TWI801734B - Solder alloys, solder powders, solder pastes, solder balls and solder preforms - Google Patents

Solder alloys, solder powders, solder pastes, solder balls and solder preforms Download PDF

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TWI801734B
TWI801734B TW109117061A TW109117061A TWI801734B TW I801734 B TWI801734 B TW I801734B TW 109117061 A TW109117061 A TW 109117061A TW 109117061 A TW109117061 A TW 109117061A TW I801734 B TWI801734 B TW I801734B
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solder
alloy
solder alloy
acid
powder
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TW202043495A (en
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川崎浩由
宗形修
白鳥正人
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日商千住金屬工業股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24Selection of soldering or welding materials proper
    • B23K35/26Selection of soldering or welding materials proper with the principal constituent melting at less than 400 degrees C
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C13/00Alloys based on tin

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)

Abstract

本發明提供一種可抑制焊料浴槽的Fe侵蝕、提高焊料接頭的機械強度、不產生電路短路之焊料合金、使用該焊料合金之焊料粉末、焊膏、焊球、焊料預形體及焊料接頭。焊料合金係以質量%計具有Cu:0.55~0.75%、Ni:0.0350~0.0600%、Ge:0.0035~0.0200%、Fe:0.0020~ 0.0100%、及其餘部分為Sn之合金組成。The present invention provides a solder alloy capable of suppressing Fe corrosion in a solder bath, improving the mechanical strength of a solder joint, and preventing short circuits, solder powder, solder paste, solder ball, solder preform, and solder joint using the solder alloy. The solder alloy system has an alloy composition of Cu: 0.55-0.75%, Ni: 0.0350-0.0600%, Ge: 0.0035-0.0200%, Fe: 0.0020-0.0100%, and the rest is Sn in mass %.

Description

焊料合金、焊料粉末、焊膏、焊球及焊料預形體Solder alloys, solder powders, solder pastes, solder balls and solder preforms

本發明係關於一種可抑制Fe侵蝕的焊料合金、焊料粉末、焊膏、焊球及焊料預形體。 The present invention relates to a solder alloy, solder powder, solder paste, solder ball and solder preform capable of suppressing Fe corrosion.

在各種電子機器類中,已使用有於印刷基板搭載電子零件而成之安裝基板。於安裝基板中,除了單層基板者,亦可使用為了實現充足之機能而層合複數基板者。基板間的導通或電子零件對基板之安裝中,可列舉藉由表面安裝進行連接之方法或將端子插入至基板的通孔而安裝之方法。作為此般之對印刷基板之安裝步驟,可列舉流動焊接(flow soldering)、回流焊接(reflow soldering)、手工焊接(manual soldering)等。 Mounting boards in which electronic components are mounted on printed boards are used in various electronic devices. As the mounting substrate, in addition to a single-layer substrate, a plurality of substrates laminated in order to realize sufficient functions may be used. Conduction between substrates and mounting of electronic components on substrates include a method of connecting by surface mounting or a method of mounting by inserting terminals into through holes of the substrate. As such a mounting process to a printed circuit board, flow soldering, reflow soldering, manual soldering, etc. are mentioned.

於此等之中,在安裝具有一定程度之大小的電子零件時,就連接強度等之觀點來看,係採用將端子插入至通孔而安裝之方法。作為安裝步驟通常是採用流動焊接。流動焊接係藉由將焊料浴槽之噴流面對準印刷基板之連接面側而進行焊接之方法。 Among them, when mounting an electronic component having a certain size, a method of mounting a terminal by inserting it into a through hole is used from the viewpoint of connection strength or the like. Flow soldering is usually used as the mounting step. Flow soldering is a method of soldering by aligning the spray surface of the solder bath with the connection surface side of the printed circuit board.

在流動焊接中,焊料浴槽是必需的。由於焊料浴槽內長時間流動有高溫的熔融焊料,故就耐蝕性的觀 點,於焊料浴槽使用主成分為Fe的不鏽鋼等。然而,因長時間的使用,而有焊料浴槽的內面藉由Fe侵蝕而被侵蝕。此般Fe侵蝕產生的原因,認為係因為焊料合金中的Sn與Fe藉由相互擴散而合金化,且此為易溶解於熔融焊料中的Sn。由於重新檢討焊料浴槽的材質要耗費龐大的費用與時間,故檢討可抑制Fe侵蝕產生之焊料合金。 In flow soldering, a solder bath is required. Since there is high temperature molten solder flowing in the solder bath for a long time, the corrosion resistance For the solder bath, use stainless steel whose main component is Fe. However, due to long-term use, the inner surface of the solder bath is corroded by Fe corrosion. The reason for such Fe corrosion is considered to be that Sn and Fe in the solder alloy are alloyed by interdiffusion, and this is Sn that is easily dissolved in molten solder. Since re-examination of the material of the solder bath is costly and time-consuming, it is necessary to review the solder alloy that can suppress the corrosion of Fe.

專利文獻1揭示了為了抑制Fe侵蝕而含有既定量之Fe與Ge的焊料合金。 Patent Document 1 discloses a solder alloy containing predetermined amounts of Fe and Ge in order to suppress Fe corrosion.

[先前技術文獻] [Prior Art Literature] [專利文獻] [Patent Document]

[專利文獻1]日本特開2008-168322號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2008-168322

專利文獻1中記載之發明並未限於延長焊料浴槽的壽命,也將以下作為目的:抑制施加於烙鐵之烙鐵頭的Fe鍍敷之Fe侵蝕等、亦抑制於Fe侵蝕易產生之嚴酷環境下的Fe侵蝕。如此般,於同文獻記載之發明中,由於僅著眼於抑制在任何環境下的Fe侵蝕,故揭示了Fe含量多且亦含有Ge的焊料合金。 The invention described in Patent Document 1 is not limited to prolonging the life of the solder bath, but also aims at suppressing Fe corrosion of Fe plating applied to the soldering iron tip of a soldering iron, etc., and suppressing it under severe environments where Fe corrosion is likely to occur. Fe attack. In this way, in the invention described in the same document, since the focus is only on suppressing the corrosion of Fe in any environment, a solder alloy containing a large amount of Fe and also containing Ge has been disclosed.

然而,在以Sn為主成分之焊料合金中含有大量Fe的情況下,源自SnFe化合物之針狀結晶析出,而有電路短路之可能。又,專利文獻1中記載的焊料合金係為了 使濕潤性提升而可含有大量的Ni。當Ni含量多,則在焊料合金的接合界面附近會析出SnCuNi化合物,有焊料接頭的機械強度降低之疑慮。 However, when a large amount of Fe is contained in a solder alloy mainly composed of Sn, needle-like crystals derived from the SnFe compound are precipitated, and there is a possibility of a short circuit. Also, the solder alloy described in Patent Document 1 is for A large amount of Ni may be contained to improve wettability. When the Ni content is high, the SnCuNi compound is precipitated near the joint interface of the solder alloy, which may lower the mechanical strength of the solder joint.

如此般,過往之焊料合金係僅著眼於Fe侵蝕來進行合金設計,於過往之焊料合金中亦必須確保自最初所要求之作為焊料接頭的機械強度。故,除了Fe侵蝕,必須以能確保作為焊料合金最重要之焊料接頭的機械強度的方式來進行合金設計。 In this way, the conventional solder alloys were designed focusing only on the corrosion of Fe, and the mechanical strength required from the beginning as a solder joint had to be ensured even in the conventional solder alloys. Therefore, in addition to Fe corrosion, it is necessary to design the alloy in such a way that the mechanical strength of the solder joint which is the most important part of the solder alloy can be ensured.

本發明之課題在於提供一種可抑制焊料浴槽的Fe侵蝕、提高焊料接頭的機械強度、不產生電路短路之焊料合金、使用該焊料合金之焊料粉末、焊膏、焊球及焊料預形體。 The object of the present invention is to provide a solder alloy that can suppress Fe corrosion in a solder bath, improve the mechanical strength of a solder joint, and prevent short circuits, and solder powder, solder paste, solder balls, and solder preforms using the solder alloy.

本發明者們著眼於焊料浴槽的Fe侵蝕並且抑制針狀結晶之結晶析出,故對於在Fe含量少的焊料合金中亦同時含有Ge之合金組成進行了詳細地檢討。並且,本發明者們為了使焊料接頭的機械強度改善,著眼於在焊料合金的接合界面附近不析出SnCuNi化合物,進而亦對抑制Ni含量之合金組成進行了檢討。此外,本發明者們為了提升焊料接頭的機械強度,亦著眼於使Cu3Sn或Cu6Sn5等之金屬間化合物不成長於電極與焊料合金之接合界面。因此,對於Fe含量及Ni含量少,且含有既定量之Cu的合金組成進行了詳細的檢討。 The inventors of the present invention focused on Fe corrosion in the solder bath and suppressed the precipitation of needle crystals, and therefore examined in detail the composition of an alloy containing Ge in a solder alloy with a low Fe content. Furthermore, in order to improve the mechanical strength of the solder joint, the present inventors focused on not precipitating the SnCuNi compound in the vicinity of the joint interface of the solder alloy, and further examined an alloy composition for suppressing the Ni content. In addition, in order to improve the mechanical strength of the solder joint, the present inventors also focused on preventing intermetallic compounds such as Cu 3 Sn or Cu 6 Sn 5 from growing on the joint interface between the electrode and the solder alloy. Therefore, detailed examination was performed on an alloy composition containing a predetermined amount of Cu with a low Fe content and a Ni content.

其結果,偶然地得到下述見解:以Fe含量較過往之焊料合金少的範圍可充分地抑制焊料浴槽的Fe侵蝕。又得到下述見解:因為Fe含量少而亦可抑制針狀結晶的析出。另,得到下述見解:由於Ni含量少,在焊料合金的接合界面附近可抑制SnCuNi化合物的析出。除此之外,亦得到下述見解:若Fe含量或Ni含量過少,Cu3Sn或Cu6Sn5等之金屬間化合物成長,因此必須含有一定程度量的該等元素。 As a result, it was found by accident that the Fe corrosion of the solder bath can be sufficiently suppressed in a range where the Fe content is less than that of conventional solder alloys. It was also found that the precipitation of needle crystals can be suppressed because the Fe content is small. In addition, it was found that the precipitation of the SnCuNi compound can be suppressed in the vicinity of the joint interface of the solder alloy due to the low Ni content. In addition, it is also found that if the content of Fe or Ni is too small, intermetallic compounds such as Cu 3 Sn or Cu 6 Sn 5 grow, so a certain amount of these elements must be contained.

又,作為較佳之態樣,得到下述見解:Ni與Fe、Cu與Ni、Cu與Fe、及Ge與Fe之至少1組滿足各自所定的關係之情況下,可更充分地發揮上述效果。作為其他較佳之態樣,得到下述見解:進而含有As之焊料合金,係藉由As在焊料合金的表面濃化而可發揮焊膏之增黏抑制效果且抑制黃變,進而亦可維持焊料合金的濕潤性。 Also, as a preferable aspect, it has been found that when at least one set of Ni and Fe, Cu and Ni, Cu and Fe, and Ge and Fe satisfies the respective predetermined relationships, the above-mentioned effects can be exhibited more sufficiently. As another preferred aspect, the following insights were obtained: Furthermore, the solder alloy containing As can exert the thickening suppression effect of the solder paste and suppress yellowing of the solder paste by concentrating As on the surface of the solder alloy, and can also maintain the solder. alloy wettability.

基於該等見解所得之本發明係如以下。 The present invention based on these findings is as follows.

(1)一種焊料合金,其特徵為:以質量%計具有Cu:0.55~0.75%、Ni:0.0350~0.0600%、Ge:0.0035~0.0200%、Fe:0.0020~0.0100%、及其餘部分為Sn之合金組成。 (1) A solder alloy characterized by: Cu: 0.55-0.75%, Ni: 0.0350-0.0600%, Ge: 0.0035-0.0200%, Fe: 0.0020-0.0100%, and the rest being Sn in mass%. alloy composition.

(2)如上述(1)記載之焊料合金,其中,合金組成進而以質量%計含有Ag:0~4.0%。 (2) The solder alloy as described in said (1) whose alloy composition further contains Ag: 0-4.0% by mass %.

(3)如上述(1)或上述(2)記載之焊料合金,其中,合金組成進而滿足下述(1)~(5)式。 (3) The solder alloy according to the above (1) or the above (2), wherein the alloy composition further satisfies the following formulas (1) to (5).

0.0430%≦Ni+Fe≦0.0700% (1) 0.0430%≦Ni+Fe≦0.0700% (1)

3.50≦Ni/Fe≦30.00 (2) 3.50≦Ni/Fe≦30.00 (2)

10.83≦Cu/Ni≦18.57 (3) 10.83≦Cu/Ni≦18.57 (3)

65.00≦Cu/Fe≦325.00 (4) 65.00≦Cu/Fe≦325.00 (4)

0.0060%≦Ge+Fe≦0.0280% (5) 0.0060%≦Ge+Fe≦0.0280% (5)

上述(1)~(5)式中,Ni、Fe、Cu及Ge表示各自合金組成之含量(質量%)。 In the formulas (1) to (5) above, Ni, Fe, Cu, and Ge represent the contents (% by mass) of the respective alloy compositions.

(4)如上述(1)至上述(3)中任一項記載之焊料合金,其中,合金組成進而以質量%計含有As:0.0040~0.0250%。 (4) The solder alloy according to any one of the above (1) to the above (3), wherein the alloy composition further contains As in mass %: 0.0040 to 0.0250%.

(5)一種焊膏,其具有由如上述(1)至上述(4)中任一項記載之焊料合金所成之焊料粉末與助焊劑。 (5) A solder paste comprising solder powder and flux consisting of the solder alloy according to any one of the above (1) to the above (4).

(6)一種焊球,其係由如上述(1)至上述(4)中任一項記載之焊料合金所成。 (6) A solder ball made of the solder alloy described in any one of the above (1) to the above (4).

(7)一種焊料預形體,其係由如上述(1)至上述(4)中任一項記載之焊料合金所成。 (7) A solder preform made of the solder alloy described in any one of the above (1) to the above (4).

[圖1]為焊球表面之XPS分析之圖表。 [Fig. 1] is a graph of XPS analysis of the solder ball surface.

[圖2]為焊球表面之XPS分析之圖表。 [Fig. 2] is a graph of XPS analysis of the solder ball surface.

[圖3]為焊球表面之XPS分析之圖表。 [Fig. 3] is a graph of XPS analysis of the solder ball surface.

藉由以下詳細地說明本發明。本說明書中, 關於焊料合金組成之「%」,只要沒有特別指定,則為「質量%」。 The present invention is explained in detail by the following. In this manual, The "%" of the solder alloy composition is "mass%" unless otherwise specified.

1.合金組成 1. Alloy composition (1)Cu:0.55~0.75% (1) Cu: 0.55~0.75%

Cu係,於一般之焊料合金所使用,且使焊料接頭之接合強度提升之元素。並且,Cu相對於Sn而言為貴的元素,且藉由與As共存而促進As之增黏抑制效果。Cu未達0.55%時,無法提升焊料接頭的強度。Cu含量之下限為0.55%以上,較佳為超過0.55%,更佳為0.60%以上。另一方面,若Cu含量超過0.75%,則焊料合金的熔點上升,會給予電子零件熱損傷。Cu含量之上限為0.75%以下,較佳為未達0.75%,更佳為0.70%以下。 Cu is an element that is used in general solder alloys and improves the bonding strength of solder joints. In addition, Cu is an element more expensive than Sn, and by coexisting with As, Cu promotes the thickening suppression effect of As. When Cu is less than 0.55%, the strength of the solder joint cannot be improved. The lower limit of the Cu content is more than 0.55%, preferably more than 0.55%, more preferably more than 0.60%. On the other hand, if the Cu content exceeds 0.75%, the melting point of the solder alloy will rise, causing thermal damage to electronic components. The upper limit of the Cu content is 0.75% or less, preferably less than 0.75%, more preferably 0.70% or less.

(2)Ni:0.0350~0.0600% (2) Ni: 0.0350~0.0600%

Ni係,抑制Cu3Sn或Cu6Sn5等之金屬間化合物在接合界面成長之元素。Ni含量未達0.0350%時,該等金屬間化合物成長而焊料接頭的機械強度劣化。Ni含量之下限為0.0350%以上,較佳為超過0.0350%,更佳為0.0400%以上。另一方面,若Ni含量超過0.0600%,則在焊料合金中之接合界面附近,SnCuNi化合物大量地析出,而焊料接頭的機械強度劣化。Ni含量之上限為0.0600%以下,較佳為未達0.0600%,更佳為0.0550%以下。 Ni-based, an element that inhibits the growth of intermetallic compounds such as Cu 3 Sn or Cu 6 Sn 5 at the joint interface. When the Ni content is less than 0.0350%, these intermetallic compounds grow and the mechanical strength of the solder joint deteriorates. The lower limit of the Ni content is 0.0350% or more, preferably more than 0.0350%, more preferably 0.0400% or more. On the other hand, if the Ni content exceeds 0.0600%, a large amount of SnCuNi compound is precipitated near the joint interface in the solder alloy, and the mechanical strength of the solder joint deteriorates. The upper limit of the Ni content is 0.0600% or less, preferably less than 0.0600%, more preferably 0.0550% or less.

(3)Ge:0.0035~0.0200% (3) Ge: 0.0035~0.0200%

Ge係,抑制焊料合金的氧化而防止焊料合金的變色或濕潤性之劣化,並且抑制源自Fe之渣滓(dross)產生的元素。Ge含量未達0.0035%時,產生焊料合金的變色或濕潤性之劣化。Ge含量之下限為0.0035%以上,較佳為0.0040%以上,更佳為0.0080%以上。另一方面,若Ge含量超過0.0200%,則由於在焊料合金的表面大量的氧化物析出而濕潤性惡化,伴隨於此,焊料接頭的機械強度劣化。Ge含量之上限為0.0200%以下,較佳為未達0.0200%,更佳為0.0150%以下,特佳為0.0120%以下。 Ge is an element that suppresses oxidation of the solder alloy to prevent discoloration or deterioration of wettability of the solder alloy, and is an element that suppresses generation of dross derived from Fe. When the Ge content is less than 0.0035%, discoloration of the solder alloy or deterioration of wettability occurs. The lower limit of the Ge content is above 0.0035%, preferably above 0.0040%, more preferably above 0.0080%. On the other hand, when the Ge content exceeds 0.0200%, wettability deteriorates due to precipitation of a large amount of oxides on the surface of the solder alloy, and the mechanical strength of the solder joint deteriorates accordingly. The upper limit of the Ge content is 0.0200% or less, preferably less than 0.0200%, more preferably 0.0150% or less, most preferably 0.0120% or less.

(4)Fe:0.0020~0.0100% (4) Fe: 0.0020~0.0100%

Fe係,在鐵製或不鏽鋼製的焊料浴槽中熔融焊料合金時,抑制焊料浴槽內面的Fe侵蝕,並且與Ni相同地抑制Cu3Sn或Cu6Sn5等之金屬間化合物在接合界面成長之元素。又,在上述範圍內可抑制SnFe化合物所致之針狀結晶的析出,可防止電路短路。所謂本發明中之針狀結晶,係表示在焊料合金的剖面SEM照片中,於300μm×300μm的範圍進行觀察時,1個的SnFe化合物中,長徑與短徑之比的長寬比為2以上的結晶。 Fe-based, when the solder alloy is melted in a solder bath made of iron or stainless steel, it inhibits the corrosion of Fe on the inner surface of the solder bath, and inhibits the growth of intermetallic compounds such as Cu 3 Sn or Cu 6 Sn 5 at the joint interface similarly to Ni of elements. Also, within the above range, the precipitation of needle crystals due to the SnFe compound can be suppressed, and a circuit short circuit can be prevented. The so-called needle-shaped crystals in the present invention means that in a SnFe compound, the aspect ratio of the ratio of the major axis to the minor axis is 2 when observed in the range of 300 μm × 300 μm in the cross-sectional SEM photograph of the solder alloy. above crystallization.

若Fe含量未達0.0020%,則產生焊料浴槽的Fe侵蝕,且粗大之Cu6Sn5化合物析出。Fe含量之下限為0.0020%以上,較佳為0.0050%以上。另一方面,若Fe含量超過0.0100%,則針狀結晶析出而電路短路。Fe含量之上 限為0.0100%以下,較佳為未達0.0100%,更佳為0.0080%以下。 If the Fe content is less than 0.0020%, Fe corrosion of the solder bath occurs, and coarse Cu 6 Sn 5 compounds are precipitated. The lower limit of the Fe content is at least 0.0020%, preferably at least 0.0050%. On the other hand, if the Fe content exceeds 0.0100%, needle-shaped crystals will be precipitated and the circuit will be short-circuited. The upper limit of the Fe content is 0.0100% or less, preferably less than 0.0100%, more preferably 0.0080% or less.

(5)Ag:0~4.0% (5) Ag: 0~4.0%

Ag係,可在結晶界面形成Ag3Sn而使焊料合金之可靠性提升之任意元素。又,Ag相對於Sn而言為貴的元素,且藉由與As共存而促進As之增黏抑制效果。進而,若Ag含量在上述範圍內,由於可抑制熔點的上升,因此不需要將焊料浴槽內的設定溫度過度地提高,亦可抑制Fe侵蝕。Ag含量較佳為0~4%,更佳為0.5~3.5%,再更佳為1.0~3.0%,特佳為2.0~3.0%。 Ag is an arbitrary element that can form Ag 3 Sn at the crystal interface to improve the reliability of the solder alloy. In addition, Ag is an element more expensive than Sn, and the thickening suppression effect of As is promoted by coexisting with As. Furthermore, if the Ag content is within the above range, since the rise of the melting point can be suppressed, Fe corrosion can also be suppressed without excessively raising the preset temperature in the solder bath. The Ag content is preferably 0-4%, more preferably 0.5-3.5%, even more preferably 1.0-3.0%, particularly preferably 2.0-3.0%.

(6)(1)~(5)式之至少1式 (6) At least one of the formulas (1)~(5)

0.0430%≦Ni+Fe≦0.0700% (1) 0.0430%≦Ni+Fe≦0.0700% (1)

3.50≦Ni/Fe≦30.00 (2) 3.50≦Ni/Fe≦30.00 (2)

10.83≦Cu/Ni≦18.57 (3) 10.83≦Cu/Ni≦18.57 (3)

65.00≦Cu/Fe≦325.00 (4) 65.00≦Cu/Fe≦325.00 (4)

0.0060%≦Ge+Fe≦0.0280% (5) 0.0060%≦Ge+Fe≦0.0280% (5)

上述(1)~(5)式中,Ni、Fe、Cu及Ge表示各自合金組成之含量(質量%)。 In the formulas (1) to (5) above, Ni, Fe, Cu, and Ge represent the contents (% by mass) of the respective alloy compositions.

本發明之焊料合金係除了各構成元素的含量在上述範圍內,進而期望Ni、Fe、Cu及Ge的至少2種滿足各自上述(1)~(5)式之至少1式。焊料合金的各構成元素並非是獨自地進行作用,而是各構成元素之含量的全部在所 定範圍的情況下,能夠開始發揮各種的效果。本發明中,除了各構成元素的含量為上述範圍以外,進而藉由與Fe侵蝕的抑制、焊料接頭的機械強度提升及電路短路的抑制相關連之Fe及Ni、Fe或Ni與其他元素彼此滿足既定之關係,而可更充分地發揮本發明的效果。 In addition to the content of each constituent element in the solder alloy system of the present invention within the above-mentioned range, at least two kinds of Ni, Fe, Cu, and Ge preferably satisfy at least one of the above-mentioned formulas (1)-(5). Each constituent element of the solder alloy does not act independently, but all the contents of each constituent element In the case of a certain range, various effects can start to be exerted. In the present invention, in addition to the content of each constituent element being within the above range, Fe and Ni, Fe or Ni and other elements that are related to the suppression of Fe corrosion, the improvement of the mechanical strength of the solder joint, and the suppression of circuit short circuits satisfy each other. Given the relationship, the effects of the present invention can be brought into full play.

滿足(1)式及(2)式、(3)式、(4)式以及(5)式之至少1者較佳,更佳為同時滿足(1)~(5)式。 It is preferable to satisfy at least one of formula (1) and formula (2), formula (3), formula (4) and formula (5), and it is more preferable to satisfy formula (1)~(5) at the same time.

又,Ni與Fe係,(1)式較佳為0.0430%~0.0700%,更佳為0.045%~0.0600%;(2)式較佳為3.50~30.00,更佳為6.25~30.00。Cu與Ni係,(3)式較佳為10.83~18.57,更佳為11.0~15.0。Cu與Fe係,(4)式較佳為65.00~325.00,更佳為81.25~325.00。Ge與Fe係,(5)式較佳為0.0060%~0.0280%,更佳為0.0100%~0.0200%。 Also, Ni and Fe system, formula (1) is preferably 0.0430%~0.0700%, more preferably 0.045%~0.0600%; formula (2) is preferably 3.50~30.00, more preferably 6.25~30.00. Cu and Ni system, formula (3) is preferably 10.83~18.57, more preferably 11.0~15.0. Cu and Fe system, formula (4) is preferably 65.00~325.00, more preferably 81.25~325.00. Ge and Fe system, formula (5) is preferably 0.0060%~0.0280%, more preferably 0.0100%~0.0200%.

(7)As:0.0040~0.0250% (7) As: 0.0040~0.0250%

As係為了在焊料合金的表面形成As濃化層而抑制黃變之任意元素。並且,在焊膏中,若將本發明之焊料合金作為焊料粉末而添加,則發揮增黏抑制效果。As含量之下限係為了使含有As之效果充分地發揮,較佳為0.0040%以上,更佳為超過0.0040%。另一方面,於As為0.0250%以下可維持濕潤性。As含量之上限較佳為0.0250%以下,更佳為0.0200%以下,再更佳為0.0100%以下。 As is an optional element that suppresses yellowing in order to form an As-concentrated layer on the surface of the solder alloy. In addition, when the solder alloy of the present invention is added as solder powder to the solder paste, the thickening suppressing effect is exerted. The lower limit of the As content is to fully exhibit the effect of containing As, and it is preferably 0.0040% or more, more preferably more than 0.0040%. On the other hand, wettability can be maintained when As is 0.0250% or less. The upper limit of the As content is preferably at most 0.0250%, more preferably at most 0.0200%, even more preferably at most 0.0100%.

本發明中,所謂含有As時所形成之As濃化層係指,As濃度高於焊料材料中之平均As濃度(As的質量相 對於焊料合金的質量之比例)之區域,具體來說,可藉由後述之判定基準而確認存在。As濃化層較佳為存在於焊料合金的表面側之至少一部分,更佳為覆蓋表面全體。 In the present invention, the As concentration layer formed when the so-called As is contained means that the As concentration is higher than the average As concentration in the solder material (the mass phase of As). Specifically, the presence of the region of the mass ratio of the solder alloy can be confirmed by the criteria for determination described later. The As-concentrated layer preferably exists on at least a part of the surface side of the solder alloy, and more preferably covers the entire surface.

如本發明般,若在含有As之情況下形成As濃化層,可抑制黃變並且抑制焊膏黏度的經時變化的原因尚不清楚,但推測如下。認為黏度上升係因為由Sn或Sn氧化物與焊膏(助焊劑)中所含之活性劑等各種添加劑之間產生的反應而形成鹽、或焊料粉末凝集等所引起。推測若如本發明之焊料合金般在表面存在As濃化層,則成為As濃化層介存於焊料粉末與助焊劑之間,變成不易發生如上述之反應,因此同時展現上述效果。 The reason why yellowing can be suppressed and the temporal change in solder paste viscosity can be suppressed when an As-concentrated layer is formed when As is contained as in the present invention is not clear, but it is presumed as follows. The increase in viscosity is considered to be caused by the formation of salt due to the reaction between Sn or Sn oxide and various additives such as activators contained in the solder paste (flux), or agglomeration of solder powder. It is speculated that if an As-concentrated layer exists on the surface like the solder alloy of the present invention, the As-concentrated layer will be interposed between the solder powder and the flux, and the above-mentioned reaction will not easily occur, so the above-mentioned effects will be exhibited at the same time.

(7-1)As濃化層的判定基準 (7-1) Judgment criteria for As-concentrated layer

在5.0mm×5.0mm之大小的樣品(於焊料材料不為板狀時,為將焊料材料(焊料粉末、焊球等)無間隙地鋪滿至5.0mm×5.0mm之範圍而成者)中,選定任意之700μm×300μm之區域,進行併用離子濺鍍之XPS分析。於每1個樣品選定1個區域,對3個樣品各自進行1次,合計3次之分析。於全部3次的分析中均為S1≧S2之情況,判斷為形成有As濃化層。 In a sample with a size of 5.0mm×5.0mm (when the solder material is not in the form of a plate, the solder material (solder powder, solder ball, etc.) is spread to the range of 5.0mm×5.0mm without gaps) , select any area of 700 μm×300 μm, and perform XPS analysis with ion sputtering. One region is selected for each sample, and each of the three samples is analyzed once for a total of three times. In the case of S1≧S2 in all three analyzes, it was judged that an As-concentrated layer was formed.

此處,S1、S2及D1的定義係如下所述。 Here, the definitions of S1, S2, and D1 are as follows.

S1:於對上述樣品進行之XPS分析的圖表中,SiO2換算之深度為0~2×D1(nm)之區域中的As之檢測強度之積分值 S1: In the graph of the XPS analysis performed on the above sample, the integrated value of the detection intensity of As in the region where the depth converted to SiO 2 is 0~2×D1(nm)

S2:於XPS分析的圖表中,SiO2換算之深度為2×D1~4×D1(nm)之區域中的As之檢測強度之積分值 S2: In the XPS analysis chart, the integrated value of the detection intensity of As in the region where the depth converted to SiO 2 is 2×D1~4×D1 (nm)

D1:於XPS分析的圖表中,於較O原子之檢測強度成為最大之SiO2換算之深度(Do.max(nm))更深之部分中,O原子之檢測強度成為最大檢測強度(Do.max處之強度)的1/2強度的最初之SiO2換算之深度(nm)。 D1: In the graph of XPS analysis, the detection intensity of O atoms becomes the maximum detection intensity (Do.max) in the part deeper than the depth (Do.max (nm)) converted to SiO 2 at which the detection intensity of O atoms becomes the maximum The depth (nm) of the initial SiO 2 conversion of 1/2 the intensity at which the intensity is located.

上述As濃化層的判定基準之詳細的條件係遵照實施例的記載。如本發明之焊料合金般,藉由表面具有As濃化層,而可抑制焊料合金的黃變並且抑制焊膏的黏度上升。 The detailed conditions of the criteria for determining the above-mentioned As-concentrated layer follow the descriptions in the examples. Like the solder alloy of the present invention, by having an As-concentrated layer on the surface, yellowing of the solder alloy can be suppressed and an increase in the viscosity of the solder paste can be suppressed.

(7-2)As濃化層的厚度 (7-2) Thickness of As Concentrated Layer

As濃化層的厚度(SiO2換算)較佳為0.5~8.0nm,更佳為0.5~4.0nm,最佳為0.5~2.0nm。若As濃化層的厚度為上述範圍內,則可得到抑制黃變、濕潤性優異之焊料材料。 The thickness of the As concentrated layer (in terms of SiO 2 ) is preferably from 0.5 to 8.0 nm, more preferably from 0.5 to 4.0 nm, most preferably from 0.5 to 2.0 nm. When the thickness of the As concentration layer is within the above range, yellowing is suppressed and a solder material having excellent wettability can be obtained.

(7-3)黃色度 (7-3) Yellowness

本發明中,焊料合金之L*a*b*表色系中的黃色度b*較佳為0~10.0,更佳為3.0~5.7,最佳為3.0~5.0。若焊料材料之L*a*b*表色系中的黃色度b*為上述範圍內,則黃色度低,由於焊料具有金屬光澤,於焊料接頭之影像辨識的自動處理時,可確實地檢測出焊料接頭。 In the present invention, the yellowness b* in the L*a*b* color system of the solder alloy is preferably 0-10.0, more preferably 3.0-5.7, most preferably 3.0-5.0. If the yellowness b* in the L*a*b* color system of the solder material is within the above range, the yellowness is low. Since the solder has a metallic luster, it can be reliably detected in the automatic processing of the image recognition of the solder joint. out solder joints.

本發明中,黃色度b*係使用CM-3500d2600d型分光測色計(柯尼卡美能達公司製),於D65光源、10度 視野中,遵照JIS Z 8722:2009「顏色的測定方法-反射及穿透物體色」測定分光穿透率,而從色彩值(L*、a*、b*)求得。 Among the present invention, the yellowness b* system uses the CM-3500d2600d type spectrophotometer (manufactured by Konica Minolta Corporation), at D65 light source, 10 degrees In the field of view, the spectral transmittance was measured in accordance with JIS Z 8722:2009 "Measurement method of color - reflected and transmitted object color", and obtained from the color value (L*, a*, b*).

(8)其餘部分:Sn (8) Rest: Sn

本發明之焊料合金的其餘部分為Sn。除前述之元素以外亦可含有不可避免之雜質。即使在含有不可避免之雜質的情況下,亦不會影響前述之效果。 The remainder of the solder alloy of the present invention is Sn. In addition to the aforementioned elements, unavoidable impurities may also be contained. Even in the case of containing unavoidable impurities, it will not affect the aforementioned effects.

2.焊料粉末 2. Solder powder

本發明之焊料粉末係使用於後述之焊膏,較佳為球狀粉末。藉由為球狀粉末,焊料合金的流動性提升。本發明之焊料粉末為球狀粉末時,較佳為滿足於JIS Z 3284-1:2014之粉末尺寸之分類(表2)中滿足標號1~8之尺寸(粒度分佈)。更佳為滿足標號4~8之尺寸(粒度分佈),再更佳為滿足標號5~8之尺寸(粒度分佈)。若粒徑滿足此條件,則有粉末之表面積不會過大而可抑制黏度的上升,且可抑制微細粉末之凝聚而抑制黏度之上升。因此,對更微細之零件的焊接成為可能。 The solder powder of the present invention is used in the solder paste described later, and is preferably spherical powder. By being a spherical powder, the fluidity of the solder alloy is improved. When the solder powder of the present invention is a spherical powder, it is preferable to satisfy the size (particle size distribution) of 1 to 8 in the powder size classification (Table 2) of JIS Z 3284-1:2014. It is more preferable to satisfy the size (particle size distribution) of 4~8, and more preferably to satisfy the size (particle size distribution) of 5~8. If the particle size satisfies this condition, the surface area of the powder will not be too large and the increase in viscosity can be suppressed, and the aggregation of fine powder can be suppressed to suppress the increase in viscosity. Therefore, welding of finer parts becomes possible.

焊料粉末的真球度較佳為0.90以上,更佳為0.95以上,最佳為0.99以上。本發明中,球狀粉末的真球度係使用採用最小區域中心法(MZC法)的CNC影像測定系統(MITUTOYO公司製的ULTRA Quick Vision ULTRA QV350-PRO測定裝置)進行測定。本發明中,所謂真球度 係表示與真球的偏離,例如為將500個之各球的直徑除以長徑時所算出之算術平均值,值越接近上限的1.00,表示越接近真球。 The true sphericity of the solder powder is preferably at least 0.90, more preferably at least 0.95, most preferably at least 0.99. In the present invention, the true sphericity of the spherical powder is measured using a CNC image measuring system (ULTRA Quick Vision ULTRA QV350-PRO measuring device manufactured by MITUTOYO Co., Ltd.) using the minimum zone center method (MZC method). In the present invention, the so-called true sphericity It means the deviation from the true ball. For example, it is the arithmetic mean calculated by dividing the diameter of 500 balls by the major diameter. The closer the value is to the upper limit of 1.00, the closer to the true ball.

3.焊膏 3. Solder paste

本發明之焊膏含有前述焊料粉末及助焊劑。 The solder paste of the present invention contains the aforementioned solder powder and flux.

(1)助焊劑的成分 (1) Components of flux

使用於焊膏中之助焊劑,為有機酸、胺、胺鹵化氫酸鹽、有機鹵化合物、觸變劑、松香、溶劑、界面活性劑、基劑、高分子化合物、矽烷偶合劑、著色劑之任一者,或由2個以上之組合所構成。 Flux used in solder paste is organic acid, amine, amine hydrogen halide, organic halogen compound, thixotropic agent, rosin, solvent, surfactant, base agent, polymer compound, silane coupling agent, colorant Either one, or a combination of two or more.

作為有機酸,可列舉琥珀酸、戊二酸、己二酸、庚二酸、辛二酸、壬二酸、癸二酸、二聚酸、丙酸、2,2-雙羥甲基丙酸、酒石酸、蘋果酸、乙醇酸、二乙醇酸、硫代乙醇酸、二硫代乙醇酸、硬脂酸、12-羥基硬脂酸、棕櫚酸、油酸等。 Examples of organic acids include succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, dimer acid, propionic acid, and 2,2-bismethylolpropionic acid , tartaric acid, malic acid, glycolic acid, diglycolic acid, thioglycolic acid, dithioglycolic acid, stearic acid, 12-hydroxystearic acid, palmitic acid, oleic acid, etc.

作為胺,可列舉乙基胺、三乙基胺、乙二胺、三伸乙基四胺、2-甲基咪唑、2-十一烷基咪唑、2-十七烷基咪唑、1,2-二甲基咪唑、2-乙基-4-甲基咪唑、2-苯基咪唑、2-苯基-4-甲基咪唑、1-苄基-2-甲基咪唑、1-苄基-2-苯基咪唑、1-氰乙基-2-甲基咪唑、1-氰乙基-2-十一烷基咪唑、1-氰乙基-2-乙基-4-甲基咪唑、1-氰乙基-2-苯基咪唑、1-氰乙基-2-十一烷基咪唑鎓偏苯三甲酸鹽、1-氰乙 基-2-苯基咪唑鎓偏苯三甲酸鹽、2,4-二胺基-6-[2'-甲基咪唑基-(1')]-乙基-s-三嗪、2,4-二胺基-6-[2'-十一烷基咪唑基-(1')]-乙基-s-三嗪、2,4-二胺基-6-[2'-乙基-4'-甲基咪唑基-(1')]-乙基-s-三嗪、2,4-二胺基-6-[2'-甲基咪唑基-(1')]-乙基-s-三嗪異三聚氰酸加成物、2-苯基咪唑異三聚氰酸加成物、2-苯基-4,5-二羥基甲基咪唑、2-苯基-4-甲基-5-羥基甲基咪唑、2,3-二氫-1H-吡咯并[1,2-a]苯并咪唑、1-十二烷基-2-甲基-3-苄基咪唑鎓氯化物、2-甲基咪唑啉、2-苯基咪唑啉、2,4-二胺基-6-乙烯基-s-三嗪、2,4-二胺基-6-乙烯基-s-三嗪異三聚氰酸加成物、2,4-二胺基-6-甲基丙烯醯氧基乙基-s-三嗪、環氧-咪唑加成物、2-甲基苯并咪唑、2-辛基苯并咪唑、2-戊基苯并咪唑、2-(1-乙基戊基)苯并咪唑、2-壬基苯并咪唑、2-(4-噻唑基)苯并咪唑、苯并咪唑、2-(2'-羥基-5'-甲基苯基)苯并三唑、2-(2'-羥基-3'-tert-丁基-5'-甲基苯基)-5-氯苯并三唑、2-(2'-羥基-3',5'-二-tert-戊基苯基)苯并三唑、2-(2'-羥基-5'-tert-辛基苯基)苯并三唑、2,2'-亞甲基雙[6-(2H-苯并三唑-2-基)-4-tert-辛基苯酚]、6-(2-苯并三唑基)-4-tert-辛基-6'-tert-丁基-4'-甲基-2,2'-亞甲基雙苯酚、1,2,3-苯并三唑、1-[N,N-雙(2-乙基己基)胺基甲基]苯并三唑、羧基苯并三唑、1-[N,N-雙(2-乙基己基)胺基甲基]甲基苯并三唑、2,2'-[[(甲基-1H-苯并三唑-1-基)甲基]亞胺基]雙乙醇、1-(1',2'-二羧基乙基)苯并三唑、1-(2,3-二羧基丙基)苯并三唑、1-[(2-乙基己基胺基)甲基]苯并三唑、2,6-雙[(1H-苯并三唑-1-基)甲基]-4-甲 基苯酚、5-甲基苯并三唑、5-苯基四唑等。 Examples of the amine include ethylamine, triethylamine, ethylenediamine, triethylenetetramine, 2-methylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 1,2 -Dimethylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2-methylimidazole, 1-benzyl- 2-phenylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl-2-undecylimidazole, 1-cyanoethyl-2-ethyl-4-methylimidazole, 1 -Cyanoethyl-2-phenylimidazole, 1-cyanoethyl-2-undecylimidazolium trimellitate, 1-cyanoethyl-2-phenylimidazolium trimellitate, 2 ,4-Diamino-6-[2 ' -methylimidazolyl-(1 ' )]-ethyl-s-triazine, 2,4-diamino-6-[2 ' -undecyl Imidazolyl-(1 ' )]-ethyl-s-triazine, 2,4-diamino-6-[2 ' -ethyl-4 ' -methylimidazolyl-(1 ' )]-ethyl -s-triazine, 2,4-diamino-6-[2 ' -methylimidazolyl-(1 ' )]-ethyl-s-triazine isocyanuric acid adduct, 2-benzene Imidazole isocyanuric acid adduct, 2-phenyl-4,5-dihydroxymethylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, 2,3-dihydro- 1H-pyrrolo[1,2-a]benzimidazole, 1-dodecyl-2-methyl-3-benzylimidazolium chloride, 2-methylimidazoline, 2-phenylimidazoline, 2,4-Diamino-6-vinyl-s-triazine, 2,4-diamino-6-vinyl-s-triazine isocyanuric acid adduct, 2,4-diamine Base-6-methacryloxyethyl-s-triazine, epoxy-imidazole adduct, 2-methylbenzimidazole, 2-octylbenzimidazole, 2-pentylbenzimidazole, 2-(1-Ethylpentyl)benzimidazole, 2-nonylbenzimidazole, 2-(4-thiazolyl)benzimidazole, benzimidazole, 2-( 2' -hydroxy-5' - methyl phenyl)benzotriazole, 2-( 2' -hydroxy-3' - tert-butyl- 5' -methylphenyl)-5-chlorobenzotriazole, 2-( 2' -hydroxy- 3 ' , 5' -di-tert-pentylphenyl)benzotriazole, 2-( 2' -hydroxy- 5' -tert-octylphenyl)benzotriazole, 2,2' -methylene Bis[6-(2H-benzotriazol-2-yl)-4-tert-octylphenol], 6-(2-benzotriazolyl)-4-tert-octyl-6' - tert -Butyl- 4' -methyl- 2,2' -methylenebisphenol, 1,2,3-benzotriazole, 1-[N,N-bis(2-ethylhexyl)aminomethyl base]benzotriazole, carboxybenzotriazole, 1-[N,N-bis(2-ethylhexyl)aminomethyl]methylbenzotriazole, 2,2 ' -[[(methyl -1H-Benzotriazol-1-yl)methyl]imino]bisethanol, 1-(1 ' , 2' -dicarboxyethyl)benzotriazole, 1-(2,3-dicarboxy Propyl)benzotriazole, 1-[(2-ethylhexylamino)methyl]benzotriazole, 2,6-bis[(1H-benzotriazol-1-yl)methyl]- 4-methylphenol, 5-methylbenzotriazole, 5-phenyltetrazole, etc.

胺鹵化氫酸鹽為使胺與鹵化氫反應而成之化合物,作為胺,可列舉乙基胺、乙二胺、三乙基胺、二苯基胍、二甲苯基胍、甲基咪唑、2-乙基-4-甲基咪唑等,作為鹵化氫,可列舉氯、溴、碘之氫化物。 Amine hydrohalides are compounds obtained by reacting amines with hydrogen halides. Examples of amines include ethylamine, ethylenediamine, triethylamine, diphenylguanidine, xylylguanidine, methylimidazole, 2 -Ethyl-4-methylimidazole, etc. Examples of the hydrogen halide include hydrides of chlorine, bromine, and iodine.

作為有機鹵化合物,可列舉trans-2,3-二溴-2-丁烯-1,4-二醇、三烯丙基異三聚氰酸酯6溴化物、1-溴-2-丁醇、1-溴-2-丙醇、3-溴-1-丙醇、3-溴-1,2-丙二醇、1,4-二溴-2-丁醇、1,3-二溴-2-丙醇、2,3-二溴-1-丙醇、2,3-二溴-1,4-丁二醇、2,3-二溴-2-丁烯-1,4-二醇等。 Examples of organohalogen compounds include trans-2,3-dibromo-2-butene-1,4-diol, triallyl isocyanurate 6 bromide, 1-bromo-2-butanol , 1-bromo-2-propanol, 3-bromo-1-propanol, 3-bromo-1,2-propanediol, 1,4-dibromo-2-butanol, 1,3-dibromo-2- Propanol, 2,3-dibromo-1-propanol, 2,3-dibromo-1,4-butanediol, 2,3-dibromo-2-butene-1,4-diol, etc.

作為觸變劑,可列舉蠟系觸變劑、醯胺系觸變劑、山梨醇系觸變劑等。作為蠟系觸變劑,例如可列舉氫化蓖麻油等。作為醯胺系觸變劑,可列舉單醯胺系觸變劑、雙醯胺系觸變劑、聚醯胺系觸變劑,具體來說,可列舉月桂酸醯胺、棕櫚酸醯胺、硬脂酸醯胺、山萮酸醯胺、羥基硬脂酸醯胺、飽和脂肪酸醯胺、油酸醯胺、芥酸醯胺、不飽和脂肪酸醯胺、p-甲苯甲烷醯胺、芳香族醯胺、亞甲基雙硬脂酸醯胺、伸乙基雙月桂酸醯胺、伸乙基雙羥基硬脂酸醯胺、飽和脂肪酸雙醯胺、亞甲基雙油酸醯胺、不飽和脂肪酸雙醯胺、m-二甲苯雙硬脂酸醯胺、芳香族雙醯胺、飽和脂肪酸聚醯胺、不飽和脂肪酸聚醯胺、芳香族聚醯胺、取代醯胺、羥甲基硬脂酸醯胺、羥甲基醯胺、脂肪酸酯醯胺等。作為山梨醇系觸變劑,可列舉二亞苄基-D-山梨醇、雙(4-甲基亞苄基)-D-山梨醇等。 Examples of the thixotropic agent include wax-based thixotropic agents, amide-based thixotropic agents, and sorbitol-based thixotropic agents. As a wax-type thixotropic agent, hydrogenated castor oil etc. are mentioned, for example. Examples of the amide-based thixotropic agent include monoamide-based thixotropic agents, bisamide-based thixotropic agents, and polyamide-based thixotropic agents. Specifically, lauric acid amide, palmitic acid amide, Stearic acid amides, behenic acid amides, hydroxystearic acid amides, saturated fatty acid amides, oleic acid amides, erucamides, unsaturated fatty acid amides, p-toluamide, aromatic amides Amine, Methylenebisstearamide, Ethylbislaurateamide, Ethylbishydroxystearamide, Saturated Fatty Acid Bisamide, Methylenebisoleamide, Unsaturated Fatty Acid Bisamide, m-xylene bisstearamide, aromatic bisamide, saturated fatty acid polyamide, unsaturated fatty acid polyamide, aromatic polyamide, substituted amide, hydroxymethyl stearic acid Amide, hydroxymethylamide, fatty acid ester amide, etc. Examples of the sorbitol-based thixotropic agent include dibenzylidene-D-sorbitol, bis(4-methylbenzylidene)-D-sorbitol, and the like.

作為基劑,可列舉非離子系界面活性劑、弱陽離子系界面活性劑、松香等。 Examples of the base include nonionic surfactants, weak cationic surfactants, rosin, and the like.

作為非離子系界面活性劑,可列舉聚乙二醇、聚乙二醇-聚丙二醇共聚物、脂肪族醇聚氧乙烯加成物、芳香族醇聚氧乙烯加成物、多元醇聚氧乙烯加成物等。 Examples of nonionic surfactants include polyethylene glycol, polyethylene glycol-polypropylene glycol copolymers, aliphatic alcohol polyoxyethylene adducts, aromatic alcohol polyoxyethylene adducts, polyol polyoxyethylene Additions etc.

作為弱陽離子系界面活性劑,可列舉末端二胺聚乙二醇、末端二胺聚乙二醇-聚丙二醇共聚物、脂肪族胺聚氧乙烯加成物、芳香族胺聚氧乙烯加成物、多元胺聚氧乙烯加成物。 Examples of weak cationic surfactants include terminal diamine polyethylene glycol, terminal diamine polyethylene glycol-polypropylene glycol copolymer, aliphatic amine polyoxyethylene adducts, and aromatic amine polyoxyethylene adducts , Polyamine polyoxyethylene adduct.

作為松香,可列舉例如松香膠、木松香及妥爾油松香等之原料松香,以及由該原料松香所得之衍生物。作為該衍生物,可列舉例如精製松香、氫化松香、歧化松香、聚合松香及α,β不飽和羧酸改質物(丙烯醯化松香、順丁烯二醯化松香、反丁烯二醯化松香等),以及該聚合松香之精製物、氫化物及歧化物,以及該α,β不飽和羧酸改質物之精製物、氫化物及歧化物等,並且可使用二種以上。又,除了松香系樹脂,可更包含選自萜烯樹脂、改質萜烯樹脂、萜烯酚樹脂、改質萜烯酚樹脂、苯乙烯樹脂、改質苯乙烯樹脂、二甲苯樹脂、及改質二甲苯樹脂之至少一種以上的樹脂。作為改質萜烯樹脂,可使用芳香族改質萜烯樹脂、氫化萜烯樹脂、氫化芳香族改質萜烯樹脂等。作為改質萜烯酚樹脂,可使用氫化萜烯酚樹脂等。作為改質苯乙烯樹脂,可使用苯乙烯丙烯酸樹脂、苯乙烯順 丁烯二酸樹脂等。作為改質二甲苯樹脂,可列舉酚改質二甲苯樹脂、烷基酚改質二甲苯樹脂、酚改質可溶酚醛型二甲苯樹脂、多元醇改質二甲苯樹脂、聚氧乙烯加成二甲苯樹脂等。 Examples of the rosin include raw material rosins such as rosin gum, wood rosin, and tall oil rosin, and derivatives obtained from the raw material rosins. Examples of such derivatives include purified rosin, hydrogenated rosin, disproportionated rosin, polymerized rosin, and modified α, β unsaturated carboxylic acids (acrylated rosin, maleated rosin, fumarated rosin etc.), and the refined product, hydrogenated product, and disproportionated product of the polymerized rosin, and the refined product, hydrogenated product, and disproportionated product of the α, β unsaturated carboxylic acid modified product, etc., and two or more types may be used. Also, in addition to rosin-based resins, it may further contain terpene resins, modified terpene resins, terpene phenol resins, modified terpene phenol resins, styrene resins, modified styrene resins, xylene resins, and modified terpene resins. At least one or more resins of high-quality xylene resins. As the modified terpene resin, an aromatic modified terpene resin, a hydrogenated terpene resin, a hydrogenated aromatic modified terpene resin, or the like can be used. As the modified terpene phenol resin, a hydrogenated terpene phenol resin or the like can be used. As the modified styrene resin, styrene acrylic resin, styrene cis Butenedioic acid resin, etc. Examples of modified xylene resins include phenol-modified xylene resins, alkylphenol-modified xylene resins, phenol-modified resol-type xylene resins, polyol-modified xylene resins, polyoxyethylene-added di Toluene resin, etc.

作為溶劑,可列舉水、醇系溶劑、二醇醚系溶劑、萜品醇類等。作為醇系溶劑,可列舉異丙醇、1,2-丁二醇、異莰基環己醇、2,4-二乙基-1,5-戊二醇、2,2-二甲基-1,3-丙二醇、2,5-二甲基-2,5-己二醇、2,5-二甲基-3-己炔-2,5-二醇、2,3-二甲基-2,3-丁二醇、1,1,1-參(羥基甲基)乙烷、2-乙基-2-羥基甲基-1,3-丙二醇、2,2'-氧基雙(亞甲基)雙(2-乙基-1,3-丙二醇)、2,2-雙(羥基甲基)-1,3-丙二醇、1,2,6-三羥基己烷、雙[2,2,2-參(羥基甲基)乙基]醚、1-乙炔基-1-環己醇、1,4-環己二醇、1,4-環己烷二甲醇、赤蘚醇、蘇糖醇、癒創木酚甘油醚、3,6-二甲基-4-辛炔-3,6-二醇、2,4,7,9-四甲基-5-癸炔-4,7-二醇等。作為二醇醚系溶劑,可列舉二乙二醇單-2-乙基己基醚、乙二醇單苯基醚、2-甲基戊烷-2,4-二醇、二乙二醇單己基醚、二乙二醇二丁基醚、三乙二醇單丁基醚等。 Examples of the solvent include water, alcohol-based solvents, glycol ether-based solvents, terpineols, and the like. Examples of alcohol-based solvents include isopropanol, 1,2-butanediol, isobornylcyclohexanol, 2,4-diethyl-1,5-pentanediol, 2,2-dimethyl- 1,3-propanediol, 2,5-dimethyl-2,5-hexanediol, 2,5-dimethyl-3-hexyne-2,5-diol, 2,3-dimethyl- 2,3-butanediol, 1,1,1-para(hydroxymethyl)ethane, 2-ethyl-2-hydroxymethyl-1,3-propanediol, 2,2' -oxybis( Methyl)bis(2-ethyl-1,3-propanediol), 2,2-bis(hydroxymethyl)-1,3-propanediol, 1,2,6-trihydroxyhexane, bis[2,2 ,2-(hydroxymethyl)ethyl]ether, 1-ethynyl-1-cyclohexanol, 1,4-cyclohexanediol, 1,4-cyclohexanedimethanol, erythritol, threose alcohol, guaiacol glyceryl ether, 3,6-dimethyl-4-octyne-3,6-diol, 2,4,7,9-tetramethyl-5-decyne-4,7- diol, etc. Examples of glycol ether solvents include diethylene glycol mono-2-ethylhexyl ether, ethylene glycol monophenyl ether, 2-methylpentane-2,4-diol, diethylene glycol monohexyl ether, diethylene glycol dibutyl ether, triethylene glycol monobutyl ether, etc.

作為界面活性劑,可列舉聚氧伸烷基乙炔二醇類、聚氧伸烷基甘油醚、聚氧伸烷基烷基醚、聚氧伸烷基酯、聚氧伸烷基烷基胺、聚氧伸烷基烷基醯胺等。 Examples of the surfactant include polyoxyalkylene acetylene glycols, polyoxyalkylene glyceryl ethers, polyoxyalkylene alkyl ethers, polyoxyalkylene esters, polyoxyalkylene alkylamines, Polyoxyalkylene alkylamide, etc.

(2)助焊劑的含量 (2) Flux content

相對於焊膏的總質量,助焊劑的含量較佳為5~95%, 更佳為5~15%。若為此範圍,則可充分地發揮起因於焊料粉末之增黏抑制效果。 Relative to the total mass of the solder paste, the flux content is preferably 5-95%, More preferably 5~15%. Within this range, the effect of suppressing thickening due to the solder powder can be sufficiently exhibited.

(3)焊膏之製造方法 (3) Manufacturing method of solder paste

本發明之焊膏係藉由本業界中一般之方法而製造。首先,焊料粉末之製造係可採用滴加經熔融之焊料材料而獲得粒子之滴加法或進行離心噴霧之噴霧法、粉碎塊體之焊料材料的方法等之公知方法。滴加法或噴霧法中,為了製成粒子狀,滴加或噴霧較佳係於惰性環境或溶媒中進行。然後,可將上述各成分加熱混合而調製助焊劑,並於助焊劑中導入上述焊料粉末或依情況之氧化鋯粉末,進行攪拌、混合而予以製造。 The solder paste of the present invention is manufactured by a general method in the industry. First, known methods such as a drop method of dropping molten solder material to obtain particles, a spray method of centrifugal spraying, and a method of pulverizing bulk solder material can be used to produce solder powder. In the dropping method or the spraying method, in order to form particles, the dropping or spraying is preferably performed in an inert environment or in a solvent. Then, the above-mentioned components can be heated and mixed to prepare a flux, and the above-mentioned solder powder or zirconia powder as the case may be introduced into the flux, stirred and mixed to manufacture.

4.焊球 4. Solder balls

本發明之焊料合金可使用作為焊球。當作為焊球而使用時,可將本發明之焊料合金使用本業界中一般之方法的滴加法來製造焊球。又,可藉由以在塗布有助焊劑之1個電極上搭載1個焊球並進行接合等本業界中一般之方法來加工焊球,而製造焊料接頭。焊球之粒徑的下限較佳為1μm以上,更佳為10μm以上,再更佳為20μm以上,特佳為30μm以上。又,焊球之粒徑之上限較佳為3000μm以下,更佳為1000μm以下,再更佳為600μm以下,特佳為300μm以下。 The solder alloy of the present invention can be used as a solder ball. When used as solder balls, solder balls can be produced by using the solder alloy of the present invention by the drop method which is a common method in the industry. Furthermore, solder joints can be produced by processing the solder balls by a method generally used in the industry, such as mounting and bonding one solder ball on one electrode coated with flux. The lower limit of the particle size of the solder balls is preferably at least 1 μm, more preferably at least 10 μm, still more preferably at least 20 μm, particularly preferably at least 30 μm. Also, the upper limit of the particle size of the solder balls is preferably at most 3000 μm, more preferably at most 1000 μm, still more preferably at most 600 μm, particularly preferably at most 300 μm.

5.焊料預形體 5. Solder preform

本發明之焊料合金可使用作為預形體。作為預形體的形狀,可列舉墊片、環狀、顆粒、盤形、帶式、線材等。 The solder alloy of the present invention can be used as a preform. Examples of the shape of the preform include a gasket, ring, pellet, disk, ribbon, wire, and the like.

6.焊料接頭 6. Solder joints

本發明之焊料合金係可接合IC晶片等之PKG(Package)的電極與PCB(printed circuit board)等之基板的電極而形成焊料接頭。焊料接頭係由電極及焊料接合部所構成。所謂焊料接合部主要表示由焊料合金所形成之部分。 The solder alloy of the present invention can join the electrodes of PKG (Package) such as IC chips and the electrodes of substrates such as PCB (printed circuit board) to form solder joints. The solder joint is composed of electrodes and solder joints. The term "solder joint" mainly refers to a portion formed of a solder alloy.

7.焊料合金之形成方法 7. Formation method of solder alloy

本發明之焊料合金之製造方法並無限定,可藉由將原料金屬熔融混合而製造。 The method for producing the solder alloy of the present invention is not limited, and it can be produced by melting and mixing raw material metals.

在焊料合金含有As的情況下,形成As濃化層的方法亦無限定。作為As濃化層之形成方法的一例,可列舉將焊料材料在氧化環境(空氣或氧氣環境)中進行加熱。加熱溫度雖並無限定,但例如可設為40~200℃,亦可為50~80℃。加熱時間亦無限定,例如可設為數分鐘~數天,較佳設為數分鐘~數小時。為了形成充分量之As濃化層,加熱時間較佳設為10分鐘以上,更佳設為20分鐘以上。 When the solder alloy contains As, the method of forming the As-concentrated layer is also not limited. As an example of the formation method of an As concentrating layer, heating a solder material in an oxidizing atmosphere (air or an oxygen atmosphere) is mentioned. Although heating temperature is not limited, For example, it may be 40-200 degreeC, and may be 50-80 degreeC. The heating time is also not limited, for example, it may be several minutes to several days, preferably several minutes to several hours. In order to form a sufficient amount of As concentrating layer, the heating time is preferably 10 minutes or more, more preferably 20 minutes or more.

本發明之焊料合金係可藉由使用低α線材作為其原材料而製造低α線合金。此般之低α線合金,若用於形成記憶體周邊之焊料凸塊,則可抑制軟性錯誤(soft error)。 The solder alloy system of the present invention can produce a low α wire alloy by using a low α wire material as its raw material. Such a low alpha alloy, if used to form solder bumps around the memory, can suppress soft errors.

[實施例] [Example]

本發明是藉由以下的實施例進行說明,但本發明並不限定於以下實施例。 The present invention is illustrated by the following examples, but the present invention is not limited to the following examples.

使用表1~5的實施例及比較例中記載的焊料合金(質量%),評價關於1.在焊料浴槽內之Fe的溶出抑制、2.針狀結晶的析出抑制、3.對於Cu之IMC成長抑制、4.於凸塊內之SnCuNi形成抑制。又,對於表3~5之含有As的實施例及比較例,亦進而一起評價5.As的表面濃化、6.增黏抑制、7.黃色度變化、8.焊料濕潤性。 Using the solder alloys (mass %) described in Examples and Comparative Examples in Tables 1 to 5, evaluations were made on 1. Inhibition of elution of Fe in a solder bath, 2. Inhibition of precipitation of acicular crystals, and 3. IMC with respect to Cu Growth inhibition, 4. SnCuNi formation inhibition in the bump. In addition, for the examples and comparative examples containing As in Tables 3 to 5, 5. surface concentration of As, 6. inhibition of thickening, 7. change in yellowness, and 8. solder wettability were further evaluated together.

1.在焊料浴槽內之Fe的溶出抑制 1. Inhibition of Fe dissolution in the solder bath

使用容積為30L之SUS304製焊料浴槽,投入40kg之表1~5中記載的焊料合金,以280℃攪拌加熱12小時。於加熱攪拌後,冷卻焊料浴槽內之熔融焊料,藉由利用ICP-AES(高頻感應耦合電漿發射光譜分析裝置)之元素分析來測定Fe含量的增加量。 Using a solder bath made of SUS304 with a volume of 30 L, 40 kg of the solder alloys listed in Tables 1 to 5 were put in, and stirred and heated at 280° C. for 12 hours. After heating and stirring, the molten solder in the solder bath was cooled, and the increase in Fe content was measured by elemental analysis using ICP-AES (Inductively Coupled Plasma Emission Spectroscopy).

藉由加熱攪拌,Fe含量的增加未達20ppm/12h之情況下評價為「○」,為20ppm/12h以上之情況下評價為「×」。 When the increase in Fe content by heating and stirring was less than 20 ppm/12h, it was evaluated as "◯", and when it was 20 ppm/12h or more, it was evaluated as "×".

2.針狀結晶的析出抑制 2. Inhibition of precipitation of needle crystals

將表1~5中記載的焊料合金以250℃進行熔融,並在1分鐘內冷卻至全合金組成之固相線溫度以下之100℃為 止。於冷卻後的焊料合金之剖面SEM照片中,在任意3處對300μm×300μm的範圍進行,確認源自SnFe化合物之針狀結晶的有無。所謂本實施例中之針狀結晶,係表示1個的SnFe化合物中,作為長徑與短徑之比的長寬比為2以上的結晶。 Melt the solder alloys listed in Tables 1 to 5 at 250°C and cool within 1 minute to 100°C below the solidus temperature of the entire alloy composition. end. In the cross-sectional SEM photograph of the solder alloy after cooling, the range of 300 μm×300 μm was taken at any three places, and the presence or absence of needle crystals derived from the SnFe compound was confirmed. The needle crystal in this example means a crystal having an aspect ratio of 2 or more in one SnFe compound.

在3處均未觀察到針狀結晶之情況下評價為「○」,在至少1處觀察到針狀結晶之情況下評價為「×」。 When no needle-like crystals were observed at any of the three locations, the evaluation was "◯", and when at least one needle-like crystal was observed, the evaluation was "x".

3.對於Cu之IMC成長抑制 3. IMC growth inhibition for Cu

將塗布有液狀助焊劑之Bare-Cu板浸漬於加熱至280℃之具有表1~5所示之合金組成的熔融焊料中,而製作焊料鍍敷Cu板。將此焊料鍍敷Cu板於加熱至150℃之加熱板上進行300小時之加熱處理。於冷卻後的焊料合金之剖面SEM照片中,在任意3處對300μm×300μm的範圍進行,求得金屬間化合物之最大結晶粒徑。 The Bare-Cu board coated with the liquid flux was immersed in molten solder having the alloy compositions shown in Tables 1 to 5 heated to 280° C., to produce a solder-plated Cu board. This solder-plated Cu board was heat-processed for 300 hours on the hot plate heated to 150 degreeC. In the SEM photograph of the cross-section of the cooled solder alloy, the maximum crystal grain size of the intermetallic compound is determined at any three places in the range of 300 μm × 300 μm.

本實施例中,所謂最大結晶粒徑,係由得到之影像所辨識出的金屬化合物中,以目視選擇最大的結晶粒,並對於選出之結晶粒,以間隔成為最大的方式畫出平行之2條切線,將其間隔設為最大結晶粒徑。 In this embodiment, the so-called maximum crystal grain size refers to visually selecting the largest crystal grain among the metal compounds identified from the obtained image, and drawing parallel 2 lines so that the distance between the selected crystal grains becomes the largest. tangent lines, and set their intervals to the maximum grain size.

結晶粒徑之最大值未達5μm之情況下評價為「○」,最大值為5μm以上之情況下評價為「×」。 When the maximum value of the crystal grain size was less than 5 μm, it was evaluated as “◯”, and when the maximum value was 5 μm or more, it was evaluated as “×”.

4.於凸塊內之SnCuNi形成抑制 4. SnCuNi formation suppression in the bump

與上述「3.」相同地製作焊料鍍敷Cu板,以與上述 「3.」相同之方法對在Cu板與焊料合金之界面的任意3處進行觀察,確認在焊料合金中之SnCuNi系化合物的有無。在全部處所中,於焊料合金的界面附近未觀察到SnCuNi系化合物之形成的情況下評價為「○」,在至少1處觀察到SnCuNi系化合物之形成的情況下評價為「×」。 In the same manner as in the above "3.", a solder-plated Cu plate was prepared to be the same as the above "3." Observe any 3 places on the interface between the Cu plate and the solder alloy in the same way to confirm the presence or absence of SnCuNi-based compounds in the solder alloy. In all locations, when the formation of the SnCuNi-based compound was not observed near the interface of the solder alloy, it was evaluated as "◯", and when the formation of the SnCuNi-based compound was observed at least one place, it was evaluated as "×".

5.As的表面濃化 5. Surface Concentration of As

As濃化層的有無,係使用利用XPS(X射線光電光譜法:X-ray Photoelectron Spectroscopy)之深度方向分析,以如下之方式進行評價。 The presence or absence of an As concentration layer was evaluated as follows using depth direction analysis by XPS (X-ray photoelectron spectroscopy: X-ray Photoelectron Spectroscopy).

(分析條件) (analysis conditions)

.分析裝置:微小區域X射線光電子光譜分析裝置(Kratos Analytical公司製AXIS Nova) . Analytical device: Micro-area X-ray photoelectron spectroscopic analysis device (AXIS Nova manufactured by Kratos Analytical Co., Ltd.)

.分析條件:X射線源AlKα線,X射線槍電壓15kV,X射線槍電流值10mA,分析區域700μm×300μm . Analysis conditions: X-ray source AlKα line, X-ray gun voltage 15kV, X-ray gun current value 10mA, analysis area 700μm×300μm

.濺鍍條件:離子種Ar+,加速電壓2kV,濺鍍速率0.5nm/min(SiO2換算) . Sputtering conditions: ion species Ar + , accelerating voltage 2kV, sputtering rate 0.5nm/min (SiO 2 conversion)

.樣品:準備3個將具有表3~5所示之合金組成的焊料粉末無間隙且平坦地鋪滿於貼附有碳膠帶之載台上而成者,以作為樣品。其中,樣品的大小設為5.0mm×5.0mm。焊料粉末為使用平均粒徑為21μm,相當於JIS Z3284-1:2014的粉末尺寸分類(表2)之5者,且在大氣中,使用乾燥裝置以60℃加熱30分鐘而得。比較例8未進行加熱處理。 . Samples: Prepare 3 solder powders having the alloy compositions shown in Tables 3-5, spread flatly and without gaps on the stage with carbon tape attached, as samples. Among them, the size of the sample is set to 5.0 mm×5.0 mm. The solder powder used has an average particle diameter of 21 μm, which corresponds to JIS Z3284-1:2014 powder size classification (Table 2) of 5, and was obtained by heating at 60° C. for 30 minutes using a drying device in the atmosphere. In Comparative Example 8, no heat treatment was performed.

(評價順序) (Evaluation order)

由5.0mm×5.0mm之大小的樣品中,選定任意之700μm×300μm之區域,一邊進行離子濺鍍一邊對Sn、O及As之各原子進行XPS分析,得到XPS分析的圖表。於每1個樣品選定1個區域,對3個樣品各自進行1次,合計3次之分析。 From a sample with a size of 5.0mm×5.0mm, select an arbitrary area of 700μm×300μm, carry out XPS analysis on each atom of Sn, O and As while performing ion sputtering, and obtain an XPS analysis chart. One region is selected for each sample, and each of the three samples is analyzed once for a total of three times.

將藉由XPS分析所得到之圖表的一例表示於圖1~3。圖1~3為對於相同的樣品變更縱軸之檢測強度(cps)的尺度而得者,橫軸為由濺鍍時間算出之SiO2換算之深度(nm)。XPS分析的圖表中,縱軸為檢測強度(cps),橫軸可選自濺鍍時間(min)或由濺鍍時間使用SiO2標準試料的濺鍍蝕刻速率而算出之SiO2換算之深度(nm)的任一者,但圖1~3中,將XPS分析的圖表中之橫軸設為由濺鍍時間使用SiO2標準試料的濺鍍蝕刻速率而算出之SiO2換算之深度(nm)。 An example of a graph obtained by XPS analysis is shown in FIGS. 1 to 3 . Figures 1 to 3 are obtained by changing the scale of detection intensity (cps) on the vertical axis for the same sample, and the horizontal axis is the depth (nm) converted to SiO2 calculated from the sputtering time. In the graph of XPS analysis, the vertical axis is the detection intensity (cps), and the horizontal axis can be selected from the sputtering time (min) or the SiO2 -converted depth calculated from the sputtering etching rate of the SiO2 standard sample for the sputtering time ( nm), but in Figures 1 to 3, the horizontal axis in the graph of XPS analysis is the depth (nm) in terms of SiO2 calculated from the sputtering etching rate of the SiO2 standard sample for the sputtering time .

並且,各樣品之XPS分析的圖表中,將O原子之檢測強度成為最大之SiO2換算之深度設為Do.max(nm)(參照圖2)。然後,較Do.max更深之部分中,將O原子之檢測強度成為最大檢測強度(Do.max處之強度)的1/2強度的最初之SiO2換算之深度設為D1(nm)。 In addition, in the graph of XPS analysis of each sample, the depth in conversion of SiO 2 at which the detection intensity of O atoms becomes the maximum is set as Do. max (nm) (see Figure 2). Then, compare Do. In the deeper portion of max, the depth in terms of SiO 2 at which the detection intensity of O atoms becomes 1/2 intensity of the maximum detection intensity (intensity at Do.max) is set to D1 (nm).

接著,各樣品之XPS分析的圖表中,求出自最表面起至深度2×D1為止之區域(SiO2換算之深度為0~2×D1(nm)之區域)中的As之檢測強度之積分值(S1)、與 自深度2×D1起至進而僅深2×D1之部分為止之區域(SiO2換算之深度為2×D1~4×D1(nm)之區域)中的As之檢測強度之積分值(S2)(參照圖3),將其進行比較。 Next, in the XPS analysis chart of each sample, the ratio of the detection intensity of As in the region from the outermost surface to a depth of 2×D1 (the region where the depth is 0 to 2×D1 (nm) in terms of SiO 2 ) was obtained. Integral value (S1), and detection of As in the region from the depth of 2×D1 to the part with a depth of only 2×D1 (the region where the depth is 2×D1~4×D1 (nm) in terms of SiO 2 ) Integral value (S2) of intensity (refer to Fig. 3 ), and compare them.

並且,基於以下的基準進行評價。 In addition, evaluation was performed based on the following criteria.

.於全部3次的測定中均為S1>S2:形成有As濃化層(○) . S1>S2 in all 3 measurements: As concentrated layer formed (○)

.於全部3次的測定中之2次以下的次數為S1>S2:未形成As濃化層(×) . The frequency of 2 or less out of all 3 measurements is S1>S2: No As-concentrated layer was formed (×)

6.增黏抑制 6. Viscosity inhibition

藉由將由表3~5的實施例及比較例的焊料合金所得之焊料粉末與表6所示之助焊劑,以助焊劑與焊料粉末之質量比(助焊劑:焊料粉末)成為11:89之方式進行加熱攪拌後,予以冷卻而製作焊膏。對於該等焊膏,依據JIS Z 3284-3:2014之「4.2黏度特性試驗」中記載的方法,使用旋轉黏度計(PCU-205、Malcolm股分有限公司製),以轉數:10rpm、測定溫度:25℃,持續測定黏度12小時。然後,將初期黏度(攪拌30分鐘後之黏度)與12小時後之黏度進行比較,基於以下的基準進行增黏抑制效果之評價。 By combining the solder powder obtained from the solder alloys of Examples and Comparative Examples in Tables 3 to 5 and the flux shown in Table 6, the mass ratio of flux to solder powder (flux:solder powder) becomes 11:89. After heated and stirred by the method, it was cooled to prepare a solder paste. For these solder pastes, according to the method described in JIS Z 3284-3:2014 "4.2 Viscosity characteristic test", using a rotational viscometer (PCU-205, manufactured by Malcolm Co., Ltd.), the rotation speed: 10rpm, measurement Temperature: 25°C, continuously measure the viscosity for 12 hours. Then, the initial viscosity (viscosity after stirring for 30 minutes) was compared with the viscosity after 12 hours, and the thickening suppression effect was evaluated based on the following criteria.

12小時後之黏度≦初期黏度×1.2:經時之黏度上升小而良好(○) Viscosity after 12 hours≦initial viscosity×1.2: Viscosity increase over time is small and good (○)

12小時後之黏度>初期黏度×1.2:經時之黏度上升大而不良(×) Viscosity after 12 hours>Initial viscosity×1.2: Viscosity rises greatly over time and is not good (×)

7.黃色度變化 7. Changes in yellowness

將具有表3~5所示之合金組成的焊球(球徑0.3mm)於200℃之恆溫槽中加熱2小時。對於L*a*b*表色系中之黃色度b*,進行加熱前及加熱後之焊球的測定,算出由加熱後之b*減去加熱前之b*的增加量(△b*)。僅比較例8係使用未進行加熱處理之焊球而導入至恆溫槽中。 Heat solder balls (ball diameter 0.3 mm) with the alloy compositions shown in Tables 3 to 5 in a constant temperature bath at 200°C for 2 hours. For the yellowness b* in the L*a*b* color system, measure the solder balls before and after heating, and calculate the increase (△b*) from the b* after heating minus the b* before heating ). Only in Comparative Example 8, solder balls that were not heat-treated were introduced into the constant temperature bath.

黃色度b*係使用CM-3500d2600d型分光測色計(柯尼卡美能達公司製),於D65光源、10度視野中,遵照JIS Z 8722:2009「顏色的測定方法-反射及穿透物體色」測定分光穿透率,而從色彩值(L*、a*、b*)求得。尚,色彩值(L*、a*、b*)係基於JIS Z 8781-4:2013之標準。 The yellowness b* is measured using a CM-3500d2600d spectrophotometer (manufactured by Konica Minolta Corporation), in a D65 light source and a 10-degree field of view, in accordance with JIS Z 8722: 2009 "Color determination method - reflection and penetration objects Color" is used to measure the spectral transmittance, which is obtained from the color value (L*, a*, b*). Still, the color values (L*, a*, b*) are based on the standard of JIS Z 8781-4:2013.

△b*之值為△b*(基準)的70%以下:○(良好) The value of △b* is less than 70% of △b* (standard): ○ (good)

△b*之值為大於△b*(基準)的70%:×(不良) The value of △b* is greater than 70% of △b* (baseline): × (poor)

8.焊料濕潤性 8. Solder wettability

關於與上述「6.」相同地製作出之焊膏,將剛製作後的各焊膏印刷至Cu板上,於回焊爐,在N2環境中以1℃/s之升溫速度由25℃加熱至260℃後,冷卻至室溫。以光學顯微鏡觀察冷卻後之焊料凸塊的外觀,藉此來評價濕潤性。未觀察到未完全熔融的焊料粉末之情況下評價為「○」,觀察到未完全熔融的焊料粉末之情況下評價為「×」。 Regarding the solder paste produced in the same way as in "6." above, print each solder paste immediately after production on a Cu board, and heat up from 25°C at a rate of 1°C/s in a N2 environment in a reflow furnace. After heating to 260°C, it was cooled to room temperature. Wettability was evaluated by observing the appearance of the cooled solder bumps with an optical microscope. When incompletely melted solder powder was not observed, it was rated as "◯", and when incompletely melted solder powder was observed, it was rated as "x".

將評價之結果示於表1~5。 The results of the evaluation are shown in Tables 1-5.

Figure 109117061-A0305-02-0028-1
Figure 109117061-A0305-02-0028-1

Figure 109117061-A0305-02-0029-2
Figure 109117061-A0305-02-0029-2

Figure 109117061-A0305-02-0030-3
Figure 109117061-A0305-02-0030-3

Figure 109117061-A0305-02-0031-4
Figure 109117061-A0305-02-0031-4

Figure 109117061-A0305-02-0032-5
Figure 109117061-A0305-02-0032-5

Figure 109117061-A0305-02-0033-6
Figure 109117061-A0305-02-0033-6

如表1~5所示可知,實施例1~100係任一的合金組成中滿足全部本發明之要件,因此抑制在焊料浴槽內之Fe的溶出、抑制針狀結晶的析出、抑制對於Cu之IMC成長、抑制於凸塊內之SnCuNi形成。又,關於表3~5之含有As的實施例,進而可確認到As的表面濃化,且可知能抑制焊膏的增黏、抑制焊料合金的黃色度變化並顯示優異之焊料濕潤性。 As shown in Tables 1 to 5, it can be seen that any alloy composition of Examples 1 to 100 satisfies all the requirements of the present invention, so the elution of Fe in the solder bath is suppressed, the precipitation of needle crystals is suppressed, and the resistance to Cu is suppressed. IMC growth, suppression of SnCuNi formation in bumps. In addition, regarding the examples containing As in Tables 3 to 5, it was further confirmed that the surface of As was concentrated, and it was found that the thickening of the solder paste and the change of the yellowness of the solder alloy were suppressed, and excellent solder wettability was exhibited.

另一方面,比較例1~7及比較例9~15係任一的合金組成中未滿足本發明之要件的至少一個,因此在焊料浴槽內之Fe的溶出抑制、針狀結晶的析出抑制、對於Cu之IMC成長抑制、於凸塊內之SnCuNi形成抑制的至少一者較差。比較例8由於未進行加熱處理,未確認到As的表面濃化,可知無法抑制焊膏的增黏,且焊料合金黃變。 On the other hand, in any of the alloy compositions of Comparative Examples 1 to 7 and Comparative Examples 9 to 15, at least one of the requirements of the present invention is not satisfied, so the dissolution of Fe in the solder bath is suppressed, the precipitation of needle crystals is suppressed, At least one of IMC growth inhibition for Cu, SnCuNi formation inhibition in the bump is poor. In Comparative Example 8, since no heat treatment was performed, concentration of As on the surface was not confirmed, and it was found that thickening of the solder paste could not be suppressed, and the solder alloy was yellowed.

Claims (8)

一種焊料合金,其特徵為:以質量%計具有Cu:0.55~0.75%、Ni:0.0350~0.0600%、Ge:0.0035~0.0200%、Fe:0.0020~0.0100%、及其餘部分為Sn之合金組成。 A solder alloy characterized in that it has Cu: 0.55-0.75%, Ni: 0.0350-0.0600%, Ge: 0.0035-0.0200%, Fe: 0.0020-0.0100%, and the rest is Sn in terms of mass %. 一種焊料合金,其特徵為:以質量%計具有Cu:0.55~0.75%、Ni:0.0350~0.0600%、Ge:0.0035~0.0200%、Fe:0.0020~0.0100%、Ag:0~4.0%、及其餘部分為Sn之合金組成。 A solder alloy characterized by: Cu: 0.55-0.75%, Ni: 0.0350-0.0600%, Ge: 0.0035-0.0200%, Fe: 0.0020-0.0100%, Ag: 0-4.0%, and others in mass % Part of it is composed of Sn alloy. 一種焊料合金,其特徵為:以質量%計具有Cu:0.55~0.75%、Ni:0.0350~0.0600%、Ge:0.0035~0.0200%、Fe:0.0020~0.0100%、As:0.0040~0.0250%、及其餘部分為Sn之合金組成。 A solder alloy characterized by: Cu: 0.55-0.75%, Ni: 0.0350-0.0600%, Ge: 0.0035-0.0200%, Fe: 0.0020-0.0100%, As: 0.0040-0.0250%, and others in mass % Part of it is composed of Sn alloy. 一種焊料合金,其特徵為:以質量%計具有Cu:0.55~0.75%、Ni:0.0350~0.0600%、Ge:0.0035~0.0200%、Fe:0.0020~0.0100%、Ag:0~4.0%、As:0.0040~0.0250%、及其餘部分為Sn之合金組成。 A solder alloy characterized by: Cu: 0.55-0.75%, Ni: 0.0350-0.0600%, Ge: 0.0035-0.0200%, Fe: 0.0020-0.0100%, Ag: 0-4.0%, As: 0.0040~0.0250%, and the rest is an alloy composition of Sn. 如請求項1~4中任一項之焊料合金,其中,前述合金組成進而滿足下述(1)~(5)式之至少1式;0.0430(%)≦Ni+Fe≦0.0700(%) (1) 3.50≦Ni/Fe≦30.00 (2) 10.83≦Cu/Ni≦18.57 (3) 65.00≦Cu/Fe≦325.00 (4) 0.0060(%)≦Ge+Fe≦0.0280(%) (5) 上述(1)~(5)式中,Ni、Fe、Cu及Ge表示各自前述合金組成之含量(質量%)。 The solder alloy according to any one of claims 1 to 4, wherein the aforementioned alloy composition further satisfies at least one of the following formulas (1) to (5); 0.0430(%)≦Ni+Fe≦0.0700(%) ( 1) 3.50≦Ni/Fe≦30.00 (2) 10.83≦Cu/Ni≦18.57 (3) 65.00≦Cu/Fe≦325.00 (4) 0.0060(%)≦Ge+Fe≦0.0280(%) (5) In the formulas (1) to (5) above, Ni, Fe, Cu, and Ge represent the contents (% by mass) of the aforementioned alloy compositions. 一種焊膏,其具有由如請求項1~5中任一項之焊料合金所成之焊料粉末與助焊劑。 A solder paste comprising solder powder and flux made of the solder alloy according to any one of Claims 1 to 5. 一種焊球,其係由如請求項1~5中任一項之焊料合金所成。 A solder ball, which is made of the solder alloy according to any one of Claims 1-5. 一種焊料預形體,其係由如請求項1~5中任一項之焊料合金所成。 A solder preform made of the solder alloy according to any one of Claims 1-5.
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