TWI794783B - Apparatus of transferring a plurality of chips and method of transferring a plurality of chips - Google Patents
Apparatus of transferring a plurality of chips and method of transferring a plurality of chips Download PDFInfo
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Abstract
一種轉移多個晶片的裝置,包括:帶支承件,其構成為支承具有黏合層圖案的附接帶,該黏合層圖案附接有多個晶片;紫外線雷射光源,其配置於該帶支承件下方且可朝該附接帶移動,該紫外線雷射光源構成為朝該晶片中選定的晶片所位於的該附接帶之區域選擇性地照射紫外線雷射光,以選擇性地固化該區域中的該黏合層圖案之一者;以及拾取工具,其配置於該帶支承件上方以能夠朝該附接帶移動,該拾取工具構成為從該附接帶拾取對應於固化的黏合層圖案之該選定的晶片,並將該選定的晶片置於基板。A device for transferring a plurality of wafers, comprising: a tape support configured to support an attachment tape having an adhesive layer pattern attached to a plurality of wafers; an ultraviolet laser light source configured on the belt support below and movable toward the attachment tape, the ultraviolet laser light source is configured to selectively irradiate ultraviolet laser light toward an area of the attachment tape where a selected one of the wafers is located, to selectively cure the one of the adhesive layer patterns; and a pick-up tool disposed above the tape support to be movable toward the attachment tape, the pick-up tool configured to pick up the selected one corresponding to the cured adhesive layer pattern from the attachment tape and place the selected wafer on the substrate.
Description
本發明是關於一種從附接帶選擇性地轉移多個晶片的裝置以及使用該裝置選擇性地轉移多個晶片的方法。 The present invention relates to an apparatus for selectively transferring a plurality of wafers from an attachment tape and a method for selectively transferring a plurality of wafers using the apparatus.
在執行多個半導體製造過程的同時,轉移多個晶片的步驟相當頻繁地發生。通常,半導體晶片製造過程中的晶片已經過處理,已被重新分類並已被轉移到後續步驟,並將晶片載置於附接帶上。 While performing multiple semiconductor manufacturing processes, the step of transferring multiple wafers occurs quite frequently. Typically, wafers in a semiconductor wafer manufacturing process have been processed, re-sorted and transferred to subsequent steps, and the wafers are placed on attaching tapes.
特別地,為了從附接帶拾取晶片,在使用彈出銷或支柱的同時可能對晶片施加機械力。此時,當機械力施加於晶片時,可能造成晶片損壞。 In particular, in order to pick up the wafer from the attachment tape, it is possible to apply mechanical force to the wafer while using eject pins or posts. At this time, when a mechanical force is applied to the wafer, it may cause damage to the wafer.
另一方面,在一次拾取多個晶片的情況下,包含於預定區域中的所有晶片被拾取。在預定區域中以相同的間距佈置的所有晶片可被拾取及傳輸。因此,可能另外需要以等級對被轉移的晶片等進行分類的重新分類步驟。因此,可能需要提供一種轉移晶片的裝置以及轉移多個晶片的方法,以選擇性地僅拾取佈置於特定區域中之多個晶片中的某些晶片。 On the other hand, in the case of picking up a plurality of wafers at a time, all wafers included in a predetermined area are picked up. All wafers arranged at the same pitch in a predetermined area may be picked up and transferred. Therefore, a re-sorting step of sorting the transferred wafers and the like in grades may be additionally required. Therefore, it may be necessary to provide an apparatus for transferring a wafer and a method for transferring a plurality of wafers to selectively pick up only some of the plurality of wafers arranged in a specific area.
本發明提供了一種裝置,該裝置在預定區域內以等級選擇性地轉移多個晶片而不會造成晶片損壞。 The present invention provides an apparatus that selectively transfers a plurality of wafers in grades within a predetermined area without causing damage to the wafers.
本發明提供了一種方法,該方法在預定區域內以等級選擇性地轉移多個晶片而不會造成晶片損壞。 The present invention provides a method for selectively transferring a plurality of wafers in grades within a predetermined area without causing damage to the wafers.
根據本發明的示例性實施例,一種轉移多個晶片的裝置包括:帶支承件,其構成為支承具有黏合層圖案的附接帶,該黏合層圖案附接有多個晶片;紫外線雷射光源,其配置於該帶支承件下方且可朝該附接帶移動,該紫外線雷射光源構成為朝該晶片中選定的晶片所位於的該附接帶之區域選擇性地照射紫外線雷射光,以選擇性地固化該區域中的該黏合層圖案之一者;以及拾取工具,其配置於該帶支承件上方以能夠朝該附接帶移動,該拾取工具構成為從該附接帶拾取對應於固化的黏合層圖案之該選定的晶片,並將該選定的晶片置於基板。 According to an exemplary embodiment of the present invention, an apparatus for transferring a plurality of wafers includes: a tape support configured to support an attachment tape having an adhesive layer pattern to which a plurality of wafers are attached; an ultraviolet laser light source , which is disposed under the tape support and can move toward the attachment tape, the ultraviolet laser light source is configured to selectively irradiate ultraviolet laser light toward the area of the attachment tape where a selected wafer of the wafers is located, so as to selectively curing one of the adhesive layer patterns in the area; and a pick-up tool disposed above the band support to be movable toward the attachment band, the pick-up tool being configured to pick up from the attachment band a corresponding patterning the selected wafer with the cured adhesive layer, and placing the selected wafer on the substrate.
在示例性實施例中,該附接帶可包括基底層以及在該基底層上由紫外線固化樹脂形成的黏合層圖案。 In exemplary embodiments, the attachment tape may include a base layer and an adhesive layer pattern formed of an ultraviolet curable resin on the base layer.
此處,該黏合層圖案之各者可為點狀。此外,該黏合層圖案可分別對應於該晶片。 Here, each of the adhesive layer patterns may be dotted. In addition, the adhesive layer patterns may respectively correspond to the wafers.
替代地,該黏合層圖案分別可為條帶狀,並且可佈置為矩陣形狀。 Alternatively, the adhesive layer patterns may be strip-shaped, respectively, and may be arranged in a matrix shape.
在示例性實施例中,該拾取工具可包括黏合層,該黏合層於其下方具有平坦的表面。 In an exemplary embodiment, the pick-up tool may include an adhesive layer having a flat surface therebelow.
根據本發明的示例性實施例,一種轉移多個晶片的方法是由以下方式執行:支承附接帶,該附接帶具有黏合層圖案,該黏合層圖案附接有多 個晶片;對該晶片中選定的晶片所位於的該附接帶之區域選擇性地照射紫外線雷射光,以選擇性地固化該區域中的該黏合層圖案之一者;從該附接帶拾取位於該區域中對應於固化的黏合層圖案之晶片;以及將該晶片置於基板。 According to an exemplary embodiment of the present invention, a method of transferring a plurality of wafers is performed by supporting an attachment tape having an adhesive layer pattern to which multiple wafers are attached. a wafer; selectively irradiating an area of the attachment tape where a selected wafer of the wafers is located to selectively cure one of the adhesive layer patterns in the area; picking up from the attachment tape a wafer corresponding to the pattern of the cured adhesive layer located in the region; and placing the wafer on the substrate.
在示例性實施例中,該附接帶包括基底層以及形成在該基底層上的黏合層圖案,該黏合層圖案具有紫外線固化樹脂。 In an exemplary embodiment, the attachment tape includes a base layer and an adhesive layer pattern formed on the base layer, the adhesive layer pattern having an ultraviolet curable resin.
此處,該黏合層圖案之各者可為點狀。 Here, each of the adhesive layer patterns may be dotted.
在示例性實施例中,該黏合層圖案分別可為條帶狀,並且可佈置為矩陣形狀。 In exemplary embodiments, the adhesive layer patterns may be strip-shaped, respectively, and may be arranged in a matrix shape.
在示例性實施例中,可使用拾取工具來拾取位於選定區域中的晶片,且該拾取工具可包括黏合層,該黏合層於其下方具有平坦的表面。 In an exemplary embodiment, a pick-up tool may be used to pick up the wafer located in the selected area, and the pick-up tool may include an adhesive layer having a flat surface therebelow.
根據本發明的示例性實施例,紫外線雷射光源可選擇性地固化對應於區域中的選定之晶片的黏合層圖案之一者,並且提供拾取工具以從附接帶的固化區域拾取選定的晶片並將選定的晶片置於基板上。因此,可在不導致晶片損壞的情況下選擇性地轉移多個晶片中的選定的晶片。 According to an exemplary embodiment of the present invention, an ultraviolet laser light source can selectively cure one of the adhesive layer patterns corresponding to a selected wafer in the area, and a pick-up tool is provided to pick up the selected wafer from the cured area of the attached tape And place the selected wafer on the substrate. Accordingly, selected ones of the plurality of wafers can be selectively transferred without causing damage to the wafers.
同時,即使拾取工具包括具有平坦表面而無其他突起之黏合層,拾取工具也可選擇性地拾取對應於特定區域內的特定等級之選定的晶片。 Meanwhile, even if the pick-up tool includes an adhesive layer having a flat surface without other protrusions, the pick-up tool can selectively pick up selected wafers corresponding to a specific grade in a specific area.
另外,可以選擇性地僅拾取佈置在特定區域中的多個晶片中的選定的晶片。因此,可以省略對轉移的晶片等進行分類的重新分類步驟。 In addition, only selected wafers among a plurality of wafers arranged in a specific area may be selectively picked up. Therefore, a re-sorting step of sorting transferred wafers and the like can be omitted.
本公開的以上概述並非旨在描述本公開的各個所示的實施例或各個實施方式。以下的詳細描述和申請專利範圍更具體地舉例說明了這些實施例。 The above summary of the present disclosure is not intended to describe each illustrated embodiment or every implementation of the present disclosure. The Detailed Description and Claims that follow more particularly exemplify these embodiments.
10:物件 10: Object
12:晶片 12: Wafer
12a:晶片主體 12a: wafer body
12b:晶片墊 12b: wafer pad
14:附接帶 14: Attachment strap
14a:基底層 14a: Basal layer
14b:黏合層圖案 14b: Adhesive layer pattern
14c:選定區域 14c: Selected area
14d:黏合層圖案 14d: Adhesive layer pattern
14e:黏合層圖案 14e: Adhesive layer pattern
16:安裝框架 16: Install the frame
20:帶支承件 20: with support
24:支承環 24: support ring
26:延伸環 26: Extension ring
30:拾取工具 30: Pickup Tool
40:工具驅動單元 40: Tool drive unit
50:視覺單元 50: Visual unit
60:紫外線雷射光源 60: Ultraviolet laser light source
70:水平驅動單元 70: Horizontal drive unit
100:裝置 100: device
根據結合圖式的以下描述,可以更詳細地理解示例性實施例,其中:圖1是示出根據本發明的示例性實施例的轉移晶片的裝置之截面圖。 Exemplary embodiments can be understood in more detail from the following description in conjunction with the accompanying drawings, wherein: FIG. 1 is a cross-sectional view illustrating an apparatus for transferring a wafer according to an exemplary embodiment of the present invention.
圖2是示出附接有多個晶片的附接帶之截面圖。 FIG. 2 is a cross-sectional view showing an attachment tape to which a plurality of dies are attached.
圖3是示出附接帶的一示例之俯視圖。 Fig. 3 is a plan view showing an example of an attachment strap.
圖4是示出附接帶的另一示例之俯視圖。 Fig. 4 is a plan view showing another example of the attachment strap.
圖5是示出根據本發明的示例性實施例之轉移晶片的方法之流程圖。 FIG. 5 is a flowchart illustrating a method of transferring a wafer according to an exemplary embodiment of the present invention.
儘管各種實施例適於各種修改和替代形式,但其細節已藉由示例在圖式中示出且將被詳細描述。然而,應當理解,其意圖並非將所要求的發明限定於所描述的特定實施例。相反地,其意圖再於涵蓋落入由申請專利範圍所限定之主題的精神及範圍內的所有修改、等同形式與替代形式。 While various embodiments are susceptible to various modifications and alternative forms, details thereof have been shown in the drawings by way of example and will be described in detail. It should be understood, however, that the intention is not to limit the claimed invention to the particular embodiments described. On the contrary, the intention is to cover all modifications, equivalents, and alternatives falling within the spirit and scope of the subject matter defined by the claims.
下文中,將參照圖式詳細描述具體實施例。然而,本發明能夠以不同的形式實施,且不應被解釋為限定於此處所闡述的實施例。而是提供這些實施例以使本公開將為透徹且完整,並將向本領域之技術人員充分傳達本發明的範圍。貫串全文,相似的參考符號指代相似的元件。圖式中,為了圖示之清楚,放大了層和區域的尺寸。 Hereinafter, specific embodiments will be described in detail with reference to the drawings. However, this invention may be embodied in different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. Throughout, like reference symbols refer to like elements. In the drawings, the dimensions of layers and regions are exaggerated for clarity of illustration.
諸如第一、第二等術語可用於描述各種元件,但是上述術語所限定的上述元件不應受到限制。以上術語僅用於從其他元件中區分一個元件。例如,本發明中,在不背離第一組件到第二組件之範圍的情況下,可類似地進行命名,第二組件到第一組件也可被命名。 Terms such as first, second, etc. may be used to describe various elements, but the above elements defined by the above terms should not be limited. The above terms are only used to distinguish one element from other elements. For example, in the present invention, without departing from the scope of the first component to the second component, they can be similarly named, and the second component to the first component can also be named.
此處使用的術語僅出於描述特定之示例性實施例的目的,且並非旨在限制本發明構思。如本文所使用,單數形式「一」、「一個」以及「該」也旨在包括複數形式,除非上下文另外明確指出。將進一步理解的是,當在本說明書中使用術語「包括」及/或「包含」時,其指定了所述特徵、整體、步驟、操作、元件及/或組件之存在,但並不排除一個或多個其他特徵、整體、步驟、操作、元件、組件及/或其組之存在或增加。 The terminology used herein is for the purpose of describing particular exemplary embodiments only and is not intended to be limiting of the inventive concepts. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, unless the context clearly dictates otherwise. It will be further understood that when the terms "comprising" and/or "comprises" are used in this specification, they specify the existence of said features, integers, steps, operations, elements and/or components, but do not exclude a or the presence or addition of multiple other features, integers, steps, operations, elements, components and/or groups thereof.
除非另有定義,否則本文所使用的所有術語(包括技術術語及科學術語)具有與本技術領域所屬具有通常知識者一般所理解之含義相同的含義。還將理解,諸如在常用辭典中定義的那些術語,除非在此明確地定義,否則應當解釋為具有與其在相關技術的上下文中之含義一致的含義,且不會以理想化或過於正式的意義來解釋。 Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art. It will also be understood that terms such as those defined in commonly used dictionaries, unless expressly defined herein, should be interpreted to have a meaning consistent with their meaning in the context of the relevant art, and not in an idealized or overly formal sense to explain.
圖1是示出根據本發明的示例性實施例的轉移晶片的裝置之截面圖。圖2是示出附接有多個晶片的附接帶之截面圖。 FIG. 1 is a cross-sectional view illustrating an apparatus for transferring a wafer according to an exemplary embodiment of the present invention. FIG. 2 is a cross-sectional view showing an attachment tape to which a plurality of dies are attached.
參照圖1及圖2,根據本發明的實施例之轉移晶片的裝置100包括帶支承件20、紫外線(UV)雷射光源60及拾取工具30。裝置100可以拾取附接於附接帶14的多個晶片12,並可將晶片12置於基板(未示出)。附接帶14及附接於附接帶14的多個晶片12被定義為物件10。各個晶片12包括晶片主體12a和晶片墊(chip pad)12b。
Referring to FIGS. 1 and 2 , an
附接帶14包括基底層14a及使用紫外線可固化樹脂形成於基底層14a上的黏合層圖案14b。當對黏合層圖案14b照射紫外線時,各個黏合層圖案14b具有自第一黏合力減小的第二黏合力。由於晶片12在第二黏合力下被黏合於黏合層圖案14b,可以容易地將位於黏合層圖案14b上的晶片12從附接帶14分離。因為黏合層圖案14b未覆蓋基底層14a的整個區域,但被圖案化以覆蓋其部分區域,故拾取工具30可以容易地從附接帶14拾取晶片。
The
帶支承件20支承有多個晶片12附接於黏合層圖案14b的附接帶14。例如,帶支承件20可藉由保持附接帶14的外周來支承附接帶14。
The
帶支承件20可包括:支承環24,其用於支承附接帶14的外周;以及延伸環26,其用於藉由降低支承環24及安裝框架16來延伸附接帶14。
The
紫外線雷射光源60設置在帶支承件20的下方,且紫外線雷射光源構成為可朝附接帶14移動。例如,紫外線雷射光源60可在水平方向或垂直方向上移動。紫外線雷射光源60可將紫外線雷射光選擇性地照射於晶片中選定的晶片所位於的附接帶14之區域上。即,隨著紫外線雷射光源60移動以對附接帶14的選定區域選擇性地照射紫外線雷射光。因此,當屬於選定區域的黏合層圖案14b之一者被選擇性地固化,該黏合層圖案14b之一者具有自第一黏合力減小的第二黏合力。
The ultraviolet
另外,由於控制了紫外線雷射光源的開啟/關閉,紫外線雷射光源60將紫外線雷射光選擇性地照射在位於選定區域中的某些黏合層圖案14b上,而不將紫外線雷射光照射於其他黏合層圖案14b上。因此,位於選定區域中的某些黏合層圖案14b可被選擇性地固化。
In addition, since the on/off of the ultraviolet laser light source is controlled, the ultraviolet
因此,隨著紫外線雷射光源60移動並開啟/關閉,某些黏合層圖案14b可被固化。之前在選定區域中緊密地黏合於某些黏合層圖案14b的晶片12失去第一黏合力而變成微弱地黏合於某些黏合層圖案14b。因此,由於拾取工具30可以選擇性地拾取在附接帶14的選定區域中之選定的晶片12,故可抑制在執行拾取過程中可能對晶片造成的損壞,並且可以容易地執行拾取過程以從附接帶14選擇性地拾取多個晶片12。
Therefore, as the ultraviolet
紫外線雷射光源60可連接於水平驅動單元70。水平驅動單元70可使紫外線雷射光源60在水平方向,即在X方向和Y方向兩者上移動。
The ultraviolet
水平驅動單元70可以包括例如設置成彼此交叉的一對導軌(未示出)及軀動源(未示出),該驅動源使用產生驅動源之缸體或馬達以使紫外線雷射光源60沿導軌移動。
The
拾取工具30配置於帶支承件20上方,以便能夠朝附接帶14移動。拾取工具30從附接帶14拾取位於選定的區域中的晶片12並將其放置。
A pick-up
拾取工具30可以包括於其下方具有平坦的表面的黏合層31。黏合層31可從基底層14a拾取晶片12,因為黏合層31具有高於將晶片12黏合於附接帶14之第二黏合力的黏合力。因此,即使拾取工具30具備於其下方具有平坦表面而無分離之突起的黏合層31,也可以在特定區域中選擇性地拾取被分類為特定等級的晶片。
The pick-up
替代地,拾取工具30可以藉由使用真空力來拾取晶片12。
Alternatively, the
此處,拾取工具30可以從基底層14a選擇性地拾取對第二黏合力具有減弱之黏合力的晶片12,同時拾取工具30的平坦表面與附接帶14的選定區域完全地接觸。
Here, the pick-up
拾取工具30可以配置於由帶支承件20支承的物件上方以用於轉移物件,並且可安裝於工具驅動單元40上。工具驅動單元40可於水平及垂直方向驅動拾取工具30,從而拾取工具30拾取從附接帶14分離的晶片12並轉移晶片12。
The pick-up
另外,可以將用於確定晶片12位置的視覺單元50配置於由帶支承件20支承的物件10上方。視覺單元50可以獲取所要拾取的晶片12的圖像,並從所獲取的晶片圖像獲取晶片12的位置坐標。
In addition, a
圖3是示出附接帶的一示例之俯視圖。圖4是示出附接帶的另一示例之俯視圖。 Fig. 3 is a plan view showing an example of an attachment strap. Fig. 4 is a plan view showing another example of the attachment strap.
參照圖3所示,附接帶14可分別包括基底層14a及設置在基底層14a上並佈置為點狀的黏合層圖案14b。
Referring to FIG. 3 , the
佈置為點狀的黏合層圖案14b與各個晶片12部分地重疊。因此,黏合層圖案14b並非將各個晶片12的整個區域固定於附接帶14上,而是將各個晶片部分地黏合於晶片附接帶14。
The
某些黏合層圖案14b限定了附接帶14的選定區域14c。在選定區域14c中,某些黏合層圖案14d可以被固化,而其他黏合層圖案14e可保持為未固化狀態。
Certain
因此,當分別將晶片12附接於基底層14a的黏合層圖案14b選擇性地被固化且黏合力藉由減小的第二黏合力而減弱,晶片12可容易地被拾取。
Therefore, when the
因此,當用於將晶片12分別附接於基底層14a的黏合層圖案14b選擇性地被固化以減弱黏合力從而具有第二黏合力時,拾取工具30可以容易地拾取晶片12。
Therefore, when the
各個黏合層圖案14b可設置為對應於各個晶片12。各個黏合層圖案14b可形成為與各個晶片12的中心部分重疊。因此,各個晶片12的中心部分
藉由各個黏合層圖案14b黏合於基底層14a,而各個晶片12的外周處於跨越基底層14a的狀態。因此,拾取工具30可以容易地從基底層14a拾取晶片12。
The respective
替代地,各個黏合層圖案14b可對應為部分地與各個晶片12的外周部分重疊。
Alternatively, each
圖4是示出附接帶的另一示例之俯視圖。 Fig. 4 is a plan view showing another example of the attachment strap.
參照圖4,附接帶14可包括基底層14a及黏合層圖案14b,各個黏合層圖案14b具有彼此交叉的條帶形狀,並且設置在基底層14a的上表面上。因此,黏合層圖案14b可佈置為矩陣形狀。
Referring to FIG. 4 , the
圖5是示出根據本發明的示例性實施例之轉移晶片的方法之流程圖。 FIG. 5 is a flowchart illustrating a method of transferring a wafer according to an exemplary embodiment of the present invention.
參照圖5,支承將多個晶片附接於黏合層圖案的附接帶(S110)。附接帶處於晶片被黏合於附接帶的狀態。附接帶包括基底層以及由紫外線可固化樹脂製成並形成於基底層上的黏合層圖案。 Referring to FIG. 5 , an attachment tape attaching a plurality of wafers to an adhesive layer pattern is supported ( S110 ). The attachment tape is in a state where the wafer is bonded to the attachment tape. The attachment tape includes a base layer and an adhesive layer pattern made of ultraviolet curable resin and formed on the base layer.
隨後,紫外線雷射光被選擇性地照射在晶片中被選定的晶片所位於的晶片附接帶之區域上。因此,存在於該區域中的某些黏合層圖案被選擇性地固化(S130)。 Subsequently, ultraviolet laser light is selectively irradiated on the area of the die attach tape where selected ones of the wafers are located. Accordingly, certain adhesive layer patterns present in the region are selectively cured (S130).
之後,位於選定區域中的晶片從固化的黏合層圖案被分離,並從附接帶被拾取(S150)。此處,拾取工具用於從晶片附接帶拾取位於該區域中的晶片。此情況下,拾取工具包括黏合層,該黏合層於其下方具有平坦的表面。 After that, the wafer located in the selected area is separated from the cured adhesive layer pattern, and picked up from the attachment tape (S150). Here, a pick tool is used to pick up a die located in this area from the die attach tape. In this case, the pick-up tool comprises an adhesive layer with a flat surface underneath.
隨後,將晶片置於基板上(S170)。因此,可以選擇性地僅拾取佈置於特定區域中的晶片中被選定的晶片。因此,可以省略對晶片等進行分類的重新分類步驟。 Subsequently, the wafer is placed on the substrate (S170). Therefore, only selected wafers among wafers arranged in a specific area can be selectively picked up. Therefore, a re-sorting step for sorting wafers and the like can be omitted.
儘管已經參考特定實施例描述了轉移多個晶片的裝置和轉移多個晶片的方法,但是它們不限於此。因此,本領域技術人員容易理解,在不脫離 由所附請求項限定的本公開的精神及範圍的情況下,可對其進行各種修改與改變。 Although the apparatus for transferring a plurality of wafers and the method for transferring a plurality of wafers have been described with reference to specific embodiments, they are not limited thereto. Therefore, those skilled in the art can easily understand that without departing from Various modifications and changes may be made within the spirit and scope of the present disclosure as defined by the appended claims.
10 物件
12 晶片
14 黏合層圖案
16 安裝框架
20 帶支承件
24 支承環
26 延伸環
30 拾取工具
40 工具驅動單元
50 視覺單元
60 紫外線雷射光源
70 水平驅動單元
100 裝置
10
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Citations (3)
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JP2005045074A (en) * | 2003-07-23 | 2005-02-17 | Sony Corp | Method of exfoliation |
TW200629433A (en) * | 2004-10-04 | 2006-08-16 | Matsushita Electric Ind Co Ltd | Electronic component pickup method, electronic component mounting method and electronic component mounting apparatus |
US20190378720A1 (en) * | 2017-09-20 | 2019-12-12 | International Business Machines Corporation | Chip handling and electronic component integration |
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Patent Citations (3)
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JP2005045074A (en) * | 2003-07-23 | 2005-02-17 | Sony Corp | Method of exfoliation |
TW200629433A (en) * | 2004-10-04 | 2006-08-16 | Matsushita Electric Ind Co Ltd | Electronic component pickup method, electronic component mounting method and electronic component mounting apparatus |
US20190378720A1 (en) * | 2017-09-20 | 2019-12-12 | International Business Machines Corporation | Chip handling and electronic component integration |
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