TWI814982B - Adhesive sheet for workpiece processing and manufacturing method thereof - Google Patents

Adhesive sheet for workpiece processing and manufacturing method thereof Download PDF

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TWI814982B
TWI814982B TW109103487A TW109103487A TWI814982B TW I814982 B TWI814982 B TW I814982B TW 109103487 A TW109103487 A TW 109103487A TW 109103487 A TW109103487 A TW 109103487A TW I814982 B TWI814982 B TW I814982B
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adhesive
base material
workpiece processing
adhesive sheet
adhesive layer
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TW202039611A (en
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坂本美紗季
山口征太郎
佐伯尚哉
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日商琳得科股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/20Diluents or solvents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • C09J7/25Plastics; Metallised plastics based on macromolecular compounds obtained otherwise than by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/255Polyesters
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/29Laminated material
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/312Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/40Additional features of adhesives in the form of films or foils characterized by the presence of essential components
    • C09J2301/416Additional features of adhesives in the form of films or foils characterized by the presence of essential components use of irradiation

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Adhesive Tapes (AREA)
  • Materials For Medical Uses (AREA)
  • Absorbent Articles And Supports Therefor (AREA)

Abstract

一種工件加工用黏著片,為具備:基材,以及積層在上述基材的單面上的黏著劑層,上述黏著劑層為由含有在側鏈導入有活性能量射線硬化性基的丙烯酸系聚合物的黏著性組合物所形成的活性能量射線硬化性的黏著劑所構成,上述丙烯酸系聚合物的玻璃轉換溫度(Tg)為-80℃以上,-30℃以下,在上述基材的與上述黏著劑層接觸的面上,形成有含有吡咯烷酮系化合物的塗佈層的工件加工用黏著片。根據相關的工件加工用黏著片,可抑制對工件的殘膠。An adhesive sheet for workpiece processing, comprising: a base material; and an adhesive layer laminated on one side of the base material; the adhesive layer is made of an acrylic polymer containing an active energy ray curable group introduced into a side chain It is composed of an active energy ray-curable adhesive formed from an adhesive composition, and the glass transition temperature (Tg) of the above-mentioned acrylic polymer is -80°C or more and -30°C or less, between the above-mentioned base material and the above-mentioned An adhesive sheet for workpiece processing in which a coating layer containing a pyrrolidone compound is formed on the surface in contact with the adhesive layer. Depending on the adhesive sheet for workpiece processing, residual glue on the workpiece can be suppressed.

Description

工件加工用黏著片及其製造方法Adhesive sheet for workpiece processing and manufacturing method thereof

本發明是關於一種可適合使用在半導體晶圓等的工件加工的工件加工用黏著片以及其製造方法The present invention relates to an adhesive sheet for workpiece processing that can be suitably used for workpiece processing such as semiconductor wafers and a method for manufacturing the same.

矽、砷化鎵等的半導體晶圓、各種封裝類是在大直徑的狀態被製造,切斷(dicing,亦稱切割)成元件切片(半導體晶片),經剝離(pickup,亦稱撿晶)後,轉送至作為下一步驟的安裝(mount)步驟。此時,半導體晶圓等的作業(work,亦稱工件)是以貼附在具備基材以及黏著劑層的工件加工用黏著片的狀態,進行背面研磨(back grinding)、切割、洗淨、乾燥、擴展(expanding)、撿晶、安裝(mounting)等的加工。Semiconductor wafers and various packages of silicon, gallium arsenide, etc. are manufactured in a large-diameter state, cut (dicing, also called cutting) into component slices (semiconductor wafers), and then peeled (pickup, also called wafer picking) Then, transfer to the mount step as the next step. At this time, the work (also called workpiece) such as the semiconductor wafer is in a state of being attached to the adhesive sheet for workpiece processing that has a base material and an adhesive layer, and is subjected to back grinding, cutting, cleaning, Processing such as drying, expanding, crystal picking, mounting, etc.

在此,上述的切割步驟,起因於被切斷物的固定不足等,有時會在晶片的切斷面上發生缺陷(chipping,缺角)。此類缺角會使晶片本身的彎曲強度降低,使被密封的IC的封裝內抽入空氣,易於發生封裝破裂。近年來,半導體晶圓的薄膜化持續進展,厚度變得越薄,發生如上述的缺角的可能性變得越高。Here, in the above-described dicing step, defects (chipping, chipping) may occur on the cut surface of the wafer due to insufficient fixation of the object to be cut. Such missing corners will reduce the bending strength of the chip itself, causing air to be sucked into the package of the sealed IC, which may easily lead to package rupture. In recent years, thinning of semiconductor wafers has continued, and the thinner the thickness, the higher the possibility of occurrence of chipping as described above.

為了防止如上述的缺角的發生,可想到使黏著力提升。例如,專利文獻1中,提案一種切割用黏著片,具有將切割用黏著片貼附在矽鏡面晶圓後,在23℃進行180°剝離(拉力速度300mm/min)時的黏著力成為10N/25mm以上的貼附溫度。 [先前技術文獻] [專利文獻]In order to prevent the occurrence of chipping as mentioned above, it is conceivable to increase the adhesive force. For example, Patent Document 1 proposes a dicing adhesive sheet that has an adhesive force of 10 N/min when the dicing adhesive sheet is attached to a silicon mirror wafer and then peeled off at 180° at 23°C (pulling speed 300 mm/min). Attachment temperature above 25mm. [Prior technical literature] [Patent Document]

專利文獻1:日本特開2003-142433號公報Patent Document 1: Japanese Patent Application Publication No. 2003-142433

[發明欲解決的問題][Problem to be solved by the invention]

然而,使用黏著力大的工件加工用黏著片時,在與工件分離時(例如,晶片的撿晶時),容易發生構成黏著劑層的黏著劑附著在工件上所謂殘膠的問題。這種殘膠的問題在當工件於表面具有微小的凹部時,特別容易發生。However, when using an adhesive sheet for workpiece processing with a strong adhesive force, when it is separated from the workpiece (for example, when picking up a wafer), the adhesive constituting the adhesive layer adheres to the workpiece, so-called residual glue is likely to occur. This problem of residual glue is particularly likely to occur when the workpiece has tiny recesses on the surface.

具體而言,將工件加工用黏著片的黏著劑層側的面貼附在工件有凹部存在的面,在工件加工用黏著片上對工件進行預定的加工後,將工件加工用黏著片與工件進行分離。在此分離時,在該工件中貼附有工件加工用黏著片的面上,構成工件加工用黏著片的黏著劑層的黏著劑發生容易附著的等的問題。Specifically, the surface on the adhesive layer side of the workpiece processing adhesive sheet is attached to the surface of the workpiece with the concave portion, and after predetermined processing is performed on the workpiece on the workpiece processing adhesive sheet, the workpiece processing adhesive sheet is attached to the workpiece. separation. During this separation, there is a problem that the adhesive constituting the adhesive layer of the workpiece processing adhesive sheet easily adheres to the surface of the workpiece on which the adhesive sheet for workpiece processing is attached.

本發明為鑒於此種實情而完成者,其目的為提供一種可抑制對工件的殘膠的工件加工用黏著片以及其製造方法。 [解決問題的手段]The present invention was made in view of such circumstances, and its object is to provide an adhesive sheet for workpiece processing that can suppress adhesive residue on the workpiece, and a method for manufacturing the same. [Methods to solve problems]

為了達成上述目的,第一,本發明提供一種工件加工用黏著片,具備:基材,以及積層在上述基材的單面上的黏著劑層,上述黏著劑層為由含有在側鏈導入有活性能量射線硬化性基的丙烯酸系聚合物的黏著性組合物所形成的活性能量射線硬化性的黏著劑所構成,上述丙烯酸系聚合物的玻璃轉換溫度(Tg)為-80℃以上,-30℃以下,在上述基材的與上述黏著劑層接觸的面,形成有含有吡咯烷酮系化合物的塗佈層的工件加工用黏著片(發明1)。In order to achieve the above object, first, the present invention provides an adhesive sheet for workpiece processing, which includes: a base material; and an adhesive layer laminated on one side of the base material. The adhesive layer is composed of a side chain introduced with An active energy ray-curable adhesive composed of an adhesive composition of an acrylic polymer with an active energy ray-curable group. The glass transition temperature (Tg) of the acrylic polymer is -80°C or above, -30 °C or lower, an adhesive sheet for workpiece processing in which a coating layer containing a pyrrolidone compound is formed on the surface of the base material that is in contact with the adhesive layer (Invention 1).

上述發明(發明1)相關的工件加工用黏著片,藉由黏著劑層為由含有在側鏈導入有活性能量射線硬化性基的丙烯酸系聚合物的黏著性組合物所形成的活性能量射線硬化性的黏著劑所構成,該丙烯酸系聚合物的玻璃轉換溫度(Tg)為上述範圍,再者,在基材的與黏著劑層接觸的面上形成含有吡咯烷酮系化合物的塗佈層,可降低殘膠的問題。 The adhesive sheet for workpiece processing according to the above invention (Invention 1) has an active energy ray curable adhesive layer formed of an adhesive composition containing an acrylic polymer having an active energy ray curable group introduced into the side chain. It is composed of a flexible adhesive, and the glass transition temperature (Tg) of the acrylic polymer is in the above range. In addition, a coating layer containing a pyrrolidone compound is formed on the surface of the substrate in contact with the adhesive layer, which can reduce The problem of residual glue.

在上述發明(發明1)中,以上述丙烯酸系聚合物為在該聚合物的主鏈上包含來自(甲基)丙烯酸烷基酯的構造,上述(甲基)丙烯酸烷基酯中的丙烯酸基的碳數為1~4為佳(發明2)。 In the above invention (Invention 1), the acrylic polymer has a structure derived from an alkyl (meth)acrylate in the main chain of the polymer, and the acrylic group in the alkyl (meth)acrylate The number of carbon atoms is preferably 1 to 4 (Invention 2).

上述發明(發明1、2)中,上述丙烯酸系聚合物為在該聚合物的主鏈上含有來自含有官能基的單體的構造,以在上述丙烯酸系聚合物全體中上述來自含有官能基的單體的構造部分的比例為0.1質量%以上,12質量%以下為佳(發明3)。 In the above inventions (Inventions 1 and 2), the acrylic polymer has a structure in which the main chain of the polymer is derived from a monomer containing a functional group, so that in the entire acrylic polymer, the acrylic polymer is derived from a functional group-containing monomer. The proportion of the monomer structural part is preferably 0.1% by mass or more and 12% by mass or less (Invention 3).

上述發明(發明1~3)中,以上述吡咯烷酮系化合物為以乙烯吡咯烷酮作為主要構成單元的聚合物為佳(發明4)。 In the above-mentioned inventions (Inventions 1 to 3), it is preferable that the pyrrolidone-based compound is a polymer having vinylpyrrolidone as its main structural unit (Invention 4).

在上述發明(發明1~4)中,以上述基材在25℃的貯藏模數為1000MPa以上為佳(發明5)。 In the above inventions (Inventions 1 to 4), it is preferable that the storage modulus of the base material at 25°C is 1000 MPa or more (Invention 5).

在上述發明(發明5)中,以上述基材為聚對苯二甲酸乙二酯膜作為基材本體為佳(發明6)。 In the above invention (Invention 5), it is preferable that the base material is a polyethylene terephthalate film as the base material body (Invention 6).

在上述發明(發明1~6)中,以切割片為佳(發明7)。 Among the above-mentioned inventions (Inventions 1 to 6), cutting sheets are preferred (Invention 7).

第二,本發明提供一種工件加工用黏著片的製造方法,為上述工件加工用黏著片(發明1~7)的製造方法,具備:在基材本體的單面上,形成含有吡咯烷酮系化合物的塗佈層,獲得上述基材的步驟;將上述黏著性組合物塗佈在剝離片材的剝離面上,形成上述黏著劑層的步驟;以即將上述基材的塗佈層側的面,與上述黏著劑層貼合的步驟(發明8)。 Secondly, the present invention provides a method for manufacturing an adhesive sheet for workpiece processing, which is the manufacturing method of the above-mentioned adhesive sheet for workpiece processing (Inventions 1 to 7), and includes: forming a pyrrolidone-based compound on one side of the base material body. coating layer to obtain the above-mentioned base material; coating the above-mentioned adhesive composition on the peeling surface of the release sheet to form the above-mentioned adhesive layer; that is, the surface on the coating layer side of the above-mentioned base material and The above-mentioned step of laminating the adhesive layer (Invention 8).

第三,本發明提供一種工件加工用黏著片的製造方法為上述工件加工用黏著片(發明3)的製造方法,具備:調製使含官能基的單體以5質量%以上,35質量%以下的量進行共聚合的(甲基)丙烯酸酯共聚物,於上述(甲基)丙烯酸酯共聚物中,使具有官能基的含活性能量射線硬化性基的化合物進行反應,製造在側鏈導入有活性能量射線硬化性基的丙烯酸系聚合物,調製含有該丙烯酸系聚合物的黏著性組合物的步驟;於基材本體的單面,形成含有吡咯烷酮系化合物的塗佈層,獲得上述基材的步驟;將上述黏著性組合物塗佈在剝離片材的剝離面,形成上述黏著劑層的步驟;以及將上述基材的塗佈層側的面,與上述黏著劑層貼合的步驟(發明9)。Thirdly, the present invention provides a method for manufacturing an adhesive sheet for workpiece processing, which is the manufacturing method of the above-mentioned adhesive sheet for workpiece processing (Invention 3). A (meth)acrylate copolymer that is copolymerized in an amount of An acrylic polymer with an active energy ray-curable group and a step of preparing an adhesive composition containing the acrylic polymer; forming a coating layer containing a pyrrolidone compound on one side of the base material body to obtain the above base material Steps; the step of coating the above-mentioned adhesive composition on the peeling surface of the release sheet to form the above-mentioned adhesive layer; and the step of laminating the surface of the coating layer side of the above-mentioned base material with the above-mentioned adhesive layer (invention 9).

上述發明(發明9)中,相對於上述含官能基的單體的官能基的量,具有上述官能基的含活性能量射線硬化性基的化合物的量,以60莫耳%以上,99莫耳%以下為佳(發明10)。 [發明的效果]In the above invention (Invention 9), the amount of the active energy ray-curable group-containing compound having the above-mentioned functional group is 60 mol% or more, 99 mol%, relative to the amount of the functional group of the functional group-containing monomer. % or less is preferred (Invention 10). [Effects of the invention]

本發明相關的工件加工用黏著片可抑制對工件的殘膠。此外,根據本發明相關的工件加工用黏著片的製造方法,可有效率地製造可抑制對工件的殘膠的工件加工用黏著片。The adhesive sheet for workpiece processing related to the present invention can suppress adhesive residue on the workpiece. Furthermore, according to the manufacturing method of an adhesive sheet for workpiece processing related to the present invention, it is possible to efficiently manufacture an adhesive sheet for workpiece processing that can suppress adhesive residue on the workpiece.

以下,說明有關本發明的實施形態。 本發明一實施形態相關的工件加工用黏著片,具備:基材,以及積層在該基材的單面的黏著劑層。該黏著劑層為由含有在側鏈導入有活性能量射線硬化性基的丙烯酸系聚合物的黏著性組合物所形成的活性能量射線硬化性的黏著劑所構成,上述丙烯酸系聚合物的玻璃轉換溫度(Tg)為-80℃以上,-30℃以下。此外,在上述基材中與黏著劑層接觸的面上,形成有含有吡咯烷酮系化合物的塗佈層。Hereinafter, embodiments of the present invention will be described. An adhesive sheet for workpiece processing according to an embodiment of the present invention includes a base material and an adhesive layer laminated on one side of the base material. The adhesive layer is composed of an active energy ray curable adhesive composed of an adhesive composition containing an acrylic polymer having an active energy ray curable group introduced into the side chain. The glass transition of the acrylic polymer is Temperature (Tg) is above -80°C and below -30°C. In addition, a coating layer containing a pyrrolidone compound is formed on the surface of the base material that is in contact with the adhesive layer.

使用本實施形態相關的工件加工用黏著片時,在工件加工用黏著片的黏著劑層中與基材相反側的面(以下,有時稱為「黏著面」)上貼附工件,在工件加工用黏著片上對工件進行預定的加工。接著,對黏著劑層照射能量射線,使黏著劑層硬化後,將工件加工用黏著片與工件分離。本實施形態相關的工件加工用黏著片,藉由具有如上述的構成,在與工件的分離時,可有效地抑制對工件的殘膠。特別是,黏著劑層為由含有在側鏈導入有活性能量射線硬化性基的丙烯酸系聚合物的黏著性組合物所形成的活性能量射線硬化性的黏著劑所構成時,藉由活性能量射線的照射,對工件的黏著力易於降低,與工件的分離時,不易在工件側有黏著劑殘留。此外,當黏著劑的玻璃轉換溫度(Tg)為-30℃以下時,對基材的密附性變高,在與工件的分離時,變得不易在工件側有黏著劑殘留。再者,藉由在基材中與黏著劑層接觸的面上,有含有吡咯烷酮系化合物的塗佈層存在,基材與黏著劑層的密附性變得更高,在與工件的分離時,變得不易在工件側有黏著劑殘留。相關的殘膠抑制效果,即使工件中與工件加工用黏著片的黏著面接觸的面上有微小的凹部存在,亦能良好地發揮。When using the adhesive sheet for workpiece processing according to this embodiment, the workpiece is attached to the surface opposite to the base material (hereinafter, sometimes referred to as the "adhesive surface") of the adhesive layer of the adhesive sheet for workpiece processing, and the workpiece is Predetermined processing is performed on the workpiece on the processing adhesive sheet. Next, the adhesive layer is irradiated with energy rays to harden the adhesive layer, and then the adhesive sheet for workpiece processing is separated from the workpiece. By having the above-mentioned structure, the adhesive sheet for workpiece processing according to this embodiment can effectively suppress adhesive residue on the workpiece when it is separated from the workpiece. In particular, when the adhesive layer is composed of an active energy ray-curable adhesive composed of an adhesive composition containing an acrylic polymer having an active energy ray-curable group introduced into the side chain, the active energy ray can be With the irradiation, the adhesion to the workpiece is easily reduced, and when separated from the workpiece, there is less adhesive residue on the side of the workpiece. In addition, when the glass transition temperature (Tg) of the adhesive is -30°C or less, the adhesion to the base material becomes high, and it becomes less likely that the adhesive will remain on the workpiece side when separated from the workpiece. Furthermore, since there is a coating layer containing a pyrrolidone compound on the surface of the base material that is in contact with the adhesive layer, the adhesion between the base material and the adhesive layer becomes higher, and when the workpiece is separated from the workpiece, the adhesion between the base material and the adhesive layer becomes higher. , it becomes less likely to have adhesive residue on the workpiece side. The related adhesive residue suppression effect can be effectively exerted even if there are tiny recesses on the surface of the workpiece that is in contact with the adhesive surface of the adhesive sheet for workpiece processing.

從殘膠抑制的觀點而言,上述丙烯酸系聚合物的玻璃轉換溫度(Tg)必須為-30℃以下,以-32℃以下為佳,特別是以-35℃以下為佳。此外,從類似的殘膠抑制的觀點而言,上述丙烯酸系聚合物的玻璃轉換溫度(Tg),以-80℃以上為佳,以-70℃以上為更佳,特別是以-55℃以上為佳。且,在本說明書中玻璃轉換溫度(Tg)為藉由Fox的算式可求得的計算值。From the viewpoint of suppressing adhesive residue, the glass transition temperature (Tg) of the acrylic polymer must be -30°C or lower, preferably -32°C or lower, and particularly preferably -35°C or lower. In addition, from the viewpoint of similar residual glue suppression, the glass transition temperature (Tg) of the above-mentioned acrylic polymer is preferably -80°C or higher, more preferably -70°C or higher, and particularly -55°C or higher. Better. In this specification, the glass transition temperature (Tg) is a calculated value that can be obtained by Fox's equation.

另一方面,本實施形態中基材在25℃的貯藏模數,以1000MPa以上為佳。藉由基材具有相關的貯藏模數,在切割時,降低工件加工用黏著片的晃動的發生,貼附在工件加工用黏著片的工件的移動受到限制的結果,缺角的發生受到抑制。通常,當基材具有如上述的大貯藏模數時,基材與黏著劑層的密附性降低,在與工件的分離時,變得容易在工件側有黏著劑殘留,但本實施形態相關的工件加工用黏著片,藉由具有上述構成,即使使用具有如上述的大貯藏模數的基材的情況,仍能抑制殘膠。On the other hand, in this embodiment, the storage modulus of the base material at 25°C is preferably 1000 MPa or more. Since the base material has a relevant storage modulus, the occurrence of wobbling of the workpiece processing adhesive sheet during cutting is reduced. As a result, the movement of the workpiece attached to the workpiece processing adhesive sheet is restricted, and the occurrence of chipping is suppressed. Generally, when the base material has a large storage modulus as described above, the adhesion between the base material and the adhesive layer decreases, and when the base material is separated from the workpiece, it becomes easy for the adhesive to remain on the workpiece side. However, this embodiment is related to By having the above-mentioned structure, the adhesive sheet for workpiece processing can suppress residual adhesive even when using a base material with a large storage modulus as mentioned above.

從上述觀點而言,基材在25℃的貯藏模數,以1200MPa以上為更佳,特別是以1500MPa以上為佳。另一方面,基材在25℃的貯藏模數,以3000MPa以下為佳。藉由貯藏模數的上限值如上述,工件加工用黏著片成為具有適當彈性者,可良好地進行與工件的分離(包括晶片的撿晶)。且,基材的貯藏模數的測定方法如下述試驗例所示。From the above point of view, the storage modulus of the base material at 25°C is more preferably 1200 MPa or more, especially 1500 MPa or more. On the other hand, the storage modulus of the base material at 25°C is preferably 3000 MPa or less. By setting the upper limit of the storage modulus as described above, the adhesive sheet for workpiece processing has appropriate elasticity and can be separated from the workpiece well (including picking up wafers). In addition, the method for measuring the storage modulus of the base material is as shown in the following test examples.

作為本實施形態相關的工件加工用黏著片的一例的具體構成如圖1所示。如圖1所示,一實施形態相關的工件加工用黏著片1,具備:基材2、積層在該基材2中的單面側的黏著劑層3,以及積層在黏著劑層3中與基材2相反側的剝離片材4。基材2具備:基材本體21,以及含有吡咯烷酮系化合物的塗佈層22,該塗佈層22位在與黏著劑層3鄰接的一側。此外,剝離片材4以該剝離片材4的剝離面鄰接黏著劑層3的方式設置。且,在本說明書中剝離片材的剝離面,是指剝離片材中具有剝離性的面,包括實施剝離處理的面以及即使未實施剝離處理仍顯示剝離性的面的任一者。The specific structure of an example of the adhesive sheet for workpiece processing related to this embodiment is shown in FIG. 1 . As shown in FIG. 1 , an adhesive sheet 1 for workpiece processing according to an embodiment includes a base material 2 , an adhesive layer 3 laminated on one side of the base material 2 , and an adhesive layer 3 laminated on the adhesive layer 3 . The release sheet 4 on the opposite side of the base material 2. The base material 2 includes a base material body 21 and a coating layer 22 containing a pyrrolidone compound, and the coating layer 22 is located on the side adjacent to the adhesive layer 3 . Moreover, the release sheet 4 is provided so that the release surface of the release sheet 4 may be adjacent to the adhesive layer 3 . In addition, in this specification, the release surface of the release sheet refers to the surface of the release sheet that has releasability, and includes any of the surface that has been subjected to a release process and the surface that still shows releasability even if the release process has not been performed.

1. 工件加工用黏著片的構成構件 (1)基材 本實施形態中的基材2,具備:基材本體21,以及設置在基材本體21的黏著劑層3側的含有吡咯烷酮系化合物的塗佈層22。1. Components of the adhesive sheet for workpiece processing (1)Substrate The base material 2 in this embodiment includes a base material body 21 and a coating layer 22 containing a pyrrolidone compound provided on the adhesive layer 3 side of the base material body 21 .

(1-1)基材本體 本實施形態中的基材本體21,只要是能發揮工件加工用黏著片的使用時所期望的機能者即可,則無特別限定。惟,從抑制切割時缺角的發生的觀點而言,基材2以可發揮上述貯藏模數者為佳。且,本實施形態,由於塗佈層22對基材2的貯藏模數幾乎無影響,故可將基材2的貯藏模數與基材本體21的貯藏模數視為相同。(1-1)Substrate body The base material body 21 in this embodiment is not particularly limited as long as it can exert the desired function when using the adhesive sheet for workpiece processing. However, from the viewpoint of suppressing the occurrence of chipping during cutting, the base material 2 is preferably one that can exhibit the above-mentioned storage modulus. Furthermore, in this embodiment, since the coating layer 22 has almost no influence on the storage modulus of the base material 2, the storage modulus of the base material 2 and the storage modulus of the base material body 21 can be regarded as the same.

工件為像半導體晶圓般,對活性能量射線(特別是紫外線)的穿透性為無或比較低者時,基材本體21以對活性能量射線具有良好的穿透性為佳。藉由透過基材2對黏著劑層3照射活性能量射線,可使該黏著劑層3良好地硬化。此外,工件為如玻璃構件般,為由對活性能量射線具有良好的穿透性的材質所構成者時,該玻璃構件的表面存在有凹凸(例如,以印刷而形成的凹凸),有以該凹凸為起因的活性能量射線(特別是紫外線)無法發揮充分的穿透性的可能性時,以基材本體21對活性能量射線具有良好的穿透性為佳。When the workpiece is like a semiconductor wafer and has no or relatively low penetrability to active energy rays (especially ultraviolet rays), it is preferable that the base material body 21 has good penetrability to active energy rays. By irradiating the adhesive layer 3 with active energy rays through the base material 2, the adhesive layer 3 can be cured favorably. In addition, when the workpiece is made of a material that has good penetrability to active energy rays, such as a glass member, the surface of the glass member has unevenness (for example, unevenness formed by printing), and the surface of the glass member has unevenness. When there is a possibility that active energy rays (especially ultraviolet rays) due to unevenness cannot exhibit sufficient penetrability, it is preferable that the base material body 21 has good penetrability to active energy rays.

基材本體21以樹脂系的材料做為主材料的樹脂膜為佳。作為其具體例,可列舉,聚對苯二甲酸乙二酯膜、聚對苯二甲酸丁二酯膜、聚萘二甲酸乙二酯等的聚酯系膜;乙烯-醋酸乙烯酯共聚物膜;乙烯-(甲基)丙烯酸甲酯共聚物膜、其他的乙烯-(甲基)丙烯酸酯共聚物膜等的乙烯系共聚物膜;聚乙烯膜、聚丙烯膜、聚丁烯膜、聚丁二烯膜、聚甲基戊烯膜、乙烯-降莰烯共聚物膜、降莰烯樹脂膜等的聚烯烴系膜;聚氯乙烯膜、氯乙烯共聚物膜等的聚氯乙烯系膜;(甲基)丙烯酸酯共聚物膜;聚氨酯膜;聚醯亞胺膜;聚苯乙烯膜;聚碳酸酯膜;氟樹脂膜等。作為聚乙烯膜的例子,可列舉,低密度聚乙烯(LDPE)膜、直鏈低密度聚乙烯(LLDPE)膜、高密度聚乙烯(HDPE)膜等。此外,亦可使用其交聯膜、離子性聚合物膜之類的改質膜。此外,基材也可以是將上述的膜進行複數積層而形成的積層膜。在此積層膜中,構成各層的材料可相同,亦可相異。且,在本說明書中「(甲基)丙烯酸」是指丙烯酸以及甲基丙烯酸兩者。關於其他類似用語亦相同。The base body 21 is preferably a resin film whose main material is a resin-based material. Specific examples thereof include polyester-based films such as polyethylene terephthalate film, polybutylene terephthalate film, and polyethylene naphthalate; and ethylene-vinyl acetate copolymer film. ; Ethylene-based copolymer films such as ethylene-(meth)acrylate copolymer film and other ethylene-(meth)acrylate copolymer films; polyethylene film, polypropylene film, polybutylene film, polybutylene film Polyolefin-based films such as diene films, polymethylpentene films, ethylene-norbornene copolymer films, norbornene resin films; polyvinyl chloride-based films such as polyvinyl chloride films, vinyl chloride copolymer films, etc.; (Meth)acrylate copolymer film; polyurethane film; polyimide film; polystyrene film; polycarbonate film; fluororesin film, etc. Examples of polyethylene films include low-density polyethylene (LDPE) films, linear low-density polyethylene (LLDPE) films, high-density polyethylene (HDPE) films, and the like. In addition, modified membranes such as cross-linked membranes and ionic polymer membranes can also be used. In addition, the base material may be a laminated film formed by laminating a plurality of the above-mentioned films. In this laminated film, the materials constituting each layer may be the same or different. In addition, in this specification, "(meth)acrylic acid" means both acrylic acid and methacrylic acid. The same applies to other similar terms.

作為本實施形態中的基材本體21,上述的膜當中,以聚酯系膜、硬質氯乙烯膜、聚苯乙烯膜、聚碳酸酯膜等為佳,特別是以聚酯系膜為佳。此外,聚酯系膜當中,特別是以聚對苯二甲酸乙二酯膜為佳。上述的膜易於滿足上述貯藏模數,因此,易於抑制缺角的發生。As the base material body 21 in this embodiment, among the above-mentioned films, polyester-based films, rigid vinyl chloride films, polystyrene films, polycarbonate films, etc. are preferred, and polyester-based films are particularly preferred. Among polyester films, polyethylene terephthalate films are particularly preferred. The above-mentioned film easily satisfies the above-mentioned storage modulus, and therefore easily suppresses the occurrence of chipping.

基材本體21亦可含有阻燃劑、塑化劑、抗靜電劑、潤滑劑、抗氧化劑、著色劑、紅外線吸收劑、紫外線吸收劑、離子捕捉劑等的各種添加劑。作為其添加劑的含量,並無特別限定,但以在發揮基材本體21所期望的機能的範圍為佳。The base material body 21 may also contain various additives such as flame retardants, plasticizers, antistatic agents, lubricants, antioxidants, colorants, infrared absorbers, ultraviolet absorbers, and ion trapping agents. The content of the additive is not particularly limited, but it is preferably within a range in which the desired function of the base body 21 is exerted.

基材本體21的厚度只要是對應工件加工用黏著片1被使用的方法而適當設定即可,但從抑制缺角的發生的觀點而言,以20μm以上為佳,特別是以25μm以上為佳,進一步以40μm以上為佳。此外,該厚度以450μm以下為佳,特別是以300μm以下為佳,進一步以200μm以下為佳。The thickness of the base material body 21 may be appropriately set according to the method in which the adhesive sheet 1 for workpiece processing is used. However, from the viewpoint of suppressing the occurrence of chipping, it is preferably 20 μm or more, and particularly preferably 25 μm or more. , further preferably above 40 μm. In addition, the thickness is preferably 450 μm or less, particularly preferably 300 μm or less, and further preferably 200 μm or less.

(1-2)塗佈層 本實施形態中的塗佈層22為含有吡咯烷酮系化合物。藉由此塗佈層22的存在,基材2與黏著劑層3間的密附性提升,變得在與工件分離時有效地抑制殘膠。雖然未必完全明白其理由,但推測吡咯烷酮系化合物與構成黏著劑層3的黏著劑中所含的官能基,特別是與羥基進行鍵結或反應,使黏著劑層3易於密附在塗佈層22之故。(1-2)Coating layer The coating layer 22 in this embodiment contains a pyrrolidone compound. The presence of this coating layer 22 improves the adhesion between the base material 2 and the adhesive layer 3, effectively suppressing adhesive residue when separated from the workpiece. Although the reason for this is not necessarily fully understood, it is speculated that the pyrrolidone-based compound bonds or reacts with the functional groups contained in the adhesive constituting the adhesive layer 3, especially with the hydroxyl group, so that the adhesive layer 3 can easily adhere to the coating layer. 22 reasons.

吡咯烷酮系化合物只要是具有吡咯烷酮骨架的化合物即可,可以是單體,也可以是聚合物。當中,從對塗佈層22的黏著劑層3的密附性的觀點而言,以具有吡咯烷酮骨架的聚合物為佳,特別是以乙烯吡咯烷酮作為主要構成單元的聚合物為佳。該聚合物可以是乙烯吡咯烷酮的均聚物(聚乙烯吡咯烷酮),也可以是乙烯吡咯烷酮與其他單體的共聚物。當為此種共聚物的時候,乙烯吡咯烷酮成分的含有比率,以50質量%以上為佳。The pyrrolidone-based compound only needs to be a compound having a pyrrolidone skeleton, and may be a monomer or a polymer. Among them, from the viewpoint of adhesion to the adhesive layer 3 of the coating layer 22, a polymer having a pyrrolidone skeleton is preferred, and in particular, a polymer containing vinylpyrrolidone as a main structural unit is preferred. The polymer may be a homopolymer of vinylpyrrolidone (polyvinylpyrrolidone) or a copolymer of vinylpyrrolidone and other monomers. In the case of such a copolymer, the content ratio of the vinylpyrrolidone component is preferably 50% by mass or more.

作為其他單體,可列舉,乙烯基、(甲基)丙烯醯基、烯丙基等的具有加成聚合性不飽和基的單體。相關的其他單體也可以是在側鏈具有烷基、烷酯基、烷醚基、羥基、羧基、醯胺基、胺基、聚烷醚基等者。Examples of other monomers include monomers having an addition polymerizable unsaturated group such as a vinyl group, a (meth)acrylyl group, and an allyl group. Related other monomers may also have an alkyl group, an alkyl ester group, an alkyl ether group, a hydroxyl group, a carboxyl group, a amide group, an amine group, a polyalkyl ether group, etc. in the side chain.

作為上述其他單體,具體而言,可列舉,(甲基)丙烯酸、(甲基)甲基丙烯酸甲酯等的(甲基)甲基丙烯酸烷酯、(甲基)丙烯酸羥乙酯等的(甲基)丙烯酸與二醇的單酯、(甲基)丙烯酸的鹼金屬鹽、(甲基)丙烯酸的銨鹽、醋酸乙烯酯、N-乙烯基咪唑、N-乙烯基乙醯胺、N-乙烯基甲醯胺、N-乙烯基己內醯胺、(甲基)丙烯醯胺、N-烷基(甲基)丙烯醯胺、N-羥甲基(甲基)丙烯醯胺等的乙烯單體等。Specific examples of the other monomers include (meth)acrylic acid, (meth)alkyl methacrylates such as (meth)methyl methacrylate, and hydroxyethyl (meth)acrylate, etc. Monoester of (meth)acrylic acid and glycol, alkali metal salt of (meth)acrylic acid, ammonium salt of (meth)acrylic acid, vinyl acetate, N-vinylimidazole, N-vinyl acetamide, N - Vinylformamide, N-vinylcaprolactamide, (meth)acrylamide, N-alkyl(meth)acrylamide, N-hydroxymethyl(meth)acrylamide, etc. Ethylene monomer, etc.

具有吡咯烷酮骨架的聚合物的重量平均分子量,以50000以上為佳,特別是以100000以上為佳。此外,該重量平均分子量,以1000000以下為佳,特別是以800000以下為佳,進一步以700000以下為佳。在此,在本說明書中的重量平均分子量是藉由凝膠滲透層析(GPC)法所測定的換算標準聚苯乙烯的值。The weight average molecular weight of the polymer having a pyrrolidone skeleton is preferably 50,000 or more, and particularly preferably 100,000 or more. In addition, the weight average molecular weight is preferably 1,000,000 or less, particularly 800,000 or less, and further preferably 700,000 or less. Here, the weight average molecular weight in this specification is a value measured by gel permeation chromatography (GPC) in terms of standard polystyrene.

本實施形態中的塗佈層2以將含有吡咯烷酮系化合物的塗佈劑進行塗佈而形成為佳。相關的塗佈劑除了吡咯烷酮系化合物以外,以含有結合劑(binder)樹脂為佳,以進一步含有與結合劑樹脂進行反應的硬化劑(交聯劑)為佳。The coating layer 2 in this embodiment is preferably formed by applying a coating agent containing a pyrrolidone compound. The related coating agent preferably contains a binder resin in addition to the pyrrolidone compound, and further preferably contains a hardener (crosslinking agent) that reacts with the binder resin.

在塗佈劑中的吡咯烷酮系化合物的含量(固形分換算),以20質量%以上為佳,特別是以30質量%以上為佳。此外,該含量以80質量%以下為佳,特別是以70質量%以下為佳。The content of the pyrrolidone compound in the coating agent (in terms of solid content) is preferably 20 mass% or more, and particularly preferably 30 mass% or more. In addition, the content is preferably 80 mass% or less, and particularly preferably 70 mass% or less.

作為結合劑樹脂,可列舉,聚酯系結合劑樹脂、丙烯酸系結合劑樹脂、聚醚-胺甲酸乙酯系結合劑樹脂等為佳。當中,從對基材的親和性的觀點而言,以聚酯系結合劑樹脂為佳。作為聚酯系結合劑樹脂,以水性聚酯系結合劑樹脂為佳。水性聚酯系結合劑樹脂雖然是採取在水中進行溶解的水溶液的形態,但也會採取在水中做為乳化液而分散的水分散體的形態。Preferable examples of the binder resin include polyester binder resin, acrylic binder resin, polyether-urethane binder resin, and the like. Among them, polyester-based binder resin is preferred from the viewpoint of affinity to the base material. As the polyester-based binder resin, a water-based polyester-based binder resin is preferred. The water-based polyester binder resin takes the form of an aqueous solution dissolved in water, but may also take the form of a water dispersion dispersed in water as an emulsion.

上述水性聚酯系結合劑樹脂,以酸價為10.0KOHmg/g以上,羥基值為2.0KOHmg/g以上者為佳。如此一來,成為對基材本體21的密附性良好者。從相關觀點而言,水性聚酯系結合劑樹脂的酸價,以15.0KOHmg/g以上為更佳,特別是以20.0KOHmg/g以上為佳,進一步以30.0KOHmg/g以上為佳,以40.0KOHmg/g以上為最佳。此外,水性聚酯系結合劑樹脂的羥基值,以2.5KOHmg/g以上為更佳,特別是以3.0KOHmg/g以上為佳,進一步以3.5KOHmg/g以上為佳,以4.0KOHmg/g以上為最佳。且,上述的酸價以及羥基值為依據JIS K0070-1992為準則所測定的值。 The above-mentioned water-based polyester binder resin preferably has an acid value of 10.0KOHmg/g or more and a hydroxyl value of 2.0KOHmg/g or more. This results in good adhesion to the base material body 21 . From a related perspective, the acid value of the water-based polyester binder resin is more preferably 15.0KOHmg/g or more, especially 20.0KOHmg/g or more, further preferably 30.0KOHmg/g or more, and 40.0 KOHmg/g or above is the best. In addition, the hydroxyl value of the water-based polyester-based binder resin is more preferably 2.5KOHmg/g or more, especially 3.0KOHmg/g or more, further preferably 3.5KOHmg/g or more, and 4.0KOHmg/g or more. for the best. In addition, the above-mentioned acid value and hydroxyl value are values measured based on the standards of JIS K0070-1992.

作為上述水性聚酯系結合劑樹脂,可列舉,醇成分與羧酸成分進行聚縮合可獲得的共聚物,以及該共聚物的改質物等。 Examples of the water-based polyester-based binder resin include copolymers obtained by polycondensation of alcohol components and carboxylic acid components, modified products of the copolymers, and the like.

作為上述醇成分,可使用在1分子中具有2個以上羥基的多元醇。作為具體的醇成分,可列舉,例如,乙二醇、二乙二醇、三乙二醇、四乙二醇、丙二醇、二丙二醇、1,4-丁二醇、1,3-丁二醇、2,3-丁二醇、1,2-丁二醇、3-甲基-1,2-丁二醇、1,2-戊二醇、1,5-戊二醇、1,4-戊二醇、2,4-戊二醇、3-甲基-4,5-戊二醇、2,2,4-三甲基-1,3-戊二醇、1,6-己二醇、1,5-己二醇、1,4-己二醇、2,5-己二醇、新戊二醇、羥基三甲基乙酸新戊二醇酯(hydroxypivalic acid neopentyl glycol ester)等的二醇類;於此等二醇類中加成ε-己內酯等的內酯類的聚內酯二醇;對苯二甲酸雙(羥乙基)酯等的聚酯二醇類;1,3-環己烷二甲醇、1,4-環己烷二甲醇、三環癸烷二甲醇、氫化雙酚A、氫化雙酚F、螺二醇(spiroglycol)、二羥甲基三環癸烷等的二價環醇;雙酚A的環氧乙烷、環氧丙烷加成產物;丙三醇、三羥甲基丙烷、三羥甲基乙烷、二丙三醇、三丙三醇、1,2,6-己三醇、新戊四醇、二新戊四醇、山梨醇、甘露醇等的三價以上的多元醇。此等醇成分可單獨或組合2種以上使用。 As the alcohol component, a polyhydric alcohol having two or more hydroxyl groups per molecule can be used. Specific alcohol components include, for example, ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, propylene glycol, dipropylene glycol, 1,4-butanediol, and 1,3-butanediol. , 2,3-butanediol, 1,2-butanediol, 3-methyl-1,2-butanediol, 1,2-pentanediol, 1,5-pentanediol, 1,4- Pentylene glycol, 2,4-pentanediol, 3-methyl-4,5-pentanediol, 2,2,4-trimethyl-1,3-pentanediol, 1,6-hexanediol , 1,5-hexanediol, 1,4-hexanediol, 2,5-hexanediol, neopentyl glycol, hydroxypivalic acid neopentyl glycol ester, etc. Alcohols; polylactone diols in which lactones such as ε-caprolactone are added to these diols; polyester diols such as bis(hydroxyethyl) terephthalate; 1, 3-Cyclohexane dimethanol, 1,4-cyclohexanedimethanol, tricyclodecane dimethanol, hydrogenated bisphenol A, hydrogenated bisphenol F, spiroglycol, dimethylol tricyclodecane and other divalent cyclic alcohols; ethylene oxide and propylene oxide addition products of bisphenol A; glycerol, trimethylolpropane, trimethylolethane, diglycerol, triplycerol, Trivalent or higher polyhydric alcohols such as 1,2,6-hexanetriol, neopentylerythritol, dineopenterythritol, sorbitol, and mannitol. These alcohol components can be used individually or in combination of 2 or more types.

作為上述羧酸成分,可使用1分子中具有2個以上羧基的多元酸。作為具體的羧酸成分,可列舉,例如,苯二甲酸、異苯二甲酸、對苯二甲酸、萘二甲酸、4,4-聯苯二甲酸、二苯基甲烷-4,4’-二羧酸、丁二酸、己二酸、壬二酸、 癸二酸、氯橋酸、順丁烯二酸、反丁烯二酸、伊康酸、環己烷-1,3-二羧酸、環己烷-1,4-二羧酸、六氫酞酸、六氫異酞酸、六氫對苯二甲酸、甲基六氫酞酸等的二羧酸及其等的酸酐;偏苯三甲酸(trimellitic acid)、均苯三甲酸(trimesic acid)、甲基環己烷三羧酸、六氫偏苯三甲酸、四氯己烷三羧酸等的三羧酸及其等的酸酐;1,2,4,5-環己烷四羧酸、1,2,3,4-丁烷四羧酸、1,2,3,4-環丁烷四羧酸、1,2,3,4-環戊烷四羧酸、均苯四甲酸(pyromellitic acid)等的四羧酸及其酸酐等。此等羧酸成分可單獨或組合2種以上使用。 As the carboxylic acid component, a polybasic acid having two or more carboxyl groups per molecule can be used. Specific carboxylic acid components include, for example, phthalic acid, isophthalic acid, terephthalic acid, naphthalenedicarboxylic acid, 4,4-biphenyldicarboxylic acid, and diphenylmethane-4,4'-di. Carboxylic acid, succinic acid, adipic acid, azelaic acid, Sebacic acid, chloronic acid, maleic acid, fumaric acid, itaconic acid, cyclohexane-1,3-dicarboxylic acid, cyclohexane-1,4-dicarboxylic acid, hexahydrogen Dicarboxylic acids such as phthalic acid, hexahydroisophthalic acid, hexahydroterephthalic acid, methylhexahydrophthalic acid and their anhydrides; trimellitic acid, trimesic acid , methylcyclohexanetricarboxylic acid, hexahydrotrimellitic acid, tetrachlorohexanetricarboxylic acid and other tricarboxylic acids and their anhydrides; 1,2,4,5-cyclohexanetetracarboxylic acid, 1,2,3,4-butanetetracarboxylic acid, 1,2,3,4-cyclobutanetetracarboxylic acid, 1,2,3,4-cyclopentanetetracarboxylic acid, pyromellitic acid acid) and other tetracarboxylic acids and their anhydrides, etc. These carboxylic acid components can be used individually or in combination of 2 or more types.

水性聚酯系結合劑樹脂的重量平均分子量,從對水的溶解性或分散性,以及對基材本體21的密附性的觀點而言,以1000~20000為佳,以1500~15000為更佳,特別是以2000~10000為佳,進一步以500~7500為佳。 The weight average molecular weight of the water-based polyester binder resin is preferably 1,000 to 20,000, and more preferably 1,500 to 15,000 from the viewpoint of solubility or dispersibility in water and adhesion to the base material body 21 It is better, especially 2000~10000 is better, and further 500~7500 is better.

在塗佈劑中的結合劑樹脂的含量(固形分換算),以20質量%以上為佳,特別是以30質量%以上為佳。此外,該含量以80質量%以下為佳,特別是以70質量%以下為佳。 The content of the binder resin in the coating agent (in terms of solid content) is preferably 20% by mass or more, and particularly preferably 30% by mass or more. In addition, the content is preferably 80 mass% or less, and particularly preferably 70 mass% or less.

作為硬化劑,只要是與結合劑樹脂進行反應即可,並無特別限定,但可列舉,例如,環氧系化合物、碳二醯亞胺系化合物、

Figure 109103487-A0305-02-0012-1
唑啉系化合物、醯肼系化合物、異氰酸酯系化合物、烷氧矽烷系化合物、胺系化合物等。此等硬化劑可使用單獨1種,亦可組合2種以上使用。上述當中,從與水性聚酯系結合劑樹脂的反應性的觀點而言,以環氧系化合物、碳二醯亞胺系化合物或
Figure 109103487-A0305-02-0012-2
唑啉系化合物為佳,特別是以
Figure 109103487-A0305-02-0012-3
唑啉系化合物為佳。此外,此等化合物從與水性聚酯系結合劑樹脂的相溶性的觀點而言,以水溶性者為佳。 The hardener is not particularly limited as long as it reacts with the binder resin, but examples thereof include epoxy compounds, carbodiimide compounds,
Figure 109103487-A0305-02-0012-1
Oxazoline compounds, hydrazine compounds, isocyanate compounds, alkoxysilane compounds, amine compounds, etc. These hardeners can be used individually by 1 type, or in combination of 2 or more types. Among the above, from the viewpoint of reactivity with aqueous polyester-based binder resin, epoxy-based compounds, carbodiimide-based compounds or
Figure 109103487-A0305-02-0012-2
Oxazoline compounds are preferred, especially
Figure 109103487-A0305-02-0012-3
Oxazoline compounds are preferred. In addition, from the viewpoint of compatibility with the water-based polyester-based binder resin, those compounds that are water-soluble are preferred.

作為環氧系化合物,只要是分子中具有2個以上的環氧基或環氧丙基者即可。此外,作為碳二醯亞胺系化合物,只要是分子中含有至少2個以上碳二醯亞胺基者為佳。 The epoxy compound may be any compound having two or more epoxy groups or epoxypropyl groups in the molecule. In addition, the carbodiimide-based compound is preferably one containing at least two carbodiimide groups in the molecule.

作為

Figure 109103487-A0305-02-0012-4
唑啉系化合物,只要是分子中含有至少2個以上
Figure 109103487-A0305-02-0012-5
唑啉基者即可,可列舉,例如,在2位的碳位置具有含有不飽和碳-碳鍵結的取代基的加成聚合性2-㗁唑啉(例如,2-異丙烯基-2-㗁唑啉)的均聚物、該加成聚合性2-㗁唑啉與其他不飽和單體的共聚物等。as
Figure 109103487-A0305-02-0012-4
Zozoline compounds, as long as the molecule contains at least 2 or more
Figure 109103487-A0305-02-0012-5
It suffices to be an oxazoline group, and examples thereof include, for example, addition polymerizable 2-oxazoline having a substituent containing an unsaturated carbon-carbon bond at the carbon position of the 2-position (for example, 2-isopropenyl-2 Homopolymer of -tetrazoline), copolymers of the addition polymerizable 2-tetrazoline and other unsaturated monomers, etc.

當㗁唑啉系化合物為聚合物時,其重量平均分子量,以10000~300000為佳,以50000~200000為更佳。When the tetrazoline compound is a polymer, its weight average molecular weight is preferably 10,000 to 300,000, and more preferably 50,000 to 200,000.

在塗佈劑中的硬化劑的含量(固形分換算),以1質量%以上為佳,特別是以3質量%以上為佳。此外,該含量以20質量%以下為佳,特別是以15質量%以下為佳。The content of the hardener in the coating agent (in terms of solid content) is preferably 1% by mass or more, and particularly preferably 3% by mass or more. In addition, the content is preferably 20% by mass or less, and particularly preferably 15% by mass or less.

塗佈層22的厚度的下限值,從對黏著劑層3的密附性的觀點而言,以0.01μm以上為佳,特別是以0.03μm以上為佳。此外,塗佈層22的厚度的上限值,從防止阻礙的觀點而言,以10μm以下為佳,特別是以1μm以下為佳,進一步以0.2μm以下為佳。The lower limit of the thickness of the coating layer 22 is preferably 0.01 μm or more, and particularly preferably 0.03 μm or more, from the viewpoint of adhesion to the adhesive layer 3 . In addition, from the viewpoint of preventing obstruction, the upper limit of the thickness of the coating layer 22 is preferably 10 μm or less, particularly 1 μm or less, and further preferably 0.2 μm or less.

(2)黏著劑層 在本實施形態中的黏著劑層3為由含有在側鏈導入有活性能量射線硬化性基的丙烯酸系聚合物(A)的黏著性組合物(以下,有時稱為「黏著性組合物P」)所形成的活性能量射線硬化性的黏著劑所構成。在本實施形態中的黏著性組合物P,以含有丙烯酸系聚合物(A),同時含有交聯劑(B)為佳,以進一步含有光聚合起始劑(C)為佳。(2)Adhesive layer The adhesive layer 3 in this embodiment is an adhesive composition (hereinafter sometimes referred to as "adhesive composition P") containing an acrylic polymer (A) in which an active energy ray curable group is introduced into the side chain. ") formed by active energy ray curable adhesive. The adhesive composition P in this embodiment preferably contains an acrylic polymer (A) and a cross-linking agent (B), and further preferably contains a photopolymerization initiator (C).

(2-1)各成分 (2-1-1)在側鏈導入有活性能量射線硬化性基的丙烯酸系聚合物(A) 在側鏈導入有活性能量射線硬化性基的丙烯酸系聚合物(A),以具有官能基的(甲基)丙烯酸酯共聚物(AP),與具有可與該官能基反應的官能基的含活性能量射線硬化性基的化合物(A3)進行反應可獲得者為佳。(2-1)Each ingredient (2-1-1) Acrylic polymer (A) in which an active energy ray curable group is introduced into the side chain An acrylic polymer (A) having an active energy ray curable group introduced into the side chain, a (meth)acrylate copolymer (AP) having a functional group, and an acrylic polymer having a functional group capable of reacting with the functional group. The compound (A3) having an active energy ray curable group is preferably obtained by reaction.

(甲基)丙烯酸酯聚合物(AP),以將至少(甲基)丙烯酸烷基酯(A1),與具有反應性的官能基的含官能基的單體(A2)進行共聚合者為佳。The (meth)acrylate polymer (AP) is preferably a copolymer of at least an alkyl (meth)acrylate (A1) and a functional group-containing monomer (A2) having a reactive functional group. .

作為(甲基)丙烯酸烷基酯(A1),以烷基的碳數為1~18者為佳,特別是以碳數為1~4者為佳。藉由碳數為1~4,所獲得的黏著劑層3的對基材2的密附性變得更高。As the (meth)acrylic acid alkyl ester (A1), one having a carbon number of 1 to 18 in the alkyl group is preferred, and one having a carbon number of 1 to 4 is particularly preferred. When the carbon number is 1 to 4, the adhesive layer 3 obtained has higher adhesion to the base material 2 .

作為(甲基)丙烯酸烷基酯(A1)的具體例,可列舉,(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸正戊酯、(甲基)丙烯酸正己酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸正癸酯、(甲基)丙烯酸月桂酯、(甲基)丙烯酸肉豆蔻酯、(甲基)丙烯酸棕櫚酯、(甲基)丙烯酸硬脂醯酯等。此等當中,以(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯或(甲基)丙烯酸正丁酯為佳,特別是以甲基丙烯酸甲酯或丙烯酸正丁酯為佳。此等可單獨使用,亦可組合2種以上使用。Specific examples of alkyl (meth)acrylate (A1) include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, and n-butyl (meth)acrylate. Ester, n-pentyl (meth)acrylate, n-hexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, isooctyl (meth)acrylate, n-decyl (meth)acrylate, ( Lauryl methacrylate, myristyl (meth)acrylate, palmityl (meth)acrylate, stearyl (meth)acrylate, etc. Among these, methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate or n-butyl (meth)acrylate is preferred, especially methyl methacrylate or acrylic acid. n-butyl ester is preferred. These can be used individually or in combination of 2 or more types.

在(甲基)丙烯酸酯共聚物(AP)中的上述來自(甲基)丙烯酸烷基酯(A1)的構造部分的質量的比例,以50~98質量%為佳,特別是以60~95質量%為佳,進一步以70~90質量%為佳。The mass ratio of the structural part derived from the alkyl (meth)acrylate (A1) in the (meth)acrylate copolymer (AP) is preferably 50 to 98 mass %, especially 60 to 95 % by mass is preferred, and 70 to 90 mass % is more preferred.

作為含官能基的單體(A2),可使用具有可與含活性能量射線硬化性基的化合物(A3)所具有的官能基進行反應的反應性的官能基者。作為含官能基的單體(A2)所具有的官能基,可列舉,例如,羥基、羧基、胺基、取代胺基、環氧基等,當中,以羥基或羧基為佳,特別是以羥基為佳。且,使用交聯劑(B)時,含官能基的單體(A2)所有的反應性的官能基,以與該交聯劑(B)進行反應為佳。As the functional group-containing monomer (A2), one having a reactive functional group capable of reacting with the functional group of the active energy ray-curable group-containing compound (A3) can be used. Examples of the functional group possessed by the functional group-containing monomer (A2) include a hydroxyl group, a carboxyl group, an amino group, a substituted amino group, an epoxy group, and the like. Among them, a hydroxyl group or a carboxyl group is preferred, especially a hydroxyl group. Better. Furthermore, when using the cross-linking agent (B), it is preferable that all the reactive functional groups of the functional group-containing monomer (A2) react with the cross-linking agent (B).

作為含官能基的單體(A2),使用具有羥基的單體(含羥基的單體)時,作為其例子,可列舉,(甲基)丙烯酸羥烷酯,作為其具體例,可列舉,(甲基)丙烯酸2-羥乙酯、(甲基)丙烯酸2-羥丙酯、(甲基)丙烯酸3-羥丙酯、(甲基)丙烯酸2-羥丁酯、(甲基)丙烯酸3-羥丁酯、(甲基)丙烯酸4-羥丁酯等。此等當中,從羥基的反應性以及共聚合性的觀點而言,以(甲基)丙烯酸2-羥乙酯為佳。此等可單獨使用,亦可組合2種以上使用。When a monomer having a hydroxyl group (hydroxyl group-containing monomer) is used as the functional group-containing monomer (A2), examples thereof include hydroxyalkyl (meth)acrylate, and specific examples thereof include: 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, (meth)acrylic acid 3 -Hydroxybutyl ester, 4-hydroxybutyl (meth)acrylate, etc. Among these, 2-hydroxyethyl (meth)acrylate is preferred from the viewpoint of reactivity of hydroxyl groups and copolymerizability. These can be used individually or in combination of 2 or more types.

作為含官能基的單體(A2),使用具有羧基的單體(含羧基的單體)時,作為其例,可列舉,乙烯性不飽和羧酸,作為其具體例,可列舉,丙烯酸、甲基丙烯酸、丁烯酸、順丁烯二酸、伊康酸、檸康酸等。此等當中,從羧基的反應性以及共聚合性的觀點而言,以丙烯酸為佳。此等可單獨使用,亦可組合2種以上使用。When a monomer having a carboxyl group (carboxyl group-containing monomer) is used as the functional group-containing monomer (A2), examples thereof include ethylenically unsaturated carboxylic acid, and specific examples thereof include acrylic acid, Methacrylic acid, crotonic acid, maleic acid, itaconic acid, citraconic acid, etc. Among these, acrylic acid is preferred from the viewpoint of reactivity of the carboxyl group and copolymerizability. These can be used individually or in combination of 2 or more types.

且,亦可組合相異種類的含官能基的單體(A2)使用。例如,亦可組合上述含羥基的單體與含羧基的單體使用。Furthermore, different types of functional group-containing monomers (A2) may be used in combination. For example, the above-mentioned hydroxyl group-containing monomer and carboxyl group-containing monomer may be used in combination.

在(甲基)丙烯酸酯聚合物(AP)中的來自含官能基的單體(A2)的構造部分的質量的比例,以5質量%以上為佳,特別是以7質量%以上為佳,進一步以10質量%以上為佳。此外,該比例以35質量%以下為佳,特別是以30質量%以下為佳,進一步以17質量%以下為佳。藉由來自含官能基的單體(A2)的構造部分的質量的比例為上述範圍,可使對於在側鏈導入有能量射線硬化性基的丙烯酸系聚合物(A)的含活性能量射線硬化性基的化合物(A3)的導入量在適合的範圍中。此外,當使用交聯劑(B),使含官能基的單體(A2)與交聯劑(B)反應時,藉由該交聯劑(B)可以使交聯的程度,亦即凝膠分率在適合的範圍中,而變得可控制黏著劑層3的凝集力等的物性。再者,當該比例為17質量%以下時,成為殘膠抑制效果變得更佳者。The mass ratio of the structural part derived from the functional group-containing monomer (A2) in the (meth)acrylate polymer (AP) is preferably 5 mass % or more, particularly 7 mass % or more, Furthermore, it is preferably 10% by mass or more. In addition, the ratio is preferably 35 mass% or less, particularly 30 mass% or less, and further preferably 17 mass% or less. When the mass ratio of the structural part derived from the functional group-containing monomer (A2) is within the above range, the active energy ray-containing acrylic polymer (A) having an energy ray curable group introduced into the side chain can be cured. The introduction amount of the compound (A3) having a sexual group is within a suitable range. In addition, when the cross-linking agent (B) is used to react the functional group-containing monomer (A2) with the cross-linking agent (B), the degree of cross-linking, that is, the coagulation can be controlled by the cross-linking agent (B). When the gel fraction is in an appropriate range, physical properties such as the cohesive force of the adhesive layer 3 can be controlled. Furthermore, when the ratio is 17% by mass or less, the residual glue suppressing effect becomes better.

(甲基)丙烯酸酯共聚物(AP)可以是連同上述(甲基)丙烯酸烷基酯(A1)以及含官能基的單體(A2),與其他單體進行共聚合者。The (meth)acrylate copolymer (AP) may be copolymerized with other monomers together with the alkyl (meth)acrylate (A1) and the functional group-containing monomer (A2).

作為上述其他單體,可列舉,例如,(甲基)丙烯酸甲氧基甲酯、(甲基)丙烯酸甲氧基乙酯、(甲基)丙烯酸乙氧基甲酯、(甲基)丙烯酸乙氧基乙酯等的含烷氧基烷基的(甲基)丙烯酸酯;(甲基)丙烯酸環己酯等的具有脂肪族環的(甲基)丙烯酸酯;(甲基)丙烯酸苯酯等的具有芳香族環的(甲基)丙烯酸酯;N-(甲基)丙烯醯基嗎福啉、N-乙烯基-2-吡咯烷酮、N-(甲基)丙烯醯基吡咯烷酮等的具有含氮的雜環的單體;(甲基)丙烯醯胺、N,N-二甲基(甲基)丙烯醯胺等的非交聯性的丙烯醯胺;(甲基)丙烯酸N,N-二甲基胺基乙基酯、(甲基)丙烯酸N,N-二甲基胺基丙基酯等的具有非交聯性的3級胺基的(甲基)丙烯酸酯;醋酸乙烯酯;苯乙烯等。上述當中,以具有含氮的雜環的單體、非交聯性的丙烯醯胺或醋酸乙烯酯為佳,特別是以N-(甲基)丙烯醯基嗎福啉、二甲基(甲基)丙烯醯胺或醋酸乙烯酯為佳,進一步以N-丙烯醯基嗎福啉或二甲基丙烯醯胺為佳。藉由使相關的單體進行共聚合,成為所得的黏著劑層3的對基材2的密附性變得更佳者。此等單體可單獨使用,亦可組合2種以上使用。Examples of the other monomers include methoxymethyl (meth)acrylate, methoxyethyl (meth)acrylate, ethoxymethyl (meth)acrylate, and ethyl (meth)acrylate. Alkoxyalkyl group-containing (meth)acrylates such as oxyethyl ester; aliphatic ring-containing (meth)acrylates such as cyclohexyl (meth)acrylate; phenyl (meth)acrylate, etc. (Meth)acrylates with aromatic rings; N-(meth)acrylylmorpholine, N-vinyl-2-pyrrolidone, N-(meth)acrylylpyrrolidone, etc. with nitrogen-containing Heterocyclic monomers; non-crosslinking acrylamide such as (meth)acrylamide, N,N-dimethyl(meth)acrylamide; (meth)acrylic acid N,N-di (meth)acrylates with non-crosslinking tertiary amine groups such as methylaminoethyl ester and N,N-dimethylaminopropyl (meth)acrylate; vinyl acetate; benzene Ethylene etc. Among the above, monomers having a nitrogen-containing heterocyclic ring, non-crosslinking acrylamide or vinyl acetate are preferred, especially N-(meth)acrylmorpholine, dimethyl (meth) Acrylic acid acrylamide or vinyl acetate is preferred, and N-acrylamide or dimethylacrylamide is further preferred. By copolymerizing the relevant monomers, the resulting adhesive layer 3 has better adhesion to the base material 2 . These monomers can be used alone or in combination of two or more types.

在(甲基)丙烯酸酯共聚物(AP)中的來自上述其他單體的構造部分的質量的比例,以1質量%以上為佳,特別是以3質量%以上為佳,進一步以5質量%以上為佳。此外,該比例以20質量%以下為佳,特別是以18質量%以下為佳,進一步以15質量%以下為佳。如此一來,成為所得的黏著劑層3的對基材2的密附性變得更佳者。The mass ratio of the structural part derived from the other monomers in the (meth)acrylate copolymer (AP) is preferably 1 mass % or more, particularly 3 mass % or more, and further 5 mass %. The above is better. In addition, the ratio is preferably 20 mass% or less, particularly 18 mass% or less, and further preferably 15 mass% or less. As a result, the adhesive layer 3 obtained has better adhesion to the base material 2 .

(甲基)丙烯酸酯共聚物(AP)的聚合態樣,可以是隨機共聚物,也可以是嵌段共聚物。此外,關於聚合法並無特別限定,可藉由一般的聚合法,例如,藉由溶液聚合法進行聚合。The polymerization state of the (meth)acrylate copolymer (AP) can be a random copolymer or a block copolymer. In addition, the polymerization method is not particularly limited, and polymerization can be performed by a general polymerization method, for example, a solution polymerization method.

另一方面,含活性能量射線硬化性基的化合物(A3)為含有可與含官能基的單體(A2)的官能基進行反應的官能基,以及藉由活性能量射線的照射而斷裂的含有碳-碳雙鍵的活性能量射線硬化性基者。On the other hand, the active energy ray-curable group-containing compound (A3) contains a functional group that can react with the functional group of the functional group-containing monomer (A2), and a compound that is cleaved by irradiation with active energy rays. Active energy ray hardening base of carbon-carbon double bonds.

作為可與含官能基的單體(A2)的官能基進行反應的官能基,可列舉,例如,異氰酸酯基、環氧基等,當中,以與羥基的反應性高的異氰酸酯基為佳。Examples of the functional group that can react with the functional group of the functional group-containing monomer (A2) include an isocyanate group, an epoxy group, and the like. Among them, an isocyanate group having high reactivity with a hydroxyl group is preferred.

作為含有碳-碳雙鍵的活性能量射線硬化性基,以(甲基)丙烯醯基等為佳。且,藉由活性能量射線的照射而斷裂的碳-碳雙鍵,以含活性能量射線硬化性基的化合物(A3)1分子中存在1~5個存在為佳,特別是以存在1~3個為佳。As the active energy ray curable group containing a carbon-carbon double bond, a (meth)acrylyl group or the like is preferred. Furthermore, it is preferable that there are 1 to 5 carbon-carbon double bonds broken by irradiation of active energy rays in 1 molecule of the active energy ray curable group-containing compound (A3), especially 1 to 3 One is better.

作為含活性能量射線硬化性基的化合物(A3)的例子,可列舉,2-甲基丙烯醯基氧基乙基異氰酸酯、間-異丙烯基-α,α-二甲基苄基異氰酸酯、甲基丙烯醯基異氰酸酯、烯丙基異氰酸酯、1,1-(雙丙烯醯基氧基甲基)乙基異氰酸酯;藉由二異氰酸酯化合物或聚異氰酸酯化合物與(甲基)丙烯酸羥乙酯反應所獲得的丙烯醯基單異氰酸酯化合物;藉由二異氰酸酯化合物或聚異氰酸酯化合物與聚醇化合物與(甲基)丙烯酸羥乙酯反應所獲得的丙烯醯基單異氰酸酯化合物等。此等當中,特別是以2-甲基丙烯醯基氧基乙基異氰酸酯為佳。且,含活性能量射線硬化性基的化合物(A3)可單獨使用,亦可組合2種以上使用。Examples of the active energy ray curable group-containing compound (A3) include 2-methacryloyloxyethyl isocyanate, m-isopropenyl-α,α-dimethylbenzyl isocyanate, and methacryloxyethyl isocyanate. Acrylyl isocyanate, allyl isocyanate, 1,1-(bisacryloxymethyl)ethyl isocyanate; obtained by reacting diisocyanate compounds or polyisocyanate compounds with hydroxyethyl (meth)acrylate Acrylyl monoisocyanate compounds; acrylyl monoisocyanate compounds obtained by reacting diisocyanate compounds or polyisocyanate compounds with polyol compounds and hydroxyethyl (meth)acrylate, etc. Among these, 2-methacryloxyethyl isocyanate is particularly preferred. In addition, the active energy ray curable group-containing compound (A3) may be used alone or in combination of two or more types.

調製丙烯酸系聚合物(A),可藉由(甲基)丙烯酸酯共聚物(AP)的調製,以及(甲基)丙烯酸酯共聚物(AP)與含活性能量射線硬化性基的化合物(A3)的反應,依照一般方法而進行。在此反應步驟中,(甲基)丙烯酸酯共聚物(AP)中的來自含官能基的單體(A2)的反應性的官能基與含活性能量射線硬化性基的化合物(A3)中的官能基反應。如此一來,可獲得在側鏈導入有能量射線硬化性基的丙烯酸系聚合物(A)。且,(甲基)丙烯酸酯共聚物(AP)與含活性能量射線硬化性基的化合物(A3)的反應,以在有機金屬觸媒等的觸媒的存在下進行為佳。The acrylic polymer (A) can be prepared by preparing a (meth)acrylate copolymer (AP), and the (meth)acrylate copolymer (AP) and the compound (A3) containing an active energy ray curable group. ) reaction is carried out according to general methods. In this reaction step, the reactive functional group derived from the functional group-containing monomer (A2) in the (meth)acrylate copolymer (AP) and the active energy ray curable group-containing compound (A3) Functional group reaction. In this way, an acrylic polymer (A) in which an energy-beam curable group is introduced into the side chain can be obtained. Furthermore, the reaction between the (meth)acrylate copolymer (AP) and the active energy ray curable group-containing compound (A3) is preferably carried out in the presence of a catalyst such as an organic metal catalyst.

在丙烯酸系聚合物(A)中,相對於含官能基的單體(A2)的反應性的官能基的量,含活性能量射線硬化性基的化合物(A3)的量,以60莫耳%以上為佳,特別是以70莫耳%以上為佳。此外,該含活性能量射線硬化性基的化合物(A3)的量,以99莫耳%以下為佳,特別是以95%以下為佳,進一步以90莫耳%以下為佳。In the acrylic polymer (A), the amount of the active energy ray-curable group-containing compound (A3) relative to the amount of the reactive functional group of the functional group-containing monomer (A2) is 60 mol %. The above is preferred, especially above 70 mol%. In addition, the amount of the active energy ray curable group-containing compound (A3) is preferably 99 mol% or less, particularly 95% or less, and further preferably 90 mol% or less.

在丙烯酸系聚合物(A)全體中,來自含官能基的單體(A2)的構造部分的比例,以0.1質量%以上為佳,特別是以0.5質量%以上為佳,進一步以1質量%以上為佳。此外,該比例以12質量%以下為佳,特別是以10質量%以下為佳,進一步以8質量%以下為佳。如此一來,所獲得的黏著劑層3的對基材2(塗佈層21)的密附性變得更佳者。In the entire acrylic polymer (A), the proportion of the structural part derived from the functional group-containing monomer (A2) is preferably 0.1 mass % or more, particularly 0.5 mass % or more, and further 1 mass %. The above is better. In addition, the ratio is preferably 12 mass% or less, particularly 10 mass% or less, and further preferably 8 mass% or less. In this way, the adhesive layer 3 obtained has better adhesion to the base material 2 (coating layer 21).

丙烯酸系聚合物(A)的重量平均分子量(Mw),以1萬以上為佳。此外,該重量平均分子量(Mw)以150萬以下為佳。藉由丙烯酸系聚合物(A)的重量平均分子量(Mw)在上述範圍中,由於確保黏著性組合物P的塗佈性,同時黏著劑層3的凝集性變得良好,可獲得適於切割等的物性。The weight average molecular weight (Mw) of the acrylic polymer (A) is preferably 10,000 or more. In addition, the weight average molecular weight (Mw) is preferably 1.5 million or less. When the weight average molecular weight (Mw) of the acrylic polymer (A) is within the above range, the coating properties of the adhesive composition P are ensured and the cohesiveness of the adhesive layer 3 becomes good, so that it is possible to obtain a material suitable for cutting. etc. physical properties.

且,在側鏈導入有能量射線硬化性基的丙烯酸系聚合物(A)的玻璃轉換溫度(Tg)如上述。Furthermore, the glass transition temperature (Tg) of the acrylic polymer (A) in which an energy-beam curable group is introduced into the side chain is as described above.

(2-1-2)交聯劑(B) 黏著性組合物P以含有可使在側鏈導入有能量射線硬化性基的丙烯酸系聚合物(A)進行交聯的交聯劑(B)為佳。此時,在本實施形態中的黏著劑層3含有藉由使該丙烯酸系聚合物(A)與交聯劑(B)的交聯反應所獲得的交聯產物。藉由使用相關的交聯劑(B),變得易於調整形成黏著劑層3的黏著劑的凝膠分率於適合的範圍中,可獲得適於切割等的物性。(2-1-2) Cross-linking agent (B) The adhesive composition P preferably contains a cross-linking agent (B) capable of cross-linking the acrylic polymer (A) in which an energy-beam curable group is introduced into the side chain. At this time, the adhesive layer 3 in this embodiment contains a cross-linked product obtained by cross-linking reaction between the acrylic polymer (A) and the cross-linking agent (B). By using the relevant cross-linking agent (B), it becomes easy to adjust the gel fraction of the adhesive forming the adhesive layer 3 to a suitable range, and physical properties suitable for cutting and the like can be obtained.

作為交聯劑(B)的種類,可列舉,例如,環氧系化合物、聚異氰酸酯系化合物、金屬螫合物系化合物、氮丙啶(aziridine)系化合物等的聚亞胺系化合物、三聚氰胺樹脂、尿素樹脂、二醛類、羥甲基聚合物、烷氧基金屬(metal alkoxide)、金屬鹽等。此等當中,根據容易控制交聯反應等的理由,以使用環氧系化合物或聚異氰酸酯系化合物為佳,特別是以使用聚異氰酸酯系化合物為佳。Examples of types of the crosslinking agent (B) include polyimine compounds such as epoxy compounds, polyisocyanate compounds, metal chelate compounds, aziridine compounds, and melamine resins. , urea resin, dialdehydes, hydroxymethyl polymer, metal alkoxide (metal alkoxide), metal salt, etc. Among these, it is preferable to use an epoxy compound or a polyisocyanate compound for reasons such as easy control of the cross-linking reaction, and particularly it is preferable to use a polyisocyanate compound.

作為環氧系化合物,可列舉,例如,1,3-雙(N,N’-二環氧丙基胺基甲基)環己烷、N,N,N’,N’-四環氧丙基-間-苯二甲二胺、乙二醇二環氧丙基醚、1,6-己二醇二環氧丙基醚、三羥甲基丙烷二環氧丙基醚、二環氧丙基苯胺、二環氧丙基胺等。Examples of the epoxy compound include 1,3-bis(N,N'-diepoxypropylaminomethyl)cyclohexane, N,N,N',N'-tetraepoxypropane Base-m-phenylenediamine, ethylene glycol diepoxypropyl ether, 1,6-hexanediol diepoxypropyl ether, trimethylolpropane diepoxypropyl ether, diepoxypropyl ether aniline, diepoxypropylamine, etc.

聚異氰酸酯系化合物為每1分子具有2個以上異氰酸酯基的化合物。具體而言,可列舉,甲伸苯基二異氰酸酯、二苯基甲烷二異氰酸酯、伸二甲苯二異氰酸酯(xylylene diisocyanate)等的芳香族聚異氰酸酯;六亞甲基二異氰酸酯等的脂肪族聚異氰酸酯;異佛爾酮二異氰酸酯、氫化二苯基甲烷二異氰酸酯等的脂環式聚異氰酸酯等。進一步可列舉,其等的雙縮脲、異氰脲酸酯、加合物等。作為加合物,可列舉,與乙二醇、丙二醇、新戊二醇、三羥甲基丙烷、蓖麻油等的含低分子活性氫的化合物的反應產物。The polyisocyanate-based compound is a compound having two or more isocyanate groups per molecule. Specific examples include aromatic polyisocyanates such as tolylene diisocyanate, diphenylmethane diisocyanate, and xylylene diisocyanate; aliphatic polyisocyanates such as hexamethylene diisocyanate; and isocyanate. Alicyclic polyisocyanates such as phorone diisocyanate and hydrogenated diphenylmethane diisocyanate. Further examples include biurets, isocyanurates, and adducts thereof. Examples of the adduct include reaction products with low-molecular active hydrogen-containing compounds such as ethylene glycol, propylene glycol, neopentyl glycol, trimethylolpropane, and castor oil.

交聯劑(B)可單獨使用1種,亦可組合2種以上使用。The cross-linking agent (B) may be used individually by 1 type, or in combination of 2 or more types.

在黏著性組合物P中的交聯劑(B)的含量,相對於在側鏈導入有能量射線硬化性基的丙烯酸系聚合物(A)100質量份,以0.01~15質量份為佳,特別是以0.05~10質量份為佳,進一步以0.1~2質量份為佳。The content of the cross-linking agent (B) in the adhesive composition P is preferably 0.01 to 15 parts by mass relative to 100 parts by mass of the acrylic polymer (A) having an energy-ray curable group introduced into the side chain. In particular, it is preferably 0.05 to 10 parts by mass, and further preferably 0.1 to 2 parts by mass.

(2-1-3)光聚合起始劑(C) 當使用紫外線,作為使活性能量射線硬化性的黏著劑硬化時所使用的活性能量射線時,黏著性組合物P以進一步含有光聚合起始劑(C)為佳。藉由含有此類光聚合起始劑(C),可有效率地使在側鏈導入有能量射線硬化性基的丙烯酸系聚合物(A)聚合-硬化,此外,可以使聚合硬化時間以及活性能量射線的照射量減少。(2-1-3) Photopolymerization initiator (C) When ultraviolet rays are used as active energy rays used to harden an active energy ray-curable adhesive, the adhesive composition P preferably further contains a photopolymerization initiator (C). By containing such a photopolymerization initiator (C), the acrylic polymer (A) having an energy ray curable group introduced into the side chain can be polymerized and cured efficiently, and the polymerization curing time and activity can be improved. The amount of energy ray exposure is reduced.

作為光聚合起始劑(C),可列舉,例如,二苯甲酮、苯乙酮、苯偶姻、苯偶姻甲醚、苯偶姻乙醚、苯偶姻異丙醚、苯偶姻異丁醚、苯偶姻安息香酸、苯偶姻安息香酸甲酯、苯偶姻二甲基縮酮、2,4-二乙基噻吨酮(2,4-diethyl thioxanthone)、1-羥基環己基苯基酮、苄基二苯基硫醚(benzyl diphenyl sulfide)、一硫化四甲基秋蘭姆(tetramethylthiuram monosulfide)、偶氮雙異丁腈、苄、聯苄、聯乙醯、β-氯蒽醌、(2,4,6-三甲基苄基二苯基)膦氧化物、2-苯并噻唑-N,N-二甲基二硫胺基甲酸酯、寡{2-羥基-2-甲基-1-[4-(1-丙烯基)苯基]丙酮}、2,2-二甲氧基-1,2-二苯基乙烷-1-酮、2-羥基-1-{4-[4-(2-羥基-2-甲基-丙醯基)-苄基]苯基}-2-甲基-丙烷-1-酮等。此等可單獨使用,亦可組合2種以上使用。Examples of the photopolymerization initiator (C) include benzophenone, acetophenone, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzoin isopropyl ether. Butyl ether, benzoin benzoic acid, benzoin benzoate methyl ester, benzoin dimethyl ketal, 2,4-diethyl thioxanthone, 1-hydroxycyclohexyl Phenyl ketone, benzyl diphenyl sulfide, tetramethylthiuram monosulfide, azobisisobutyronitrile, benzyl, bibenzyl, diacetyl, β-chloroanthracene Quinone, (2,4,6-trimethylbenzyldiphenyl)phosphine oxide, 2-benzothiazole-N,N-dimethyldithiocarbamate, oligo{2-hydroxy-2 -Methyl-1-[4-(1-propenyl)phenyl]acetone}, 2,2-dimethoxy-1,2-diphenylethan-1-one, 2-hydroxy-1- {4-[4-(2-hydroxy-2-methyl-propanyl)-benzyl]phenyl}-2-methyl-propan-1-one, etc. These can be used individually or in combination of 2 or more types.

在黏著性組合物P中的光聚合起始劑(C)的含量,相對於在側鏈導入有能量射線硬化性基的丙烯酸系聚合物(A)100質量份,以0.1~10質量份為佳,特別是以0.5~8質量份為佳。The content of the photopolymerization initiator (C) in the adhesive composition P is 0.1 to 10 parts by mass relative to 100 parts by mass of the acrylic polymer (A) in which an energy ray curable group is introduced into the side chain. It is better, especially 0.5~8 parts by mass.

(2-1-4)其他的成分 在本實施形態中的黏著性組合物P,只要無損本實施形態相關的工件加工用黏著片1相關的上述效果,可添加期望的添加劑,例如,抗靜電劑、賦黏劑、抗氧化劑、光安定劑、軟化劑、填充劑等。且,下述稀釋溶劑為不包含在構成黏著性組合物P的添加劑中。(2-1-4)Other ingredients In the adhesive composition P in this embodiment, as long as the above-mentioned effects related to the adhesive sheet 1 for workpiece processing related to this embodiment are not impaired, desired additives may be added, such as antistatic agents, tackifiers, antioxidants, optical Stabilizers, softeners, fillers, etc. In addition, the following dilution solvent is not included in the additives constituting the adhesive composition P.

(2-2)黏著性組合物的調製 在本實施形態中的黏著性組合物P,可藉由製造丙烯酸系聚合物(A),於所得的丙烯酸系聚合物(A)中,依照需要,與交聯劑(B)、光聚合起始劑(C)及添加劑進行混合而製造。此時,亦可根據需要添加稀釋溶劑,獲得黏著性組合物P的塗佈液。(2-2) Preparation of adhesive composition The adhesive composition P in this embodiment can be produced by producing an acrylic polymer (A), and the obtained acrylic polymer (A) can be photopolymerized with a cross-linking agent (B) as necessary. The starting agent (C) and additives are mixed and manufactured. At this time, a diluting solvent may be added as necessary to obtain a coating liquid of the adhesive composition P.

作為上述稀釋溶劑,可使用例如,己烷、丁烷、環己烷等的脂肪族烴、甲苯、二甲苯等的芳香族烴、二氯甲烷、二氯乙烷等的鹵化烴、甲醇、乙醇、丙醇、丁醇、1-甲氧基-2-丙醇等的醇、丙酮、丁酮、2-戊酮、異佛爾酮、環己酮等的酮、醋酸乙酯、醋酸丁酯等的酯、乙基賽珞蘇等的賽珞蘇系溶劑等。As the dilution solvent, for example, aliphatic hydrocarbons such as hexane, butane, and cyclohexane, aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as dichloromethane and dichloroethane, methanol, and ethanol can be used. , alcohols such as propanol, butanol, 1-methoxy-2-propanol, ketones such as acetone, butanone, 2-pentanone, isophorone, cyclohexanone, ethyl acetate, butyl acetate Esters such as ethyl cellulose, cellulose-based solvents such as ethyl cellulose, etc.

作為此法所調製的塗佈液的濃度-黏度,只要是可塗佈的範圍即可,並無特別限制,可對應情況適當選擇。例如,以黏著性組合物P的濃度成為10質量%以上,60質量%以下的方式進行稀釋。且,在獲得塗佈液時,稀釋溶劑等的添加並非必要條件,只要是黏著性組合物P為可塗佈的黏度等即可,也可以不添加稀釋溶劑。此時,黏著性組合物P將丙烯酸系聚合物(A)的聚合溶媒直接當作稀釋溶劑而成為塗佈液。The concentration and viscosity of the coating liquid prepared by this method are not particularly limited as long as it is within the coating range, and can be appropriately selected according to the situation. For example, the concentration of the adhesive composition P is diluted so that it becomes 10 mass % or more and 60 mass % or less. In addition, when obtaining the coating liquid, the addition of a diluting solvent or the like is not a necessary condition, as long as the adhesive composition P has a coatable viscosity, etc., and the diluting solvent does not need to be added. At this time, the adhesive composition P uses the polymerization solvent of the acrylic polymer (A) directly as a dilution solvent to become a coating liquid.

(2-3)黏著劑層的厚度 在本實施形態中的黏著劑層3的厚度,以10μm以上為佳,特別是以15μm以上為佳,進一步以20μm以上為佳。如此一來,工件加工用黏著片1變得易於發揮良好的黏著力,例如,變得可有效地抑制在切割時晶片飛散等。此外,黏著劑層3的厚度以100μm以下為佳,特別是以50μm以下為佳。如此一來,在活性能量射線的照射後,對於加工後的工件的黏著力適度地降低,變得易於從工件加工用黏著片1將工件分離。(2-3) Thickness of adhesive layer The thickness of the adhesive layer 3 in this embodiment is preferably 10 μm or more, particularly 15 μm or more, and further preferably 20 μm or more. In this way, the adhesive sheet 1 for workpiece processing becomes easy to exhibit good adhesive force, and for example, it becomes possible to effectively suppress the scattering of the wafer during cutting. In addition, the thickness of the adhesive layer 3 is preferably 100 μm or less, particularly preferably 50 μm or less. In this way, after the irradiation of active energy rays, the adhesive force to the processed workpiece is moderately reduced, making it easier to separate the workpiece from the workpiece processing adhesive sheet 1 .

(3)剝離片材 本實施形態相關的工件加工用黏著片1,在黏著劑層3上積層有剝離片材4。此剝離片材4可以是用來形成黏著劑層3的製程材料,也可以是在工件加工用黏著片1貼附至工件為止的期間,保護黏著劑層3的黏著面者。此外,在本實施形態相關的工件加工用黏著片1中,也可以省略剝離片材4。(3) Peel off the sheet The adhesive sheet 1 for workpiece processing according to this embodiment has a release sheet 4 laminated on an adhesive layer 3 . The peeling sheet 4 may be a process material used to form the adhesive layer 3 , or may be used to protect the adhesive surface of the adhesive layer 3 until the workpiece processing adhesive sheet 1 is attached to the workpiece. In addition, in the adhesive sheet 1 for workpiece processing according to this embodiment, the release sheet 4 may be omitted.

剝離片材4的構成為任意,以塑膠膜藉由剝離劑等而完成剝離處理者為例。作為塑膠膜的具體例,可列舉,聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯等的聚酯膜,以及聚丙烯、聚乙烯等的聚烯烴膜。作為剝離劑,可使用矽酮系、氟系、長鏈烷基系的剝離劑等,此等當中,以價廉並可獲得安定的性能的矽酮系剝離劑為佳。關於剝離片材4的厚度並無特別限制,但通常為20μm以上,250μm以下。The structure of the peeling sheet 4 is arbitrary, and a plastic film that has been peeled off by a peeling agent or the like is used as an example. Specific examples of the plastic film include polyester films such as polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate, and polyester films such as polypropylene and polyethylene. Olefin membrane. As the release agent, silicone-based, fluorine-based, long-chain alkyl-based release agents, etc. can be used. Among these, silicone-based release agents that are inexpensive and can obtain stable performance are preferred. The thickness of the release sheet 4 is not particularly limited, but is usually 20 μm or more and 250 μm or less.

(4)其他的構件 本實施形態相關的工件加工用黏著片1,亦可在黏著劑層3中的黏著面上積層接著劑層。此時,本實施形態相關的工件加工用黏著片1,因為如上述具備接著劑層,可作為切割-固晶片材使用。此類切割-固晶片材,藉由在接著劑層中的與黏著劑層3相反側的面上貼附工件,連同該工件切割接著劑層,可獲得積層有經單片化的接著劑層的晶片。該晶片透過此經單片化的接著劑層,該晶片變得易於固定在被搭載的對象上。作為構成上述接著劑層的材料,以使用含有熱可塑性樹脂與低分子量的熱硬化性接著成分者,或含有B階段(半硬化狀)的熱硬化型接著成分者為佳。(4)Other components The adhesive sheet 1 for workpiece processing according to this embodiment may have an adhesive layer laminated on the adhesive surface of the adhesive layer 3 . At this time, since the adhesive sheet 1 for workpiece processing according to this embodiment is provided with the adhesive layer as described above, it can be used as a dicing and die-bonding sheet. This type of cutting and die-bonding sheet can be obtained by attaching a workpiece to the surface of the adhesive layer on the opposite side to the adhesive layer 3 and cutting the adhesive layer with the workpiece, thereby obtaining a laminated, individualized adhesive layer. of wafers. The chip can be easily fixed on the object being mounted through the single-piece adhesive layer. As a material constituting the adhesive layer, it is preferable to use one containing a thermoplastic resin and a low molecular weight thermosetting adhesive component, or one containing a B-stage (semi-cured) thermosetting adhesive component.

此外,本實施形態相關的工件加工用黏著片1,亦可在黏著劑層3中的黏著面上積層保護膜形成層。此時,本實施形態相關的工件加工用黏著片1可以作為保護膜形成兼工件加工用片材使用。此類片材,例如,藉由在保護膜形成層中的與黏著劑層3相反側的面上貼附工件,連同該工件切割保護膜形成層,可獲得積層有經單片化的保護膜形成層的晶片。作為該工件,以使用在單面上形成有迴路者為佳,此時,通常,在與形成有該迴路的面相反側的面上積層有保護膜形成層。經單片化的保護膜形成層,藉由在特定的時間點使其硬化,可將具有充分耐久性的保護膜形成在晶片上。保護膜形成層以由未硬化的硬化性接著劑所構成為佳。In addition, the adhesive sheet 1 for workpiece processing according to this embodiment may have a protective film-forming layer laminated on the adhesive surface of the adhesive layer 3 . In this case, the adhesive sheet 1 for workpiece processing according to this embodiment can be used as a protective film forming and workpiece processing sheet. For example, by attaching a workpiece to the surface of the protective film-forming layer opposite to the adhesive layer 3 and cutting the protective film-forming layer with the workpiece, a protective film laminated into individual sheets can be obtained. Forming layers of wafers. As the workpiece, it is preferable to use one with a circuit formed on one side. In this case, a protective film-forming layer is usually laminated on the surface opposite to the surface on which the circuit is formed. By hardening the monolithized protective film forming layer at a specific time point, a protective film with sufficient durability can be formed on the wafer. The protective film forming layer is preferably composed of an uncured curable adhesive.

2・工件加工用黏著片的物性 本實施形態相關的工件加工用黏著片1,將工件加工用黏著片1中的黏著劑層3側的面固定在支撐體上,對黏著劑層3照射活性能量射線,使黏著劑層3硬化後,作為從黏著劑層3將基材2以剝離角度180°,剝離速度300mm/min進行剝離時的剝離力所測定的基材2與黏著劑層3間的層間強度,以1000mN/25mm以上為佳,特別是以3000mN/25mm以上為佳,進一步以5000mN/25mm以上為佳。藉由該層間強度如上述,可有效地抑制與工件分離時的殘膠。本實施形態相關的工件加工用黏著片1,藉由具有上述構成以及物性,可達成上述的層間強度。且,上述層間強度的上限值並無特別限定,但通常以50000mN/25mm以下為佳。此外,上述層間強度的測定方法的詳細情形如下述試驗例中所記載。2・Physical properties of adhesive sheets for workpiece processing In the adhesive sheet 1 for workpiece processing according to this embodiment, the surface on the adhesive layer 3 side of the adhesive sheet 1 for workpiece processing is fixed to a support, and the adhesive layer 3 is irradiated with active energy rays to harden the adhesive layer 3 Then, the interlayer strength between the base material 2 and the adhesive layer 3 was measured as the peeling force when the base material 2 was peeled off from the adhesive layer 3 at a peeling angle of 180° and a peeling speed of 300mm/min. Preferably, it is preferably at least 3000mN/25mm, and further preferably at least 5000mN/25mm. By having this interlayer strength as mentioned above, residual glue when separated from the workpiece can be effectively suppressed. The adhesive sheet 1 for workpiece processing according to this embodiment can achieve the above-mentioned interlayer strength by having the above-mentioned structure and physical properties. Furthermore, the upper limit of the interlaminar strength is not particularly limited, but is generally preferably 50,000 mN/25 mm or less. In addition, the details of the method for measuring the interlaminar strength are described in the following test examples.

3. 工件加工用黏著片的製造方法 本實施形態相關的工件加工用黏著片1的製造方法並無特別限定。較佳的製造方法,具備:在基材本體21的單面,形成含有吡咯烷酮系化合物的塗佈層22,獲得基材2的步驟;將黏著性組合物P(的塗佈液)塗佈在剝離片材4的剝離面上,形成黏著劑層3的步驟;以及將上述基材2的塗佈層22側的面與黏著劑層3貼合的步驟。3. Manufacturing method of adhesive sheet for workpiece processing The manufacturing method of the adhesive sheet 1 for workpiece processing according to this embodiment is not particularly limited. A preferred manufacturing method includes the following steps: forming a coating layer 22 containing a pyrrolidone compound on one side of the base material body 21 to obtain the base material 2; applying the adhesive composition P (the coating liquid) on the base material 2. The step of forming the adhesive layer 3 on the peeling surface of the release sheet 4; and the step of bonding the surface of the base material 2 on the coating layer 22 side to the adhesive layer 3.

對於基材本體21的單面的塗佈層22的形成,可藉由習知方法進行。例如,將用以形成塗佈層22的塗佈劑,藉由桿塗佈法、刀式塗佈法、輥塗佈法、翼片塗佈法、模具塗佈法、凹版塗佈法等塗佈在基材本體21的單面而形成塗膜,藉由使該塗膜乾燥,可形成塗佈層22。The coating layer 22 on one side of the substrate body 21 can be formed by a conventional method. For example, the coating agent used to form the coating layer 22 is applied by a rod coating method, a knife coating method, a roller coating method, a fin coating method, a die coating method, a gravure coating method, or the like. A coating film is formed on one side of the base body 21 and the coating film is dried to form the coating layer 22 .

此外,對剝離片材4的剝離面的黏著劑層3的形成,可藉由習知方法進行。例如,將黏著性組合物P的塗佈液,藉由桿塗佈法、刀式塗佈法、輥塗佈法、翼片塗佈法、模具塗佈法、凹版塗佈法等塗佈在剝離片材4的剝離面而形成塗膜,藉由使該塗膜乾燥,可形成黏著劑層3。In addition, the adhesive layer 3 on the peeling surface of the peeling sheet 4 can be formed by a conventional method. For example, the coating liquid of the adhesive composition P is applied to the surface by a rod coating method, a knife coating method, a roller coating method, a fin coating method, a die coating method, a gravure coating method, or the like. The peeling surface of the sheet 4 is peeled off to form a coating film, and the adhesive layer 3 can be formed by drying the coating film.

黏著性組合物P含有交聯劑(B)時,以藉由變更上述的乾燥條件(溫度、時間等),或藉由額外設置加熱處理,使塗膜內的丙烯酸系聚合物(A)與交聯劑(B)的交聯反應進行,在黏著劑層3內以期望的存在密度形成交聯構造為佳。When the adhesive composition P contains the cross-linking agent (B), the acrylic polymer (A) in the coating film can be combined with the acrylic polymer (A) by changing the above-mentioned drying conditions (temperature, time, etc.) or by additionally providing heat treatment. It is preferable that the cross-linking reaction of the cross-linking agent (B) proceeds and a cross-linked structure is formed at a desired density in the adhesive layer 3 .

將基材2的塗佈層22側的面與黏著劑層3貼合後,為了使上述交聯反應充分進行,也可以進行例如在23℃,相對溼度50%的環境中靜置數日的所謂熟成(aging)。After the surface of the base material 2 on the coating layer 22 side is bonded to the adhesive layer 3, in order to allow the above-mentioned cross-linking reaction to fully proceed, for example, it can be left to stand for several days in an environment of 23° C. and a relative humidity of 50%. The so-called aging.

如上述,將形成在剝離片材4上的黏著劑層3轉錄於基材2上的方法,以使生產效率高為佳。一般而言,藉由此類轉錄的方法,基材與黏著劑層的密附性有變低的傾向。然而,本實施形態相關的工件加工用黏著片1,藉由具有上述構成以及物性,即使藉由相關方法而製造,基材2與黏著劑層3的密附性仍高,因此,可有效地抑制在與工件的分離時對工件的殘膠。As described above, the method of transferring the adhesive layer 3 formed on the release sheet 4 to the base material 2 is preferred to achieve high production efficiency. Generally speaking, by such a transcription method, the adhesion between the base material and the adhesive layer tends to decrease. However, since the adhesive sheet 1 for workpiece processing according to this embodiment has the above-described structure and physical properties, even if it is manufactured by a related method, the adhesion between the base material 2 and the adhesive layer 3 is still high, so it can effectively Suppresses adhesive residue on the workpiece when separated from the workpiece.

且,儘管會降低生產效率,亦可不照上述方式將形成在剝離片材4上的黏著劑層3轉錄於基材2,而是對基材2的塗佈層22直接形成黏著劑層3。此時,在黏著劑層3可以積層剝離片材4,也可以不積層。Moreover, although the production efficiency will be reduced, the adhesive layer 3 formed on the release sheet 4 may not be transferred to the base material 2 in the above manner, but the adhesive layer 3 may be directly formed on the coating layer 22 of the base material 2 . At this time, the release sheet 4 may or may not be laminated on the adhesive layer 3 .

4. 工件加工用黏著片的使用方法 本實施形態相關的工件加工用黏著片1,可以用來加工工件而使用。亦即,可以將本實施形態相關的工件加工用黏著片1的黏著面貼附在工件後,在工件加工用黏著片1上,進行該工件加工。4. How to use adhesive sheets for workpiece processing The adhesive sheet 1 for workpiece processing according to this embodiment can be used for processing workpieces. That is, after the adhesive surface of the workpiece processing adhesive sheet 1 according to this embodiment is attached to the workpiece, the workpiece processing can be performed on the workpiece processing adhesive sheet 1 .

使用本實施形態相關的工件加工用黏著片1而施行加工的工件,並無特別限定。作為該工件的例子,可列舉,半導體晶圓、半導體封裝等的半導體構件、玻璃板等的玻璃構件等。根據本實施形態相關的工件加工用黏著片1,由於可抑制加工後的工件中的殘膠,以使用在對於此類要求不會產生殘膠的工件為佳。The workpiece to be processed using the adhesive sheet 1 for workpiece processing according to this embodiment is not particularly limited. Examples of the workpiece include semiconductor members such as semiconductor wafers and semiconductor packages, glass members such as glass plates, and the like. According to the adhesive sheet 1 for workpiece processing according to this embodiment, since the residual glue in the processed workpiece can be suppressed, it is preferably used in workpieces that do not generate residual glue in response to such requirements.

作為使用本實施形態相關的工件加工用黏著片1所進行的加工,可列舉,背面研磨、切割、擴展、撿晶等。可以使用一個工件加工用黏著片1,進行上述各加工,也可以在一連串的加工途中重貼工件加工用黏著片1。Examples of processing performed using the adhesive sheet 1 for workpiece processing according to this embodiment include back grinding, cutting, expanding, crystal picking, and the like. Each of the above-mentioned processes can be performed using one adhesive sheet 1 for workpiece processing, or the adhesive sheet 1 for workpiece processing can be reattached during a series of processes.

此外,在上述加工結束後,在將加工後的工件從工件加工用黏著片1進行分離時,以在該分離前,對黏著劑層3照射活性能量射線為佳。如此一來,可以使對於加工後的工件的黏著力降低,可易於進行上述的分離。作為上述活性能量射線,通常可以使用紫外線、電子射線等,特別是以操作簡單的紫外線為佳。Furthermore, when the processed workpiece is separated from the adhesive sheet 1 for workpiece processing after the above-mentioned processing is completed, it is preferable to irradiate the adhesive layer 3 with active energy rays before the separation. In this way, the adhesion force to the processed workpiece can be reduced, and the above-mentioned separation can be easily performed. As the above-mentioned active energy rays, ultraviolet rays, electron rays, etc. can generally be used, and ultraviolet rays that are easy to handle are particularly preferred.

上述紫外線的照射,可以藉由高壓水銀燈、熔融燈(fusion lamp)、氙燈等而進行,紫外線的照射量,以照度為50mW/cm2 以上,1000mW/cm2 以下為佳。紫外線的光量以50mJ/cm2 以上為佳,特別是以80mJ/cm2 以上為佳,進一步以100mJ/cm2 以上為佳。此外,紫外線的光量以2000mJ/cm2 以下為佳,特別是以1000mJ/cm2 以下為佳,進一步以500mJ/cm2 以下為佳。The above-mentioned ultraviolet irradiation can be performed by a high-pressure mercury lamp, a fusion lamp, a xenon lamp, etc. The amount of ultraviolet irradiation is preferably 50 mW/cm 2 or more and 1000 mW/cm 2 or less. The amount of ultraviolet light is preferably 50 mJ/cm 2 or more, particularly 80 mJ/cm 2 or more, and further preferably 100 mJ/cm 2 or more. In addition, the amount of ultraviolet light is preferably 2000 mJ/cm 2 or less, particularly preferably 1000 mJ/cm 2 or less, and further preferably 500 mJ/cm 2 or less.

作為一例,在工件加工用黏著片1上,對作為工件的半導體晶圓、玻璃板進行切割,將複數個半導體晶片進行單片化後,依需要對工件加工用黏著片1進行擴展。然後,對黏著劑層3照射活性能量射線,使黏著劑層3硬化後,從工件加工用黏著片1將半導體晶片、玻璃晶片進行個別撿晶。As an example, a semiconductor wafer or a glass plate as a workpiece is cut on the workpiece processing adhesive sheet 1, and a plurality of semiconductor wafers are singulated, and then the workpiece processing adhesive sheet 1 is expanded as necessary. Then, the adhesive layer 3 is irradiated with active energy rays to harden the adhesive layer 3, and then the semiconductor wafer and the glass wafer are individually picked from the adhesive sheet 1 for workpiece processing.

本實施形態相關的工件加工用黏著片1,藉由具有上述構成以及物性,抑制構成黏著劑層3的黏著劑附著在被撿晶的半導體晶片、玻璃晶片的表面上。亦即,抑制對半導體晶片、玻璃晶片的殘膠。The adhesive sheet 1 for workpiece processing according to this embodiment has the above-mentioned structure and physical properties, thereby suppressing the adhesive constituting the adhesive layer 3 from adhering to the surface of the semiconductor wafer or glass wafer to be picked. That is, adhesive residue on semiconductor wafers and glass wafers is suppressed.

特別的是本實施形態相關的工件加工用黏著片1,對於在表面具有凹部的工件而言,可以特別適合使用。此時,可在該工件有凹部存在的面上,貼附工件加工用黏著片1的黏著面。作為此類具有凹部的工件,可列舉,例如,具有藉由雷射光照射(雷射刻字)而形成有微小的凹部的保護膜或密封樹脂層的半導體晶圓、形成有刻溝等的微小的凹部的玻璃板等。本實施形態相關的工件加工用黏著片1,即使使用在表面具有凹部的工件時,仍可良好地獲得抑制殘膠的效果。In particular, the adhesive sheet 1 for workpiece processing according to this embodiment can be particularly suitably used for workpieces having recessed portions on the surface. At this time, the adhesive surface of the workpiece processing adhesive sheet 1 can be attached to the surface of the workpiece where the recessed portion exists. Examples of such workpieces having recessed portions include, for example, a semiconductor wafer having a protective film or a sealing resin layer in which minute recessed portions are formed by laser light irradiation (laser engraving), and minute recessed portions in which engraved grooves are formed. Recessed glass plates, etc. Even when the adhesive sheet 1 for workpiece processing according to this embodiment is used on a workpiece having a concave portion on its surface, it is possible to obtain a good effect of suppressing adhesive residue.

以上所說明的實施形態,為用以易於瞭解本發明而記載者,並非用以限定本發明而記載者。因此,上述實施形態所揭示的各元件,是包括本發明所屬的技術範圍內全部的設計變更、均等物。The embodiments described above are described to facilitate understanding of the present invention and are not described to limit the present invention. Therefore, each element disclosed in the above embodiment includes all design changes and equivalents within the technical scope to which the present invention belongs.

例如,也可以沒有剝離片材4,在基材2中的與黏著劑層3相反側的面上,亦可設置其他的層。 [實施例]For example, the release sheet 4 may not be provided, and another layer may be provided on the surface of the base material 2 opposite to the adhesive layer 3 . [Example]

以下,雖然藉由實施例等進一步具體說明本發明,但本發明的範圍並不限定於此等實施例等。Hereinafter, the present invention will be further described in detail using Examples and the like, but the scope of the present invention is not limited to these Examples and the like.

[製造例1](基材X的製作) (1)塗佈劑的調製 於反應容器中倒入水938g及硫酸銅(II)0.046mg,將其升溫至60℃為止。接著,一邊維持60℃,一邊將N-乙烯吡咯烷酮1kg、25%氨水6g以及35質量%過氧化氫水溶液34g,費時180分鐘進行滴下。滴下結束後,添加25質量%氨水2g。反應開始起的4小時後,升溫至80℃,添加35質量%過氧化氫水5g。接著,反應開始期的5.5小時後,添加35質量%過氧化氫水5g,進一步在80℃維持1小時,獲得50質量%聚乙烯吡咯烷酮水溶液。藉此所獲得的聚乙烯吡咯烷酮的重量平均分子量(Mw)為30萬。[Manufacturing Example 1] (Preparation of base material X) (1) Preparation of coating agent 938g of water and 0.046mg of copper(II) sulfate were poured into the reaction vessel, and the temperature was raised to 60°C. Next, while maintaining 60° C., 1 kg of N-vinylpyrrolidone, 6 g of 25% ammonia water, and 34 g of 35 mass% hydrogen peroxide aqueous solution were dropped over 180 minutes. After the dropping was completed, 2 g of 25 mass% ammonia water was added. Four hours after the reaction started, the temperature was raised to 80°C, and 5 g of 35 mass% hydrogen peroxide water was added. Next, 5.5 hours after the reaction start period, 5 g of 35 mass % hydrogen peroxide water was added, and the mixture was further maintained at 80° C. for 1 hour to obtain a 50 mass % polyvinylpyrrolidone aqueous solution. The weight average molecular weight (Mw) of the polyvinylpyrrolidone thus obtained was 300,000.

將上述所得的聚乙烯吡咯烷酮水溶液40質量份(固形分換算;以下皆同),聚酯系結合劑樹脂(互應化學工業公司製,製品名稱「PLAS COAT:Z-730」,重量平均分子量:3000,酸價:50.0KOHmg/g,羥基值:5.0KOHmg/g)50質量份,以及含㗁唑啉基的聚合物的水溶性硬化劑(日本觸媒公司製,製品名稱「EPOCROS:WS-300」,重量平均分子量:120000)5質量份進行混合,獲得塗佈劑(10質量%水溶液)。40 parts by mass of the polyvinylpyrrolidone aqueous solution obtained above (solid content conversion; the same applies below), polyester-based binder resin (manufactured by Hoyo Chemical Industry Co., Ltd., product name "PLAS COAT: Z-730"), weight average molecular weight: 3000, acid value: 50.0KOHmg/g, hydroxyl value: 5.0KOHmg/g) 50 parts by mass, and a water-soluble hardener of a tetrazoline group-containing polymer (manufactured by Nippon Shokubai Co., Ltd., product name "EPOCROS: WS- 300", weight average molecular weight: 120000) 5 parts by mass were mixed to obtain a coating agent (10 mass% aqueous solution).

(2)塗佈層的形成 將上述所得的塗佈劑,在作為基材本體的聚對苯二甲酸乙二酯膜(三菱化學公司製,製品名稱「PET100 T-100 MITSUBISHI」,厚度100μm)的單面上,使用梅耶桿(meyer bar)進行塗佈。然後,藉由使塗膜在110℃乾燥1分鐘,在基材本體上形成厚度0.05μm的塗佈層(吡咯烷酮系塗佈層),將此作為基材X。(2) Formation of coating layer The coating agent obtained above was applied to one side of a polyethylene terephthalate film (manufactured by Mitsubishi Chemical Corporation, product name "PET100 T-100 MITSUBISHI", thickness 100 μm) as the base material body, using Mayer Coating is performed using a meyer bar. Then, the coating film was dried at 110° C. for 1 minute to form a coating layer (pyrrolidone-based coating layer) with a thickness of 0.05 μm on the base material body, which was regarded as base material X.

[製造例2](基材Y的製作) (1)塗佈劑的調製 將水溶性聚乙烯醇樹脂(kuraray公司製,製品名稱「Poval」)40質量份,醇系結合劑樹脂(互應化學工業公司製,製品名稱「PLAS COAT:Z-565」)50質量份,以及含㗁唑啉基的聚合物的水溶性硬化劑(日本觸媒公司製,製品名稱「EPOCROS:WS-300」,重量平均分子量:120000)5質量份進行混合,獲得塗佈劑(10質量%水溶液)。[Manufacturing Example 2] (Preparation of base material Y) (1) Preparation of coating agent Mix 40 parts by mass of water-soluble polyvinyl alcohol resin (manufactured by Kuraray Co., Ltd., product name "Poval") and 50 parts by mass of alcohol-based binder resin (manufactured by Hoyo Chemical Industry Co., Ltd., product name "PLAS COAT: Z-565"), and 5 parts by mass of a water-soluble hardener of a tetrazoline group-containing polymer (manufactured by Nippon Shokubai Co., Ltd., product name "EPOCROS: WS-300", weight average molecular weight: 120000) were mixed to obtain a coating agent (10 mass % aqueous solution).

(2)塗佈層的形成 將上述所得的塗佈劑,在作為基材本體的聚對苯二甲酸乙二酯膜(三菱化學公司製,製品名稱「PET100 T-100 MITSUBISHI」,厚度100μm)的單面,使用梅耶桿進行塗佈。然後,藉由使塗膜在110℃乾燥1分鐘,在基材本體上形成厚度0.05μm的塗佈層(非吡咯烷酮系塗佈層),將此作為基材Y。(2) Formation of coating layer The coating agent obtained above was applied to one side of a polyethylene terephthalate film (manufactured by Mitsubishi Chemical Corporation, product name "PET100 T-100 MITSUBISHI", thickness 100 μm) as the base body, using a Meyer rod. Carry out coating. Then, the coating film was dried at 110° C. for 1 minute to form a coating layer (non-pyrrolidone coating layer) with a thickness of 0.05 μm on the base material body, which was used as base material Y.

[實施例1] (1)黏著性組合物的調製 將丙烯酸正丁酯(BA)75質量份,甲基丙烯酸甲酯(MMA)10質量份,丙烯酸2-羥乙酯(HEA)15質量份,藉由溶液聚合法使其聚合,獲得(甲基)丙烯酸酯共聚物。將此(甲基)丙烯酸酯共聚物,與相對於該(甲基)丙烯酸酯共聚物100g的30g(相對於丙烯酸2-羥乙酯相當於80莫耳%)的甲基丙烯醯基氧基乙基異氰酸酯(MOI)進行反應,獲得在側鏈導入有活性能量射線硬化性基的丙烯酸系聚合物。此丙烯酸系聚合物的重量平均分子量(Mw)為60萬。[Example 1] (1) Preparation of adhesive composition 75 parts by mass of n-butyl acrylate (BA), 10 parts by mass of methyl methacrylate (MMA), and 15 parts by mass of 2-hydroxyethyl acrylate (HEA) were polymerized by a solution polymerization method to obtain (methyl ) acrylate copolymer. This (meth)acrylate copolymer was mixed with 30 g (equivalent to 80 mol% of 2-hydroxyethyl acrylate) of methacryloxy group based on 100 g of the (meth)acrylate copolymer. Ethyl isocyanate (MOI) is reacted to obtain an acrylic polymer having an active energy ray curable group introduced into the side chain. The weight average molecular weight (Mw) of this acrylic polymer is 600,000.

將上述所得的在側鏈導入有活性能量射線硬化性基的丙烯酸系聚合物100質量份,作為光聚合起始劑的2-羥基-1-{4-[4-(2-羥基-2-甲基-丙醯基)-苄基]苯基}-2-甲基-丙烷-1-酮(BASF公司製,製品名稱「Omnirad 127」)7質量份,作為交聯劑的三羥甲基丙烷改質甲伸苯基二異氰酸酯(東曹公司製,製品名稱「Coronate L」)0.2質量份在溶媒中進行混合,獲得黏著性組合物的塗佈液。100 parts by mass of the acrylic polymer having an active energy ray curable group introduced into the side chain obtained above was added with 2-hydroxy-1-{4-[4-(2-hydroxy-2- 7 parts by mass of methyl-propyl)-benzyl]phenyl}-2-methyl-propan-1-one (manufactured by BASF, product name "Omnirad 127"), trimethylol as a cross-linking agent 0.2 parts by mass of propane-modified tomycin diisocyanate (manufactured by Tosoh Corporation, product name "Coronate L") was mixed in a solvent to obtain a coating liquid of an adhesive composition.

(2)黏著劑層的形成 對於由在厚度38μm的聚對苯二甲酸乙二酯(PET)膜的單面上形成有矽酮系的剝離劑層而成的剝離片材(LINTEC公司製,製品名稱「SP-PET381031」)的剝離面,塗佈上述黏著性組合物的塗佈液,藉由加熱使其乾燥,在剝離片材上,形成厚度25μm的黏著劑層。(2) Formation of adhesive layer A release sheet made of a polyethylene terephthalate (PET) film with a thickness of 38 μm and a silicone-based release agent layer formed on one side of the film (manufactured by LINTEC, product name "SP-PET381031") The coating liquid of the above-mentioned adhesive composition is applied to the release surface, and dried by heating to form an adhesive layer with a thickness of 25 μm on the release sheet.

(3) 工件加工用黏著片的製作 藉由將在上述步驟(2)所形成的黏著劑層的露出面與製造例1所製作的基材X的塗佈層側的面進行貼合,獲得工件加工用黏著片。(3) Production of adhesive sheets for workpiece processing The adhesive sheet for workpiece processing was obtained by bonding the exposed surface of the adhesive layer formed in the above-mentioned step (2) to the coating layer side surface of the base material X produced in Production Example 1.

[實施例2~6、比較例1~2] 除了將構成在側鏈導入有活性能量射線硬化性基的丙烯酸系聚合物((甲基)丙烯酸酯共聚物)的各單體的種類以及比例,以及該丙烯酸系聚合物的重量平均分子量(Mw)變更成為如表1所示以外,其餘與實施例1同樣地製造工件加工用黏著片。[Examples 2 to 6, Comparative Examples 1 to 2] In addition to the types and proportions of each monomer constituting an acrylic polymer ((meth)acrylate copolymer) having an active energy ray-curable group introduced into the side chain, and the weight average molecular weight (Mw) of the acrylic polymer ) except that the adhesive sheet for workpiece processing was produced in the same manner as in Example 1 except that the changes are as shown in Table 1.

[比較例3~4] 除了將構成在側鏈導入有活性能量射線硬化性基的丙烯酸系聚合物((甲基)丙烯酸酯共聚物)的各單體的種類以及比例,以及該丙烯酸系聚合物的重量平均分子量(Mw)變更成為如表1所示,同時將基材X變更成為基材Y以外,其餘與實施例1同樣地製造工件加工用黏著片。[Comparative Examples 3~4] In addition to the types and proportions of each monomer constituting an acrylic polymer ((meth)acrylate copolymer) having an active energy ray-curable group introduced into the side chain, and the weight average molecular weight (Mw) of the acrylic polymer ) was changed as shown in Table 1, and the base material

[比較例5] 除了將基材X變更為基材Y以外,其餘與實施例1同樣地製造工件加工用黏著片。[Comparative example 5] An adhesive sheet for workpiece processing was produced in the same manner as in Example 1 except that the base material X was changed to the base material Y.

[比較例6] 對於將乙烯-甲基丙烯酸共聚物(EMAA)(DOW-MITSUI POLYCHEMICALS CO.,LTD.製,製品名稱「NUCREL N0903HC」),藉由小型T型模具擠出機(東洋精機製作所社製,製品名稱「LABO PLASTOMILL 」)進行擠出成形所獲得的厚度80μm的EMAA膜,照射110kGy的電子射線2.2秒。除了將藉此所獲得的EMAA膜取代基材X以外,其餘與實施例1同樣地製造工件加工用黏著片。[Comparative example 6] Ethylene-methacrylic acid copolymer (EMAA) (manufactured by DOW-MITSUI POLYCHEMICALS CO., LTD., product name "NUCREL N0903HC") is extruded through a small T-type die extruder (manufactured by Toyo Seiki Seisakusho Co., Ltd., product name An EMAA film with a thickness of 80 μm obtained by extrusion molding of "LABO PLASTOMILL") was irradiated with an electron beam of 110 kGy for 2.2 seconds. An adhesive sheet for workpiece processing was produced in the same manner as in Example 1 except that the EMAA film thus obtained was used instead of the base material X.

在此,表1中所記載的簡碼等的詳細情形如以下所述。 BA:丙烯酸正丁酯 MMA:甲基丙烯酸甲酯 HEA:丙烯酸2-羥乙酯 ACMO:N-丙烯醯基嗎福啉 DMAA:N,N-二甲基丙烯醯胺 2EHA:丙烯酸2-乙基己酯 VAc:醋酸乙烯酯Here, the details of the simple codes and the like described in Table 1 are as follows. BA: n-butyl acrylate MMA: methyl methacrylate HEA: 2-hydroxyethyl acrylate ACMO: N-Acrylylmorpholine DMAA: N,N-dimethylacrylamide 2EHA: 2-ethylhexyl acrylate VAc: vinyl acetate

上述的重量平均分子量(Mw)為使用凝膠滲透層析法(GPC),在以下的條件所測定(GPC測定)的換算標準聚苯乙烯的重量平均分子量。 >測定條件> ・測定裝置:東曹公司製,HLC-8320 ・GPC管柱(依以下的順序通過):東曹公司製 TSK gel SuperH-H TSK gel superHM-H TSK gel superH2000 ・測定溶媒:四氫呋喃 ・測定溫度:40℃The weight average molecular weight (Mw) mentioned above is the weight average molecular weight of converted standard polystyrene measured under the following conditions (GPC measurement) using gel permeation chromatography (GPC). >Measurement conditions> ・Measuring device: Made by Tosoh Corporation, HLC-8320 ・GPC string (pass in the following order): Made by Tosoh Corporation TSK gel SuperH-H TSK gel superHM-H TSK gel superH2000 ・Measurement solvent: tetrahydrofuran ・Measuring temperature: 40℃

[試驗例1](基材的貯藏模數的測定) 關於在實施例以及比較例所製作-使用的基材,在下述裝置以及條件測定在25℃的貯藏模數。結果如表1所示。 測定裝置:動態模數測定裝置,A&D Company, Limited製,製品名稱「RHEOVIBRON DDV-01FP」 試驗開始溫度:0℃ 試驗結束溫度:200℃ 升溫速度:3℃/分 頻率:11Hz 振幅:20μm[Test Example 1] (Measurement of storage modulus of base material) Regarding the base materials produced and used in the Examples and Comparative Examples, the storage modulus at 25° C. was measured using the following apparatus and conditions. The results are shown in Table 1. Measuring device: Dynamic modulus measuring device, manufactured by A&D Company, Limited, product name "RHEOVIBRON DDV-01FP" Test starting temperature: 0℃ Test end temperature: 200℃ Heating rate: 3℃/min Frequency: 11Hz Amplitude: 20μm

[試驗例2](玻璃轉換溫度的計算) 將實施例以及比較例所調製的在側鏈導入有活性能量射線硬化性基的丙烯酸系聚合物的玻璃轉換溫度(Tg),藉由Fox的算式計算出。結果如表1所示。[Test Example 2] (Calculation of glass transition temperature) The glass transition temperature (Tg) of the acrylic polymer prepared in Examples and Comparative Examples and having an active energy ray curable group introduced into the side chain was calculated by Fox's equation. The results are shown in Table 1.

[試驗例3](層間強度的測定) 將由基材、積層在該基材的單面上的由高黏著力性的紫外線硬化性黏著劑所構成的黏著劑層,以及積層在該黏著劑層中的與基材相反的面的剝離片材的3層所構成的高黏著力UV黏著片(LINTEC公司製,製品名稱「Adwill D-510T」)的基材側的面,隔著雙面黏著膠帶(LINTEC公司製,製品名稱「TackLiner」),固定在作為支撐體的不繡鋼板(SUS304#600)的單面上。[Test Example 3] (Measurement of interlaminar strength) It consists of a base material, an adhesive layer composed of a highly adhesive ultraviolet curable adhesive laminated on one side of the base material, and a release sheet laminated on the side of the adhesive layer opposite to the base material. The surface of the base material side of the high-adhesion UV adhesive sheet (manufactured by LINTEC, product name "Adwill D-510T") composed of three layers of the material is separated by a double-sided adhesive tape (manufactured by LINTEC, product name "TackLiner" ), fixed on one side of the stainless steel plate (SUS304#600) as the support.

接著,從上述高黏著力UV黏著片將剝離片材剝離,使上述黏著劑層中的與基材相反側的面露出。接著,從實施例以及比較例所製造的工件加工用黏著片將剝離片材剝離,使黏著面露出,該黏著面貼附在上述高黏著力UV黏著片中的黏著劑層的露出面上。Next, the release sheet is peeled off from the high-adhesion UV adhesive sheet to expose the surface of the adhesive layer opposite to the base material. Next, the release sheet was peeled off from the adhesive sheet for workpiece processing manufactured in Examples and Comparative Examples to expose the adhesive surface, which was attached to the exposed surface of the adhesive layer in the high-adhesion UV adhesive sheet.

接著,對於工件加工用黏著片中的黏著劑層,從工件加工用黏著片中的基材側的面照射紫外線(照度:230mW/cm2 ,光量:190mJ/cm2 ),使工件加工用黏著片的黏著劑層以及高黏著力UV黏著片的黏著劑層硬化。Next, the adhesive layer in the adhesive sheet for workpiece processing is irradiated with ultraviolet rays (illuminance: 230mW/cm 2 , light intensity: 190mJ/cm 2 ) from the surface of the adhesive sheet for workpiece processing on the base material side, so that the adhesive layer for workpiece processing is adhered. The adhesive layer of the sheet and the adhesive layer of the high-adhesion UV adhesive sheet are hardened.

之後,使用萬能型拉伸測試機(島津製作所製,製品名稱「AUTOGRAPH AG-IS」),以剝離角度180°以及剝離速度300mm/min的條件,將工件加工用黏著片的基材從工件加工用黏著片的黏著劑層剝離,測定此時的剝離力(mN/25mm)。然後,該剝離力作為層間強度(mN/25mm)。結果如表1所示。Thereafter, a universal tensile testing machine (manufactured by Shimadzu Corporation, product name "AUTOGRAPH AG-IS") was used to process the base material of the adhesive sheet for workpiece processing from the workpiece at a peeling angle of 180° and a peeling speed of 300mm/min. Peel off the adhesive layer of the adhesive sheet and measure the peeling force at this time (mN/25mm). Then, the peeling force was used as the interlaminar strength (mN/25mm). The results are shown in Table 1.

且,在實施例1~3的工件加工用黏著片中,由於工件加工用黏著片的黏著劑層與基材的層間強度過高,在基材或黏著劑層有破裂發生,故無法測定。Moreover, in the adhesive sheets for workpiece processing of Examples 1 to 3, since the interlayer strength between the adhesive layer of the adhesive sheet for workpiece processing and the base material was too high, cracks occurred in the base material or the adhesive layer, so the measurement could not be performed.

[試驗例4](殘膠的評價) 對矽晶圓的鏡面,使用雷射刻字裝置(KEYENCE公司製,製品名稱「MD-S9910A」)進行刻字。如此一來,對於該鏡面,形成以剖面觀測寬度約為50μm,深度約為25μm的溝。[Test Example 4] (Evaluation of residual glue) A laser marking device (manufactured by KEYENCE, product name "MD-S9910A") was used to engrave the mirror surface of the silicon wafer. As a result, the mirror surface has a groove with a width of about 50 μm and a depth of about 25 μm when viewed in cross section.

接著,從實施例以及比較例所製造的工件加工用黏著片將剝離片材剝離所露出的黏著面,對於上述雷射刻字後的鏡面,使用2kg的橡膠滾筒進行貼附,放置20分鐘。Next, the exposed adhesive surface was peeled off from the adhesive sheet for workpiece processing produced in Examples and Comparative Examples, and the mirror surface after laser engraving was attached using a 2kg rubber roller and left for 20 minutes.

接著,對於工件加工用黏著片中的黏著劑層,從工件加工用黏著片中的基材側的面照射紫外線(照度:230mW/cm2 ,光量:190mJ/cm2 ),使工件加工用黏著片的黏著劑層硬化。Next, the adhesive layer in the adhesive sheet for workpiece processing is irradiated with ultraviolet rays (illuminance: 230mW/cm 2 , light intensity: 190mJ/cm 2 ) from the surface of the adhesive sheet for workpiece processing on the base material side, so that the adhesive layer for workpiece processing is adhered. The adhesive layer of the tablet hardens.

之後,將上述鏡面與工件加工用黏著片分離,對在該鏡面中刻字部分的殘膠(黏著劑的附著)以肉眼進行確認。其結果為,無殘膠者評價為「◎」,確認稍微有殘膠者評價為「〇」,有殘膠者評價為「×」。結果如表1所示。Thereafter, the above-mentioned mirror surface is separated from the adhesive sheet for workpiece processing, and the residual glue (adhesion of adhesive) on the engraved portion of the mirror surface is visually confirmed. As a result, those with no glue residue were evaluated as "◎", those with a slight glue residue were evaluated as "O", and those with glue residue were evaluated as "×". The results are shown in Table 1.

[試驗例5](缺角的評價) 從實施例以及比較例所製造的工件加工用黏著片將剝離片材剝離,對於露出的黏著劑層,使用膠帶貼面機(LINTEC公司製,製品名稱「Adwill RAD2500m/12」),貼附6英吋矽晶圓以及切割用環狀框架。接著,配合環狀框架的外徑裁斷工件加工用黏著片後,使用切割裝置(DISCO公司製:DFD-651),在以下的切割條件進行從矽晶圓側起的切斷的切割,獲得8mm正方的晶片。[Test Example 5] (Evaluation of missing corners) The release sheet was peeled off from the adhesive sheet for workpiece processing manufactured in the Example and Comparative Example, and the exposed adhesive layer was applied using a tape pasting machine (manufactured by LINTEC, product name "Adwill RAD2500m/12"), and 6 Inch silicon wafers and ring frames for dicing. Next, after cutting the adhesive sheet for workpiece processing according to the outer diameter of the annular frame, a cutting device (manufactured by DISCO: DFD-651) was used to cut from the silicon wafer side under the following cutting conditions to obtain 8 mm Square chip.

>切割條件> ・晶圓的厚度:350μm ・切割裝置:DISCO公司製,製品名稱「DFD-651」 ・刀刃:DISCO公司製,製品名稱「NBC-2H205027HECC」 ・刀刃寬:0.025~0.030mm ・刃先出量:0.640~0.760mm ・刀刃旋轉數:30000rpm ・切削速度:80mm/sec ・切入基材的深度:20μm ・切削水量:1.0L/min ・切削水溫度:20℃>Cutting conditions> ・Wafer thickness: 350μm ・Cutting device: Made by DISCO, product name "DFD-651" ・Blade: Made by DISCO, product name "NBC-2H205027HECC" ・Blade width: 0.025~0.030mm ・Blade first output: 0.640~0.760mm ・Blade rotation number: 30000rpm ・Cutting speed: 80mm/sec ・Depth of cutting into the base material: 20μm ・Cutting water volume: 1.0L/min ・Cutting water temperature: 20℃

所得的8mm正方的晶片當中,針對工件加工用黏著片的中心部以及其附近的位置,觀察有無缺角(晶片端部的缺損)。具體而言,使用電子顯微鏡(KEYENCE社製,製品名稱「VHZ-100」,倍率:300倍),觀察在基材本體的製造時的流向(MD方向)上的50晶片邊緣以及在與MD方向垂直方向(CD方向)上的50晶片邊緣。然後,將具有100μm以上的寬度或深度的缺損判定為缺角,計數具有缺角的晶片數。基於此結果,以下作為基準,評價缺角。評價結果如表1所示。 〇:發生缺角的晶片數未達5個。 ×:發生缺角的晶片數為5個以上。Among the obtained 8 mm square wafers, the center part of the adhesive sheet for workpiece processing and the position near it were observed to see if there were any chipped corners (defects at the end of the wafer). Specifically, an electron microscope (manufactured by KEYENCE, product name "VHZ-100", magnification: 300 times) was used to observe the 50 wafer edge in the flow direction (MD direction) during the production of the base material body and in the MD direction. 50 wafer edge in vertical direction (CD direction). Then, a defect having a width or depth of 100 μm or more is determined to be a chipped corner, and the number of wafers having a chipped corner is counted. Based on this result, the missing angle is evaluated as follows as a standard. The evaluation results are shown in Table 1. 〇: The number of wafers with chipped corners does not reach 5. ×: The number of wafers with chipped corners is 5 or more.

[表1] 基材 丙烯酸系聚合物 Tg (℃) 層間強度 (mN/25mm) 殘膠 的評價 缺角的 評價 種類 貯藏模數 (MPa) 組 成 Mw 實施例1 基材X 1800 BA75/MMA10/HEA15-80% 60萬 -39 發生破裂 實施例2 1800 BA75/ACMO10/HEA15-80% 60萬 -37 發生破裂 實施例3 1800 BA75/DMAA10/HEA15-80% 60萬 -38 發生破裂 實施例4 1800 2EHA73/DMAA12/HEA15-80% 60萬 -50 12000 實施例5 1800 2EHA75/VAc10/HEA15-80% 60萬 -56 6800 實施例6 1800 2EHA80/HEA20-80% 60萬 -61 5400 比較例1 1800 2EHA40/VAc40/HEA20-80% 60萬 -27 450 × 比較例2 1800 2EHA50/MMA30/HEA20-80% 60萬 -25 305 × 比較例3 基材Y 1770 2EHA73/DMAA12/HEA15-80% 60萬 -50 270 × 比較例4 1770 2EHA75/VAc10/HEA15-80% 60萬 -56 300 × 比較例5 1770 BA75/MMA10/HEA15-80% 60萬 -39 250 × 比較例6 聚烯烴膜 140 BA75/MMA10/HEA15-80% 60萬 -39 20000 × [Table 1] base material Acrylic polymer Tg(℃) Interlayer strength (mN/25mm) Evaluation of residual glue Comments on missing corners Kind Storage modulus (MPa) composition Mw Example 1 Base material 1800 BA75/MMA10/HEA15-80% 600,000 -39 rupture occurs Example 2 1800 BA75/ACMO10/HEA15-80% 600,000 -37 rupture occurs Example 3 1800 BA75/DMAA10/HEA15-80% 600,000 -38 rupture occurs Example 4 1800 2EHA73/DMAA12/HEA15-80% 600,000 -50 12000 Example 5 1800 2EHA75/VAc10/HEA15-80% 600,000 -56 6800 Example 6 1800 2EHA80/HEA20-80% 600,000 -61 5400 Comparative example 1 1800 2EHA40/VAc40/HEA20-80% 600,000 -27 450 × Comparative example 2 1800 2EHA50/MMA30/HEA20-80% 600,000 -25 305 × Comparative example 3 Base material Y 1770 2EHA73/DMAA12/HEA15-80% 600,000 -50 270 × Comparative example 4 1770 2EHA75/VAc10/HEA15-80% 600,000 -56 300 × Comparative example 5 1770 BA75/MMA10/HEA15-80% 600,000 -39 250 × Comparative example 6 polyolefin film 140 BA75/MMA10/HEA15-80% 600,000 -39 20000 ×

由表1可得知,實施例所得的工件加工用黏著片,可良好地抑制在與工件的分離時對工件的殘膠。此外,亦能抑制在切割時的缺角的發生。 [產業可利用性]It can be seen from Table 1 that the adhesive sheet for workpiece processing obtained in the Example can effectively suppress the residual glue on the workpiece when it is separated from the workpiece. In addition, the occurrence of chipped corners during cutting can also be suppressed. [Industrial Availability]

本發明的工件加工用黏著片,適合使用在要求不產生殘膠的工件,特別是在表面具有微小的凹部之類的工件進行加工時。The adhesive sheet for workpiece processing of the present invention is suitable for use on workpieces that require no adhesive residue, especially when processing workpieces with minute recesses on the surface.

1:工件加工用黏著片 2:基材 21:基材本體 22:塗佈層 3:黏著劑層 4:剝離片材1: Adhesive sheet for workpiece processing 2:Substrate 21:Substrate body 22:Coating layer 3: Adhesive layer 4: Peel off the sheet

[圖1]本發明一實施形態相關的工件加工用黏著片的剖面圖。[Fig. 1] A cross-sectional view of an adhesive sheet for workpiece processing according to an embodiment of the present invention.

1:工件加工用黏著片 1: Adhesive sheet for workpiece processing

2:基材 2:Substrate

21:基材本體 21:Substrate body

22:塗佈層 22:Coating layer

3:黏著劑層 3: Adhesive layer

4:剝離片材 4: Peel off the sheet

Claims (10)

一種工件加工用黏著片,具備;基材、以及積層在上述基材的單面上的黏著劑層, 上述黏著劑層為由含有在側鏈導入有活性能量射線硬化性基的丙烯酸系聚合物的黏著性組合物所形成的活性能量射線硬化性的黏著劑所構成, 上述丙烯酸系聚合物的玻璃轉換溫度(Tg)為-80℃以上,-30℃以下, 在上述基材的與上述黏著劑層接觸的面上,形成有含有吡咯烷酮系化合物的塗佈層。An adhesive sheet for workpiece processing, including: a base material, and an adhesive layer laminated on one side of the base material, The adhesive layer is composed of an active energy ray-curable adhesive composed of an adhesive composition containing an acrylic polymer having an active energy ray-curable group introduced into a side chain, The glass transition temperature (Tg) of the above-mentioned acrylic polymer is -80°C or more and -30°C or less, A coating layer containing a pyrrolidone compound is formed on the surface of the base material that is in contact with the adhesive layer. 如請求項1所述之工件加工用黏著片,其中,上述丙烯酸系聚合物為在該聚合物的主鏈上包含來自(甲基)丙烯酸烷基酯的構造, 上述(甲基)丙烯酸烷基酯中的丙烯酸基的碳數為1~4。The adhesive sheet for workpiece processing according to claim 1, wherein the acrylic polymer has a structure derived from an alkyl (meth)acrylate in the main chain of the polymer, The acrylic acid group in the alkyl (meth)acrylate has 1 to 4 carbon atoms. 如請求項1所述之工件加工用黏著片,其中,上述丙烯酸系聚合物為在該聚合物的主鏈上含有來自含有官能基的單體的構造, 在上述丙烯酸系聚合物全體中上述來自含有官能基的單體的構造部分的比例為0.1質量%以上,12質量%以下。The adhesive sheet for workpiece processing according to claim 1, wherein the acrylic polymer has a structure derived from a monomer containing a functional group in the main chain of the polymer, The proportion of the structural portion derived from the functional group-containing monomer in the entire acrylic polymer is 0.1% by mass or more and 12% by mass or less. 如請求項1所述之工件加工用黏著片,其中,上述吡咯烷酮系化合物為以乙烯吡咯烷酮作為主要構成單元的聚合物。The adhesive sheet for workpiece processing according to claim 1, wherein the pyrrolidone compound is a polymer having vinylpyrrolidone as its main structural unit. 如請求項1所述之工件加工用黏著片,其中,上述基材在25℃的貯藏模數為1000MPa以上。The adhesive sheet for workpiece processing according to claim 1, wherein the storage modulus of the above-mentioned base material at 25°C is 1000 MPa or more. 如請求項5所述之工件加工用黏著片,其中,上述基材為以聚對苯二甲酸乙二酯膜作為基材本體。The adhesive sheet for workpiece processing according to claim 5, wherein the above-mentioned base material uses a polyethylene terephthalate film as the base material body. 如請求項1所述之工件加工用黏著片,其為切割片。The adhesive sheet for workpiece processing described in claim 1 is a cutting sheet. 一種工件加工用黏著片的製造方法,其為如請求項1~7中任一項所述之工件加工用黏著片的製造方法,包含: 在基材本體的單面上,形成含有吡咯烷酮系化合物的塗佈層,獲得上述基材的步驟; 將上述黏著性組合物塗佈在剝離片材的剝離面上,形成上述黏著劑層的步驟;以及 將上述基材的塗佈層側的面,與上述黏著劑層貼合的步驟。A method for manufacturing an adhesive sheet for workpiece processing, which is a method for manufacturing an adhesive sheet for workpiece processing as described in any one of claims 1 to 7, including: The step of forming a coating layer containing a pyrrolidone compound on one side of the base material body to obtain the above base material; The step of applying the above-mentioned adhesive composition on the release surface of the release sheet to form the above-mentioned adhesive layer; and The step of laminating the surface of the coating layer side of the above-mentioned base material to the above-mentioned adhesive layer. 一種工件加工用黏著片的製造方法,為如請求項3所述之工件加工用黏著片的製造方法,包含: 調製使含官能基的單體以5質量%以上,35質量%以下的量進行共聚合的(甲基)丙烯酸酯共聚物,在上述(甲基)丙烯酸酯共聚物,使具有官能基的含活性能量射線硬化性基的化合物進行反應,製造於側鏈導入有活性能量射線硬化性基的丙烯酸系聚合物,調製含有該丙烯酸系聚合物的黏著性組合物的步驟; 於基材本體的單面,形成含有吡咯烷酮系化合物的塗佈層,獲得上述基材的步驟; 將上述黏著性組合物塗佈在剝離片材的剝離面,形成上述黏著劑層的步驟;以及 將上述基材的塗佈層側的面,與上述黏著劑層貼合的步驟。A method of manufacturing an adhesive sheet for workpiece processing, which is the manufacturing method of an adhesive sheet for workpiece processing as described in claim 3, including: A (meth)acrylate copolymer is prepared by copolymerizing a functional group-containing monomer in an amount of 5 mass % or more and 35 mass % or less. In the (meth)acrylate copolymer, the functional group-containing monomer is The step of reacting a compound with an active energy ray curable group to produce an acrylic polymer having an active energy ray curable group introduced into a side chain, and preparing an adhesive composition containing the acrylic polymer; The step of forming a coating layer containing a pyrrolidone compound on one side of the base material body to obtain the above-mentioned base material; The step of applying the above-mentioned adhesive composition on the release surface of the release sheet to form the above-mentioned adhesive layer; and The step of laminating the surface of the coating layer side of the above-mentioned base material to the above-mentioned adhesive layer. 如請求項9所述之工件加工用黏著片的製造方法,其中,相對於上述含官能基的單體的官能基的量,具有上述官能基的含活性能量射線硬化性基的化合物的量為60莫耳%以上,99莫耳%以下。The method of manufacturing an adhesive sheet for workpiece processing according to claim 9, wherein the amount of the active energy ray-curable group-containing compound having the above functional group relative to the amount of the functional group of the functional group-containing monomer is More than 60 mol%, less than 99 mol%.
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