PMMA substrate coated with the test emulsion. After integration The ball collects the light after penetration, checks the transmittance of each test emulsion every 1nm in the 290-400nm range, and converts it with the UV-2600 SPF Calculator software to obtain the SPF value, UVAP and Star Rating. Table 7 below shows the test results.

Figure 111126539-A0101-12-0015-10
Figure 111126539-A0101-12-0015-10

本發明以矽片-氧化鋅複合物製成的乳液為親水性,先以水相分散,相較於以市售氧化鋅,先以油相分散製成的乳液為親油性。微米級(micro grade)矽片-氧化鋅複合物的粉體,易於水中分散及操作,且不易聚集。其所製成的乳液塗抹於皮膚上,不會產生白感,更有不油膩及清爽的感覺,以及易於臉部的御妝或身體的清洗等優點。 The emulsion made of the silicon wafer-zinc oxide composite in the present invention is hydrophilic and is first dispersed in the water phase. Compared with commercially available zinc oxide, the emulsion is first dispersed in the oil phase and is lipophilic. Micro grade silicon flake-zinc oxide composite powder is easy to disperse and operate in water, and is not easy to aggregate. The emulsion made by it will not produce a white feeling when applied to the skin. It has a non-greasy and refreshing feeling, and is easy to apply makeup on the face or clean the body.

抗屑洗髮精 Anti-dandruff shampoo

下表所列為添加1%本發明矽片-氧化鋅複合物液體之抗屑洗髮精的一組成配方例。 The following table lists a formula example of an anti-dandruff shampoo adding 1% of the silicon flake-zinc oxide complex liquid of the present invention.

Figure 111126539-A0101-12-0015-11
Figure 111126539-A0101-12-0015-11

依習知的洗髮精製作流程,將本發明之矽片-氧化鋅複合物(ZnO/NSP),以液態的ZnO含量為4.2%添加在習知的洗髮精配方中,製成其中含有相當於420ppm ZnO的洗髮精產品(YH-040洗髮精)。另製備添加液態的ZnO為含量2%之洗髮精產品(YH-040-1洗髮精)。 According to the conventional shampoo production process, the silicon flake-zinc oxide composite (ZnO/NSP) of the present invention is added to the conventional shampoo formula with a liquid ZnO content of 4.2% to prepare a formula containing A shampoo product equivalent to 420ppm ZnO (YH-040 shampoo). In addition, a shampoo product (YH-040-1 shampoo) with a content of 2% added liquid ZnO was prepared.

結合前述實施例2及3之試驗結果,本發明之矽片-氧化鋅複合物具有抑制皮屑芽胞菌的功效。相較於市售的Zinc Pyrithione(ZPT,歐盟已於2022年3月開始禁用),本發明之ZnO-NSP因不具毒性,適於每天使用,可提供頭髮生長的必要營養素及抑制頭皮微生物的滋生,維護頭皮健康的環境。 Combining the test results of the above-mentioned Examples 2 and 3, the silicon chip-zinc oxide composite of the present invention has the effect of inhibiting Bacillus dandruff. Compared with commercially available Zinc Pyrithione (ZPT, which has been banned by the European Union since March 2022), the ZnO-NSP of the present invention is non-toxic and suitable for daily use. It can provide necessary nutrients for hair growth and inhibit the growth of scalp microorganisms. , maintain a healthy scalp environment.

綜合上述,本發明之矽片-氧化鋅複合物具有親水性,其粉體易於水中分散及操作,且不會聚集。製成的產品塗抹於皮膚上不會產生刺激性與令消費者不適的白感,更有不油膩及清爽的感覺。尤其本發明以矽片作為氧化鋅顆粒之載體,可使氧化鋅粒子能更均勻分散、吸附於矽片上,藉以提升其紫外線吸收能力與抑菌功效,不僅可有效降低氧化鋅的使用量,亦經實驗證明對於皮膚細胞不具毒性,且穿透至皮膚內部組織的量極低,可安全應用於皮膚保護之組合物,特別是施用於人類皮膚的化妝品組合物。 Based on the above, the silicon wafer-zinc oxide composite of the present invention is hydrophilic, and its powder is easy to disperse and handle in water, and will not aggregate. The finished product will not produce irritation or a white feeling that makes consumers uncomfortable when applied to the skin, and it will also feel non-greasy and refreshing. In particular, the present invention uses silicon flakes as the carrier of zinc oxide particles, which can make the zinc oxide particles more evenly dispersed and adsorbed on the silicon flakes, thereby improving its ultraviolet absorption capacity and antibacterial effect. It can not only effectively reduce the usage of zinc oxide, It has also been proven by experiments that it is not toxic to skin cells, and the amount of penetration into the internal tissues of the skin is extremely low. It can be safely used in skin protection compositions, especially cosmetic compositions applied to human skin.

Claims (9)

一種矽片-氧化鋅複合物(ZnO-on-silicate platelet composite)用於製備皮膚保護組合物之用途,其中該矽片-氧化鋅複合物係藉由將鋅鹽的水溶液加入矽片懸浮液中進行金屬離子交換反應,並利用NaOH使矽片表面形成氫氧化鋅,再經脫水形成氧化鋅粒子並吸附於矽片表面而製成。 A use of a silicon flake-on-silicate platelet composite (ZnO-on-silicate platelet composite) for preparing a skin protection composition, wherein the silicon flake-zinc oxide composite is made by adding an aqueous solution of zinc salt to a silicon flake suspension It is made by carrying out a metal ion exchange reaction, using NaOH to form zinc hydroxide on the surface of the silicon wafer, and then dehydrating it to form zinc oxide particles and adsorbing them on the surface of the silicon wafer. 如請求項1所述之用途,其中該組合物為一化妝品組合物。 The use as claimed in claim 1, wherein the composition is a cosmetic composition. 如請求項1所述之用途,其中該組合物係用於保護皮膚防止細菌感染。 The use as claimed in claim 1, wherein the composition is used to protect skin from bacterial infection. 一種用於保護皮膚之化妝品組合物,包含一5%-25%之矽片-氧化鋅複合物及載劑、賦形劑或稀釋劑,其中該矽片-氧化鋅複合物係藉由將鋅鹽的水溶液加入矽片懸浮液中進行金屬離子交換反應,並利用NaOH使矽片表面形成氫氧化鋅,再經脫水形成氧化鋅粒子並吸附於矽片表面而製成。 A cosmetic composition for protecting skin, comprising a 5%-25% silicon flake-zinc oxide complex and a carrier, excipient or diluent, wherein the silicon flake-zinc oxide complex is prepared by adding zinc The aqueous salt solution is added to the silicon wafer suspension to perform a metal ion exchange reaction, and NaOH is used to form zinc hydroxide on the surface of the silicon wafer, which is then dehydrated to form zinc oxide particles and adsorbed on the surface of the silicon wafer. 如請求項4所述之化妝品組合物,其中該化妝品組合物為一皮膚防護乳霜或乳液。 The cosmetic composition of claim 4, wherein the cosmetic composition is a skin protective cream or lotion. 如請求項5所述之化妝品組合物,其中該化妝品組合物為一防曬乳液。 The cosmetic composition according to claim 5, wherein the cosmetic composition is a sunscreen lotion. 如請求項4所述之化妝品組合物,其中該化妝品組合物為一護膚清潔產品。 The cosmetic composition according to claim 4, wherein the cosmetic composition is a skin care cleansing product. 如請求項7所述之化妝品組合物,其中該化妝品組合物為一洗髮精/乳。 The cosmetic composition as claimed in claim 7, wherein the cosmetic composition is a shampoo/milk. 如請求項4所述之化妝品組合物,其中該化妝品組合物為一養髮液(hair tonic)。 The cosmetic composition according to claim 4, wherein the cosmetic composition is a hair tonic.
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期刊 Camila O. Vieira ZnO:SBA-15 Nanocomposites for Potential Use in Sunscreen: Preparation, Properties, Human Skin Penetration and Toxicity Skin Pharmacol Physiol 32 2019 32-42 *

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