TWI811382B - Sealing sheet and sealing body - Google Patents
Sealing sheet and sealing body Download PDFInfo
- Publication number
- TWI811382B TWI811382B TW108120647A TW108120647A TWI811382B TW I811382 B TWI811382 B TW I811382B TW 108120647 A TW108120647 A TW 108120647A TW 108120647 A TW108120647 A TW 108120647A TW I811382 B TWI811382 B TW I811382B
- Authority
- TW
- Taiwan
- Prior art keywords
- sealing sheet
- compound
- group
- resin
- cyclic ether
- Prior art date
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- 238000007789 sealing Methods 0.000 title claims abstract description 126
- 239000000565 sealant Substances 0.000 claims abstract description 160
- 150000001875 compounds Chemical class 0.000 claims abstract description 125
- 239000000203 mixture Substances 0.000 claims abstract description 96
- 229920005989 resin Polymers 0.000 claims abstract description 89
- 239000011347 resin Substances 0.000 claims abstract description 89
- 125000000524 functional group Chemical group 0.000 claims abstract description 56
- 150000004292 cyclic ethers Chemical group 0.000 claims abstract description 44
- 239000011230 binding agent Substances 0.000 claims abstract description 42
- 238000003860 storage Methods 0.000 claims abstract description 41
- 238000006243 chemical reaction Methods 0.000 claims abstract description 12
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 29
- 229920006287 phenoxy resin Polymers 0.000 claims description 29
- 239000013034 phenoxy resin Substances 0.000 claims description 29
- 239000000126 substance Substances 0.000 claims description 29
- 239000003054 catalyst Substances 0.000 claims description 28
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 claims description 22
- 229920006324 polyoxymethylene Polymers 0.000 claims description 22
- 239000007787 solid Substances 0.000 claims description 16
- 239000011354 acetal resin Substances 0.000 claims description 14
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical group C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 claims description 13
- 125000003700 epoxy group Chemical group 0.000 claims description 13
- 239000003822 epoxy resin Substances 0.000 claims description 13
- 229920000647 polyepoxide Polymers 0.000 claims description 13
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 12
- 239000007788 liquid Substances 0.000 claims description 12
- 229920005672 polyolefin resin Polymers 0.000 claims description 12
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 8
- 230000009477 glass transition Effects 0.000 claims description 3
- 125000004018 acid anhydride group Chemical group 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 112
- -1 cyclic ether compound Chemical class 0.000 description 78
- 239000010408 film Substances 0.000 description 72
- 239000007789 gas Substances 0.000 description 57
- 230000004888 barrier function Effects 0.000 description 46
- 229920000642 polymer Polymers 0.000 description 46
- 238000000034 method Methods 0.000 description 43
- 150000001336 alkenes Chemical class 0.000 description 30
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 28
- 238000000576 coating method Methods 0.000 description 25
- 150000002500 ions Chemical class 0.000 description 25
- 239000004593 Epoxy Substances 0.000 description 22
- 239000011248 coating agent Substances 0.000 description 22
- 239000000463 material Substances 0.000 description 21
- 239000002904 solvent Substances 0.000 description 20
- 239000000853 adhesive Substances 0.000 description 14
- 230000001070 adhesive effect Effects 0.000 description 14
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 14
- 229920001709 polysilazane Polymers 0.000 description 14
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 12
- 150000001241 acetals Chemical class 0.000 description 12
- 239000002585 base Substances 0.000 description 12
- 238000010438 heat treatment Methods 0.000 description 12
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 12
- 238000010538 cationic polymerization reaction Methods 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 11
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 11
- 238000010030 laminating Methods 0.000 description 11
- 239000000178 monomer Substances 0.000 description 11
- 239000003505 polymerization initiator Substances 0.000 description 11
- 239000000758 substrate Substances 0.000 description 11
- 229920002554 vinyl polymer Polymers 0.000 description 11
- 125000001931 aliphatic group Chemical group 0.000 description 10
- 125000003118 aryl group Chemical group 0.000 description 10
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 9
- 238000005468 ion implantation Methods 0.000 description 9
- 238000002834 transmittance Methods 0.000 description 9
- 229930182556 Polyacetal Natural products 0.000 description 8
- 239000004793 Polystyrene Substances 0.000 description 8
- 150000001244 carboxylic acid anhydrides Chemical group 0.000 description 8
- 238000001035 drying Methods 0.000 description 8
- 229920002223 polystyrene Polymers 0.000 description 8
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 7
- 125000002723 alicyclic group Chemical group 0.000 description 7
- 150000002148 esters Chemical class 0.000 description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 7
- 150000002989 phenols Chemical class 0.000 description 7
- 239000003566 sealing material Substances 0.000 description 7
- 238000007740 vapor deposition Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 6
- 238000005227 gel permeation chromatography Methods 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 150000001299 aldehydes Chemical class 0.000 description 5
- 125000002947 alkylene group Chemical group 0.000 description 5
- 230000001588 bifunctional effect Effects 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 230000004048 modification Effects 0.000 description 5
- 238000012986 modification Methods 0.000 description 5
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- 239000000123 paper Substances 0.000 description 5
- 229920001230 polyarylate Polymers 0.000 description 5
- 229920005862 polyol Polymers 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 4
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- 239000004721 Polyphenylene oxide Substances 0.000 description 4
- 239000004743 Polypropylene Substances 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229920000570 polyether Polymers 0.000 description 4
- 229920001155 polypropylene Polymers 0.000 description 4
- 229920005573 silicon-containing polymer Polymers 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- 229920001187 thermosetting polymer Polymers 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- WNXJIVFYUVYPPR-UHFFFAOYSA-N 1,3-dioxolane Chemical compound C1COCO1 WNXJIVFYUVYPPR-UHFFFAOYSA-N 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 239000001431 2-methylbenzaldehyde Substances 0.000 description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical group [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical group OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 3
- 239000004952 Polyamide Substances 0.000 description 3
- 239000004734 Polyphenylene sulfide Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Chemical group C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 3
- 150000001491 aromatic compounds Chemical class 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 3
- 150000001735 carboxylic acids Chemical class 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- ZSWFCLXCOIISFI-UHFFFAOYSA-N endo-cyclopentadiene Natural products C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 3
- 125000005677 ethinylene group Chemical group [*:2]C#C[*:1] 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 238000002513 implantation Methods 0.000 description 3
- 229910010272 inorganic material Inorganic materials 0.000 description 3
- 229910052809 inorganic oxide Inorganic materials 0.000 description 3
- 238000004020 luminiscence type Methods 0.000 description 3
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical class C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 3
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 3
- 150000004767 nitrides Chemical class 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 125000003566 oxetanyl group Chemical group 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 238000009832 plasma treatment Methods 0.000 description 3
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- 239000004417 polycarbonate Substances 0.000 description 3
- 239000004848 polyfunctional curative Substances 0.000 description 3
- 229920000098 polyolefin Polymers 0.000 description 3
- 150000003077 polyols Chemical class 0.000 description 3
- 229920000069 polyphenylene sulfide Polymers 0.000 description 3
- 239000011342 resin composition Substances 0.000 description 3
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinyl group Chemical group C1(O)=CC(O)=CC=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 229920001567 vinyl ester resin Polymers 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 2
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- AOBIOSPNXBMOAT-UHFFFAOYSA-N 2-[2-(oxiran-2-ylmethoxy)ethoxymethyl]oxirane Chemical compound C1OC1COCCOCC1CO1 AOBIOSPNXBMOAT-UHFFFAOYSA-N 0.000 description 2
- KUAUJXBLDYVELT-UHFFFAOYSA-N 2-[[2,2-dimethyl-3-(oxiran-2-ylmethoxy)propoxy]methyl]oxirane Chemical compound C1OC1COCC(C)(C)COCC1CO1 KUAUJXBLDYVELT-UHFFFAOYSA-N 0.000 description 2
- GJYCVCVHRSWLNY-UHFFFAOYSA-N 2-butylphenol Chemical compound CCCCC1=CC=CC=C1O GJYCVCVHRSWLNY-UHFFFAOYSA-N 0.000 description 2
- JESXATFQYMPTNL-UHFFFAOYSA-N 2-ethenylphenol Chemical compound OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 2
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 2
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 2
- GRWFFFOEIHGUBG-UHFFFAOYSA-N 3,4-Epoxy-6-methylcyclohexylmethyl-3,4-epoxy-6-methylcyclo-hexanecarboxylate Chemical compound C1C2OC2CC(C)C1C(=O)OCC1CC2OC2CC1C GRWFFFOEIHGUBG-UHFFFAOYSA-N 0.000 description 2
- LSTZTHCEEPHCNQ-UHFFFAOYSA-N 3-(2,5-dioxabicyclo[2.1.0]pentan-3-yloxy)-2,5-dioxabicyclo[2.1.0]pentane Chemical compound C1(C2C(O2)O1)OC1C2C(O2)O1 LSTZTHCEEPHCNQ-UHFFFAOYSA-N 0.000 description 2
- UWFHYGTWXNRUDH-UHFFFAOYSA-N 3-ethyl-3-[4-[(3-ethyloxetan-3-yl)methoxy]butoxymethyl]oxetane Chemical compound C1OCC1(CC)COCCCCOCC1(CC)COC1 UWFHYGTWXNRUDH-UHFFFAOYSA-N 0.000 description 2
- LMIOYAVXLAOXJI-UHFFFAOYSA-N 3-ethyl-3-[[4-[(3-ethyloxetan-3-yl)methoxymethyl]phenyl]methoxymethyl]oxetane Chemical compound C=1C=C(COCC2(CC)COC2)C=CC=1COCC1(CC)COC1 LMIOYAVXLAOXJI-UHFFFAOYSA-N 0.000 description 2
- IAVREABSGIHHMO-UHFFFAOYSA-N 3-hydroxybenzaldehyde Chemical compound OC1=CC=CC(C=O)=C1 IAVREABSGIHHMO-UHFFFAOYSA-N 0.000 description 2
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 2
- YGCZTXZTJXYWCO-UHFFFAOYSA-N 3-phenylpropanal Chemical compound O=CCCC1=CC=CC=C1 YGCZTXZTJXYWCO-UHFFFAOYSA-N 0.000 description 2
- HVMHLMJYHBAOPL-UHFFFAOYSA-N 4-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)propan-2-yl]-7-oxabicyclo[4.1.0]heptane Chemical compound C1CC2OC2CC1C(C)(C)C1CC2OC2CC1 HVMHLMJYHBAOPL-UHFFFAOYSA-N 0.000 description 2
- RGHHSNMVTDWUBI-UHFFFAOYSA-N 4-hydroxybenzaldehyde Chemical compound OC1=CC=C(C=O)C=C1 RGHHSNMVTDWUBI-UHFFFAOYSA-N 0.000 description 2
- FVCSARBUZVPSQF-UHFFFAOYSA-N 5-(2,4-dioxooxolan-3-yl)-7-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C(OC2=O)=O)C2C(C)=CC1C1C(=O)COC1=O FVCSARBUZVPSQF-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
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- 229930185605 Bisphenol Natural products 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical group OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
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- AMIMRNSIRUDHCM-UHFFFAOYSA-N Isopropylaldehyde Chemical compound CC(C)C=O AMIMRNSIRUDHCM-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- 239000004696 Poly ether ether ketone Substances 0.000 description 2
- 239000004962 Polyamide-imide Substances 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 2
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- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
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- 150000003377 silicon compounds Chemical class 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
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- APSBXTVYXVQYAB-UHFFFAOYSA-M sodium docusate Chemical group [Na+].CCCCC(CC)COC(=O)CC(S([O-])(=O)=O)C(=O)OCC(CC)CCCC APSBXTVYXVQYAB-UHFFFAOYSA-M 0.000 description 1
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- 239000003381 stabilizer Substances 0.000 description 1
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- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000005017 substituted alkenyl group Chemical group 0.000 description 1
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- 150000005846 sugar alcohols Polymers 0.000 description 1
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- 150000003512 tertiary amines Chemical class 0.000 description 1
- 125000003718 tetrahydrofuranyl group Chemical group 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
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- 229910052718 tin Inorganic materials 0.000 description 1
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- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
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- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- HKFSBKQQYCMCKO-UHFFFAOYSA-N trichloro(prop-2-enyl)silane Chemical compound Cl[Si](Cl)(Cl)CC=C HKFSBKQQYCMCKO-UHFFFAOYSA-N 0.000 description 1
- UMFJXASDGBJDEB-UHFFFAOYSA-N triethoxy(prop-2-enyl)silane Chemical compound CCO[Si](CC=C)(OCC)OCC UMFJXASDGBJDEB-UHFFFAOYSA-N 0.000 description 1
- HRTZJTKYLWFENK-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropylsilyl)propyl]silane Chemical group CCO[Si](CCC[SiH2]CCC[Si](OCC)(OCC)OCC)(OCC)OCC HRTZJTKYLWFENK-UHFFFAOYSA-N 0.000 description 1
- VTHOKNTVYKTUPI-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyltetrasulfanyl)propyl]silane Chemical group CCO[Si](OCC)(OCC)CCCSSSSCCC[Si](OCC)(OCC)OCC VTHOKNTVYKTUPI-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- JTTSZDBCLAKKAY-UHFFFAOYSA-N trimethoxy-[3-(3-trimethoxysilylpropyltetrasulfanyl)propyl]silane Chemical group CO[Si](OC)(OC)CCCSSSSCCC[Si](OC)(OC)OC JTTSZDBCLAKKAY-UHFFFAOYSA-N 0.000 description 1
- QYJYJTDXBIYRHH-UHFFFAOYSA-N trimethoxy-[8-(oxiran-2-ylmethoxy)octyl]silane Chemical compound C(C1CO1)OCCCCCCCC[Si](OC)(OC)OC QYJYJTDXBIYRHH-UHFFFAOYSA-N 0.000 description 1
- 229920001862 ultra low molecular weight polyethylene Polymers 0.000 description 1
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- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/10—Materials in mouldable or extrudable form for sealing or packing joints or covers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/15—Heterocyclic compounds having oxygen in the ring
- C08K5/151—Heterocyclic compounds having oxygen in the ring having one oxygen atom in the ring
- C08K5/1515—Three-membered rings
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J201/00—Adhesives based on unspecified macromolecular compounds
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/10—Adhesives in the form of films or foils without carriers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/40—Adhesives in the form of films or foils characterised by release liners
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
- H05B33/04—Sealing arrangements, e.g. against humidity
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/312—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/842—Containers
- H10K50/8426—Peripheral sealing arrangements, e.g. adhesives, sealants
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Epoxy Resins (AREA)
- Sealing Material Composition (AREA)
- Laminated Bodies (AREA)
- Adhesive Tapes (AREA)
- Electroluminescent Light Sources (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Closing Of Containers (AREA)
- Packages (AREA)
- Thermotherapy And Cooling Therapy Devices (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Seal Device For Vehicle (AREA)
- Containers And Plastic Fillers For Packaging (AREA)
Abstract
本發明提供一種密封劑組合物,其為含有具有環狀醚基的化合物及具有能夠與前述具有環狀醚基的化合物進行硬化反應的官能基之黏結劑樹脂之密封劑組合物,其特徵在於:在23℃之硬化前的儲存模數為104Pa以上,在-20℃以上且+90℃以下的溫度範圍之硬化後的儲存模數為108Pa以上;一種密封片,其為由2片剝離膜及經該等剝離膜挾持的密封劑層所構成之密封片,前述密封劑層是使用前述密封劑組合物而形成之物;以及一種密封體,使用前述密封片將被密封物密封而成。 The present invention provides a sealant composition, which is a sealant composition containing a compound having a cyclic ether group and a binder resin having a functional group capable of performing a curing reaction with the compound having a cyclic ether group, and is characterized by: : The storage modulus before hardening at 23°C is 10 4 Pa or more, and the storage modulus after hardening in the temperature range of -20°C or more and +90°C or less is 10 8 Pa or more; a sealing sheet made of A sealing sheet composed of two release films and a sealant layer sandwiched by the release films, the sealant layer being formed using the sealant composition; and a sealing body using the sealing sheet to seal the object Sealed.
Description
本發明有關於一種具有密封劑組合物及由該密封劑組合物所形成的密封劑層之密封片、以及使用前述密封片將密封物密封而成之密封體。 The present invention relates to a sealing sheet having a sealant composition and a sealant layer formed from the sealant composition, and a sealing body in which a sealant is sealed using the sealing sheet.
近年來,有機EL元件作為藉由低電壓直流驅動而能夠高亮度發光的發光元件而受到關注。 In recent years, organic EL elements have attracted attention as light-emitting elements capable of emitting light with high brightness by low-voltage DC driving.
但是,有機EL元件有發光亮度、發光效率、發光均勻性等的發光特性容易隨著時間經過而低落之問題。 However, organic EL elements have a problem that their light-emitting characteristics, such as light-emitting brightness, light-emitting efficiency, and light-emitting uniformity, tend to decrease over time.
作為該發光特性低落的問題之原因,因為認為氧、水分等侵入至有機EL元件的內部致使電極、有機層等劣化。因此,為了解決該問題,有提案揭示使用具有優異的水分隔離性之黏著片作為密封材(密封片)。 It is considered that the cause of the problem of lowered luminescence characteristics is that oxygen, moisture, etc. penetrate into the inside of the organic EL element, causing the electrodes, organic layers, etc. to deteriorate. Therefore, in order to solve this problem, there is a proposal to use an adhesive sheet having excellent moisture barrier properties as a sealing material (sealing sheet).
作為具有此種特性之密封片,專利文獻1提案揭示一種熱硬化性組合物,其含有在1分子內具有二個以上的環氧基之陽離子聚合性化合物、熱陽離子聚合起始劑、選自由聚環氧烷及冠醚(crown ether)所組成群組之重量平均分子量250~10,000的聚醚化合物、以及調平劑(leveling agent)。 As a sealing sheet having such characteristics, Patent Document 1 proposes a thermosetting composition containing a cationic polymerizable compound having two or more epoxy groups in one molecule, a thermal cationic polymerization initiator, and a thermosetting composition selected from the group consisting of: A polyether compound with a weight average molecular weight of 250 to 10,000, which is a group composed of polyalkylene oxide and crown ether, and a leveling agent.
該文獻亦記載使用該文獻記載的熱硬化性組合物時,能夠在有機EL元件等的被塗佈物上形成凹凸、收縮斑(cissing)等較少且表面平滑性較高的硬化物層。 This document also describes that when the thermosetting composition described in this document is used, a cured material layer with less unevenness, cissing, etc. and high surface smoothness can be formed on a coated object such as an organic EL element.
又,專利文獻2亦記載一種有機EL元件密封用樹脂組合物,其特徵在於:含有環氧樹脂、硬化劑及平均粒徑為10μm以下的吸濕性金屬氧化物,且該硬化劑為離子液體。Furthermore, Patent Document 2 also describes a resin composition for sealing organic EL elements, characterized in that it contains an epoxy resin, a hardener, and a hygroscopic metal oxide with an average particle diameter of 10 μm or less, and the hardener is ionic liquids.
該文獻亦記載使用該文獻記載的樹脂組合物時,能夠熔融成為在全面密封的積層步驟中被要求之適當黏度的熔融物,且在低溫硬化而能夠形成較高的密著強度(黏著強度)的硬化物層。 [先前技術文獻] [專利文獻]This document also states that when the resin composition described in this document is used, it can be melted into a molten material with an appropriate viscosity required in the lamination step of full sealing, and it can be cured at a low temperature to form a high adhesion strength (adhesion strength). layer of hardened material. [Prior technical literature] [Patent Document]
[專利文獻1]日本特許第5763280號 [專利文獻2]日本特許第5601202號[Patent Document 1] Japanese Patent No. 5763280 [Patent Document 2] Japanese Patent No. 5601202
如專利文獻1、2所記載,藉由使用含有環氧樹脂之硬化性組合物,容易得到水分隔離性優異之密封片。 但是,伴隨著近年來電子機器進一步高性能化,對構成電子機器的構件之要求越來越嚴格,且被要求開發在廣泛的溫度區域具有更優異的密封性之密封材。As described in Patent Documents 1 and 2, by using a curable composition containing an epoxy resin, a sealing sheet excellent in moisture barrier properties can be easily obtained. However, in recent years, as electronic equipment has become more highly functional, requirements for the components constituting the electronic equipment have become increasingly stringent, and sealing materials with better sealing properties in a wide temperature range have been required to be developed.
本發明鑒於上述實際情況而進行,其目的是提供一種容易加工成為薄片狀物而加工性優異,且在廣泛的溫度區域能夠形成密封性優異的密封劑層之密封劑組合物;具有由該密封劑組合物所形成的密封劑層之密封片;以及使用前述密封片將密封物密封而成之密封體。The present invention was made in view of the above-mentioned actual situation, and an object thereof is to provide a sealant composition that is easily processed into a sheet-like object, has excellent processability, and can form a sealant layer with excellent sealing properties in a wide temperature range; A sealing sheet having a sealant layer formed of a sealant composition; and a sealing body formed by sealing a sealing object using the aforementioned sealing sheet.
為了解決上述課題,本發明者等專心研討密封劑組合物。 其結果,發現一種密封劑組合物,其含有具有環狀醚基的化合物及具有能夠與前述具有環狀醚基的化合物進行硬化反應的官能基之黏結劑樹脂,而且在硬化前後之各自具有特定值以上的儲存模數,能夠容易地製成薄片狀物,且在低溫(-20℃)起至高溫(+90℃)之廣泛的溫度範圍,對有機EL元件等的被密封物的密封性優異,而完成了本發明。 In order to solve the above-mentioned problems, the inventors of the present invention concentrated on studying sealant compositions. As a result, they discovered a sealant composition that contains a compound having a cyclic ether group and a binder resin having a functional group that can undergo a curing reaction with the compound having a cyclic ether group, and each has specific properties before and after curing. It has a storage modulus of more than 100%, can be easily formed into a sheet, and has excellent sealing properties against sealed objects such as organic EL elements in a wide temperature range from low temperature (-20°C) to high temperature (+90°C). Excellent, the present invention was completed.
如此依照本發明,能夠提供下述(1)~(17)的密封劑組合物、(18)、(19)的密封片及(20)的密封體。 In this manner, according to the present invention, the following sealant compositions (1) to (17), sealing sheets (18) and (19), and sealing body (20) can be provided.
(1)一種密封劑組合物,其為含有具有環狀醚基的化合物及具有能夠與前述具有環狀醚基的化合物進行硬化反應的官能基之黏結劑樹脂之密封劑組合物,其特徵在於:在23℃之硬化前的儲存模數為104Pa以上,在-20℃以上且+90℃以下的溫度範圍之硬化後的儲存模數為108Pa以上。 (1) A sealant composition containing a compound having a cyclic ether group and a binder resin having a functional group capable of performing a curing reaction with the compound having a cyclic ether group, characterized in that : The storage modulus before hardening at 23°C is 10 4 Pa or more, and the storage modulus after hardening in the temperature range from -20°C to +90°C is 10 8 Pa or more.
(2)如(1)所述之密封劑組合物,其中在23℃之硬化前的儲存模數為1.5×107Pa以下。 (2) The sealant composition according to (1), wherein the storage modulus before hardening at 23°C is 1.5×10 7 Pa or less.
(3)如(1)或(2)所述之密封劑組合物,其中前述具有環狀醚基的化合物的含量,相對於密封劑組合物全體,以固體成分計,為45~90質量%。 (3) The sealant composition according to (1) or (2), wherein the content of the compound having a cyclic ether group is 45 to 90 mass % in terms of solid content relative to the entire sealant composition. .
(4)如(1)或(2)所述之密封劑組合物,其中前述具有官能基之黏結劑樹脂的含量,相對於密封劑組合物全體,以固體成分計,為5~50質量%。 (4) The sealant composition as described in (1) or (2), wherein the content of the binder resin having a functional group is 5 to 50% by mass based on the solid content of the entire sealant composition. .
(5)如(1)或(2)所述之密封劑組合物,其中前述具有環狀醚基的化合物的含量相對於前述具有官能基之黏結劑樹脂100質量份,為110~1800質量份。 (5) The sealant composition as described in (1) or (2), wherein the content of the compound having a cyclic ether group is 110 to 1800 parts by mass relative to 100 parts by mass of the binder resin having a functional group .
(6)如(1)或(2)所述之密封劑組合物,其中前述具有環狀醚基的化合物在25℃為液體,前述具有環狀醚基的化合物的含量,相對於密封劑組合物全體,以固體成分計,為53質量%以上。 (6) The sealant composition as described in (1) or (2), wherein the compound having a cyclic ether group is liquid at 25°C, and the content of the compound having a cyclic ether group is relative to the sealant composition. The total content of the material is 53% by mass or more in terms of solid content.
(7)如(1)或(2)所述之密封劑組合物,其中前述具有環狀醚基的化合物包含具有環氧丙基醚基之環氧樹脂。 (7) The sealant composition according to (1) or (2), wherein the compound having a cyclic ether group contains an epoxy resin having a glycidyl ether group.
(8)如(1)或(2)所述之密封劑組合物,其中前述具有環狀醚基的化合物的分子量為100~5,000。 (8) The sealant composition according to (1) or (2), wherein the molecular weight of the compound having a cyclic ether group is 100 to 5,000.
(9)如(1)或(2)所述之密封劑組合物,其中前述具有官能基之黏結劑樹脂的重量平均分子量(Mw)為10,000~1,000,000。 (9) The sealant composition according to (1) or (2), wherein the weight average molecular weight (Mw) of the binder resin having functional groups is 10,000 to 1,000,000.
(10)如(1)或(2)所述之密封劑組合物,其中前述具有官能基之黏結劑樹脂所具有的官能基是選自由羧基、酸酐基、環氧基及羥基所組成群組之至少一種。 (10) The sealant composition as described in (1) or (2), wherein the functional group of the binder resin having functional groups is selected from the group consisting of carboxyl groups, acid anhydride groups, epoxy groups and hydroxyl groups At least one of them.
(11)如(1)或(2)所述之密封劑組合物,其中前述黏結劑樹脂的玻璃轉移溫度(Tg)為90℃以上。 (11) The sealant composition according to (1) or (2), wherein the glass transition temperature (Tg) of the binder resin is 90°C or higher.
(12)如(1)或(2)所述之密封劑組合物,其中前述具有官能基之黏結劑樹脂是選自由烯烴系樹脂、苯氧基系樹脂及縮醛系樹脂所組成群組之至少一種。 (12) The sealant composition as described in (1) or (2), wherein the binder resin having functional groups is selected from the group consisting of olefin resins, phenoxy resins and acetal resins At least one.
(13)如(1)或(2)所述之密封劑組合物,其中在密封劑組合物所包含之液狀的具有環狀醚基的化合物的含量為65質量%以下。 (13) The sealant composition according to (1) or (2), wherein the content of the liquid compound having a cyclic ether group contained in the sealant composition is 65 mass % or less.
(14)如(1)或(2)所述之密封劑組合物,其中進一步含有硬化觸媒。 (14) The sealant composition according to (1) or (2), further containing a curing catalyst.
(15)如(14)所述之密封劑組合物,其中前述硬化觸媒的含量,相對於前述具有環狀醚基的化合物100質量份,為0.01~15質量份。 (15) The sealant composition according to (14), wherein the content of the hardening catalyst is 0.01 to 15 parts by mass relative to 100 parts by mass of the compound having a cyclic ether group.
(16)如(1)或(2)所述之密封劑組合物,其中進一步含有矽烷偶合劑。 (16) The sealant composition according to (1) or (2), further containing a silane coupling agent.
(17)如(16)所述之密封劑組合物,其中前述矽烷偶合劑的含量,相對於密封劑組合物全體,以固體成分計,為0.01~5質量%。 (17) The sealant composition according to (16), wherein the content of the silane coupling agent is 0.01 to 5 mass % based on the solid content of the entire sealant composition.
(18)一種密封片,其為由2片剝離膜及被該等剝離膜挾持的密封劑層所構成之密封片,前述密封劑層是使用如(1)至(17)項中任一項所述之密封劑組合物而形成之物。 (18) A sealing sheet composed of two release films and a sealant layer sandwiched by the release films. The sealant layer is made of any one of items (1) to (17). The sealant composition is formed from the sealant composition.
(19)如(18)所述之密封片,其中密封劑層的厚度為1~25μm。 (20)一種密封體,使用如(18)或(19)所述之密封片將被密封物密封而成。(19) The sealing sheet as described in (18), wherein the thickness of the sealant layer is 1~25 μm. (20) A sealing body formed by sealing the object to be sealed using the sealing sheet as described in (18) or (19).
依照本發明,能夠提供一種容易加工成為薄片狀物且加工性優異,而且在低溫(-20℃)起至高溫(+90℃)之廣泛的溫度區域能夠形成對有機EL元件等的被密封物的密封性優異之密封層之密封劑組合物;具有使用該密封劑組合物而形成的密封劑層之密封片;以及經該密封片密封而成之密封體。According to the present invention, it is possible to provide a product that can be easily processed into a sheet-like object and has excellent processability, and can form a sealed object for organic EL elements and the like in a wide temperature range from low temperature (-20°C) to high temperature (+90°C). A sealant composition having a sealant layer with excellent sealing properties; a sealant sheet having a sealant layer formed using the sealant composition; and a sealed body sealed by the sealant sheet.
用以實施發明之形態Form used to implement the invention
以下,將本發明分項成為1)密封劑組合物、2)密封片及3)密封體而詳細地說明。Hereinafter, the present invention will be divided into 1) sealant composition, 2) sealing sheet, and 3) sealing body and will be described in detail.
1)密封劑組合物 本發明的密封劑組合物,是含有具有環狀醚基的化合物及具有能夠與前述具有環狀醚基的化合物進行硬化反應的官能基之黏結劑樹脂之密封劑組合物,其特徵在於:在23℃之硬化前的儲存模數為104 Pa以上,在-20℃以上且+90℃以下的溫度範圍之硬化後的儲存模數為108 Pa以上。1) Sealant composition The sealant composition of the present invention is a sealant composition containing a compound having a cyclic ether group and a binder resin having a functional group capable of performing a curing reaction with the compound having a cyclic ether group. , characterized in that the storage modulus before hardening at 23°C is 10 4 Pa or more, and the storage modulus after hardening in the temperature range of -20°C or more and +90°C or less is 10 8 Pa or more.
[儲存模數] 本發明的密封劑組合物,在23℃之硬化前的儲存模數為104 Pa以上,良好為105 Pa以上,較佳為6×105 Pa以上。又,本發明的密封劑組合物在23℃之硬化前的儲存模數為108 Pa以下,良好為107 Pa以下,較佳為4×106 Pa以下。 在23℃之硬化前的儲存模數為該範圍之密封劑組合物,容易成形為薄片狀物且加工性優異。 又,本發明的密封劑組合物,在-20℃以上且+90℃以下的溫度範圍之硬化後的儲存模數為108 Pa以上,良好為108 Pa~1011 Pa,較佳為2×108 Pa~1010 Pa。 在-23℃~+90℃之硬化後的儲存模數為該範圍之密封劑組合物,在廣泛的溫度區域(-20℃~+90℃)具有優異的密封性。[Storage Modulus] The sealant composition of the present invention has a storage modulus before hardening at 23°C of 10 4 Pa or more, preferably 10 5 Pa or more, and preferably 6×10 5 Pa or more. Moreover, the storage modulus of the sealant composition of the present invention before curing at 23°C is 10 8 Pa or less, preferably 10 7 Pa or less, and preferably 4×10 6 Pa or less. A sealant composition having a storage modulus before hardening at 23° C. within this range is easily formed into a sheet and has excellent processability. In addition, the sealant composition of the present invention has a storage modulus after curing in a temperature range of -20°C or more and +90°C or less: 10 8 Pa or more, preferably 10 8 Pa to 10 11 Pa, and preferably 2 ×10 8 Pa~10 10 Pa. A sealant composition with a cured storage modulus within this range of -23°C to +90°C has excellent sealing properties in a wide temperature range (-20°C to +90°C).
密封劑組合物的儲存模數,是使用習知的動態黏彈性測定裝置而測定。 硬化前的儲存模數,能夠將本發明的密封劑組合物加工成為薄片狀而得到的密封片(無剝離片),使用貼合機且在23℃使其層積至試樣厚度1mm之後,且採用該物作為測定用試料,使用習知的儲存模數測定裝置而測定。具體而言,能夠使用實施例記載的方法而測定。 又,硬化後的儲存模數,能夠將本發明的密封劑組合物加工成為薄片狀而得到的密封片(無剝離片),使用貼合機且在23℃使其層積至試樣厚度200μm之後,在100℃、1小時的硬化條件下使密封片的密封劑層硬化,且採用該物作為測定用試料,使用習知的儲存模數測定裝置而測定。具體而言,能夠使用實施例記載的方法而測定。The storage modulus of the sealant composition is measured using a conventional dynamic viscoelasticity measuring device. The storage modulus before hardening can be obtained by processing the sealant composition of the present invention into a sheet-like sealing sheet (without peeling sheet) and laminating it to a sample thickness of 1 mm using a laminating machine at 23°C. This product was used as a measurement sample and measured using a conventional storage modulus measuring device. Specifically, it can be measured using the method described in the Examples. In addition, the storage modulus after hardening can be obtained by processing the sealant composition of the present invention into a sheet-like sealing sheet (without peeling sheet) and laminating it at 23° C. to a sample thickness of 200 μm using a laminating machine. Thereafter, the sealant layer of the sealing sheet was cured under curing conditions of 100° C. for 1 hour, and this was used as a measurement sample, and measured using a conventional storage modulus measuring device. Specifically, it can be measured using the method described in the Examples.
[具有環狀醚基的化合物] 本發明的密封劑組合物含有具有環狀醚基的化合物(以下有稱為「環狀醚化合物(A)」之情形。 環狀醚化合物(A)能夠提供一種與具有官能基之黏結劑樹脂的相容性優異且黏著性優異之硬化物。因而,藉由使用該物,而能夠得到一種薄片加工性(造膜性)優異之密封劑組合物、以及一種無色透明性及水蒸氣隔離性優異之密封劑組合物的硬化物。[Compounds with cyclic ether groups] The sealant composition of the present invention contains a compound having a cyclic ether group (hereinafter sometimes referred to as "cyclic ether compound (A)"). The cyclic ether compound (A) can provide a cured product having excellent compatibility with a binder resin having a functional group and excellent adhesiveness. Therefore, by using this substance, it is possible to obtain a sealant composition excellent in sheet processability (film-forming properties) and a cured product of the sealant composition excellent in colorless transparency and water vapor barrier properties.
所謂環狀醚化合物(A),是指在分子內具有1個、較佳為2個以上的環狀醚基之化合物。又,在本發明,後述苯氧基樹脂被設定為不被環狀醚化合物(A)所包含之物。 The cyclic ether compound (A) refers to a compound having one, preferably two or more cyclic ether groups in the molecule. Furthermore, in the present invention, the phenoxy resin described below is not included in the cyclic ether compound (A).
環狀醚化合物(A)的分子量,通常為100~5,000,較佳為200~3,000。 The molecular weight of the cyclic ether compound (A) is usually 100 to 5,000, preferably 200 to 3,000.
環狀醚化合物(A)的環狀醚當量,良好為50g/eq以上且1000g/eq以下,較佳為100g/eq以上且800g/eq以下。 The cyclic ether equivalent of the cyclic ether compound (A) is preferably from 50 g/eq to 1000 g/eq, and preferably from 100 g/eq to 800 g/eq.
藉由使用環狀醚化合物(A)的環狀醚當量為上述範圍之密封劑組合物,能夠效率更良好地形成黏著強度高且硬化性優異之密封材。 By using a sealant composition in which the cyclic ether equivalent of the cyclic ether compound (A) is in the above range, a sealing material with high adhesive strength and excellent curability can be formed more efficiently.
在本發明所謂環狀醚當量,意味著將分子量除以環狀醚基數而得到的值。 In the present invention, the cyclic ether equivalent means a value obtained by dividing the molecular weight by the number of cyclic ether groups.
作為環狀醚基,可舉出氧環丙烷基(oxirane group,環氧基)、氧環丁烷基(氧雜環丁烷基,oxetanyl group)、四氫呋喃基、四氫吡喃基(tetrahydropyranyl group)、環氧丙基(glycidyl group)、環氧丙基醚(glycidyl ether group)基等。該等之中,從能夠得到薄片加工性(造膜性)更優異之密封劑組合物及黏著強度更優異之密封劑組合物的硬化物之觀點而言,以具有氧環丙烷基或氧環丁烷基、環氧丙基或環氧丙基醚基之化合物為佳,以在分子內具有2個以上的氧環丙烷基、氧環丁烷基、環氧丙基或環氧丙基醚基之化合物較佳,以在分子內具有2個以上的氧環丙烷基、環氧丙基或環氧丙基醚基之化合物為特佳。 Examples of the cyclic ether group include an oxirane group (epoxy group), an oxetanyl group (oxetanyl group), a tetrahydrofuranyl group, and a tetrahydropyranyl group (tetrahydropyranyl group). ), glycidyl group, glycidyl ether group, etc. Among them, from the viewpoint of obtaining a cured product of a sealant composition with better sheet processability (film-forming properties) and a sealant composition with better adhesive strength, those having an oxycyclopropane group or an oxycyclic ring Compounds with butyl, glycidyl or glycidyl ether groups are preferred, those with more than 2 oxycyclopropyl, oxycyclobutanyl, glycidyl or glycidyl ether groups in the molecule Compounds having oxycyclopropyl groups, glycidyl ether groups or glycidyl ether groups are particularly preferred.
作為在分子內具有氧環丙烷基之化合物,可舉出,例如,脂肪族環氧化合物(脂環式環氧化合物除外)、芳香族環氧化合物、脂環式環氧化合物等。 Examples of compounds having an oxycyclopropyl group in the molecule include aliphatic epoxy compounds (excluding alicyclic epoxy compounds), aromatic epoxy compounds, alicyclic epoxy compounds, and the like.
作為脂肪族環氧化合物,可舉出脂肪族醇的環氧丙基醚化物、烷基羧酸的環氧丙酯等的單官能環氧化合物;脂肪族多元醇、或其環氧烷加成物(alkylene oxide adduct)的聚環氧丙基醚化物、脂肪族長鏈多元酸的聚環氧丙酯、具有三嗪骨架之環氧化合物等的多官能環氧化合物。 Examples of aliphatic epoxy compounds include monofunctional epoxy compounds such as glycidyl etherates of aliphatic alcohols and glycidyl esters of alkyl carboxylic acids; aliphatic polyols, or alkylene oxide additions thereof; Polyfunctional epoxy compounds such as polyglycidyl etherates of alkylene oxide adduct, polyglycidyl esters of aliphatic long-chain polybasic acids, and epoxy compounds with triazine skeletons.
作為該等脂肪族環氧化合物的代表性化合物,可舉出烯丙基環氧丙基醚、丁基環氧丙基醚、2-乙基己基環氧丙基醚、C12~13混合烷基環氧丙基醚、1,4-丁二醇二環氧丙基醚、新戊二醇二環氧丙基醚、甘油的三環氧丙基醚、三羥甲基丙烷的三環氧丙基醚、山梨糖醇的四環氧丙基醚、二新戊四醇的六環氧丙基醚、聚乙二醇的二環氧丙基醚、聚丙二醇的二環氧丙基醚、二環戊二烯二甲醇二環氧丙基醚等的多元醇的環氧丙基醚、或藉由將1種或2種以上的環氧烷附加在丙二醇、三羥甲基丙烷、甘油等的脂肪族多元醇而得到之聚醚多元醇的聚環氧丙基醚化物、脂肪族長鏈二元酸的二環氧丙酯; 脂肪族高級醇的單環氧丙基醚、高級脂肪酸的環氧丙酯、環氧化大豆油、環氧硬脂酸辛酯、環氧硬脂酸丁酯、環氧化聚丁二烯;2,4,6-三(環氧丙氧基)-1,3,5-三嗪等。Representative compounds of these aliphatic epoxy compounds include allyl glycidyl ether, butyl glycidyl ether, 2-ethylhexyl glycidyl ether, and C12-13 mixed alkyl ether. Glycidyl ether, 1,4-butanediol diglycidyl ether, neopentyl glycol diglycidyl ether, glycerol triglycidyl ether, trimethylolpropane triglycidyl ether ether, tetraglycidyl ether of sorbitol, hexaglycidyl ether of dineopenterythritol, diepoxypropyl ether of polyethylene glycol, diepoxypropyl ether of polypropylene glycol, Glycidyl ethers of polyols such as cyclopentadienyl dimethanol diglycidyl ether, or by adding one or more alkylene oxides to propylene glycol, trimethylolpropane, glycerin, etc. Polyglycidyl etherates of polyether polyols obtained from aliphatic polyols, and diepoxypropyl esters of aliphatic long-chain dibasic acids; Monoglycidyl ether of aliphatic higher alcohol, glycidyl ester of higher fatty acid, epoxidized soybean oil, octyl epoxy stearate, butyl epoxy stearate, epoxidized polybutadiene; 2,4 , 6-tris(glycidoxy)-1,3,5-triazine, etc.
又,作為脂肪族環氧化合物,亦能夠使用市售品。作為市售品,可舉出DENACOL EX-121、DENACOL EX-171、DENACOL EX-192、DENACOL EX-211、DENACOL EX-212、DENACOL EX-313、DENACOL EX-314、DENACOL EX-321、DENACOL EX-411、DENACOL EX-421、DENACOL EX-512、DENACOL EX-521、DENACOL EX-611、DENACOL EX-612、DENACOL EX-614、DENACOL EX-622、DENACOL EX- 810、DENACOL EX-811、DENACOL EX-850、DENACOL EX-851、DENACOL EX-821、DENACOL EX-830、DENACOL EX-832、DENACOL EX-841、DENACOL EX-861、DENACOL EX-911、DENACOL EX- 941、DENACOL EX-920、DENACOL EX-931 (以上,NAGASE CHEMTEX公司製);Epolite M-1230、Epolite 40E、Epolite 100E、Epolite 200E、Epolite 400E、Epolite 70P、Epolite 200P、Epolite 400P、Epolite 1500NP、Epolite 1600、Epolite 80MF、Epolite 100 MF (以上,共榮社化學公司製);Adeka Glycilol ED-503、Adeka Glycilol ED-503G、Adeka Glycilol ED-506、Adeka Glycilol ED-523T、ADEKARESIN EP-4088S、ADEKARESIN EP-4088L、ADEKARESIN EP-4080E (以上,ADEKA公司製);TEPIC-FL、TEPIC-PAS、TEPIC-UC (以上,日產化學公司製)等。In addition, as the aliphatic epoxy compound, a commercially available product can also be used. Examples of commercially available products include DENACOL EX-121, DENACOL EX-171, DENACOL EX-192, DENACOL EX-211, DENACOL EX-212, DENACOL EX-313, DENACOL EX-314, DENACOL EX-321, and DENACOL EX. -411, DENACOL EX-421, DENACOL EX-512, DENACOL EX-521, DENACOL EX-611, DENACOL EX-612, DENACOL EX-614, DENACOL EX-622, DENACOL EX-810, DENACOL EX-811, DENACOL EX -850, DENACOL EX-851, DENACOL EX-821, DENACOL EX-830, DENACOL EX-832, DENACOL EX-841, DENACOL EX-861, DENACOL EX-911, DENACOL EX-941, DENACOL EX-920, DENACOL EX -931 (above, manufactured by NAGASE CHEMTEX); Epolite M-1230, Epolite 40E, Epolite 100E, Epolite 200E, Epolite 400E, Epolite 70P, Epolite 200P, Epolite 400P, Epolite 1500NP, Epolite 1600, Epolite 80MF, Epolite 10 0 MF ( Above, manufactured by Kyoeisha Chemical Co., Ltd.); Adeka Glycilol ED-503, Adeka Glycilol ED-503G, Adeka Glycilol ED-506, Adeka Glycilol ED-523T, ADEKARESIN EP-4088S, ADEKARESIN EP-4088L, ADEKARESIN EP-4080E (above) , manufactured by ADEKA Co., Ltd.); TEPIC-FL, TEPIC-PAS, TEPIC-UC (the above, manufactured by Nissan Chemical Co., Ltd.), etc.
作為芳香族環氧化合物,可舉出苯酚、甲酚、丁基苯酚等的具有至少1個以上的芳香族環之多元醇、或其環氧烷加成物的單/多環氧丙基醚化物等。 作為該等芳香族環氧化合物的代表性化合物,可舉出雙酚A、雙酚F、或進一步將環氧烷附加在該等而成之化合物的環氧丙基醚化物和環氧酚醛清漆樹脂; 間苯二酚(resorcinol)、對苯二酚(hydroquinone)、兒茶酚(catechol)等的具有2個以上的酚性羥基之芳香族化合物的單/多環氧丙基醚化物;苯基二甲醇、苯基二乙醇、苯基二丁醇等的具有2個以上的醇性羥基之芳香族化合物的環氧丙基醚化物;鄰苯二甲酸、對苯二甲酸、偏苯三甲酸等的具有2個以上的羧酸之多元酸芳香族化合物的環氧丙酯、苯甲酸的環氧丙酯、氧化苯乙烯或二乙烯苯的環氧化物等。Examples of the aromatic epoxy compound include polyols having at least one aromatic ring such as phenol, cresol, butylphenol, or mono/polyepoxypropyl ethers of their alkylene oxide adducts. Chemicals etc. Representative compounds of these aromatic epoxy compounds include bisphenol A, bisphenol F, or glycidyl etherates and epoxy novolacs obtained by adding an alkylene oxide to these compounds. Resin; Mono/polyepoxypropyl etherates of aromatic compounds with two or more phenolic hydroxyl groups such as resorcinol, hydroquinone, catechol, etc.; phenyldi Glycidyl etherates of aromatic compounds with two or more alcoholic hydroxyl groups such as methanol, phenyldiethanol, phenyldibutanol, etc.; phthalic acid, terephthalic acid, trimellitic acid, etc. Glycidyl ester of a polybasic acid aromatic compound having two or more carboxylic acids, glycidyl ester of benzoic acid, epoxide of styrene oxide or divinylbenzene, etc.
又,作為芳香族環氧化合物,亦能夠使用市售品。作為市售品,可舉出DENACOL EX-146、DENACOL EX-147、DENACOL EX-201、DENACOL EX-203、DENACOL EX-711、DENACOL EX-721、ONCOAT EX-1020、ONCOAT EX-1030、ONCOAT EX-1040、ONCOAT EX-1050、ONCOAT EX-1051、ONCOAT EX-1010、ONCOAT EX-1011、ONCOAT 1012 (以上,NAGASE CHEMTEX公司製);OGSOL PG-100、OGSOL EG-200、OGSOL EG-210、OGSOL EG-250 (以上,大阪GAS CHEMICAL公司製);HP4032、HP4032D、HP4700 (以上,DIC公司製);ESN-475V (以上,新日鐵住金化學公司製);JER (舊EPICOAT)YX8800 (以上,三菱化學公司製);MERPROOF G-0105SA、MERPROOF G-0130SP (以上,日油(股)公司製);Epiclon N-665、Epiclon HP-7200 (以上,DIC公司製);EOCN-1020、EOCN-102S、EOCN-103S、EOCN-104S、XD-1000、NC-3000、EPPN-501H、EPPN-501HY、EPPN-502H、NC-7000L (以上,日本化藥公司製);ADEKARESIN EP-4000、ADEKARESIN EP-4005、ADEKARESIN EP-4100、ADEKARESIN EP-4901 (以上,ADEKA公司製);TECHMORE VG-3101L (以上,Printec公司製)等。In addition, as the aromatic epoxy compound, commercially available products can also be used. Examples of commercially available products include DENACOL EX-146, DENACOL EX-147, DENACOL EX-201, DENACOL EX-203, DENACOL EX-711, DENACOL EX-721, ONCOAT EX-1020, ONCOAT EX-1030, and ONCOAT EX. -1040, ONCOAT EX-1050, ONCOAT EX-1051, ONCOAT EX-1010, ONCOAT EX-1011, ONCOAT 1012 (above, manufactured by NAGASE CHEMTEX); OGSOL PG-100, OGSOL EG-200, OGSOL EG-210, OGSOL EG-250 (above, manufactured by Osaka GAS CHEMICAL Co., Ltd.); HP4032, HP4032D, HP4700 (above, manufactured by DIC Corporation); ESN-475V (above, manufactured by Nippon Steel & Sumitomo Metal Chemical Co., Ltd.); JER (former EPICOAT) YX8800 (above, manufactured by DIC Corporation) Mitsubishi Chemical Corporation); MERPROOF G-0105SA, MERPROOF G-0130SP (above, manufactured by NOF Corporation); Epiclon N-665, Epiclon HP-7200 (above, manufactured by DIC Corporation); EOCN-1020, EOCN- 102S, EOCN-103S, EOCN-104S, XD-1000, NC-3000, EPPN-501H, EPPN-501HY, EPPN-502H, NC-7000L (the above, manufactured by Nippon Chemical Co., Ltd.); ADEKARESIN EP-4000, ADEKARESIN EP -4005, ADEKARESIN EP-4100, ADEKARESIN EP-4901 (the above, made by ADEKA); TECHMORE VG-3101L (the above, made by Printec), etc.
作為脂環式環氧化合物,可舉出具有至少1個以上的脂環式結構之多元醇的聚環氧丙基醚化物、或藉由使用氧化劑將含有環己烯和環戊烯環的化合物環氧化而得到之含有環氧環己烷(cyclohexene oxide)和環氧環戊烷(cyclopetene oxide)之化合物。 作為該等脂環式環氧化合物的代表性化合物,可舉出氫化雙酚A二環氧丙基醚、3,4-環氧環己基甲基-3,4-環氧環己烷羧酸酯、3,4-環氧-1-甲基環己基-3,4-環氧-1-甲基己烷羧酸酯、6-甲基-3,4-環氧環己基甲基-6-甲基-3,4-環氧環己烷羧酸酯、3,4-環氧-3-甲基環己基甲基-3,4-環氧-3-甲基環己烷羧酸酯、3,4-環氧-5-甲基環己基甲基-3,4-環氧-5-甲基環己烷羧酸酯、雙(3,4-環氧環己基甲基)己二酸酯、3,4-環氧-6-甲基環己烷羧酸酯、亞甲基雙(3,4-環氧環己烷)、丙烷-2,2-二基-雙(3,4-環氧環己烷)、2,2-雙(3,4-環氧環己基)丙烷、二環戊二烯二環氧化物(dicyclopentadiene diepoxide)、伸乙基雙(3,4-環氧環己烷羧酸酯)、環氧六氫鄰苯二甲酸二辛酯、環氧六氫鄰苯二甲酸二-2-乙基己酯、1-環氧基乙基-3,4-環氧環己烷、1,2-環氧-2-環氧基乙基環己烷、α-氧化蒎烯(α-pinene oxide)、二氧化檸檬烯(limonene dioxide)等。Examples of the alicyclic epoxy compound include polyglycidyl etherates of polyhydric alcohols having at least one alicyclic structure, or compounds containing cyclohexene and cyclopentene rings prepared by using an oxidizing agent. Compounds containing cyclohexene oxide and cyclopetene oxide obtained by epoxidation. Representative compounds of these alicyclic epoxy compounds include hydrogenated bisphenol A diglycidyl ether and 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylic acid. Ester, 3,4-epoxy-1-methylcyclohexyl-3,4-epoxy-1-methylhexanecarboxylate, 6-methyl-3,4-epoxycyclohexylmethyl-6 -Methyl-3,4-epoxycyclohexanecarboxylate, 3,4-epoxy-3-methylcyclohexylmethyl-3,4-epoxy-3-methylcyclohexanecarboxylate , 3,4-epoxy-5-methylcyclohexylmethyl-3,4-epoxy-5-methylcyclohexanecarboxylate, bis(3,4-epoxycyclohexylmethyl)hexanedi Acid ester, 3,4-epoxy-6-methylcyclohexanecarboxylate, methylene bis(3,4-epoxycyclohexane), propane-2,2-diyl-bis(3, 4-epoxycyclohexane), 2,2-bis(3,4-epoxycyclohexyl)propane, dicyclopentadiene diepoxide, ethylidene bis(3,4-cyclohexane) Oxycyclohexane carboxylate), dioctyl epoxy hexahydrophthalate, di-2-ethylhexyl epoxy hexahydrophthalate, 1-epoxyethyl-3,4- Epoxycyclohexane, 1,2-epoxy-2-epoxyethylcyclohexane, α-pinene oxide, limonene dioxide, etc.
又,作為脂環式環氧化合物,亦能夠使用市售品。作為市售品,可舉出YX8000、YX8034 (以上,三菱化學公司製)、CELLOXIDE 2021P、CELLOXIDE 2081、CELLOXIDE 2000、CELLOXIDE3000 (以上,DAICEL公司製)、EP-4088L (ADEKA公司製)等。In addition, as the alicyclic epoxy compound, a commercially available product can also be used. Examples of commercially available products include YX8000, YX8034 (above, manufactured by Mitsubishi Chemical Corporation), CELLOXIDE 2021P, CELLOXIDE 2081, CELLOXIDE 2000, CELLOXIDE3000 (above, manufactured by DAICEL Corporation), EP-4088L (manufactured by ADEKA Corporation), and the like.
作為在分子內具有氧環丁烷基之化合物,可舉出3,7-雙(3-氧雜環丁烷基)-5-氧雜-壬烷、1,4-雙[(3-乙基-3-氧雜環丁烷基甲氧基)甲基]苯、1,2-雙[(3-乙基-3-氧雜環丁烷基甲氧基)甲基]乙烷、1,3-雙[(3-乙基-3-氧雜環丁烷基甲氧基)甲基]丙烷、乙二醇雙(3-乙基-3-氧雜環丁烷基甲基)醚、三乙二醇雙(3-乙基-3-氧雜環丁烷基甲基)醚、四乙二醇雙(3-乙基-3-氧雜環丁烷基甲基)醚、1,4-雙(3-乙基-3-氧雜環丁烷基甲氧基)丁烷、1,6-雙(3-乙基-3-氧雜環丁烷基甲氧基)己烷等的二官能脂肪族氧環丁烷化合物、3-乙基-3-[(苯氧基)甲基]氧環丁烷、3-乙基-3-(己氧基甲基)氧環丁烷、3-乙基-3-(2-乙基己氧基甲基)氧環丁烷、3-乙基-3-(羥甲基)氧環丁烷、3-乙基-3-(氯甲基)氧環丁烷等的一官能氧環丁烷化合物等。Examples of compounds having an oxetanyl group in the molecule include 3,7-bis(3-oxetanyl)-5-oxa-nonane, 1,4-bis[(3-ethyl) methyl-3-oxetanylmethoxy)methyl]benzene, 1,2-bis[(3-ethyl-3-oxetanylmethoxy)methyl]ethane, 1 , 3-bis[(3-ethyl-3-oxetanylmethoxy)methyl]propane, ethylene glycol bis(3-ethyl-3-oxetanylmethyl) ether , triethylene glycol bis(3-ethyl-3-oxetanylmethyl) ether, tetraethylene glycol bis(3-ethyl-3-oxetanylmethyl) ether, 1 ,4-bis(3-ethyl-3-oxetanylmethoxy)butane, 1,6-bis(3-ethyl-3-oxetanylmethoxy)hexane Difunctional aliphatic oxycyclobutane compounds, 3-ethyl-3-[(phenoxy)methyl]oxycyclobutane, 3-ethyl-3-(hexyloxymethyl)oxycyclobutane alkane, 3-ethyl-3-(2-ethylhexyloxymethyl)oxycyclobutane, 3-ethyl-3-(hydroxymethyl)oxycyclobutane, 3-ethyl-3-( Monofunctional oxycyclobutane compounds such as chloromethyl) oxycyclobutane, etc.
作為在分子內具有氧環丁烷基之化合物,亦能夠使用市售品。作為市售品,可舉出2-羥乙基乙烯醚、二乙二醇單乙烯醚、4-羥丁基乙烯醚(以上,丸善石油化學公司製);ARONOXETANE OXT-121、OXT-221、EXOH、POX、OXA、OXT-101、OXT-211、OXT-212 (以上,東亞合成公司製);ETERNACOLL OXBP、OXTP (以上,宇部興產公司製)等。As a compound having an oxybutanyl group in the molecule, commercially available products can also be used. Examples of commercially available products include 2-hydroxyethyl vinyl ether, diethylene glycol monovinyl ether, and 4-hydroxybutyl vinyl ether (manufactured by Maruzen Petrochemical Co., Ltd.); ARONOXETANE OXT-121, OXT-221, EXOH, POX, OXA, OXT-101, OXT-211, OXT-212 (the above, manufactured by Toa Gosei Co., Ltd.); ETERNACOLL OXBP, OXTP (the above, manufactured by Ube Kosan Co., Ltd.), etc.
該等環狀醚化合物(A)能夠單獨1種或組合2種以上而使用。 該等之中,從能夠得到薄片加工性(造膜性)更優異之密封劑組合物及黏著強度更優異之密封劑組合物的硬化物的觀點而言,以在25℃為液狀(液體)之物為佳。在此,所謂液體,是指物質的聚集狀態之一,大致具有一定的體積但是不具有固有形狀的狀態之物These cyclic ether compounds (A) can be used individually by 1 type or in combination of 2 or more types. Among them, the one that is liquid at 25° C. (liquid ) is better. Here, the so-called liquid refers to one of the aggregated states of matter, a state that has a roughly certain volume but does not have an inherent shape.
在密封劑組合物中之環狀醚化合物(A)的含量,相對於密封劑組合物全體,以固體成分計,較佳為45~90質量%,更佳為50~85質量%,又更佳為60~80質量%。 藉由將環狀醚化合物(A)的含量設為上述範圍,容易得到黏著強度更優異之密封劑組合物的硬化物。The content of the cyclic ether compound (A) in the sealant composition is preferably 45 to 90 mass %, more preferably 50 to 85 mass %, and more preferably 50 to 85 mass % in terms of solid content relative to the entire sealant composition. Preferably, it is 60~80% by mass. By setting the content of the cyclic ether compound (A) in the above range, it is easy to obtain a cured product of the sealant composition having more excellent adhesive strength.
[具有官能基之黏結劑樹脂] 本發明的密封劑組合物,除了環狀醚化合物(A)以外,亦含有具有能夠與前述環狀醚化合物(A)進行硬化反應的官能基之黏結劑樹脂(以下,有稱為「黏結劑樹脂(B)」之情形)。[Binder resin with functional groups] The sealant composition of the present invention, in addition to the cyclic ether compound (A), also contains a binder resin (hereinafter referred to as "binder") having a functional group that can undergo a curing reaction with the cyclic ether compound (A). Resin (B)" case).
黏結劑樹脂(B)的重量平均分子量(Mw),沒有特別限定,從與環狀醚化合物(A)的相容性更優異且更容易得到薄片狀物的觀點而言,以10,000以上為佳,以10,000~1,000,000為較佳,以10,000~800,000為更佳。 黏結劑樹脂(B)的重量平均分子量(Mw),能夠使用四氫呋喃(THF)作為溶劑而進行凝膠滲透層析法(GPC),且以標準聚苯乙烯換算值之方式求取。The weight average molecular weight (Mw) of the binder resin (B) is not particularly limited, but is preferably 10,000 or more from the viewpoint of better compatibility with the cyclic ether compound (A) and easier production of flakes. , 10,000~1,000,000 is better, 10,000~800,000 is better. The weight average molecular weight (Mw) of the binder resin (B) can be determined by gel permeation chromatography (GPC) using tetrahydrofuran (THF) as a solvent and as a standard polystyrene conversion value.
在密封劑組合物中之黏結劑樹脂(B)的含量,相對於密封劑組合物全體,以固體成分計,為5~50質量%為佳,以10~45質量%為較佳。 藉由使黏結劑樹脂(B)的含量,相對於密封劑組合物全體,以固體成分計,為5~45質量%,容易得到薄片成形性及加工性更優異之密封劑組合物。The content of the binder resin (B) in the sealant composition is preferably 5 to 50 mass %, and more preferably 10 to 45 mass % in terms of solid content relative to the entire sealant composition. By setting the content of the binder resin (B) to 5 to 45% by mass in terms of solid content relative to the entire sealant composition, a sealant composition with better sheet formability and processability can be easily obtained.
作為黏結劑樹脂(B)所具有的官能基,可舉出羧基、羧酸酐基、羧酸酯基、羥基、環氧基、醯胺基、銨基、腈基、胺基、醯亞胺基、異氰酸酯基、乙醯基、硫醇基、醚基、硫醚基、碸基、膦基、硝基、胺甲酸乙酯基、烷氧矽烷基、矽烷醇基、鹵素原子等。該等之中,以羧基、羧酸酐基、羧酸酯基、羥基、環氧基為佳,以羧基、羧酸酐基、環氧基、羥基為較佳。黏結劑樹脂(B)亦可在分子內具有2種以上的官能基。Examples of the functional group that the binder resin (B) has include a carboxyl group, a carboxylic anhydride group, a carboxylic acid ester group, a hydroxyl group, an epoxy group, an amide group, an ammonium group, a nitrile group, an amine group, and an amide group. , isocyanate group, acetyl group, thiol group, ether group, thioether group, styrene group, phosphine group, nitro group, urethane group, alkoxysilyl group, silanol group, halogen atom, etc. Among these, a carboxyl group, a carboxylic anhydride group, a carboxylate group, a hydroxyl group, and an epoxy group are preferred, and a carboxyl group, a carboxylic anhydride group, an epoxy group, and a hydroxyl group are preferred. The binder resin (B) may have two or more functional groups in the molecule.
作為黏結劑樹脂(B),只要是與環狀醚化合物(A)具有相容性,且具有能夠與環狀醚化合物(A)所具有的環狀醚基進行硬化反應的官能基之物,就沒有特別限定。其中,以選自由改性烯烴系樹脂、苯氧基(phenoxy)系樹脂及縮醛(acetal)系樹脂所組成群組之至少一種為佳。 該等樹脂能夠單獨1種或組合2種以上而使用。As long as the binder resin (B) is compatible with the cyclic ether compound (A) and has a functional group capable of performing a curing reaction with the cyclic ether group of the cyclic ether compound (A), There are no special restrictions. Among them, at least one selected from the group consisting of modified olefin-based resins, phenoxy-based resins, and acetal-based resins is preferred. These resins can be used individually by 1 type or in combination of 2 or more types.
(改性烯烴系樹脂) 改性烯烴系樹脂,是導入了官能基之烯烴系樹脂,其能夠藉由使用改性劑對作為前驅物的烯烴系樹脂施行改性處理而得到。(Modified olefin resin) Modified olefin-based resin is an olefin-based resin into which functional groups have been introduced, and can be obtained by subjecting an olefin-based resin as a precursor to a modification process using a modifier.
所謂烯烴系樹脂,是指含有源自烯烴系單體的重複單元之聚合物。烯烴系樹脂可為僅由源自烯烴系單體的重複單元所構成之聚合物,亦可為由源自烯烴系單體的重複單元及源自能夠與烯烴系單體共聚合的單體的重複單元所構成之聚合物。Olefin-based resin refers to a polymer containing repeating units derived from olefin-based monomers. The olefin-based resin may be a polymer composed only of repeating units derived from an olefin-based monomer, or may be a polymer composed of repeating units derived from an olefin-based monomer and a monomer copolymerizable with an olefin-based monomer. A polymer composed of repeating units.
作為烯烴系單體,以碳數2~8的α-烯烴為佳,以乙烯、丙烯、1-丁烯、異丁烯、或1-己烯為較佳,以乙烯或丙烯為更佳。 該等烯烴系單體能夠單獨1種或組合2種以上而使用。 作為能夠與烯烴系單體共聚合的單體,可舉出乙酸乙烯酯、(甲基)丙烯酸酯、苯乙烯等。在此,「(甲基)丙烯酸」表示丙烯酸或甲基丙烯酸(以下相同)。 該等能夠與烯烴系單體共聚合的單體能夠單獨1種或組合2種以上而使用。The olefin-based monomer is preferably an α-olefin having 2 to 8 carbon atoms, more preferably ethylene, propylene, 1-butene, isobutylene, or 1-hexene, and more preferably ethylene or propylene. These olefin-based monomers can be used individually by 1 type or in combination of 2 or more types. Examples of the monomer copolymerizable with the olefin-based monomer include vinyl acetate, (meth)acrylate, styrene, and the like. Here, "(meth)acrylic acid" means acrylic acid or methacrylic acid (the same applies below). These monomers copolymerizable with olefin-based monomers can be used individually by 1 type or in combination of 2 or more types.
作為烯烴系樹脂,可舉出超低密度聚乙烯(VLDPE)、低密度聚乙烯(LDPE)、中密度聚乙烯(MDPE)、高密度聚乙烯(HDPE)、直鏈狀低密度聚乙烯(LLDPE)、聚丙烯(PP)、乙烯-丙烯共聚物、烯烴系彈性體(TPO)、乙烯-乙酸乙烯酯共聚物(EVA)、乙烯-(甲基)丙烯酸共聚物、乙烯-(甲基)丙烯酸酯共聚物等。Examples of olefin resins include ultra-low density polyethylene (VLDPE), low density polyethylene (LDPE), medium density polyethylene (MDPE), high density polyethylene (HDPE), and linear low density polyethylene (LLDPE). ), polypropylene (PP), ethylene-propylene copolymer, olefin elastomer (TPO), ethylene-vinyl acetate copolymer (EVA), ethylene-(meth)acrylic acid copolymer, ethylene-(meth)acrylic acid Ester copolymers, etc.
使用在烯烴系樹脂的改性處理之改性劑,在分子內具有官能基之化合物。 作為官能基,可舉出與作為黏結劑樹脂(B)所具有的官能基已列記之物相同之物。具有官能基之化合物亦可在分子內具有2種以上的官能基。A compound that has a functional group in the molecule as a modifier used in the modification treatment of olefin resins. Examples of the functional group include the same ones listed as the functional groups possessed by the binder resin (B). The compound having a functional group may also have two or more functional groups in the molecule.
在本發明,從能夠得到本發明的更優異的效果之觀點而言,作為改性烯烴系樹脂,以酸改性烯烴系樹脂為佳。 所謂酸改性烯烴系樹脂,是指使用酸對烯烴系樹脂進行接枝改性而成之物。可舉出,例如,使不飽和羧酸或不飽和羧酸酐(以下有稱為「不飽和羧酸等」之情形)對烯烴樹脂進行反應而導入(接枝改性)羧基或羧酸酐基而成之物。In the present invention, from the viewpoint of obtaining more excellent effects of the present invention, acid-modified olefin-based resin is preferred as the modified olefin-based resin. Acid-modified olefin-based resin refers to an olefin-based resin graft-modified using an acid. For example, an olefin resin is reacted with an unsaturated carboxylic acid or an unsaturated carboxylic acid anhydride (hereinafter referred to as "unsaturated carboxylic acid, etc.") to introduce (graft-modify) a carboxyl group or a carboxylic acid anhydride group. accomplished thing.
作為使其對烯烴系樹脂進行反應之不飽和羧酸等,可舉出順丁烯二酸、反丁烯二酸、伊康酸、檸康酸、戊烯二酸、四氫酞酸、烏頭酸等的不飽和羧酸;順丁烯二酸酐、伊康酸酐、戊烯二酸酐、檸康酸酐、烏頭酸酐、降莰烯二羧酸酐(norbornene dicarboxylic acid anhydride)、四氫酞酸酐等的不飽和羧酸酐。 該等能夠單獨1種或組合2種以上而使用。該等之中,因為容易得到薄片加工性(造膜性)更優異之密封劑組合物及黏著強度更優異之密封劑組合物的硬化物,以順丁烯二酸酐為佳。Examples of the unsaturated carboxylic acid that reacts the olefin-based resin include maleic acid, fumaric acid, itaconic acid, citraconic acid, glutaconic acid, tetrahydrophthalic acid, and aconitum. unsaturated carboxylic acids such as maleic anhydride, itaconic anhydride, glutaconic anhydride, citraconic anhydride, aconitic anhydride, norbornene dicarboxylic acid anhydride, tetrahydrophthalic anhydride, etc. Saturated carboxylic anhydride. These can be used individually by 1 type or in combination of 2 or more types. Among these, maleic anhydride is preferred because it is easy to obtain a sealant composition with better sheet processability (film-forming properties) and a cured product of the sealant composition with better adhesive strength.
使其對烯烴系樹脂進行反應之不飽和羧酸的量,相對於烯烴系樹脂100質量份,良好為0.1~5質量份,較佳為0.2~3質量份,更佳為0.2~1質量份。如此進行而得到之含有酸改性烯烴系樹脂的樹脂組合物,容易得到黏著強度更優異之硬化物。The amount of the unsaturated carboxylic acid used to react the olefin resin is preferably 0.1 to 5 parts by mass, more preferably 0.2 to 3 parts by mass, and more preferably 0.2 to 1 part by mass relative to 100 parts by mass of the olefin resin. . The resin composition containing the acid-modified olefin-based resin obtained in this way can easily obtain a cured product having more excellent adhesive strength.
將不飽和羧酸單元或不飽和羧酸酐單元導入至烯烴系樹脂之方法沒有特別限定。可舉出,例如,在有機過氧化物類或偶氮腈(azonitrile)類等的自由基產生劑的存在下,使烯烴系樹脂與不飽和羧酸等在烯烴系樹脂的熔點以上進行加熱熔融而使其反應之方法;或藉由使烯烴系樹脂與不飽和羧酸等溶解在有機溶劑之後,在自由基產生劑的存在下進行加熱、攪拌且反應的方法等,而使不飽和羧酸等對烯烴系樹脂進行接枝共聚合之方法。The method of introducing unsaturated carboxylic acid units or unsaturated carboxylic acid anhydride units into the olefin-based resin is not particularly limited. For example, an olefin resin and an unsaturated carboxylic acid are heated and melted above the melting point of the olefin resin in the presence of a radical generating agent such as an organic peroxide or azonitrile. A method of reacting; or a method of dissolving an olefin resin and an unsaturated carboxylic acid in an organic solvent and then heating, stirring and reacting in the presence of a radical generating agent to make the unsaturated carboxylic acid Methods such as graft copolymerization of olefin resins.
作為酸改性烯烴系樹脂,亦能夠使用市售品。作為市售品,例如可舉出ADMER (註冊商標)(三井化學公司製)、UNISTOLE (註冊商標)(三井化學公司製)、BondyRam (Polyram公司製)、orevac (註冊商標)(ARKEMA公司製)、Modic (註冊商標)(三菱化學公司製)等。As the acid-modified olefin-based resin, commercially available products can also be used. Examples of commercially available products include ADMER (registered trademark) (manufactured by Mitsui Chemicals Co., Ltd.), UNISTOLE (registered trademark) (manufactured by Mitsui Chemicals Co., Ltd.), BondyRam (manufactured by Polyram Co., Ltd.), orevac (registered trademark) (manufactured by ARKEMA Co., Ltd.) , Modic (registered trademark) (manufactured by Mitsubishi Chemical Corporation), etc.
改性烯烴系樹脂的重量平均分子量(Mw),良好為10,000~1,000,000,較佳為30,000~500,000。 改性烯烴系樹脂的重量平均分子量(Mw),能夠使用四氫呋喃(THF)作為溶劑而進行凝膠滲透層析法(GPC),且以標準聚苯乙烯換算值之方式求取。The weight average molecular weight (Mw) of the modified olefin-based resin is preferably 10,000 to 1,000,000, more preferably 30,000 to 500,000. The weight average molecular weight (Mw) of the modified olefin-based resin can be determined in terms of standard polystyrene conversion by gel permeation chromatography (GPC) using tetrahydrofuran (THF) as a solvent.
(苯氧基系樹脂) 苯氧基系樹脂通常相當於高分子量的環氧樹脂,且聚合度為100左右以上。本發明所使用的苯氧系樹脂,是具有環氧基作為官能基之黏結劑樹脂。(Phenoxy resin) Phenoxy resins generally correspond to high molecular weight epoxy resins and have a polymerization degree of about 100 or more. The phenoxy resin used in the present invention is a binder resin having an epoxy group as a functional group.
本發明使用的苯氧基系樹脂是重量平均分子量(Mw)為10,000~1,000,000之物。苯氧基系樹脂的重量平均分子量(Mw),能夠使用四氫呋喃(THF)作為溶劑,而且進行凝膠滲透層析法(GPC)且以標準聚苯乙烯換算值之方式求取。 此種相當於高分子量的環氧樹脂之苯氧基系樹脂,通常玻璃轉移溫度為130℃以下。而且,5重量%減少溫度比350℃更高且耐熱變形性優異。 又,本發明使用的苯氧基系樹脂,較佳為環氧當量為5,000以上,更佳為7,000以上。The phenoxy resin used in the present invention has a weight average molecular weight (Mw) of 10,000 to 1,000,000. The weight average molecular weight (Mw) of the phenoxy resin can be determined in terms of standard polystyrene conversion using gel permeation chromatography (GPC) using tetrahydrofuran (THF) as a solvent. This kind of phenoxy resin, which is equivalent to a high molecular weight epoxy resin, usually has a glass transition temperature of 130°C or less. Furthermore, the 5 wt% reduction temperature is higher than 350°C and has excellent heat deformation resistance. In addition, the phenoxy resin used in the present invention preferably has an epoxy equivalent of 5,000 or more, more preferably 7,000 or more.
本發明使用的苯氧基系樹脂只要是重量平均分子量為10,000~1,000,000的環氧樹脂,就沒有特別限定。可舉出,例如,雙酚A型、雙酚F型、雙酚S型苯氧基樹脂、雙酚A型與雙酚F型的共聚物型苯氧基樹脂、其蒸餾品、萘型苯氧基樹脂、酚醛清漆型苯氧基樹脂、聯苯型苯氧基樹脂、環戊二烯型苯氧基樹脂等。 該等苯氧基系樹脂能夠單獨1種或組合2種以上而使用。The phenoxy resin used in the present invention is not particularly limited as long as it is an epoxy resin with a weight average molecular weight of 10,000 to 1,000,000. Examples include bisphenol A type, bisphenol F type, bisphenol S type phenoxy resin, copolymer type phenoxy resin of bisphenol A type and bisphenol F type, distillates thereof, naphthalene type benzene Oxygen resin, novolac type phenoxy resin, biphenyl type phenoxy resin, cyclopentadiene type phenoxy resin, etc. These phenoxy resins can be used individually by 1 type or in combination of 2 or more types.
苯氧基系樹脂,能夠藉由使二官能苯酚類與表鹵醇(epihalohydrin)進行反應至高分子量為止之方法,或是使二官能環氧樹脂與二官能苯酚類進行加成聚合反應而得到。 例如,在鹼金屬氫氧化物的存在下,且在惰性溶劑中、40~120℃的溫度,使二官能苯酚類與表鹵醇進行反應而能夠得到。又,在鹼金屬化合物、有機磷系化合物、環狀胺系化合物等的觸媒的存在下,且在沸點為120℃以上的醯胺系溶劑、醚系溶劑、酮系溶劑、內酯(lactone)系溶劑、醇系溶劑等的有機溶劑中,以固體成分濃度為50重量%以下且加熱至50~200℃,使二官能環氧樹脂與二官能苯酚類進行加成聚合反應亦能夠得到。Phenoxy resins can be obtained by reacting bifunctional phenols and epihalohydrins to a high molecular weight, or by performing an addition polymerization reaction between bifunctional epoxy resins and bifunctional phenols. For example, it can be obtained by reacting bifunctional phenols and epihalohydrin in the presence of an alkali metal hydroxide in an inert solvent at a temperature of 40 to 120°C. In addition, in the presence of a catalyst such as an alkali metal compound, an organic phosphorus compound, a cyclic amine compound, etc., and in an amide solvent, an ether solvent, a ketone solvent, or a lactone with a boiling point of 120° C. or higher, ) type solvent, alcohol type solvent, and other organic solvents, it can also be obtained by performing an addition polymerization reaction between a difunctional epoxy resin and difunctional phenols with a solid content concentration of 50% by weight or less and heating to 50 to 200°C.
二官能苯酚類,只要是具有2個酚性羥基之化合物,就沒有特別限定。舉出,例如可,對苯二酚、2-溴對苯二酚(2-bromohydroquinone)、間苯二酚、兒茶酚等的單環二官能苯酚類、雙酚A、雙酚F、雙酚AD、雙酚S等的雙酚類、4,4’-二羥基聯苯等的二羥基聯苯類、雙(4-羥苯基)醚等的二羥苯基醚類及將直鏈烷基、支鏈烷基、芳基、羥甲基、烯丙基、環狀脂肪族基、鹵素(四溴雙酚A等)、硝基等導入至該等苯酚骨架的芳香環而成之物、將直鏈烷基、支鏈烷基、烯丙基、具有取代基之烯丙基、環狀脂肪族基、烷氧基羰基等導入至位於該等雙酚骨架的中央之碳原子而成之多環二官能苯酚類等。Bifunctional phenols are not particularly limited as long as they are compounds having two phenolic hydroxyl groups. Examples include monocyclic difunctional phenols such as hydroquinone, 2-bromohydroquinone, resorcin, and catechol, bisphenol A, bisphenol F, and bisphenol F. Bisphenols such as phenol AD and bisphenol S, dihydroxybiphenyls such as 4,4'-dihydroxybiphenyl, dihydroxyphenyl ethers such as bis(4-hydroxyphenyl)ether, and straight-chain Alkyl, branched alkyl, aryl, hydroxymethyl, allyl, cyclic aliphatic group, halogen (tetrabromobisphenol A, etc.), nitro, etc. are introduced into the aromatic ring of the phenol skeleton. By introducing straight-chain alkyl groups, branched-chain alkyl groups, allyl groups, substituted allyl groups, cyclic aliphatic groups, alkoxycarbonyl groups, etc. into the carbon atoms located in the center of the bisphenol skeleton, Polycyclic difunctional phenols, etc.
作為表鹵醇,可舉出表氯醇(epichlorohydrin)、表溴醇(epibromhydrin)、表碘醇(epiiodohydrin)等。Examples of epihalohydrins include epichlorohydrin, epibromhydrin, epiiodohydrin, and the like.
又,在本發明,作為苯氧基系樹脂,亦能夠使用市售品。可舉出,例如,三菱化學公司製的商品名:YX7200、YL7553、YL6794、YL7213、YL7290、YL7482;三菱化學公司製的商品名:YX8100 (含雙酚S骨架的苯氧基樹脂) ;東都化成公司製的商品名:FX280、FX293、FX 293S (含茀骨架旳苯氧基樹脂) ;三菱化學公司製的商品名:jER1256、jER4250;新日鐵化學公司製的商品名:YP-50、YP-50S (任一者均為含雙酚A骨架的苯氧基樹脂) ;三菱化學公司製的商品名:YX6954 (含雙酚苯乙酮骨架的苯氧基樹脂) ;日鐵CHEMICAL公司製的商品名:ZX-1356-2等。In addition, in the present invention, commercially available products can also be used as the phenoxy resin. Examples include, for example, YX7200, YL7553, YL6794, YL7213, YL7290, YL7482 manufactured by Mitsubishi Chemical Corporation; YX8100 (bisphenol S skeleton-containing phenoxy resin) manufactured by Mitsubishi Chemical Corporation; Toto Kasei Trade names made by the company: FX280, FX293, FX 293S (phenoxy resin containing fluorine skeleton); Trade names made by Mitsubishi Chemical Corporation: jER1256, jER4250; Trade names made by Nippon Steel Chemical Corporation: YP-50, YP -50S (Both are phenoxy resins containing bisphenol A skeleton); Trade name: YX6954 (phenoxy resin containing bisphenol acetophenone skeleton) manufactured by Mitsubishi Chemical Corporation; Manufactured by Nippon Steel Chemical Corporation Trade name: ZX-1356-2, etc.
(具有官能基之縮醛系樹脂) 縮醛系樹脂含有氧亞甲基(oxymethylene group, -CH2 O-)作為主要結構單元之高分子化合物。縮醛系樹脂包含聚縮醛同元聚合物、聚縮醛共聚物。 後者的聚縮醛共聚物除了氧亞甲基以外,亦包含碳數2~10的氧伸烷基(氧伸乙基、氧伸丙基、氧三亞甲基、氧四亞甲基等)作為結構單元。在聚縮醛共聚物中之碳數2~10的氧伸烷基(oxyalkylene group)的比率,相對於結構單元全體,為0.01~30莫耳%左右。(Acetal-based resin having functional groups) Acetal-based resin is a polymer compound containing an oxymethylene group (-CH 2 O-) as a main structural unit. Acetal-based resins include polyacetal homopolymers and polyacetal copolymers. In addition to oxymethylene, the latter polyacetal copolymer also contains oxyalkylene groups with 2 to 10 carbon atoms (oxyethylene, oxypropyl, oxytrimethylene, oxytetramethylene, etc.) as structural unit. The ratio of the oxyalkylene group having 2 to 10 carbon atoms in the polyacetal copolymer is about 0.01 to 30 mol% relative to the entire structural unit.
縮醛系樹脂能夠藉由使甲醛、乙醛等的醛類;三㗁烷(trioxane)、環氧乙烷(ethylene oxide)、環氧丙烷(propylene oxide)、1,3-二氧雜戊環(1,3-dioxolane)等的環狀醚類聚合而得到。Acetal-based resins can be produced by adding aldehydes such as formaldehyde and acetaldehyde; trioxane, ethylene oxide, propylene oxide, and 1,3-dioxolane. It is obtained by polymerizing cyclic ethers such as (1,3-dioxolane).
聚縮醛共聚物可為由二成分所構成之共聚物、由三成分所構成之三元共聚物(terpolymer)等。聚縮醛共聚物亦可為無規共聚物、以及嵌段共聚物、接枝共聚物等。又,聚縮醛樹脂不僅是線狀,亦可為分枝構造,亦可具有交聯結構。而且,聚縮醛樹脂的末端亦可藉由,例如,與乙酸等的羧酸或該等的酐進行酯化等而安定化。The polyacetal copolymer can be a copolymer composed of two components, a terpolymer composed of three components, etc. The polyacetal copolymer can also be a random copolymer, a block copolymer, a graft copolymer, etc. In addition, the polyacetal resin may not only be linear, but may also have a branched structure or a cross-linked structure. Furthermore, the terminals of the polyacetal resin may be stabilized by, for example, esterification with carboxylic acids such as acetic acid or anhydrides thereof.
在本發明,被使用作為黏結劑樹脂(B)之縮醛系樹脂,是具有官能基之樹脂。In the present invention, the acetal resin used as the binder resin (B) is a resin having a functional group.
具有官能基之縮醛系樹脂,能夠藉由,例如,使用具有官能基之聚合性化合物將前述縮醛系樹脂進行改性而得到。 作為具有官能基之聚合性化合物,可舉出具有官能基之含乙烯性不飽和鍵的化合物及具有官能基之含乙炔鍵的化合物。 作為聚合性化合物所具有的官能基,可舉出與已列記作為前述黏結劑樹脂(B)所具有的官能基之物相同之物。The acetal-based resin having a functional group can be obtained, for example, by modifying the acetal-based resin using a polymerizable compound having a functional group. Examples of the polymerizable compound having a functional group include an ethylenically unsaturated bond-containing compound having a functional group and an acetylene bond-containing compound having a functional group. Examples of the functional groups that the polymerizable compound has include the same ones listed as the functional groups that the binder resin (B) has.
作為具有官能基之聚合性化合物,可舉出烯丙基環氧丙基醚、查耳酮環氧丙基醚(chalcone glycidyl ether)等的環氧丙基醚;環氧丙基(甲基)丙烯酸酯、乙烯基苯甲酸環氧丙酯、烯丙基苯甲酸環氧丙酯、桂皮酸環氧丙酯、亞桂皮基乙酸環氧丙酯、二聚酸環氧丙酯、環氧化硬脂醇與丙烯酸或甲基丙烯酸的酯等的環氧丙酯或環氧酯;環氧己烯、氧化檸檬烯(limonene oxide)等的具有環氧基作為官能基之化合物;丙烯酸、甲基丙烯酸、丙炔酸(propiolic acid)、巴豆酸、桂皮酸、順丁烯二酸、反丁烯二酸、伊康酸、檸康酸等的具有羧基作為官能基之化合物;順丁烯二酸酐、伊康酸酐、檸康酸酐、降莰烯二酸酐( himic anhydride)等的具有羧酸酐基作為官能基之化合物;烯丙醇、(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、丁二醇單(甲基)丙烯酸酯、己二醇單(甲基)丙烯酸酯、新戊二醇單(甲基)丙烯酸酯、甘油單(甲基)丙烯酸酯、乙烯基苯酚等的具有羥基作為官能基之化合物等。Examples of the polymerizable compound having a functional group include glycidyl ethers such as allyl glycidyl ether and chalcone glycidyl ether; glycidyl (methyl) Acrylates, glycidyl vinyl benzoate, allyl glycidyl benzoate, glycidyl cinnamate, glycidyl cinnamyl acetate, glycidyl dimer acid, epoxy stearate Glycidyl propyl esters or epoxy esters of alcohols and acrylic acid or methacrylic acid esters; compounds with epoxy groups as functional groups such as epoxyhexene and limonene oxide; acrylic acid, methacrylic acid, propylene oxide, etc. Compounds with carboxyl groups as functional groups such as propiolic acid, crotonic acid, cinnamic acid, maleic acid, fumaric acid, itaconic acid, citraconic acid; maleic anhydride, itaconic acid Compounds with carboxylic anhydride groups as functional groups such as acid anhydride, citraconic anhydride, norbornenedioic anhydride (himic anhydride); allyl alcohol, 2-hydroxyethyl (meth)acrylate, 2-hydroxy(meth)acrylate Propyl ester, butylene glycol mono(meth)acrylate, hexylene glycol mono(meth)acrylate, neopentyl glycol mono(meth)acrylate, glycerol mono(meth)acrylate, vinyl phenol, etc. Compounds with hydroxyl groups as functional groups, etc.
又,在本發明,亦能夠使用聚乙烯基縮醛樹脂作為縮醛系樹脂。聚乙烯基縮醛樹脂是具有羥基作為官能基之黏結劑樹脂。In addition, in the present invention, polyvinyl acetal resin can also be used as the acetal-based resin. Polyvinyl acetal resin is a binder resin with hydroxyl groups as functional groups.
聚乙烯基縮醛樹脂,是藉由使醛對聚乙烯醇進行反應而縮醛化所能夠得到之樹脂。 作為使用的醛,可舉出,例如,甲醛、乙醛、丙醛、正丁醛、異丁醛、戊醛、己醛、庚醛、正辛醛、2-乙基己醛、環己醛、糠醛(furfural)、乙二醛、戊二醛、苯甲醛、2-甲基苯甲醛、3-甲基苯甲醛、4-甲基苯甲醛、對羥基苯甲醛、間羥基苯甲醛、苯基乙醛、β-苯基丙醛等。 又,例如藉由水解而供給對應的醛之縮醛(二烷基縮醛等)、乙烯酯、乙烯醚、乙烯鹵化物等醛的衍生物亦能夠使用在縮醛化反應。Polyvinyl acetal resin is a resin obtained by reacting aldehyde with polyvinyl alcohol to acetalize it. Examples of aldehydes used include formaldehyde, acetaldehyde, propionaldehyde, n-butyraldehyde, isobutyraldehyde, valeraldehyde, hexanal, heptaldehyde, n-octylaldehyde, 2-ethylhexanal, and cyclohexanal. , furfural, glyoxal, glutaraldehyde, benzaldehyde, 2-methylbenzaldehyde, 3-methylbenzaldehyde, 4-methylbenzaldehyde, p-hydroxybenzaldehyde, m-hydroxybenzaldehyde, phenyl Acetaldehyde, β-phenylpropionaldehyde, etc. In addition, for example, derivatives of aldehydes such as acetals (dialkyl acetals, etc.), vinyl esters, vinyl ethers, and vinyl halides that supply the corresponding aldehydes by hydrolysis can also be used in the acetalization reaction.
在構成聚乙烯基縮醛樹脂之總結構單元所佔有的乙烯醇單元(-CH2 -CH(OH)-)的含有率,從黏著力等的觀點而言,以5莫耳%以上且50莫耳%以下為佳。 在構成聚乙烯基縮醛樹脂之總結構單元所佔有之經縮醛化的乙烯醇單元的含有率,能夠設為,例如,10莫耳%以上,從黏著力、溶解性等的觀點而言,以40莫耳%以上為佳,50莫耳%以上為較佳。 又,聚乙烯基縮醛樹脂亦可具有乙烯酯單元[-CH2 -CH(O-C(=O)-R)-:R表示烴基]作為結構單元。乙烯酯單元在總結構單元之含有率,從黏著力等的觀點而言,以0.1莫耳%以上且30莫耳%以下為佳,以0.3莫耳%以上且20莫耳%以下為較佳。The content rate of the vinyl alcohol unit (-CH 2 -CH(OH)-) occupied by the total structural units constituting the polyvinyl acetal resin is 5 mol% or more and 50 from the viewpoint of adhesive force, etc. Mol% or less is preferred. The content rate of acetalized vinyl alcohol units in the total structural units constituting the polyvinyl acetal resin can be, for example, 10 mol% or more, from the viewpoint of adhesive force, solubility, etc. , 40 mol% or more is preferred, and 50 mol% or more is preferred. In addition, the polyvinyl acetal resin may have a vinyl ester unit [-CH 2 -CH(OC(=O)-R)-: R represents a hydrocarbon group] as a structural unit. The content of the vinyl ester unit in the total structural units is preferably 0.1 mol% or more and 30 mol% or less from the viewpoint of adhesion, etc., and 0.3 mol% or more and 20 mol% or less is more preferred. .
在本發明的密封劑組合物,除了聚乙烯基縮醛樹脂以外,或者代替該聚乙烯基縮醛樹脂,亦能夠使用藉由常用的方法將聚乙烯基縮醛樹脂進行羧酸改性而得到的羧酸改性縮醛樹脂。In the sealant composition of the present invention, in addition to or instead of the polyvinyl acetal resin, a polyvinyl acetal resin obtained by subjecting a polyvinyl acetal resin to carboxylic acid modification by a common method can be used. carboxylic acid modified acetal resin.
縮醛系樹脂及羧酸改性聚乙烯基縮醛樹脂可藉由常用的方法而進行合成,亦可取得市售品。作為市售品,可舉出,例如,積水化學工業公司製的商品名:S-LEC BX-1、BX-2、BX-5、BX-55、BX-7、BH-3、BH-S、KS-3Z、KS-5、KS-5Z、KS-8、KS-23Z;電氣化學工業公司製的商品名:電化BUTYLAL 4000-2、5000A、6000C、6000EP等。 具有官能基之縮醛系樹脂能夠單獨1種或組合2種以上而使用。Acetal-based resins and carboxylic acid-modified polyvinyl acetal resins can be synthesized by common methods and are also commercially available. Examples of commercially available products include, for example, trade names: S-LEC BX-1, BX-2, BX-5, BX-55, BX-7, BH-3, and BH-S manufactured by Sekisui Chemical Industry Co., Ltd. , KS-3Z, KS-5, KS-5Z, KS-8, KS-23Z; Trade names made by Denki Chemical Industry Co., Ltd.: Denka BUTYLAL 4000-2, 5000A, 6000C, 6000EP, etc. The acetal-based resin having a functional group can be used alone or in combination of two or more types.
[硬化觸媒] 作為在本發明的密封劑組合物使用的硬化觸媒,只要是能夠使具有環狀醚基的化合物硬化之觸媒,就沒有特別限定。以含有藉由熱而使具有環狀醚基的化合物硬化之物、熱陽離子聚合起始劑等為佳,以熱陽離子聚合起始劑為較佳。[hardening catalyst] The curing catalyst used in the sealant composition of the present invention is not particularly limited as long as it can cure the compound having a cyclic ether group. It is preferable to contain a compound that hardens a compound having a cyclic ether group by heat, a thermal cationic polymerization initiator, etc., and a thermal cationic polymerization initiator is more preferred.
作為藉由熱而使具有環狀醚基的化合物硬化之物,可舉出苄甲胺、2,4,6-參二甲胺基甲基苯酚等的三級胺;2-甲基咪唑、3-乙基-4-甲基咪唑、2-十七基咪唑等的咪唑化合物;三氟化硼‧單乙胺錯合物、三氟化硼‧哌嗪錯合物等的路易斯酸等。Examples of compounds that harden a compound having a cyclic ether group by heat include tertiary amines such as benzylmethylamine and 2,4,6-benzodimethylaminomethylphenol; 2-methylimidazole, Imidazole compounds such as 3-ethyl-4-methylimidazole and 2-heptadecanylimidazole; Lewis acids such as boron trifluoride‧monethylamine complex and boron trifluoride‧piperazine complex, etc.
熱陽離子聚合起始劑,是能夠藉由加熱而產生使聚合開始的陽離子種之化合物。熱陽離子聚合起始劑沒有特別限制,能夠按照硬化條件和陽離子聚合性化合物的種類而適當地選擇。The thermal cationic polymerization initiator is a compound that can generate cationic species that initiate polymerization by heating. The thermal cationic polymerization initiator is not particularly limited and can be appropriately selected according to the hardening conditions and the type of the cationically polymerizable compound.
作為熱陽離子聚合起始劑,可舉出,例如,鋶(sulfonium)鹽、咪唑系硬化觸媒、四級銨鹽、鏻(phosphonium)鹽、重氮鎓(diazonium)鹽、碘鎓(iodonium)鹽等。該等之中,從取得容易性、能夠得到黏著性及透明性更優異之硬化物等的觀點而言,以使用鋶鹽、咪唑系硬化觸媒為佳。Examples of the thermal cationic polymerization initiator include sulfonium salts, imidazole-based curing catalysts, quaternary ammonium salts, phosphonium salts, diazonium salts, and iodonium salts. Salt etc. Among these, it is preferable to use a sulfonium salt or an imidazole-based curing catalyst from the viewpoint of ease of acquisition and the ability to obtain a cured product having superior adhesiveness and transparency.
作為鋶鹽,可舉出三苯基鋶四氟硼酸鹽、三苯基鋶六氟銻酸鹽、三苯基鋶六氟砷酸鹽、參(4-甲氧基苯基)鋶六氟砷酸鹽、二苯基(4-苯硫基苯基)鋶六氟砷酸鹽等。Examples of sulfonium salts include triphenylsonium tetrafluoroborate, triphenylsonium hexafluoroantimonate, triphenylsonium hexafluoroarsenate, and gins(4-methoxyphenyl)sonium hexafluoroarsenate. acid salt, diphenyl (4-phenylthiophenyl) sulfonium hexafluoroarsenate, etc.
又,作為鋶鹽,亦能夠使用市售品。作為市售品,能夠具體地可舉出ADEKAOPTON SP-150、ADEKAOPTON SP-170、ADEKAOPTON CP-66、ADEKAOPTON CP-77 (以上,旭電化公司製);SANEIDO SI-60L、SANEIDO SI-80L、SANEIDO SI-100L、SANEIDO SI-B2A、SANEIDO SI-B3 (以上,三新化學公司製);CYRACURE UVI-6974、CYRACURE UVI-6990 (以上,Union Carbide公司製)、UVI-508、UVI-509 (以上,General Electric公司製)、FC-508、FC-509 (以上,Minnesota Mining and Manufacturing公司製)、CD-1010、CD-1011 (以上,Sastomma公司製)、CI SERIES的製品(日本曹達公司製)等。In addition, as the strontium salt, a commercially available product can also be used. Specific examples of commercially available products include ADEKAOPTON SP-150, ADEKAOPTON SP-170, ADEKAOPTON CP-66, and ADEKAOPTON CP-77 (the above, manufactured by Asahi Denka Co., Ltd.); SANEIDO SI-60L, SANEIDO SI-80L, and SANEIDO SI-100L, SANEIDO SI-B2A, SANEIDO SI-B3 (above, manufactured by Sanshin Chemical Co., Ltd.); CYRACURE UVI-6974, CYRACURE UVI-6990 (above, manufactured by Union Carbide Co., Ltd.), UVI-508, UVI-509 (above) , manufactured by General Electric Co., Ltd.), FC-508, FC-509 (above, manufactured by Minnesota Mining and Manufacturing Co., Ltd.), CD-1010, CD-1011 (above, manufactured by Sastomma Co., Ltd.), CI SERIES (manufactured by Nippon Soda Co., Ltd.) wait.
作為咪唑系硬化觸媒,可舉出2-甲基咪唑、2-苯基咪唑、2-十一基咪唑、2-十七基咪唑、2-乙基-4-甲基咪唑、2-苯基-4-甲基咪唑、2-苯基-4-甲基-5-羥甲基咪唑、2-苯基-4,5-二羥甲基咪唑等。Examples of the imidazole-based curing catalyst include 2-methylimidazole, 2-phenylimidazole, 2-undecylimidazole, 2-heptadecanylimidazole, 2-ethyl-4-methylimidazole, and 2-phenylimidazole. methyl-4-methylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, 2-phenyl-4,5-dihydroxymethylimidazole, etc.
作為四級銨鹽,可具體地舉出,例如,四丁基銨四氟硼酸鹽、四丁基銨六氟磷酸鹽、硫酸氫四丁基銨(tetrabutylammonium hydrogen sulfate)、四乙基銨四氟硼酸鹽、四乙基銨對甲苯磺酸鹽(tetraethylammonium p-toluenesulfonate)、N,N-二甲基-N-苄基苯銨六氟銻酸鹽(N,N-dimethyl-N-benzylanilinium hexafluoroantimonate)、N,N-二甲基-N-苄基苯銨四氟硼酸鹽、N,N-二甲基-N-苄基吡啶鎓六氟銻酸鹽(N,N-dimethyl-N-benzylpyridinium hexafluoroantimonate)、N,N-二乙基-N-苄基三氟甲烷磺酸鹽、N,N-二甲基-N-(4-甲氧基苄基)吡啶鎓六氟銻酸鹽(N,N-dimethyl-N-(4-methoxybenzyl) pyridinium hexafluoroantimonate)、N,N-二乙基-N-(4-甲氧基苄基)甲苯胺鎓六氟銻酸鹽(N,N-diethyl-N-(4-methoxybenzyl) toluidinium hexafluoroantimonate)等。又,作為前述鏻鹽,可具體地舉出,例如,乙基三苯基鏻六氟銻酸鹽、四丁基鏻六氟銻酸鹽等。Specific examples of quaternary ammonium salts include tetrabutylammonium tetrafluoroborate, tetrabutylammonium hexafluorophosphate, tetrabutylammonium hydrogen sulfate, and tetraethylammonium tetrafluorophosphate. Borate, tetraethylammonium p-toluenesulfonate, N,N-dimethyl-N-benzylanilinium hexafluoroantimonate , N,N-dimethyl-N-benzylpyridinium tetrafluoroborate, N,N-dimethyl-N-benzylpyridinium hexafluoroantimonate ), N,N-diethyl-N-benzyltrifluoromethanesulfonate, N,N-dimethyl-N-(4-methoxybenzyl)pyridinium hexafluoroantimonate (N, N-dimethyl-N-(4-methoxybenzyl) pyridinium hexafluoroantimonate), N,N-diethyl-N-(4-methoxybenzyl)toluidinium hexafluoroantimonate (N,N-diethyl-N -(4-methoxybenzyl) toluidinium hexafluoroantimonate) etc. Specific examples of the phosphonium salt include ethyltriphenylphosphonium hexafluorantimonate, tetrabutylphosphonium hexafluorantimonate, and the like.
作為前述重氮鎓鹽,可舉出AMERICURE (American Can公司製)、ULTRASET(旭電化公司製)等。Examples of the diazonium salt include AMERICURE (manufactured by American Can Co., Ltd.), ULTRASET (manufactured by Asahi Denka Co., Ltd.), and the like.
作為碘鎓鹽,可舉出二苯基碘鎓六氟砷酸鹽、雙(4-氯苯基)碘鎓六氟砷酸鹽、雙(4-溴苯基)碘鎓六氟砷酸鹽、苯基(4-甲氧基苯基)碘鎓六氟砷酸鹽等。又,作為市售品,亦能夠使用UV-9310C (東芝SILICONE公司製)、Photoinitiator 2074 (Rhone-Poulenc公司製)、UVE SERIES的製品(General Electric公司製)、FC SERIES的製品(Minnesota Mining and Manufacturing公司製)等。 該等硬化觸媒能夠單獨1種或組合2種以上而使用。Examples of iodonium salts include diphenyliodonium hexafluoroarsenate, bis(4-chlorophenyl)iodonium hexafluoroarsenate, and bis(4-bromophenyl)iodonium hexafluoroarsenate. , phenyl (4-methoxyphenyl) iodonium hexafluoroarsenate, etc. In addition, as commercially available products, UV-9310C (manufactured by Toshiba Silicone Co., Ltd.), Photoinitiator 2074 (manufactured by Rhone-Poulenc Co., Ltd.), UVE SERIES (manufactured by General Electric Co., Ltd.), and FC SERIES (Minnesota Mining and Manufacturing Co., Ltd.) can also be used. company system), etc. These hardening catalysts can be used individually by 1 type or in combination of 2 or more types.
硬化觸媒的含量沒有特別限制,相對於環狀醚化合物(A)100質量份,以0.1~15質量份為佳,以1~10質量份為較佳,以1~5質量份為最佳。 硬化觸媒的含量為一定以上時,容易使環狀醚化合物(A)充分地硬化。另一方面,硬化觸媒的含量為一定以下時,不僅是保管時不容易損害密封劑組合物的安定性,而且能夠減少硬化物中未反應的硬化觸媒殘留量,且不容易損害硬化物的耐熱性等。硬化觸媒可僅由一種化合物所構成,亦可為二種以上的化合物之組合。The content of the hardening catalyst is not particularly limited. It is preferably 0.1 to 15 parts by mass, preferably 1 to 10 parts by mass, and most preferably 1 to 5 parts by mass relative to 100 parts by mass of the cyclic ether compound (A). . When the content of the curing catalyst is at least a certain level, the cyclic ether compound (A) is likely to be sufficiently cured. On the other hand, when the content of the curing catalyst is below a certain level, not only is the stability of the sealant composition less likely to be damaged during storage, but the amount of unreacted curing catalyst remaining in the cured product can be reduced, and the cured product is less likely to be damaged. heat resistance, etc. The hardening catalyst may be composed of only one compound or a combination of two or more compounds.
[矽烷偶合劑] 本發明的密封劑組合物亦可進一步含有矽烷偶合劑。 藉由含有矽烷偶合劑,可容易得到濕熱耐久性更優異之密封劑層。[Silane coupling agent] The sealant composition of the present invention may further contain a silane coupling agent. By containing a silane coupling agent, a sealant layer with better wet-heat durability can be easily obtained.
作為矽烷偶合劑,能夠使用習知的矽烷偶合劑。尤其是以在分子內具有至少1個烷氧矽烷基之有機矽化合物為佳。 作為矽烷偶合劑,可舉出3-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基甲基二乙氧基矽烷、3-甲基丙烯醯氧基丙基三乙氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷等的具有(甲基)丙烯醯基的矽烷偶合劑;乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、二甲氧基甲基乙烯基矽烷、二乙氧基甲基乙烯基矽烷、三氯乙烯基矽烷、乙烯基參(2-甲氧基乙氧基)矽烷等的具有乙烯基的矽烷偶合劑;2-(3,4-環氧環己基)乙基三甲氧基矽烷、3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基甲基二乙氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷、8-環氧丙氧基辛基三甲氧基矽烷等的具有環氧基的矽烷偶合劑;對苯乙烯基三甲氧基矽烷、對苯乙烯基三乙氧基矽烷等的具有苯乙烯基的矽烷偶合劑;N-(2-胺乙基)-3-胺丙基甲基二甲氧基矽烷、N-(2-胺乙基)-3-胺丙基三甲氧基矽烷、N-(2-胺乙基)-3-胺丙基三乙氧基矽烷、3-胺丙基三甲氧基矽烷、3-胺丙基三乙氧基矽烷、3-三乙氧基矽烷基-N-(1,3-二甲基‧亞丁基)丙胺(3-triethoxysilyl-N- (1,3-dimethylbutylidene) propylamine)、N-苯基-3-胺丙基三甲氧基矽烷、N-(乙烯基苄基)-2-胺乙基-3-胺丙基三甲氧基矽烷的鹽酸鹽等的具有胺基的矽烷偶合劑;3-脲丙基三甲氧基矽烷(3-ureidopropyltrimethoxysilane)、3-脲丙基三乙氧基矽烷(3-ureidopropyltriethoxysilane)等的具有脲(ureido)基的矽烷偶合劑;3-氯丙基三甲氧基矽烷、3-氯丙基三乙氧基矽烷等的具有鹵素原子的矽烷偶合劑;3-巰基丙基甲基二甲氧基矽烷、3-巰基丙基三甲氧基矽烷等的具有巰基的矽烷偶合劑;雙(三甲氧基矽烷基丙基)四硫化物(bis (trimethoxysilylpropyl) tetrasulfide)、雙(三乙氧基矽烷基丙基)四硫化物(bis (triethoxysilylpropyl) tetrasulfide)等的具有硫化物基的矽烷偶合劑;3-異氰酸基丙基三甲氧基矽烷(3-isocyanatopropyltrimethoxysilane)、3-異氰酸基丙基三乙氧基矽烷(3-isocyanatopropyltriethoxysilane)等的具有異氰酸基(isocyanato group)的矽烷偶合劑;烯丙基三氯矽烷、烯丙基三乙氧基矽烷、烯丙基三甲氧基矽烷等的具有烯丙基的矽烷偶合劑;3-羥丙基三甲氧基矽烷、3-羥丙基三乙氧基矽烷等的具有羥基的矽烷偶合劑等。 該等矽烷偶合劑能夠單獨1種或組合2種以上而使用。As the silane coupling agent, a conventional silane coupling agent can be used. In particular, an organosilicon compound having at least one alkoxysilyl group in the molecule is preferred. Examples of the silane coupling agent include 3-methacryloxypropylmethyldimethoxysilane, 3-methacryloxypropyltrimethoxysilane, and 3-methacryloxypropyl Silane couplings having (meth)acrylyl groups such as methyl diethoxysilane, 3-methacryloxypropyltriethoxysilane, 3-acryloxypropyltrimethoxysilane, etc. Mixture; Vinyltrimethoxysilane, Vinyltriethoxysilane, Dimethoxymethylvinylsilane, Diethoxymethylvinylsilane, Trichlorovinylsilane, Vinyltrimethoxysilane (2-methyl Silane coupling agents with vinyl groups such as oxyethoxy)silane; 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-epoxypropoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, 3-glycidoxypropyltriethoxysilane, 8-glycidoxyoctyltrimethoxysilane, etc. Silane coupling agent based on styryl group; silane coupling agent with styryl group such as p-styryltrimethoxysilane, p-styryltriethoxysilane, etc.; N-(2-aminoethyl)-3-aminopropyl group Methyldimethoxysilane, N-(2-aminoethyl)-3-aminopropyltrimethoxysilane, N-(2-aminoethyl)-3-aminopropyltriethoxysilane, 3 -Aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-triethoxysilyl-N-(1,3-dimethyl‧butylene)propylamine (3-triethoxysilyl-N - (1,3-dimethylbutylidene) propylamine), N-phenyl-3-aminopropyltrimethoxysilane, N-(vinylbenzyl)-2-aminoethyl-3-aminopropyltrimethoxysilane Silane coupling agents with amine groups such as hydrochloride; 3-ureidopropyltrimethoxysilane, 3-ureidopropyltriethoxysilane, etc. with ureido )-based silane coupling agents; silane coupling agents with halogen atoms such as 3-chloropropyltrimethoxysilane, 3-chloropropyltriethoxysilane, etc.; 3-mercaptopropylmethyldimethoxysilane, Silane coupling agents with mercapto groups such as 3-mercaptopropyltrimethoxysilane; bis (trimethoxysilylpropyl) tetrasulfide, bis (triethoxysilylpropyl) Silane coupling agents with sulfide groups such as bis (triethoxysilylpropyl) tetrasulfide; 3-isocyanatopropyltrimethoxysilane (3-isocyanatopropyltrimethoxysilane), 3-isocyanatopropyltriethoxy Silane coupling agents with isocyanato group (isocyanato group) such as 3-isocyanatopropyltriethoxysilane; silane coupling agents with olefins such as allyltrichlorosilane, allyltriethoxysilane, allyltrimethoxysilane, etc. Propyl silane coupling agents; silane coupling agents with hydroxyl groups such as 3-hydroxypropyltrimethoxysilane and 3-hydroxypropyltriethoxysilane. These silane coupling agents can be used individually by 1 type or in combination of 2 or more types.
本發明的密封劑組合物含有矽烷偶合劑時,矽烷偶合劑的含量,在密封劑組合物全體中,良好為0.01~5質量%,較佳為0.05~1質量%。 又,矽烷偶合劑的含量,相對於前述(A)成分100質量份,較佳為0.01~10質量份,更佳為0.02~5質量份。 藉由矽烷偶合劑的含量為上述範圍內,可更容易得到濕熱耐久性優異之密封劑層。When the sealant composition of the present invention contains a silane coupling agent, the content of the silane coupling agent in the entire sealant composition is preferably 0.01 to 5 mass %, and preferably 0.05 to 1 mass %. Moreover, the content of the silane coupling agent is preferably 0.01 to 10 parts by mass, and more preferably 0.02 to 5 parts by mass relative to 100 parts by mass of the component (A). When the content of the silane coupling agent is within the above range, a sealant layer excellent in wet heat durability can be more easily obtained.
本發明的密封劑組合物亦可含有溶劑。 作為溶劑,可舉出苯、甲苯等的芳香族烴系溶劑;乙酸乙酯、乙酸丁酯等的酯系溶劑;丙酮、甲基乙基酮、甲基異丁基酮等的酮系溶劑;正戊烷、正己烷、正庚烷等的脂肪族烴系溶劑;環戊烷、環己烷、甲基環己烷等的脂環式烴系溶劑等。 該等溶劑能夠單獨1種或組合2種以上而使用。 溶劑的含量能夠考慮塗佈性等而適當地決定。The sealant composition of the present invention may also contain solvents. Examples of solvents include aromatic hydrocarbon-based solvents such as benzene and toluene; ester-based solvents such as ethyl acetate and butyl acetate; ketone-based solvents such as acetone, methyl ethyl ketone, and methyl isobutyl ketone; Aliphatic hydrocarbon-based solvents such as n-pentane, n-hexane, and n-heptane; alicyclic hydrocarbon-based solvents such as cyclopentane, cyclohexane, and methylcyclohexane, etc. These solvents can be used individually by 1 type or in combination of 2 or more types. The content of the solvent can be appropriately determined taking into account coatability and the like.
本發明的密封劑組合物在不妨礙本發明的效果之範圍,亦可含有其它成分。 作為其它成分,可舉出紫外線吸收劑、抗靜電劑、光安定劑、抗氧化劑、樹脂安定劑、填充劑、顏料、增量劑、軟化劑等的添加劑。 該等能夠單獨1種或組合2種以上而使用。 本發明的黏著劑組合物含有該等添加劑時,其含量能夠配合目的而適當地決定。The sealant composition of the present invention may contain other components as long as the effects of the present invention are not inhibited. Examples of other components include additives such as ultraviolet absorbers, antistatic agents, light stabilizers, antioxidants, resin stabilizers, fillers, pigments, extenders, and softeners. These can be used individually by 1 type or in combination of 2 or more types. When the adhesive composition of the present invention contains these additives, their content can be appropriately determined according to the purpose.
本發明的密封劑組合物,能夠藉由將預定成分依照常用的方法適當地混合‧攪拌而調製。The sealant composition of the present invention can be prepared by appropriately mixing and stirring predetermined ingredients according to a common method.
[密封片] 本發明的密封片,是由2片剝離膜及被前述2片剝離膜挾持的密封劑層所構成,前述密封劑層是具有由本發明的密封劑組合物所形成的密封劑層之薄片狀物。[Sealing sheet] The sealing sheet of the present invention is composed of two release films and a sealant layer sandwiched between the two release films. The sealant layer is a sheet-like object having a sealant layer formed from the sealant composition of the present invention. .
本發明的密封片形狀、大小等沒有特別限定。又,可為薄長方形狀之物,亦可為長條狀之物。在本申請案說明書,所謂「長條狀」,是指相對於寬度具有5倍以上的長度之形狀,較佳是具有10倍或是其以上的長度,具體而言,是指具有能夠被捲取成為捲物狀而保管或搬運程度的長度之薄膜形狀。相對於薄膜的寬度之長度的比例之上限,沒有特別限定,例如,能夠設為100,000倍以下。The shape, size, etc. of the sealing sheet of the present invention are not particularly limited. Moreover, it can be a thin rectangular thing or a long strip shape. In the specification of this application, "long strip" refers to a shape having a length that is 5 times or more relative to the width, and preferably has a length that is 10 times or more. Specifically, it refers to a shape that can be rolled up. It takes the shape of a film that is long enough to be stored or transported in the form of a roll. The upper limit of the ratio of the length to the width of the film is not particularly limited, but may be, for example, 100,000 times or less.
本發明的密封片的密封劑層之厚度,通常為1~50μm,良好為1~25μm,較佳為5~25μm。具有厚度在上述範圍內的密封劑層之密封片,能夠適合使用作為密封材。 密封劑層的厚度,能夠使用習知的厚度計且依據JIS K 7130(1999)而測定。The thickness of the sealant layer of the sealing sheet of the present invention is usually 1 to 50 μm, preferably 1 to 25 μm, and preferably 5 to 25 μm. A sealing sheet having a sealant layer with a thickness within the above range can be suitably used as a sealing material. The thickness of the sealant layer can be measured in accordance with JIS K 7130 (1999) using a conventional thickness meter.
構成密封片之剝離膜,是在密封片製造步驟發揮作為支撐體的功能,同時亦發揮直到使用密封片為止之期間作為密封劑層的保護片之功能。 又,前述密封片表示使用前的狀態之物,使用本發明的密封片時,通常會將剝離膜剝離除去。The release film constituting the sealing sheet functions as a support in the sealing sheet manufacturing step and also functions as a protective sheet for the sealant layer until the sealing sheet is used. In addition, the aforementioned sealing sheet refers to a state before use. When using the sealing sheet of the present invention, the release film is usually peeled off and removed.
作為剝離膜,能夠利用先前習知物。可舉出,例如,在剝離膜用基材上具有經剝離劑剝離處理的剝離層之物。As the release film, a conventionally known one can be used. For example, a release film base material having a release layer subjected to release treatment with a release agent can be cited.
作為剝離膜用基材,可舉出玻璃紙(glassine paper)、塗層紙、上等紙等的紙基材;將聚乙烯等的熱可塑性樹脂貼合在該等紙基材而成之積層紙;聚對苯二甲酸乙二酯樹脂、聚對苯二甲酸丁二酯樹脂、聚萘二甲酸乙二酯樹脂、聚丙烯樹脂、聚乙烯樹脂等的塑膠膜等。 作為剝離劑,可舉出矽酮(silicone)系樹脂、烯烴系樹脂、異戊二烯系樹脂、丁二烯系樹脂等的橡膠系彈性體、長鏈烷基系樹脂、醇酸(alkyd)系樹脂、氟系樹脂等。 剝離膜的厚度沒有特別限制,通常為20~250μm左右。Examples of the base material for the release film include paper base materials such as glassine paper, coated paper, and fine paper; and laminated paper in which a thermoplastic resin such as polyethylene is bonded to these paper base materials. ; Plastic films of polyethylene terephthalate resin, polybutylene terephthalate resin, polyethylene naphthalate resin, polypropylene resin, polyethylene resin, etc. Examples of the release agent include rubber-based elastomers such as silicone-based resins, olefin-based resins, isoprene-based resins, and butadiene-based resins, long-chain alkyl-based resins, and alkyds. resin, fluorine resin, etc. The thickness of the release film is not particularly limited, but is usually about 20 to 250 μm.
本發明的密封片,在密封劑層的兩側各自具有1片,合計具有2片剝離膜。此時2片剝離膜可為相同,亦可為不同,2片剝離膜以具有不同的剝離力為佳。藉由2片剝離膜的剝離力不同,在密封片使用時不容易產生問題。亦即,藉由使2片剝離膜的剝離力不同,能夠效率更良好地進行最初將剝離膜剝離之步驟。The sealing sheet of the present invention has one release film on both sides of the sealant layer, and a total of two release films. At this time, the two peeling films may be the same or different. It is preferred that the two peeling films have different peeling forces. Due to the different peeling forces of the two pieces of release film, problems are less likely to occur when using the sealing sheet. That is, by making the peeling force of two peeling films different, the step of peeling off a peeling film initially can be performed more efficiently.
密封片的製造方法沒有特別限定。例如,能夠使用澆鑄法(cast)而製造密封片。 在使用澆鑄法製造密封片時,能夠使用習知的方法,藉由將本發明的密封劑組合物塗佈在基材或剝離膜之經剝離處理的剝離層面,且將所得到的塗膜乾燥,而能夠得到密封片。The manufacturing method of the sealing sheet is not particularly limited. For example, the sealing sheet can be manufactured using a casting method. When the sealing sheet is manufactured using the casting method, a conventional method can be used, by applying the sealant composition of the present invention to the base material or the peeling surface of the release film that has been peeled off, and drying the resulting coating film. , and the sealing sheet can be obtained.
作為密封劑組合物之方法,可舉出,例如,旋轉塗佈法、噴霧塗佈法、桿塗佈法、刮刀塗佈法、輥塗佈法、刀片塗佈法、模塗佈法、凹版塗佈法等。Examples of methods for producing the sealant composition include spin coating, spray coating, rod coating, blade coating, roll coating, blade coating, die coating, and gravure coating. Coating method, etc.
作為將塗膜乾燥之方法,可舉出熱風乾燥、熱輥乾燥、紅外線照射等先前習知的乾燥方法。 作為將塗膜乾燥的條件,例如在80~150℃、30秒起至5分鐘。Examples of methods for drying the coating film include conventionally known drying methods such as hot air drying, hot roller drying, and infrared irradiation. Conditions for drying the coating film include, for example, 80 to 150° C. for 30 seconds to 5 minutes.
本發明的密封片的密封劑層是具有熱硬化性之物。 亦即,藉由將密封劑層加熱,至少具有環狀醚基的化合物的環氧基與黏結劑樹脂所具有之官能基進行反應,而使密封劑層硬化。The sealant layer of the sealing sheet of the present invention has thermosetting property. That is, by heating the sealant layer, at least the epoxy group of the compound having a cyclic ether group reacts with the functional group of the binder resin, thereby hardening the sealant layer.
使密封劑層熱硬化時的條件,沒有特別限定。 加熱溫度通常為80~200℃,較佳為90~150℃。 加熱時間通常為30分鐘起至12小時,較佳為1~6小時。The conditions for thermally hardening the sealant layer are not particularly limited. The heating temperature is usually 80~200℃, preferably 90~150℃. The heating time usually ranges from 30 minutes to 12 hours, preferably 1 to 6 hours.
硬化處理後的密封劑層具有優異的黏著強度。 硬化處理後的密封劑層之黏著強度,在溫度23℃、相對濕度50%的條件下進行180∘剝離試驗時,通常為1~20N/25mm,較佳為2.5~15N/25mm。該180∘剝離試驗,能夠在,例如,溫度23℃、相對濕度50%的條件下,且依據JIS Z0237:2009記載的黏著力測定方法而進行。The hardened sealant layer has excellent adhesive strength. The adhesive strength of the hardened sealant layer is usually 1~20N/25mm, preferably 2.5~15N/25mm, when performing a 180∘ peel test at a temperature of 23°C and a relative humidity of 50%. This 180∘ peel test can be performed, for example, under the conditions of a temperature of 23° C. and a relative humidity of 50%, and based on the adhesive force measurement method described in JIS Z0237:2009.
硬化處理後的密封劑層的無色透明性優異。 硬化處理後之厚度為20μm的密封劑層的總光線透射率,良好為85%以上,較佳為90%以上。總光線透射率沒有特別的上限,通常為95%以下。 如上述,在本發明的密封劑組合物,是將黏結劑樹脂(B)及與該黏結劑樹脂(B)相容性較高的環狀醚化合物(A)組合而使用。其結果,硬化處理後的密封劑層之總光線透射率變為較高。總光線透射率能夠依據JIS K7361-1:1997而測定。The sealant layer after hardening treatment has excellent colorless transparency. The total light transmittance of the sealant layer with a thickness of 20 μm after hardening treatment is preferably more than 85%, and preferably more than 90%. There is no special upper limit for total light transmittance, but it is usually below 95%. As described above, the sealant composition of the present invention is used in combination with the binder resin (B) and the cyclic ether compound (A) that is highly compatible with the binder resin (B). As a result, the total light transmittance of the hardened sealant layer becomes higher. The total light transmittance can be measured in accordance with JIS K7361-1:1997.
又,硬化後的密封劑層之水蒸氣透過率,通常為0.1~200 g.m-2 .day-1 ,較佳為0.1~150 g.m-2 .day-1 。 水蒸氣透過率能夠使用習知的氣體透過率測定裝置而測定。In addition, the water vapor transmission rate of the hardened sealant layer is usually 0.1~200 g. m -2 . day -1 , preferably 0.1~150 g. m -2 . day -1 . The water vapor transmission rate can be measured using a conventional gas transmission rate measuring device.
如上述,本發明的密封片密封劑層的硬化物,黏著強度、無色透明性及水蒸氣隔離性均優異。因此,本發明的密封片能夠適合使用在有機EL元件等發光裝置的密封材等的光學用途。As described above, the cured product of the sealant layer of the sealing sheet of the present invention is excellent in adhesive strength, colorless transparency, and water vapor barrier properties. Therefore, the sealing sheet of the present invention can be suitably used for optical applications such as sealing materials for light-emitting devices such as organic EL elements.
3)密封體 本發明的密封體,是使用本發明的密封片將被密封物密封而成之物。本發明的密封體,因為具備在-20℃~+90℃的廣泛溫度範圍的密封性優異之由本發明的密封劑組合物所形成之密封劑層,所以在廣泛溫度範圍之對被密封物的密封性優異。3)Sealing body The sealing body of the present invention is a product in which an object to be sealed is sealed using the sealing sheet of the present invention. The sealing body of the present invention has a sealant layer formed of the sealant composition of the present invention that has excellent sealing properties in a wide temperature range of -20°C to +90°C. Excellent sealing performance.
所謂「使用本發明的密封片將被密封物密封而成」,是指將構成本發明的密封片之剝離膜除去而使密封劑層露出,使該密封劑層密著在被密封物並使其硬化,且將被密封物覆蓋。 作為本發明的密封體,可舉出,例如,具備基板、形成在該基板上之元件(被密封物)及用以將該元件密封之密封材之物,且前述密封材為源自本發明的密封片的密封劑層之物(密封劑層的硬化物)。The term "the object to be sealed is sealed using the sealing sheet of the present invention" means that the peeling film constituting the sealing sheet of the present invention is removed to expose the sealant layer, and the sealant layer is closely adhered to the object to be sealed and It hardens and will be covered by the seal. Examples of the sealing body of the present invention include, for example, a substrate, a component (sealed object) formed on the substrate, and a sealing material for sealing the component. The sealing material is derived from the present invention. The sealant layer of the sealing sheet (hardened product of the sealant layer).
基板沒有特別限定,能夠使用各種基板材料。特別是,以使用可見光透射率較高的基板材料為佳。又,以阻止從元件外部侵入的水分、氣體等之隔離性能高且耐溶劑性、耐候性等優異之材料為佳。具體而言,可舉出石英、玻璃等的透明無機材料;聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯、聚碳酸酯、聚苯乙烯、聚乙烯、聚丙烯、聚苯硫、聚偏二氟乙烯、乙酸纖維素、溴化苯氧基、聚芳醯胺(aramid)類、聚醯亞胺類、聚苯乙烯類、聚芳香酯(polyarylate)類、聚碸類、聚烯烴類等的透明塑膠及前述的氣體阻障性膜。 基板的厚度沒有特別限制,能夠考慮光的透射率、將元件內外隔離之性能而適當地選擇。The substrate is not particularly limited, and various substrate materials can be used. In particular, it is preferable to use a substrate material with high visible light transmittance. In addition, a material with high isolation performance to prevent moisture, gas, etc. from intruding from outside the element, and excellent solvent resistance, weather resistance, etc. is preferred. Specific examples include transparent inorganic materials such as quartz and glass; polyethylene terephthalate, polyethylene naphthalate, polycarbonate, polystyrene, polyethylene, polypropylene, and polyphenylene sulfide. , polyvinylidene fluoride, cellulose acetate, brominated phenoxy, polyarylimine (aramid), polyimide, polystyrene, polyarylate (polyarylate), polystyrene, poly Transparent plastics such as olefins and the aforementioned gas barrier films. The thickness of the substrate is not particularly limited and can be appropriately selected taking into consideration the light transmittance and the performance of isolating the inside and outside of the element.
作為被密封物,可舉出有機EL元件、有機EL顯示器元件、液晶顯示器元件、太陽電池元件等。Examples of the object to be sealed include organic EL elements, organic EL display elements, liquid crystal display elements, solar cell elements, and the like.
本發明的密封體的製造方法沒有特別限定。 可舉出,例如,將本發明的密封片的一剝離膜除去,且將露出的密封劑層貼附在被密封物,藉由將所得到的密封物加熱而使密封劑層硬化之方法。在本發明,亦可將硬化後的密封劑層上之剝離片剝離後,將氣體阻障膜貼附在露出的密封劑層上。The method of manufacturing the sealing body of the present invention is not particularly limited. For example, a method of removing a release film of the sealing sheet of the present invention, attaching the exposed sealant layer to the object to be sealed, and curing the sealant layer by heating the obtained sealant. In the present invention, the release sheet on the hardened sealant layer can also be peeled off, and then the gas barrier film can be attached to the exposed sealant layer.
又,亦能夠採用(α)將本發明的密封片的一剝離膜除去,將氣體阻障膜貼附在露出的密封劑層,之後,將另一剝離膜除去且將黏著劑層貼附在被密封物上,藉由將所得到的密封物加熱使密封片的密封劑層硬化,而使用密封片的密封劑層將被密封物密封之方法;(β)將本發明的密封片的一剝離膜除去,且將露出的密封劑層貼附在被密封物,之後,將另一剝離膜除去,且將氣體阻障膜貼附在露出的密封劑層,藉由將所得到的密封物加熱使密封片的密封劑層硬化,而使用密封片的密封劑層將被密封物密封之方法。In addition, (α) can also be used to remove one release film of the sealing sheet of the present invention, affix the gas barrier film to the exposed sealant layer, and then remove the other release film and affix the adhesive layer to the exposed sealant layer. On the object to be sealed, the sealant layer of the sealing sheet is hardened by heating the obtained sealing object, and the object to be sealed is sealed using the sealant layer of the sealing sheet; (β) A method of applying one part of the sealing sheet of the present invention to the object to be sealed. The release film is removed, and the exposed sealant layer is attached to the object to be sealed. After that, the other release film is removed, and the gas barrier film is attached to the exposed sealant layer, and the obtained sealant is A method in which the sealant layer of the sealing sheet is hardened by heating, and the sealant layer of the sealing sheet is used to seal the object to be sealed.
使密封片密封劑層與被密封物黏著時的黏著條件沒有特別限定。黏著溫度,例如,可為23~100℃,較佳為23~80℃,更佳為23℃~40℃。該黏著處理亦可邊加壓邊進行。 作為使密封劑層硬化時的硬化條件,能夠利用前面已說明的條件。The adhesion conditions for adhering the sealant layer of the sealing sheet to the object to be sealed are not particularly limited. The adhesion temperature, for example, can be 23~100°C, preferably 23~80°C, more preferably 23°C~40°C. This adhesion treatment can also be performed while applying pressure. As the hardening conditions when hardening the sealant layer, the conditions described above can be used.
氣體阻障性膜在溫度40℃‧相對濕度90%(以下,略記為「90%RH」)的環境下之水蒸氣透過率,以0.1g/m2 /day以下為佳,以0.05g/m2 /day以下為較佳,以0.005g/m2 /day以下為更佳。 藉由氣體阻障性膜在溫度40℃、90%RH的環境下之水蒸氣透過率為0.1g/m2 /day以下,能夠有效地抑制氧、水分等侵入至形成在基板上的有機EL元件等的元件內部,且能夠有效地抑制電極、有機層等產生劣化。 氣體阻障性膜的水蒸氣等的透過率,能夠使用習知的氣體透過率測定裝置而測定。The water vapor transmittance of the gas barrier film in an environment with a temperature of 40°C and a relative humidity of 90% (hereinafter, abbreviated as "90%RH") is preferably 0.1g/m 2 /day or less, and 0.05g/day is preferred. m 2 /day or less is preferred, and 0.005 g/m 2 /day or less is even more preferred. The gas barrier film has a water vapor transmission rate of 0.1g/m 2 /day or less under an environment of 40°C and 90% RH, which can effectively inhibit the intrusion of oxygen, moisture, etc. into the organic EL formed on the substrate. It can effectively suppress the deterioration of electrodes, organic layers, etc. inside components. The transmittance of water vapor and the like of the gas barrier film can be measured using a conventional gas transmittance measuring device.
作為氣體阻障性膜,可舉出金屬箔、薄膜玻璃、樹脂製薄膜等。該等之中,以樹脂製薄膜為佳,以具有基材及氣體阻障層之氣體阻障性膜為較佳。Examples of the gas barrier film include metal foil, thin film glass, and resin films. Among them, a resin film is preferred, and a gas barrier film having a base material and a gas barrier layer is preferred.
作為基材,可舉出樹脂膜。作為樹脂膜的樹脂成分,可舉出聚醯亞胺、聚醯胺、聚醯胺醯亞胺、聚苯醚(polyphenylene ether)、聚醚酮、聚醚醚酮、聚烯烴、聚酯、聚碳酸酯、聚碸、聚醚碸、聚苯硫(polyphenylene sulfide)、聚芳香酯(polyarylate)、丙烯酸系樹脂、環烯烴系聚合物、芳香族系聚合物、聚氨酯系聚合物等。 基材的厚度沒有特別限制,從在密封劑層的乾燥步驟之熱收縮、泛用性的觀點而言,良好為10~500μm,較佳為10~300μm,更佳為15~200μm。 基材的厚度沒有特別限制,從操作容易性的觀點而言,良好為0.5~500μm,較佳為1~200μm,更佳為5~100μm。Examples of the base material include resin films. Examples of the resin component of the resin film include polyamide, polyamide, polyamide imide, polyphenylene ether, polyether ketone, polyether ether ketone, polyolefin, polyester, poly Carbonate, polystyrene, polyether sulfide, polyphenylene sulfide, polyarylate, acrylic resin, cycloolefin polymer, aromatic polymer, polyurethane polymer, etc. The thickness of the base material is not particularly limited, but from the viewpoint of thermal shrinkage in the drying step of the sealant layer and versatility, it is preferably 10 to 500 μm, more preferably 10 to 300 μm, and more preferably 15 to 200 μm. The thickness of the base material is not particularly limited, but from the viewpoint of ease of handling, it is preferably 0.5 to 500 μm, more preferably 1 to 200 μm, and more preferably 5 to 100 μm.
氣體阻障層只要能夠賦予所需要的氣體阻障性之物,材質等沒有特別限定。作為氣體阻障層,可舉出由無機蒸鍍膜所構成之氣體阻障層;含有氣體阻障性樹脂的氣體阻障層;及對含有高分子化合物之層(以下,有稱為「高分子層」之情形)施行改質處理而得到的氣體阻障層[此時,所謂氣體阻障層,不是僅意味著經離子植入處理等改質的區域,而是意味著「包含經改質的區域之高分子層」]等。 該等之中,因為能夠效率良好地形成較薄且氣體阻障性優異之層,以由無機蒸鍍膜所構成之氣體阻障層、或對高分子層施行改質處理而得到的氣體阻障層為佳。氣體阻障膜亦可具有2種以上的該等氣體阻障層。The gas barrier layer is not particularly limited in terms of material, etc., as long as it can provide required gas barrier properties. Examples of the gas barrier layer include a gas barrier layer composed of an inorganic vapor-deposited film; a gas barrier layer containing a gas barrier resin; and a layer containing a polymer compound (hereinafter referred to as "polymer"). layer"). [In this case, the so-called gas barrier layer does not only mean the area that has been modified by ion implantation, etc., but means "including the area that has been modified. The polymer layer of the area"], etc. Among them, a gas barrier layer composed of an inorganic vapor-deposited film or a gas barrier obtained by modifying a polymer layer can be used to efficiently form a thin layer with excellent gas barrier properties. Layer is better. The gas barrier film may also have two or more types of such gas barrier layers.
作為無機蒸鍍膜,可舉出無機化合物和金屬的蒸鍍膜。 作為無機化合物的蒸鍍膜原料,可舉出氧化矽、氧化鋁、氧化鎂、氧化鋅、氧化銦、氧化錫、氧化鋅錫等的無機氧化物;氮化矽、氮化鋁、氮化鈦等的無機氮化物;無機碳化物;無機硫化物;氮氧化矽等的無機氮氧化物;無機碳氧化物;無機碳氮化物;無機氧氮碳化物等。 作為金屬的蒸鍍膜的原料,可舉出鋁、鎂、鋅及錫等。 該等能夠單獨1種或組合2種以上而使用。Examples of inorganic vapor-deposited films include vapor-deposited films of inorganic compounds and metals. Examples of raw materials for vapor deposition films of inorganic compounds include inorganic oxides such as silicon oxide, aluminum oxide, magnesium oxide, zinc oxide, indium oxide, tin oxide, and zinc-tin oxide; silicon nitride, aluminum nitride, titanium nitride, etc. Inorganic nitrides; inorganic carbides; inorganic sulfides; inorganic nitrogen oxides such as silicon oxynitride; inorganic carbon oxides; inorganic carbon nitrides; inorganic oxygen nitrogen carbides, etc. Examples of raw materials for metal vapor deposition films include aluminum, magnesium, zinc, tin, and the like. These can be used individually by 1 type or in combination of 2 or more types.
該等之中,從氣體阻障性的觀點而言,以將無機氧化物、無機氮化物或金屬作為原料之無機蒸鍍膜為佳,而且從無色透明性的觀點而言,以將無機氧化物或無機氮化物作為原料之無機蒸鍍膜為佳。又,無機蒸鍍膜可為單層,亦可為多層。Among them, inorganic vapor-deposited films using inorganic oxides, inorganic nitrides, or metals as raw materials are preferred from the viewpoint of gas barrier properties, and from the viewpoint of colorless transparency, inorganic vapor-deposited films using inorganic oxides as raw materials are preferred. Or an inorganic evaporated film using inorganic nitride as a raw material is preferred. In addition, the inorganic vapor deposition film may be a single layer or multiple layers.
無機蒸鍍膜的厚度,從氣體阻障性及操作性的觀點而言,通常為1nm以上且2000nm以下,良好為3nm以上且1000nm以下,較佳為5nm以上且500nm以下,更佳為40nm以上且200nm以下。The thickness of the inorganic vapor-deposited film is usually 1 nm or more and 2000 nm or less, preferably 3 nm or more and 1000 nm or less, preferably 5 nm or more and 500 nm or less, and more preferably 40 nm or more and 500 nm or less, from the viewpoint of gas barrier properties and operability. Below 200nm.
形成無機蒸鍍膜之方法沒有特別限制,能夠使用習知的方法。作為形成無機蒸鍍膜之方法,可舉出,例如,真空蒸鍍法、濺鍍法、離子噴鍍法等的PVD (物理蒸鍍)法、熱CVD (化學蒸鍍)法、電漿CVD法、光CVD法等的CVD法、原子層堆積法(ALD法)。The method of forming the inorganic vapor deposition film is not particularly limited, and conventional methods can be used. Examples of methods for forming an inorganic vapor deposition film include PVD (physical vapor deposition) methods such as vacuum vapor deposition, sputtering, and ion spraying, thermal CVD (chemical vapor deposition), and plasma CVD. , CVD method such as photo CVD method, atomic layer deposition method (ALD method).
在經改質高分子層的表面而成之氣體阻障層,作為所使用的高分子化合物,可舉出含矽的高分子化合物、聚醯亞胺、聚醯胺、聚醯胺醯亞胺、聚苯醚、聚醚酮、聚醚醚酮、聚烯烴、聚酯、聚碳酸酯、聚碸、聚醚碸、聚苯硫、聚芳香酯(polyarylate)、丙烯酸系樹脂、脂環式烴系樹脂、芳香族系聚合物等。 該等高分子化合物能夠單獨1種或組合2種以上而使用。Examples of polymer compounds used in the gas barrier layer formed on the surface of the modified polymer layer include silicon-containing polymer compounds, polyimide, polyamide, and polyamideimide. , polyphenylene ether, polyether ketone, polyether ether ketone, polyolefin, polyester, polycarbonate, polystyrene, polyether sulfide, polyphenylene sulfide, polyarylate (polyarylate), acrylic resin, alicyclic hydrocarbon Resins, aromatic polymers, etc. These polymer compounds can be used individually by 1 type or in combination of 2 or more types.
該等高分子化合物之中,從能夠形成具有更優異的氣體阻障性之氣體阻障層的觀點而言,以含矽的高分子化合物為佳。作為含矽的高分子化合物,可舉出聚矽氮烷(polysilazane)系化合物、聚碳矽烷(polycarbosilane)系化合物、聚矽烷系化合物、聚有機矽氧烷(polyorganosiloxane)系化合物、聚(伸二矽烷基伸苯基)(poly (disilanylene phenylene))系化合物及聚(伸二矽烷基伸乙基)(poly (disilanylene ethynylene))系化合物等。其中,從即便較薄亦能夠形成具有優異的氣體阻障性之氣體阻障層的觀點而言,以聚矽氮烷系化合物為佳。藉由對含有聚矽氮烷系化合物之層施行改質處理,能夠形成具有將氧、氮、矽作為主構成原子之層(氮氧化矽層)。Among these polymer compounds, silicon-containing polymer compounds are preferred from the viewpoint of being able to form a gas barrier layer having more excellent gas barrier properties. Examples of silicon-containing polymer compounds include polysilazane compounds, polycarbosilane compounds, polysilane compounds, polyorganosiloxane compounds, and poly(disilane) compounds. Poly(disilanylene phenylene)-based compounds and poly(disilanylene ethynylene)-based compounds. Among them, polysilazane-based compounds are preferred from the viewpoint that a gas barrier layer having excellent gas barrier properties can be formed even if it is thin. By subjecting the layer containing the polysilazane compound to a modification treatment, a layer (silicon oxynitride layer) having oxygen, nitrogen, and silicon as its main constituent atoms can be formed.
聚矽氮烷系化合物,是在分子內具有含-Si-N-鍵(矽氮烷鍵)的重複單元之高分子化合物。具體而言,以具有式(1)Polysilazane-based compounds are polymer compounds having repeating units containing -Si-N- bonds (silazane bonds) in the molecule. Specifically, with formula (1)
表示的重複單元之化合物為佳。又,使用的聚矽氮烷系化合物的數量平均分子量沒有特別限定,以100~50,000為佳。The compounds represented by the repeating units are preferred. In addition, the number average molecular weight of the polysilazane-based compound used is not particularly limited, but is preferably 100 to 50,000.
前述式(1)中,n表示任意的自然數。Rx、Ry、Rz各自獨立且表示氫原子、未取代或具有取代基的烷基、未取代或是具有取代基的環烷基、未取代或具有取代基的烯基、未取代或是具有取代基的芳基或烷基矽烷基等的非水解性基。In the aforementioned formula (1), n represents an arbitrary natural number. Rx, Ry, and Rz are each independent and represent a hydrogen atom, an unsubstituted or substituted alkyl group, an unsubstituted or substituted cycloalkyl group, an unsubstituted or substituted alkenyl group, an unsubstituted or substituted A non-hydrolyzable group such as an aryl group or an alkylsilyl group.
該等之中,作為Rx、Ry、Rz,以氫原子、碳數1~6的烷基、或苯基為佳,以氫原子為特佳。Among these, a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a phenyl group is preferred as Rx, Ry, and Rz, and a hydrogen atom is particularly preferred.
作為具有前述式(1)表示的重複單元之聚矽氮烷系化合物,可為Rx、Ry、Rz全部是氫原子之無機聚矽氮烷、Rx、Ry、Rz的至少1個不是氫原子之有機聚矽氮烷的任一者。The polysilazane compound having the repeating unit represented by the formula (1) may be an inorganic polysilazane in which all Rx, Ry, and Rz are hydrogen atoms, and at least one of Rx, Ry, and Rz is not a hydrogen atom. Any of organopolysilazane.
又,在本發明,亦能夠使用聚矽氮烷改性物作為聚矽氮烷系化合物。作為聚矽氮烷改性物,可舉出,例如,在特開昭62-195024號公報、特開平2-84437號公報、特開昭63-81122號公報、特開平1-138108號公報、特開平2-175726號公報、特開平5-238827號公報、特開平6-122852號公報、特開平6-306329號公報、特開平6-299118號公報、特開平9-31333號公報、特開平5-345826號公報、特開平4-63833號公報等記載之物。 Furthermore, in the present invention, a modified polysilazane can also be used as the polysilazane compound. Examples of modified polysilazane include those disclosed in Japanese Patent Application Laid-Open Nos. 62-195024, 2-84437, 63-81122, 1-138108, Japanese Patent Application Publication No. 175726, Japanese Patent Application Publication No. 5-238827, Japanese Patent Application Publication No. 6-122852, Japanese Patent Application Publication No. 6-306329, Japanese Patent Application Publication No. 6-299118, Japanese Patent Application Publication No. 9-31333, Japanese Patent Application Publication No. 5-345826, Japanese Patent Application Publication No. 4-63833, etc.
該等之中,作為聚矽氮烷系化合物,從取得容易性及能夠形成具有優異的氣體阻障性之離子植入層的觀點而言,以Rx、Ry、Rz全部是氫原子之全氫化聚矽氮烷為佳。 Among these, as a polysilazane-based compound, Rx, Ry, and Rz are all fully hydrogenated hydrogen atoms from the viewpoint of ease of acquisition and ability to form an ion implantation layer with excellent gas barrier properties. Polysilazane is preferred.
又,作為聚矽氮烷系化合物,亦能夠直接使用市售作為玻璃塗佈材之市售品等。 In addition, as the polysilazane compound, commercially available products as glass coating materials can also be used as they are.
聚矽氮烷系化合物能夠單獨1種或組合2種以上而使用。 The polysilazane compound can be used individually by 1 type or in combination of 2 or more types.
高分子層除了上述高分子化合物以外,在不阻礙本發明的目的之範圍亦可含有其它成分。作為其它成分,可舉出硬化劑、其它高分子、防老劑、光安定劑、阻燃劑等。 In addition to the above-mentioned polymer compounds, the polymer layer may contain other components within a range that does not hinder the object of the present invention. Examples of other components include hardeners, other polymers, antioxidants, light stabilizers, flame retardants, and the like.
高分子層中的高分子化合物含量,從形成氣體阻障性更優異之氣體阻障層的觀點而言,以50質量%以上為佳,以70質量%以上為較佳。 The content of the polymer compound in the polymer layer is preferably 50 mass% or more, and more preferably 70 mass% or more, from the viewpoint of forming a gas barrier layer with better gas barrier properties.
高分子層的厚度沒有特別限制,通常為20nm以上且50μm以下,較佳為30nm以上且1μm以下,更佳為40nm以上且500nm以下。 The thickness of the polymer layer is not particularly limited, but is usually from 20 nm to 50 μm , preferably from 30 nm to 1 μm , and more preferably from 40 nm to 500 nm.
高分子層能夠藉由,例如,將使高分子化合物溶解或分散在有機溶劑而成之液體,使用習知的塗佈方法塗佈在基材或其它層上,而且將所得到的塗膜乾燥而形成。 The polymer layer can be coated on the substrate or other layers using a conventional coating method using, for example, a liquid in which a polymer compound is dissolved or dispersed in an organic solvent, and the resulting coating film is dried. And formed.
作為使用的有機溶劑之具體例,取決於所使用的基材、高分子化合物的種類,可舉出甲苯、二甲苯等的芳香族系溶劑;乙酸乙酯等的酯系溶劑;甲基乙基酮等的酮系溶劑;二丁醚、乙二醇、單丁醚、1,3-二氧雜戊環等的醚系溶劑;氯化甲烷、二氯乙烷、二氯甲烷等的鹵化烴系溶劑;己烷等的脂肪族烴系溶劑等。該等溶劑能夠單獨使用1種或混合2種以上而使用。Specific examples of the organic solvent used depend on the type of base material and polymer compound used, and include aromatic solvents such as toluene and xylene; ester solvents such as ethyl acetate; methylethyl solvents; Ketone-based solvents such as ketones; ether-based solvents such as dibutyl ether, ethylene glycol, monobutyl ether, and 1,3-dioxolane; halogenated hydrocarbons such as chlorinated methane, dichloroethane, and dichloromethane. Solvents; aliphatic hydrocarbon solvents such as hexane, etc. These solvents can be used individually by 1 type or in mixture of 2 or more types.
高分子化合物溶液能夠藉由使高分子化合物溶解在有機溶劑而調製。 高分子化合物溶液之高分子化合物的固體成分濃度良好為1~60質量%,較佳為3~45質量%,更佳為3~30質量%。具有該範圍的固體成分濃度時,能夠使基材適當地溶解,而且,藉由適當的黏度能夠得到具有優異的塗佈作業性之溶液。 高分子化合物溶液在不阻礙本發明的效果之範圍,亦可含有輔助溶解之成分等的其它成分。The polymer compound solution can be prepared by dissolving the polymer compound in an organic solvent. The solid content concentration of the polymer compound in the polymer compound solution is preferably 1 to 60 mass %, more preferably 3 to 45 mass %, and more preferably 3 to 30 mass %. When the solid content concentration is within this range, the base material can be appropriately dissolved, and a solution having excellent coating workability can be obtained with an appropriate viscosity. The polymer compound solution may also contain other components such as components that assist dissolution within a range that does not hinder the effects of the present invention.
作為將前述高分子化合物溶液塗佈在基材之方法,沒有特別限定,能夠利用旋轉塗佈法、噴霧塗佈法、桿塗佈法、刮刀塗佈法、輥塗佈法、刀片塗佈法、模塗佈法、凹版塗佈法等習知的塗佈方法。The method for applying the polymer compound solution to the base material is not particularly limited, and spin coating, spray coating, rod coating, blade coating, roll coating, and blade coating can be used. , die coating method, gravure coating method and other common coating methods.
塗膜的乾燥方法亦沒有特別限定,能夠利用作為將先前習知的塗膜乾燥之方法已舉出的方法。 加熱溫度通常為80~150℃,加熱時間通常為數十秒起至數十分鐘。The drying method of the coating film is not particularly limited, and methods listed as methods for drying conventionally known coating films can be used. The heating temperature is usually 80~150℃, and the heating time is usually tens of seconds to tens of minutes.
作為將高分子層表面改質之方法,可舉出離子植入處理、電漿處理、紫外線照射處理、熱處理等。 離子植入處理,如後所述,是將經加速的離子植入高分子層而將高分子層改質之方法。 電漿處理是將高分子層暴露在電漿中而將高分子層改質之方法。例如,能夠依照特開2012-106421號公報記載的方法而進行電漿處理。 紫外線照射處理是對高分子層照射紫外線而將高分子層改質之方法。例如,能夠依照特開2013-226757號公報記載的方法而進行紫外線改質處理。Examples of methods for modifying the surface of the polymer layer include ion implantation treatment, plasma treatment, ultraviolet irradiation treatment, heat treatment, and the like. The ion implantation process, as described later, is a method of implanting accelerated ions into a polymer layer to modify the polymer layer. Plasma treatment is a method of exposing the polymer layer to plasma to modify the polymer layer. For example, plasma treatment can be performed according to the method described in Japanese Patent Application Laid-Open No. 2012-106421. Ultraviolet irradiation treatment is a method of irradiating ultraviolet rays to the polymer layer to modify the polymer layer. For example, ultraviolet modification treatment can be performed according to the method described in Japanese Patent Application Laid-Open No. 2013-226757.
該等氣體阻障層之中,從不使高分子層表面粗糙而效率良好地改質至其內部為止,且能夠形成氣體阻障性更優異之氣體阻障層的觀點而言,以對含有含矽的高分子化合物之層施行離子植入處理而得到之物為佳。Among these gas barrier layers, from the viewpoint of efficiently modifying the polymer layer to its interior without roughening the surface of the polymer layer, and forming a gas barrier layer with more excellent gas barrier properties, a gas barrier layer containing Preferably, the layer of the silicon-containing polymer compound is subjected to ion implantation treatment.
作為植入至高分子層之離子,可舉出氬、氦、氖、氪、氙等的稀有氣體的離子;氟碳、氫、氮、氧、二氧化碳、氯、氟、硫等的離子;甲烷、乙烷等的烷系氣體類的離子;乙烯、丙烯等的烯系氣體類的離子;戊二烯、丁二烯等的二烯烴系氣體類的離子;乙炔等的炔系氣體類的離子;苯、甲苯等的芳香族烴系氣體類的離子;環丙烷等的環烷系氣體類的離子;環戊烯等的環烯系氣體類的離子;金屬的離子;有機矽化合物的離子等。 該等離子能夠單獨1種或組合2種以上而使用 該等之中,因為能夠更簡便地植入離子且能夠形成具有更優異的氣體阻障性之氣體阻障層,以氬、氦、氖、氪、氙等的稀有氣體的離子為佳。Examples of ions implanted into the polymer layer include ions of rare gases such as argon, helium, neon, krypton, and xenon; ions of fluorocarbon, hydrogen, nitrogen, oxygen, carbon dioxide, chlorine, fluorine, sulfur, etc.; methane, Ions of alkane-based gases such as ethane; ions of olefin-based gases such as ethylene and propylene; ions of diene-based gases such as pentadiene and butadiene; ions of acetylene-based gases such as acetylene; Ions of aromatic hydrocarbon-based gases such as benzene and toluene; ions of cycloalkane-based gases such as cyclopropane; ions of cycloolefin-based gases such as cyclopentene; metal ions; ions of organic silicon compounds, etc. This plasma can be used alone or in combination of two or more types. Among them, ions of rare gases such as argon, helium, neon, krypton, and xenon are preferred because ions can be implanted more easily and a gas barrier layer with better gas barrier properties can be formed.
離子的植入量能夠配合氣體阻障膜的使用目的(需要的氣體阻障性、無色透明性等)等而適當地決定。The implantation amount of ions can be appropriately determined according to the purpose of use of the gas barrier film (required gas barrier properties, colorless transparency, etc.).
作為植入離子之方法,可舉出照射經電場加速的離子(離子射束)之方法;及將電漿中的離子(電漿離子)植入之方法等。其中,從能夠簡便地形成目標氣體阻障層之觀點而言,以後者的將電漿離子植入之方法(電漿離子植入法)為佳。Examples of methods of implanting ions include a method of irradiating ions accelerated by an electric field (ion beam), a method of implanting ions in plasma (plasma ions), and the like. Among them, the latter method of implanting plasma ions (plasma ion implantation method) is preferable from the viewpoint of being able to easily form the target gas barrier layer.
電漿離子植入法,例如,是在含有稀有氣體等的電漿生成氣體之環境下使其產生電漿,且對高分子層施加負的高電壓脈衝,藉此而能夠將該電漿中的離子(陽離子)植入至高分子層的表面部。更具體而言,能夠使用WO2010/107018號小冊子等記載的方法而實施電漿離子植入法。The plasma ion implantation method, for example, generates plasma in an environment containing a plasma-generating gas such as a rare gas, and applies a negative high-voltage pulse to the polymer layer, whereby the plasma can be neutralized. ions (cations) are implanted into the surface of the polymer layer. More specifically, the plasma ion implantation method can be implemented using the method described in pamphlet WO2010/107018 or the like.
藉由離子植入,被植入離子的區域之厚度,能夠藉離子種類、施加電壓、處理時間等的植入條件而控制,而且按照高分子層的厚度和氣體阻障膜的使用目的等而決定即可,通常為10nm以上且400nm以下。Through ion implantation, the thickness of the region where ions are implanted can be controlled by implantation conditions such as ion species, applied voltage, and processing time, and depends on the thickness of the polymer layer and the purpose of use of the gas barrier film. Just decide, usually 10nm or more and 400nm or less.
能夠藉由使用X射線光電子光譜分析(XPS)而進行從高分子層表面起至10nm附近的元素分析測定,而確認離子已經植入。Implantation of ions can be confirmed by performing elemental analysis and measurement from the surface of the polymer layer to around 10 nm using X-ray photoelectron spectroscopy (XPS).
本發明的密封體是使用本發明的密封片將被密封物密封而成之物。因而,在本發明的密封體,能夠長期間持續維持被密封物的性能。 [實施例]The sealing body of the present invention is a sealed object sealed using the sealing sheet of the present invention. Therefore, the sealing body of the present invention can continuously maintain the performance of the sealed object for a long period of time. [Example]
以下,舉出實施例而更詳細地說明本發明。但是本發明不限定於以下的實施例。 各例中的份及%只要未預先告知,就是質量基準。Hereinafter, an Example is given and this invention is demonstrated in more detail. However, the present invention is not limited to the following examples. The parts and % in each example are based on quality unless notified in advance.
[儲存模數測定方法] (1)硬化前的儲存模數 硬化前的儲存模數,是將實施例、比較例所得到的密封劑組合物加工成為薄片狀而得到的密封片,使用貼合機且在23℃使其層積至試樣厚度1mm之後,將該物使用作為測定用試料而測定。亦即,使用儲存模數測定裝置(Anton Paar公司製、製品名:Physica MCR301),在頻率1Hz、變形1%、升溫速度3℃/分鐘的條件下,而得到23℃的彈性模數之值。 (2)硬化後的儲存模數 [硬化後的密封片儲存模數之測定] 硬化後的儲存模數,是將實施例、比較例所得到的密封劑組合物加工成為薄片狀而得到的密封片,使用貼合機且在23℃層積至試樣厚度200μm之後,在100℃、1小時的硬化條件下使密封片的密封劑層硬化,將該物使用作為測定用試料而測定。亦即,使用儲存模數測定裝置(TA Instruments公司製、製品名:DMAQ800),在頻率11Hz、振幅5μm、升溫速度3℃/分鐘的條件下,而得到-20℃~+90℃的溫度範圍的彈性模數之值。[Storage modulus measurement method] (1) Storage modulus before hardening The storage modulus before hardening is obtained by processing the sealant compositions obtained in the Examples and Comparative Examples into a sheet shape and laminating the sealing sheet to a sample thickness of 1 mm using a laminating machine at 23°C. This substance was used as a measurement sample and measured. That is, a storage modulus measuring device (manufactured by Anton Paar, product name: Physica MCR301) was used to obtain an elastic modulus value of 23°C under the conditions of frequency 1Hz, deformation 1%, and temperature rise rate 3°C/min. . (2) Storage modulus after hardening [Determination of storage modulus of hardened sealing sheet] The storage modulus after hardening is a sealing sheet obtained by processing the sealant composition obtained in the Examples and Comparative Examples into a sheet shape, laminating it to a sample thickness of 200 μm using a laminating machine at 23°C, and then laminating it at 100 The sealant layer of the sealing sheet was cured under curing conditions of 1 hour at 10° C., and this was used as a measurement sample for measurement. That is, using a storage modulus measuring device (manufactured by TA Instruments, product name: DMAQ800), under the conditions of a frequency of 11 Hz, an amplitude of 5 μm, and a temperature rise rate of 3°C/min, a temperature range of -20°C to +90°C was obtained. The value of the elastic modulus.
[有機EL元件的評價試驗] 使用以下的方法而製造將具有經成膜形成氧化銦錫(ITO)膜(厚度:100nm;薄片電阻:50Ω/□(ohms per square,歐姆/平方))之玻璃基板作為陽極之有機EL元件。 首先,在前述玻璃基板的ITO膜上依序以0.1~0.2nm/分鐘的速度蒸鍍N,N’-雙(1-萘基)-N,N’-雙(苯基)-聯苯胺)(N,N'-bis(1-naphthyl)-N,N'-bis(phenyl)-benzidine);Luminescence Technology公司製)蒸鍍50nm、及參(8-羥基-喹啉酸)鋁(tris (8-hydroxy-quinolinate) aluminum;Lumine scence Technology公司製) 50nm而形成發光層。 在所得到的發光層上,將氟化鋰(LiF)(高純度化學研究所公司製)作為電子植入材料,且以0.1nm/分鐘的速度形成4nm,之後,使鋁(Al)(高純度化學研究所公司製)以0.1nm/分鐘的速度蒸鍍100nm,而形成陰極,以得到有機EL元件。 又,蒸鍍時的真空度全部為1×10-4 Pa以下。[Evaluation test of organic EL elements] Glass having a film-formed indium tin oxide (ITO) film (thickness: 100 nm; sheet resistance: 50Ω/□ (ohms per square, ohms per square)) was produced using the following method. The substrate serves as the anode for the organic EL element. First, N,N'-bis(1-naphthyl)-N,N'-bis(phenyl)-benzidine) is evaporated sequentially on the ITO film of the aforementioned glass substrate at a speed of 0.1~0.2nm/min. (N,N'-bis(1-naphthyl)-N,N'-bis(phenyl)-benzidine); manufactured by Luminescence Technology Co., Ltd.) evaporated 50 nm, and ginseng (8-hydroxy-quinolinic acid) aluminum (tris ( 8-hydroxy-quinolinate) aluminum; Lumine scence Technology Co., Ltd.) 50nm to form a light-emitting layer. On the obtained light-emitting layer, lithium fluoride (LiF) (manufactured by High Purity Chemical Research Institute Co., Ltd.) was used as an electron implant material, and was formed into a thickness of 4 nm at a speed of 0.1 nm/min. After that, aluminum (Al) (high (manufactured by Purity Chemical Laboratory Co., Ltd.) was evaporated to a thickness of 100 nm at a rate of 0.1 nm/min to form a cathode, thereby obtaining an organic EL element. In addition, the degree of vacuum during vapor deposition was all 1×10 -4 Pa or less.
將實施例或比較例所得到的密封片的剝離膜剝下1片,將露出的密封劑層重疊在金屬箔膜上,使用貼合機於23℃將該等黏著。之後,將另1片剝離膜剝離,將露出的密封劑層,以覆蓋形成在玻璃基板上的有機EL元件之方式重疊,使用貼合機於23℃將該等黏著。之後,於100℃加熱2小時使密封劑層硬化,以得到經密封有機EL元件之底部發光(bottom emission)電子裝置。 使該電子裝置在溫度60℃、相對濕度90%的環境下靜置250小時之後,使有機EL元件起動,觀察有無暗點(非發光處),基於以下的基準而進行評價。 ○:暗點為小於發光面積的40%。 △:暗點為發光面積的40%以上且小於50% ╳:暗點為發光面積的50%以上One piece of the release film of the sealing sheet obtained in the Example or Comparative Example was peeled off, the exposed sealant layer was overlapped on the metal foil film, and these were adhered using a laminating machine at 23°C. After that, the other release film was peeled off, and the exposed sealant layer was overlapped so as to cover the organic EL element formed on the glass substrate, and these were adhered using a laminating machine at 23°C. Afterwards, the sealant layer is heated at 100° C. for 2 hours to harden the sealant layer, thereby obtaining a bottom emission electronic device with a sealed organic EL element. After the electronic device was allowed to stand for 250 hours in an environment with a temperature of 60° C. and a relative humidity of 90%, the organic EL element was started, and the presence or absence of dark spots (non-luminescent areas) was observed, and evaluation was performed based on the following criteria. ○: The dark spot is less than 40% of the luminous area. △: Dark spots are more than 40% and less than 50% of the luminous area ╳: The dark spot is more than 50% of the luminous area
[實施例1] 將作為黏結劑成分之改性烯烴系樹脂(酸改性α-烯烴聚合物,三井化學公司製,商品名:UNISTOLE H-200,重量平均分子量:52,000,官能基:羧基) 100份,具有環狀醚基的化合物(日產化學公司製,商品名:TEPIC-FL、重量平均分子量:525,官能基:環氧丙基) 100份、作為硬化觸媒之陽離子聚合起始劑(三新化學工業公司製,商品名:SAN-AID SI-B2A) 1份、矽烷偶合劑(信越化學工業公司製,商品名:KBM4803) 0.2份溶解在甲基乙基酮而調製固體成分濃度30%的塗佈液。 將該塗佈液塗佈在剝離膜(LINTEC公司製,商品名:SP-PET382150)的剝離處理面上,將所得到的塗膜於100℃乾燥2分鐘,而形成厚度為10μm的密封劑層,將另1片剝離膜(LINTEC公司製,品名:SP-PET381031)的剝離處理面貼合在其上而得到密封片1。[Example 1] 100 parts of modified olefin-based resin (acid-modified α-olefin polymer, manufactured by Mitsui Chemicals Co., Ltd., trade name: UNISTOLE H-200, weight average molecular weight: 52,000, functional group: carboxyl group) as a binder component, with ring 100 parts of an ether-like compound (manufactured by Nissan Chemical Co., Ltd., trade name: TEPIC-FL, weight average molecular weight: 525, functional group: epoxypropyl group), cationic polymerization initiator as a hardening catalyst (Sanshin Chemical Industry 1 part of silane coupling agent (manufactured by Shin-Etsu Chemical Industry Co., Ltd., trade name: KBM4803) was dissolved in methyl ethyl ketone to prepare a coating with a solid content concentration of 30%. liquid. This coating liquid was applied to the release-treated surface of a release film (manufactured by LINTEC, trade name: SP-PET382150), and the resulting coating film was dried at 100° C. for 2 minutes to form a sealant layer with a thickness of 10 μm. , the release-treated surface of another release film (manufactured by LINTEC, product name: SP-PET381031) was bonded thereto to obtain the sealing sheet 1.
[實施例2] 在實施例1,除了將具有環狀醚基的化合物的量變更成為150份以外,與實施例1同樣地進行而得到密封片2。[Example 2] In Example 1, the sealing sheet 2 was obtained in the same manner as in Example 1, except that the amount of the compound having a cyclic ether group was changed to 150 parts.
[實施例3] 在實施例1,除了將硬化觸媒的量變更成為1.5份以外,與實施例1同樣地進行而得到密封片3。[Example 3] In Example 1, the sealing sheet 3 was obtained in the same manner as in Example 1 except that the amount of the curing catalyst was changed to 1.5 parts.
[實施例4] 將作為黏結劑成分之苯氧基樹脂(三菱CHEMICAL公司製,商品名:YX7200B35,重量平均分子量:30000,官能基:環氧丙基) 100份、具有環狀醚基的化合物(氫化雙酚A型環氧樹脂(三菱CHEMICAL公司製,商品名:YX8034,分子量:540,官能基環氧基) 250份、作為硬化觸媒之咪唑系硬化觸媒(四國化成公司製,商品名:CUREZOLE 2E4MZ) 2份、矽烷偶合劑(信越化學工業公司製,商品名:KBM4803) 0.2份溶解在甲基乙基酮,而調製固體成分濃度35%的塗佈液。 將該塗佈液塗佈在剝離膜(LINTEC公司製,商品名:SP-PET382150)的剝離處理面上,將所得到的塗膜於100℃乾燥2分鐘,而形成厚度為10μm的密封劑層,將另1片剝離膜(LINTEC公司製,品名:SP-PET381031)的剝離處理面貼合在其上而得到密封片4。[Example 4] 100 parts of phenoxy resin (manufactured by Mitsubishi Chemical Co., Ltd., trade name: YX7200B35, weight average molecular weight: 30000, functional group: glycidyl) as a binder component and a compound having a cyclic ether group (hydrogenated bisphenol A 250 parts of type epoxy resin (manufactured by Mitsubishi Chemical Co., Ltd., trade name: YX8034, molecular weight: 540, functional epoxy group), imidazole-based curing catalyst as a curing catalyst (manufactured by Shikoku Kasei Co., Ltd., trade name: CUREZOLE 2E4MZ ) 2 parts and 0.2 parts of silane coupling agent (manufactured by Shin-Etsu Chemical Industry Co., Ltd., trade name: KBM4803) were dissolved in methyl ethyl ketone to prepare a coating liquid with a solid content concentration of 35%. This coating liquid was applied to the release-treated surface of a release film (manufactured by LINTEC, trade name: SP-PET382150), and the resulting coating film was dried at 100° C. for 2 minutes to form a sealant layer with a thickness of 10 μm. , the release-treated surface of another release film (manufactured by LINTEC, product name: SP-PET381031) was bonded thereto to obtain the sealing sheet 4.
[實施例5] 在實施例4,除了使用陽離子聚合起始劑(三新化學工業股份公司製,商品名:SAN-AID SI-B3) 2份作為硬化觸媒以外,與實施例4同樣地進行而得到密封片5。[Example 5] In Example 4, a sealing sheet was obtained in the same manner as in Example 4, except that 2 parts of a cationic polymerization initiator (manufactured by Sanshin Chemical Industry Co., Ltd., trade name: SAN-AID SI-B3) was used as the curing catalyst. 5.
[實施例6] 在實施例4,使用氫化雙酚A型環氧樹脂(三菱CHEMICAL公司製,商品名:YX8034) 100份、二環戊二烯型環氧樹脂(ADEKA公司製,商品名:EP-4088L,分子量:330,官能基:環氧基) 100份作為具有環狀醚基的化合物,使用陽離子聚合起始劑(三新化學工業公司製,商品名:SAN-AID SI-B2A) 1份作為硬化觸媒,除此之外,與實施例4同樣地進行而得到密封片6。[Example 6] In Example 4, 100 parts of hydrogenated bisphenol A-type epoxy resin (manufactured by Mitsubishi Chemical Co., Ltd., trade name: YX8034) and dicyclopentadiene-type epoxy resin (manufactured by ADEKA Co., Ltd., trade name: EP-4088L, molecular weight : 330, functional group: epoxy group) 100 parts as a compound having a cyclic ether group, use a cationic polymerization initiator (manufactured by Sanshin Chemical Industry Co., Ltd., trade name: SAN-AID SI-B2A) 1 part as a hardening contact The sealing sheet 6 was obtained in the same manner as in Example 4 except that the medium was used.
[實施例7] 在實施例4,使用苯氧基樹脂(三菱CHEMICAL公司製,商品名:YX7200B35,重量平均分子量:30000,官能基:環氧丙基) 100份、縮醛樹脂(積水化學公司製,商品名:KS-5Z,官能基:羥基) 30份作為黏結劑成分,除此之外,與實施例4同樣地進行而得到密封片7。[Example 7] In Example 4, 100 parts of phenoxy resin (manufactured by Mitsubishi Chemical Co., Ltd., trade name: YX7200B35, weight average molecular weight: 30000, functional group: glycidyl) and acetal resin (manufactured by Sekisui Chemical Co., Ltd., trade name: Sealing sheet 7 was obtained in the same manner as in Example 4 except that 30 parts of KS-5Z (functional group: hydroxyl group) was used as the adhesive component.
[實施例8] 在實施例1,將黏結劑成分變更成為苯氧基樹脂(三菱CHEMICAL公司製,商品名:YX6954BH30,重量平均分子量:39,000,官能基:環氧丙基) 100份,將具有環狀醚基的化合物變更成為氫化雙酚A型環氧樹脂(三菱CHEMICAL公司製,商品名:YX8000、分子量:357,官能基:環氧基) 200份,將作為硬化觸媒變更成為陽離子聚合起始劑(三新化學工業股份公司製,商品名:SAN-AID SI-B3) 2.5份,除此之外,與實施例1同樣地進行而得到密封片8。[Example 8] In Example 1, the binder component was changed to 100 parts of phenoxy resin (manufactured by Mitsubishi Chemical Corporation, trade name: YX6954BH30, weight average molecular weight: 39,000, functional group: glycidyl), and The compound was changed to 200 parts of hydrogenated bisphenol A type epoxy resin (manufactured by Mitsubishi Chemical Co., Ltd., trade name: YX8000, molecular weight: 357, functional group: epoxy group), and the curing catalyst was changed to a cationic polymerization initiator (three Manufactured by Shin Chemical Industry Co., Ltd., trade name: SAN-AID SI-B3) 2.5 parts, except having carried out similarly to Example 1, and obtained the sealing sheet 8.
[實施例9] 在實施例8,將黏結劑成分變更成為苯氧基樹脂(三菱CHEMICAL公司製,商品名:YX7200B35) 100份、將環狀醚化合物的量設為130份,將硬化觸媒的量變更成為3.8份,除此之外,與實施例8同樣地進行而得到密封片9。[Example 9] In Example 8, the binder components were changed to 100 parts of phenoxy resin (manufactured by Mitsubishi Chemical Corporation, trade name: YX7200B35), the amount of the cyclic ether compound was changed to 130 parts, and the amount of curing catalyst was changed to 3.8 Except for this, the sealing sheet 9 was obtained in the same manner as in Example 8.
[實施例10] 在實施例8,將黏結劑成分變更成為苯氧基樹脂(三菱CHEMICAL公司製,商品名:YX7200B35) 100份,將硬化觸媒的量變更成為5份,除此之外,與實施例8同樣地進行而得到密封片10。[Example 10] In Example 8, the same procedure as Example 8 was performed except that the binder component was changed to 100 parts of phenoxy resin (manufactured by Mitsubishi Chemical Corporation, trade name: YX7200B35) and the amount of curing catalyst was changed to 5 parts. The sealing sheet 10 is obtained by proceeding as follows.
[實施例11] 在實施例10,將黏結劑成分變更成為苯氧基樹脂(日鐵CHEMICAL & MATERRIAL公司製,商品名:ZX-1356-2,重量平均分子量:65,000,官能基:環氧丙基) 100份,除此之外,與實施例4同樣地進行而得到密封片11。[Example 11] In Example 10, the binder component was changed to 100 parts of phenoxy resin (manufactured by Nippon Steel Chemical & Material Co., Ltd., trade name: ZX-1356-2, weight average molecular weight: 65,000, functional group: epoxypropyl), Except for this, the sealing sheet 11 was obtained in the same manner as in Example 4.
[比較例1] 在實施例1,除了不使用硬化觸媒以外,與實施例1同樣地進行而得到密封片1r。[Comparative example 1] In Example 1, the sealing sheet 1r was obtained in the same manner as in Example 1 except that a curing catalyst was not used.
[比較例2] 在實施例1,將具有環狀醚基的化合物的量變更成為25份,將硬化觸媒的量變更成為0.01份,除此之外,與實施例1同樣地進行而得到密封片2r。[Comparative example 2] In Example 1, the sealing sheet 2r was obtained in the same manner as in Example 1 except that the amount of the compound having a cyclic ether group was changed to 25 parts and the amount of the curing catalyst was changed to 0.01 part.
[比較例3] 在實施例4,除了不使用硬化觸媒以外,與實施例4同樣地進行而得到密封片3r。[Comparative example 3] In Example 4, the sealing sheet 3r was obtained in the same manner as in Example 4 except that a curing catalyst was not used.
[比較例4] 在實施例8,將具有環狀醚基的化合物的量設為90份,使用陽離子聚合起始劑(三新化學工業公司製,商品名:SAN-AID SI-B2A) 0.01份作為硬化觸媒,除此之外,與實施例8同樣地進行而得到密封片4r。[Comparative example 4] In Example 8, the amount of the compound having a cyclic ether group was set to 90 parts, and 0.01 part of the cationic polymerization initiator (manufactured by Sanshin Chemical Industry Co., Ltd., trade name: SAN-AID SI-B2A) was used as the curing catalyst. , Except for this, the same procedure as in Example 8 was performed to obtain the sealing sheet 4r.
將實施例1~11及比較例1r~4r的密封片的密封劑層在硬化前之23℃的儲存模數及在硬化後之-20℃及在+90℃之儲存模數、以及有機EL元件(OLED)評價試驗結果顯示在下述表1、表2。The storage modulus of the sealant layer of the sealing sheets of Examples 1 to 11 and Comparative Examples 1r to 4r at 23°C before curing and the storage modulus at -20°C and +90°C after curing, and the organic EL The device (OLED) evaluation test results are shown in Table 1 and Table 2 below.
[表1] [Table 1]
[表2] [Table 2]
從表1,得知實施例1~11的密封片的密封劑層在23℃之硬化前的儲存模數為6×105 Pa~8×107 Pa範圍,且薄片成形性優異。又,在-20℃之硬化後的儲存模數為8×108 Pa~9×109 Pa的範圍,在+90℃之硬化後的儲存模數為2×108 Pa~5×109 Pa的範圍。 通常,因為儲存模數有隨著溫度越低而越高之傾向,所以在室溫附近(23℃)之硬化後的儲存模數,成為在-20℃與+90℃各自硬化後的儲存模數之中間值。因此,得知實施例1~11的密封片在-20℃起至+90℃之廣泛的溫度區域,具有優異的密封性(特別是實施例1~7的密封片在23℃之硬化前的儲存模數為6×105 Pa~4×106 Pa的範圍,薄片成形性及密封性更優異)。這種情形從在OELD試驗之暗點為發光面積的小於40%,且評價全部為「○」亦可得知。 另一方面,在比較例1r~4r的密封片,得知在硬化後之+90℃的儲存模數為5×104 Pa~5×105 Pa之較低值,且密封性較差。在OELD試驗亦是暗點為發光面積的40%以上且小於50%,且評價為「△」(比較例2、4),暗點為發光面積的50%以上且評價為「╳」(比較例1、3)。From Table 1, it is known that the storage modulus of the sealant layer of the sealing sheets of Examples 1 to 11 before hardening at 23°C is in the range of 6×10 5 Pa to 8×10 7 Pa, and the sheet formability is excellent. In addition, the storage modulus after hardening at -20°C is in the range of 8×10 8 Pa ~ 9×10 9 Pa, and the storage modulus after hardening at +90°C is in the range of 2×10 8 Pa ~ 5×10 9 The range of Pa. Generally, since the storage modulus tends to increase as the temperature decreases, the storage modulus after curing near room temperature (23°C) becomes the storage modulus after hardening at -20°C and +90°C. The middle value of the number. Therefore, it was found that the sealing sheets of Examples 1 to 11 have excellent sealing properties in a wide temperature range from -20°C to +90°C (especially the sealing sheets of Examples 1 to 7 before hardening at 23°C). The storage modulus is in the range of 6×10 5 Pa to 4×10 6 Pa, and the sheet formability and sealing properties are better). This situation can also be seen from the fact that the dark spots in the OELD test are less than 40% of the luminous area, and all evaluations are "○". On the other hand, for the sealing sheets of Comparative Examples 1r to 4r, the storage modulus at +90°C after hardening was a relatively low value of 5×10 4 Pa to 5×10 5 Pa, and the sealing properties were poor. In the OELD test, the dark spots were more than 40% and less than 50% of the light-emitting area, and were evaluated as "△" (Comparative Examples 2 and 4). The dark spots were more than 50% of the light-emitting area, and were evaluated as "╳" (Comparative Examples 2 and 4). Examples 1 and 3).
無。without.
無。without.
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Application Number | Priority Date | Filing Date | Title |
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TW108120646A TWI813697B (en) | 2018-06-15 | 2019-06-14 | Adhesive sheet for device sealing and method for manufacturing device sealing body |
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JP7368202B2 (en) * | 2019-11-29 | 2023-10-24 | リンテック株式会社 | Sealing sheet |
EP4082779A4 (en) * | 2019-12-25 | 2024-01-03 | Nitto Denko Corporation | Layered body |
JP7530524B2 (en) | 2021-09-28 | 2024-08-07 | リンテック株式会社 | Sheet-shaped curable adhesive and optical component |
TW202332750A (en) * | 2021-09-30 | 2023-08-16 | 日商琳得科股份有限公司 | Curable adhesive sheet, and method for producing cured product |
TWI843230B (en) * | 2021-10-13 | 2024-05-21 | 日商巴川集團股份有限公司 | Sealing material |
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JP7303188B2 (en) | 2023-07-04 |
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JPWO2019240261A1 (en) | 2021-07-08 |
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