TWI812466B - Comparison method, device front-end module - Google Patents
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Abstract
提供一種檢測在經過中間處理工程前後平面尺寸相異之搬送對象物的混載,而有助於半導體製造中的運用率提升之載入埠、及載入埠中的對照處理方法。 構成為進行:就座保持處理,保持載置桌台(5)上的搬送容器(FOUP(3)或第2搬送容器(C));及後方牽引處理,令載置桌台(5)上的搬送容器從就座位置移動至搬送對象物授受位置;及第1對照處理,通過處於開狀態的框(4)的開口部(41)將對照器(M2)置放於可偵測第1搬送對象物(W)之第1對照位置(P1)來執行;及第2對照處理,將對照器(M2)置放於可偵測第2搬送對象物(F)之第2對照位置來執行。 Provides a load port and a comparison processing method in the load port that detect mixed loading of objects having different planar dimensions before and after an intermediate processing process, thereby helping to improve utilization rates in semiconductor manufacturing. It is configured to perform: seating holding processing to hold the transportation container (FOUP (3) or the second transportation container (C)) on the placement table (5); and rear pulling processing to place the placement table (5) on the The transfer container is moved from the seating position to the transfer object receiving position; and the first comparison process is to place the comparison device (M2) through the opening (41) of the frame (4) in the open state to detect the first The first comparison position (P1) of the conveyance object (W) is executed; and the second comparison process is executed by placing the comparator (M2) at the second comparison position capable of detecting the second conveyance object (F). .
Description
本發明有關半導體製造工程中,用來與可將複數片的晶圓等搬送對象物收納至多段式狹槽(slot)的搬送容器亦即FOUP之間授受搬送對象物之EFEM(Equipment Front End Module;設備前端模組),特別有關具備了對照包括FOUP的各狹槽中有無搬送對象物之狀態的資訊之對照(mapping)機構的EFEM、及對照方法。The present invention relates to an EFEM (Equipment Front End Module) used in a semiconductor manufacturing process to transfer objects to and from a FOUP, a transport container that can accommodate a plurality of wafers and other objects to be transported in multi-stage slots. ; Equipment front-end module), especially EFEM, which has a mapping mechanism for comparing information on the presence or absence of conveyance objects in each slot of the FOUP, and a mapping method.
例如在半導體的製造工程中,為求良率或品質之提升,係在無塵室內進行晶圓之處理。近年來,係導入「微環境(Mini-Environment)方式」亦即僅針對晶圓周圍的局部性空間進一步提升潔淨度,採用於進行晶圓搬送等其他處理之手段。微環境方式中,是在框體的內部載置構成大致封閉之晶圓搬送室(以下稱搬送室)的壁面的一部分,並且在高清淨的內部空間供晶圓等搬送對象物收納之搬送容器亦即FOUP(Front-Opening Unified Pod;晶舟),而在緊貼於FOUP的門之狀態下,具有令該FOUP門開閉的機能之載入埠係鄰接於搬送室而設置。以下,將可卡合於FOUP門而令FOUP門開閉之載入埠的門稱為「載入埠門」。For example, in the semiconductor manufacturing process, in order to improve the yield or quality, wafers are processed in a clean room. In recent years, the "Mini-Environment method" has been introduced, which is to further improve the cleanliness of only the local space around the wafer and use it for other processing such as wafer transportation. In the micro-environment method, a part of the wall that forms a substantially closed wafer transfer chamber (hereinafter referred to as the transfer chamber) is placed inside the frame, and a transfer container is used to store wafers and other transfer objects in a high-clean internal space. That is, a FOUP (Front-Opening Unified Pod; wafer), and a load port that has the function of opening and closing the FOUP door in close proximity to the FOUP door is installed adjacent to the transfer room. Hereinafter, the load port door that can be engaged with the FOUP door to open and close the FOUP door is called a "load port door".
這樣的載入埠,為用來與搬送室之間進行搬送對象物的取出放入之裝置,作用成為搬送室與FOUP之間的介面部。又,構成為若在對於FOUP門而言令載入埠門緊貼之狀態下該些FOUP門及載入埠門同時被開啟,則能夠藉由配置於搬送室內的搬送機器人,將FOUP內的搬送對象物取出至搬送室內,或將搬送對象物從搬送室內收納至FOUP內。Such a loading port is a device for taking out and placing objects to be transported into and out of the transport chamber, and serves as an interface between the transport chamber and the FOUP. Furthermore, if the FOUP door and the load port are opened at the same time while the load port is in close contact with the FOUP door, the transfer robot disposed in the transfer chamber can transfer the FOUP to the load port. The objects to be transported are taken out to the transport chamber, or the objects to be transported are stored in the FOUP from the transport chamber.
在載入埠,備有可檢測設於FOUP內之多段式狹槽中搬送對象物的有無或收納姿勢之對照機構。作為對照機構之一例,能夠舉出下述之物,即,將在先端部具備了對照感測器之對照器(mapper),構成為可在令其後退至比載入埠的框還靠搬送室側之不可對照位置、與通過框的開口部而接近至比不可對照位置還靠FOUP內之可對照位置之間移動。此外,對照機構,具備支撐對照器之對照移動部(對照臂),其構成為將對照器維持在可對照位置而令對照臂朝高度方向移動,藉此可對每一狹槽偵測多段式狹槽中的搬送對象物。另,對照臂的升降移動,是和載入埠門的升降移動一體或獨立地進行。The loading port is equipped with a comparison mechanism that can detect the presence or storage posture of objects to be transported in the multi-stage slots in the FOUP. As an example of the collation mechanism, a mapper (mapper) equipped with a collation sensor at the front end is configured so that it can be moved back further than the frame of the load port. It moves between a non-collatable position on the chamber side and a collatable position that is closer to the FOUP than the non-collatable position through the opening of the frame. In addition, the collation mechanism is equipped with a collation moving part (collation arm) that supports the collimator. It is configured to maintain the collimator at a collatable position and move the collation arm in the height direction, thereby enabling multi-stage detection for each slot. The object to be transported in the slot. In addition, the lifting movement of the control arm is performed integrally or independently with the lifting movement of the loading port.
不過,半導體製造的中間工程~後工程(例如底部拋光(back-lapping)處理工程、晶圓層積處理工程、切割處理工程等)中,會在鄰接於搬送室而設置之複數種類的處理室內各自施以適當的處理。因此,在處理室內,例如底部拋光處理前之晶圓、底部拋光處理後的薄晶圓會在被保持於環狀框之狀態下受到搬送。However, in the intermediate to post-processes of semiconductor manufacturing (such as back-lapping processing, wafer lamination processing, dicing processing, etc.), multiple types of processing chambers are installed adjacent to the transfer chamber. Give appropriate treatment to each. Therefore, in the processing chamber, for example, the wafer before the bottom polishing process and the thin wafer after the bottom polishing process are transported while being held in the ring frame.
此處,供底部拋光處理後的薄晶圓保持之環狀框,例如為被設定成0.3~0.7mm程度的厚度之物。被保持於環狀框的晶圓,會在被收容至和FOUP相異之專用的容器亦即框匣(frame casstte)之狀態下受到搬送。Here, the annular frame for holding the thin wafer after the bottom polishing process is set to a thickness of about 0.3 to 0.7 mm, for example. The wafers held in the ring-shaped frame are transported while being accommodated in a frame cassette, a dedicated container that is different from the FOUP.
上述這樣的半導體製造的中間工程~後工程中,以往,中間處理工程以後的薄晶圓(被保持於環狀框的薄晶圓)是藉由搬送環狀框之專用的機器人、或搬送收納了環狀框的框匣之專用的機器人而被直接搬送至下一工程,或被搬送至不同於載入埠之框匣專用的載置空間。此外,在對於搬送室而言設置處理內容(底部拋光處理工程、晶圓層積處理工程、切割處理工程等)相異的複數種處理室之半導體製造裝置中,框匣往載入埠之搬送、裝載是藉由作業者來進行。In the above-mentioned intermediate process to the post-process of semiconductor manufacturing, conventionally, thin wafers (thin wafers held in a ring frame) after the intermediate processing process are transported and stored by a dedicated robot that transports the ring frame, or The frame of the ring frame is directly transported to the next process by a dedicated robot, or is transported to a dedicated loading space for the frame that is different from the loading port. In addition, in a semiconductor manufacturing apparatus in which a plurality of processing chambers with different processing contents (bottom polishing processing process, wafer lamination processing process, dicing processing process, etc.) are provided for the transfer chamber, the transport of the cassette to the load port , loading is performed by the operator.
另一方面,當著眼於與載入埠之間授受搬送容器之機構(例如OHT;Overhead Hoist Transfer;空中懸吊式搬送系統)的搬送效率改善、搬送產距(takt)改善這一點的情形下,對於搬送室而言設有處理內容相異的複數種處理室之構成中,料想理想是以晶圓搬送機器人來搬送保持薄晶圓之環狀框、或利用FOUP的載置空間亦即載入埠來作為框匣的載置空間,藉此使用共通的裝置來取用框匣與FOUP。On the other hand, when focusing on the improvement of transportation efficiency and improvement of transportation throughput (takt) of the mechanism that transfers containers to and from the loading port (such as OHT; Overhead Hoist Transfer; overhead transport system) In a structure where a transfer chamber is provided with a plurality of types of processing chambers with different processing contents, it is expected that the ideal method is to use a wafer transfer robot to transfer a ring frame holding a thin wafer, or to use a FOUP loading space, that is, a wafer transfer chamber. The port is used as a storage space for the box, thereby using a common device to access the box and FOUP.
當設想了這樣的使用形態的情形下,料想在中間處理工程以後,可能會發生例如底部拋光處理前的晶圓亦即未被保持於環狀框之晶圓、或底部拋光處理後被保持於環狀框之晶圓被混載收容於載入埠上的FOUP內或框匣內之事態。也就是說,會有本應被收納於FOUP之晶圓被誤投入/誤積載至框匣內,或本應被收納於框匣之環狀框被誤投入/誤積載至FOUP內之事態發生的可能性。若這樣的事態發生,會妨礙半導體製造工程的順暢進行,直接導致製造效率的降低。When such a use situation is assumed, it is expected that after the intermediate processing process, for example, the wafer before the bottom polishing process, that is, the wafer is not held in the ring frame, or the wafer is held in the ring frame after the bottom polishing process. A state in which wafers in a ring-shaped frame are mixed and stored in a FOUP on the load port or in a cassette. In other words, there may be situations where wafers that should be stored in the FOUP are mistakenly put in/stowed into the cassette by mistake, or ring frames that are supposed to be stored in the cassette are mistakenly put in/stowed into the FOUP by mistake. possibility. If such a situation occurs, it will hinder the smooth progress of the semiconductor manufacturing process and directly lead to a reduction in manufacturing efficiency.
專利文獻1中,揭示一種將配置於搬送容器的周圍之對照感測器沿著搬送容器的高度方向做升降移動,藉此判定搬送容器內的每一狹槽是否收納有晶圓之對照處理。料想這樣的對照處理,亦可判定在搬送容器內是否收納有晶圓。
[先前技術文獻]
[專利文獻]
[專利文獻1]日本特開2016-181655號公報[Patent Document 1] Japanese Patent Application Publication No. 2016-181655
[發明所欲解決之問題][Problem to be solved by the invention]
然而,專利文獻1記載之構成中,當在搬送容器內混載有相異尺寸的晶圓的情形下,料想無法區別是否發生混載。再者,必須在搬送容器的周圍配置對照感測器之專利文獻1記載的構成,會招致對照機構的大型化而佔據面積亦會變大,並且為了不讓來自對照感測器的照射光被搬送容器遮擋,會要求在搬送容器沒有遮蔽物、或是搬送容器由具有透光性的素材來形成,因此會有可適用的搬送容器受限定之問題。However, in the structure described in
此外,處理相異尺寸的晶圓之載入埠中,作為設計成能夠共用對照裝置之技術,亦有人提議一種對照裝置,是把將檢測波的照射軸朝向左右的水平方向之對照感測器安裝在朝上下方向移動之對照臂,而令將檢測波的照射軸朝向左右的水平方向之第1伸出感測器往對照感測器的移動方向遠離而安裝在對照元件,又,設置將檢測波的照射軸朝向對照感測器的上下移動方向之第2伸出感測器(參照日本特開2015-211164號公報)。In addition, as a technology designed to be able to share a collation device in a load port that handles wafers of different sizes, a collation device is also proposed, which is a collation sensor that points the irradiation axis of the detection wave in the horizontal direction to the left and right. It is attached to the comparison arm that moves in the up and down direction, so that the first extended sensor, which directs the irradiation axis of the detection wave in the horizontal direction to the left and right, is moved away from the movement direction of the comparison sensor and is installed on the comparison element. The irradiation axis of the detection wave is directed toward the second extension sensor in the up-down movement direction of the reference sensor (see Japanese Patent Application Laid-Open No. 2015-211164).
按照這樣的對照裝置,當將對照感測器插入至最小尺寸的搬送容器的內部,而在搬送容器內令其朝上下方向移動時,可藉由第1伸出感測器檢測可能會和對照感測器衝撞之伸出的晶圓,並且可藉由第2伸出感測器檢測比對照感測器還先行移動而可能會和第1伸出感測器衝撞之伸出的晶圓。According to such a collation device, when the collation sensor is inserted into the interior of a minimum-sized transport container and moved in the up-and-down direction within the transport container, it is possible to detect possible collation by the first extension sensor. The sensor collides with the protruding wafer, and the second protruding sensor can detect the protruding wafer that has moved earlier than the reference sensor and may collide with the first protruding sensor.
然而,這樣的對照裝置,除了對照感測器以外,還需要第1伸出感測器及第2伸出感測器,因此會有感測器數量增加而構造變得複雜,成本亦增大之問題。However, such a comparison device requires a first extension sensor and a second extension sensor in addition to the comparison sensor. Therefore, the number of sensors increases, the structure becomes complex, and the cost also increases. problem.
本發明係著眼於這樣的待解問題而研發,主要目的在於提供一種無需大幅變更以往的載入埠的構成,而可檢測在經過中間工程前後平面尺寸相異之搬送對象物彼此被混載(包括誤投入/誤積載)於搬送容器,而有助於半導體製造中的運用率(utilization rate)提升之載入埠、及載入埠中的對照處理方法。另,本發明,不限定於中間處理後的搬送對象物的平面尺寸和環狀框的平面尺寸相依之態樣,為一可通盤適用於中間工程前的搬送對象物與中間工程後的搬送對象物的平面尺寸相異之態樣之技術。 [解決問題之技術手段] The present invention was developed with an eye on such problems to be solved, and its main purpose is to provide a structure that can detect the mixed loading of conveyance objects with different planar dimensions before and after passing through the intermediate process without significantly changing the structure of the conventional loading port (including A load port that helps improve the utilization rate in semiconductor manufacturing due to misplacement/incorrect stowage) in a transport container, and a comparison processing method in the load port. In addition, the present invention is not limited to the aspect that the plane size of the object to be transported after the intermediate process depends on the plane size of the annular frame, but is applicable to the object to be transported before the intermediate process and the object to be transported after the intermediate process. The technique of changing the appearance of objects in different plane dimensions. [Technical means to solve problems]
亦即本發明,係有關和在內部具備了搬送機器人之搬送室共同構成EFEM之載入埠。本發明中,於載入埠和搬送室並排之前後方向,將載入埠側定義為前方,將搬送室側定義為後方。In other words, the present invention relates to a loading port of the EFEM that is formed together with a transfer chamber equipped with a transfer robot inside. In the present invention, in the front-rear direction where the loading port and the transfer chamber are arranged side by side, the loading port side is defined as the front and the transfer chamber side is defined as the rear.
本發明之載入埠,具備:平板狀的框,以站立姿勢併設於搬送室且具有可供第1搬送對象物以略水平姿勢通過之開口部;及載置桌台,可載置第1搬送容器即FOUP;及載入埠門,可和FOUP所具有之FOUP門卡合,且可將框的開口部開閉;及就座保持機構,將從外部被搬送來的FOUP保持於載置桌台上;及門開閉機構,令載入埠門移動至朝搬送室側後退之門開放位置,藉此將框的開口部設為開狀態;及牽引機構,在相對於框而言以朝前方突出之姿勢配置之載置桌台上,令FOUP在就座位置與搬送對象物授受位置之間朝前後方向移動;及對照機構,於藉由門開閉機構將開口部設為了開狀態之狀態下,對照有關包括位於搬送對象物授受位置的FOUP內的各狹槽中的第1搬送對象物的有無之狀態之資訊;及控制部,掌控該些各機構(就座保持機構、牽引機構、門開閉機構、及對照機構)的動作。此處,作為本發明中的第1搬送對象物,能夠舉出晶圓。此外,若搬送對象物例如為晶圓,則用來搬送搬送對象物之搬送室為晶圓搬送室。The loading port of the present invention is provided with: a flat frame, which is installed in the transport room in a standing position and has an opening through which the first transport object can pass in a substantially horizontal position; and a loading table on which the first transport object can be placed. The transport container is the FOUP; the loading port door engages with the FOUP door of the FOUP and can open and close the opening of the frame; and the seating retaining mechanism retains the FOUP transported from the outside on the loading table. on the table; and a door opening and closing mechanism that moves the loading port door to the door opening position that retreats toward the transfer chamber side, thereby opening the opening of the frame; and a pulling mechanism that faces forward relative to the frame The placement table with a protruding posture moves the FOUP in the front-to-back direction between the seating position and the transfer object receiving and receiving position; and the control mechanism sets the opening to the open state by the door opening and closing mechanism. , compares the information on the presence or absence of the first conveyance object in each slot in the FOUP located at the conveyance object receiving position; and the control unit, controls the various mechanisms (seating retention mechanism, traction mechanism, door opening and closing mechanism, and control mechanism) action. Here, as the first transfer object in the present invention, a wafer can be cited. In addition, if the object to be transferred is, for example, a wafer, the transfer chamber used to transfer the object is a wafer transfer chamber.
此外,本發明中的搬送機器人,只要是配置於搬送室內之物即可,能夠利用已知之物。另,搬送機器人,可為不構成本發明的載入埠的一部分之物,亦可為構成本發明的載入埠的一部分之物。作為搬送機器人,已知有構成為在連結了複數個臂要素的連桿機構的先端部設置機械手,而可藉由此機械手把持搬送對象物在搬送容器與搬送室之間做取出放入之物。然而,本發明中的搬送機器人不限定於此類型。In addition, the transfer robot in the present invention may be anything disposed in a transfer room, and any known robot can be used. In addition, the transfer robot may not constitute a part of the load port of the present invention, or may constitute a part of the load port of the present invention. As a transfer robot, there is known a structure in which a manipulator is provided at the tip of a link mechanism that connects a plurality of arm elements, and the manipulator can hold a conveyance object and put it in and out between a conveyance container and a conveyance chamber. thing. However, the transport robot in the present invention is not limited to this type.
本發明中的對照機構,係具備:對照器,在先端部具有對照感測器;及對照移動部,支撐對照器且通過處於開狀態之開口部令對照器移動至可藉由對照感測器偵測FOUP中收容有第1搬送對象物之第1對照位置。此處,本發明中的對照移動部,可為滿足藉由門開閉機構而和載入埠門一起朝前後方向及上下方向動作之第1動作條件、及和門開閉機構獨立地動作之第2動作條件的雙方之物,或亦可為滿足其中一方之物。此外,本發明中,作為令對照器移動至第1對照位置之構成的具體例,能夠舉出藉由對照移動部全體傾動來令對照器往前方傾動而置放於第1對照位置之構成,或藉由對照移動部全體往前方滑動移動來令對照器往前方移動而置放於第1對照位置之構成。The comparison mechanism in the present invention is provided with: a comparison device having a comparison sensor at a tip; and a comparison moving part that supports the comparison device and moves the comparison device through an opening in an open state to a position where the comparison sensor can be passed The first comparison position containing the first transfer target object is detected in the FOUP. Here, the comparison moving part in the present invention may satisfy the first operating condition of moving in the front-rear direction and the up-down direction together with the loading port door by the door opening and closing mechanism, and the second operating condition of operating independently from the door opening and closing mechanism. Things that are both sides of the action conditions, or things that satisfy one of them. In addition, in the present invention, as a specific example of the structure of moving the collimator to the first collation position, there can be cited a structure in which the collimator is tilted forward and placed in the first collation position by tilting the entire collation moving part. , or a structure in which the collimator moves forward and is placed in the first collation position by sliding the entire collation moving part forward.
又,本發明之載入埠,其特徵為,控制部可執行:就座保持處理,藉由就座保持機構,把可將和第1搬送對象物平面尺寸相異的第2搬送對象物收容於多段式狹槽之第2搬送容器或FOUP保持於載置桌台上;及後方牽引處理,藉由牽引機構令載置桌台上的第2搬送容器或FOUP從就座位置移動至搬送對象物授受位置;及門開放處理,藉由門開閉機構將開口部設為開狀態;及第1對照處理,通過處於開狀態之開口部將對照器置放於第1對照位置而令其執行對照機構所做之對照處理;及第2對照處理,通過處於開狀態之開口部將對照器置放於可藉由對照感測器偵測第2搬送容器中收容有第2搬送對象物之第2對照位置而令其執行對照機構所做之對照處理;係選擇性地執行第1對照處理及第2對照處理的其中一方或雙方。Furthermore, the loading port of the present invention is characterized in that the control unit can execute the seating holding process to hold the second conveying object having a different planar size from the first conveying object by the seating holding mechanism. The second transport container or FOUP in the multi-stage slot is held on the placement table; and the rear traction process uses the traction mechanism to move the second transport container or FOUP on the placement table from the seating position to the transportation target. The object transfer position; and the door opening process, which uses the door opening and closing mechanism to open the opening; and the first comparison process, which places the comparison device in the first comparison position through the opening in the open state to perform comparison. The comparison process performed by the organization; and the second comparison process, placing the comparison device through the opening in the open state on the second transfer container that can detect the second transfer object contained in the second transfer container by the comparison sensor Comparing a location and causing it to perform the comparison processing performed by the comparison agency; it is to selectively perform one or both of the first comparison processing and the second comparison processing.
此處,作為「和第1搬送對象物平面尺寸相異的第2搬送對象物」之一例,能夠舉出於中間工程後薄晶圓及保持它之環狀框的組合、或環狀框單體等,但不限定於此。另,薄晶圓,為連同平面尺寸比薄晶圓還大的環狀框受到搬送之物,因此規範第2搬送對象物的平面尺寸之部件並非薄晶圓,而是環狀框。當這樣的環狀框為第2搬送對象物的情形下,本發明中的「可將第2搬送對象物收容於多段式狹槽之第2搬送容器」,為可將環狀框多段式地收容之框匣,惟第2搬送容器亦不限定於此。Here, as an example of "the second transfer object having a planar size different from that of the first transfer object", a combination of a thin wafer after the intermediate process and a ring frame holding it, or a ring frame alone can be cited body, etc., but is not limited to this. In addition, a thin wafer is transported together with an annular frame having a planar size larger than that of the thin wafer. Therefore, the member that regulates the planar size of the second transfer object is not the thin wafer but the annular frame. When such a ring frame is a second conveyance object, the "second conveyance container capable of accommodating the second conveyance object in a multi-stage slot" in the present invention means that the ring frame can be placed in a multi-stage manner. The storage frame and the second transport container are not limited to this.
按照這樣的本發明之載入埠,使用對照有關包括FOUP內的各狹槽中的第1搬送對象物的有無之狀態之資訊的對照機構,來執行第2對照處理,藉此便可對照有關包括第2搬送容器內的各狹槽中的第2搬送對象物的有無之狀態之資訊。According to the load port of the present invention, a second comparison process is performed using a comparison mechanism that compares information including the presence or absence of the first conveyance object in each slot in the FOUP, whereby the relevant information can be compared. Information on the presence or absence of the second transfer target object in each slot in the second transfer container is included.
又,當第2搬送對象物的平面尺寸比第1搬送對象物還大的情形下,對載置於載置桌台之第1搬送容器亦即FOUP內的每一狹槽進行判定是否收納有第2搬送對象物之第2對照處理,若偵測收納有第2搬送對象物,則便能掌握第2搬送對象物被誤投入於FOUP。此外,當在載置桌台上載置了第2搬送容器的情形下,如果對於和依第2對照處理而未收納有第2搬送對象物之資訊建立了關連之狹槽而言,第1對照處理的偵測結果為收納有第1搬送對象物之偵測結果,則便能掌握第1搬送對象物被誤投入於第2搬送容器。Furthermore, when the planar size of the second conveyance object is larger than that of the first conveyance object, it is determined whether each slot in the FOUP, which is the first conveyance container placed on the mounting table, is accommodated. In the second comparison process of the second conveyance object, if it is detected that the second conveyance object is stored, it can be understood that the second conveyance object has been put into the FOUP by mistake. In addition, when the second transport container is placed on the placement table, if the slot is related to the information that does not contain the second transport object according to the second comparison process, the first comparison If the detection result of the process is that the first conveyance object is stored, it can be understood that the first conveyance object has been put into the second conveyance container by mistake.
像這樣,按照本發明之載入埠,利用至少具備了對照器及對照移動部之對照機構,基於第1對照處理的偵測結果、與第2對照處理的偵測結果(偵測資訊)的雙方或其中一方,可辨明平面尺寸相異的搬送對象物是否被混載於搬送容器內。是故,按照本發明之載入埠,無需大幅變更以往的載入埠的構成,避免對照機構的大型化及構造的複雜化,於中間工程以後,即使採用將平面尺寸相異的搬送對象物收容至載置於共通的載入埠上之FOUP(第1搬送容器)或第2搬送容器而取用之使用形態的情形下,仍可偵測相異的搬送對象物在FOUP或第2搬送容器中被誤混載(誤投入/誤積載),而能夠謀求半導體製造中的運用率提升。In this way, according to the load port of the present invention, a comparison mechanism including at least a comparison device and a comparison moving unit is used to perform a comparison based on the detection result of the first comparison process and the detection result (detection information) of the second comparison process. Both parties or one of them can identify whether objects to be transported with different planar dimensions are mixed in the transport container. Therefore, according to the load port of the present invention, there is no need to significantly change the structure of the conventional load port, and the enlargement of the comparison mechanism and the complexity of the structure are avoided. After the intermediate process, even if the objects to be transported with different planar dimensions are used, Even if the object is stored in the FOUP (first transport container) or the second transport container placed on a common loading port and taken out, it is still possible to detect the objects being transported in the FOUP or the second transport container. It is possible to improve the utilization rate in semiconductor manufacturing by mistakenly mixing the containers (wrongly adding/wrongly stowing).
另,即使當容許第1或第2搬送容器內混載第1或第2搬送對象物的情形下,按照本發明仍能藉由對照處理來掌握該混載的狀態。In addition, even when the first or second transport object is allowed to be mixed in the first or second transport container, according to the present invention, the mixed state can be grasped through the comparison process.
又,本發明中,是將第2對照處理執行時對照器被置放之第2對照位置,設定成和第1對照處理執行時對照器被置放之第1對照位置為相異位置。作為本發明之比較例,若為藉由置放於同一對照處理位置之對照器的對照感測器來偵測平面尺寸相異的搬送對象物之構成,則必須令相互平面尺寸相異的搬送對象物彼此的外緣的一部分切齊。然後,為了令平面尺寸相異的搬送對象物彼此的外緣的一部分切齊,不得不因應搬送對象物的平面尺寸來變更搬送機器人所做之搬送對象物的搬送距離或搬送位置,而被迫做繁雜的控制。另一方面,本發明之載入埠中,無需令載置桌台上的搬送對象物的中心依第1搬送對象物及第2搬送對象物而相異,作為搬送機器人的搬送控制能夠採用以往的簡單控制。是故,按照本發明,不會要求因應搬送對象物的平面尺寸來變更搬送機器人所做之搬送對象物的搬送距離或搬送位置,比起上述比較例會成為簡單的控制,亦有助於半導體製造中的運用率提升。Furthermore, in the present invention, the second collation position where the collation device is placed when the second collation process is executed is set to a position different from the first collation position where the collation device is placed when the first collation process is executed. As a comparative example of the present invention, if it is configured to detect conveyance objects with different planar dimensions by using the comparison sensor of the comparator placed at the same comparison processing position, it is necessary to ensure that the conveyance objects with different planar dimensions must be detected. Parts of the outer edges of the objects are aligned with each other. Then, in order to align a part of the outer edges of objects to be conveyed with different planar dimensions, the conveying distance or the conveying position of the object to be conveyed by the conveying robot has to be changed according to the planar size of the object to be conveyed, and this forces the Do complex controls. On the other hand, in the loading port of the present invention, there is no need to make the center of the conveyance object placed on the table different depending on the first conveyance object and the second conveyance object, and the conventional conveyance control can be adopted as the conveyance robot. simple controls. Therefore, according to the present invention, it is not required to change the conveying distance or the conveying position of the conveyed object by the conveying robot according to the planar size of the conveyed object. Compared with the above comparative example, the control can be simpler, and it is also helpful for semiconductor manufacturing. The utilization rate in .
本發明中的「第1對照位置」及「第2對照位置」,可因應第1搬送對象物及第2搬送對象物的平面尺寸而適當設定,惟作為第1對照位置的良好例子,能夠舉出對照感測器被配置於比框當中面向搬送室之後壁面(最接近搬送室之壁面)還前方之位置,作為第2對照位置的良好例子,能夠舉出對照感測器被配置於比框的後壁面還後方之位置。又,本發明中,可設定成於將對照器置放於第1對照位置之狀態下令對照移動部做升降動作藉此進行第1對照處理,並且於將對照器置放於第2對照位置之狀態下令對照移動部做升降動作藉此進行第2對照處理。The "first comparison position" and the "second comparison position" in the present invention can be appropriately set according to the planar dimensions of the first conveyance object and the second conveyance object. However, as a good example of the first comparison position, there can be cited The comparison sensor is arranged in the center of the frame and in front of the rear wall of the transfer chamber (the wall closest to the transfer room). As a good example of the second comparison position, the comparison sensor is arranged in the comparison frame. The rear wall is also in the rear position. Furthermore, in the present invention, it can be configured such that the first comparison process is performed by instructing the comparison moving unit to perform a lifting movement while the comparison device is placed in the first comparison position, and the second comparison process is performed after the comparison device is placed in the second comparison position. The status instructs the comparison moving part to perform a lifting and lowering operation to thereby perform the second comparison process.
再加上,本發明之載入埠中,若控制部為具有判別藉由就座保持機構保持了FOUP或第2搬送容器的哪一者之容器判別部之物,則可基於容器判別部所做的判別資訊,基於事先設定好的動作序列如就座保持處理、門開放處理、後方牽引處理、第1對照處理、第2對照處理的順序,或進行第1對照處理及第2對照處理雙方、或是僅進行其中一方的對照處理等,來自動控制各機構的動作。In addition, in the load port of the present invention, if the control unit has a container discriminating unit for discriminating which of the FOUP and the second transport container is held by the seating holding mechanism, it can be based on what the container discriminating unit determines. The judgment information is based on a preset sequence of actions such as the seating holding process, the door opening process, the rear pulling process, the first comparison process, the second comparison process, or both the first comparison process and the second comparison process. , or perform comparison processing on only one of them to automatically control the actions of each mechanism.
特別是,本發明中較佳是,控制部,當容器判別部判斷出藉由就座保持機構保持了第2搬送容器的情形下,依序執行了就座保持處理、門開放處理、後方牽引處理之後,執行第1對照處理及第2對照處理雙方。此為本發明特有的動作序列,是為了避免當第2搬送容器於前後方向的尺寸比FOUP還大的情形下,若比門開放處理還先進行了後方牽引處理的情形下第2搬送容器會衝撞載入埠門這樣的事態。另,第1對照處理與第2對照處理的順序並無特別限定。另,前後方向的尺寸比FOUP還大之第2搬送容器中收容的第2搬送對象物,為比第1搬送對象物還大的平面尺寸。能夠藉由進行判定第2搬送對象物的有無之第2對照處理、及判定第1搬送對象物的有無之第1對照處理的雙方,來提高偵測這樣的第2搬送容器中混載第1搬送對象物與第2搬送對象物之對照精度。In particular, in the present invention, it is preferable that the control unit sequentially executes the seating holding process, the door opening process, and the rear pulling process when the container determining unit determines that the second transport container is held by the seating holding mechanism. After the processing, both the first comparison process and the second comparison process are executed. This is a unique action sequence of the present invention. It is to avoid that when the size of the second transport container in the front-rear direction is larger than the FOUP, if the rear pulling process is performed before the door opening process, the second transport container will be Collision loading port situation. In addition, the order of the first comparison process and the second comparison process is not particularly limited. In addition, the second conveyance object accommodated in the second conveyance container, which is larger than the FOUP in the front-rear direction, has a planar size larger than that of the first conveyance object. By performing both the second collation process for determining the presence or absence of the second conveyance object and the first collation process for determining the presence or absence of the first conveyance object, it is possible to improve the detection of the first conveyance mixed in the second conveyance container. Comparison accuracy between the object and the second conveyed object.
此外,本發明係有關一種具備了對照機構之載入埠中的對照處理方法,該對照機構是被用於用來在可將複數片的第1搬送對象物存儲於多段式狹槽之第1搬送容器與搬送室之間授受第1搬送對象物,而對照有關包括第1搬送容器的各狹槽中的第1搬送對象物的有無之狀態之資訊,其特徵為,作為載入埠,適用構成為可與第2搬送容器之間授受第2搬送對象之物,該第2搬送容器係可將和第1搬送對象物平面尺寸相異的第2搬送對象物存儲複數個於多段式狹槽,作為對照機構,適用具備:對照器,在先端部具有對照感測器;及對照移動部,支撐對照器且令對照器移動至可藉由對照感測器偵測第1搬送容器中收容有第1搬送對象物之第1對照位置之物,選擇性地執行:第1對照處理,將對照器置放於第1對照位置而令其執行對照機構所做之對照處理;及第2對照處理,將對照器置放於可藉由對照感測器偵測第2搬送容器中收容有第2搬送對象物之第2對照位置而執行對照處理;的其中一方或雙方。Furthermore, the present invention relates to a collation processing method in a load port provided with a collation mechanism for storing a plurality of first conveyance objects in a first multi-stage slot. The first transfer object is exchanged between the transfer container and the transfer chamber, and information on the presence or absence of the first transfer object in each slot including the first transfer container is compared, and is characterized in that it is suitable as a loading port. The second transport container is configured to exchange and receive the second transport object to and from the second transport container, and the second transport container is capable of storing a plurality of second transport objects having different planar dimensions from the first transport object in the multi-stage slot. , as the comparison mechanism, it is suitable to include: a comparison device having a comparison sensor at the tip; and a comparison moving part that supports the comparison device and moves the comparison device to a position where the comparison sensor can detect whether there is a comparison sensor contained in the first transport container. The object at the first comparison position of the first conveyance object selectively performs: the first comparison process, placing the comparison device at the first comparison position and causing it to perform the comparison process performed by the comparison mechanism; and the second comparison process. , place the colarator at one or both of the two locations where the collation sensor can detect the second collation position containing the second transport object in the second transport container and execute the collation process;
若為這樣的對照處理方法,會發揮如同上述的載入埠所發揮的種種作用效果之作用效果,能夠謀求半導體製造中的運用率提升。特別是,本發明中較佳是,第1搬送對象物及第2搬送對象物是在第1搬送容器或第2搬送容器內將彼此的中心位置以相互一致之方式被收容之狀態下執行對照處理(第1對照處理、第2對照處理)。 [發明之功效] Such a comparison processing method can exert various functions and effects similar to those exerted by the above-mentioned load port, and can improve the utilization rate in semiconductor manufacturing. In particular, in the present invention, it is preferable that the first transfer object and the second transfer object are collated in a state in which the center positions of each other are aligned with each other in the first transfer container or the second transfer container. Treatment (first control treatment, second control treatment). [The effect of invention]
本發明,於半導體製造工程中,為一種載入埠及對照處理方法,係具備了對照機構之載入埠中的對照處理方法,該對照機構是被用於用來在可與將複數片的晶圓存儲於多段式狹槽之第1搬送容器之間授受晶圓等的第1搬送對象物,而對照有關包括第1搬送容器的各狹槽中的第1搬送對象物的有無之狀態之資訊,其特徵為,構成為可與第2搬送容器之間授受第1搬送對象物,該第2搬送容器係可將平面尺寸比第1搬送對象物還大的第2搬送對象物存儲複數個於多段式狹槽,作為對照機構,適用具備:對照器,在先端部具有對照感測器;及對照移動部,支撐對照器而可藉由門開閉機構和載入埠門一起動作,且可和門開閉機構獨立地動作之物,可執行:第1對照處理,將對照器置放於可藉由對照感測器偵測FOUP中收容有第1搬送對象物之第1對照位置而令其執行對照處理;及第2對照處理,將對照器置放於可藉由對照感測器偵測第2搬送容器中收容有第2搬送對象物之第2對照位置而執行對照處理;係選擇性地執行第一對照處理及第二對照處理的其中一方或雙方。The present invention is a load port and comparison processing method in a semiconductor manufacturing process. It is a comparison processing method in a load port equipped with a comparison mechanism. The comparison mechanism is used to compare multiple chips with each other. Wafers are stored in the multi-stage slots and first transfer objects such as wafers are exchanged between the first transfer containers, and the presence or absence of the first transfer objects in each slot including the first transfer container is compared. The information is characterized in that the first transfer object can be transferred to and received from a second transfer container, and the second transfer container can store a plurality of second transfer objects having a larger planar size than the first transfer object. In multi-stage slots, as a comparison mechanism, it is suitable to include: a comparison device with a comparison sensor at the tip; and a comparison moving part that supports the comparison device and can be operated together with the loading port door by the door opening and closing mechanism, and can The thing that operates independently of the door opening and closing mechanism can perform the first comparison process, and place the comparison device at a first comparison position that can detect the first transportation object contained in the FOUP by the comparison sensor to make it Executing a comparison process; and a second comparison process, placing the comparison device at a second comparison position where the comparison sensor can detect that the second transfer object is contained in the second transfer container, and executing the comparison process; it is optional to execute one or both of the first comparison process and the second comparison process.
也就是說,本發明,採用了下述這樣嶄新的技術思想,即,使用簡單的構成之對照機構,構成為可執行第1對照處理及第2對照處理,而選擇性地執行第1對照處理及第2對照處理的一方或雙方。按照基於這樣的技術思想之本發明,能夠提供一種避免對照機構的大型化及構造的複雜化,而可於經過中間處理工程前後在共通的載入埠上的第1搬送容器即FOUP或第2搬送容器中偵測是否有平面尺寸相異的搬送對象物混載,而有助於半導體製造中的運用率提升之載入埠、及載入埠中的對照處理方法。That is to say, the present invention adopts a novel technical idea of using a collation mechanism with a simple structure to execute the first collation process and the second collation process, and to selectively execute the first collation process. and one or both parties to the second comparison process. According to the present invention based on such a technical idea, it is possible to provide a first transfer container, that is, a FOUP or a second transfer container, which can be used on a common loading port before and after the intermediate processing process without increasing the size of the comparison mechanism and complicating the structure. A loading port and a comparison processing method in a loading port that detect whether there are mixed objects to be transported with different planar dimensions in a transport container, thereby helping to improve the utilization rate in semiconductor manufacturing.
以下參照圖面,說明本發明之一實施形態。An embodiment of the present invention will be described below with reference to the drawings.
本實施形態之載入埠1,例如為用於半導體的製造工程中,如圖1及圖2所示,在無塵室內,構成搬送室2的壁面的一部分,用來在搬送室2與FOUP3等的搬送容器3之間進行晶圓W等搬送對象物的取出放入之物。載入埠1,構成EFEM(Equipment Front End Module;設備前端模組)的一部分,為作用成為搬送容器3與搬送室2的介面部分之物。EFEM中取用的晶圓W的尺寸被標準化為SEMI (Semiconductor Equipment and Materials International;國際半導體設備暨材料協會)規格,本實施形態中適用直徑300(半徑150)mm的晶圓W。The
本實施形態中的FOUP3,如圖1模型化示意般,具備可通過搬出入口31而將內部空間3S僅朝後方開放之FOUP本體32、及可將搬出入口31開閉之FOUP本體32。FOUP3,在內部設置多段式狹槽,構成為可在各狹槽收容搬送對象物W亦即晶圓W,而構成為可透過搬出入口31將該些晶圓W取出放入之已知之物。後述的圖8模型化地示意在FOUP3內的狹槽34收容了晶圓W之狀態。在FOUP本體32的向上面,設置供自動地搬送搬送容器3的裝置(例如OHT:Over Head Transport)等把持之凸緣部35。The
本實施形態之載入埠1,如圖2至圖6等所示,具備:呈板狀的框4,構成搬送室2的壁面的一部分,且形成有用來將搬送室2的內部空間2S開放之開口部41;及載置桌台5,相對於框4而言令其以朝前方突出之略水平姿勢設置;及就座保持機構6,將從外部被搬送來的FOUP3保持於載置桌台5上;及牽引機構7,在載置桌台5上令FOUP3在就座位置與搬送對象物授受位置之間朝前後方向D移動;及載入埠門8,將框4的開口部41開閉;及門開閉機構9,令載入埠門8移動至朝搬送室2側後退之門開放位置(O),藉此將框4的開口部41設為開狀態;及對照機構M,於藉由門開閉機構9而將框4的開口部41設為開狀態之狀態下,對照有關包括位於搬送對象物授受位置之FOUP3內的各狹槽34中有無晶圓W(相當於本發明之「第1搬送對象物」)的狀態之資訊。The
框4,以起立姿勢配置,為一具有可和載置於載置桌台5上的FOUP3的搬出入口連通之大小的開口部41之略矩形板狀之物。圖1模型化地揭示框4的開口部41。本實施形態之載入埠1,藉由框4來構成搬送室2的壁面的一部分。在框4的下端,設置具有腳輪及設置腳之腳部42。The
載置桌台5,設於在框4當中比高度方向中央還稍靠上方的位置以略水平姿勢配置之水平基台50(支撐台)的上部,為一在FOUP本體32和框4相向之朝向下可載置FOUP3之物。如圖4所示,在載置桌台5,設置令其向上突出之複數個突起51,藉由令該些突起51卡合至形成於FOUP3的底面之孔(圖示省略),來謀求載置桌台5上的FOUP3之定位。The placement table 5 is provided on the upper part of a horizontal base 50 (support base) arranged in a substantially horizontal attitude at a position slightly above the center in the height direction of the
就座保持機構6,為一將設於載置桌台5的鎖定爪61(參照圖5)設為鉤住而固定至設於FOUP3的底面之被鎖定部(圖示省略)的鎖定狀態,藉此將FOUP3保持於載置桌台5上之物。此外,本實施形態之載入埠1中,藉由解除對於被鎖定部之鎖定爪61的鎖定狀態,能夠將FOUP3設為可從載置桌台5遠離之狀態。The
牽引機構7,為一在載置桌台5上令FOUP3在FOUP本體32從載入埠門8遠離規定距離之位置亦即就座位置、與使FOUP本體32緊貼載入埠門8之位置亦即搬送對象物授受位置之間朝前後方向D移動之物。牽引機構7,是使用令載置桌台5前後移動之未圖示之滑軌等來構成。就座保持機構6及牽引機構7,亦能想成是載置桌台5所具備之機構。The
另,圖1中,作為載置桌台5上的FOUP3之載置狀態,係簡化示意成FOUP3的底面接觸載置桌台5的上面之狀態。然而,實際上,比載置桌台5的上面還朝上方突出之複數個突起51,會卡合至形成於FOUP3的底面之有底的孔,藉此支撐FOUP3,而載置桌台5的上面與FOUP3的底面被規定成相互不接觸,在載置桌台5的上面與FOUP3的底面之間會形成規定的間隙。In addition, in FIG. 1 , the placement state of the
本發明及本實施形態中,在載置於載置桌台5的FOUP3和框4並排之前後方向D(參照圖1等),將FOUP3側定義成前方、框4側定義成後方。In the present invention and the present embodiment, in the front and back direction D (see FIG. 1 etc.) where the
載入埠門8,為一可在將框4的開口部41密閉之全閉位置(C)、及比全閉位置(C)還朝搬送室2側後退之門開放位置(O)、及使開口部41的開口空間朝後方完全開放之全開位置(圖示省略)之間移動之物。載入埠門8,具備可吸附而保持FOUP本體32之卡合部81(參照圖4),構成為可維持與FOUP本體32之卡合狀態而和FOUP本體32一體地在全閉位置(C)、門開放位置(O)及全開位置之間移動。本實施形態中,是將全閉位置(C)、門開放位置(O)及被置放了的載入埠門8的姿勢設定成同一姿勢。又,全開位置與全閉位置(C)之間的載入埠門8的移動路徑,係由令位於全閉位置(C)的載入埠門8維持其高度位置而往搬送室2側移動至門開放位置(O)為止之路徑(水平路徑)、及令位於門開放位置(O)的載入埠門8維持其前後位置而往下方移動至全開位置為止之路徑(鉛直路徑)所構成。為了讓置放至門開放位置(O)的載入埠門8能夠朝鉛直方向及水平方向的任一者移動,被保持於置放至門開放位置(O)的載入埠門8之FOUP本體32,係和載入埠門8一起被置放至比框4還後方的位置(從FOUP本體32完全地遠離,而被配置於搬送室2的內部空間2S之位置)。The loading
這樣的載入埠門8之移動,是藉由設於載入埠1之門開閉機構9而實現。門開閉機構9,為一令載入埠門8移動至門開放位置(O)或全開位置,藉此透過設為開狀態之框4的開口來使FOUP3的內部空間連通至搬送室2之物。門開閉機構9,例如是使用將支撐載入埠門8的支撐框80以可朝前後方向D移動之方式予以支撐之可動塊體(圖示省略)、或將可動塊體以可朝上下方向H移動之方式予以支撐之滑軌(圖示省略)來構成,為一令致動器等驅動源(圖示省略)作動,而使載入埠門8朝前後方向D及上下方向H移動之物。另,雖亦可為分別具備前後移動用的致動器、及上下移動用的致動器之態樣,但就零件數刪減這一點而言,以共通的致動器作為驅動源來進行載入埠門8的前後移動及上下移動之態樣較為優良。Such movement of the
本實施形態之載入埠門8,具備連結切換機構82,係將FOUP門32與FOUP本體32之卡合狀態(閂鎖狀態)解除而造出可將FOUP門32從FOUP本體32拆卸之狀態(解閂鎖狀態)(參照圖4)。The
對照機構M,如圖3、圖5及圖8等所示,在先端部具備:對照器M2,具有可檢測藉由設於FOUP3內的多段式狹槽34而於高度方向H被多段狀地收納之搬送對象物W的有無之對照感測器M1(發送器M11、接收器M12);及對照臂M3(相當於本發明之「對照移動部」),支撐對照器M2;為一可檢測FOUP3內的搬送對象物W的有無或收納姿勢之物。圖8模型化地揭示於FOUP3內被載置於狹槽34之晶圓W(第1搬送對象物)的收容狀態。The collation mechanism M, as shown in Figures 3, 5, 8, etc., is equipped with a comparator M2 at the tip end, which has a function that can detect
對照器M2,如圖8所示,為以從對照臂M3的規定處朝前方突出之形態,於寬幅方向相隔規定距離並設左右一對,而在先端部安裝有對照感測器M1之物。對照感測器M1,由發出訊號亦即光束(線型光)之發送器M11(發光感測器)、及接收從發送器M11發出的訊號之接收器M12(受光感測器)所構成。另,亦可藉由發送器、及將從發送器發出的線型光朝向發送器反射之反射部來構成對照感測器M1。在此情形下,發送器還具有身為接收器之機能。如圖8所示,為了讓將光軸ML朝向左右的水平方向之對照感測器M1(M11、M12)於對照處理時不會干涉偵測對象亦即搬送對象物W,係將對照感測器M1(M11、M12)彼此的左右的跨距因應搬送對象物W的平面尺寸而設定成適當的值。As shown in FIG. 8 , the comparator M2 is in a shape that protrudes forward from a predetermined position of the comparison arm M3. A pair of left and right devices are provided at a predetermined distance apart in the width direction, and a comparison sensor M1 is installed at the tip. things. The comparison sensor M1 is composed of a transmitter M11 (light-emitting sensor) that emits a signal, that is, a light beam (linear light), and a receiver M12 (light-receiving sensor) that receives the signal from the transmitter M11. In addition, the comparison sensor M1 may also be constituted by a transmitter and a reflecting part that reflects linear light emitted from the transmitter toward the transmitter. In this case, the transmitter also functions as a receiver. As shown in Figure 8, in order to prevent the comparison sensor M1 (M11, M12) with the optical axis ML facing the left and right horizontal direction from interfering with the detection target, that is, the transport object W, during the comparison process, the comparison sensor is The left and right spans between the devices M1 (M11, M12) are set to appropriate values in accordance with the planar size of the conveyance object W.
對照臂M3,為一令於前後方向D之對照器M2的位置,在圖8(ii)所示位置亦即可通過處於開狀態的開口部41而藉由對照感測器M1偵測FOUP3中收容有晶圓W之第1對照位置(P1)、與圖8(i)所示位置亦可不可藉由對照感測器M1偵測FOUP3中收容有晶圓W之不能對照晶圓位置(P2)之間移動之物。本實施形態之對照臂M3,如圖3所示,呈框狀,一體或一體性地具有上框部M31、及從上框部M31的兩端各自朝下方延伸之左右一對的側框部M32、及設於兩側框部M32的下端部間之下框部M33,而構成為在藉由該些上框部M31、兩側框部M32及下框部M33被圍繞之朝前後方向D開口的對照臂M3的內部空間MS,能夠收容載入埠門8本體、以及從搬送室2側被覆載入埠門8的周邊部件之門罩83。The control arm M3 is the position of the control device M2 in the front-rear direction D. At the position shown in FIG. 8(ii) , that is, the control arm M3 can detect the center of the
本實施形態中,在對照臂M3的上框部M31將對照器M2以令其朝前方突出之姿勢支撐。是故,設於對照器M2的先端部之對照感測器M1,係配置於比對照臂M3還朝前方突出之位置。本實施形態之載入埠1,是將對照臂M3的下框部M33安裝在構成門開閉機構9之部件。具體而言,將下框部M33安裝在支撐載入埠門8之支撐框80。是故,伴隨門開閉機構9所做之載入埠門8的升降作動,對照臂M3亦會一體地作動。其結果,對照機構M全體會和載入埠門8朝同一方向升降移動。另,本實施形態中,雖採用對照機構M和門8一體地作動之構成,但亦可在對照機構M設置專用的升降機構(僅使對照機構M單獨地升降之機構),藉此做成相對於門8而言對照機構M獨立地升降之構成。In this embodiment, the collimator M2 is supported on the upper frame part M31 of the collation arm M3 in a posture that protrudes forward. Therefore, the comparison sensor M1 provided at the tip of the comparison device M2 is disposed at a position that protrudes forward from the comparison arm M3. The
本實施形態之對照機構M,具備以對照臂M3與門開閉機構9之安裝部中的樞支點作為中心而使對照臂M3全體傾動之傾動機構M4。傾動機構M4,如圖3、圖5及圖6所示,具備:傾動曲柄M41,連結至下框部M33;及連結軸M42(相當於樞支點),以令和長邊方向一致的軸方向和載入埠1的寬幅方向一致之姿勢配置,且將傾動曲柄M41及門支撐框80相互連結;及進退可動部M43,以朝前後方向D貫通形成於框4的狹縫狀的插入孔之姿勢配置,可朝前後方向D做進退動作;及樞支軸M44,將傾動曲柄M41的下端部樞接至進退可動部M43的後端部。The comparison mechanism M of this embodiment includes a tilting mechanism M4 that tilts the entire comparison arm M3 with the pivot point in the mounting portion of the comparison arm M3 and the door opening and
這樣的傾動機構M4,於將圖5等所示之對照器M2置放至不能對照晶圓位置(P2)的狀態下,藉由未圖示的驅動源使進退可動部M43往後方(搬送室2側)移動,藉此將傾動曲柄M41的下端部往後方推而使傾動曲柄M41全體繞樞支軸M44旋轉(傾動)。藉此,傾動曲柄M41,會於使上端部朝前方(FOUP3側)移動之方向旋動,連結至傾動曲柄M41的對照臂M3會和傾動曲柄M41往同一方向傾動。其結果,對照臂M3當中兩側框部M32的上端部側區域及上框部M31全體,會通過開口部41突出至比框4的最後面4B還前方的空間(FOUP3側的空間)。依以上,對照器M2,如圖6所示,便被置放至使對照感測器M1通過開口部41而突出至比框4的最後面4B還前方的空間之第1對照位置(P1)。另,傾動機構M4,於將對照器M2置放至第1對照位置(P1)的狀態下,藉由使進退可動部M43往前方(FOUP3側)移動,便能將對照器M2置放至不能對照晶圓位置(P2)。Such a tilting mechanism M4 moves the forward and backward movable portion M43 backward (transfer chamber) by a drive source not shown in the figure when the collimator M2 shown in Fig. 5 and others is placed in a state where the wafer cannot be collated (P2). 2) movement, thereby pushing the lower end of the tilt crank M41 backward to cause the entire tilt crank M41 to rotate (tilt) around the pivot axis M44. Thereby, the tilting crank M41 rotates in the direction of moving the upper end forward (FOUP3 side), and the control arm M3 connected to the tilting crank M41 tilts in the same direction as the tilting crank M41. As a result, the upper end side areas of the two side frame portions M32 of the control arm M3 and the entire upper frame portion M31 protrude through the
對照機構M,構成為可將對照器M2的前後方向之位置維持在第1對照位置(P1)或不能對照晶圓位置(P2)而和上述門開閉機構9的升降移動一體地升降。像這樣,本實施形態中的對照臂M3,為一藉由門開閉機構9而和載入埠門8一起朝前後方向及上下方向動作之物,且為一和門開閉機構9獨立而藉由傾動機構M4動作之物。The collation mechanism M is configured to move up and down integrally with the up and down movement of the door opening and
本實施形態之載入埠1,能夠具備底部排淨(bottom purge)部,其設於載置桌台5而從FOUP3的底面側對該FOUP3內注入氮氣或惰性氣體或是乾燥空氣等適當選擇的氣體亦即環境氣體(亦稱為排淨氣體,本實施形態中主要使用氮氣或乾燥空氣),而可將FOUP3內的氣體環境置換成環境氣體。底部排淨部,是以在載置桌台5上的規定處設有複數個之未圖示的噴嘴作為主體而成,令複數個噴嘴作用成為注入規定的環境氣體之底部排淨注入用噴嘴、或排出FOUP3內的氣體環境之底部排淨排出用噴嘴。該些複數個噴嘴,為可在嵌入至設於FOUP3的底部之注入口及排出口(皆圖示省略)的狀態予以連結之物。可透過注入口從底部排淨注入用噴嘴對FOUP3的內部空間2S供給環境氣體,透過排出口從底部排淨排出用噴嘴排出FOUP3的內部空間2S的氣體環境(此氣體環境,從排淨處理執行開始至規定時間為止為空氣或空氣以外的清淨度低之環境氣體,於該規定時間經過後為充填於FOUP3的內部空間2S的清淨度高之環境氣體),藉此進行排淨處理。The
這樣的載入埠1,和在內部具備了搬送機器人21之搬送室2共同構成EFEM。本實施形態中,如圖2所示,在搬送室2的前面(前壁面)2F將載入埠1並排配置複數(例如3台)。EFEM的作動,是藉由載入埠1的控制器(圖3所示之控制部1C)、或EFEM全體的控制器(圖1所示之控制部2C)而受到控制。Such a
在搬送室2的內部空間2S,設有可將晶圓W等搬送對象物在載入埠1上的FOUP3與處理室R之間搬送之搬送機器人21。搬送機器人21,如圖1及圖2所示,例如為一具備將複數個連桿要素相互予以可水平迴旋地連結,而在先端部設置搬送對象物把持部211(機械手)之臂212、及將構成臂212的基端部之臂基座予以可迴旋地支撐朝且搬送室2的寬幅方向(載入埠1的並列方向)走行之走行部之物。搬送機器人21,具有連桿構造(多關節構造),其形狀會在臂長成為最小之折疊狀態、與臂長變得比折疊狀態時還長之伸長狀態之間變化。能夠適用在臂212的先端將可個別控制之複數個機械手211於高度方向多段狀地設置之搬送機器人21。In the
搬送室2,構成為供載入埠1及處理室R連接,藉此讓內部空間2S成為略密閉之狀態。在搬送室2的內部空間2S,形成從上方朝向下方之氣流亦即下降流(down flow)。是故,即使當搬送室2的內部空間2S中存在污染晶圓W的表面之微粒的情形下,仍可藉由下降流將微粒朝下方推下,而抑制微粒附著到搬送中的晶圓W的表面。圖1中,以箭頭模型化地揭示形成有下降流之搬送室2內的氣體的流動。亦可構成在搬送室2的側面或搬送室2的內部空間2S配置緩衝工作站、對準器(aligner)等適當的工作站而成之EFEM。The
本實施形態中,在和搬送室2當中配置了載入埠1的壁面2F(前壁面)相向之壁面2B(後壁面),於寬幅方向並排配置複數(圖示例中為3室)之處理室R(半導體處理裝置),而構成為在各處理室R內各自施以相異之適當的處理。作為在半導體製造工程的中間工程或後工程進行之處理例,能夠舉出底部拋光處理工程、晶圓層積處理工程、切割處理工程等。另,處理室R的作動,是藉由處理室R的控制器(圖1所示之控制部RC)而受到控制。此處,處理室R全體的控制器(控制部RC)、或EFEM全體的控制器(控制部2C),為載入埠1的控制部1C之上位控制器。In this embodiment, a
各處理室R的內部空間MS、搬送室2的內部空間2S及被載置於各載入埠1上的FOUP3的內部空間2S,被維持在高清淨度。另一方面,在配置載入埠1的空間換言之即處理室外、EFEM外成為相對低清淨度。另,圖1及圖2,為載入埠1及搬送室2的相對位置關係、及具備該些載入埠1及搬送室2之EFEM與處理室R的相對位置關係模型化示意圖。The internal space MS of each processing chamber R, the
本實施形態中,在鄰接於搬送室2而設置之複數種類的處理室R內各自施加適當的處理。是故,底部拋光處理前的晶圓W、或底部拋光處理後被保持於環狀框F的薄晶圓W1等會透過鄰接於搬送室2而設置之載入埠1被搬送至處理室R內。此處,將底部拋光處理後的薄晶圓W1(比底部拋光處理前還被加工成較薄之晶圓W1)予以保持之環狀框F,為一形成一定程度的元件構造,而藉由底部拋光處理等被設定為例如0.3~0.7mm程度的厚度之物。另,底部拋光處理前後,晶圓W和薄晶圓W1的平面尺寸沒有變化。圖7(i)揭示第1搬送對象物亦即晶圓W,同圖(ii)揭示未保持薄晶圓W1之環狀框F,同圖(iii)揭示保持了薄晶圓W1之環狀框F。In this embodiment, appropriate processing is performed in each of a plurality of types of processing chambers R provided adjacent to the
環狀框F,由具有比晶圓W還大一圈的平面尺寸之環狀本體F1、及張貼在環狀本體F1全體之膜F2所構成,為一可在膜F2上貼附保持底部拋光處理後的薄晶圓W1之物。被保持於這樣的環狀框F之薄晶圓W1,是在專用的搬送容器3亦即框匣C中收容一個個環狀框F之狀態下被搬送。在框匣C設有多段式的狹槽C1,構成為可在各狹槽C1載置環狀框F。圖9模型化地揭示在框匣C的狹槽C1載置了環狀框F之狀態。The annular frame F is composed of an annular body F1 having a planar size one circle larger than that of the wafer W, and a film F2 attached to the entire annular body F1. It is a frame that can be attached to the film F2 to maintain the bottom polishing. Thin wafer W1 after processing. The thin wafer W1 held in such annular frame F is conveyed in a state where the annular frames F are accommodated in the cassette C that is a
本實施形態中,是在著眼於與載入埠1之間授受搬送容器3之搬送容器自動搬送裝置(OHT)的搬送效率改善、搬送產距(takt)改善這一點,而對於搬送室2而言設有處理內容相異的複數種處理室R之構成中,構成為以搬送機器人21來搬送保持底部拋光處理後的薄晶圓W1之環狀框F、或利用FOUP3的載置空間亦即載入埠1來作為框匣C的載置空間,藉此可並行地使用框匣C與FOUP3。也就是說,構成為以載入埠1作為介面,而可在載置於載入埠1上之框匣C與搬送機器人21之間搬送一個個環狀框F。此處,保持了薄晶圓W1之狀態的環狀框F相當於本發明之「第2搬送對象物」,框匣C相當於本發明之「第2搬送容器」。In this embodiment, the
本實施形態之載入埠1中,構成為能夠將以多段狀收容和晶圓W平面尺寸相異的環狀框F之框匣C載置於載置桌台5,又,藉由就座保持機構6將框匣C保持於載置桌台5上,藉由牽引機構7可將載置桌台5上的框匣C在就座位置與搬送對象物授受位置之間朝前後方向移動。當在載置桌台5上載置有FOUP3的情形下之就座位置、搬送對象物授受位置,分別和當在載置桌台5上載置有框匣C的情形下之就座位置、搬送對象物授受位置相同。也就是說,載置牽引機構7所做的牽引處理時之載置桌台5的移動量,於當在載置桌台5上載置有FOUP3之情形下、及於當在載置桌台5上載置有框匣C之情形下為相同移動量。The
本實施形態中,是令保持於載置桌台5上之搬送容器3(FOUP3、框匣C)的工件中心(晶圓W的中心、環狀框F的中心)相互一致。是故,使載置桌台5上的FOUP3藉由牽引機構7而從就座位置移動到了搬送對象物授受位置之時間點下的FOUP3內的晶圓W的中心,會和使載置桌台5上的框匣C藉由牽引機構7而從就座位置移動到了搬送對象物授受位置之時間點下的框匣C內的環狀框F的中心一致。藉此,當藉由搬送機器人21將工件(晶圓W、環狀框F)相對於搬送容器3(FOUP3、框匣C)做取出放入時,搬送機器人21只要以工件中心來對齊即可,而不需要每一相異的搬送容器3的教導(teaching),搬送機器人21的控制會變得簡易。In this embodiment, the workpiece centers (the center of the wafer W and the center of the annular frame F) of the transfer container 3 (
此外,本實施形態中,是將框4的開口部41設定成環狀框F可以略水平姿勢通過之開口尺寸。In addition, in this embodiment, the
不過,當構成為以晶圓W搬送機器人21搬送保持底部拋光處理後的薄晶圓W1之環狀框F,或利用FOUP3的載置空間亦即載入埠1作為框匣C的載置空間,而可在共通的載入埠1並行使用框匣C與FOUP3的情形下,料想可能會發生載置桌台5上的框匣C中有底部拋光處理前的晶圓W和保持底部拋光處理後的薄晶圓W1之環狀框F混載,或載置桌台5上的FOUP3中有保持底部拋光處理後的薄晶圓W1之環狀框F和底部拋光處理前的晶圓W混載之事態。However, when the wafer
鑑此,本實施形態之載入埠1中,構成為能夠藉由對照機構M所做的對照處理來判別在載置桌台5上的搬送容器3(FOUP3、框匣C)內是否有搬送對象物W(底部拋光處理前的晶圓W、保持底部拋光處理後的薄晶圓W1之環狀框F)混載。In view of this, the
本實施形態中,是令置放至搬送對象物授受位置之載置桌台5上的搬送對象物W(晶圓W、環狀框F)的中心一致,因此平面尺寸相異之搬送對象物W(晶圓W、環狀框F)的邊端位置和邊端位置不會相互一致,而會於前後方向D產生差距。本實施形態中,利用於此前後方向D搬送對象物W(晶圓W、環狀框F)的位置會發生差距,而構成為能夠藉由對照機構M所做的對照處理來判別在載置桌台5上的搬送容器3(FOUP3、框匣C)內是否有平面尺寸相異之搬送對象物(底部拋光處理前的晶圓W、保持底部拋光處理後的薄晶圓W1之環狀框F)混載。In this embodiment, the centers of the transfer objects W (wafers W, ring frames F) placed on the placement table 5 at the transfer object receiving and receiving positions are aligned, so that the transfer objects have different planar dimensions. The edge positions and edge positions of W (wafer W, annular frame F) do not coincide with each other, but there is a gap in the front-rear direction D. In this embodiment, a difference occurs in the position of the conveyance object W (wafer W, ring frame F) in the front-rear direction D, and the configuration is configured so that the comparison process performed by the comparison mechanism M can be used to determine where the object W is placed is placed. Is there any object to be transferred (wafer W before bottom polishing process, wafer W before bottom polishing process, ring frame holding thin wafer W1 after bottom polishing process) in the transfer container 3 (FOUP3, cassette C) on the table 5? F) Mixed loading.
本實施形態之控制部1C,具有容器判別部1Ca,判別藉由就座保持機構6而保持於載置桌台5上的是FOUP3或框匣C的哪一者。作為容器判別部1Ca,係適用構成為僅當在載置桌台5載置了框匣C的情形下才會發出偵測訊號之物。具體而言,構成為藉由反射型感測器所做的偵測處理,而能夠判定在載置桌台5是否保持了框匣C。The
又,本實施形態之載入埠1,其特徵為,控制部1C可執行:第1對照處理,通過處於開狀態之開口部41將對照器M2置放於第1對照位置(P1)而令其執行對照機構M所做之對照處理;及第2對照處理,通過處於開狀態之開口部41將對照器M2置放於可藉由對照感測器M1偵測框匣C中收容有環狀框F之第2對照位置(P2)而令其執行對照機構M所做之對照處理,係選擇性地執行第1對照處理及第2對照處理的其中一方或雙方。本實施形態中,於前後方向D將第2對照位置(P2)設定在和不能對照晶圓位置(P2)同一位置。第1對照處理,為將對照器M2置放至第1對照位置(P1)的狀態下令對照臂M3做升降動作,藉此對搬送容器內的每一狹槽(FOUP內的每一狹槽34、框匣C內的每一狹槽C1)取得有關搬送對象物的資訊之處理,第2對照處理,為將對照器M2置放至第2對照位置(P2)的狀態下令對照臂M3做升降動作,藉此對搬送容器3內的每一狹槽34取得有關搬送對象物W的資訊之處理。Furthermore, the
此處,對照感測器M1,為一發出訊號亦即光束(線型光),以是否接收該訊號來偵測搬送對象物W的有無之物,能夠將光束的軌跡(線型光線條)想成是檢測線條ML。也就是說,在將對照器M2置放至第1對照位置(P1)的狀態下進行之第1對照處理時的檢測線條ML,為橫切FOUP3中收容的晶圓W之線條(參照圖7(ii)),在將對照器M2置放至第2對照位置(P2)的狀態下進行之第2對照處理時的檢測線條ML,為橫切框匣C中收容的環狀框F之線條(參照圖8(i))。特別是,本實施形態中,著眼於框匣C具有比晶圓W還大的平面尺寸,在將對照器M2置放至第2對照位置(P2)的狀態下進行之第2對照處理時的檢測線條ML,是設定成不會橫切FOUP3中收容的晶圓W之線條。這樣的對照器M2的第1對照位置(P1)及第2對照位置(P2),能夠因應從搬送對象物W(晶圓W、環狀框F)的中心WC、FC或搬送容器3(FOUP3、框匣C)的中心至檢測線條ML為止之沿前後方向D的距離來設定。Here, the comparison sensor M1 emits a signal, that is, a light beam (linear light). Whether or not the signal is received is used to detect the presence or absence of the transport object W. The trajectory of the light beam (linear light line) can be thought of as is the detection line ML. That is, the detection line ML during the first collation process with the collimator M2 placed in the first collation position (P1) is a line that crosses the wafer W accommodated in the FOUP 3 (see FIG. 7 (ii)), the detection line ML during the second comparison process with the comparator M2 placed in the second comparison position (P2) is a line that crosses the annular frame F accommodated in the frame box C. (Refer to Figure 8(i)). In particular, in this embodiment, focusing on the fact that the cassette C has a larger plane size than the wafer W, the second collation process is performed with the collimator M2 placed in the second collation position (P2). The detection line ML is set so as not to cross the wafer W accommodated in FOUP3. The first collation position (P1) and the second collation position (P2) of such a collimator M2 can respond to changes from the center WC or FC of the transport object W (wafer W, ring frame F) or the transport container 3 (FOUP3). , the distance along the front-rear direction D from the center of the frame box C) to the detection line ML is set.
於第1對照處理時,藉由從發送器M11朝向接收器M12發出訊號而在發送器M11與接收器M12之間形成的訊號路徑,會在晶圓W存在之處被遮擋,在晶圓W不存在之處不會被遮擋而會到達接收器M12。藉此,便能依序檢測於高度方向H並排收納之晶圓W的有無或收納姿勢。如此,關於FOUP3內的所有的狹槽34或框匣C內的所有的狹槽C1,便能獲得有關晶圓W的有無或收納姿勢之資訊(搬送對象物檢測資訊)。During the first comparison process, the signal path formed between the transmitter M11 and the receiver M12 by sending a signal from the transmitter M11 toward the receiver M12 will be blocked where the wafer W exists. Where it does not exist, it will not be blocked and will reach the receiver M12. Thereby, the presence or absence or storage posture of the wafers W stored side by side in the height direction H can be detected sequentially. In this way, information on the presence or absence of the wafer W or the storage posture (transport object detection information) can be obtained for all the
於第2對照處理時,藉由從發送器M11朝向接收器M12發出訊號而在發送器M11與接收器M12之間形成的訊號路徑,會在環狀框F存在之處被遮擋,在環狀框F不存在之處不會被遮擋而會到達接收器M12。藉此,便能依序檢測於高度方向H並排收納之環狀框F的有無或收納姿勢。如此,關於FOUP3內的所有的狹槽34或框匣C內的所有的狹槽34,便能獲得有關環狀框F的有無或收納姿勢之資訊(搬送對象物檢測資訊)。During the second comparison process, the signal path formed between the transmitter M11 and the receiver M12 by sending a signal from the transmitter M11 to the receiver M12 will be blocked where the ring frame F exists. Where frame F does not exist, it will not be blocked and will reach the receiver M12. Thereby, the presence or absence or the storage posture of the ring frames F stored side by side in the height direction H can be detected sequentially. In this way, information on the presence or absence of the ring frame F or the storage posture (transport object detection information) can be obtained for all the
本實施形態之載入埠1,藉由從控制部1C對各部、各機構賦予驅動指令來執行規定的動作。控制部1C,具有下述構成,即,具備了進行記憶部、ROM、RAM、I/O埠、CPU、外部的顯示裝置(未圖示)等之間的資料的輸出入之輸出入介面(IF),及將它們相互連接而在各部之間傳達資訊之匯流排。In the
記憶部中,因應在此載入埠1被執行之處理的種類,而記憶有控制手續(動作序列)。也就是說,此記憶部中,存儲有規定的動作程式。本實施形態中的程式,係身為可執行之程式而被存儲於非暫時性的電腦可讀取的記錄媒體(硬碟等)之物。In the memory unit, control procedures (action sequences) are stored in accordance with the type of processing executed in the
ROM,由硬碟、EEPROM、快閃記憶體等所構成,為記憶CPU的動作程式等之記錄媒體。RAM,作用成為CPU的工作區等。I/O埠,例如將CPU所輸出的控制訊號往各部、各機構輸出,或將來自感測器的資訊供給至CPU。ROM is composed of hard disk, EEPROM, flash memory, etc., and is a recording medium that memorizes CPU operation programs, etc. RAM functions as the workspace of the CPU, etc. The I/O port, for example, outputs control signals output by the CPU to various parts and mechanisms, or supplies information from sensors to the CPU.
CPU,構成控制部1C的中樞,執行ROM中記憶的動作程式。CPU,沿著記憶部中記憶的程式來控制載入埠1的動作。The CPU constitutes the core of the
接下來、參照示意動作流程之圖10等,說明本實施形態之載入埠1的使用方法(特別是對照處理方法)及作用。Next, the usage method (especially the comparison processing method) and the function of the
首先,FOUP3或框匣C的其中一方,藉由在沿著搬送室2當中配置了載入埠1之共通的壁面3A而延伸之直線上的搬送線(動線)作動之OHT等搬送容器自動搬送裝置,被搬送至載入埠1的上方,而被載置於載置桌台5上,則本實施形態之載入埠1中,控制部1C會執行藉由就座保持機構6保持於載置桌台5上之就座保持處理St1(參照圖10)。本實施形態中的就座保持處理St1的具體的處理,係將載置桌台5上的鎖定爪61鉤住設於FOUP3的底面或框匣C的底面之被鎖定部(圖示省略)而設為鎖定狀態之處理。藉此,便能將FOUP3或框匣C載置而固定於載置桌台5上的規定的就座位置。當FOUP3被載置於載置桌台5上的情形下,設於載置桌台5之定位用突起51會嵌入FOUP3的定位用凹部。First, one of the
本實施形態中,控制部1C是基於容器判別部1Ca的輸出訊號來判別藉由就座保持機構6保持了FOUP3或框匣C的哪一者(容器判別處理St2)。本實施形態之容器判別處理St2,係藉由容器判別部1Ca來判別載置桌台5上的搬送容器是否為框匣C之處理。又,本實施形態之載入埠1,於當載置桌台5上保持了FOUP3的情形下、與當在載置桌台5上保持了框匣C的情形下令其動作序列相異。In the present embodiment, the
另,本實施形態中,亦能構成為可對朝搬送室2的寬幅方向並排配置3台之載入埠1的載置桌台5各自載置FOUP3或框匣C,而藉由檢測搬送容器(FOUP3、框匣C)在載置桌台5上是否被載置於規定的位置之就座感測器(圖示省略),來檢測搬送容器(FOUP3、框匣C)已被載置於載置桌台5上的就座位置。In addition, in this embodiment, it can also be configured so that the
本實施形態之載入埠1中,控制部1C,當判別在載置桌台5上保持了FOUP3的情形下(容器判別處理St2;No),循以下的處理手續。接續上述的就座保持處理St1,本實施形態之載入埠1中,控制部1C,藉由牽引機構7使載置桌台5從就座位置朝向框4後退至搬送對象物授受位置為止(後方牽引處理St3)。藉由此後方牽引處理St3,能夠將FOUP門32連結(對接;docking)至事先被命令在全閉位置(C)待命之載入埠門8而以緊貼狀態予以保持。本實施形態中,構成為使用設於上述的載入埠門8之卡合部81來將FOUP門32連結至該載入埠門8而以緊貼狀態予以保持。In the
本實施形態之載入埠1中,於FOUP3被載置於載置桌台5上的就座位置之時間點,控制部1C,檢測到FOUP3的底面部已推壓設於載置桌台5之例如加壓感測器,以此為契機,控制部1C,賦予令設於載置桌台5的底部排淨注入用噴嘴及底部排淨排出用噴嘴往比載置桌台5的上面還上方伸進之驅動命令(訊號)。其結果,會將該些各噴嘴(底部排淨注入用噴嘴、底部排淨排出用噴嘴)各自連結至FOUP3的注入口及排出口,成為可執行排淨處理之狀態。In the
然後,本實施形態之載入埠1中,控制部1C發出驅動命令,對FOUP3的內部空間2S執行排淨處理St4。此排淨處理St4,係透過注入口從底部排淨注入用噴嘴對FOUP3的內部空間2S供給規定的環境氣體,而將在此之前滯留於FOUP3的內部空間2S的氣體透過排出口從底部排淨排出用噴嘴予以排出之處理。藉由此排淨處理St4,能夠將FOUP3的內部空間2S以環境氣體填滿,於短時間內使FOUP3內的水分濃度及氧濃度各自降低至規定值以下,而將FOUP3內中的搬送對象物W的周圍環境設為低濕度環境及低氧環境。Then, in the
另,可適用於比被載置於載置桌台5上還之前的時間點事先施加排淨處理之FOUP3,對於這樣的FOUP3可執行排淨處理St4,亦可選擇不執行排淨處理St4。In addition, it is applicable to the
接著,本實施形態之載入埠1中,控制部1C,藉由連結切換機構82,進行解除FOUP門32與FOUP本體32之卡合狀態而設為可將FOUP門32從FOUP本體32拆卸之解閂鎖狀態之處理(解閂鎖處理St5)。Next, in the
接續解閂鎖處理St5,本實施形態之載入埠1中,控制部1C,執行藉由門開閉機構9使載入埠門8從全閉位置(C)往後方移動至門開放位置(O),而將框4的開口部41設為開狀態之處理(門開放處理St6)。具體而言,控制部1C,藉由門開閉機構9使載入埠門8從全閉位置(C)至門開放位置(O)為止沿著上述的水平路徑移動規定距離。此時,載入埠門8,藉由卡合部81將FOUP門32一體地保持而移動。是故,藉由門開放處理St6,FOUP3的搬出入口31亦和框4的開口部41同樣地成為開狀態。Continuing with the unlatching process St5, in the
接下來,本實施形態之載入埠1中,控制部1C,藉由對照機構M進行第2對照處理St7。對照機構M的對照器M2,於門開放處理St6的執行剛完畢後,是被置放於不能對照晶圓位置(P2)(參照圖8(i))。本實施形態中,是將對照器M2的第2對照位置(P2)設定在和不能對照晶圓位置(P2)同一位置,而將門開放處理St6剛完畢後之對照感測器M1的高度位置,設定在比FOUP3內的最上段的狹槽34還稍微上側之位置。將此對照感測器M1的高度位置訂為「第2對照開始高度位置」。按照這樣的本實施形態之載入埠1,可於門開放處理St6剛完畢後進行第2對照處理St7。另,本實施形態之載入埠1,是於比執行第2對照處理St7還之前的時間點執行門開放處理St6,因此框4的開口部41及FOUP3的搬出入口31會處於開狀態。Next, in the
然後,本實施形態之載入埠1中,藉由門開閉機構9使載入埠門8從門開放位置(O)朝向全開位置往下方移動,則對照機構M全體亦往下方移動。藉此,對照器M2,會將前後位置維持在第2對照位置(P2),而從第2對照開始高度位置移動至比最下段的狹槽34還低之位置(第2對照結束高度位置)。控制部1C,循以上手續,檢測形成於對照感測器M1彼此之間的訊號路徑是否被遮擋,而執行對每一狹槽34獲得有關環狀框F的有無或收納姿勢的資訊(搬送對象物檢測資訊)之第2對照處理St7。Then, in the
當第2對照處理St7的結果為「有偵測到」的情形下,能夠辨明載置桌台5上的FOUP3內之狹槽34中收容有環狀框F。另,當環狀框F為放不進FOUP3內之大小的情形下,可設定成依據第2對照處理St7的結果為「有偵測到」,來通報錯誤,而不執行第1對照處理St9(將對照處理停止),亦能設定成根本不執行第2對照處理St7。When the result of the second comparison process St7 is "detected", it can be seen that the annular frame F is accommodated in the
另一方面,當第2對照處理St7的結果為「無偵測到」的情形下,能夠辨明該狹槽34中未收容有環狀框F。On the other hand, when the result of the second comparison process St7 is "no detection", it can be seen that the ring frame F is not accommodated in the
本實施形態之載入埠1中,控制部1C,接續第2對照處理St7,執行令對照器M2從第2對照結束高度位置上昇至第2對照開始高度位置之處理(對照上昇處理St8)。具體而言,本實施形態中的對照上昇處理St8,能夠以藉由門開閉機構9使載入埠門8從全開位置朝向門開放位置(O)往上方移動之處理來執行。In the
接下來,本實施形態之載入埠1中,控制部1C,藉由對照機構M進行第1對照處理St9。具體而言,藉由傾動機構M4使對照器M2從第2對照位置(P2)移動至圖6及圖8(ii)所示之第1對照位置(P1),而將對照器M2置放於對照感測器M1會被配置在FOUP3內之最上段的狹槽34的稍微上側之高度位置(第1對照開始高度位置),而藉由門開閉機構9使載入埠門8從門開放位置(O)朝向全開位置往下方移動,則對照機構M全體亦往下方移動。藉此,對照器M2,會將前後位置維持在第1對照位置(P1),而從第1對照開始高度位置移動至比最下段的狹槽34還低之位置(第1對照結束高度位置)。控制部1C,循以上手續,檢測形成於對照感測器M1彼此之間的訊號路徑是否被遮擋,而執行對每一狹槽34獲得有關晶圓W的有無或收納姿勢的資訊(搬送對象物檢測資訊)之第1對照處理St9。Next, in the
另,於接續對照上昇處理St8而令對照器M2從第2對照位置(P2)移動到了第1對照位置(P1)之時間點,如果對照感測器M1的尺寸條件是會被置放於比FOUP3內的最上段的狹槽34還下側,則只要藉由適當的處理(若為本實施形態,是令對照機構M和載入埠門8一體地往上方移動規定距離之處理),來調整對照器M2的高度位置使得對照感測器M1會被置放於比FOUP3內的最上段的狹槽34還上側即可。In addition, at the time when the comparator M2 moves from the second comparison position (P2) to the first comparison position (P1) following the comparison rising process St8, if the size condition of the comparison sensor M1 is If the
當第1對照處理St9的結果為「有偵測到」的情形下,能夠辨明載置桌台5上的FOUP3內之狹槽34中收容有環狀框F、晶圓W的其中一者。另一方面,當第1對照處理St9的結果為「無偵測到」的情形下,能夠辨明該狹槽34中未收容有晶圓W、環狀框F的任一者。When the result of the first comparison process St9 is "detected", it can be identified that one of the ring frame F and the wafer W is accommodated in the
然後,本實施形態中,如圖11所示,能夠以藉由第1對照處理St9及第2對照處理St7而獲得之搬送對象物檢測資訊的結果,來辨明FOUP3內的收容狀況。也就是說,當第2對照處理St7的偵測結果為「無偵測到」,第1對照處理St9的偵測結果為「有偵測到」的情形下,能夠辨明該狹槽34中收容有晶圓W(正常積載)。此外,當第2對照處理St7的偵測結果為「無偵測到」,第1對照處理St9的偵測結果亦為「無偵測到」的情形下,能夠辨明該狹槽34中未收容有晶圓W、環狀框F的任一者(空狹槽狀態)。Then, in this embodiment, as shown in FIG. 11 , the storage status in the
另一方面,當第2對照處理St7的偵測結果為「有偵測到」,第1對照處理St9的偵測結果亦為「有偵測到」的情形下,能夠辨明該狹槽34中收容有環狀框F、晶圓W的其中一者(混載)。此外,當第2對照處理St7的偵測結果為「有偵測到」,第1對照處理St9的偵測結果為「無偵測到」的情形下,該狹槽34中的收容狀況成為矛盾,因此能夠辨明感測器錯誤。On the other hand, when the detection result of the second comparison process St7 is "detected" and the detection result of the first comparison process St9 is also "detected", it can be identified that the
依以上,於在載置桌台5上保持了FOUP3的狀態下,若第2對照處理St7的偵測結果為「無偵測到」,第1對照處理St9的偵測結果為「有偵測到」,則能夠辨明為在FOUP3內未有晶圓W與環狀框F混載之「正常積載」,若為其以外的偵測結果,則能夠辨明為在FOUP3內混載收容有晶圓W與環狀框F,或是感測器錯誤。According to the above, while FOUP3 is maintained on the placement table 5, if the detection result of the second comparison process St7 is "no detection", the detection result of the first comparison process St9 is "detection ”, it can be identified as “normal loading” in which wafer W and ring frame F are not mixed in FOUP3. If the detection result is other than this, it can be identified that wafer W and ring frame F are mixedly loaded in FOUP3. Ring box F, or sensor error.
接下來,當在載置桌台5上保持了框匣C的情形下說明動作序列。本實施形態之載入埠1中,控制部1C,當判別在載置桌台5上保持了框匣C的情形下(容器判別處理St2;Yes),循以下的處理手續。接續上述的就座保持處理St1,本實施形態之載入埠1中,控制部1C,執行藉由門開閉機構9使載入埠門8從全閉位置(C)往後方移動至門開放位置(O),而將框4的開口部41設為開狀態之處理(門開放處理St6),接續門開放處理St6,藉由牽引機構7使載置桌台5從就座位置朝向框4後退至搬送對象物授受位置(後方牽引處理St3)。Next, the operation sequence will be described in the case where the cassette C is held on the placement table 5 . In the
本實施形態中適用之框匣C的平面尺寸,特別是前後方向的尺寸,比FOUP3的前後方向的尺寸還大,因此當比門開放處理St6還先執行了後方牽引處理St3的情形下,收容於框匣C內之環狀框F或是框匣C本體恐會和載入埠門8接觸。鑑此,本實施形態中,當在載置桌台5上載置了框匣C的情形下,係設定成將門開放處理St6優先於後方牽引處理St3執行。The plane size of the frame C applied to this embodiment, especially the front-to-back direction, is larger than the front-to-back direction size of
此外,本實施形態中適用之框匣C,為開放匣,因此能夠省略排淨處理及解閂鎖處理。另,中間工程、後工程中,搬送室2內的高空間清淨性並不必要,因此作為環狀框F的搬送容器3能夠使用開放匣。In addition, since the frame box C applied to this embodiment is an open box, the draining process and the unlatching process can be omitted. In addition, in the intermediate process and the post-process, high space cleanliness in the
然後,本實施形態之載入埠1中,控制部1C,接續後方牽引處理St3,執行將對照器M2置放於第2對照位置(P2)而進行之第2對照處理St7(參照圖9(i))、對照上昇處理St8、及將對照器M2置放於第1對照位置(P1)而進行之第1對照處理St9(參照圖9(ii))。Then, in the
當第2對照處理St7的結果為「有偵測到」的情形下,能夠辨明載置桌台5上的框匣C內之狹槽C1中收容有環狀框F。另一方面,當第2對照處理St7的結果為「無偵測到」的情形下,能夠辨明該狹槽C1中未收容有環狀框F。When the result of the second comparison process St7 is "detected", it can be seen that the annular frame F is accommodated in the slot C1 in the frame box C placed on the table 5 . On the other hand, when the result of the second comparison process St7 is "no detection", it can be seen that the ring frame F is not accommodated in the slot C1.
當第1對照處理St9的結果為「有偵測到」的情形下,能夠辨明載置桌台5上的框匣C內之狹槽C1中收容有環狀框F、晶圓W的其中一者。另一方面,當第1對照處理St9的結果為「無偵測到」的情形下,能夠辨明該狹槽C1中未收容有晶圓W、環狀框F的任一者。When the result of the first comparison process St9 is "detected", it can be identified that one of the annular frame F and the wafer W is accommodated in the slot C1 in the frame cassette C placed on the table 5 By. On the other hand, when the result of the first comparison process St9 is "no detection", it can be seen that neither the wafer W nor the annular frame F is accommodated in the slot C1.
然後,本實施形態中,如圖11所示,能夠以藉由第1對照處理St9及第2對照處理St7而獲得之搬送對象物檢測資訊的結果,來辨明框匣C內的收容狀況。也就是說,當第2對照處理St7的偵測結果為「有偵測到」,第1對照處理St9的偵測結果亦為「有偵測到」的情形下,能夠辨明該狹槽C1中收容有環狀框F。此外,當第2對照處理St7的偵測結果為「有偵測到」,第1對照處理St9的偵測結果為「無偵測到」的情形下,該狹槽C1中的收容狀況成為矛盾,因此能夠辨明感測器錯誤。Then, in this embodiment, as shown in FIG. 11 , the storage status in the frame box C can be identified based on the results of the conveyed object detection information obtained by the first comparison process St9 and the second comparison process St7. That is to say, when the detection result of the second comparison process St7 is "detected" and the detection result of the first comparison process St9 is also "detected", it can be identified that the gap in the slot C1 Contains Ring Frame F. In addition, when the detection result of the second comparison process St7 is "detected" and the detection result of the first comparison process St9 is "no detection", the storage status in the slot C1 becomes contradictory. , so sensor errors can be identified.
另一方面,當第2對照處理St7的偵測結果為「無偵測到」,第1對照處理St9的偵測結果為「有偵測到」的情形下,能夠辨明該狹槽C1中收容有晶圓W。此外,當第2對照處理St7的偵測結果為「無偵測到」,第1對照處理St9的偵測結果亦為「無偵測到」的情形下,能夠辨明該狹槽34中未收容有環狀框F、晶圓W的任一者(空狹槽狀態)。On the other hand, when the detection result of the second comparison process St7 is "no detection" and the detection result of the first comparison process St9 is "detection", it can be determined that the storage in the slot C1 There is wafer W. In addition, when the detection result of the second comparison process St7 is "no detection" and the detection result of the first comparison process St9 is also "no detection", it can be determined that there is no accommodation in the
依以上,於在載置桌台5上保持了框匣C的狀態下,若第2對照處理St7的偵測結果為「有偵測到」,第1對照處理St9的偵測結果亦為「有偵測到」,則能夠辨明為在框匣C內未有環狀框F與晶圓W混載之「正常積載」,若為其以外的偵測結果,則能夠辨明為在框匣C內混載收容有環狀框F與晶圓W,或是感測器錯誤。According to the above, while the frame box C is held on the placing table 5, if the detection result of the second comparison process St7 is "detected", the detection result of the first comparison process St9 is also "detected". Detected", it can be identified as "normal loading" in which the annular frame F and the wafer W are not mixed in the cassette C. If the detection result is other than this, it can be identified that the wafer W is in the cassette C. Mixed loading contains ring frame F and wafer W, or sensor error.
本實施形態之載入埠1中,在載置桌台5上保持了FOUP3的情形下,在載置桌台5上保持了框匣C的情形下,在它們任一種情形下,控制部1C皆執行第1對照處理、第2對照處理,於該些2次的對照處理結束後,在將對照器M2置放於搬送室2的內部空間之狀態(例如置放於第2對照位置(P2)之狀態)下,執行藉由門開閉機構9使載入埠門8下降至全開位置之處理。藉此,對照機構M,會和往全開位置移動之載入埠門8一起往下方移動。本實施形態之載入埠1中,控制部1C,當基於第1對照處理及第2對照處理的偵測結果而辨明出非混載狀態或感測器錯誤狀態的情形下,係執行從載置桌台5上的FOUP3或框匣C將搬送對象物(晶圓W、環狀框F)藉由搬送機器人21依序往規定的搬送目的地(處理室R(具體而言為載入/載出室)、緩衝工作站、對準器等)搬送之處理。In the
另一方面,當基於第1對照處理及第2對照處理的偵測結果而辨明出為混載狀態或感測器錯誤狀態的情形下,載置桌台5上的FOUP3或框匣C,會藉由搬送容器自動搬送裝置從載置桌台5被移載往其他空間,新的FOUP3或框匣C藉由搬送容器自動搬送裝置被載置於載置桌台5上,而循上述的動作序列。On the other hand, when a mixed load state or a sensor error state is determined based on the detection results of the first comparison process and the second comparison process, the
按照以上所述本實施形態之載入埠1,可使用對照有關包括FOUP3內的各狹槽34中的第1搬送對象物(晶圓W)的有無之狀態的資訊之對照機構M,來執行第2對照處理,而藉由第2對照處理來對照有關包括第2搬送容器(框匣C)內的各狹槽C1中的第2搬送對象物(環狀框F)的有無之狀態的資訊,基於第1對照處理的偵測結果與第2對照處理的偵測結果之雙方、或其中一方,而可辨明平面尺寸相異的搬送對象物W是否混載於載置桌台5上的FOUP3或框匣C內。是故,按照本實施形態之載入埠1,無需大幅變更以往的載入埠的構成,避免對照機構M的大型化及構造的複雜化,於中間工程以後,即使採用將互相平面尺寸相異的搬送對象物(晶圓W、環狀框F)利用共通的載入埠1來收容至載置於載入埠1上之FOUP3(第1搬送容器)或框匣C(第2搬送容器)而取用之使用形態的情形下,仍可偵測相異的搬送對象物(晶圓W、環狀框F)在FOUP3或框匣C中被誤混載(誤投入/誤積載),而能夠謀求半導體製造中的運用率提升。As described above, the
又,本實施形態中,構成為藉由分別置放於第1對照位置(P1)或第2對照位置(P2)之對照器M2來偵測令載置桌台5上的工件中心互相一致之搬送對象物(晶圓W、環狀框F)的端部。也就是說,本實施形態中,是構成為於第1搬送對象物(晶圓W)及第2搬送對象物(環狀框F)在第1搬送容器(FOUP3)內或第2搬送容器(框匣C)內以彼此的中心位置相互一致之方式被收容之狀態下執行對照處理(第1對照處理、第2對照處理),因此不必因應搬送對象物(晶圓W、環狀框F)的尺寸來變更搬送機器人21所做的搬送對象物之搬送距離或搬送位置,能夠謀求控制的簡化。Furthermore, in this embodiment, the collimator M2 placed at the first collation position (P1) or the second collation position (P2) is configured to detect that the centers of the workpieces placed on the table 5 are consistent with each other. The end portion of the transfer object (wafer W, ring frame F). That is, in this embodiment, the first transfer object (wafer W) and the second transfer object (ring frame F) are configured in the first transfer container (FOUP3) or the second transfer container (FOUP3). The comparison process (first comparison process, second comparison process) is performed in a state where the center positions of each other are accommodated in the cassette C) so that they coincide with each other, so there is no need to cope with the transfer target (wafer W, ring frame F) By changing the transport distance or transport position of the transport object by the
再加上,按照本實施形態之載入埠1,控制部1C,具有判別藉由就座保持機構6保持了FOUP3或框匣C的哪一者之容器判別部1Ca,因此可基於容器判別部1Ca所做的判別資訊,基於事先設定好的動作序列如就座保持處理、門開放處理、後方牽引處理、第1對照處理、第2對照處理的順序,或進行第1對照處理及第2對照處理雙方、或是僅進行其中一方的對照處理等,來自動控制各機構的動作。In addition, according to the
特別是,本實施形態之載入埠1中,當判斷出藉由就座保持機構6保持了框匣C之搬送容器為框匣C的情形下,依序執行了就座保持處理、門開放處理、後方牽引處理之後,執行第1對照處理及第2對照處理雙方,藉此便能避免框匣C和載入埠門8衝撞之事態。In particular, in the
此外,按照本實施形態中採用之載入埠1中的對照處理方法,會發揮如同上述的載入埠所發揮的種種作用效果之作用效果,能夠謀求半導體製造中的運用率提升。In addition, according to the comparison processing method in the
另,本發明並不限於上述實施形態。例如,上述實施形態中,作為第1搬送對象物係示例晶圓,作為和第1搬送對象物平面尺寸相異的第2搬送對象物係示例了保持中間處理完畢的薄晶圓之環狀框,但第1搬送對象物、第2搬送對象物不限定於它們。收容第2搬送對象物之第2搬送容器亦不限定於框匣,只要是和第2搬送對象物的尺寸等相應之適當的搬送容器即可。作為搬送容器,亦能適用附門的框匣。在此情形下,需要將匣門卸下之處理(解閂鎖處理)。In addition, the present invention is not limited to the above-described embodiment. For example, in the above embodiment, a wafer is exemplified as the first transfer object, and a ring-shaped frame holding a thin wafer that has been processed in the intermediate process is exemplified as the second transfer object having a different plane size from the first transfer object. , but the first conveyance object and the second conveyance object are not limited to them. The second transport container for accommodating the second transport object is not limited to the frame box, and may be an appropriate transport container corresponding to the size of the second transport object. As a transport container, a frame box with a door can also be used. In this case, the door needs to be removed (unlatched).
此外,第2搬送對象物為比第1搬送對象物平面尺寸還小之物亦無妨。在此情形下,執行關於第2搬送對象物之對照處理(第2對照處理)時的對照器的位置(第2對照位置),會成為比執行關於第1搬送對象物之對照處理(第1對照處理)時的對照器的位置(第1對照位置)還前方。In addition, the second conveyance object may be smaller in planar size than the first conveyance object. In this case, the position of the comparator (the second comparison position) when performing the comparison process (the second comparison process) on the second conveyance object will be different from the position when the comparison process (the first comparison process) on the first conveyance object is executed. The position of the comparator (the first comparison position) during the comparison processing) is still forward.
本發明中的「第1對照位置」及「第2對照位置」,可因應第1搬送對象物及第2搬送對象物的平面尺寸來適當設定,第2對照位置亦可為和上述實施形態中的不能對照晶圓位置相異之位置。按照本發明,從生產性提升的觀點看來,對於晶圓的大徑化進展,而從目前為止的直徑300(半徑150)mm往直徑450(半徑225)mm乃至直徑500(半徑250)mm的晶圓轉變推進這樣近來的傾向亦能良好地對應。也就是說,不僅是上述這樣半導體製造的中間工程、後工程,於初期工程中亦可以本發明之載入埠來取用2種類的尺寸不同的搬送對象物與和其相應之2種類的搬送容器,而進行正確的對照處理。The "first comparison position" and the "second comparison position" in the present invention can be appropriately set according to the planar dimensions of the first conveyance object and the second conveyance object. The second comparison position can also be the same as in the above embodiment. It is impossible to compare the positions of different wafer positions. According to the present invention, from the viewpoint of productivity improvement, the wafer diameter is being enlarged, from the current diameter of 300 mm (radius 150) mm to a diameter of 450 mm (radius 225) mm or even a diameter of 500 (radius 250) mm. It can also respond well to recent trends such as the advancement of wafer transformation. In other words, not only in the intermediate process and post-process of semiconductor manufacturing as mentioned above, but also in the initial process, the load port of the present invention can be used to access two types of transportation objects with different sizes and two types of transportation corresponding thereto. Containers for proper control processing.
能夠適當變更將對照器置放於第1對照位置而執行之第1對照處理、及將對照器置放於第2對照位置而執行之第2對照處理的順序。此外,當第1或第2搬送容器中根本不會混載目的以外的搬送對象物之狀況下,亦能一面使用1種類的載入埠來取用2種類的搬送容器、2種類的搬送對象物,一面僅執行和搬送容器及搬送對象物相應之第1對照處理或第2對照處理的其中一方。The order of the first collation process executed by placing the colarator at the first collation position and the second collation process executed by placing the colarator at the second collation position can be appropriately changed. In addition, when there are no mixed objects to be transported in the first or second transport container, it is possible to use one type of loading port to access two types of transport containers and two types of transport objects. , only one of the first comparison processing or the second comparison processing corresponding to the transportation container and the transportation object is executed.
上述實施形態中,對照機構的對照移動部(對照臂),係示例了滿足藉由門開閉機構而和載入埠門一起朝前後方向及上下方向動作,且和門開閉機構獨立地動作之第2動作條件的雙方之物,但只要為滿足它們其中一方的條件之物即可。例如,能夠適用構成為具備使對照移動部往前後方向水平移動之滑動機構,而藉由滑動機構使對照器在第1對照位置與第2對照位置之間前後移動之對照機構,或採用藉由和門開閉機構不同的移動機構來使對照機構朝高度方向之構成。此外,對照機構,只要是於藉由門開閉機構將框的開口部設為開狀態之狀態下可實施對照處理之物即可,本發明中所謂「將框的開口部設為開狀態之狀態」,為涵括上述實施形態中將載入埠門置放於門開放位置之狀態、及置放於全開位置之狀態的雙方之概念。對照機構,只要為和載入埠門的升降移動獨立而可升降移動之物,則亦可於將載入埠門置放於相當於上述實施形態中的門開放位置之位置的狀態下實施對照處理,亦可於將門置放於相當於上述實施形態中的全開位置之位置的狀態下實施對照處理。In the above-mentioned embodiment, the collation moving part (collation arm) of the collation mechanism is exemplified by the door opening and closing mechanism that moves in the front-rear direction and the up-down direction together with the loading port door, and operates independently from the door opening and closing mechanism. 2. Things that meet both action conditions, as long as it satisfies one of the conditions. For example, it is possible to apply a collation mechanism that has a sliding mechanism that horizontally moves the collating moving part in the front-rear direction, and uses the sliding mechanism to move the collating device back and forth between the first collating position and the second collating position, or it can be applied. A moving mechanism different from the door opening and closing mechanism is used to move the control mechanism in the height direction. In addition, the collation mechanism may be anything that can perform the collation process in a state in which the opening of the frame is opened by the door opening and closing mechanism. In the present invention, the so-called "state in which the opening of the frame is opened" is used. ” is a concept that includes both the state in which the loading port door is placed in the door-open position and the state in which it is placed in the fully-open position in the above embodiment. As long as the comparison mechanism is a thing that can move up and down independently of the lifting movement of the load port, the comparison can also be performed with the load port door placed at a position equivalent to the door open position in the above embodiment. The comparison process may be performed with the door placed at a position corresponding to the fully open position in the above-mentioned embodiment.
此外,本發明中,作為對照機構,能夠適用下述之物,即,具備:在先端部具有對照感測器之對照器;及對照移動部,將對照器的基端部或基端部鄰近予以可水平或略水平迴旋地支撐,且通過處於開狀態的框的開口部而使對照器移動至可藉由對照感測器偵測第1搬送容器(FOUP)中收容有第1搬送對象物之第1對照位置。在此情形下,例如對照移動部,係具備:作為對照感測器的迴旋中心之左右一對的迴旋軸;及使迴旋軸適當朝正逆方向同步旋轉之驅動部;及收容迴旋軸及驅動部的至少一部分或全部之機殼;將機殼做成安裝於載入埠門的適當處之構成,而能夠將對照器設定成可在第1對照位置、與不能藉由對照感測器偵測第1搬送容器中收容有第1搬送對象物的不能對照晶圓位置之間繞迴旋軸移動。又,能夠採用設計成將對照器的迴旋角度(例如以安裝於不能對照位置之對照器為基準之迴旋角度)設定為和使其從不能對照位置移動至第1對照位置時之迴旋角度相異的值,藉此通過處於開狀態的框的開口部而將對照器置放於可藉由對照感測器偵測第2搬送容器中收容有第2搬送對象物之第2對照位置之構成(第1構成),或是設計成將對照器的迴旋角度設定為和使其從不能對照位置移動至第1對照位置時之迴旋角度相同的值,且控制載入埠門的前後方向的進退動作(前進、後退),藉此將對照器置放於第2對照位置之構成(第2構成)。若為第1構成,則可將對照器的第2對照位置與不能對照位置設定為同一位置,而另一方面若為第2構成,則第2對照位置與不能對照位置必然地會成為相異位置。即使是這樣的對照機構,仍能在將對照器置放於第1對照位置之狀態下使載入埠門適當升降移動,藉此使對照機構全體升降而實施第1對照處理,而能在將對照器置放於第2對照位置之狀態下使載入埠門適當升降移動,藉此使對照機構全體升降而實施第2對照處理。若為這樣的構成,則上述實施形態中的對照臂或傾動機構便不需要。In addition, in the present invention, the following can be applied as the collation mechanism, that is, a collimator having a collimator having a collimator sensor at a distal end portion; and a collimator moving portion that moves the proximal end portion or the proximal end portion of the collimator adjacent to the collimator. It is supported so as to be able to rotate horizontally or slightly horizontally, and the collimator is moved through the opening of the frame in the open state to a position where the collation sensor can detect that the first transport object is accommodated in the first transport container (FOUP). The first comparison position. In this case, for example, the comparison moving part is provided with: a pair of left and right rotation shafts as the rotation center of the comparison sensor; a driving part that appropriately and synchronously rotates the rotation shaft in the forward and reverse directions; and accommodating the rotation shaft and the drive part. At least a part or all of the chassis; the chassis is configured to be installed at a suitable place on the load port, so that the comparator can be set to be in the first comparison position, and not to be detected by the comparison sensor. It is detected that the first transfer object contained in the first transfer container cannot move around the rotation axis between the wafer positions. Furthermore, a design may be adopted in which the rotation angle of the comparator (for example, the rotation angle based on the comparator installed at the non-colariable position) is set to be different from the rotation angle when the comparator is moved from the non-colariable position to the first collation position. value, whereby the collimator is placed at the second collation position where the second transport object is stored in the second transport container through the collation sensor through the opening of the frame in the open state ( The first configuration), or is designed to set the rotation angle of the comparator to the same value as the rotation angle when it moves from the non-comparison position to the first comparison position, and to control the forward and backward movement of the loading port in the forward and backward directions. (forward, backward), thereby placing the comparator in the second comparison position (second configuration). With the first configuration, the second comparison position and the non-comparison position of the comparator can be set to the same position. On the other hand, with the second configuration, the second comparison position and the non-comparison position will inevitably be different. Location. Even with such a collation mechanism, the loading port can be moved up and down appropriately with the comparator placed in the first collation position, thereby raising and lowering the entire collation mechanism to perform the first collation process. With the comparator placed in the second collation position, the load port is moved up and down appropriately, thereby raising and lowering the entire collation mechanism to perform the second collation process. With such a structure, the control arm or the tilting mechanism in the above-mentioned embodiment is unnecessary.
此外,亦可藉由搬送機器人將搬送對象物(第1搬送對象物、第2搬送對象物)收容到了載入埠上的搬送容器(第1搬送容器、第2搬送容器)之後,也進行第1對照處理、第2對照處理的雙方或一方,來辨明是否為混載狀態。In addition, after the transportation object (the first transportation object and the second transportation object) is stored in the transportation container (the first transportation container and the second transportation container) on the loading port by the transportation robot, the second transportation object may also be carried out. Both or one of the 1st comparison process and the 2nd comparison process is used to identify whether it is a mixed load state.
另,就座保持機構、牽引機構、門開閉機構等各機構的具體構成或驅動源亦能適當變更。In addition, the specific structure and driving source of each mechanism such as the seating retention mechanism, the traction mechanism, and the door opening and closing mechanism can also be appropriately changed.
作為判別藉由保持就座保持機構保持了種類相異的搬送容器(若為上述實施形態則為FOUP、框匣)的哪一者之容器判別部,亦可適用藉由是否偵測到載置平台上的搬送容器為FOUP,來判別搬送容器。As a container discriminating unit for discriminating which of different types of transport containers (FOUP or cassette in the above embodiment) is held by the seating holding mechanism, it can also be applied by detecting whether the placement The transport container on the platform is FOUP to identify the transport container.
本發明之載入埠,如上述般可作為構成EFEM的一部分之物來使用,亦能適用於EFEM以外的搬送裝置。The loading port of the present invention can be used as a part of the EFEM as described above, and can also be applied to transport devices other than the EFEM.
此外,例如亦可作為構成篩選裝置的一部分之物來使用,該篩選裝置是在搬送室的壁面配置複數個本發明之載入埠,而可藉由配置於搬送室內的搬送機器人在載置於各載入埠的載置桌台上之搬送容器間抽換搬送對象物。In addition, for example, it can also be used as a part of a screening device in which a plurality of loading ports of the present invention are arranged on the wall of a transfer chamber, and can be placed on the transfer chamber by a transfer robot. The objects to be transported are exchanged between the transport containers on the loading table of each loading port.
本發明之載入埠所鄰接配置的搬送室,為在內部空間具備有搬送機器人之物。本發明中,可將對於各載入埠的載置桌台上的搬送容器(第1搬送容器、第2搬送容器)而言之搬送對象物(第1搬送對象物、第2搬送對象物)的搬出入處理,構成為以單一的搬送機器人來進行之態樣、或是構成為以複數個搬送機器人來進行之態樣的任一種。作為搬送機器人,能夠適用具有3個以上的搬送對象物把持部(若為上述實施形態則為機械手)之物。此外,作為搬送機器人,能夠適用具有1個搬送對象物把持部之物。此外,亦能適用搬送對象物把持部是由機械手以外的規定部件等所構成之搬送機器人。The transfer chamber arranged adjacent to the loading port of the present invention is equipped with a transfer robot in the internal space. In the present invention, the objects to be transported (the first object to be transported, the second object to be transported) for the transport containers (the first transport container, the second transport container) on the placement table of each loading port can be The loading and unloading processing may be performed by a single transfer robot or may be performed by a plurality of transfer robots. As the transfer robot, a thing having three or more transfer object holding parts (manipulators in the case of the above embodiment) can be applied. In addition, as the transfer robot, a thing having one transfer target object holding part can be applied. In addition, it can also be applied to a transport robot in which the transport object holding part is composed of predetermined components other than the robot arm.
配置於搬送室的壁面之載入埠亦可為1台。上述實施形態中,示例了載入埠的框係構成為搬送室的外壁的一部分之態樣,但框亦可為沿著搬送室的外壁而設置之物。There can also be one loading port arranged on the wall of the transfer room. In the above embodiment, the frame of the load port is configured as a part of the outer wall of the transfer chamber. However, the frame may be provided along the outer wall of the transfer chamber.
上述實施形態,作為搬送對象物示例了晶圓,但搬送對象物亦可為倍縮光罩(reticle)、液晶搬送對象物、玻璃搬送對象物、培養平板(culture plate)、培養容器、碟、或培養皿等。也就是說,本發明能夠適用於將收容於半導體、液晶、細胞培養等各種領域中的容器之搬送對象予以授受之載入埠。In the above embodiment, the wafer is exemplified as the transfer object, but the transfer object may also be a reticle, a liquid crystal transfer object, a glass transfer object, a culture plate (culture plate), a culture container, a dish, Or a petri dish, etc. In other words, the present invention can be applied to a loading port for transferring objects contained in containers in various fields such as semiconductors, liquid crystals, and cell culture.
鄰接於搬送室而設置之處理室的處理內容或數量亦能適當變更。The processing content or quantity of the processing chamber installed adjacent to the transfer chamber can also be changed appropriately.
上述實施形態中,示例了載入埠具備控制部,由控制部來掌控載入埠門的移動等各部的作動之態樣,但亦可構成為藉由掌控載入埠的上位裝置(若為上述實施形態則為EFEM、或是處理室)的作動之控制部(上位控制器亦即上述的EFEM全體的控制部或處理室的控制部)來一併掌控載入埠的作動。In the above embodiment, the load port is provided with a control unit, and the control unit controls the movement of the load port and other operations of the components. However, the load port may also be configured to be controlled by a higher-level device (in the case of In the above-mentioned embodiment, the operation control unit of the EFEM or the processing chamber (the upper controller is the control unit of the entire EFEM or the control unit of the processing chamber) collectively controls the operation of the load port.
此外,上述的控制部,不依賴專用的系統,而可使用通常的電腦系統來實現。例如,能夠在汎用電腦中從存儲有用來執行上述處理的程式之記錄媒體(軟碟、CD-ROM等)安裝該程式,藉此構成執行上述處理之控制部。又,用來供給該些程式之手段為任意。除能夠上述般透過規定的記錄媒體來供給外,例如亦可透過通訊線路、通訊網路、通訊系統等來供給。在此情形下,例如亦可在通訊網路的布告欄(BBS)公布該程式,而將其透過網路來疊加至載波來提供。又,能夠藉由起動像這樣被提供的程式,於OS的控制下如同其他應用程式般執行,來執行上述處理。In addition, the above-mentioned control unit does not rely on a dedicated system, but can be implemented using a common computer system. For example, a control unit for executing the above-mentioned processing can be configured in a general-purpose computer by installing the program from a recording medium (floppy disk, CD-ROM, etc.) storing the program for executing the above-mentioned processing. In addition, the means used to provide these programs are arbitrary. In addition to being provided through prescribed recording media as mentioned above, it can also be provided through communication lines, communication networks, communication systems, etc., for example. In this case, for example, the program can also be published on a bulletin board (BBS) of the communication network, and then superimposed on the carrier through the network to provide it. In addition, the above-mentioned processing can be performed by activating the program provided in this way and executing it like other applications under the control of the OS.
除此之外,有關各部分的具體構成亦不限於上述實施形態,在不脫離本發明要旨之範圍內可為各種變形。In addition, the specific configuration of each part is not limited to the above-described embodiment, and various modifications can be made without departing from the gist of the present invention.
1:載入埠
1C:(載入埠1的)控制部
1Ca:容器判別部
2:搬送室
2C:(EFEM全體的)控制部
21:搬送機器人
4:框
41:開口部
3:FOUP
32:FOUP門
34:狹槽
5:載置桌台
6:就座保持機構
7:牽引機構
8:載入埠門
9:門開閉機構
C:第2搬送容器(框匣)
F:第2搬送對象物(環狀框)
M:對照機構
M1:對照感測器
M2:對照器
M3:對照移動部(對照臂)
RC:(處理室R的)控制部
W:第1搬送對象物(晶圓)
1:
[圖1]揭示具備了本發明一實施形態之載入埠的EFEM及其周邊裝置的相對位置關係之模型化示意側面圖。 [圖2]將圖1所示相對位置關係簡化後的平面圖。 [圖3]同實施形態之載入埠的立體圖。 [圖4]同實施形態之載入埠一部分省略示意正面圖。 [圖5]在載置桌台上載置有框匣且載入埠門處於門開放位置之狀態的同實施形態之載入埠的側面圖。 [圖6]對應於圖5而示意將對照器置放至第1對照位置的狀態之圖。 [圖7]同實施形態中的搬送對象物的平面圖。 [圖8]對於收容在FOUP內的狹槽的第1搬送對象物之對照機構的對照處理動作模型化示意圖。 [圖9]對於收容在第2搬送容器內的狹槽的第2搬送對象物之對照機構的對照處理動作模型化示意圖。 [圖10]本實施形態中的載入埠的動作手續示意流程圖。 [圖11]本實施形態中的第1對照處理及第2對照處理之偵測狀況及對照結果示意圖表。 [Fig. 1] A modeled schematic side view showing the relative positional relationship between an EFEM equipped with a load port and its peripheral devices according to an embodiment of the present invention. [Fig. 2] A simplified plan view of the relative positional relationship shown in Fig. 1. [Fig. 3] A perspective view of the loading port of the same embodiment. [Fig. 4] A front view of the same embodiment with part of the loading port omitted. [Fig. 5] A side view of the loading port of the same embodiment with the cassette placed on the loading table and the loading port door in the open position. [Fig. 6] A diagram corresponding to Fig. 5 illustrating a state in which the comparator is placed in the first collation position. [Fig. 7] A plan view of the object to be transported in the same embodiment. [Fig. 8] A schematic diagram illustrating a model of the comparison processing operation of the comparison mechanism for the first conveyance object accommodated in the slot in the FOUP. [Fig. 9] A schematic diagram illustrating a model of the comparison processing operation of the comparison mechanism for the second conveyance object contained in the slot in the second conveyance container. [Fig. 10] A flowchart illustrating the operation procedure of the load port in this embodiment. [Fig. 11] A diagram illustrating the detection status and comparison results of the first comparison process and the second comparison process in this embodiment.
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JP7238126B2 (en) * | 2019-06-27 | 2023-03-13 | 川崎重工業株式会社 | Substrate mapping device, its mapping method, and mapping teaching method |
CN110444493B (en) * | 2019-08-15 | 2021-03-16 | 德淮半导体有限公司 | Device for preventing arm from impacting wafer |
KR102127008B1 (en) * | 2019-11-11 | 2020-06-29 | 주식회사 케이씨티 | Mapping Device Combined Opening and Closing Door for Loadport Module |
TWI832287B (en) * | 2022-06-10 | 2024-02-11 | 樂華科技股份有限公司 | Wafer storage device and method |
CN116190278B (en) * | 2023-03-13 | 2023-07-28 | 上海果纳半导体技术有限公司 | Wafer detection mechanism and wafer loading device |
CN116666284B (en) * | 2023-06-28 | 2024-06-21 | 江苏圣创半导体科技有限公司 | Wafer loader |
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