TWI823069B - Gold evaporation materials - Google Patents

Gold evaporation materials Download PDF

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TWI823069B
TWI823069B TW110108851A TW110108851A TWI823069B TW I823069 B TWI823069 B TW I823069B TW 110108851 A TW110108851 A TW 110108851A TW 110108851 A TW110108851 A TW 110108851A TW I823069 B TWI823069 B TW I823069B
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gold
evaporation
evaporation material
gold evaporation
granular
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TW202214884A (en
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高田英士
小林孝
仲野幸健
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日商松田產業股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C5/00Alloys based on noble metals
    • C22C5/02Alloys based on gold
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation

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  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
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  • Organic Chemistry (AREA)
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  • Physical Vapour Deposition (AREA)
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Abstract

本發明之金之蒸鍍材料係真空蒸鍍法中使用的粒狀之金之蒸鍍材料,其特徵在於:金之蒸鍍材料之平均結晶粒徑為0.1mm以上,氧含量為10wtppm以下,且氫含量為5wtppm以下。本發明之課題在於提供一種金之蒸鍍材料,其係真空蒸鍍法中使用的粒狀(珠)之金之蒸鍍材料,且於真空蒸鍍時可抑制爆沸現象。 The gold evaporation material of the present invention is a granular gold evaporation material used in a vacuum evaporation method. It is characterized in that: the average crystal grain size of the gold evaporation material is 0.1mm or more, and the oxygen content is 10wtppm or less. And the hydrogen content is below 5wtppm. The subject of the present invention is to provide a gold evaporation material, which is a granular (bead) gold evaporation material used in a vacuum evaporation method, and can suppress the bumping phenomenon during vacuum evaporation.

Description

金之蒸鍍材料 Gold evaporation materials

本發明係關於一種真空蒸鍍法中使用之金之蒸鍍材料。The invention relates to a gold evaporation material used in a vacuum evaporation method.

真空蒸鍍法係成膜技術之一,係於真空中對蒸發材料進行加熱,使成為氣體分子之蒸鍍材料附著於基板上,從而形成薄膜之技術。可於玻璃、塑膠、膜、金屬等進行蒸鍍(成膜),真空蒸鍍法廣泛用於電子零件、半導體裝置、光學薄膜、磁性裝置、LED、有機EL、LCD等中之元件之形成。作為蒸鍍材料,可使用金、銀、鉑、鈀等貴金屬或銅、鋁、鉻、錫等非鐵金屬,進而,不僅金屬能夠成膜,氧化物等非金屬亦能夠成膜。Vacuum evaporation is one of the film-forming technologies. It is a technology that heats the evaporation material in a vacuum so that the evaporation material becomes gas molecules and adheres to the substrate, thereby forming a thin film. It can be evaporated (film-formed) on glass, plastic, film, metal, etc. The vacuum evaporation method is widely used in the formation of components in electronic parts, semiconductor devices, optical films, magnetic devices, LEDs, organic EL, LCD, etc. As the evaporation material, noble metals such as gold, silver, platinum, and palladium or non-ferrous metals such as copper, aluminum, chromium, and tin can be used. Furthermore, not only metals can be formed into films, but also non-metals such as oxides can be formed into films.

先前,於將蒸鍍材料填充至坩堝中,使用電子束等進行熔解時,蒸鍍材料包含之雜質等揮發而產生爆沸現象(亦稱為飛濺),產生粒子附著於基板上之問題。關於該爆沸現象之問題,專利文獻1中記載有藉由減少雜質元素來防止爆沸之方法。又,專利文獻2中記載有添入添加金屬之方法。進而,專利文獻3中提出有控制最表面之氧量之方法。 先前技術文獻 專利文獻 Previously, when evaporation materials were filled into a crucible and melted using electron beams, impurities contained in the evaporation materials volatilized, causing a bumping phenomenon (also called spatter), causing particles to adhere to the substrate. Regarding the problem of this bumping phenomenon, Patent Document 1 describes a method of preventing bumping by reducing impurity elements. Furthermore, Patent Document 2 describes a method of adding additive metal. Furthermore, Patent Document 3 proposes a method of controlling the amount of oxygen on the outermost surface. Prior technical literature patent documents

專利文獻1:日本特開平1-180961號公報 專利文獻2:國際公開第2017/199873號 專利文獻3:日本特開2000-212728號公報 Patent document 1: Japanese Patent Application Publication No. 1-180961 Patent Document 2: International Publication No. 2017/199873 Patent Document 3: Japanese Patent Application Publication No. 2000-212728

[發明所欲解決之課題][Problem to be solved by the invention]

本發明之課題在於提供一種金之蒸鍍材料,其係真空蒸鍍法中使用的粒狀(珠)之金之蒸鍍材料,且於真空蒸鍍時可抑制爆沸現象。 [解決課題之技術手段] The subject of the present invention is to provide a gold evaporation material, which is a granular (bead) gold evaporation material used in a vacuum evaporation method, and can suppress the bumping phenomenon during vacuum evaporation. [Technical means to solve the problem]

可解決上述課題之本發明之一態樣係一種真空蒸鍍法中使用的粒狀之金之蒸鍍材料,其特徵在於:金之蒸鍍材料之平均結晶粒徑為0.1 mm以上,氧含量為10 wtppm以下,且氫含量為5 wtppm以下。又,可解決上述課題之另一態樣係一種真空蒸鍍法中使用的粒狀之金之蒸鍍材料,其特徵在於:1 g之金之蒸鍍材料中包含的1 μm以上之異物個數為5000個以下。 [發明之效果] One aspect of the present invention that can solve the above problems is a granular gold evaporation material used in a vacuum evaporation method. It is characterized in that the average crystal grain size of the gold evaporation material is 0.1 mm or more, and the oxygen content is is 10 wtppm or less, and the hydrogen content is 5 wtppm or less. Another aspect that can solve the above problem is a granular gold evaporation material used in a vacuum evaporation method, which is characterized in that 1 g of the gold evaporation material contains foreign matter particles of 1 μm or more. The number is less than 5,000. [Effects of the invention]

根據本發明,可有效地於金之蒸鍍材料熔解時抑制爆沸現象,藉此可減少附著於基板上之粒子。因此,可有助於改善製品之良率。According to the present invention, the bumping phenomenon can be effectively suppressed when the gold evaporation material is melted, thereby reducing particles adhering to the substrate. Therefore, it can help improve the yield of products.

關於真空蒸鍍法中使用之金之蒸鍍材料,通常使用純度99.9 wt%以上之金作為原料,於大氣中,使該金原料於氧化鋁等陶瓷坩堝或碳坩堝中進行熔解。然後,使金之熔液自與坩堝底部連結之噴嘴掉落至水中或有機溶劑中進行急冷,從而製造粒狀之金之蒸鍍材料(亦稱為金粒或金珠)。藉此,可製作雜質相對少之金之蒸鍍材料。Regarding the gold evaporation material used in the vacuum evaporation method, gold with a purity of 99.9 wt% or more is usually used as a raw material, and the gold raw material is melted in a ceramic crucible such as alumina or a carbon crucible in the atmosphere. Then, the gold melt is dropped from the nozzle connected to the bottom of the crucible into water or an organic solvent for rapid cooling, thereby producing granular gold evaporation materials (also called gold particles or gold beads). In this way, gold evaporation materials with relatively few impurities can be produced.

然而,即便於使用此種雜質相對少之金之蒸鍍材料之情形時,亦存在蒸鍍初期產生爆沸現象,預蒸鍍之時間變長,或必須改變蒸鍍裝置之條件設定,而使生產效率降低之問題。尤其由於金作為材料較昂貴,故存在預蒸鍍之時間越長,相應地費用越多之問題。又,亦產生由於爆沸現象,使裝置或坩堝內污染,而使裝置洗淨之頻率增加之問題。However, even when such gold evaporation materials with relatively few impurities are used, there will still be a bumping phenomenon in the early stages of evaporation. The pre-evaporation time will become longer, or the condition settings of the evaporation device must be changed, resulting in The problem of reduced production efficiency. In particular, since gold is relatively expensive as a material, there is a problem that the longer the pre-evaporation time is, the higher the cost will be. In addition, there is also a problem that the device or the crucible is contaminated due to the bumping phenomenon, which increases the frequency of device cleaning.

本發明者對此種問題進行了潛心研究,結果獲得以下見解:真空蒸鍍法中使用的粒狀之金之蒸鍍材料的平均結晶粒徑與氧及氫含量存在相關關係,藉由使平均結晶粒徑增大,可減少氧及氫含量,並且,藉由減少氧及氫含量,可抑制爆沸現象。 又,本發明者自另一觀點出發對上述問題進行了潛心研究,結果獲得以下見解:於藉由電子束熔解等來使粒狀之金之蒸鍍材料蒸發的過程中,異物浮於熔液表面,將熔液表面覆蓋,而成為爆沸之原因,並且,藉由減少該異物,可抑制爆沸現象。 本發明基於該等見解,提供以下實施形態。 The inventors of the present invention conducted intensive research on this problem, and as a result obtained the following insights: There is a correlation between the average crystal grain size of the granular gold evaporation material used in the vacuum evaporation method and the oxygen and hydrogen content. By making the average The increase in crystal particle size can reduce the oxygen and hydrogen content, and by reducing the oxygen and hydrogen content, the bumping phenomenon can be suppressed. In addition, the inventors of the present invention conducted intensive research on the above-mentioned problem from another viewpoint, and as a result obtained the following findings: In the process of evaporating the granular gold evaporation material by electron beam melting or the like, foreign matter floats in the melt. The surface covers the melt surface and causes bumping, and by reducing the foreign matter, the bumping phenomenon can be suppressed. Based on these findings, the present invention provides the following embodiments.

本發明之實施形態係一種真空蒸鍍法中使用的粒狀之金之蒸鍍材料,平均結晶粒徑較佳為0.1 mm以上。更佳為0.5 mm以上。若平均結晶粒徑過小,則結晶粒界變多,而容易沿該粒界吸藏下述氧或氫等氣體成分。所吸藏之氣體成分於用作蒸鍍材料時可能成為爆沸現象之原因。推測:若結晶粒界少,則氣體於粒內之擴散速度非常緩慢,而不易固溶於粒內。因此,平均結晶粒徑越大越佳,較佳為設為0.1 mm以上。更佳為0.5 mm以上。再者,理想之狀態為單晶。An embodiment of the present invention is a granular gold evaporation material used in a vacuum evaporation method, and the average crystal grain size is preferably 0.1 mm or more. More preferably, it is 0.5 mm or more. If the average crystal grain size is too small, the number of crystal grain boundaries will increase, and gas components such as oxygen and hydrogen described below will be easily occluded along the grain boundaries. The absorbed gas components may cause bumping when used as evaporation materials. It is speculated that if there are few crystal grain boundaries, the diffusion rate of gas within the grains will be very slow and it will be difficult to solid dissolve within the grains. Therefore, the larger the average crystal grain size is, the better, and it is preferably 0.1 mm or more. More preferably, it is 0.5 mm or more. Furthermore, the ideal state is single crystal.

本發明之實施形態的粒狀之金之蒸鍍材料較佳為金之蒸鍍材料中的氧含量為10 wtppm以下。存在氧沿粒界侵入至蒸鍍材料中而吸藏於內部之情況,又,存在使金之熔液掉落於水中進行急冷時,熔液之金與水發生反應,Au+H 2O成為AuO+H 2,而使金之表面被氧化物薄膜覆蓋之情況。因此,較理想為使氧含量減少,較佳為設為5 wtppm以下。 The granular gold vapor deposition material according to the embodiment of the present invention preferably has an oxygen content in the gold vapor deposition material of 10 wtppm or less. Oxygen may invade into the evaporated material along the grain boundaries and be absorbed inside. Also, when the gold melt is dropped into water and rapidly cooled, the gold in the melt reacts with the water, and Au+H 2 O becomes AuO+H 2 , causing the surface of gold to be covered with an oxide film. Therefore, it is preferable to reduce the oxygen content, and it is preferable to set it to 5 wtppm or less.

本發明之實施形態的粒狀之金之蒸鍍材料較佳為金之蒸鍍材料中的氫含量為5 wtppm以下。如上所述,存在金之熔液與水發生反應而產生氫,所產生之氫沿金之粒界侵入而被過度飽和地吸藏之情況。該氫於用作蒸鍍材料時成為爆沸現象之原因,故較理想為減少,較佳為設為3 wtppm以下。The granular gold vapor deposition material according to the embodiment of the present invention preferably has a hydrogen content of 5 wtppm or less in the gold vapor deposition material. As described above, there are cases where the molten gold reacts with water to generate hydrogen, and the generated hydrogen invades along the gold grain boundaries and is absorbed in a supersaturated manner. This hydrogen causes a bumping phenomenon when used as a vapor deposition material, so it is desirably reduced, and is preferably set to 3 wtppm or less.

又,本實施形態的金之蒸鍍材料之特徵在於:1 g之金之蒸鍍材料中包含的1 μm以上之異物為5000個以下。蒸鍍材料係於坩堝內對金原料進行大氣熔解,並對其熔液進行急冷而製成,但存在混入作為大氣中之灰塵的SiO 2、MgO、Al 2O 3等氧化物之情況,又,存在自坩堝混入C(碳)等之情況。該等以異物之形式殘留於金熔液中,於用作蒸鍍材料時成為爆沸現象之原因。若1 g之金之蒸鍍材料中包含的1 μm以上之異物為5000個以下,則可謂能一定程度地抑制爆沸現象。較佳為1 μm以上之異物個數為1200個以下。 Furthermore, the gold vapor deposition material of this embodiment is characterized in that the number of foreign matter of 1 μm or more contained in 1 g of the gold vapor deposition material is 5,000 or less. Evaporation materials are produced by atmospheric melting of gold raw materials in a crucible and rapid cooling of the melt. However, oxides such as SiO 2 , MgO, and Al 2 O 3 may be mixed in as dust in the atmosphere. , C (carbon), etc. may be mixed in from the crucible. These remain in the gold melt in the form of foreign matter and cause bumping when used as evaporation materials. If 1 g of gold evaporation material contains less than 5,000 foreign matter of 1 μm or larger, it can be said that the bumping phenomenon can be suppressed to a certain extent. Preferably, the number of foreign matter larger than 1 μm is 1,200 or less.

本實施形態之蒸鍍材料例如能以如下方式加以製作。將純度4 N(99.99 wt%)以上之金原料填充至碳製坩堝內,並進行熔解。然後,使坩堝內熔解之金之熔液自坩堝之底部掉落於水中,將經粒化之金用作蒸鍍材料(珠)。 此時重要的是,向金熔液中添加硼砂等凝集劑,同時調整其量,以吸附異物。藉此,熔液中之異物以凝集劑為起點進行濃縮。所添加之硼砂停留於液面,故粒化時噴嘴內殘留有少量之金。殘留之量雖亦取決於熔解之量,惟較佳為設為0.1 g~100 g。以此方式使包含凝集劑之金之一部分殘留,故金粒不會被凝集劑或異物污染。 The vapor deposition material of this embodiment can be produced as follows, for example. Fill the carbon crucible with gold raw material with a purity of 4 N (99.99 wt%) or above and melt it. Then, the melted gold in the crucible is dropped into water from the bottom of the crucible, and the granulated gold is used as the evaporation material (beads). What is important at this time is to add a coagulant such as borax to the gold melt and adjust its amount to absorb foreign matter. Thereby, foreign matter in the melt is concentrated using the coagulant as a starting point. The added borax stays on the liquid surface, so a small amount of gold remains in the nozzle during granulation. Although the amount of residue also depends on the amount of melting, it is preferably 0.1 g to 100 g. In this way, part of the gold containing the coagulant remains, so the gold particles are not contaminated by the coagulant or foreign matter.

使金之熔液自坩堝之底部掉落於水中進行急冷,而製作粒化之金,此時,可根據坩堝之底部至水面之掉落距離或熔液溫度,來控制結晶粒徑或氧、氫之含量。例如,掉落距離越長,則由於掉落途中緩冷而多晶化,使得粒界越多。並且,若粒界較多,則金之熔液與水反應而產生之氫容易沿粒界侵入而被過度飽和地吸藏。又,若熔液溫度較熔解溫度高100℃以上,則氧或氫之含量變多,熔液溫度越高,則該等氣體成分越多。The gold melt is dropped from the bottom of the crucible into water for rapid cooling to produce granulated gold. At this time, the crystal particle size or oxygen, Hydrogen content. For example, the longer the falling distance, the more grain boundaries there will be due to polycrystallization due to slow cooling during the falling process. Furthermore, if there are many grain boundaries, hydrogen generated by the reaction of the gold melt and water will easily invade along the grain boundaries and be absorbed in an oversaturated manner. In addition, if the melt temperature is more than 100°C higher than the melting temperature, the content of oxygen or hydrogen will increase. The higher the melt temperature, the greater the content of these gas components.

(平均結晶粒徑之測定方法) 於粒狀之金之蒸鍍材料(珠)的截面(成為最大面積之位置)處進行切割,並對珠剖面進行切割及/或研磨,使粒界顯示出來。然後,進行研磨等,並利用光學顯微鏡觀察剖面。為了易於觀察粒界,將光學顯微鏡之倍率設為10倍或50倍。然後,縱向及橫向劃直線,使其通過利用光學顯微鏡所獲得之放大照片之中心,對被各直線切割之晶粒之個數進行計數。再者,線段之端部之晶粒計作0.5個。繼而,用縱橫各直線之長度除以晶粒之個數,而求出縱橫之平均結晶粒徑。又,由於珠的每一粒之大小或重量均不同,故任意選10個珠,將10個珠之平均值作為平均結晶粒徑。 (Measurement method of average crystal particle size) The granular gold vapor deposition material (bead) is cut at the cross section (the position where the largest area becomes the largest area), and the cross section of the bead is cut and/or ground to reveal the grain boundaries. Then, grinding etc. are performed, and the cross-section is observed using an optical microscope. In order to easily observe the grain boundaries, the magnification of the optical microscope was set to 10 times or 50 times. Then, straight lines were drawn vertically and horizontally so that they passed through the center of the enlarged photograph obtained using an optical microscope, and the number of crystal grains cut by each straight line was counted. Furthermore, the grains at the end of the line segment are counted as 0.5. Then, the length of each vertical and horizontal straight line is divided by the number of crystal grains to determine the average vertical and horizontal crystal grain diameters. In addition, since each bead has a different size or weight, 10 beads are randomly selected and the average value of the 10 beads is taken as the average crystal particle size.

(氧及氫含量之測定方法) 分析裝置:堀場製作所 EMGA-600W 分析方法:非活性氣體中脈衝爐加熱熔解 紅外線吸收法 (Measurement method of oxygen and hydrogen content) Analytical device: Horiba Manufacturing Co., Ltd. EMGA-600W Analysis method: Pulse furnace heating and melting in inert gas; Infrared absorption method

(異物之測定方法) 使粒狀之金之蒸鍍材料(珠)溶解於王水,將溶解殘渣蒸乾之後,放入至純水中,使用基於光散射法之粒子計數器,對1 μm以上之異物個數進行測定。再者,異物分析之結果為Si、Al、Mg等之氧化物或C(碳)。又,由於珠之每一粒之粒徑或重量均不同,故任意選10個珠,使10個珠溶解,測定異物總數,根據10個珠之總重量,求出每1 g之異物個數。 (Method for determination of foreign matter) Dissolve the granular gold evaporation material (beads) in aqua regia, evaporate the dissolved residue to dryness, put it into pure water, and use a particle counter based on the light scattering method to measure the number of foreign matter larger than 1 μm. Furthermore, the result of foreign matter analysis is oxides of Si, Al, Mg, etc. or C (carbon). In addition, since each particle of beads has a different particle size or weight, 10 beads are randomly selected, 10 beads are dissolved, the total number of foreign matter is measured, and the number of foreign matter per 1 g is calculated based on the total weight of 10 beads. .

(爆沸現象之評價) 若蒸鍍材料進行電子束熔解時產生爆沸現象,則蒸鍍材料附著於蒸鍍裝置內部,而使蒸鍍材料之重量減少。因此,藉由對熔解後之蒸鍍材料之重量減少量進行測定,而可對爆沸現象進行評價。將約40 g蒸鍍材投入至銅坩堝中,於真空度為1×10 -1Pa、電子束照射功率為6 kW、電子束照射時間為2分鐘之條件下進行電子束熔解,並對熔解後之重量減少量進行測定。再者,該熔解條件下,幾乎不發生由蒸發導致之損耗。並且,重量減少率未達0.01 wt%時判定為◎(非常良好),重量減少率為0.01~1 wt%時判定為○(良好),重量減少率為1 wt%以上時判定為×(非常差)。 [實施例] (Evaluation of bumping phenomenon) If a bumping phenomenon occurs when the vapor deposition material is melted by electron beam, the vapor deposition material will adhere to the inside of the vapor deposition device, thereby reducing the weight of the vapor deposition material. Therefore, by measuring the weight loss of the melted vapor deposition material, the bumping phenomenon can be evaluated. Put about 40 g of evaporated material into a copper crucible, conduct electron beam melting under the conditions of vacuum degree of 1×10 -1 Pa, electron beam irradiation power of 6 kW, and electron beam irradiation time of 2 minutes, and conduct melting The subsequent weight loss was measured. Furthermore, under these melting conditions, almost no loss due to evaporation occurs. In addition, when the weight reduction rate is less than 0.01 wt%, it is judged as ◎ (very good), when the weight reduction rate is 0.01 to 1 wt%, it is judged as ○ (good), and when the weight reduction rate is 1 wt% or more, it is judged as × (very good). Difference). [Example]

其次,對本發明之實施例等進行說明。再者,以下實施例僅為具有代表性之例,故本發明無須受限於該等實施例,應於申請專利範圍中記載之技術思想之範圍內進行解釋。Next, embodiments and the like of the present invention will be described. Furthermore, the following examples are only representative examples, so the present invention is not limited to these examples and should be interpreted within the scope of the technical ideas described in the patent application.

(樣品編號1~9) 將純度4 N(99.99 wt%)以上之1000 g金原料填充至碳製坩堝中,使用設置於坩堝之外周之高頻感應線圈使金原料熔解。此時,將各樣品之熔液溫度調整為如表1所示。又,向金之熔液中添加作為凝集劑之硼砂。將各樣品中之添加量示於表1。然後,使坩堝內熔解之金之熔液自坩堝之底部掉落於水中而製作粒狀之金,並將其用作蒸鍍材料。此時,針對各樣品,調整坩堝之底部至水面之掉落距離、及包含凝集劑之金熔液之殘留量。彙整以上內容而示於表1。 (Sample No. 1~9) Fill 1000 g of gold raw material with a purity of 4 N (99.99 wt%) or above into a carbon crucible, and use a high-frequency induction coil installed on the outer periphery of the crucible to melt the gold raw material. At this time, the melt temperature of each sample was adjusted as shown in Table 1. Furthermore, borax is added as a coagulant to the gold melt. The amounts added to each sample are shown in Table 1. Then, the melted gold in the crucible is dropped into water from the bottom of the crucible to produce granular gold, which is used as a vapor deposition material. At this time, for each sample, the distance from the bottom of the crucible to the water surface and the remaining amount of the gold melt containing the coagulant were adjusted. The above contents are summarized and shown in Table 1.

針對所獲得之各樣品之金蒸鍍材料,使用上述測定方法測定1 μm以上之異物個數、平均結晶粒徑、氧含量及氫含量。將其結果示於表1。又,將測定後之各樣品之金蒸鍍材料投入至銅坩堝中,於上述條件下照射電子束並進行熔解,測定熔解後之重量減少率。結果如表1所示,可知若1 μm以上之異物之個數超過5000個,則由爆沸現象導致之重量減少相對多。For the gold evaporation material of each sample obtained, the number of foreign matter larger than 1 μm, average crystal particle size, oxygen content, and hydrogen content were measured using the above measurement method. The results are shown in Table 1. Furthermore, the gold evaporation material of each sample after measurement was put into a copper crucible, irradiated with an electron beam under the above conditions, and melted, and the weight reduction rate after melting was measured. The results are shown in Table 1. It can be seen that if the number of foreign objects larger than 1 μm exceeds 5,000, the weight loss caused by the bumping phenomenon will be relatively large.

[表1] 樣品編號 熔液 溫度 掉落距離 凝集劑(硼砂) 殘留量 平均結晶粒徑 1 μm以上之異物個數 爆沸現象之評價 cm g g mm wtppm wtppm 個/g 1 1120 20 10 10 2.1 <1 <1 110 2 1000 20 5 1 1 <1 <1 520 3 1300 20 5 1 0.5 1 <1 1010 4 1300 50 5 0.5 0.3 2 1 3150 5 1300 50 1 0.5 0.1 5 3 4900 6 1400 60 1 - 0.07 10 5 5000 7 1420 70 1 - 0.01 15 6 7000 × 8 1420 120 - - 0.006 20 8 11500 × 9 1500 200 - - 0.002 35 10 21000 × [產業上之可利用性] [Table 1] Sample number Melt temperature Falling distance Coagulant (borax) Residue amount average crystal particle size oxygen Hydrogen Number of foreign objects above 1 μm Evaluation of bumping phenomenon cm g g mm wtppm wtppm pieces/g 1 1120 20 10 10 2.1 <1 <1 110 2 1000 20 5 1 1 <1 <1 520 3 1300 20 5 1 0.5 1 <1 1010 4 1300 50 5 0.5 0.3 2 1 3150 5 1300 50 1 0.5 0.1 5 3 4900 6 1400 60 1 - 0.07 10 5 5000 7 1420 70 1 - 0.01 15 6 7000 × 8 1420 120 - - 0.006 20 8 11500 × 9 1500 200 - - 0.002 35 10 21000 × [Industrial availability]

根據本發明,可於蒸鍍材料熔解時抑制爆沸現象,藉此可減少附著於基板上之粒子。本實施形態之蒸鍍材料可廣泛用於使用真空蒸鍍法的電子零件、半導體裝置、光學薄膜、磁性裝置、LED、有機EL、LCD等中之元件之形成。According to the present invention, the bumping phenomenon can be suppressed when the evaporation material is melted, thereby reducing particles adhering to the substrate. The evaporation material of this embodiment can be widely used to form elements in electronic components, semiconductor devices, optical films, magnetic devices, LEDs, organic EL, LCDs, etc. using the vacuum evaporation method.

without

[圖1]為本發明之一形態的金之蒸鍍材料(珠)之照片。[Fig. 1] is a photograph of a gold evaporation material (bead) according to one aspect of the present invention.

Claims (3)

一種金之蒸鍍材料,其係真空蒸鍍法中使用的粒狀之金之蒸鍍材料,其特徵在於:金之蒸鍍材料之平均結晶粒徑為0.1mm以上,氧含量為10wtppm以下,且氫含量為5wtppm以下。 A gold evaporation material, which is a granular gold evaporation material used in a vacuum evaporation method. It is characterized in that: the average crystal grain size of the gold evaporation material is more than 0.1mm, and the oxygen content is less than 10wtppm. And the hydrogen content is below 5wtppm. 如請求項1之金之蒸鍍材料,其中,上述氧含量為5wtppm以下。 For example, the gold evaporation material of claim 1, wherein the oxygen content is 5 wtppm or less. 如請求項1或2之金之蒸鍍材料,其中,上述氫含量為3wtppm以下。 For example, the gold evaporation material of claim 1 or 2, wherein the hydrogen content is 3wtppm or less.
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