TWI811477B - Surface protection film and optical components - Google Patents

Surface protection film and optical components Download PDF

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TWI811477B
TWI811477B TW108140053A TW108140053A TWI811477B TW I811477 B TWI811477 B TW I811477B TW 108140053 A TW108140053 A TW 108140053A TW 108140053 A TW108140053 A TW 108140053A TW I811477 B TWI811477 B TW I811477B
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film
meth
acid
mpa
base film
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TW202028394A (en
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山形真人
沖田奈津子
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日商日東電工股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/29Laminated material
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J175/00Adhesives based on polyureas or polyurethanes; Adhesives based on derivatives of such polymers
    • C09J175/04Polyurethanes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • C09J7/25Plastics; Metallised plastics based on macromolecular compounds obtained otherwise than by reactions involving only carbon-to-carbon unsaturated bonds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Laminated Bodies (AREA)
  • Pens And Brushes (AREA)
  • Prostheses (AREA)
  • Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)

Abstract

本發明之目的在於提供一種適合對具有彎曲部位或撓曲部位等非平坦部位之保護對象面進行被覆保護之表面保護膜、及伴隨有此種表面保護膜之光學構件。 作為本發明之表面保護膜之膜10具有包含基材膜11及黏著劑層12之積層構造。基材膜11之130℃下之儲存彈性模數為700 MPa以下,且基材膜11之30℃下之儲存彈性模數為1000 MPa以上。本發明之光學構件20包含作為表面保護膜之膜10。An object of the present invention is to provide a surface protective film suitable for covering and protecting a surface to be protected having a non-flat portion such as a curved portion or a flexed portion, and an optical member accompanied by such a surface protective film. The film 10 as the surface protective film of the present invention has a laminated structure including a base film 11 and an adhesive layer 12 . The storage elastic modulus of the base film 11 at 130°C is 700 MPa or less, and the storage elastic modulus of the base film 11 at 30°C is more than 1000 MPa. The optical member 20 of the present invention includes the film 10 as a surface protective film.

Description

表面保護膜及光學構件Surface protective film and optical components

本發明係關於一種表面保護膜及附帶有其之光學構件。The present invention relates to a surface protective film and an optical member provided with the same.

近年來,於多種技術領域利用具有較高之透明性之表面保護膜。例如於平板顯示器(FPD)之技術領域中,組入至FPD之各種光學構件存在為了保護其製造過程、或檢查步驟、輸送過程等中之表面,而於構件表面貼合表面保護膜之情況。關於此種表面保護膜,例如記載於下述專利文獻1、2中。 先前技術文獻 專利文獻In recent years, surface protective films with higher transparency have been used in various technical fields. For example, in the technical field of flat panel displays (FPDs), various optical components incorporated into the FPD sometimes have surface protective films attached to their surfaces in order to protect their surfaces during the manufacturing process, inspection steps, transportation processes, etc. Such a surface protective film is described in the following Patent Documents 1 and 2, for example. Prior technical literature patent documents

專利文獻1:日本專利特開2012-17399號公報 專利文獻2:日本專利特開2016-74899號公報Patent Document 1: Japanese Patent Application Publication No. 2012-17399 Patent Document 2: Japanese Patent Application Publication No. 2016-74899

[發明所欲解決之問題][Problem to be solved by the invention]

作為有利用表面保護膜對表面進行被覆保護之情況之光學構件之一例,可列舉顯示器用之覆蓋玻璃等透明之覆蓋構件。顯示器用之類之覆蓋構件存在如下情況,即,以於其外觀表面包含彎曲部位或撓曲部位等非平坦部位之方式進行圖案設計。An example of an optical member whose surface is covered and protected by a surface protective film is a transparent covering member such as a cover glass for a display. Cover members for displays and the like may be patterned so as to include uneven portions such as curved portions and deflected portions on the outer surface.

然而,先前之表面保護膜存在如下情況,即,即便嘗試對包含彎曲部位或撓曲部位等非平坦部位之保護對象面進行貼合,亦無法充分地追隨非平坦部位之表面形狀(非平坦表面形狀),而於該非平坦部位產生不貼著於保護對象面之部分。又,先前之表面保護膜存在如下情況,即,即便於暫時地追隨上述非平坦表面形狀之情形時,亦無法維持自身之該追隨形狀,而於該非平坦部位產生剝離。However, there is a case where the conventional surface protection film cannot fully follow the surface shape of the non-flat part (non-flat surface) even if it is tried to be bonded to a surface to be protected including a non-flat part such as a curved part or a flexed part. Shape), and a portion that is not attached to the surface to be protected is produced in the non-flat area. In addition, there is a case where the conventional surface protective film cannot maintain the following shape even when it temporarily follows the non-flat surface shape, and peeling occurs at the non-flat portion.

本發明係基於如上所述之情況而想出,目的在於提供一種適合對包含彎曲部位或撓曲部位等非平坦部位之保護對象面進行被覆保護之表面保護膜、及附帶有此種表面保護膜之光學構件。 [解決問題之技術手段]The present invention was conceived based on the above situation, and aims to provide a surface protective film suitable for covering and protecting a surface to be protected including a non-flat portion such as a curved portion or a flexed portion, and a surface protective film attached thereto. optical components. [Technical means to solve problems]

根據本發明之第1態樣,提供一種表面保護膜。該表面保護膜具有包含基材膜及黏著劑層之積層構造。基材膜之130℃下之儲存彈性模數(第1儲存彈性模數)為700 MPa以下,較佳為500 MPa以下,更佳為300 MPa以下,更佳為200 MPa以下,更佳為100 MPa以下,更佳為80 MPa以下。基材膜之30℃下之儲存彈性模數(第2儲存彈性模數)為1000 MPa以上,較佳為1500 MPa以上,更佳為2000 MPa以上,更佳為2500 MPa以上,更佳為2700 MPa以上,更佳為2800 MPa以上。基材膜之80℃下之儲存彈性模數為第1儲存彈性模數以上且為第2儲存彈性模數以下,例如為700~1100 MPa,較佳為700~1000 MPa。又,本表面保護膜之黏著劑層例如含有丙烯酸系聚合物及/或胺基甲酸酯系聚合物作為黏著劑。此種構成之表面保護膜係於其黏著劑層側貼合於被黏著體之保護對象面而使用。According to a first aspect of the present invention, a surface protective film is provided. The surface protective film has a laminated structure including a base film and an adhesive layer. The storage elastic modulus (first storage elastic modulus) of the base film at 130°C is 700 MPa or less, preferably 500 MPa or less, more preferably 300 MPa or less, more preferably 200 MPa or less, more preferably 100 MPa or less. MPa or less, more preferably 80 MPa or less. The storage elastic modulus (second storage elastic modulus) of the base film at 30°C is 1000 MPa or more, preferably 1500 MPa or more, more preferably 2000 MPa or more, more preferably 2500 MPa or more, more preferably 2700 MPa or above, more preferably 2800 MPa or above. The storage elastic modulus of the base film at 80° C. is not less than the first storage elastic modulus and not more than the second storage elastic modulus, for example, 700 to 1100 MPa, preferably 700 to 1000 MPa. Moreover, the adhesive layer of this surface protection film contains, for example, an acrylic polymer and/or a urethane polymer as an adhesive. The surface protective film with this structure is used with its adhesive layer side attached to the protected surface of the adherend.

本表面保護膜之基材膜如上所述,130℃下之儲存彈性模數為700 MPa以下,較佳為500 MPa以下,更佳為300 MPa以下,更佳為200 MPa以下,更佳為100 MPa以下,更佳為80 MPa以下。此種構成適合:對於包含彎曲部位或撓曲部位等非平坦部位之被黏著體保護對象面,使表面保護膜一面於例如藉由向100℃左右以上加熱而充分地軟化之狀態下追隨非平坦部位之表面形狀,一面進行貼合。The base material film of this surface protection film is as mentioned above. The storage elastic modulus at 130°C is 700 MPa or less, preferably 500 MPa or less, more preferably 300 MPa or less, more preferably 200 MPa or less, more preferably 100 MPa or less, more preferably 80 MPa or less. This structure is suitable for making the surface of the adherend to be protected including a curved portion or a flexure portion and other uneven portions, so that the surface protective film can follow the unevenness in a state that is sufficiently softened by, for example, heating to about 100°C or above. The surface shape of the part is adhered to one side.

此外,本表面保護膜之基材膜如上所述,30℃下之儲存彈性模數為1000 MPa以上,較佳為1500 MPa以上,更佳為2000 MPa以上,更佳為2500 MPa以上,更佳為2700 MPa以上,更佳為2800 MPa以上。此種構成適合:對於包含彎曲部位或撓曲部位等非平坦部位之被黏著體保護對象面,在表面保護膜一面例如藉由向100℃左右以上加熱而充分地軟化從而追隨非平坦部位之表面形狀,一面被貼合於該保護對象面後,於該膜降溫至室溫左右之狀態下維持表面保護膜對非平坦表面形狀之追隨形狀。In addition, as mentioned above, the base film of this surface protection film has a storage elastic modulus at 30°C of 1000 MPa or more, preferably 1500 MPa or more, more preferably 2000 MPa or more, more preferably 2500 MPa or more, even more preferably It is 2700 MPa or more, more preferably, it is 2800 MPa or more. This structure is suitable for a surface to be protected by an adherend that contains uneven parts such as curved parts or flexure parts. The surface protective film side is sufficiently softened by heating to about 100°C or above, for example, so that it can follow the surface of the uneven parts. After one side is attached to the surface to be protected, the shape of the surface protection film that follows the shape of the non-flat surface is maintained when the film is cooled to about room temperature.

如上所述,本表面保護膜適合:一面於例如藉由向100℃左右以上加熱而充分地軟化之狀態下追隨保護對象面內之非平坦表面形狀,一面貼合於該保護對象面;並且適合:於此種貼合後之室溫左右之溫度條件下維持對非平坦表面形狀之追隨形狀。此種本表面保護膜就對具有彎曲部位或撓曲部位等非平坦部位之保護對象面進行被覆保護方面而言較佳。As described above, this surface protective film is suitable for following the non-flat surface shape in the surface to be protected while being adhered to the surface to be protected in a state that is sufficiently softened by heating to about 100°C or above, for example. : Maintaining the shape following non-flat surface shapes under temperature conditions around room temperature after bonding. This surface protective film is suitable for covering and protecting a surface to be protected that has a non-flat portion such as a curved portion or a flexed portion.

構成上述基材膜之材料較佳為包含聚酯。該構成就容易實現較佳之儲存彈性模數(第1儲存彈性模數、第2儲存彈性模數)等方面而言較佳。The material constituting the base film preferably contains polyester. This configuration is preferable in that it is easy to achieve better storage elastic modulus (first storage elastic modulus, second storage elastic modulus).

於本表面保護膜中,基材膜較佳為具有包含抗靜電層之積層構造。抗靜電層較佳為含有具有四級銨基之抗靜電劑及/或導電性聚合物。該等構成適合防止或抑制本表面保護膜之帶電。表面保護膜之帶電之防止或抑制適合對表面保護膜確保向保護對象面之貼合作業等之操作容易性。又,表面保護膜之帶電之防止或抑制適合防止或抑制塵埃等微小異物進入至表面保護膜與被貼合其之保護對象面之間。In this surface protection film, the base film preferably has a laminated structure including an antistatic layer. The antistatic layer preferably contains an antistatic agent having a quaternary ammonium group and/or a conductive polymer. These structures are suitable for preventing or inhibiting the charging of the surface protective film. The prevention or suppression of electrification of the surface protective film is suitable for the ease of operation such as ensuring the adhesion of the surface protective film to the surface to be protected. Furthermore, the prevention or suppression of electrification of the surface protective film is suitable for preventing or suppressing minute foreign matter such as dust from entering between the surface protective film and the surface to be protected to which it is bonded.

本表面保護膜較佳為真空壓空成形貼合型膜。所謂真空壓空成形貼合型膜,意指藉由真空壓空成形之方法而貼合於被黏著體表面之類型之膜。真空壓空成形係用以一面對膜進行加熱而使其軟化一面貼合於被黏著體表面之一方法。本表面保護膜為真空壓空成形貼合型膜之構成適合:對於本表面保護膜,一面使其適當地追隨被黏著體之保護對象面內之彎曲部位或撓曲部位等非平坦部位之表面形狀,一面貼合於該保護對象面而使用。The surface protective film is preferably a vacuum pressure forming laminating film. The so-called vacuum forming laminating film refers to a type of film that is adhered to the surface of the adherend through the method of vacuum forming. Vacuum pressure forming is a method in which a film is heated while softening it so that it adheres to the surface of an adherend. This surface protective film is a vacuum pressure-formed laminating film. The structure is suitable for: This surface protective film can properly follow the surface of non-flat parts such as curved parts or flexed parts in the surface of the adherend to be protected. Shape, one side is used to fit the surface to be protected.

根據本發明之第2態樣,提供一種光學構件。該光學構件包含本發明之第1態樣之上述表面保護膜。根據本光學構件,關於其表面保護膜,可享受與在上文已關於本發明之第1態樣敍述之技術效果相同之技術效果。According to a second aspect of the present invention, an optical member is provided. This optical member includes the above-mentioned surface protective film according to the first aspect of the present invention. According to the present optical member, the same technical effects as those described above with respect to the first aspect of the present invention can be enjoyed with respect to the surface protective film thereof.

圖1係本發明之表面保護膜之一實施形態之膜10之局部剖視圖。膜10具有包含基材膜11及黏著劑層12之積層構造。膜10例如可為了保護組入至顯示器之顯示器用透明覆蓋構件等各種光學構件之製造過程、或檢查步驟、輸送過程等中之光學構件表面,而貼合於構件表面來使用。又,膜10於本實施形態中為一面加熱一面貼合於被黏著體之類型之膜,較佳為真空壓空成形貼合型膜。FIG. 1 is a partial cross-sectional view of a film 10 according to an embodiment of the surface protective film of the present invention. The film 10 has a laminated structure including a base film 11 and an adhesive layer 12 . The film 10 can be used, for example, by being bonded to the surface of the optical member in order to protect the surface of the optical member during the manufacturing process of various optical members such as a transparent cover member for a display incorporated into the display, or during the inspection step, transportation process, etc. In addition, in this embodiment, the film 10 is a type of film that is bonded to an adherend while being heated, and is preferably a vacuum pressure forming bonding type film.

膜10中之基材膜11係具有透光性之膜狀基材,且為於膜10中作為支持體發揮功能之要素。基材膜11例如為塑膠膜。作為塑膠膜之構成材料,例如可列舉:聚酯、聚烯烴、聚醯胺、聚醯亞胺、聚碳酸酯、聚丙烯酸酯、聚氯乙烯、聚偏二氯乙烯、聚乙烯醇、及聚氟乙烯。作為聚酯,例如可列舉:聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯、及聚對苯二甲酸丁二酯。作為聚烯烴,例如可列舉:聚乙烯、聚丙烯、聚丁烯、聚甲基戊烯、乙烯-丙烯共聚物、乙烯-丁烯共聚物、乙烯-乙酸乙烯酯共聚物、乙烯-(甲基)丙烯酸酯共聚物、及乙烯-乙烯醇共聚物。作為聚醯胺,例如可列舉:尼龍6、尼龍6,6、及部分芳香族聚醯胺。基材膜11可包含一種材料,亦可包含兩種以上之材料。基材膜11可具有單層構造,亦可具有多層構造。The base film 11 in the film 10 is a translucent film-like base material and is an element that functions as a support in the film 10 . The base film 11 is, for example, a plastic film. Examples of the constituent materials of the plastic film include: polyester, polyolefin, polyamide, polyimide, polycarbonate, polyacrylate, polyvinyl chloride, polyvinylidene chloride, polyvinyl alcohol, and polyvinyl alcohol. Fluoroethylene. Examples of the polyester include polyethylene terephthalate, polyethylene naphthalate, and polybutylene terephthalate. Examples of the polyolefin include polyethylene, polypropylene, polybutene, polymethylpentene, ethylene-propylene copolymer, ethylene-butene copolymer, ethylene-vinyl acetate copolymer, ethylene-(methyl ) acrylate copolymer, and ethylene-vinyl alcohol copolymer. Examples of polyamides include nylon 6, nylon 6,6, and partially aromatic polyamides. The base film 11 may include one kind of material, or may include two or more materials. The base film 11 may have a single-layer structure or a multi-layer structure.

基材膜11於包含塑膠膜之情形時,可為雙軸延伸膜,亦可為單軸延伸膜,亦可為無延伸膜。於基材膜11為延伸膜之情形時,其延伸倍率例如為1.2~10。基材膜11之所謂之MD方向之延伸倍率與所謂之TD方向之延伸倍率可相同,亦可不同。When the base film 11 includes a plastic film, it may be a biaxially stretched film, a uniaxially stretched film, or a non-stretched film. When the base film 11 is a stretched film, the stretching ratio is, for example, 1.2 to 10. The stretch ratio of the base film 11 in the MD direction and the stretch ratio in the TD direction may be the same or different.

關於基材膜11之厚度,就確保用以供基材膜11作為膜10中之支持體發揮功能之強度之觀點而言,較佳為10 μm以上,更佳為15 μm以上,更佳為25 μm以上。又,就於膜10實現適度之可撓性之觀點而言,基材膜11之厚度較佳為200 μm以下,更佳為150 μm以下,更佳為100 μm以下,更佳為75 μm以下。The thickness of the base film 11 is preferably 10 μm or more, more preferably 15 μm or more, and more preferably 15 μm or more, from the viewpoint of ensuring the strength for the base film 11 to function as a support in the film 10 25 μm or more. Moreover, from the viewpoint of achieving appropriate flexibility in the film 10, the thickness of the base film 11 is preferably 200 μm or less, more preferably 150 μm or less, more preferably 100 μm or less, further preferably 75 μm or less. .

基材膜11亦可具有抗靜電性。例如,基材膜11亦可為由抗靜電成分分散之樹脂材料製膜而成者,亦可為具有包含抗靜電層之積層構造。抗靜電層可設置於用於基材膜11之上述塑膠膜中之黏著劑層12側之表面,亦可設置於與黏著劑層12相反側之表面。The base film 11 may also have antistatic properties. For example, the base film 11 may be made of a resin material in which antistatic components are dispersed, or may have a laminated structure including an antistatic layer. The antistatic layer may be provided on the surface of the adhesive layer 12 side of the above-mentioned plastic film used for the base film 11 , or may be provided on the surface opposite to the adhesive layer 12 .

於基材膜11具有包含抗靜電層之積層構造之情形時,該抗靜電層含有抗靜電成分。抗靜電層可含有一種抗靜電成分,亦可含有兩種以上之抗靜電成分。又,抗靜電層視需要含有黏合劑成分。When the base film 11 has a laminated structure including an antistatic layer, the antistatic layer contains an antistatic component. The antistatic layer may contain one antistatic component, or may contain two or more antistatic components. In addition, the antistatic layer may contain a binder component if necessary.

作為上述抗靜電成分,例如可列舉:陽離子型抗靜電劑、陰離子型抗靜電劑、兩性離子型抗靜電劑、及非離子型抗靜電劑。Examples of the antistatic component include cationic antistatic agents, anionic antistatic agents, amphoteric antistatic agents, and nonionic antistatic agents.

作為陽離子型抗靜電劑,例如可列舉具有四級銨鹽形態之官能基、吡啶鎓鹽形態之官能基、及一級、二級或三級胺基等作為陽離子性官能基之抗靜電劑。關於具有作為陽離子性官能基之四級銨鹽即四級銨基之抗靜電劑,例如可列舉:烷基三甲基銨鹽、醯基醯胺丙基三甲基銨甲基硫酸鹽、烷基苄基甲基銨鹽、醯基氯化膽鹼、及聚甲基丙烯酸二甲胺乙酯等具有四級銨基之丙烯酸系共聚物、聚乙烯苄基三甲基氯化銨等具有四級銨基之苯乙烯共聚物、以及聚二烯丙基二甲基氯化銨等具有四級銨基之二烯丙基胺共聚物。Examples of the cationic antistatic agent include antistatic agents having a cationic functional group such as a functional group in the form of a quaternary ammonium salt, a functional group in the form of a pyridinium salt, and a primary, secondary or tertiary amino group. Examples of the antistatic agent having a quaternary ammonium salt as a cationic functional group, that is, a quaternary ammonium group include alkyl trimethyl ammonium salt, acyl amide propyl trimethyl ammonium methyl sulfate, and alkyl trimethyl ammonium methyl sulfate. Acrylic copolymers with quaternary ammonium groups such as benzyl methyl ammonium salt, acyl choline chloride, and polydimethylamine ethyl methacrylate, polyethylene benzyl trimethyl ammonium chloride, etc. have quaternary ammonium groups. Styrene copolymers with quaternary ammonium groups, and diallylamine copolymers with quaternary ammonium groups such as polydiallyldimethylammonium chloride.

作為陰離子型抗靜電劑,例如可列舉:烷磺酸鹽、烷基苯磺酸鹽、烷基硫酸酯鹽、烷基乙氧基硫酸酯鹽、烷基磷酸酯鹽、及含磺酸基苯乙烯共聚物。Examples of the anionic antistatic agent include alkane sulfonates, alkyl benzene sulfonates, alkyl sulfate ester salts, alkyl ethoxy sulfate ester salts, alkyl phosphate ester salts, and sulfonate-containing benzene. Ethylene copolymer.

作為兩性離子型抗靜電劑,例如可列舉:烷基甜菜鹼、烷基咪唑鎓甜菜鹼、及羰基甜菜鹼接枝共聚物。Examples of the amphoteric antistatic agent include alkyl betaine, alkyl imidazolium betaine, and carbonyl betaine graft copolymer.

作為非離子型抗靜電劑,例如可列舉:脂肪酸羥烷基醯胺、二(2-羥基乙基)烷基胺、聚氧乙烯烷基胺、脂肪酸甘油酯、聚氧乙二醇脂肪酸酯、山梨醇酐脂肪酸酯、聚氧山梨醇酐脂肪酸酯、聚氧乙烯烷基苯醚、聚氧乙烯烷基醚、聚乙二醇、聚氧乙二胺、及甲氧基聚乙二醇(甲基)丙烯酸酯等。Examples of nonionic antistatic agents include fatty acid hydroxyalkylamide, di(2-hydroxyethyl)alkylamine, polyoxyethylene alkylamine, fatty acid glyceryl ester, and polyoxyethylene glycol fatty acid ester. , sorbitan fatty acid ester, polyoxysorbitan fatty acid ester, polyoxyethylene alkyl phenyl ether, polyoxyethylene alkyl ether, polyethylene glycol, polyoxyethylene diamine, and methoxypolyethylene glycol Alcohol (meth)acrylate, etc.

作為上述抗靜電成分,亦可列舉導電性聚合物。作為導電性聚合物,例如可列舉:聚苯胺磺酸等聚苯胺系導電性聚合物、及經聚陰離子類摻雜之聚噻吩類等聚噻吩系導電性聚合物。Examples of the antistatic component include conductive polymers. Examples of the conductive polymer include polyaniline conductive polymers such as polyaniline sulfonic acid and polythiophene conductive polymers such as polyaniline-doped polythiophenes.

作為抗靜電成分而採用之導電性聚合物之重量平均分子量(Mw)較佳為1×103 以上,更佳為5×103 以上。導電性聚合物之重量平均分子量(Mw)意指藉由凝膠滲透層析儀(GPC)測定所得之標準聚苯乙烯換算之值。The weight average molecular weight (Mw) of the conductive polymer used as the antistatic component is preferably 1×10 3 or more, more preferably 5×10 3 or more. The weight average molecular weight (Mw) of the conductive polymer means a standard polystyrene-converted value measured by gel permeation chromatography (GPC).

於採用聚苯胺磺酸作為導電性聚合物之情形時,該聚苯胺磺酸之重量平均分子量(Mw)較佳為5×105 以下,更佳為3×105 以下。作為聚苯胺磺酸之市售品,例如可列舉三菱麗陽股份有限公司製造之商品名「aqua-PASS」。When polyaniline sulfonic acid is used as the conductive polymer, the weight average molecular weight (Mw) of the polyaniline sulfonic acid is preferably 5×10 5 or less, more preferably 3×10 5 or less. As a commercial product of polyaniline sulfonic acid, the trade name "aqua-PASS" manufactured by Mitsubishi Rayon Co., Ltd. is mentioned, for example.

作為上述聚噻吩類,例如可列舉:聚噻吩、聚(3-甲基噻吩)、聚(3-乙基噻吩)、聚(3-丙基噻吩)、聚(3-丁基噻吩)、聚(3-己基噻吩)、聚(3-庚基噻吩)、聚(3-辛基噻吩)、聚(3-癸基噻吩)、聚(3-十二烷基噻吩)、聚(3-十八烷基噻吩)、聚(3-溴基噻吩)、聚(3-氯基噻吩)、聚(3-碘基噻吩)、聚(3-氰基噻吩)、聚(3-苯基噻吩)、聚(3,4-二甲基噻吩)、聚(3,4-二丁基噻吩)、聚(3-羥基噻吩)、聚(3-甲氧基噻吩)、聚(3-乙氧基噻吩)、聚(3-丁氧基噻吩)、聚(3-己氧基噻吩)、聚(3-庚氧基噻吩)、聚(3-辛氧基噻吩)、聚(3-癸氧基噻吩)、聚(3-十二烷氧基噻吩)、聚(3-十八烷氧基噻吩)、聚(3,4-二羥基噻吩)、聚(3,4-二甲氧基噻吩)、聚(3,4-二乙氧基噻吩)、聚(3,4-二丙氧基噻吩)、聚(3,4-二丁氧基噻吩)、聚(3,4-二己氧基噻吩)、聚(3,4-二庚氧基噻吩)、聚(3,4-二辛氧基噻吩)、聚(3,4-二癸氧基噻吩)、聚(3,4-二十二烷氧基噻吩)、聚(3,4-伸乙基二氧基噻吩)、聚(3,4-伸丙基二氧基噻吩)、聚(3,4-丁烯二氧基噻吩)、聚(3-甲基-4-甲氧基噻吩)、聚(3-甲基-4-乙氧基噻吩)、聚(3-羧基噻吩)、聚(3-甲基-4-羧基噻吩)、聚(3-甲基-4-羧基乙基噻吩)、及聚(3-甲基-4-羧基丁基噻吩)。就於基材膜11或抗靜電層表現較高之導電性,從而表現良好之抗靜電性之觀點而言,作為上述聚噻吩類,較佳為聚(3,4-伸乙基二氧基噻吩)。Examples of the polythiophenes include polythiophene, poly(3-methylthiophene), poly(3-ethylthiophene), poly(3-propylthiophene), poly(3-butylthiophene), poly (3-hexylthiophene), poly(3-heptylthiophene), poly(3-octylthiophene), poly(3-decylthiophene), poly(3-dodecylthiophene), poly(3-decylthiophene) Octalkylthiophene), poly(3-bromothiophene), poly(3-chlorothiophene), poly(3-iodothiophene), poly(3-cyanothiophene), poly(3-phenylthiophene) , poly(3,4-dimethylthiophene), poly(3,4-dibutylthiophene), poly(3-hydroxythiophene), poly(3-methoxythiophene), poly(3-ethoxy Thiophene), poly(3-butoxythiophene), poly(3-hexyloxythiophene), poly(3-heptoxythiophene), poly(3-octoxythiophene), poly(3-decyloxy Thiophene), poly(3-dodecyloxythiophene), poly(3-octadecyloxythiophene), poly(3,4-dihydroxythiophene), poly(3,4-dimethoxythiophene) , poly(3,4-diethoxythiophene), poly(3,4-dipropoxythiophene), poly(3,4-dibutoxythiophene), poly(3,4-dihexyloxy Thiophene), poly(3,4-diheptoxythiophene), poly(3,4-dioctyloxythiophene), poly(3,4-didecyloxythiophene), poly(3,4-20 dialkoxythiophene), poly(3,4-ethylenedioxythiophene), poly(3,4-propylenedioxythiophene), poly(3,4-butylenedioxythiophene) , poly(3-methyl-4-methoxythiophene), poly(3-methyl-4-ethoxythiophene), poly(3-carboxythiophene), poly(3-methyl-4-carboxythiophene) ), poly(3-methyl-4-carboxyethylthiophene), and poly(3-methyl-4-carboxybutylthiophene). From the viewpoint that the base film 11 or the antistatic layer exhibits high conductivity and thereby exhibits good antistatic properties, the polythiophenes are preferably poly(3,4-ethylenedioxy). Thiophene).

上述聚陰離子類係具有陰離子基之結構單元之聚合物,作為對聚噻吩類之摻雜劑發揮作用。作為聚陰離子類,例如可列舉:聚苯乙烯磺酸、聚乙烯磺酸、聚芳碸酸、聚丙烯磺酸、聚甲基丙烯磺酸、聚(2-丙烯醯胺-2-甲基丙磺酸)、聚異戊二烯磺酸、聚甲基丙烯酸磺基乙酯、聚(甲基丙烯酸4-磺基丁酯)、聚甲基烯丙氧基苯磺酸、聚乙烯羧酸、聚苯乙烯羧酸、聚芳羧酸、聚丙烯羧酸、聚甲基丙烯羧酸、聚(2-丙烯醯胺-2-甲基丙羧酸)、聚異戊二烯羧酸、聚丙烯酸、及聚磺化苯乙炔。就於上述聚噻吩類表現較高之導電性之觀點而言,作為聚陰離子類,較佳為聚苯乙烯磺酸。The above-mentioned polyanionics are polymers having anionic structural units and function as dopants for polythiophenes. Examples of the polyanions include polystyrene sulfonic acid, polyethylene sulfonic acid, polyaromatic acid, polypropylene sulfonic acid, polymethacryl sulfonic acid, and poly(2-acrylamide-2-methylpropane). sulfonic acid), polyisoprene sulfonic acid, polysulfoethyl methacrylate, poly(4-sulfobutyl methacrylate), polymethallyloxybenzenesulfonic acid, polyethylene carboxylic acid, Polystyrene carboxylic acid, polyaromatic carboxylic acid, polypropylene carboxylic acid, polymethacrylic carboxylic acid, poly(2-acrylamide-2-methylpropanecarboxylic acid), polyisoprene carboxylic acid, polyacrylic acid , and polysulfonated phenylacetylene. From the viewpoint that the polythiophenes exhibit high electrical conductivity, polystyrene sulfonic acid is preferred as the polyanions.

就於基材膜11或抗靜電層表現良好之抗靜電性之觀點而言,基材膜11或抗靜電層較佳為含有具有四級銨基之上述抗靜電劑及/或上述導電性聚合物作為抗靜電成分。又,作為抗靜電成分之導電性聚合物,就於基材膜11或抗靜電層表現較高之導電性而表現良好之抗靜電性之觀點而言,較佳為經聚陰離子類之聚苯乙烯磺酸摻雜之聚噻吩類之聚(3,4-伸乙基二氧基噻吩)。From the viewpoint of the base film 11 or the antistatic layer exhibiting good antistatic properties, the base film 11 or the antistatic layer preferably contains the above-mentioned antistatic agent having a quaternary ammonium group and/or the above-mentioned conductive polymer as an antistatic component. In addition, the conductive polymer as the antistatic component is preferably polyanionic polyphenylene from the viewpoint of exhibiting high conductivity in the base film 11 or the antistatic layer and thus good antistatic properties. Ethylene sulfonic acid-doped polythiophene-based poly(3,4-ethylidenedioxythiophene).

作為抗靜電層中之黏合劑成分,例如可列舉:聚酯樹脂、丙烯酸系樹脂、丙烯酸-胺基甲酸酯樹脂、丙烯酸-苯乙烯樹脂、丙烯酸-矽酮樹脂、矽酮樹脂、聚矽氮烷樹脂、氟樹脂、聚乙烯樹脂、胺基甲酸酯樹脂、三聚氰胺樹脂、及環氧樹脂。Examples of the binder component in the antistatic layer include polyester resin, acrylic resin, acrylic-urethane resin, acrylic-styrene resin, acrylic-silicone resin, silicone resin, and polysilicone resin. Alkane resin, fluorine resin, polyethylene resin, urethane resin, melamine resin, and epoxy resin.

抗靜電層或用以形成其之組合物亦可視需要進而含有潤滑劑、或整平劑、交聯劑、抗氧化劑、著色劑(顏料、染料等)、流動性調整劑(觸變劑、增黏劑等)、造膜助劑、觸媒(例如包含紫外線硬化型樹脂之組合物中之紫外線聚合起始劑)等各種添加劑。作為交聯劑,可自一般樹脂之交聯中所使用之異氰酸酯系交聯劑、或環氧系交聯劑、三聚氰胺系交聯劑等各種交聯劑進行適宜選擇而使用。The antistatic layer or the composition used to form it may also contain lubricants, or leveling agents, cross-linking agents, antioxidants, colorants (pigments, dyes, etc.), fluidity adjusters (thixotropic agents, additives, etc.) as needed. Adhesives, etc.), film-forming aids, catalysts (such as ultraviolet polymerization initiators in compositions containing ultraviolet curable resins) and other additives. As the cross-linking agent, various cross-linking agents such as isocyanate-based cross-linking agents, epoxy-based cross-linking agents, and melamine-based cross-linking agents commonly used for cross-linking resins can be appropriately selected and used.

於本實施形態中,基材膜11具有包含抗靜電層之積層構造,且該抗靜電層或用以形成其之組合物較佳為含有潤滑劑。於抗靜電層中,可使用一種潤滑劑,亦可使用兩種以上之潤滑劑。In this embodiment, the base film 11 has a laminated structure including an antistatic layer, and the antistatic layer or the composition used to form the antistatic layer preferably contains a lubricant. In the antistatic layer, one kind of lubricant can be used, or two or more lubricants can be used.

作為潤滑劑,較佳為使用脂肪醯胺及/或脂肪酸酯。當使用脂肪醯胺及/或脂肪酸酯作為抗靜電層中之潤滑劑時,即便於不對抗靜電層之表面實施剝離處理(例如將矽酮系剝離劑或長鏈烷基系剝離劑等剝離處理劑塗佈於層表面並使其乾燥之處理)之情形時亦於抗靜電層表面獲得充分高之滑動性,從而,於抗靜電層或基材膜11獲得較高之耐摩擦性。關於未於抗靜電層或基材膜11之露出表面實施剝離處理之構成,就可避免起因於剝離處理用剝離劑之變白(例如因在加熱加濕條件下保存導致之變白)之方面而言較佳,又,就抗靜電層或基材膜11之露出表面之耐溶劑性之方面而言亦有利。As the lubricant, fatty acid amide and/or fatty acid ester is preferably used. When fatty amide and/or fatty acid ester are used as the lubricant in the antistatic layer, even if the surface of the antistatic layer is not subjected to a peeling treatment (for example, a silicone-based peeling agent or a long-chain alkyl-based peeling agent is peeled off) When the treatment agent is applied to the surface of the layer and dried), sufficiently high sliding properties are obtained on the surface of the antistatic layer, thereby obtaining high friction resistance in the antistatic layer or the base film 11. By not performing peeling treatment on the exposed surface of the antistatic layer or the base film 11, it is possible to avoid whitening caused by the peeling agent used for the peeling treatment (for example, whitening due to storage under heated and humidified conditions). It is preferable in terms of solvent resistance, and it is also advantageous in terms of solvent resistance of the exposed surface of the antistatic layer or base film 11 .

作為上述脂肪醯胺,例如可列舉:月桂醯胺、棕櫚醯胺、硬脂醯胺、山萮醯胺、羥基硬脂醯胺、油醯胺、芥醯胺、N-油基棕櫚醯胺、N-硬脂基硬脂醯胺、N-硬脂基油醯胺、N-油基硬脂醯胺、N-硬脂基芥醯胺、羥甲基硬脂醯胺、亞甲基雙硬脂醯胺、伸乙基雙癸醯胺、伸乙基雙月桂醯胺、伸乙基雙硬脂醯胺、伸乙基雙羥基硬脂醯胺、伸乙基雙山萮醯胺、六亞甲基雙硬脂醯胺、六亞甲基雙山萮醯胺、六亞甲基羥基硬脂醯胺、N,N'-二硬脂基己二醯胺、N,N'-二硬脂基癸二醯胺、伸乙基雙油醯胺、伸乙基雙芥醯胺、六亞甲基雙油醯胺、N,N'-二油基己二醯胺、N,N'-二油基癸二醯胺、間苯二甲基雙硬脂醯胺、間苯二甲基雙羥基硬脂醯胺、及N,N'-硬脂基間苯二甲醯胺。Examples of the fatty acid amide include laurylamide, palmitamide, stearylamine, behenylamide, hydroxystearamide, oleylamide, erucamide, N-oleylpalmitamide, N-stearyl stearamide, N-stearyl oleyl amide, N-oleyl stearamide, N-stearyl erucamide, hydroxymethyl stearamide, methylene distearamide Ethylidene, ethylbisdecylamide, ethylbislaurylamide, ethylbisstearylamide, ethylbishydroxystearylamide, ethylbisbehenamide, hexaamide Methyl distearylamide, hexamethylene distearylamide, hexamethylene hydroxystearamide, N,N'-distearyl hexamethylene diamide, N,N'-distearyl Ethyldecanediamide, ethylidenebisoleamide, ethylbiserucamide, hexamethylenebisoleamide, N,N'-dioleyl hexamethylenediamine, N,N'-dioleamide Oil-based decanediamide, m-xylylenedimethyl distearamide, m-xylylenedihydroxystearamide, and N,N'-stearyl isophthalamide.

作為上述脂肪酸酯,例如可列舉高級脂肪酸與高級醇之酯(即蠟酯)。用以形成蠟酯之所謂「高級脂肪酸」,意指碳數8以上之羧酸。該高級脂肪酸典型而言為一元羧酸,該高級脂肪酸之碳數典型而言為10以上,較佳為10~40。用以形成蠟酯之所謂「高級醇」,意指碳數6以上之醇。該高級醇典型而言為一元或二元醇,較佳為一元醇,該高級醇之碳數典型而言為10以上,較佳為10~40。具有含有此種蠟酯與上述黏合劑成分之組成之抗靜電層即便保存於高溫多濕條件下亦不易變白。就於作為具備基材膜11之表面保護膜之膜10確保良好之外觀品位之方面而言,較佳為基材膜11中之抗靜電層不易變白。Examples of the fatty acid ester include esters of higher fatty acids and higher alcohols (that is, wax esters). The so-called "higher fatty acids" used to form wax esters refer to carboxylic acids with 8 or more carbon atoms. The higher fatty acid is typically a monocarboxylic acid, and the number of carbon atoms in the higher fatty acid is typically 10 or more, preferably 10 to 40. The so-called "higher alcohols" used to form wax esters mean alcohols with 6 or more carbon atoms. The higher alcohol is typically a monohydric or dihydric alcohol, preferably a monohydric alcohol. The carbon number of the higher alcohol is typically 10 or more, preferably 10 to 40. The antistatic layer composed of such wax ester and the above-mentioned adhesive component is not easy to turn white even if it is stored under high temperature and humid conditions. In order to ensure good appearance quality of the film 10 as a surface protective film provided with the base film 11, it is preferable that the antistatic layer in the base film 11 does not become white easily.

作為上述蠟酯,例如可列舉:蠟酸蜂花酯、棕櫚酸蜂花酯、棕櫚酸鯨蠟酯、及硬脂酸硬脂酯。Examples of the wax ester include melisyl cerate, melisyl palmitate, cetyl palmitate, and stearyl stearate.

又,作為抗靜電層中之潤滑劑,亦可採用含有上述蠟酯之天然蠟。此種天然蠟中之上述蠟酯之含有比率(於天然蠟包含兩種以上之蠟酯之情形時為其等之含有比率之合計)以非揮發成分(NV)基準計,較佳為50質量%以上,更佳為65質量%以上,更佳為75質量%以上。作為天然蠟,例如可列舉:巴西棕櫚蠟(含有蠟酸蜂花酯作為主成分)或棕櫚蠟等植物性蠟、及蜂蠟或鯨蠟等動物性蠟。巴西棕櫚蠟中之蠟酸蜂花酯之比率較佳為60質量%以上,更佳為70質量%以上,更佳為80質量%以上。In addition, as the lubricant in the antistatic layer, natural wax containing the above-mentioned wax ester can also be used. The content ratio of the above-mentioned wax esters in this natural wax (when the natural wax contains two or more wax esters, the total of equal content ratios) is preferably 50 mass on a non-volatile content (NV) basis. % or more, more preferably 65 mass % or more, more preferably 75 mass % or more. Examples of natural waxes include carnauba wax (containing melisyl cereus as a main component), vegetable waxes such as palm wax, and animal waxes such as beeswax and spermaceti. The ratio of melisyl cerate in the carnauba wax is preferably 60 mass% or more, more preferably 70 mass% or more, and more preferably 80 mass% or more.

於採用蠟酯或天然蠟作為抗靜電層中之潤滑劑之情形時,該蠟成分(蠟酯、天然蠟)之熔點就抑制抗靜電層變白之方面而言,較佳為50℃以上,更佳為60℃以上,更佳為70℃以上,更佳為75℃以上。上述熔點就於抗靜電層或基材膜11之露出表面確保充分高之滑動性而實現較高之耐摩擦性之方面而言,較佳為100℃以下。When wax ester or natural wax is used as the lubricant in the antistatic layer, the melting point of the wax component (wax ester, natural wax) is preferably 50°C or above in order to suppress the whitening of the antistatic layer. More preferably, it is 60°C or higher, more preferably 70°C or higher, still more preferably 75°C or higher. The melting point is preferably 100° C. or lower in order to ensure sufficiently high sliding properties on the exposed surface of the antistatic layer or the base film 11 and to achieve high friction resistance.

作為潤滑劑,除上述以外,例如可列舉:石油系蠟(石蠟等)、或礦物系蠟(褐煤蠟等)、高級脂肪酸(蠟酸等)、中性脂肪(棕櫚酸三甘油酯等)等各種蠟。又,亦可將矽酮系潤滑劑或氟系潤滑劑等蠟以外之潤滑劑作為調配於抗靜電層之潤滑劑與蠟一起輔助性地使用,但於本實施形態中,抗靜電層較佳為實質上不含有矽酮系潤滑劑或氟系潤滑劑。又,不排除將基於與潤滑劑調配目的不同之目的(例如期待作為抗靜電層形成用組合物中之消泡劑之功能)而使用之矽酮系化合物等調配於抗靜電層或用以形成其之組合物中。Examples of lubricants other than the above include petroleum waxes (paraffin wax, etc.), mineral waxes (montan wax, etc.), higher fatty acids (ceric acid, etc.), neutral fats (palmitic acid triglyceride, etc.), etc. Various waxes. In addition, a lubricant other than wax, such as a silicone-based lubricant or a fluorine-based lubricant, may be used as a lubricant mixed with the wax in the antistatic layer. However, in this embodiment, the antistatic layer is preferred. It contains substantially no silicone lubricant or fluorine lubricant. Furthermore, it is not excluded that silicone-based compounds used for purposes different from the lubricant formulation purpose (for example, expected to function as a defoaming agent in the antistatic layer-forming composition) are blended into the antistatic layer or used to form the lubricant. in its composition.

關於基材膜11中之抗靜電層之整體中潤滑劑所占之比率,就確保抗靜電層表面之滑動性之方面而言,較佳為1質量%以上,更佳為5質量%以上。就抑制抗靜電層之變白之方面而言,上述比率較佳為50質量%以下,更佳為40質量%以下。The proportion of the lubricant in the entire antistatic layer in the base film 11 is preferably 1 mass % or more, and more preferably 5 mass % or more in order to ensure the sliding properties of the antistatic layer surface. In terms of suppressing whitening of the antistatic layer, the above ratio is preferably 50 mass% or less, more preferably 40 mass% or less.

抗靜電層例如可藉由以下方式形成,即,將包含抗靜電成分與視需要而調配之樹脂成分之組合物塗佈於基材膜本體後使其乾燥。The antistatic layer can be formed, for example, by applying a composition containing an antistatic component and an optional resin component to the base film body and then drying the composition.

基材膜11中之黏著劑層12側之表面亦可實施用以提高與黏著劑層12之密接性之表面處理。作為此種表面處理,可列舉:電暈處理或電漿處理等物理性處理、及底塗處理等化學性處理。The surface of the base film 11 on the adhesive layer 12 side may also be subjected to surface treatment to improve the adhesion with the adhesive layer 12 . Examples of such surface treatment include physical treatments such as corona treatment and plasma treatment, and chemical treatments such as primer treatments.

基材膜11之130℃下之儲存彈性模數(第1儲存彈性模數)為700 MPa以下,較佳為500 MPa以下,更佳為300 MPa以下,更佳為200 MPa以下,更佳為100 MPa以下,更佳為80 MPa以下。基材膜11之30℃下之儲存彈性模數(第2儲存彈性模數)為1000 MPa以上,較佳為1500 MPa以上,更佳為2000 MPa以上,更佳為2500 MPa以上,更佳為2700 MPa以上,更佳為2800 MPa以上。基材膜11之80℃下之儲存彈性模數(第3儲存彈性模數)為第1儲存彈性模數以上且第2儲存彈性模數以下,例如為700~1100,較佳為700~1000 MPa。基材膜11之儲存彈性模數之調整可藉由基材膜11中所含之塑膠膜構成材料之組成之調整、或基材膜11之延伸倍率之調整等來進行。又,關於膜體之儲存彈性模數,可基於使用動態黏彈性測定裝置(商品名「RSΑ-G2」,TA INSTRUMENTS公司製造)進行之動態黏彈性測定而求出。於該測定中,將成為測定對象物之試片之尺寸設為寬度5 mm×長度30 mm,將試片保持用夾頭之初始夾頭間距離設為10 mm,將測定模式設為拉伸模式,將測定溫度範圍設為25~170℃,將頻率設為1 Hz,將升溫速度設為5℃/分鐘。The storage elastic modulus (first storage elastic modulus) of the base film 11 at 130°C is 700 MPa or less, preferably 500 MPa or less, more preferably 300 MPa or less, more preferably 200 MPa or less, more preferably 100 MPa or less, more preferably 80 MPa or less. The storage elastic modulus (second storage elastic modulus) of the base film 11 at 30°C is 1000 MPa or more, preferably 1500 MPa or more, more preferably 2000 MPa or more, more preferably 2500 MPa or more, more preferably 2700 MPa or more, preferably 2800 MPa or more. The storage elastic modulus (third storage elastic modulus) of the base film 11 at 80°C is above the first storage elastic modulus and below the second storage elastic modulus, for example, 700 to 1100, preferably 700 to 1000. MPa. The storage elastic modulus of the base film 11 can be adjusted by adjusting the composition of the plastic film constituent material contained in the base film 11 or adjusting the stretching ratio of the base film 11 . In addition, the storage elastic modulus of the membrane body can be determined based on dynamic viscoelasticity measurement using a dynamic viscoelasticity measuring device (trade name "RSΑ-G2", manufactured by TA INSTRUMENTS). In this measurement, the size of the test piece to be measured is 5 mm in width x 30 mm in length, the initial distance between the chucks for holding the test piece is 10 mm, and the measurement mode is set to tensile. mode, set the measurement temperature range to 25 to 170°C, the frequency to 1 Hz, and the temperature rise rate to 5°C/min.

作為構成基材膜11之材料,就容易實現較佳之儲存彈性模數(第1儲存彈性模數、第2儲存彈性模數、第3儲存彈性模數)等方面而言,較佳為包含聚酯。 作為上述聚酯,典型而言,使用包含對二羧酸與二醇進行縮聚而獲得之聚酯作為主成分之聚酯。As a material constituting the base film 11, in terms of easily achieving better storage elastic modulus (first storage elastic modulus, second storage elastic modulus, third storage elastic modulus), etc., it is preferable to include polyethylene. ester. As the above-mentioned polyester, a polyester containing as a main component a polyester obtained by polycondensing a dicarboxylic acid and a diol is typically used.

作為構成上述聚酯之二羧酸,例如可列舉:鄰苯二甲酸、間苯二甲酸、對苯二甲酸、2-甲基對苯二甲酸、5-磺基間苯二甲酸、4,4'-二苯基二羧酸、4,4'-二苯醚二羧酸、4,4'-二苯基酮二羧酸、4,4'-二苯氧基乙烷二羧酸、4,4'-二苯基碸二羧酸、1,4-萘二羧酸、1,5-萘二羧酸、2,6-萘二羧酸、2,7-萘二羧酸等芳香族二羧酸;1,2-環己烷二羧酸、1,3-環己烷二羧酸、1,4-環己烷二羧酸等脂環式二羧酸;丙二酸、丁二酸、戊二酸、己二酸、庚二酸、辛二酸、壬二酸、癸二酸、十二酸等脂肪族二羧酸;馬來酸、馬來酸酐、富馬酸等不飽和二羧酸;該等之衍生物(例如對苯二甲酸等上述二羧酸之低級烷基酯等)等。該等可單獨使用一種,或組合兩種以上使用。Examples of the dicarboxylic acid constituting the polyester include phthalic acid, isophthalic acid, terephthalic acid, 2-methylterephthalic acid, 5-sulfoisophthalic acid, 4,4 '-Diphenyldicarboxylic acid, 4,4'-diphenyletherdicarboxylic acid, 4,4'-diphenylketonedicarboxylic acid, 4,4'-diphenoxyethanedicarboxylic acid, 4 , 4'-diphenyl dicarboxylic acid, 1,4-naphthalenedicarboxylic acid, 1,5-naphthalenedicarboxylic acid, 2,6-naphthalenedicarboxylic acid, 2,7-naphthalenedicarboxylic acid and other aromatic Dicarboxylic acid; 1,2-cyclohexanedicarboxylic acid, 1,3-cyclohexanedicarboxylic acid, 1,4-cyclohexanedicarboxylic acid and other alicyclic dicarboxylic acids; malonic acid, butanedioic acid Acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, dodecanoic acid and other aliphatic dicarboxylic acids; maleic acid, maleic anhydride, fumaric acid and other unsaturated acids Dicarboxylic acids; their derivatives (such as terephthalic acid and other lower alkyl esters of the above-mentioned dicarboxylic acids), etc. These can be used individually by 1 type, or in combination of 2 or more types.

作為構成上述聚酯之二羧酸,就基材膜11容易實現較佳之儲存彈性模數(第1儲存彈性模數、第2儲存彈性模數、第3儲存彈性模數)等方面而言,較佳為芳香族二羧酸。其中,作為較佳之二羧酸,可列舉對苯二甲酸及間苯二甲酸。例如較佳為構成上述聚酯之二羧酸中之50重量%以上(例如為80重量%以上,典型而言為95重量%以上)為對苯二甲酸、間苯二甲酸或該等之併用。上述二羧酸亦可實質上僅包含對苯二甲酸,實質上僅包含間苯二甲酸,或實質上僅包含對苯二甲酸及間苯二甲酸。As the dicarboxylic acid constituting the above-mentioned polyester, the base film 11 can easily achieve a better storage elastic modulus (the first storage elastic modulus, the second storage elastic modulus, and the third storage elastic modulus). Aromatic dicarboxylic acids are preferred. Among these, preferred dicarboxylic acids include terephthalic acid and isophthalic acid. For example, it is preferable that 50% by weight or more (for example, 80% by weight or more, typically 95% by weight or more) of the dicarboxylic acids constituting the polyester be terephthalic acid, isophthalic acid, or a combination thereof. . The above-mentioned dicarboxylic acid may also contain substantially only terephthalic acid, substantially only isophthalic acid, or substantially only terephthalic acid and isophthalic acid.

於構成基材膜11之材料為併用對苯二甲酸與間苯二甲酸之聚酯之情形時,對苯二甲酸與間苯二甲酸之比(對苯二甲酸/間苯二甲酸)並無特別限定,例如可自99/1~50/50、較佳為95/5~60/40、更佳為90/10~70/30、尤佳為87/13~80/20之範圍進行適宜選擇。When the material constituting the base film 11 is polyester using both terephthalic acid and isophthalic acid, the ratio of terephthalic acid to isophthalic acid (terephthalic acid/isophthalic acid) does not matter. It is particularly limited. For example, it can be suitably selected from the range of 99/1 to 50/50, preferably 95/5 to 60/40, more preferably 90/10 to 70/30, and particularly preferably 87/13 to 80/20. select.

作為構成上述聚酯之二醇,例如可列舉:乙二醇、二乙二醇、聚乙二醇、丙二醇、聚丙二醇、1,3-丙二醇、1,5-戊二醇、新戊二醇、1,4-丁二醇、1,6-己二醇、1,8-辛二醇、聚氧四亞甲基二醇等脂肪族二醇;1,2-環己烷二醇、1,4-環己烷二醇、1,1-環己烷二羥甲基、1,4-環己烷二羥甲基等脂環式二醇、苯二甲醇、4,4'-二羥基聯苯、2,2-雙(4'-羥基苯基)丙烷、雙(4-羥基苯基)碸等芳香族二醇等。該等可單獨使用一種或組合兩種以上使用。Examples of glycols constituting the polyester include ethylene glycol, diethylene glycol, polyethylene glycol, propylene glycol, polypropylene glycol, 1,3-propylene glycol, 1,5-pentanediol, and neopentyl glycol. , 1,4-butanediol, 1,6-hexanediol, 1,8-octanediol, polyoxytetramethylene glycol and other aliphatic diols; 1,2-cyclohexanediol, 1 , 4-cyclohexanediol, 1,1-cyclohexanedihydroxymethyl, 1,4-cyclohexanedihydroxymethyl and other alicyclic glycols, benzenedimethanol, 4,4'-dihydroxy Aromatic diols such as biphenyl, 2,2-bis(4'-hydroxyphenyl)propane, bis(4-hydroxyphenyl)terine, etc. These can be used individually by 1 type or in combination of 2 or more types.

作為構成上述聚酯之二醇,就基材膜11容易實現較佳之儲存彈性模數(第1儲存彈性模數、第2儲存彈性模數、第3儲存彈性模數)等方面而言,較佳為脂肪族二醇。其中,作為較佳之二醇,可列舉乙二醇、二乙二醇。例如,較佳為構成上述聚酯之二醇中之50重量%以上(例如為80重量%以上,典型而言為95重量%以上)為乙二醇、二乙二醇或該等之併用。上述二醇亦可實質上僅包含乙二醇,實質上僅包含二乙二醇,或實質上僅包含乙二醇及二乙二醇。As the glycol constituting the above-mentioned polyester, the base film 11 can easily achieve a better storage elastic modulus (the first storage elastic modulus, the second storage elastic modulus, and the third storage elastic modulus). Preferred are aliphatic diols. Among these, preferred glycols include ethylene glycol and diethylene glycol. For example, it is preferable that 50% by weight or more (for example, 80% by weight or more, typically 95% by weight or more) of the glycols constituting the polyester be ethylene glycol, diethylene glycol, or a combination thereof. The above-mentioned glycol may also include substantially only ethylene glycol, substantially only diethylene glycol, or substantially only ethylene glycol and diethylene glycol.

於構成基材膜11之材料為併用乙二醇與二乙二醇之聚酯之情形時,乙二醇與二乙二醇之比(乙二醇/二乙二醇)並無特別限定,例如可自99.9/0.1~80/20、較佳為99.5/0.5~85/15、更佳為99/1~90/10、尤佳為98/2~95/5之範圍進行適宜選擇。When the material constituting the base film 11 is polyester using both ethylene glycol and diethylene glycol, the ratio of ethylene glycol and diethylene glycol (ethylene glycol/diethylene glycol) is not particularly limited. For example, it can be appropriately selected from the range of 99.9/0.1 to 80/20, preferably 99.5/0.5 to 85/15, more preferably 99/1 to 90/10, and particularly preferably 98/2 to 95/5.

上述基材膜11就容易實現較佳之儲存彈性模數(第1儲存彈性模數、第2儲存彈性模數、第3儲存彈性模數)等方面而言,較佳為延伸膜。於基材膜11為延伸膜之情形時,可為雙軸延伸膜,亦可為單軸延伸膜。於基材膜11為延伸膜之情形時,其延伸倍率就容易實現較佳之儲存彈性模數(第1儲存彈性模數、第2儲存彈性模數、第3儲存彈性模數)等方面而言,例如為1.1~3,較佳為1.2~2,更佳為1.3~1.8,尤佳為1.4~1.6。基材膜11之所謂之MD方向之延伸倍率與所謂之TD方向之延伸倍率可相同,亦可不同。The base film 11 is preferably a stretched film in terms of easily achieving better storage elastic modulus (first storage elastic modulus, second storage elastic modulus, third storage elastic modulus). When the base film 11 is a stretched film, it may be a biaxially stretched film or a uniaxially stretched film. When the base film 11 is a stretched film, its stretching ratio can easily achieve better storage elastic modulus (first storage elastic modulus, second storage elastic modulus, third storage elastic modulus), etc. , for example, 1.1 to 3, preferably 1.2 to 2, more preferably 1.3 to 1.8, particularly preferably 1.4 to 1.6. The stretch ratio of the base film 11 in the MD direction and the stretch ratio in the TD direction may be the same or different.

膜10之黏著劑層12或用以形成其之黏著劑組合物具有黏著劑且具有透光性。黏著劑層12例如包含選自由作為丙烯酸系黏著劑之丙烯酸系聚合物、作為胺基甲酸酯系黏著劑之聚胺基甲酸酯、及矽酮系黏著劑所組成之群中之至少一種作為黏著劑。就一併實現對表面保護膜之黏著劑層要求之程度之黏著力與較高之透明性之觀點而言,作為黏著劑層12中之黏著劑,較佳為採用丙烯酸系聚合物。又,黏著劑層12具有能夠貼著於被黏著體之黏著面12a。The adhesive layer 12 of the film 10 or the adhesive composition used to form it has an adhesive and is light-transmissive. The adhesive layer 12 includes, for example, at least one selected from the group consisting of an acrylic polymer as an acrylic adhesive, a polyurethane as a urethane adhesive, and a silicone adhesive. As an adhesive. From the viewpoint of achieving both the required degree of adhesion and high transparency required for the adhesive layer of the surface protective film, an acrylic polymer is preferably used as the adhesive in the adhesive layer 12 . In addition, the adhesive layer 12 has an adhesive surface 12a capable of sticking to an adherend.

於黏著劑層12含有作為丙烯酸系黏著劑之丙烯酸系聚合物之情形時,較佳為,該丙烯酸系聚合物包含源自具有碳數例如為4~12之烷基之(甲基)丙烯酸烷基酯的單體單元,作為以重量比率計最多之主要單體單元。以下,以「(甲基)丙烯酸酯」表示「丙烯酸酯」及/或「甲基丙烯酸酯」。When the adhesive layer 12 contains an acrylic polymer as an acrylic adhesive, it is preferable that the acrylic polymer contains an alkyl (meth)acrylate derived from an alkyl group having a carbon number of, for example, 4 to 12. The monomer units of the base ester are the most numerous primary monomer units in terms of weight ratio. Hereinafter, "(meth)acrylate" means "acrylate" and/or "methacrylate".

作為用以構成上述丙烯酸系聚合物之單體單元之(甲基)丙烯酸烷基酯即用以形成上述丙烯酸系聚合物之單體成分中所含之(甲基)丙烯酸烷基酯,例如可列舉:(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸異戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸十一烷基酯、及(甲基)丙烯酸十二烷基酯。作為用於丙烯酸系聚合物之該(甲基)丙烯酸烷基酯,可使用一種(甲基)丙烯酸烷基酯,亦可使用兩種以上之(甲基)丙烯酸烷基酯。於本實施形態中,作為用於丙烯酸系聚合物之(甲基)丙烯酸烷基酯,使用選自由(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第三丁酯、及(甲基)丙烯酸2-乙基己酯所組成之群中之至少一種。上述丙烯酸系聚合物中之源自(甲基)丙烯酸烷基酯之單體單元之比率例如為50~99.9質量%,較佳為70~99.9質量%,更佳為80~99.5質量%。As the (meth)acrylic acid alkyl ester used to form the monomer unit of the above-mentioned acrylic polymer, that is, the (meth)acrylic acid alkyl ester contained in the monomer component used to form the above-mentioned acrylic polymer, for example, Examples: (butyl methacrylate, isobutyl (meth)acrylate, tert-butyl (meth)acrylate, amyl (meth)acrylate, amyl (meth)acrylate, (meth)acrylic acid Isoamyl ester, hexyl (meth)acrylate, heptyl (meth)acrylate, octyl (meth)acrylate, isooctyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, ( Nonyl methacrylate, isononyl (meth)acrylate, decyl (meth)acrylate, isodecyl (meth)acrylate, undecyl (meth)acrylate, and (meth)acrylic acid Lauryl ester. As the (meth)acrylic acid alkyl ester used for the acrylic polymer, one (meth)acrylic acid alkyl ester can be used, or two or more (meth)acrylic acid alkyl esters can be used. In this embodiment, as the (meth)acrylic acid alkyl ester used in the acrylic polymer, a third compound selected from the group consisting of butyl (meth)acrylate, isobutyl (meth)acrylate, and (meth)acrylic acid is used. At least one of the group consisting of butyl ester and 2-ethylhexyl (meth)acrylate. The ratio of monomer units derived from alkyl (meth)acrylate in the acrylic polymer is, for example, 50 to 99.9 mass%, preferably 70 to 99.9 mass%, and more preferably 80 to 99.5 mass%.

上述丙烯酸系聚合物亦可包含源自含羥基單體之單體單元。含羥基單體係於單體單元內具有至少一個羥基之單體。於黏著劑層12內之丙烯酸系聚合物包含含羥基單體單元之情形時,在黏著劑層12容易獲得接著性或適度之凝聚力。於黏著劑層12形成用之黏著劑組合物含有包含含羥基單體單元之丙烯酸系聚合物與例如異氰酸酯系交聯劑之情形時,含羥基單體單元之羥基(含活性氫官能基)能夠作為交聯點發揮功能。The above-mentioned acrylic polymer may also contain monomer units derived from hydroxyl-containing monomers. Hydroxyl-containing monomers are monomers that have at least one hydroxyl group in the monomer unit. When the acrylic polymer in the adhesive layer 12 contains hydroxyl-containing monomer units, the adhesive layer 12 can easily obtain adhesiveness or appropriate cohesive force. When the adhesive composition for forming the adhesive layer 12 contains an acrylic polymer containing a hydroxyl-containing monomer unit and, for example, an isocyanate-based cross-linking agent, the hydroxyl group (containing an active hydrogen functional group) of the hydroxyl-containing monomer unit can Functions as a cross-linking point.

作為用以構成上述丙烯酸系聚合物之單體單元之含羥基單體即用以形成該丙烯酸系聚合物之單體成分中所含之含羥基單體,例如可列舉:(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸3-羥基丙酯、(甲基)丙烯酸2-羥基丁酯、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸6-羥基己酯、(甲基)丙烯酸8-羥基辛酯、(甲基)丙烯酸10-羥基癸酯、(甲基)丙烯酸12-羥基月桂酯、及[4-(羥基甲基)環己基]丙烯酸甲酯。作為用於丙烯酸系聚合物之含羥基單體,可使用一種含羥基單體,亦可使用兩種以上之含羥基單體。於本實施形態中,作為用於丙烯酸系聚合物之含羥基單體,較佳為使用(甲基)丙烯酸2-羥基乙酯。就於所形成之黏著劑層12實現接著性或適度之凝聚力之觀點而言,上述丙烯酸系聚合物中之源自含羥基單體之單體單元之比率例如為0.1~30質量%,較佳為0.5~20質量%。Examples of the hydroxyl-containing monomer used to form the monomer unit of the acrylic polymer include: (meth)acrylic acid 2 -Hydroxyethyl ester, 2-hydroxypropyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, ( 6-hydroxyhexyl methacrylate, 8-hydroxyoctyl (meth)acrylate, 10-hydroxydecyl (meth)acrylate, 12-hydroxylauryl (meth)acrylate, and [4-(hydroxymethyl) base) cyclohexyl] methyl acrylate. As the hydroxyl-containing monomer used in the acrylic polymer, one hydroxyl-containing monomer may be used, or two or more hydroxyl-containing monomers may be used. In this embodiment, it is preferable to use 2-hydroxyethyl (meth)acrylate as the hydroxyl-containing monomer used for the acrylic polymer. From the viewpoint of achieving adhesiveness or appropriate cohesive force in the formed adhesive layer 12, the ratio of monomer units derived from hydroxyl-containing monomers in the acrylic polymer is preferably, for example, 0.1 to 30% by mass. It is 0.5~20 mass%.

黏著劑層12中所含有之丙烯酸系聚合物亦可包含源自含羧基單體之單體單元。含羧基單體係於單體單元內具有至少一個羧基之單體。於黏著劑層12內之丙烯酸系聚合物包含含羧基單體單元之情形時,在黏著劑層12容易獲得良好之接著可靠性。於黏著劑層12形成用之黏著劑組合物含有包含含羧基單體單元之丙烯酸系聚合物與例如異氰酸酯系交聯劑之情形時,含羧基單體單元之羧基(含活性氫官能基)能夠作為交聯點發揮功能。The acrylic polymer contained in the adhesive layer 12 may also contain monomer units derived from carboxyl group-containing monomers. Carboxyl-containing monomers are monomers with at least one carboxyl group in the monomer unit. When the acrylic polymer in the adhesive layer 12 contains carboxyl group-containing monomer units, it is easy to obtain good bonding reliability in the adhesive layer 12 . When the adhesive composition for forming the adhesive layer 12 contains an acrylic polymer containing a carboxyl group-containing monomer unit and an isocyanate-based crosslinking agent, for example, the carboxyl group (containing an active hydrogen functional group) of the carboxyl group-containing monomer unit can Functions as a cross-linking point.

作為用以構成上述丙烯酸系聚合物之單體單元之含羧基單體即用以形成該丙烯酸系聚合物之單體成分中所含之含羧基單體,例如可列舉:(甲基)丙烯酸、伊康酸、馬來酸、及丙烯酸β-羧基乙酯。作為用於丙烯酸系聚合物之含羧基單體,可使用一種含羧基單體,亦可使用兩種以上之含羧基單體。於本實施形態中,作為用於丙烯酸系聚合物之含羧基單體,較佳為使用丙烯酸。就於所形成之黏著劑層12確保良好之接著可靠性之觀點而言,上述丙烯酸系聚合物中之源自含羧基單體之單體單元之比率例如為0.1~20質量%,較佳為0.5~15質量%。Examples of the carboxyl group-containing monomer used to constitute the monomer unit of the acrylic polymer include: (meth)acrylic acid, Iconic acid, maleic acid, and β-carboxyethyl acrylate. As the carboxyl group-containing monomer used in the acrylic polymer, one type of carboxyl group-containing monomer can be used, or two or more types of carboxyl group-containing monomers can be used. In this embodiment, acrylic acid is preferably used as the carboxyl group-containing monomer used for the acrylic polymer. From the viewpoint of ensuring good adhesion reliability in the formed adhesive layer 12, the ratio of monomer units derived from carboxyl group-containing monomers in the acrylic polymer is, for example, 0.1 to 20% by mass, preferably 0.1 to 20% by mass. 0.5~15% by mass.

黏著劑層12中所含有之丙烯酸系聚合物亦可包含源自乙烯酯系單體之單體單元。乙烯酯系單體係於單體單元內具有至少一個乙烯酯基之單體。於黏著劑層12內之丙烯酸系聚合物包含乙烯酯系單體單元之情形時,在黏著劑層12容易獲得良好之凝聚力。The acrylic polymer contained in the adhesive layer 12 may also contain monomer units derived from vinyl ester monomers. Vinyl ester monomer system is a monomer having at least one vinyl ester group in the monomer unit. When the acrylic polymer in the adhesive layer 12 contains vinyl ester monomer units, it is easy to obtain good cohesion in the adhesive layer 12 .

作為用以構成上述丙烯酸系聚合物之單體單元之乙烯酯系單體即用以形成該丙烯酸系聚合物之單體成分中所含之乙烯酯系單體,例如可列舉:乙酸乙烯酯、丙酸乙烯酯、丁酸乙烯酯、新戊酸乙烯酯、環己烷羧酸乙烯酯、苯甲酸乙烯酯。作為用於丙烯酸系聚合物之乙烯酯系單體,可使用一種乙烯酯系單體,亦可使用兩種以上之乙烯酯系單體。於本實施形態中,作為用於丙烯酸系聚合物之乙烯酯系單體,較佳為使用乙酸乙烯酯。就於所形成之黏著劑層12確保良好之凝聚力之觀點而言,上述丙烯酸系聚合物中之源自乙烯酯系單體之單體單元之比率例如為10~60質量%,較佳為20~50質量%。Examples of the vinyl ester monomer used to form the monomer unit of the acrylic polymer include vinyl acetate, Vinyl propionate, vinyl butyrate, vinyl pivalate, vinyl cyclohexanecarboxylate, vinyl benzoate. As the vinyl ester monomer used for the acrylic polymer, one vinyl ester monomer may be used, or two or more vinyl ester monomers may be used. In this embodiment, vinyl acetate is preferably used as the vinyl ester monomer used for the acrylic polymer. From the viewpoint of ensuring good cohesion of the adhesive layer 12 formed, the ratio of monomer units derived from vinyl ester monomers in the acrylic polymer is, for example, 10 to 60 mass %, preferably 20 ~50% by mass.

黏著劑層12中所含有之丙烯酸系聚合物亦可包含源自其他單體之單體單元。作為其他單體,可列舉:上述含羥基單體、含羧基單體及乙烯酯系單體以外之含有含活性氫官能基之單體、含氮原子單體、含環氧基單體、含烷氧基單體、含氰基單體、苯乙烯系單體、含異氰酸基單體、具有雜環之(甲基)丙烯酸酯、含鹵素原子單體、含烷氧基矽烷基單體、含矽氧烷鍵單體、含脂環式烴基之(甲基)丙烯酸酯、含芳香族烴基之(甲基)丙烯酸酯、及多官能(甲基)丙烯酸酯等多官能單體。The acrylic polymer contained in the adhesive layer 12 may also contain monomer units derived from other monomers. Examples of other monomers include monomers containing active hydrogen-containing functional groups, nitrogen atom-containing monomers, epoxy group-containing monomers, Alkoxy monomers, cyano group-containing monomers, styrenic monomers, isocyanate group-containing monomers, (meth)acrylates with heterocyclic rings, halogen atom-containing monomers, alkoxysilane group-containing monomers Polyfunctional monomers such as monomers containing siloxane bonds, (meth)acrylates containing alicyclic hydrocarbon groups, (meth)acrylates containing aromatic hydrocarbon groups, and multifunctional (meth)acrylates.

作為上述含氮原子單體,例如可列舉:N-乙烯基-2-吡咯啶酮、N-甲基乙烯基吡咯啶酮、2-乙烯基吡啶、N-乙烯基哌啶酮、5-乙烯基嘧啶、N-乙烯基哌𠯤、2-乙烯基吡𠯤、N-乙烯基吡咯、N-乙烯基咪唑、4-乙烯基㗁唑、N-乙烯基𠰌啉、N-乙烯基己內醯胺、N-(甲基)丙烯醯𠰌啉、(甲基)丙烯醯胺、N,N-二甲基(甲基)丙烯醯胺、N-丁基(甲基)丙烯醯胺、N-羥甲基(甲基)丙烯醯胺、N-異丙基(甲基)丙烯醯胺、N-甲氧基甲基(甲基)丙烯醯胺、N-丁氧基甲基(甲基)丙烯醯胺、(甲基)丙烯酸胺基乙酯、(甲基)丙烯酸N,N-二甲基胺基乙酯、(甲基)丙烯酸第三丁基胺基乙酯等。Examples of the nitrogen atom-containing monomer include N-vinyl-2-pyrrolidone, N-methylvinylpyrrolidone, 2-vinylpyridine, N-vinylpiperidone, and 5-ethylene. Pyrimidine, N-vinylpiperidine, 2-vinylpyridine, N-vinylpyrrole, N-vinylimidazole, 4-vinylethazole, N-vinylpyridine, N-vinylcaprolactone Amine, N-(meth)acrylamide, (meth)acrylamide, N,N-dimethyl(meth)acrylamide, N-butyl(meth)acrylamide, N- Hydroxymethyl(meth)acrylamide, N-isopropyl(meth)acrylamide, N-methoxymethyl(meth)acrylamide, N-butoxymethyl(methyl) Acrylamide, (meth)acrylic acid aminoethyl ester, (meth)acrylic acid N,N-dimethylaminoethyl ester, (meth)acrylic acid tert-butylaminoethyl ester, etc.

作為上述含環氧基單體,例如可列舉:(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸甲基縮水甘油酯、烯丙基縮水甘油基醚等。Examples of the epoxy group-containing monomer include glycidyl (meth)acrylate, methylglycidyl (meth)acrylate, allyl glycidyl ether, and the like.

作為上述含烷氧基單體,例如可列舉:(甲基)丙烯酸甲氧基乙酯、(甲基)丙烯酸乙氧基乙酯等。Examples of the alkoxy group-containing monomer include methoxyethyl (meth)acrylate, ethoxyethyl (meth)acrylate, and the like.

作為上述含氰基單體,例如可列舉:丙烯腈、甲基丙烯腈等。Examples of the cyano group-containing monomer include acrylonitrile, methacrylonitrile, and the like.

作為上述苯乙烯系單體,例如可列舉:苯乙烯、取代苯乙烯(α-甲基苯乙烯等)、乙烯基甲苯等。Examples of the styrene-based monomer include styrene, substituted styrene (α-methylstyrene, etc.), vinyl toluene, and the like.

作為上述含異氰酸基單體,例如可列舉:異氰酸2-(甲基)丙烯醯氧基乙酯。Examples of the isocyanate group-containing monomer include 2-(meth)acryloyloxyethyl isocyanate.

作為具有雜環之(甲基)丙烯酸酯,例如可列舉:(甲基)丙烯酸四氫呋喃甲酯等。Examples of the (meth)acrylate having a heterocyclic ring include tetrahydrofuran methyl (meth)acrylate.

作為上述含鹵素原子單體,例如可列舉:氯乙烯、偏二氯乙烯等。Examples of the halogen atom-containing monomer include vinyl chloride, vinylidene chloride, and the like.

作為上述含烷氧基矽烷基單體,例如可列舉:3-(甲基)丙烯醯氧基丙基三甲氧基矽烷、3-(甲基)丙烯醯氧基丙基三乙氧基矽烷、3-(甲基)丙烯醯氧基丙基甲基二甲氧基矽烷、3-(甲基)丙烯醯氧基丙基甲基二乙氧基矽烷等。Examples of the alkoxysilyl group-containing monomer include: 3-(meth)acryloxypropyltrimethoxysilane, 3-(meth)acryloxypropyltriethoxysilane, 3-(meth)acryloxypropylmethyldimethoxysilane, 3-(meth)acryloxypropylmethyldiethoxysilane, etc.

作為具有矽氧烷鍵之單體,例如可列舉:矽酮(甲基)丙烯酸酯等。Examples of the monomer having a siloxane bond include silicone (meth)acrylate.

作為上述含脂環式烴基之(甲基)丙烯酸酯,例如可列舉:(甲基)丙烯酸環戊酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸異𦯉酯、(甲基)丙烯酸雙環戊酯、(甲基)丙烯酸金剛烷基酯等。Examples of the alicyclic hydrocarbon group-containing (meth)acrylate include: (meth)cyclopentyl acrylate, (meth)cyclohexyl acrylate, (meth)isoacrylate, (meth)acrylate Dicyclopentyl acrylate, adamantyl (meth)acrylate, etc.

作為上述含芳香族烴基之(甲基)丙烯酸酯,例如可列舉:(甲基)丙烯酸芳基酯(例如(甲基)丙烯酸苯酯)、(甲基)丙烯酸芳氧基烷基酯(例如(甲基)丙烯酸苯氧基乙酯)、(甲基)丙烯酸芳烷基酯(例如(甲基)丙烯酸苄酯)等。Examples of the aromatic hydrocarbon group-containing (meth)acrylate include: (meth)aryl acrylate (for example, phenyl (meth)acrylate), (meth)aryloxyalkyl acrylate (for example) (Phenoxyethyl acrylate), aralkyl (meth)acrylate (such as benzyl (meth)acrylate), etc.

作為上述多官能性單體,例如可列舉:己二醇二(甲基)丙烯酸酯、乙二醇二(甲基)丙烯酸酯、丙二醇二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、季戊四醇二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯等。Examples of the polyfunctional monomer include hexylene glycol di(meth)acrylate, ethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, and polyethylene glycol di(meth)acrylate. acrylate, polypropylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate, pentaerythritol di(meth)acrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol Tri(meth)acrylate, dipentaerythritol hexa(meth)acrylate, etc.

此處所揭示之技術中之其他單體原料可基於調整丙烯酸系聚合物之Tg或提高凝聚力等目的而單獨使用一種或組合兩種以上使用。The other monomer raw materials in the technology disclosed here can be used alone or in combination of two or more for the purpose of adjusting the Tg of the acrylic polymer or improving the cohesive force.

黏著劑層12中所含有之丙烯酸系聚合物之重量平均分子量(Mw)例如為10萬~300萬,較佳為20萬~200萬,更佳為30萬~150萬,更佳為40萬~100萬。丙烯酸系聚合物之重量平均分子量(Mw)意指藉由凝膠滲透層析儀(GPC)測定而獲得之標準聚苯乙烯換算之值。The weight average molecular weight (Mw) of the acrylic polymer contained in the adhesive layer 12 is, for example, 100,000 to 3,000,000, preferably 200,000 to 2,000,000, more preferably 300,000 to 1.5 million, more preferably 400,000. ~1 million. The weight average molecular weight (Mw) of the acrylic polymer means a standard polystyrene-converted value measured by gel permeation chromatography (GPC).

黏著劑層12中所含有之丙烯酸系聚合物之玻璃轉移溫度(Tg)例如為0℃以下,較佳為-10℃以下,更佳為-30℃以下,更佳為-50℃以下。丙烯酸系聚合物之玻璃轉移溫度可使用利用動態黏彈性裝置之測定方法、或藉由FOX式所得之計算值等。The glass transition temperature (Tg) of the acrylic polymer contained in the adhesive layer 12 is, for example, 0°C or lower, preferably -10°C or lower, more preferably -30°C or lower, more preferably -50°C or lower. The glass transition temperature of an acrylic polymer can be measured using a dynamic viscoelastic device or calculated using the FOX formula.

作為黏著劑層12用黏著劑之上述胺基甲酸酯系聚合物係分子鏈中具有多個胺基甲酸酯鍵之聚合物,為聚合物乙二醇或低分子乙二醇等多元醇、二異氰酸酯等多官能異氰酸酯、及視需要使用之含活性氫基化合物之聚合物。於本實施形態中,該胺基甲酸酯系聚合物較佳為在主鏈或側鏈上具有能夠與異氰酸酯系交聯劑反應之羥基或羧基等含活性氫官能基。The above-mentioned urethane polymer used as the adhesive for the adhesive layer 12 is a polymer having multiple urethane bonds in the molecular chain, and is a polyol such as polymer ethylene glycol or low molecular weight ethylene glycol. , diisocyanate and other multifunctional isocyanates, and polymers containing active hydrogen compounds used as needed. In this embodiment, the urethane polymer preferably has an active hydrogen-containing functional group such as a hydroxyl group or a carboxyl group that can react with an isocyanate cross-linking agent on the main chain or side chain.

黏著劑層12中之丙烯酸系聚合物或胺基甲酸酯系聚合物等黏著劑亦可由交聯劑交聯。可利用藉由該交聯劑進行之黏著劑之交聯來調整黏著劑層12之凝膠分率。作為此種交聯劑,例如可列舉:異氰酸酯系交聯劑、環氧系交聯劑、三聚氰胺系交聯劑、及金屬螯合物系交聯劑。用以形成黏著劑層12之黏著劑組合物可含有一種交聯劑,亦可含有兩種以上之該交聯劑。於本實施形態中,較佳為使用異氰酸酯系交聯劑及/或環氧系交聯劑。The adhesive such as acrylic polymer or urethane polymer in the adhesive layer 12 can also be cross-linked by a cross-linking agent. The gel fraction of the adhesive layer 12 can be adjusted by cross-linking the adhesive by the cross-linking agent. Examples of such cross-linking agents include isocyanate-based cross-linking agents, epoxy-based cross-linking agents, melamine-based cross-linking agents, and metal chelate-based cross-linking agents. The adhesive composition used to form the adhesive layer 12 may contain one cross-linking agent, or may contain two or more cross-linking agents. In this embodiment, it is preferable to use an isocyanate cross-linking agent and/or an epoxy cross-linking agent.

作為異氰酸酯系交聯劑,例如可列舉:脂肪族異氰酸酯類、脂環式異氰酸酯類、及芳香族異氰酸酯類。作為脂肪族異氰酸酯類,例如可列舉:三亞甲基二異氰酸酯、伸丁基二異氰酸酯、六亞甲基二異氰酸酯、及二聚酸二異氰酸酯。作為脂環式異氰酸酯類,例如可列舉:伸環戊基二異氰酸酯、伸環己基二異氰酸酯、異佛爾酮二異氰酸酯、及1,3-雙(異氰酸酯基甲基)環己烷。作為芳香族異氰酸酯類,例如可列舉:2,4-甲伸苯基二異氰酸酯、4,4'-二苯基甲烷二異氰酸酯、及苯二甲基二異氰酸酯。又,作為異氰酸酯系交聯劑,亦可列舉:甲伸苯基二異氰酸酯之三羥甲基丙烷加成物(商品名「Coronate L」,東梭股份有限公司製造)或六亞甲基二異氰酸酯之異三聚氰酸體(商品名「Coronate HX」,東梭股份有限公司製造)。Examples of isocyanate-based crosslinking agents include aliphatic isocyanates, alicyclic isocyanates, and aromatic isocyanates. Examples of aliphatic isocyanates include trimethylene diisocyanate, butylene diisocyanate, hexamethylene diisocyanate, and dimer acid diisocyanate. Examples of alicyclic isocyanates include cyclopentyl diisocyanate, cyclohexyl diisocyanate, isophorone diisocyanate, and 1,3-bis(isocyanatomethyl)cyclohexane. Examples of aromatic isocyanates include 2,4-methylphenyl diisocyanate, 4,4'-diphenylmethane diisocyanate, and xylylenediisocyanate. Examples of the isocyanate cross-linking agent include trimethylolpropane adduct of tolylene diisocyanate (trade name "Coronate L", manufactured by Tosot Co., Ltd.) or hexamethylene diisocyanate. Coronate HX (trade name: "Coronate HX", manufactured by Tosot Co., Ltd.).

作為環氧系交聯劑(多官能環氧化合物),例如可列舉:N,N,N',N'-四縮水甘油基-間苯二甲胺、二縮水甘油基苯胺、1,3-雙(N,N-二縮水甘油胺甲基)環己烷、1,6-己二醇二縮水甘油醚、及新戊二醇二縮水甘油醚。Examples of the epoxy cross-linking agent (polyfunctional epoxy compound) include: N,N,N',N'-tetraglycidyl-m-xylylenediamine, diglycidylaniline, 1,3- Bis(N,N-diglycidylaminemethyl)cyclohexane, 1,6-hexanediol diglycidyl ether, and neopentyl glycol diglycidyl ether.

於黏著劑層12形成用之黏著劑組合物含有交聯劑之情形時,就在所形成之黏著劑層12實現對被黏著體之充分之接著可靠性之觀點而言,相對於該組合物中之黏著劑100質量份,例如為0.1~20質量份,較佳為0.5~15質量份,更佳為1~10質量份。When the adhesive composition for forming the adhesive layer 12 contains a cross-linking agent, from the viewpoint of realizing sufficient adhesion reliability to the adherend of the formed adhesive layer 12, relative to the composition 100 parts by mass of the adhesive in the adhesive is, for example, 0.1 to 20 parts by mass, preferably 0.5 to 15 parts by mass, and more preferably 1 to 10 parts by mass.

黏著劑層12或用以形成其之黏著劑組合物亦可視需要進而含有交聯促進劑、或黏著賦予樹脂、抗老化劑、填充劑、抗氧化劑、塑化劑、軟化劑、界面活性劑、抗靜電劑等各種添加劑。The adhesive layer 12 or the adhesive composition used to form it may also contain cross-linking accelerators, or adhesion-imparting resins, anti-aging agents, fillers, antioxidants, plasticizers, softeners, surfactants, Various additives such as antistatic agents.

關於黏著劑層12之厚度,就實現對被黏著體之充分之黏著力之觀點而言,較佳為1 μm以上,更佳為5 μm以上,更佳為10 μm以上,更佳為15 μm以上。又,就形成之容易性之觀點而言,黏著劑層12之厚度較佳為200 μm以下,更佳為100 μm以下,更佳為50 μm以下,更佳為30 μm以下。The thickness of the adhesive layer 12 is preferably 1 μm or more, more preferably 5 μm or more, more preferably 10 μm or more, and more preferably 15 μm, from the viewpoint of achieving sufficient adhesion to the adherend. above. In addition, from the viewpoint of ease of formation, the thickness of the adhesive layer 12 is preferably 200 μm or less, more preferably 100 μm or less, more preferably 50 μm or less, and more preferably 30 μm or less.

又,膜10之厚度方向之霧度較佳為5%以下,更佳為3%以下,更佳為1.5%以下。霧度設為依據JIS K 7136所測得之值。In addition, the haze in the thickness direction of the film 10 is preferably 5% or less, more preferably 3% or less, and more preferably 1.5% or less. The haze is set to the value measured in accordance with JIS K 7136.

具有如上所述之積層構造之膜10亦可以被覆黏著劑層12之黏著面12a之方式設置有隔離膜或剝離襯墊。隔離膜係用以保護膜10之黏著劑層12不露出之要素,於將膜10貼合於被黏著體時自膜10剝離。作為隔離膜,例如可列舉:具有剝離處理層之基材、包含氟聚合物之低接著性基材、及包含非極性聚合物之低接著性基材。隔離膜之表面亦可被實施離型處理、防污處理、或抗靜電處理。隔離膜之厚度例如為5~200 μm。膜10具體而言可採用與被覆黏著劑層12之黏著面12a之隔離膜相伴之片狀形態,亦可採用不與隔離膜相伴而膜10之基材膜11與黏著劑層12以交替地配置之方式被捲繞成滾筒狀而成之形態。The film 10 having the above-mentioned laminated structure may also be provided with a release film or a release liner so as to cover the adhesive surface 12 a of the adhesive layer 12 . The isolation film is an element used to protect the adhesive layer 12 of the film 10 from being exposed, and is peeled off from the film 10 when the film 10 is attached to an adherend. Examples of the separator include a base material having a release-treated layer, a low-adhesion base material containing a fluoropolymer, and a low-adhesion base material containing a non-polar polymer. The surface of the isolation film can also be subjected to release treatment, antifouling treatment, or antistatic treatment. The thickness of the isolation film is, for example, 5 to 200 μm. Specifically, the film 10 may be in a sheet-like form accompanied by a release film covering the adhesive surface 12a of the adhesive layer 12, or may be in a sheet-like form without being accompanied by a release film and the base film 11 and the adhesive layer 12 of the film 10 may be alternately The arrangement is rolled into a drum shape.

如上所述之構成之膜10例如可藉由以下方式製造。首先,製備黏著劑層12形成用之組合物。該組合物含有在上文已關於黏著劑層12敍述之特定成分及溶劑。作為溶劑,例如可列舉:乙酸乙酯等酯類、甲苯等芳香族烴類、正己烷等脂肪族烴類、及環己烷等脂環式烴類。其次,將黏著劑層12形成用之黏著劑組合物塗佈於基材膜11上而形成黏著劑組合物層,使該組合物層乾燥、固化,藉此形成黏著劑層12。或者,膜10亦可藉由在隔離膜上形成黏著劑層12後,將該黏著劑層12貼合至基材膜11來製作。The film 10 having the above structure can be produced in the following manner, for example. First, a composition for forming the adhesive layer 12 is prepared. The composition contains the specific ingredients and solvents described above with respect to the adhesive layer 12 . Examples of the solvent include esters such as ethyl acetate, aromatic hydrocarbons such as toluene, aliphatic hydrocarbons such as n-hexane, and alicyclic hydrocarbons such as cyclohexane. Next, the adhesive composition for forming the adhesive layer 12 is coated on the base film 11 to form an adhesive composition layer, and the composition layer is dried and solidified to form the adhesive layer 12 . Alternatively, the film 10 can also be produced by forming the adhesive layer 12 on the isolation film and then bonding the adhesive layer 12 to the base film 11 .

於作為具備如上所述之構成之表面保護膜之膜10中,基材膜11如上所述,130℃下之儲存彈性模數為700 MPa以下,較佳為500 MPa以下,更佳為300 MPa以下,更佳為200 MPa以下,更佳為100 MPa以下,更佳為80 MPa以下。此種構成適合:對於包含彎曲部位或撓曲部位等非平坦部位之被黏著體保護對象面,使膜10一面於例如藉由向100℃左右以上加熱而充分地軟化之狀態下追隨非平坦部位之表面形狀,一面進行貼合。In the film 10 as the surface protective film having the above-described structure, the base film 11 has a storage elastic modulus at 130° C. of 700 MPa or less, preferably 500 MPa or less, and more preferably 300 MPa, as described above. or less, more preferably 200 MPa or less, more preferably 100 MPa or less, more preferably 80 MPa or less. This configuration is suitable for a surface to be protected by an adherend including a non-flat part such as a curved part or a deflection part, so that the film 10 can follow the non-flat part in a state that is sufficiently softened by, for example, heating to about 100° C. or above. According to the surface shape, one side is attached.

此外,膜10之基材膜11如上所述,30℃下之儲存彈性模數為1000 MPa以上,較佳為1500 MPa以上,更佳為2000 MPa以上,更佳為2500 MPa以上,更佳為2700 MPa以上,更佳為2800 MPa以上。此種構成適合:對於包含彎曲部位或撓曲部位等非平坦部位之被黏著體保護對象面,在膜10一面例如藉由向100℃左右以上加熱而充分地軟化從而追隨非平坦部位之表面形狀,一面被貼合於該保護對象面後,於該膜降溫至室溫左右之狀態下,維持膜10對非平坦表面形狀之追隨形狀。In addition, as mentioned above, the base film 11 of the film 10 has a storage elastic modulus at 30°C of 1000 MPa or more, preferably 1500 MPa or more, more preferably 2000 MPa or more, more preferably 2500 MPa or more, more preferably 2700 MPa or more, preferably 2800 MPa or more. This configuration is suitable for a surface to be protected by an adherend that includes uneven portions such as curved portions or flexed portions. The film 10 side is sufficiently softened, for example, by heating to about 100° C. or above to follow the surface shape of the uneven portion. , after one side is bonded to the surface to be protected, and the film 10 maintains the shape following the non-flat surface shape while the film is cooled to about room temperature.

如上所述,膜10適合:一面於例如藉由向100℃左右以上加熱而充分地軟化之狀態下追隨保護對象面內之非平坦表面形狀,一面貼合於該保護對象面;並且適合:於此種貼合後之室溫左右之溫度條件下維持對非平坦表面形狀之追隨形狀。此種膜10就對具有彎曲部位或撓曲部位等非平坦部位之保護對象面進行被覆保護之方面而言較佳。As described above, the film 10 is suitable for following the non-flat surface shape in the surface to be protected while being in a state of being sufficiently softened by heating to about 100°C or above, for example, while being adhered to the surface to be protected; and is suitable for: After this bonding, the shape can be maintained to follow the non-flat surface shape under temperature conditions around room temperature. This type of film 10 is suitable for covering and protecting a surface to be protected that has a non-flat portion such as a curved portion or a flexed portion.

膜10之基材膜11如上所述,較佳為具有包含抗靜電層之積層構造。抗靜電層如上所述,較佳為含有具有四級銨基之抗靜電劑及/或導電性聚合物。該等構成適合防止或抑制膜10之帶電。膜10之帶電之防止或抑制適合對膜10確保對保護對象面之貼合作業等之操作容易性。又,膜10之帶電之防止或抑制適合防止或抑制塵埃等微小異物進入至膜10與被貼合其之保護對象面之間。As mentioned above, the base film 11 of the film 10 preferably has a laminated structure including an antistatic layer. As mentioned above, the antistatic layer preferably contains an antistatic agent having a quaternary ammonium group and/or a conductive polymer. These structures are suitable for preventing or suppressing charging of the film 10 . The prevention or suppression of electrification of the film 10 is suitable for ensuring ease of operation such as adhering the film 10 to the surface to be protected. In addition, the prevention or suppression of charging of the film 10 is suitable for preventing or suppressing the entry of tiny foreign matter such as dust into the space between the film 10 and the surface to be protected to which it is bonded.

膜10如上所述,較佳為真空壓空成形貼合型膜。膜10為真空壓空成形貼合型膜之構成適合:對於膜10,一面使其適當地追隨被黏著體之保護對象面內之彎曲部位或撓曲部位等非平坦部位之表面形狀,一面貼合於該保護對象面而使用。As mentioned above, the film 10 is preferably a vacuum pressure forming lamination type film. The film 10 is a vacuum pressure-formed lamination type film. The structure of the film 10 is suitable for the film 10 to properly follow the surface shape of non-flat areas such as bends or flexures in the surface of the adherend to be protected. Used in accordance with the protection object.

圖2係本發明之另一實施形態之附帶膜10之光學構件20之局部剖視圖。FIG. 2 is a partial cross-sectional view of an optical member 20 with a film 10 according to another embodiment of the present invention.

光學構件20例如為組入至顯示器之顯示器用透明覆蓋構件。作為顯示器,例如可列舉:智慧型手機或電視用之液晶顯示器及有機電致發光顯示器。又,光學構件20具有被設為藉由表面保護膜進行之保護之對象之表面21。表面21具有彎曲部位21a及撓曲部位21b。此種光學構件20例如包含透明之樹脂系材料或玻璃系材料。The optical member 20 is, for example, a transparent cover member for a display incorporated into the display. Examples of displays include liquid crystal displays and organic electroluminescent displays for smartphones and televisions. Furthermore, the optical member 20 has a surface 21 to be protected by a surface protective film. The surface 21 has a curved portion 21a and a deflection portion 21b. The optical member 20 includes, for example, a transparent resin-based material or a glass-based material.

對於此種光學構件20之表面21,將作為表面保護膜之上述膜10於其黏著劑層(於圖2中未圖示)側貼合。膜10被貼合於表面21之彎曲部位21a及撓曲部位21b之所有部位。For the surface 21 of such an optical member 20, the above-mentioned film 10 as a surface protective film is bonded to its adhesive layer (not shown in FIG. 2) side. The film 10 is adhered to all parts of the curved portion 21a and the deflected portion 21b of the surface 21.

根據附帶膜10之該光學構件20,關於該膜10,可享受在上文已關於膜10敍述之技術效果相同之技術效果。即,於附帶膜10之光學構件20中,上述膜10就對具有彎曲部位21a或撓曲部位21b等非平坦部位之表面21(保護對象面)進行被覆保護之方面而言較佳。 實施例According to the optical member 20 provided with the film 10 , the same technical effects as those described above with respect to the film 10 can be enjoyed with respect to the film 10 . That is, in the optical member 20 provided with the film 10, the film 10 is preferable in terms of covering and protecting the surface 21 (surface to be protected) having non-flat portions such as the curved portion 21a or the flexed portion 21b. Example

[基材膜F1 之製作] 使用具備特定之加熱輥群及拉幅機之延伸裝置,自作為具有間苯二甲酸單元(7莫耳%)、對苯二甲酸單元(44莫耳%)、乙二醇單元(48莫耳%)及二乙二醇單元(1莫耳%)之原料膜之聚對苯二甲酸乙二酯(PET)膜(厚度100 μm,重量平均分子量(Mw)72000,玻璃轉移溫度75℃)製作雙軸延伸膜。首先,將該PET膜一面通過85℃之加熱輥群,一面在所謂之MD方向上以1.6倍之延伸倍率進行延伸,而製作單軸配向PET膜。其次,對於該PET膜,引導至拉幅機內,於100℃之加熱區內在所謂之TD方向上以1.6倍之延伸倍率進行延伸,繼而,於拉幅機內之200℃之熱處理區內實施熱固定,而獲得厚度38 μm之聚酯系膜。其次,對該聚酯系膜之單面實施電暈處理。藉由以上方式而製作單面具有電暈處理面之聚酯系膜(基材膜F1 )。[Preparation of base film F 1 ] Using a stretching device equipped with a specific heating roller group and a tenter, it has an isophthalic acid unit (7 mol%) and a terephthalic acid unit (44 mol%). , polyethylene terephthalate (PET) film (thickness 100 μm, weight average molecular weight (Mw)) as raw material film for ethylene glycol unit (48 mol%) and diethylene glycol unit (1 mol%) 72000, glass transition temperature 75℃) to produce biaxially stretched film. First, the PET film was stretched in the so-called MD direction at a stretching ratio of 1.6 times while passing through a group of heated rollers at 85°C, thereby producing a uniaxially aligned PET film. Next, the PET film is guided into the tenter, stretched in the so-called TD direction at a stretching ratio of 1.6 times in the heating zone at 100°C, and then carried out in the heat treatment zone at 200°C in the tenter. Heat fixation to obtain a polyester film with a thickness of 38 μm. Next, corona treatment is performed on one side of the polyester film. In the above manner, a polyester-based film (base film F 1 ) having a corona-treated surface on one side was produced.

[基材膜F2 之製作] 準備如下溶液(抗靜電層形成用溶液):將作為側鏈中包含四級銨基之丙烯酸系共聚物之丙烯酸系抗靜電劑(商品名「BONDEIP-PA100主劑」,Konishi股份有限公司製造)、與作為硬化劑之環氧樹脂(商品名「BONDEIP-PA100硬化劑」)以質量比100:100計包含於水與異丙基醇之混合溶劑中。其次,將該溶液塗佈於上述基材膜F1 之電暈處理面後,使該塗膜乾燥。藉此於聚酯系膜之表面形成厚度100 nm之抗靜電層。藉由以上方式而製作單面具有抗靜電層(厚度100 nm)之聚酯系膜(基材膜F2 )。[Preparation of base film F 2 ] Prepare the following solution (solution for antistatic layer formation): an acrylic antistatic agent (trade name "BONDEIP-PA100") which is an acrylic copolymer containing quaternary ammonium groups in the side chain. Agent", manufactured by Konishi Co., Ltd.), and epoxy resin as a hardener (trade name "BONDEIP-PA100 Hardener") are contained in a mixed solvent of water and isopropyl alcohol at a mass ratio of 100:100. Next, this solution is applied to the corona-treated surface of the above-mentioned base film F 1 , and then the coating film is dried. This forms an antistatic layer with a thickness of 100 nm on the surface of the polyester film. In the above manner, a polyester-based film (base film F 2 ) having an antistatic layer (thickness: 100 nm) on one side was produced.

[基材膜F3 之製作] 使用具備特定之加熱輥群及拉幅機之延伸裝置,自作為上述原料膜之PET膜(厚度100 μm,重量平均分子量(Mw)72000,玻璃轉移溫度75℃)製作雙軸延伸膜。首先,將該PET膜一面通過85℃之加熱輥群,一面在所謂之MD方向上以1.4倍之延伸倍率進行延伸,而製作單軸配向PET膜。其次,對於該膜,引導至拉幅機內,於100℃之加熱區內在所謂之TD方向上以1.4倍之延伸倍率進行延伸,繼而,於拉幅機內之200℃之熱處理區內實施熱固定,而獲得厚度50 μm之聚酯系膜。其次,對該聚酯系膜之單面實施電暈處理。另一方面,準備作為黏合劑之包含飽和共聚聚酯樹脂25質量%之分散液S1 (商品名「VYLONAL MD-1480」,東洋紡股份有限公司製造)、作為潤滑劑之巴西棕櫚蠟之水分散液S2 、作為導電性聚合物之包含聚(3,4-乙二氧基噻吩)0.5質量%及聚苯乙烯磺酸鹽(數平均分子量15萬)0.8質量%之水溶液S3 (商品名「Baytron P」,H.C.Stark公司製造)、及三聚氰胺系交聯劑之溶液S4 (商品名「Nikaresin S-176」,日本電石工業股份有限公司製造)。然後,向水與乙醇之體積比1:3之混合溶劑中加入以固形物成分量計為100質量份之上述分散液S1 、以固形物成分量計為30質量份之上述水分散液S2 、以固形物成分量計為50質量份之上述水溶液S3 、及以固形物成分量計為10質量份之上述溶液S4 ,攪拌約20分鐘而混合。藉此,製備非揮發成分(NV)濃度約0.15質量%之塗佈材料。將該塗佈材料塗佈於延伸倍率1.4倍之上述雙軸延伸聚酯系膜之電暈處理面後,使該塗膜乾燥。藉此,於該聚酯系膜之表面形成厚度15 nm之抗靜電層。藉由以上方式而製作單面具有抗靜電層(厚度15 nm)之聚酯系膜(基材膜F3 )。[Preparation of base film F 3 ] Using a stretching device equipped with a specific heating roller group and a tenter, the PET film (thickness 100 μm, weight average molecular weight (Mw) 72000, glass transition temperature 75°C) as the raw material film ) to produce biaxially stretched film. First, the PET film was stretched in the so-called MD direction at a stretching ratio of 1.4 times while passing through a group of heated rollers at 85°C, thereby producing a uniaxially aligned PET film. Next, the film is guided into the tenter, stretched in the so-called TD direction at a stretching ratio of 1.4 times in a heating zone of 100°C, and then heated in a heat treatment zone of 200°C in the tenter. Fixed to obtain a polyester film with a thickness of 50 μm. Next, corona treatment is performed on one side of the polyester film. On the other hand, a dispersion S1 containing 25% by mass of a saturated copolymerized polyester resin as a binder (trade name "VYLONAL MD-1480", manufactured by Toyobo Co., Ltd.) and a water dispersion of carnauba wax as a lubricant were prepared. Liquid S 2 , aqueous solution S 3 (trade name) containing 0.5 mass % of poly(3,4-ethylenedioxythiophene) and 0.8 mass % of polystyrene sulfonate (number average molecular weight: 150,000) as a conductive polymer "Baytron P", manufactured by HCStark Co., Ltd.), and solution S 4 of melamine-based cross-linking agent (trade name "Nikaresin S-176", manufactured by Nippon Carbide Industry Co., Ltd.). Then, 100 parts by mass of the above-mentioned dispersion S 1 in terms of solid content and 30 parts by mass of the above-mentioned aqueous dispersion S in terms of solid content were added to a mixed solvent with a volume ratio of water and ethanol of 1:3. 2. Mix the above-mentioned aqueous solution S 3 which is 50 parts by mass in terms of solid content and 10 parts by mass in terms of solid content and stir for about 20 minutes. Thereby, a coating material with a non-volatile component (NV) concentration of approximately 0.15% by mass was prepared. The coating material was applied to the corona-treated surface of the biaxially stretched polyester film with a stretching ratio of 1.4 times, and then the coating film was dried. Thereby, an antistatic layer with a thickness of 15 nm was formed on the surface of the polyester film. In the above manner, a polyester film (base film F 3 ) having an antistatic layer (thickness: 15 nm) on one side was produced.

[基材膜F4 之製作] 準備作為黏合劑之包含飽和共聚聚酯樹脂25質量%之分散液S1 (商品名「VYLONAL MD-1480」,東洋紡股份有限公司製造)、作為導電性聚合物之聚苯胺磺酸之溶液S5 (商品名「aquaPASS」,重量平均分子量4萬,三菱麗陽股份有限公司製造)、作為交聯劑之以二異丙胺進行封端之六亞甲基二異氰酸酯之異氰尿酸酯體之溶液S6 、及作為潤滑劑之油醯胺之溶液S7 。然後,向水與乙醇之體積比1:3之混合溶劑中加入以固形物成分量計為100質量份之上述分散液S1 、以固形物成分量計為75質量份之上述溶液S5 、以固形物成分量計為10質量份之上述溶液S6 、及以固形物成分量計為30質量份之上述溶液S7 ,攪拌約20分鐘而混合。藉此製備非揮發成分(NV)濃度約0.4質量%之塗佈材料。將該塗佈材料塗佈於延伸倍率1.4倍之上述雙軸延伸聚酯系膜之電暈處理面後,使該塗膜乾燥。藉此於該聚酯系膜之表面形成厚度45 nm之抗靜電層。藉由以上方式而製作單面具有抗靜電層(厚度45 nm)之聚酯系膜(基材膜F4 )。[Preparation of Base Film F 4 ] Dispersion S 1 (trade name "VYLONAL MD-1480", manufactured by Toyobo Co., Ltd.) containing 25% by mass of saturated copolymer polyester resin as a binder and a conductive polymer were prepared Solution S 5 of polyaniline sulfonic acid (trade name "aquaPASS", weight average molecular weight 40,000, manufactured by Mitsubishi Rayon Co., Ltd.), hexamethylene diisocyanate blocked with diisopropylamine as a cross-linking agent The solution of isocyanurate body S 6 and the solution of oleamide as lubricant S 7 . Then, 100 parts by mass of the above-mentioned dispersion S 1 in terms of solid content, 75 parts by mass of the above-mentioned solution S 5 in terms of solid content were added to a mixed solvent with a volume ratio of water and ethanol of 1:3. The above-mentioned solution S 6 , which is 10 parts by mass in terms of solid content, and the above-mentioned solution S 7 , which is 30 parts by mass in terms of solid content, are stirred for about 20 minutes and mixed. Thereby, a coating material with a non-volatile component (NV) concentration of approximately 0.4% by mass was prepared. The coating material was applied to the corona-treated surface of the biaxially stretched polyester film with a stretching ratio of 1.4 times, and then the coating film was dried. Thus, an antistatic layer with a thickness of 45 nm was formed on the surface of the polyester film. In the above manner, a polyester film (base film F 4 ) having an antistatic layer (thickness 45 nm) on one side was produced.

[基材膜F5 之製作] 藉由T模法於結點溫度220℃之條件下將結晶性均聚丙烯(商品名「F-704NP」,樹脂密度0.900,Prime Polymer股份有限公司製造)40質量份、無規聚丙烯(商品名「F-744NP」,樹脂密度0.900,Prime Polymer股份有限公司製造)40質量份、及乙烯-丙烯共聚物(商品名「Tafmer P0180」,三井化學股份有限公司製造)20質量份製膜成厚度40 μm。其次,對所獲得之膜之單面實施電暈處理。藉由以上方式而製作厚度40 μm之聚烯烴系膜(基材膜F5 )。[Preparation of base film F 5 ] Crystalline homopolypropylene (trade name "F-704NP", resin density 0.900, manufactured by Prime Polymer Co., Ltd.) 40 was made by the T-die method at a junction temperature of 220°C. 40 parts by mass of atactic polypropylene (trade name "F-744NP", resin density 0.900, manufactured by Prime Polymer Co., Ltd.), and ethylene-propylene copolymer (trade name "Tafmer P0180", manufactured by Mitsui Chemicals Co., Ltd. (Manufacture) 20 parts by mass to form a film with a thickness of 40 μm. Next, corona treatment is performed on one side of the obtained film. In the above manner, a polyolefin-based film (base film F 5 ) with a thickness of 40 μm was produced.

[丙烯酸系黏著劑組合物A1 之製備] 於配備有回流冷卻器、氮氣導入管、攪拌機、及溫度計之燒瓶(反應容器)內,將包含丙烯酸-2-乙基己酯96.2質量份、丙烯酸羥基乙酯3.8質量份、作為聚合起始劑之2,2'-偶氮二異丁腈0.2質量份、及乙酸乙酯150質量份之混合物一面於氮氣氛圍下穩定地攪拌一面於60℃下反應6小時。藉此獲得以40質量%之濃度含有丙烯酸系聚合物之溶液(丙烯酸系聚合物溶液)。該丙烯酸系聚合物之重量平均分子量為54萬。然後,以丙烯酸系聚合物濃度成為25質量%之方式利用乙酸乙酯對丙烯酸系聚合物溶液進行稀釋後,向該丙烯酸系聚合物溶液400質量份(固形物成分100重量份)加入以固形物成分量計為4質量份之作為甲伸苯基二異氰酸酯之三羥甲基丙烷加成物之交聯劑(商品名「Coronate L」,固形物成分濃度75質量%之乙酸乙酯溶液,東梭股份有限公司製造)、以固形物成分量計為0.02質量份之作為交聯觸媒之二月桂酸二辛基錫(商品名「EMBILIZER OL-1」,Tokyo Fine Chemical股份有限公司製造)、及作為交聯延遲劑之乙醯丙酮3質量份,將該等攪拌混合。藉此獲得丙烯酸系黏著劑組合物(丙烯酸系黏著劑組合物A1 )。[Preparation of acrylic adhesive composition A 1 ] In a flask (reaction vessel) equipped with a reflux cooler, a nitrogen introduction pipe, a stirrer, and a thermometer, 96.2 parts by mass of 2-ethylhexyl acrylate, acrylic acid A mixture of 3.8 parts by mass of hydroxyethyl ester, 0.2 parts by mass of 2,2'-azobisisobutyronitrile as a polymerization initiator, and 150 parts by mass of ethyl acetate was stirred stably under a nitrogen atmosphere at 60°C. Reaction takes 6 hours. Thereby, a solution containing an acrylic polymer at a concentration of 40% by mass (acrylic polymer solution) was obtained. The weight average molecular weight of the acrylic polymer is 540,000. Then, after diluting the acrylic polymer solution with ethyl acetate so that the acrylic polymer concentration becomes 25% by mass, 400 parts by mass (100 parts by weight of solid content) of the acrylic polymer solution was added with solid matter. The ingredient amount is 4 parts by mass of a cross-linking agent (trade name "Coronate L", an ethyl acetate solution with a solid content concentration of 75% by mass, which is a trimethylolpropane adduct of tolylene diisocyanate, Dong (manufactured by Shuttle Co., Ltd.), 0.02 parts by mass of dioctyltin dilaurate (trade name "EMBILIZER OL-1", produced by Tokyo Fine Chemical Co., Ltd.) as a cross-linking catalyst in terms of solid content, and 3 parts by mass of acetylacetone as a cross-linking retardant, and these were stirred and mixed. Thereby, an acrylic adhesive composition (acrylic adhesive composition A 1 ) was obtained.

[丙烯酸系黏著劑組合物A2 之製備] 使用以固形物成分量計為4質量份之作為三官能異氰酸酯化合物之六亞甲基二異氰酸酯之異三聚氰酸體(商品名「Coronate HX」,東梭股份有限公司製造),代替作為甲伸苯基二異氰酸酯之三羥甲基丙烷加成物之交聯劑(商品名「Coronate L」,固形物成分濃度75質量%之乙酸乙酯溶液,東梭股份有限公司製造)作為交聯劑,除此以外,與丙烯酸系黏著劑組合物A1 之製備同樣地製備另一丙烯酸系黏著劑組合物(丙烯酸系黏著劑組合物A2 )。[Preparation of Acrylic Adhesive Composition A 2 ] Isocyanurate of hexamethylene diisocyanate (trade name "Coronate HX"), which is a trifunctional isocyanate compound, was used in an amount of 4 parts by mass in terms of solid content. , manufactured by Tosot Co., Ltd.), as a substitute for the cross-linking agent of the trimethylolpropane adduct of tolylene diisocyanate (trade name "Coronate L", ethyl acetate solution with a solid content concentration of 75% by mass) , manufactured by Tosot Co., Ltd.) as a cross-linking agent, prepare another acrylic adhesive composition (acrylic adhesive composition A 2 ) in the same manner as the acrylic adhesive composition A 1 .

[丙烯酸系黏著劑組合物A3 之製備] 於配備有回流冷卻器、氮氣導入管、攪拌機、及溫度計之燒瓶(反應容器)內,將包含丙烯酸丁酯96質量份、丙烯酸4質量份、作為聚合起始劑之2,2'-偶氮二異丁腈0.2質量份、及乙酸乙酯150質量份之混合物一面於氮氣氛圍下穩定地攪拌一面於60℃下反應6小時。藉此獲得以40質量%之濃度含有丙烯酸系聚合物之溶液(丙烯酸系聚合物溶液)。該丙烯酸系聚合物之重量平均分子量為58萬。然後,將該丙烯酸系聚合物之固形物成分100質量份、及作為環氧系化合物之1,3-雙(N,N-二縮水甘油胺甲基)環己烷(商品名「Tetrad-C」,Mitsubishi Gas Chemical股份有限公司製造)3質量份進行混合,而獲得丙烯酸系黏著劑組合物(丙烯酸系黏著劑組合物A3 )。[Preparation of Acrylic Adhesive Composition A 3 ] In a flask (reaction vessel) equipped with a reflux cooler, a nitrogen introduction pipe, a stirrer, and a thermometer, 96 parts by mass of butyl acrylate and 4 parts by mass of acrylic acid were placed. A mixture of 0.2 parts by mass of 2,2'-azobisisobutyronitrile as a polymerization initiator and 150 parts by mass of ethyl acetate was reacted at 60° C. for 6 hours while stably stirring in a nitrogen atmosphere. Thereby, a solution containing an acrylic polymer at a concentration of 40% by mass (acrylic polymer solution) was obtained. The weight average molecular weight of the acrylic polymer is 580,000. Then, 100 parts by mass of the solid content of the acrylic polymer and 1,3-bis(N,N-diglycidylaminemethyl)cyclohexane (trade name "Tetrad-C") as an epoxy compound ”, manufactured by Mitsubishi Gas Chemical Co., Ltd.) 3 parts by mass were mixed to obtain an acrylic adhesive composition (acrylic adhesive composition A 3 ).

[丙烯酸系黏著劑組合物A4 之製備] 於配備有回流冷卻器、氮氣導入管、攪拌機、及溫度計之燒瓶(反應容器)內,將包含丙烯酸-2-乙基己酯100份、乙酸乙烯酯80份、丙烯酸5份、作為過氧化物系聚合起始劑之過氧化苯甲醯(BPO,日油(股)製造之「Nyper(註冊商標)BW」)0.3份、及甲苯275份之混合物於氮氣氛圍下之室溫下穩定地攪拌1小時。然後,將容器內容物之溫度升溫至63℃,於氮氣氣流中進行6小時聚合。然後,將容器內容物之溫度升溫至80℃,反應6小時。藉此獲得以40質量%之濃度含有丙烯酸系聚合物之溶液(丙烯酸系聚合物溶液)。該丙烯酸系聚合物之重量平均分子量為43萬。然後,將該丙烯酸系聚合物之固形物成分100質量份、及作為環氧系化合物之1,3-雙(N,N-二縮水甘油胺甲基)環己烷(商品名「Tetrad-C」,Mitsubishi Gas Chemical股份有限公司製造)3質量份進行混合,而獲得丙烯酸系黏著劑組合物(丙烯酸系黏著劑組合物A4 )。[Preparation of acrylic adhesive composition A 4 ] In a flask (reaction vessel) equipped with a reflux cooler, a nitrogen introduction pipe, a stirrer, and a thermometer, 100 parts of 2-ethylhexyl acrylate and vinyl acetate were placed 80 parts of ester, 5 parts of acrylic acid, 0.3 parts of benzoyl peroxide (BPO, "Nyper (registered trademark) BW" manufactured by NOF Co., Ltd.) as a peroxide polymerization initiator, and 275 parts of toluene The mixture was stirred steadily at room temperature under nitrogen atmosphere for 1 hour. Then, the temperature of the contents of the container was raised to 63°C, and polymerization was performed for 6 hours in a nitrogen gas flow. Then, the temperature of the contents of the container was raised to 80°C, and the reaction was carried out for 6 hours. Thereby, a solution containing an acrylic polymer at a concentration of 40% by mass (acrylic polymer solution) was obtained. The weight average molecular weight of the acrylic polymer is 430,000. Then, 100 parts by mass of the solid content of the acrylic polymer and 1,3-bis(N,N-diglycidylaminemethyl)cyclohexane (trade name "Tetrad-C") as an epoxy compound ”, manufactured by Mitsubishi Gas Chemical Co., Ltd.) 3 parts by mass were mixed to obtain an acrylic adhesive composition (acrylic adhesive composition A 4 ).

[胺基甲酸酯系黏著劑組合物之製備] 利用乙酸乙酯將胺基甲酸酯系聚合物(商品名「Oribain SH-109」,TOYOCHEM股份有限公司製造)稀釋至25質量%,而獲得胺基甲酸酯系聚合物溶液。然後,向該溶液400質量份(固形物成分100質量份)加入作為三官能異氰酸酯化合物之六亞甲基二異氰酸酯之異三聚氰酸體(商品名「Coronate HX」,東梭股份有限公司製造)10質量份(固形物成分10質量份)作為交聯劑,進行混合攪拌。以此方式製備胺基甲酸酯系黏著劑組合物。[Preparation of urethane adhesive composition] A urethane-based polymer (trade name "Oribain SH-109", manufactured by TOYOCHEM Co., Ltd.) was diluted to 25% by mass with ethyl acetate to obtain a urethane-based polymer solution. Then, to 400 parts by mass (100 parts by mass of solid content) of this solution, isocycyanurate of hexamethylene diisocyanate (trade name: "Coronate HX", manufactured by Tosot Co., Ltd., which is a trifunctional isocyanate compound ) 10 parts by mass (10 parts by mass of solid content) as a cross-linking agent, and mixed and stirred. In this way, a urethane-based adhesive composition is prepared.

[實施例1] 於已對單面實施矽酮處理之聚對苯二甲酸乙二酯製之剝離襯墊(厚度38 μm)之矽酮處理面上塗佈上述丙烯酸系黏著劑組合物A1 而形成黏著劑組合物層。其次,將該黏著劑組合物層於130℃下加熱20秒鐘而形成厚度20 μm之黏著劑層。其次,對該黏著劑層之露出面貼合上述基材膜F2 之與抗靜電層形成面相反之面。以此方式製作實施例1之表面保護膜。[Example 1] The above-described acrylic adhesive composition A 1 was applied to the silicone-treated surface of a polyethylene terephthalate release liner (thickness 38 μm) that had been silicone-treated on one side. The adhesive composition layer is formed. Next, the adhesive composition layer was heated at 130° C. for 20 seconds to form an adhesive layer with a thickness of 20 μm. Next, the exposed surface of the adhesive layer is bonded to the surface of the base film F 2 opposite to the surface where the antistatic layer is formed. In this way, the surface protective film of Example 1 was produced.

[實施例2] 使用丙烯酸系黏著劑組合物A2 代替丙烯酸系黏著劑組合物A1 ,除此以外,與實施例1之表面保護膜同樣地製作實施例2之表面保護膜。[Example 2] A surface protective film of Example 2 was produced in the same manner as the surface protective film of Example 1, except that acrylic adhesive composition A 2 was used instead of acrylic adhesive composition A 1 .

[實施例3~5] 使用基材膜F3 (實施例3)、基材膜F4 (實施例4)、或基材膜F1 (實施例5)代替基材膜F2 ,除此以外,與實施例1之表面保護膜同樣地製作實施例3~5之各表面保護膜。[Examples 3 to 5] Except that the base film F 3 (Example 3), the base film F 4 (Example 4), or the base film F 1 (Example 5) was used instead of the base film F 2 Except for this, each surface protective film of Examples 3 to 5 was produced in the same manner as the surface protective film of Example 1.

[實施例6] 於已對單面實施矽酮處理之聚對苯二甲酸乙二酯製之剝離襯墊(厚度38 μm)之矽酮處理面上塗佈上述胺基甲酸酯系黏著劑組合物而形成黏著劑組合物層。其次,將該黏著劑組合物層於130℃下加熱20秒鐘,而形成厚度10 μm之黏著劑層。其次,對該黏著劑層之露出面貼合上述基材膜F1 之電暈處理面。以此方式製作實施例6之表面保護膜。[Example 6] The above-described urethane adhesive was applied to the silicone-treated surface of a polyethylene terephthalate release liner (thickness 38 μm) that had been silicone-treated on one side. composition to form an adhesive composition layer. Next, the adhesive composition layer was heated at 130° C. for 20 seconds to form an adhesive layer with a thickness of 10 μm. Next, the exposed surface of the adhesive layer is bonded to the corona-treated surface of the above-mentioned base film F1 . In this way, the surface protective film of Example 6 was produced.

[實施例7] 使用丙烯酸系黏著劑組合物A4 代替丙烯酸系黏著劑組合物A1 ,形成厚度5 μm而非厚度20 μm之黏著劑層,且貼合於基材F1 之電暈處理面,除此以外,與實施例1之表面保護膜同樣地製作實施例7之表面保護膜。[Example 7] Corona treatment using acrylic adhesive composition A 4 instead of acrylic adhesive composition A 1 to form an adhesive layer with a thickness of 5 μm instead of 20 μm and bonding it to the base material F 1 Except for this, the surface protective film of Example 7 was produced in the same manner as the surface protective film of Example 1.

[比較例1] 使用另一聚酯系膜(基材膜F6 )(商品名「ASTROLL CE900」,厚度38 μm,KOLON公司製造)代替基材膜F2 ,除此以外,與實施例1之表面保護膜同樣地製作比較例1之表面保護膜。[Comparative Example 1] The same procedure as Example 1 was used except that another polyester-based film (base film F 6 ) (trade name "ASTROLL CE900", thickness 38 μm, manufactured by KOLON Co., Ltd.) was used instead of the base film F 2 The surface protective film of Comparative Example 1 was produced in the same manner.

[比較例2] 於作為聚烯烴系膜之上述基材膜F5 (厚度40 μm)之電暈處理面上塗佈上述丙烯酸系黏著劑組合物A3 而形成黏著劑組合物層。其次,將該黏著劑組合物層於80℃下加熱1分鐘,而形成厚度5 μm之黏著劑層。其次,對黏著劑層之露出面貼合已對單面實施矽酮處理之聚對苯二甲酸乙二酯製之剝離襯墊(厚度38 μm)之矽酮處理面側。其次,對於基材膜F5 上之黏著劑層,於室溫下實施5天老化。藉此製作比較例2之表面保護膜。[Comparative Example 2] The above-mentioned acrylic adhesive composition A 3 was applied to the corona-treated surface of the above-mentioned base film F 5 (thickness 40 μm) as a polyolefin film to form an adhesive composition layer. Next, the adhesive composition layer was heated at 80° C. for 1 minute to form an adhesive layer with a thickness of 5 μm. Next, the silicone-treated side of a polyethylene terephthalate release liner (thickness: 38 μm) that has been silicone-treated on one side was bonded to the exposed surface of the adhesive layer. Secondly, the adhesive layer on the base film F5 is aged at room temperature for 5 days. Thereby, the surface protective film of Comparative Example 2 was produced.

<儲存彈性模數之測定> 對於實施例1~7及比較例1、2之表面保護膜中之各基材膜,藉由使用動態黏彈性測定裝置(商品名「RSA-G2」,TA INSTRUMENTS公司製造)進行之動態黏彈性測定來調查拉伸儲存彈性模數(MPa)。於該測定中,將成為測定對象物之基材膜試片之尺寸設為寬度5 mm×長度30 mm,將試片保持用夾頭之初始夾頭間距離設為10 mm,將測定模式設為拉伸模式,將測定溫度範圍設為25~170℃,將頻率設為1 Hz,將升溫速度設為5℃/分鐘。將30℃、80℃、及130℃下之測定結果列於表1。<Measurement of storage elastic modulus> For each of the base films in the surface protective films of Examples 1 to 7 and Comparative Examples 1 and 2, dynamic viscoelasticity was measured using a dynamic viscoelasticity measuring device (trade name "RSA-G2", manufactured by TA INSTRUMENTS). Measurement was performed to investigate the tensile storage elastic modulus (MPa). In this measurement, the dimensions of the base film test piece to be measured were set to width 5 mm x length 30 mm, the initial distance between the chucks for holding the test piece was set to 10 mm, and the measurement mode was set to In the tensile mode, the measurement temperature range was set to 25 to 170°C, the frequency was set to 1 Hz, and the temperature rise rate was set to 5°C/min. The measurement results at 30°C, 80°C, and 130°C are listed in Table 1.

<表面電阻率> 對於實施例1~4之表面保護膜中之各基材膜,在室溫下經過7天老化後,使用電阻率計(商品名「Hiresta-UP MCP-HT450」,Mitsubishi Chemical Analytech股份有限公司製造)測定表面電阻率(Ω/□)。於該測定中,將施加電壓設為10 V,將電壓施加時間設為10秒。又,該測定係於23℃及50%RH之環境下進行。將測定結果列於表1。<Surface resistivity> For each of the base films in the surface protective films of Examples 1 to 4, after aging for 7 days at room temperature, a resistivity meter (trade name "Hiresta-UP MCP-HT450", manufactured by Mitsubishi Chemical Analytech Co., Ltd. ) to measure the surface resistivity (Ω/□). In this measurement, the applied voltage was set to 10 V, and the voltage application time was set to 10 seconds. In addition, this measurement was performed in an environment of 23°C and 50%RH. The measurement results are listed in Table 1.

<對玻璃黏著力之測定> 對於實施例1~7及比較例1、2之各表面保護膜,調查對玻璃平面之黏著力。具體而言,首先,於表面保護膜在室溫下老化7天後,自表面保護膜切出寬度25 mm及長度100 mm之尺寸之試片。自試片將剝離襯墊剝離後,藉由2 kg手壓輥1個往返作業將試片於其黏著劑層側壓接於玻璃板(商品名「青板切放品(磨邊)」,厚度1.35 mm×寬度100 mm×長度100 mm,松浪硝子工業股份有限公司製造)之表面。於玻璃板上將試片在23℃及50%RH之環境下放置30分鐘後,使用萬能拉伸試驗機對試片進行自玻璃板剝離之剝離試驗,而測定對玻璃黏著力(N/25 mm)」。於該測定中,將剝離角度設為180°,將拉伸速度設為0.3 m/分鐘。又,該測定係於23℃及50%RH之環境下進行。將測定結果列於表1。<Measurement of adhesion to glass> The adhesion to the glass plane of each surface protective film of Examples 1 to 7 and Comparative Examples 1 and 2 was investigated. Specifically, first, after the surface protective film is aged for 7 days at room temperature, a test piece with a width of 25 mm and a length of 100 mm is cut out from the surface protective film. After peeling off the release liner from the test piece, press the test piece on its adhesive layer side to the glass plate (trade name "Blue plate cut and placed product (edged)" by using a 2 kg hand pressure roller in one reciprocating operation. Thickness 1.35 mm × width 100 mm × length 100 mm, manufactured by Shonami Glass Industry Co., Ltd.). After placing the test piece on the glass plate for 30 minutes in an environment of 23°C and 50% RH, use a universal tensile testing machine to conduct a peeling test on the test piece from the glass plate, and measure the adhesion to the glass (N/25 mm)". In this measurement, the peeling angle was set to 180°, and the stretching speed was set to 0.3 m/min. In addition, this measurement was performed in an environment of 23°C and 50%RH. The measurement results are listed in Table 1.

<對3D玻璃板之追隨性> 對於實施例1~7及比較例1、2之各表面保護膜,調查對具有非平坦部位之被黏著體表面之追隨性。具體而言,首先,於表面保護膜在室溫下老化7天後,自表面保護膜切出所需數量之寬度210 mm×長度300 mm之尺寸之樣品膜。其次,自樣品膜將剝離襯墊剝離後,使用真空壓空成形機(商品名「真空壓空成形機NGF-0406-S」,布施真空股份有限公司製造)進行真空壓空成形,該真空壓空成形係將樣品膜於其黏著劑層側貼合於四邊具有斜面之模型玻璃板(厚度1 mm×寬度70 mm×長度150 mm,斜面部長度2.5 mm,於圖3表示剖面尺寸)之包含斜面之側之表面(於圖3中為除圖中下表面以外之表面)。針對每種表面保護膜,進行使用一樣品膜藉由膜加熱溫度80℃下之真空壓空成形進行之貼合、及使用另一樣品膜藉由膜加熱溫度130℃下之真空壓空成形進行之貼合。於各貼合後,沿著四邊具有斜面之模型玻璃板之底部外周利用截切刀將樣品膜之剩餘部(未貼附於玻璃之部分)切割去除(修整)。然後,目視觀察模型玻璃板斜面部中之樣品膜之隆起(局部剝離)之有無,並進行評價。將於貼合2天後無隆起之情況評價為“良”,將自剛貼合後1天以內產生隆起之情況評價為“可”,將剛貼合後產生隆起或皺褶之情況評價為“不良”。將該評價結果列於表1。比較例2之表面保護膜之藉由膜加熱溫度130℃下之真空壓空成形進行之貼合由於膜產生熱縮,故而無法實施。<Followability of 3D glass plates> Each surface protective film of Examples 1 to 7 and Comparative Examples 1 and 2 was investigated for its ability to follow the surface of an adherend having uneven portions. Specifically, first, after the surface protective film is aged for 7 days at room temperature, a required number of sample films with a width of 210 mm and a length of 300 mm are cut out from the surface protective film. Next, after peeling off the release liner from the sample film, vacuum molding was performed using a vacuum molding machine (trade name "Vacuum molding machine NGF-0406-S", manufactured by Busch Vacuum Co., Ltd.). Hollow forming involves attaching the sample film on its adhesive layer side to a model glass plate with bevels on all four sides (thickness 1 mm × width 70 mm × length 150 mm, bevel length 2.5 mm, cross-sectional dimensions shown in Figure 3) The surface on the side of the inclined plane (in Figure 3, it is the surface except the lower surface in the figure). For each type of surface protection film, one sample film was used for lamination by vacuum pressure forming at a film heating temperature of 80°C, and another sample film was used for lamination by vacuum pressure forming at a film heating temperature of 130°C. The fit. After each lamination, use a cutting knife along the bottom periphery of the model glass plate with bevels on all four sides to cut and remove (trim) the remaining portion of the sample film (the portion not attached to the glass). Then, the presence or absence of bulging (partial peeling) of the sample film in the inclined portion of the model glass plate was visually observed and evaluated. The condition with no bulging after 2 days of application is rated as "good", the condition with bulging within 1 day after the first application is assessed as "good", and the application with bulges or wrinkles immediately after application is assessed as "good". "bad". The evaluation results are listed in Table 1. The surface protective film of Comparative Example 2 was bonded by vacuum pressure molding at a film heating temperature of 130° C. Since the film was thermally shrunk, it could not be implemented.

<表面保護膜之作業性> 對於實施例1~7及比較例1、2之各表面保護膜,評價對真空壓空成形機之安裝作業性。具體而言,於進行上述追隨性評價試驗之過程中的剝離襯墊剝離後之樣品膜(表面保護膜)之對真空壓空成形機之安裝作業中,將可無問題地安裝之情況評價為“良”,將雖因剝離襯墊剝離後產生之靜電導致膜交纏但仍可安裝之情況評價為“可”,將因剝離襯墊剝離後產生之靜電導致膜交纏且膜本身無塑性故而安裝作業困難之情況評價為“不良”。將其評價結果列於表1。<Workability of Surface Protection Film> The surface protective films of Examples 1 to 7 and Comparative Examples 1 and 2 were evaluated for installation workability on a vacuum pressure forming machine. Specifically, in the process of performing the above-mentioned followability evaluation test, the sample film (surface protective film) after peeling off the release liner was evaluated as being able to be installed without any problem in the installation operation of the vacuum pressure molding machine. "Good" is evaluated as "good" when the film is entangled due to static electricity generated after peeling off the release liner but can still be installed. "Good" is evaluated when the film is entangled due to static electricity generated after peeling off the release liner and the film itself has no plasticity. Therefore, if the installation operation is difficult, the evaluation is "poor". The evaluation results are listed in Table 1.

<再剝離性> 於自藉由在上文已關於追隨性評價試驗敍述之真空壓空成形進行之貼合作業起2天後,利用人工作業將表面保護膜自模型玻璃板剝離,將此時之剝離作業之容易性作為再剝離性進行評價。具體而言,關於表面保護膜之再剝離性,將可容易地剝離表面保護膜之情況評價為“良”,將難以剝離表面保護膜之情況評價為“不良”。將其評價結果列於表1。<Repeelability> Two days after the bonding operation by the vacuum pressure forming described above for the followability evaluation test, the surface protective film was peeled off from the model glass plate manually. The ease of peeling off at this time was The properties were evaluated as re-peelability. Specifically, regarding the re-peelability of the surface protective film, the case where the surface protective film can be easily peeled off is evaluated as "good", and the case where the surface protective film is difficult to peel off is evaluated as "poor". The evaluation results are listed in Table 1.

<濡濕性> 對於實施例1~7及比較例1、2之各表面保護膜,調查黏著劑層或黏著面對玻璃平面之所謂之濡濕性。具體而言,首先,對於表面保護膜,在老化7天後,自表面保護膜切出寬度25 mm及長度100 mm之尺寸之試片。自試片將剝離襯墊剝離後,使試片之黏著面之一端區域(寬度25 mm×長度5 mm)與玻璃板(商品名「青板切放品(磨邊)」,厚度1.35 mm×寬度100 mm×長度100 mm,松浪硝子工業股份有限公司製造)之表面接觸,以試片相對於玻璃板表面所成之角度成為仰角20~30°之方式保持試片。其次,解除試片之保持,上述仰角因試片之自身重量而逐漸變小,同時試片黏著面與玻璃板表面之接觸面積逐漸變大,經過該過程,使試片黏著面之整個面與玻璃板表面接觸。測定解除試片之保持之時間點至試片黏著面之整個面與玻璃板表面接觸為止所需之時間。將測定結果列於表1。<Moisture resistance> For each surface protective film of Examples 1 to 7 and Comparative Examples 1 and 2, the so-called wettability of the adhesive layer or adhesive surface to the glass plane was investigated. Specifically, first, for the surface protective film, after aging for 7 days, a test piece with a width of 25 mm and a length of 100 mm was cut out from the surface protective film. After peeling off the release liner from the test piece, make one end area of the adhesive surface of the test piece (width 25 mm × length 5 mm) and a glass plate (trade name "Blue plate cut and placed product (edged)", thickness 1.35 mm × Width 100 mm × length 100 mm, manufactured by Shonami Glass Industry Co., Ltd.), hold the test piece in such a way that the angle formed by the test piece relative to the surface of the glass plate becomes an elevation angle of 20 to 30°. Secondly, when the test piece is released, the above-mentioned elevation angle gradually becomes smaller due to the weight of the test piece. At the same time, the contact area between the adhesive surface of the test piece and the surface of the glass plate gradually becomes larger. Through this process, the entire surface of the adhesive surface of the test piece is in contact with the surface of the glass plate. Glass plate surface contact. Measure the time required from the time point when the test piece is released until the entire adhesive surface of the test piece comes into contact with the surface of the glass plate. The measurement results are listed in Table 1.

[評價] 具備本發明之構成之實施例1~7之表面保護膜均於上述追隨性評價試驗中獲得良好之結果。相對於此,比較例1、2之表面保護膜均於上述之追隨性評價試驗中未獲得良好之結果。[evaluation] The surface protective films of Examples 1 to 7 having the structure of the present invention all obtained good results in the above-mentioned followability evaluation test. In contrast, the surface protective films of Comparative Examples 1 and 2 did not obtain good results in the above-mentioned followability evaluation test.

[表1]    實施例1 實施例2 實施例3 實施例4 實施例5 實施例6 實施例7 比較例1 比較例2 基材膜 種類 F2 F2 F3 F4 F1 F1 F1 F6 F5 厚度(μm) 38 38 50 50 38 38 38 38 40 抗靜電層 表面電阻率(Ω/□) 4.0×109 4.0×109 7.9×108 1.5×107 - - - - - 儲存彈性模數(MPa) 30℃ 2900 2900 2800 2800 2900 2900 2900 3800 950 80℃ 1000 1000 1100 1100 1000 1000 1000 3200 250 130℃ 40 40 80 80 40 40 40 770 - 黏著劑層 種類 丙烯酸系 丙烯酸系 丙烯酸系 丙烯酸系 丙烯酸系 胺基甲酸酯系 丙烯酸系 丙烯酸系 丙烯酸系 厚度(mm) 20 20 20 20 20 10 5 20 5 對玻璃黏著力(N/25 mm) 0.11 0.07 0.10 0.10 0.11 0.02 0.17 0.11 0.13 追隨性 80℃ 不良 130℃ - 再剝離性 80℃ 130℃ - 安裝作業性 不良 濡濕性(秒/100 mm) 40 30 40 40 40 10 80 40 >100 [Table 1] Example 1 Example 2 Example 3 Example 4 Example 5 Example 6 Example 7 Comparative example 1 Comparative example 2 base film Kind F 2 F 2 F 3 F 4 F 1 F 1 F 1 F 6 F 5 Thickness(μm) 38 38 50 50 38 38 38 38 40 antistatic layer have have have have without without without without without Surface resistivity (Ω/□) 4.0×10 9 4.0×10 9 7.9×10 8 1.5×10 7 - - - - - Storage elastic modulus (MPa) 30℃ 2900 2900 2800 2800 2900 2900 2900 3800 950 80℃ 1000 1000 1100 1100 1000 1000 1000 3200 250 130℃ 40 40 80 80 40 40 40 770 - adhesive layer Kind Acrylic Acrylic Acrylic Acrylic Acrylic Urethane series Acrylic Acrylic Acrylic Thickness(mm) 20 20 20 20 20 10 5 20 5 Adhesion to glass (N/25 mm) 0.11 0.07 0.10 0.10 0.11 0.02 0.17 0.11 0.13 Followability 80℃ good good good good good good good Can bad 130℃ good good good good good good good Can - Re-peelability 80℃ good good good good good good good good good 130℃ good good good good good good good good - Installation workability good good good good Can Can Can Can bad Humidity (seconds/100 mm) 40 30 40 40 40 10 80 40 >100

將上述所說明之發明之變化標註於以下。 [1]一種表面保護膜,其具有積層構造,該積層構造包含130℃下之儲存彈性模數為700 MPa以下且30℃下之儲存彈性模數為1000 MPa以上之基材膜、及 黏著劑層。 [2]如上述[1]所記載之表面保護膜,其中上述基材膜具有包含抗靜電層之積層構造。 [3]如上述[2]所記載之表面保護膜,其中上述抗靜電層含有具有四級銨基之抗靜電劑及/或導電性聚合物。 [4]如上述[1]至[3]中任一項所記載之表面保護膜,其中構成上述基材膜之材料包含聚酯。 [5]如上述[1]至[4]中任一項所記載之表面保護膜,其中上述黏著劑層含有丙烯酸系聚合物及/或胺基甲酸酯系聚合物。 [6]如上述[1]至[5]中任一項所記載之表面保護膜,其為真空壓空成形貼合型膜。 [7]一種光學構件,其包含如上述[1]至[6]中任一項所記載之表面保護膜。 [產業上之可利用性]Changes in the invention described above are noted below. [1] A surface protection film having a laminated structure including a base film having a storage elastic modulus at 130°C of 700 MPa or less and a storage elastic modulus at 30°C of 1,000 MPa or more, and Adhesive layer. [2] The surface protective film according to the above [1], wherein the base film has a laminated structure including an antistatic layer. [3] The surface protective film according to the above [2], wherein the antistatic layer contains an antistatic agent having a quaternary ammonium group and/or a conductive polymer. [4] The surface protective film according to any one of [1] to [3] above, wherein the material constituting the base film contains polyester. [5] The surface protective film according to any one of [1] to [4] above, wherein the adhesive layer contains an acrylic polymer and/or a urethane polymer. [6] The surface protective film according to any one of the above [1] to [5], which is a vacuum pressure forming lamination type film. [7] An optical member including the surface protective film according to any one of [1] to [6] above. [Industrial availability]

本發明之表面保護膜可較佳地用作外觀表面包含彎曲部位或撓曲部位等非平坦部位之光學構件之保護膜。The surface protective film of the present invention can be suitably used as a protective film for optical members whose exterior surfaces include uneven portions such as curved portions or flexed portions.

10:膜(表面保護膜) 11:基材膜 12:黏著劑層 12a:黏著面 20:光學構件 21:表面 21a:彎曲部位 21b:撓曲部位 10: Film (surface protective film) 11:Substrate film 12: Adhesive layer 12a: Adhesive surface 20: Optical components 21:Surface 21a: Bend part 21b:flexion part

圖1係本發明之一實施形態之表面保護膜之局部剖視圖。 圖2係本發明之另一實施形態之光學構件之局部剖視圖。 圖3表示針對實施例及比較例之表面保護膜之追隨性評價試驗中所使用之模型玻璃板之剖面尺寸。Figure 1 is a partial cross-sectional view of a surface protective film according to an embodiment of the present invention. FIG. 2 is a partial cross-sectional view of an optical component according to another embodiment of the present invention. FIG. 3 shows the cross-sectional dimensions of the model glass plate used in the followability evaluation test of the surface protective film of Examples and Comparative Examples.

10:膜(表面保護膜) 10: Film (surface protective film)

11:基材膜 11:Substrate film

12:黏著劑層 12: Adhesive layer

12a:黏著面 12a: Adhesive surface

Claims (7)

一種表面保護膜,其具有積層構造,該積層構造包含:130℃下之儲存彈性模數為700MPa以下,30℃下之儲存彈性模數為1000MPa以上且80℃下之儲存彈性模數為700~1100MPa之基材膜、及黏著劑層;構成上述基材膜之材料包含聚酯,且構成上述聚酯之二羧酸包含對苯二甲酸及間苯二甲酸。 A surface protection film having a laminated structure. The laminated structure includes: a storage elastic modulus at 130°C of 700 MPa or less, a storage elastic modulus of 30°C or more than 1000 MPa, and a storage elastic modulus of 700~ at 80°C. A base film of 1100 MPa and an adhesive layer; the material constituting the base film includes polyester, and the dicarboxylic acid constituting the polyester includes terephthalic acid and isophthalic acid. 如請求項1之表面保護膜,其中上述基材膜具有包含抗靜電層之積層構造。 The surface protection film of claim 1, wherein the base film has a laminated structure including an antistatic layer. 如請求項2之表面保護膜,其中上述抗靜電層含有具有四級銨基之抗靜電劑及/或導電性聚合物。 The surface protection film of claim 2, wherein the antistatic layer contains an antistatic agent with a quaternary ammonium group and/or a conductive polymer. 如請求項1至3中任一項之表面保護膜,其中構成上述聚酯之二醇包含乙二醇及二乙二醇。 The surface protective film according to any one of claims 1 to 3, wherein the glycols constituting the polyester include ethylene glycol and diethylene glycol. 如請求項1至3中任一項之表面保護膜,其中上述黏著劑層含有丙烯酸系聚合物及/或胺基甲酸酯系聚合物。 The surface protection film according to any one of claims 1 to 3, wherein the adhesive layer contains an acrylic polymer and/or a urethane polymer. 如請求項1至3中任一項之表面保護膜,其為真空壓空成形貼合型膜。 The surface protection film according to any one of claims 1 to 3 is a vacuum pressure forming laminating film. 一種光學構件,其包含如請求項1至6中任一項之表面保護膜。 An optical member including the surface protection film according to any one of claims 1 to 6.
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