TWI815814B - Flow rate control apparatus, flow rate control method, and program recording medium - Google Patents
Flow rate control apparatus, flow rate control method, and program recording medium Download PDFInfo
- Publication number
- TWI815814B TWI815814B TW107125734A TW107125734A TWI815814B TW I815814 B TWI815814 B TW I815814B TW 107125734 A TW107125734 A TW 107125734A TW 107125734 A TW107125734 A TW 107125734A TW I815814 B TWI815814 B TW I815814B
- Authority
- TW
- Taiwan
- Prior art keywords
- flow rate
- flow
- downstream side
- downstream
- fluid resistance
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 7
- 239000012530 fluid Substances 0.000 claims abstract description 77
- 230000002123 temporal effect Effects 0.000 claims abstract description 10
- 238000011144 upstream manufacturing Methods 0.000 claims description 71
- 230000008859 change Effects 0.000 claims description 29
- 238000001514 detection method Methods 0.000 claims description 15
- 230000007246 mechanism Effects 0.000 claims description 12
- 230000005856 abnormality Effects 0.000 claims description 6
- 230000006870 function Effects 0.000 claims description 6
- 230000004044 response Effects 0.000 abstract description 11
- 239000007789 gas Substances 0.000 description 26
- 238000005259 measurement Methods 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 6
- 238000006073 displacement reaction Methods 0.000 description 5
- 238000003745 diagnosis Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000007257 malfunction Effects 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000001052 transient effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000004092 self-diagnosis Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
- G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
- G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
- G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
- G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
- G05D7/0664—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means the plurality of throttling means being arranged for the control of a plurality of diverging flows from a single flow
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
- G01F1/05—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects
- G01F1/34—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by measuring pressure or differential pressure
- G01F1/36—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by measuring pressure or differential pressure the pressure or differential pressure being created by the use of flow constriction
- G01F1/363—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by measuring pressure or differential pressure the pressure or differential pressure being created by the use of flow constriction with electrical or electro-mechanical indication
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
- G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
- G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
- G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F15/00—Details of, or accessories for, apparatus of groups G01F1/00 - G01F13/00 insofar as such details or appliances are not adapted to particular types of such apparatus
- G01F15/005—Valves
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F22/00—Methods or apparatus for measuring volume of fluids or fluent solid material, not otherwise provided for
- G01F22/02—Methods or apparatus for measuring volume of fluids or fluent solid material, not otherwise provided for involving measurement of pressure
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F25/00—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume
- G01F25/10—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume of flowmeters
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
- G05B19/416—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by control of velocity, acceleration or deceleration
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
- G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
- G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
- G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
- G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
- G05D7/0647—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means the plurality of throttling means being arranged in series
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/37—Measurements
- G05B2219/37371—Flow
Abstract
Description
本發明涉及一種流量控制裝置，該流量控制裝置例如用於控制半導體製造裝置所使用的流體的流量。The present invention relates to a flow control device for controlling the flow rate of a fluid used in a semiconductor manufacturing apparatus, for example.
在半導體工序中，為了控制例如向蝕刻室內導入的各種氣體的流量而使用被稱為質量流量控制器的流量控制裝置，該流量控制裝置將各種流體設備與控制機構集成化。In semiconductor processes, for example, in order to control the flow rates of various gases introduced into an etching chamber, a flow control device called a mass flow controller is used. This flow control device integrates various fluid equipment and a control mechanism.
例如，質量流量控制器包括：流量感測器，設置於流路；閥，設置在流量感測器的下游側；以及流量控制部，以使由流量感測器測定的測定流量成為作為目標值的設定流量的方式控制所述閥的開度（參照專利文獻1）。For example, the mass flow controller includes: a flow sensor provided in the flow path; a valve provided on the downstream side of the flow sensor; and a flow control unit so that the measured flow rate measured by the flow sensor becomes a target value. The opening of the valve is controlled by setting the flow rate (see Patent Document 1).
在這種質量流量控制器中需求提高回應速度，以便使閥的下游側流動的實際的氣體流量盡可能快地追隨設定流量。In such a mass flow controller, it is necessary to increase the response speed so that the actual gas flow rate flowing on the downstream side of the valve follows the set flow rate as quickly as possible.
但是，近年來在半導體製造工序中所需求的回應速度非常嚴格，具有如上所述的流量控制系統的質量流量控制器越來越難以應對。本申請的發明人對其原因進行了認真研究後，發現了存在以下說明的原理性問題。However, in recent years, the response speed required in semiconductor manufacturing processes has become very strict, and it has become increasingly difficult for a mass flow controller having a flow control system as described above to cope with this. The inventor of the present application carefully studied the reason and found that there is a fundamental problem explained below.
即，在上述質量流量控制器中，對比閥更靠上游側測定的流量進行回饋來控制閥，由流量感測器測定流量的測定點與由閥控制流量的控制點偏離了流量感測器與閥的設置間隔。That is, in the above-mentioned mass flow controller, the flow rate measured upstream of the valve is fed back to control the valve. The measurement point where the flow rate is measured by the flow sensor and the control point where the flow rate is controlled by the valve deviate from the flow sensor and the control point. Valve setting interval.
例如，當流量感測器具有層流元件等流體阻力件時，以實現所需要的壓力的方式使氣體流入流出，以便在作為測定點的流體阻力件與作為控制點的閥之間的內部容積部實現設定流量，上述動作因流體阻力件的作用而需要預定時間。For example, when the flow sensor has a fluid resistance member such as a laminar flow element, the gas is allowed to flow in and out in such a manner that the required pressure is achieved so that the internal volume between the fluid resistance member serving as a measurement point and a valve serving as a control point Partially realizes the set flow rate, and the above action requires a predetermined time due to the action of the fluid resistance member.
因此，在控制點產生的流量變化顯現於具有流量感測器的測定點會產生時間延遲。因此，由於在控制點始終基於預定時間之前的流量資訊來持續控制閥的開度，所以回應速度必然具有極限。Therefore, there will be a time delay in the flow rate changes generated at the control point appearing at the measurement point with the flow sensor. Therefore, since the valve opening is continuously controlled based on the flow information before the predetermined time at the control point, the response speed must have a limit.
專利文獻1：日本專利公開公報特開2004-280688號Patent document 1: Japanese Patent Publication No. 2004-280688
本發明是鑒於上述問題而完成的，其目的在於提供一種流量控制裝置，能夠以比以往小的時間延遲得到作為控制點的閥中的實際流量，可以通過使測定點與控制點一致而大幅度提高回應速度。The present invention was made in view of the above problems, and its object is to provide a flow control device that can obtain the actual flow rate in a valve serving as a control point with a smaller time delay than conventional ones, and that can significantly improve the flow rate by making the measurement point coincide with the control point. Improve response speed.
即，本發明的流量控制裝置包括：流體阻力件，設置於流路；下游側閥，設置在流體阻力件的下游側；下游側壓力感測器，測定所述流體阻力件與所述下游側閥之間的所述流路的容積部中的壓力；第一流量算出部，計算出流過所述流體阻力件的第一流量；第二流量算出部，基於第一流量和由所述下游側壓力感測器測定的下游側壓力的時間變化量，計算出從所述下游側閥流出的第二流量；以及流量控制部，基於設定流量和第二流量來控制所述下游側閥。That is, the flow control device of the present invention includes: a fluid resistance member provided in the flow path; a downstream side valve provided on the downstream side of the fluid resistance member; and a downstream side pressure sensor that measures the relationship between the fluid resistance member and the downstream side. the pressure in the volume portion of the flow path between the valves; a first flow rate calculation unit that calculates a first flow rate flowing through the fluid resistance member; and a second flow rate calculation unit that calculates the first flow rate based on the first flow rate and the flow rate calculated by the downstream The time variation of the downstream pressure measured by the side pressure sensor is used to calculate the second flow rate flowing out of the downstream valve; and the flow control unit controls the downstream valve based on the set flow rate and the second flow rate.
此外，本發明的流量控制方法利用流量控制裝置，所述流量控制裝置包括：流體阻力件，設置於流路；下游側閥，設置在流體阻力件的下游側；以及下游側壓力感測器，測定所述流體阻力件與所述下游側閥之間的所述流路的容積部中的壓力，所述流量控制方法包括：第一流量算出步驟，計算出流過所述流體阻力件的第一流量；第二流量算出步驟，基於第一流量和由所述下游側壓力感測器測定的下游側壓力的時間變化量，計算出從所述下游側閥流出的第二流量；以及流量控制步驟，基於設定流量和第二流量來控制所述下游側閥。In addition, the flow control method of the present invention utilizes a flow control device including: a fluid resistance member provided in the flow path; a downstream side valve provided on the downstream side of the fluid resistance member; and a downstream side pressure sensor, The pressure in the volume portion of the flow path between the fluid resistance member and the downstream side valve is measured, and the flow rate control method includes a first flow rate calculation step of calculating a third flow rate flowing through the fluid resistance member. a flow rate; a second flow rate calculation step that calculates a second flow rate flowing out of the downstream side valve based on the first flow rate and the time variation of the downstream side pressure measured by the downstream side pressure sensor; and flow rate control Step: controlling the downstream side valve based on the set flow rate and the second flow rate.
按照這種結構，基於流入所述流體阻力件與所述下游側閥之間的所述流路的容積部的流體的流量和從所述容積部流出的流體的流量之差，確定下游側壓力的時間變化量。According to this structure, the downstream side pressure is determined based on the difference between the flow rate of the fluid flowing into the volume portion of the flow path between the fluid resistance member and the downstream side valve and the flow rate of the fluid flowing out of the volume portion. time variation.
因此，所述第二流量算出部可以根據作為流入所述容積部的流體的流量的第一流量和下游側壓力的時間變化量，計算出從所述下游側閥流出的第二流量，所述第二流量是從所述容積部流出的流體的流量。Therefore, the second flow rate calculation unit may calculate the second flow rate flowing out of the downstream side valve based on the first flow rate, which is the flow rate of the fluid flowing into the volume part, and the temporal change amount of the downstream side pressure. The second flow rate is the flow rate of fluid flowing out of the volume.
如此，由於能夠以幾乎不產生時間延遲的方式得到作為控制點的下游側閥處的流量亦即第二流量，所以所述流量控制部可以使控制點與測定點一致來控制所述下游側閥，從而與以往相比能夠提高例如暫態回應時的回應速度。In this way, since the flow rate at the downstream valve as the control point, that is, the second flow rate, can be obtained with almost no time delay, the flow rate control unit can control the downstream valve by making the control point coincide with the measurement point. , which can improve the response speed during transient response, for example, compared to the past.
作為第二流量算出部的具體結構可以列舉的是，所述第二流量算出部包括：變化量算出部，計算出下游側壓力的時間變化量；以及流量運算部，基於第一流量與根據下游側壓力的時間變化量計算出的換算流量之差，計算出第二流量。As a specific structure of the second flow rate calculation unit, the second flow rate calculation unit includes: a change amount calculation unit that calculates the time change amount of the downstream side pressure; and a flow rate calculation unit that calculates the time change amount of the downstream side pressure based on the first flow rate and the downstream pressure. The second flow rate is calculated from the difference between the converted flow rate calculated from the time variation of the side pressure.
為了能夠實現穩健的控制，以便在利用所述下游側閥使第二流量穩定為設定流量之後，即使所述流體阻力件的上游側產生壓力變化，也能夠使第二流量不容易變動，優選的是，所述流量控制裝置還包括：上游側閥，設置成比所述流體阻力件更靠上游側；上游側壓力感測器，測定所述上游側閥與所述流體阻力件之間的所述流路的容積部中的壓力；以及壓力控制部，基於設定壓力和由所述上游側壓力感測器測定的上游側壓力來控制所述上游側閥。In order to achieve robust control so that after the second flow rate is stabilized at the set flow rate by the downstream side valve, even if a pressure change occurs on the upstream side of the fluid resistance member, the second flow rate is not easily changed, it is preferable Yes, the flow control device further includes: an upstream side valve disposed further upstream than the fluid resistance member; an upstream side pressure sensor that measures all pressure between the upstream side valve and the fluid resistance member. a pressure in a volume portion of the flow path; and a pressure control unit that controls the upstream valve based on the set pressure and the upstream pressure measured by the upstream pressure sensor.
為了使所述第一流量算出部能夠利用所述流體阻力件前後產生的壓差，計算出準確的第一流量，並且能夠抑制感測器數量的增加，優選的是，所述第一流量算出部基於上游側壓力和下游側壓力計算出流過所述流體阻力件的第一流量。In order to enable the first flow rate calculation unit to calculate an accurate first flow rate using the pressure difference generated before and after the fluid resistance member, and to suppress an increase in the number of sensors, it is preferred that the first flow rate calculation unit The first flow rate flowing through the fluid resistance member is calculated based on the upstream side pressure and the downstream side pressure.
為了僅利用流量控制裝置就能夠對內部的異常進行自診斷，優選的是，所述流量控制裝置還包括診斷部，所述診斷部在所述下游側閥關閉的狀態下，對第一流量和第二流量進行比較來診斷是否存在異常。In order to be able to self-diagnose internal abnormalities using only the flow control device, it is preferable that the flow control device further includes a diagnostic unit that detects the first flow rate and the first flow rate in a state where the downstream valve is closed. The second flow rate is compared to diagnose whether there is an abnormality.
作為用於得到本發明的第一流量的其他具體實施方式，可以列舉的是，所述流量控制裝置還包括流量檢測機構，所述流量檢測機構輸出與流過所述流體阻力件的第一流量對應的檢測信號，所述第一流量算出部基於所述流量檢測機構輸出的檢測信號計算出第一流量。As another specific embodiment for obtaining the first flow rate of the present invention, it can be cited that the flow control device further includes a flow detection mechanism, and the flow detection mechanism outputs a flow rate corresponding to the first flow rate flowing through the fluid resistance member. Corresponding to the detection signal, the first flow rate calculation unit calculates the first flow rate based on the detection signal output by the flow rate detection mechanism.
例如僅通過對現有的流量控制裝置升降程式，就能夠得到與本發明的流量控制裝置同樣的效果，可以使用流量控制裝置用程式，所述控制裝置用程式是用於流量控制裝置的程式，所述流量控制裝置包括：流體阻力件，設置於流路；下游側閥，設置在流體阻力件的下游側；以及下游側壓力感測器，測定所述流體阻力件與所述下游側閥之間的所述流路的容積部中的壓力，其中，所述流量控制裝置用程式使電腦發揮如下功能：第一流量算出部，計算出流過所述流體阻力件的第一流量；第二流量算出部，基於第一流量和由所述下游側壓力感測器測定的下游側壓力的時間變化量，計算出從所述下游側閥流出的第二流量；以及流量控制部，基於設定流量和第二流量來控制所述下游側閥。For example, the same effect as the flow control device of the present invention can be obtained by simply raising and lowering the existing flow control device program, and the flow control device program can be used. The control device program is a program for the flow control device. The flow control device includes: a fluid resistance member disposed in the flow path; a downstream side valve disposed on the downstream side of the fluid resistance member; and a downstream side pressure sensor that measures the distance between the fluid resistance member and the downstream side valve. The pressure in the volume part of the flow path, wherein the flow control device uses a program to cause the computer to perform the following functions: a first flow calculation unit calculates a first flow rate flowing through the fluid resistance member; a second flow rate a calculation unit that calculates a second flow rate flowing out of the downstream valve based on the first flow rate and a temporal change amount of the downstream pressure measured by the downstream pressure sensor; and a flow control unit that calculates a second flow rate that flows out of the downstream valve based on the set flow rate and The second flow rate controls the downstream side valve.
另外，流量控制裝置用程式能夠以電子方式發送，也可以存儲於CD、DVD、HDD和快閃記憶體器等存儲介質。In addition, the program for the flow control device can be sent electronically or stored in storage media such as CD, DVD, HDD, and flash memory.
如此，按照本發明的流量控制裝置，可以基於第一流量和下游側壓力的時間變化量來得到作為流量的控制點的下游側閥中實際流動的第二流量，通過使流量的測定點與控制點一致來進行控制，可以提高回應速度。In this way, according to the flow control device of the present invention, the second flow rate actually flowing in the downstream valve as the control point of the flow rate can be obtained based on the first flow rate and the time variation of the downstream side pressure. By combining the measurement point of the flow rate with the control point Click to control, which can increase the response speed.
參照圖1和圖2，對本發明第一實施方式的流量控制裝置100進行說明。The flow control device 100 according to the first embodiment of the present invention will be described with reference to FIGS. 1 and 2 .
第一實施方式的流量控制裝置100例如用於在半導體製造工序中向蝕刻室以設定流量供給氣體。在此，設定流量是從某一流量值向另一流量值階段式上升或下降的步進信號。上述流量控制裝置100構成為例如以滿足製造的半導體的質量的方式在預定時間內追隨上述步進信號。The flow control device 100 of the first embodiment is used, for example, in a semiconductor manufacturing process to supply gas to an etching chamber at a set flow rate. Here, the set flow rate is a step signal that increases or decreases in steps from a certain flow rate value to another flow rate value. The flow control device 100 is configured to follow the step signal within a predetermined time, for example, so as to satisfy the quality of the manufactured semiconductor.
即，如圖1所示，流量控制裝置100包括：流體設備，由設置於流路的感測器和閥構成；以及控制器COM，對該流體設備進行控制。That is, as shown in FIG. 1 , the flow control device 100 includes a fluid device including a sensor and a valve provided in a flow path, and a controller COM that controls the fluid device.
相對於流路從上游側依次設置有供給壓力感測器P0、上游側閥V1、上游側壓力感測器P1、流體阻力件R、下游側壓力感測器P2和下游側閥V2。在此，流體阻力件R例如是層流元件，產生與其前後流動的氣體的流量對應的壓差。A supply pressure sensor P0, an upstream valve V1, an upstream pressure sensor P1, a fluid resistance member R, a downstream pressure sensor P2, and a downstream valve V2 are provided in order from the upstream side of the flow path. Here, the fluid resistance member R is, for example, a laminar flow element that generates a pressure difference corresponding to the flow rate of the gas flowing forward and backward.
供給壓力感測器P0用於監測從上游側供給的氣體的壓力。另外，在保證供給壓力穩定等情況下，也可以省略供給壓力感測器P0。The supply pressure sensor P0 is used to monitor the pressure of gas supplied from the upstream side. In addition, when ensuring stable supply pressure, etc., the supply pressure sensor P0 may be omitted.
上游側壓力感測器P1測定作為充入上游側容積部內的氣體的壓力的上游側壓力，該上游側容積部是流路中的上游側閥V1與流體阻力件R之間的容積部。The upstream pressure sensor P1 measures the upstream pressure, which is the pressure of the gas filled in the upstream volume portion between the upstream valve V1 and the fluid resistance member R in the flow path.
下游側壓力感測器P2測定作為充入下游側容積部VL的氣體的壓力的下游側壓力，該下游側容積部VL是流路中的流體阻力件R與下游側閥V2之間的容積部。The downstream pressure sensor P2 measures the downstream pressure, which is the pressure of the gas filled in the downstream volume VL, which is the volume between the fluid resistance element R and the downstream valve V2 in the flow path. .
如此，上游側壓力感測器P1和下游側壓力感測器P2分別測定由上游側閥V1、流體阻力件R和下游側閥V2形成的兩個容積部的壓力。此外，作為其他表現方式，上游側壓力感測器P1和下游側壓力感測器P2測定配置在流體阻力件R前後的各容積部內的壓力。In this way, the upstream pressure sensor P1 and the downstream pressure sensor P2 respectively measure the pressures of the two volume parts formed by the upstream valve V1, the fluid resistance member R and the downstream valve V2. In addition, as another expression, the upstream pressure sensor P1 and the downstream pressure sensor P2 measure the pressure in each volume portion arranged before and after the fluid resistance member R.
上游側閥V1和下游側閥V2在第一實施方式中為相同類型，例如是利用壓電元件相對於閥座驅動閥體的壓電閥。上游側閥V1基於由上游側壓力感測器P1測定的上游側壓力來控制上游側容積部內的壓力。另一方面，流體設備中的設置在最下游側的下游側閥V2對從流體設備流出的氣體流量整體進行控制。The upstream valve V1 and the downstream valve V2 are of the same type in the first embodiment, and are, for example, piezoelectric valves that use a piezoelectric element to drive a valve body relative to a valve seat. The upstream side valve V1 controls the pressure in the upstream side volume part based on the upstream side pressure measured by the upstream side pressure sensor P1. On the other hand, the downstream valve V2 provided on the most downstream side in the fluid equipment controls the entire gas flow rate flowing out from the fluid equipment.
接著，對控制器COM進行詳細說明。Next, the controller COM will be described in detail.
控制器COM例如是具有CPU、記憶體、A/D及D/A轉換器和輸入輸出裝置的所謂的電腦，通過執行記憶體中存儲的流量控制裝置用程式，使各種設備協同動作，從而至少作為第一流量算出部1、第二流量算出部2、流量控制部3和壓力控制部4發揮功能。The controller COM is, for example, a so-called computer having a CPU, a memory, an A/D and D/A converter, and an input/output device. By executing a program for the flow control device stored in the memory, the various devices cooperate to operate at least It functions as a first flow rate calculation unit 1 , a second flow rate calculation unit 2 , a flow rate control unit 3 and a pressure control unit 4 .
第一流量算出部1與上游側壓力感測器P1、流體阻力件R和下游側壓力感測器P2一起構成所謂的壓差式流量感測器。即，第一流量算出部1將由上游側壓力感測器P1測定的上游側壓力和由下游側壓力感測器P2測定的下游側壓力作為輸入，計算出作為流過流體阻力件R的氣體的流量的第一流量並輸出。在此，在第一流量算出部1中使用的流量的算式可以使用現有算式。雖然由第一流量算出部1計算出的第一流量連續變化，但是相對於利用下游側閥V2的控制實現的經過該下游側閥V2的實際流量產生預定的時間延遲。The first flow rate calculation unit 1 constitutes a so-called differential pressure flow sensor together with the upstream pressure sensor P1, the fluid resistance member R, and the downstream pressure sensor P2. That is, the first flow rate calculation unit 1 takes as input the upstream pressure measured by the upstream pressure sensor P1 and the downstream pressure measured by the downstream pressure sensor P2 and calculates the flow rate of the gas flowing through the fluid resistance member R. Flow the first flow and output. Here, the existing calculation formula can be used as the flow rate calculation formula used in the first flow rate calculation unit 1 . Although the first flow rate calculated by the first flow rate calculation unit 1 changes continuously, a predetermined time delay occurs with respect to the actual flow rate passing through the downstream valve V2 by the control of the downstream valve V2.
第二流量算出部2基於由第一流量算出部1計算出的第一流量和由下游側壓力感測器P2測定的下游側壓力，計算出作為從下游側閥V2流出的氣體的流量的第二流量並輸出。更具體地說，第二流量算出部2基於第一流量與第二流量之差的常數倍(倍數為常數)等於下游側壓力的時間變化量，計算出第二流量，該第一流量是流入流體阻力件R與下游側閥V2之間的下游側容積部VL的氣體的流量，該第二流量是從下游側容積部VL流出的氣體的流量。The second flow rate calculation unit 2 calculates a third flow rate that is the flow rate of the gas flowing out from the downstream side valve V2 based on the first flow rate calculated by the first flow rate calculation unit 1 and the downstream pressure measured by the downstream pressure sensor P2. Two flows and output. More specifically, the second flow rate calculation unit 2 calculates the second flow rate based on the fact that a constant multiple of the difference between the first flow rate and the second flow rate (the multiple is a constant) is equal to the time change amount of the downstream side pressure, and the first flow rate is the inflow. The flow rate of the gas in the downstream volume part VL between the fluid resistance element R and the downstream side valve V2. This second flow rate is the flow rate of the gas flowing out from the downstream side volume part VL.
即，第二流量算出部2包括：變化量算出部21，計算出由下游側壓力感測器P2測定的下游側壓力的時間變化量；以及流量運算部22，基於第一流量與下游側壓力的時間變化量計算出第二流量。That is, the second flow rate calculation unit 2 includes: a change amount calculation unit 21 that calculates a temporal change amount of the downstream pressure measured by the downstream pressure sensor P2; and a flow rate calculation unit 22 that calculates a change amount based on the first flow rate and the downstream pressure. The second flow rate is calculated by the time change.
以下，針對第二流量能夠基於第一流量與下游側壓力的時間變化量而算出這一點進行說明。Hereinafter, a description will be given that the second flow rate can be calculated based on the first flow rate and the time change amount of the downstream side pressure.
設下游側壓力為P2 、下游側容積部VL的體積為V、氣體的溫度為T、氣體常數為R、質量為n時，根據氣體的狀態方程式，成為P2 ＝nRT/V。對該公式取時間微分，When the downstream pressure is P 2 , the volume of the downstream volume part VL is V, the temperature of the gas is T, the gas constant is R, and the mass is n, according to the state equation of the gas, P 2 =nRT/V. Take the time derivative of this formula,
[式1] [Formula 1]
此外，由於質量的時間微分與每單位時間流入流出下游側容積部VL的氣體的流量呈比例關係，所以設第一流量為Q1 、第二流量為Q2 、常數為a時，In addition, since the time differential of the mass is proportional to the flow rate of the gas flowing into and out of the downstream volume part VL per unit time, when the first flow rate is Q 1 , the second flow rate is Q 2 , and the constant is a,
[式2]根據各式對第二流量Q2 求解，[Formula 2] Solve the second flow rate Q 2 according to various equations,
[式3] [Formula 3]
在此，A是彙集了R、T、V、a的函數，下游側壓力的時間變化量乘以函數A的值為換算流量。根據該式可知，能夠基於作為實際測定的值的第一流量和作為下游側壓力的時間變化量的時間微分，計算出第二流量。Here, A is a function that combines R, T, V, and a, and the value obtained by multiplying the time change amount of the downstream side pressure by the function A is the converted flow rate. From this equation, it is known that the second flow rate can be calculated based on the first flow rate, which is an actually measured value, and the time differential, which is the time variation of the downstream side pressure.
在第一實施方式中，變化量算出部21計算出時間微分作為由下游側壓力感測器P2測定的下游側壓力的時間變化量。另外，時間微分可以通過從下游側壓力的時序資料取得差分而算出。In the first embodiment, the change amount calculation unit 21 calculates the time differential as the time change amount of the downstream pressure measured by the downstream pressure sensor P2. In addition, the time differential can be calculated by taking the difference from the time series data of the downstream side pressure.
流量運算部22例如根據預先由實驗等求出的常數A、輸入的第一流量Q1 以及從變化量算出部21輸入的下游側壓力的時間微分，計算出第二流量並向流量控制部3輸出。The flow rate calculation unit 22 calculates the second flow rate and sends it to the flow rate control unit 3 based on the constant A determined in advance through experiments or the like, the input first flow rate Q 1 , and the time differential of the downstream pressure input from the change amount calculation unit 21 , for example. output.
流量控制部3基於由用戶設定的設定流量和從第二流量算出部2輸入的第二流量來控制下游側閥V2。即，流量控制部3利用作為從下游側閥V2流出的氣體的流量的第二流量的回饋，以使設定流量與第二流量的偏差變小的方式來控制下游側閥V2。The flow rate control unit 3 controls the downstream side valve V2 based on the set flow rate set by the user and the second flow rate input from the second flow rate calculation unit 2 . That is, the flow rate control unit 3 uses the feedback of the second flow rate, which is the flow rate of the gas flowing out from the downstream valve V2, to control the downstream valve V2 so that the deviation between the set flow rate and the second flow rate is small.
另一方面，壓力控制部4基於由用戶設定的設定壓力和由上游側壓力感測器P1測定的上游側壓力來控制上游側閥V1。即，壓力控制部4利用上游側壓力的回饋，以使設定壓力與上游側壓力的偏差變小的方式來控制上游側壓力。在此，基於第二流量穩定為設定流量時在流體阻力件R的前後應保持的壓力差，對設定壓力進行設定。On the other hand, the pressure control unit 4 controls the upstream valve V1 based on the set pressure set by the user and the upstream pressure measured by the upstream pressure sensor P1. That is, the pressure control unit 4 uses the feedback of the upstream pressure to control the upstream pressure so that the deviation between the set pressure and the upstream pressure is small. Here, the set pressure is set based on the pressure difference that should be maintained before and after the fluid resistance member R when the second flow rate is stabilized at the set flow rate.
接著，參照圖2的流程圖，說明在下游側閥V2完全關閉的狀態下，使第二流量從零的狀態向預定的流量變化的情況下的控制動作的示例。Next, an example of the control operation in a case where the second flow rate is changed from a zero state to a predetermined flow rate in a state where the downstream side valve V2 is completely closed will be described with reference to the flowchart of FIG. 2 .
設定流量的值為零的期間（步驟S0），流量控制部3使下游側閥V2保持為完全關閉狀態，使氣體不從下游側閥V2流出（步驟S1）。While the value of the set flow rate is zero (step S0 ), the flow rate control unit 3 maintains the downstream valve V2 in a fully closed state so that gas does not flow out from the downstream valve V2 (step S1 ).
另一方面，壓力控制部4以使上游側容積部內的壓力成為設定壓力的方式控制上游側閥V1的開度，使氣體流入該上游側容積部內（步驟S2）。On the other hand, the pressure control unit 4 controls the opening of the upstream valve V1 so that the pressure in the upstream volume portion becomes the set pressure, and causes the gas to flow into the upstream volume portion (step S2 ).
如果設定流量步進式地從零變化為預定值（步驟S3），則流量控制部3以使第二流量成為設定流量的預定值的方式打開下游側閥V2，該第二流量是根據由流體阻力件R前後的壓差計算出的第一流量以及下游側壓力的時間變化量計算出的控制點處的流量（步驟S4）。另外，第一流量是由第一流量算出部1將上游側壓力感測器P1測定的上游側壓力和下游側壓力感測器P2測定的下游側壓力作為輸入而算出的流過流體阻力件R的流量。If the set flow rate changes stepwise from zero to a predetermined value (step S3), the flow rate control unit 3 opens the downstream side valve V2 so that the second flow rate, which is determined by the fluid, becomes the predetermined value of the set flow rate. The first flow rate calculated from the pressure difference before and after the resistance member R and the flow rate at the control point calculated from the time variation of the downstream side pressure (step S4). In addition, the first flow rate is the flow through the fluid resistance member R calculated by the first flow rate calculation unit 1 using the upstream side pressure measured by the upstream side pressure sensor P1 and the downstream side pressure measured by the downstream side pressure sensor P2 as inputs. of traffic.
在此，如果下游側閥V2打開，則氣體從下游側容積部VL流出，所以下游側壓力下降，產生下游側壓力的時間變化量（步驟S5）。即，在氣體開始流動的暫態回應狀態下，第二流量是與第一流量不同的值，並且是考慮了下游側壓力的時間變化量的值。Here, when the downstream side valve V2 is opened, the gas flows out from the downstream side volume part VL, so the downstream side pressure decreases, causing a time variation amount of the downstream side pressure (step S5). That is, in the transient response state in which the gas starts flowing, the second flow rate is a different value from the first flow rate, and is a value that takes into consideration the temporal change amount of the downstream side pressure.
如果進行基於第二流量的回饋控制（步驟S6），則流量的測定點與控制點一致，所以下游側閥V2中的流量變化立即反映於下游側閥V2的開度控制。因此，第二流量在短時間內穩定為設定流量的預定值（步驟S7）。If feedback control based on the second flow rate is performed (step S6), the measurement point of the flow rate coincides with the control point, so the flow rate change in the downstream side valve V2 is immediately reflected in the opening control of the downstream side valve V2. Therefore, the second flow rate stabilizes at the predetermined value of the set flow rate in a short period of time (step S7).
在第二流量穩定為設定流量的預定值時，相對於下游側容積部VL流入流出的氣體的量為平衡狀態，所以下游側壓力的時間變化量大體為零（步驟S8）。即，第二流量實質上等於第一流量，流量控制部3對下游側閥V2進行利用第一流量的回饋控制（步驟S9）。如此，由於流量控制部3基於由流體阻力件R前後的壓差計算出的第一流量以及由下游側壓力的時間變化量計算出的第二流量，來控制下游側閥V2的開度，所以在下游側容積部VL內產生壓力變化時和下游側容積部VL內的壓力穩定時，回饋的流量自然地變化。即，也可以說由流量控制部3進行的流量控制自然地從第二流量控制切換為第一流量控制。When the second flow rate stabilizes at the predetermined value of the set flow rate, the amount of gas flowing in and out of the downstream volume part VL is in a balanced state, so the temporal change amount of the downstream pressure is substantially zero (step S8 ). That is, the second flow rate is substantially equal to the first flow rate, and the flow rate control unit 3 performs feedback control using the first flow rate on the downstream valve V2 (step S9 ). In this way, since the flow rate control unit 3 controls the opening of the downstream side valve V2 based on the first flow rate calculated from the pressure difference before and after the fluid resistance member R and the second flow rate calculated from the temporal change amount of the downstream side pressure, When a pressure change occurs in the downstream volume part VL and when the pressure in the downstream volume part VL becomes stable, the feedback flow rate naturally changes. That is, it can be said that the flow control performed by the flow control unit 3 naturally switches from the second flow control to the first flow control.
此外，壓力控制部4與流量控制部3獨立地控制上游側閥V1的開度，在第二流量穩定為設定流量的預定值的期間，以利用上游側閥V1的開度變化而使從下游側閥V2流出的流量保持恒定的方式進行控制（步驟S10）。In addition, the pressure control unit 4 and the flow rate control unit 3 independently control the opening of the upstream side valve V1, so that during the period when the second flow rate is stabilized at a predetermined value of the set flow rate, the opening of the upstream side valve V1 is used to control the flow from the downstream. The flow rate out of the side valve V2 is controlled so that the flow rate remains constant (step S10).
按照如此構成的第一實施方式的流量控制裝置100，可以根據實際測定的第一流量和下游側壓力的時間變化量，計算出作為從下游側閥V2流出的流量的第二流量。並且，由於對作為控制點的下游側閥V2處的流量亦即第二流量進行回饋來控制下游側閥V2，所以在實際的流量與回饋的流量之間不產生時間延遲，從而與以往相比能夠提高相對於設定流量變化的追隨速度。即，可以實現在半導體製造工序中所需求的回應速度。According to the flow rate control device 100 of the first embodiment configured in this way, the second flow rate, which is the flow rate flowing out of the downstream side valve V2, can be calculated based on the actually measured first flow rate and the time change amount of the downstream side pressure. Furthermore, since the second flow rate, which is the flow rate at the downstream side valve V2 as the control point, is fed back to control the downstream side valve V2, there is no time delay between the actual flow rate and the feedback flow rate, which is better than in the past. The speed of following changes in the set flow rate can be increased. That is, the response speed required in the semiconductor manufacturing process can be achieved.
此外，由於利用上游側閥V1，以使流體阻力件R的上游側的壓力始終保持為設定壓力的方式進行控制，所以不容易產生壓力變動，並且利用下游側閥V2的控制，在第二流量穩定為設定流量後容易繼續保持其流量。即，對於從下游側閥V2流出的氣體的流量的控制，可以提高穩健性。In addition, since the pressure on the upstream side of the fluid resistance element R is always maintained at the set pressure by the upstream side valve V1, pressure fluctuation is less likely to occur, and by the control of the downstream side valve V2, at the second flow rate It is easy to maintain the flow rate after stabilizing the set flow rate. That is, the robustness of the control of the flow rate of the gas flowing out from the downstream valve V2 can be improved.
接著參照圖3，對本發明第二實施方式進行說明。另外，對已經在第一實施方式中說明的構件賦予相同的附圖標記。Next, a second embodiment of the present invention will be described with reference to FIG. 3 . In addition, the same reference numerals are given to the members already described in the first embodiment.
在第二實施方式中，流量控制裝置100未附加外部感測器，而是具有自診斷功能，該自診斷功能根據流量控制裝置100自身所具有的感測器的資訊診斷自身狀態。即，如圖3所示，流量控制裝置100還包括診斷部5，該診斷部5在下游側閥V2關閉的狀態下，對第一流量和第二流量進行比較來診斷是否存在異常。如果是下游側閥V2關閉的狀態，則不存在來自下游側容積部VL的氣體的流出，所以如果各感測器未發生故障，則第一流量和第二流量幾乎不會產生差異。因此，當第一流量與第二流量之差超過預定閾值時，診斷部5診斷為上游側壓力感測器P1、下游側壓力感測器P2和下游側閥V2中的某一個發生了故障。In the second embodiment, the flow control device 100 does not have an external sensor attached, but has a self-diagnostic function that diagnoses its own status based on information from the sensors it has. That is, as shown in FIG. 3 , the flow control device 100 further includes a diagnostic unit 5 that compares the first flow rate and the second flow rate to diagnose whether there is an abnormality in a state where the downstream valve V2 is closed. If the downstream valve V2 is closed, there is no outflow of gas from the downstream volume VL. Therefore, if each sensor does not malfunction, there will be almost no difference between the first flow rate and the second flow rate. Therefore, when the difference between the first flow rate and the second flow rate exceeds the predetermined threshold, the diagnosis unit 5 diagnoses a failure in any one of the upstream pressure sensor P1, the downstream pressure sensor P2, and the downstream valve V2.
如此，按照第二實施方式的流量控制裝置100，通過對從內部得到的各種流量進行比較，可以診斷流體設備是否發生了故障等異常。In this manner, according to the flow control device 100 of the second embodiment, by comparing various flow rates obtained from the inside, it is possible to diagnose whether an abnormality such as a malfunction has occurred in the fluid equipment.
接著參照圖4，對本發明第三實施方式進行說明。Next, a third embodiment of the present invention will be described with reference to FIG. 4 .
在第三實施方式的流量控制裝置100中，第一流量的算出原理與第一實施方式不同。具體地說，第三實施方式的流量控制裝置100未使用設置在流體阻力件R前後的壓力感測器的測定值，而是另外設置有用於測定流量的流量檢測機構F，第一流量算出部1基於上述流量檢測機構F的輸出計算出第一流量。In the flow control device 100 of the third embodiment, the calculation principle of the first flow rate is different from that of the first embodiment. Specifically, the flow control device 100 of the third embodiment does not use the measurement value of the pressure sensor provided before and after the fluid resistance member R, but is additionally provided with a flow detection mechanism F for measuring the flow rate, and a first flow calculation unit 1The first flow rate is calculated based on the output of the flow rate detection mechanism F.
即，在第三實施方式中，流量檢測機構F具有：細管F1，以跨越流體阻力件R前後的方式分路設置；兩個傳熱線圈F2，捲繞於該細管F1；以及流量檢測器F3，由將各傳熱線圈F2保持為預定溫度的電橋電路構成。向各傳熱線圈F2施加的電壓對應於細管F1內流動的流體的流量而變化。第一流量算出部1基於從流量檢測器F3輸出的電壓之差計算出第一流量。即，在第三實施方式中，由流量檢測機構F和第一流量算出部1構成熱式流量感測器。That is, in the third embodiment, the flow rate detection mechanism F includes: a thin tube F1 that is branched across the fluid resistance member R; two heat transfer coils F2 wound around the thin tube F1; and a flow rate detector F3 , consisting of a bridge circuit that maintains each heat transfer coil F2 at a predetermined temperature. The voltage applied to each heat transfer coil F2 changes according to the flow rate of the fluid flowing in the thin tube F1. The first flow rate calculation unit 1 calculates the first flow rate based on the difference in voltages output from the flow rate detector F3. That is, in the third embodiment, the flow rate detection mechanism F and the first flow rate calculation unit 1 constitute a thermal flow sensor.
按照這種結構，基於第一流量和由下游側壓力感測器P2測定的下游側壓力的時間變化量，計算出作為在下游側閥V2中實際流動的流量的第二流量，能夠基於上述第二流量以不產生時間延遲的方式來進行流量控制。According to this structure, the second flow rate, which is the flow rate actually flowing in the downstream side valve V2, is calculated based on the first flow rate and the time change amount of the downstream side pressure measured by the downstream side pressure sensor P2. The second flow rate is controlled in a manner that does not cause time delay.
對其他實施方式進行說明。Other embodiments will be described.
也可以是流量控制裝置不具備上游側閥，流體設備僅具備上游側壓力感測器、流體阻力件、下游側壓力感測器和下游側閥。即，也可以不進行將流體阻力件的上游側的壓力保持為恒定的壓力控制，而利用下游側閥進行第一實施方式中說明的基於第二流量的流量回饋控制。即使是這種結構，通過使流量的測定點與控制點一致，也能夠得到提高回應速度的效果。The flow control device may not include an upstream valve, and the fluid equipment may only include an upstream pressure sensor, a fluid resistance member, a downstream pressure sensor, and a downstream valve. That is, instead of performing pressure control to maintain the pressure on the upstream side of the fluid resistance element constant, the flow rate feedback control based on the second flow rate described in the first embodiment may be performed using the downstream side valve. Even with this structure, by aligning the measurement point of the flow rate with the control point, the response speed can be improved.
流量控制裝置控制的流體不限於氣體，也可以是液體。The fluid controlled by the flow control device is not limited to gas, and may also be liquid.
也可以是下游側閥包括位移感測器，可以檢測閥體相對於閥座的位置、即開度。此外，也可以是流量控制部例如基於設定流量與第二流量的偏差計算出當前應實現的目標開度，並且以使位移感測器檢測的檢測開度成為目標開度的方式控制下游側閥。按照這種結構，由於能夠利用第二流量以不產生時間延遲的方式得到下游側閥在某一控制點處的實際流量，並且能夠基於位移感測器的檢測開度高速地控制下游側閥的開度自身，所以能夠使實際經過下游側閥的流量進一步高速地追隨設定流量。The downstream valve may also include a displacement sensor that can detect the position of the valve body relative to the valve seat, that is, the opening. Furthermore, the flow rate control unit may calculate a target opening that should be achieved currently based on, for example, a deviation between the set flow rate and the second flow rate, and control the downstream valve so that the detected opening detected by the displacement sensor becomes the target opening. . According to this structure, the actual flow rate of the downstream valve at a certain control point can be obtained using the second flow rate without causing time delay, and the downstream valve can be controlled at high speed based on the detected opening of the displacement sensor. The opening itself allows the actual flow rate passing through the downstream side valve to follow the set flow rate at a higher speed.
此外，由於可以檢測下游側閥的當前開度，並且根據第二流量得到實際經過下游側閥的流量，所以還能夠準確地把握開度與實際流動的第二流量之間的關係。因此，即使例如發生了某種故障或堵塞，從某一開度下應實現的流量僅稍許變化，也能夠檢測為異常。即，如果診斷部基於位移感測器的檢測開度和第二流量來進行流量控制裝置內的自診斷，則與以往相比能夠進行高精度的診斷。In addition, since the current opening of the downstream valve can be detected and the actual flow rate passing through the downstream valve is obtained based on the second flow rate, the relationship between the opening and the actual second flow rate can be accurately grasped. Therefore, even if, for example, some kind of malfunction or blockage occurs, an abnormality can be detected even if the flow rate that should be achieved at a certain opening degree changes only slightly. That is, if the diagnosis unit performs self-diagnosis in the flow control device based on the detected opening of the displacement sensor and the second flow rate, it is possible to perform diagnosis with higher accuracy than in the past.
另外，也可以是上游側閥也包括位移感測器，從而能夠檢測上游側閥的開度。In addition, the upstream valve may also include a displacement sensor so that the opening of the upstream valve can be detected.
此外，為了可以將利用本發明的流量控制裝置在極短時間內實現的流量例如向腔室等直接供給，只要在流路中將下游側閥配置在腔室的導入口附近即可。Furthermore, in order to directly supply the flow rate achieved in a very short time by the flow rate control device of the present invention to, for example, a chamber, a downstream valve may be arranged in the flow path near the inlet of the chamber.
此外，只要不違反本發明的宗旨，可以進行實施方式的變形，也可以分別組合各實施方式的一部分或全部。In addition, as long as the gist of the present invention is not violated, the embodiments may be modified, and part or all of the embodiments may be combined separately.
100‧‧‧流量控制裝置COM‧‧‧控制器F‧‧‧流量檢測機構F1‧‧‧細管F2‧‧‧傳熱線圈F3‧‧‧流量檢測器V1‧‧‧上游側閥V2‧‧‧下游側閥P0‧‧‧供給壓力感測器P1‧‧‧上游側壓力感測器P2‧‧‧下游側壓力感測器R‧‧‧流體阻力件VL‧‧‧下游側容積部1‧‧‧第一流量算出部2‧‧‧第二流量算出部21‧‧‧變化量算出部22‧‧‧流量運算部3‧‧‧流量控制部4‧‧‧壓力控制部5‧‧‧診斷部100‧‧‧Flow control device COM‧‧‧Controller F‧‧‧Flow detection mechanism F1‧‧‧Thin tube F2‧‧‧Heat transfer coil F3‧‧‧Flow detector V1‧‧‧Upstream side valve V2‧‧‧ Downstream side valve P0‧‧‧Supply pressure sensor P1‧‧‧Upstream side pressure sensor P2‧‧‧Downstream side pressure sensor R‧‧‧Fluid resistance piece VL‧‧‧Downstream side volume part 1‧‧ ‧First flow calculation part 2‧‧‧Second flow calculation part 21‧‧‧Variation calculation part 22‧‧‧Flow calculation part 3‧‧‧Flow control part 4‧‧‧Pressure control part 5‧‧‧Diagnosis part
圖1是表示本發明第一實施方式的流量控制裝置的示意圖。 圖2是表示第一實施方式的流量控制裝置的控制動作的流程圖。 圖3是表示本發明第二實施方式的流量控制裝置的示意圖。 圖4是表示本發明第三實施方式的流量控制裝置的示意圖。FIG. 1 is a schematic diagram showing a flow control device according to the first embodiment of the present invention. FIG. 2 is a flowchart showing the control operation of the flow rate control device according to the first embodiment. FIG. 3 is a schematic diagram showing a flow control device according to a second embodiment of the present invention. FIG. 4 is a schematic diagram showing a flow rate control device according to a third embodiment of the present invention.
100‧‧‧流量控制裝置 100‧‧‧Flow control device
COM‧‧‧控制器 COM‧‧‧Controller
V1‧‧‧上游側閥 V1‧‧‧Upstream side valve
V2‧‧‧下游側閥 V2‧‧‧Downstream side valve
P0‧‧‧供給壓力感測器 P0‧‧‧Supply pressure sensor
P1‧‧‧上游側壓力感測器 P1‧‧‧Upstream side pressure sensor
P2‧‧‧下游側壓力感測器 P2‧‧‧Downstream pressure sensor
R‧‧‧流體阻力件 R‧‧‧Fluid resistance parts
VL‧‧‧下游側容積部 VL‧‧‧Downstream side volume part
1‧‧‧第一流量算出部 1‧‧‧First flow rate calculation section
2‧‧‧第二流量算出部 2‧‧‧Second flow rate calculation part
21‧‧‧變化量算出部 21‧‧‧Change calculation part
22‧‧‧流量運算部 22‧‧‧Flow calculation department
3‧‧‧流量控制部 3‧‧‧Flow Control Department
4‧‧‧壓力控制部 4‧‧‧Pressure Control Department
Claims (7)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017147801A JP7164938B2 (en) | 2017-07-31 | 2017-07-31 | Flow control device, flow control method, and program for flow control device |
| JP2017-147801 | 2017-07-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201910955A TW201910955A (en) | 2019-03-16 |
| TWI815814B true TWI815814B (en) | 2023-09-21 |
Family
ID=65038611
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW107125734A TWI815814B (en) | 2017-07-31 | 2018-07-25 | Flow rate control apparatus, flow rate control method, and program recording medium |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US10545514B2 (en) |
| JP (2) | JP7164938B2 (en) |
| KR (1) | KR102483417B1 (en) |
| CN (1) | CN109324641B (en) |
| TW (1) | TWI815814B (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10633297B2 (en) | 2018-03-16 | 2020-04-28 | Ngk Insulators, Ltd. | Method of manufacturing honeycomb structure |
| JP7437980B2 (en) * | 2019-03-12 | 2024-02-26 | 株式会社堀場エステック | Fluid control device, fluid control system, diagnostic method, and program for fluid control device |
| US11512998B2 (en) * | 2019-09-18 | 2022-11-29 | GE Precision Healthcare LLC | Systems and method for an air flow sensor in a medical gas flow device |
| CN111579013B (en) * | 2020-05-26 | 2022-07-15 | 北京七星华创流量计有限公司 | Gas mass flow controller and flow calibration method thereof |
| US11860018B2 (en) * | 2020-08-14 | 2024-01-02 | Horiba Stec, Co., Ltd. | Rate-of-change flow measurement device |
| JP2022047815A (en) * | 2020-09-14 | 2022-03-25 | アズビル株式会社 | Mass flow controller |
| CN113983224A (en) * | 2021-10-12 | 2022-01-28 | 康赛特自动化集团有限公司 | Electric actuator device for Internet of things and use method thereof |
| JP2023080611A (en) * | 2021-11-30 | 2023-06-09 | 株式会社堀場エステック | Flow rate control device, flow rate control method, and program for flow rate control device |
| JP7144126B1 (en) * | 2022-05-16 | 2022-09-29 | 東フロコーポレーション株式会社 | Flow controller |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008053839A1 (en) * | 2006-11-02 | 2008-05-08 | Horiba Stec, Co., Ltd. | Diagnostic mechanism in differential pressure type mass flow controller |
| WO2013179550A1 (en) * | 2012-05-31 | 2013-12-05 | 株式会社フジキン | Flow volume control device equipped with build-down system flow volume monitor |
| JP5395451B2 (en) * | 2009-02-10 | 2014-01-22 | サーパス工業株式会社 | Flow controller |
| TW201602749A (en) * | 2014-06-20 | 2016-01-16 | 堀場Ｓｔｅｃ股份有限公司 | Relay and fluid control and measurement system |
| TW201612669A (en) * | 2014-08-01 | 2016-04-01 | Horiba Stec Co | Flow rate control apparatus, storage medium storing program for flow rate control apparatus and flow rate control method |
| TW201642063A (en) * | 2015-04-08 | 2016-12-01 | Tokyo Electron Ltd | Gas supply control method |
| TW201702781A (en) * | 2015-07-10 | 2017-01-16 | 派伏塔系統公司 | Method and apparatus for gas flow control |
| CN103529869B (en) * | 2012-07-03 | 2017-06-06 | 株式会社堀场Stec | Pressure control device, volume control device, compress control method and flow control methods |
Family Cites Families (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002323402A (en) * | 2001-04-26 | 2002-11-08 | Tomoe Tech Res Co | Detector of valve leakage, method, actuator for valve driving and program |
| JP2003084840A (en) * | 2001-09-14 | 2003-03-19 | Ckd Corp | Pressure operated flow control method and device therefor |
| JP4544992B2 (en) | 2002-06-24 | 2010-09-15 | エム ケー エス インストルメンツ インコーポレーテッド | Apparatus and method for mass flow control insensitive to pressure fluctuations |
| JP4146746B2 (en) | 2003-03-18 | 2008-09-10 | 株式会社堀場エステック | Mass flow controller |
| JP2004302914A (en) * | 2003-03-31 | 2004-10-28 | Advanced Energy Japan Kk | Mass flow controller equipped with sensor for primary side pressure |
| JP4204400B2 (en) * | 2003-07-03 | 2009-01-07 | 忠弘 大見 | Differential pressure type flow meter and differential pressure type flow control device |
| US7740024B2 (en) * | 2004-02-12 | 2010-06-22 | Entegris, Inc. | System and method for flow monitoring and control |
| US7204158B2 (en) * | 2004-07-07 | 2007-04-17 | Parker-Hannifin Corporation | Flow control apparatus and method with internally isothermal control volume for flow verification |
| US7757554B2 (en) * | 2005-03-25 | 2010-07-20 | Mks Instruments, Inc. | High accuracy mass flow verifier with multiple inlets |
| US7621290B2 (en) * | 2005-04-21 | 2009-11-24 | Mks Instruments, Inc. | Gas delivery method and system including a flow ratio controller using antisymmetric optimal control |
| US20090250116A1 (en) * | 2006-07-10 | 2009-10-08 | Hong Sa-Mun | Flow rate controlling apparatus |
| US8079383B2 (en) * | 2006-12-07 | 2011-12-20 | Mks Instruments, Inc. | Controller gain scheduling for mass flow controllers |
| US20080250854A1 (en) * | 2007-04-12 | 2008-10-16 | Junhua Ding | Mass flow device using a flow equalizer for improving the output response |
| JP2010055500A (en) * | 2008-08-29 | 2010-03-11 | Mitsumi Electric Co Ltd | Flow controller and flow control method |
| US7826986B2 (en) * | 2008-09-26 | 2010-11-02 | Advanced Energy Industries, Inc. | Method and system for operating a mass flow controller |
| JP2010169657A (en) * | 2008-12-25 | 2010-08-05 | Horiba Stec Co Ltd | Mass flow meter and mass flow controller |
| US8131400B2 (en) * | 2010-06-10 | 2012-03-06 | Hitachi Metals, Ltd. | Adaptive on-tool mass flow controller tuning |
| JP2012168824A (en) * | 2011-02-15 | 2012-09-06 | Horiba Stec Co Ltd | Fluid control device |
| US10353408B2 (en) * | 2011-02-25 | 2019-07-16 | Mks Instruments, Inc. | System for and method of fast pulse gas delivery |
| US8849466B2 (en) * | 2011-10-04 | 2014-09-30 | Mks Instruments, Inc. | Method of and apparatus for multiple channel flow ratio controller system |
| US9846074B2 (en) * | 2012-01-20 | 2017-12-19 | Mks Instruments, Inc. | System for and method of monitoring flow through mass flow controllers in real time |
| US9557744B2 (en) * | 2012-01-20 | 2017-01-31 | Mks Instruments, Inc. | System for and method of monitoring flow through mass flow controllers in real time |
| JP5754853B2 (en) * | 2012-01-30 | 2015-07-29 | 株式会社フジキン | Gas shunt supply device for semiconductor manufacturing equipment |
| JP5867517B2 (en) * | 2012-02-03 | 2016-02-24 | 日立金属株式会社 | Flow control device and program |
| JP5960614B2 (en) * | 2012-03-29 | 2016-08-02 | Ckd株式会社 | Fluid control system and fluid control method |
| JP5665794B2 (en) * | 2012-04-27 | 2015-02-04 | 株式会社フジキン | Gas shunt supply device for semiconductor manufacturing equipment |
| US10031005B2 (en) * | 2012-09-25 | 2018-07-24 | Mks Instruments, Inc. | Method and apparatus for self verification of pressure-based mass flow controllers |
| JP6771772B2 (en) * | 2015-09-24 | 2020-10-21 | 株式会社フジキン | Pressure type flow control device and its abnormality detection method |
| US10459458B2 (en) * | 2015-09-30 | 2019-10-29 | Hitachi Metals, Ltd. | Mass flow controller and diagnostic method for differential pressure type flow meter |
| WO2017110066A1 (en) * | 2015-12-25 | 2017-06-29 | 株式会社フジキン | Flow rate control device and abnormality detection method using flow rate control device |
| JP6804874B2 (en) * | 2016-05-31 | 2020-12-23 | 株式会社堀場エステック | Flow control device, program used for flow control device, and flow control method |
| JP6600854B2 (en) * | 2016-08-24 | 2019-11-06 | 株式会社フジキン | Pressure-type flow rate control device, flow rate calculation method thereof, and flow rate control method |
| JP7245600B2 (en) * | 2016-12-15 | 2023-03-24 | 株式会社堀場エステック | Flow control device and program for flow control device |
| US10983537B2 (en) * | 2017-02-27 | 2021-04-20 | Flow Devices And Systems Inc. | Systems and methods for flow sensor back pressure adjustment for mass flow controller |
| JP7008499B2 (en) * | 2017-12-27 | 2022-01-25 | 株式会社堀場エステック | Calibration data creation device, calibration data creation method, and flow control device |
| US10649471B2 (en) * | 2018-02-02 | 2020-05-12 | Mks Instruments, Inc. | Method and apparatus for pulse gas delivery with isolation valves |
| JP7059053B2 (en) * | 2018-03-12 | 2022-04-25 | 株式会社堀場エステック | Flow control device, flow control method, and program for flow control device |
| US11209298B2 (en) * | 2018-04-27 | 2021-12-28 | Hitachi Metals, Ltd. | Thermal mass flow sensor with improved accuracy |
-
2017
- 2017-07-31 JP JP2017147801A patent/JP7164938B2/en active Active
-
2018
- 2018-07-11 KR KR1020180080692A patent/KR102483417B1/en active IP Right Grant
- 2018-07-12 CN CN201810762767.6A patent/CN109324641B/en active Active
- 2018-07-25 TW TW107125734A patent/TWI815814B/en active
- 2018-07-30 US US16/048,750 patent/US10545514B2/en active Active
-
2021
- 2021-11-10 JP JP2021183490A patent/JP2022010221A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008053839A1 (en) * | 2006-11-02 | 2008-05-08 | Horiba Stec, Co., Ltd. | Diagnostic mechanism in differential pressure type mass flow controller |
| JP5395451B2 (en) * | 2009-02-10 | 2014-01-22 | サーパス工業株式会社 | Flow controller |
| WO2013179550A1 (en) * | 2012-05-31 | 2013-12-05 | 株式会社フジキン | Flow volume control device equipped with build-down system flow volume monitor |
| CN103529869B (en) * | 2012-07-03 | 2017-06-06 | 株式会社堀场Stec | Pressure control device, volume control device, compress control method and flow control methods |
| TW201602749A (en) * | 2014-06-20 | 2016-01-16 | 堀場Ｓｔｅｃ股份有限公司 | Relay and fluid control and measurement system |
| TW201612669A (en) * | 2014-08-01 | 2016-04-01 | Horiba Stec Co | Flow rate control apparatus, storage medium storing program for flow rate control apparatus and flow rate control method |
| TW201642063A (en) * | 2015-04-08 | 2016-12-01 | Tokyo Electron Ltd | Gas supply control method |
| TW201702781A (en) * | 2015-07-10 | 2017-01-16 | 派伏塔系統公司 | Method and apparatus for gas flow control |
Also Published As
| Publication number | Publication date |
|---|---|
| US20190033896A1 (en) | 2019-01-31 |
| KR20190013490A (en) | 2019-02-11 |
| JP7164938B2 (en) | 2022-11-02 |
| JP2022010221A (en) | 2022-01-14 |
| TW201910955A (en) | 2019-03-16 |
| JP2019028747A (en) | 2019-02-21 |
| KR102483417B1 (en) | 2022-12-30 |
| CN109324641A (en) | 2019-02-12 |
| CN109324641B (en) | 2023-07-25 |
| US10545514B2 (en) | 2020-01-28 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI815814B (en) | Flow rate control apparatus, flow rate control method, and program recording medium | |
| US10503179B2 (en) | Flow rate control apparatus and program recording medium having recorded therein program for flow rate control apparatus | |
| JP5873681B2 (en) | Flow control device, diagnostic device used for flow control device, and diagnostic program | |
| KR101994373B1 (en) | Flow rate control device, diagnostic device for use in flow rate measuring mechanism or for use in flow rate control device including the flow rate measuring mechanism and recording medium having diagnostic program recorded thereon for use in the same | |
| JP6415889B2 (en) | Flow control device, program for flow control device, and flow control method | |
| KR20130040740A (en) | Flow rate control device, diagnostic device for use in flow rate measuring mechanism or for use in flow rate control device including the flow rate measuring mechanism and recording medium having diagnostic program recorded thereon for use in the same | |
| JP7059053B2 (en) | Flow control device, flow control method, and program for flow control device | |
| US10705546B2 (en) | Flow rate control apparatus, flow rate control method, and program recording medium | |
| JP7148302B2 (en) | Flow controller | |
| JP6929566B2 (en) | Flow rate measuring method and flow measuring device | |
| TW202221440A (en) | Flow rate control apparatus, flow rate control method, and program recording medium in which program for flow rate control apparatus is recorded | |
| JPWO2019026700A1 (en) | Fluid control system and flow measurement method | |
| JP3893115B2 (en) | Mass flow controller | |
| JP7217742B2 (en) | Flow control device, diagnostic method, and program for flow control device | |
| JP2021093182A (en) | Flow controller, flow control method, and program for flow controller | |
| JP2021005361A (en) | Fluid control device, fluid control system, diagnosis method, and program for fluid control device | |
| TW202102962A (en) | Flow rate control device, flow rate measuring method, and computer readable storage medium | |
| KR20220103623A (en) | Pressure control system, pressure control method, and pressure control program stored in a storage medium |