TWI816446B - Laser application processing system and method thereof - Google Patents
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Abstract
一種雷射應用處理系統及其方法,係應用於雷射檢測及加工的處理環境中,利用本發明之雷射應用處理系統以進行雷射應用處理方法,於利用雷射檢測過程時,首先,將工件(被加工物)移至飛秒雷射SHG或THG檢測之聚焦光之下方;接著,將取得SHG或THG訊號對工件之空間分佈之數據;進而,依SHG或THG訊號值設定該工件之點所需之最佳雷射加工參數組;再,於進行雷射加工處理過程時,可將已完成雷射檢測過程之工件移至飛秒雷射加工之聚焦光之下方,以進行雷射加工,及/或,先以飛秒雷射加工之聚焦光對工件進行雷射加工,待加工處理完成後,再對工件進行利用雷射檢測過程,以便檢測出雷射加工後之工件是否符合所需要求。本發明之雷射應用處理系統於進行雷射應用處理方法時,例如,以雷射檢測過程之手段,可進行材料不均勻度之檢測,並將此檢測量化,並建立一對應於材料不同位置(例如,一組X,Y,Z座標)之檢測量化值表;另,於進行雷射加工處理過程時,於雷射加工時再依此檢測量化值表進行不同位置之最佳參數組加工。本發明之雷射應用處理系統及方法可結合SHG或THG檢測手法、以及雷射加工手法以完成檢測後補償法。 A laser application processing system and its method are applied in the processing environment of laser detection and processing. The laser application processing system of the present invention is used to perform the laser application processing method. When using the laser detection process, first, Move the workpiece (processed object) under the focused light of femtosecond laser SHG or THG detection; then, the data of the spatial distribution of the SHG or THG signal on the workpiece will be obtained; then, the workpiece will be set according to the SHG or THG signal value. The optimal laser processing parameter set required for the point; furthermore, during the laser processing process, the workpiece that has completed the laser inspection process can be moved under the focused light of femtosecond laser processing for laser processing. Laser processing, and/or, first use the focused light of femtosecond laser processing to laser process the workpiece. After the processing is completed, the workpiece is then subjected to a laser inspection process in order to detect whether the workpiece after laser processing is Meet the required requirements. When the laser application processing system of the present invention performs the laser application processing method, for example, by means of the laser detection process, the unevenness of the material can be detected, the detection can be quantified, and a map corresponding to different positions of the material can be established. (For example, a set of X, Y, Z coordinates) detection quantification value table; in addition, during the laser processing process, the detection quantification value table is used to perform optimal parameter set processing at different positions during laser processing. . The laser application processing system and method of the present invention can combine SHG or THG detection techniques and laser processing techniques to complete the post-detection compensation method.
Description
本發明係有關於雷射應用處理系統及方法,更詳而言之,係有關於一種應用於雷射檢測及加工的處理環境中的雷射應用處理系統及其方法,以雷射檢測過程之手段,可進行材料不均勻度之檢測,並將此檢測量化,並建立一對應於材料不同位置(例如,一組X,Y,Z座標)之檢測量化值表,另,於進行雷射加工處理過程時,於雷射加工時再依此檢測量化值表進行不同位置之最佳參數組加工,本發明之雷射應用處理系統及方法可結合SHG或THG檢測手法、以及雷射加工手法以完成檢測後補償法。 The present invention relates to a laser application processing system and method. More specifically, it relates to a laser application processing system and method applied in a processing environment for laser detection and processing. The invention is based on the laser detection process. The method can detect the unevenness of the material, quantify the detection, and establish a detection quantification value table corresponding to different positions of the material (for example, a set of X, Y, Z coordinates). In addition, during laser processing During the processing process, during laser processing, the optimal parameter set processing at different positions is performed according to this detection and quantification value table. The laser application processing system and method of the present invention can be combined with SHG or THG detection techniques and laser processing techniques to Compensation method after completion of testing.
就目前的雷射加工與檢測而言,二者是分開並於不同的平台予以進行,例如,先於一檢測平台完成檢測並取得不同材料需要不同之最佳雷射加工參數組數據,以便於後續,在另一雷射加工平台上,依不同材料所需之最佳雷射加工參數組數據,對該些不同材料進行雷射加工。 As far as the current laser processing and inspection are concerned, the two are separated and carried out on different platforms. For example, the inspection is first completed on an inspection platform and the optimal laser processing parameter set data required for different materials is obtained, so as to facilitate Subsequently, on another laser processing platform, these different materials are laser processed according to the optimal laser processing parameter set data required for different materials.
然,此類習知雷射加工與檢測技術之缺點在於,由於檢測與加工並非位於同一平台,因而,工件(被加工物)與雷射檢測光/雷射加工之聚焦光的位置校準,常常是一個問題。 However, the disadvantage of this conventional laser processing and inspection technology is that since inspection and processing are not on the same platform, the position calibration of the workpiece (processed object) and the laser inspection light/laser processing focused light is often inconsistent. is a problem.
再,於習知技術中,於進行材料檢測時,常是以破壞性方式來檢測材料,而往往無法得出精準之檢測值,亦無法有效地對工件進行雷射加工。 Furthermore, in the conventional technology, when materials are tested, materials are often detected in a destructive manner, which often fails to obtain accurate detection values, and it is also impossible to effectively perform laser processing on the workpiece.
另,於習知技術中,於進行材料檢測時,無法有效反應材料缺陷、不均勻度等問題,致使工件於進行雷射加工時碰到困難。 In addition, in the conventional technology, problems such as material defects and unevenness cannot be effectively reflected during material inspection, resulting in difficulties in laser processing of the workpiece.
又,習知技術所面臨的課題是,如何克服「同一種材料」但是因材料本身不均勻的關係,造成如果整片材料都用同一種雷射參數加工,而會有效果不佳的問題。 In addition, the problem faced by the conventional technology is how to overcome the problem that the "same material" but the material itself is uneven, resulting in poor results if the entire material is processed with the same laser parameters.
台灣公開/公告號I758923「雷射檢測系統」係揭露一種雷射檢測系統,係由一雷射源發射具有第一光譜之雷射且由第一光纖傳輸該雷射,一增益光纖連接該第一光纖,一光偵測器設置在該增益光纖處,其中,該具有第一光譜之雷射經過該增益光纖時,藉由該增益光纖吸收該具有第一光譜之雷射的部分能階,使得該具有第一光譜之雷射變頻而產生具有第二光譜之光,並由該光偵測器偵測該具有第二光譜之光的強度。本揭露透過摻雜特殊離子之增益光纖吸收雷射的部分能階,藉由該雷射之變頻現象產生其他光,以供偵測該其他光之強度來推得雷射源的功率。 Taiwan Publication/Announcement No. I758923 "Laser Detection System" discloses a laser detection system in which a laser source emits a laser with a first spectrum and transmits the laser through a first optical fiber, and a gain optical fiber is connected to the first optical fiber. An optical fiber, an optical detector is disposed at the gain fiber, wherein when the laser with the first spectrum passes through the gain fiber, part of the energy level of the laser with the first spectrum is absorbed by the gain fiber, The frequency of the laser with the first spectrum is converted to generate light with the second spectrum, and the intensity of the light with the second spectrum is detected by the light detector. This disclosure uses a gain fiber doped with special ions to absorb part of the energy level of the laser, and generates other light through the frequency conversion phenomenon of the laser, so as to detect the intensity of the other light to derive the power of the laser source.
台灣公開/公告號I668406「雷射檢測裝置」係揭露一種雷射檢測裝置,用於測量工件之輪廓,其包括固定件及固定於固定件上之雷射位移感測器,該雷射位移感測器包括並列設置之雷射發射頭及雷射接收頭。該雷射檢測裝置還包括反射件,該反射件包括固定於該固定件上並與該雷射位移感測器間隔設置之稜鏡,該稜鏡具有與該雷射發射頭發出之雷射光相傾斜之反射面,該雷射發射頭能夠從一預設角度發射雷射光至工件上並反射回該雷射接收頭,該稜鏡能夠藉由該反射面將該雷射發射頭發出之部份雷射光沿另一角度反射至該工件上並使該部份雷射光直接反射或經由該稜鏡反射回該雷射接收頭。 Taiwan Publication/Announcement No. I668406 "Laser Detection Device" discloses a laser detection device used to measure the contour of a workpiece. It includes a fixed part and a laser displacement sensor fixed on the fixed part. The laser displacement sensor The detector includes a laser transmitter head and a laser receiver head arranged side by side. The laser detection device also includes a reflective member. The reflective member includes a lens fixed on the fixing member and spaced apart from the laser displacement sensor. The lens has a phase phase with the laser light emitted by the laser emitter. With an inclined reflective surface, the laser emitting head can emit laser light to the workpiece from a preset angle and reflect it back to the laser receiving head. The laser can emit the part of the laser emitting head through the reflective surface. The laser light is reflected to the workpiece at another angle and the part of the laser light is directly reflected or reflected back to the laser receiving head through the lens.
台灣公開/公告號I576187「雷射加工裝置」係揭露一附屬裝置112,而附屬裝置112係收納由相機161、透鏡162及反射鏡163所構成的觀察光學系,且安裝於具備掃描加工雷射光Lp的振鏡156之雷射頭111的底面。來自加工面S的光係透過反射鏡163而反射並射入透鏡162,藉由透鏡162而在相機161的攝像元件中成像加工面S的像。該發明係例如可應用於雷射標示器。 Taiwan Publication/Announcement No. I576187 "Laser Processing Device" discloses an accessory device 112, and the accessory device 112 houses an observation optical system composed of a camera 161, a lens 162 and a reflector 163, and is installed on a device equipped with scanning processing laser light. The bottom surface of the laser head 111 of the galvanometer 156 of Lp. The light from the processing surface S is reflected by the reflecting mirror 163 and enters the lens 162 , and the image of the processing surface S is formed on the imaging element of the camera 161 by the lens 162 . The invention is applicable to laser markers, for example.
台灣公開/公告號I560443「倍頻非螢光基態耗損超解析之顯微成像方法」係揭露一種倍頻非螢光基態耗損超解析之顯微成像方法,其包括下列步驟:提供一有機材料單元;聚焦激發光及基態耗損光;產生倍頻訊號;進行基態耗損;以及進行顯微成像。藉由本發明之實施,以激發光照射並激發有機材料單元,使其電子受激發並跳躍至單重態能階並使其分子感應產生倍頻訊號;又以基態耗損光將有機材料單元之基態能階電子激發至單重態能階,並經由系間轉換至三重態能階而導致有機材料單元產生基態耗損,降低非線性吸收,並抑制倍頻訊號的強度,進而調制(調變)非螢光倍頻訊號在空間上的分布。 如此,可以將STED超解析顯微成像技術應用到非螢光訊號的調變與顯微成像,並提高顯微成像之影像解析度。 Taiwan Publication/Announcement No. I560443 "Frequency-doubled non-fluorescent ground state depletion super-resolution microscopy imaging method" discloses a frequency-doubled non-fluorescent ground state depletion super-resolution microscopy imaging method, which includes the following steps: providing an organic material unit ; Focus the excitation light and ground state depletion light; generate frequency doubled signals; perform ground state depletion; and perform microscopic imaging. Through the implementation of the present invention, the organic material unit is irradiated and excited with excitation light, so that its electrons are excited and jump to the singlet energy level, and its molecules are induced to generate frequency doubled signals; and the ground state energy of the organic material unit is increased by ground state depletion light. The first-order electrons are excited to the singlet energy level and converted to the triplet energy level through the intersystem, causing the organic material unit to generate ground state loss, reducing nonlinear absorption, and suppressing the intensity of the frequency-doubled signal, thus modulating (modulating) the non-fluorescent light. The spatial distribution of frequency doubled signals. In this way, STED super-resolution microscopy imaging technology can be applied to the modulation and microscopy imaging of non-fluorescent signals, and the image resolution of microscopy imaging can be improved.
台灣公開/公告號I725849「用於檢測生物組織之分子結構的系統及方法」係揭露一種用於檢測生物組織之分子結構的系統。系統包括無標記多倍頻顯微鏡及處理器。無標記多倍頻顯微鏡用於藉由二倍頻(SHG)及三倍頻(THG)對目標物進行成像,以分別得到SHG圖像及THG圖像。處理器與無標記多倍頻顯微鏡耦接,且用於將第一偽原色加至SHG圖像,及將第二偽原色加至THG圖像,以分別得到偽原色加成SHG圖像及偽原色加成THG圖像;以及疊加偽原色加成SHG圖像及偽原色加成THG圖像以得到疊加圖像,其中疊加圖像用以判斷目標物中是否具有分子結構。 Taiwan Publication/Announcement No. I725849 "System and Method for Detecting Molecular Structure of Biological Tissue" discloses a system for detecting the molecular structure of biological tissue. The system includes a label-free multi-frequency microscope and processor. The label-free multi-frequency microscope is used to image the target object through double frequency (SHG) and triple frequency (THG) to obtain SHG image and THG image respectively. The processor is coupled to the label-free multi-frequency microscope, and is used to add the first pseudo primary color to the SHG image, and add the second pseudo primary color to the THG image, to obtain the pseudo primary color added SHG image and the pseudo primary color respectively. The primary color plus THG image; and the pseudo primary color plus SHG image and the pseudo primary color plus THG image are superimposed to obtain an overlay image, where the overlay image is used to determine whether the target object has a molecular structure.
所以如何能解決,以習知的雷射加工與檢測而言,二者是分開並於不同的平台予以進行,此類習知雷射加工與檢測技術之缺點在於,由於檢測與加工並非位於同一平台,因而,工件(被加工物)與雷射檢測光/雷射加工之聚焦光的位置校準是問題;於進行材料檢測時,常是以破壞性方式來檢測材料,而往往無法得出精準之檢測值,亦無法有效地對工件進行雷射加工;另,於習知技術中,於進行材料檢測時,無法有效反應材料缺陷、不均勻度等問題,致使工件於進行雷射加工時碰到困難;又,習知技術所面臨的課題是,如何克服「同一種材料」但是因材料本身不均勻的關係,造成如果整片材料都用同一種雷射參數加工,而會有效果不佳的問題;而以上種種所述,均是待解決的問題。 So how to solve the problem? In terms of conventional laser processing and inspection, the two are separated and performed on different platforms. The disadvantage of this conventional laser processing and inspection technology is that since inspection and processing are not located on the same Platform, therefore, the position calibration of the workpiece (processed object) and the laser detection light/focused light of laser processing is a problem; when conducting material inspection, the material is often detected in a destructive manner, and it is often impossible to obtain accurate results. The detection value cannot effectively perform laser processing on the workpiece; in addition, in the conventional technology, when conducting material testing, problems such as material defects and unevenness cannot be effectively reflected, resulting in the workpiece colliding during laser processing. Difficulties are encountered; also, the issue faced by the conventional technology is how to overcome the problem that the same material is not uniform, so if the entire material is processed with the same laser parameters, the effect will be poor. problems; and all the above are problems to be solved.
本發明之主要目的便是在於提供一種雷射應用處理系統及其方法,係應用於雷射檢測及加工的處理環境中,利用本發明之雷射應用處理系統以進行雷射應用處理方法,於利用雷射檢測過程時,首先,將工件(被加工物)移至飛秒雷射SHG或THG檢測之聚焦光之下方;接著,將取得SHG或THG訊號對工件之空間分佈之數據;進而,依SHG或THG訊號值設定該工件之點所需之最佳雷射加工參數組;再,於進行雷射加工處理過程時,可將已完成雷射檢測過程之工件移至飛秒雷射加工之聚焦光之下方,以進行雷射加工,及/或,先以飛秒雷射加工之聚焦光對工件進行雷射加工,待加工處理完成後,再對工件進行利用雷 射檢測過程,以便檢測出雷射加工後之工件是否符合所需要求。本發明之雷射應用處理系統於進行雷射應用處理方法時,例如,以雷射檢測過程之手段,可進行材料不均勻度之檢測,並將此檢測量化,並建立一對應於材料不同位置(例如,一組X,Y,Z座標)之檢測量化值表;另,於進行雷射加工處理過程時,於雷射加工時再依此檢測量化值表進行不同位置之最佳參數組加工。本發明之雷射應用處理系統及方法可結合SHG或THG檢測手法、以及雷射加工手法以完成檢測後補償法。 The main purpose of the present invention is to provide a laser application processing system and a method thereof, which are applied in the processing environment of laser detection and processing. The laser application processing system of the present invention is used to perform the laser application processing method. When using the laser inspection process, first, the workpiece (processed object) is moved under the focused light of the femtosecond laser SHG or THG inspection; then, the data on the spatial distribution of the SHG or THG signal on the workpiece will be obtained; further, Set the optimal laser processing parameter set required for the point of the workpiece according to the SHG or THG signal value; then, during the laser processing process, the workpiece that has completed the laser inspection process can be moved to femtosecond laser processing Below the focused light for laser processing, and/or, first use the focused light of femtosecond laser processing to laser process the workpiece. After the processing is completed, the workpiece is then processed using laser. The laser inspection process is used to detect whether the workpiece after laser processing meets the required requirements. When the laser application processing system of the present invention performs the laser application processing method, for example, by means of the laser detection process, the unevenness of the material can be detected, the detection can be quantified, and a map corresponding to different positions of the material can be established. (For example, a set of X, Y, Z coordinates) detection quantification value table; in addition, during the laser processing process, the detection quantification value table is used to perform optimal parameter set processing at different positions during laser processing. . The laser application processing system and method of the present invention can combine SHG or THG detection techniques and laser processing techniques to complete the post-detection compensation method.
本發明之再一目的便是在於提供一種雷射應用處理系統及其方法,係應用於雷射檢測及加工的處理環境中,能克服「同一種材料」但是因材料本身不均勻的關係,造成如果整片材料都用同一種雷射參數加工,而會有效果不佳的問題;在此,解決方式是,加入線上SHG或THG檢測,可以有效檢測尤其是具晶格的材料,其晶格/雜質等不均勻分佈,以克服此問題。 Another purpose of the present invention is to provide a laser application processing system and method, which are applied in the processing environment of laser detection and processing, and can overcome the problem of "the same material" due to the unevenness of the material itself. If the entire material is processed with the same laser parameters, there will be a problem of poor results; here, the solution is to add online SHG or THG detection, which can effectively detect especially materials with crystal lattice. /Impurities etc. are unevenly distributed to overcome this problem.
本發明之又一目的便是在於提供一種雷射應用處理系統及其方法,係應用於雷射檢測及加工的處理環境中,由於雷射加工與檢測係位於同一工作平台,因而,能解決由於檢測與加工並非位於同一平台,因而,工件(被加工物)與雷射檢測光/雷射加工之聚焦光的位置校準的問題。 Another object of the present invention is to provide a laser application processing system and method, which are applied in the processing environment of laser detection and processing. Since the laser processing and detection systems are located on the same working platform, it can solve the problem of Detection and processing are not on the same platform, so there is a problem in positioning the workpiece (processed object) and the laser detection light/laser processing focused light.
本發明之另一目的便是在於提供一種雷射應用處理系統及其方法,係應用於雷射檢測及加工的處理環境中,於進行材料檢測時,以非破壞性方式來檢測材料、並能得出精準之檢測值以能有效地對工件進行雷射加工。 Another object of the present invention is to provide a laser application processing system and method, which are applied in the processing environment of laser detection and processing. When conducting material detection, materials can be detected in a non-destructive manner and can Accurate detection values are obtained to effectively laser process the workpiece.
本發明之又一目的便是在於提供一種雷射應用處理系統及其方法,係應用於雷射檢測及加工的處理環境中,於進行材料檢測時,檢測手法能有效反應材料缺陷、不均勻度等問題,讓工件於進行雷射加工時不會遭受困難。 Another object of the present invention is to provide a laser application processing system and method, which are applied in the processing environment of laser detection and processing. When conducting material detection, the detection method can effectively reflect material defects and unevenness. and other problems, so that the workpiece will not encounter difficulties during laser processing.
本發明之再一目的便是在於提供一種雷射應用處理系統及其方法,係應用於雷射檢測及加工的處理環境中,加入線上SHG或THG檢測,可以有效檢測尤其是具晶格的材料,其晶格/雜質等不均勻分佈,以克服同一種材料因材料本身不均勻的關係,而造成如果整片材料都用同一種雷射參數加工,會有效果不佳的問題。 Another purpose of the present invention is to provide a laser application processing system and method thereof, which are applied in the processing environment of laser detection and processing. By adding online SHG or THG detection, it can effectively detect especially materials with crystal lattice. , its crystal lattice/impurities are unevenly distributed to overcome the problem of poor results if the entire material is processed with the same laser parameters due to the uneven nature of the material itself.
本發明之另一目的便是在於提供一種雷射應用處理系統及其方法,係應用於雷射檢測及加工的處理環境中,於進行線上SHG或THG檢測時,可將,例如,SHG訊號之函數予以轉換,可定義出材料之不同區域/類別,而於定 義出該材料之該些不同區域/類別後,依該材料之該些不同區域/類別,於指定之該些不同區域/類別以相同及/或不同之雷射加工參數而予以雷射加工,例如,可使用不同之雷射加工功率、使用不同之雷射加工參數組,在此,例如,該些不同之雷射加工參數組是依不同材料/特性而分別予以優化後所得出之。 Another object of the present invention is to provide a laser application processing system and method, which are applied in the processing environment of laser detection and processing. When performing online SHG or THG detection, for example, the SHG signal can be Function can be converted to define different areas/categories of materials, and depending on the After defining the different areas/categories of the material, laser processing is performed in the designated different areas/categories with the same and/or different laser processing parameters according to the different areas/categories of the material, For example, different laser processing powers and different laser processing parameter sets can be used. Here, for example, these different laser processing parameter sets are obtained by optimizing respectively according to different materials/characteristics.
根據以上所述之目的,本發明提供一種雷射應用處理系統,該雷射應用處理系統包含應用於同一移動工作平台的雷射加工次系統、以及雷射檢測次系統。 According to the above objectives, the present invention provides a laser application processing system, which includes a laser processing subsystem and a laser detection subsystem applied to the same mobile work platform.
雷射次系統包含第一飛秒雷射源、第一飛秒雷射加工光、飛秒雷射加工光路模組、以及第一飛秒雷射加工之聚焦光。 The laser subsystem includes the first femtosecond laser source, the first femtosecond laser processing light, the femtosecond laser processing optical path module, and the first femtosecond laser processing focused light.
雷射檢測次系統包含第二飛秒雷射源、第二飛秒雷射SHG或THG檢測光、飛秒雷射檢測光路模組、以及第二飛秒雷射SHG或THG檢測之聚焦光。 The laser detection subsystem includes a second femtosecond laser source, a second femtosecond laser SHG or THG detection light, a femtosecond laser detection optical path module, and a second femtosecond laser SHG or THG detection focused light.
第一飛秒雷射源,該第一飛秒雷射源之波長可不限,而一般常見之波長為1020-1060nm、510-530nm、340-353nm等,通常依為工件之被加工物之光學吸收率對於不同波長之反應特性而選擇之。 The first femtosecond laser source. The wavelength of the first femtosecond laser source is not limited, but the common wavelengths are 1020-1060nm, 510-530nm, 340-353nm, etc., usually based on the optical properties of the workpiece. Absorbance is selected for the response characteristics of different wavelengths.
脈衝常見之重複率(repetition rate)範圍為100kHz-10MHz。 The common repetition rate range of pulses is 100kHz-10MHz.
脈衝寬度(pulse duration)範圍為300飛秒至800飛秒間。 The pulse duration ranges from 300 femtoseconds to 800 femtoseconds.
脈衝能量範圍為1微焦耳(microjoules)至200微焦耳(microjoules)間。 The pulse energy range is from 1 microjoules to 200 microjoules.
光斑品質(M2)範圍為1.0至1.4間,越小越佳。越小代表相同的入射光斑下,相同的聚焦物鏡可以達到較小的聚焦點光斑。 The spot quality (M2) ranges from 1.0 to 1.4, the smaller the better. The smaller the value, the smaller the focus spot with the same incident light spot.
第一飛秒雷射源可具備接受外部電壓訊號或是指令而可調整其輸出功率的手段,熟知技藝之技術領域人士均知其理,是故,在此不再贅述。 The first femtosecond laser source can be equipped with a means of receiving external voltage signals or instructions to adjust its output power. People familiar with the art know the reason, so it will not be described again here.
第一飛秒雷射源在此用途為提供微加工之雷射光,與第二飛秒雷射源之功用(提供SHG或THG之檢測光)不同。 The purpose of the first femtosecond laser source is to provide laser light for microprocessing, which is different from the function of the second femtosecond laser source (to provide detection light for SHG or THG).
注意到是,於實際施行時,第一飛秒雷射源及第二飛秒雷射源也可共用為同一台。 It is noted that in actual implementation, the first femtosecond laser source and the second femtosecond laser source can also be used as the same one.
飛秒雷射加工光路模組,該飛秒雷射加工光路模組之最少功能為(1)導引雷射光方向;及(2)將雷射光產生一聚焦點於工件附近。 Femtosecond laser processing optical path module, the minimum function of the femtosecond laser processing optical path module is to (1) guide the direction of the laser light; and (2) generate a focusing point of the laser light near the workpiece.
可採用幾種不同之方式實現: This can be achieved in several different ways:
1.由一面固定不動之反射鏡及一面聚焦鏡所組成。採用此法時,第一飛秒雷射加工之聚焦光固定不動,如需在工件上製造加工軌跡,可使用移動工作平台將工件移動之,此法一般稱為固定光束法(fixed beam)。 1. Consists of a fixed reflector and a focusing mirror. When using this method, the focused light of the first femtosecond laser processing is fixed. If you need to create a processing track on the workpiece, you can use a mobile work platform to move the workpiece. This method is generally called the fixed beam method.
2.由一面可動之反射鏡及一面聚焦鏡所組成。採用此法,則軌跡可由此可動之反射鏡所產生,工件不動。或是可合併移動工作平台使用,此法又可稱為單軸掃描振鏡(single-axis galvo scanning)。 2. Consists of a movable reflector and a focusing mirror. Using this method, the trajectory can be generated by the movable mirror without moving the workpiece. Or it can be used in conjunction with a mobile work platform. This method is also called single-axis galvo scanning.
3.由兩面可動之反射鏡及一面聚焦鏡所組成。採用此法,則軌跡可由此兩面可動之反射鏡所產生,工件不動。或是可合併移動平台60使用,此法又可稱為雙軸掃描振鏡(duel-axis galvo scanning)。
3. Consists of two movable reflectors and a focusing mirror. Using this method, the trajectory can be generated by the two movable mirrors, and the workpiece does not move. Or it can be used in combination with the
以此類推,也可由N面可動之反射鏡及一面聚焦鏡所組成,常見為五軸(five-axis galvo scanning)掃描振鏡,可提供X,Y方向外,另外有Z方向(平行於第一飛秒雷射加工之聚焦光方向)以及聚焦光相對於工件之兩個傾斜角。 By analogy, it can also be composed of N movable mirrors and a focusing mirror. A common five-axis galvo scanning scanning mirror can provide X, Y directions, and Z direction (parallel to the The direction of the focused light in femtosecond laser processing) and the two tilt angles of the focused light relative to the workpiece.
飛秒雷射加工光路模組可由上述之方式,單獨及/或組合來予以施行,以上方式都應為此發明之飛秒雷射加工光路模組所包含之技術特徵範圍內,但不限於此,只要能達到(1)導引雷射光方向及(2)將雷射光產生一聚焦點於工件附近之功能的方式,都應為本發明之飛秒雷射加工光路模組所涵蓋之範圍,其理相同、類似於上述技術特徵內容,在此,不再贅述之。 The femtosecond laser processing optical path module can be implemented by the above methods, alone and/or in combination. The above methods are all within the scope of the technical features included in the femtosecond laser processing optical path module of this invention, but are not limited to this. , as long as it can achieve the functions of (1) guiding the laser light direction and (2) generating a focusing point of the laser light near the workpiece, it should be covered by the femtosecond laser processing optical path module of the present invention. The reason is the same and similar to the technical features mentioned above, and will not be described again here.
第一飛秒雷射加工光由第一飛秒雷射源射出後,經過飛秒雷射加工光路模組形成第一飛秒雷射加工之聚焦光於工件上。 After the first femtosecond laser processing light is emitted from the first femtosecond laser source, it passes through the femtosecond laser processing optical path module to form the first femtosecond laser processing focused light on the workpiece.
而第二飛秒雷射源射出第二飛秒雷射SHG或THG檢測光,經過飛秒雷射檢測光路模組後形成第二飛秒雷射SHG或THG檢測之聚焦光於工件上。 The second femtosecond laser source emits the second femtosecond laser SHG or THG detection light, and after passing through the femtosecond laser detection optical path module, the second femtosecond laser SHG or THG detection focused light is formed on the workpiece.
工件可被移動工作平台移動而使得工件落於第一飛秒雷射加工之聚焦光或是第二飛秒雷射SHG或THG檢測之聚焦光之下。工件可由一位置P1移至另一位置P2或反向移動,如第一飛秒雷射加工之聚焦光以及第二飛秒雷射SHG或THG檢測光之間之距離為定值,則可輕易映射出移動工作平台應移動到之位置使得第二飛秒雷射SHG或THG檢測光及第一飛秒雷射加工之聚焦光可於移動工作平台移動後打到工件上之同一點。 The workpiece can be moved by the mobile work platform so that the workpiece falls under the focused light of the first femtosecond laser processing or the focused light of the second femtosecond laser SHG or THG detection. The workpiece can be moved from one position P1 to another position P2 or in the opposite direction. If the distance between the focused light of the first femtosecond laser processing and the SHG or THG detection light of the second femtosecond laser is a constant value, it can be easily The position to which the mobile work platform should be moved is mapped so that the second femtosecond laser SHG or THG detection light and the first femtosecond laser processing focused light can hit the same point on the workpiece after the mobile work platform moves.
此結合雷射加工次系統的飛秒雷射加工、以及雷射檢測次系統的飛秒雷射SHG或THG檢測功能為本發明之雷射應用處理系統的重點,於同一移 動工作平台/系統/機器內,可利用飛秒雷射先進行SHG或THG檢測後,再以檢測結果之空間分佈結果決定於工件不同位置上使用不同之雷射加工參數組。 This combination of femtosecond laser processing of the laser processing subsystem and femtosecond laser SHG or THG detection function of the laser detection subsystem is the focus of the laser application processing system of the present invention. In the moving work platform/system/machine, femtosecond laser can be used to first conduct SHG or THG inspection, and then use the spatial distribution of the inspection results to determine the use of different laser processing parameter sets at different positions of the workpiece.
再,於施行時,先以飛秒雷射加工之聚焦光對工件進行雷射加工,待加工處理完成後,再對工件進行利用雷射檢測過程,以便檢測出雷射加工後之工件是否符合所需要求。 Furthermore, during implementation, the workpiece is first laser-processed with the focused light of femtosecond laser processing. After the processing is completed, the workpiece is then subjected to a laser inspection process to detect whether the laser-processed workpiece meets the requirements. Required requirements.
利用本發明之雷射應用處理系統以進行雷射應用處理方法,於利用雷射檢測過程時,首先,將工件(被加工物)移至飛秒雷射SHG或THG檢測之聚焦光之下方。 When using the laser application processing system of the present invention to perform the laser application processing method, during the laser detection process, first, the workpiece (processed object) is moved under the focused light of femtosecond laser SHG or THG detection.
接著,將取得SHG或THG訊號對工件之空間分佈之數據。 Next, data on the spatial distribution of the SHG or THG signal on the workpiece will be obtained.
進而,依SHG或THG訊號值設定該工件之點所需之最佳雷射加工參數組,而完成雷射檢測過程。 Then, the optimal laser processing parameter set required for the point of the workpiece is set according to the SHG or THG signal value to complete the laser inspection process.
再,進行雷射加工處理過程;於進行雷射加工處理過程時,可將已完成雷射檢測過程之工件移至飛秒雷射加工之聚焦光之下方,以進行雷射加工,及/或,先以飛秒雷射加工之聚焦光對工件進行雷射加工,待加工處理完成後,再對工件進行利用雷射檢測過程,以便檢測出雷射加工後之工件是否符合所需要求。 Then, perform the laser processing process; during the laser processing process, the workpiece that has completed the laser inspection process can be moved under the focused light of femtosecond laser processing to perform laser processing, and/or , first use the focused light of femtosecond laser processing to laser process the workpiece. After the processing is completed, the workpiece is then subjected to a laser inspection process to detect whether the laser-processed workpiece meets the required requirements.
本發明之雷射應用處理系統於進行雷射應用處理方法時,例如,以雷射檢測過程之手段,可進行材料不均勻度之檢測,並將此檢測量化,並建立一對應於材料不同位置(例如,一組X,Y,Z座標)之檢測量化值表;另,於進行雷射加工處理過程時,於雷射加工時再依此檢測量化值表進行不同位置之最佳參數組加工。本發明之雷射應用處理系統及方法可結合SHG或THG檢測手法、以及雷射加工手法以完成檢測後補償法。 When the laser application processing system of the present invention performs the laser application processing method, for example, by means of the laser detection process, the unevenness of the material can be detected, the detection can be quantified, and a map corresponding to different positions of the material can be established. (For example, a set of X, Y, Z coordinates) detection quantification value table; in addition, during the laser processing process, the detection quantification value table is used to perform optimal parameter set processing at different positions during laser processing. . The laser application processing system and method of the present invention can combine SHG or THG detection techniques and laser processing techniques to complete the post-detection compensation method.
為使熟悉該項技藝人士瞭解本發明之目的、特徵及功效,茲藉由下述具體實施例,並配合所附之圖式,對本發明詳加說明如後: In order to enable those familiar with the art to understand the purpose, characteristics and effects of the present invention, the present invention is described in detail below through the following specific embodiments and the accompanying drawings:
1:晶圓 1:wafer
2:區域 2:Region
11:區域 11:Region
12:區域 12:Region
10:第一飛秒雷射源 10: The first femtosecond laser source
20:飛秒雷射加工光路模組 20: Femtosecond laser processing optical path module
30:第二飛秒雷射源 30: The second femtosecond laser source
40:飛秒雷射檢測光路模組 40: Femtosecond laser detection optical path module
41:高反射鏡 41:High reflective mirror
42:波長分光鏡 42:Wavelength spectroscope
43:光偵測器 43:Light detector
44:聚焦物鏡 44: Focusing objective lens
50:工件 50:Artifact
60:移動工作平台 60:Mobile work platform
L1:第一飛秒雷射加工光 L1: The first femtosecond laser processing light
L2:第一飛秒雷射加工之聚焦光 L2: The first femtosecond laser processing focused light
L3:第二飛秒雷射SHG或THG檢測光/第一飛秒雷射SHG或THG檢測光 L3: Second femtosecond laser SHG or THG detection light/First femtosecond laser SHG or THG detection light
L4:第二飛秒雷射SHG或THG檢測之聚焦 L4: Focus of the second femtosecond laser SHG or THG detection
M1:分光鏡 M1: Beam splitter
M2:高反射鏡 M2: High reflective mirror
M3:高反射鏡 M3: High reflective mirror
M4:高反射鏡 M4: High reflective mirror
101,102,103,104:步驟 101, 102, 103, 104: Steps
第1圖為一系統示意圖,用以顯示說明本發明之雷射應用處理系統之系統架構、以及運作情形; 第2圖為一流程圖,用以顯示說明利用如第1圖中之本發明之雷射應用處理系統以進行雷射應用處理方法的一流程步驟;第3圖為一流程圖,用以顯示說明利用如第1圖中之本發明之雷射應用處理系統以進行雷射應用處理方法的另一流程步驟;第4圖為一示意圖,用以顯示說明本發明之雷射應用處理系統的一實施例、以及運作情形;第5圖為一示意圖,用以顯示說明本發明之雷射應用處理系統的另一實施例、以及運作情形;第6圖為一側視示意圖,用以顯示利用第4圖或第5圖之雷射應用處理系統的實施例,將SHG或THG訊號轉換為雷射加工參數以進行晶圓檢測及加工的狀況;第7圖為第6圖之俯視示意圖,用以顯示利用第4圖或第5圖之雷射應用處理系統的實施例,將SHG或THG訊號轉換為雷射加工參數以進行晶圓檢測及加工的狀況;以及第8圖為一示意圖,用以顯示說明於第4圖、以及第5圖中之飛秒雷射檢測光路模組的結構。 Figure 1 is a system schematic diagram used to illustrate the system architecture and operation of the laser application processing system of the present invention; Figure 2 is a flow chart for illustrating a process step of a laser application processing method using the laser application processing system of the present invention as shown in Figure 1; Figure 3 is a flow chart for showing Describes another process step of using the laser application processing system of the present invention as shown in Figure 1 to perform a laser application processing method; Figure 4 is a schematic diagram used to illustrate an example of the laser application processing system of the present invention. Embodiment, and operation situation; Figure 5 is a schematic diagram used to illustrate another embodiment of the laser application processing system of the present invention, and operation situation; Figure 6 is a side view schematic diagram used to illustrate the use of the laser application processing system of the present invention; Figure 4 or Figure 5 is an embodiment of a laser application processing system, which converts SHG or THG signals into laser processing parameters for wafer inspection and processing; Figure 7 is a top view schematic diagram of Figure 6, for Shows the use of the embodiment of the laser application processing system in Figure 4 or Figure 5 to convert SHG or THG signals into laser processing parameters for wafer inspection and processing; and Figure 8 is a schematic diagram for The structure of the femtosecond laser detection optical path module illustrated in Figure 4 and Figure 5 is shown.
第1圖為一系統示意圖,用以顯示說明本發明之雷射應用處理系統之系統架構、以及運作情形。如第1圖中所示之,雷射應用處理系統1包含應用於同一移動工作平台的雷射加工次系統2、以及雷射檢測次系統3。
Figure 1 is a system schematic diagram for illustrating the system architecture and operation of the laser application processing system of the present invention. As shown in Figure 1, the laser
雷射加工次系統2包含第一飛秒雷射源(未圖示之)、第一飛秒雷射加工光(未圖示之)、飛秒雷射加工光路模組(未圖示之)、以及第一飛秒雷射加工之聚焦光(未圖示之)。
雷射檢測次系統3包含第二飛秒雷射源(未圖示之)、第二飛秒雷射SHG或THG檢測光(未圖示之)、飛秒雷射檢測光路模組(未圖示之)、以及第二飛秒雷射SHG或THG檢測之聚焦光(未圖示之)。
The
第一飛秒雷射源,該第一飛秒雷射源之波長可不限,而一般常見之波長為1020-1060nm、510-530nm、340-353nm等,通常依為工件之被加工物之光學吸收率對於不同波長之反應特性而選擇之。 The first femtosecond laser source. The wavelength of the first femtosecond laser source is not limited, but the common wavelengths are 1020-1060nm, 510-530nm, 340-353nm, etc., usually based on the optical properties of the workpiece. Absorbance is selected for the response characteristics of different wavelengths.
脈衝常見之重複率(repetition rate)範圍為100kHz-10MHz。 The common repetition rate range of pulses is 100kHz-10MHz.
脈衝寬度(pulse duration)範圍為300飛秒至800飛秒間。 The pulse duration ranges from 300 femtoseconds to 800 femtoseconds.
脈衝能量範圍為1微焦耳(microjoules)至200微焦耳(microjoules)間。 The pulse energy range is from 1 microjoules to 200 microjoules.
光斑品質(M2)範圍為1.0至1.4間,越小越佳。越小代表相同的入射光斑下,相同的聚焦物鏡可以達到較小的聚焦點光斑。 The spot quality (M2) ranges from 1.0 to 1.4, the smaller the better. The smaller the value, the smaller the focus spot with the same incident light spot.
第一飛秒雷射源可具備接受外部電壓訊號或是指令而可調整其輸出功率的手段,熟知技藝之技術領域人士均知其理,是故,在此不再贅述。 The first femtosecond laser source can be equipped with a means of receiving external voltage signals or instructions to adjust its output power. People familiar with the art know the reason, so it will not be described again here.
第一飛秒雷射源在此用途為提供微加工之雷射光,與第二飛秒雷射源之功用(提供SHG或THG之檢測光)不同。 The purpose of the first femtosecond laser source is to provide laser light for microprocessing, which is different from the function of the second femtosecond laser source (to provide detection light for SHG or THG).
注意到是,於實際施行時,第一飛秒雷射源及第二飛秒雷射源也可共用為同一台。 It is noted that in actual implementation, the first femtosecond laser source and the second femtosecond laser source can also be used as the same one.
飛秒雷射加工光路模組,該飛秒雷射加工光路模組之最少功能為(1)導引雷射光方向;及(2)將雷射光產生一聚焦點於工件附近。 Femtosecond laser processing optical path module, the minimum function of the femtosecond laser processing optical path module is to (1) guide the direction of the laser light; and (2) generate a focusing point of the laser light near the workpiece.
可採用幾種不同之方式實現: This can be achieved in several different ways:
1.由一面固定不動之反射鏡及一面聚焦鏡所組成。採用此法時,第一飛秒雷射加工之聚焦光固定不動,如需在工件上製造加工軌跡,可使用移動工作平台將工件移動之,此法一般稱為固定光束法(fixed beam)。 1. Consists of a fixed reflector and a focusing mirror. When using this method, the focused light of the first femtosecond laser processing is fixed. If you need to create a processing track on the workpiece, you can use a mobile work platform to move the workpiece. This method is generally called the fixed beam method.
2.由一面可動之反射鏡及一面聚焦鏡所組成。採用此法,則軌跡可由此可動之反射鏡所產生,工件不動。或是可合併移動工作平台使用,此法又可稱為單軸掃描振鏡(single-axis galvo scanning)。 2. Consists of a movable reflector and a focusing mirror. Using this method, the trajectory can be generated by the movable mirror without moving the workpiece. Or it can be used in conjunction with a mobile work platform. This method is also called single-axis galvo scanning.
3.由兩面可動之反射鏡及一面聚焦鏡所組成。採用此法,則軌跡可由此兩面可動之反射鏡所產生,工件不動。或是可合併移動平台60使用,此法又可稱為雙軸掃描振鏡(duel-axis galvo scanning)。
3. Consists of two movable reflectors and a focusing mirror. Using this method, the trajectory can be generated by the two movable mirrors, and the workpiece does not move. Or it can be used in combination with the
以此類推,也可由N面可動之反射鏡及一面聚焦鏡所組成,常見為五軸(five-axis galvo scanning)掃描振鏡,可提供X,Y方向外,另外有Z方向(平行於第一飛秒雷射加工之聚焦光方向)以及聚焦光相對於工件之兩個傾斜角。 By analogy, it can also be composed of N movable mirrors and a focusing mirror. A common five-axis galvo scanning scanning mirror can provide X, Y directions, and Z direction (parallel to the The direction of the focused light in femtosecond laser processing) and the two tilt angles of the focused light relative to the workpiece.
飛秒雷射加工光路模組可由上述之方式,單獨及/或組合來予以施行,以上方式都應為此發明之飛秒雷射加工光路模組所包含之技術特徵範圍內,但不限於此,只要能達到(1)導引雷射光方向及(2)將雷射光產生一聚焦點於 工件附近之功能的方式,都應為本發明之飛秒雷射加工光路模組所涵蓋之範圍,其理相同、類似於上述技術特徵內容,在此,不再贅述之。 The femtosecond laser processing optical path module can be implemented by the above methods, alone and/or in combination. The above methods are all within the scope of the technical features included in the femtosecond laser processing optical path module of this invention, but are not limited to this. , as long as it can (1) guide the laser light direction and (2) generate a focusing point for the laser light The functions and methods near the workpiece should all fall within the scope of the femtosecond laser processing optical path module of the present invention. The principles are the same and similar to the above technical features, and will not be described again here.
第一飛秒雷射加工光由第一飛秒雷射源射出後,經過飛秒雷射加工光路模組形成第一飛秒雷射加工之聚焦光於工件上。 After the first femtosecond laser processing light is emitted from the first femtosecond laser source, it passes through the femtosecond laser processing optical path module to form the first femtosecond laser processing focused light on the workpiece.
而第二飛秒雷射源射出第二飛秒雷射SHG或THG檢測光,經過飛秒雷射檢測光路模組後形成第二飛秒雷射SHG或THG檢測之聚焦光於工件上。 The second femtosecond laser source emits the second femtosecond laser SHG or THG detection light, and after passing through the femtosecond laser detection optical path module, the second femtosecond laser SHG or THG detection focused light is formed on the workpiece.
工件可被移動工作平台移動而使得工件落於第一飛秒雷射加工之聚焦光或是第二飛秒雷射SHG或THG檢測之聚焦光之下。工件可由一位置P1移至另一位置P2或反向移動,如第一飛秒雷射加工之聚焦光以及第二飛秒雷射SHG或THG檢測光之間之距離為定值,則可輕易映射出移動工作平台應移動到之位置使得第二飛秒雷射SHG或THG檢測光及第一飛秒雷射加工之聚焦光可於移動工作平台移動後打到工件上之同一點。 The workpiece can be moved by the mobile work platform so that the workpiece falls under the focused light of the first femtosecond laser processing or the focused light of the second femtosecond laser SHG or THG detection. The workpiece can be moved from one position P1 to another position P2 or in the opposite direction. If the distance between the focused light of the first femtosecond laser processing and the SHG or THG detection light of the second femtosecond laser is a constant value, it can be easily The position to which the mobile work platform should be moved is mapped so that the second femtosecond laser SHG or THG detection light and the first femtosecond laser processing focused light can hit the same point on the workpiece after the mobile work platform moves.
此結合雷射加工次系統的飛秒雷射加工、以及雷射檢測次系統的飛秒雷射SHG或THG檢測功能為本發明之雷射應用處理系統的重點,於同一移動工作平台/系統/機器內,可利用飛秒雷射先進行SHG或THG檢測後,再以檢測結果之空間分佈結果決定於工件不同位置上使用不同之雷射加工參數組。 This combination of femtosecond laser processing of the laser processing subsystem and femtosecond laser SHG or THG detection function of the laser detection subsystem is the focus of the laser application processing system of the present invention. On the same mobile work platform/system/ In the machine, femtosecond laser can be used to conduct SHG or THG inspection first, and then the spatial distribution of the inspection results can be used to determine the use of different laser processing parameter sets at different positions of the workpiece.
再,於施行時,先以飛秒雷射加工之聚焦光對工件進行雷射加工,待加工處理完成後,再對工件進行利用雷射檢測過程,以便檢測出雷射加工後之工件是否符合所需要求。 Furthermore, during implementation, the workpiece is first laser-processed with the focused light of femtosecond laser processing. After the processing is completed, the workpiece is then subjected to a laser inspection process to detect whether the laser-processed workpiece meets the requirements. Required requirements.
飛秒雷射為可產生脈衝光且脈衝寬度為數十至數百飛秒之雷射。 Femtosecond laser is a laser that can generate pulsed light with a pulse width of tens to hundreds of femtoseconds.
因其脈衝寬度極短,因而能在瞬間產生極高之瞬間功率(Peak power),如結合合適之聚焦鏡將雷射光斑聚至數微米至數十微米,則可達到瞬間極高的瞬間功率密度(peak intensity),此高瞬間功率密度可直接游離大部分已知的材料或是破壞材料晶格。 Because of its extremely short pulse width, it can generate extremely high peak power in an instant. If combined with a suitable focusing lens to focus the laser spot to several microns to tens of microns, extremely high peak power can be achieved. Density (peak intensity), this high instantaneous power density can directly dissociate most known materials or destroy the material lattice.
相較於脈衝長於1000飛秒(即1皮秒)以上的雷射來說,飛秒雷射較易達到高的瞬間功率密度同時維持較低的平均功率(average power),平均功率為熱效應的來源。 Compared with lasers whose pulses are longer than 1000 femtoseconds (i.e. 1 picosecond), femtosecond lasers are easier to achieve high instantaneous power density while maintaining a low average power (average power). The average power is due to thermal effects. Source.
簡而言之,飛秒雷射適合用來作為材料之減法加工,並且具有不易造成熱效應的優點。 In short, femtosecond laser is suitable for subtractive processing of materials and has the advantage of not easily causing thermal effects.
在工業應用上,以雷射進行材料加工應用極具商業價值,譬如晶圓切割(dicing)、切片(slicing)、改質(modification)、劃線(grooving)、修補(repair)等。 In industrial applications, laser material processing applications are of great commercial value, such as wafer cutting, slicing, modification, grooving, repair, etc.
其中,可被雷射加工之材料極為多元,可為半導體材料如矽、砷化鎵、碳化矽、氮化鎵;或為陶瓷材料如氧化鋁、氮化矽等;或玻璃材料;或為多晶材料如藍寶石(sapphire)晶圓;或為有機材料如聚醯亞胺(PI)…等。 Among them, the materials that can be processed by laser are extremely diverse. They can be semiconductor materials such as silicon, gallium arsenide, silicon carbide, and gallium nitride; or ceramic materials such as alumina, silicon nitride, etc.; or glass materials; or many more Crystalline materials such as sapphire wafers; or organic materials such as polyimide (PI), etc.
而由雷射加工習知技術及一般常識可知,雷射加工時,針對不同材料其所要施加之雷射加工參數,例如功率、速度、加工趟數、聚焦點大小、雷射重複頻率、波長等,均需視材料特性如光吸收率、材料加工閾值(ablation threshold)等,而作調整,才能達到較佳效果。 From the conventional laser processing technology and general common sense, we can know that during laser processing, the laser processing parameters to be applied to different materials, such as power, speed, number of processing passes, focus point size, laser repetition frequency, wavelength, etc. , all need to be adjusted according to material characteristics such as light absorption rate, material processing threshold (ablation threshold), etc., in order to achieve better results.
換言之,不同材料需要不同的最佳雷射加工參數組。此處「最佳效果」可以是最少的熱影響區(heat affected zone)、最細加工線寬、最高的加工產能等等,依加工需求定義之,應都可以相對地在工程上找到一組以上之較合適之雷射加工參數。 In other words, different materials require different optimal sets of laser processing parameters. The "best effect" here can be the smallest heat affected zone, the thinnest processing line width, the highest processing capacity, etc. It can be defined according to the processing requirements, and a group can be found in the project accordingly. The above are more suitable laser processing parameters.
同理,如被加工材料本身已具有不均勻度,例如晶格排列、雜質濃度、表面粗糙度等不同,均會影響被加工材料之特性(上述的光吸收率及加工閾值等),因此同一種材料、於其不同空間上的區域,也有可能需要不同的最佳雷射加工參數組。 In the same way, if the material to be processed already has unevenness, such as differences in crystal lattice arrangement, impurity concentration, surface roughness, etc., it will affect the characteristics of the material to be processed (the above-mentioned light absorption rate and processing threshold, etc.), so the same A material may also require different optimal laser processing parameter sets for different spatial regions.
此「同種材料」但由於「不完美性(imperfection)」或「不均勻度(inhomogeneity)」而造成最佳參數組不同的問題,解決之手段之一可以是尋求一次佳之加工參數組,使得此參數組可應付不均勻之材料。然而此法將使得最佳加工效果無法被達到。 This "same material" has different optimal parameter sets due to "imperfection" or "inhomogeneity". One of the solutions can be to find an optimal processing parameter set so that this Parameter groups can cope with non-uniform materials. However, this method will prevent the optimal processing effect from being achieved.
另一可能之解決手段為以下:以某種檢測手段,進行材料不均勻度之檢測,並將此檢測量化,並建立一對應於材料不同位置(例如,X,Y,Z座標)之檢測量化值表。接著,於雷射加工時再依此表進行不同位置之最佳參數組加工。 Another possible solution is as follows: use some kind of detection method to detect the unevenness of the material, quantify the detection, and establish a detection quantification corresponding to different positions of the material (for example, X, Y, Z coordinates) value table. Then, during laser processing, the optimal parameter set for different positions is processed according to this table.
此法,在此可簡化稱為檢測後補償法。 This method can be simply called the post-detection compensation method.
檢測手段相當關鍵,其檢測必須能提供有意義之量化值才能使得工程上可依此值找到合適之加工參數組。 The detection method is very critical, and its detection must provide meaningful quantitative values so that the appropriate processing parameter set can be found based on this value in the project.
於檢測手法上,在生醫領域上為使用飛秒雷射進行螢光顯微術或是非線性影像顯微術。利用到飛秒雷射瞬間功率極高的特性,前者為在樣本中激發螢光分子,儀器並收集此螢光訊號並轉為影像;後者為在樣本中激發二倍頻(second harmonic generation,SHG)或三倍頻(third harmonic generation,THG)訊號,並收集此二倍頻或三倍頻光並轉為影像。 In terms of detection methods, in the biomedical field, femtosecond laser is used for fluorescence microscopy or nonlinear imaging microscopy. Taking advantage of the extremely high instantaneous power of femtosecond laser, the former excites fluorescent molecules in the sample, and the instrument collects the fluorescent signals and converts them into images; the latter excites second harmonic generation (SHG) in the sample. ) or third harmonic generation (THG) signal, and collects this second or triple frequency light and converts it into an image.
SHG或THG訊號之技術為在樣本中激發二倍頻(second harmonic generation,SHG)或三倍頻(third harmonic generation,THG)訊號,並收集此二倍頻或三倍頻光並轉為影像;其中,以SHG或THG訊號為檢測手段,進行材料不均勻度之檢測,並將此檢測量化,並建立一對應於材料不同位置(某X,Y,Z座標)之檢測量化值表;接著,於雷射加工時再依此表進行不同位置之最佳參數組加工。 The SHG or THG signal technology is to excite a second harmonic generation (SHG) or third harmonic generation (THG) signal in the sample, and collect the second harmonic generation or third harmonic generation (THG) light and convert it into an image; Among them, the SHG or THG signal is used as a detection method to detect material unevenness, quantify the detection, and establish a detection quantification value table corresponding to different positions of the material (certain X, Y, Z coordinates); then, During laser processing, follow this table to process the optimal parameter set for different positions.
SHG或THG訊號之技術,亦即使用飛秒雷射產生SHG或THG光亦可應用於可被雷射加工之材料上,而此為本發明之雷射應用處理系統及其方法的核心概念,亦即結合SHG或THG檢測手法以及雷射加工手法以做到檢測後補償法。 The SHG or THG signal technology, that is, using femtosecond laser to generate SHG or THG light, can also be applied to materials that can be laser processed. This is the core concept of the laser application processing system and method of the present invention. That is to say, the SHG or THG detection method and the laser processing method are combined to achieve post-inspection compensation method.
SHG光對於可有效用來檢測非中心對稱(non-centrosymmetric)之材料,因理論上SHG於中心對稱(centrosymmetric)材料並無法產生,除非於介面或表面上,而THG光可有效用來檢測介面(interface)存在。 SHG light can be effectively used to detect non-centrosymmetric materials, because theoretically SHG cannot be produced in centrosymmetric materials except at the interface or surface, while THG light can be effectively used to detect the interface. (interface) exists.
回歸到上述雷射加工時材料不均勻之問題,一創新的解決方法急需要被提出。 Returning to the above-mentioned problem of material unevenness during laser processing, an innovative solution urgently needs to be proposed.
本發明之雷射應用處理系統及其方法,即為結合SHG或THG檢測方法於飛秒雷射加工機上,以克服雷射加工時材料不均勻之問題。 The laser application processing system and method of the present invention combine the SHG or THG detection method on the femtosecond laser processing machine to overcome the problem of uneven materials during laser processing.
第2圖為一流程圖,用以顯示說明利用如第1圖中之本發明之雷射應用處理系統以進行雷射應用處理方法的一流程步驟。如第2圖中所示之,首先,於步驟101,進行工件檢測啟始動作;將工件(被加工物)移至飛秒雷射SHG或THG檢測之聚焦光(例如,第二飛秒雷射SHG或THG檢測之聚焦L4)之下方;並進到步驟102。
FIG. 2 is a flow chart illustrating a process step of a laser application processing method using the laser application processing system of the present invention as shown in FIG. 1 . As shown in Figure 2, first, in
於步驟102,進行取得數據動作;利用飛秒雷射SHG或THG檢測之聚焦光(例如,第二飛秒雷射SHG或THG檢測之聚焦L4)於該工件上產生SHG或THG波長之光,進行SHG或THG檢測,並收集SHG或THG該波長之光以光偵測
器之手段轉為數據,得出檢測結果之空間分佈結果,將取得SHG或THG訊號對工件之空間分佈之數據,並進到步驟103。
In
在此,SHG或THG訊號之技術為在樣本中激發二倍頻(second harmonic generation,SHG)或三倍頻(third harmonic generation,THG)訊號,並收集此二倍頻或三倍頻光並轉為影像。 Here, the technology of SHG or THG signal is to excite the second harmonic generation (SHG) or third harmonic generation (THG) signal in the sample, and collect the second harmonic generation or third harmonic generation light and convert it into for images.
於步驟103,設定最佳雷射加工參數組動作;依SHG或THG訊號值設定該工件之點所需之最佳雷射加工參數組,而完成雷射檢測過程。
In
在此,可利用飛秒雷射先進行SHG或THG檢測後,再以檢測結果之空間分佈結果決定於工件不同位置上使用不同之雷射加工參數組;以SHG或THG訊號為檢測手段,進行材料不均勻度之檢測,並將此檢測量化,並建立一對應於材料不同位置(某X,Y,Z座標)之檢測量化值表;接著,於雷射加工時再依此表進行不同位置之最佳雷射加工參數組加工。 Here, femtosecond laser can be used to perform SHG or THG detection first, and then the spatial distribution of the detection results can be used to determine the use of different laser processing parameter sets at different positions of the workpiece; SHG or THG signals can be used as detection means. Detect material unevenness, quantify the detection, and establish a table of detection quantified values corresponding to different positions of the material (certain X, Y, Z coordinates); then, use this table to perform different positions during laser processing The best laser processing parameter set for processing.
雷射檢測過程係包含步驟101、102、以及103。
The laser detection process includes
再,於步驟104,進行雷射加工處理過程;於進行雷射加工處理過程時,可將已完成雷射檢測過程之工件移至飛秒雷射加工之聚焦光之下方,以進行雷射加工。
Then, in
本發明之雷射應用處理系統於進行雷射應用處理方法時,例如,以雷射檢測過程之手段,可進行材料不均勻度之檢測,並將此檢測量化,並建立一對應於材料不同位置(例如,一組X,Y,Z座標)之檢測量化值表;另,於進行雷射加工處理過程時,於雷射加工時再依此檢測量化值表進行不同位置之最佳參數組加工。本發明之雷射應用處理系統及方法可結合SHG或THG檢測手法、以及雷射加工手法以完成檢測後補償法。 When the laser application processing system of the present invention performs the laser application processing method, for example, by means of the laser detection process, the unevenness of the material can be detected, the detection can be quantified, and a map corresponding to different positions of the material can be established. (For example, a set of X, Y, Z coordinates) detection quantification value table; in addition, during the laser processing process, the detection quantification value table is used to perform optimal parameter set processing at different positions during laser processing. . The laser application processing system and method of the present invention can combine SHG or THG detection techniques and laser processing techniques to complete the post-detection compensation method.
第3圖為一流程圖,用以顯示說明利用如第1圖中之本發明之雷射應用處理系統以進行雷射應用處理方法的另一流程步驟。如第3圖中所示之,首先,於步驟201,進行雷射加工處理過程;先以飛秒雷射加工之聚焦光對工件進行雷射加工,待加工處理完成後,再對工件進行利用雷射檢測過程,以便檢測出雷射加工後之工件是否符合所需要求;並進到步驟202。
FIG. 3 is a flow chart illustrating another process step of using the laser application processing system of the present invention as shown in FIG. 1 to perform a laser application processing method. As shown in Figure 3, first, in
於步驟202,進行工件檢測啟始動作;將工件(被加工物)移至飛秒雷射SHG或THG檢測之聚焦光(例如,第二飛秒雷射SHG或THG檢測之聚焦L4)之下方;並進到步驟203。
In
於步驟203,進行取得數據動作;利用飛秒雷射SHG或THG檢測之聚焦光(例如,第二飛秒雷射SHG或THG檢測之聚焦L4)於該工件上產生SHG或THG波長之光,進行SHG或THG檢測,並收集SHG或THG該波長之光以光偵測器之手段轉為數據,得出檢測結果之空間分佈結果,將取得SHG或THG訊號對工件之空間分佈之數據,並進到步驟204。
In
在此,SHG或THG訊號之技術為在樣本中激發二倍頻(second harmonic generation,SHG)或三倍頻(third harmonic generation,THG)訊號,並收集此二倍頻或三倍頻光並轉為影像。 Here, the technology of SHG or THG signal is to excite the second harmonic generation (SHG) or third harmonic generation (THG) signal in the sample, and collect the second harmonic generation or third harmonic generation light and convert it into for images.
於步驟204,設定最佳雷射加工參數組動作;依SHG或THG訊號值設定該工件之點所需之最佳雷射加工參數組,而完成雷射檢測過程。
In
在此,可利用飛秒雷射先進行SHG或THG檢測後,再以檢測結果之空間分佈結果決定於工件不同位置上使用不同之雷射加工參數組;以SHG或THG訊號為檢測手段,進行材料不均勻度之檢測,並將此檢測量化,並建立一對應於材料不同位置(某X,Y,Z座標)之檢測量化值表;接著,於雷射加工時再依此表進行不同位置之最佳雷射加工參數組加工。 Here, femtosecond laser can be used to perform SHG or THG detection first, and then the spatial distribution of the detection results can be used to determine the use of different laser processing parameter sets at different positions of the workpiece; SHG or THG signals can be used as detection means. Detect material unevenness, quantify the detection, and establish a table of detection quantified values corresponding to different positions of the material (certain X, Y, Z coordinates); then, use this table to perform different positions during laser processing The best laser processing parameter set for processing.
在此,雷射檢測過程係包含步驟202、203、以及204。
Here, the laser detection process includes
若經雷射檢測過程後之工件不符合需求,則將再進行新的一雷射檢測過程,以便得出新的所需之最佳雷射加工參數組,待新的該雷射檢測過程完成後,將再進行另一雷射加工處理過程;於進行該另一雷射加工處理過程時,可將已完成雷射檢測過程之工件移至飛秒雷射加工之聚焦光之下方,以進行雷射加工。 If the workpiece after the laser inspection process does not meet the requirements, a new laser inspection process will be carried out in order to obtain a new required optimal laser processing parameter set, until the new laser inspection process is completed. After that, another laser processing process will be performed; while performing this other laser processing process, the workpiece that has completed the laser inspection process can be moved under the focused light of femtosecond laser processing to perform Laser processing.
第4圖為一示意圖,用以顯示說明本發明之雷射應用處理系統的一實施例、以及運作情形。 FIG. 4 is a schematic diagram illustrating an embodiment of the laser application processing system of the present invention and its operation.
如第4圖中所示之,雷射應用處理系統1包含應用於同一移動工作平台60的雷射加工次系統2、以及雷射檢測次系統3。
As shown in FIG. 4 , the laser
雷射加工次系統2包含第一飛秒雷射源1()、第一飛秒雷射加工光L1、飛秒雷射加工光路模組20、以及第一飛秒雷射加工之聚焦光L2。
The
雷射檢測次系統3包含第二飛秒雷射源30、第二飛秒雷射SHG或THG檢測光L3、飛秒雷射檢測光路模組40、以及第二飛秒雷射SHG或THG檢測之聚焦光L4。
The
第一飛秒雷射源10,該第一飛秒雷射源10之波長可不限,而一般常見之波長為1020-1060nm、510-530nm、340-353nm等,通常依為工件50之被加工物之光學吸收率對於不同波長之反應特性而選擇之。
The wavelength of the first
脈衝常見之重複率(repetition rate)範圍為100kHz-10MHz。 The common repetition rate range of pulses is 100kHz-10MHz.
脈衝寬度(pulse duration)範圍為300飛秒至800飛秒間。 The pulse duration ranges from 300 femtoseconds to 800 femtoseconds.
脈衝能量範圍為1微焦耳(microjoules)至200微焦耳(microjoules)間。 The pulse energy range is from 1 microjoules to 200 microjoules.
光斑品質(M2)範圍為1.0至1.4間,越小越佳。越小代表相同的入射光斑下,相同的聚焦物鏡可以達到較小的聚焦點光斑。 The spot quality (M2) ranges from 1.0 to 1.4, the smaller the better. The smaller the value, the smaller the focus spot with the same incident light spot.
第一飛秒雷射源10可具備接受外部電壓訊號或是指令而可調整其輸出功率的手段,熟知技藝之技術領域人士均知其理,是故,在此不再贅述。
The first
第一飛秒雷射源10在此用途為提供微加工之雷射光,與第二飛秒雷射源30之功用(提供SHG或THG之檢測光)不同。
The purpose of the first
注意到是,於實際施行時,第一飛秒雷射源10及第二飛秒雷射源30也可共用為同一台,如第5圖中所示之。
It should be noted that in actual implementation, the first
飛秒雷射加工光路模組20,該飛秒雷射加工光路模組20之最少功能為(1)導引雷射光方向;及(2)將雷射光產生一聚焦點於工件50附近。
Femtosecond laser processing
可採用幾種不同之方式實現: This can be achieved in several different ways:
1.由一面固定不動之反射鏡及一面聚焦鏡所組成。採用此法時,第一飛秒雷射加工之聚焦光L2固定不動,如需在工件上製造加工軌跡,可使用移動工作平台60將工件50移動之,此法一般稱為固定光束法(fixed beam)。
1. Consists of a fixed reflector and a focusing mirror. When this method is used, the focused light L2 of the first femtosecond laser processing is fixed. If it is necessary to create a processing track on the workpiece, the
2.由一面可動之反射鏡及一面聚焦鏡所組成。採用此法,則軌跡可由此可動之反射鏡所產生,工件不動。或是可合併移動工作平台60使用,此法又可稱為單軸掃描振鏡(single-axis galvo scanning)。
2. Consists of a movable reflector and a focusing mirror. Using this method, the trajectory can be generated by the movable mirror without moving the workpiece. Or it can be used in combination with the mobile working
3.由兩面可動之反射鏡及一面聚焦鏡所組成。採用此法,則軌跡可由此兩面可動之反射鏡所產生,工件不動。或是可合併移動平台60使用,此法又可稱為雙軸掃描振鏡(duel-axis galvo scanning)。
3. Consists of two movable reflectors and a focusing mirror. Using this method, the trajectory can be generated by the two movable mirrors, and the workpiece does not move. Or it can be used in combination with the
以此類推,也可由N面可動之反射鏡及一面聚焦鏡所組成,常見為五軸(five-axis galvo scanning)掃描振鏡,可提供X,Y方向外,另外有Z方向(平行於第一飛秒雷射加工之聚焦光方向)以及聚焦光相對於工件之兩個傾斜角。 By analogy, it can also be composed of N movable mirrors and a focusing mirror. A common five-axis galvo scanning scanning mirror can provide X, Y directions, and Z direction (parallel to the The direction of the focused light in femtosecond laser processing) and the two tilt angles of the focused light relative to the workpiece.
飛秒雷射加工光路模組可由上述之方式,單獨及/或組合來予以施行,以上方式都應為此發明之飛秒雷射加工光路模組所包含之技術特徵範圍內,但不限於此,只要能達到(1)導引雷射光方向及(2)將雷射光產生一聚焦點於工件50附近之功能的方式,都應為本發明之飛秒雷射加工光路模組所涵蓋之範圍,其理相同、類似於上述技術特徵內容,在此,不再贅述之。
The femtosecond laser processing optical path module can be implemented by the above methods, alone and/or in combination. The above methods are all within the scope of the technical features included in the femtosecond laser processing optical path module of this invention, but are not limited to this. , as long as it can achieve the functions of (1) guiding the laser light direction and (2) generating a focusing point of the laser light near the
第一飛秒雷射加工光L1由第一飛秒雷射源射10出後,經過飛秒雷射加工光路模組20形成第一飛秒雷射加工之聚焦光L2於工件50上。
After the first femtosecond laser processing light L1 is emitted from the first
而第二飛秒雷射源30射出第二飛秒雷射SHG或THG檢測光L3,經過飛秒雷射檢測光路模組40後形成第二飛秒雷射SHG或THG檢測之聚焦光L4於工件50上。
The second
工件50可被移動工作平台60移動而使得工件50落於第一飛秒雷射加工之聚焦光L2或是第二飛秒雷射SHG或THG檢測之聚焦光L4之下。工件50可由一位置P1移至另一位置P2或反向移動,如第一飛秒雷射加工之聚焦光L2以及第二飛秒雷射SHG或THG檢測光L3之間之距離為定值(於此架設中此條件成立),則可輕易映射出移動工作平台60應移動到之位置使得第二飛秒雷射SHG或THG檢測光L3及第一飛秒雷射加工之聚焦光L2可於移動工作平台60移動後打到工件50上之同一點。
The
此結合雷射加工次系統2的飛秒雷射加工、以及雷射檢測次系統3的飛秒雷射SHG或THG檢測功能為本發明之雷射應用處理系統1的重點,於同一移動工作平台/系統/機器內,可利用飛秒雷射先進行SHG或THG檢測後,再以檢測結果之空間分佈結果決定於工件不同位置上使用不同之雷射加工參數組。
This combination of femtosecond laser processing of the
再,於施行時,先以飛秒雷射加工之聚焦光對工件進行雷射加工,待加工處理完成後,再對工件進行利用雷射檢測過程,以便檢測出雷射加工後之工件是否符合所需要求。 Furthermore, during implementation, the workpiece is first laser-processed with the focused light of femtosecond laser processing. After the processing is completed, the workpiece is then subjected to a laser inspection process to detect whether the laser-processed workpiece meets the requirements. Required requirements.
第5圖為一示意圖,用以顯示說明本發明之雷射應用處理系統的另一實施例、以及運作情形。 FIG. 5 is a schematic diagram illustrating another embodiment of the laser application processing system of the present invention and its operation.
如第5圖中所示之,雷射應用處理系統1包含應用於同一移動工作平台60的雷射加工次系統2、以及雷射檢測次系統3。
As shown in FIG. 5 , the laser
雷射加工次系統2包含第一飛秒雷射源10、第一飛秒雷射加工光L1、飛秒雷射加工光路模組20、第一飛秒雷射加工之聚焦光L2、分光鏡M1以及高反射鏡M2。
The
雷射檢測次系統3包含第一飛秒雷射SHG或THG檢測光L3、飛秒雷射檢測光路模組40、第二飛秒雷射SHG或THG檢測之聚焦光L4、高反射鏡M3、以及高反射鏡M4。
The
如第5圖中所示之,使用同一飛秒雷射源10作為(1)飛秒雷射加工以及(2)飛秒雷射SHG或THG檢測方法之光源,較第4圖有較為簡化之優點,僅需架設簡易之光路如M1、M2、M3、M4等之鏡片組成之光路。
As shown in Figure 5, the same
第一飛秒雷射源10,該第一飛秒雷射源10之波長可不限,而一般常見之波長為1020-1060nm、510-530nm、340-353nm等,通常依為工件50之被加工物之光學吸收率對於不同波長之反應特性而選擇之。
The wavelength of the first
脈衝常見之重複率(repetition rate)範圍為100kHz-10MHz。 The common repetition rate range of pulses is 100kHz-10MHz.
脈衝寬度(pulse duration)範圍為300飛秒至800飛秒間。 The pulse duration ranges from 300 femtoseconds to 800 femtoseconds.
脈衝能量範圍為1微焦耳(microjoules)至200微焦耳(microjoules)間。 The pulse energy range is from 1 microjoules to 200 microjoules.
光斑品質(M2)範圍為1.0至1.4間,越小越佳。越小代表相同的入射光斑下,相同的聚焦物鏡可以達到較小的聚焦點光斑。 The spot quality (M2) ranges from 1.0 to 1.4, the smaller the better. The smaller the value, the smaller the focus spot with the same incident light spot.
第一飛秒雷射源10)可具備接受外部電壓訊號或是指令而可調整其輸出功率的手段,熟知技藝之技術領域人士均知其理,是故,在此不再贅述。 The first femtosecond laser source 10) may be equipped with a means of receiving external voltage signals or instructions to adjust its output power. Those familiar with the art know the reason, and therefore will not be described in detail here.
第一飛秒雷射源10在此用途為提供微加工之雷射光、第一飛秒雷射源10並可經由分光鏡M1與高反射鏡M2的作用而成為提供SHG或THG之檢測光的第一飛秒雷射SHG或THG檢測光L3的來源。
The first
飛秒雷射加工光路模組20,該飛秒雷射加工光路模組20之最少功能為(1)導引雷射光方向;及(2)將雷射光產生一聚焦點於工件50附近。
Femtosecond laser processing
可採用幾種不同之方式實現: This can be achieved in several different ways:
1.由一面固定不動之反射鏡及一面聚焦鏡所組成。採用此法時,第一飛秒雷射加工之聚焦光L2固定不動,如需在工件上製造加工
軌跡,可使用移動工作平台60將工件50移動之,此法一般稱為固定光束法(fixed beam)。
1. Consists of a fixed reflector and a focusing mirror. When using this method, the focused light L2 of the first femtosecond laser processing is fixed. If it is necessary to process the workpiece
The moving
2.由一面可動之反射鏡及一面聚焦鏡所組成。採用此法,則軌跡可由此可動之反射鏡所產生,工件不動。或是可合併移動工作平台60使用,此法又可稱為單軸掃描振鏡(single-axis galvo scanning)。
2. Consists of a movable reflector and a focusing mirror. Using this method, the trajectory can be generated by the movable mirror without moving the workpiece. Or it can be used in combination with the mobile working
3.由兩面可動之反射鏡及一面聚焦鏡所組成。採用此法,則軌跡可由此兩面可動之反射鏡所產生,工件不動。或是可合併移動平台60使用,此法又可稱為雙軸掃描振鏡(duel-axis galvo scanning)。
3. Consists of two movable reflectors and a focusing mirror. Using this method, the trajectory can be generated by the two movable mirrors, and the workpiece does not move. Or it can be used in combination with the
以此類推,也可由N面可動之反射鏡及一面聚焦鏡所組成,常見為五軸(five-axis galvo scanning)掃描振鏡,可提供X,Y方向外,另外有Z方向(平行於第一飛秒雷射加工之聚焦光方向)以及聚焦光相對於工件之兩個傾斜角。 By analogy, it can also be composed of N movable mirrors and a focusing mirror. A common five-axis galvo scanning scanning mirror can provide X, Y directions, and Z direction (parallel to the The direction of the focused light in femtosecond laser processing) and the two tilt angles of the focused light relative to the workpiece.
飛秒雷射加工光路模組可由上述之方式,單獨及/或組合來予以施行,以上方式都應為此發明之飛秒雷射加工光路模組所包含之技術特徵範圍內,但不限於此,只要能達到(1)導引雷射光方向及(2)將雷射光產生一聚焦點於工件50附近之功能的方式,都應為本發明之飛秒雷射加工光路模組所涵蓋之範圍,其理相同、類似於上述技術特徵內容,在此,不再贅述之。
The femtosecond laser processing optical path module can be implemented by the above methods, alone and/or in combination. The above methods are all within the scope of the technical features included in the femtosecond laser processing optical path module of this invention, but are not limited to this. , as long as it can achieve the functions of (1) guiding the laser light direction and (2) generating a focusing point of the laser light near the
第一飛秒雷射加工光L1由第一飛秒雷射源射10出後,經過飛秒雷射加工光路模組20形成第一飛秒雷射加工之聚焦光L2於工件50上。
After the first femtosecond laser processing light L1 is emitted from the first
第一飛秒雷射源10經由分光鏡M1與高反射鏡M2的作用而成為提供SHG或THG之檢測光的第一飛秒雷射SHG或THG檢測光L3的來源,而第一飛秒雷射SHG或THG檢測光L3經過飛秒雷射檢測光路模組40後形成第二飛秒雷射SHG或THG檢測之聚焦光L4於工件50上。
The first
工件50可被移動工作平台60移動而使得工件50落於第一飛秒雷射加工之聚焦光L2或是第二飛秒雷射SHG或THG檢測之聚焦光L4之下。工件50可由一位置P1移至另一位置P2或反向移動,如第一飛秒雷射加工之聚焦光L2以及第一飛秒雷射SHG或THG檢測光L3之間之距離為定值(於此架設中此條件成立),則可輕易映射出移動工作平台60應移動到之位置使得第二飛秒雷射SHG或THG檢測光L3及第一飛秒雷射加工之聚焦光L2可於移動工作平台60移動後打到工件50上之同一點。
The
第6圖為一側視示意圖,用以顯示利用第4圖或第5圖之雷射應用處理系統的實施例,將SHG或THG訊號轉換為雷射加工參數以進行晶圓檢測及加工的狀況。 Figure 6 is a schematic side view showing the use of the embodiment of the laser application processing system in Figure 4 or Figure 5 to convert SHG or THG signals into laser processing parameters for wafer inspection and processing. .
如第6圖中所示之,晶圓1具有一區域11以及區域12,在此,該晶圓1為,例如,矽晶圓,藍寶石晶圓(Sapphine),碳化矽(SiC)等等的單晶之晶圓。
As shown in Figure 6, the
於晶圓1中之區域11其特性不同於其外之其他區域12,因而,造成區域11之SHG或THG訊號是不同於區域12所具有之SHG或THG訊號。於進行2D掃瞄之後,將可分別得出區域11之SHG或THG訊號、以及區域12之SHG或THG訊號。
The characteristics of
第7圖為第6圖之俯視示意圖,用以顯示利用第4圖或第5圖之雷射應用處理系統的實施例,將SHG或THG訊號轉換為雷射加工參數以進行晶圓檢測及加工的狀況。 Figure 7 is a schematic top view of Figure 6, showing an embodiment of using the laser application processing system of Figure 4 or Figure 5 to convert SHG or THG signals into laser processing parameters for wafer inspection and processing. status.
於進行線上SHG或THG檢測時,可將,例如,SHG訊號之函數予以轉換,可定義出材料之不同區域/類別,而於定義出該材料之該些不同區域/類別後,依該材料之該些不同區域/類別,於指定之該些不同區域/類別以相同及/或不同之雷射加工參數而予以雷射加工,例如,可使用不同之雷射加工功率、使用不同之雷射加工參數組,在此,例如,該些不同之雷射加工參數組是依不同材料/特性而分別予以優化後所得出之。 When performing online SHG or THG testing, for example, the function of the SHG signal can be converted to define different areas/categories of the material. After defining the different areas/categories of the material, the These different areas/categories are laser processed with the same and/or different laser processing parameters in the designated different areas/categories. For example, different laser processing powers can be used, and different laser processing can be used. Parameter set, here, for example, these different laser processing parameter sets are obtained by optimizing respectively according to different materials/characteristics.
在此,以SHG訊號為例,於X-Y軸向之總掃描範圍xc與總掃描範圍yc在此,以SH,在晶圓1之外的區域2,區域2之SHG訊號之函數值約為0,而晶圓1之區域12的SHG訊號之函數值是大於區域11的SHG訊號之函數值。
Here, taking the SHG signal as an example, the total scanning range x c and the total scanning range y c in the XY axis are here, using SH, in
另,可設SHG訊號之函數為sig(x,y),例如,可利用二值化(binarization)而將sig(x,y)轉換為[0,1],即可定義出二個不同的區域。 In addition, the function of the SHG signal can be assumed to be sig(x, y). For example, binarization can be used to convert sig(x, y) into [0, 1], and two different signals can be defined. area.
再,或是依需求,而將SHG訊號之函數sig(x,y)與以區分為N類別:例如,若0≦sig(x,y)<k1,則此區為第1類;若k1≦sig(x,y)<k2,則此區為第2類;依此類推若kn-1≦sig(x,y)<kn,則此區為第n類;k1,k2...kn>0 Then, the function sig(x, y) of the SHG signal may be divided into N categories according to the needs: for example, if 0≦sig(x, y)<k 1 , then this area is the 1st category; if k 1 ≦sig(x, y)<k 2 , then this area is the 2nd category; and so on if kn- 1 ≦sig(x, y)<k n , then this area is the nth category; k 1 , k 2 ... k n >0
又,或是以其他類似於上述之分類分式而將不同區域11、12予以分類,其理相同、類似於上述,是故,在此不再贅述之。
Alternatively,
指定不同區域(例如,區域11及/或區域12)之不同的雷射加工參數時,如上所述之:(1)按不同區域之SHG訊號之不同函數值,可使用不同之雷射加工功率,例如,P1功率給"0"的區域予以雷射加工;而P2功率給"1"的區域予以雷射加工;(2)按不同區域之SHG訊號之不同函數值,可使用一雷射參數(P,fR,ν,m),其中,P為功率,fR為重複頻率,ν為速度,而m為整數;或是,使用不同之雷射參數組(PN,fR N,νN,mN)於不同之區域/N類區。在此,例如,該些不同之雷射加工參數組是依不同材料/特性而分別予以優化後所得出之。
When specifying different laser processing parameters in different areas (for example,
第8圖為一示意圖,用以顯示說明於第4圖、以及第5圖中之飛秒雷射檢測光路模組的結構。 Figure 8 is a schematic diagram showing the structure of the femtosecond laser detection optical path module described in Figures 4 and 5.
飛秒雷射檢測光路模組40將所輸入之第二飛秒雷射SHG或THG檢測光L3或第一飛秒雷射SHG或THG檢測光L3產生為第二飛秒雷射SHG或THG檢測之聚焦光L4並予以輸出。
The femtosecond laser detection
飛秒雷射檢測光路模組40其功能在於使用一飛秒雷射雷射具有一特定波長λ之雷射光,產生第二飛秒雷射SHG或THG檢測之聚焦光L4,於工件50上產生SHG或是THG波長之光,並收集此波長之光以光偵測器之手段轉為數據。
The function of the femtosecond laser detection
此處僅舉一實施例說明,但並不因此實施例的方式限縮本發明之廣泛適用性,只要以飛秒雷射光於工件(材料)上產生二倍頻SHG或是三倍頻光並加以收集之手段或模組,均應在本發明之涵蓋範圍內。 Here is only one example for illustration, but this example does not limit the wide applicability of the present invention. As long as the femtosecond laser light is used to generate double frequency SHG or triple frequency light on the workpiece (material) and The means or modules for collecting should be within the scope of the present invention.
如第8圖中所示之,飛秒雷射檢測光路模組40包含高反射鏡41、波長分光鏡42(dichroic mirror)、光偵測器43(photodetector)、以及聚焦物鏡44(focusing objective)。
As shown in Figure 8, the femtosecond laser detection
其中,實施例可為由飛秒雷射源輸入之光束L3,具有波長1030nm,經由高反射鏡41轉向導向波長分光鏡42,此波長分光鏡具有特性為1030nm具高穿透率(例如95%以上),而對於倍頻光515nm具有高反射率。
Among them, the embodiment can be that the light beam L3 input by the femtosecond laser source has a wavelength of 1030nm, and is directed to a
1030nm光在穿透波長分光波42後導向一聚焦物鏡44,此聚焦物鏡44產生一聚焦之光束L4投向工件,工件之材料因與雷射光交互作用後,因其本身之非線性特性可產生倍頻515nm波長之光,而此光線具有往回射之分量,此光束可被同一聚焦物鏡所接收,而再度轉為接近平行光束,而被波長分光鏡42高反射而射向光偵測器43,最後由光偵測器將光訊號轉為電訊號並可送至數據處理之微處理器或電腦處理之。
The 1030nm light is directed to a focusing
綜合以上之實施例,我們可以得到本發明之一種雷射應用處理系統及其方法,係應用於雷射檢測及加工的處理環境中,利用本發明之雷射應用處理系統以進行雷射應用處理方法,於利用雷射檢測過程時,首先,將工件(被加工物)移至飛秒雷射SHG或THG檢測之聚焦光之下方;接著,將取得SHG或THG訊號對工件之空間分佈之數據;進而,依SHG或THG訊號值設定該工件之點所需之最佳雷射加工參數組;再,於進行雷射加工處理過程時,可將已完成雷射檢測過程之工件移至飛秒雷射加工之聚焦光之下方,以進行雷射加工,及/或,先以飛秒雷射加工之聚焦光對工件進行雷射加工,待加工處理完成後,再對工件進行利用雷射檢測過程,以便檢測出雷射加工後之工件是否符合所需要求。本發明之雷射應用處理系統於進行雷射應用處理方法時,例如,以雷射檢測過程之手段,可進行材料不均勻度之檢測,並將此檢測量化,並建立一對應於材料不同位置(例如,一組X,Y,Z座標)之檢測量化值表;另,於進行雷射加工處理過程時,於雷射加工時再依此檢測量化值表進行不同位置之最佳參數組加工。本發明之雷射應用處理系統及方法可結合SHG或THG檢測手法、以及雷射加工手法以完成檢測後補償法。 Based on the above embodiments, we can obtain a laser application processing system and method of the present invention, which are applied in the processing environment of laser detection and processing. The laser application processing system of the present invention is used to perform laser application processing. Method: When using the laser inspection process, first, move the workpiece (object to be processed) under the focused light of the femtosecond laser SHG or THG inspection; then, obtain data on the spatial distribution of the SHG or THG signal on the workpiece. ; Furthermore, the optimal laser processing parameter set required for the point of the workpiece is set according to the SHG or THG signal value; and then, during the laser processing process, the workpiece that has completed the laser inspection process can be moved to femtosecond Under the focused light of laser processing, laser processing is performed, and/or, the workpiece is first laser processed with the focused light of femtosecond laser processing, and after the processing is completed, the workpiece is inspected using laser. process in order to detect whether the workpiece after laser processing meets the required requirements. When the laser application processing system of the present invention performs the laser application processing method, for example, by means of the laser detection process, the unevenness of the material can be detected, the detection can be quantified, and a map corresponding to different positions of the material can be established. (For example, a set of X, Y, Z coordinates) detection quantification value table; in addition, during the laser processing process, the detection quantification value table is used to perform optimal parameter set processing at different positions during laser processing. . The laser application processing system and method of the present invention can combine SHG or THG detection techniques and laser processing techniques to complete the post-detection compensation method.
以上所述僅為本發明之較佳實施例而已,並非用以限定本發明之範圍;凡其它未脫離本發明所揭示之精神下所完成之等效改變或修飾,均應包含在下述之專利範圍內。 The above descriptions are only preferred embodiments of the present invention and are not intended to limit the scope of the present invention; all other equivalent changes or modifications made without departing from the spirit of the present invention shall be included in the following patents. within the range.
101,102,103,104:步驟 101, 102, 103, 104: Steps
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