TWI800255B - 製備輻射敏感組成物的方法 - Google Patents

製備輻射敏感組成物的方法 Download PDF

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Publication number
TWI800255B
TWI800255B TW111105261A TW111105261A TWI800255B TW I800255 B TWI800255 B TW I800255B TW 111105261 A TW111105261 A TW 111105261A TW 111105261 A TW111105261 A TW 111105261A TW I800255 B TWI800255 B TW I800255B
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TW
Taiwan
Prior art keywords
preparing
radiation sensitive
sensitive composition
composition
radiation
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TW111105261A
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English (en)
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TW202222812A (zh
Inventor
班傑明 L 克拉克
多明尼克 斯密蒂
湯瑪斯 Ｊ 萊金
馬克 珍尼薩
喬瑟夫 Ｂ 愛迪生
克雷格 Ｍ 蓋茲
Original Assignee
美商英培雅股份有限公司
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Publication of TW202222812A publication Critical patent/TW202222812A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D35/00—Filtering devices having features not specifically covered by groups B01D24/00 - B01D33/00, or for applications not specifically covered by groups B01D24/00 - B01D33/00; Auxiliary devices for filtration; Filter housing constructions
    • B01D35/02—Filters adapted for location in special places, e.g. pipe-lines, pumps, stop-cocks
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/22—Tin compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
TW111105261A 2019-01-30 2020-01-07 製備輻射敏感組成物的方法 TWI800255B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US16/262,233 US11966158B2 (en) 2019-01-30 2019-01-30 Monoalkyl tin trialkoxides and/or monoalkyl tin triamides with low metal contamination and/or particulate contamination, and corresponding methods
US16/262,233 2019-01-30

Publications (2)

Publication Number Publication Date
TW202222812A TW202222812A (zh) 2022-06-16
TWI800255B true TWI800255B (zh) 2023-04-21

Family

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Family Applications (5)

Application Number Title Priority Date Filing Date
TW112111832A TWI833623B (zh) 2019-01-30 2020-01-07 包含單烷基錫三胺或單烷基錫三烷氧化物的組成物、形成彼之方法及其用途
TW111105261A TWI800255B (zh) 2019-01-30 2020-01-07 製備輻射敏感組成物的方法
TW113102390A TW202421639A (zh) 2019-01-30 2020-01-07 包含單烷基錫三烷氧化物的組成物
TW110106122A TWI758104B (zh) 2019-01-30 2020-01-07 低金屬污染及／或微粒污染之單烷基錫三烷氧化物及／或單烷基錫三胺以及對應方法
TW109100437A TWI723727B (zh) 2019-01-30 2020-01-07 低金屬污染及／或微粒污染之單烷基錫三烷氧化物及／或單烷基錫三胺以及對應方法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
TW112111832A TWI833623B (zh) 2019-01-30 2020-01-07 包含單烷基錫三胺或單烷基錫三烷氧化物的組成物、形成彼之方法及其用途

Family Applications After (3)

Application Number Title Priority Date Filing Date
TW113102390A TW202421639A (zh) 2019-01-30 2020-01-07 包含單烷基錫三烷氧化物的組成物
TW110106122A TWI758104B (zh) 2019-01-30 2020-01-07 低金屬污染及／或微粒污染之單烷基錫三烷氧化物及／或單烷基錫三胺以及對應方法
TW109100437A TWI723727B (zh) 2019-01-30 2020-01-07 低金屬污染及／或微粒污染之單烷基錫三烷氧化物及／或單烷基錫三胺以及對應方法

Country Status (4)

Country Link
US (2) US11966158B2 (zh)
JP (3) JP7200147B2 (zh)
KR (2) KR102711650B1 (zh)
TW (5) TWI833623B (zh)

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CN114769294B (zh) * 2022-04-20 2023-07-28 昆明理工大学 一种树脂基复合材料废料高效回收系统及其方法
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Also Published As

Publication number Publication date
TWI758104B (zh) 2022-03-11
US11966158B2 (en) 2024-04-23
TW202122406A (zh) 2021-06-16
TW202421639A (zh) 2024-06-01
US20230251569A1 (en) 2023-08-10
JP2023027327A (ja) 2023-03-01
KR102711650B1 (ko) 2024-09-27
JP7482980B2 (ja) 2024-05-14
TWI833623B (zh) 2024-02-21
KR20240146634A (ko) 2024-10-08
US20200241413A1 (en) 2020-07-30
JP2020122959A (ja) 2020-08-13
TW202222812A (zh) 2022-06-16
KR20200094658A (ko) 2020-08-07
TW202328154A (zh) 2023-07-16
JP2024109608A (ja) 2024-08-14
TWI723727B (zh) 2021-04-01
JP7200147B2 (ja) 2023-01-06
TW202028215A (zh) 2020-08-01

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