TWI808948B - Quantum dot light emitting devices - Google Patents

Quantum dot light emitting devices Download PDF

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TWI808948B
TWI808948B TW106136322A TW106136322A TWI808948B TW I808948 B TWI808948 B TW I808948B TW 106136322 A TW106136322 A TW 106136322A TW 106136322 A TW106136322 A TW 106136322A TW I808948 B TWI808948 B TW I808948B
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group
compounds
quantum dot
alkylene
dot light
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TW201818566A (en
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阿納托利 N 索科洛夫
布萊恩 古德費洛
羅伯特大衛 格雷格
利亞姆 P 史賓瑟
約翰 W 克萊默
大衛 D 德沃爾
蘇克里特 慕赫佩德海
彼得 Ⅲ 特萊弗納斯
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美商羅門哈斯電子材料有限公司
美商陶氏全球科技責任有限公司
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Priority claimed from PCT/CN2016/104856 external-priority patent/WO2018082086A1/en
Priority claimed from PCT/CN2016/112579 external-priority patent/WO2018119729A1/en
Priority claimed from PCT/US2017/039191 external-priority patent/WO2018005318A1/en
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Abstract

The present invention provides a quantum dot light emitting diode comprising i) an emitting layer of at least one semiconductor nanoparticle made from semiconductor materials selected from the group consisting of Group II-VI compounds, Group II-V compounds, Group III-VI compounds, Group III-V compounds, Group IV-VI compounds, Group I-III-VI compounds, Group II-IV-VI compounds, Group II-IV-V compounds, or any combination thereof; and ii) a polymer for hole injection or hole transport layer; and the polymer comprises, as polymerized units, at least one or more monomers having a first monomer structure comprising a) a polymerizable group, b) an electroactive group with formula NAr1 Ar2 Ar3 wherein Ar1 , Ar2 and Ar3 independently are C6 -C50 aromatic substituents, and (c) a linker group connecting the polymerizable group and the electroactive group.

Description

量子點發光裝置 quantum dot light emitting device

本發明係關於一種電子裝置,尤其,一種量子點發光二極體。The invention relates to an electronic device, in particular, a quantum dot light-emitting diode.

量子點發光二極體(QLED)為使用多個有機及無機層結合半導體奈米粒子之一發射性層的電致發光裝置,有時被稱作量子點(QD)。QLED中之量子點層能夠當將電輸入施加至裝置時發射光。因此,QLED可用作顯示器及一般照明應用中之光源。QLED之一個限制為缺乏能夠有至量子點層內之高效電荷注入的合適電洞輸送層(HTL)。至量子點內之不良電荷注入導致具有高工作電壓及低光產生效率的QLED裝置。Quantum dot light emitting diodes (QLEDs) are electroluminescent devices that use multiple organic and inorganic layers combined with an emissive layer of semiconductor nanoparticles, sometimes referred to as quantum dots (QDs). The quantum dot layer in a QLED is capable of emitting light when an electrical input is applied to the device. Therefore, QLEDs can be used as light sources in displays and general lighting applications. One limitation of QLEDs is the lack of a suitable hole transport layer (HTL) that enables efficient charge injection into the quantum dot layer. Poor charge injection into quantum dots results in QLED devices with high operating voltage and low light generation efficiency.

因此,存在對於新電洞輸送材料之持續需求,以實現具有高亮度及色彩純度、最小化之功率消耗及高可靠性的改良之QLED裝置。Therefore, there is a continuing need for new hole transport materials to enable improved QLED devices with high brightness and color purity, minimized power consumption, and high reliability.

本發明提供一種量子點發光二極體,其包括:i)一由選自由第II-VI族化合物、第II-V族化合物、第III-VI族化合物、第III-V族化合物、第IV-VI族化合物、第I-III-VI族化合物、第II-IV-VI族化合物、第II-IV-V族化合物或其任何組合組成之群組之半導體材料製成的至少一個半導體奈米粒子之發光層;及ii)一用於電洞注入或電洞輸送層之聚合物;且所述聚合物包括具有一包括以下各者之第一單體結構的至少一或多個單體作為聚合單元:a)一可聚合基團,b)一具有式NAr1 Ar2 Ar3 之電活性基團,其中Ar1 、Ar2 及Ar3 獨立地為C6 至C50 芳香族取代基,及(c)一連接子基團,其連接所述可聚合基團與所述電活性基團。The present invention provides a quantum dot light-emitting diode, which includes: i) a compound selected from group II-VI compounds, group II-V compounds, group III-VI compounds, group III-V compounds, group IV -At least one semiconductor nanometer made of a group of semiconductor materials consisting of Group VI compounds, Group I-III-VI compounds, Group II-IV-VI compounds, Group II-IV-V compounds, or any combination thereof and ii) a polymer for the hole injection or hole transport layer; and said polymer comprises at least one or more monomers having a first monomer structure comprising as Polymerization unit: a) a polymerizable group, b) an electroactive group having the formula NAr 1 Ar 2 Ar 3 , wherein Ar 1 , Ar 2 and Ar 3 are independently C 6 to C 50 aromatic substituents, and (c) a linker group connecting the polymerizable group and the electroactive group.

本發明之量子點發光裝置包括一陽極層、視情況一或多個電洞注入層、一或多個電洞輸送層、視情況一或多個電子阻擋層、一發射層、視情況一或多個電洞阻擋層、視情況一或多個電子輸送層、視情況一或多個電子注入層及一陰極。The quantum dot light-emitting device of the present invention includes an anode layer, one or more hole injection layers, one or more hole transport layers, one or more electron blocking layers, an emissive layer, one or more Hole blocking layers, optionally one or more electron transport layers, optionally one or more electron injection layers and a cathode.

所述光發射性層包括至少一個半導體奈米粒子。The light emissive layer includes at least one semiconductor nanoparticle.

電洞注入層或電洞輸送層或電洞注入層及電洞輸送層兩者或充當電洞注入層或/及電洞輸送層中任一個/兩者的層包括以下描述之聚合物。 光發射層The hole injection layer or the hole transport layer or both the hole injection layer and the hole transport layer or the layer acting as either/both the hole injection layer or/and the hole transport layer comprises the polymers described below. light emitting layer

QLED之光發射性層包括半導體奈米粒子。在一些實施例中,半導體奈米粒子可包括元素、二元、三元或四元半導體。如果需要,半導體可包括5或更多個元素。在一些實施例中,半導體奈米粒子之組合物可包含第IV族化合物、第II-VI族化合物、第II-V族化合物、第III-VI族化合物、第III-V族化合物、第IV-VI族化合物、第I-III-VI族化合物、第II-IV-VI族化合物、第II-IV-V族化合物或其任何組合。在一些實施例中,半導體奈米粒子之組合物可包含諸如ZnO及TiO2 之金屬氧化物。在一些實施例中,半導體奈米粒子之組合物可包含諸如甲基銨三鹵化鉛之鈣鈦礦材料。在一些實施例中,半導體奈米粒子可包含CdS、CdSe、CdTe、ZnS、ZnSe、ZnTe、InP、CuInSe2 或其任何組合。在一些實施例中,半導體奈米粒子可包含異質接面。在一些實施例中,半導體奈米粒子可包括分級組合物,藉以組合物在一段距離上自第一組合物過渡至第二組合物。The light-emitting layer of the QLED includes semiconductor nanoparticles. In some embodiments, semiconductor nanoparticles may include elemental, binary, ternary, or quaternary semiconductors. Semiconductors may include 5 or more elements if desired. In some embodiments, the composition of semiconductor nanoparticles may comprise Group IV compounds, Group II-VI compounds, Group II-V compounds, Group III-VI compounds, Group III-V compounds, Group IV compounds - a Group VI compound, a Group I-III-VI compound, a Group II-IV-VI compound, a Group II-IV-V compound, or any combination thereof. In some embodiments, the composition of semiconductor nanoparticles may include metal oxides such as ZnO and TiO 2 . In some embodiments, the composition of semiconductor nanoparticles may include a perovskite material such as methylammonium lead trihalide. In some embodiments, the semiconductor nanoparticles may comprise CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, InP, CuInSe2, or any combination thereof. In some embodiments, semiconductor nanoparticles can include heterojunctions. In some embodiments, the semiconductor nanoparticles may comprise a graded composition whereby the composition transitions over a distance from a first composition to a second composition.

半導體奈米粒子可未摻雜;或摻雜有稀土元素,諸如,Eu、Er、Tb、Tm、Dy;及/或摻雜有過渡金屬元素,諸如,Mn、Cu及Ag;或其任何組合。The semiconductor nanoparticles can be undoped; or doped with rare earth elements, such as, Eu, Er, Tb, Tm, Dy; and/or doped with transition metal elements, such as, Mn, Cu and Ag; or any combination thereof .

在一些實施例中,半導體奈米粒子具有至少一個維度——長100奈米或更小、長50奈米或更小或甚至長20奈米或更小。在一些實施例中,光發射層中的半導體奈米粒子之大小可具有分佈。在一些實施例中,半導體奈米粒子之大小分佈可為單峰或多峰。在一些實施例中,半導體奈米粒子具有各向同性維度或非各向同性維度。In some embodiments, the semiconductor nanoparticles have at least one dimension - 100 nm or less in length, 50 nm or less in length, or even 20 nm or less in length. In some embodiments, the semiconductor nanoparticles in the light emitting layer may have a distribution in size. In some embodiments, the size distribution of the semiconductor nanoparticles can be unimodal or multimodal. In some embodiments, semiconductor nanoparticles have isotropic dimensions or non-isotropic dimensions.

在一些實施例中,半導體奈米粒子可具有一核殼結構,藉以將額外材料(被稱為「殼」)塗佈於半導體奈米粒子之內部部分之外側上。殼可由半導體或絕緣體構成。在一些實施例中,殼之組合物可包含第IV族化合物、第II-VI族化合物、第II-V族化合物、第III-VI族化合物、第III-V族化合物、第IV-VI族化合物、第I-III-VI族化合物、第II-IV-VI族化合物、第II-IV-V族化合物或其任何組合。在另外實施例中,殼之組合物可包含諸如ZnO及TiO2 之金屬氧化物。在另一實施例中,殼之組合物可包含諸如甲基銨三鹵化鉛之鈣鈦礦材料。在一些實施例中,殼之組合物可包含CdS、CdSe、CdTe、ZnS、ZnSe、ZnTe、InP、CuInSe2或其任何組合。在一些實施例中,殼可包括單一層或多個層。在一些實施例中,殼可包括分級組合物,藉以組合物在一段距離上自第一組合物過渡至第二組合物。在一些實施例中,組合物可自半導體奈米粒子之內部部分至殼連續地分級。在一些實施例中,殼可具有100奈米或更小、50奈米或更小或甚至5奈米或更小之厚度。In some embodiments, the semiconductor nanoparticles may have a core-shell structure whereby additional material (referred to as the "shell") is coated on the outside of the inner portion of the semiconductor nanoparticles. The shell can consist of a semiconductor or an insulator. In some embodiments, the composition of the shell may include Group IV compounds, Group II-VI compounds, Group II-V compounds, Group III-VI compounds, Group III-V compounds, Group IV-VI compounds Compounds, Group I-III-VI compounds, Group II-IV-VI compounds, Group II-IV-V compounds, or any combination thereof. In further embodiments, the composition of the shell may include metal oxides such as ZnO and TiO2 . In another embodiment, the composition of the shell may include a perovskite material such as methylammonium lead trihalide. In some embodiments, the composition of the shell can include CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, InP, CuInSe2, or any combination thereof. In some embodiments, the shell may comprise a single layer or multiple layers. In some embodiments, the shell may comprise a graded composition whereby the composition transitions over a distance from a first composition to a second composition. In some embodiments, the composition can be continuously graded from the inner portion of the semiconductor nanoparticles to the shell. In some embodiments, the shell may have a thickness of 100 nm or less, 50 nm or less, or even 5 nm or less.

半導體奈米粒子之表面可填充有分子(有時被稱作配位體,諸如,烷基膦、烷基膦氧化物、胺、羧酸及類似者及/或封端無機分子)以允許在多種溶劑中之分散及控制奈米粒子之間的聚合及聚結。The surface of semiconductor nanoparticles can be filled with molecules (sometimes referred to as ligands, such as alkylphosphines, alkylphosphine oxides, amines, carboxylic acids, and/or capped inorganic molecules) to allow Dispersion in various solvents and control of aggregation and coalescence of nanoparticles.

配位體分子可經由能夠進行與量子點之最外層的共價或非共價相互作用的官能團來共價或非共價地附著至量子點。在一些實施例中,官能團可選自包含(但不限於)膦、膦氧化物、羧酸、胺及醇之清單。在一些實施例中,第二官能團可存在於配位體上,使得第一官能團與量子點表面相互作用,且第二官能團與鄰近量子點上之配位體相互作用。Ligand molecules can be covalently or non-covalently attached to the quantum dots via functional groups capable of covalent or non-covalent interactions with the outermost layer of the quantum dots. In some embodiments, the functional group can be selected from a list including, but not limited to, phosphine, phosphine oxide, carboxylic acid, amine, and alcohol. In some embodiments, a second functional group may be present on the ligand such that the first functional group interacts with the surface of the quantum dot and the second functional group interacts with the ligand on an adjacent quantum dot.

在一些實施例中,配位體分子上之官能團可具有有機取代基,諸如(但不限於),飽和烷基、不飽和烷基、芳基、直鏈烷基、非直鏈烷基、分支鏈烷基、醚基或胺基。在一些實施例中,配位體層可由一或多個類型之分子的混合物組成。根據本發明之實施例,配位體層可具有任何所要的厚度。在一些實施例中,配位體層具有15奈米或更小、或10奈米或更小或甚至3奈米或更小之厚度。在一些實施例中,配位體分子在量子點之表面上形成完整單層或亞單層。In some embodiments, the functional groups on the ligand molecule may have organic substituents, such as (but not limited to), saturated alkyl, unsaturated alkyl, aryl, linear alkyl, non-linear alkyl, branched Alkyl, ether or amine groups. In some embodiments, the ligand layer may consist of a mixture of one or more types of molecules. According to embodiments of the present invention, the ligand layer may have any desired thickness. In some embodiments, the ligand layer has a thickness of 15 nm or less, or 10 nm or less, or even 3 nm or less. In some embodiments, the ligand molecules form a complete monolayer or sub-monolayer on the surface of the quantum dot.

在一些實施例中,半導體奈米粒子可為一維的。所述一維奈米粒子具有橫截面區域,其特性厚度尺寸(例如,圓形橫截面區域之直徑或正方形或矩形橫截面區域之對角線)為直徑1 nm至1000奈米(nm),較佳地2 nm至50 nm,且更佳地5 nm至20 nm(諸如,約6、7、8、9、10、11、12、13、14、15、16、17、18、19或20 nm)。奈米棒為具有圓形橫截面區域的剛性棒,其特性尺寸處於上述範圍內。奈米線或奈米須為曲線形且具有不同蛇形或蠕蟲狀形狀。奈米帶具有以四或五個線性側為界的橫截面區域。此類橫截面區域之實例為正方形、矩形、平行六面體、斜方六面體及類似者。奈米管具有橫越奈米棒之整個長度的實質上同心孔,藉此使其為管狀。此等一維奈米粒子之縱橫比大於或等於2,較佳地大於或等於5,且更佳地大於或等於10。In some embodiments, semiconductor nanoparticles can be one-dimensional. The one-dimensional nanoparticles have a cross-sectional area with a characteristic thickness dimension (e.g., the diameter of a circular cross-sectional area or the diagonal of a square or rectangular cross-sectional area) from 1 nm to 1000 nanometers (nm) in diameter, Preferably 2 nm to 50 nm, and more preferably 5 nm to 20 nm (such as about 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19 or 20nm). Nanorods are rigid rods with circular cross-sectional areas, with characteristic dimensions within the above-mentioned ranges. The nanowires or nanowhiskers are curved and have various snake-like or worm-like shapes. Nanoribbons have a cross-sectional area bounded by four or five linear sides. Examples of such cross-sectional areas are square, rectangular, parallelepiped, rhombohedral and the like. The nanotube has a substantially concentric hole that traverses the entire length of the nanorod, thereby giving it a tubular shape. The aspect ratio of the one-dimensional nanoparticles is greater than or equal to 2, preferably greater than or equal to 5, and more preferably greater than or equal to 10.

一維奈米粒子具有10至100奈米、較佳地12至50奈米且更佳地14至30奈米之長度。一維奈米粒子可具有2至10奈米、較佳地3至7奈米之直徑。一維奈米粒子具有大於或等於約2、較佳地大於或等於約4之縱橫比。The one-dimensional nanoparticles have a length of 10 to 100 nm, preferably 12 to 50 nm, and more preferably 14 to 30 nm. One-dimensional nanoparticles may have a diameter of 2 to 10 nm, preferably 3 to 7 nm. The one-dimensional nanoparticles have an aspect ratio greater than or equal to about 2, preferably greater than or equal to about 4.

在一個例示性實施例中,半導體奈米粒子包括已安置於接觸一維奈米粒子之單一端蓋或複數個端蓋的任一或每一端處之一維奈米粒子。在一個實施例中,端蓋亦相互接觸。端蓋用以鈍化一維奈米粒子。奈米粒子可關於至少一個軸線為對稱或不對稱。奈米粒子在組成上、在端蓋之組成上、在幾何結構及電子結構上或在組成及結構兩者上可不對稱。In an exemplary embodiment, the semiconductor nanoparticle comprises a one-dimensional nanoparticle that has been disposed at either or each end of a single endcap or a plurality of endcaps contacting the one-dimensional nanoparticle. In one embodiment, the end caps also touch each other. The end caps are used to passivate the one-dimensional nanoparticles. Nanoparticles can be symmetric or asymmetric about at least one axis. Nanoparticles may be asymmetric in composition, in the composition of the end caps, in geometric structure and electronic structure, or both.

在一個實施例中,奈米粒子包括包括在沿著其縱軸之每一對置端處的端蓋之一維奈米粒子。每一端蓋具有不同組成,因此給奈米粒子提供多個異質接面。在另一實施例中,奈米粒子包括一維奈米粒子,所述一維奈米粒子包括在沿著其縱軸之每一對置端處的端蓋且進一步包括安置於所述一維奈米粒子之徑向表面上或端蓋上的節點。徑向表面亦被稱為棒之側表面。端蓋可具有相互類似或不同的組成,及/或節點可具有相互類似或不同的組成,只要端蓋中之一者具有與另一端蓋或與節點中之至少一者不同的組成。In one embodiment, the nanoparticles comprise one-dimensional nanoparticles comprising end caps at each opposing end along its longitudinal axis. Each end cap has a different composition, thus providing multiple heterojunctions to the nanoparticles. In another embodiment, the nanoparticle comprises a one-dimensional nanoparticle comprising an end cap at each opposite end along its longitudinal axis and further comprising a cap disposed on the one-dimensional nanoparticle. Nodes on radial surfaces or end caps of nanoparticles. The radial surface is also referred to as the side surface of the rod. The end caps may have similar or different compositions to each other, and/or the nodes may have similar or different compositions to each other, so long as one of the end caps has a different composition than at least one of the other end cap or the node.

在一個實施例中,複數個端蓋包括第一端蓋及部分或完全包圍第一端蓋之第二端蓋。端蓋為三維奈米粒子,其中之至少一者直接接觸一維奈米粒子。每一端蓋可或可不接觸一維奈米粒子。第一端蓋及第二端蓋可具有相互不同的組成。節點亦為在大小上可比端蓋小或大之三維奈米粒子。In one embodiment, the plurality of end caps includes a first end cap and a second end cap partially or completely surrounding the first end cap. The end caps are three-dimensional nanoparticles, at least one of which directly contacts the one-dimensional nanoparticles. Each end cap may or may not be in contact with the one-dimensional nanoparticles. The first end cap and the second end cap may have mutually different compositions. Nodes are also three-dimensional nanoparticles that can be smaller or larger in size than the end caps.

術語「異質接面」暗示具有與另一半導體材料直接接觸之一個半導體材料。The term "heterojunction" implies having one semiconductor material in direct contact with another semiconductor material.

一維奈米粒子、第一端蓋及第二端蓋各包括半導體。奈米棒與第一端蓋之間的界面提供第一異質接面,而第一端蓋與第二端蓋之間的界面提供第二異質接面。以此方式,奈米粒子可包括複數個異質接面。Each of the one-dimensional nanoparticle, the first end cap and the second end cap includes a semiconductor. The interface between the nanorod and the first end cap provides a first heterojunction, and the interface between the first end cap and the second end cap provides a second heterojunction. In this way, nanoparticles can include a plurality of heterojunctions.

在一個實施例中,一維奈米粒子接觸第一端蓋之異質接面具有I型或準II型頻帶對準。在另一實施例中,第二端蓋接觸第一端蓋之點具有I型或準II型頻帶對準。In one embodiment, the heterojunction of the one-dimensional nanoparticle contacting the first endcap has a type I or quasi-type II band alignment. In another embodiment, the point where the second end cap contacts the first end cap has a Type I or quasi-Type II band alignment.

第一端蓋及第二端蓋化學上相互不同,且係選自由以下組成之群組:Si、Ge、Pb、SiGe、ZnO、TiO2 、ZnS、ZnSe、ZnTe、CdO、CdS、CdSe、CdTe、MgO、MgS、MgSe、MgTe、HgO、HgS、HgSe、HgTe、AlN、AlP、AlAs、AlSb、GaN、GaP、GaAs、GaSb、InN、InP、InAs、InSb、TlN、TIP、TlA、TlSb、TlSb、PbS、PbSe、PbTe或類似者,或包括前述半導體中之至少一者的組合。在例示性實施例中,第一端蓋為CdTe或CdSe,而第二端蓋為ZnSe。The first endcap and the second endcap are chemically different from each other and are selected from the group consisting of Si, Ge, Pb, SiGe, ZnO, TiO2 , ZnS, ZnSe, ZnTe, CdO, CdS, CdSe, CdTe , MgO, MgS, MgSe, MgTe, HgO, HgS, HgSe, HgTe, AlN, AlP, AlAs, AlSb, GaN, GaP, GaAs, GaSb, InN, InP, InAs, InSb, TlN, TIP, TlA, TlSb, TlSb , PbS, PbSe, PbTe, or the like, or a combination comprising at least one of the foregoing semiconductors. In an exemplary embodiment, the first end cap is CdTe or CdSe and the second end cap is ZnSe.

藉由改變一維奈米粒子、第一端蓋及/或第二端蓋之組成及大小(直徑或長度),能帶隙及頻帶偏移可變化。變化能帶隙可用以改變奈米粒子中的光產生之波長、效率及強度。在一個實施例中,第一端蓋與一維奈米粒子之間的傳導帶偏移比第一端蓋與第二端蓋之間的傳導帶偏移高得多,且其中第一端蓋與一維奈米粒子之間的價帶偏移比第一端蓋與第二端蓋之間的價帶偏移低得多。在另一實施例中,第一端蓋與一維奈米粒子之間的傳導帶偏移比第一端蓋與第二端蓋之間的傳導帶偏移低得多,且其中第一端蓋與一維奈米粒子之間的價帶偏移比第一端蓋與第二端蓋之間的價帶偏移低得多。在又一實施例中,由第一端蓋形成的兩個異質接面中之一者具有比另一者小的傳導帶偏移及大的價帶偏移,且另一者具有較大傳導帶偏移及較小價帶偏移。By changing the composition and size (diameter or length) of the one-dimensional nanoparticles, the first endcap and/or the second endcap, the energy bandgap and frequency band shift can be varied. Varying the energy bandgap can be used to alter the wavelength, efficiency and intensity of light generation in nanoparticles. In one embodiment, the conduction band offset between the first endcap and the one-dimensional nanoparticle is much higher than the conduction band offset between the first endcap and the second endcap, and wherein the first endcap The valence band offset between the one-dimensional nanoparticles is much lower than the valence band offset between the first endcap and the second endcap. In another embodiment, the conduction band shift between the first end cap and the one-dimensional nanoparticle is much lower than the conduction band shift between the first end cap and the second end cap, and wherein the first end The valence band offset between the cap and the one-dimensional nanoparticle is much lower than the valence band offset between the first end cap and the second end cap. In yet another embodiment, one of the two heterojunctions formed by the first end cap has a smaller conduction band shift and a larger valence band shift than the other, and the other has a larger conduction band shift. Band shift and smaller valence band shift.

在一個實施例中,奈米粒子包括兩個類型之異質接面,其中II型交錯之頻帶偏移允許電子及電洞之高效注入,而I型偏移定義用於高效光發射之複合中心。In one embodiment, the nanoparticle includes two types of heterojunctions, where type II interleaved band offsets allow efficient injection of electrons and holes, and type I offsets define recombination centers for efficient light emission.

在一個實施例中,奈米粒子可用以形成層或膜。在一個實施例中,層可為無序的。在另一實施例中,層可具有液晶特性。在另一實施例中,層可含有在單一維度上之定序。在另一實施例中,層可含有在二維或在三維上之定序。在另一實施例中,奈米粒子可自組裝成膜內之晶格。In one embodiment, nanoparticles can be used to form layers or films. In one embodiment, the layers may be disordered. In another embodiment, the layer may have liquid crystal properties. In another embodiment, a layer may contain ordering in a single dimension. In another embodiment, a layer may contain an order in two dimensions or in three dimensions. In another embodiment, the nanoparticles can self-assemble into a lattice within the film.

在一些實施例中,可在裝置內之層中對準各向異性奈米粒子。在一個實施例中,可對準各向異性奈米粒子,使得粒子之一維軸線與層之表面正交。在另一實施例中,可在層之平面圖內對準各向異性奈米粒子。在另一實施例中,可對準各向異性粒子,使得複數個各向異性粒子一維軸線在同一方向上對準。 用於電洞注入/輸送層之聚合物In some embodiments, anisotropic nanoparticles can be aligned in layers within the device. In one embodiment, the anisotropic nanoparticles can be aligned such that a one-dimensional axis of the particles is normal to the surface of the layer. In another embodiment, the anisotropic nanoparticles can be aligned within the plan view of the layer. In another embodiment, the anisotropic particles can be aligned such that the one-dimensional axes of the plurality of anisotropic particles are aligned in the same direction. Polymers for hole injection/transport layer

在一個例示性實施例中,聚合物包括至少一或多個單體作為聚合單元,所述至少一或多個單體具有包括以下各者之第一單體結構:a)可聚合基團,b)具有式NAr1 Ar2 Ar3 之電活性基團,其中Ar1 、Ar2 及Ar3 獨立地為C6 至C50 芳香族取代基,及(c)連接子基團,其連接可聚合基團與電活性基團。In an exemplary embodiment, the polymer comprises at least one or more monomers as polymerized units having a first monomer structure comprising: a) a polymerizable group, b) an electroactive group having the formula NAr 1 Ar 2 Ar 3 , wherein Ar 1 , Ar 2 and Ar 3 are independently C 6 to C 50 aromatic substituents, and (c) a linker group whose link can be Polymeric groups and electroactive groups.

在另一實施例中,聚合物另外包括具有第二單體結構之至少一或多個單體。In another embodiment, the polymer additionally includes at least one or more monomers having a second monomeric structure.

所述聚合物具有的Mw為至少5,000,較佳地至少10,000,較佳地至少20,000;較佳地不大於10,000,000,較佳地不大於1,000,000,較佳地不大於500,000,較佳地不大於400,000,較佳地不大於300,000,較佳地不大於200,000,較佳地不大於100,000。較佳地,聚合物包括至少50%(較佳地至少60%、較佳地至少70%、較佳地至少80%、較佳地至少90%)電活性基團,其含有至少五個芳環,較佳地至少六個,較佳地不多於20個,較佳地不多於15個;不具有此特性之其他單體亦可存在。含有兩個或更多個稠合環的環狀部分被視為單一芳環,其限制條件為環狀部分中之所有環原子為芳香系之部分。舉例而言,萘基、咔唑基及吲哚基被視為單一芳環,但認為茀基含有兩個芳環,因為茀之9-位處的碳原子並非芳香系之部分。較佳地,聚合物包括至少50%(較佳地至少70%)電活性基團,所述電活性基團含有三芳基胺、咔唑、吲哚、聯苯基及茀環系統中之至少一者。The polymer has a Mw of at least 5,000, preferably at least 10,000, preferably at least 20,000; preferably not greater than 10,000,000, preferably not greater than 1,000,000, preferably not greater than 500,000, preferably not greater than 400,000 , preferably not greater than 300,000, preferably not greater than 200,000, preferably not greater than 100,000. Preferably, the polymer comprises at least 50% (preferably at least 60%, preferably at least 70%, preferably at least 80%, preferably at least 90%) electroactive groups containing at least five aromatic Rings, preferably at least six, preferably not more than 20, preferably not more than 15; other monomers not having this property may also be present. A cyclic moiety containing two or more fused rings is considered a single aromatic ring, provided that all ring atoms in the cyclic moiety are part of the aromatic system. For example, naphthyl, carbazolyl, and indolyl are considered to have a single aromatic ring, but fenyl is considered to contain two aromatic rings because the carbon atom at the 9-position of fenene is not part of an aromatic system. Preferably, the polymer comprises at least 50%, preferably at least 70%, electroactive groups containing at least one.

本發明之可聚合基團可選自乙烯基(較佳地,附著至芳環)、苯并環丁烯、丙烯酸酯或甲基丙烯酸酯基團、三氟乙烯醚、肉桂酸酯/查耳酮、二烯、乙氧基乙炔及3-乙氧基-4-甲基環丁-2-烯酮。較佳的可聚合基團包括下列結構中之至少一者。其中「R1 至R12 」基團獨立地為氫、氘、C1 至C30 烷基、雜原子取代之C1 至C30 烷基、C1 至C30 芳香基、雜原子取代之C1 至C30 芳香基,或表示樹脂結構之另一部分;較佳地,氫、氘、C1 至C20 烷基、雜原子取代之C1 至C20 烷基、C1 至C20 芳香基、雜原子取代之C1 至C20 芳香基,或表示樹脂結構之另一部分;較佳地,氫、氘、C1 至C10 烷基、雜原子取代之C1 至C10 烷基、C1 至C10 芳香基、雜原子取代之C1 至C10 芳香基,或表示樹脂結構之另一部分;較佳地,氫、氘、C1 至C4 烷基、雜原子取代之C1 至C4 烷基,或表示樹脂結構之另一部分。在本發明之一個較佳實施例中,「R1 至R12 」基團可連接以形成稠環結構。The polymerizable groups of the present invention may be selected from vinyl groups (preferably attached to aromatic rings), benzocyclobutene, acrylate or methacrylate groups, trifluoroethylene ethers, cinnamate/challe Ketones, dienes, ethoxyacetylenes and 3-ethoxy-4-methylcyclobut-2-enone. Preferred polymerizable groups include at least one of the following structures. Wherein "R 1 to R 12 " groups are independently hydrogen, deuterium, C 1 to C 30 alkyl, heteroatom substituted C 1 to C 30 alkyl, C 1 to C 30 aryl, heteroatom substituted C 1 to C 30 aryl, or represent another part of the resin structure; preferably, hydrogen, deuterium, C 1 to C 20 alkyl, heteroatom substituted C 1 to C 20 alkyl, C 1 to C 20 aryl , heteroatom substituted C 1 to C 20 aryl group, or another part of the resin structure; preferably, hydrogen, deuterium, C 1 to C 10 alkyl, heteroatom substituted C 1 to C 10 alkyl, C 1 to C 10 aryl, heteroatom substituted C 1 to C 10 aryl, or another part of the resin structure; preferably, hydrogen, deuterium, C 1 to C 4 alkyl, heteroatom substituted C 1 to C 4 alkyl, or represent another part of the resin structure. In a preferred embodiment of the present invention, the "R 1 to R 12 " groups can be connected to form a fused ring structure.

在又一實施例中,可聚合基團之實例包括:In yet another embodiment, examples of polymerizable groups include: .

較佳地,可聚合基團係選自Preferably, the polymerizable group is selected from .

在一個實施例中,本發明之電活性基團具有式NAr1 Ar2 Ar3 ,其中Ar1 、Ar2 及Ar3 獨立地為C6 至C50 芳香族取代基。In one embodiment, the electroactive group of the present invention has the formula NAr 1 Ar 2 Ar 3 , wherein Ar 1 , Ar 2 and Ar 3 are independently C 6 to C 50 aromatic substituents.

Ar1 至Ar3 之合適實例包含 Suitable examples of Ar 1 to Ar 3 include .

較佳地,式NAr1 Ar2 Ar3 之電活性基團含有一共4至20個芳環;較佳地至少5個、較佳地至少6個;較佳地不多於18個、較佳地不多於15個、較佳地不多於13個。較佳地,Ar1 、Ar2 及Ar3 中之每一者獨立地含有至少10個碳原子,較佳地至少12個;較佳地不多於45個、較佳地不多於42個、較佳地不多於40個。在一較佳實施例中,Ar2 及Ar3 中之每一者獨立地含有至少10個碳原子,較佳地至少15個、較佳地至少20個;較佳地不多於45個、較佳地不多於42個、較佳地不多於40個;且Ar1 含有不多於35個碳原子,較佳地不多於25個、較佳地不多於15個。Ar取代基中的碳原子之總數中包含脂族碳原子,例如,C1 至C6 烴基取代基或非芳環碳原子(例如,茀之9碳)。Ar基團可含有雜原子,較佳地,N、O或S;較佳地,N;較佳地,Ar基團不含有除氮外的雜原子。較佳地,僅一個連接子基團存在於式NAr1 Ar2 Ar3 之化合物中。較佳地,Ar基團包括聯苯基、茀基、亞苯基、咔唑基及吲哚基中之一或多者。Preferably, the electroactive group of formula NAr 1 Ar 2 Ar 3 contains a total of 4 to 20 aromatic rings; preferably at least 5, preferably at least 6; preferably no more than 18, preferably There are no more than 15, preferably no more than 13. Preferably, each of Ar 1 , Ar 2 and Ar 3 independently contains at least 10 carbon atoms, preferably at least 12; preferably not more than 45, preferably not more than 42 , preferably not more than 40. In a preferred embodiment, each of Ar2 and Ar3 independently contains at least 10 carbon atoms, preferably at least 15, preferably at least 20; preferably no more than 45, Preferably no more than 42, preferably no more than 40; and Ar 1 contains no more than 35 carbon atoms, preferably no more than 25, preferably no more than 15. The total number of carbon atoms in the Ar substituent includes aliphatic carbon atoms, for example, C 1 to C 6 hydrocarbyl substituents or non-aromatic ring carbon atoms (for example, 9 carbons of fennel). The Ar group may contain heteroatoms, preferably, N, O or S; preferably, N; preferably, the Ar group does not contain heteroatoms other than nitrogen. Preferably, only one linker group is present in the compound of formula NAr 1 Ar 2 Ar 3 . Preferably, the Ar group includes one or more of biphenyl, fenyl, phenylene, carbazolyl and indolyl.

當Ar取代基中之一者中的一個氮原子為三芳基胺氮原子時,取決於將哪一氮原子視為式NAr1 Ar2 Ar3 中之氮原子,可以不同方式定義Ar1 、Ar2 及Ar3 基團。在此情況下,應解釋氮原子及Ar基團以便滿足權利要求限制。When one of the nitrogen atoms in one of the Ar substituents is a triarylamine nitrogen atom, Ar 1 , Ar 2 and Ar 3 groups. In this case, the nitrogen atom and the Ar group should be construed so as to satisfy the claim limitations.

較佳地,Ar1 、Ar2 及Ar3 共同地含有不多於五個氮原子,較佳地不多於四個、較佳地不多於三個。Preferably, Ar 1 , Ar 2 and Ar 3 collectively contain no more than five nitrogen atoms, preferably no more than four, preferably no more than three.

具有式NAr1 Ar2 Ar3 的電活性基團之合適實例含有以下: Suitable examples of electroactive groups having the formula NAr 1 Ar 2 Ar 3 include the following: .

在另一實施例中,聚合物包括選自以下清單之第二單體。 In another embodiment, the polymer includes a second monomer selected from the list below. .

較佳地,聚合物包括少於50%之第二單體,較佳地少於40%、較佳地少於30%、較佳地少於20%、較佳地少於10%。Preferably, the polymer comprises less than 50% of the second monomer, preferably less than 40%, preferably less than 30%, preferably less than 20%, preferably less than 10%.

第二單體具有的Mw小於5,000,較佳地小於3,000、較佳地小於2,000且較佳地小於1,000。The second monomer has a Mw of less than 5,000, preferably less than 3,000, preferably less than 2,000 and preferably less than 1,000.

本發明之可聚合基團及電活性基團經由選自由以下各者組成的群組之連接子基團連接:共價鍵;-O-;-伸烷基-;-伸芳基-;-伸烷基-伸芳基-;-伸芳基-伸烷基-;-O-伸烷基-;-O-伸芳基-;-O-伸烷基-伸芳基-;-O-伸烷基-O-;-O-伸烷基-O-伸烷基-O-;-O-伸芳基-O-;-O-伸烷基-伸芳基-O-;-O-(CH2 CH2 -O)n -,其中n為自2至20之整數;-O-伸烷基-O-伸烷基-;-O-伸烷基-O-伸芳基-;-O-伸芳基-O-;-O-伸芳基-O-伸烷基-;及-O-伸芳基-O-伸芳基。The polymerizable group and the electroactive group of the present invention are linked via a linker group selected from the group consisting of: a covalent bond; -O-; -alkylene-; -arylylene-;- Alkylene-arylylene-;-Arylylene-Alkylene-;-O-Alkylene-;-O-Arylylene-; Alkylene-O-; -O-Alkylene-O-Alkylene-O-; -O-Arylylene-O-; (CH 2 CH 2 -O) n -, wherein n is an integer from 2 to 20; -O-alkylene-O-alkylene-; -O-alkylene-O-arylylene-;- O-arylylene-O-; -O-arylylene-O-alkylene-; and -O-arylylene-O-arylylene.

在一個實施例中,連接子基團為芳氧基連接子,具有附著至氧原子之至少一個苯甲基碳。較佳地,芳氧基連接子為醚、酯或苄醇。較佳地,芳氧基連接子具有兩個附著至氧原子之苯甲基碳原子。苯甲基碳原子為並非芳環之部分且附著至具有自5至30個碳原子(較佳地,5至20個)的芳環、較佳地苯環之環碳的碳原子。在另一實施例中,連接子基團為附著至乙烯基之烷基、芳香基、雜烷基、雜芳基連接子。In one embodiment, the linker group is an aryloxy linker having at least one benzyl carbon attached to an oxygen atom. Preferably, the aryloxy linker is an ether, ester or benzyl alcohol. Preferably, the aryloxy linker has two benzyl carbon atoms attached to the oxygen atom. A benzyl carbon atom is a carbon atom that is not part of an aromatic ring and is attached to a ring carbon of an aromatic ring having from 5 to 30 carbon atoms (preferably 5 to 20), preferably a benzene ring. In another embodiment, the linker group is an alkyl, aryl, heteroalkyl, heteroaryl linker attached to a vinyl group.

在一個實施例中,連接子基團包括選自以下清單之結構。In one embodiment, the linker group comprises a structure selected from the list below. .

視情況,聚合物可進一步包括p型摻雜劑,其可為具有pKa ≤ 4之有機布忍司特酸;包括正芳香族離子及陰離子之路易斯酸;或熱酸產生劑(TAG),其為具有pKa ≤ 2之有機布忍司特酸之銨或吡錠鹽或有機磺酸之酯。Optionally, the polymer may further comprise a p-type dopant, which may be an organic Brynsted acid with pKa ≤ 4; a Lewis acid comprising positive aromatic ions and anions; or a thermal acid generator (TAG), which is Ammonium or pyridinium salts of organic brenest acids having a pKa ≤ 2 or esters of organic sulfonic acids.

在一個實施例中,有機布忍司特酸具有pKa ≤ 2,較佳地≤ 0。較佳地,有機布忍司特酸為芳香族、烷基或全氟烷基磺酸;羧酸;質子化醚;或式Ar4 SO3 CH2 Ar5 之化合物,其中Ar4 為苯基、烷基苯基或三氟甲基苯基,且Ar5 為硝苯基。In one embodiment, the organic Brenest acid has a pKa ≤ 2, preferably ≤ 0. Preferably, the organic Brenest acid is an aromatic, alkyl or perfluoroalkyl sulfonic acid; a carboxylic acid; a protonated ether; or a compound of the formula Ar 4 SO 3 CH 2 Ar 5 , wherein Ar 4 is phenyl, Alkylphenyl or trifluoromethylphenyl, and Ar 5 is nitrophenyl.

在一個實施例中,正芳香族離子具有自七至五十個碳原子,較佳地七至四十個。在一較佳實施例中,正芳香族離子為鎓離子或具有式之離子,其中A為芳環中之一或多者上的取代基,且為H、D、CN、CF3 或(Ph)3 C+(經由Ph附著);X為C、Si、Ge或Sn。較佳地,X為C。較佳地,A在所有三種環上相同。In one embodiment, the positive aromatic ion has from seven to fifty carbon atoms, preferably seven to forty. In a preferred embodiment, the positive aromatic ion is an onium ion or has the formula Ions of , where A is a substituent on one or more of the aromatic rings and is H, D, CN, CF 3 or (Ph) 3 C+ (attached via Ph); X is C, Si, Ge or Sn . Preferably, X is C. Preferably, A is the same on all three rings.

在一個實施例中,陰離子為具有式之四芳基硼酸鹽,其中R表示選自F及CF3 之零至五個非氫取代基。較佳地,R表示四個環中之每一者上的五個取代基,較佳地,五個氟基取代基。In one embodiment, the anion is of the formula A tetraaryl borate, wherein R represents zero to five non-hydrogen substituents selected from F and CF 3 . Preferably, R represents five substituents on each of the four rings, preferably five fluoro substituents.

較佳地,用於在本發明中使用之酸催化劑包括布忍司特酸、路易斯酸或選自以下清單之TAG。在一個實施例中,TAG具有≤280℃之降解溫度。 Preferably, acid catalysts for use in the present invention include Brenest acid, Lewis acid or TAG selected from the list below. In one embodiment, the TAG has a degradation temperature < 280°C. .

尤其較佳TAG為有機銨鹽,較佳地,選自以下清單之吡錠鹽。Especially preferred TAG is an organic ammonium salt, preferably a pyridinium salt selected from the list below. .

視情況,聚合物可進一步與選自包含以下各者的中性及離子化合物的一或多種p型摻雜劑摻合:三苯甲基鹽、銨鹽、碘鹽、鎓離子鹽、咪唑鎓鹽、鏻鹽、氧鎓鹽及其混合物。較佳地,離子化合物係選自三苯甲基硼酸鹽、硼酸銨、硼酸碘、硼酸鎓、硼酸咪唑鎓、硼酸鏻、硼酸氧鎓及其混合物。本發明中所使用的p型摻雜劑之合適實例包含以下化合物(p-1)至(p-15): Optionally, the polymer may be further blended with one or more p-type dopants selected from neutral and ionic compounds comprising trityl salts, ammonium salts, iodide salts, onium ionic salts, imidazolium Salts, phosphonium salts, oxonium salts and mixtures thereof. Preferably, the ionic compound is selected from trityl borate, ammonium borate, iodine borate, onium borate, imidazolium borate, phosphonium borate, oxonium borate and mixtures thereof. Suitable examples of p-type dopants used in the present invention include the following compounds (p-1) to (p-15): .

較佳地,p型摻雜劑為以下化合物(p-1):Preferably, the p-type dopant is the following compound (p-1): .

p型摻雜劑按基於聚合物之總重量的按重量計1%或更多、按重量計3%或更多、按重量計5%或更多或甚至按重量計7%或更多且同時按重量計20%或更少、按重量計15%或更少、按重量計12%或更少或甚至按重量計10%或更少之量存在於本發明中。The p-type dopant is 1% by weight or more, 3% by weight or more, 5% by weight or more or even 7% by weight or more based on the total weight of the polymer and At the same time an amount of 20% by weight or less, 15% by weight or less, 12% by weight or less or even 10% by weight or less is present in the present invention.

視情況,p型摻雜劑可作為單獨層存在。在不受理論限制的情況下,p型摻雜劑可在聚合物沈積後擴散至聚合物內。視情況,p型摻雜劑之擴散可藉由熱處理來加速。Optionally, p-type dopants may be present as a separate layer. Without being limited by theory, p-type dopants may diffuse into the polymer after deposition of the polymer. Optionally, the diffusion of p-type dopants can be accelerated by heat treatment.

當製得溶液以用於在基板上塗佈聚合物時,較佳地,溶劑具有如藉由氣相層析-質譜(GC/MS)所量測的按重量計至少99.8%、較佳地按重量計至少99.9%之純度。較佳地,溶劑具有小於1.2、更佳地小於1.0的RED值(相對能量差(相對於聚合物),如使用CHEMCOMP v2.8.50223.1自漢森溶解度參數(Hansen solubility parameter)計算)。較佳的溶劑包括芳族烴及芳族-脂族醚,較佳地為具有六至二十個碳原子之彼等物。苯甲醚、均三甲苯、二甲苯及甲苯為尤其較佳溶劑。When preparing a solution for coating a polymer on a substrate, preferably the solvent has at least 99.8% by weight, preferably A purity of at least 99.9% by weight. Preferably, the solvent has a RED value (relative energy difference (relative to polymer) as calculated from Hansen solubility parameter using CHEMCOMP v2.8.50223.1) of less than 1.2, more preferably less than 1.0. Preferred solvents include aromatic hydrocarbons and aromatic-aliphatic ethers, preferably those having six to twenty carbon atoms. Anisole, mesitylene, xylene and toluene are especially preferred solvents.

較佳地,本發明之聚合物作為薄層存在於基板上。較佳地,根據本發明產生之聚合物薄膜的厚度為自1 nm至100微米,較佳地至少10 nm,較佳地至少30 nm,較佳地不大於10微米,較佳地不大於1微米,較佳地不大於300 nm。Preferably, the polymer of the invention is present as a thin layer on the substrate. Preferably, the thickness of the polymer film produced according to the present invention is from 1 nm to 100 microns, preferably at least 10 nm, preferably at least 30 nm, preferably not more than 10 microns, preferably not more than 1 Micron, preferably not greater than 300 nm.

本發明之聚合物可藉由已知或提議用於製造有機電子裝置的各種類型的溶液處理技術中之任一者沈積。舉例而言,可使用印刷製程(諸如,噴墨印刷、噴嘴印刷、平版印刷、轉印印刷或絲網印刷)或例如使用塗佈製程(諸如,噴塗、旋塗或浸塗)來沈積聚合物溶液。在溶液沈積之後,移除溶劑,其可藉由使用習知方法(諸如,真空乾燥及/或加熱)來執行。膜較佳地藉由溶液製程、較佳地藉由旋塗或藉由噴墨製程形成於基板上。The polymers of the present invention can be deposited by any of various types of solution processing techniques known or proposed for the fabrication of organic electronic devices. For example, the polymer can be deposited using a printing process such as inkjet printing, nozzle printing, lithography, transfer printing or screen printing, or for example using a coating process such as spray coating, spin coating or dip coating solution. After solution deposition, the solvent is removed, which can be performed using conventional methods such as vacuum drying and/or heating. The film is preferably formed on the substrate by a solution process, preferably by spin coating or by an inkjet process.

當已藉由旋塗產生膜時,旋塗膜厚度主要由溶液中之固體含量及旋轉速率判定。舉例而言,在2000 rpm旋轉速率下,2、5、8及10 wt%聚合物調配之溶液分別產生30、90、160及220 nm之膜厚度。When films have been produced by spin coating, the spin coating film thickness is primarily determined by the solids content in the solution and the spin rate. For example, solutions formulated with 2, 5, 8 and 10 wt% polymer yielded film thicknesses of 30, 90, 160 and 220 nm, respectively, at a spin rate of 2000 rpm.

藉由在表面上塗佈聚合物組合物而形成之聚合物層可在自50℃至150℃(較佳地,80℃至120℃)之溫度下烘烤,較佳地達少於五分鐘,接著為在自120℃至280℃之溫度下(較佳地至少140℃、較佳地至少160℃、較佳地至少170℃;較佳地不大於230℃、較佳地不大於215℃)熱交聯。較佳地,濕膜在烘烤及退火之後收縮5%或更少。較佳地,暴露於熱氣氛之持續時間為2分鐘或更久;更佳地為5分鐘或更久。較佳地,氣氛為惰性的;更佳地,氣氛含有按重量計1%或更少之氧氣;更佳地,氣氛含有按重量計99%或更多之氮氣。The polymer layer formed by coating the polymer composition on the surface can be baked at a temperature from 50°C to 150°C (preferably, 80°C to 120°C), preferably for less than five minutes , followed by at a temperature from 120°C to 280°C (preferably at least 140°C, preferably at least 160°C, preferably at least 170°C; preferably not greater than 230°C, preferably not greater than 215°C ) thermally crosslinked. Preferably, the wet film shrinks by 5% or less after baking and annealing. Preferably, the duration of exposure to the heated atmosphere is 2 minutes or longer; more preferably 5 minutes or longer. Preferably, the atmosphere is inert; more preferably, the atmosphere contains 1% by weight oxygen or less; more preferably, the atmosphere contains 99% by weight or more nitrogen.

聚合物薄層可進一步交聯。交聯可藉由使層溶液曝露於熱及/或光化輻射(包含UV光、γ射線或x射線)來執行。交聯可在引發劑存在下進行,所述引發劑在熱量或輻照下分解以產生起始交聯反應之自由基或離子。交聯可在裝置之製造期間就地執行。在交聯後,由其製造之聚合層較佳地無為反應性或可藉由曝露於光、正電荷、負電荷或激子而分解之殘餘部分。The thin polymer layers can be further crosslinked. Crosslinking can be performed by exposing the layer solution to heat and/or actinic radiation, including UV light, gamma rays or x-rays. Crosslinking can be performed in the presence of initiators that decompose under heat or radiation to generate free radicals or ions that initiate the crosslinking reaction. Crosslinking can be performed in situ during fabrication of the device. After crosslinking, the polymeric layer produced therefrom is preferably free of residual parts that are reactive or decompose by exposure to light, positive charges, negative charges or excitons.

較佳地,聚合物層抵抗溶劑之溶解(耐溶劑性有時被稱作「溶劑正交性)。耐溶劑性為有用的,因為在製造含有本發明之聚合物組合物之QLED層之後,後續層可塗覆至含有本發明之組合物之層。在許多情況下,後續層將藉由溶液製程塗覆。需要後續溶液製程中之溶劑不溶解或顯著降解含有本發明之組合物之層。可重複溶液沈積及交聯之製程以創造多個層。Preferably, the polymer layer is resistant to dissolution by solvents (solvent resistance is sometimes referred to as "solvent orthogonality"). Solvent resistance is useful because after fabrication of a QLED layer containing the polymer composition of the present invention, Subsequent layers can be applied to the layer containing the composition of the present invention. In many cases, the subsequent layer will be applied by solution processing. It is required that the solvent in the subsequent solution processing does not dissolve or significantly degrade the layer containing the composition of the present invention • The process of solution deposition and crosslinking can be repeated to create multiple layers.

當本發明之組合物存在於HTL中時,較佳地,HTL將藉由溶液製程形成。後續層可塗覆至HIL;後續層通常為發射層。若後續層係藉由溶液製程塗覆,則較佳地,HTL對溶解於在溶液製程中用於塗覆後續層之溶劑具抗性。When the composition of the invention is present in a HTL, preferably the HTL will be formed by solution processing. Subsequent layers may be applied to the HIL; subsequent layers are typically emissive layers. If the subsequent layer is applied by a solution process, preferably the HTL is resistant to being dissolved in the solvent used to apply the subsequent layer in the solution process.

例示性有機電子裝置包括半導體奈米粒子作為裝置中之發射性層。裝置包括基板、第一電極、電洞注入層、電洞輸送層(如本文中所揭示)、奈米粒子、電子輸送層及第二電極。基板通常包括光學透明、電絕緣玻璃,或光學透明、電絕緣聚合物。第一電極可包括光學透明傳導性聚合物或金屬氧化物。第一電極之實例為氧化銦錫、氧化錫、聚吡咯之薄膜、聚苯胺、聚噻吩或類似者。用於在電洞注入層中使用之合適電洞注入材料為PEDOT:PSS (聚(3,4-伸乙二氧基噻吩)/聚(苯乙烯磺酸鹽),其為兩種離聚物之聚合物混合。電子輸送層包括鋅氧化物或氧化鈦奈米粒子。第二電極(其充當陰極)包括金屬膜,其實例為鋁膜。其他材料可用於第一電極、電洞注入層、電子輸送層及第二電極中。An exemplary organic electronic device includes semiconductor nanoparticles as an emissive layer in the device. The device includes a substrate, a first electrode, a hole injection layer, a hole transport layer (as disclosed herein), nanoparticles, an electron transport layer, and a second electrode. The substrate typically comprises an optically clear, electrically insulating glass, or an optically clear, electrically insulating polymer. The first electrode may include an optically transparent conductive polymer or metal oxide. Examples of the first electrode are indium tin oxide, tin oxide, thin films of polypyrrole, polyaniline, polythiophene or the like. A suitable hole injection material for use in the hole injection layer is PEDOT:PSS (poly(3,4-ethylenedioxythiophene)/poly(styrenesulfonate), which is two ionomers The polymer mix. The electron transport layer includes zinc oxide or titanium oxide nanoparticles. The second electrode (which acts as a cathode) includes a metal film, an example of which is an aluminum film. Other materials can be used for the first electrode, hole injection layer, In the electron transport layer and the second electrode.

在實施例中,顯示裝置可為像素化之發光二極體,其可發射單一色彩(單一波長)之光或複數個色彩光之光(具有不同波長之光)。舉例而言,其可發射白光,或可發射可組合以產生白光之紅、綠及藍光。所述物品可用以在全部可見光光譜中產生光。In an embodiment, the display device can be a pixelated light-emitting diode, which can emit light of a single color (single wavelength) or light of a plurality of colors (light of different wavelengths). For example, it can emit white light, or it can emit red, green and blue light that can be combined to produce white light. The articles can be used to generate light throughout the visible light spectrum.

在實施例中,顯示裝置可具有色彩轉換層。色彩轉換層可包括週期性奈米球,其幫助在裝置中提取受限制的光,及亦增大有效光路以達成更高效色彩轉換。In an embodiment, a display device may have a color converting layer. The color conversion layer can include periodic nanospheres, which help extract confined light in the device, and also increase the effective light path for more efficient color conversion.

本文中揭示之材料可用於平顯示器、彎曲顯示器及透明顯示器中,及多層顯示器中。The materials disclosed herein can be used in flat, curved, and transparent displays, and in multilayer displays.

本文中揭示之材料可用作照明,諸如,白照明、紅照明、保形光塗層、色彩調整照明、用於標牌之照明或類似者。實例 The materials disclosed herein can be used as lighting, such as white lighting, red lighting, conformal light coating, color-tuned lighting, lighting for signage, or the like. example

以下實例說明本發明之實施例。除非另有指示,否則所有份數及百分比皆以重量計。The following examples illustrate embodiments of the invention. All parts and percentages are by weight unless otherwise indicated.

所有溶劑及試劑皆可購自商業銷售商(例如,Sigma-Aldrich、TCI及Alfa Aesar),且以最高可用的純度及/或在必需時在使用之前再結晶的形式使用。無水溶劑自內部純化/分配系統(己烷、甲苯及四氫呋喃)獲得,或購自Sigma-Aldrich。所有涉及「水敏感性化合物」之實驗皆在「烘箱乾燥的」玻璃器皿中在氮氣氛圍下或在手套箱中進行。All solvents and reagents are available from commercial vendors (eg, Sigma-Aldrich, TCI, and Alfa Aesar) and are used in the highest available purity and/or if necessary, recrystallized prior to use. Anhydrous solvents were obtained from an internal purification/distribution system (hexane, toluene, and tetrahydrofuran) or purchased from Sigma-Aldrich. All experiments involving "water-sensitive compounds" were performed in "oven-dried" glassware under a nitrogen atmosphere or in a glove box.

以下標準分析性設備及方法用於實例中。凝膠滲透層析法( GPC The following standard analytical equipment and methods were used in the Examples. Gel Permeation Chromatography ( GPC )

使用凝膠滲透層析法(GPC)來分析聚合物之分子量。將2 mg HTL聚合物溶解於1 mL THF中。溶液經由0.20 μm聚四氟乙烯(PTFE)針筒過濾器過濾,且將50 μl濾液注入至GPC系統上。使用以下分析條件:泵:Waters™ e2695分離模組,在1.0 mL/min的標稱流動速率下;溶離劑:Fisher Scientific HPLC級THF(穩定);注入器:Waters e2695分離模組;管柱:兩個5 µm混合-C管柱,來自Polymer Laboratories Inc.,保持在40℃下;偵測器:Shodex RI-201差示折射率(DRI)偵測器;校準:17聚苯乙烯標準材料,來自Polymer Laboratories Inc.,擬合在3742kg kg/mol至0.58 kg/mol之範圍上的3階多頂式曲線。核磁共振 NMR The molecular weight of the polymer was analyzed using gel permeation chromatography (GPC). Dissolve 2 mg of HTL polymer in 1 mL of THF. The solution was filtered through a 0.20 μm polytetrafluoroethylene (PTFE) syringe filter, and 50 μl of the filtrate was injected onto the GPC system. The following analytical conditions were used: Pump: Waters™ e2695 separation module at a nominal flow rate of 1.0 mL/min; Eluent: Fisher Scientific HPLC grade THF (stable); Injector: Waters e2695 separation module; Column: Two 5 µm Mixed-C columns from Polymer Laboratories Inc. maintained at 40°C; detector: Shodex RI-201 differential refractive index (DRI) detector; calibration: 17 polystyrene standard materials, From Polymer Laboratories Inc., a polynomial curve of order 3 fitted over the range of 3742 kg kg/mol to 0.58 kg/mol. Nuclear Magnetic Resonance ( NMR )

在30℃下在Varian VNMRS-500或VNMRS-400光譜儀上獲得1 H-NMR光譜(500 MHz或400 MHz)。化學位移係參考CDCl3 中之四甲基矽烷(TMS)(6:000)。液相層析質法( LC/MS 1H -NMR spectra (500 MHz or 400 MHz) were acquired on a Varian VNMRS-500 or VNMRS-400 spectrometer at 30 °C. Chemical shifts are referenced to tetramethylsilane (TMS) (6:000) in CDCl 3 . Liquid Chromatography Mass Method ( LC/MS )

如下進行常規液相層析/質譜(LC/MS)研究。將一微升等分試樣的樣品(作為1 mg/ml四氫呋喃(THF)溶液)注入於以PI模式操作之經由雙重電噴霧界面(ESI)耦接至Agilent 6520四極飛行時間(Q-TOF)MS系統之Agilent 1200SL二元液相層析(LC)上。使用以下分析條件:管柱:Agilent Eclipse XDB-C18,4.6*50 mm,1.7 μm;管柱烘箱溫度:30℃;溶劑A:THF;溶劑B:0.1%甲酸於水/乙腈(v/v,95/5)中;梯度:在0-6 min內40-80%溶劑A,且保持9 min;流動:0.3 mL/min;UV偵測器:二極體陣列,254 nm;MS條件:毛細管電壓:3900 kV(負),3500 kV(正);模式:負及正;掃描:100-2000 amu;速率:1秒/掃描;去溶劑化溫度:300℃。HTL1 單體之合成 Routine liquid chromatography/mass spectrometry (LC/MS) studies were performed as follows. A one microliter aliquot of the sample (as a 1 mg/ml solution in tetrahydrofuran (THF)) was injected into an Agilent 6520 quadrupole time-of-flight (Q-TOF) coupled via a dual electrospray interface (ESI) operating in PI mode. Agilent 1200SL binary liquid chromatography (LC) of MS system. The following analysis conditions were used: column: Agilent Eclipse XDB-C18, 4.6*50 mm, 1.7 μm; column oven temperature: 30°C; solvent A: THF; solvent B: 0.1% formic acid in water/acetonitrile (v/v, 95/5); gradient: 40-80% solvent A in 0-6 min, hold 9 min; flow: 0.3 mL/min; UV detector: diode array, 254 nm; MS conditions: capillary Voltage: 3900 kV (negative), 3500 kV (positive); Mode: negative and positive; Scan: 100-2000 amu; Rate: 1 sec/scan; Desolvation temperature: 300°C. Synthesis of HTL1 Monomer

4-(3-(4-([1,1'- 聯苯 ]-4- (9,9- 二甲基 -9H- -2- ) 胺基 ) 苯基 )-9H- 咔唑 -9- ) 苯甲醛之合成 N -(4-(9H-咔唑-3-基)苯基)-N-([1,1'-聯苯]-4-基)-9,9-二甲基-9H-茀-2-胺(2.00 g,3.318 mmol,1.0當量)、4-溴苯甲醛(0.737 g,3.982 mmol,1.2當量)、CuI(0.126 g,0.664 mmol,0.2當量)、碳酸鉀(1.376 g,9.954 mmol,3.0當量)及18-冠-6(86 mg,10 mol%)填充圓底燒瓶。燒瓶用氮氣沖洗且連接至回流冷凝器。添加10.0 mL無水除氣1,2-二氯苯,且使混合物回流達48小時。用飽和NH4 Cl水溶液淬滅經冷卻溶液,且用二氯甲烷進行萃取。將經組合之有機溶離份乾燥,且藉由蒸餾移除溶劑。藉由矽膠層析(己烷/氯仿梯度)純化粗殘餘物,且得到鮮黃色固體產物(2.04 g)。所述產物具有以下特性:1 H-NMR(500 MHz,CDCl3 ):δ 10.13(s,1 H)、8.37(d,J = 2.0 Hz,1 H)、8.20(dd,J = 7.7,1.0 Hz,1 H)、8.16(d,J = 8.2 Hz,2H)、7.83(d,J = 8.1 Hz,2 H)、7.73至7.59(m,7 H)、7.59至7.50(m,4 H)、7.50至7.39(m,4 H)、7.39至7.24(m,10 H)、7.19至7.12(m,1 H)、1.47(s,6H)。13 C-NMR(126 MHz,CDCl3 ):δ 190.95、155.17、153.57、147.21、146.98、146.69、143.38、140.60、140.48、139.28、138.93、135.90、135.18、134.64、134.46、133.88、131.43、128.76、127.97、127.81、126.99、126.84、126.73、126.65、126.54、126.47、125.44、124.56、124.44、124.12、123.98、123.63、122.49、120.96、120.70、120.57、119.47、118.92、118.48、110.05, 109.92、46.90、27.13。 4-(3-(4-([1,1'- biphenyl ]-4- yl (9,9- dimethyl -9H- fenest -2- yl ) amino ) phenyl )-9H- carbazole Synthesis of -9- yl ) benzaldehyde : N- (4-(9H-carbazol-3-yl)phenyl)-N-([1,1'-biphenyl]-4-yl)-9, 9-Dimethyl-9H-tertilene-2-amine (2.00 g, 3.318 mmol, 1.0 equiv), 4-bromobenzaldehyde (0.737 g, 3.982 mmol, 1.2 equiv), CuI (0.126 g, 0.664 mmol, 0.2 equiv ), potassium carbonate (1.376 g, 9.954 mmol, 3.0 eq) and 18-crown-6 (86 mg, 10 mol%) filled the round bottom flask. The flask was flushed with nitrogen and connected to a reflux condenser. 10.0 mL of dry degassed 1,2-dichlorobenzene was added, and the mixture was refluxed for 48 hours. The cooled solution was quenched with saturated aqueous NH4Cl and extracted with dichloromethane. The combined organic fractions were dried and the solvent was removed by distillation. The crude residue was purified by silica gel chromatography (hexane/chloroform gradient) and the product was obtained as a bright yellow solid (2.04 g). The product has the following properties: 1 H-NMR (500 MHz, CDCl 3 ): δ 10.13 (s, 1 H), 8.37 (d, J = 2.0 Hz, 1 H), 8.20 (dd, J = 7.7, 1.0 Hz, 1 H), 8.16 (d, J = 8.2 Hz, 2 H), 7.83 (d, J = 8.1 Hz, 2 H), 7.73 to 7.59 (m, 7 H), 7.59 to 7.50 (m, 4 H) , 7.50 to 7.39 (m, 4 H), 7.39 to 7.24 (m, 10 H), 7.19 to 7.12 (m, 1 H), 1.47 (s, 6H). 13 C-NMR (126 MHz, CDCl 3 ): δ 190.95, 155.17, 153.57, 147.21, 146.98, 146.69, 143.38, 140.60, 140.48, 139.28, 138.93, 135.90, 135.18, 134.64, 1 34.46, 133.88, 131.43, 128.76, 127.97 , 127.81, 126.99, 126.84, 126.73, 126.65, 126.54, 126.47, 125.44, 124.56, 124.44, 124.12, 123.98, 123.63, 122.49, 120.96, 120.70, 120.57, 1 19.47, 118.92, 118.48, 110.05, 109.92, 46.90, 27.13.

(4-(3-(4-([1,1'- 聯苯 ]-4- (9,9- 二甲基 -9H- -2- ) 胺基 ) 苯基 )-9H- 咔唑 -9- ) 苯基 ) 甲醇之合成 用式1(4.36 g,6.17 mmol,1.00當量)在氮之覆蓋下填充圓底燒瓶。將材料溶解於40 mL 1:1之THF:EtOH中。逐份添加硼氫化物(0.28 g,7.41 mmol,1.20當量),且攪拌材料達3小時。謹慎地用1 M HCl淬滅反應混合物,且用二氯甲烷之部分萃取產物。用飽和碳酸氫鈉水溶液洗滌經組合之有機溶離份,用MgSO4 進行乾燥且濃縮成粗殘餘物。藉由層析法(己烷/二氯甲烷梯度)純化材料,且得到白色固體產物(3.79 g)。產物具有以下特性:1 H-NMR(500 MHz,CDCl3 ):δ 8.35(s,1 H)、8.19(dt,J = 7.8,1.1 Hz,1 H)、7.73-7.56(m,11 H)、7.57-7.48(m,2 H)、7.48-7.37(m,6 H)、7.36-7.23(m,9 H)、7.14(s,1 H)、4.84(s,2 H)、1.45(s,6 H)。13 C-NMR(126 MHz, CDCl3 ):δ 155.13、153.56、147.24、147.02、146.44、141.27、140.60、140.11、140.07、138.94、136.99、136.33、135.06、134.35、132.96、128.73、128.44、127.96、127.76、127.09、126.96、126.79、126.62、126.48、126.10、125.15、124.52、123.90、123.54、123.49、122.46、120.66、120.36、120.06、119.43、118.82、118.33、109.95、109.85、64.86、46.87、27.11。 (4-(3-(4-([1,1'- biphenyl ]-4- yl (9,9- dimethyl -9H- fen -2- yl ) amino ) phenyl )-9H- carba Synthesis of azol -9- yl ) phenyl ) methanol : Fill a round bottom flask with formula 1 (4.36 g, 6.17 mmol, 1.00 equiv) under nitrogen blanket. The material was dissolved in 40 mL of 1:1 THF:EtOH. Borohydride (0.28 g, 7.41 mmol, 1.20 equiv) was added in portions, and the material was stirred for 3 hours. The reaction mixture was cautiously quenched with 1 M HCl, and the product was partially extracted with dichloromethane. The combined org. fractions were washed with saturated aqueous sodium bicarbonate, dried over MgSO4 and concentrated to a crude residue. The material was purified by chromatography (hexane/dichloromethane gradient) and the product was obtained as a white solid (3.79 g). The product has the following properties: 1 H-NMR (500 MHz, CDCl 3 ): δ 8.35 (s, 1 H), 8.19 (dt, J = 7.8, 1.1 Hz, 1 H), 7.73-7.56 (m, 11 H) , 7.57-7.48 (m, 2 H), 7.48-7.37 (m, 6 H), 7.36-7.23 (m, 9 H), 7.14 (s, 1 H), 4.84 (s, 2 H), 1.45 (s , 6H). 13 C-NMR (126 MHz, CDCl 3 ): δ 155.13, 153.56, 147.24, 147.02, 146.44, 141.27, 140.60, 140.11, 140.07, 138.94, 136.99, 136.33, 135.06, 134.35, 132.96, 128.73, 128.44, 127.96, 127.76 ,127.09,126.96,126.79,126.62,126.48,126.10,125.15,124.52,123.90,123.54,123.49,122.46,120.66,120.36,120.06,119.43,118.82,1 18.33, 109.95, 109.85, 64.86, 46.87, 27.11.

N-([1,1'- 聯苯 ]-4- )-9,9- 二甲基 -N-(4-(9-(4-(((4- 乙烯基苯甲基 ) 氧基 ) 甲基 ) 苯基 )-9H- 咔唑 -3- ) 苯基 )-9H- -2- 之合成 :在填充有氮之手套箱中,用(4-(3-(4-([1,1'-聯苯]-4-基(9,9-二甲基-9H-茀-2-基)胺基)苯基)-9H-咔唑-9-基)苯基)甲醇(4.40 g,6.21 mmol,1.00當量)及35 mL THF填充100 mL圓底燒瓶。逐份添加氫化鈉(0.224 g,9.32 mmol,1.50當量),且攪拌混合物達30分鐘。附接回流冷凝器,密封單元且自手套箱移除。注入4-氯甲基乙烯基苯(1.05 mL,7.45 mmol,1.20當量),且使混合物回流,直至起始材料耗盡為止。使反應混合物冷卻(冰浴)且謹慎地用異丙醇進行淬滅。添加飽和NH4 Cl水溶液,且用乙酸乙酯萃取產物。組合之有機溶離份係用鹽水洗滌,用MgSO4 乾燥,過濾,濃縮,且藉由二氧化矽層析法進行純化。產物具有以下特性:1 H-NMR(400 MHz,CDCl3 ):δ 8.35(s,1 H)、8.18(dt,J = 7.8,1.0 Hz,1 H)、7.74至7.47(m,14 H)、7.47至7.35(m,11 H)、7.35至7.23(m,9 H)、7.14(s,1 H)、6.73(dd,J = 17.6,10.9 Hz,1 H)、5.76(dd,J = 17.6,0.9 Hz,1 H)、5.25(dd,J = 10.9,0.9 Hz,1 H)、4.65(s,4 H)、1.45(s,6 H)。13 C-NMR(101 MHz, CDCl3 ):δ 155.13、153.56、147.25、147.03、146.43、141.28、140.61、140.13、138.94、137.64、137.63、137.16、137.00、136.48、136.37、135.06、134.35、132.94、129.21、128.73、128.05、127.96、127.76、126.96、126.94、126.79、126.62、126.48、126.33、126.09、125.14、124.54、123.89、123.54、123.48、122.46、120.66、120.34、120.04、119.44、118.82、118.31、113.92、110.01、109.90、72.33、71.61、46.87、27.11。HTL2 單體之合成 N-([1,1'- biphenyl ]-4- yl )-9,9- dimethyl -N-(4-(9-(4-(((4- vinylbenzyl ) oxy ) methyl ) phenyl ) -9H- carbazol -3- yl ) phenyl ) -9H- tertiary -2- amine synthesis : In a glove box filled with nitrogen, use (4-(3-(4- ([1,1'-biphenyl]-4-yl(9,9-dimethyl-9H-fluorene-2-yl)amino)phenyl)-9H-carbazol-9-yl)phenyl) A 100 mL round bottom flask was filled with methanol (4.40 g, 6.21 mmol, 1.00 equiv) and 35 mL of THF. Sodium hydride (0.224 g, 9.32 mmol, 1.50 equiv) was added portionwise, and the mixture was stirred for 30 minutes. A reflux condenser was attached, the unit was sealed and removed from the glove box. 4-Chloromethylvinylbenzene (1.05 mL, 7.45 mmol, 1.20 equiv) was injected, and the mixture was refluxed until the starting material was consumed. The reaction mixture was cooled (ice bath) and quenched cautiously with isopropanol. Sat. aq. NH4Cl was added, and the product was extracted with ethyl acetate. The combined organic fractions were washed with brine, dried over MgSO4 , filtered, concentrated, and purified by silica chromatography. The product has the following properties: 1 H-NMR (400 MHz, CDCl 3 ): δ 8.35 (s, 1 H), 8.18 (dt, J = 7.8, 1.0 Hz, 1 H), 7.74 to 7.47 (m, 14 H) , 7.47 to 7.35 (m, 11 H), 7.35 to 7.23 (m, 9 H), 7.14 (s, 1 H), 6.73 (dd, J = 17.6, 10.9 Hz, 1 H), 5.76 (dd, J = 17.6, 0.9 Hz, 1 H), 5.25 (dd, J = 10.9, 0.9 Hz, 1 H), 4.65 (s, 4 H), 1.45 (s, 6 H). 13 C-NMR (101 MHz, CDCl 3 ): δ 155.13, 153.56, 147.25, 147.03, 146.43, 141.28, 140.61, 140.13, 138.94, 137.64, 137.63, 137.16, 137.00, 136.48, 136.37, 135.06, 134.35, 132.94, 129.21 , 128.73, 128.05, 127.96, 127.76, 126.96, 126.94, 126.79, 126.62, 126.48, 126.33, 126.09, 125.14, 124.54, 123.89, 123.54, 123.48, 122.46, 1 20.66, 120.34, 120.04, 119.44, 118.82, 118.31, 113.92, 110.01 , 109.90, 72.33, 71.61, 46.87, 27.11. Synthesis of HTL2 Monomer

4'-((9,9- 二甲基 -9H- -2- )(4-(1- 甲基 -2- 苯基 -1H- 吲哚 -3- ) 苯基 ) 胺基 )-[1,1'- 聯苯 ]-4- 甲醛 之合成 在80℃下,在氮氣氣氛下,將N-(4-溴苯基)-9,9-二甲基-N-(4-(1-甲基-2-苯基-1H-吲哚-3-基)苯基)-9H-茀-2-胺(1)(12.9 g,20 mmol)、(4-甲醯基苯基)硼酸(1.07 g,30mmol)、Pd(PPh3 )4 (693 mg,1155,3%)、2M K2 CO3 (4.14 g,30 mmol,15 mL H2O)與45 mL之THF的混合物加熱達12 h。在冷卻至室溫之後,在真空下移除溶劑且用二氯甲烷萃取殘基。在冷卻至室溫之後,在真空下移除溶劑且接著添加水。混合物用CH2 Cl2 萃取。收集有機層且經無水硫酸鈉乾燥。在過濾之後,蒸發濾液以移除溶劑,且經由矽膠管柱層析純化殘餘物,以得到淡黃色固體(產率:75%)。MS(ESI):671.80 [M+H]+ 。1H-NMR(CDCl3 ,400 MHz,TMS,ppm):δ 10.03(s,1H)、7.94(d,2H)、7.75(d,2H)、7.64(m,2H)、7.55(d,2H)、7.41(m,9H)、7.23(m,8H)、7.09(m,3H)、3.69(s,3H)、1.43(s,6H)。 4'-((9,9- Dimethyl -9H- fen - 2- yl )(4-(1- methyl -2- phenyl- 1H - indol -3- yl ) phenyl ) amino ) Synthesis of -[1,1'- biphenyl ]-4- formaldehyde : at 80°C, under a nitrogen atmosphere, N-(4-bromophenyl)-9,9-dimethyl-N-(4 -(1-methyl-2-phenyl-1H-indol-3-yl)phenyl)-9H-oxene-2-amine (1) (12.9 g, 20 mmol), (4-formylphenyl A mixture of boronic acid (1.07 g, 30 mmol), Pd(PPh 3 ) 4 (693 mg, 1155, 3%), 2M K 2 CO 3 (4.14 g, 30 mmol, 15 mL H2O) and 45 mL of THF was heated up to 12 h. After cooling to room temperature, the solvent was removed under vacuum and the residue was extracted with dichloromethane. After cooling to room temperature, the solvent was removed under vacuum and then water was added. The mixture was extracted with CH2Cl2 . The organic layer was collected and dried over anhydrous sodium sulfate. After filtration, the filtrate was evaporated to remove the solvent, and the residue was purified by silica gel column chromatography to obtain a pale yellow solid (yield: 75%). MS (ESI): 671.80 [M+H] + . 1H-NMR (CDCl 3 , 400 MHz, TMS, ppm): δ 10.03 (s, 1H), 7.94 (d, 2H), 7.75 (d, 2H), 7.64 (m, 2H), 7.55 (d, 2H) , 7.41 (m, 9H), 7.23 (m, 8H), 7.09 (m, 3H), 3.69 (s, 3H), 1.43 (s, 6H).

(4'-((9,9- 二甲基 -9H- -2- )(4-(1- 甲基 -2- 苯基 -1H- 吲哚 -3- ) 苯基 ) 胺基 )-[1,1'- 聯苯 ]-4- ) 甲醇 之合成 在氮氣氣氛下,向40℃下的4'-((9,9-二甲基-9H-茀-2-基)(4-(1-甲基-2-苯基-1H-吲哚-3-基)苯基)胺基)-[1,1'-聯苯]-4-甲醛(10 g,15 mmol)在50 mL THF及50 mL乙醇中之溶液添加NaBH4 (2.26 g,60 mmol)。使溶液在室溫下攪拌達2 h。接著,添加鹽酸水溶液溶液,直至pH值為5,且維持添加再達30 min。在真空下移除溶劑且用二氯甲烷萃取殘餘物。接著藉由移除溶劑來獲得產物,且將產物用於下一步驟,而無進一步純化(產率:95%)。MS(ESI):673.31 [M+H]+ (4'-((9,9- Dimethyl -9H- fluorene -2- yl )(4-(1- methyl -2- phenyl- 1H - indol -3- yl ) phenyl ) amino )-[1,1'- biphenyl ]-4- yl ) methanol synthesis : under nitrogen atmosphere, to 4'-((9,9-dimethyl-9H-fluorene-2-yl )(4-(1-methyl-2-phenyl-1H-indol-3-yl)phenyl)amino)-[1,1'-biphenyl]-4-carbaldehyde (10 g, 15 mmol ) in 50 mL THF and 50 mL ethanol was added NaBH 4 (2.26 g, 60 mmol). The solution was allowed to stir at room temperature for 2 h. Next, aqueous hydrochloric acid solution was added until the pH was 5, and the addition was maintained for another 30 min. The solvent was removed under vacuum and the residue was extracted with dichloromethane. The product was then obtained by removing the solvent and used in the next step without further purification (yield: 95%). MS (ESI): 673.31 [M+H] + .

9,9- 二甲基 -N-(4-(1- 甲基 -2- 苯基 -1H- 吲哚 -3- ) 苯基 )-N-(4'-(((4- 乙烯基苯甲基 ) 氧基 ) 甲基 )-[1,1'- 聯苯 ]-4- )-9H- -2- 之合成 向(4'-((9,9-二甲基-9H-茀-2-基)(4-(1-甲基-2-苯基-1H-吲哚-3-基)苯基)胺基)-[1,1'-聯苯]-4-基)甲醇(9.0 g,13.4 mmol)在50 mL無水DMF中之溶液添加NaH(482 mg,20.1 mmol),接著在室溫下攪拌所述混合物達1 h。且經由針筒將4-氯甲基乙烯基苯(3.05 g,20.1 mmol)添加至以上溶液。在24 h內將混合物加熱至50℃。在用水淬滅後,將混合物倒入水中以移除DMF。過濾殘餘物,且所得固體用二氯甲烷溶解,其接著用水洗滌。在真空下移除溶劑且用二氯甲烷萃取殘餘物。產物接著藉由矽膠管柱層析獲得(產率:90%)。MS(ESI):789.38 [M+H]+ 。1H-NMR(CDCl3 ,400 MHz,TMS, ppm):δ 7.59(d,4 H)、7.48(m,2 H)、7.40(m,18 H)、7.22(m,8 H)、6.71(dd,1 H)、5.77(d,1 H)、5.25(d,1 H)、4.58(s,4 H)、3.67 (s,3 H)、1.42 (s,6 H)。HTL3 單體之合成 9,9- Dimethyl -N-(4-(1- methyl -2- phenyl- 1H - indol -3- yl ) phenyl )-N-(4'-(((4- vinyl Synthesis of benzyl ) oxy ) methyl )-[1,1'- biphenyl ]-4- yl )-9H- oxene -2- amine : to (4'-((9,9-dimethyl -9H-Oxen-2-yl)(4-(1-methyl-2-phenyl-1H-indol-3-yl)phenyl)amino)-[1,1'-biphenyl]-4 -yl) Methanol (9.0 g, 13.4 mmol) in 50 mL of anhydrous DMF was added NaH (482 mg, 20.1 mmol), and the mixture was stirred at room temperature for 1 h. And 4-chloromethylvinylbenzene (3.05 g, 20.1 mmol) was added to the above solution via syringe. The mixture was heated to 50 °C within 24 h. After quenching with water, the mixture was poured into water to remove DMF. The residue was filtered, and the resulting solid was dissolved with dichloromethane, which was then washed with water. The solvent was removed under vacuum and the residue was extracted with dichloromethane. The product was then obtained by silica gel column chromatography (yield: 90%). MS (ESI): 789.38 [M+H] + . 1H-NMR (CDCl 3 , 400 MHz, TMS, ppm): δ 7.59 (d, 4 H), 7.48 (m, 2 H), 7.40 (m, 18 H), 7.22 (m, 8 H), 6.71 ( dd, 1 H), 5.77 (d, 1 H), 5.25 (d, 1 H), 4.58 (s, 4 H), 3.67 (s, 3 H), 1.42 (s, 6 H). Synthesis of HTL3 Monomer

4'-([1,1'- 聯苯 ]-4- (9,9- 二甲基 -9H- -2- ) 胺基 )-[1,1'- 聯苯 ]-4- 甲醛 之合成 用[1](20 g,38.7 mmol,1當量)、4-甲醯基苯硼酸(6.42 g,42.6 mmol,1.1當量)、四氫呋喃(315 mL)及2 M水性K2 CO3 (58 mL)填充1 L、3頸圓底燒瓶,所述燒瓶裝備有熱電偶、具有N2入口之冷凝器及隔板。將混合物攪拌且用N2 噴灑達30分鐘。添加Pd(dppf)Cl2 (0.55 g,0.75 mmol,0.02當量),且在21 h內加熱反應以回流。蒸餾掉四氫呋喃,且用水(300 mL)稀釋反應,且用二氯甲烷(2×300 mL)萃取。經MgSO4 乾燥組合之有機相,過濾且濃縮至矽石上。使用梯度溶離劑(1管柱體積己烷增大至8管柱體積上的1:1己烷:二氯甲烷)層析材料,接著針對10管柱體積維持1:1比率)。冷凝組合之溶離份以得到亮黃色固體(15.2 g,72%,純度99.5%)。 4'-([1,1'- biphenyl ]-4- yl (9,9- dimethyl -9H- fen -2- yl ) amino )-[1,1'- biphenyl ]-4- Synthesis of formaldehyde : using [1] (20 g, 38.7 mmol, 1 equivalent), 4-formylphenylboronic acid (6.42 g, 42.6 mmol, 1.1 equivalent), tetrahydrofuran (315 mL) and 2 M aqueous K 2 CO 3 (58 mL) filled a 1 L, 3-necked round bottom flask equipped with a thermocouple, condenser with N2 inlet, and a septum. The mixture was stirred and sparged with N2 for 30 min. Pd(dppf) Cl2 (0.55 g, 0.75 mmol, 0.02 equiv) was added and the reaction was heated to reflux over 21 h. Tetrahydrofuran was distilled off, and the reaction was diluted with water (300 mL), and extracted with dichloromethane (2 x 300 mL). The combined org. phases were dried over MgSO4 , filtered and concentrated onto silica. Material was chromatographed using a gradient eluent (1 column volume hexane increasing to 1:1 hexane:dichloromethane over 8 column volumes, then maintaining a 1:1 ratio for 10 column volumes). The combined fractions were condensed to give a bright yellow solid (15.2 g, 72%, 99.5% pure).

1 H NMR(400 MHz,C6 D6)δ 9.74(s,1 H)、7.61(2 H,dd,J = 8 Hz,2 Hz)、7.55(2 H,dd,J = 20 Hz,2.4 Hz)、7.50 - 7.46(5 H,多峰)、7.37 - 7.11(15 H,多峰)、1.28(s,6 H)。 1 H NMR (400 MHz, C 6 D6) δ 9.74 (s, 1 H), 7.61 (2 H, dd, J = 8 Hz, 2 Hz), 7.55 (2 H, dd, J = 20 Hz, 2.4 Hz ), 7.50 - 7.46 (5 H, multimodal), 7.37 - 7.11 (15 H, multimodal), 1.28 (s, 6 H).

13 C NMR(101 MHz,C6 D6)δ 190.64、155.70、153.83、148.64、147.24、147.05、146.04、140.76、139.10、136.52、135.61、135.38、133.68、130.22、129.01、128.43、128.36、127.39、127.18、127.12、126.95、126.94、124.93、124.44、123.82、122.74、121.29、119.88、119.61、46.95z、26.93。 13 C NMR (101 MHz, C 6 D6) δ 190.64, 155.70, 153.83, 148.64, 147.24, 147.05, 146.04, 140.76, 139.10, 136.52, 135.61, 135.38, 133.68, 130.22, 129 .01, 128.43, 128.36, 127.39, 127.18, 127.12, 126.95, 126.94, 124.93, 124.44, 123.82, 122.74, 121.29, 119.88, 119.61, 46.95z, 26.93.

N-([1,1'- 聯苯 ]-4- )-9,9- 二甲基 -N-(4'- 乙烯基 -[1,1'- 聯苯 ]-4- )-9H- -2- 之合成 用甲基三苯基鏻溴化物(18.44 g,51.6 mmol,2當量)及無水四氫呋喃(148 mL)填充500 mL圓底燒瓶3頸圓底燒瓶,所述燒瓶裝備有熱電偶、具有N2入口之冷凝器及隔板。添加第三丁醇鉀(6.8 g,60.6 mmol,2.3當量),且將混合物攪拌15分鐘。將4'-([1,1'-聯苯]-4-基(9,9-二甲基-9H-茀-2-基)胺基)-[1,1'-聯苯]-4-甲醛[9](14.03 g,25.9 mmol,1當量)溶解於無水四氫呋喃(74 mL)中且添加至甲基三苯基鏻溴化物溶液。在室溫下攪拌反應16 h。添加水(4 mL),且經由矽石之插塞過濾混合物。用二氯甲烷(423 g)沖洗襯墊,且使濾液吸附至矽石且藉由色譜法使用梯度溶離劑(1管柱體積己烷增大至19管柱體積上80 : 20己烷:二氯甲烷,接著針對10管柱體積維持80 : 20比率)來純化。冷凝組合之溶離份以得到黃色含油固體,用甲醇濕磨所述固體以得到白色固體(10.57 g,76%,純度99.8%)。 N-([1,1'- biphenyl ]-4- yl )-9,9- dimethyl -N-(4'- vinyl- [1,1'- biphenyl ]-4- yl )- Synthesis of 9H- tertilene -2- amine : Fill a 500 mL round-bottom flask with a 3-neck round-bottom flask with methyltriphenylphosphonium bromide (18.44 g, 51.6 mmol, 2 equivalents) and anhydrous tetrahydrofuran (148 mL), and the The flask was equipped with thermocouple, condenser with N2 inlet and separator. Potassium tert-butoxide (6.8 g, 60.6 mmol, 2.3 equiv) was added, and the mixture was stirred for 15 minutes. 4'-([1,1'-biphenyl]-4-yl(9,9-dimethyl-9H-fluorene-2-yl)amino)-[1,1'-biphenyl]-4 - Formaldehyde [9] (14.03 g, 25.9 mmol, 1 equiv) was dissolved in anhydrous tetrahydrofuran (74 mL) and added to the methyltriphenylphosphonium bromide solution. The reaction was stirred at room temperature for 16 h. Water (4 mL) was added, and the mixture was filtered through a plug of silica. The pad was flushed with dichloromethane (423 g), and the filtrate was adsorbed to silica and chromatographed using gradient eluents (1 column volume hexane increasing to 19 column volumes 80:20 hexane:2 Chloromethane, followed by an 80:20 ratio for 10 column volumes). The combined fractions were condensed to give a yellow oily solid which was triturated with methanol to give a white solid (10.57 g, 76%, 99.8% pure).

1 H NMR(400 MHz,C6 D6)δ 7.55 - 7.43(多峰,11 H)、7.33 - 7.10(多峰,13 H)、6.63(1 H,dd,J = 20 Hz,12 Hz)、5.66(1 H,dd,J = 20 Hz,1.2 Hz)、5.11(1 H,dd,J = 12 Hz,1.2 Hz)、1.27(s,6 H)。 1 H NMR (400 MHz, C 6 D6 ) δ 7.55 - 7.43 (multiple peaks, 11 H), 7.33 - 7.10 (multiple peaks, 13 H), 6.63 (1 H, dd, J = 20 Hz, 12 Hz), 5.66 (1 H, dd, J = 20 Hz, 1.2 Hz), 5.11 (1 H, dd, J = 12 Hz, 1.2 Hz), 1.27 (s, 6 H).

13 C NMR(101 MHz,C6 D6)δ 155.61、153.85、147.66、147.57、147.39、140.91、140.28、139.25、136.82、136.51、136.04、135.41、135.19、128.98、128.28、128.02、127.78、127.34、127.04、127.02、126.98、126.94、124.60、124.52、124.15、122.71、121.23、119.81、119.30、113.42、46.93、26.94。HTL4 單體之合成 13 C NMR (101 MHz, C 6 D6) δ 155.61, 153.85, 147.66, 147.57, 147.39, 140.91, 140.28, 139.25, 136.82, 136.51, 136.04, 135.41, 135.19, 128.98, 128 .28, 128.02, 127.78, 127.34, 127.04, 127.02, 126.98, 126.94, 124.60, 124.52, 124.15, 122.71, 121.23, 119.81, 119.30, 113.42, 46.93, 26.94. Synthesis of HTL4 Monomer

4-(3,6- (4-([1,1'- 聯苯 ]-4- (9,9- 二甲基 -9H- -2- ) 胺基 ) 苯基 )-9H- 咔唑 -9- ) 苯甲醛之合成 在氮氣下隔夜在80℃下加熱4-(3,6-二溴-9H-咔唑-9-基)苯甲醛(6.00 g,17.74 mmol)、N-([1,1'-聯苯]-4-基)-9,9-二甲基-N-(4-(4,4,5,5-四甲基-1,3,2-二氧雜硼戊環-2-基)苯基)-9H-茀-2-胺(15.70 g,35.49 mmol)、Pd(PPh3 )3 (0.96 g)、7.72 g K2 CO3 、100mL THF與30mL H2 O之混合物。在冷卻至室溫之後,在真空下移除溶劑且用二氯甲烷萃取殘基。接著藉由矽膠管柱層析用石油醚及二氯甲烷作為溶離劑來獲得產物以提供所需產物(14.8 g,產率92%)。1 H NMR(CDCl3 ,ppm):10.14(s,1H)、8.41(d,2H)、8.18(d,2H)、7.86(d,2H)、7.71(dd,2H)、7.56-7.68(m,14H)、7.53(m,4H)、7.42(m,4H)、7.26-735(m,18H)、7.13-7.17(d,2H)、1.46(s,12H)。 4-(3,6- bis (4-([1,1'- biphenyl ]-4- yl (9,9- dimethyl -9H- fluorene - 2- yl ) amino ) phenyl )-9H Synthesis of -carbazol -9- yl ) benzaldehyde : Heating 4-(3,6-dibromo-9H-carbazol - 9-yl)benzaldehyde (6.00 g, 17.74 mmol) at 80°C overnight under nitrogen , N-([1,1'-biphenyl]-4-yl)-9,9-dimethyl-N-(4-(4,4,5,5-tetramethyl-1,3,2 -dioxaborolan-2-yl)phenyl)-9H-tertire-2-amine (15.70 g, 35.49 mmol), Pd(PPh 3 ) 3 (0.96 g), 7.72 g K 2 CO 3 , 100 mL A mixture of THF and 30 mL H2O . After cooling to room temperature, the solvent was removed under vacuum and the residue was extracted with dichloromethane. The product was then obtained by silica gel column chromatography using petroleum ether and dichloromethane as eluents to afford the desired product (14.8 g, 92% yield). 1 H NMR (CDCl 3 , ppm): 10.14 (s, 1H), 8.41 (d, 2H), 8.18 (d, 2H), 7.86 (d, 2H), 7.71 (dd, 2H), 7.56-7.68 (m , 14H), 7.53 (m, 4H), 7.42 (m, 4H), 7.26-735 (m, 18H), 7.13-7.17 (d, 2H), 1.46 (s, 12H).

(4-(3,6- (4-([1,1'- 聯苯 ]-4- (9,9- 二甲基 -9H- -2- ) 胺基 ) 苯基 )-9H- 咔唑 -9- ) 苯基 ) 甲醇之合成 將4-(3,6-雙(4-([1,1'-聯苯]-4-基(9,9-二甲基-9H-茀-2-基)胺基)苯基)-9H-咔唑-9-基)苯甲醛(10.0 g,8.75 mmol)溶解於80 mL THF及30 mL乙醇中。在氮氣氣氛下添加NaBH4 (1.32 g,35.01 mmol)超過2小時。接著,添加鹽酸水溶液直至pH 5為止,且保持攪拌混合物30 min。在真空下移除溶劑且用二氯甲烷萃取殘餘物。接著在真空下乾燥產物且不經進一步純化即用於下一步驟。 (4-(3,6- bis (4-([1,1'- biphenyl ]-4- yl (9,9- dimethyl -9H- fluorene - 2- yl ) amino ) phenyl )- Synthesis of 9H- carbazol -9- yl ) phenyl ) methanol : 4-(3,6-bis(4-([1,1'-biphenyl]-4-yl(9,9-dimethyl -9H-Oxen-2-yl)amino)phenyl)-9H-carbazol-9-yl)benzaldehyde (10.0 g, 8.75 mmol) was dissolved in 80 mL THF and 30 mL ethanol. NaBH4 (1.32 g, 35.01 mmol) was added under nitrogen atmosphere over 2 hours. Then, aqueous hydrochloric acid was added until pH 5, and the mixture was kept stirring for 30 min. The solvent was removed under vacuum and the residue was extracted with dichloromethane. The product was then dried under vacuum and used in the next step without further purification.

N,N'-((9-(4-(((4- 乙烯基苯甲基 氧基 ) 甲基 ) 苯基 )-9H- 咔唑 -3,6- 二基 ) (4,1- 伸苯基 )) (N-([1,1'- 聯苯 ]-4- )-9,9- 二甲基 -9H- -2- 胺) 之合成 將0.45 g 60%NaH添加至(4-(3,6-雙(4-([1,1'-聯苯]-4-基(9,9-二甲基-9H-茀-2-基)胺基)苯基)-9H-咔唑-9-基)苯基)甲醇之10.00 g、100 mL乾燥DMF溶液。在室溫下攪拌1 h之後,藉由針筒添加2.00 g 1-(氯甲基)-4-乙烯基苯。在N2 下在60℃下攪拌所述溶液且藉由TLC追蹤。在耗盡起始材料之後,使溶液冷卻且將所述溶液倒入至冰水中。在進行過濾且分別用水、乙醇及石油醚洗滌之後,獲得粗產物且在50℃下在真空烘箱中整夜乾燥所述粗產物,且接著藉由閃光矽膠管柱層析法憑藉二氯甲烷與石油醚之溶離劑(1:3至1:1)的梯度演進進行純化。藉由來自乙酸乙酯之再結晶及管柱層析法進一步純化粗產物,其實現純度為99.8%。ESI-MS(m/z, Ion):1260.5811、(M+H)+1 H NMR(CDCl3 ,ppm):8.41(s,2 H)、7.58-7.72(m,18 H)、7.53(d,4 H)、7.38-7.50(m,12 H)、7.25-7.35(m,16 H)、7.14(d,2 H)、6.75(q,1 H)、5.78(d,1 H)、5.26(d,1 H)、4.68(s,4 H)、1.45(s,12 H)。針對 HTL 聚合物之製備: N,N'-((9-(4-(((4- vinylbenzyl ) oxy )methyl ) phenyl ) -9H- carbazole -3,6- diyl ) bis (4,1 -Synthesis of -phenylene )) bis (N-([1,1'- biphenyl ]-4- yl )-9,9- dimethyl -9H- oxene -2- amine) : 0.45 g 60% NaH was added to (4-(3,6-bis(4-([1,1'-biphenyl]-4-yl(9,9-dimethyl-9H-fluorene-2-yl)amino)benzene 10.00 g, 100 mL of dry DMF solution of -9H-carbazol-9-yl)phenyl)methanol. After stirring at room temperature for 1 h, 2.00 g of 1-(chloromethyl)-4-vinylbenzene were added via syringe. The solution was stirred at 60 °C under N2 and tracked by TLC. After consumption of starting material, the solution was allowed to cool and poured into ice water. After filtering and washing with water, ethanol and petroleum ether respectively, the crude product was obtained and dried overnight in a vacuum oven at 50°C, and then flash silica gel column chromatography with dichloromethane and The gradient evolution of petroleum ether eluent (1:3 to 1:1) was used for purification. The crude product was further purified by recrystallization from ethyl acetate and column chromatography, achieving a purity of 99.8%. ESI-MS (m/z, Ion): 1260.5811, (M+H) + . 1 H NMR (CDCl 3 , ppm): 8.41 (s, 2 H), 7.58-7.72 (m, 18 H), 7.53 (d, 4 H), 7.38-7.50 (m, 12 H), 7.25-7.35 ( m, 16 H), 7.14 (d, 2 H), 6.75 (q, 1 H), 5.78 (d, 1 H), 5.26 (d, 1 H), 4.68 (s, 4 H), 1.45 (s, 12H). For the preparation of HTL polymers:

在手套箱中,將單體(1.00當量)溶解於苯甲醚(電子級,0.25 M)中。將混合物加熱至70℃,且注射AIBN溶液(0.20 M於甲苯中,5 mol%)。攪拌混合物直至單體完全消耗,至少24小時(可添加2.5莫耳%部分之AIBN溶液以完成轉換)。聚合物用甲醇(苯甲醚之10×容積)沈澱且藉由過濾分離。用額外部分之甲醇沖洗經過濾固體。經過濾固體再溶解於苯甲醚中且再重複沈澱/過濾工序兩次。經分離固體在50℃下置於真空烘箱中隔夜以移除溶劑。HTL 聚合物結構及分子量( MW In a glove box, dissolve the monomer (1.00 equiv) in anisole (electronic grade, 0.25 M). The mixture was heated to 70 °C, and AIBN solution (0.20 M in toluene, 5 mol%) was injected. The mixture was stirred until the monomer was completely consumed, at least 24 hours (a 2.5 mol% portion of the AIBN solution could be added to complete the conversion). The polymer was precipitated with methanol (10 x volume of anisole) and isolated by filtration. The filtered solid was rinsed with an additional portion of methanol. The filtered solid was redissolved in anisole and the precipitation/filtration procedure was repeated two more times. The isolated solid was placed in a vacuum oven overnight at 50 °C to remove solvent. HTL polymer structure and molecular weight ( MW )

Mn :平均數之MW;Mw :平均重量之MW;Mz :平均Z之MW;Mz+1 :平均Z+1之MW。PDI = Mw /Mn :多分散性 QLED裝置製造M n : average MW; M w : average weight MW; M z : average Z MW; M z+1 : average Z+1 MW. PDI = M w /M n : polydispersity QLED device manufacturing

如下構建QLED裝置。使用具有像素化錫摻雜之氧化銦(ITO)電極(Ossila Inc.)之玻璃基板(20 mm×15 mm)。使用氧電漿處理ITO。電洞注入層(HIL)為購自Sigma-Aldrich之Plexcore™ OC RG-1200(聚(噻吩-3-[2-(2-甲氧基乙氧基)乙氧基]-2,5-二基)。HIL溶液用0.45微米聚偏二氟乙烯(PVDF)針筒過濾器過濾且藉由動態旋塗沈積至層中,藉此將20 μL溶液分配至旋轉基板上。旋轉速度大致為2000 RPM以達成大致40 nm之膜厚度。使用泡沫拭子,用甲苯移除覆蓋電極之段之沈積膜的一些部分。裝置接著在惰性氣氛中在熱板上於150℃下退火30分鐘。The QLED device was constructed as follows. A glass substrate (20 mm x 15 mm) with pixelated tin-doped indium oxide (ITO) electrodes (Ossila Inc.) was used. ITO was treated with oxygen plasma. The hole injection layer (HIL) was Plexcore™ OC RG-1200 (poly(thiophene-3-[2-(2-methoxyethoxy)ethoxy]-2,5-di base). The HIL solution was filtered with a 0.45 micron polyvinylidene fluoride (PVDF) syringe filter and deposited into the layer by dynamic spin coating, whereby 20 μL of the solution was dispensed onto the rotating substrate. The spin speed was approximately 2000 RPM To achieve a film thickness of approximately 40 nm. Using a foam swab, some portions of the deposited film covering the segment of the electrode were removed with toluene. The device was then annealed for 30 minutes at 150° C. on a hot plate in an inert atmosphere.

為了形成電洞輸送層(HTL),每一HTL聚合物在升高的溫度(< 100℃)下個別地溶解於電子級苯甲醚(2% w/w)中以確保完整的溶解且穿過0.2 μm聚四氟乙烯(PTFE)過濾器。材料藉由動態旋塗沈積至層中,藉以將20 μL溶液分配至旋轉基板上。對於各材料調節旋轉速度(大致2000 RPM)以達成大致40 nm之膜厚度。使用泡沫拭子,用甲苯移除覆蓋電極之段之沈積膜的一些部分。裝置接著在惰性氣氛中在熱板上於205℃下退火10分鐘。將由聚[(9,9-二辛基茀基-2,7-二基)-共-(4,40-(N-(4-第二丁基苯基))二苯胺)] (TFB)及2,3,5,6-四氟-7,7,8,8-四氰基對醌二甲烷(F4TCNQ)之50:50混合物組成之充分研究的文獻HTL用作參考。To form the hole transport layer (HTL), each HTL polymer was individually dissolved in electronic grade anisole (2% w/w) at elevated temperature (<100°C) to ensure complete dissolution and penetration. Pass through a 0.2 μm polytetrafluoroethylene (PTFE) filter. Materials were deposited into layers by dynamic spin coating, whereby 20 μL of the solution was dispensed onto the rotating substrate. The spin speed (approximately 2000 RPM) was adjusted for each material to achieve a film thickness of approximately 40 nm. Using a foam swab, some parts of the deposited film covering the section of the electrode were removed with toluene. The device was then annealed at 205° C. for 10 minutes on a hot plate in an inert atmosphere. Will be made of poly[(9,9-dioctyl fenyl-2,7-diyl)-co-(4,40-(N-(4-second butylphenyl))diphenylamine)] (TFB) and 2,3,5,6-tetrafluoro-7,7,8,8-tetracyanoquinodimethane (F4TCNQ) The well-studied literature HTL for the composition of a 50:50 mixture is used as a reference.

發光層選自以下清單。各材料藉由動態旋塗沈積至層中,藉此將20 μL溶液分配至旋轉基板上。對於各材料調節旋轉速度(大致2000至4000 RPM)以達成大致5 nm至15 nm之膜厚度。使用泡沫拭子,用甲苯移除覆蓋電極之段之沈積膜的一些部分。裝置接著在惰性氣氛中在熱板上於180℃下退火10分鐘。The light emitting layer is selected from the list below. Each material was deposited into layers by dynamic spin coating, whereby 20 μL of the solution was dispensed onto the rotating substrate. The spin speed (approximately 2000 to 4000 RPM) was adjusted for each material to achieve a film thickness of approximately 5 nm to 15 nm. Using a foam swab, some parts of the deposited film covering the section of the electrode were removed with toluene. The device was then annealed at 180° C. for 10 minutes on a hot plate in an inert atmosphere.

如下使用發光層材料: 1)CdSe/ZnS(520 nm發射); 2)InP /ZnS(620 nm發射);及 3)CdS/CdSe/ZnSe DHNR(600 nm發射)。Emissive layer materials were used as follows: 1) CdSe/ZnS (520 nm emission); 2) InP/ZnS (620 nm emission); and 3) CdS/CdSe/ZnSe DHNR (600 nm emission).

CdSe/ZnS及InP/ZnS分別以目錄號748021及776777購自Aldrich。量子點以約20 mg/ml之濃度分散於甲苯中,且按原樣使用。CdSe/ZnS and InP/ZnS were purchased from Aldrich as catalog numbers 748021 and 776777, respectively. Quantum dots were dispersed in toluene at a concentration of about 20 mg/ml and used as received.

根據以下程序合成Synthesized according to the following procedure DHNRDHNR .

工業級三辛基氧化膦(90%)、工業級三辛基膦(TOP)(90%)、工業級油酸(90%)、工業級十八烯(90%)、CdO(99.5 %)、乙酸鋅(99.99%)、S粉末(99.998%)及Se粉末(99.99%)係獲自Sigma Aldrich。N-十八烷基膦酸(ODPA)係獲自PCI Synthesis。ACS級氯仿及甲醇係獲自Fischer Scientific。所有化學品按原樣使用。Technical grade trioctylphosphine oxide (90%), technical grade trioctylphosphine (TOP) (90%), technical grade oleic acid (90%), technical grade octadecene (90%), CdO (99.5 %) , Zinc acetate (99.99%), S powder (99.998%) and Se powder (99.99%) were obtained from Sigma Aldrich. N-octadecylphosphonic acid (ODPA) was obtained from PCI Synthesis. ACS grade chloroform and methanol were obtained from Fischer Scientific. All chemicals were used as received.

CdS 奈米棒之合成 CdS奈米棒係以與已確立方法14類似之方式製備。反應在N2氛圍下在標準施蘭克線(Schlenk line)中進行。首先,50 ml三頸圓底燒瓶中之2.0 g(5.2 mmol)三辛基氧化膦、0.67 g(2.0 mmol) ODPA及0.13 g(2.0 mmol) CdO在150℃下於真空中脫氣30分鐘,且接著伴隨攪拌加熱至350℃。隨著Cd-ODPA複合物在350℃下形成,燒瓶中之棕色溶液通常在1 h之後變得光學透明及無色。溶液接著經冷卻且在150℃下脫氣10 min以移除包含O2 及H2 O之錯合副產物。在脫氣之後,溶液在N2 氣氛下再加熱至350℃。含有溶解於1.5 ml TOP中之16 mg(0.5 mmol)S之S前驅體被用針筒迅速注射至燒瓶中。因此,反應混合物經猝滅至330℃,在330℃下進行CdS生長。在15 min之後,CdS奈米棒生長藉由冷卻至250℃而終止,在250℃下進行Cds奈米棒上之CdSe生長。獲取CdS奈米棒之等分試樣且藉由用甲醇及丁醇沈澱而清潔以用於特性化。CdS/CdSe異質結構係藉由將Se前驅體緩慢添加至維持於N2 氣氛下之相同反應燒瓶中,如下所述地形成。Synthesis of CdS nanorods : CdS nanorods were prepared in a similar manner to the established method 14 . Reactions were carried out in a standard Schlenk line under N2 atmosphere. First, 2.0 g (5.2 mmol) trioctylphosphine oxide, 0.67 g (2.0 mmol) ODPA, and 0.13 g (2.0 mmol) CdO in a 50 ml three-necked round-bottom flask were degassed in vacuum at 150 °C for 30 min, And then heated to 350 °C with stirring. The brown solution in the flask usually became optically clear and colorless after 1 h as the Cd-ODPA complex formed at 350 °C. The solution was then cooled and degassed at 150 °C for 10 min to remove complex by-products including O2 and H2O . After degassing, the solution was reheated to 350 °C under N2 atmosphere. The S precursor containing 16 mg (0.5 mmol) S dissolved in 1.5 ml TOP was quickly injected into the flask with a syringe. Therefore, the reaction mixture was quenched to 330°C at which CdS growth was performed. After 15 min, CdS nanorod growth was terminated by cooling to 250°C, at which point CdSe growth on Cds nanorods was performed. Aliquots of CdS nanorods were taken and cleaned by precipitation with methanol and butanol for characterization. The CdS/CdSe heterostructure was formed by slowly adding the Se precursor to the same reaction flask maintained under N2 atmosphere as described below.

CdS/CdSe 奈米棒異質結構之合成 以與已確立方法類似之方式進行棒-棒-棒形奈米棒異質結構之一鍋合成。在形成CdS奈米棒之後,含有溶解於1.0 ml TOP中之20 mg(0.25 mmol)Se之Se前驅體在250℃下經由注射泵以4 ml h-1 之速率緩慢注射(總注射時間約15 min)。接著使反應混合物在250℃下再攪拌5 min,隨後藉由噴氣快速冷卻。獲取CdS/CdSe奈米棒異質結構之等分試樣且藉由用甲醇及丁醇沈澱而清潔以用於分析。將最終反應混合物溶解於氯仿中,且以2,000 RPM離心。沈澱物再溶解於氯仿中以用於下一步驟。當以10之因數稀釋時,CdS/CdSe奈米棒異質結構之此溶液在CdS頻帶邊緣吸收峰處具有0.75之光學密度(在具有1 cm光學路徑長度之比色管中)。Synthesis of CdS/CdSe nanorod heterostructures : One-pot synthesis of rod-rod-rod-shaped nanorod heterostructures was performed in a similar manner to established methods. After the formation of CdS nanorods, the Se precursor containing 20 mg (0.25 mmol) Se dissolved in 1.0 ml TOP was slowly injected at a rate of 4 ml h at 250 °C via a syringe pump (total injection time about 15 min). The reaction mixture was then allowed to stir for a further 5 min at 250° C., followed by rapid cooling by gas sparging. Aliquots of the CdS/CdSe nanorod heterostructures were taken and cleaned for analysis by precipitation with methanol and butanol. The final reaction mixture was dissolved in chloroform and centrifuged at 2,000 RPM. The precipitate was redissolved in chloroform for use in the next step. When diluted by a factor of 10, this solution of CdS/CdSe nanorod heterostructures has an optical density of 0.75 (in a cuvette with an optical path length of 1 cm) at the CdS band-edge absorption peak.

CdS/CdSe/ZnSe DHNR 之合成 CdS/CdSe/ZnSe DHNR係藉由將ZnSe生長至CdS/CdSe奈米棒異質結構上而合成。對於Zn前驅體,將6 ml十八烯、2 ml油酸及0.18 g(1.0 mmol)乙酸鋅在150℃下脫氣30 min。鞀混合物在N2 氣氛下加熱至250℃,且因此在1 h之後形成油酸鋅。將2 ml先前製備之CdS/CdSe儲備溶液在冷卻至50℃後注射至油酸鋅溶液中。使氯仿在70℃下於真空中蒸發30 min。ZnSe生長藉由將含有溶解於2.0 ml TOP中之39 mg(0.50 mmol)Se之Se前驅體在250℃下緩慢注射至反應混合物中而起始。ZnSe在CdS/CdSe奈米棒異質結構上之厚度由注入的Se之量控制。ZnSe生長在注入所要量的Se前驅體之後移除加熱套而終止。在用氯仿及甲醇混合物(1:1體積比)洗滌兩次之後,CdS/CdSe/ZnSe DHNR最後以(約30 mg ml-1 )分散於甲苯中。 Synthesis of CdS/CdSe/ZnSe DHNR : CdS/CdSe/ZnSe DHNR was synthesized by growing ZnSe onto CdS/CdSe nanorod heterostructure. For the Zn precursor, 6 ml of octadecene, 2 ml of oleic acid, and 0.18 g (1.0 mmol) of zinc acetate were degassed at 150 °C for 30 min. The zinc mixture was heated to 250 °C under N2 atmosphere, and thus zinc oleate was formed after 1 h. 2 ml of the previously prepared CdS/CdSe stock solution was injected into the zinc oleate solution after cooling to 50 °C. Chloroform was evaporated in vacuo at 70 °C for 30 min. ZnSe growth was initiated by slowly injecting a Se precursor containing 39 mg (0.50 mmol) Se dissolved in 2.0 ml TOP into the reaction mixture at 250 °C. The thickness of ZnSe on the CdS/CdSe nanorod heterostructure is controlled by the amount of Se implanted. ZnSe growth was terminated by removing the heating mantle after injecting the desired amount of Se precursor. After washing twice with a mixture of chloroform and methanol (1:1 volume ratio), CdS/CdSe/ZnSe DHNR was finally dispersed in toluene (about 30 mg ml −1 ).

ZnO 合成 將ZnO用作電子輸送層(ETL)。根據公開之文獻程序合成ZnO。簡要地,將氫氧化鉀(1.48 g)於甲醇(65 ml)中之溶液添加至含乙酸鋅二水合物(2.95 g)之甲醇(125 ml)溶液中,且反應混合物在60℃下攪拌2小時。混合物接著冷卻至室溫且用甲醇洗滌沈澱物兩次。將沈澱物懸浮於1-丁醇中以形成最終ZnO溶液。ZnO藉由動態旋塗沈積至層中,藉此將20 μL溶液分配至旋轉基板上。調整旋轉速度(大致為2000 RPM)以達成大致30 nm之膜厚度。使用泡沫拭子,用丁醇移除覆蓋電極之段之沈積膜的一些部分。裝置接著在惰性氣氛中在熱板上於120℃下退火10分鐘。 ZnO synthesis : ZnO was used as the electron transport layer (ETL). ZnO was synthesized according to published literature procedures. Briefly, a solution of potassium hydroxide (1.48 g) in methanol (65 ml) was added to a solution of zinc acetate dihydrate (2.95 g) in methanol (125 ml), and the reaction mixture was stirred at 60°C for 2 Hour. The mixture was then cooled to room temperature and the precipitate was washed twice with methanol. The precipitate was suspended in 1-butanol to form the final ZnO solution. ZnO was deposited into the layer by dynamic spin coating, whereby 20 μL of the solution was dispensed onto the rotating substrate. Adjust the spin speed (approximately 2000 RPM) to achieve a film thickness of approximately 30 nm. Using a foam swab, some portions of the deposited film covering the section of the electrode were removed with butanol. The device was then annealed at 120° C. for 10 minutes on a hot plate in an inert atmosphere.

鋁之100 nm層藉由經由陰極蔭罩自石墨坩堝在高真空下之熱蒸發而沈積。A 100 nm layer of aluminum was deposited by thermal evaporation from a graphite crucible under high vacuum through a cathode shadow mask.

如下測試QLED裝置。使用來自Ossila Inc.之訂製測試板在N2 手套箱內部的未囊封裝置上收集電流-電壓-照明光(JVL)資料。所述板含有呈組合形式的兩個組件:1)X100 Xtralien™精密測試源,及2)智能PV及OLED板;此等組件用以在量測電流及光輸出時以0.1 V之增量在−2 V至7 V之電壓範圍上測試QLED裝置。使用注視反應光電二極體來量測光輸出,所述光電二極體包括模仿適光眼敏感性之濾光器(Centronic E系列)。將裝置置於板上之測試腔室內部且覆蓋有光電二極體總成。藉由智能板總成內部之一系列彈簧致動金探針進行至ITO電極之電接觸。光電二極體位於ITO基板上方3 mm的距離處。自JVL資料判定重要裝置參數,包含達到1000 cd/m2 亮度所需之電壓、1000 cd/m2 下之QLED之電流效率(以cd/A計),及在QLED中達到10 mA/cm2 電流所需之驅動電壓。幾何因數應用於量測之光電二極體電流以考量光電二極體與基板之間的距離(3 mm)及與基板上之各像素之相對定位。結果及分析 The QLED devices were tested as follows. Current-voltage-illumination light (JVL) data was collected on unencapsulated devices inside a N2 glove box using custom test panels from Ossila Inc. The board consists of two components in combination: 1) the X100 Xtralien™ precision test source, and 2) the smart PV and OLED board; these components are used to measure current and light output in 0.1 V increments QLED devices were tested over a voltage range of −2 V to 7 V. Light output was measured using a gaze-responsive photodiode including a filter that mimics the sensitivity of a photopic eye (Centronic E series). The device was placed inside the test chamber on the board and covered with the photodiode assembly. Electrical contact to the ITO electrodes is made by a series of spring-actuated gold probes inside the smart board assembly. The photodiode is located at a distance of 3 mm above the ITO substrate. Determining important device parameters from JVL data, including voltage required to achieve luminance of 1000 cd/m 2 , current efficiency (in cd/A) of QLEDs at 1000 cd/m 2 , and 10 mA/cm 2 in QLEDs The driving voltage required for the current. Geometry factors are applied to the measured photodiode current to take into account the distance between the photodiode and the substrate (3 mm) and the relative positioning of each pixel on the substrate. Results and Analysis

以下列出之HTL聚合物製造為實例量子點發光二極體。實例二極體在包含由CdSe/ZnS、InP/ZnS及DHNR構成之量子點的所有測試中之表現為可接受的。展示實例裝置在介於520 nm至600 nm及至620 nm範圍內的量子點發射之情況下之表現為可接受的,如下表中所列。展示實例裝置在球形及棒狀量子點之情況下之表現為可接受的。如與參考實例相比,HTL化合物導致改良之QLED裝置效率及駕駛電壓。 在於520 nm下發射之球形CdSe/ZnS量子點之情況下之QLED裝置效能 在於620 nm下發射之球形InP/ZnS量子點之情況下之QLED裝置效能 在於600 nm下發射之DHNR之情況下之QLED裝置效能 The HTL polymers listed below were fabricated as example quantum dot light emitting diodes. The example diodes performed acceptable in all tests involving quantum dots composed of CdSe/ZnS, InP/ZnS, and DHNR. The example devices were shown to perform acceptable with quantum dot emission ranging from 520 nm to 600 nm and to 620 nm, as listed in the table below. The example devices are shown to perform acceptable with spherical and rod-shaped quantum dots. The HTL compounds lead to improved QLED device efficiency and driving voltage as compared to the reference example. QLED device performance with spherical CdSe/ZnS quantum dots emitting at 520 nm QLED device performance with spherical InP/ZnS quantum dots emitting at 620 nm QLED device performance with DHNR emitting at 600 nm

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Claims (11)

一種量子點發光裝置,其包括:i)一由選自由第II-VI族化合物、第II-V族化合物、第III-VI族化合物、第III-V族化合物、第IV-VI族化合物、第I-III-VI族化合物、第II-IV-VI族化合物、第II-IV-V族化合物或其任何組合組成之群組之半導體材料製成的至少一個半導體奈米粒子之發光層;及ii)一用於電洞注入或電洞輸送層之聚合物,其中所述聚合物包括具有一包括以下各者之第一單體結構的至少一或多個單體以作為聚合單元:a)一可聚合基團,b)一具有式NAr1Ar2Ar3之電活性基團,其中Ar1、Ar2及Ar3獨立地為C6至C50芳香族取代基,及(c)一連接子基團,其連接所述可聚合基團與所述電活性基團,其中,所述可聚合基團係選自一乙烯基、苯并環丁烯、丙烯酸酯或甲基丙烯酸脂基團、三氟乙烯醚、肉桂酸酯或查耳酮、二烯、乙氧基乙炔及3-乙氧基-4-甲基環丁-2-烯酮。 A quantum dot light-emitting device, which includes: i) a compound selected from group II-VI compounds, group II-V compounds, group III-VI compounds, group III-V compounds, group IV-VI compounds, A light-emitting layer of at least one semiconductor nanoparticle made of a group of semiconductor materials consisting of group I-III-VI compounds, group II-IV-VI compounds, group II-IV-V compounds, or any combination thereof; and ii) a polymer for a hole injection or hole transport layer, wherein said polymer comprises as polymerized units at least one or more monomers having a first monomer structure comprising: a ) a polymerizable group, b) an electroactive group having the formula NAr 1 Ar 2 Ar 3 , wherein Ar 1 , Ar 2 and Ar 3 are independently C 6 to C 50 aromatic substituents, and (c) A linker group, which connects the polymerizable group and the electroactive group, wherein the polymerizable group is selected from a vinyl group, benzocyclobutene, acrylate or methacrylate group, trifluoroethylene ether, cinnamate or chalcone, diene, ethoxyacetylene and 3-ethoxy-4-methylcyclobut-2-enone. 如申請專利範圍第1項所述的量子點發光裝置,其中所述聚合物具有至少5,000且不大於10,000,000之分子量。 The quantum dot light-emitting device as described in claim 1, wherein the polymer has a molecular weight of at least 5,000 and not greater than 10,000,000. 如申請專利範圍第1項所述的量子點發光裝置,其中所述可聚合基團係一乙烯基。 The quantum dot light-emitting device as described in claim 1 of the patent application, wherein the polymerizable group is a vinyl group. 如申請專利範圍第1項所述的量子點發光裝置,其中具有式NAr1Ar2Ar3之所述電活性基團含有以下各者:
Figure 106136322-A0305-02-0044-1
Figure 106136322-A0305-02-0045-2
Figure 106136322-A0305-02-0046-3
Figure 106136322-A0305-02-0047-4
Figure 106136322-A0305-02-0048-5
Figure 106136322-A0305-02-0049-6
The quantum dot light-emitting device as described in item 1 of the scope of the patent application, wherein the electroactive group having the formula NAr 1 Ar 2 Ar 3 contains the following:
Figure 106136322-A0305-02-0044-1
Figure 106136322-A0305-02-0045-2
Figure 106136322-A0305-02-0046-3
Figure 106136322-A0305-02-0047-4
Figure 106136322-A0305-02-0048-5
Figure 106136322-A0305-02-0049-6
如申請專利範圍第1項所述的量子點發光裝置,其中所述聚合物進一步包括一選自以下各者之第二單體:
Figure 106136322-A0305-02-0049-11
Figure 106136322-A0305-02-0050-10
The quantum dot light-emitting device as described in claim 1 of the patent application, wherein the polymer further includes a second monomer selected from the following:
Figure 106136322-A0305-02-0049-11
Figure 106136322-A0305-02-0050-10
如申請專利範圍第1項所述的量子點發光裝置,其中所述連接 子基團係選自由以下各者組成之群組:一共價鍵;-O-;-伸烷基-;-伸芳基-;-伸烷基-伸芳基-;-伸芳基-伸烷基-;-O-伸烷基-;-O-伸芳基-;-O-伸烷基-伸芳基-;-O-伸烷基-O-;-O-伸烷基-O-伸烷基-O-;-O-伸芳基-O-;-O-伸烷基-伸芳基-O-;-O-(CH2CH2-O)n-,其中n為一自2至20之整數;-O-伸烷基-O-伸烷基-;-O-伸烷基-O-伸芳基-;-O-伸芳基-O-;-O-伸芳基-O-伸烷基-;及-O-伸芳基-O-伸芳基。 The quantum dot light-emitting device as described in item 1 of the scope of the patent application, wherein the linker group is selected from the group consisting of: a covalent bond; -O-; -alkylene-; -extension Base-;-Alkylene-arylylene-;-Arylylene-Alkylene-; ;-O-Alkylene-O-;-O-Alkylene-O-Alkylene-O-; ; -O-(CH 2 CH 2 -O) n -, wherein n is an integer from 2 to 20; -O-alkylene-O-alkylene-; -O-alkylene-O-alkylene Aryl-; -O-arylylene-O-; -O-arylylene-O-alkylene-; and -O-arylylene-O-arylylene. 如申請專利範圍第1項所述的量子點發光裝置,其中所述聚合物進一步包括一p型摻雜劑。 The quantum dot light-emitting device as described in claim 1, wherein the polymer further includes a p-type dopant. 如申請專利範圍第1項所述的量子點發光裝置,其中所述半導體奈米粒子摻雜有稀土元素、過渡金屬元素或其任何組合。 The quantum dot light-emitting device as described in item 1 of the scope of the patent application, wherein the semiconductor nanoparticles are doped with rare earth elements, transition metal elements or any combination thereof. 如申請專利範圍第1項所述的量子點發光裝置,其中所述半導體奈米粒子具有一核殼結構,藉以將一額外材料塗佈於所述半導體奈米粒子之一內部部分之外側上,且所述額外材料係選自由以下各者組成之群組:第IV族化合物、第II-VI族化合物、第II-V族化合物、第III-VI族化合物、第III-V族化合物、第IV-VI族化合物、第I-III-VI族化合物、第II-IV-VI族化合物、第II-IV-V族化合物或其任何組合。 The quantum dot light-emitting device as described in claim 1, wherein the semiconductor nanoparticles have a core-shell structure, so that an additional material is coated on the outside of an inner part of the semiconductor nanoparticles, And the additional material is selected from the group consisting of Group IV compounds, Group II-VI compounds, Group II-V compounds, Group III-VI compounds, Group III-V compounds, Group Group IV-VI compounds, Group I-III-VI compounds, Group II-IV-VI compounds, Group II-IV-V compounds, or any combination thereof. 如申請專利範圍第1項所述的量子點發光裝置,其中所述半導體奈米粒子具有至少一個維度──長100奈米或更小。 The quantum dot light-emitting device as described in item 1 of the patent claims, wherein the semiconductor nanoparticles have at least one dimension—100 nanometers or less in length. 如申請專利範圍第1項所述的量子點發光裝置,其中所述半導體奈米粒子包括一一維奈米粒子,所述一維奈米粒子已安置於接觸所述一維奈米粒子之一單一端蓋或複數個端蓋的任一或每一端處。The quantum dot light-emitting device as described in item 1 of the scope of patent application, wherein the semiconductor nanoparticles include a one-dimensional nanoparticle, and the one-dimensional nanoparticle has been placed in contact with one of the one-dimensional nanoparticle At either or each end of a single end cap or a plurality of end caps.
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201127782A (en) * 2010-02-03 2011-08-16 Nat Univ Tsing Hua Triphenylene based aromatic compounds and OLEDs utilizing the same
US20130092887A1 (en) * 2011-10-04 2013-04-18 Plextronics, Inc. Doping methods for hole injection and transport layers
US20140326982A1 (en) * 2011-12-12 2014-11-06 Nippon Steel & Sumikin Chemical Co., Ltd. Curable composition, cured product, and organic electroluminescence element using same

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