TWI811455B - An exhaust gas purification system - Google Patents

An exhaust gas purification system Download PDF

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TWI811455B
TWI811455B TW108134187A TW108134187A TWI811455B TW I811455 B TWI811455 B TW I811455B TW 108134187 A TW108134187 A TW 108134187A TW 108134187 A TW108134187 A TW 108134187A TW I811455 B TWI811455 B TW I811455B
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exhaust gas
gas
cooling
unit
cooling unit
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TW108134187A
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TW202027845A (en
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王玉偉
舒鵬
張冬
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美商伊利諾工具工程公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/002Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by condensation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D46/00Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/10Particle separators, e.g. dust precipitators, using filter plates, sheets or pads having plane surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/70Organic compounds not provided for in groups B01D2257/00 - B01D2257/602
    • B01D2257/702Hydrocarbons
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/70Organic compounds not provided for in groups B01D2257/00 - B01D2257/602
    • B01D2257/708Volatile organic compounds V.O.C.'s
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2258/00Sources of waste gases
    • B01D2258/02Other waste gases
    • B01D2258/0216Other waste gases from CVD treatment or semi-conductor manufacturing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2258/00Sources of waste gases
    • B01D2258/06Polluted air

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Treating Waste Gases (AREA)
  • Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
  • Filtering Of Dispersed Particles In Gases (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Exhaust Gas After Treatment (AREA)

Abstract

本案揭示一種廢氣淨化系統,用於淨化回流焊爐爐膛中的廢氣中的污染物,包括第一級冷卻單元、第二級冷卻單元和過濾單元,能夠使得廢氣中的污染物不容易附著在冷卻裝置的內壁,從而延長維護週期。本案還揭示一種能夠自清潔的廢氣淨化系統,包括冷卻單元、過濾單元、加熱部件、第一通道和第二通道,氣體在冷卻單元、第一通道、過濾單元和第二通道中形成自清潔氣體循環,從而能夠方便的對廢氣淨化系統進行維護。This case reveals an exhaust gas purification system used to purify pollutants in the exhaust gas in the reflow furnace furnace, including a first-stage cooling unit, a second-stage cooling unit and a filter unit, which can make the pollutants in the exhaust gas less likely to adhere to the cooling the inner wall of the device, thereby extending maintenance intervals. This case also discloses a self-cleaning exhaust gas purification system, including a cooling unit, a filter unit, a heating component, a first channel, and a second channel. The gas forms a self-cleaning gas in the cooling unit, the first channel, the filter unit, and the second channel. circulation, so that the exhaust gas purification system can be easily maintained.

Description

廢氣淨化系統Exhaust gas purification system

本案涉及回流焊爐的廢氣處理系統,尤其涉及一種用於對回流焊爐爐膛中的廢氣進行淨化的廢氣淨化系統。This case involves an exhaust gas treatment system for a reflow soldering furnace, and in particular, an exhaust gas purification system used to purify the exhaust gas in the furnace of the reflow soldering furnace.

在印刷電路板的製作程序中,通常使用被稱為「回流焊接」的製程,將電子元件安裝到電路板上。在典型的回流焊接製程中,焊膏(例如錫膏)被沉積到電路板上選定的區域,並且一或多個電子元件的導線被插入所沉積的焊膏中。然後電路板通過回流焊爐,在回流焊爐中,焊膏在加熱區域中回流(即,加熱至熔化或回流溫度),然後在冷卻區域中冷卻,以將電子元件的導線電氣且機械地連接至電路板。這裡所使用的術語「電路板」包括任何類型的電子元件的基板元件,例如包括晶片基板。在回流焊爐中,通常以空氣或基本上惰性的氣體(例如氮氣)作為工作氣體,針對不同製程要求的電路板使用不同的工作氣體。在回流焊爐的爐膛中充滿工作氣體,電路板在通過傳送裝置傳送通過爐膛時在工作氣體中執行焊接。In the manufacturing process of printed circuit boards, a process called "reflow soldering" is usually used to mount electronic components onto the circuit board. In a typical reflow soldering process, solder paste (eg, solder paste) is deposited onto selected areas on a circuit board, and the leads of one or more electronic components are inserted into the deposited solder paste. The circuit board then passes through a reflow oven where the solder paste is reflowed in a heated area (i.e., heated to melting or reflow temperature) and then cooled in a cooled area to electrically and mechanically connect the electronic components' leads. to the circuit board. The term "circuit board" as used herein includes any type of electronic component substrate component, including, for example, a wafer substrate. In a reflow oven, air or a basically inert gas (such as nitrogen) is usually used as the working gas, and different working gases are used for circuit boards with different process requirements. The furnace of the reflow oven is filled with working gas, and soldering is performed in the working gas while the circuit board is transported through the furnace by a conveyor.

在回流焊爐中,焊膏不僅包括焊料,還包括促使焊料變濕並提供良好的焊接接縫的助焊劑。諸如溶劑和催化劑之類的其它添加劑也可以包括在內。在將焊膏沉積在電路板上之後,將電路板在傳送器上傳送通過回流焊爐的多個加熱區域。加熱區域中的熱使得焊膏熔化,主要包括助焊劑在內的揮發性有機化合物(稱為「VOC」)汽化而形成蒸汽,從而形成「污染物」。這些污染物在回流焊爐中累積會導致一些問題。例如,如果污染物到達冷卻區域,它們將凝結在電路板上而污染電路板,從而使得必須進行後續的清洗步驟。污染物也會在回流焊爐的冷卻器的表面上凝結,從而阻塞氣孔。另外,凝結物也可能滴在後續的電路板上,從而可能破壞電路板上的元件或使得必須對污染的電路板進行後續清洗步驟。In a reflow oven, solder paste includes not only solder, but also flux that encourages the solder to become moist and provide a good soldered joint. Other additives such as solvents and catalysts may also be included. After the solder paste is deposited on the circuit board, the circuit board is transferred on a conveyor through multiple heated zones of the reflow oven. The heat in the heated area causes the solder paste to melt, and volatile organic compounds (called "VOCs"), mainly including flux, vaporize to form vapor, thereby forming "pollutants". The accumulation of these contaminants in the reflow oven can cause problems. For example, if contaminants reach the cooling area, they will condense on the circuit board and contaminate the circuit board, making subsequent cleaning steps necessary. Contaminants can also condense on the surface of the reflow oven's cooler, blocking the pores. In addition, condensation may also drip onto subsequent circuit boards, potentially damaging components on the circuit boards or necessitating subsequent cleaning steps on contaminated circuit boards.

需要將回流焊爐爐膛中的含有污染物的廢氣排出爐膛,以保持回流焊爐爐膛中的工作氣氛的潔淨,從而防止污染物進入回流焊爐冷卻區,在回流焊爐中造成上述問題。The exhaust gas containing pollutants in the reflow furnace needs to be discharged from the furnace to keep the working atmosphere in the reflow furnace clean, thereby preventing pollutants from entering the cooling area of the reflow furnace and causing the above problems in the reflow furnace.

當回流焊爐以基本上惰性的氣體(例如氮氣)作為工作氣體時,由於基本上惰性的氣體(例如氮氣)價格高昂,因此通常希望從回流焊爐排出的廢氣經過廢氣淨化系統處理乾淨後再被輸送回到回流焊爐中重複利用。當回流焊爐以空氣作為工作氣體時,從回流焊爐排出的廢氣經過廢氣淨化系統處理乾淨後可以直接排放到大氣中,也可以再被輸送回到回流焊爐中重複利用。When the reflow oven uses a basically inert gas (such as nitrogen) as the working gas, since the basically inert gas (such as nitrogen) is expensive, it is usually hoped that the waste gas discharged from the reflow soldering furnace will be cleaned by the waste gas purification system. It is transported back to the reflow oven for reuse. When the reflow oven uses air as the working gas, the exhaust gas discharged from the reflow oven can be directly discharged into the atmosphere after being cleaned by the exhaust gas purification system, or can be transported back to the reflow oven for reuse.

一種處理方案是,將廢氣在冷卻裝置中降溫至約80℃以下,以使廢氣中的污染物由氣體形態被冷凝為液體或者固體形態,然後除去液體或固體形態的污染物。但是通過降溫而形成的液體或固體形態的污染物不僅容易附著在冷卻裝置的內壁上,難以清理,使得維護週期短、維護成本高,並且還會附著在冷卻裝置的熱交換部件(如換熱板或換熱管)上,影響熱交換效率。One treatment solution is to cool the exhaust gas to below about 80°C in a cooling device, so that the pollutants in the exhaust gas are condensed from gaseous form into liquid or solid form, and then the liquid or solid form of pollutants are removed. However, liquid or solid pollutants formed by cooling not only easily adhere to the inner wall of the cooling device and are difficult to clean, resulting in a short maintenance cycle and high maintenance costs, but also adhere to the heat exchange components of the cooling device (such as replacement parts). hot plate or heat exchange tube), affecting the heat exchange efficiency.

另一方面,在現有技術的廢氣淨化系統中,清洗廢氣淨化系統的連接管道以及各部分裝置需要人工清洗,因此十分不便。On the other hand, in the exhaust gas purification system of the prior art, cleaning the connecting pipes and various parts of the exhaust gas purification system requires manual cleaning, which is very inconvenient.

經過觀察和研究,申請人發現,廢氣淨化系統中附著在冷卻裝置內壁上和熱交換部件上的難以清理的污染物主要為固體形態的松香。這是因為污染物中的松香以及其它助焊劑在從高溫冷卻至約80℃時會直接由氣體形態凝固為固體形態,粘附在冷卻裝置內壁上和熱交換部件上,使得廢氣淨化系統的維護週期過短的同時,還影響熱交換效率。After observation and research, the applicant found that the difficult-to-clean pollutants attached to the inner wall of the cooling device and the heat exchange components in the exhaust gas purification system are mainly rosin in solid form. This is because the rosin and other fluxes in the pollutants will directly solidify from the gas form to the solid form when cooled from high temperature to about 80°C, and adhere to the inner wall of the cooling device and the heat exchange components, making the exhaust gas purification system When the maintenance cycle is too short, it also affects the heat exchange efficiency.

為瞭解決上述至少一個問題,本案的至少一個目的是提供一種廢氣淨化系統,該廢氣淨化系統用於回流焊爐的爐膛,能夠使得松香不容易附著在冷卻裝置的內壁,從而延長維護週期。In order to solve at least one of the above problems, at least one purpose of this case is to provide an exhaust gas purification system for use in the furnace of a reflow soldering furnace, which can prevent rosin from easily adhering to the inner wall of the cooling device, thereby extending the maintenance cycle.

為了實現上述目的,本案的第一方面提供了一種廢氣淨化系統,用於淨化回流焊爐爐膛中的廢氣中的污染物,包括:第一級冷卻單元,所述第一級冷卻單元具有廢氣入口和氣體出口,所述第一級冷卻單元用於將通過所述廢氣入口進入所述第一級冷卻單元中的廢氣冷卻至第一溫度,以使得進入所述第一級冷卻單元中的廢氣中的污染物一部分從氣態冷卻為液態並從所述第一級冷卻單元排出,進入所述第一級冷卻單元中的廢氣中的污染物剩餘部分的一部分保持氣態;第二級冷卻單元,所述第二級冷卻單元具有氣體入口和氣體出口,所述第二級冷卻單元的氣體入口與所述第一級冷卻單元的氣體出口流體連通,所述第二級冷卻單元用於將從所述第一級冷卻單元進入所述第二級冷卻單元的廢氣從所述第一溫度冷卻至第二溫度,以使得進入所述第二級冷卻單元中的所述廢氣的污染物一部分從氣態冷卻為液態並從所述第二級冷卻單元中排出,進入所述第二級冷卻單元中的廢氣中的污染物的剩餘部分的一部分保持氣態或霧狀;過濾單元,所述過濾單元具有氣體入口和淨氣出口,所述過濾單元的氣體入口與所述第二級冷卻單元的氣體出口流體連通,所述過濾單元用於過濾進入所述過濾單元的廢氣,並將過濾後的氣體的至少一部分通過所述過濾單元的淨氣出口排出。In order to achieve the above purpose, the first aspect of this case provides an exhaust gas purification system for purifying pollutants in the exhaust gas in the reflow furnace furnace, including: a first-stage cooling unit, the first-stage cooling unit has an exhaust gas inlet and a gas outlet, the first-stage cooling unit is used to cool the exhaust gas entering the first-stage cooling unit through the exhaust gas inlet to a first temperature, so that the exhaust gas entering the first-stage cooling unit is A part of the pollutants is cooled from gaseous state to liquid state and discharged from the first-stage cooling unit, and a part of the remaining part of the pollutants in the exhaust gas entering the first-stage cooling unit remains in gaseous state; in the second-stage cooling unit, the The second-stage cooling unit has a gas inlet and a gas outlet. The gas inlet of the second-stage cooling unit is in fluid communication with the gas outlet of the first-stage cooling unit. The second-stage cooling unit is used to remove the gas from the first-stage cooling unit. The exhaust gas entering the second-stage cooling unit from the first-stage cooling unit is cooled from the first temperature to the second temperature, so that a part of the pollutants in the exhaust gas entering the second-stage cooling unit is cooled from a gaseous state to a liquid state. And discharged from the second-stage cooling unit, part of the remaining part of the pollutants in the exhaust gas entering the second-stage cooling unit remains in a gaseous or mist state; a filtering unit, the filtering unit has a gas inlet and a net Gas outlet, the gas inlet of the filter unit is in fluid communication with the gas outlet of the second-stage cooling unit, the filter unit is used to filter the exhaust gas entering the filter unit, and pass at least part of the filtered gas through the The air is discharged from the clean air outlet of the filter unit.

根據上述第一方面,所述廢氣淨化系統還包括:收集單元,所述第一級冷卻單元和所述第二級冷卻單元各自具有廢液出口,所述收集單元可控地與所述第一級冷卻單元和所述第二級冷卻單元的廢液出口均流體連通,用於收集排出的液態廢氣。According to the above first aspect, the exhaust gas purification system further includes: a collection unit, each of the first-stage cooling unit and the second-stage cooling unit has a waste liquid outlet, and the collection unit is controllably connected to the first-stage cooling unit. The waste liquid outlet of the first-stage cooling unit and the second-stage cooling unit are both in fluid communication for collecting discharged liquid waste gas.

根據上述第一方面,在所述第一溫度下,廢氣中從氣態冷卻為液態的污染物包括松香有機物;在所述第二溫度下,廢氣中的從氣態冷卻為液態的污染物包括其他低凝點的酸類或酯類或醚類有機物。According to the above first aspect, at the first temperature, the pollutants in the exhaust gas that are cooled from the gaseous state to the liquid state include rosin organic matter; at the second temperature, the pollutants in the exhaust gas that are cooled from the gaseous state to the liquid state include other low-level pollutants. Acids, esters or ether organic compounds with freezing points.

根據上述第一方面,所述第一溫度為110~130℃;所述第二溫度為60~80℃。According to the above first aspect, the first temperature is 110~130°C; the second temperature is 60~80°C.

根據上述第一方面,所述第一級冷卻單元的廢氣入口用於可控地與所述回流焊爐的爐膛流體連通。According to the above first aspect, the exhaust gas inlet of the first-stage cooling unit is used to be in controllably fluid communication with the furnace hearth of the reflow oven.

本案的第二方面提供了一種能夠自清潔的廢氣淨化系統,包括:冷卻單元,所述冷卻單元具有自清潔氣體入口和氣體出口;過濾單元,所述過濾單元具有氣體入口和自清潔氣體出口;加熱部件,所述加熱部件設置在所述過濾單元中,用於升高所述過濾單元內的氣體溫度;第一通道,所述第一通道連接所述冷卻單元的氣體出口和所述過濾單元的氣體入口,所述第一通道用於將所述冷卻單元中的氣體輸送至所述過濾單元中;和第二通道,所述第二通道連接所述過濾單元的自清潔氣體出口和所述冷卻單元的自清潔氣體入口,所述第二通道用於可控地將所述過濾單元中的氣體輸送至所述冷卻單元中;其中所述冷卻單元、第一通道、過濾單元和第二通道中形成自清潔氣體循環。The second aspect of this case provides an exhaust gas purification system capable of self-cleaning, including: a cooling unit having a self-cleaning gas inlet and a gas outlet; a filtering unit having a gas inlet and a self-cleaning gas outlet; Heating component, the heating component is provided in the filter unit for raising the gas temperature in the filter unit; a first channel connects the gas outlet of the cooling unit and the filter unit a gas inlet, the first channel is used to transport the gas in the cooling unit to the filter unit; and a second channel connects the self-cleaning gas outlet of the filter unit and the A self-cleaning gas inlet of the cooling unit, the second channel is used to controllably transport the gas in the filter unit to the cooling unit; wherein the cooling unit, the first channel, the filter unit and the second channel A self-cleaning gas cycle is formed.

根據上述第二方面,所述廢氣淨化系統還包括:流體動力裝置,所述流體動力裝置使得氣體能夠通過所述第一通道和所述第二通道在所述過濾單元和所述冷卻單元中循環。According to the above second aspect, the exhaust gas purification system further includes: a fluid power device that enables gas to circulate in the filter unit and the cooling unit through the first channel and the second channel. .

根據上述第二方面,所述冷卻單元包括廢氣入口,所述廢氣入口用於可控地與回流焊爐的爐膛連接;所述過濾單元包括淨氣出口,所述淨氣出口用於可控地排出所述過濾單元中的氣體。According to the above second aspect, the cooling unit includes an exhaust gas inlet, the exhaust gas inlet is used to controllably connect with the furnace of the reflow soldering furnace; the filter unit includes a clean gas outlet, the clean gas outlet is used to controllably connect Drain the gas from the filter unit.

根據上述第二方面,所述廢氣淨化系統還包括:收集單元,所述冷卻單元和所述過濾單元各自具有廢液出口,所述收集單元可控地與所述冷卻單元和所述過濾單元的廢液出口均流體連通,用於收集排出的液態廢氣。According to the above second aspect, the exhaust gas purification system further includes: a collection unit, the cooling unit and the filter unit each have a waste liquid outlet, the collection unit is controllably connected to the cooling unit and the filter unit. The waste liquid outlets are all fluidly connected and used to collect discharged liquid waste gas.

根據上述第二方面,所述冷卻單元還具有補氣口,所述補氣口用於可控地與保護氣體流體連通,以使得保護氣體進入所述廢氣淨化系統內;所述過濾單元具有排氣口,所述排氣口用於可控地排出所述廢氣淨化系統內的氣體。According to the above second aspect, the cooling unit also has an air supply port, the air supply port is used to controllably communicate with the protective gas fluid, so that the protective gas enters the exhaust gas purification system; the filter unit has an exhaust port , the exhaust port is used to controllably discharge the gas in the exhaust gas purification system.

以下將結合附圖對本案的構思、具體結構及產生的技術效果作進一步說明,以充分地瞭解本案的目的、特徵和效果。The following will further describe the concept, specific structure and technical effects of this case in conjunction with the accompanying drawings, in order to fully understand the purpose, characteristics and effects of this case.

下面將參考構成本說明書一部分的附圖對本案的各種具體實施方式進行描述。應該理解的是,雖然在本案中使用表示方向的術語,諸如 「前」、「後」、「上」、「下」、「左」、「右」、「頂」、「底」、「側」等描述本案的各種示例結構部分和元件,但是在此使用這些術語只是為了方便說明的目的,是基於附圖中顯示的示例方位而決定的。由於本案所揭示的實施例可以按照不同的方向設置,所以這些表示方向的術語只是作為說明而不應視作為限制。Various specific embodiments of the present invention will be described below with reference to the accompanying drawings that form a part of this specification. It should be understood that although terms indicating direction are used in this case, such as "front", "back", "upper", "lower", "left", "right", "top", "bottom", "side" "" etc. describe various example structural parts and elements of the present application, but these terms are used here for convenience of explanation only and are determined based on the orientation of the examples shown in the drawings. Since the embodiments disclosed in this case can be arranged in different directions, these terms indicating directions are for illustration only and should not be regarded as limiting.

本領域技藝人士需要知曉的是,本實施例中所描述的的廢氣或氣體是指大部分為氣態的成分,其中也可能包含一部分霧狀或者顆粒狀的成分。Those skilled in the art need to know that the waste gas or gas described in this embodiment refers to components that are mostly gaseous, and may also include some mist-like or granular components.

圖1A圖示根據本案的一個實施例的廢氣淨化系統的簡化的結構方塊圖,用於示出廢氣淨化系統100的各個部分的連接關係。如圖1A所示,廢氣淨化系統100設置在回流焊爐爐膛118外部,並連接至回流焊爐的爐膛118。當回流焊爐使用基本上惰性的氣體(例如氮氣)作為工作氣體時,廢氣淨化系統100接收從回流焊爐的爐膛118排出的廢氣,並將淨化後的氣體輸送回到爐膛118中。當回流焊爐使用空氣作為工作氣體時,廢氣淨化系統100接收從回流焊爐的爐膛118排出的廢氣,淨化後的氣體可以輸送回到爐膛118中,也可以不輸送回到爐膛118中,而是排放到爐膛118的外部。在圖1A中,廢氣淨化系統100將淨化後的氣體輸送回到爐膛118中。FIG. 1A illustrates a simplified structural block diagram of an exhaust gas purification system according to an embodiment of the present application, for illustrating the connection relationship of various parts of the exhaust gas purification system 100 . As shown in FIG. 1A , the exhaust gas purification system 100 is disposed outside the reflow furnace chamber 118 and is connected to the furnace chamber 118 of the reflow furnace. When the reflow oven uses a substantially inert gas (eg, nitrogen) as the working gas, the exhaust gas purification system 100 receives the exhaust gas discharged from the furnace 118 of the reflow oven and delivers the purified gas back to the furnace 118 . When the reflow soldering furnace uses air as the working gas, the exhaust gas purification system 100 receives the exhaust gas discharged from the furnace 118 of the reflow soldering furnace, and the purified gas may or may not be transported back to the furnace 118. is discharged to the outside of the furnace 118. In FIG. 1A , the exhaust gas purification system 100 delivers the purified gas back into the furnace 118 .

如圖1A所示,廢氣淨化系統100包括第一級冷卻單元110、第二級冷卻單元120和過濾單元130,它們依次連接,並與爐膛118相連接,以對爐膛118中排出的廢氣進行淨化。廢氣淨化系統100還可以將淨化後的氣體輸送回爐膛118中。並且,廢氣淨化系統100還能夠對第一級冷卻單元110、第二級冷卻單元120和過濾單元130及其之間的連接通道進行自清潔。As shown in FIG. 1A , the exhaust gas purification system 100 includes a first-stage cooling unit 110 , a second-stage cooling unit 120 and a filter unit 130 , which are connected in sequence and connected to the furnace 118 to purify the exhaust gas discharged from the furnace 118 . The exhaust gas purification system 100 can also deliver the purified gas back to the furnace 118 . In addition, the exhaust gas purification system 100 can also self-clean the first-stage cooling unit 110, the second-stage cooling unit 120, the filter unit 130 and the connecting channels between them.

具體而言,第一級冷卻單元110具有廢氣入口111.1、自清潔氣體入口114、氣體出口111.2和第一廢液出口141.1。第二級冷卻單元120具有氣體入口121.1、氣體出口121.2和廢液出口141.2。過濾單元130具有氣體入口131.1、自清潔氣體出口134、淨氣出口131.2和廢液出口141.3。Specifically, the first-stage cooling unit 110 has a waste gas inlet 111.1, a self-cleaning gas inlet 114, a gas outlet 111.2 and a first waste liquid outlet 141.1. The second stage cooling unit 120 has a gas inlet 121.1, a gas outlet 121.2 and a waste liquid outlet 141.2. The filter unit 130 has a gas inlet 131.1, a self-cleaning gas outlet 134, a clean gas outlet 131.2 and a waste liquid outlet 141.3.

第一級冷卻單元110的廢氣入口111.1通過閥部件117.1可控地與爐膛118的高溫區流體連通。第一級冷卻單元110的氣體出口111.2通過連接通道125.1與第二級冷卻單元120的氣體入口121.1流體連通。第二級冷卻單元120的氣體出口121.2通過連接通道125.2與過濾單元130的氣體入口131.1流體連通,過濾單元130的淨氣出口131.2通過閥部件117.2可控地與爐膛118的低溫區流體連通。由此,爐膛118中排出的廢氣能夠依次經過第一級冷卻單元110、第二級冷卻單元120和過濾單元130淨化後再返回爐膛118中。The exhaust gas inlet 111.1 of the first stage cooling unit 110 is in controllably fluid communication with the high temperature zone of the furnace 118 through a valve member 117.1. The gas outlet 111.2 of the first stage cooling unit 110 is in fluid communication with the gas inlet 121.1 of the second stage cooling unit 120 through the connecting channel 125.1. The gas outlet 121.2 of the second-stage cooling unit 120 is in fluid communication with the gas inlet 131.1 of the filter unit 130 through the connecting channel 125.2. The clean gas outlet 131.2 of the filter unit 130 is controllably fluidly connected to the low temperature zone of the furnace 118 through the valve component 117.2. Therefore, the exhaust gas discharged from the furnace 118 can be purified by the first-stage cooling unit 110 , the second-stage cooling unit 120 and the filter unit 130 in sequence, and then return to the furnace 118 .

此外,過濾單元130的自清潔氣體出口134通過連接通道135與第一級冷卻單元110的氣體入口114連接,連接通道135上設有通道開關部件117.5,以將過濾單元130的自清潔氣體出口134與第一級冷卻單元110的氣體入口114可控地流體連通。由此,從過濾單元130的自清潔氣體出口134排出的氣體能夠進入第一級冷卻單元110中,並能夠依次流經第一級冷卻單元110和第二級冷卻單元120,再回到過濾單元130中,以形成廢氣淨化系統100內部的自清潔氣體循環。 In addition, the self-cleaning gas outlet 134 of the filter unit 130 is connected to the gas inlet 114 of the first-stage cooling unit 110 through the connecting channel 135. The connecting channel 135 is provided with a channel switch component 117.5 to connect the self-cleaning gas outlet 134 of the filter unit 130. In controllable fluid communication with the gas inlet 114 of the first stage cooling unit 110 . Therefore, the gas discharged from the self-cleaning gas outlet 134 of the filter unit 130 can enter the first-stage cooling unit 110, and can flow through the first-stage cooling unit 110 and the second-stage cooling unit 120 in sequence, and then return to the filter unit. 130 to form a self-cleaning gas circulation inside the exhaust gas purification system 100 .

根據本案的一個實施例,第一級冷卻單元110上也可以不設置與廢氣入口111.1分開的自清潔氣體入口114,而是用同一個入口作為廢氣入口和自清潔氣體入口。同樣的,過濾單元130上也可以不設置與淨氣出口131.2分開的自清潔氣體出口134,而是用同一個出口作為自清潔氣體出口134和淨氣出口131.2。 According to an embodiment of this case, the first-stage cooling unit 110 may not be provided with a self-cleaning gas inlet 114 separate from the exhaust gas inlet 111.1, but use the same inlet as the exhaust gas inlet and the self-cleaning gas inlet. Similarly, the filter unit 130 may not be provided with a self-cleaning gas outlet 134 separate from the clean gas outlet 131.2, but use the same outlet as the self-cleaning gas outlet 134 and the clean gas outlet 131.2.

廢氣淨化系統100還包括設置在第一級冷卻單元110上的補氣口112和設置在過濾單元130上的排氣口132,以及用於檢測過濾單元130中氣體濃度的氣體濃度檢測部件。作為一個示例,氣體濃度檢測部件155為氧氣濃度檢測部件,通過檢測氧氣濃度,以得到工作氣體的濃度。其中氧氣濃度檢測部件設置在排氣口132附近。補氣口112通過閥部件117.3可控地打開和關閉,排氣口132通過閥部件117.4可控地打開和關閉。當回流焊爐使用基本上惰性的氣體(例如氮氣)作為工作氣體時,可以 通過補氣口112向廢氣淨化系統100中補充工作氣體(即基本上惰性的氣體(如氮氣)),排氣口132用於補氣口112工作時與補氣口112協同工作。通過設置補氣口112和排氣口132能夠將廢氣淨化系統100中的工作氣體的濃度調整為與爐膛118中的工作氣體濃度相匹配。補氣口112可以通過閥部件117.3可控的與工作氣體(即基本上惰性的氣體(如氮氣))源流體連通,排氣口132通過閥部件117.4可控地與大氣流體連通。 The exhaust gas purification system 100 also includes an air supply port 112 provided on the first-stage cooling unit 110 and an exhaust port 132 provided on the filter unit 130, as well as a gas concentration detection component for detecting the gas concentration in the filter unit 130. As an example, the gas concentration detection component 155 is an oxygen concentration detection component, which detects the oxygen concentration to obtain the concentration of the working gas. The oxygen concentration detection component is arranged near the exhaust port 132 . The air supply port 112 is controllably opened and closed by a valve component 117.3, and the exhaust port 132 is controllably opened and closed by a valve component 117.4. When the reflow oven uses a substantially inert gas (such as nitrogen) as the working gas, it can Working gas (that is, a substantially inert gas (such as nitrogen)) is replenished into the exhaust gas purification system 100 through the gas supply port 112. The exhaust port 132 is used to cooperate with the gas supply port 112 when the gas supply port 112 is working. By providing the air supply port 112 and the exhaust port 132, the concentration of the working gas in the exhaust gas purification system 100 can be adjusted to match the concentration of the working gas in the furnace 118. The make-up port 112 may be in controllably fluid communication with a source of working gas (ie, a substantially inert gas such as nitrogen) via valve member 117.3, and the exhaust port 132 may be in controllably fluid communication with the atmosphere via valve member 117.4.

過濾單元130中設置有過濾部件136。其中過濾單元130的氣體入口131.1設置在過濾部件136的上游側,自清潔氣體出口134和淨氣出口131.2設置在過濾部件136的下游側。需要說明的是,這裡的「上游」和「下游」是相對於廢氣淨化系統100中的氣體流動方向而言的。過濾部件136可以為鋼珠過濾網或者紙過濾網等。 The filter unit 130 is provided with a filter component 136 . The gas inlet 131.1 of the filter unit 130 is disposed on the upstream side of the filter component 136, and the self-cleaning gas outlet 134 and the clean gas outlet 131.2 are disposed on the downstream side of the filter component 136. It should be noted that “upstream” and “downstream” here are relative to the gas flow direction in the exhaust gas purification system 100 . The filter component 136 may be a steel ball filter or a paper filter, etc.

過濾單元130中還設有加熱部件133,加熱部件133位於過濾部件136的下方,用於對過濾部件136進行加熱。 The filter unit 130 is also provided with a heating component 133 located below the filter component 136 for heating the filter component 136 .

廢氣淨化系統100還包括風扇124,用於驅動廢氣淨化系統100中的氣體流動。在圖1A所示的實施例中,風扇124設置在過濾單元130中。更具體而言,風扇124設置在過濾部件136上方,風扇124的進風側與過濾單元130內的容腔流體連通,風扇124的出風側與過濾單元130的淨氣出口131.2、自清潔氣體出口134和排氣口132流體連通。在其他實施例中,也可以採用其他的流體動力裝置(例如鼓風機、泵等)來替代圖1A所示的實施例中的風扇124,只要能夠驅動廢氣淨化系統100內的氣體按照預期的路徑流動即可。The exhaust gas purification system 100 also includes a fan 124 for driving the flow of gas in the exhaust gas purification system 100 . In the embodiment shown in FIG. 1A , the fan 124 is provided in the filter unit 130 . More specifically, the fan 124 is disposed above the filter component 136. The air inlet side of the fan 124 is in fluid communication with the cavity in the filter unit 130, and the air outlet side of the fan 124 is in fluid communication with the clean air outlet 131.2 and the self-cleaning gas of the filter unit 130. The outlet 134 and the exhaust port 132 are in fluid communication. In other embodiments, other fluid power devices (such as blowers, pumps, etc.) can also be used to replace the fan 124 in the embodiment shown in FIG. 1A , as long as the gas in the exhaust gas purification system 100 can be driven to flow according to the expected path. That’s it.

廢氣淨化系統100還包括收集單元140,第一級冷卻單元110的廢液出口141.1、第二級冷卻單元120的廢液出口141.2和過濾單元130的廢液出口141.3均與收集單元140連通,以使得從第一級冷卻單元110、第二級冷卻單元120以及過濾單元130中排出的液體均能夠流入收集單元140。收集單元140的入口處設置有閥部件117.6,當需要更換收集單元140或者將收集單元140中的液體倒出時,關閉閥部件117.6可以將收集單元140與第一級冷卻單元110、第二級冷卻單元120以及過濾單元130斷開。The exhaust gas purification system 100 also includes a collection unit 140. The waste liquid outlet 141.1 of the first-stage cooling unit 110, the waste liquid outlet 141.2 of the second-stage cooling unit 120, and the waste liquid outlet 141.3 of the filter unit 130 are all connected with the collection unit 140, so as to This allows the liquid discharged from the first-stage cooling unit 110 , the second-stage cooling unit 120 and the filter unit 130 to flow into the collection unit 140 . A valve component 117.6 is provided at the inlet of the collection unit 140. When the collection unit 140 needs to be replaced or the liquid in the collection unit 140 needs to be poured out, closing the valve component 117.6 can separate the collection unit 140 from the first-stage cooling unit 110 and the second-stage cooling unit 110. The cooling unit 120 and the filter unit 130 are disconnected.

廢氣淨化系統100還包括分別設置為檢測第一級冷卻單元110和第二級冷卻單元120中的溫度的溫度檢測部件151,152。The exhaust gas purification system 100 further includes temperature detection components 151, 152 respectively configured to detect temperatures in the first-stage cooling unit 110 and the second-stage cooling unit 120.

需要說明的是,在圖1所示的實施例中,廢氣淨化系統100中包括兩級冷卻單元,兩級冷卻單元之間通過連接通道125.1流體連通。在其他實施例中,廢氣淨化系統中也可以只包括第一級冷卻單元110或第二級冷卻單元120。It should be noted that, in the embodiment shown in FIG. 1 , the exhaust gas purification system 100 includes two-stage cooling units, and the two-stage cooling units are fluidly connected through the connecting channel 125.1. In other embodiments, the exhaust gas purification system may also include only the first-stage cooling unit 110 or the second-stage cooling unit 120 .

廢氣淨化系統100具有工作狀態和維護狀態。在工作狀態中,廢氣淨化系統100對回流焊爐爐膛118中排出的氣體進行淨化。在維護狀態中,廢氣淨化系統100不再接收回流焊爐爐膛118中排出的氣體,而是對廢氣淨化系統100內部進行自清潔。通過控制各個閥部件117.1, 117.2, 117.3, 117.4, 117.5, 117.6的打開和關閉,能夠將廢氣淨化系統100在工作狀態和維護狀態這兩個狀態之間進行切換。下面以使用基本上惰性的氣體(例如氮氣)作為工作氣體的回流焊爐為例,說明本案的廢氣淨化系統100的兩種工作狀態中氣體的流動路徑。The exhaust gas purification system 100 has a working state and a maintenance state. In the working state, the exhaust gas purification system 100 purifies the gas discharged from the reflow oven furnace 118 . In the maintenance state, the exhaust gas purification system 100 no longer receives the gas discharged from the reflow oven furnace 118, but performs self-cleaning on the inside of the exhaust gas purification system 100. By controlling the opening and closing of each valve component 117.1, 117.2, 117.3, 117.4, 117.5, 117.6, the exhaust gas purification system 100 can be switched between the working state and the maintenance state. The following takes a reflow oven that uses a substantially inert gas (such as nitrogen) as the working gas as an example to illustrate the gas flow paths in the two working states of the exhaust gas purification system 100 in this case.

圖1B圖示圖1A中的廢氣淨化系統100處於工作狀態時,氣體的流動路徑。如圖1B所示,當廢氣淨化系統100處於工作狀態時,閥部件117.1, 117.2, 117.6打開,閥部件117.3和閥部件117.4關閉,通道開關部件117.5可關閉,或者至少部分地打開。回流焊爐爐膛118中的包含有污染物的廢氣(溫度大致為170℃)從爐膛118的高溫區排出後,先經過第一級冷卻單元110冷卻至第一溫度,例如110~130℃。在此溫度下,第一級冷卻單元110中的廢氣污染物中的松香等有機物從氣態凝結為液態並可以從第一級冷卻單元110的廢液出口141.1排入收集單元140中,剩餘的部分廢氣再輸送至第二級冷卻單元120進一步進行冷卻。進入第二級冷卻單元120中的氣體在第二級冷卻單元120中被冷卻至第二溫度,例如60~80℃,以使得廢氣中的其他污染物有機物(例如低凝點的酸類或酯類或醚類有機物)從氣態凝結為液態,並通過第二級冷卻單元120的廢液出口141.2排入收集單元140中,剩餘的部分廢氣輸送至過濾單元130進行過濾淨化。進入過濾單元130中的廢氣被過濾後,其中的顆粒狀以及霧狀有機物被除去,因此能得到清潔的淨氣。最後將淨氣輸送回到回流焊爐爐膛118的低溫區,完成對廢氣的淨化。FIG. 1B illustrates the gas flow path when the exhaust gas purification system 100 in FIG. 1A is in operation. As shown in Figure 1B, when the exhaust gas purification system 100 is in working condition, the valve components 117.1, 117.2, 117.6 are opened, the valve component 117.3 and the valve component 117.4 are closed, and the channel switch component 117.5 can be closed, or at least partially opened. After the exhaust gas containing pollutants (temperature is approximately 170°C) in the reflow furnace furnace 118 is discharged from the high temperature area of the furnace 118, it is first cooled to a first temperature, such as 110~130°C, through the first-stage cooling unit 110. At this temperature, organic matter such as rosin in the exhaust gas pollutants in the first-stage cooling unit 110 condenses from gaseous state to liquid state and can be discharged into the collection unit 140 from the waste liquid outlet 141.1 of the first-stage cooling unit 110, and the remaining part The exhaust gas is then sent to the second-stage cooling unit 120 for further cooling. The gas entering the second-stage cooling unit 120 is cooled to a second temperature in the second-stage cooling unit 120, such as 60~80°C, so that other pollutant organic matter (such as low condensation point acids or esters) in the exhaust gas or ether organic matter) condenses from the gaseous state into the liquid state, and is discharged into the collection unit 140 through the waste liquid outlet 141.2 of the second-stage cooling unit 120. The remaining waste gas is transported to the filtering unit 130 for filtration and purification. After the exhaust gas entering the filter unit 130 is filtered, the particulate and mist organic matter in the exhaust gas is removed, so clean air can be obtained. Finally, the clean gas is transported back to the low temperature area of the reflow furnace furnace 118 to complete the purification of the waste gas.

在廢氣淨化系統100處於工作狀態時,如果閥部件117.5關閉,則經過過濾單元130過濾後的淨氣不能通過連接通道135回到第一級冷卻單元110中。如果通道開關部件117.5打開或部分地打開,則經過過濾單元130過濾後的淨氣的一部分能夠通過連接通道135回到第一級冷卻單元110中,由此,可以利用過濾單元130中溫度較低的清潔淨氣冷卻第一級冷卻單元110中的氣體,以節省第一級冷卻單元110中用於熱交換的冷卻媒體。When the exhaust gas purification system 100 is in operation, if the valve component 117.5 is closed, the clean air filtered by the filter unit 130 cannot return to the first-stage cooling unit 110 through the connecting channel 135. If the channel switch component 117.5 is opened or partially opened, a part of the clean air filtered by the filter unit 130 can return to the first-stage cooling unit 110 through the connecting channel 135, thereby taking advantage of the lower temperature in the filter unit 130. The clean air cools the gas in the first-stage cooling unit 110 to save cooling media used for heat exchange in the first-stage cooling unit 110 .

圖1C圖示廢氣淨化系統100處於維護狀態時,氣體的流動方向。如圖1C所示,當廢氣淨化系統100處於維護狀態時,閥部件117.1,117.2,117.3,117.4斷開,閥部件117.6和通道開關部件117.5打開。此時,通過過濾單元130中的加熱部件133對過濾單元130中的氣體加熱,能夠升高過濾單元130內部的溫度,例如升高至150℃~170℃左右。在此溫度下,過濾部件136上附著的固體污染物中的一部分轉化為液態,一部分轉化為氣態,液體能夠通過過濾單元130的廢液出口141.3排出,而氣體以較高溫度經過連接通道135再輸送至第一級冷卻單元110和第二級冷卻單元120中。第一級冷卻單元110和第二級冷卻單元110中的氣體以如上述廢氣淨化程序的那樣經過連接通道125.1,125.2再流動回到過濾單元130中,使第一級冷卻單元110和第二級冷卻單元120內的各個部件上,以及連接通道125.1和冷卻通道125.2內壁上附著的固體形態的污染物有機物重新被加熱為液態或氣態,並使液體通過第一級冷卻單元110的廢液出口141.1和第二級冷卻單元120的廢液出口141.2排出,氣體輸送回過濾單元130中,完成自清潔的氣體循環。FIG. 1C illustrates the flow direction of gas when the exhaust gas purification system 100 is in a maintenance state. As shown in FIG. 1C , when the exhaust gas purification system 100 is in the maintenance state, the valve components 117.1, 117.2, 117.3, and 117.4 are disconnected, and the valve component 117.6 and the channel switch component 117.5 are opened. At this time, by heating the gas in the filter unit 130 through the heating component 133 in the filter unit 130, the temperature inside the filter unit 130 can be raised, for example, to about 150°C to 170°C. At this temperature, part of the solid pollutants attached to the filter component 136 is converted into a liquid state, and part is converted into a gaseous state. The liquid can be discharged through the waste liquid outlet 141.3 of the filter unit 130, while the gas passes through the connecting channel 135 at a higher temperature. Transported to the first-level cooling unit 110 and the second-level cooling unit 120 . The gas in the first-stage cooling unit 110 and the second-stage cooling unit 110 flows back to the filter unit 130 through the connecting channels 125.1, 125.2 as in the above exhaust gas purification process, so that the first-stage cooling unit 110 and the second-stage The solid form of pollutant organic matter attached to various components in the cooling unit 120 and on the inner walls of the connecting channel 125.1 and the cooling channel 125.2 is reheated into a liquid or gaseous state, and the liquid passes through the waste liquid outlet of the first-stage cooling unit 110 141.1 and the waste liquid outlet 141.2 of the second-stage cooling unit 120 are discharged, and the gas is transported back to the filter unit 130 to complete the self-cleaning gas cycle.

在如圖1C所示的自清潔的氣體循環程序中,由於閥部件117.1,117.2被斷開,因此該自清潔的氣體循環程序能夠在不影響回流焊爐工作的情況下進行。也就是說,即使回流焊爐處於工作程序中,廢氣淨化系統100也能處於維護狀態,對其內部進行自清潔。In the self-cleaning gas circulation program shown in FIG. 1C , since the valve components 117.1 and 117.2 are disconnected, the self-cleaning gas circulation program can be performed without affecting the operation of the reflow oven. That is to say, even if the reflow oven is in a working program, the exhaust gas purification system 100 can be in a maintenance state and perform self-cleaning inside it.

對於使用基本上惰性的氣體(例如氮氣)作為工作氣體的回流焊爐爐膛118中工作氣體需要保持一定的濃度範圍,以滿足製程需求。回流焊爐通常設有調節爐膛118中工作氣體濃度的單元(例如補充工作氣體的單元)。當廢氣淨化系統100處於工作狀態時,回流焊爐的爐膛118中的氣體持續地被廢氣淨化系統100淨化並重新送回到回流焊爐的爐膛118中,因此處於工作狀態的廢氣淨化系統100中的工作氣體的濃度與回流焊爐的爐膛118中的工作氣體的濃度單元相近。但是當將廢氣淨化系統100從回流焊爐的爐膛118斷開進行自清潔維護後,廢氣淨化系統100中的工作氣體的濃度通常會小於爐膛118中的工作氣體的濃度。因此,根據本案,在廢氣淨化系統100的維護狀態完成後(包括自清潔的氣體循環的維護程序或者其他清潔方式的維護程序),在將廢氣淨化系統100重新與回流焊爐的爐膛118連通之前,可以向廢氣淨化系統100中補充一定量的工作氣體,以使得廢氣淨化系統100中的工作氣體達到與回流焊爐中的工作氣體相同或相近的濃度。為此,通過補氣口112向廢氣淨化系統100中補充工作氣體,並且同時通過排氣口132排出廢氣淨化系統100中的氣體,直至通過氣體濃度檢測部件155判斷出廢氣淨化系統100中的保護氣體濃度達到回流焊爐中保護氣體的濃度。For a reflow oven that uses a substantially inert gas (such as nitrogen) as the working gas, the working gas in the furnace 118 needs to maintain a certain concentration range to meet process requirements. The reflow oven is usually provided with a unit for adjusting the concentration of the working gas in the furnace 118 (eg, a unit for replenishing the working gas). When the exhaust gas purification system 100 is in the working state, the gas in the furnace 118 of the reflow soldering furnace is continuously purified by the exhaust gas purification system 100 and sent back to the furnace 118 of the reflow soldering furnace. Therefore, the exhaust gas purification system 100 is in the working state. The concentration of the working gas is similar to the concentration unit of the working gas in the furnace 118 of the reflow oven. However, after the exhaust gas purification system 100 is disconnected from the furnace 118 of the reflow oven for self-cleaning maintenance, the concentration of the working gas in the exhaust gas purification system 100 will usually be smaller than the concentration of the working gas in the furnace 118 . Therefore, according to this case, after the maintenance status of the exhaust gas purification system 100 is completed (including maintenance procedures for self-cleaning gas circulation or maintenance procedures for other cleaning methods), before the exhaust gas purification system 100 is reconnected to the furnace 118 of the reflow oven , a certain amount of working gas can be added to the exhaust gas purification system 100 so that the working gas in the exhaust gas purification system 100 reaches the same or similar concentration as the working gas in the reflow oven. To this end, the working gas is replenished into the exhaust gas purification system 100 through the gas supply port 112, and at the same time, the gas in the exhaust gas purification system 100 is discharged through the exhaust port 132, until the gas concentration detection component 155 determines that the protective gas in the exhaust gas purification system 100 is The concentration reaches that of the protective gas in the reflow oven.

當廢氣淨化系統100用於使用空氣作為工作氣體的回流焊爐時,廢氣淨化系統100淨化後的氣體可以輸送回到爐膛118中,也可以不輸送回到爐膛118中,而是直接排放到大氣中。如果廢氣淨化系統100淨化後的氣體直接排放到大氣中,那麼圖1B所示的過濾單元130的淨氣出口131.2通過閥部件117.2可控地與大氣流體連通,而不是連接至爐膛118。When the exhaust gas purification system 100 is used in a reflow oven that uses air as the working gas, the gas purified by the exhaust gas purification system 100 may be transported back to the furnace 118, or may not be transported back to the furnace 118, but directly discharged to the atmosphere. middle. If the purified gas of the exhaust gas purification system 100 is directly discharged into the atmosphere, then the clean gas outlet 131.2 of the filter unit 130 shown in FIG. 1B is controllably fluidly connected to the atmosphere through the valve component 117.2 instead of being connected to the furnace 118.

根據本案,廢氣淨化系統100中的第一級冷卻單元110和第二級冷卻單元120可以採用已知的任何類型的熱交換裝置。According to this case, the first-stage cooling unit 110 and the second-stage cooling unit 120 in the exhaust gas purification system 100 may adopt any known type of heat exchange device.

根據本案,廢氣淨化系統100的第一級冷卻單元110,第二級冷卻單元120和過濾單元130可以集成在一起,使得整個廢氣淨化系統100形成一個箱式的廢氣淨化裝置,以便於與回流焊爐配合使用。According to this case, the first-stage cooling unit 110, the second-stage cooling unit 120 and the filter unit 130 of the exhaust gas purification system 100 can be integrated together, so that the entire exhaust gas purification system 100 forms a box-type exhaust gas purification device to facilitate reflow soldering. Use with furnace.

以下介紹廢氣淨化裝置的兩種具體結構示例,其中圖2A-圖6圖示根據本案的一個種實施例的廢氣淨化裝置200的具體結構,圖7A-圖11示出根據本案的另一個實施例的廢氣淨化裝置700的具體結構。Two specific structural examples of the exhaust gas purification device are introduced below. Figures 2A to 6 illustrate the specific structure of the exhaust gas purification device 200 according to one embodiment of the present case. Figures 7A to 11 illustrate another embodiment of the present case. The specific structure of the exhaust gas purification device 700.

圖2A-圖2C為廢氣淨化裝置200的整體結構示意圖,其中圖2A為廢氣淨化裝置200的立體結構圖,圖2B為圖2A的正視圖,圖2C為圖2A的俯視圖。如圖2A-2C所示,廢氣淨化裝置200包括殼體201,殼體201大致為內部具有容腔的箱形,其包括頂部202、底部203、左部204、右部205、前部206和後部207。其中殼體201的頂部202、底部203、左部204、右部205和後部207例如通過焊接的方式連接在一起形成箱體容腔,前部206通過例如卡扣等方式可拆卸地連接頂部202和底部203上,以封閉箱體容腔。其中在圖2B中圖示頂部202、底部203、左部204、右部205和前部206,圖2C中圖示後部207。2A-2C are schematic diagrams of the overall structure of the exhaust gas purification device 200, where FIG. 2A is a three-dimensional structural view of the exhaust gas purification device 200, FIG. 2B is a front view of FIG. 2A, and FIG. 2C is a top view of FIG. 2A. As shown in Figures 2A-2C, the exhaust gas purification device 200 includes a housing 201. The housing 201 is generally box-shaped with a cavity inside, and includes a top 202, a bottom 203, a left part 204, a right part 205, a front part 206 and a Rear 207. The top 202, bottom 203, left part 204, right part 205 and rear part 207 of the housing 201 are connected together to form a box cavity, for example by welding, and the front part 206 is detachably connected to the top 202 by, for example, buckles. and the bottom 203 to close the box cavity. The top 202, the bottom 203, the left 204, the right 205 and the front 206 are shown in Figure 2B, and the rear 207 is shown in Figure 2C.

如圖2A-2C所示,廢氣淨化裝置200還包括設置在殼體201上的廢氣入口211.1和淨氣出口231.2。廢氣入口211.1上設有連接管道251.1,連接管道251.1上設有閥部件217.1。閥部件217.1可以打開和關閉。廢氣入口211.1通過連接管道251.1與回流焊爐爐膛高溫區(圖中未示出)連接。淨氣出口231.2上設有連接管道251.2,連接管道251.2上設有閥部件217.2。閥部件217.2可以打開和關閉。淨氣出口231.2通過連接管道251.2與回流焊爐爐膛低溫區(圖中未示出)連接。爐膛中排出的廢氣能夠從廢氣入口211.1進入廢氣淨化裝置200,經過廢氣淨化裝置200淨化為淨氣後,再從淨氣出口231.2排至回流焊爐爐膛低溫區。As shown in Figures 2A-2C, the exhaust gas purification device 200 also includes an exhaust gas inlet 211.1 and a clean gas outlet 231.2 provided on the housing 201. The exhaust gas inlet 211.1 is provided with a connecting pipe 251.1, and the connecting pipe 251.1 is provided with a valve component 217.1. The valve part 217.1 can be opened and closed. The exhaust gas inlet 211.1 is connected to the high temperature zone (not shown in the figure) of the reflow furnace furnace through a connecting pipe 251.1. The clean gas outlet 231.2 is provided with a connecting pipe 251.2, and the connecting pipe 251.2 is provided with a valve component 217.2. The valve part 217.2 can be opened and closed. The clean gas outlet 231.2 is connected to the low temperature zone (not shown in the figure) of the reflow furnace furnace through a connecting pipe 251.2. The exhaust gas discharged from the furnace can enter the exhaust gas purification device 200 from the exhaust gas inlet 211.1. After being purified into clean gas by the exhaust gas purification device 200, it is then discharged from the clean gas outlet 231.2 to the low temperature zone of the reflow furnace furnace.

從如圖2B所示的廢氣淨化裝置200的前部看過去,廢氣入口211.1設置在殼體201的右部205靠後處,淨氣出口231.2設置在殼體201的後部207靠左處,由此使得廢氣在廢氣淨化裝置200中的流動方向大致為從右向左流動。Viewed from the front of the exhaust gas purification device 200 as shown in Figure 2B, the exhaust gas inlet 211.1 is located at the rear of the right portion 205 of the housing 201, and the clean air outlet 231.2 is located at the left of the rear portion 207 of the housing 201. This makes the flow direction of the exhaust gas in the exhaust gas purification device 200 generally flow from right to left.

殼體201的前部206包括第一前板206.1和第二前板206.2。其中第一前板206.1用於從前側方向殼體201內部的一部分容腔(參見圖3中的過濾容腔342),第二前板206.2用於從前側方向密封殼體201內部的另一部分容腔(參見圖3中的冷卻容腔341)。其中第二前板206.2上設有數個開口271,用於將冷卻裝置通過第二前板206.2上的開口271插入冷卻容腔341中(這將結合圖3詳細介紹)。The front portion 206 of the housing 201 includes a first front panel 206.1 and a second front panel 206.2. The first front plate 206.1 is used to seal a part of the cavity inside the casing 201 from the front side (see the filter cavity 342 in Figure 3), and the second front plate 206.2 is used to seal another part of the cavity inside the casing 201 from the front side. cavity (see cooling volume 341 in Figure 3). The second front plate 206.2 is provided with several openings 271 for inserting the cooling device into the cooling cavity 341 through the openings 271 on the second front plate 206.2 (this will be described in detail in conjunction with FIG. 3).

廢氣淨化裝置200還包括收集裝置,收集裝置連接在殼體201的底部203。在如圖所示的示例中,收集裝置包括兩個收集瓶240.1和240.2,它們各自通過一個閥部件217.6與殼體201的底部203相連,以使得凝成液體的污染物能夠可控地排入收集瓶240.1和240.2中。底部203包括沿從後向前的方向逐漸向下傾斜的底板,收集瓶240.1和240.2連接在底板的前側(參見圖4)。收集瓶240.1用於與殼體201內部的過濾容腔342(參見圖3)連通,收集瓶240.2用於與殼體201內部的冷卻容腔341(參見圖3)連通。通過設置傾斜的底板,可以使得凝成液體的污染物更容易流入收集裝置中。The exhaust gas purification device 200 also includes a collection device, which is connected to the bottom 203 of the housing 201 . In the example shown in the figure, the collection device includes two collection bottles 240.1 and 240.2, each of which is connected to the bottom 203 of the housing 201 through a valve member 217.6, so that the contaminants condensed into liquid can be controllably discharged into Collect in bottles 240.1 and 240.2. The bottom 203 includes a bottom plate that gradually slopes downward in the direction from back to front, and the collection bottles 240.1 and 240.2 are connected to the front side of the bottom plate (see Figure 4). The collection bottle 240.1 is used to communicate with the filter cavity 342 (see Figure 3) inside the housing 201, and the collection bottle 240.2 is used to communicate with the cooling cavity 341 (see Figure 3) inside the housing 201. By arranging an inclined bottom plate, contaminants that have condensed into liquid can flow into the collection device more easily.

廢氣淨化裝置200還包括排氣口232和補氣口212(見圖2C)。作為一個示例,補氣口212設置在殼體201的頂部202上靠近廢氣入口211.1的附近。排氣口232設置淨氣出口231.2處連接管道251.1上,並位於淨氣出口231.2和閥部件217.1之間的位置處。淨氣出口231.2處的連接管道251.1的底部設有氧氣濃度檢測裝置455(參見圖4),氧氣濃度檢測裝置455用於檢測淨氣出口231.2處排出的氣體中的氧氣濃度。從而,向廢氣淨化裝置200中補充的保護氣體的流動方向大致上也是從右向左流動,以使整個廢氣淨化裝置200中的工作氣體的濃度都能得到提高。排氣口232和補氣口212上分別設有閥部件,通過閥部件來控制排氣口232和補氣口212的開啟或關閉,例如通過電磁閥控制。本領域技藝人士應當知曉的是,為了維持廢氣淨化裝置200中的氣體壓力在一定範圍內,排氣口232和補氣口212上的閥部件應當同時開啟或者同時關閉。當然,排氣口232和補氣口212也可以設置在其他位置,只要能夠使得氣體可控地通過補氣口212輸入廢氣淨化裝置200中,並且可控地通過排氣口232排出廢氣淨化裝置200即可。廢氣淨化裝置200還包括風機224。風機224的驅動部件設置在殼體201的頂部202的左側,風機224的葉輪設置在殼體201內的過濾容腔342內(參見圖5)。風機224的葉輪具有進風側和出風側,其中進風側與過濾容腔342流體連通,出風側與淨氣出口231.2流體連通。The exhaust gas purification device 200 also includes an exhaust port 232 and an air supply port 212 (see Figure 2C). As an example, the air supply port 212 is provided on the top 202 of the housing 201 near the exhaust gas inlet 211.1. The exhaust port 232 is provided on the pipe 251.1 connected to the clean gas outlet 231.2, and is located between the clean gas outlet 231.2 and the valve component 217.1. An oxygen concentration detection device 455 (see Figure 4) is provided at the bottom of the connecting pipe 251.1 at the clean gas outlet 231.2. The oxygen concentration detection device 455 is used to detect the oxygen concentration in the gas discharged from the clean gas outlet 231.2. Therefore, the flow direction of the protective gas supplied to the exhaust gas purification device 200 is also generally from right to left, so that the concentration of the working gas in the entire exhaust gas purification device 200 can be increased. The exhaust port 232 and the air supply port 212 are respectively provided with valve components, and the valve components are used to control the opening or closing of the exhaust port 232 and the air supply port 212, for example, through solenoid valve control. Those skilled in the art should know that in order to maintain the gas pressure in the exhaust gas purification device 200 within a certain range, the valve components on the exhaust port 232 and the air supply port 212 should be opened or closed at the same time. Of course, the exhaust port 232 and the air supply port 212 can also be arranged at other positions, as long as the gas can be controllably input into the exhaust gas purification device 200 through the air supply port 212, and the gas can be controllably discharged from the exhaust gas purification device 200 through the exhaust port 232. That is, Can. The exhaust gas purification device 200 also includes a fan 224. The driving component of the fan 224 is arranged on the left side of the top 202 of the housing 201, and the impeller of the fan 224 is arranged in the filter cavity 342 in the housing 201 (see Figure 5). The impeller of the fan 224 has an air inlet side and an air outlet side, where the air inlet side is in fluid communication with the filter chamber 342 and the air outlet side is in fluid communication with the clean air outlet 231.2.

廢氣淨化裝置200還包括溫度檢測器213.1、213.2、213.3、213.4、213.5和213.6。其中溫度檢測器213.1和213.2分別設置在廢氣入口211.1和淨氣出口231.2處,溫度檢測器213.3、213.4和213.5連接在殼體201的後部207上並且伸入廢氣淨化裝置200的冷卻容腔341(參見圖5)內。溫度檢測器213.6連接在殼體201的左部204並且伸入廢氣淨化裝置200的過濾容腔342(參見圖5)內。作為一個示例,溫度檢測器213.1、213.2、213.3、213.4、213.5和213.6為熱電偶。在其他示例中,廢氣淨化裝置200也可以僅包括一部分溫度檢測器或者設置其他類型的溫度檢測器。The exhaust gas purification device 200 also includes temperature detectors 213.1, 213.2, 213.3, 213.4, 213.5 and 213.6. The temperature detectors 213.1 and 213.2 are respectively provided at the exhaust gas inlet 211.1 and the clean air outlet 231.2. The temperature detectors 213.3, 213.4 and 213.5 are connected to the rear portion 207 of the housing 201 and extend into the cooling cavity 341 of the exhaust gas purification device 200 ( See Figure 5). The temperature detector 213.6 is connected to the left part 204 of the housing 201 and extends into the filter chamber 342 (see Figure 5) of the exhaust gas purification device 200. As an example, temperature detectors 213.1, 213.2, 213.3, 213.4, 213.5 and 213.6 are thermocouples. In other examples, the exhaust gas purification device 200 may also include only a part of the temperature detectors or provide other types of temperature detectors.

廢氣淨化裝置200還包括數個加熱棒222。加熱棒222也連接在殼體201的左部204並且伸入廢氣淨化裝置200的過濾容腔342(參見圖5)內,以在廢氣淨化裝置200的自清潔程序中對過濾容腔342中的過濾部件336(參見圖5)加熱。在其他示例中也可以用其他加熱裝置來替代加熱棒222。當然,在無需進行自清潔的廢氣淨化裝置中也可以不包括加熱棒222。The exhaust gas purification device 200 also includes a plurality of heating rods 222 . The heating rod 222 is also connected to the left portion 204 of the housing 201 and extends into the filter chamber 342 (see FIG. 5 ) of the exhaust gas purification device 200 to clean the filter chamber 342 during the self-cleaning procedure of the exhaust gas purification device 200 . Filter element 336 (see Figure 5) is heated. In other examples, other heating devices may be used instead of the heating rod 222 . Of course, the heating rod 222 may not be included in an exhaust gas purification device that does not require self-cleaning.

圖3為廢氣淨化裝置200的爆炸結構圖,用於示出廢氣淨化裝置200的內部結構和部件。如圖3所示,殼體201的內部包括分隔板437(分隔板437的具體結構參見圖4),分隔板437將殼體201內部的容腔分隔成冷卻容腔341和過濾容腔342,冷卻容腔341位於過濾容腔342的右側。並且分隔板437上具有上部開口432和下部開口431(參見圖4),上部開口432和下部開口431能夠連通冷卻容腔341和過濾容腔342。冷卻容腔341與廢氣入口211.1連通,過濾容腔342與淨氣出口231.2連通。冷卻容腔341中提供有冷卻裝置,冷卻裝置用於降低冷卻容腔341中的氣體的溫度。冷卻裝置包括第一級冷卻裝置310和第二級冷卻裝置320,第一級冷卻裝置310位於第二級冷卻裝置320的右側。氣體從廢氣入口211.1進入冷卻容腔341後,從右向左依次流經第一級冷卻裝置310和第二級冷卻裝置320。過濾容腔342中提供有過濾部件336,過濾部件336橫向安裝在過濾容腔342中,使得氣體進入過濾容腔342後能夠由下至上地流經過濾部件336,以從過濾部件336上方的淨氣出口231.2流出過濾容腔342。FIG. 3 is an exploded structural view of the exhaust gas purification device 200 , showing the internal structure and components of the exhaust gas purification device 200 . As shown in Figure 3, the interior of the housing 201 includes a partition plate 437 (see Figure 4 for the specific structure of the partition plate 437). The partition plate 437 divides the chamber inside the housing 201 into a cooling chamber 341 and a filter chamber. Cavity 342, the cooling cavity 341 is located on the right side of the filter cavity 342. And the partition plate 437 has an upper opening 432 and a lower opening 431 (see FIG. 4 ), and the upper opening 432 and the lower opening 431 can communicate with the cooling cavity 341 and the filtering cavity 342 . The cooling cavity 341 is connected to the exhaust gas inlet 211.1, and the filtering cavity 342 is connected to the clean gas outlet 231.2. A cooling device is provided in the cooling chamber 341, and the cooling device is used to reduce the temperature of the gas in the cooling chamber 341. The cooling device includes a first-level cooling device 310 and a second-level cooling device 320. The first-level cooling device 310 is located on the right side of the second-level cooling device 320. After the gas enters the cooling chamber 341 from the exhaust gas inlet 211.1, it flows through the first-stage cooling device 310 and the second-stage cooling device 320 from right to left. A filter component 336 is provided in the filter cavity 342, and the filter component 336 is installed transversely in the filter cavity 342, so that after the gas enters the filter cavity 342, it can flow through the filter component 336 from bottom to top to clean the air above the filter component 336. The air outlet 231.2 flows out of the filter chamber 342.

冷卻容腔341中還設有圍板327,圍板327設置在冷卻裝置的頂部靠後側的位置,圍板327與殼體201共同形成自清潔氣體流過的連接通道的一部分,這將在後文詳細敘述。The cooling cavity 341 is also provided with a hoarding 327, which is disposed at the top of the cooling device at the rear side. The hoarding 327 and the housing 201 together form a part of the connection channel through which the self-cleaning gas flows, which will be in the cooling chamber 341. Described in detail later.

廢氣從回流焊爐爐膛的高溫區排出後,從廢氣入口211.1進入廢氣淨化裝置200內,其中廢氣中的松香等污染物經過冷卻容腔341被第一級冷卻裝置310和第二級冷卻裝置320從氣態凝結為液態並排入收集瓶240.2中,廢氣中剩餘的氣體經過開口431再流入過濾容腔342中,在過濾容腔342內被過濾部件336過濾為清潔的淨氣,最後將淨氣從淨氣出口231.2排至回流焊爐爐膛的低溫區。After the waste gas is discharged from the high-temperature area of the reflow furnace furnace, it enters the waste gas purification device 200 from the waste gas inlet 211.1, where the rosin and other pollutants in the waste gas are removed by the first-stage cooling device 310 and the second-stage cooling device 320 through the cooling chamber 341. It condenses from gaseous state into liquid state and is discharged into the collection bottle 240.2. The remaining gas in the exhaust gas flows into the filter chamber 342 through the opening 431, and is filtered into clean gas by the filter component 336 in the filter chamber 342. Finally, the clean gas is It is discharged from the clean gas outlet 231.2 to the low temperature area of the reflow oven furnace.

需要說明的是,冷卻容腔341也可以設置在過濾容腔342的左側,但是此時需要使廢氣入口211.1位於殼體的左部204使其保持與冷卻容腔341的連通,淨氣出口231.2位於殼體的右部205使其保持與過濾容腔342的連通。It should be noted that the cooling cavity 341 can also be arranged on the left side of the filter cavity 342, but in this case, the exhaust gas inlet 211.1 needs to be located at the left part 204 of the housing to maintain communication with the cooling cavity 341, and the clean gas outlet 231.2 The right portion 205 of the housing maintains communication with the filter volume 342 .

仍然如圖3所示,第一級冷卻裝置310包括數個冷卻板315,第二級冷卻裝置320包括數個冷卻板317。每個冷卻板315,317內部可以容納冷卻媒體。冷卻板315,317中的冷卻媒體通過冷卻板315,317的外周側壁與廢氣進行熱交換,使廢氣的溫度降低。殼體的第二前板206.2的數個開口271中每個開口的大小設置為與相應的一個冷卻板315或317的大小相匹配,使得每個冷卻板315或317在插入相應的開口271中後,能夠將相應的開口271封住。每個冷卻板315或317的位於殼體201外部的端板上設有冷卻媒體入口355或357和冷卻媒體出口365或367,通過冷卻媒體入口355或357可以向相應的冷卻板315或317中加入冷卻媒體,通過冷卻媒體出口365或367可以將相應的冷卻板315或317中的冷卻媒體排出。冷卻媒體入口355或357和冷卻媒體出口365或367可以被封住。As still shown in FIG. 3 , the first-stage cooling device 310 includes a plurality of cooling plates 315 , and the second-stage cooling device 320 includes a plurality of cooling plates 317 . Each cooling plate 315, 317 can contain cooling media inside. The cooling medium in the cooling plates 315 and 317 exchanges heat with the exhaust gas through the outer peripheral side walls of the cooling plates 315 and 317 to reduce the temperature of the exhaust gas. Each of the openings 271 of the second front plate 206.2 of the housing is sized to match the size of a corresponding cooling plate 315 or 317, such that each cooling plate 315 or 317 is inserted into the corresponding opening 271. Finally, the corresponding opening 271 can be sealed. The end plate of each cooling plate 315 or 317 located outside the housing 201 is provided with a cooling medium inlet 355 or 357 and a cooling medium outlet 365 or 367. Through the cooling medium inlet 355 or 357, the cooling medium can be fed into the corresponding cooling plate 315 or 317. The cooling medium is added, and the cooling medium in the corresponding cooling plate 315 or 317 can be discharged through the cooling medium outlet 365 or 367. The cooling medium inlet 355 or 357 and the cooling medium outlet 365 or 367 can be sealed.

在圖3所示的實施例中,第一級冷卻裝置310的數個冷卻板315中的冷卻媒體為壓縮氣體,第二級冷卻裝置320的數個冷卻板317中的冷卻媒體為空氣。第一級冷卻裝置310的數個冷卻板315的冷卻媒體出口365處設有消聲器208(參見圖2A),以減小壓縮氣體流動時帶來的噪音。第二級冷卻裝置320的數個冷卻板317的冷卻媒體入口357處還設有過濾網,並連接有氣體管道318和抽風機319,以使空氣能夠以一定的速度從冷卻媒體入口357輸入,並且從冷卻媒體出口367輸出。當然,本領域技藝人士也可以根據實際的工作環境選擇其他類型的冷卻媒體,例如冷卻水等。In the embodiment shown in FIG. 3 , the cooling medium in the cooling plates 315 of the first-stage cooling device 310 is compressed gas, and the cooling medium in the cooling plates 317 of the second-stage cooling device 320 is air. Mufflers 208 (see FIG. 2A ) are provided at the cooling medium outlets 365 of the cooling plates 315 of the first-stage cooling device 310 to reduce the noise caused by the flow of compressed gas. The cooling medium inlet 357 of the cooling plates 317 of the second-stage cooling device 320 is also provided with a filter, and is connected to a gas pipeline 318 and an exhaust fan 319, so that air can be input from the cooling medium inlet 357 at a certain speed. and output from the cooling medium outlet 367. Of course, those skilled in the art can also choose other types of cooling media, such as cooling water, according to the actual working environment.

圖4為沿圖2B中A-A線的剖視圖,用於示出分隔板437的具體結構。如圖4所示,殼體201的內部的分隔板437連接在殼體201的頂部202和底部203之間,用於分隔冷卻容腔341與過濾容腔342。分隔板437上設有上部開口432和下部開口431,其中上部開口432在殼體內的位置設置得比過濾部件336(圖4中未示出)高,下部開口431在殼體內的位置設置得比過濾部件336(圖4中未示出)低。其中上部開口432與風機224的葉輪580的出風側584流體連通(見圖5)。FIG. 4 is a cross-sectional view along line A-A in FIG. 2B , showing the specific structure of the partition plate 437 . As shown in FIG. 4 , the internal partition plate 437 of the housing 201 is connected between the top 202 and the bottom 203 of the housing 201 for separating the cooling cavity 341 and the filtering cavity 342 . The partition plate 437 is provided with an upper opening 432 and a lower opening 431, wherein the upper opening 432 is positioned higher in the housing than the filter component 336 (not shown in Figure 4), and the lower opening 431 is positioned higher in the housing. lower than filter element 336 (not shown in Figure 4). The upper opening 432 is in fluid communication with the air outlet side 584 of the impeller 580 of the fan 224 (see Figure 5 ).

圍板327的截面為L形,包括相互連接的橫板425和豎板426,其中橫板425抵接或大致抵接在所述殼體201的後部207,豎板426抵接在殼體201的頂部202,以使得圍板327與殼體201共同形成連接通道635(參見圖6)。連接通道635與分隔板437的上部開口432對準並連通,以使得過濾容腔342中的氣體能夠通過分隔板437的上部開口432進入連接通道635中。The enclosure 327 has an L-shaped cross-section and includes interconnected horizontal plates 425 and vertical plates 426 , wherein the horizontal plates 425 abut or substantially abut against the rear portion 207 of the housing 201 , and the vertical plates 426 abut against the housing 201 The top 202 of the housing 201 such that the enclosure 327 and the housing 201 together form a connection channel 635 (see FIG. 6 ). The connection channel 635 is aligned with and communicates with the upper opening 432 of the partition plate 437 , so that the gas in the filter chamber 342 can enter the connection channel 635 through the upper opening 432 of the partition plate 437 .

由此,冷卻容腔341中的氣體能夠通過下部開口431流入過濾容腔342中,在過濾容腔342中由下至上地流動,以被過濾部件336過濾為淨氣。並且,過濾容腔342中過濾後的一部分淨氣能夠通過淨氣出口231.2排至回流焊爐中,另一部分淨氣通過上部開口432流經連接通道635再流回至冷卻容腔341中。Therefore, the gas in the cooling cavity 341 can flow into the filter cavity 342 through the lower opening 431 , flow from bottom to top in the filter cavity 342 , and be filtered by the filter component 336 into clean gas. Moreover, a part of the filtered clean gas in the filter cavity 342 can be discharged to the reflow oven through the clean gas outlet 231.2, and the other part of the clean gas flows through the upper opening 432 through the connecting channel 635 and then flows back to the cooling cavity 341.

圖5為沿圖2C中的B-B線的剖視圖,用於示出第一級冷卻裝置310、第二級冷卻裝置320以及過濾部件336的具體結構,並說明廢氣淨化程序中氣體的流動路徑。如圖5所示,第一級冷卻裝置310包括四個冷卻板315,第二級冷卻裝置320包括兩個冷卻板317。FIG. 5 is a cross-sectional view along line B-B in FIG. 2C , showing the specific structures of the first-stage cooling device 310 , the second-stage cooling device 320 and the filter component 336 , and illustrating the flow path of the gas in the exhaust gas purification process. As shown in FIG. 5 , the first-stage cooling device 310 includes four cooling plates 315 , and the second-stage cooling device 320 includes two cooling plates 317 .

四個冷卻板315沿殼體201的橫向排列(即在左右方向上排列)。每個冷卻板315具有空腔546.1,空腔546.1與殼體201上的冷卻媒體入口355和冷卻媒體出口365連通,使得壓縮空氣作為冷卻媒體能夠流入和流出冷卻板315的空腔546.1。兩個冷卻板317也沿橫向排列(即在左右方向上排列),每個冷卻板317具有空腔546.2,空腔546.2與殼體201上的冷卻媒體入口357和冷卻媒體出口367連通,使得空氣作為冷卻媒體能夠流入和流出冷卻板317的空腔546.2。每個冷卻板315和317為可導熱的材料製成,例如金屬製成,以使得冷卻板315和317周圍的氣體能夠與冷卻板315和317內容納的冷卻媒體進行熱交換。通過調節冷卻媒體流入或流出冷卻板315和317的速度,能夠將第一級冷卻裝置310和第二級冷卻裝置320中的氣體冷卻至一定溫度範圍內。The four cooling plates 315 are arranged transversely of the housing 201 (that is, arranged in the left-right direction). Each cooling plate 315 has a cavity 546.1 that communicates with the cooling medium inlet 355 and the cooling medium outlet 365 on the housing 201 so that compressed air as the cooling medium can flow into and out of the cavity 546.1 of the cooling plate 315. The two cooling plates 317 are also arranged laterally (that is, arranged in the left and right direction). Each cooling plate 317 has a cavity 546.2. The cavity 546.2 is connected with the cooling medium inlet 357 and the cooling medium outlet 367 on the housing 201, so that the air The cooling medium can flow into and out of the cavity 546.2 of the cooling plate 317. Each cooling plate 315 and 317 is made of a thermally conductive material, such as metal, so that the gas around the cooling plate 315 and 317 can conduct heat exchange with the cooling medium contained in the cooling plate 315 and 317 . By adjusting the speed of the cooling medium flowing into or out of the cooling plates 315 and 317, the gas in the first-stage cooling device 310 and the second-stage cooling device 320 can be cooled to a certain temperature range.

每個冷卻板315,317豎向放置(即在垂直於殼體頂部202和底部203的方向上放置),每兩個相鄰的冷卻板之間形成豎向氣體通道548。每個冷卻板315,317具有左右兩個側壁,冷卻容腔341中的廢氣流經豎向氣體通道548時,廢氣通過冷卻板315,317的左右側壁與空腔546.1和空腔546.2內的冷卻媒體進行熱交換,使廢氣的溫度降低。隨著廢氣的降低,廢氣中的一部分污染物能夠凝結成液體並沿著冷卻板315,317的左右側壁向下流動至殼體的底部203。需要說明的是,對於最左側的冷卻板來說,該冷卻板除了與其右側的相鄰冷卻板之間形成豎向氣體通道548以外,還與左側的分隔板437之間形成豎向氣體通道548。同樣的,對於最右側的冷卻板來說,該冷卻板除了與其左側的相鄰冷卻板之間形成豎向氣體通道548以外,還與殼體右部205之間形成豎向氣體通道548。Each cooling plate 315, 317 is placed vertically (ie, placed in a direction perpendicular to the top 202 and bottom 203 of the housing), and a vertical gas channel 548 is formed between every two adjacent cooling plates. Each cooling plate 315, 317 has two left and right side walls. When the exhaust gas in the cooling cavity 341 flows through the vertical gas channel 548, the exhaust gas carries out heat exchange with the cooling media in the cavity 546.1 and the cavity 546.2 through the left and right side walls of the cooling plate 315, 317. , lowering the temperature of the exhaust gas. As the exhaust gas decreases, a part of the pollutants in the exhaust gas can condense into liquid and flow down to the bottom 203 of the housing along the left and right side walls of the cooling plates 315, 317. It should be noted that, for the leftmost cooling plate, in addition to forming a vertical gas channel 548 between the cooling plate and the adjacent cooling plate on the right, it also forms a vertical gas channel with the partition plate 437 on the left. 548. Similarly, for the rightmost cooling plate, in addition to the vertical gas channel 548 formed between the cooling plate and the adjacent cooling plate on the left side, the cooling plate also forms a vertical gas channel 548 with the right part 205 of the housing.

並且,每個冷卻板315,317還與殼體底部203之間形成底部橫向氣體通道549.2或與殼體頂部202之間形成頂部橫向氣體通道549.1。其中每個頂部橫向氣體通道549.1和底部橫向氣體通道549.2與至少一個豎向氣體通道548連通,以形成廢氣流動的氣體通道550。作為一個示例,頂部橫向氣體通道549.1和底部橫向氣體通道549.2在冷卻板315,317的排列方向上交替地設置,以形成如圖5中示出的彎曲的氣體通道550。其中廢氣入口211.1與最右側的豎向氣體通道548連通,分隔板的下部開口431與最左側的豎向氣體通道548連通,使得廢氣能夠從最右側的豎向氣體通道548流入氣體通道550中,並從最左側的豎向氣體通道548流出氣體通道550。在其它實施例中,頂部橫向氣體通道、底部橫向通道與豎向氣體通道也可以設置為其它的排列方式以形成其它的氣體通道,只需保證廢氣能夠在氣體通道中流動並且流經每塊冷卻板即可。Moreover, each cooling plate 315, 317 also forms a bottom transverse gas channel 549.2 with the bottom 203 of the housing or a top transverse gas channel 549.1 with the top 202 of the housing. Each of the top transverse gas channel 549.1 and the bottom transverse gas channel 549.2 is connected with at least one vertical gas channel 548 to form a gas channel 550 for exhaust gas flow. As an example, the top lateral gas channels 549.1 and the bottom lateral gas channels 549.2 are alternately arranged in the arrangement direction of the cooling plates 315, 317 to form a curved gas channel 550 as shown in Figure 5. The exhaust gas inlet 211.1 is connected to the rightmost vertical gas channel 548, and the lower opening 431 of the partition plate is connected to the leftmost vertical gas channel 548, so that exhaust gas can flow into the gas channel 550 from the rightmost vertical gas channel 548. , and flows out of the gas channel 550 from the leftmost vertical gas channel 548. In other embodiments, the top transverse gas channel, the bottom transverse channel and the vertical gas channel can also be arranged in other arrangements to form other gas channels, as long as the exhaust gas can flow in the gas channel and flow through each cooling block Just use the board.

作為本領域技藝人士應當知曉的是,在本實施例中,為了形成彎曲的氣體通道550,每個冷卻板315,317只形成底部橫向氣體通道549.2或者頂部橫向氣體通道549.1中的一個。當冷卻板315,317與殼體底部203之間形成底部橫向氣體通道549.2時,冷卻板315,317需要與殼體頂部202抵接或以其他方式擋住二者之間的間隙,使得流體不能夠從冷卻板315,317與殼體頂部202之間流過。同樣的,當冷卻板與殼體頂部202之間形成頂部橫向氣體通道549.2時,冷卻板315,317需要與殼體底部203抵接或以其他方式擋住二者之間的間隙,使得流體不能夠從冷卻板315,317與殼體底部203之間流過。As those skilled in the art should know, in this embodiment, in order to form the curved gas channel 550, each cooling plate 315, 317 only forms one of the bottom lateral gas channel 549.2 or the top lateral gas channel 549.1. When the bottom transverse gas channel 549.2 is formed between the cooling plates 315, 317 and the casing bottom 203, the cooling plates 315, 317 need to abut the casing top 202 or block the gap between them in other ways, so that the fluid cannot flow from the cooling plates 315, 317 and the top 202 of the housing. Similarly, when the top transverse gas channel 549.2 is formed between the cooling plate and the top of the housing 202, the cooling plates 315, 317 need to abut the bottom of the housing 203 or otherwise block the gap between the two, so that the fluid cannot be cooled from the cooling plate. Between the plates 315, 317 and the bottom 203 of the housing.

在圖5所示的實施例中,有三個冷卻板315,317與殼體頂部202之間形成頂部橫向氣體通道549.1。在這三個冷卻板315,317與殼體底部203靠近的位置處分別設有一組連接在殼體底部203上的密封板554。每組密封板554包括兩個密封板554,它們分別抵靠在相應的冷卻板315,317下部的左右兩側,以擋住冷卻板315,317與殼體底部203之間的間隙,使得流體不能夠從冷卻板315,317與殼體底部203之間流過。通過設置密封板554,即使當殼體底部203為圖4所示的傾斜形狀,也能夠阻擋流體從冷卻板315,317與殼體底部203之間流過。當然,本領域技藝人士也可以不設置密封板554,而直接設計冷卻板的形狀,使得冷卻板與殼體底部203的形狀配合。In the embodiment shown in Figure 5, there are three cooling plates 315, 317 forming a top transverse gas channel 549.1 between the top 202 of the housing. A set of sealing plates 554 connected to the bottom 203 of the housing are respectively provided at positions where the three cooling plates 315 and 317 are close to the bottom 203 of the housing. Each set of sealing plates 554 includes two sealing plates 554 which are respectively pressed against the left and right sides of the lower part of the corresponding cooling plates 315 and 317 to block the gap between the cooling plates 315 and 317 and the bottom of the housing 203 so that fluid cannot flow from the cooling plates. 315, 317 and the bottom 203 of the housing. By providing the sealing plate 554 , even when the casing bottom 203 has an inclined shape as shown in FIG. 4 , fluid can be blocked from flowing between the cooling plates 315 and 317 and the casing bottom 203 . Of course, those skilled in the art can also directly design the shape of the cooling plate without providing the sealing plate 554 so that the cooling plate matches the shape of the bottom 203 of the housing.

如圖5所示,溫度檢測器213.3用於檢測第一級冷卻裝置310的氣體入口處的氣體溫度,溫度檢測器213.4用於檢測第一級冷卻裝置310的氣體出口處的氣體溫度,溫度檢測器213.5用於檢測第二級冷卻裝置320的氣體出口處的氣體溫度,溫度檢測器213.6用於檢測過濾裝置中的氣體溫度。這些溫度檢測器能夠即時檢測廢氣淨化裝置200中的氣體溫度,並根據該溫度情況調節冷卻媒體的流量。當檢測的氣體溫度過高,或者調節冷卻媒體的流量對氣體溫度影響不太明顯時,可能需要對廢氣淨化裝置200進行自清潔。As shown in Figure 5, the temperature detector 213.3 is used to detect the gas temperature at the gas inlet of the first-stage cooling device 310, and the temperature detector 213.4 is used to detect the gas temperature at the gas outlet of the first-stage cooling device 310. Temperature detection The detector 213.5 is used to detect the gas temperature at the gas outlet of the second-stage cooling device 320, and the temperature detector 213.6 is used to detect the gas temperature in the filtering device. These temperature detectors can instantly detect the gas temperature in the exhaust gas purification device 200 and adjust the flow rate of the cooling medium according to the temperature condition. When the detected gas temperature is too high, or the effect of adjusting the flow rate of the cooling medium on the gas temperature is not obvious, the exhaust gas purification device 200 may need to be self-cleaned.

過濾部件336設置在過濾容腔342的中部,將過濾容腔342分為上下兩個子容腔,其中下部的子容腔與分隔板的下部開口431連通,風機224的葉輪580設置在上部的子容腔中,以使得風機224的葉輪580的進風側582與上部的子容腔流體連通。風機224的葉輪580的出風側584與淨氣出口231.2以及分隔板的上部開口432流體連通。葉輪580轉動時,能夠使得氣體在冷卻容腔341以及過濾容腔342內沿圖5所示的箭頭方向流動。作為一個示例,過濾部件336為鋼珠過濾網,一方面有利於導熱,另一方面可以清洗以重複使用、節省成本。The filter component 336 is disposed in the middle of the filter chamber 342, dividing the filter chamber 342 into two upper and lower sub-cavities, where the lower sub-cavity is connected to the lower opening 431 of the partition plate, and the impeller 580 of the fan 224 is disposed in the upper part. in the sub-cavity, so that the air inlet side 582 of the impeller 580 of the fan 224 is in fluid communication with the upper sub-cavity. The air outlet side 584 of the impeller 580 of the fan 224 is in fluid communication with the clean air outlet 231.2 and the upper opening 432 of the partition plate. When the impeller 580 rotates, the gas can flow in the cooling chamber 341 and the filter chamber 342 in the direction of the arrow shown in FIG. 5 . As an example, the filter component 336 is a steel ball filter, which is beneficial to heat conduction and can be cleaned for reuse to save costs.

需要說明的是,在冷卻容腔保持一定尺寸的情況下,第一級冷卻裝置310的冷卻板315的橫向寬度在容納足夠的冷卻媒體的情況下,應盡可能小,以使得廢氣流經第一級冷卻裝置310時被凝結成液體的松香能夠較少的積累在冷卻板315的頂部。因此,第一級冷卻裝置310中包括橫向寬度較小,但是數量較多的冷卻板315,而第二級冷卻裝置320中包括橫向寬度較大,但是數量較少的冷卻板317。在圖5所示的實施例中,第一級冷卻裝置310的冷卻板315的橫向寬度為的第二級冷卻裝置320的冷卻板317的橫向寬度的三分之一。在其他的實施例中,也可以設置其他數量的冷卻板315,317,冷卻板315和317的橫向寬度也可以是其他的比例,只要能夠確保冷卻板315,317內容納冷卻媒體足以將廢氣冷卻至所需的溫度即可。 It should be noted that when the cooling cavity maintains a certain size, the lateral width of the cooling plate 315 of the first-stage cooling device 310 should be as small as possible while accommodating enough cooling media, so that the exhaust gas flows through the first-stage cooling device 310 . The rosin condensed into liquid during the primary cooling device 310 can be less accumulated on the top of the cooling plate 315 . Therefore, the first-stage cooling device 310 includes cooling plates 315 with a smaller transverse width but a larger number, while the second-stage cooling device 320 includes cooling plates 317 with a larger transverse width but a smaller number. In the embodiment shown in FIG. 5 , the lateral width of the cooling plate 315 of the first-stage cooling device 310 is one third of the lateral width of the cooling plate 317 of the second-stage cooling device 320 . In other embodiments, other numbers of cooling plates 315 and 317 can also be provided, and the lateral widths of the cooling plates 315 and 317 can also be in other proportions, as long as it is ensured that the cooling media contained in the cooling plates 315 and 317 is sufficient to cool the exhaust gas. to the desired temperature.

圖6為圖5中的廢氣淨化裝置200內的冷卻裝置的立體結構示意圖,用於示出冷卻板、分隔板437和圍板327的具體結構和位置關係,以說明自清潔氣體循環程序的流動路徑。為了顯示冷卻板315,317的內部結構,在圖6中去掉了冷卻板315,317的端板(即在圖3中示出的設有冷卻媒體入口和出口的端板)。如圖6所示,廢氣淨化裝置200內的分隔板437、冷卻板315和冷卻板317大致上平行地豎向放置,並且相互間隔以形成如前述的氣體通道550。 Figure 6 is a schematic three-dimensional structural diagram of the cooling device in the exhaust gas purification device 200 in Figure 5. It is used to show the specific structure and positional relationship of the cooling plate, the partition plate 437 and the enclosure plate 327 to illustrate the self-cleaning gas circulation program. flow path. In order to show the internal structure of the cooling plates 315, 317, the end plates of the cooling plates 315, 317 (ie, the end plates with the cooling medium inlet and outlet shown in FIG. 3) are removed in FIG. 6. As shown in FIG. 6 , the partition plate 437 , the cooling plate 315 and the cooling plate 317 in the exhaust gas purification device 200 are vertically placed substantially parallel and spaced apart from each other to form the gas passage 550 as mentioned above.

其中圍板327設置在冷卻板315和冷卻板317的後側以及上方,沿左右方向延伸。作為一種設置方式的示例,一部分冷卻板,例如與殼體底部203之間形成底部橫向氣體通道549.2的那部分冷卻板,其頂部後側設置臺階形狀的支承部。該臺階形狀的支承部用於容納L形狀的圍板327。該設置方式可以使得廢氣淨化裝置200的結構更加緊湊。本領域技藝人士應當知曉的是,圍板327也可以不為L形形狀或者冷卻板上不設置支承部等,只需保證冷卻板、圍板327以及殼體能夠按照需要的那樣密封以形成氣體通道550即可。The enclosure 327 is provided on the rear side and above the cooling plate 315 and the cooling plate 317, and extends in the left-right direction. As an example of an arrangement, a part of the cooling plate, such as the part of the cooling plate that forms the bottom transverse gas channel 549.2 between the bottom of the housing 203 and the bottom part of the cooling plate 203, has a step-shaped support portion on the rear side of the top. This step-shaped support portion is used to accommodate the L-shaped enclosure 327 . This arrangement can make the structure of the exhaust gas purification device 200 more compact. Those skilled in the art should know that the enclosure 327 does not need to be L-shaped or the cooling plate is not provided with a support, etc., as long as the cooling plate, enclosure 327 and shell can be sealed as required to form a gas Channel 550 is sufficient.

通過上述設置,圍板327能夠和殼體201形成連接通道635,連接通道635的兩端具有自清潔氣體出口634和自清潔氣體入口614,其中自清潔氣體出口634與分隔板437的上部開口432連通,自清潔氣體入口614與在第一級冷卻裝置310處與冷卻容腔341流體連通。作為一個示例,自清潔氣體入口614位於廢氣入口211.1附近。Through the above arrangement, the enclosure 327 can form a connecting channel 635 with the housing 201. Both ends of the connecting channel 635 have a self-cleaning gas outlet 634 and a self-cleaning gas inlet 614, where the self-cleaning gas outlet 634 is connected to the upper opening of the partition plate 437. 432 is connected, the self-cleaning gas inlet 614 is in fluid communication with the cooling chamber 341 at the first-stage cooling device 310 . As an example, self-cleaning gas inlet 614 is located near exhaust gas inlet 211.1.

作為一個示例,分隔板437的上部開口432的大小可以調節,從而使過濾容腔342中的氣體能夠可控地流入連接通道635。在本案的實施例中,在分隔板437上可活動地連接有可調節擋板638,可調節擋板638能夠前後移動,以覆蓋上部開口432或者打開上部開口432,也可以調節上部開口432的開口大小。可調節擋板638上設有導向槽661,分隔板437上設置有導向銷662插入導向槽661中,實現可調節擋板638與分隔板437之間的可活動的連接。As an example, the size of the upper opening 432 of the partition plate 437 can be adjusted, so that the gas in the filter chamber 342 can controllably flow into the connecting channel 635. In the embodiment of this case, an adjustable baffle 638 is movably connected to the partition plate 437. The adjustable baffle 638 can move forward and backward to cover the upper opening 432 or open the upper opening 432. The upper opening 432 can also be adjusted. the size of the opening. The adjustable baffle 638 is provided with a guide groove 661, and the partition plate 437 is provided with a guide pin 662 inserted into the guide groove 661 to achieve a movable connection between the adjustable baffle 638 and the partition plate 437.

由此,在廢氣淨化裝置200處於維護狀態時,過濾容腔342中氣體能夠經過上部開口432流入連接通道635,並經過連接通道635流至第一級冷卻裝置310處。Therefore, when the exhaust gas purification device 200 is in the maintenance state, the gas in the filter chamber 342 can flow into the connecting channel 635 through the upper opening 432, and flow to the first-stage cooling device 310 through the connecting channel 635.

仍然如圖6所示,冷卻板315內部的空腔546.1中包括均流板656.1,同樣的,冷卻板317內部的空腔546.2中包括均流板656.2,每個均流板上設有若干通孔。作為一個示例,均流板656.1上均勻設置若干圓形孔658.1,均流板656.2上設有若干長條形孔658.2。均流板656.1和656.2分別設置在空腔546.1和546.2中的冷卻媒體的流動路徑上,以使得冷卻媒體能夠穿過通孔,並且均勻穩定地流動。對於冷卻板317,空氣從冷卻媒體入口357流入冷卻板的空腔546.2中,由下至上的穿過均流板656.2,然後從冷卻媒體出口367流出,通過冷卻板317的側壁與廢氣進行熱交換。對於冷卻板315,壓縮氣體從冷卻媒體入口355流入冷卻板315的空腔546.1中,由下至上的穿過均流板656.1,然後從冷卻媒體出口365流出,通過冷卻板315的側壁與廢氣進行熱交換。As still shown in Figure 6, the cavity 546.1 inside the cooling plate 315 includes a flow equalizing plate 656.1. Similarly, the cavity 546.2 inside the cooling plate 317 includes a flow equalizing plate 656.2. Each flow equalizing plate is provided with a plurality of flow plates. hole. As an example, the flow equalizing plate 656.1 is provided with a plurality of circular holes 658.1 evenly, and the flow equalizing plate 656.2 is provided with a plurality of elongated holes 658.2. The flow equalizing plates 656.1 and 656.2 are respectively provided on the flow path of the cooling medium in the cavities 546.1 and 546.2, so that the cooling medium can pass through the through holes and flow evenly and stably. For the cooling plate 317, the air flows from the cooling medium inlet 357 into the cavity 546.2 of the cooling plate, passes through the flow equalizing plate 656.2 from bottom to top, and then flows out from the cooling medium outlet 367, and exchanges heat with the exhaust gas through the side wall of the cooling plate 317. . For the cooling plate 315, the compressed gas flows from the cooling medium inlet 355 into the cavity 546.1 of the cooling plate 315, passes through the flow equalizing plate 656.1 from bottom to top, then flows out from the cooling medium outlet 365, and interacts with the exhaust gas through the side wall of the cooling plate 315. heat exchange.

廢氣在廢氣淨化裝置200中大致的淨化程序如下:包含有污染物的廢氣(溫度大致為170℃)從回流焊爐爐膛的高溫區排出後,從廢氣入口211.1進入氣體通道550中。廢氣在流經第一級冷卻裝置310中的冷卻板315時,通過調節壓縮空氣流入和流出冷卻板315的流量,使得廢氣被冷卻至大約為110~130℃(第一級冷卻裝置310出口處的氣體溫度,由溫度檢測裝置213.4測得),在此溫度下,廢氣中的松香及其他助焊劑等有機物從氣態凝結為液態,並能夠被排至收集瓶240.2中。剩餘部分的廢氣流經第二級冷卻裝置320中的冷卻板317,通過調節空氣流入和流出冷卻板317的流量,使得剩餘部分的廢氣被冷卻至大約為60~80℃(第二級冷卻裝置320出口處的氣體溫度,由溫度檢測裝置213.5測得),在此溫度下,廢氣中的其他污染物有機物,例如低凝點的酸類或酯類或醚類有機物,從氣態凝結為液態,並能夠被排至收集瓶240.2中。剩餘部分的廢氣經過分隔板437的下部開口431流入過濾容腔342中,然後由下至上地流經過濾部件336,被過濾部件336過濾以除去其中的顆粒狀以及霧狀的有機物,以得到清潔的淨氣。最後,大部分清潔的淨氣從淨氣出口231.2排出至回流焊爐爐膛的低溫區,完成對廢氣的淨化程序,小部分的淨氣能夠經過上部開口432和連接通道635流回至第一級冷卻裝置310中與廢氣混合並且降低廢氣的溫度。調節上部開口431的開口大小可以改變經過上部開口432和連接通道635流回至第一級冷卻裝置310中的淨氣的量。當然,也可以完全關閉上部開口431,阻止淨氣能夠經過上部開口432和連接通道635流回至第一級冷卻裝置310中。The general purification process of waste gas in the waste gas purification device 200 is as follows: after the waste gas containing pollutants (temperature is approximately 170°C) is discharged from the high temperature area of the reflow furnace furnace, it enters the gas channel 550 from the waste gas inlet 211.1. When the exhaust gas flows through the cooling plate 315 in the first-stage cooling device 310, the exhaust gas is cooled to approximately 110~130°C (at the outlet of the first-stage cooling device 310) by adjusting the flow of compressed air into and out of the cooling plate 315. gas temperature, measured by the temperature detection device 213.4). At this temperature, organic matter such as rosin and other fluxes in the exhaust gas condenses from gaseous state to liquid state and can be discharged into the collection bottle 240.2. The remaining part of the exhaust gas flows through the cooling plate 317 in the second-stage cooling device 320. By adjusting the flow of air into and out of the cooling plate 317, the remaining part of the exhaust gas is cooled to about 60~80°C (the second-stage cooling device 320 outlet gas temperature, measured by the temperature detection device 213.5), at this temperature, other pollutant organic matter in the exhaust gas, such as acids or esters or ether organic matter with low freezing point, condenses from gaseous state to liquid state, and Can be drained into collection bottle 240.2. The remaining exhaust gas flows into the filter chamber 342 through the lower opening 431 of the partition plate 437, and then flows through the filter component 336 from bottom to top, and is filtered by the filter component 336 to remove particulate and mist organic matter therein to obtain Clean air. Finally, most of the clean gas is discharged from the clean gas outlet 231.2 to the low temperature area of the reflow oven furnace to complete the purification process of the waste gas. A small part of the clean gas can flow back to the first stage through the upper opening 432 and the connecting channel 635 It is mixed with the exhaust gas in the cooling device 310 and reduces the temperature of the exhaust gas. Adjusting the opening size of the upper opening 431 can change the amount of clean air flowing back to the first-stage cooling device 310 through the upper opening 432 and the connecting channel 635 . Of course, the upper opening 431 can also be completely closed to prevent the clean air from flowing back to the first-stage cooling device 310 through the upper opening 432 and the connecting channel 635 .

廢氣淨化裝置200的自清潔程序如下:通過閥部件217.1和217.2關閉廢氣入口211.1和淨氣出口231.2,利用加熱器222對過濾容腔342中的氣體進行加熱,直至過濾容腔342內的溫度上升至約150℃~170℃(由溫度檢測裝置213.6測得),以使得附著在過濾部件336上的固體污染物一部分轉化為液態,一部分轉化為氣態,其中液態污染物流至殼體底部203。高溫氣態污染物在風機224的作用下,由下至上地流至分隔板的上部開口432,然後流經連接通道635後被輸送回第一級冷卻裝置310和第二級冷卻裝置320,並使廢氣淨化裝置200中的殼體內壁、冷卻裝置外壁、圍板327以及過濾部件336等各部件表面附著的固體形態的污染物重新被加熱為液態,以得到清潔。其中殼體底部203的液體污染物被收集裝置240.1和240.2收集。The self-cleaning procedure of the exhaust gas purification device 200 is as follows: close the exhaust gas inlet 211.1 and the clean gas outlet 231.2 through the valve components 217.1 and 217.2, and use the heater 222 to heat the gas in the filter chamber 342 until the temperature in the filter chamber 342 rises. to about 150°C ~ 170°C (measured by the temperature detection device 213.6), so that part of the solid contaminants attached to the filter component 336 is converted into a liquid state, and part is converted into a gaseous state, where the liquid contaminants flow to the bottom 203 of the housing. The high-temperature gaseous pollutants flow from bottom to top to the upper opening 432 of the partition plate under the action of the fan 224, and then flow through the connecting channel 635 and are transported back to the first-stage cooling device 310 and the second-stage cooling device 320, and The solid form of pollutants attached to the surfaces of components such as the inner wall of the casing, the outer wall of the cooling device, the enclosure 327 and the filter component 336 in the exhaust gas purification device 200 are reheated into a liquid state to be cleaned. The liquid contaminants at the bottom 203 of the housing are collected by collection devices 240.1 and 240.2.

該自清潔程序完成後,通過補氣口212向廢氣淨化裝置200中補充諸如氮氣等工作氣體,並從排氣口232中排出廢氣淨化裝置200中的氣體。檢測廢氣淨化裝置200中的氧氣濃度達到要求後,再將廢氣淨化裝置200與回流焊爐的爐膛連通。After the self-cleaning process is completed, working gas such as nitrogen is replenished into the exhaust gas purification device 200 through the gas replenishment port 212 , and the gas in the exhaust gas purification device 200 is discharged from the exhaust port 232 . After detecting that the oxygen concentration in the exhaust gas purification device 200 reaches the requirement, the exhaust gas purification device 200 is connected to the furnace of the reflow soldering furnace.

圖7A-圖11圖示根據本案的另一種實施例的廢氣淨化裝置700的結構,其中廢氣淨化裝置700與廢氣淨化裝置200的區別主要在於冷卻裝置的具體結構不同。7A to 11 illustrate the structure of an exhaust gas purification device 700 according to another embodiment of the present invention. The difference between the exhaust gas purification device 700 and the exhaust gas purification device 200 mainly lies in the specific structure of the cooling device.

圖7A-圖7C為廢氣淨化裝置700的整體結構示意圖,其中圖7A為廢氣淨化裝置700的立體結構圖,圖7B為圖7A的正視圖,圖7C為圖7A的俯視圖。如圖7A-7C所示,廢氣淨化裝置700包括殼體701,殼體701具有與廢氣淨化裝置200的殼體201相似的結構,包括頂部702、底部703、左部704、右部705、前部706和後部707,在此不重複贅述。7A to 7C are schematic diagrams of the overall structure of the exhaust gas purification device 700, where FIG. 7A is a three-dimensional structural view of the exhaust gas purification device 700, FIG. 7B is a front view of FIG. 7A, and FIG. 7C is a top view of FIG. 7A. As shown in Figures 7A-7C, the exhaust gas purification device 700 includes a casing 701. The casing 701 has a similar structure to the casing 201 of the exhaust gas purification device 200, including a top 702, a bottom 703, a left part 704, a right part 705, and a front part. Part 706 and rear part 707 will not be repeated here.

廢氣淨化裝置700的淨氣出口731.2設置在殼體701的後部707靠左處。與廢氣淨化裝置200的廢氣入口211.1不同的是,廢氣淨化裝置700的廢氣入口711.1設置在殼體701的後部707上,並且廢氣入口711.1設置在殼體701的後部707靠右處。相應的,補氣口712也設置殼體701的頂部702靠後側,廢氣入口711.1的附近。而排氣口732和氧氣濃度檢測裝置955(參見圖9)的位置保持不變。The clean air outlet 731.2 of the exhaust gas purification device 700 is disposed on the left side of the rear portion 707 of the housing 701. Different from the exhaust gas inlet 211.1 of the exhaust gas purification device 200, the exhaust gas inlet 711.1 of the exhaust gas purification device 700 is disposed on the rear portion 707 of the housing 701, and the exhaust gas inlet 711.1 is disposed on the right side of the rear portion 707 of the housing 701. Correspondingly, the air supply port 712 is also located on the rear side of the top 702 of the housing 701, near the exhaust gas inlet 711.1. The positions of the exhaust port 732 and the oxygen concentration detection device 955 (see Figure 9) remain unchanged.

殼體701的前部706包括第一前板706.1和第二前板706.2。其中第二前板706.2上也設有數個開口771,用於將冷卻裝置插入第二冷卻容腔862中。廢氣淨化裝置700還包括連接在殼體底部703收集瓶740.1和740.2,以及連接在殼體頂部702的風機724。The front portion 706 of the housing 701 includes a first front panel 706.1 and a second front panel 706.2. The second front plate 706.2 is also provided with a plurality of openings 771 for inserting the cooling device into the second cooling cavity 862. The exhaust gas purification device 700 also includes collection bottles 740.1 and 740.2 connected to the bottom 703 of the housing, and a fan 724 connected to the top 702 of the housing.

圖8為廢氣淨化裝置700的爆炸結構圖,用於示出廢氣淨化裝置700的內部的冷卻容腔841和過濾容腔842,以說明氣體在廢氣淨化裝置700內的流動方向。如圖8所示,殼體701的內部包括分隔板937(分隔板937的結構與分隔板437相同,具體參見圖9),分隔板937將殼體701內部分隔成冷卻容腔841和過濾容腔842,冷卻容腔841和過濾容腔842通過分隔板937的下部開口931(參見圖9)連通。其中冷卻容腔841包括第一冷卻容腔861和第二冷卻容腔862,第一冷卻容腔861中設有第一級冷卻裝置810,第二冷卻容腔862中設有第二級冷卻裝置820,氣體從廢氣入口711.1進入冷卻容腔841後,從右向左依次流經第一級冷卻裝置810和第二級冷卻裝置820。過濾容腔842中包括過濾部件836,氣體進入過濾容腔842後,由下至上地流經過濾部件836,能夠從淨氣出口731.2流出過濾容腔842。其中第二級冷卻裝置820的結構與廢氣淨化裝置200中的第二級冷卻裝置320的結構相同,在此不再贅述。第二級冷卻裝置820的上部靠後側設有L形的圍板827,與圖2A-6中所示的廢氣淨化裝置200中的圍板327不同的是,圍板827僅設置在第二級冷卻裝置820處。FIG. 8 is an exploded structural view of the exhaust gas purification device 700 , showing the cooling chamber 841 and the filtering chamber 842 inside the exhaust gas purification device 700 to illustrate the flow direction of gas in the exhaust gas purification device 700 . As shown in Figure 8, the interior of the housing 701 includes a partition plate 937 (the structure of the partition plate 937 is the same as the partition plate 437, see Figure 9 for details). The partition plate 937 divides the interior of the housing 701 into cooling chambers. 841 and the filter chamber 842, the cooling chamber 841 and the filter chamber 842 are connected through the lower opening 931 (see Figure 9) of the partition plate 937. The cooling chamber 841 includes a first cooling chamber 861 and a second cooling chamber 862. The first cooling chamber 861 is provided with a first-stage cooling device 810, and the second cooling chamber 862 is provided with a second-stage cooling device. 820. After the gas enters the cooling chamber 841 from the exhaust gas inlet 711.1, it flows through the first-stage cooling device 810 and the second-stage cooling device 820 from right to left. The filter cavity 842 includes a filter component 836. After the gas enters the filter cavity 842, it flows through the filter component 836 from bottom to top, and can flow out of the filter cavity 842 from the clean air outlet 731.2. The structure of the second-stage cooling device 820 is the same as the structure of the second-stage cooling device 320 in the exhaust gas purification device 200, and will not be described again here. An L-shaped enclosure 827 is provided on the rear side of the upper part of the second-stage cooling device 820. Different from the enclosure 327 in the exhaust gas purification device 200 shown in FIG. 2A-6, the enclosure 827 is only provided on the second-stage cooling device 820. stage cooling device 820.

仍然如圖8所示,第一級冷卻裝置810包括冷卻片863和冷卻管865,每個冷卻管865內部可以容納冷卻媒體,冷卻管865中的冷卻媒體通過冷卻片863與廢氣進行熱交換。第二級冷卻裝置820中包括數個冷卻板817,冷卻板817的大小與第二前板706.2上的開口771匹配。其中從殼體的前部可以看到,第一級冷卻裝置810設有冷卻媒體入口855和冷卻媒體出口815,第二級冷卻裝置820上設有冷卻媒體入口857和冷卻媒體出口816。需要注意的是,兩組冷卻媒體入口855和冷卻媒體出口815不為並排佈置,其中一組冷卻媒體入口855和冷卻媒體出口815相距較近,而另一組冷卻媒體入口855和冷卻媒體出口815相距較遠(參見圖7B)。其中在如圖8所示的實施例中,第一級冷卻裝置810的冷卻管865中的冷卻媒體為壓縮氣體,第二級冷卻裝置820的數個冷卻板817中的冷卻媒體為空氣。第一級冷卻裝置810的每個冷卻媒體出口815處也設有消聲器708。As still shown in FIG. 8 , the first-stage cooling device 810 includes cooling fins 863 and cooling tubes 865 . Each cooling tube 865 can accommodate a cooling medium inside. The cooling medium in the cooling tube 865 exchanges heat with the exhaust gas through the cooling fins 863 . The second-stage cooling device 820 includes several cooling plates 817, and the size of the cooling plates 817 matches the openings 771 on the second front plate 706.2. As can be seen from the front of the housing, the first-stage cooling device 810 is provided with a cooling medium inlet 855 and a cooling medium outlet 815, and the second-stage cooling device 820 is provided with a cooling medium inlet 857 and a cooling medium outlet 816. It should be noted that the two sets of cooling media inlets 855 and cooling media outlets 815 are not arranged side by side. One set of cooling media inlets 855 and cooling media outlets 815 are relatively close to each other, while the other set of cooling media inlets 855 and cooling media outlets 815 are relatively close to each other. are far apart (see Figure 7B). In the embodiment shown in FIG. 8 , the cooling medium in the cooling pipe 865 of the first-stage cooling device 810 is compressed gas, and the cooling medium in the cooling plates 817 of the second-stage cooling device 820 is air. A muffler 708 is also provided at each cooling medium outlet 815 of the first-stage cooling device 810 .

圖9為沿圖7B中的A-A線的剖視圖,用於示出分隔板937的具體結構。分隔板937與圖2A-6中所示的廢氣淨化裝置200中分隔板437結構相似,也具有上部開口932和下部開口931。並且圍板827包括橫板925和豎板926,它們與殼體701共同形成連接通道1135(參見圖11)。其中上部開口932也與風機724的葉輪1080的出風側1084(參見圖10)流體連通。FIG. 9 is a cross-sectional view along line A-A in FIG. 7B , showing the specific structure of the partition plate 937 . The partition plate 937 is similar in structure to the partition plate 437 in the exhaust gas purification device 200 shown in FIG. 2A-6 , and also has an upper opening 932 and a lower opening 931 . And the enclosure 827 includes a horizontal plate 925 and a vertical plate 926, which together with the housing 701 form a connection channel 1135 (see Figure 11). The upper opening 932 is also in fluid communication with the air outlet side 1084 (see Figure 10) of the impeller 1080 of the fan 724.

圖10A和圖10B用於示出第一級冷卻裝置810、第二級冷卻裝置820以及過濾部件836的具體結構,以說明廢氣淨化程序中氣體的流動路徑。其中圖10A為沿圖7C中的B-B線的剖視圖,圖10B為沿圖10A中的C-C線的剖視圖,並且為了更清楚的顯示第一冷卻裝置810的具體結構,在圖10B中僅圖示第一冷卻裝置810,去掉了其他的部件。10A and 10B are used to show the specific structures of the first-stage cooling device 810, the second-stage cooling device 820 and the filter component 836 to illustrate the flow path of the gas in the exhaust gas purification process. FIG. 10A is a cross-sectional view along line B-B in FIG. 7C , and FIG. 10B is a cross-sectional view along line C-C in FIG. 10A . In order to more clearly display the specific structure of the first cooling device 810 , only the first cooling device 810 is illustrated in FIG. 10B . A cooling device 810 with other components removed.

如圖10A和圖10B所示,第一級冷卻裝置810包括四層冷卻片863和四層冷卻管865,四層冷卻管865中容納有冷卻媒體。其中冷卻管865與冷卻片863連接在一起,通過冷卻片863與廢氣進行熱交換,使廢氣溫度降低。As shown in FIGS. 10A and 10B , the first-stage cooling device 810 includes four layers of cooling fins 863 and four layers of cooling tubes 865 , and the four layers of cooling tubes 865 contain cooling media. The cooling pipe 865 is connected to the cooling fin 863, and the cooling fin 863 performs heat exchange with the exhaust gas to reduce the temperature of the exhaust gas.

其中四層冷卻片863沿縱向排列(即在上下方向上排列),每層冷卻片863橫向放置(即沿左右方向放置),相鄰的兩層冷卻片863之間具有一定的間距。冷卻管865具有空腔1046.1。冷卻片863為可導熱的材料製成,例如金屬製成,以使得第一冷卻容腔861中的廢氣能夠通過冷卻片863的傳熱,與冷卻管865的空腔1046.1中的冷卻媒體進行熱交換。Four layers of cooling fins 863 are arranged longitudinally (that is, arranged in the up and down direction), each layer of cooling fins 863 is placed transversely (that is, placed in the left and right direction), and there is a certain distance between two adjacent layers of cooling fins 863 . Cooling tube 865 has cavity 1046.1. The cooling fin 863 is made of a thermally conductive material, such as metal, so that the exhaust gas in the first cooling cavity 861 can heat transfer with the cooling medium in the cavity 1046.1 of the cooling tube 865 through the heat transfer of the cooling fin 863 Exchange.

每層冷卻片863大致為U形形狀,其具有通槽1064和側槽1072(也可參見圖11),其中通槽1064設置在冷卻片863的底部1066,並且沿左右方向延伸。廢氣穿過冷卻片863底部的通槽1064,由上至下形成縱向氣體流1068。需要說明的是,由於廢氣入口711.1設置在殼體後側,因此廢氣在流動的程序中,除了由上至下流動的以外,也會從後向前流動。側槽1072設置在冷卻片863的兩個側壁1067上,通槽1064的兩端分別與一對側槽1072連通。冷卻管865穿過一對側槽1072以支撐冷卻片863,使得冷卻片863可拆卸地與冷卻管865連接。Each layer of cooling fins 863 is generally U-shaped and has a through groove 1064 and a side groove 1072 (see also FIG. 11 ), where the through groove 1064 is provided at the bottom 1066 of the cooling fin 863 and extends in the left-right direction. The exhaust gas passes through the slot 1064 at the bottom of the cooling fin 863 to form a longitudinal gas flow 1068 from top to bottom. It should be noted that since the exhaust gas inlet 711.1 is provided on the rear side of the housing, the exhaust gas will flow from back to front in addition to flowing from top to bottom. The side grooves 1072 are provided on the two side walls 1067 of the cooling fin 863, and the two ends of the through groove 1064 are respectively connected with a pair of side grooves 1072. The cooling tube 865 passes through a pair of side grooves 1072 to support the cooling fins 863 so that the cooling fins 863 are detachably connected to the cooling tube 865.

每層冷卻片上設有數個通槽1064,至少一部分相鄰的兩層冷卻片863中的通槽1064錯開佈置,以使得廢氣不是從上至下沿直線穿過各層冷卻片863,而是沿彎曲的路徑穿過各層冷卻片,從而能夠更好的與冷卻管865和冷卻片863進行熱交換。在如圖10A和10B所示出的示例中,第一層和第二層冷卻片863的通槽1064錯開佈置,並且第三層和第四層冷卻片863的通槽1064錯開佈置。Each layer of cooling fins is provided with several through-slots 1064 , and at least part of the through-slots 1064 in two adjacent layers of cooling fins 863 are staggered, so that the exhaust gas does not pass through each layer of cooling fins 863 in a straight line from top to bottom, but along a curved path. The paths pass through each layer of cooling fins, thereby enabling better heat exchange with the cooling tubes 865 and cooling fins 863 . In the example shown in FIGS. 10A and 10B , the through grooves 1064 of the first and second layers of cooling fins 863 are staggered, and the through grooves 1064 of the third and fourth layers of cooling fins 863 are staggered.

冷卻管865和側槽1072的個數與數個通槽1064相應地設置。並且每一層的冷卻管865與殼體701上的冷卻媒體入口855和冷卻媒體出口815連通,以使得作為冷卻媒體的壓縮空氣能夠流入冷卻管865中,並從冷卻管865中流出。作為一個示例,每一層的冷卻管865通過輸入總管1081及/或輸出總管1085(也可參見圖11)匯合在一起後,再將輸入總管1081和輸出總管1085與殼體701上的冷卻媒體入口855和冷卻媒體出口815連接。輸入總管1081和輸出總管1085為沿前後方向延伸的管,其一端封閉,另一端與冷卻媒體入口855或冷卻媒體出口815連接。The number of cooling pipes 865 and side grooves 1072 is provided corresponding to the number of through grooves 1064 . And the cooling pipes 865 of each layer are connected with the cooling medium inlet 855 and the cooling medium outlet 815 on the housing 701, so that the compressed air as the cooling medium can flow into the cooling pipes 865 and flow out from the cooling pipes 865. As an example, after the cooling pipes 865 of each layer are merged together through the input main pipe 1081 and/or the output main pipe 1085 (see also FIG. 11 ), the input main pipe 1081 and the output main pipe 1085 are connected to the cooling medium inlet on the shell 701 855 and cooling media outlet 815 are connected. The input main pipe 1081 and the output main pipe 1085 are pipes extending in the front-rear direction, one end of which is closed, and the other end is connected to the cooling medium inlet 855 or the cooling medium outlet 815.

作為一個示例,第一層和第四層的相應的冷卻管連接在一起,形成右側開口的U形冷卻管,其中第一層的U形冷卻管管口與輸出總管1085連接,第四層的U形冷卻管管口與輸入總管1081連接。相似的,第二層和第三層的冷卻管連接在一起,形成左側開口的U形冷卻管,其中第二層的U形冷卻管管口與輸出總管1085連接,第三層的U形冷卻管管口與輸入總管1081連接。由此,在殼體701上設置僅設置兩組冷卻媒體入口855和冷卻媒體出口815即可。在其它實施例中,也可以在每層的冷卻管兩端各自設置單獨的輸入總管和輸出總管以連接到殼體701,此時需要在殼體上設置四組冷卻媒體入口和冷卻媒體出口。As an example, the corresponding cooling pipes of the first and fourth layers are connected together to form a U-shaped cooling pipe with an opening on the right side, in which the U-shaped cooling pipe nozzle of the first layer is connected to the output main pipe 1085, and the U-shaped cooling pipe of the fourth layer is connected to the output main pipe 1085. The U-shaped cooling pipe nozzle is connected to the input main pipe 1081. Similarly, the cooling pipes on the second and third floors are connected together to form a U-shaped cooling pipe with an opening on the left. The U-shaped cooling pipe on the second floor is connected to the output main pipe 1085, and the U-shaped cooling pipe on the third floor is connected to the output main pipe 1085. The pipe mouth is connected to the input main pipe 1081. Therefore, it is sufficient to provide only two sets of cooling medium inlet 855 and cooling medium outlet 815 on the housing 701 . In other embodiments, separate input manifolds and output manifolds may be provided at both ends of the cooling pipes of each layer to connect to the shell 701. In this case, four sets of cooling medium inlets and cooling media outlets need to be provided on the shell.

在本案如圖所示的示例中,第一層和第四層冷卻管865中包括六根冷卻管,而第二層和第三層中包括五根冷卻管。In the example shown in the figure, the first and fourth layers of cooling tubes 865 include six cooling tubes, while the second and third layers include five cooling tubes.

由此,冷卻管865能夠通過冷卻片863擴大與縱向氣體流1068進行熱交換的面積,使得廢氣形成的縱向氣體流1068的溫度降低,廢氣中的一部分污染物能夠冷凝成液體並經過通槽1064上至下地流動至殼體底部703。Therefore, the cooling pipe 865 can expand the area for heat exchange with the longitudinal gas flow 1068 through the cooling fins 863, so that the temperature of the longitudinal gas flow 1068 formed by the exhaust gas is reduced, and part of the pollutants in the exhaust gas can be condensed into liquid and passed through the channel 1064. Flows from top to bottom to the bottom 703 of the housing.

第二級冷卻裝置820包括兩塊冷卻板817,每塊冷卻板817與圖5中的冷卻板317具有相同的結構,以形成豎向氣體通道1048。冷卻板817具有用於容納冷卻媒體(例如空氣)的空腔1046.2,空腔1046.2與殼體701上的空氣入口716.1和空氣出口716.2連通,使得空氣作為冷卻媒體能夠流入和流出冷卻板817。其中右側的冷卻板817與殼體底部703之間形成底部橫向氣體通道1049.2,左側的冷卻板817與殼體頂部702之間形成頂部橫向氣體通道1049.1。頂部橫向氣體通道1049.1和底部橫向氣體通道1049.2與豎向氣體通道1048流體連通,以形成彎曲的氣體冷卻通道1050。並且底部橫向氣體通道1049.2與第一級冷卻裝置810連通,以使得第一冷卻容腔861中的縱向氣體流1068從上之下地經過第一級冷卻裝置810後,能夠進入氣體冷卻通道1050中。The second-stage cooling device 820 includes two cooling plates 817. Each cooling plate 817 has the same structure as the cooling plate 317 in FIG. 5 to form a vertical gas channel 1048. The cooling plate 817 has a cavity 1046.2 for accommodating a cooling medium (such as air). The cavity 1046.2 is connected with the air inlet 716.1 and the air outlet 716.2 on the housing 701 so that air can flow into and out of the cooling plate 817 as the cooling medium. The bottom lateral gas channel 1049.2 is formed between the cooling plate 817 on the right side and the bottom 703 of the casing, and the top lateral gas channel 1049.1 is formed between the cooling plate 817 on the left side and the top 702 of the casing. The top lateral gas channel 1049.1 and the bottom lateral gas channel 1049.2 are in fluid communication with the vertical gas channel 1048 to form a curved gas cooling channel 1050. And the bottom transverse gas channel 1049.2 is connected with the first-stage cooling device 810, so that the longitudinal gas flow 1068 in the first cooling chamber 861 can enter the gas cooling channel 1050 after passing through the first-stage cooling device 810 from top to bottom.

回到圖10A中,同樣的,過濾部件836設置在過濾容腔842中部,將過濾容腔842分為上下兩個子容腔,其中下部的子容腔與分隔板下部開口931連通,上部的子容腔與淨氣出口731.2以及分隔板上部開口932連通。風機724的葉輪1080設置在上部的子容腔中,以使得風機724的葉輪1080的進風側1082與上部的子容腔流體連通。風機724的葉輪1080的出風側1084與淨氣出口731.2以及分隔板的上部開口932流體連通。葉輪1080轉動時,能夠使得氣體在冷卻容腔841以及過濾容腔842內沿圖10A所示的箭頭方向流動。作為一個示例,過濾部件836也為鋼珠過濾網。Returning to Figure 10A, similarly, the filter component 836 is disposed in the middle of the filter chamber 842, dividing the filter chamber 842 into two upper and lower sub-cavities, where the lower sub-cavity is connected to the lower opening 931 of the partition plate, and the upper part is connected to the lower opening 931 of the partition plate. The sub-cavity is connected with the clean air outlet 731.2 and the upper opening 932 of the partition plate. The impeller 1080 of the fan 724 is disposed in the upper sub-chamber, so that the air inlet side 1082 of the impeller 1080 of the fan 724 is in fluid communication with the upper sub-chamber. The air outlet side 1084 of the impeller 1080 of the fan 724 is in fluid communication with the clean air outlet 731.2 and the upper opening 932 of the partition plate. When the impeller 1080 rotates, the gas can flow in the cooling chamber 841 and the filter chamber 842 in the direction of the arrow shown in FIG. 10A . As an example, the filter component 836 is also a steel ball filter.

需要說明的是,本實施例中的第一級冷卻裝置810也可以為本領域技藝人士所知的任何翅片式換熱器成品件,以節省成本。It should be noted that the first-stage cooling device 810 in this embodiment can also be any finished fin heat exchanger known to those skilled in the art to save costs.

圖11為本案廢氣淨化裝置700內的冷卻裝置的立體結構示意圖,用於示出第一級冷卻裝置810、第二級冷卻裝置820、分隔板937和圍板827的具體結構和位置關係。與廢氣淨化裝置200相似的是,第二級冷卻裝置820中的右側的冷卻板817的頂部後側設置用於容納圍板827的臺階形狀的卡槽。其中圍板827能夠和殼體701形成連接通道1135,連接通道1135具有自清潔氣體出口1134和自清潔氣體入口1114,其中自清潔氣體出口1134與分隔板937的上部開口932連通,自清潔氣體入口1114與廢氣入口711.1連通。在本實施例中,由於廢氣入口711.1的位置與第二級冷卻裝置820相距較近,圍板827僅需設置在第二級冷卻裝置820後側即可使得,連接通道1135的自清潔氣體入口1114與廢氣入口711.1連通。Figure 11 is a schematic three-dimensional structural diagram of the cooling device in the exhaust gas purification device 700 of this case, which is used to show the specific structure and positional relationship of the first-stage cooling device 810, the second-stage cooling device 820, the partition plate 937 and the enclosure plate 827. Similar to the exhaust gas purification device 200 , a step-shaped slot for accommodating the enclosure plate 827 is provided on the top rear side of the right cooling plate 817 in the second-stage cooling device 820 . The enclosure 827 can form a connecting channel 1135 with the housing 701. The connecting channel 1135 has a self-cleaning gas outlet 1134 and a self-cleaning gas inlet 1114. The self-cleaning gas outlet 1134 is connected to the upper opening 932 of the partition plate 937. The self-cleaning gas Inlet 1114 communicates with exhaust gas inlet 711.1. In this embodiment, since the position of the exhaust gas inlet 711.1 is relatively close to the second-stage cooling device 820, the enclosure 827 only needs to be disposed behind the second-stage cooling device 820 so that the self-cleaning gas inlet of the connecting channel 1135 can be 1114 is connected to the exhaust gas inlet 711.1.

同樣的,分隔板937上也連接有可調節擋板1138,以調節上部開口932的開口大小。這樣設置能夠使過濾容腔342上部的子容腔中的一部分氣體從淨氣出口731.2處排至回流焊爐中,另一部分氣體經過上部開口932流入連接通道1135,並經過連接通道1135流至廢氣入口711.1附近。Similarly, an adjustable baffle 1138 is also connected to the partition plate 937 to adjust the opening size of the upper opening 932 . This arrangement enables a part of the gas in the upper sub-cavity of the filter chamber 342 to be discharged into the reflow oven from the clean gas outlet 731.2, and the other part of the gas flows into the connecting channel 1135 through the upper opening 932, and flows to the exhaust gas through the connecting channel 1135. Near entrance 711.1.

冷卻板817內部的空腔1046.2中包括均流板1156,每個均流板上設有若干長條形孔1158。The cavity 1046.2 inside the cooling plate 817 includes a flow equalizing plate 1156, and each flow equalizing plate is provided with a plurality of elongated holes 1158.

廢氣在廢氣淨化裝置700中大致的淨化程序如下:包含有污染物的廢氣(溫度大致為170℃)從回流焊爐爐膛的高溫區排出後,從廢氣入口711.1進入第一冷卻容腔861中。廢氣先從上至下並且從後向前的流經第一級冷卻裝置810,通過調節壓縮空氣流入和流出冷卻管865的速度,使得廢氣被冷卻至出口處的氣體溫度大約為110~130℃,在此溫度下,廢氣中的松香等有機物從氣態凝結為液態,並從上至下穿過通槽1064流至殼體底部703。剩餘部分的廢氣從右至左地流經第二級冷卻裝置820中的冷卻板817,通過調節空氣流入和流出冷卻板817的速度,使得剩餘部分的廢氣被冷卻至出口處的氣體溫度大約為60~80℃,在此溫度下,廢氣中的其他污染物有機物,例如低凝點的酸類或酯類或醚類有機物,從氣態凝結為液態,並順著冷卻板817的側壁流至殼體底部703。剩餘部分的廢氣經過分隔板937的下部開口931流入過濾容腔842中,然後由下至上地流經過濾部件836,被過濾部件836過濾以除去其中的顆粒狀以及霧狀的有機物,以得到清潔的淨氣。最後,大部分清潔的淨氣從淨氣出口731.2排出至回流焊爐爐膛的低溫區,完成對廢氣的淨化程序,剩餘的小部分的淨氣經過上部開口932和連接通道1135流回至第一級冷卻裝置810中與廢氣混合並且降低廢氣的溫度。調節上部開口932的開口大小可以改變經過上部開口932和連接通道1135流回至第一級冷卻裝置810中的淨氣的量。當然,也可以完全關閉上部開口932,阻止淨氣能夠經過上部開口932和連接通道1135流回至第一級冷卻裝置810中。其中殼體底部703的液體污染物被收集裝置740.2收集。The general purification process of waste gas in the waste gas purification device 700 is as follows: after the waste gas containing pollutants (temperature is approximately 170°C) is discharged from the high temperature area of the reflow furnace furnace, it enters the first cooling chamber 861 from the waste gas inlet 711.1. The exhaust gas first flows through the first-stage cooling device 810 from top to bottom and from back to front. By adjusting the speed of the compressed air flowing in and out of the cooling pipe 865, the exhaust gas is cooled to a gas temperature of about 110~130°C at the outlet. , at this temperature, organic matter such as rosin in the exhaust gas condenses from gaseous state to liquid state, and flows from top to bottom through the channel 1064 to the bottom 703 of the housing. The remaining part of the exhaust gas flows through the cooling plate 817 in the second-stage cooling device 820 from right to left. By adjusting the speed of air flowing in and out of the cooling plate 817, the remaining part of the exhaust gas is cooled to the gas temperature at the outlet of about 60~80°C. At this temperature, other pollutant organic matter in the exhaust gas, such as acids, esters or ether organic matter with low freezing point, condenses from gaseous state to liquid state, and flows along the side wall of cooling plate 817 to the shell. Bottom 703. The remaining exhaust gas flows into the filter chamber 842 through the lower opening 931 of the partition plate 937, and then flows through the filter component 836 from bottom to top, and is filtered by the filter component 836 to remove the particulate and mist organic matter therein to obtain Clean air. Finally, most of the clean clean gas is discharged from the clean gas outlet 731.2 to the low temperature area of the reflow oven furnace to complete the purification process of the waste gas. The remaining small part of the clean gas flows back to the first through the upper opening 932 and the connecting channel 1135. The cooling device 810 mixes with the exhaust gas and reduces the temperature of the exhaust gas. Adjusting the opening size of the upper opening 932 can change the amount of clean air flowing back to the first-stage cooling device 810 through the upper opening 932 and the connecting channel 1135 . Of course, the upper opening 932 can also be completely closed to prevent the clean air from flowing back to the first-stage cooling device 810 through the upper opening 932 and the connecting channel 1135 . The liquid contaminants at the bottom 703 of the housing are collected by the collection device 740.2.

廢氣淨化裝置700的自清潔程序與廢氣淨化裝置200類似,不再贅述。The self-cleaning procedure of the exhaust gas purification device 700 is similar to that of the exhaust gas purification device 200 and will not be described again.

本案兩個實施例中廢氣淨化裝置200和廢氣淨化裝置700的主要區別在於第一級冷卻裝置不同。其中廢氣淨化裝置200的第一級冷卻裝置310中的冷卻板315具有更小的橫向面積,因此使得較少的污染物積累在熱交換部件(冷卻板315)上,因此能夠具有更長的保養間隔時間。而廢氣淨化裝置700的第一級冷卻裝置810為市售的成品件,能夠具有更低的成本。The main difference between the exhaust gas purification device 200 and the exhaust gas purification device 700 in the two embodiments of this case is that the first-stage cooling device is different. The cooling plate 315 in the first-stage cooling device 310 of the exhaust gas purification device 200 has a smaller lateral area, so that less pollutants are accumulated on the heat exchange component (cooling plate 315), and therefore can have longer maintenance. Interval time. The first-stage cooling device 810 of the exhaust gas purification device 700 is a commercially available finished product, which can have a lower cost.

儘管參考附圖中出示的具體實施方式將對本案進行描述,但是應當理解,在不背離本案教導的精神和範圍和背景下,本案的廢氣淨化系統和廢氣淨化裝置可以有許多變化形式。本領域技術一般技藝人士還將意識到有不同的方式來改變本案所揭示的實施例中的設置,均落入本案和請求項的精神和範圍內。Although the present case will be described with reference to specific embodiments shown in the drawings, it should be understood that the exhaust gas purification system and exhaust gas purification device of the present case may have many variations without departing from the spirit, scope and context of the teachings of the present case. One of ordinary skill in the art will also recognize that there are different ways to modify the arrangements of the disclosed embodiments, all within the spirit and scope of the disclosure and claims.

100:廢氣淨化系統 110:第一級冷卻單元 111.1:廢氣入口 111.2:氣體出口 112:補氣口 114:自清潔氣體入口 117.1:閥部件 117.2:閥部件 117.3:閥部件 117.4:閥部件 117.5:通道開關部件 117.6:閥部件 118:爐膛 120:第二級冷卻單元 121.1:氣體入口 121.2:氣體出口 124:流體動力裝置 125.1:連接通道 125.2:連接通道 130:過濾單元 131.1:氣體入口 131.2:淨氣出口 132:排氣口 133:加熱部件 134:自清潔氣體出口 135:連接通道 136:過濾部件 140:收集單元 141.1:廢液出口 141.2:廢液出口 141.3:廢液出口 151:溫度檢測部件 152:溫度檢測部件 155:氣體濃度檢測部件 200:廢氣淨化裝置 201:殼體 202:頂部 203:底部 204:左部 205:右部 206:前部 206.1:第一前板 206.2:第二前板 207:後部 211.1:近廢氣入口 212:補氣口 213.1:溫度檢測器 213.2:溫度檢測器 213.3:溫度檢測器 213.4:溫度檢測器 213.5:溫度檢測器 213.6:溫度檢測器 217.1:閥部件 217.2:閥部件 217.6:閥部件 222:加熱棒 224:風機 231.2:淨氣出口 232:排氣口 240.1:收集瓶 240.2:收集瓶 251.1:連接管道 251.2:連接管道 271:開口 310:第一級冷卻裝置 315:冷卻板 317:冷卻板 318:氣體管道 319:抽風機 320:第二級冷卻裝置 327:圍板 336:過濾部件 341:過濾部件 342:過濾容腔 355:冷卻媒體入口 357:冷卻媒體入口 365:冷卻媒體出口 367:冷卻媒體出口 425:橫板 426:豎板 431:下部開口 432:上部開口 437:分隔板 455:氧氣濃度檢測裝置 546.1:空腔 546.2:空腔 548:豎向氣體通道 549.1:頂部橫向氣體通道 549.2:底部橫向氣體通道 550:氣體通道 554:密封板 580:葉輪 582:進風側 584:出風側 614:清潔氣體入口 634:清潔氣體出口 635:連接通道 638:可調節擋板 656.1:均流板 656.2:均流板 658.1:圓形孔 658.2:長條形孔 661:導向槽 662:導向銷 700:廢氣淨化裝置 701:殼體 702:頂部 703:底部 704:左部 705:右部 706:前部 706.1:第一前板 706.2:第二前板 707:後部 708:消聲器 711.1:廢氣入口 712:補氣口 724:風機 731.2:淨氣出口 732:排氣口 740.1:收集瓶 740.2:收集瓶 771:開口 810:第一級冷卻裝置 815:冷卻媒體出口 816:冷卻媒體出口 817:冷卻板 820:第二級冷卻裝置 827:圍板 836:過濾部件 841:冷卻容腔 842:過濾容腔 855:冷卻媒體入口 857:冷卻媒體入口 861:第一冷卻容腔 862:第二冷卻容腔 863:冷卻片 865:冷卻管 925:橫板 926:豎板 931:分隔板下部開口 932:分隔板上部開口 937:分隔板 955:氧氣濃度檢測裝置 1046.1:空腔 1046.2:空腔 1049.1:頂部橫向氣體通道 1049.2:底部橫向氣體通道 1050:氣體冷卻通道 1064:通槽 1066:底部 1067:側壁 1068:縱向氣體流 1072:側槽 1080:葉輪 1081:輸入總管 1082:進風側 1084:出風側 1085:輸出總管 1114:自清潔氣體入口 1134:自清潔氣體出口 1135:連接通道 1138:可調節擋板 1156:均流板 1158:長條形孔100: Exhaust gas purification system 110: First level cooling unit 111.1: Exhaust gas inlet 111.2: Gas outlet 112: Air supply port 114:Self-cleaning gas inlet 117.1: Valve parts 117.2: Valve parts 117.3: Valve parts 117.4: Valve parts 117.5: Channel switch components 117.6: Valve parts 118:Hearth 120: Second stage cooling unit 121.1:Gas inlet 121.2: Gas outlet 124:Fluid power device 125.1:Connection channel 125.2: Connection channel 130:Filter unit 131.1:Gas inlet 131.2: Clean gas outlet 132:Exhaust port 133: Heating parts 134:Self-cleaning gas outlet 135:Connection channel 136:Filter components 140: Collection unit 141.1:Waste liquid outlet 141.2:Waste liquid outlet 141.3:Waste liquid outlet 151: Temperature detection parts 152: Temperature detection parts 155: Gas concentration detection parts 200: Exhaust gas purification device 201: Shell 202:Top 203: Bottom 204:Left 205:Right 206:Front 206.1: First front plate 206.2: Second front plate 207:Rear 211.1: Near the exhaust gas inlet 212: Air supply port 213.1: Temperature detector 213.2: Temperature detector 213.3: Temperature detector 213.4: Temperature detector 213.5: Temperature detector 213.6: Temperature detector 217.1: Valve components 217.2: Valve parts 217.6: Valve parts 222:Heating rod 224:Fan 231.2: Clean gas outlet 232:Exhaust port 240.1: Collection bottle 240.2: Collection bottle 251.1:Connecting pipes 251.2: Connecting pipes 271:Open your mouth 310: First stage cooling device 315:Cooling plate 317:Cooling plate 318:Gas pipeline 319:Exhaust fan 320: Second stage cooling device 327:Hoarding 336:Filter components 341:Filter components 342:Filter cavity 355: Cooling media inlet 357: Cooling media inlet 365: Cooling media outlet 367: Cooling media outlet 425:Horizontal board 426:Riser 431:Lower opening 432: Upper opening 437:Divider 455: Oxygen concentration detection device 546.1:Cavity 546.2:Cavity 548:Vertical gas channel 549.1: Top transverse gas channel 549.2: Bottom transverse gas channel 550:Gas channel 554:Sealing plate 580: Impeller 582:Inlet side 584:Outlet side 614: Clean gas inlet 634: Clean gas outlet 635:Connection channel 638: Adjustable baffle 656.1: Current equalizing plate 656.2: Current equalizing plate 658.1: Round hole 658.2: Elongated hole 661:Guide groove 662:Guide pin 700: Exhaust gas purification device 701: Shell 702:Top 703: Bottom 704:Left 705:Right 706:Front 706.1: First front plate 706.2: Second front plate 707:Rear 708:muffler 711.1: Exhaust gas inlet 712: Air supply port 724:Fan 731.2: Clean gas outlet 732:Exhaust port 740.1: Collection bottle 740.2: Collection bottle 771:Open your mouth 810: First stage cooling device 815: Cooling media outlet 816: Cooling media outlet 817:Cooling plate 820: Second stage cooling device 827:hoarding 836:Filter components 841: Cooling cavity 842:Filter chamber 855: Cooling media inlet 857: Cooling media inlet 861: First cooling cavity 862: Second cooling cavity 863: Cooling fin 865: Cooling pipe 925:Horizontal board 926:Riser 931: Opening at the lower part of the partition 932: Upper opening of partition plate 937:Divider 955: Oxygen concentration detection device 1046.1:Cavity 1046.2:Cavity 1049.1: Top transverse gas channel 1049.2: Bottom transverse gas channel 1050:Gas cooling channel 1064:Through slot 1066: Bottom 1067:Side wall 1068:Longitudinal gas flow 1072:Side slot 1080: Impeller 1081: Enter the manager 1082: Inlet side 1084: Outlet side 1085:Output header 1114:Self-cleaning gas inlet 1134:Self-cleaning gas outlet 1135:Connection channel 1138: Adjustable baffle 1156: Current equalizing plate 1158: long hole

圖1A為根據本案的一個實施例的廢氣淨化系統的簡化的結構方塊圖;Figure 1A is a simplified structural block diagram of an exhaust gas purification system according to an embodiment of the present case;

圖1B為示出圖1A中的廢氣淨化系統處於工作狀態時的氣體流動路徑的方塊圖;Figure 1B is a block diagram showing the gas flow path when the exhaust gas purification system in Figure 1A is in operation;

圖1C為示出圖1A中的廢氣淨化系統處於維護狀態時的氣體流動路徑的方塊圖;Figure 1C is a block diagram illustrating the gas flow path when the exhaust gas purification system in Figure 1A is in a maintenance state;

圖2A為根據本案的一個實施例的廢氣淨化裝置的立體結構示意圖;Figure 2A is a schematic three-dimensional structural diagram of an exhaust gas purification device according to an embodiment of the present case;

圖2B為圖2A所示的廢氣淨化裝置的正視圖;Figure 2B is a front view of the exhaust gas purification device shown in Figure 2A;

圖2C為圖2A所示的廢氣淨化裝置的俯視圖;Figure 2C is a top view of the exhaust gas purification device shown in Figure 2A;

圖3為圖2A所示的廢氣淨化裝置的爆炸結構圖;Figure 3 is an exploded structural view of the exhaust gas purification device shown in Figure 2A;

圖4為沿圖2B的A-A線的剖視圖;Figure 4 is a cross-sectional view along line A-A of Figure 2B;

圖5為沿圖2C的B-B線的剖視圖;Figure 5 is a cross-sectional view along line B-B of Figure 2C;

圖6為圖2A所示的廢氣淨化裝置中的冷卻裝置的立體結構示意圖;Figure 6 is a schematic three-dimensional structural view of the cooling device in the exhaust gas purification device shown in Figure 2A;

圖7A為根據本案的另一個實施例的廢氣淨化裝置的立體結構示意圖;Figure 7A is a schematic three-dimensional structural diagram of an exhaust gas purification device according to another embodiment of the present case;

圖7B為圖7A所示的廢氣淨化裝置的的正視圖;Figure 7B is a front view of the exhaust gas purification device shown in Figure 7A;

圖7C為圖7A所示的廢氣淨化裝置的的俯視圖;Figure 7C is a top view of the exhaust gas purification device shown in Figure 7A;

圖8為圖7A所示的廢氣淨化裝置的爆炸結構圖;Figure 8 is an exploded structural view of the exhaust gas purification device shown in Figure 7A;

圖9為沿圖7B 的A-A線的剖視圖;Figure 9 is a cross-sectional view along line A-A of Figure 7B;

圖10A為沿圖7C的B-B線的剖視圖;Figure 10A is a cross-sectional view along line B-B of Figure 7C;

圖10B為沿圖10A的C-C線的剖視圖;Figure 10B is a cross-sectional view along line C-C of Figure 10A;

圖11為圖7A所示的廢氣淨化裝置中的冷卻裝置的立體結構示意圖。Fig. 11 is a schematic three-dimensional structural view of the cooling device in the exhaust gas purification device shown in Fig. 7A.

國內寄存資訊 (請依寄存機構、日期、號碼順序註記) 無Domestic storage information (please note in order of storage institution, date and number) without

國外寄存資訊 (請依寄存國家、機構、日期、號碼順序註記) 無Overseas storage information (please note in order of storage country, institution, date, and number) without

100:廢氣淨化系統 100: Exhaust gas purification system

110:第一級冷卻單元 110: First level cooling unit

111.1:廢氣入口 111.1: Exhaust gas inlet

111.2:氣體出口 111.2: Gas outlet

112:補氣口 112: Air supply port

114:自清潔氣體入口 114:Self-cleaning gas inlet

117.1:閥部件 117.1: Valve components

117.2:閥部件 117.2: Valve components

117.3:閥部件 117.3: Valve components

117.4:閥部件 117.4: Valve parts

117.5:通道開關部件 117.5: Channel switch components

117.6:閥部件 117.6: Valve parts

118:爐膛 118:Hearth

120:第二級冷卻單元 120: Second stage cooling unit

121.1:氣體入口 121.1:Gas inlet

121.2:氣體出口 121.2: Gas outlet

124:流體動力裝置 124:Fluid power device

125.1:連接通道 125.1:Connection channel

125.2:連接通道 125.2: Connection channel

130:過濾單元 130:Filter unit

131.1:氣體入口 131.1:Gas inlet

131.2:淨氣出口 131.2: Clean gas outlet

132:排氣口 132:Exhaust port

133:加熱部件 133: Heating parts

134:自清潔氣體出口 134:Self-cleaning gas outlet

135:連接通道 135:Connection channel

136:過濾部件 136:Filter components

140:收集單元 140: Collection unit

141.1:廢液出口 141.1:Waste liquid outlet

141.2:廢液出口 141.2:Waste liquid outlet

141.3:廢液出口 141.3:Waste liquid outlet

151:溫度檢測部件 151: Temperature detection parts

152:溫度檢測部件 152: Temperature detection parts

155:氣體濃度檢測部件 155: Gas concentration detection parts

Claims (9)

一種廢氣淨化系統,用於淨化回流焊爐爐膛(118)中的廢氣中的污染物,其中:包括:第一級冷卻單元(110),所述第一級冷卻單元(110)具有廢氣入口(111.1)和氣體出口(111.2),所述第一級冷卻單元(110)用於將通過所述廢氣入口(111.1)進入所述第一級冷卻單元(110)中的廢氣冷卻至第一溫度,以使得進入所述第一級冷卻單元(110)中的廢氣中的污染物一部分從氣態冷卻為液態並從所述第一級冷卻單元(110)排出,進入所述第一級冷卻單元(110)中的廢氣中的污染物剩餘部分的一部分保持氣態;第二級冷卻單元(120),所述第二級冷卻單元(120)具有氣體入口(121.1)和氣體出口(121.2),所述第二級冷卻單元(120)的氣體入口(121.1)與所述第一級冷卻單元(110)的氣體出口(111.2)流體連通,所述第二級冷卻單元(120)用於將從所述第一級冷卻單元(110)進入所述第二級冷卻單元(120)的廢氣從所述第一溫度冷卻至第二溫度,以使得進入所述第二級冷卻單元(120)中的所述廢氣的污染物一部分從氣態冷卻為液態並從所述第二級冷卻單元(120)中排出,進入所述第二級冷卻單元(120) 中的廢氣中的污染物的剩餘部分的一部分保持氣態或霧狀;過濾單元(130),所述過濾單元(130)具有氣體入口(131.1)和淨氣出口(131.2),所述過濾單元(130)的氣體入口(131.1)與所述第二級冷卻單元(120)的氣體出口(121.2)流體連通,所述過濾單元(130)用於過濾進入所述過濾單元(130)的廢氣,並將過濾後的氣體的至少一部分通過所述過濾單元(130)的淨氣出口(131.2)排出,其中所述第一級冷卻單元(110)的廢氣入口(111.1)用於可控地與所述回流焊爐的爐膛(118)流體連通。 An exhaust gas purification system for purifying pollutants in exhaust gas in a reflow furnace furnace (118), which: includes: a first-stage cooling unit (110), the first-stage cooling unit (110) has an exhaust gas inlet ( 111.1) and gas outlet (111.2), the first-stage cooling unit (110) is used to cool the exhaust gas entering the first-stage cooling unit (110) through the exhaust gas inlet (111.1) to the first temperature, So that part of the pollutants in the exhaust gas entering the first-stage cooling unit (110) is cooled from gaseous state to liquid state and discharged from the first-stage cooling unit (110), entering the first-stage cooling unit (110) ) in the exhaust gas remains in a gaseous state; a second-stage cooling unit (120), the second-stage cooling unit (120) has a gas inlet (121.1) and a gas outlet (121.2), the second-stage cooling unit (120) The gas inlet (121.1) of the secondary cooling unit (120) is in fluid communication with the gas outlet (111.2) of the first-stage cooling unit (110). The second-stage cooling unit (120) is used to remove the gas from the first-stage cooling unit (110). The exhaust gas entering the second-stage cooling unit (120) from the first-stage cooling unit (110) is cooled from the first temperature to the second temperature, so that the exhaust gas entering the second-stage cooling unit (120) A part of the pollutants are cooled from gaseous state to liquid state and discharged from the second-stage cooling unit (120), entering the second-stage cooling unit (120) A part of the remaining part of the pollutants in the exhaust gas remains in a gaseous or mist state; a filtering unit (130), the filtering unit (130) has a gas inlet (131.1) and a clean gas outlet (131.2), the filtering unit (131.2) The gas inlet (131.1) of 130) is in fluid communication with the gas outlet (121.2) of the second-stage cooling unit (120), the filter unit (130) is used to filter the exhaust gas entering the filter unit (130), and At least part of the filtered gas is discharged through the clean gas outlet (131.2) of the filter unit (130), wherein the exhaust gas inlet (111.1) of the first-stage cooling unit (110) is used to controllably communicate with the The furnace chamber (118) of the reflow oven is in fluid communication. 根據請求項1之廢氣淨化系統,其中:還包括:收集單元(140),所述第一級冷卻單元(110)和所述第二級冷卻單元(120)各自具有廢液出口(141.1,141.2),所述收集單元(140)可控地與所述第一級冷卻單元(110)和所述第二級冷卻單元(120)的廢液出口(141.1,141.2)均流體連通,用於收集排出的液態廢氣。 The exhaust gas purification system according to claim 1, further comprising: a collection unit (140), the first-stage cooling unit (110) and the second-stage cooling unit (120) each have a waste liquid outlet (141.1, 141.2 ), the collection unit (140) is controllably fluidly connected with the waste liquid outlets (141.1, 141.2) of the first-stage cooling unit (110) and the second-stage cooling unit (120) for collection Expelled liquid waste gas. 根據請求項1之廢氣淨化系統,其中:在所述第一溫度下,廢氣中從氣態冷卻為液態的污染物包括松香有機物; 在所述第二溫度下,廢氣中的從氣態冷卻為液態的污染物包括其他低凝點的酸類或酯類或醚類有機物。 The exhaust gas purification system according to claim 1, wherein: at the first temperature, the pollutants in the exhaust gas that are cooled from the gaseous state to the liquid state include rosin organic matter; At the second temperature, the pollutants in the exhaust gas that are cooled from the gaseous state to the liquid state include other acids, esters or ether organic compounds with low freezing point. 根據請求項3之廢氣淨化系統,其中:所述第一溫度為110~130℃;所述第二溫度為60~80℃。 The exhaust gas purification system according to claim 3, wherein: the first temperature is 110~130°C; the second temperature is 60~80°C. 一種能夠自清潔的廢氣淨化系統,其中:包括:冷卻單元(110,120),所述冷卻單元(110,120)具有自清潔氣體入口(114)和氣體出口(121.2);過濾單元(130),所述過濾單元(130)具有氣體入口(131.1)和自清潔氣體出口(134);加熱部件(133),所述加熱部件(133)設置在所述過濾單元(130)中,用於升高所述過濾單元(130)內的氣體溫度;第一通道(125.2),所述第一通道(125.2)連接所述冷卻單元(110,120)的氣體出口(121.2)和所述過濾單元(130)的氣體入口(131.1),所述第一通道(125.2)用於將所述冷卻單元(110,120)中的氣體輸送至所述過濾單元(130)中;和第二通道(135),所述第二通道(135)連接所述過濾單元(130)的自清潔氣體出口(134)和所述冷卻單元(110,120)的自清潔氣體入口(114),所 述第二通道(135)用於可控地將所述過濾單元(130)中的氣體輸送至所述冷卻單元(110,120)中;其中氣體在所述冷卻單元(110,120)、第一通道(125.2)、過濾單元(130)和第二通道(135)中形成自清潔氣體循環,其中所述冷卻單元(110,120)包括廢氣入口(111.1),所述廢氣入口(111.1)用於可控地與回流焊爐的爐膛(118)連接。 An exhaust gas purification system capable of self-cleaning, which includes: a cooling unit (110,120) with a self-cleaning gas inlet (114) and a gas outlet (121.2); a filtering unit (130), the filtering unit (110,120) The unit (130) has a gas inlet (131.1) and a self-cleaning gas outlet (134); a heating component (133) provided in the filter unit (130) for raising the filter The gas temperature in the unit (130); the first channel (125.2), the first channel (125.2) connects the gas outlet (121.2) of the cooling unit (110,120) and the gas inlet (130) of the filter unit (130) 131.1), the first channel (125.2) is used to transport the gas in the cooling unit (110, 120) to the filter unit (130); and the second channel (135), the second channel (135 ) connects the self-cleaning gas outlet (134) of the filter unit (130) and the self-cleaning gas inlet (114) of the cooling unit (110, 120), so The second channel (135) is used to controllably transport the gas in the filter unit (130) to the cooling unit (110,120); where the gas is in the cooling unit (110,120) and the first channel (125.2 ), the filter unit (130) and the second channel (135) form a self-cleaning gas cycle, wherein the cooling unit (110, 120) includes an exhaust gas inlet (111.1) for controllably communicating with the backflow The furnace (118) of the welding furnace is connected. 根據請求項5之廢氣淨化系統,其中:還包括:流體動力裝置(124),所述流體動力裝置(124)使得氣體能夠通過所述第一通道(125.2)和所述第二通道(135)在所述過濾單元(130)和所述冷卻單元(110,120)中循環。 The exhaust gas purification system according to claim 5, further comprising: a fluid power device (124), the fluid power device (124) enabling gas to pass through the first channel (125.2) and the second channel (135) Circulates in the filtration unit (130) and the cooling unit (110, 120). 根據請求項5之廢氣淨化系統,其中:所述過濾單元(130)包括淨氣出口(131.2),所述淨氣出口(131.2)用於可控地排出所述過濾單元(130)中的氣體。 The exhaust gas purification system according to claim 5, wherein: the filter unit (130) includes a clean gas outlet (131.2), and the clean gas outlet (131.2) is used to controllably discharge the gas in the filter unit (130) . 根據請求項5之廢氣淨化系統,其特徵在於還包括:收集單元(140),所述冷卻單元(110,120)和所述過濾單元(130)各自具有廢液出口(141.1,141.2,141.3),所述收集單元(140)可 控地與所述冷卻單元(110)和所述過濾單元(130)的廢液出口(141.1,141.2)均流體連通,用於收集排出的液態廢氣。 The exhaust gas purification system according to claim 5, characterized by further comprising: a collection unit (140), the cooling unit (110, 120) and the filter unit (130) each have a waste liquid outlet (141.1, 141.2, 141.3), so The above collection unit (140) can The cooling unit (110) and the waste liquid outlet (141.1, 141.2) of the filter unit (130) are all fluidly connected in a controlled manner for collecting discharged liquid waste gas. 根據請求項5之廢氣淨化系統,其中:所述冷卻單元(110,120)還具有補氣口(112),所述補氣口(112)用於可控地與保護氣體流體連通,以使得保護氣體進入所述廢氣淨化系統(100)內;所述過濾單元(130)具有排氣口(132),所述排氣口(132)用於可控地排出所述廢氣淨化系統(100)內的氣體。 The exhaust gas purification system according to claim 5, wherein: the cooling unit (110, 120) also has an air supply port (112), the air supply port (112) is used to controllably communicate with the protective gas fluid, so that the protective gas enters the In the exhaust gas purification system (100); the filter unit (130) has an exhaust port (132), and the exhaust port (132) is used to controllably discharge the gas in the exhaust gas purification system (100).
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