TWI792404B - Transparent film, display apparatus comprising the same and method of measuring average two-dimensional dispersibility of filler - Google Patents
Transparent film, display apparatus comprising the same and method of measuring average two-dimensional dispersibility of filler Download PDFInfo
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Abstract
Description
本揭露是有關於一種透光膜及包括其之顯示元件,且特別是有關於一種具有卓越的填料分散性的透光膜及包括其之顯示元件。 The disclosure relates to a light-transmitting film and a display element including the same, and in particular to a light-transmitting film with excellent filler dispersibility and a display element including the same.
最近,為減小顯示元件的厚度及重量並增加可撓性,已考慮使用透光膜代替玻璃作為顯示元件的覆蓋窗。為了使透光膜可用作顯示元件的覆蓋窗,透光膜需要具有卓越的光學性質及優異的物理性質,例如硬度、耐磨性及可撓性。 Recently, in order to reduce the thickness and weight of the display element and increase the flexibility, it has been considered to use a light-transmitting film instead of glass as the cover window of the display element. In order for the light-transmitting film to be useful as a cover window of a display element, the light-transmitting film needs to have excellent optical properties as well as excellent physical properties such as hardness, abrasion resistance, and flexibility.
透明塑膠膜正被研究作為顯示元件的覆蓋窗的透光膜。舉例而言,在透明塑膠膜中,具有高硬度的聚醯亞胺系膜正被研究作為可撓性顯示元件的覆蓋窗的材料。聚醯亞胺系膜由聚醯亞胺(polyimide,PI)系樹脂製成。聚醯亞胺(PI)系樹脂具有不溶性、耐化學性、耐熱性、耐輻射性及低溫特性,且因此被用作汽車材料、航空材料、航天器材料、絕緣塗層、絕緣膜、保護膜 及類似物。 Transparent plastic films are being studied as light-transmitting films for cover windows of display components. For example, among transparent plastic films, polyimide films with high hardness are being studied as materials for cover windows of flexible display elements. The polyimide film is made of polyimide (polyimide, PI) resin. Polyimide (PI)-based resins have insolubility, chemical resistance, heat resistance, radiation resistance, and low-temperature characteristics, and are therefore used as automotive materials, aviation materials, spacecraft materials, insulating coatings, insulating films, protective films and the like.
同時,為了賦予透光膜所需的物理性質,可將填料添加至透光膜。填料較佳為均勻分散於透光膜中。 Meanwhile, in order to impart desired physical properties to the light-transmitting film, fillers may be added to the light-transmitting film. The filler is preferably uniformly dispersed in the transparent film.
因此,鑒於上述問題而做出本揭露,且本揭露的一個目的是提供一種透光膜,所述透光膜包含均勻分散於透光基質中的填料。 Therefore, the present disclosure is made in view of the above problems, and an object of the present disclosure is to provide a light-transmitting film comprising fillers uniformly dispersed in a light-transmitting matrix.
本揭露的另一目的是提供一種量測分散於透光基質中的填料的平均二維分散性的方法。 Another object of the present disclosure is to provide a method for measuring the average two-dimensional dispersibility of fillers dispersed in a light-transmitting matrix.
本揭露的另一目的是提供一種透光膜,所述透光膜包含以25%或大於25%的平均二維分散性分散於透光基質中的填料。 Another object of the present disclosure is to provide a light-transmitting film comprising a filler dispersed in a light-transmitting matrix with an average two-dimensional dispersion of 25% or greater.
本揭露的另一目的是提供一種生產具有優異填料分散性的透光膜的方法。 Another object of the present disclosure is to provide a method for producing a light-transmitting film with excellent filler dispersibility.
根據本揭露,上述及其他目的可藉由提供一種透光膜來達成,所述透光膜包括:透光基質;及填料,分散於所述透光基質中,其中所述填料具有25%或大於25%的平均二維分散性,其中所述平均二維分散性根據以下等式計算:
其中Dx是根據透光膜的樣品的顯微鏡影像中顯示的填料顆粒的數目及所述顯微鏡影像的面積計算的所述填料顆粒之間的理想二維距離;Daj是所述顯微鏡影像中顯示的最近的相鄰填料顆粒之間的量測二維距離;且N是所述顯微鏡影像中所述填料顆粒的總數。 Wherein Dx is the ideal two-dimensional distance between the filler particles calculated according to the number of filler particles shown in the microscope image of the sample of the light-transmitting film and the area of the microscope image; Daj is the closest distance shown in the microscope image and N is the total number of filler particles in the microscope image.
所述填料可具有25%至55%的平均二維分散性。 The filler may have an average two-dimensional dispersibility of 25% to 55%.
所述填料可包括無機顆粒、有機顆粒及有機-無機混合顆粒中的至少一種。 The filler may include at least one of inorganic particles, organic particles and organic-inorganic hybrid particles.
所述填料可包括二氧化矽(SiO2)。 The filler may include silicon dioxide (SiO 2 ).
所述填料可具有5奈米至50奈米的平均粒徑。 The filler may have an average particle diameter of 5 nm to 50 nm.
基於所述透光膜的總重量,所述填料可以0.01重量%至20重量%的量存在。 The filler may be present in an amount of 0.01% by weight to 20% by weight based on the total weight of the light-transmitting film.
所述透光膜可具有3.5或小於3.5的黃色指數。 The light transmissive film may have a yellowness index of 3.5 or less.
所述透光膜可具有2%或小於2%的霧度。 The light-transmitting film may have a haze of 2% or less.
所述透光膜可具有88%或大於88%的透光率。 The light-transmitting film may have a light transmittance of 88% or more.
所述透光膜可具有110百萬帕或大於110百萬帕的2%屈服強度。 The light-transmitting film may have a 2% yield strength of 110 megapascals or greater.
所述透光膜可具有4.5吉帕或大於4.5吉帕的楊氏模數。 The light-transmitting film may have a Young's modulus of 4.5 GPa or greater.
所述顯微鏡影像可為以20,000x的放大率拍攝的透射電子顯微鏡(transmission electron microscope,TEM)影像。 The microscope image may be a transmission electron microscope (TEM) image taken at a magnification of 20,000×.
可藉由在平行於厚度方向的方向上將所述透光膜切割成120奈米的厚度來獲得所述樣品。所述填料可具有5奈米至80奈 米的平均粒徑。 The sample can be obtained by cutting the light-transmitting film into a thickness of 120 nm in a direction parallel to the thickness direction. The filler can have 5nm to 80nm The average grain size of rice.
所述顯微鏡影像可為以3,000x的放大率拍攝的掃描電子顯微鏡(scanning electron microscope,SEM)影像。 The microscope image may be a scanning electron microscope (SEM) image taken at a magnification of 3,000×.
可藉由對所述透光膜的平行於所述厚度方向的橫截面進行成像來獲得所述顯微鏡影像。所述填料可具有50奈米至500奈米的平均粒徑。 The microscope image can be obtained by imaging a cross-section of the light-transmitting film parallel to the thickness direction. The filler may have an average particle diameter of 50 nm to 500 nm.
所述透光基質可包含醯亞胺重複單元。 The light-transmitting matrix may include imide repeating units.
所述透光基質可包含醯胺重複單元。 The light-transmitting matrix may comprise amide repeating units.
根據本揭露的另一態樣,提供一種顯示元件,所述顯示元件包括:顯示面板;及透光膜,設置於所述顯示面板上。 According to another aspect of the present disclosure, a display element is provided, and the display element includes: a display panel; and a light-transmitting film disposed on the display panel.
根據本揭露的又一態樣,提供一種量測填料的平均二維分散性的方法,所述方法包括:生產包含填料的透光膜的樣品;獲得所述樣品的顯微鏡影像;對所述顯微鏡影像進行預處理,以獲得經處理影像;自所述經處理影像獲得關於填料顆粒的位置的座標資料;使用所述座標資料確定所述填料顆粒的數目;使用所述填料顆粒的所述數目及所述顯微鏡影像的面積計算所述填料顆粒之間的理想二維距離;及使用所述座標資料計算所述填料顆粒之間的距離。 According to yet another aspect of the present disclosure, there is provided a method of measuring the average two-dimensional dispersion of fillers, the method comprising: producing a sample of a light-transmitting film containing fillers; obtaining a microscope image of the sample; preprocessing the image to obtain a processed image; obtaining coordinate data about the location of filler particles from the processed image; using the coordinate data to determine the number of the filler particles; using the number of the filler particles and calculating an ideal two-dimensional distance between the filler particles from the area of the microscope image; and calculating the distance between the filler particles using the coordinate data.
根據本揭露的實施例,可以算術方式計算包含在透光膜中的填料的平均二維分散性,且因此可以容易理解的方式評估填料的分散狀態。 According to an embodiment of the present disclosure, the average two-dimensional dispersibility of the filler contained in the light-transmitting film can be calculated arithmetically, and thus the dispersion state of the filler can be evaluated in an easily understandable manner.
根據本揭露的實施例,可生產具有優異填料分散性的透光膜,且因此可容易選擇具有優異填料分散性的透光膜。 According to the embodiments of the present disclosure, a light-transmitting film having excellent filler dispersibility can be produced, and thus a light-transmitting film having excellent filler dispersibility can be easily selected.
根據本揭露實施例的透光膜由於其卓越的填料分散性,可表現出優異的霧度特性、楊氏模數及屈服強度。 The light-transmitting film according to the embodiments of the present disclosure can exhibit excellent haze characteristics, Young's modulus and yield strength due to its excellent filler dispersibility.
根據本揭露實施例的透光膜由於其優異的光學性質及機械性質,可用作顯示元件的覆蓋窗。 The light-transmitting film according to the embodiments of the present disclosure can be used as a cover window of a display device due to its excellent optical and mechanical properties.
100:透光膜/聚醯亞胺系膜 100: Light-transmitting film/polyimide film
110:透光基質/聚醯亞胺系基質/基質 110: Light-transmitting matrix/polyimide-based matrix/matrix
120:填料/填料顆粒 120: filler/filler particles
200:顯示元件 200: display components
210:模製物 210: molding
250:刀 250: Knife
310、410:樣品 310, 410: samples
501:顯示面板 501: display panel
510:基底 510: base
520:半導體層 520: semiconductor layer
530:閘極電極 530: gate electrode
535:閘極絕緣層 535: gate insulation layer
541:源極電極 541: source electrode
542:汲極電極 542: Drain electrode
551:層間絕緣層 551: interlayer insulating layer
552:平坦化層 552: Planarization layer
570:有機發光元件 570: Organic Light Emitting Components
571:第一電極 571: first electrode
572:有機發光層 572: Organic light-emitting layer
573:第二電極 573: second electrode
580:堤層 580: embankment layer
590:薄膜包封層 590: film encapsulation layer
a、b:長度 a, b: length
P:部分 P: part
TFT:薄膜電晶體 TFT: thin film transistor
t1、t2:厚度 t1, t2: Thickness
X、Y:軸 X, Y: axis
藉由結合附圖閱讀以下詳細說明,將更清楚地理解本揭露的上述及其他目的、特徵及其他優點,在附圖中:圖1是示出根據本揭露實施例的透光膜的示意圖;圖2是示出對顯微鏡影像進行處理的步驟的示意圖;圖3是示出計算填料顆粒之間的理想二維距離Dx的方法的示意圖;圖4是示出填料顆粒之間的距離的分佈的曲線圖;圖5是示出根據本揭露的另一實施例的顯示元件的一部分的剖視圖;圖6是示出圖5的部分「P」的放大剖視圖;圖7a是示出在平行於厚度(t1)方向的方向上切割透光膜的示意性透視圖;圖7b是示出根據本揭露一個實施例的透光膜的樣品的透視圖及對該膜成像的方法;及 圖8是示出根據另一實施例的對透光膜成像的方法的透視圖。 By reading the following detailed description in conjunction with the accompanying drawings, the above and other purposes, features and other advantages of the present disclosure will be more clearly understood. In the accompanying drawings: FIG. 1 is a schematic diagram showing a light-transmitting film according to an embodiment of the present disclosure; Fig. 2 is a schematic diagram showing the steps of processing microscope images; Fig. 3 is a schematic diagram showing a method for calculating an ideal two-dimensional distance Dx between filler particles; Fig. 4 is a diagram showing the distribution of distances between filler particles Graph; FIG. 5 is a cross-sectional view showing a part of a display element according to another embodiment of the present disclosure; FIG. 6 is an enlarged cross-sectional view showing a portion "P" of FIG. 5; A schematic perspective view of cutting the light-transmitting film in the direction of t1) direction; FIG. 7 b is a perspective view showing a sample of a light-transmitting film according to an embodiment of the present disclosure and a method for imaging the film; and FIG. 8 is a perspective view illustrating a method of imaging a light-transmitting film according to another embodiment.
在下文中,將參照附圖詳細地闡述本揭露的實施例。然而,提供以下實施例僅是為進行例示,以清楚地理解本揭露,且並不限制本揭露的範圍。 Hereinafter, embodiments of the present disclosure will be explained in detail with reference to the accompanying drawings. However, the following examples are provided only for illustration to clearly understand the present disclosure, and do not limit the scope of the present disclosure.
在附圖中揭露的用於闡述本揭露的實施例的形狀、大小、比率、角度及數目僅是示例性的,且本揭露不限於所示細節。貫穿本說明書,相同的參考編號指代相同的部件。在以下說明中,當判斷對相關眾所習知功能或配置的詳細說明不必要地使本揭露的標的模糊不清時,將省略所述詳細說明。 The shapes, sizes, ratios, angles and numbers disclosed in the drawings for illustrating the embodiments of the present disclosure are exemplary only, and the present disclosure is not limited to the details shown. Throughout this specification, the same reference numbers refer to the same parts. In the following description, when it is judged that a detailed description of a related well-known function or configuration unnecessarily obscures the subject matter of the present disclosure, the detailed description will be omitted.
在本說明書中使用例如「包括」、「具有」或「包含」等用語的情況下亦可存在另一部分,除非使用表述「僅」。單數形式的用語可包括複數含義,除非上下文另有表述。此外,在解釋部件時,即使不存在對其的明確說明,所述部件亦應被解釋為包括誤差範圍。 Where a term such as "comprises", "has" or "comprises" is used in this specification, another part may also be present, unless the expression "only" is used. Terms in the singular may include the plural unless the context dictates otherwise. Furthermore, when explaining a component, the component should be construed as including a range of error even if there is no explicit description thereof.
在位置關係的闡述中,舉例而言,當位置關係被闡述為「在...上」、「上方」、「下方」或「靠近」時,可包括其間並未接觸的情況,除非使用「恰好(just)」或「直接」。 In the description of positional relationship, for example, when a positional relationship is stated as "on", "above", "below" or "near", this may include the absence of contact between them, unless the use of " Exactly (just)" or "directly".
例如「下方」、「之下」、「下部」、「上方」及「上部」等空間相對用語在本文中可用於闡述如圖中所示的元件或部件與另一元件或另一部件的關係。應理解,除圖中繪示的定向之外,空 間相對用語還旨在包括在元件的使用或操作期間元件的不同定向。舉例而言,若其中一個圖中的元件上下顛倒,則被闡述為在其他部件「下方」或在其他部件「之下」的元件此時將被定位成位於其他部件「上方」。因此,示例性用語「下方」或「之下」可涵蓋「下方」及「上方」兩種含義。同樣地,示例性用語「上方」或「上部」可涵蓋「上方」及「下方」兩種含義。 Spatially relative terms such as "below", "under", "lower", "above" and "upper" may be used herein to describe the relationship of an element or component to another element or component as shown in the figures. . It should be understood that in addition to the orientation depicted in the figure, empty Relative terms are also intended to encompass different orientations of elements during use or operation of the elements. For example, if an element in one of the figures is turned upside down, elements described as "below" or "beneath" the other elements would then be oriented "above" the other elements. Thus, the exemplary terms "below" or "under" can encompass both "below" and "above". Likewise, the exemplary terms "above" or "upper" can encompass both "above" and "below".
在闡述時間關係時,舉例而言,當時間順序被闡述為使用「之後」、「隨後」、「接下來」或「之前」時,除非使用「恰好」或「直接」,否則可包括非連續關係的情況。 In stating temporal relationships, for example, when chronological order is stated using "after", "after", "next" or "before", discontinuities may be included unless "exactly" or "directly" are used the situation of the relationship.
應理解,儘管在本文中可能使用用語「第一」、「第二」等來闡述各種部件,但該些部件不應受該些用語限制。該些用語僅用於區分一個部件與另一部件。因此,在本揭露的技術思想內,第一部件可被稱為第二部件。 It should be understood that although the terms "first", "second", etc. may be used herein to describe various components, these components should not be limited by these terms. These terms are only used to distinguish one component from another. Therefore, the first component may be referred to as the second component within the technical idea of the present disclosure.
應理解,用語「至少一者」包括與任一項目相關的所有組合。舉例而言,「第一部件、第二部件及第三部件中的至少一者」可包括自第一部件、第二部件及第三部件中選擇的二或更多個部件、以及第一部件、第二部件及第三部件中的每一部件的所有組合。 It should be understood that the term "at least one" includes all combinations associated with any one item. For example, "at least one of the first component, the second component, and the third component" may include two or more components selected from the first component, the second component, and the third component, and the first component , all combinations of each of the second and third components.
如熟習此項技術者將容易理解,本揭露的各種實施例的特徵可部分地或完全地彼此耦合或組合,並且可以不同方式彼此相互操作及在技術上驅動。本揭露的實施例可彼此獨立地實行,或者可以相互關聯的方式一起實行。 Those skilled in the art will easily understand that the features of various embodiments of the present disclosure may be partially or completely coupled or combined with each other, and may interoperate with each other and be technically driven in different ways. Embodiments of the present disclosure may be implemented independently of each other, or may be implemented together in an interrelated manner.
圖1是示出根據本揭露實施例的透光膜100的示意圖。
FIG. 1 is a schematic diagram illustrating a light-transmitting
根據本揭露實施例的透光膜100包括透光基質110及分散於透光基質中的填料120。
The
根據本揭露的實施例,透光基質110是透光的。另外,透光基質110可為可撓性的。舉例而言,透光基質110可為可彎曲的、可折疊的及可捲曲的。
According to an embodiment of the present disclosure, the light-transmitting
透光基質110包括透光樹脂。透光基質110可包括例如醯亞胺重複單元。另外,透光基質110可包括例如醯胺重複單元。
The light-transmitting
根據本揭露實施例的透光基質110可由包括例如二酐及二胺的單體組分製備。更具體而言,根據本揭露實施例的透光基質110可具有由二酐及二胺形成的醯亞胺重複單元。另外,根據本揭露實施例的透光基質110可具有由二羰基化合物及二胺形成的醯胺重複單元。
The light-transmitting
根據本揭露實施例的透光基質110可由包括二酐、二胺及二羰基化合物的單體組分製備。因此,根據本揭露實施例的透光基質110可具有醯亞胺重複單元及醯胺重複單元。具有醯亞胺重複單元及醯胺重複單元的透光基質110可為例如聚醯胺-醯亞胺樹脂。
The light-transmitting
根據本揭露實施例的透光基質110可包括聚醯亞胺樹脂或聚醯胺-醯亞胺樹脂。根據本揭露的實施例,包括醯亞胺重複單元的樹脂被稱為聚醯亞胺系樹脂。聚醯亞胺系樹脂包括聚醯亞胺樹脂及聚醯胺-醯亞胺樹脂。
The light-transmitting
根據本揭露的實施例,用作透光基質110的聚醯亞胺系樹脂可具有優異的機械性質及光學性質。
According to an embodiment of the present disclosure, the polyimide-based resin used for the light-transmitting
透光基質110可具有足以使透光膜100能夠保護顯示面板的厚度。舉例而言,透光基質110可具有10微米至100微米的厚度。透光基質110的厚度可與透光膜100的厚度t1相同。透光膜100可具有10微米至100微米的厚度t1。
The light-transmitting
根據本揭露實施例的透光膜100包括例如使用聚醯亞胺系樹脂作為透光基質110的聚醯亞胺系膜。聚醯亞胺系膜包括聚醯亞胺膜及聚醯胺-醯亞胺膜。
The light-transmitting
填料120可為無機材料或有機材料。填料120可具有顆粒形狀。根據本揭露的實施例,填料120可包括無機顆粒、有機顆粒或有機-無機混合顆粒中的至少一種。
The
根據本揭露的實施例,填料120可包括二氧化矽(SiO2)。舉例而言,無機二氧化矽(SiO2)顆粒可用作填料120。
According to an embodiment of the present disclosure, the
根據本揭露的實施例,用作填料120的二氧化矽(SiO2)的至少一部分可經表面處理。更具體而言,經表面處理的二氧化矽(SiO2)顆粒可用作填料120。根據本揭露的實施例,用作填料120的二氧化矽(SiO2)的至少一部分可使用具有烷氧基的有機化合物進行表面處理。根據本揭露的實施例,不管表面處理如何,均使用二氧化矽顆粒;換言之,二氧化矽顆粒旨在包括非表面處理的二氧化矽顆粒及經表面處理的二氧化矽顆粒。
According to an embodiment of the present disclosure, at least a portion of silicon dioxide (SiO 2 ) used as the
舉例而言,使用經取代或未經取代的烷基烷氧基矽烷或
苯基烷氧基矽烷中的至少一種進行表面處理的二氧化矽(SiO2)顆粒可用作填料120。
For example, silicon dioxide (SiO 2 ) particles surface-treated with at least one of substituted or unsubstituted alkylalkoxysilanes or phenylalkoxysilanes may be used as the
具體而言,使用甲基烷氧基矽烷、乙基烷氧基矽烷或苯基烷氧基矽烷進行表面處理的二氧化矽(SiO2)顆粒可用作填料120。根據本揭露的實施例,例如使用三甲氧基(甲基)矽烷及苯基三甲氧基矽烷進行表面處理的二氧化矽(SiO2)顆粒可用作填料120。
Specifically, silicon dioxide (SiO 2 ) particles surface-treated with methylalkoxysilane, ethylalkoxysilane, or phenylalkoxysilane may be used as the
根據本揭露的實施例,填料120可具有由以下式1至式6表示的單元結構:
[式3]
[式6]
其中R各自獨立地為具有1至10個碳原子的烷基、具有1至10個碳原子的烷氧基、具有3至10個碳原子的環烷基或具有6至18個碳原子的苯基中的至少一種。 wherein each R is independently an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, or a benzene having 6 to 18 carbon atoms at least one of the bases.
在根據本揭露實施例的透光膜100中,分散於透光基質110中的填料120具有25%或大於25%的平均二維分散性。
In the light-transmitting
填料120的平均二維分散性使用以下的等式1計算。
The average two-dimensional dispersibility of the
其中Dx是填料顆粒之間的理想二維距離,且Daj是相鄰填料顆粒之間的量測二維距離。 where Dx is the ideal two-dimensional distance between filler particles, and Daj is the measured two-dimensional distance between adjacent filler particles.
具體而言,在等式1中,Dx是根據透光膜的樣品的顯微鏡影像中顯示的填料顆粒的數目及顯微鏡影像的面積計算的填料顆粒之間的理想二維距離,Daj是顯微鏡影像中顯示的最近的填料顆粒之間的量測二維距離,且N是顯微鏡影像中填料顆粒的總數。 Specifically, in Equation 1, Dx is the ideal two-dimensional distance between filler particles calculated from the number of filler particles shown in the microscope image of the sample of the light-transmitting film and the area of the microscope image, and Daj is the ideal two-dimensional distance between the filler particles in the microscope image. The measured two-dimensional distance between the nearest filler particles is shown, and N is the total number of filler particles in the microscope image.
顯微鏡影像是透光膜100的樣品310的顯微鏡影像。透
光膜100的樣品310可藉由在平行於厚度t1的方向上將透光膜100切割成120奈米的厚度t2來生產(參見圖7a及圖7b)。
The microscope image is a microscope image of a
根據本揭露的實施例,顯微鏡影像可為以20,000x的放大率拍攝的透射電子顯微鏡(TEM)影像。 According to an embodiment of the present disclosure, the microscope image may be a transmission electron microscope (TEM) image taken at a magnification of 20,00Ox.
在根據本揭露實施例的透光膜100中,分散於透光基質110中的填料120可具有使用以20,000x的放大率拍攝的透射電子顯微鏡(TEM)影像計算的25%或大於25%的平均二維分散性。
In the light-transmitting
填料顆粒120之間的距離可根據以下方法獲得。
The distance between
圖7a是示出在平行於透光膜的厚度(t1)方向的方向上切割透光膜的示意性透視圖。圖7b是示出根據本揭露一個實施例的透光膜的樣品的透視圖及對該膜成像的方法。 Fig. 7a is a schematic perspective view showing cutting of the light-transmitting film in a direction parallel to the thickness (t1) direction of the light-transmitting film. 7b is a perspective view showing a sample of a light-transmitting film and a method of imaging the film according to one embodiment of the present disclosure.
首先,為了獲得顯微鏡影像,生產透光膜100的樣品310。參照圖7a,透光膜100可使用模製物210來覆蓋。舉例而言,透光膜100可藉由包含環氧樹脂的模製物210來固定。
First, in order to obtain a microscope image, a
如圖7a中所示,使用刀250切割透光膜100。具體而言,切割由模製物210固定的透光膜100以生產樣品310。
As shown in FIG. 7 a , the light-transmitting
根據本揭露的實施例,透光膜100的樣品310可藉由在平行於厚度t1方向的方向上將透光膜100切割成120奈米的厚度t2來生產。在圖7a及圖7b中,透光膜100的厚度方向是t1的方向,且樣品310的厚度方向是t2的方向。
According to an embodiment of the present disclosure, the
對圖7b中所示的樣品310進行顯微成像。在透光膜100的一部分上自圖7b中所示影像的頂部向底部進行顯微成像。更具
體而言,透光膜100的樣品310可在圖7b中由「PIC」指示的方向上成像。
Microscopic imaging was performed on the
圖2是示出對顯微鏡影像進行處理的步驟的示意圖。 Fig. 2 is a schematic diagram illustrating the steps of processing a microscope image.
藉由使用顯微鏡成像,可獲得如圖2A中所示的透光膜100的顯微鏡影像。顯微鏡影像可藉由使用顯微鏡對包含填料120的透光膜100成像來產生。舉例而言,有關此處使用的顯微鏡可為光學顯微鏡或透射電子顯微鏡(TEM)。
By using microscope imaging, a microscope image of the light-transmitting
根據本揭露的實施例,本文中使用的透射電子顯微鏡(TEM)是由日本電子(JEOL)製造的JEM-2100F。藉由根據使用已知顯微鏡的方法執行成像來獲得顯微鏡影像。 According to an embodiment of the present disclosure, the transmission electron microscope (TEM) used herein is JEM-2100F manufactured by JEOL. Microscopic images are obtained by performing imaging according to methods using known microscopes.
圖2A是根據本揭露實施例的透光膜100在20,000x(20K)的放大率下拍攝的透射電子顯微鏡(TEM)影像。
FIG. 2A is a transmission electron microscope (TEM) image taken at a magnification of 20,000x (20K) of the light-transmitting
接下來,對顯微鏡影像進行預處理,以生成如圖2(B)中所示的經處理影像。在對顯微鏡影像進行預處理的步驟中,填料120可與除填料120之外的部分清楚地區分開,因此可提高填料120的區別性。舉例而言,顯微鏡影像可藉由顏色分離(color separation)轉換成單色影像或雙色影像。根據本揭露的實施例,可藉由對顯微鏡影像進行預處理將顯微鏡影像轉換成黑白影像。
Next, the microscope images were preprocessed to generate the processed images shown in Figure 2(B). In the step of preprocessing the microscope image, the
圖2B是自透光膜100的透射電子顯微鏡(TEM)影像轉換的黑白影像。
FIG. 2B is a black and white image converted from a transmission electron microscope (TEM) image of the
接下來,自經處理影像提取填料120的顆粒的位置的座標資料。
Next, the coordinate data of the positions of the particles of
具體而言,為了提取關於填料顆粒120的位置的座標資料,將填料顆粒120自經處理影像中隔離。因此,在圖2C的影像中僅留下對應於圖2B的影像中的填料120的顆粒的點。此處,自影像中的點中排除具有過小直徑的點。舉例而言,自影像排除被量測具有小於填料120顆粒的平均直徑的1/10的直徑的點。因此,獲得圖2C的影像。在本揭露的實施例中,如圖2C中所示的影像被稱為「渲染影像(rendered image)」。
Specifically, the
使用影像分析程式對渲染影像進行分析,以提取填料120的顆粒的座標。在此情況下,基於點的座標被稱為「填料120的座標」。
The rendered image is analyzed using an image analysis program to extract the coordinates of the particles of the
根據本揭露的實施例,填料120的顆粒的座標可藉由iTEM使用奧林巴斯(Olympus)生產的iTEM5.1作為影像分析程式來獲得。
According to an embodiment of the present disclosure, the coordinates of the particles of the
當獲得填料120的顆粒的座標時,可獲得一個影像中包括的填料顆粒的數目。
When the coordinates of the particles of the
根據本揭露的實施例,可使用圖3中所示的方法來計算Dx,其為填料120的顆粒之間的理想二維距離。
According to an embodiment of the present disclosure, the method shown in FIG. 3 can be used to calculate Dx, which is an ideal two-dimensional distance between particles of the
根據本揭露的實施例,為了計算Dx(Dx是填料120的顆粒之間的理想二維距離),如圖3中所示,填料120的顆粒均勻地分散於渲染影像中,且位於具有相同邊長的等邊三角形的相應頂點處。圖3中所示的等邊三角形的每一邊的長度由填料120的顆粒數目及渲染影像的大小決定。
According to an embodiment of the present disclosure, in order to calculate Dx (Dx is the ideal two-dimensional distance between particles of filler 120), as shown in FIG. corresponding vertices of a long equilateral triangle. The length of each side of the equilateral triangle shown in FIG. 3 is determined by the number of particles of the
圖3是示出計算填料顆粒之間的理想二維距離Dx的方法的示意圖。 Fig. 3 is a schematic diagram showing a method of calculating an ideal two-dimensional distance Dx between filler particles.
參照圖3,等邊三角形的一邊被設置為平行於X軸方向。 Referring to FIG. 3 , one side of the equilateral triangle is set parallel to the X-axis direction.
在圖3中,渲染影像在X軸方向上的長度由「a」表示,在Y軸方向上的長度由「b」表示,在X軸方向上設置在一列中的填料120的顆粒數由「Nx」表示,在Y軸方向上設置在一行中的填料120的顆粒數由「Ny」表示,且等邊三角形的一邊的長度由「Dx」表示作為填料顆粒之間的理想二維距離。當填料顆粒的總數為N時,滿足以下關係。
In FIG. 3 , the length of the rendered image in the X-axis direction is represented by "a", the length in the Y-axis direction is represented by "b", and the number of particles of the
N=Nx×Ny N=Nx×Ny
a=(Nx-1)×Dx a=(Nx-1)×Dx
b=(Ny-1)×Dx×cos 30° b=(Ny-1)×Dx×cos 30°
渲染影像的面積=a×b Area of rendered image = a×b
根據渲染影像的分析獲得N、a及b,且根據N、a及b獲得Dx。 N, a, and b are obtained from the analysis of the rendered image, and Dx is obtained from N, a, and b.
此外,填料120的顆粒之間的距離Daj可藉由iTEM程式使用利用影像分析程式獲得的填料120的顆粒的實際座標來量測。此處,量測距離Daj是渲染影像中所示的填料120的相鄰顆粒之間的量測二維距離。
In addition, the distance Daj between the particles of the
填料120的顆粒之間的距離可大於Dx或小於Dx,Dx是填料顆粒之間的理想二維距離。
The distance between particles of
圖4是示出填料顆粒之間的距離分佈的曲線圖。具體而
言,圖4是示出根據本揭露實施例的分散於透光膜100中的填料120的填料顆粒的數目與相鄰顆粒之間的量測二維距離Daj之間的關係的曲線圖。
Fig. 4 is a graph showing the distribution of distances between filler particles. specific and
4 is a graph showing the relationship between the number of filler particles of the
自圖4可以看出,填料120的顆粒並非以預定的距離分散,而是以不同的距離分散。
It can be seen from FIG. 4 that the particles of the
填料120的平均二維分散性藉由根據等式1使用如此獲得的Dx、Dy及N的值的計算來確定。
The average two-dimensional dispersibility of the
根據本揭露的實施例,顯微鏡影像是以3,000x的放大率拍攝的掃描電子顯微鏡(SEM)影像,且平均二維分散性可根據以3,000x的放大率拍攝的掃描電子顯微鏡(SEM)影像計算。當使用以3,000x的放大率拍攝的掃描電子顯微鏡(SEM)時,可使用透光膜100在平行於透光膜100的厚度t1方向的橫截面上拍攝的影像(圖8)。
According to an embodiment of the present disclosure, the microscope image is a scanning electron microscope (SEM) image taken at a magnification of 3,000x, and the average two-dimensional dispersion can be calculated from the scanning electron microscope (SEM) image taken at a magnification of 3,000x . When using a scanning electron microscope (SEM) at a magnification of 3,000×, an image taken on a cross-section of the light-transmitting
圖8是示出對透光膜100成像的方法的另一實施例的透視圖。參照圖8,透光膜100可使用模製物210覆蓋。舉例而言,透光膜100可藉由包含環氧樹脂的模製物210固定。
FIG. 8 is a perspective view illustrating another embodiment of a method of imaging the light-transmitting
參照圖8,在平行於厚度t1方向的方向上對覆蓋有模製物210的透光膜100進行切割,以產生在厚度t1方向上具有暴露的橫截面的透光膜100的樣品。對圖8中所示的樣品410的厚度t1方向上的橫截面執行掃描電子顯微鏡(SEM)成像。具體而言,透光膜100的樣品410可在圖8中由「PIC」指示的方向上成像。
Referring to FIG. 8 , the light-transmitting
使用在3,000x的放大率下由掃描電子顯微鏡(SEM)拍 攝的影像計算平均二維分散性的方法與使用在20,000x的放大率下拍攝的透射電子顯微鏡(TEM)影像計算平均二維分散性的方法相同。 Using a scanning electron microscope (SEM) at a magnification of 3,000x The average two-dimensional dispersion was calculated from the images taken in the same manner as the average two-dimensional dispersion calculated using a transmission electron microscope (TEM) image taken at a magnification of 20,000x.
根據本揭露的實施例,透射電子顯微鏡(TEM)可為場發射掃描電子顯微鏡(field-emission scanning electron microscope,FE-SEM)。本文中使用的場發射掃描電子顯微鏡(FE-SEM)可為例如由日本電子(JEOL)生產的JEM-2100F。顯微鏡影像可藉由根據使用已知顯微鏡的方法執行成像來獲得。 According to an embodiment of the present disclosure, the transmission electron microscope (TEM) may be a field-emission scanning electron microscope (FE-SEM). The field emission scanning electron microscope (FE-SEM) used herein may be, for example, JEM-2100F produced by JEOL. Microscopic images can be obtained by performing imaging according to methods using known microscopes.
根據本揭露的實施例,分散於透光膜100的透光基質110中的填料120可具有使用在3,000x的放大率下拍攝的掃描電子顯微鏡(SEM)影像計算的25%或大於25%的平均二維分散性。
According to an embodiment of the present disclosure, the
根據本揭露的實施例,可使用光學顯微鏡拍攝的影像來計算平均二維分散性。光學顯微鏡可為奧林巴斯集團(Olympus Group)生產的DSX510。 According to an embodiment of the present disclosure, the average two-dimensional dispersion can be calculated using images taken by an optical microscope. The optical microscope may be DSX510 manufactured by Olympus Group.
根據本揭露的實施例,當分散於透光基質110中的填料120具有25%或大於25%的平均二維分散性時,填料120均勻地分散於透光膜100中,且因此可賦予透光膜優異的光學性質。另外,當用於改善機械性質的填料120以25%或大於25%的平均二維分散性分散於透光基質110中時,可將改善透光膜100的機械性質的效果最大化。
According to an embodiment of the present disclosure, when the
根據本揭露的實施例,填料120可具有25%至55%的平均二維分散性。更具體而言,填料120可具有25%至50%的平均
二維分散性。填料120可具有30%至45%的平均二維分散性。
According to an embodiment of the present disclosure, the
根據本揭露的實施例,對於填料120的大小或含量沒有特別的限制。根據本揭露的實施例,考慮到透光膜100的光學性質及機械性質,可調節填料120的大小及含量。
According to embodiments of the present disclosure, there is no particular limitation on the size or content of the
根據本揭露的實施例,填料120可具有5奈米至500奈米的平均粒徑。
According to an embodiment of the present disclosure, the
當填料120的平均粒徑小於5奈米時,填料120的分散性可能劣化,且填料120的顆粒可能聚集。另一方面,當填料120的平均粒徑大於500奈米時,包含填料120的透光膜100的光學性質可能會劣化。舉例而言,當過量包含平均粒徑大於500奈米的填料120時,透光膜100的霧度可能增加。
When the average particle diameter of the
另外,當填料120的平均粒徑小於5奈米時,由於填料120的聚集,在填料120發生聚集的部分中透光膜100的機械強度劣化,且透光膜100的楊氏模數及2%屈服強度可能劣化。當填料120的平均粒徑大於500奈米時,透光膜100的屈服強度可能降低,且其機械強度可能劣化。
In addition, when the average particle diameter of the
根據本揭露的另一實施例,填料120可具有5奈米至200奈米的平均粒徑,可具有5奈米至100奈米的平均粒徑,或可具有5奈米至80奈米的平均粒徑。根據本揭露的另一實施例,填料120可具有5奈米至200奈米的平均粒徑,或可具有10奈米至20奈米的平均粒徑。
According to another embodiment of the present disclosure, the
根據本揭露的實施例,當使用利用透射電子顯微鏡
(TEM)拍攝的影像計算平均二維分散性時,考慮到透射電子顯微鏡(TEM)的放大率,填料120可具有5奈米至80奈米的平均粒徑。舉例而言,包含平均粒徑為5奈米至80奈米的填料120的透光膜100的平均二維分散性可使用在20,000x的放大率下拍攝的透射電子顯微鏡(TEM)影像來計算。
According to an embodiment of the present disclosure, when using a transmission electron microscope
When calculating the average two-dimensional dispersion from images taken by (TEM), considering the magnification of the transmission electron microscope (TEM), the
根據本揭露的另一實施例,當使用利用掃描電子顯微鏡(SEM)拍攝的影像計算平均二維分散性時,考慮到掃描電子顯微鏡(SEM)的放大率,填料120可具有50奈米至500奈米的平均粒徑。舉例而言,包含平均粒徑為50奈米至500奈米的填料120的透光膜100的平均二維分散性可使用在30,000x的放大率下拍攝的掃描電子顯微鏡(SEM)影像來計算。
According to another embodiment of the present disclosure, when the average two-dimensional dispersion is calculated using an image taken by a scanning electron microscope (SEM), the
當透光膜100包含填料120時,透光膜100的光學性質及機械性質可藉由填料120的光散射來改善。
When the
根據本揭露的實施例,以透光膜100的總重量計,填料120的含量可處於0.01重量%至20重量%的範圍內。
According to an embodiment of the present disclosure, based on the total weight of the light-transmitting
當以透光膜100的總重量計,填料120的含量小於0.01重量%時,基於填料120的光散射效果不足,且透光膜100的透光率或2%屈服強度幾乎沒有改善。
When the content of the
另一方面,當以透光膜100的總重量計,填料120的含量高於20重量%時,填料120的分散性及透光膜100的霧度可能劣化,且過量的填料120阻擋光,且因此透光膜100的透光率可能劣化。
On the other hand, when the content of the
根據本揭露的實施例,以透光膜100的總重量計,填料120的含量可處於0.01重量%至10重量%或0.01重量%至5重量%的範圍內。作為另外一種選擇,以透光膜100的總重量計,填料120的含量可處於0.5重量%至2重量%或0.5重量%至1重量%的範圍內。
According to an embodiment of the present disclosure, based on the total weight of the light-transmitting
在透光膜100包含填料120的情況下,當填料120並未充分均勻地分散於其中時,透光膜100的光學性質可能劣化;例如透光膜100的光學透射率可能劣化,且透光膜100的霧度可能增加。然而,根據本揭露的實施例,藉由將填料在透光基質110中的平均二維分散性調節至25%或大於25%,可防止透光膜100的霧度增加及其透光率降低。
In the case that the light-transmitting
根據本揭露的實施例,透光膜100可具有88%或大於88%的透光率。更具體而言,根據本揭露實施例的透光膜100可具有89%或大於89%、或者90%或大於90%的透光率。
According to an embodiment of the present disclosure, the light-transmitting
根據本揭露的實施例,透光膜100可具有3.5或小於3.5的黃色指數。更具體而言,根據本揭露的實施例,透光膜100可具有3.0或小於3.0的黃色指數。
According to an embodiment of the present disclosure, the light-transmitting
另外,根據本揭露的實施例,透光膜100可具有2%或小於2%的霧度。更具體而言,根據本揭露實施例的透光膜100可具有1%或小於1%、或0.5%或小於0.5%的霧度。根據本揭露的實施例,藉由將填料在透光基質110中的平均二維分散性調節至25%或大於25%,可賦予透光膜100 4.5吉帕或大於4.5吉帕的楊氏模
數及110百萬帕或大於110百萬帕的2%屈服強度。
In addition, according to an embodiment of the present disclosure, the light-transmitting
根據本揭露的一個實施例的透光膜100可具有110百萬帕或大於110百萬帕的2%屈服強度。更具體而言,根據本揭露的一個實施例的透光膜100可具有120百萬帕或大於120百萬帕的2%屈服強度或125百萬帕或大於125百萬帕的2%屈服強度。
The light-transmitting
另外,根據本揭露的一個實施例的透光膜100可具有4.5吉帕或大於4.5吉帕的楊氏模數。更具體而言,根據本揭露的一個實施例的透光膜100可具有4.8吉帕或大於4.8吉帕的楊氏模數。
In addition, the light-transmitting
圖5是示出根據另一實施例的顯示元件200的一部分的剖視圖,且圖6是圖5中的部分「P」的放大剖視圖。
FIG. 5 is a cross-sectional view illustrating a part of a
參照圖5,根據本揭露另一實施例的顯示元件200包括顯示面板501及位於顯示面板501上的聚醯亞胺系膜100。
Referring to FIG. 5 , a
參照圖5及圖6,顯示面板501包括基底510、位於基底510上的薄膜電晶體TFT、以及連接至薄膜電晶體TFT的有機發光元件570。有機發光元件570包括第一電極571、位於第一電極571上的有機發光層572及位於有機發光層572上的第二電極573。圖5及圖6中所示的顯示元件200是有機發光顯示元件。
5 and 6, the
基底510可由玻璃或塑膠形成。具體而言,基底510可由塑膠(例如聚醯亞胺系樹脂或聚醯亞胺系膜)形成。儘管未示出,但可於基底510上設置緩衝層。
The base 510 can be formed of glass or plastic. Specifically, the
薄膜電晶體TFT設置於基底510上。薄膜電晶體TFT包括半導體層520、與半導體層520絕緣並與半導體層520的至少
一部分交疊的閘極電極530、連接至半導體層520的源極電極541、以及與源極電極541間隔開並連接至半導體層520的汲極電極542。
The thin film transistor TFT is disposed on the
參照圖6,在閘極電極530與半導體層520之間設置閘極絕緣層535。可在閘極電極530上設置層間絕緣層551,且源極電極541及汲極電極542可設置於層間絕緣層551上。
Referring to FIG. 6 , a
在薄膜電晶體TFT上設置平坦化層552,以將薄膜電晶體TFT的頂部平坦化。
A
第一電極571設置於平坦化層552上。第一電極571藉由設置於平坦化層552中的接觸孔連接至薄膜電晶體TFT。
The
在平坦化層552上在第一電極571的一部分中設置堤層580,以界定畫素區域或發光區域。舉例而言,堤層580以矩陣的形式設置在多個畫素之間的邊界處,以界定相應的畫素區。
A
有機發光層572設置於第一電極571上。有機發光層572亦可設置於堤層580上。有機發光層572可包括一個發光層或在垂直方向上堆疊的兩個發光層。可自有機發光層572發射具有紅色、綠色及藍色中的任一種顏色的光,且可自有機發光層572發射白光。
The organic
第二電極573設置於有機發光層572上。
The
可將第一電極571、有機發光層572及第二電極573堆疊以構成有機發光元件570。
The
儘管未示出,但是當有機發光層572發射白光時,每一
畫素可包括濾色器,用於基於特定波長過濾自有機發光層572發射的白光。濾色器形成於光路徑中。
Although not shown, when the organic
可在第二電極573上設置薄膜包封層590。薄膜包封層590可包括至少一個有機層及至少一個無機層,且所述至少一個有機層及所述至少一個無機層可交替設置。
A thin
聚醯亞胺系膜100設置於具有上述堆疊結構的顯示面板501上。聚醯亞胺系膜100包括聚醯亞胺系基質110及分散於聚醯亞胺系基質110中的填料120。
The
根據本揭露實施例的透光膜100可藉由使用溶液-溶液混合與溶液-粉末混合的組合的混種混合方法(hybrid mixing method)生產。
The light-transmitting
在下文中,將闡述生產根據本揭露實施例的透光膜100的方法。為了便於說明,將參考其中透光膜100是聚醯亞胺系膜的實施例來闡述生產透光膜100的方法。
Hereinafter, a method of producing the light-transmitting
根據本揭露的實施例,生產透光膜100的方法包括:製備透光樹脂粉末;將第一量的透光樹脂粉末溶解於第一溶劑中以製備透光樹脂溶液;將填料分散於第二溶劑中以製備填料分散體;將填料分散體與透光樹脂溶液混合以製備第一混合溶液;以及將第二量的透光樹脂粉末添加至第一混合溶液,隨後進行溶解以製備第二混合溶液。根據本揭露的實施例,作為透光樹脂,例如可使用聚醯亞胺系樹脂。填料分散體可藉由向第二溶劑添加填料隨後進行攪拌來製備。
According to an embodiment of the present disclosure, the method for producing the light-transmitting
根據本揭露的實施例,透光樹脂粉末被分成至少兩等份,並與填料分散體混合。 According to an embodiment of the present disclosure, the light-transmitting resin powder is divided into at least two equal parts, and mixed with the filler dispersion.
具體而言,將第一量的透光樹脂粉末溶解於第一溶劑中,並以透光樹脂溶液的形式與填料分散體混合。基於填料的重量,第一量的透光樹脂粉末可為0.5%至10%。更具體而言,基於填料120的總重量,第一量的透光樹脂粉末可介於1%至10%的範圍內。
Specifically, a first amount of light-transmitting resin powder is dissolved in a first solvent, and mixed with the filler dispersion in the form of a light-transmitting resin solution. The first amount of light-transmitting resin powder may be 0.5% to 10% based on the weight of the filler. More specifically, based on the total weight of the
另外,第二量的透光樹脂粉末以粉末形式添加。具體而言,第二量的透光樹脂粉末可以粉末形式添加至第一混合溶液,所述第一混合溶液藉由將填料分散體與透光樹脂溶液混合來製備。 In addition, the second amount of light-transmitting resin powder is added in powder form. Specifically, the second amount of light-transmitting resin powder may be added in powder form to the first mixed solution prepared by mixing the filler dispersion with the light-transmitting resin solution.
第二量的透光樹脂粉末可對應於自用於生產透光膜100的透光樹脂粉末的總量中除去第一量之後剩餘的量。舉例而言,第二量可為第一量的至少5倍、10倍或50倍。根據本揭露的另一實施例,第二量的透光樹脂粉末可為第一量的至少100倍。
The second amount of light-transmitting resin powder may correspond to an amount remaining after removing the first amount from the total amount of light-transmitting resin powder used to produce the light-transmitting
根據本揭露的一實施例,在將第二量的透光樹脂粉末添加至第一混合溶液之前,所述方法可更包括將第三溶劑添加至第一混合溶液。第三溶劑可與第一溶劑相同或不同。在本揭露的實施例中,第三溶劑可與第一溶劑相同。 According to an embodiment of the present disclosure, before adding the second amount of light-transmitting resin powder to the first mixed solution, the method may further include adding a third solvent to the first mixed solution. The third solvent may be the same as or different from the first solvent. In an embodiment of the present disclosure, the third solvent may be the same as the first solvent.
N,N-二甲基乙醯胺(DMAc)可用作第一溶劑。N,N-二甲基乙醯胺(DMAc)或甲基乙基酮(MEK)可用作第二溶劑。N,N-二甲基乙醯胺(DMAc)可用作第三溶劑。然而,本揭露的實 施例不限於此,且其他已知溶劑可用作第一溶劑、第二溶劑及第三溶劑。 N,N-Dimethylacetamide (DMAc) can be used as the first solvent. N,N-Dimethylacetamide (DMAc) or methyl ethyl ketone (MEK) can be used as the second solvent. N,N-Dimethylacetamide (DMAc) can be used as the third solvent. However, the facts of this disclosure The embodiment is not limited thereto, and other known solvents may be used as the first solvent, the second solvent, and the third solvent.
根據本揭露的實施例,首先,將一部分(第一量的)透光樹脂粉末溶解於溶劑中且然後與填料分散體混合。因此,填料的分散性得到改善。 According to an embodiment of the present disclosure, first, a part (first amount) of the light-transmitting resin powder is dissolved in a solvent and then mixed with the filler dispersion. Therefore, the dispersibility of the filler is improved.
當透光樹脂粉末直接注射至其中分散有填料的填料分散體中時,溶劑立即自粉末表面滲透至粉末內部,此時,粉末表面周圍的濃度立即增加,藉此填料顆粒可能聚集。 When the light-transmitting resin powder is directly injected into the filler dispersion in which the filler is dispersed, the solvent immediately penetrates from the powder surface to the inside of the powder, and at this time, the concentration around the powder surface immediately increases, whereby filler particles may aggregate.
另一方面,根據本揭露的實施例,藉由首先將藉由溶解透光樹脂粉末製備的透光樹脂溶液添加至包含溶劑的填料分散體,分散於填料顆粒之間的透光樹脂的聚合物鏈可防止填料顆粒的聚集。然後,即使亦添加第二量的透光樹脂粉末,填料顆粒之間亦不會發生聚集。因此,可防止填料的聚集,且可改善填料的分散性。 On the other hand, according to an embodiment of the present disclosure, by first adding a light-transmitting resin solution prepared by dissolving light-transmitting resin powder to a filler dispersion containing a solvent, the polymer of the light-transmitting resin dispersed between the filler particles Chains prevent aggregation of filler particles. Then, even if the second amount of light-transmitting resin powder is also added, aggregation of the filler particles does not occur. Therefore, aggregation of the filler can be prevented, and dispersibility of the filler can be improved.
根據本揭露的實施例,包括均勻分散於其中的填料120的透光膜100可使用其中將溶液-溶液混合與溶液-粉末混合組合的混種混合方法。
According to an embodiment of the present disclosure, the light-transmitting
根據本揭露的實施例,可保持填料120與透光樹脂的高自由度,因此可創造有利於分散的環境。因此,填料120可以高自由度結合至透光樹脂,且填料120可均勻分散於由透光樹脂形成的基質110中。
According to the embodiments of the present disclosure, a high degree of freedom of the
根據本揭露的實施例,二氧化矽顆粒可用作填料120。
According to an embodiment of the present disclosure, silica particles may be used as the
填料120的分散體可為二氧化矽分散體。二氧化矽分散體可藉由例如將二甲基乙醯胺(DMAc)及二氧化矽顆粒注入至反應器中隨後進行攪拌來製備。
The dispersion of
在下文中,將參照製備例及實例更詳細地闡述本揭露。然而,製備例及實例不應被解釋為限制本揭露的範圍。 Hereinafter, the present disclosure will be explained in more detail with reference to Preparations and Examples. However, the preparations and examples should not be construed as limiting the scope of the present disclosure.
<製備例1:製備透光聚合物固體> <Preparation Example 1: Preparation of Light-Transmitting Polymer Solid>
將776.655克N,N-二甲基乙醯胺(DMAc)充入配有攪拌器、氮氣注射器、滴液漏斗、溫度控制器及冷卻器的1升反應器中,同時使氮氣穿過反應器。然後將反應器的溫度調節至25℃,溶解54.439克(0.17莫耳)2,2'-雙(三氟甲基)聯苯胺(2,2'-bis(trifluoromethyl)benzidine,TFDB),並將所得溶液保持在25℃。向其中添加15.005克(0.051莫耳)聯苯-四羧酸二酐(BPDA),隨後攪拌3小時以完全溶解BPDA,且然後向其中添加22.657克(0.051莫耳)4,4'-(六氟異亞丙基)二鄰苯二甲酸酐(4,4'-(hexafluoroisopropylidene)diphthalic anhydride,6FDA),並完全溶解於其中。將反應器溫度降至10℃,向其中添加13.805克(0.068莫耳)對苯二甲醯氯(terephthaloyl chloride,TPC),並使反應在25℃下進行12小時,以獲得具有12重量%的固體含量的聚合物溶液。 Charge 776.655 grams of N,N-dimethylacetamide (DMAc) into a 1-liter reactor equipped with a stirrer, nitrogen injector, dropping funnel, temperature controller, and cooler while passing nitrogen through the reactor . Then the temperature of the reactor was adjusted to 25°C, 54.439 grams (0.17 moles) of 2,2'-bis(trifluoromethyl)benzidine (2,2'-bis(trifluoromethyl)benzidine, TFDB) were dissolved, and The resulting solution was maintained at 25°C. 15.005 grams (0.051 moles) of biphenyl-tetracarboxylic dianhydride (BPDA) was added thereto, followed by stirring for 3 hours to completely dissolve the BPDA, and then 22.657 grams (0.051 moles) of 4,4'-(hexa Fluoroisopropylidene) diphthalic anhydride (4,4'-(hexafluoroisopropylidene) diphthalic anhydride, 6FDA), and completely dissolved in it. The reactor temperature was lowered to 10° C., 13.805 g (0.068 mol) of terephthaloyl chloride (TPC) was added thereto, and the reaction was carried out at 25° C. for 12 hours to obtain a compound having 12% by weight. solids content of the polymer solution.
向所獲得的聚合物溶液添加17.75克吡啶及22.92克乙酸酐,隨後攪拌30分鐘,且然後在70℃下進一步攪拌1小時。使所得產物冷卻至室溫,向所得聚合物溶液添加20升甲醇以沈澱固 體,且對所沈澱的固體進行過濾,粉碎,用2升甲醇再次洗滌,且然後在真空中於100℃乾燥6小時以獲得粉末狀透光聚合物固體。在本文中製備的透光聚合物固體是聚醯亞胺系樹脂固體。更具體而言,在製備例1中製備的透光聚合物固體是聚醯胺-醯亞胺聚合物固體的粉末,且是透光樹脂粉末。 To the obtained polymer solution, 17.75 g of pyridine and 22.92 g of acetic anhydride were added, followed by stirring for 30 minutes, and then further stirring at 70° C. for 1 hour. The resulting product was cooled to room temperature, and 20 liters of methanol was added to the resulting polymer solution to precipitate a solid body, and the precipitated solid was filtered, pulverized, washed again with 2 liters of methanol, and then dried in vacuum at 100° C. for 6 hours to obtain a powdery light-transmitting polymer solid. The light-transmitting polymer solid prepared herein is a polyimide-based resin solid. More specifically, the light-transmitting polymer solid prepared in Preparation Example 1 is a powder of polyamide-imide polymer solid, and is a light-transmitting resin powder.
<實例1> <Example 1>
將35.40重量份的N,N-二甲基乙醯胺(DMAc)(第一溶劑)充入500毫升反應器中,且然後攪拌,同時將反應器的溫度保持在10℃。然後,向其中添加0.36重量份(第一量的)在製備例1中製備的作為固體粉末(透光樹脂粉末)的聚醯胺-醯亞胺,隨後攪拌1小時,且然後將溫度升高至25℃,以製備作為液體的透光樹脂溶液。 35.40 parts by weight of N,N-dimethylacetamide (DMAc) (first solvent) was charged into a 500 ml reactor, and then stirred while maintaining the temperature of the reactor at 10°C. Then, 0.36 parts by weight (of the first amount) of polyamide-imide as a solid powder (light-transmitting resin powder) prepared in Preparation Example 1 was added thereto, followed by stirring for 1 hour, and then the temperature was raised to 25°C to prepare a light-transmitting resin solution as a liquid.
將35.76重量份的二氧化矽分散體A(DMAC-ST,日產化工(Nissan Chemical Industries))充入另一個1升反應器中,在二氧化矽分散體A中,平均粒徑為10奈米至15奈米的二氧化矽顆粒以20重量%的量分散於N,N-二甲基乙醯胺(DMAc)溶液(第二溶劑)中,且使用圓柱形泵以0.5克/分鐘的速率緩慢注射製備的液體透光樹脂溶液,同時將反應器的溫度保持在25℃,以製備其中二氧化矽分散體與透光樹脂溶液混合的第一混合溶液。 Fill another 1 liter reactor with 35.76 parts by weight of silica dispersion A (DMAC-ST, Nissan Chemical Industries). In silica dispersion A, the average particle size is 10 nm Silica particles down to 15 nm were dispersed in N,N-dimethylacetamide (DMAc) solution (second solvent) in an amount of 20% by weight, and at a rate of 0.5 g/min using a cylindrical pump The prepared liquid light-transmitting resin solution was slowly injected while maintaining the temperature of the reactor at 25° C. to prepare a first mixed solution in which the silica dispersion was mixed with the light-transmitting resin solution.
將336.32重量份的DMAc作為第三溶劑添加至第一混合溶液,隨後進行攪拌。然後,向其中添加64.04重量份(第二量的)在製備例1中製備的作為固體粉末(透光樹脂粉末)的聚醯 胺-醯亞胺,隨後進行攪拌,以製備第二混合溶液。第二混合溶液是其中分散有二氧化矽顆粒的透光樹脂溶液。 336.32 parts by weight of DMAc as a third solvent was added to the first mixed solution, followed by stirring. Then, 64.04 parts by weight (second amount) of polyamide as solid powder (light-transmitting resin powder) prepared in Preparation Example 1 was added thereto. Amine-imide, followed by stirring, to prepare a second mixed solution. The second mixed solution is a light-transmitting resin solution in which silicon dioxide particles are dispersed.
將獲得的第二混合溶液施加至玻璃基底,澆鑄,並在130℃下用熱空氣乾燥30分鐘以產生膜,且然後將產生的膜自玻璃基底剝離並用銷固定至框架。對於澆鑄基底的類型沒有特別的限制。澆鑄基底可為玻璃基底、不銹鋼(SUS)基底、特氟隆基底等。實例1中使用的澆鑄基底是玻璃基底,且同樣適用於下文。 The obtained second mixed solution was applied to a glass substrate, cast, and dried with hot air at 130° C. for 30 minutes to produce a film, and then the produced film was peeled from the glass substrate and fixed to the frame with pins. There is no particular limitation on the type of casting substrate. The casting substrate may be a glass substrate, a stainless steel (SUS) substrate, a Teflon substrate, or the like. The casting substrate used in Example 1 was a glass substrate, and the same applies below.
將固定有膜的框架放入真空爐中,自100℃緩慢加熱至280℃達2小時,緩慢冷卻,並與框架分離,以獲得透光膜。透光膜在250℃下進一步進行熱處理達5分鐘。 The frame fixed with the film was put into a vacuum furnace, slowly heated from 100°C to 280°C for 2 hours, cooled slowly, and separated from the frame to obtain a light-transmitting film. The light-transmitting film was further heat-treated at 250° C. for 5 minutes.
因此,完成具有80微米的厚度t1且包括透光基質110及分散於透光基質110中的二氧化矽系填料120的透光膜100的生產。此處,透光基質110由聚醯亞胺系樹脂形成,且具有膜形式。
Therefore, the production of the
<實例2> <Example 2>
將16.78重量份的DMAc(第一溶劑)充入500毫升反應器中,且然後攪拌,同時將反應器的溫度保持在10℃。然後,向其中添加0.17重量份(第一量的)在製備例1中製備的作為固體粉末(透光樹脂粉末)的聚醯胺-醯亞胺,隨後攪拌1小時,且然後將溫度升高至25℃,以製備作為液體的透光樹脂溶液。 16.78 parts by weight of DMAc (first solvent) was charged into a 500 ml reactor, and then stirred while maintaining the temperature of the reactor at 10°C. Then, 0.17 parts by weight (first amount) of polyamide-imide as a solid powder (light-transmitting resin powder) prepared in Preparation Example 1 was added thereto, followed by stirring for 1 hour, and then the temperature was raised to 25°C to prepare a light-transmitting resin solution as a liquid.
將16.95重量份的二氧化矽分散體A(DMAC-ST,日產化工(Nissan Chemical Industries))充入另一個1升反應器中,在 二氧化矽分散體A中,平均粒徑為10奈米至15奈米的二氧化矽顆粒以20重量%的量分散於N,N-二甲基乙醯胺(DMAc)溶液(第二溶劑)中,且使用圓柱形泵以0.5克/分鐘的速率緩慢注射製備的液體透光樹脂溶液,同時將反應器的溫度保持在25℃,以製備其中二氧化矽分散體與透光樹脂溶液混合的第一混合溶液。 16.95 parts by weight of silica dispersion A (DMAC-ST, Nissan Chemical Industries (Nissan Chemical Industries)) was charged into another 1 liter reactor, In silica dispersion A, silica particles with an average particle size of 10 nm to 15 nm were dispersed in N,N-dimethylacetamide (DMAc) solution (second solvent) in an amount of 20% by weight. ), and use a cylindrical pump to slowly inject the prepared liquid light-transmitting resin solution at a rate of 0.5 g/min, while maintaining the temperature of the reactor at 25°C to prepare the silica dispersion mixed with the light-transmitting resin solution the first mixed solution.
將351.37重量份的DMAc作為第三溶劑添加至第一混合溶液,隨後進行攪拌。然後,向其中添加64.23重量份(第二量的)在製備例1中製備的作為固體粉末(透光樹脂粉末)的聚醯胺-醯亞胺,隨後進行攪拌,以製備第二混合溶液。第二混合溶液是其中分散有二氧化矽顆粒的透光樹脂溶液。 351.37 parts by weight of DMAc was added as a third solvent to the first mixed solution, followed by stirring. Then, 64.23 parts by weight (second amount) of polyamide-imide as a solid powder (light-transmitting resin powder) prepared in Preparation Example 1 was added thereto, followed by stirring, to prepare a second mixed solution. The second mixed solution is a light-transmitting resin solution in which silicon dioxide particles are dispersed.
將獲得的第二混合溶液施加至澆鑄基底,澆鑄,並在130℃下用熱空氣乾燥30分鐘以產生膜,且然後將產生的膜自澆鑄基底剝離並用銷固定至框架。 The obtained second mixed solution was applied to a casting base, cast, and dried with hot air at 130° C. for 30 minutes to produce a film, and then the produced film was peeled from the casting base and fixed to a frame with pins.
將固定有膜的框架放入真空爐中,自100℃緩慢加熱至280℃達2小時,緩慢冷卻,並與框架分離,以獲得透光膜。透光膜在250℃下進一步進行熱處理達5分鐘。 The frame fixed with the film was put into a vacuum furnace, slowly heated from 100°C to 280°C for 2 hours, cooled slowly, and separated from the frame to obtain a light-transmitting film. The light-transmitting film was further heat-treated at 250° C. for 5 minutes.
因此,完成具有80微米的厚度t1且包括透光基質110及分散於透光基質110中的二氧化矽系填料120的透光膜100的生產。
Therefore, the production of the
<實例3> <Example 3>
將1.61重量份的DMAc(第一溶劑)充入100毫升反應器中,且然後攪拌,同時將反應器的溫度保持在10℃。然後,向 其中添加0.017重量份(第一量的)在製備例1中製備的作為固體粉末(透光樹脂粉末)的聚醯胺-醯亞胺,隨後攪拌1小時,且然後將溫度升高至25℃,以製備作為液體的透光樹脂溶液。 1.61 parts by weight of DMAc (first solvent) was charged into a 100 ml reactor, and then stirred while maintaining the temperature of the reactor at 10°C. Then, to Thereto, 0.017 parts by weight (of the first amount) of polyamide-imide as a solid powder (light-transmitting resin powder) prepared in Preparation Example 1 was added, followed by stirring for 1 hour, and then raising the temperature to 25° C. , to prepare a light-transmitting resin solution as a liquid.
將1.63重量份的二氧化矽分散體A(DMAC-ST,日產化工(Nissan Chemical Industries))充入另一個1升反應器中,且使用圓柱形泵以0.5克/分鐘的速率緩慢注射製備的液體透光樹脂溶液,同時將反應器的溫度保持在25℃,以製備其中二氧化矽分散體與透光樹脂溶液混合的第一混合溶液。 1.63 parts by weight of silica dispersion A (DMAC-ST, Nissan Chemical Industries (Nissan Chemical Industries)) was filled into another 1-liter reactor and slowly injected at a rate of 0.5 g/min using a cylindrical pump. liquid light-transmitting resin solution while maintaining the temperature of the reactor at 25° C. to prepare a first mixed solution in which the silica dispersion was mixed with the light-transmitting resin solution.
將363.63重量份的DMAc作為第三溶劑添加至第一混合溶液,隨後進行攪拌。然後,向其中添加64.383重量份(第二量的)在製備例1中製備的作為固體粉末(透光樹脂粉末)的聚醯胺-醯亞胺,隨後進行攪拌,以製備第二混合溶液。第二混合溶液是其中分散有二氧化矽顆粒的透光樹脂溶液。 363.63 parts by weight of DMAc was added as a third solvent to the first mixed solution, followed by stirring. Then, 64.383 parts by weight (second amount) of polyamide-imide as a solid powder (light-transmitting resin powder) prepared in Preparation Example 1 was added thereto, followed by stirring, to prepare a second mixed solution. The second mixed solution is a light-transmitting resin solution in which silicon dioxide particles are dispersed.
將獲得的第二混合溶液施加至澆鑄基底,澆鑄,並在130℃下用熱空氣乾燥30分鐘以產生膜,且然後將產生的膜自澆鑄基底剝離並用銷固定至框架。 The obtained second mixed solution was applied to a casting base, cast, and dried with hot air at 130° C. for 30 minutes to produce a film, and then the produced film was peeled from the casting base and fixed to a frame with pins.
將固定有膜的框架放入真空爐中,自100℃緩慢加熱至280℃達2小時,緩慢冷卻,並與框架分離,以獲得透光膜。透光膜在250℃下進一步進行熱處理達5分鐘。 The frame fixed with the film was put into a vacuum furnace, slowly heated from 100°C to 280°C for 2 hours, cooled slowly, and separated from the frame to obtain a light-transmitting film. The light-transmitting film was further heat-treated at 250° C. for 5 minutes.
因此,完成具有80微米的厚度t1且包括透光基質110及分散於透光基質110中的二氧化矽系填料120的透光膜100的生產。
Therefore, the production of the
<實例4> <Example 4>
將4.85重量份的DMAc(第一溶劑)充入100毫升反應器中,且然後攪拌,同時將反應器的溫度保持在10℃。然後,向其中添加0.05重量份(第一量的)在製備例1中製備的作為固體粉末(透光樹脂粉末)的聚醯胺-醯亞胺,隨後攪拌1小時,且然後將溫度升高至25℃,以製備作為液體的透光樹脂溶液。 4.85 parts by weight of DMAc (first solvent) was charged into a 100 ml reactor, and then stirred while maintaining the temperature of the reactor at 10°C. Then, 0.05 parts by weight (of the first amount) of polyamide-imide as a solid powder (light-transmitting resin powder) prepared in Preparation Example 1 was added thereto, followed by stirring for 1 hour, and then the temperature was raised to 25°C to prepare a light-transmitting resin solution as a liquid.
將2.45重量份的二氧化矽分散體B(MEK-ST-40,日產化工(Nissan Chemical Industries))充入另一個1升反應器中,在二氧化矽分散體B中,平均粒徑為10奈米至15奈米的二氧化矽顆粒以40重量%的量分散於甲基乙基酮(MEK)溶液(第二溶劑)中,且使用圓柱形泵以0.5克/分鐘的速率緩慢注射製備的液體透光樹脂溶液,同時將反應器的溫度保持在25℃,以製備其中二氧化矽分散體與透光樹脂溶液混合的第一混合溶液。 Fill another 1 liter reactor with 2.45 parts by weight of silica dispersion B (MEK-ST-40, Nissan Chemical Industries). In silica dispersion B, the average particle size is 10 Silica particles of nanometers to 15 nanometers were dispersed in methyl ethyl ketone (MEK) solution (second solvent) in an amount of 40% by weight, and were prepared by slow injection at a rate of 0.5 g/min using a cylindrical pump The liquid light-transmitting resin solution, while maintaining the temperature of the reactor at 25° C., to prepare a first mixed solution in which the silica dispersion is mixed with the light-transmitting resin solution.
將363.46重量份的DMAc作為第三溶劑添加至第一混合溶液,隨後進行攪拌。然後,向其中添加64.35重量份(第二量的)在製備例1中製備的作為固體粉末(透光樹脂粉末)的聚醯胺-醯亞胺,隨後進行攪拌,以製備第二混合溶液。第二混合溶液是其中分散有二氧化矽顆粒的透光樹脂溶液。 363.46 parts by weight of DMAc was added as a third solvent to the first mixed solution, followed by stirring. Then, 64.35 parts by weight (second amount) of polyamide-imide as a solid powder (light-transmitting resin powder) prepared in Preparation Example 1 was added thereto, followed by stirring, to prepare a second mixed solution. The second mixed solution is a light-transmitting resin solution in which silicon dioxide particles are dispersed.
將獲得的第二混合溶液施加至澆鑄基底,澆鑄,並在130℃下用熱空氣乾燥30分鐘以產生膜,且然後將產生的膜自澆鑄基底剝離並用銷固定至框架。 The obtained second mixed solution was applied to a casting base, cast, and dried with hot air at 130° C. for 30 minutes to produce a film, and then the produced film was peeled from the casting base and fixed to a frame with pins.
將固定有膜的框架放入真空爐中,自100℃緩慢加熱至 280℃達2小時,緩慢冷卻,並與框架分離,以獲得透光膜。透光膜在250℃下進一步進行熱處理達5分鐘。 Put the frame fixed with the membrane into a vacuum furnace and heat slowly from 100 °C to 280°C for 2 hours, slowly cooled, and separated from the frame to obtain a light-transmitting film. The light-transmitting film was further heat-treated at 250° C. for 5 minutes.
因此,完成具有80微米的厚度t1且包括透光基質110及分散於透光基質110中的二氧化矽系填料120的透光膜100的生產。
Therefore, the production of the
<實例5> <Example 5>
將18.55重量份的DMAc(第一溶劑)充入100毫升反應器中,且然後攪拌,同時將反應器的溫度保持在10℃。然後,向其中添加0.19重量份(第一量的)在製備例1中製備的作為固體粉末(透光樹脂粉末)的聚醯胺-醯亞胺,隨後攪拌1小時,且然後將溫度升高至25℃,以製備作為液體的透光樹脂溶液。 18.55 parts by weight of DMAc (first solvent) was charged into a 100 ml reactor, and then stirred while maintaining the temperature of the reactor at 10°C. Then, 0.19 parts by weight (of the first amount) of polyamide-imide as a solid powder (light-transmitting resin powder) prepared in Preparation Example 1 was added thereto, followed by stirring for 1 hour, and then the temperature was raised to 25°C to prepare a light-transmitting resin solution as a liquid.
將9.37重量份的二氧化矽分散體B(MEK-ST-40,日產化工(Nissan Chemical Industries))充入另一個1升反應器中,且使用圓柱形泵以0.5克/分鐘的速率緩慢注射製備的液體透光樹脂溶液,同時將反應器的溫度保持在25℃,以製備其中二氧化矽分散體與透光樹脂溶液混合的第一混合溶液。 9.37 parts by weight of Silica Dispersion B (MEK-ST-40, Nissan Chemical Industries) was charged into another 1-liter reactor, and injected slowly at a rate of 0.5 g/min using a cylindrical pump The liquid light-transmitting resin solution was prepared while maintaining the temperature of the reactor at 25° C. to prepare a first mixed solution in which the silica dispersion was mixed with the light-transmitting resin solution.
將359.31重量份的DMAc作為第三溶劑添加至第一混合溶液,隨後進行攪拌。然後,向其中添加64.21重量份(第二量的)在製備例1中製備的作為固體粉末(透光樹脂粉末)的聚醯胺-醯亞胺,隨後進行攪拌,以製備第二混合溶液。第二混合溶液是其中分散有二氧化矽顆粒的透光樹脂溶液。 359.31 parts by weight of DMAc was added as a third solvent to the first mixed solution, followed by stirring. Then, 64.21 parts by weight (second amount) of polyamide-imide as a solid powder (light-transmitting resin powder) prepared in Preparation Example 1 was added thereto, followed by stirring, to prepare a second mixed solution. The second mixed solution is a light-transmitting resin solution in which silicon dioxide particles are dispersed.
將獲得的第二混合溶液施加至澆鑄基底,澆鑄,並在130 ℃下用熱空氣乾燥30分鐘以產生膜,且然後將產生的膜自澆鑄基底剝離並用銷固定至框架。 The obtained second mixed solution is applied to the cast base, cast, and at 130 It was dried with hot air for 30 minutes at °C to produce a film, and then the produced film was peeled from the casting base and fixed to the frame with pins.
將固定有膜的框架放入真空爐中,自100℃緩慢加熱至280℃達2小時,緩慢冷卻,並與框架分離,以獲得透光膜。透光膜在250℃下進一步進行熱處理達5分鐘。 The frame fixed with the film was put into a vacuum furnace, slowly heated from 100°C to 280°C for 2 hours, cooled slowly, and separated from the frame to obtain a light-transmitting film. The light-transmitting film was further heat-treated at 250° C. for 5 minutes.
因此,完成具有80微米的厚度t1且包括透光基質110及分散於透光基質110中的二氧化矽系填料120的透光膜100的生產。
Therefore, the production of the
<實例6> <Example 6>
將79.70重量份的DMAc(第一溶劑)充入1升反應器中,且然後攪拌,同時將反應器的溫度保持在10℃。然後,向其中添加0.8重量份(第一量的)在製備例1中製備的作為固體粉末(透光樹脂粉末)的聚醯胺-醯亞胺,隨後攪拌1小時,且然後將溫度升高至25℃,以製備作為液體的透光樹脂溶液。 79.70 parts by weight of DMAc (first solvent) was charged into a 1 liter reactor, and then stirred while maintaining the temperature of the reactor at 10°C. Then, 0.8 parts by weight (of the first amount) of polyamide-imide as a solid powder (light-transmitting resin powder) prepared in Preparation Example 1 was added thereto, followed by stirring for 1 hour, and then the temperature was raised to 25°C to prepare a light-transmitting resin solution as a liquid.
將40.25重量份的二氧化矽分散體B(MEK-ST-40,日產化工(Nissan Chemical Industries))充入另一個1升反應器中,且使用圓柱形泵以0.5克/分鐘的速率緩慢注射製備的液體透光樹脂溶液,同時將反應器的溫度保持在25℃,以製備其中二氧化矽分散體與透光樹脂溶液混合的第一混合溶液。 40.25 parts by weight of Silica Dispersion B (MEK-ST-40, Nissan Chemical Industries) was charged into another 1-liter reactor and injected slowly at a rate of 0.5 g/min using a cylindrical pump The liquid light-transmitting resin solution was prepared while maintaining the temperature of the reactor at 25° C. to prepare a first mixed solution in which the silica dispersion was mixed with the light-transmitting resin solution.
將340.78重量份的DMAc作為第三溶劑添加至第一混合溶液,隨後進行攪拌。然後,向其中添加63.60重量份(第二量的)在製備例1中製備的作為固體粉末(透光樹脂粉末)的聚醯 胺-醯亞胺,隨後進行攪拌,以製備第二混合溶液。第二混合溶液是其中分散有二氧化矽顆粒的透光樹脂溶液。 340.78 parts by weight of DMAc was added as a third solvent to the first mixed solution, followed by stirring. Then, 63.60 parts by weight (second amount) of polyamide as solid powder (light-transmitting resin powder) prepared in Preparation Example 1 was added thereto. Amine-imide, followed by stirring, to prepare a second mixed solution. The second mixed solution is a light-transmitting resin solution in which silicon dioxide particles are dispersed.
將獲得的第二混合溶液施加至澆鑄基底,澆鑄,並在130℃下用熱空氣乾燥30分鐘以產生膜,且然後將產生的膜自澆鑄基底剝離並用銷固定至框架。 The obtained second mixed solution was applied to a casting base, cast, and dried with hot air at 130° C. for 30 minutes to produce a film, and then the produced film was peeled from the casting base and fixed to a frame with pins.
將固定有膜的框架放入真空爐中,自100℃緩慢加熱至280℃達2小時,緩慢冷卻,並與框架分離,以獲得透光膜。透光膜在250℃下進一步進行熱處理達5分鐘。 The frame fixed with the film was put into a vacuum furnace, slowly heated from 100°C to 280°C for 2 hours, cooled slowly, and separated from the frame to obtain a light-transmitting film. The light-transmitting film was further heat-treated at 250° C. for 5 minutes.
因此,完成具有80微米的厚度t1且包括透光基質110及分散於透光基質110中的二氧化矽系填料120的透光膜100的生產。
Therefore, the production of the
<實例7> <Example 7>
將0.03重量份的DMAc(第一溶劑)充入反應器中,且然後攪拌,同時將反應器的溫度保持在10℃。然後,向其中添加0.000335重量份(第一量的)在製備例1中製備的作為固體粉末(透光樹脂粉末)的聚醯胺-醯亞胺,隨後攪拌1小時,且然後將溫度升高至25℃,以製備作為液體的透光樹脂溶液。 0.03 parts by weight of DMAc (first solvent) was charged into the reactor, and then stirred while maintaining the temperature of the reactor at 10°C. Then, 0.000335 parts by weight (of the first amount) of polyamide-imide as a solid powder (light-transmitting resin powder) prepared in Preparation Example 1 was added thereto, followed by stirring for 1 hour, and then the temperature was raised to 25°C to prepare a light-transmitting resin solution as a liquid.
對二氧化矽分散體C(MEK-ST-ZL,日產化工(Nissan Chemical Industries))(其中平均粒徑為70奈米至100奈米的二氧化矽顆粒以30重量%的量分散於甲基乙基酮(MEK)溶液(第二溶劑)中)進行稀釋,使得二氧化矽顆粒的量被調節至10重量%,以製備具有10重量%的二氧化矽含量的稀釋二氧化矽分散體C。 將0.067重量份的二氧化矽分散體C充入另一個1升反應器中,且使用圓柱形泵以0.5克/分鐘的速率緩慢注射製備的液體透光樹脂溶液,同時將反應器的溫度保持在25℃,以製備其中二氧化矽分散體與透光樹脂溶液混合的第一混合溶液。 For silica dispersion C (MEK-ST-ZL, Nissan Chemical Industries) (in which silica particles with an average particle size of 70 nm to 100 nm are dispersed in methyl ethyl ketone (MEK) solution (second solvent)) such that the amount of silica particles is adjusted to 10% by weight to prepare diluted silica dispersion C with a silica content of 10% by weight . Fill another 1-liter reactor with 0.067 parts by weight of silica dispersion C, and use a cylindrical pump to slowly inject the prepared liquid light-transmitting resin solution at a rate of 0.5 g/min while maintaining the temperature of the reactor at 25° C. to prepare a first mixed solution in which the silica dispersion is mixed with the light-transmitting resin solution.
將364.87重量份的DMAc作為第三溶劑添加至第一混合溶液,隨後進行攪拌。然後,向其中添加64.39967重量份(第二量的)在製備例1中製備的作為固體粉末(透光樹脂粉末)的聚醯胺-醯亞胺,隨後進行攪拌,以製備第二混合溶液。第二混合溶液是其中分散有二氧化矽顆粒的透光樹脂溶液。 364.87 parts by weight of DMAc was added as a third solvent to the first mixed solution, followed by stirring. Then, 64.39967 parts by weight (second amount) of polyamide-imide as a solid powder (light-transmitting resin powder) prepared in Preparation Example 1 was added thereto, followed by stirring, to prepare a second mixed solution. The second mixed solution is a light-transmitting resin solution in which silicon dioxide particles are dispersed.
將獲得的第二混合溶液施加至澆鑄基底,澆鑄,並在130℃下用熱空氣乾燥30分鐘以產生膜,且然後將產生的膜自澆鑄基底剝離並用銷固定至框架。 The obtained second mixed solution was applied to a casting base, cast, and dried with hot air at 130° C. for 30 minutes to produce a film, and then the produced film was peeled from the casting base and fixed to a frame with pins.
將固定有膜的框架放入真空爐中,自100℃緩慢加熱至280℃達2小時,緩慢冷卻,並與框架分離,以獲得透光膜。透光膜在250℃下進一步進行熱處理達5分鐘。 The frame fixed with the film was put into a vacuum furnace, slowly heated from 100° C. to 280° C. for 2 hours, cooled slowly, and separated from the frame to obtain a light-transmitting film. The light-transmitting film was further heat-treated at 250° C. for 5 minutes.
因此,完成具有80微米的厚度t1且包括透光基質110及分散於透光基質110中的二氧化矽系填料120的透光膜100的生產。
Therefore, the production of the
<實例8> <Example 8>
將0.16重量份的DMAc(第一溶劑)充入反應器中,且然後攪拌,同時將反應器的溫度保持在10℃。然後,向其中添加0.001625重量份(第一量的)在製備例1中製備的作為固體粉末 (透光樹脂粉末)的聚醯胺-醯亞胺,隨後攪拌1小時,且然後將溫度升高至25℃,以製備作為液體的透光樹脂溶液。 0.16 parts by weight of DMAc (first solvent) was charged into the reactor, and then stirred while maintaining the temperature of the reactor at 10°C. Then, 0.001625 parts by weight (first amount) of the solid powder prepared in Preparation Example 1 was added thereto. (light-transmitting resin powder) of polyamide-imide, followed by stirring for 1 hour, and then raising the temperature to 25° C. to prepare a light-transmitting resin solution as a liquid.
將0.325重量份在實例7中製備的具有10重量%的二氧化矽含量的稀釋二氧化矽分散體C充入另一個反應器中,且使用圓柱形泵以0.5克/分鐘的速率緩慢注射製備的液體透光樹脂溶液,同時將反應器的溫度保持在25℃,以製備其中二氧化矽分散體與透光樹脂溶液混合的第一混合溶液。 0.325 parts by weight of the diluted silica dispersion C with a silica content of 10% by weight prepared in Example 7 was charged into another reactor and slowly injected using a cylindrical pump at a rate of 0.5 g/min to prepare The liquid light-transmitting resin solution, while maintaining the temperature of the reactor at 25° C., to prepare a first mixed solution in which the silica dispersion is mixed with the light-transmitting resin solution.
將364.64重量份的DMAc作為第三溶劑添加至第一混合溶液,隨後進行攪拌。然後,向其中添加64.398重量份(第二量的)在製備例1中製備的作為固體粉末(透光樹脂粉末)的聚醯胺-醯亞胺,隨後進行攪拌,以製備第二混合溶液。第二混合溶液是其中分散有二氧化矽顆粒的透光樹脂溶液。 364.64 parts by weight of DMAc was added as a third solvent to the first mixed solution, followed by stirring. Then, 64.398 parts by weight (second amount) of polyamide-imide as a solid powder (light-transmitting resin powder) prepared in Preparation Example 1 was added thereto, followed by stirring, to prepare a second mixed solution. The second mixed solution is a light-transmitting resin solution in which silicon dioxide particles are dispersed.
將獲得的第二混合溶液施加至澆鑄基底,澆鑄,並在130℃下用熱空氣乾燥30分鐘以產生膜,且然後將產生的膜自澆鑄基底剝離並用銷固定至框架。 The obtained second mixed solution was applied to a casting base, cast, and dried with hot air at 130° C. for 30 minutes to produce a film, and then the produced film was peeled from the casting base and fixed to a frame with pins.
將固定有膜的框架放入真空爐中,自100℃緩慢加熱至280℃達2小時,緩慢冷卻,並與框架分離,以獲得透光膜。透光膜在250℃下進一步進行熱處理達5分鐘。 The frame fixed with the film was put into a vacuum furnace, slowly heated from 100°C to 280°C for 2 hours, cooled slowly, and separated from the frame to obtain a light-transmitting film. The light-transmitting film was further heat-treated at 250° C. for 5 minutes.
因此,完成具有80微米的厚度t1且包括透光基質110及分散於透光基質110中的二氧化矽系填料120的透光膜100的生產。
Therefore, the production of the
<實例9> <Example 9>
將3.22重量份的DMAc(第一溶劑)充入100毫升反應器中,且然後攪拌,同時將反應器的溫度保持在10℃。然後,向其中添加0.0325重量份(第一量的)在製備例1中製備的作為固體粉末(透光樹脂粉末)的聚醯胺-醯亞胺,隨後攪拌1小時,且然後將溫度升高至25℃,以製備作為液體的透光樹脂溶液。 3.22 parts by weight of DMAc (first solvent) was charged into a 100 ml reactor, and then stirred while maintaining the temperature of the reactor at 10°C. Then, 0.0325 parts by weight (of the first amount) of polyamide-imide as a solid powder (light-transmitting resin powder) prepared in Preparation Example 1 was added thereto, followed by stirring for 1 hour, and then the temperature was raised to 25°C to prepare a light-transmitting resin solution as a liquid.
將6.5重量份在實例7中製備的具有10重量%的二氧化矽含量的稀釋二氧化矽分散體C充入另一個1升反應器中,且使用圓柱形泵以0.5克/分鐘的速率緩慢注射製備的液體透光樹脂溶液,同時將反應器的溫度保持在25℃,以製備其中二氧化矽分散體與透光樹脂溶液混合的第一混合溶液。 6.5 parts by weight of the diluted silica dispersion C with a silica content of 10% by weight prepared in Example 7 were charged into another 1 liter reactor and slowly fed at a rate of 0.5 g/min using a cylindrical pump. The prepared liquid light-transmitting resin solution was injected while maintaining the temperature of the reactor at 25° C. to prepare a first mixed solution in which the silica dispersion was mixed with the light-transmitting resin solution.
將359.08重量份的DMAc作為第三溶劑添加至第一混合溶液,隨後進行攪拌。然後,向其中添加64.367重量份(第二量的)在製備例1中製備的作為固體粉末(透光樹脂粉末)的聚醯胺-醯亞胺,隨後進行攪拌,以製備第二混合溶液。第二混合溶液是其中分散有二氧化矽顆粒的透光樹脂溶液。 359.08 parts by weight of DMAc was added as a third solvent to the first mixed solution, followed by stirring. Then, 64.367 parts by weight (second amount) of polyamide-imide as a solid powder (light-transmitting resin powder) prepared in Preparation Example 1 was added thereto, followed by stirring, to prepare a second mixed solution. The second mixed solution is a light-transmitting resin solution in which silicon dioxide particles are dispersed.
將獲得的第二混合溶液施加至澆鑄基底,澆鑄,並在130℃下用熱空氣乾燥30分鐘以產生膜,且然後將產生的膜自澆鑄基底剝離並用銷固定至框架。 The obtained second mixed solution was applied to a casting base, cast, and dried with hot air at 130° C. for 30 minutes to produce a film, and then the produced film was peeled from the casting base and fixed to a frame with pins.
將固定有膜的框架放入真空爐中,自100℃緩慢加熱至280℃達2小時,緩慢冷卻,並與框架分離,以獲得透光膜。透光膜在250℃下進一步進行熱處理達5分鐘。 The frame fixed with the film was put into a vacuum furnace, slowly heated from 100°C to 280°C for 2 hours, cooled slowly, and separated from the frame to obtain a light-transmitting film. The light-transmitting film was further heat-treated at 250° C. for 5 minutes.
因此,完成具有80微米的厚度t1且包括透光基質110
及分散於透光基質110中的二氧化矽系填料120的透光膜100的生產。
Thus, the finished film has a thickness t1 of 80 micrometers and includes a light-transmitting
<比較例1> <Comparative example 1>
使用溶液-粉末混合方法製備根據比較例1的透光膜。 The light-transmitting film according to Comparative Example 1 was prepared using a solution-powder mixing method.
具體而言,將420.48重量份的DMAc及40.25重量份的二氧化矽分散體B(MEK-ST-40,日產化工(Nissan Chemical Industries))充入1升反應器中,在二氧化矽分散體B中,平均粒徑為10奈米至15奈米的二氧化矽顆粒以40重量%的量分散於甲基乙基酮(MEK)溶液(第二溶劑)中,且然後攪拌,同時將反應器的溫度保持在10℃。然後,向其中添加64.4重量份在製備例1中製備的作為固體粉末的聚醯胺-醯亞胺,隨後攪拌1小時,且然後將溫度升高至25℃,以獲得其中分散有二氧化矽顆粒的透光樹脂溶液。 Specifically, 420.48 parts by weight of DMAc and 40.25 parts by weight of silica dispersion B (MEK-ST-40, Nissan Chemical Industries) were charged into a 1-liter reactor, and the silica dispersion In B, silica particles with an average particle diameter of 10 nm to 15 nm were dispersed in a methyl ethyl ketone (MEK) solution (second solvent) in an amount of 40% by weight, and then stirred while the reaction The temperature of the vessel was maintained at 10 °C. Then, 64.4 parts by weight of the polyamide-imide prepared in Preparation Example 1 as a solid powder was added thereto, followed by stirring for 1 hour, and then the temperature was raised to 25° C. to obtain a powder having silica dispersed therein. Light-transmitting resin solution of particles.
將獲得的第二混合溶液施加至澆鑄基底,澆鑄,並在130℃下用熱空氣乾燥30分鐘以產生膜,且然後將產生的膜自澆鑄基底剝離並用銷固定至框架。 The obtained second mixed solution was applied to a casting base, cast, and dried with hot air at 130° C. for 30 minutes to produce a film, and then the produced film was peeled from the casting base and fixed to a frame with pins.
將固定有膜的框架放入真空爐中,自100℃緩慢加熱至280℃達2小時,緩慢冷卻,並與框架分離,以獲得透光膜。透光膜在250℃下進一步進行熱處理達5分鐘,以生產具有80微米的厚度t1的透光膜。 The frame fixed with the film was put into a vacuum furnace, slowly heated from 100°C to 280°C for 2 hours, cooled slowly, and separated from the frame to obtain a light-transmitting film. The light-transmitting film was further heat-treated at 250° C. for 5 minutes to produce a light-transmitting film having a thickness t1 of 80 μm.
<比較例2> <Comparative example 2>
將371.72重量份的DMAc及35.76重量份的二氧化矽分 散體A(DMAC-ST,日產化工(Nissan Chemical Industries))充入1升反應器中,在二氧化矽分散體A中,平均粒徑為10奈米至15奈米的二氧化矽顆粒以20重量%的量分散於N,N-二甲基乙醯胺(DMAc)溶液(第二溶劑)中,且然後攪拌,同時將反應器的溫度保持在10℃。然後,向其中添加64.4重量份在製備例1中製備的作為固體粉末的聚醯胺-醯亞胺,隨後攪拌1小時,且然後將溫度升高至25℃,以獲得其中分散有二氧化矽顆粒的透光樹脂溶液。 The DMAc of 371.72 parts by weight and the silicon dioxide of 35.76 parts by weight are divided into Dispersion A (DMAC-ST, Nissan Chemical Industries) was charged into a 1-liter reactor. In silica dispersion A, silica particles with an average particle size of 10 nm to 15 nm were mixed with 20 An amount of % by weight was dispersed in an N,N-dimethylacetamide (DMAc) solution (second solvent), and then stirred while maintaining the temperature of the reactor at 10°C. Then, 64.4 parts by weight of the polyamide-imide prepared in Preparation Example 1 as a solid powder was added thereto, followed by stirring for 1 hour, and then the temperature was raised to 25° C. to obtain a powder having silica dispersed therein. Light-transmitting resin solution of particles.
將獲得的第二混合溶液施加至澆鑄基底,澆鑄,並在130℃下用熱空氣乾燥30分鐘以產生膜,且然後將產生的膜自澆鑄基底剝離並用銷固定至框架。 The obtained second mixed solution was applied to a casting base, cast, and dried with hot air at 130° C. for 30 minutes to produce a film, and then the produced film was peeled from the casting base and fixed to a frame with pins.
將固定有膜的框架放入真空爐中,自100℃緩慢加熱至280℃達2小時,緩慢冷卻,並與框架分離,以獲得透光膜。透光膜在250℃下進一步進行熱處理達5分鐘,以生產具有80微米的厚度t1的透光膜。 The frame fixed with the film was put into a vacuum furnace, slowly heated from 100°C to 280°C for 2 hours, cooled slowly, and separated from the frame to obtain a light-transmitting film. The light-transmitting film was further heat-treated at 250° C. for 5 minutes to produce a light-transmitting film having a thickness t1 of 80 μm.
<比較例3> <Comparative example 3>
將362.30重量份的DMAc充入1升反應器中。對二氧化矽分散體C(MEK-ST-ZL,日產化工(Nissan Chemical Industries))(其中平均粒徑為70奈米至100奈米的二氧化矽顆粒以30重量%的量分散於甲基乙基酮(MEK)溶液(第二溶劑)中)進行稀釋,使得二氧化矽顆粒的含量被調節至10重量%,以製備具有10重量%的二氧化矽含量的稀釋二氧化矽分散體C。將具有10重量%的二氧化矽含量的6.5重量份的二氧化矽分散體C充入1 升反應器中,且然後攪拌,同時將1升反應器的溫度保持在10℃。然後,向其中添加64.4重量份在製備例1中製備的作為固體粉末的聚醯胺-醯亞胺,隨後攪拌1小時,且然後將溫度升高至25℃,以獲得其中分散有二氧化矽顆粒的透光樹脂溶液。 362.30 parts by weight of DMAc were charged into a 1 liter reactor. For silica dispersion C (MEK-ST-ZL, Nissan Chemical Industries) (in which silica particles with an average particle size of 70 nm to 100 nm are dispersed in methyl ethyl ketone (MEK) solution (second solvent)) so that the content of silica particles is adjusted to 10% by weight to prepare diluted silica dispersion C with a silica content of 10% by weight . 6.5 parts by weight of silica dispersion C with a silica content of 10 wt. liter reactor, and then stirred while maintaining the temperature of the 1 liter reactor at 10°C. Then, 64.4 parts by weight of the polyamide-imide prepared in Preparation Example 1 as a solid powder was added thereto, followed by stirring for 1 hour, and then the temperature was raised to 25° C. to obtain a powder having silica dispersed therein. Light-transmitting resin solution of particles.
將獲得的第二混合溶液施加至澆鑄基底,澆鑄,並在130℃下用熱空氣乾燥30分鐘以產生膜,且然後將產生的膜自澆鑄基底剝離並用銷固定至框架。 The obtained second mixed solution was applied to a casting base, cast, and dried with hot air at 130° C. for 30 minutes to produce a film, and then the produced film was peeled from the casting base and fixed to a frame with pins.
將固定有膜的框架放入真空爐中,自100℃緩慢加熱至280℃達2小時,緩慢冷卻,並與框架分離,以獲得透光膜。透光膜在250℃下進一步進行熱處理達5分鐘,以生產具有80微米的厚度t1的透光膜。 The frame fixed with the film was put into a vacuum furnace, slowly heated from 100°C to 280°C for 2 hours, cooled slowly, and separated from the frame to obtain a light-transmitting film. The light-transmitting film was further heat-treated at 250° C. for 5 minutes to produce a light-transmitting film having a thickness t1 of 80 μm.
<量測實例> <Measurement example>
對實例1至實例9及比較例1至比較例3中生產的透光膜執行以下量測。 The following measurements were performed on the light-transmitting films produced in Examples 1 to 9 and Comparative Examples 1 to 3.
(1)平均二維分散性(使用TEM) (1) Average two-dimensional dispersion (using TEM)
藉由使用透射電子顯微鏡(TEM)對實例1至實例9及比較例1至比較例3中生產的透光膜進行成像來獲得顯微鏡影像。成像製程的細節如下。 Microscope images were obtained by imaging the light-transmitting films produced in Examples 1 to 9 and Comparative Examples 1 to 3 using a transmission electron microscope (TEM). The details of the imaging process are as follows.
首先,使用切片機將實例1至實例9及比較例1至比較例3中生產的透光膜100中的每一者薄薄地切割,以形成透光膜100的樣品310。具體而言,透光膜100被包含環氧樹脂的模製物210覆蓋,以固定透光膜100。然後,使用切片機在平行於厚度t1
方向的方向上對透光膜100薄薄地切割。因此,生產具有120奈米的厚度t2的透光膜100的樣品310(參見圖7a及圖7b)。樣品310在以下條件下生產:
First, each of the light-transmitting
- 樣品處理元件(切片機):來自徠卡生物系統(Leica Biosystems)的徠卡(Leica)EM UC7 - Sample handling element (tome): Leica EM UC7 from Leica Biosystems
- 設備條件: - Equipment condition:
速度:1毫米/秒 Speed: 1 mm/s
進給厚度(t2):120奈米 Feed thickness (t2): 120nm
- 刀:戴通(DiATOME)/奧特拉(Ultra)35度 - Knife: DiATOME/Ultra 35 degrees
接下來,使用透射電子顯微鏡(TEM)對透光膜100的樣品310成像,以獲得顯微鏡影像。具體而言,沿著圖7b中由「PIC」所示的方向對透光膜100的樣品310成像,以獲得顯微鏡影像。成像在以下條件下進行:
Next, a transmission electron microscope (TEM) is used to image the
- 透射電子顯微鏡(TEM)(來自日本電子(JEOL)的JEM-2100F) - Transmission Electron Microscope (TEM) (JEM-2100F from JEOL)
- 加速電壓:200千伏 - Accelerating voltage: 200 kV
- 放大率:20,000x(20K) - Magnification: 20,000x(20K)
接下來,對獲得的顯微鏡影像進行預處理。 Next, the obtained microscope images are preprocessed.
- 影像處理:執行藉由顏色分離轉換至黑白影像,以獲得二維黑白影像 - Image processing: perform conversion to black and white images by color separation to obtain 2D black and white images
接下來,自經處理影像提取關於填料120的顆粒的位置的座標資料。座標資料是在以下條件下提取的。
Next, coordinate information about the location of the particles of
- 影像分析程式:iTEM(使用奧林巴斯(Olympus)生產的iTEM5.1) - Image analysis program: iTEM (using iTEM5.1 produced by Olympus)
- 藉由自影像去除排除與填料顆粒120對應的點之後的剩餘部分,且自影像的點中刪除直徑小於填料120的顆粒的平均直徑的1/10的點來獲得渲染影像。
- Obtaining a rendered image by removing from the image what remains after excluding the points corresponding to the
- 將基於填料120的顆粒(影像中的點)的座標設置為填料120的顆粒的座標。
- Set the coordinates of the particles based on the filler 120 (points in the image) to the coordinates of the particles of the
接下來,基於填料120的顆粒的座標確定填料顆粒的數目N,且根據圖3中所示的方法計算作為填料120的顆粒之間的理想二維距離的Dx。
Next, the number N of filler particles is determined based on the coordinates of the particles of
假設填料120的顆粒均勻地分散於渲染影像中,且位於具有相等長度的邊的等邊三角形的相應頂點處,如圖3中所示,以便計算填料120的顆粒之間的理想二維距離Dx。
Assuming that the particles of the
如圖3中所示,等邊三角形的一邊被設置為平行於x軸方向。 As shown in FIG. 3, one side of the equilateral triangle is set parallel to the x-axis direction.
在圖3中,渲染影像在X軸方向上的長度由「a」表示,在Y軸方向上的長度由「b」表示,在X軸方向上設置在一列中的填料120的顆粒數由「Nx」表示,在Y軸方向上設置在一行中的填料120的顆粒數由「Ny」表示,且等邊三角形的一邊的長度由「Dx」表示作為填料顆粒之間的理想二維距離。當填料顆粒的總數為N時,滿足以下關係。
In FIG. 3 , the length of the rendered image in the X-axis direction is represented by "a", the length in the Y-axis direction is represented by "b", and the number of particles of the
N=Nx×Ny N=Nx×Ny
a=(Nx-1)×Dx a=(Nx-1)×Dx
b=(Ny-1)×Dx×cos 30° b=(Ny-1)×Dx×cos 30°
渲染影像的面積=a×b Area of rendered image = a×b
藉由對渲染影像進行分析獲得N、a及b,並根據N、a及b獲得Dx。 N, a and b are obtained by analyzing the rendered image, and Dx is obtained according to N, a and b.
此外,使用利用影像分析程式獲得的填料120的顆粒的實際座標來量測填料120的顆粒之間的距離Daj。
In addition, the distance Daj between the particles of the
填料120的平均二維分散性根據等式1使用如此獲得的N、Dx及Daj計算。
The average two-dimensional dispersibility of the
(2)平均二維分散性(使用SEM) (2) Average two-dimensional dispersion (using SEM)
藉由使用掃描電子顯微鏡(SEM)對實例1至實例9及比較例1至比較例3中製備的透光膜進行成像來獲得顯微鏡影像。成像製程的細節如下。 Microscopic images were obtained by imaging the light-transmitting films prepared in Examples 1 to 9 and Comparative Examples 1 to 3 using a scanning electron microscope (SEM). The details of the imaging process are as follows.
首先,使用包含環氧樹脂的模製物210覆蓋透光膜100中的每一者,以固定透光膜100。然後,使用切片機在平行於厚度t1方向的方向上對透光膜100薄薄地切割。因此,生成樣品410,如圖8中所示。樣品410在以下條件下生產:
First, each of the light-transmitting
- 樣品處理元件:來自徠卡生物系統(Leica Biosystems)的徠卡(Leica)EM UC7。使用環氧樹脂進行模製,且然後切割橫截 面。 - Sample handling element: Leica EM UC7 from Leica Biosystems. Molded with epoxy and then cut in cross section noodle.
- 刀:戴通(DiATOME)/奧特拉(Ultra)35度 - Knife: DiATOME/Ultra 35 degrees
- 設備條件:速度:1毫米/秒 - Equipment Conditions: Speed: 1mm/sec
接下來,使用場發射掃描電子顯微鏡(FE-SEM)作為掃描電子顯微鏡(SEM)對透光膜100的樣品410成像,以獲得顯微鏡影像。具體而言,沿著圖8中由「PIC」指示的方向對透光膜100的樣品410成像,以獲得顯微鏡影像。成像在以下條件下進行:
Next, a field emission scanning electron microscope (FE-SEM) is used as a scanning electron microscope (SEM) to image the
- 掃描電子顯微鏡:JSM-7601F(場發射掃描電子顯微鏡,FE-SEM),由日本電子(JEOL)生產 - Scanning electron microscope: JSM-7601F (Field Emission Scanning Electron Microscope, FE-SEM), manufactured by JEOL
- 加速電壓:10千伏 - Accelerating voltage: 10 kV
- 模式:SEI - Mode: SEI
- WD:7至9 - WD: 7 to 9
- 放大率:3,000x(3K) - Magnification: 3,000x(3K)
接下來,對獲得的顯微鏡影像進行預處理。 Next, the obtained microscope images are preprocessed.
- 影像處理:執行藉由顏色分離轉換至黑白影像,以獲得二維黑白影像 - Image processing: perform conversion to black and white images by color separation to obtain 2D black and white images
接下來,自經處理影像提取關於填料120的顆粒的位置的座標資料。座標資料是在以下條件下提取的。
Next, coordinate information about the location of the particles of
- 影像分析程式:iTEM(使用奧林巴斯(Olympus)生產的iTEM5.1) - Image analysis program: iTEM (using iTEM5.1 produced by Olympus)
- 藉由自影像去除排除與填料顆粒120對應的點之後的剩餘
部分,且自影像的點中刪除直徑小於填料120的顆粒的平均直徑的1/10的點,來獲得渲染影像。
- the remaining after excluding the points corresponding to the
- 將基於填料120的顆粒(影像中的點)的座標設置為填料120的顆粒的座標。
- Set the coordinates of the particles based on the filler 120 (points in the image) to the coordinates of the particles of the
接下來,基於填料120的顆粒的座標確定填料120的顆粒的數目N,並且根據圖3所示的方法計算作為填料120的顆粒之間的理想二維距離的Dx。
Next, the number N of particles of the
Dx的計算以與在使用透射電子顯微鏡(TEM)的情況下相同的方法執行。 Calculation of Dx is performed in the same method as in the case of using a transmission electron microscope (TEM).
(3)透光率(%):根據ASTM E313標準,使用光譜儀(CM-3700D,柯尼卡美能達(KONICA MINOLTA))量測360奈米至740奈米的波長下的平均透光率。 (3) Light transmittance (%): According to the ASTM E313 standard, the average light transmittance at a wavelength of 360 nm to 740 nm was measured using a spectrometer (CM-3700D, KONICA MINOLTA).
(4)黃色指數:根據ASTM E313標準,使用光譜儀(CM-3700D,柯尼卡美能達(KONICA MINOLTA))量測黃色指數。 (4) Yellowness index: According to the ASTM E313 standard, the yellowness index was measured using a spectrometer (CM-3700D, KONICA MINOLTA).
(5)霧度:將生產的透光膜切成50毫米×50毫米的片,且使用村上色彩研究實驗室(Murakami Color Research Laboratory)生產的霧度計(型號名稱:HM-150)根據ASTM D1003標準量測5次,且將其平均值設定為霧度。 (5) Haze: The light-transmitting film produced was cut into pieces of 50 mm×50 mm, and a haze meter (model name: HM-150) manufactured by Murakami Color Research Laboratory was used according to ASTM The D1003 standard measures 5 times, and sets the average value as the haze.
(6)楊氏模數及2%屈服強度:使用英斯特朗(Instron)生產的萬能拉伸試驗機,根據ASTM D885標準量測透光膜的楊氏模數及2%屈服強度。 (6) Young's modulus and 2% yield strength: the Young's modulus and 2% yield strength of the light-transmitting film were measured according to ASTM D885 using a universal tensile testing machine produced by Instron.
量測結果在下表1中示出。 The measurement results are shown in Table 1 below.
根據表1中所示的量測結果可以看出,根據本揭露實施例的透光膜100具有25%或大於25%的平均二維分散性,且因此表現出優異的透光率、低黃色指數及低霧度。
According to the measurement results shown in Table 1, it can be seen that the light-transmitting
100:透光膜/聚醯亞胺系膜 100: Light-transmitting film/polyimide film
110:透光基質/聚醯亞胺系基質/基質 110: Light-transmitting matrix/polyimide-based matrix/matrix
120:填料/填料顆粒 120: filler/filler particles
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