TWI818782B - Multilayer optical film structure and manufacturing method thereof - Google Patents
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
- G02F1/133602—Direct backlight
- G02F1/133606—Direct backlight including a specially adapted diffusing, scattering or light controlling members
- G02F1/133607—Direct backlight including a specially adapted diffusing, scattering or light controlling members the light controlling member including light directing or refracting elements, e.g. prisms or lenses
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
- G02F1/133602—Direct backlight
- G02F1/133611—Direct backlight including means for improving the brightness uniformity
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/075—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00
- H01L25/0753—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00 the devices being arranged next to each other
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/58—Optical field-shaping elements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/58—Optical field-shaping elements
- H01L33/60—Reflective elements
Abstract
Description
本發明涉及一種光學膜結構及其製作方法,特別是涉及一種多層光學膜結構及其製作方法。 The present invention relates to an optical film structure and a manufacturing method thereof, in particular to a multi-layer optical film structure and a manufacturing method thereof.
背光模組被廣泛地應用在液晶顯示裝置中,以提供顯示畫面所需要的光源。背光模組中的發光組件通常採用多個排成陣列的發光二極體(LED)或次毫米發光二極體(mini LED),其所產生的光束集中而具有較高的指向性。為了調整發光組件所產生的光束,即將發光組件所產生的點光源陣列轉換成面光源,會在背光模組上設置光學組件。 Backlight modules are widely used in liquid crystal display devices to provide the light source required to display images. The light-emitting components in the backlight module usually use multiple arrays of light-emitting diodes (LEDs) or sub-millimeter light-emitting diodes (mini LEDs). The light beams generated are concentrated and have high directivity. In order to adjust the light beam generated by the light-emitting component, that is, to convert the point light source array generated by the light-emitting component into a surface light source, an optical component is provided on the backlight module.
在現有技術中,為了使亮度均勻分布,光學組件通常要利用較多的光學膜片,如:導光片、擴散片、增亮膜等光學膜,以利用光線折射、反射或散射等物理現象來調整光線。然而,這種無法兼顧光學組件的厚度與亮度均勻性。故,如何通過結構設計的改良,來提升光學膜結構的的擴散效果,來克服上述的缺陷,已成為該項事業所欲解決的重要課題之一。 In the existing technology, in order to distribute the brightness evenly, optical components usually use more optical films, such as light guide films, diffusion films, brightness-enhancing films and other optical films to take advantage of physical phenomena such as light refraction, reflection or scattering. to adjust the light. However, this cannot balance the thickness and brightness uniformity of optical components. Therefore, how to improve the diffusion effect of the optical film structure and overcome the above-mentioned defects through structural design improvements has become one of the important issues to be solved in this project.
本發明所要解決的技術問題在於,針對現有技術的不足提供一種光學膜結構及其製作方法。本發明提供的光學膜結構為結構與折射率經過特 定排列的多層結構,對於點光源具有良好的擴散效果,可應用在顯示裝置的發光模組中。 The technical problem to be solved by the present invention is to provide an optical film structure and a manufacturing method thereof in view of the shortcomings of the existing technology. The optical film structure provided by the invention has a special structure and refractive index. The regularly arranged multi-layer structure has a good diffusion effect for point light sources and can be used in light-emitting modules of display devices.
為了解決上述的技術問題,本發明所採用的一技術方案是提供一種多層光學膜結構。多層光學膜結構包括基底層、第一光學結構及第二光學結構。基底層具有第一表面以及與第一表面相對的第二表面。第一光學結構設置在基底層的第一表面。第二光學結構設置在基底層的第二表面,且包括第一結構層、第二結構層及第三結構層。第一結構層位於基底層與第二結構層之間,且第二結構層位於第一結構層與第三結構層之間。第一結構層的折射率與第二結構層的折射率差大於等於0.1。 In order to solve the above technical problems, one technical solution adopted by the present invention is to provide a multi-layer optical film structure. The multilayer optical film structure includes a base layer, a first optical structure and a second optical structure. The base layer has a first surface and a second surface opposite to the first surface. The first optical structure is disposed on the first surface of the base layer. The second optical structure is disposed on the second surface of the base layer and includes a first structural layer, a second structural layer and a third structural layer. The first structural layer is located between the base layer and the second structural layer, and the second structural layer is located between the first structural layer and the third structural layer. The difference in refractive index between the first structural layer and the second structural layer is greater than or equal to 0.1.
為了解決上述的技術問題,本發明所採用的另外一技術方案是提供一種製造多層光學膜結構的方法。製造多層光學膜結構的方法包括:形成基底層;將所述第一光學結構形成於所述基底層的所述第一表面;將所述第一結構層形成於所述基底層的所述第二表面;將所述第二結構層形成於所述第一結構層上;以及將所述第三結構層形成於所述第二結構層上。 In order to solve the above technical problems, another technical solution adopted by the present invention is to provide a method for manufacturing a multi-layer optical film structure. The method of manufacturing a multi-layer optical film structure includes: forming a base layer; forming the first optical structure on the first surface of the base layer; forming the first structural layer on the third surface of the base layer. two surfaces; forming the second structural layer on the first structural layer; and forming the third structural layer on the second structural layer.
為了解決上述的技術問題,本發明所採用的另外一技術方案是提供一種製造多層光學膜結構的方法。製造多層光學膜結構的方法包括:形成所述基底層;將所述第一結構層形成於所述基底層的所述第二表面;將所述第一光學結構形成於所述基底層的所述第一表面;將所述第二結構層形成於所述第一結構層上;以及將所述第三結構層形成於所述第二結構層上。 In order to solve the above technical problems, another technical solution adopted by the present invention is to provide a method for manufacturing a multi-layer optical film structure. The method of manufacturing a multi-layer optical film structure includes: forming the base layer; forming the first structural layer on the second surface of the base layer; forming the first optical structure on all surfaces of the base layer. the first surface; forming the second structural layer on the first structural layer; and forming the third structural layer on the second structural layer.
為了解決上述的技術問題,本發明所採用的另外一技術方案是提供一種製造多層光學膜結構的方法。製造多層光學膜結構的方法包括:形成所述基底層;將所述第一結構層形成於所述基底層的所述第二表面; 將所述第二結構層形成於所述第一結構層上;將所述第一光學結構形成於所述基底層的所述第一表面;以及將所述第三結構層形成於所述第二結構層上。 In order to solve the above technical problems, another technical solution adopted by the present invention is to provide a method for manufacturing a multi-layer optical film structure. The method of manufacturing a multilayer optical film structure includes: forming the base layer; forming the first structural layer on the second surface of the base layer; The second structural layer is formed on the first structural layer; the first optical structure is formed on the first surface of the base layer; and the third structural layer is formed on the third structural layer. On the second structural layer.
為了解決上述的技術問題,本發明所採用的另外一技術方案是提供一種製造多層光學膜結構的方法。製造多層光學膜結構的方法包括:形成所述基底層;將所述第一結構層形成於所述基底層的所述第二表面;將所述第二結構層形成於所述第一結構層上;將所述第三結構層形成於所述第二結構層上;以及將所述第一光學結構形成於所述基底層的所述第一表面。 In order to solve the above technical problems, another technical solution adopted by the present invention is to provide a method for manufacturing a multi-layer optical film structure. The method of manufacturing a multi-layer optical film structure includes: forming the base layer; forming the first structural layer on the second surface of the base layer; forming the second structural layer on the first structural layer on; forming the third structural layer on the second structural layer; and forming the first optical structure on the first surface of the base layer.
本發明的其中一有益效果在於,本發明所提供的多層光學膜結構及其製作方法,其能通過“第一光學結構設置在基底層的第一表面,第二光學結構設置在基底層的第二表面”、“第二光學結構包括第一結構層、第二結構層及第三結構層”、“第一結構層位於基底層與第二結構層之間,且第二結構層位於第一結構層與第三結構層之間”以及“第一結構層的折射率與所述第二結構層的折射率差大於等於0.1”的技術方案,以擴散發光組件所產生的光束。 One of the beneficial effects of the present invention is that the multilayer optical film structure and the manufacturing method provided by the present invention can be configured by "the first optical structure is disposed on the first surface of the base layer, and the second optical structure is disposed on the third surface of the base layer." "Two surfaces", "The second optical structure includes a first structural layer, a second structural layer and a third structural layer", "The first structural layer is located between the base layer and the second structural layer, and the second structural layer is located between the first "between the structural layer and the third structural layer" and "the difference in refractive index between the first structural layer and the second structural layer is greater than or equal to 0.1" to diffuse the light beam generated by the light-emitting component.
為使能更進一步瞭解本發明的特徵及技術內容,請參閱以下有關本發明的詳細說明與圖式,然而所提供的圖式僅用於提供參考與說明,並非用來對本發明加以限制。 In order to further understand the features and technical content of the present invention, please refer to the following detailed description and drawings of the present invention. However, the drawings provided are only for reference and illustration and are not used to limit the present invention.
1A:光學膜結構 1A: Optical film structure
10:基底層 10: Basal layer
10a:第一表面 10a: First surface
10b:第二表面 10b: Second surface
11:第一光學結構 11: First optical structure
12:第二光學結構 12: Second optical structure
12L:稜線 12L: ridge line
121:第一結構層 121: First structural layer
121A:凹陷微結構 121A: Recessed microstructure
122A:凸出微結構 122A:Protruding microstructure
122S:入光面 122S: light incident surface
122:第二結構層 122:Second structural layer
123:第三結構層 123: The third structural layer
d1~d4:距離 d1~d4: distance
θ1~θ4:角度 θ1~θ4: angle
S1~S3:斜面 S1~S3: Inclined surface
D1、D2:方向 D1, D2: direction
S100~S408:步驟 S100~S408: steps
圖1為本發明第一實施例的示意圖。 Figure 1 is a schematic diagram of the first embodiment of the present invention.
圖2為本發明一實施例的光學膜的局部立體分解示意圖。 FIG. 2 is a partial three-dimensional exploded view of an optical film according to an embodiment of the present invention.
圖3為本發明另一實施例的光學膜的局部立體分解示意圖。 FIG. 3 is a partial three-dimensional exploded view of an optical film according to another embodiment of the present invention.
圖4為本發明一實施例的光學膜的製造方法的流程圖。 FIG. 4 is a flow chart of a method for manufacturing an optical film according to an embodiment of the present invention.
圖5為本發明一實施例的光學膜的製造方法的流程圖。 FIG. 5 is a flow chart of a method for manufacturing an optical film according to an embodiment of the present invention.
圖6為本發明一實施例的光學膜的製造方法的流程圖。 FIG. 6 is a flow chart of a method for manufacturing an optical film according to an embodiment of the present invention.
圖7為本發明一實施例的光學膜的製造方法的流程圖。 FIG. 7 is a flow chart of a method for manufacturing an optical film according to an embodiment of the present invention.
以下是通過特定的具體實施例來說明本發明所公開有關“多層光學膜結構及其製作方法”的實施方式,本領域技術人員可由本說明書所公開的內容瞭解本發明的優點與效果。本發明可通過其他不同的具體實施例加以施行或應用,本說明書中的各項細節也可基於不同觀點與應用,在不背離本發明的構思下進行各種修改與變更。另外,本發明的附圖僅為簡單示意說明,並非依實際尺寸的描繪,事先聲明。以下的實施方式將進一步詳細說明本發明的相關技術內容,但所公開的內容並非用以限制本發明的保護範圍。另外,本文中所使用的術語“或”,應視實際情況可能包括相關聯的列出項目中的任一個或者多個的組合。 The following is a specific example to illustrate the implementation of the "multilayer optical film structure and its manufacturing method" disclosed in the present invention. Those skilled in the art can understand the advantages and effects of the present invention from the content disclosed in this specification. The present invention can be implemented or applied through other different specific embodiments, and various details in this specification can also be modified and changed based on different viewpoints and applications without departing from the concept of the present invention. In addition, the drawings of the present invention are only simple schematic illustrations and are not depictions based on actual dimensions, as is stated in advance. The following embodiments will further describe the relevant technical content of the present invention in detail, but the disclosed content is not intended to limit the scope of the present invention. In addition, the term "or" used in this article shall include any one or combination of more of the associated listed items depending on the actual situation.
應當可以理解的是,雖然本文中可能會使用到“第一”、“第二”、“第三”等術語來描述各種元件或者信號,但這些元件或者信號不應受這些術語的限制。這些術語主要是用以區分一元件與另一元件,或者一信號與另一信號。另外,本文中所使用的術語“或”,應視實際情況可能包括相關聯的列出項目中的任一個或者多個的組合。 It should be understood that although terms such as “first”, “second” and “third” may be used herein to describe various elements or signals, these elements or signals should not be limited by these terms. These terms are primarily used to distinguish one component from another component or one signal from another signal. In addition, the term "or" used in this article shall include any one or combination of more of the associated listed items depending on the actual situation.
參閱圖1所示,圖1為本發明第一實施例的示意圖,本發明第一實施例提供一種多層光學膜結構1A,其包括:基底層10、第一光學結構11及第二光學結構12。本發明的多層光學膜結構1A可直接或間接設置在發光組件
上,以均勻地擴散發光組件所產生的光束。進一步而言,光學膜1A可以作為擴散片或者增亮片,以將點光源或者線光源轉換為面光源。在一實施例中,多層光學膜1A的總厚度可以是40μm至300μm。
Referring to Figure 1, Figure 1 is a schematic diagram of a first embodiment of the present invention. The first embodiment of the present invention provides a multi-layer
進一步而言,基底層10具有第一表面10a以及與第一表面10a相對的第二表面10b。光學膜1A具有一入光側以及與入光側相對的出光側。在本實施例中,基底層10的第一表面10a朝向出光側,基底層10的第二表面10b朝向入光側。此外,第一光學結構11是設置在第一表面10a上,而位於基底層10的出光側。因此,第一光學結構11具有背離發光組件的出光面。在本實施例中,第一光學結構11的厚度範圍是5um至50um。第一光學結構11的折射率較佳為1.42至1.70。在本實施例中,第一光學結構11可為凹金字塔型或凸金字塔型。
Furthermore, the
構成基底層10的材質可以是聚對苯二甲酸乙二酯(polyethylene terephthalate,PET),聚苯乙烯(PS)、聚碳酸脂(PC)、聚氨酯(PU)、聚丙烯(PP)、聚氯乙烯(PVC)、壓克力(PMMA)、丙烯酸(MMA)等等。只要構成基底層10的材質可允許光束通過,本發明並不限定。另外,基底層10的厚度可以是30μm至250μm,較佳是50μm至125μm,較易於加工。舉例而言,基底層10的折射率可以是1.50至1.60。
The
另外,光學膜1A還包括設置在基底層10的第二表面10b的第二光學結構12是位於光學膜1A的入光側。也就是說,第一光學結構11設置在基底層10的出光側,而第二光學結構12設置在基底層10的入光側。
In addition, the
在本實施例中,第二光學結構12包括第一結構層121、第二結構層122及第三結構層123。詳細而言,第一結構層121位於基底層10與第二結構層122之間,且第二結構層122位於第一結構層121與第三結構層123之間。也就是說,當第二光學結構12設置在基底層10的入光側時,第一結構
層121最接近基底層10,而第三結構層123最遠離基底層10。
In this embodiment, the second
據此,當光學膜1A設置在發光組件上時,第三結構層123具有面對發光組件的入光面。也就是說,發光組件中的多個發光單元所產生的光束會經由第三結構層123的入光面進入光學膜1A,之後再通過第二結構層122、第一結構層121、基底層10,並由第一光學結構11的出光面射出。
Accordingly, when the
進一步而言,第一光學結構11的表面包括多個第一斜面S1,且每兩個相連接的第一斜面S1之間共同形成一第一夾角θ1。另外,在第二光學結構12中,第一結構層121與第二結構層122之間的交界面包含多個第二斜面S2,且每一個第二斜面S2相對於基底層10的厚度方向傾斜。在本實施例中,每兩個相連的第二斜面S2共同形成一第二夾角θ2(或一第三夾角θ3)。第三結構層123的表面包括多個第三斜面S3,且每兩個相連接的第三斜面S3之間共同形成一第四夾角θ4。
Furthermore, the surface of the first
換句話說,第一光學結構11具有多個第一尖角,其具有角度θ1,第一結構層121具有多個第二尖角,其具有角度θ2,第二結構層122具有多個第三尖角,其具有角度θ3,及第三結構層123具有多個第四尖角,其具有角度角θ4。在本實施例中,第一尖角的角度θ1與第四尖角θ4的角度皆大於第二尖角的角度θ2與第三尖角的角度θ3。舉例而言,第一尖角的角度θ1與第四尖角的角度θ4為70至100度,較佳為90度,以利於光束的全反射。第二尖角θ2的角度與第三尖角θ3的角度為40至60度,較佳為50度。
In other words, the first
另一方面,相鄰的兩個第一尖角之間具有距離d1,相鄰的兩個第二尖角之間具有距離d2,相鄰的兩個第三尖角之間具有距離d3,以及相鄰的兩個第四尖角之間具有距離d4。在本實施例中,距離d1及距離d4都會大於距離d2及距離d3。 On the other hand, there is a distance d1 between two adjacent first sharp corners, a distance d2 between two adjacent second sharp corners, a distance d3 between two adjacent third sharp corners, and There is a distance d4 between two adjacent fourth sharp corners. In this embodiment, both the distance d1 and the distance d4 are larger than the distance d2 and the distance d3.
須說明的是,第一結構層121的表面輪廓與第二結構層122的
表面輪廓可相互配合。第一結構層121具有多個微結構,每一個微結構可以是三角柱、梯形柱、弓形柱、凸金字塔形、凹金字塔形或其他稜錐體,其中,凹金字塔結構可為三面凹金字塔結構或四面凹金字塔結構,凸金字塔結構可為三面凸金字塔結構或四面凸金字塔結構,但本發明並不限於此。
It should be noted that the surface profile of the first
在本實施例中,第一結構層121具有多個凹陷微結構121A,且第二結構層122填滿多個凹陷微結構121A,並具有入光面122S。詳細而言,可以先製作具有多個凹陷微結構121A的第一結構層121,再將膠材填入多個凹陷微結構121A內,而形成第二結構層122。因此,第二結構層122會具有多個凸出微結構122A。
In this embodiment, the first
請參照圖2,其為本發明一實施例的光學膜的局部立體分解示意圖。在本實施例中,第一光學結構11具有多個凹陷微結構,且凹陷微結構是朝向基底層10的方向凹陷。凹陷微結構121A為凹金字塔微結構,而凸出微結構122A為凸金字塔微結構。凹陷微結構121A可包括四個相互連接的三角形斜面,且四個三角形斜面會彼此相連而使凹陷微結構121A具有封閉的開口端,有助於使進入到第二光學結構12內的光束被更多次地反射與折射。在另一實施例中,每一凹陷微結構121A(或凸出微結構122A)也可以具有三個三角形斜面,但本發明不限於此。
Please refer to FIG. 2 , which is a partially exploded schematic diagram of an optical film according to an embodiment of the present invention. In this embodiment, the first
當其中一個發光單元所產生的光束進入第二光學結構12內之後,可通過多次反射與折射而在第二光學結構12內側向傳輸一定距離後,再進入基底層10。如此,可以增加光學膜2A的均光效果。
When the light beam generated by one of the light-emitting units enters the second
請參照圖3,其為本發明另一實施例的光學膜的局部立體分解示意圖。在圖3所示的實施例中,第一結構層121包括多個三角柱,每個三角柱具有稜線12L,其沿著第二方向D2延伸。對應於第一結構層121,第二結構層122也包括多個三角柱,其沿著第二方向D2延伸。然而,在本發明的又另
一實施例中,第一結構層121的多個三角柱與第二結構層122的多個三角柱的稜線12L可沿著第一方向D1延伸。在本實施例中,多個三角柱可具有不同的寬度及深度,例如三角柱的寬度可為5um至50um,深度可為5um至50um。
Please refer to FIG. 3 , which is a partial three-dimensional exploded view of an optical film according to another embodiment of the present invention. In the embodiment shown in FIG. 3 , the first
須說明的是,當光束由折射率較高的介質進入折射率較低的介質,且光束的入射角大於臨界角時,光束就會被全反射。反之,當光束由折射率較低的介質進入折射率較高的介質時,光束則不會被全反射,而是會分成折射光與反射光。本文中,高折射率指的是介於1.50與1.70之間的折射率範圍,低折射率指的是介於1.40與1.50的折射率範圍。 It should be noted that when a light beam enters a medium with a lower refractive index from a medium with a higher refractive index, and the incident angle of the light beam is greater than the critical angle, the light beam will be totally reflected. On the contrary, when a light beam enters a medium with a higher refractive index from a medium with a lower refractive index, the light beam will not be totally reflected, but will be divided into refracted light and reflected light. In this article, high refractive index refers to the refractive index range between 1.50 and 1.70, and low refractive index refers to the refractive index range between 1.40 and 1.50.
因此,在本實施例中,第一光學結構11的折射率越高越好,較佳為1.70以上,具體而言,第一光學結構11為高折射率層、第一結構層121是低折射率層、第二結構層122及第三結構層123結為高折射率層。換句話說,第二結構層122與第三結構層123的折射率可以是相同的。需說明的是,第一結構層121的折射率與第二結構層122的折射率差要大於等於0.1,以達到良好的均光效果。若是第一結構層121的折射率與第二結構層122的折射率差小於0.1,則無法使亮度均勻分布。
Therefore, in this embodiment, the higher the refractive index of the first
在本實施例中,第一結構層121的折射率小於第二結構層122與第三結構層123的折射率。具體而言,第一光學結構11的折射率為1.63,基底層的折射率為1.57,第一結構層121的折射率為1.45,第二結構層122的折射率為1.63,第三結構層123的折射率為1.63。
In this embodiment, the refractive index of the first
本實施例與第一實施例大致相同,其差異說明如下。在本實施例中,第一光學結構11與第二結構層122為高折射率層,第一結構層121與第三結構層123結為低折射率層。換句話說,第二結構層122與第三結構層123的折射率可以是不同的。在本實施例中,第二結構層122的折射率大
於第一結構層121與第三結構層123的折射率。具體而言,第一光學結構11的折射率為1.63,基底層的折射率為1.57,第一結構層121的折射率為1.45,第二結構層122的折射率為1.63,第三結構層123的折射率為1.45。
This embodiment is substantially the same as the first embodiment, and the differences are explained as follows. In this embodiment, the first
舉例來說,高折射率膠材可含有氧化鋯粒子,低折射率膠材可含有氟化物粒子或氧化矽粒子。然而,上述所舉的例子只是其中一可行的實施例而並非用以限定本發明。 For example, the high refractive index glue material may contain zirconia particles, and the low refractive index glue material may contain fluoride particles or silicon oxide particles. However, the above examples are only one of the possible embodiments and are not intended to limit the present invention.
本實施例與第一實施例大致相同,其差異說明如下。在本實施例中,第一光學結構11、第一結構層121與第三結構層123為高折射率層,第二結構層122為低折射率層。在本實施例中,第二結構層122的折射率小於第一結構層121與第三結構層123的折射率。具體而言,第一光學結構11的折射率為1.63,基底層的折射率為1.57,第一結構層121的折射率為1.63,第二結構層122的折射率為1.45,第三結構層123的折射率為1.63。
This embodiment is substantially the same as the first embodiment, and the differences are explained as follows. In this embodiment, the first
本實施例與第一實施例大致相同,其差異說明如下。在本實施例中,第一光學結構11與第一結構層121為高折射率層,第二結構層122與第三結構層123為低折射率層。在本實施例中,第一結構層121的折射率大於第二結構層122與第三結構層123的折射率。具體而言,第一光學結構11的折射率為1.63,基底層的折射率為1.57,第一結構層121的折射率為1.63,第二結構層122的折射率為1.45,第三結構層123的折射率為1.45。
This embodiment is substantially the same as the first embodiment, and the differences are explained as follows. In this embodiment, the first
需說明的是,由於射入光線被第一光學結構11反射後,朝著反方向前進,使得光線被第二光學結構12再次反射,而回到出光面。因此,在本發明的第二光學結構12中,第一結構層121、第二結構層122及第三結構層123的折射率可以相反設置,藉此通過多次折射、反射或全反射,使
得光線分佈更均勻。
It should be noted that since the incident light is reflected by the first
關於上述第一至第四實施例中,參閱圖4至圖7,為本發明提供一種光學膜的製造方法的流程圖。 Regarding the above-mentioned first to fourth embodiments, refer to FIGS. 4 to 7 , which provide a flow chart of a manufacturing method of an optical film according to the present invention.
在本發明的一實施例中,參閱圖4,其至少包括下列幾個步驟:S100:形成基底層10;S102:將第一光學結構11形成於基底層10的第一表面10a;S104:將第一結構層121形成於基底層10的第二表面10b;S106:將第二結構層122形成於第一結構層121上;以及S108:將第三結構層123形成於第二結構層122上。
In an embodiment of the present invention, referring to Figure 4, it includes at least the following steps: S100: forming the
在本發明的另一實施例中,參閱圖5,為本發明提供一種光學膜的製造方法的流程圖,其至少包括下列幾個步驟:S200:形成基底層10;S202:將第一結構層121形成於基底層10的第二表面10b;S204:將第一光學結構11形成於基底層10的第一表面10a;S206:將第二結構層122形成於第一結構層121上;以及S208:將第三結構層123形成於第二結構層122上。
In another embodiment of the present invention, referring to Figure 5, the present invention provides a flow chart of a manufacturing method of an optical film, which at least includes the following steps: S200: forming the
在本發明的又一實施例中,參閱圖6,為本發明提供一種光學膜的製造方法的流程圖,其至少包括下列幾個步驟:S300:形成基底層10;S302:將第一結構層121形成於基底層10的第二表面10b;S304:將第二結構層122形成於第一結構層121上;S306:將第一光學結構11形成於基底層10的第一表面10a;以及S308:將第三結構層123形成於第二結構層122上。
In another embodiment of the present invention, referring to Figure 6, the present invention provides a flow chart of a manufacturing method of an optical film, which at least includes the following steps: S300: forming the
在本發明的另一實施例中,參閱圖7,為本發明提供一種光學膜的製造方法的流程圖,其至少包括下列幾個步驟:S400:形成基底層10;S402:將第一結構層121形成於基底層10的第二表面10b;S404:將第二結構層122形成於第一結構層121上;S406:將第三結構層123形成於第二結構層122上;以及S408:將第一光學結構11形成於基底層10的第一表面10a。
In another embodiment of the present invention, referring to Figure 7, the present invention provides a flow chart of a manufacturing method of an optical film, which at least includes the following steps: S400: forming the
在本發明中,光學膜可以藉由滾輪(roll to roll)或模壓製成型(molding)逐層製作而成。另外,基底層10可由聚對苯二甲酸乙二酯(polyethylene terephthalate,PET),聚苯乙烯(PS)、聚碳酸脂(PC)、聚氨酯(PU)、聚丙烯(PP)、聚氯乙烯(PVC)、壓克力(PMMA)、丙烯酸(MMA)等製成。然而,只要構成基底層10的材質可允許光束通過,本發明並不限定。考量到後續的加工與應用,基底層10的厚度可以是30μm至250μm,較佳是50μm至125μm。
In the present invention, the optical film can be produced layer by layer by roll to roll or molding. In addition, the
須說明的是,從側視圖來看,第一光學結構11具有多個第一尖角,第一結構層121具有多個第二尖角,第二結構層122具有多個第三尖角,及第三結構層123具有多個第四尖角。進一步而言,第一尖角具有角度θ1,第二尖角具有角度θ2,第三尖角具有角度θ3,及第四尖具有角度角θ4。在本發明的一實施例中,第一尖角的角度θ1與第四尖角θ4的角度皆大於第二尖角的角度θ2與第三尖角的角度θ3。
It should be noted that, from a side view, the first
具體而言,第一尖角的角度θ1可設置為70至100度,較佳為90度。第二尖角的角度θ2可設置為40至60度,較佳為50度。第三尖角的角度θ3可設置為40至60度,較佳為50度。第四尖角的角度θ4可設置為70至100度,較佳為90度。在一實施例中,由於第四尖角的角度θ4趨近於90度,而有利於光束的全反射。 Specifically, the angle θ1 of the first sharp angle can be set to 70 to 100 degrees, preferably 90 degrees. The angle θ2 of the second sharp angle can be set to 40 to 60 degrees, preferably 50 degrees. The angle θ3 of the third sharp angle can be set to 40 to 60 degrees, preferably 50 degrees. The angle θ4 of the fourth sharp angle can be set to 70 to 100 degrees, preferably 90 degrees. In one embodiment, since the angle θ4 of the fourth sharp angle approaches 90 degrees, it is beneficial to total reflection of the light beam.
本發明的其中一有益效果在於,本發明所提供的多層光學膜結構及其製作方法,其能通過“第一光學結構設置在基底層的第一表面,第二光學結構設置在基底層的第二表面”、“第二光學結構包括第一結構層、第二結構層及第三結構層”、“第一結構層位於基底層與第二結構層之間,且第二結構層位於第一結構層與第三結構層之間”以及“第一結構層的折射 率與所述第二結構層的折射率差大於等於0.1”的技術方案,以擴散發光組件所產生的光束。 One of the beneficial effects of the present invention is that the multilayer optical film structure and the manufacturing method provided by the present invention can be configured by "the first optical structure is disposed on the first surface of the base layer, and the second optical structure is disposed on the third surface of the base layer." "Two surfaces", "The second optical structure includes a first structural layer, a second structural layer and a third structural layer", "The first structural layer is located between the base layer and the second structural layer, and the second structural layer is located between the first "between the structural layer and the third structural layer" and "refraction of the first structural layer The refractive index difference between the refractive index and the second structural layer is greater than or equal to 0.1" to diffuse the light beam generated by the light-emitting component.
更進一步來說,通過將第四尖角的角度θ4設置為趨近於90度,由發光單元所產生的光束初次投射到第三斜面S3時被全反射的機率可被大幅地增加,進而提升擴光效果。 Furthermore, by setting the angle θ4 of the fourth sharp angle to be close to 90 degrees, the probability of the light beam generated by the light-emitting unit being totally reflected when it is first projected onto the third slope S3 can be greatly increased, thereby improving the Light expansion effect.
相較於現有的背光模組,本發明實施例的多層光學膜結構,能通過結構層的設置來輸出已被擴散的點光源。據此,本發明的多層光學膜結構能取代習知需額外使用擴散片與增亮片的方式,即便減少光學組件內的光學膜片的數量,仍可在顯示區域具有均勻的亮度分布。如此,可以進一步縮減光學組件的總厚度與顯示裝置的尺寸。 Compared with the existing backlight module, the multi-layer optical film structure of the embodiment of the present invention can output diffused point light sources through the arrangement of structural layers. Accordingly, the multilayer optical film structure of the present invention can replace the conventional method of using additional diffusion sheets and brightness enhancement sheets. Even if the number of optical films in the optical assembly is reduced, uniform brightness distribution can still be achieved in the display area. In this way, the total thickness of the optical component and the size of the display device can be further reduced.
另外,本發明之多層光學膜結構的第二光學層由三層結構層組成,即便第一光學結構(或第二光學結構)的內部不具有氣泡,也能增加光束的折射、反射與散射,從而達到擴散光束的效果。 In addition, the second optical layer of the multilayer optical film structure of the present invention is composed of three structural layers. Even if there are no bubbles inside the first optical structure (or the second optical structure), the refraction, reflection and scattering of the light beam can be increased. This achieves the effect of diffusing the beam.
以上所公開的內容僅為本發明的優選可行實施例,並非因此侷限本發明的申請專利範圍,所以凡是運用本發明說明書及圖式內容所做的等效技術變化,均包含於本發明的申請專利範圍內。 The contents disclosed above are only preferred and feasible embodiments of the present invention, and do not limit the scope of the patent application of the present invention. Therefore, all equivalent technical changes made by using the description and drawings of the present invention are included in the application of the present invention. within the scope of the patent.
1A:光學膜結構
10:基底層
10a:第一表面
10b:第二表面
11:第一光學結構
12:第二光學結構
121:第一結構層
122:第二結構層
123:第三結構層
d1~d4:距離
θ1~θ4:角度
S1~S3:斜面
1A: Optical film structure
10:
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CN107831562A (en) * | 2017-02-23 | 2018-03-23 | 常州华威新材料有限公司 | A kind of high resistance to scraping bright enhancement film and preparation method thereof |
CN208188386U (en) * | 2018-01-03 | 2018-12-04 | 深圳市森太辉煌科技有限公司 | A kind of composite optical diaphragm |
TW201937216A (en) * | 2018-01-24 | 2019-09-16 | 日商日東電工股份有限公司 | Liquid crystal display device, and optical member and optical member set used in said liquid crystal display device |
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TW201015159A (en) * | 2008-10-02 | 2010-04-16 | Gigastorage Corp | Structure for multi-layer coating composite optical film |
CN105409327A (en) * | 2013-05-22 | 2016-03-16 | 三菱丽阳株式会社 | Light extraction film, method for producing same, and surface light emitting body |
CN107831562A (en) * | 2017-02-23 | 2018-03-23 | 常州华威新材料有限公司 | A kind of high resistance to scraping bright enhancement film and preparation method thereof |
CN208188386U (en) * | 2018-01-03 | 2018-12-04 | 深圳市森太辉煌科技有限公司 | A kind of composite optical diaphragm |
TW201937216A (en) * | 2018-01-24 | 2019-09-16 | 日商日東電工股份有限公司 | Liquid crystal display device, and optical member and optical member set used in said liquid crystal display device |
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